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JP3112995B2 - Method for producing biphenyl compound - Google Patents
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JP3112995B2 - Method for producing biphenyl compound - Google Patents

Method for producing biphenyl compound

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Publication number
JP3112995B2
JP3112995B2 JP03226256A JP22625691A JP3112995B2 JP 3112995 B2 JP3112995 B2 JP 3112995B2 JP 03226256 A JP03226256 A JP 03226256A JP 22625691 A JP22625691 A JP 22625691A JP 3112995 B2 JP3112995 B2 JP 3112995B2
Authority
JP
Japan
Prior art keywords
compound
reaction
formula
group
biphenyl compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP03226256A
Other languages
Japanese (ja)
Other versions
JPH05294884A (en
Inventor
洋三 三浦
延二 中谷
寛 津田
Original Assignee
日本テルペン化学株式会社
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Publication of JPH05294884A publication Critical patent/JPH05294884A/en
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Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/52Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts

Landscapes

  • Fats And Perfumes (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Anti-Oxidant Or Stabilizer Compositions (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】この発明は、ビフェニル化合物の
製造法に関する。この発明のビフェニル化合物は抗酸化
剤、消臭剤などとして有用であり、また樹脂などの合成
中間体としても有用である。
The present invention relates to a method for producing a biphenyl compound. The biphenyl compound of the present invention is useful as an antioxidant, a deodorant and the like, and also as a synthetic intermediate such as a resin.

【0002】[0002]

【従来の技術および発明が解決しようとする課題】香辛
料植物のタイム(チムス・ブルガリス・リンネ Thymus
vulgaris Linne)から、下記の化合物
BACKGROUND OF THE INVENTION Spice plant thyme (Thymmus bulgaris linne Thymus
vulgaris Linne ) from the following compounds

【化5】 が抽出、分離され、抗酸化作用及び消臭作用を有するこ
とが知られている(特開平2-160737号公報参照)。
Embedded image Is known to have an antioxidant action and a deodorant action (see JP-A-2-160737).

【0003】しかしながら、タイムに含有されている上
記の化合物は、微量であり工業的に使用するためにはそ
れらの合成法の確立が求められた。上記のような状況に
おいて、この発明の発明者らは鋭意研究をかさねた結
果、この発明を完成するに至った。
[0003] However, the above-mentioned compounds contained in thyme are very small, and establishment of a synthesis method for them is required for industrial use. Under the circumstances described above, the inventors of the present invention have conducted intensive studies and, as a result, have completed the present invention.

【0004】[0004]

【課題を解決するための手段】この発明によれば、一般
式(II)
According to the present invention, general formula (II)

【化6】 (式中R1はC1-3のアルキル基を示す)で表される化合
物を、過塩素酸コバルトとα,α,α',α'−テトラキス
−(1−メチル−1H−イミダゾール−2−イル)−2,6−
ピリジンジメタノールとの錯体の存在下に酸化して、一
般式(I)
Embedded image (Wherein R 1 represents a C 1-3 alkyl group) is prepared by treating cobalt perchlorate with α, α, α ′, α′-tetrakis- (1-methyl-1H-imidazole-2). -Il) -2,6-
Oxidation in the presence of a complex with pyridinedimethanol gives a compound of the general formula (I)

【化7】 (式中R1は上記と同一意味)で表わされる化合物を製
造する方法、及び一般式(I)の化合物を還元して一般式
(I′)
Embedded image (Wherein R 1 has the same meaning as described above), and a compound represented by the general formula (I)
(I ')

【化8】 (式中R1は上記と同一意味)で表わされる化合物を製
造する方法が提供される。
Embedded image (Wherein R 1 has the same meaning as described above).

【0005】上記の一般式中、R1のアルキル基として
はメチル、エチル、プロピル及びイソプロピル基が含ま
れる。R1はメチル基又はイソプロピル基であるのが好
ましい。一般式(I)及び(I′)の化合物でR1がイソプ
ロピル基以外の化合物は新規な化合物である。
[0005] In the above general formula, the alkyl group of R 1 includes methyl, ethyl, propyl and isopropyl groups. R 1 is preferably a methyl group or an isopropyl group. General formula (I) and compounds other than R 1 is an isopropyl group in the compound of (I ') are novel compounds.

【0006】化合物(II)から化合物(I)への酸化は、過
塩素酸コバルトとα,α,α',α'−テトラキス−(1−メ
チル−1H−イミダゾール−2−イル)−2,6−ピリジンジ
メタノールの錯体の存在下、通常、反応に不活性な有機
溶媒中で酸素ガス雰囲気下で行われる。
The oxidation of compound (II) to compound (I) is carried out by using cobalt perchlorate and α, α, α ′, α′-tetrakis- (1-methyl-1H-imidazol-2-yl) -2, The reaction is usually performed in an organic solvent inert to the reaction under an oxygen gas atmosphere in the presence of a 6-pyridinedimethanol complex.

【0007】錯体は、過塩素酸コバルト(例えば6水和
物)とイミダゾール化合物とそれぞれ等モル量をアセト
ニトリルのような有機溶媒中で混合することにより形成
される。錯体の使用量は、化合物(II)に対して、約0.01
〜1当量である。この錯体に予め酸素ガスを吹き込ん
で、酸化反応に使用するのが望ましい。
The complex is formed by mixing equimolar amounts of cobalt perchlorate (for example, hexahydrate) and an imidazole compound in an organic solvent such as acetonitrile. The amount of the complex to be used is about 0.01 with respect to compound (II).
~ 1 equivalent. It is desirable that oxygen gas be blown into the complex in advance and used for the oxidation reaction.

【0008】反応に不活性な有機溶媒としては、アセト
ニトリル、ジメチルホルムアミド、ジメチルスルホキシ
ド、テトラヒドロフラン、ジオキサン、クロロホルム、
ジクロロメタンなどが挙げられる。しかしながら、これ
らに特に限定されない。酸化反応は、酸素ガス雰囲気下
で行われ、反応温度は室温ないし若干高められた温度で
反応時間は1時間〜1日間である。
The organic solvents inert to the reaction include acetonitrile, dimethylformamide, dimethylsulfoxide, tetrahydrofuran, dioxane, chloroform,
Dichloromethane and the like. However, it is not particularly limited to these. The oxidation reaction is performed in an oxygen gas atmosphere, the reaction temperature is from room temperature to a slightly elevated temperature, and the reaction time is 1 hour to 1 day.

【0009】生成する化合物(I)は、例えばカラムクロ
マトグラフィーで錯体を除去し、その溶離液から溶媒を
留去し、残渣を再結晶することにより純品として単離・
精製しうる。
The resulting compound (I) is isolated as a pure product by removing the complex by, for example, column chromatography, distilling off the solvent from the eluate, and recrystallizing the residue.
Can be purified.

【0010】化合物(I)から化合物(I′)への還元は、
通常反応に不活性な有機溶媒(上記の酸化反応で挙げた
と同じ溶媒が適用できる)中、水素化ホウ素ナトリウ
ム、水素化リチウムアルミニウムのような還元剤を用い
て行うことができる。反応温度は室温ないし若干高めら
れた温度で、反応時間は1〜2,3時間である。還元剤
の使用量は、化合物に対して、約0.4〜3.0当量である。
生成した化合物(I′)は、反応液中に存在する未反応の
還元剤を分解し、溶媒抽出、再結晶などの常法によって
容易に分離・精製することができる。
The reduction of compound (I) to compound (I ')
Usually, the reaction can be carried out in an organic solvent inert to the reaction (the same solvent as mentioned in the above oxidation reaction can be applied) using a reducing agent such as sodium borohydride or lithium aluminum hydride. The reaction temperature is from room temperature to a slightly elevated temperature, and the reaction time is 1-2 hours. The amount of the reducing agent to be used is about 0.4-3.0 equivalents to the compound.
The produced compound (I ') decomposes the unreacted reducing agent present in the reaction solution, and can be easily separated and purified by a conventional method such as solvent extraction and recrystallization.

【0011】この発明の方法で得られる一般式(I)又は
(I′)の化合物は抗酸化作用及び消臭作用を有し、抗酸
化剤及び消臭剤として有用である。また、ポリエステ
ル、ポリカーボネート、エポキシ樹脂等の樹脂原料とし
て、さらに染料、医薬、農薬の中間体として利用しう
る。
The general formula (I) obtained by the method of the present invention or
The compound (I ') has an antioxidant action and a deodorant action, and is useful as an antioxidant and a deodorant. Further, it can be used as a resin raw material such as polyester, polycarbonate, epoxy resin and the like, and further as an intermediate of dyes, medicines and agricultural chemicals.

【0012】一般式(I)のビフェニル化合物は、例えば
次の工程に従って製造することができる。
The biphenyl compound of the general formula (I) can be produced, for example, according to the following steps.

【化9】 (式中R1は上記と同一意味、R2はフェノール性水酸基
の保護基を意味する)
Embedded image (In the formula, R 1 has the same meaning as described above, and R 2 means a protecting group for a phenolic hydroxyl group.)

【0013】R2のフェノール性水酸基の保護基として
は、メチル、エチル、イソプロピルのようなC1-3アル
キル基、メタンスルホニル、エタンスルホニル、ベンゼ
ンスルホニル、トルエンスルホニルのような脂肪族又は
芳香族スルホニル基などが挙げられる。その他、ハロゲ
ン化反応、グリニヤール反応などにおいて、フェノール
性水酸基を保護しうる基であってもよい。
The protecting group for the phenolic hydroxyl group of R 2 includes a C 1-3 alkyl group such as methyl, ethyl and isopropyl; an aliphatic or aromatic sulfonyl such as methanesulfonyl, ethanesulfonyl, benzenesulfonyl and toluenesulfonyl. And the like. In addition, it may be a group capable of protecting a phenolic hydroxyl group in a halogenation reaction, a Grignard reaction, or the like.

【0014】R2がC1-3アルキル基、ことにメチル基で
ある場合を例にとり、上記の工程を説明する。ジアルキ
ルフェノール(1)は、アルキル化剤例えばジメチル硫酸
を反応させてジアルコキシベンゼン(2)に導かれる。こ
の反応は、通常、水媒体中アルカリの存在下で行われ
る。反応温度は氷冷下ないし水の沸点の間で行われる。
反応時間は1〜20時間である。ジアルコキシベンゼン
(2)は、ハロゲン化剤と処理してハロゲン化ジアルキル
アルコキシベンゼン(3)に導かれる。ハロゲン化剤とし
ては、例えばベンジルトリメチルアンモニウムトリブロ
ミドを用いることができる(ケミストリー レターズ、
627〜630(1987)参照)。このハロゲン化は、通常有機
溶媒(ジクロロメタン、メタノール等)中で室温ないし
若干高められた温度下で行われる。反応時間は1〜数時
間である。
The above steps will be described by taking as an example the case where R 2 is a C 1-3 alkyl group, especially a methyl group. The dialkylphenol (1) is led to dialkoxybenzene (2) by reacting with an alkylating agent such as dimethyl sulfate. This reaction is usually performed in an aqueous medium in the presence of an alkali. The reaction is carried out at a temperature between ice-cooling and the boiling point of water.
The reaction time is 1 to 20 hours. Dialkoxybenzene
(2) is treated with a halogenating agent to lead to a halogenated dialkylalkoxybenzene (3). As the halogenating agent, for example, benzyltrimethylammonium tribromide can be used (Chemistry Letters,
627-630 (1987)). This halogenation is usually carried out in an organic solvent (dichloromethane, methanol, etc.) at room temperature or at a slightly elevated temperature. The reaction time is one to several hours.

【0015】次に、ハロゲン化ジアルキルアルコキシベ
ンゼン(3)は、グリニヤール反応を利用して、ジアルコ
キシビフェニル化合物(4)に変換される。すなわち、ハ
ロゲン化ジアルキルアルコキシベンゼン(3)の少なくと
も半量を金属マグネシウムと有機溶媒(例えばテトラヒ
ドロフラン)中で室温または必要ならば加温してグリニ
ヤール試薬に変換する。これと残りの(3)とを触媒量の
ジフェニルフォスフィノアルカンニッケルジクロリドの
存在下で反応させることによりジアルコキシビフェニル
化合物(4)が得られる。ジフェニルフォスフィノアルカ
ンニッケルジクロリドとしては、ジフェニルフォスフィ
ノメタン(又はエタンもしくはプロパン)ニッケルジク
ロリドが挙げられる。これらの化合物はジフェニルフォ
スフィノアルカン[(Ph)2P(CH2)nP(Ph)2(式中nは1〜
3)]を低級脂肪族アルコール(例えばメタノールやエ
タノール)中で当量の塩化ニッケル(6水和物)と反応
させ、溶媒を回収することによって得られる。
Next, the halogenated dialkylalkoxybenzene (3) is converted into a dialkoxybiphenyl compound (4) by utilizing the Grignard reaction. That is, at least half of the halogenated dialkylalkoxybenzene (3) is converted to a Grignard reagent by heating at room temperature or, if necessary, in metallic magnesium and an organic solvent (eg, tetrahydrofuran). By reacting this with the remaining (3) in the presence of a catalytic amount of diphenylphosphinoalkane nickel dichloride, dialkoxybiphenyl compound (4) is obtained. The diphenylphosphinoalkane nickel dichloride includes diphenylphosphinomethane (or ethane or propane) nickel dichloride. These compounds diphenylphosphino alkane [(Ph) 2 P (CH 2) nP (Ph) 2 ( wherein n is 1 to
3)] is reacted with an equivalent amount of nickel chloride (hexahydrate) in a lower aliphatic alcohol (for example, methanol or ethanol), and the solvent is recovered.

【0016】得られたジアルコキシビフェニル化合物
(4)は、脱保護反応に付してビフェニル化合物(5)に導か
れる。アルコキシ基の水酸基への脱保護反応は、有機溶
媒(例えばクロロホルム、ジクロロメタン、ジクロロエ
チレンのようなハロゲン化炭化水素、テトラヒドロフラ
ン、ジオキサンなどのエーテル類、ジメチルホルムアミ
ド、アセトニトリル、ジメチルスルホキサイド等)中で
トリメチルシリルハロイド(例えばクロライド、ヨーダ
イド)を反応させ、ビストリメチルシリルエーテル化合
物とし、これを単離するか又は単離することなく鉱酸
(例えば塩酸、硫酸、臭化水素酸等)と処理すことによ
って行うのが好ましい。上記の脱保護反応は、室温ない
し溶媒の沸点までの加熱下で行われる。この脱保護反応
は、酢酸中で臭化水素酸で処理する方法のような他の方
法でも行うことができる。上記の反応は、R2がアルコ
キシ基の場合を例にとり説明したが、他のフェノール性
水酸基の保護基を用いた場合は、上記を変更または当該
分野で公知の技術を利用して実施しうる。
The dialkoxybiphenyl compound obtained
(4) is subjected to a deprotection reaction to lead to a biphenyl compound (5). The deprotection reaction of the alkoxy group to the hydroxyl group is carried out in an organic solvent (eg, halogenated hydrocarbons such as chloroform, dichloromethane, dichloroethylene, ethers such as tetrahydrofuran and dioxane, dimethylformamide, acetonitrile, dimethylsulfoxide, etc.). The reaction is carried out by reacting a haloide (eg, chloride, iodide) to form a bistrimethylsilyl ether compound, and isolating or treating the compound without isolation with a mineral acid (eg, hydrochloric acid, sulfuric acid, hydrobromic acid, etc.). Is preferred. The above deprotection reaction is carried out under heating from room temperature to the boiling point of the solvent. This deprotection reaction can be carried out by other methods such as a method of treating with hydrobromic acid in acetic acid. The above reaction has been described by taking the case where R 2 is an alkoxy group as an example.However, when another protecting group for a phenolic hydroxyl group is used, the above reaction can be carried out by modifying the above or using a technique known in the art. .

【0017】[0017]

【実施例】以下に実施例を示してこの発明を説明する
が、この発明はこれによって限定されるものではない。
EXAMPLES The present invention will be described below with reference to examples, but the present invention is not limited thereto.

【0018】実施例1 過塩素酸コバルト6水和物27.5mgとα,α,α',α'−テ
トラキス−(1−メチル−1H−イミダゾール−2−イル)
−2,6−ピリジンジメタノール38.6mgをアセトニトリル
20mlに溶かし、酸素を1時間溶液中に吹き込んだ後、
4,4'−ジヒドロキシ−5,5'−ジイソプロピル−2,2'−ジ
メチルビフェニル607mgを加えた。酸素を30分溶液中
に吹き込んだ後、酸素雰囲気下、24時間攪拌させた。
溶媒を除去した後、シリカゲルカラム(移動相 n−ヘ
キサン:酢酸エチル=2:1)で触媒を除去した。溶媒
を除去した後、n−ヘキサンと少量の酢酸エチルで再結
晶を行い、4'−ヒドロキシ−5,5'−ジイソプロピル−2,
2'−ジメチルビフェニル−3,4−ジオン364mgを得た。 融点174.5〜175.0℃ IR νmax(KBr)cm-1:3400,2950,1650,1625,1602,1
385,1325,1208,11701 H−NMR(CDCl3)δ:1.11(6H,d), 1.25(3H,d), 1.2
6(3H,d), 1.76(3H,d),2.17(3H,s), 2.98(1H,sept), 3.2
2(1H,sept), 5.11(1H,brd), 6.62(1H,s),6.72(1H,s),
6.91(1H,s) MS m/z(%)(C20243):312(M+2,100), 300(18.
4), 299(76.4), 284(67.2)
Example 1 27.5 mg of cobalt perchlorate hexahydrate and α, α, α ′, α′-tetrakis- (1-methyl-1H-imidazol-2-yl)
After dissolving 38.6 mg of -2,6-pyridinedimethanol in 20 ml of acetonitrile and blowing oxygen into the solution for 1 hour,
607 mg of 4,4'-dihydroxy-5,5'-diisopropyl-2,2'-dimethylbiphenyl were added. After oxygen was blown into the solution for 30 minutes, the solution was stirred under an oxygen atmosphere for 24 hours.
After removing the solvent, the catalyst was removed with a silica gel column (mobile phase n-hexane: ethyl acetate = 2: 1). After removing the solvent, recrystallization was performed with n-hexane and a small amount of ethyl acetate, and 4′-hydroxy-5,5′-diisopropyl-2,
364 mg of 2'-dimethylbiphenyl-3,4-dione was obtained. Melting point 174.5-175.0 ° C IR νmax (KBr) cm -1 : 3400,2950,1650,1625,1602,1
385,1325,1208,1170 1 H-NMR (CDCl 3 ) δ: 1.11 (6H, d), 1.25 (3H, d), 1.2
6 (3H, d), 1.76 (3H, d), 2.17 (3H, s), 2.98 (1H, sept), 3.2
2 (1H, sept), 5.11 (1H, brd), 6.62 (1H, s), 6.72 (1H, s),
6.91 (1H, s) MS m / z (%) (C 20 H 24 O 3): 312 (M + 2,100), 300 (18.
4), 299 (76.4), 284 (67.2)

【0019】実施例2 4,4'−ジヒドロキシ−2,2',5,5'−テトラメチルビフェ
ニル56.4mgから、実施例1と同様にして、4'−ヒドロキ
シ−2,2',5,5'−テトラメチルビフェニル3,4−ジオン3
8.0mgを得た。 融点160.5〜162.0℃ IR νmax(KBr)cm-1:3410,2930,1640,1604,1365,1
308,1204,11001 H−NMR(CDCl3)δ:1.74(3H,s), 1.96(3H,s), 2.1
6(3H,s), 2.24(3H,s),5.05(1H,brd), 6.66(1H,s), 6.72
(1H,s), 6.84(1H,s) MS m/z(%)(C16163):258(M+2,100), 225(29.
1), 167(16.9), 149(67.2)
Example 2 From 56.4 mg of 4,4'-dihydroxy-2,2 ', 5,5'-tetramethylbiphenyl, the procedure of Example 1 was repeated to give 4'-hydroxy-2,2', 5, 5'-tetramethylbiphenyl 3,4-dione 3
8.0 mg were obtained. Melting point 160.5-162.0 ° C IR νmax (KBr) cm -1 : 3410,2930,1640,1604,1365,1
308,1204,1100 1 H-NMR (CDCl 3 ) δ: 1.74 (3H, s), 1.96 (3H, s), 2.1
6 (3H, s), 2.24 (3H, s), 5.05 (1H, brd), 6.66 (1H, s), 6.72
(1H, s), 6.84 ( 1H, s) MS m / z (%) (C 16 H 16 O 3): 258 (M + 2,100), 225 (29.
1), 167 (16.9), 149 (67.2)

【0020】実施例3 4'−ヒドロキシ−5,5'−ジイソプロピル−2,2'−ジメチ
ルビフェニル−3,4−ジオン106mgをテトラヒドロフラン
10mlに溶かし、窒素気流中、室温で攪拌しながら、水
素化ホウ素ナトリウム30mgを加え、さらに室温で1時
間攪拌した。5%塩酸30mlを加え、エーテル50mlで
抽出し、食塩水で洗い、硫酸ナトリウムで乾燥後、溶媒
を除去し、得られた油状物に少量のクロロホルムとn−
ヘキサンを加えて結晶化させ、3,4,4'−トリヒドロキシ
−5,5'−ジイソプロピル−2,2'−ジメチルビフェニル9
0.7mgを得た。 融点134.5〜135.5℃ IR νmax(KBr)cm-1:3560,3380,2960,1620,1430,1
340,1250,11751 H−NMR(CDCl3)δ:1.24(3Hx2,d), 1.25(3Hx2,d),
1.95(3H,s),1.98(3H,s), 3.18(1Hx2,brd), 4.72(1H,br
d), 5.05(1H,brd), 5.19(1H,brd),6.53(1H,s), 6.65(1
H,s), 6.92(1H,s) MS m/z(%)(C20263):314(M+2,100), 299(92.
4), 284(5.9), 142(17.6)
Example 3 4'-Hydroxy-5,5'-diisopropyl-2,2'-dimethylbiphenyl-3,4-dione (106 mg) was dissolved in tetrahydrofuran (10 ml), and the mixture was hydrogenated with stirring at room temperature in a nitrogen stream. 30 mg of sodium boron was added, and the mixture was further stirred at room temperature for 1 hour. 30 ml of 5% hydrochloric acid was added, and the mixture was extracted with 50 ml of ether, washed with brine, dried over sodium sulfate, and the solvent was removed.
Hexane was added for crystallization, and 3,4,4'-trihydroxy-5,5'-diisopropyl-2,2'-dimethylbiphenyl 9
0.7 mg was obtained. 134.5-135.5 ° C IR νmax (KBr) cm -1 : 3560,3380,2960,1620,1430,1
340,1250,1175 1 H-NMR (CDCl 3 ) δ: 1.24 (3Hx2, d), 1.25 (3Hx2, d),
1.95 (3H, s), 1.98 (3H, s), 3.18 (1Hx2, brd), 4.72 (1H, br
d), 5.05 (1H, brd), 5.19 (1H, brd), 6.53 (1H, s), 6.65 (1
H, s), 6.92 (1H , s) MS m / z (%) (C 20 H 26 O 3): 314 (M + 2,100), 299 (92.
4), 284 (5.9), 142 (17.6)

【0021】実施例4 4'−ヒドロキシ−2,2',5,5'−テトラメチルビフェニル
−3,4−ジオン32.4mgから実施例3と同様にして3,4,4'
−トリヒドロキシ−2,2',5,5'−テトラメチルビフェニ
ル25.0mgを得た。 融点87.0〜88.5°C IR νmax(KBr)cm-1:3310,2930,1620,1490,1400,
1255,10701 H−NMR(CDCl3)δ:1.93(3H,s),1.97(3H,s),2.22
(3H,s),2.24(3H,s),4.59(1H,brd),4.97(1H,brd),5.07(1
H,brd),6.48(1H,s),6.66(1H,s),6.82(1H,s) MS m/z(%)(C16183):258(M+,100), 242(13.
6), 225(27.1), 78(21.1)
Example 4 3,4,4 'from 32.4 mg of 4'-hydroxy-2,2', 5,5'-tetramethylbiphenyl-3,4-dione in the same manner as in Example 3.
-25.0 mg of trihydroxy-2,2 ', 5,5'-tetramethylbiphenyl were obtained. Melting point 87.0-88.5 ° C IR νmax (KBr) cm -1 : 3310,2930,1620,1490,1400,
1255,1070 1 H-NMR (CDCl 3 ) δ: 1.93 (3H, s), 1.97 (3H, s), 2.22
(3H, s), 2.24 (3H, s), 4.59 (1H, brd), 4.97 (1H, brd), 5.07 (1
H, brd), 6.48 (1H , s), 6.66 (1H, s), 6.82 (1H, s) MS m / z (%) (C 16 H 18 O 3): 258 (M +, 100), 242 (13.
6), 225 (27.1), 78 (21.1)

【0022】[0022]

【発明の効果】この発明によれば、抗酸化剤、消臭剤と
して有用でかつ各種に有用性を有する化合物の中間体と
して利用しうるビフェニル化合物とその工業的に適用し
うる製造法が提供される。
According to the present invention, there are provided a biphenyl compound which is useful as an antioxidant and a deodorant and can be used as an intermediate of a compound having various usefulness, and a production method thereof which can be industrially applied. Is done.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI // C07B 61/00 300 C07B 61/00 300 C09K 15/08 C09K 15/08 C11B 9/00 C11B 9/00 N (58)調査した分野(Int.Cl.7,DB名) C07C 46/06 C07C 37/07 C07C 39/15 C07C 50/28 C07B 61/00 300 C11B 9/00 C07C 46/04 CA(STN) REGISTRY(STN)────────────────────────────────────────────────── ─── Continued on the front page (51) Int.Cl. 7 Identification symbol FI // C07B 61/00 300 C07B 61/00 300 C09K 15/08 C09K 15/08 C11B 9/00 C11B 9/00 N (58) Field surveyed (Int. Cl. 7 , DB name) C07C 46/06 C07C 37/07 C07C 39/15 C07C 50/28 C07B 61/00 300 C11B 9/00 C07C 46/04 CA (STN) REGISTRY (STN)

Claims (4)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 一般式(II) 【化1】 (式中R1はC1-3のアルキル基を示す)で表される化合
物を過塩素酸コバルトとα,α,α',α'−テトラキス−
(1−メチル−1H−イミダゾール−2−イル)−2,6−ピ
リジンジメタノールとの錯体の存在下で酸化して、一般
式(I) 【化2】 (式中R1は上記と同一意味)で表される化合物を得る
ことを特徴とするビフェニル化合物の製法。
1. A compound of the general formula (II) (Wherein R 1 represents a C 1-3 alkyl group) and cobalt perchlorate and α, α, α ′, α′-tetrakis-
Oxidation in the presence of a complex with (1-methyl-1H-imidazol-2-yl) -2,6-pyridinedimethanol yields a compound of general formula (I) (Wherein R 1 has the same meaning as described above).
【請求項2】 請求項1項で得られた一般式(I)の化合
物を還元して一般式(I′) 【化3】 (式中R1は上記と同一意味)で表される化合物を得る
ことを特徴とするビフェニル化合物の製法。
2. The compound of the formula (I) obtained in claim 1 is reduced to give the compound of the formula (I ') (Wherein R 1 has the same meaning as described above).
【請求項3】 式 【化4】 で表される化合物。3. The formula: A compound represented by the formula: 【請求項4】 式 【化5】 で表される化合物。4. The formula: A compound represented by the formula:
JP03226256A 1990-09-10 1991-09-06 Method for producing biphenyl compound Expired - Fee Related JP3112995B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP24038190 1990-09-10
JP2-240381 1990-09-10

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Publication Number Publication Date
JPH05294884A JPH05294884A (en) 1993-11-09
JP3112995B2 true JP3112995B2 (en) 2000-11-27

Family

ID=17058646

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Country Link
JP (1) JP3112995B2 (en)

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