JP3114684B2 - Appearance inspection method and device - Google Patents
Appearance inspection method and deviceInfo
- Publication number
- JP3114684B2 JP3114684B2 JP1692098A JP1692098A JP3114684B2 JP 3114684 B2 JP3114684 B2 JP 3114684B2 JP 1692098 A JP1692098 A JP 1692098A JP 1692098 A JP1692098 A JP 1692098A JP 3114684 B2 JP3114684 B2 JP 3114684B2
- Authority
- JP
- Japan
- Prior art keywords
- edge
- image
- distance
- defect
- pieces
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims description 44
- 238000007689 inspection Methods 0.000 title claims description 15
- 230000007547 defect Effects 0.000 claims description 73
- 238000005452 bending Methods 0.000 claims description 36
- 239000000126 substance Substances 0.000 claims description 20
- 238000011179 visual inspection Methods 0.000 claims description 9
- 238000003708 edge detection Methods 0.000 claims description 5
- 239000012634 fragment Substances 0.000 claims description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 16
- 238000010586 diagram Methods 0.000 description 13
- 239000011521 glass Substances 0.000 description 11
- 229910052804 chromium Inorganic materials 0.000 description 6
- 239000011651 chromium Substances 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 238000001514 detection method Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 238000009826 distribution Methods 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000005856 abnormality Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Image Processing (AREA)
- Image Analysis (AREA)
Description
【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION
【0001】[0001]
【発明の属する技術分野】本発明は外観検査方法及び装
置に関し、特に半導体デバイスリソグラフィー用のフォ
トマスクまたはレティクル上の異物やクロムパターンの
微小な形状欠陥を画像を用いて検出する外観検査方法及
び装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an appearance inspection method and apparatus, and more particularly to an appearance inspection method and apparatus for detecting foreign matter on a photomask or reticle for a semiconductor device lithography or a minute shape defect of a chrome pattern using an image. About.
【0002】[0002]
【従来の技術】フォトマスクやレティクルの欠陥には、
製造工程の完了後付着し、洗浄などにより除去が比較的
容易な異物と、描画やエッチングなど製造工程で設計と
は異なる形状に形成されたクロムパターンで、除去が比
較的困難なパターン形状欠陥がある。2. Description of the Related Art Defects in photomasks and reticles include:
Foreign matter that adheres after the completion of the manufacturing process and is relatively easy to remove by washing, etc., and chrome pattern formed in a shape different from the design in the manufacturing process such as drawing and etching, pattern shape defects that are relatively difficult to remove is there.
【0003】画像を用いて異物を検出する、従来の外観
検査方法及び装置の代表的な手法としては、デービッド
・G・エマリーら(David G. Emery et al.,)の米国特
許第5563702号がある。これはクロムやガラスと異物の
光学的違いに着目して、異物を検出する手法である。具
体的には、透過画像と反射画像の画素値、及び各々の微
分画像などフィルタリングを施した画像の画素値を特徴
量とした特徴量空間において、ガラスやクロムの領域を
あらかじめ求めておき、この領域の外に来る画素を異物
とみなすものである。[0003] As a typical method of a conventional visual inspection method and apparatus for detecting foreign matter using images, US Pat. No. 5,556,702 to David G. Emery et al. is there. This is a method of detecting foreign matter by focusing on the optical difference between chromium and glass and foreign matter. Specifically, in a feature amount space in which pixel values of a filtered image such as a transmitted image and a reflected image, and a pixel value of an image subjected to filtering such as a differential image, a region of glass or chrome is obtained in advance. Pixels that come outside the area are regarded as foreign substances.
【0004】また、画像を用いて、クロムパターンの形
状欠陥を検出する代表的な手法として、ドナルド・F・
スペチトら(Donald F. Specht et al.,)の米国特許第
4805123号による、隣接チップとテンプレートマッチン
グにより比較するダイツーダイ方式と、CADデータよ
り参照画像を生成してそれと比較するダイツーデータベ
ース方式がある。As a typical technique for detecting a shape defect of a chrome pattern using an image, Donald F.
US Patent No. to Donald F. Specht et al.,
According to No. 4805123, there are a die-to-die method in which an adjacent chip is compared with a template by template matching, and a die-to-database method in which a reference image is generated from CAD data and compared with the reference image.
【0005】ダイツーダイ方式では隣接チップの同じ座
標に同じ様な欠陥がある場合、見つけることができな
い。このような場合でも欠陥を検出できるためにダイツ
ーデータベース方式が開発された。ただしCADデータ
から参照画像を精度よく生成することは困難であるた
め、ダイツーデータベース方式は欠陥検出能力の点で、
ダイツーダイ方式に劣る場合がある。In the die-to-die method, if there is a similar defect at the same coordinates of adjacent chips, it cannot be found. The die-to-database method was developed to detect defects even in such a case. However, since it is difficult to generate a reference image from CAD data with high accuracy, the die-to-database method has a defect detection capability.
It may be inferior to the die-to-die method.
【0006】[0006]
【発明が解決しようとする課題】上述した従来の外観検
査方法及び装置には、それぞれ問題点がある。第1番目
のデービッド・G・エマリー らの手法では、例えばガ
ラスの上に乗ったクロムの切屑のようにクロムパターン
と光学的性質が同じ異物を検出できないという問題点が
ある。また、第2番目のドナルド・F・スペチトらの手
法では、CADデータからレティクル画像が生成される
過程をシミュレートする必要があるが、実際のレティク
ル生成の過程は複雑であり、またこのレティクルを撮像
する光学系も複雑なため、CADデータから参照画像を
生成することは非常に困難で、レティクルに欠陥が無く
ても欠陥が存在すると見誤ってしまう疑似欠陥の発生す
る可能性が高い。特に欠陥が無いのにもかかわらず検査
対象画像と参照画像とで、エッジ付近の濃度勾配が図3
分図(a)と図3分図(b)との様に異なる場合、図3
分図(c)に示すように疑似欠陥が生じる。更に、ドナ
ルド・F・スペチトらの手法は、CADデータからの画
像生成及び保持において、大量の計算時間と記憶領域を
要するという問題点もある。Each of the above-described conventional visual inspection methods and apparatuses has problems. The first method of David G. Emery et al. Has a problem that foreign substances having the same optical properties as the chromium pattern, such as chromium chips on glass, cannot be detected. In the second method of Donald F. Specht et al., It is necessary to simulate the process of generating a reticle image from CAD data. However, the actual process of generating a reticle is complicated. Since the imaging optical system is also complicated, it is very difficult to generate a reference image from CAD data, and there is a high possibility that a pseudo defect will be mistakenly recognized as having a defect even if the reticle has no defect. In spite of no defect, the density gradient near the edge between the inspection target image and the reference image is shown in FIG.
In the case where the distribution diagram (a) is different from the distribution diagram (b) in FIG.
A pseudo defect occurs as shown in FIG. Further, the method of Donald F. Specht et al. Has a problem that a large amount of calculation time and a storage area are required for generating and holding an image from CAD data.
【0007】本発明の目的は、ガラスの上に乗ったクロ
ムの切屑のようにクロムパターンと光学的性質が同じ異
物の検出を可能とし、取得する画像ごとにエッジ付近の
濃度勾配が異なっていている場合でも疑似欠陥発生頻度
を低くでき、CADデータからの画像生成及び保持を不
要として所要計算時間と記憶領域とを小さくすることが
できる外観検査方法及び装置を提供することにある。An object of the present invention is to enable detection of a foreign substance having the same optical properties as a chromium pattern, such as chromium chips on glass, and that the density gradient near the edge differs for each image to be obtained. It is an object of the present invention to provide a visual inspection method and apparatus which can reduce the frequency of occurrence of pseudo defects, and can reduce the required calculation time and storage area without the need to generate and hold an image from CAD data.
【0008】[0008]
【課題を解決するための手段】本発明の外観検査方法
は、外部から取り込む入力画像を複数のエッジ片で構成
するパターンとして規定し、前記複数のエッジ片で確定
する閉領域の面積と、前記複数のエッジ片の中の平行な
エッジ片の組ごとのエッジ間距離と、前記エッジ片の接
続点である屈曲点と隣接する屈曲点との間の距離とを含
む前記エッジ片で構成されるパターンの部分的な形状特
徴に対し、予め定める基準値を基に異物あるいは欠陥の
存否を判定することで、異物あるいはパターン形状欠陥
を検出するようにしている。According to a visual inspection method of the present invention, an input image taken from the outside is defined as a pattern composed of a plurality of edge pieces, the area of a closed region defined by the plurality of edge pieces, and The edge piece includes a distance between edges for each set of parallel edge pieces among the plurality of edge pieces, and a distance between a bending point that is a connection point of the edge pieces and an adjacent bending point. A foreign substance or a pattern shape defect is detected by determining the presence or absence of a foreign substance or a defect based on a predetermined reference value for a partial shape characteristic of the pattern.
【0009】本発明の外観検査方法は、異物あるいはパ
ターン形状欠陥を検出すると入力画像上で前記異物ある
いはパターン形状欠陥の座標に目印をつけ、この座標に
目印をつけた入力画像を記憶してもよい。In the appearance inspection method of the present invention, when a foreign substance or a pattern shape defect is detected, the coordinates of the foreign substance or the pattern shape defect are marked on the input image, and the input image marked with the coordinates is stored. Good.
【0010】本発明の外観検査方法は、外部から取り込
む入力画像を複数のエッジ片で構成するパターンとして
規定するため、前記入力画像から微分強度の強い画素を
エッジ要素として検出してエッジ要素画像を生成し、前
記エッジ要素画像上の各エッジ要素について相互の距離
が予め定める基準値の範囲内にあるものに同じラベルを
与えることによって前記エッジ要素同士を連結し、同じ
ラベルを与えられた前記エッジ要素の集まりを1つのエ
ッジとみなしてエッジ画像を生成し、前記エッジ画像上
の前記エッジ要素ごとに曲率を計算し、前記エッジ要素
のうち、曲率が予め定める基準値より大きいエッジ要素
を屈曲点とし、この屈曲点であるエッジ要素を境に両側
のエッジ要素に前記屈曲点であるエッジ要素とは異なる
ラベルを与えることによりエッジを分割し、分割された
各々をエッジ片ととしてもよい。According to the appearance inspection method of the present invention, since an input image taken from the outside is defined as a pattern composed of a plurality of edge pieces, a pixel having a high differential intensity is detected as an edge element from the input image and the edge element image is detected. Generating and giving the same label to each edge element on the edge element image whose mutual distance is within a predetermined reference value range, connecting the edge elements to each other, and providing the same label with the same edge An edge image is generated by regarding a set of elements as one edge, a curvature is calculated for each of the edge elements on the edge image, and an edge element having a curvature larger than a predetermined reference value among the edge elements is defined as a bending point. A label different from the edge element which is the bending point is assigned to the edge elements on both sides of the edge element which is the bending point. By dividing the edge, each divided may be an edge piece.
【0011】本発明の外観検査装置は、外部の画像入力
手段の入力する入力画像から微分強度の強い画素をエッ
ジ要素として検出しエッジ要素画像を生成するエッジ検
出手段と、前記エッジ要素画像上の各エッジ要素の互い
の距離が予め定める基準値の範囲内にあるものについて
は同じラベルを与えることにより前記同じラベルの各エ
ッジ要素を連結し1つのエッジとしたエッジ画像を生成
するエッジ連結手段と、前記エッジ要素ごとの曲率と並
行するエッジ要素部分の相互の間の距離と閉ループ状の
エッジによる閉領域の面積とから決まる前記エッジ画像
上のパターンの形状特徴を予め定める基準値と比較し、
前記予め定める基準値の範囲外の値を示すエッジの位置
を異物あるいは形状欠陥の存在位置と認定し、前記異物
あるいは形状欠陥の存在位置の座標及び欠陥の種類を識
別し出力する形状識別手段と、前記入力画像上で前記形
状識別手段の出力する異物あるいは形状欠陥の存在位置
の座標に目印をつけ、この座標に目印をつけた入力画像
を記憶する画像保持手段とを備える構成である。According to the present invention, there is provided an appearance inspection apparatus comprising: edge detection means for detecting a pixel having a high differential intensity as an edge element from an input image input by an external image input means to generate an edge element image; Edge connecting means for connecting the edge elements of the same label to generate an edge image as one edge by giving the same label to those whose distance between the edge elements is within a predetermined reference value range; Comparing the shape characteristic of the pattern on the edge image determined from the distance between the edge element portions parallel to the curvature of each edge element and the area of the closed region by the closed loop edge with a predetermined reference value,
A shape identification unit that identifies the position of the edge indicating a value outside the range of the predetermined reference value as the existence position of the foreign matter or the shape defect, identifies the coordinates of the existence position of the foreign matter or the shape defect, and outputs the type of the defect; A mark on the coordinates of the location of the foreign matter or shape defect output by the shape identification means on the input image, and an image holding means for storing the input image marked with the coordinates.
【0012】本発明の外観検査装置は、形状識別手段
が、エッジ画像上のエッジ要素毎に曲率を計算する曲率
算出手段と、前記エッジ要素のうち、曲率が予め定める
基準値より大きいエッジ要素を屈曲点とし、この屈曲点
であるエッジ要素とこれを挟むエッジ要素とにそれぞれ
異なるラベルを与えることによりエッジを分割し、屈曲
点毎に分割された前記エッジの断片の各々をエッジ片と
するエッジ分割手段と、前記エッジ画像上の各屈曲点毎
に相互の距離が予め定める基準値内にある屈曲点同士に
ついての距離を求めこの値を記憶する屈曲点間距離算出
手段と、前記エッジ画像上の各エッジ片毎に相互の距離
が予め定める基準値内にあるエッジ片同士について、そ
の成す角度を求め、この角度が予め定められた制限角度
より小さい場合、そのエッジ片同士は平行だとみなしそ
の座標を記憶する平行エッジ検出手段と、前記平行エッ
ジ検出手段の検出した平行なエッジ片の各々の組毎にエ
ッジ片間の距離を求めその値を記憶するエッジ間距離算
出手段と、前記エッジ画像上の各エッジについてエッジ
追跡を行い閉領域を形成しているエッジを検出する閉領
域検出手段と、前記閉領域検出手段の検出した閉領域毎
に面積を計算しこの値を記憶する面積算出手段と、前記
屈曲点間距離算出手段の記憶している屈曲点間の距離が
外部から与えれたしきい値より小さい屈曲点と、前記エ
ッジ間距離算出手段の記憶しているエッジ間距離が予め
定める基準値より小さい平行エッジと、前記面積算出手
段の記憶している面積が予め定めるしきい値より小さい
閉領域とに対し、前記屈曲点と平行エッジと閉領域とを
異物またはパターン形状欠陥であるとみなし、この異物
またはパターン形状欠陥であるとみなした領域の座標及
び欠陥の種類を記憶する形状パラメーター判定手段とを
備えてもよい。[0012] In the visual inspection apparatus of the present invention, the shape discriminating means calculates a curvature for each edge element on the edge image, and, among the edge elements, an edge element whose curvature is larger than a predetermined reference value. Edges are divided by giving different labels to the edge element that is the inflection point and the edge element sandwiching the inflection point, and each of the fragments of the edge divided for each inflection point is used as an edge piece. Dividing means; calculating a distance between bending points whose distances are within a predetermined reference value for each bending point on the edge image; and storing a distance between the bending points; and calculating a distance between bending points on the edge image. The angle formed between edge pieces whose distance is within a predetermined reference value for each of the edge pieces is determined, and if this angle is smaller than a predetermined limit angle, the angle is determined. A parallel edge detecting means for storing coordinates of the edge pieces assuming that they are parallel to each other, and an edge for obtaining a distance between the edge pieces for each set of parallel edge pieces detected by the parallel edge detecting means and storing the value. Inter-distance calculating means, closed area detecting means for performing edge tracking for each edge on the edge image to detect edges forming closed areas, and calculating an area for each closed area detected by the closed area detecting means An area calculating means for storing this value, a bending point having a distance between the bending points stored in the distance between bending points calculation means smaller than a threshold value given from the outside, and a storage of the distance between edge calculation means. The parallel edge whose distance between edges is smaller than a predetermined reference value and the closed region whose area stored by the area calculating means is smaller than a predetermined threshold value are parallel to the bending point. Regarded di and closed areas to be foreign matter or pattern defect may comprise a shape parameter determining means for storing the type of coordinates and defect areas were considered to be foreign object or pattern shape defect.
【0013】[0013]
【発明の実施の形態】次に、本発明の実施の形態につい
て図面を参照して説明する。Next, embodiments of the present invention will be described with reference to the drawings.
【0014】図1は本発明の第1の実施の形態を示すブ
ロック図である。FIG. 1 is a block diagram showing a first embodiment of the present invention.
【0015】本発明の請求項第1項記載の外観検査装置
1は、外部の画像入力手段6の入力する入力画像から微
分強度が予め定めるしきい値より大きい画素をエッジ要
素として検出しエッジ要素画像を生成するエッジ検出手
段2と、エッジ要素画像上の各エッジ要素の互いの距離
が予め定める基準値の範囲内にあるものについては同じ
ラベルを与えることにより各エッジ要素を連結し、1つ
のエッジとしたエッジ画像を生成するエッジ連結手段3
と、エッジ要素ごとの曲率と並行するエッジ要素部分の
相互の間の距離と閉ループ状のエッジによる閉領域の面
積とから決まるエッジ画像上のパターンの形状特徴を予
め定める基準値と比較し、予め定める基準値の範囲外の
値を示すエッジの位置を異物あるいは形状欠陥の存在位
置と認定し、異物あるいは形状欠陥の存在位置の座標及
び欠陥の種類を識別し出力する形状識別手段4と、入力
画像上で形状識別手段の出力する異物あるいは形状欠陥
の存在位置の座標に目印をつけ、この座標に目印をつけ
た入力画像を記憶する画像保持手段5とから構成され
る。The visual inspection apparatus 1 according to the first aspect of the present invention detects a pixel whose differential intensity is larger than a predetermined threshold from an input image input from the external image input means 6 as an edge element. The edge detecting means 2 for generating an image and the edge elements on the edge element image are connected to each other by giving the same label to each of the edge elements whose distances are within a predetermined reference value range. Edge connecting means 3 for generating an edge image as an edge
And, the shape characteristic of the pattern on the edge image determined from the distance between the edge element portions parallel to the curvature of each edge element and the area of the closed region by the closed loop edge is compared with a predetermined reference value, and A shape identification means 4 for identifying the position of the edge indicating a value outside the range of the determined reference value as the existence position of the foreign matter or the shape defect, identifying the coordinates of the existence position of the foreign matter or the shape defect and the type of the defect, and outputting the input; An image holding means 5 for marking the coordinates of the position of the foreign matter or shape defect output by the shape identification means on the image and storing the input image with the coordinates marked.
【0016】図2は本発明の第2の実施の形態を示すブ
ロック図である。FIG. 2 is a block diagram showing a second embodiment of the present invention.
【0017】この本発明の第2の実施の形態は、本発明
の第1の実施の形態における形状識別手段4の機能を細
分化し明確化したものである。このため図1の構成と同
一の部分は図1と名称および符号を統一してある。In the second embodiment of the present invention, the function of the shape identifying means 4 in the first embodiment of the present invention is subdivided and clarified. For this reason, the same portions as those in the configuration of FIG.
【0018】つぎに図2を使用して第2の実施の形態の
外観検査装置の機能を詳細に説明する。なお、第1の実
施の形態と同一の部分は、説明を省略する。Next, the function of the visual inspection apparatus according to the second embodiment will be described in detail with reference to FIG. The description of the same parts as those in the first embodiment is omitted.
【0019】第2の実施の形態の外観検査装置7は、形
状識別手段8が、エッジ画像上のエッジ要素毎に曲率を
計算する曲率算出手段9と、エッジ要素のうち、曲率が
予め定めるしきい値より大きいエッジ要素を屈曲点と
し、この屈曲点であるエッジ要素とこれを挟むエッジ要
素とに、それぞれ異なるラベルを与えることによりエッ
ジを分割し、屈曲点毎に分割されたエッジの断片の各々
をエッジ片とするエッジ分割手段10と、エッジ画像上
の各屈曲点毎に相互の距離が予め定める基準値内にある
屈曲点同士についての距離を求める屈曲点間距離算出手
段11と、エッジ画像上の各エッジ片毎に相互の距離が
予め定める基準値内にあるエッジ片同士について、その
成す角度を求め、この角度が予め定められた制限角度よ
り小さい場合、そのエッジ片同士は平行だとみなしその
座標を記憶する平行エッジ検出手段12と、平行エッジ
検出手段12の検出した平行なエッジ片の各々の組毎に
エッジ片間の距離を求め、その値を記憶するエッジ間距
離算出手段13と、エッジ画像上の各エッジについてエ
ッジの形状を定めるエッジ追跡を行い閉領域を形成して
いるエッジを検出する閉領域検出手段14と、閉領域検
出手段14の検出した閉領域毎に面積を計算しこの値を
記憶する面積算出手段15と、屈曲点間距離算出手段1
1の記憶している屈曲点間の距離が外部から与えれたし
きい値より小さい屈曲点と、エッジ間距離算出手段11
の記憶しているエッジ間距離が予め定める基準値より小
さい平行エッジと、面積算出手段15の記憶している面
積が予め定める基準値より小さい閉領域に対し、屈曲点
と平行エッジと閉領域とを異物またはパターン形状欠陥
であるとみなし、この異物またはパターン形状欠陥があ
るとみなした場所の座標及び欠陥の種類を記憶する形状
パラメーター判定手段16とで構成する。In the appearance inspection apparatus 7 of the second embodiment, the shape identification means 8 calculates the curvature for each edge element on the edge image, and the curvature calculation means 9 determines the curvature among the edge elements in advance. An edge element larger than the threshold value is defined as an inflection point, and the edge element that is the inflection point and the edge element sandwiching the edge element are given different labels to divide the edge. An edge dividing unit 10 that uses each of them as an edge piece, a bending point distance calculating unit 11 that calculates a distance between bending points whose mutual distance is within a predetermined reference value for each bending point on the edge image, For each edge piece on the image, the distance between each other is within a predetermined reference value, the angle between them is determined, and if this angle is smaller than a predetermined limit angle, The edge pieces are regarded as parallel, and the coordinates are stored. The parallel edge detecting means 12 stores the coordinates, and the distance between the edge pieces is determined for each set of the parallel edge pieces detected by the parallel edge detecting means 12, and the value is calculated. An inter-edge distance calculating means 13 for storing, a closed area detecting means 14 for performing edge tracking for determining an edge shape for each edge on the edge image and detecting an edge forming a closed area; An area calculating means 15 for calculating an area for each detected closed region and storing this value; and a bending point distance calculating means 1
1 and a distance between the inflection points stored in the inflection point smaller than a threshold value given from outside;
For a parallel edge whose distance between edges stored is smaller than a predetermined reference value and a closed region whose area stored by the area calculating means 15 is smaller than a predetermined reference value, a bent point, a parallel edge, and a closed region Is regarded as a foreign matter or a pattern shape defect, and the shape parameter determining means 16 stores the coordinates of the place where the foreign matter or the pattern shape defect is considered to exist and the type of the defect.
【0020】ここで、閉領域検出手段14が、エッジ画
像上の各エッジ毎にエッジ画像上の隣接するエッジ要素
をたどりエッジ追跡を行い閉領域を形成しているエッジ
を検出するとしたが、この時のエッジ要素のたどり方、
即ちエッジの追跡の仕方としてはこれまでに各種の方法
が提案されている。Here, it is assumed that the closed area detecting means 14 detects an edge forming a closed area by tracing an adjacent edge element on the edge image for each edge on the edge image and performing edge tracing. How to follow the edge element of time,
That is, various methods have been proposed as a method of tracking an edge.
【0021】この実施の形態に適用可能な方法として
は、例えば追跡法としてまとめることができるものとし
て、まず、しきい値の大きさを雑音を検出しないように
大きく設定して、コントラストの強いエッジのみを検出
する。次にしきい値を低くして弱いエッジを検出する。
この時、全画面を探すのではなく、既に検出されている
強いエッジの延長上の近傍のみを探索する2段階処理法
や、エッジ検出のしきい値を大きくして強いエッジのみ
を追跡した後、拡大・縮小法を適用し雑音成分の取り除
きエッジを検出する方法がある。また、検出するものが
直線や円弧などの幾何学的に規則的な形状をしたものか
ら構成されているので、ハフ変換の手法を利用すること
も可能である。その他の適用可能な方法としては、先に
述べた追跡法では次に進むべき点を局所的に判断した
が、これに対し、抽出したい線の性質を考慮して大局的
に最適な線を見つける方法も考えられる。例えば、モン
タナリが、この最適な線を見つけるのに導入した、動的
計画法を使用しても良い。更に他の方法としては、局所
的な演算によって得られた特徴値は、雑音などの影響に
より必ずしも信頼できるとは限らないので、これを周囲
の特徴との整合性から徐々に修正することにより全体と
して整合性のある結果を得ようとする考え方に弛緩法が
ある。この弛緩法自体は連立方程式の数値解法として用
いられてきた手法であるが、現在では、画像処理の種々
の分野で使われている。As a method applicable to this embodiment, for example, as a method that can be summarized as a tracking method, first, the magnitude of the threshold is set large so as not to detect noise, and an edge having a strong contrast is set. Only detect. Next, the threshold is lowered to detect weak edges.
At this time, instead of searching the entire screen, a two-step processing method in which only the extension on the already detected strong edge is searched for, or only the strong edge is traced by increasing the threshold value of the edge detection There is a method of applying a scaling method to detect a noise component and detect an edge. Further, since the object to be detected is formed of a geometrically regular shape such as a straight line or an arc, it is possible to use the Hough transform method. As another applicable method, the above-mentioned tracking method locally determines the next point to be advanced, but on the other hand, finds a globally optimal line considering the characteristics of the line to be extracted A method is also conceivable. For example, a dynamic programming method introduced by Montanari to find this optimal line may be used. Still another method is that a feature value obtained by a local operation is not always reliable due to the influence of noise or the like. There is a relaxation method as a way to obtain consistent results. Although the relaxation method itself has been used as a numerical solution of simultaneous equations, it is currently used in various fields of image processing.
【0022】次に、本発明の実施例機能および動作につ
いて詳細に説明する。説明には、図1乃至8を適宜使用
する。図1乃至3は既に説明に使用しているが、図4乃
至8は未出であるので簡単に説明する。図4は本来パタ
ーンのないガラス領域にパターン形状欠陥または異物が
ある場合を説明する孤立欠陥もしくは異物の一例を示す
説明図である。図5は本来クロム領域とガラス領域との
境界は直線であるものに、掛け・突起欠陥が生じた一例
を示す説明図である。図6は本来接続されていないクロ
ム領域間に生じたブリッジ・断線欠陥の一例を示す説明
図である。図7はガラス領域に画面をはみ出して生じた
線欠陥を示す説明図である。図8は図6に比較して曲率
の小さいブリッジ・断線欠陥である。なお、これらの図
面(図4乃至8)は、すべて陰画と陽画の関係にあり、
例えば図5に欠け欠陥として示すものは、見方を変えれ
ば突起欠陥となり、図6および8は、断線欠陥を示す説
明図となる。形状認識の手順としてはどちらも対等で、
区別する必要はない。Next, the function and operation of the embodiment of the present invention will be described in detail. 1 to 8 are appropriately used for the description. 1 to 3 have already been used for the description, but FIGS. 4 to 8 are not described yet, so will be briefly described. FIG. 4 is an explanatory view showing an example of an isolated defect or a foreign substance for explaining a case where a pattern shape defect or a foreign substance is present in a glass region where there is no pattern. FIG. 5 is an explanatory view showing an example in which a hook / projection defect occurs on a boundary between a chrome region and a glass region which is originally a straight line. FIG. 6 is an explanatory diagram showing an example of a bridge / disconnection defect generated between chromium regions that are not originally connected. FIG. 7 is an explanatory diagram showing a line defect generated by protruding the screen into the glass area. FIG. 8 shows a bridge / disconnection defect having a smaller curvature than that of FIG. Note that these drawings (FIGS. 4 to 8) all have a relationship between a negative image and a positive image.
For example, what is shown as a chipped defect in FIG. 5 is a projection defect from a different viewpoint, and FIGS. 6 and 8 are explanatory diagrams showing a disconnection defect. Both are equivalent as shape recognition procedures.
There is no need to distinguish.
【0023】本発明の外観検査装置1は、外部のカメラ
等で構成する画像入力手段6から得た入力画像に例えば
ラプラシアンガウシアンフィルタを畳み込み、エッジが
強調された画像を生成し、この画像の輝度値がゼロの値
を横切る画素をエッジ要素としてその画素の座標を記憶
し、例えばエッジ要素毎に画素値が異なるように各エッ
ジ要素に画素値として1以上の整数が与えられ、エッジ
要素以外の画素には画素値として0が与えられているエ
ッジ要素画像を生成するエッジ検出手段2と、エッジ要
素画像における各々のエッジ要素について、例えばエッ
ジ要素間の距離があらかじめ与えられた値より小さい場
合に画素値を同じ値にすることにより、エッジ要素を連
結し、同じ画素値を与えられたエッジ要素の集まりが1
つのエッジとみなせるような画像をエッジ画像として生
成するエッジ連結手段3と、例えばパターンの曲率が、
図5や図6で屈曲点と示されている部分のように、曲率
の大きい部分同士が予め定めるしきい値より近い距離に
あるとか、例えば図6や図7及び図8でエッジ間距離小
と示されている部分のように、エッジ間距離が予め定め
るしきい値より小さいとか、例えば図4において面積小
と示されている部分のように、閉領域の面積が予め定め
るしきい値より小さいといった異常が認められる場合、
そのエッジの位置に異物もしくは形状欠陥があるとし
て、その座標及び欠陥の種類を画像保持手段5に渡す形
状識別手段4と、入力画像上、形状識別手段4から与え
られた異物もしくは形状欠陥が存在する座標の画素につ
いて、例えばその画素値を欠陥の種類毎に異なる外部よ
り与えられた特定の画素値とすることにより目印をつ
け、その目印のついた画像を記憶する画像保持手段5か
ら構成される。The visual inspection apparatus 1 of the present invention convolves, for example, a Laplacian Gaussian filter with an input image obtained from an image input means 6 constituted by an external camera or the like to generate an image in which edges are emphasized, and generates a luminance of this image. A pixel whose value crosses a value of zero is stored as an edge element and the coordinates of that pixel are stored. For example, an integer of 1 or more is given as a pixel value to each edge element so that the pixel value differs for each edge element. An edge detecting means 2 for generating an edge element image in which a pixel value 0 is given to a pixel; and for each edge element in the edge element image, for example, when the distance between the edge elements is smaller than a predetermined value. By making the pixel values the same, the edge elements are connected, and a group of edge elements given the same pixel value becomes 1
Edge connection means 3 for generating an image which can be regarded as one edge as an edge image, and for example, the curvature of the pattern is
As shown in FIG. 5 and FIG. 6, a point having a large curvature is closer to a distance smaller than a predetermined threshold value, for example, as shown in FIG. 6, FIG. 7, and FIG. The distance between edges is smaller than a predetermined threshold value as shown in a portion indicated by a circle, or the area of a closed region is smaller than a predetermined threshold value such as a portion shown as a small area in FIG. If an abnormality such as small is observed,
Assuming that there is a foreign substance or a shape defect at the position of the edge, the shape identification means 4 for transferring the coordinates and the type of the defect to the image holding means 5, and the presence of the foreign substance or the shape defect given from the shape identification means 4 on the input image An image holding means 5 is provided for marking the pixel having the coordinates to be set, for example, by setting the pixel value to a specific pixel value given from the outside which is different for each type of defect, and storing the marked image. You.
【0024】つぎに、本発明の外観検査装置7は、形状
識別手段8が、エッジ画像上のエッジを構成する画素で
あるエッジ要素毎に曲率を計算する曲率算出手段9と、
エッジ要素のうち、曲率が予め定めるしきい値より大き
いエッジ要素を屈曲点とし、この屈曲点であるエッジ要
素とこれを挟むエッジ要素とにそれぞれ異なるラベルを
与えることによりエッジを分割し、分割した各々をエッ
ジ片とするエッジ分割手段10と、エッジ画像上の各屈
曲点毎に相互の距離が予め定める基準値内にある屈曲点
同士についての距離を求めこの値を記憶する屈曲点間距
離算出手段11と、エッジ画像上の各々のエッジ片につ
いて、お互いの距離が予め定める基準値内にあるエッジ
片同士の成す角度を求め、この角度が予め定められた制
限角度より小さい場合、これらのエッジ片同士は平行だ
とみなしその座標を記憶する平行エッジ検出手段12
と、平行エッジ検出手段12で検出した、平行なエッジ
片の各々の組について、例えば一方のエッジ片から選び
出したエッジ要素ともう一方のエッジ片から選び出した
エッジ要素の距離を求め、全てのエッジ要素の組み合わ
せについて求めた距離のうち最小のものをエッジ片間の
距離としてその値を記憶するエッジ間距離算出手段13
と、エッジ画像上の各エッジ毎にエッジ画像上の隣接す
るエッジ要素をたどりエッジ追跡を行い閉領域を形成し
ているエッジを検出する閉領域検出手段14と、閉領域
検出手段14で検出した閉領域毎にその面積を計算しそ
の値を記憶する面積算出手段15と、屈曲点間距離算出
手段11に記憶されている屈曲点間の距離が、例えば図
5や図6で示された屈曲点のように、お互いの距離が予
め定めるしきい値より小さい場合、その屈曲点につい
て、また、エッジ間距離算出手段13に記憶されている
エッジ間距離が、例えば図6や図7及び図8に示してあ
るエッジ間距離小のエッジのように、予め定めるしきい
値より小さい場合、その平行エッジについて、また更
に、面積算出手段15に記憶されている面積が、例えば
図4で面積小と示されている部分のように予め定めるし
きい値より小さい閉領域について、これら屈曲点もしく
は平行エッジもしくは閉領域を異物またはパターン形状
欠陥であるとみなし、例えば欠陥を屈曲点や平行エッジ
や閉領域毎に分類し、それらの座標及び欠陥の種類を記
憶する形状パラメーター判定手段16とで構成する。Next, in the appearance inspection apparatus 7 of the present invention, the shape discriminating means 8 includes a curvature calculating means 9 for calculating a curvature for each edge element which is a pixel constituting an edge on the edge image;
Among the edge elements, an edge element having a curvature larger than a predetermined threshold is defined as a bending point, and the edge is divided by giving different labels to the edge element that is the bending point and the edge element sandwiching the edge element, thereby dividing the edge element. An edge dividing means 10 for making each edge piece, a distance between bending points having a mutual distance within a predetermined reference value for each bending point on an edge image, and calculating a distance between bending points for storing this value Means 11 and, for each edge piece on the edge image, determine the angle between the edge pieces whose distance is within a predetermined reference value, and if this angle is smaller than a predetermined limit angle, Parallel edge detecting means 12 which regards the pieces as parallel and stores their coordinates
For each set of parallel edge pieces detected by the parallel edge detection means 12, for example, the distance between an edge element selected from one edge piece and an edge element selected from the other edge piece is determined, and all edges are determined. Edge distance calculating means 13 for storing the minimum distance among the distances determined for combinations of elements as the distance between edge pieces.
And a closed area detecting means 14 for tracing an adjacent edge element on the edge image for each edge on the edge image to detect an edge forming a closed area, and a closed area detecting means 14 The distance between the bending points stored in the area calculating means 15 for calculating the area for each closed region and storing the calculated value and the bending point shown in FIG. If the distance between the two points is smaller than a predetermined threshold value, as in the case of a point, the distance between the edges of the inflection point and the distance between the edges stored in the distance between the edges calculating means 13 are, for example, as shown in FIGS. In the case where the distance between the edges is smaller than a predetermined threshold value as in the case of the edge having a small edge-to-edge distance shown in FIG. Shown For a closed area smaller than a predetermined threshold value, such as a portion where the edge is bent, the inflection point or the parallel edge or the closed area is regarded as a foreign substance or a pattern shape defect. And the shape parameter determining means 16 for storing the coordinates and the type of the defect.
【0025】[0025]
【発明の効果】以上説明したように、本発明は光の透過
率や反射率といった光学的特徴量を用いず、閉領域の面
積やエッジ間距離や屈曲点間距離といった、エッジで構
成されるパターンの形状のみを基に欠陥の存否を判定し
ているため、ガラス上のクロム異物のように、クロムパ
ターンと同じ光学的特徴量をもった異物を検出できる。
また、複数の画像同士を比較する従来手法とは異なり、
1枚の画像上で、閉領域の面積やエッジ間距離や屈曲点
間距離といった、エッジで構成されるパターンの形状だ
けを基に欠陥の存否を判定しているので、画像毎にエッ
ジ部分の濃度勾配が異なっていても、全く影響が無く、
濃度勾配の違いによる疑似欠陥が生じないという効果が
有る。また、閉領域の面積にしきい値を設定することに
より、簡単に孤立欠陥や異物を検出することができると
いう効果も有る。さらに、屈曲点間の距離にしきい値を
設定することにより、欠け・突起欠陥やブリッジ・断線
欠陥を検出できるという効果が有る。同様に、平行なエ
ッジ間の距離にしきい値を設定することにより、画面を
はみ出ている線欠陥や、付け根の曲率が比較的小さいブ
リッジ・断線欠陥を検出できるという効果が有る。本発
明は、半導体デバイスリソグラフィー用のフォトマスク
またはレティクル上の異物やクロムパターンの微小な形
状欠陥の検出ばかりではなく、同じ装置構成で、ウエハ
ー等半導体製品の欠陥検査にも応用できるものである。As described above, the present invention does not use optical features such as light transmittance and reflectance, and is constituted by edges such as the area of a closed region, the distance between edges, and the distance between bending points. Since the presence or absence of a defect is determined only based on the shape of the pattern, a foreign substance having the same optical characteristic amount as the chrome pattern, such as a chromium foreign substance on glass, can be detected.
Also, unlike the traditional method of comparing multiple images,
In one image, the presence or absence of a defect is determined based only on the shape of a pattern composed of edges, such as the area of a closed region, the distance between edges, and the distance between bending points. Even if the concentration gradient is different, there is no effect at all,
There is an effect that a pseudo defect due to a difference in concentration gradient does not occur. In addition, by setting a threshold value for the area of the closed region, there is an effect that an isolated defect or a foreign substance can be easily detected. Further, by setting a threshold value for the distance between the bending points, there is an effect that a chipping / projection defect, a bridge / disconnection defect can be detected. Similarly, by setting a threshold value for the distance between parallel edges, there is an effect that a line defect protruding from the screen and a bridge / disconnection defect having a relatively small curvature at the base can be detected. INDUSTRIAL APPLICABILITY The present invention can be applied not only to detection of a foreign matter on a photomask or reticle for lithography of a semiconductor device or a minute shape defect of a chrome pattern but also to defect inspection of a semiconductor product such as a wafer with the same apparatus configuration.
【図1】本発明の第1の実施の形態を示すブロック図で
ある。FIG. 1 is a block diagram showing a first embodiment of the present invention.
【図2】本発明の第2の実施の形態を示すブロック図で
ある。FIG. 2 is a block diagram showing a second embodiment of the present invention.
【図3】エッジ付近の濃度勾配が異なるエッジの1例を
説明する説明図である。FIG. 3 is an explanatory diagram illustrating an example of an edge having a different density gradient near an edge.
【図4】本来パターンのないガラス領域にパターン形状
欠陥または異物がある場合を説明する孤立欠陥もしくは
異物の一例を示す説明図である。FIG. 4 is an explanatory view showing an example of an isolated defect or a foreign substance for explaining a case where a pattern shape defect or a foreign substance is present in a glass region where there is no pattern.
【図5】本来クロム領域とガラス領域との境界は直線で
あるものに、掛け・突起欠陥が生じた一例を示す説明図
である。FIG. 5 is an explanatory diagram showing an example in which hooking / projection defects occur on a boundary between a chrome region and a glass region which is originally a straight line.
【図6】本来接続されていないクロム領域間に生じたブ
リッジ・断線欠陥の一例を示す説明図である。FIG. 6 is an explanatory view showing an example of a bridge / disconnection defect generated between chromium regions that are not originally connected.
【図7】ガラス領域に画面をはみ出して生じた線欠陥を
示す説明図である。FIG. 7 is an explanatory diagram showing a line defect generated by protruding a screen out of a glass area.
【図8】曲率の小さいブリッジ・断線欠陥を示す説明図
である。FIG. 8 is an explanatory diagram showing a bridge / break defect having a small curvature.
1,7 外観検査装置 2 エッジ検出手段 3 エッジ連結手段 4,8 形状識別手段 5 画像保持手段 6 画像入力手段 9 曲率算出手段 10 エッジ分割手段 11 屈曲点間距離算出手段 12 平行エッジ検出手段 13 エッジ間距離算出手段 14 閉領域検出手段 15 面積算出手段 16 形状パラメーター判定手段 1,7 Appearance inspection device 2 Edge detecting means 3 Edge connecting means 4,8 Shape discriminating means 5 Image holding means 6 Image input means 9 Curvature calculating means 10 Edge dividing means 11 Distance between bending points calculating means 12 Parallel edge detecting means 13 Edge Distance calculating means 14 closed area detecting means 15 area calculating means 16 shape parameter determining means
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) G01N 21/84 - 21/958 G03F 1/00 - 1/16 G06T 1/00 - 9/40 H01L 21/64 - 21/66 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. 7 , DB name) G01N 21/84-21/958 G03F 1/00-1/16 G06T 1/00-9/40 H01L 21 / 64-21/66
Claims (5)
ジ片で構成するパターンとして規定し、前記複数のエッ
ジ片で確定する閉領域の面積と、前記複数のエッジ片の
中の平行なエッジ片の組ごとのエッジ間距離と、前記エ
ッジ片の接続点である屈曲点と隣接する屈曲点との間の
距離とを含む前記エッジ片で構成されるパターンの部分
的な形状特徴に対し、予め定める基準値を基に異物ある
いは欠陥の存否を判定することで、異物あるいはパター
ン形状欠陥を検出することを特徴とする外観検査方法。1. An input image to be fetched from the outside is defined as a pattern composed of a plurality of edge pieces, an area of a closed region defined by the plurality of edge pieces, and an area of a parallel edge piece among the plurality of edge pieces. Predetermined for a partial shape characteristic of a pattern composed of the edge pieces including a distance between edges of each pair and a distance between a bending point which is a connection point of the edge pieces and an adjacent bending point. An appearance inspection method characterized by detecting foreign matter or a pattern shape defect by determining the presence or absence of a foreign matter or a defect based on a reference value.
ると入力画像上で前記異物あるいはパターン形状欠陥の
座標に目印をつけ、この座標に目印をつけた入力画像を
記憶することを特徴とする請求項1記載の外観検査方
法。2. The method according to claim 1, wherein upon detecting a foreign substance or a pattern shape defect, a mark is placed on the coordinates of the foreign substance or the pattern shape defect on the input image, and the input image with the coordinates marked is stored. Visual inspection method described.
ジ片で構成するパターンとして規定するため、前記入力
画像から微分強度の強い画素をエッジ要素として検出し
てエッジ要素画像を生成し、前記エッジ要素画像上の各
エッジ要素について相互の距離が予め定める基準値の範
囲内にあるものに同じラベルを与えることによって前記
エッジ要素同士を連結し、同じラベルを与えられた前記
エッジ要素の集まりを1つのエッジとみなしてエッジ画
像を生成し、前記エッジ画像上の前記エッジ要素ごとに
曲率を計算し、前記エッジ要素のうち、曲率が予め定め
る基準値より大きいエッジ要素を屈曲点とし、この屈曲
点であるエッジ要素を境に両側のエッジ要素に前記屈曲
点であるエッジ要素とは異なるラベルを与えることによ
りエッジを分割し、分割された各々をエッジ片とするこ
とを特徴とする請求項1記載の外観検査方法。3. An edge element image is generated by detecting a pixel having a high differential intensity as an edge element from the input image in order to define an input image captured from the outside as a pattern composed of a plurality of edge pieces. The edge elements are connected by giving the same label to each of the edge elements on the image whose mutual distance is within a predetermined reference value range. Generate an edge image as an edge, calculate a curvature for each of the edge elements on the edge image, and among the edge elements, use an edge element whose curvature is larger than a predetermined reference value as a bending point. Dividing the edge by giving a label different from the edge element being the inflection point to the edge elements on both sides with a certain edge element as a boundary, The appearance inspection method according to claim 1, wherein each of the divided pieces is an edge piece.
から微分強度の強い画素をエッジ要素として検出しエッ
ジ要素画像を生成するエッジ検出手段と、前記エッジ要
素画像上の各エッジ要素の互いの距離が予め定める基準
値の範囲内にあるものについては同じラベルを与えるこ
とにより前記同じラベルの各エッジ要素を連結し1つの
エッジとしたエッジ画像を生成するエッジ連結手段と、
前記エッジ要素ごとの曲率と並行するエッジ要素部分の
相互の間の距離と閉ループ状のエッジによる閉領域の面
積とから決まる前記エッジ画像上のパターンの形状特徴
を予め定める基準値と比較し、前記予め定める基準値の
範囲外の値を示すエッジの位置を異物あるいは形状欠陥
の存在位置と認定し、前記異物あるいは形状欠陥の存在
位置の座標及び欠陥の種類を識別し出力する形状識別手
段と、前記入力画像上で前記形状識別手段の出力する異
物あるいは形状欠陥の存在位置の座標に目印をつけ、こ
の座標に目印をつけた入力画像を記憶する画像保持手段
とを備えることを特徴とする外観検査装置。4. An edge detecting means for detecting a pixel having a high differential intensity as an edge element from an input image inputted by an external image input means to generate an edge element image; Edge connection means for generating an edge image as one edge by connecting the edge elements of the same label by giving the same label to those whose distance is within a predetermined reference value range;
The shape characteristic of the pattern on the edge image determined from the distance between the edge element portions in parallel with the curvature of each edge element and the area of the closed region by the closed loop edge is compared with a predetermined reference value, Shape identifying means for identifying the position of the edge indicating a value outside the range of the predetermined reference value as the existence position of the foreign matter or the shape defect, identifying and outputting the coordinates of the existence position of the foreign matter or the shape defect and the type of the defect, and And an image holding means for marking the coordinates of the position of the foreign matter or shape defect output by the shape identification means on the input image, and storing the input image marked with the coordinates. Inspection equipment.
要素毎に曲率を計算する曲率算出手段と、前記エッジ要
素のうち、曲率が予め定める基準値より大きいエッジ要
素を屈曲点とし、この屈曲点であるエッジ要素とこれを
挟むエッジ要素とにそれぞれ異なるラベルを与えること
によりエッジを分割し、屈曲点毎に分割された前記エッ
ジの断片の各々をエッジ片とするエッジ分割手段と、前
記エッジ画像上の各屈曲点毎に相互の距離が予め定める
基準値内にある屈曲点同士についての距離を求めこの値
を記憶する屈曲点間距離算出手段と、前記エッジ画像上
の各エッジ片毎に相互の距離が予め定める基準値内にあ
るエッジ片同士について、その成す角度を求め、この角
度が予め定められた制限角度より小さい場合、そのエッ
ジ片同士は平行だとみなしその座標を記憶する平行エッ
ジ検出手段と、前記平行エッジ検出手段の検出した平行
なエッジ片の各々の組毎にエッジ片間の距離を求めその
値を記憶するエッジ間距離算出手段と、前記エッジ画像
上の各エッジについてエッジ追跡を行い閉領域を形成し
ているエッジを検出する閉領域検出手段と、前記閉領域
検出手段の検出した閉領域毎に面積を計算しこの値を記
憶する面積算出手段と、前記屈曲点間距離算出手段の記
憶している屈曲点間の距離が外部から与えれたしきい値
より小さい屈曲点と、前記エッジ間距離算出手段の記憶
しているエッジ間距離が予め定める基準値より小さい平
行エッジと、前記面積算出手段の記憶している面積が予
め定めるしきい値より小さい閉領域とに対し、前記屈曲
点と平行エッジと閉領域とを異物またはパターン形状欠
陥であるとみなし、この異物またはパターン形状欠陥で
あるとみなした領域の座標及び欠陥の種類を記憶する形
状パラメーター判定手段とを備えることを特徴とする請
求項4記載の外観検査装置。5. A shape discriminating means for calculating a curvature for each edge element on an edge image, and among the edge elements, an edge element having a curvature larger than a predetermined reference value is defined as a bending point, Edge dividing means for dividing an edge by giving different labels to an edge element that is a point and an edge element sandwiching the point, and using each of the edge fragments divided for each bending point as an edge piece; For each inflection point on the image, determine the distance between the inflection points whose mutual distance is within a predetermined reference value and store this value between the inflection point distance calculating means, and for each edge piece on the edge image, For the edge pieces whose distance between each other is within a predetermined reference value, the angle formed by the edge pieces is determined. If this angle is smaller than a predetermined limit angle, the edge pieces are considered to be parallel. Parallel edge detection means for storing the deemed coordinates, edge distance calculation means for obtaining the distance between edge pieces for each set of parallel edge pieces detected by the parallel edge detection means and storing the value, and Closed area detecting means for performing edge tracking for each edge on the edge image to detect an edge forming a closed area, and calculating an area for each closed area detected by the closed area detecting means and storing the value Calculating means, a bending point where the distance between the bending points stored by the bending point distance calculating means is smaller than a threshold value given from the outside, and the edge distance stored by the edge distance calculating means is For a parallel edge smaller than a predetermined reference value and a closed area whose area stored by the area calculating means is smaller than a predetermined threshold, the bent point, the parallel edge and the closed area are separated by a foreign substance or Regarded as a pattern shape defect, the appearance inspection apparatus according to claim 4, characterized in that it comprises a shape parameter determining means for storing the type of coordinates and defect areas were considered to be foreign object or pattern shape defect.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1692098A JP3114684B2 (en) | 1998-01-29 | 1998-01-29 | Appearance inspection method and device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1692098A JP3114684B2 (en) | 1998-01-29 | 1998-01-29 | Appearance inspection method and device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11211671A JPH11211671A (en) | 1999-08-06 |
| JP3114684B2 true JP3114684B2 (en) | 2000-12-04 |
Family
ID=11929573
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1692098A Expired - Fee Related JP3114684B2 (en) | 1998-01-29 | 1998-01-29 | Appearance inspection method and device |
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| Country | Link |
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| JP (1) | JP3114684B2 (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006049243A1 (en) | 2004-11-05 | 2006-05-11 | Nec Corporation | Pattern testing apparatus, pattern testing method, and pattern testing program |
| JP5146797B2 (en) | 2005-01-05 | 2013-02-20 | 日本電気株式会社 | Pattern defect inspection apparatus, method thereof, and computer-readable recording medium recording the program |
| JP2009014519A (en) * | 2007-07-04 | 2009-01-22 | Horon:Kk | Area measuring method and area measuring program |
| JP4865011B2 (en) * | 2009-06-17 | 2012-02-01 | 株式会社東芝 | Photomask inspection method |
| KR101297209B1 (en) * | 2011-11-04 | 2013-08-16 | (주)오로스 테크놀로지 | Defect analyzing method of semiconductor wafer |
| JP2013037009A (en) * | 2012-10-05 | 2013-02-21 | Horon:Kk | Contour line extraction method, contour line extraction program and area measuring method |
| CN106127779B (en) * | 2016-06-29 | 2018-12-11 | 上海晨兴希姆通电子科技有限公司 | The defect inspection method and system of view-based access control model identification |
| CN111915581B (en) * | 2020-07-27 | 2021-07-13 | 青岛大学 | A kind of metal smooth arc surface defect detection method |
| CN116741655B (en) * | 2023-08-14 | 2023-12-08 | 福建鲲曜科技有限公司 | Silicon wafer feeding detection method, device, equipment, medium and silicon wafer feeding system |
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| JPH11211671A (en) | 1999-08-06 |
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