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JP3132572B2 - Manufacturing method of stamper for optical disk duplication - Google Patents
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JP3132572B2 - Manufacturing method of stamper for optical disk duplication - Google Patents

Manufacturing method of stamper for optical disk duplication

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Publication number
JP3132572B2
JP3132572B2 JP02298068A JP29806890A JP3132572B2 JP 3132572 B2 JP3132572 B2 JP 3132572B2 JP 02298068 A JP02298068 A JP 02298068A JP 29806890 A JP29806890 A JP 29806890A JP 3132572 B2 JP3132572 B2 JP 3132572B2
Authority
JP
Japan
Prior art keywords
plating
master
mother
stamper
adhesive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP02298068A
Other languages
Japanese (ja)
Other versions
JPH04170735A (en
Inventor
省蔵 村田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP02298068A priority Critical patent/JP3132572B2/en
Publication of JPH04170735A publication Critical patent/JPH04170735A/en
Application granted granted Critical
Publication of JP3132572B2 publication Critical patent/JP3132572B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】 産業上の利用分野 本発明は、光ディスク複製用スタンパ製造方法に関す
る。
Description: TECHNICAL FIELD The present invention relates to a method for manufacturing a stamper for duplicating an optical disk.

従来の技術 従来、光ディスク複製用スタンパを製造する方法とし
ては、ガラス基板上に形成したプリグルーブパターン上
に導体化膜を形成した後、この導体化膜を陰極としてNi
めっきしガラス基板を剥離することによりマスタを得、
このマスタを剥離被膜処理した後Niめっきし前記マスタ
から剥離することによりマザーを得、このマザーを剥離
被膜処理した後Niめっきし前記マザーから剥離すること
によりサン(スタンパ)を得るようにしている。
2. Description of the Related Art Conventionally, as a method of manufacturing a stamper for duplicating an optical disc, a conductive film is formed on a pregroove pattern formed on a glass substrate, and then the conductive film is used as a cathode.
A master is obtained by plating and peeling the glass substrate,
A mother is obtained by subjecting this master to a release coating treatment and then Ni plating and peeling from the master, and a mother (a stamper) is obtained by subjecting this mother to a release coating treatment and Ni plating and peeling from the mother. .

このようなスタンパ製造法において、ガラス基板にNi
めっき(浴温50℃)後、室温(25℃)まで戻すとガラス
基板とNiとの線膨張係数の違いによりバイメタル状の反
りを生ずる。そこで、例えば特開昭59−9012号公報に示
されるように、各めっき工程後に、これを加圧矯正して
接着剤を介して裏打ち補強材で裏打ちするようにしてい
る。
In such a stamper manufacturing method, Ni is added to the glass substrate.
When the temperature is returned to room temperature (25 ° C.) after plating (bath temperature: 50 ° C.), bimetallic warpage occurs due to a difference in linear expansion coefficient between the glass substrate and Ni. Therefore, as shown in, for example, JP-A-59-9012, after each plating step, the pressure is corrected and backed with a backing reinforcing material via an adhesive.

発明が解決しようとする課題 ところが、めっき複製により1枚のマスタから逆型の
マザーを介して多数枚のサンを複製する場合、室温まで
下がったマスタをめっき浴に入れてマザーを複製するた
め、平面度が変化する等の問題を生ずる。即ち、裏打ち
されたマスタの平面度は5μm以下であるが、マザーを
複製すると(めっき浴温50℃)、平面度が大きく変化し
たものである。これは、マザーを複製しなくても、50℃
の乾燥炉に数時間静置させただけで同様の平面度変化が
起きたものである。
Problems to be Solved by the Invention However, when duplicating a large number of suns from a single master through an inverted mother by plating duplication, the master lowered to room temperature is put into a plating bath to duplicate the mother. Problems such as a change in flatness occur. That is, the flatness of the backed master is 5 μm or less, but when the mother is duplicated (plating bath temperature: 50 ° C.), the flatness changes greatly. This can be done at 50 ° C without duplicating the mother.
A similar change in flatness was caused only by allowing to stand in a drying oven for several hours.

より具体的に、例えば米国特許第4,440,586号明細書
によれば、70℃のめっき浴でNiめっきを行い、エポキシ
樹脂及びアミンを硬化剤とするアラルダイトを用いて裏
打ちしている。しかし、一般に常温硬化型のエポキシ接
着剤では50〜60℃(ほぼめっき浴温に相当する)にガラ
ス転移点があり、この温度域を境として物性の急激な変
化が起こることが知られている(朝倉書店発行の「接着
・粘着の事典」p.258参照)。このため、上記のような
平面度変化を生じてしまう。このような現象は、裏打ち
後ガラス基板を剥離するとマスタ(Ni)は引張り対象
(ガラス基板)がなくなるので、マスタ自身収縮力が働
くが、接着剤の剛性により平面度は変わらない。しか
し、複製時のめっき浴温(50℃)は接着剤のガラス転移
点に相当するので、接着剤の剛性が緩和されて塑性変形
し、その変形分マスタは残留応力を解放することにな
り、平面度が変化すると考えられる。
More specifically, for example, according to US Pat. No. 4,440,586, Ni plating is performed in a plating bath at 70 ° C., and is backed with an araldite using an epoxy resin and an amine as a curing agent. However, in general, a room temperature curing type epoxy adhesive has a glass transition point at 50 to 60 ° C (corresponding to almost the plating bath temperature), and it is known that a sudden change in physical properties occurs at this temperature range. (See “Encyclopedia of Adhesion and Adhesion” published by Asakura Shoten, p.258). Therefore, the flatness change as described above occurs. In such a phenomenon, when the glass substrate is peeled off after the backing, the master (Ni) has no object to be pulled (glass substrate), so that the master itself contracts, but the flatness does not change due to the rigidity of the adhesive. However, since the plating bath temperature (50 ° C) at the time of replication corresponds to the glass transition point of the adhesive, the rigidity of the adhesive is relaxed and plastic deformation occurs, and the master releases the residual stress by that deformation, It is considered that the flatness changes.

これは、マザーからサンを複製する工程でも同様であ
る。
This is the same in the step of duplicating the sun from the mother.

課題を解決するための手段 ガラス基板上に形成したプリグルーブパターン上に導
体化膜を形成した後、この導体化膜を陰極としてNiめっ
きを行いめっき後に裏打ちしガラス基板を剥離すること
によりマスタを得、このマスタを剥離被膜処理した後Ni
めっきを行いめっき後に裏打ちし前記マスタから剥離す
ることによりマザーを得、このマザーを剥離被膜処理し
た後Niめっきを行い前記マザーから剥離することにより
サンを得るようにした光ディスク複製用スタンパ製造方
法において、裏打ちの際にガラス転移点がNiめっき浴温
以上の接着剤により接着するようにした。
Means for Solving the Problems After forming a conductive film on a pregroove pattern formed on a glass substrate, Ni plating is performed using this conductive film as a cathode, and after plating, a backing is performed and the master is removed by peeling the glass substrate. After the release coating treatment of this master, Ni
A method for manufacturing a stamper for optical disc duplication, in which a mother is obtained by plating and backing after plating and peeling from the master, and then subjecting the mother to a release coating treatment and then performing Ni plating and peeling from the mother to obtain a sun. At the time of lining, the glass transition point was made to adhere with an adhesive having a temperature equal to or higher than the Ni plating bath temperature.

この際、ガラス転移点がNiめっき浴温以上で、硬化剤
の主成分をイミダゾール、ヒドラジン、ジシアンジアミ
ドなどの高融点物質とする接着剤を用いるようにした。
At this time, an adhesive having a glass transition point equal to or higher than the Ni plating bath temperature and having a high melting point material such as imidazole, hydrazine or dicyandiamide as a main component of the curing agent was used.

作用 ガラス転移点がNiめっき浴温以上の接着剤を用いて裏
打ちすることにより、裏打ち後にめっき浴に入れて複製
しても平面度変化の少ないものとなり、平面性のよい高
品質のスタンパ複製が可能となる。
Action Backing using an adhesive whose glass transition temperature is equal to or higher than the temperature of the Ni plating bath reduces the flatness change even when duplicating in the plating bath after the backing. It becomes possible.

特に、ガラス転移点がNiめっき浴温以上で、硬化剤の
主成分をイミダゾール、ヒドラジン、ジシアンジアミド
などの高融点物質とする接着剤を用いて裏打ちすること
により、スタンパの熱安定性も向上する。
In particular, the thermal stability of the stamper is improved by backing with an adhesive having a glass transition point equal to or higher than the Ni plating bath temperature and using a high-melting substance such as imidazole, hydrazine or dicyandiamide as a main component of the curing agent.

実施例 本発明の一実施例を図面を参照して説明する。まず、
第1図によりマザーを複製するまでの工程の一般的な概
要を説明する。ガラス基板1上に形成したプリグルーブ
パターン上に導体化膜を形成した後、この導体化膜を陰
極としてNiめっきを行う。2はNiである。この場合、ガ
ラス基板1とNi2との線膨張係数の違いにより第1図
(a)に示すようにバイメタル状の反り(d≒200〜300
μm程度)を生ずる。そこで、同図(b)に示すように
加圧矯正板3を用いてNi2裏面に接着剤4を介して裏打
ち補強材5を裏打ちする。この後、同図(c)に示すよ
うにガラス基板1を剥離してマスタ6を得る。裏打ちさ
れたこのマスタ6の平面度は5μm以下である。つい
で、同図(d)に示すようにマスタ6表面に剥離被膜処
理した後、Niめっきを行う。7はめっきされたNiであ
る。この後、同図(e)に示すようにNi7上(裏面)に
対しても同様に裏打ちし、さらに、同図(f)に示すよ
うにマスタ6から剥離してマザー8を得る。この場合、
マスタ6は凸型、マザー8は凹型となるが、各々の平面
度d1,d2は300〜400μm程度となってしまう。マザーか
らサンの複製についても同様に行われる。
Embodiment An embodiment of the present invention will be described with reference to the drawings. First,
A general outline of the steps up to duplicating the mother will be described with reference to FIG. After a conductive film is formed on the pregroove pattern formed on the glass substrate 1, Ni plating is performed using the conductive film as a cathode. 2 is Ni. In this case, due to the difference in the coefficient of linear expansion between the glass substrate 1 and Ni2, as shown in FIG.
μm). Therefore, as shown in FIG. 2B, a backing reinforcing material 5 is backed on the back surface of Ni2 with an adhesive 4 using a pressure correcting plate 3. Thereafter, the glass substrate 1 is peeled off as shown in FIG. The flatness of the backed master 6 is 5 μm or less. Next, as shown in FIG. 3D, after the surface of the master 6 is subjected to a release coating treatment, Ni plating is performed. 7 is plated Ni. Thereafter, as shown in FIG. 7E, the upper surface (back surface) of Ni7 is similarly backed, and further, as shown in FIG. in this case,
The master 6 has a convex shape and the mother 8 has a concave shape, but each of the flatness d 1 and d 2 is about 300 to 400 μm. The same is done for mother-to-sun duplication.

しかして、本実施例では具体例1として下記のように
スタンパを複製製造した。ガラス基板1に対するNiめっ
きを50℃のめっき浴で行った後、硬化剤の主成分をヒド
ラジンとするエポキシ樹脂(ガラス転移点が80℃以上
で、かつ、200℃以上の高融点物質)を接着剤4として
用いて裏打ち補強材5を裏打ちし、ガラス基板1を剥離
してマスタ6を得た。このマスタ6について剥離被膜処
理した後、この剥離被膜処理面を陰極として50℃めっき
浴でNiめっきを行い、その後、同じ接着剤4を用いて裏
打ちし、マスタ6から剥離することでマザー8を得た。
マザーについても剥離被膜処理した後、この剥離被膜処
理面を陰極として50℃のめっき浴でNiめっきを行い、そ
の後、同じ接着剤を用いて裏打ちし、マザーから剥離す
ることでサンを得た。
In this embodiment, as a specific example 1, a stamper was duplicated and manufactured as described below. After performing Ni plating on the glass substrate 1 in a plating bath at 50 ° C., an epoxy resin (having a glass transition point of 80 ° C. or higher and a high melting point of 200 ° C. or higher) with hydrazine as a main component of the curing agent is bonded. The backing reinforcing material 5 was backed using the agent 4, and the glass substrate 1 was peeled off to obtain a master 6. After the release coating treatment of the master 6, Ni plating is performed in a 50 ° C. plating bath using the treated surface of the release coating as a cathode, and then the backing is performed using the same adhesive 4, and the mother 8 is peeled off from the master 6. Obtained.
The mother was also subjected to release coating treatment, and Ni was plated in a plating bath at 50 ° C. using the treated surface of the release coating as a cathode, and then backed with the same adhesive, and peeled from the mother to obtain a sun.

このような製法によるマスタ、マザー及びサンの各々
の平面度は第2図に示すように平面度のよいものとなっ
たものである。
As shown in FIG. 2, the flatness of each of the master, the mother, and the sun by such a manufacturing method is good.

また、具体例2として、具体例1の接着剤4に代え
て、硬化剤の主成分をイミダゾールとするエポキシ樹脂
を用いて裏打ちする他は同様の方法でマスタ、マザー及
びサンを得た。この具体例2による場合のマスタ、マザ
ー及びサンの各々の平面度は第3図に示すように平面度
のよいものとなったものである。
Further, as a specific example 2, a master, a mother and a sun were obtained in the same manner except that the adhesive 4 of the specific example 1 was replaced with an epoxy resin whose main component of the curing agent was imidazole. The flatness of each of the master, mother and sun in the case of the specific example 2 is good as shown in FIG.

ちなみに、比較例として、裏打ちに用いる接着剤を従
来のように常温硬化型接着剤(ガラス転移点50℃)と
し、他は上記具体例の場合と同様にマスタ、マザー及び
サンを得たが、この比較例による場合のマスタ、マザー
及びサンの各々の平面度は第4図に示すようになり、マ
ザー及びサンについては平面度の悪いものとなったもの
である。
By the way, as a comparative example, the adhesive used for the backing was a normal temperature-curable adhesive (glass transition point 50 ° C.) as in the past, and the master, mother and sun were obtained in the same manner as in the above specific example, The flatness of each of the master, mother and sun in this comparative example is as shown in FIG. 4, and the mother and sun have poor flatness.

発明の効果 本発明は、上述したように、ガラス転移点がNiめっき
浴温以上の接着剤を用いて裏打ちすることにより、裏打
ち後にめっき浴に入れて複製しても平面度変化の少ない
ものとなり、平面性のよい高品質のスタンパ複製が可能
となり、特に、ガラス転移点がNiめっき浴温以上で、硬
化剤の主成分をイミダゾール、ヒドラジン、ジシアンジ
アミドなどの高融点物質とする接着剤を用いて裏打ちす
ることにより、スタンパの熱安定性も向上させることが
できるという効果を有する。
Advantageous Effects of the Invention As described above, the present invention has a glass transition point that is backed by using an adhesive having a temperature equal to or higher than the Ni plating bath temperature, so that the flatness does not change much even when copied in a plating bath after the backing. High quality stamper duplication with good flatness is possible, especially when the glass transition point is higher than the Ni plating bath temperature and using an adhesive whose main component of the curing agent is a high melting point substance such as imidazole, hydrazine, dicyandiamide, etc. The lining has the effect that the thermal stability of the stamper can also be improved.

【図面の簡単な説明】[Brief description of the drawings]

図面は本発明の一実施例を示すもので、第1図は工程
図、第2図は具体例1による平面度特性を示す特性図、
第3図は具体例2による平面度特性を示す特性図、第4
図は比較例による平面度特性を示す特性図である。 1……ガラス基板、4……接着剤、6……マスタ、8…
…マザー
1 shows an embodiment of the present invention, FIG. 1 is a process diagram, FIG. 2 is a characteristic diagram showing flatness characteristics according to a specific example 1,
FIG. 3 is a characteristic diagram showing the flatness characteristic according to the specific example 2, and FIG.
The figure is a characteristic diagram showing flatness characteristics according to a comparative example. 1 ... Glass substrate, 4 ... Adhesive, 6 ... Master, 8 ...
… Mother

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】ガラス基板上に形成したプリグルーブパタ
ーン上に導体化膜を形成した後、この導体化膜を陰極と
してNiめっきを行いめっき後に裏打ちしガラス基板を剥
離することによりマスタを得、このマスタを剥離被膜処
理した後Niめっきを行いめっき後に裏打ちし前記マスタ
から剥離することによりマザーを得、このマザーを剥離
被膜処理した後Niめっきを行い前記マザーから剥離する
ことによりサンを得るようにした光ディスク複製用スタ
ンパ製造方法において、裏打ちの際にガラス転移点がNi
めっき浴温以上の接着剤により接着するようにしたこと
を特徴とする光ディスク複製用スタンパ製造方法。
1. A master is obtained by forming a conductive film on a pregroove pattern formed on a glass substrate, performing Ni plating using the conductive film as a cathode, backing after plating, and peeling the glass substrate to obtain a master. The master is subjected to Ni plating after the release coating treatment, and a mother is obtained by backing after plating and peeling from the master, and a Ni is obtained by subjecting the mother to Ni plating after the release coating treatment and peeling from the mother to obtain a sun. In the method of manufacturing a stamper for duplicating an optical disk, the glass transition point
A method of manufacturing a stamper for duplicating an optical disk, characterized in that the stamper is bonded with an adhesive having a plating bath temperature or higher.
【請求項2】ガラス転移点がNiめっき浴温以上で、硬化
剤の主成分をイミダゾール、ヒドラジン、ジシアンジア
ミドなどの高融点物質とする接着剤を用いたことを特徴
とする請求項1記載の光ディスク複製用スタンパ製造方
法。
2. An optical disk according to claim 1, wherein an adhesive having a glass transition point equal to or higher than the Ni plating bath temperature and a high-melting substance such as imidazole, hydrazine or dicyandiamide as a main component of a curing agent is used. A method of manufacturing a stamper for duplication.
JP02298068A 1990-11-02 1990-11-02 Manufacturing method of stamper for optical disk duplication Expired - Fee Related JP3132572B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP02298068A JP3132572B2 (en) 1990-11-02 1990-11-02 Manufacturing method of stamper for optical disk duplication

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP02298068A JP3132572B2 (en) 1990-11-02 1990-11-02 Manufacturing method of stamper for optical disk duplication

Publications (2)

Publication Number Publication Date
JPH04170735A JPH04170735A (en) 1992-06-18
JP3132572B2 true JP3132572B2 (en) 2001-02-05

Family

ID=17854728

Family Applications (1)

Application Number Title Priority Date Filing Date
JP02298068A Expired - Fee Related JP3132572B2 (en) 1990-11-02 1990-11-02 Manufacturing method of stamper for optical disk duplication

Country Status (1)

Country Link
JP (1) JP3132572B2 (en)

Also Published As

Publication number Publication date
JPH04170735A (en) 1992-06-18

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