JP3133563B2 - Photosensitive material processing equipment - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photosensitive material processing apparatus for processing a photosensitive material with a processing solution.

[0002]

2. Description of the Related Art In a photosensitive lithographic printing plate processing apparatus for processing a photosensitive lithographic printing plate, which is a photosensitive material having a photosensitive layer formed on a support such as aluminum, the photosensitive lithographic printing plate is developed in a developing section of the apparatus. The developer is immersed in a liquid to perform the developing process, or the developing process is performed by applying the developing solution while transporting the photosensitive lithographic printing plate substantially horizontally. After the development of the photosensitive lithographic printing plate, the developer on the surface is washed away with a washing solution such as water in a rinsing part, etc., and then a finisher solution is applied in a desensitizing part to protect the plate surface. Then, a desensitizing treatment is performed.

The processing performance of such a photosensitive lithographic printing plate, such as a developing solution, gradually decreases in accordance with the processing of the photosensitive lithographic printing plate. As a result, the degree of fatigue increases and the developing ability decreases (deterioration of carbon dioxide gas). In addition, when exposed to the outside air, evaporation proceeds and the processing performance is reduced. In the photosensitive lithographic printing plate processing apparatus, in order to prevent such a decrease in processing performance due to evaporation or carbon dioxide deterioration and maintain a predetermined processing performance, a replenishment of a developing replenisher is performed according to the processing of the photosensitive lithographic printing plate. Of course, the developing replenisher and the like are replenished every time a predetermined time elapses.

Further, dust may enter the cleaning liquid in the rinsing part, or water, which is the solvent of the finisher liquid in the desensitizing processing part, may evaporate and adhere to the periphery of the processing part. After finishing the operation of the photosensitive lithographic printing plate processing equipment or before starting the next work, the processing solution in the rinsing section or desensitizing processing section may adversely affect the finish of the photosensitive lithographic printing plate. To remove the cleaning sheet, or pass the cleaning sheet through the photosensitive lithographic printing plate processor after the end of the operation or before the start of the next operation to transport the photosensitive lithographic printing plate in the rinsing section or the desensitizing section. 2. Description of the Related Art Foreign matter which has an adverse effect on the finish of a photosensitive lithographic printing plate in a road has been removed.

[0005]

Accordingly, the amount of the developing replenisher in the developing section is reduced, or the rinsing section or the desensitizing processing section is cleaned when the processing apparatus is stopped, or immediately before the processing apparatus is stopped or when the processing apparatus is started. In order to eliminate a complicated operation such as passing a cleaning sheet, a processing liquid processing unit such as a developing unit, a washing unit, and a desensitizing unit may be covered with a lid or the like to be sealed.

[0006] However, when the processing liquid processing section is covered with a lid or the like to ensure airtightness, the evaporated water present in the air in the apparatus to a considerable extent, especially when the operation of the apparatus is stopped, is condensed. To form dewdrops,
A problem arises in that it adheres to components such as rollers and generates mold and the like, thereby contaminating the inside of the apparatus. In addition, if mold or the like is generated on the surface of a roller disposed outside the processing liquid such as a developing solution, a cleaning liquid, or a finisher liquid stored in the apparatus, the mold or the like adheres to the surface of the photosensitive material conveyed by the roller. As a result, the finish of the photosensitive material is impaired.

The present invention has been made in view of the above-mentioned facts, and prevents mold and the like from being generated in the apparatus, particularly in the parts outside the liquid which are not in contact with the processing liquid during non-operation of the apparatus. It is an object of the present invention to provide an apparatus for processing a photosensitive material, in which the processing is prevented.

[0008]

According to a first aspect of the present invention, there is provided a photosensitive material processing apparatus for processing a photosensitive material with a processing liquid in a substantially sealed processing liquid processing unit. Processing liquid stored in the processing liquid processing unit
An antimicrobial treatment is applied to constituent parts of the processing apparatus disposed outside .

A photosensitive material processing apparatus according to a second aspect of the present invention is the photosensitive material processing apparatus according to the first aspect, wherein an antibacterial agent is applied to a roller for transporting the photosensitive material disposed outside the processing liquid, which is the component. Is characterized by containing.

According to a third aspect of the present invention, there is provided a photosensitive material processing apparatus according to the first aspect, wherein the processing solution
The component constituting the movable portion of the processing apparatus disposed outside is covered with a coating material containing an antibacterial agent.

According to a fourth aspect of the present invention, there is provided a photosensitive material processing apparatus according to the first aspect, wherein an antibacterial agent is provided at a gap outside the processing solution of the component or at a joint between the components. A sealing material containing

[0012]

[Action] In the photosensitive material processing apparatus according to claim 1 of the present invention, the processing solution by substantially sealing the processing unit, outside air is prevented from flowing into the processing liquid processing section processing solution
The inside of the processing section is maintained at a high humidity, and the structure is such that deterioration of the processing liquid due to carbon dioxide gas and evaporation of moisture in the processing liquid are suppressed. Also,
Antibacterial treatment is performed on the components disposed outside the processing liquid among the components to prevent mold, bacteria, and the like from being generated on the surface of the components disposed outside the processing liquid .

[0013] As a result, water vapor in the air in the sealed processing solution processing unit, which has a high humidity, is condensed, and the processing is performed.
It is attached to assemblies that are disposed outside the liquid, these structure
Since the antibacterial treatment is applied to the component parts , no mold or the like is generated and contaminates the inside of the apparatus, and mold or the like generated outside the processing solution adheres to the surface of the photosensitive material and There is no loss of finish.

In a photosensitive material processing apparatus according to a second aspect of the present invention, an antibacterial treatment is applied to a roller for transporting the photosensitive material disposed outside the processing liquid . This prevents mold and the like from being generated on the surface of the roller outside the processing liquid .

[0015] In the photosensitive material processing apparatus according to claim 3 of the present invention, the movable <br/> components such as a spring condensation manageable liquid out of metallic, coated with a coating material which contains an antimicrobial agent Therefore, generation of mold and the like can be prevented.

In a photosensitive material processing apparatus according to a fourth aspect of the present invention, a sealing material containing an antibacterial agent is filled in a gap between components disposed outside the processing solution and a joint between the components. ing. Accordingly, it is possible to prevent the occurrence of mold and the like due to the dewed moisture remaining in these gaps and joints. Such gaps tend to cause mold and the like easily because moisture and the like condensed easily gather, and when the mold and the like occur, they are easily conspicuous as dirt. The clean feeling of can be kept.

In the present invention, a general antibacterial agent can be applied.
For example, a paint containing an antibacterial agent may be applied. When an antibacterial treatment is applied to a gap or a joint of a part or the like, a sealant containing an antibacterial agent may be used as it is, or the sealant may be previously solidified into a rectangular solid. The cuboid may be appropriately attached using the sealing material containing the antibacterial agent,
It can be applied in consideration of each characteristic.

[0018]

1 and 2 show a photosensitive lithographic printing plate processing apparatus (hereinafter referred to as "PS") which is a photosensitive material processing apparatus according to this embodiment.
Plate processor 10 "). The PS plate processor 10 develops a photosensitive lithographic printing plate (hereinafter, referred to as “PS plate”) 12 on which an image is printed by a printing device (not shown).

As shown in FIG. 1, the PS plate processor 10 has an internal processing solution processing unit 11 covered with a machine casing 14. The machine frame 14 includes an upper lid 70, side plate covers 72 and 74.
And an outer panel 76 covering the lower side of the side panel covers 72, 74.
It is constituted by. Further, an insertion table 16 for sending the PS plate 12 (see FIG. 2) inward is attached to the machine casing 14. The PS plate 12 is placed on the insertion table 16 and inserted into the inside of the machine frame 14 from an opening on the back side of the insertion table 16.

As shown in FIG. 2, a developing tank 18 for storing a developing solution for developing the PS plate 12 and a washing water for washing the developing solution attached to the PS plate 12 are provided inside the machine casing 14. A finisher liquid tank 30 for storing a finisher liquid for applying a finisher liquid to the PS plate 12 after water washing to store the finisher liquid for desensitizing treatment is provided from the insertion table 16.
The processing liquid processing unit 11 is arranged in order along the transport direction of the S plate 12. The developing tank 18 and the washing tank 28
And the finisher liquid tank 30 are integrally connected to form the processing tank 22.

The machine frame 14 is provided with a slit-shaped insertion port 102 corresponding to the inner side of the insertion table 16.
A slit-shaped outlet 104 is provided on the side opposite to 02.

As shown in FIG. 1, the outlet 104 is
It corresponds to an inlet of a drying unit 31 provided as needed downstream of the processing liquid processing unit 11. In the drying unit 31, a unit that blows hot air on both surfaces of the PS plate 12 while drying the PS plate 12 sent from the processing liquid processing unit 11 by a number of rollers, and the like can be used. Further, a stocker or the like for leaning the PS plate 12 discharged from the PS plate processor 10 or the drying unit 31 and storing the plate may be provided.

As shown in FIG. 1 and FIG.
The upper cover 70 is provided with a reentry insertion port 150 for inserting the PS plate 12 between the developing tank 18 and the washing tank 28. The PS plate 12 for performing processing other than development processing such as re-washing and application of a finisher liquid can be inserted from the reentry insertion port 150.

As shown in FIG. 2, a blade 152 is provided in the reentry insertion port 150. The blade 152 is made of rubber, and a tip portion thereof is brought into contact with the upper lid 70 which is a guide surface of the insertion port 150 for reentry,
The base is fixed to the back side of the upper lid 70 via the bracket 154. For this reason, the reentry insertion port 150
Are in a state of being closed by the blade 152. Here, the PS plate 12 is inserted into the reentry insertion port 150.
From above, the blade 152 elastically deforms and this P
The insertion of the S version 12 is not obstructed.

In place of the blade 152, the upper end of the slope of the cover 70 for guiding the PS plate 12 to the reentry insertion slot 150, and a vertical wall portion erecting from the reentry insertion slot 150 The PS plate 12 can be inserted into the machine frame 14 from the reentry insertion opening 150 by opening the opening / closing lid, and when closed, the reentry insertion opening 150 is provided. May be completely closed. With these, the developing tank 18 can be made to have a substantially closed structure, and it is possible to prevent the developing solution from being deteriorated due to contact with carbon dioxide gas in the outside air. Note that at least one of the blade 152 and the opening / closing lid may be provided, and the opening / closing lid may have a structure that can be easily opened / closed by a magnetic push latch mechanism or the like.

On the other hand, as shown in FIG. 1, the upper cover 70 is detachable, so
The upper lid 70 is removed, and the processing solution processing section 11 in the machine casing 14 is removed.
(Developing tank 18, washing tank 28, finisher liquid tank 30)
Can be opened.

Next, the processing liquid processing section 11 inside the machine casing 14 of the PS plate processor 10 will be described.

As shown in FIG. 2, the PS
A pair of transport rollers 32 is provided on the side where the plate 12 is inserted, and the PS plate 12 inserted from the insertion opening 102 is drawn into the machine frame 14. The pair of transport rollers 32 move the PS plate 12 horizontally by, for example, one.
The developer is fed toward the developing tank 18 at an angle of 5 °. In the vicinity of the insertion slot 102, a PS plate 12
An insertion sensor 108 for detecting the presence / absence of is provided. The insertion sensor 108 can recognize that the PS plate 12 exists in the apparatus.

Near the downstream side of the transport roller 32, a rubber blade 106 is mounted. Blade 106
Has its tip part in contact with the side wall of the developing tank 18,
The base is attached to the upper lid 70 via the bracket 156. The bracket 156 includes a fixed portion 156A and a slide portion 156B attached to the fixed portion with a thumbscrew 158, and the blade 106 includes a slide portion 156B.
It is stuck to. Therefore, the blade 106 loosens the thumbscrew 158 and slides the slide portion 156B with respect to the fixed portion 156A, so that the leading end of the blade 106 is
Is configured to be able to be separated from the side wall.

Here, the tip of the blade 106 is usually
The PS plate 12 is in contact with the side wall of the developing tank 18, and when the PS plate 12 is inserted into the insertion slot 102, the distal end of the PS plate 12 pushes the blade 106 to elastically deform and expand. The PS plate 12 is inserted into the developing tank 18 while the blade 106 is expanded as described above.

The developing tank 18 has a substantially inverted mountain shape having an upper opening and a bottom center protruding downward. A guide plate 168, a plurality of guide rollers 34, and a rotating roller are provided in the developing tank 18. A brush roller 170 is provided. Above the guide plate 168, a relatively large-diameter guide roller 36 is provided.
A rotating brush roller 38 and a guide roller 40 are disposed above the roller plate 0, and a pair of rollers 42 having a function of nipping and transporting the PS plate 12 are disposed in the center of the developing tank 18. I have.

These are rotatably wrapped between a pair of side plates (not shown) in the developing tank 18, and are rotated by transmitting a driving force of a driving unit (not shown) to convey the PS plate 12 at a constant speed. Is composed. In the vicinity of the bottom of the developing tank 18, a pair of rollers 42, a plurality of guide rollers 34 adjacent thereto, and a guide plate 168 are arranged so as to convey the PS plate 12, for example, with a radius of curvature of 300 to 350 mm. . Therefore, the PS plate 1 that is nipped and transported by the pair of transport rollers 32 and inserted into the developing tank 18
2 is conveyed obliquely downward through the space between the guide plate 168 and the guide roller 36, and inserted between the rollers 42.
The roller 42 is configured to pinch the PS plate 12 and apply a conveying force.

The PS plate 12 sent out from the roller 42
Is obliquely directed upward by a guide roller 34 and is discharged from the developing tank 18 while being guided by the rotating brush rollers 38 and 170 and the guide roller 40. Thus, the PS plate 12 is smoothly and reliably conveyed while being immersed in the developer without applying excessive force. The rotating brush rollers 38 and 170 serve to remove waste and the like from the photosensitive layer surface of the PS plate 12 to promote development, and exclusively process the single-sided PS plate 12 with the photosensitive layer facing upward. At this time, a normal guide roller may be arranged instead of the rotating brush roller 170.

The spray pipe 44 closest to the downstream side of the roller 42 is shaped like a skewer-shaped roller having a plurality of elastic rotating members supported on the outer periphery thereof, and also has a role of guiding the PS plate 12. A discharge port (not shown) communicating between the outer periphery and the inside of the pipe is provided between the rotating members. A spray pipe 172 is provided below the guide plate 168.
Are arranged. The spray pipe 172 is provided with a large number of discharge ports (not shown) communicating with the inside along the axial direction on the outer peripheral surface of the hollow pipe, and is arranged so that the axial direction is along the width direction of the transport path. These spray pipes 44,
The developing solution in the developing tank 18 is circulated to the developing tank 172 by a circulating means (not shown), and the developing solution is discharged toward the bottom of the developing tank 18. Thus, the developer in the developing tank 18 is uniformly stirred.

On the developer solution side in the developing tank 18, the floating lid 5 is provided.
0 is arranged. A portion corresponding to the rotating brush roller 38 and the guide roller 40 adjacent thereto is projected in a substantially arc shape, and the floating lid 50 is brought into close contact with the developing solution surface in order to minimize the contact between the developing solution surface and air. The PS plate 1 of the floating lid 50 is moved up and down according to the increase and decrease of the liquid.
Both ends in the conveying direction are attached to a side plate (not shown) by a slidable structure. As the material, a lightweight material such as polyvinyl chloride, polyethylene, and polyamide is selected.

The distal end of the blade 174 is in contact with the downstream end of the floating lid 50 in the transport direction. This blade 1
74 is made of rubber and fixed to the upper lid 70 via a bracket 176. The level of the developer exposed from the downstream end in the transport direction of the floating lid 50 by the blade 174 and the floating lid 50
The upper part of the developing tank 18 is completely separated from the outside of the machine by a blade 106 (in a state in contact with the side wall of the developing tank 18) near the insertion port 102,
Evaporation of the developer can be suppressed.

At the most downstream side in the transport direction of the developing tank 18, P
A roller pair 54 for nipping and transporting the S plate 12 and squeezing the developer from the surface of the PS plate 12 is arranged.
The developer is squeezed out from the surface of the PS plate 12 sent from the developing tank 18 to the washing tank 28.

Above the washing tank 28, two pairs of transport rollers 52 and 53 (hereinafter, an upstream roller pair 5
2, which is described separately from the downstream roller pair 53). These transport roller pairs 52 and 53 are rotatably supported by side plates (not shown), and are rotated by transmitting a driving force of a driving unit (not shown).
A transport path for the PS plate 12 sent from the developing tank 18 is formed. The leading end of the PS plate 12 sent from the developing tank 18 is guided so as to contact the upper part of the lower roller of the upstream roller pair 52. Further, the leading end of the PS plate 12 discharged from the upstream roller pair 52 is guided so as to contact the upper part of the lower roller of the downstream roller pair 53.

The washing tank 28 is configured to collect washing water after washing the developing solution from the PS plate 12 sent out from the developing tank 18. On the upstream side of the downstream roller pair 53 and above the transport path, a spray pipe 56 is disposed. The spray pipe 56 is disposed along the axis of the downstream roller pair 53, and Roller pair 5
A discharge port (not shown) communicating with the inside is provided at a position corresponding to the center of the upper roller 3.

When washing water is supplied to the spray pipe 56 by a water supply means (not shown), the washing water drops on the upper roller of the downstream roller pair 53, and the downstream roller pair 53
When the upper roller rotates, the washing water quickly spreads on the surface of the PS plate 12, and the surface of the PS plate 12 is washed with the washing water. Further, the washing water after washing is configured to drop to the receiving tray 62 from both ends in the width direction of the PS plate 12. The washing water is supplied from the spray pipe 56 to the PS plate 12 via the upper roller of the downstream roller pair 53 when the leading end of the PS plate 12 reaches the downstream roller pair 53, This timing is a predetermined time after the insertion sensor 108 detects the PS plate 12.

The receiving tray 62 is disposed below the pair of transport rollers 52, 53, and has a first tank 64 for accommodating the lower end of the lower roller of the pair of transport rollers 52, and the lower end of the lower roller of the transport roller 53. A second tank 66 for accommodating the parts, and an intermediate tank 68 for connecting between the first tank 64 and the second tank 66. Wash water dropped from the spray pipe 56 is collected in a second tank 66, and water overflowing from the second tank 66 flows into the first tank 64 via the intermediate tank 68. . The excess water in the first tank 64 overflows to the washing tank 28. The lower rollers of the transport roller pairs 52 and 53 draw up the water in the receiving tray 62 to clean the back surface of the PS plate 12 and, when the PS plate 12 does not pass, the upper transport roller pairs 52 and 53. To prevent the upper rollers of the pair of transport rollers 52 and 53 from drying out.

As described above, the washing water pumped up by the lower rollers of the pair of transport rollers 52 and 53 is P
Since the leading end of the S plate 12 comes into contact with the lower roller of the transport roller pair 52, 53, it is pumped up before contact and stays at the contact portion between the upper roller and the lower roller of the transport roller pair 52, 53. The washing water is supplied to both sides of the tip of the PS plate 12 without fail, so that the water can be reliably washed from the tip of the PS plate 12. The water overflowing into the washing tank 28 is discarded through a waste liquid pipe 29 to a waste liquid tank (not shown). In addition, washing tank 2
The water overflowing from 8 may be used as replenishing dilution water for the developer in the developing tank 18. The developing tank 18 and a finisher tank 30 described later are replenished with a replenisher by a replenisher replenisher (not shown) in accordance with, for example, the processing amount of the PS plate 12.

Here, the mounting structure of the transport roller pairs 52 and 53 of the washing tank 28 will be described with reference to FIGS.

The pair of sub-side plates 206 are formed by bending one end of a substantially lithographic member into a U-shape to form a side plate 202 of the washing tank 18.
A suspending portion 208 corresponding to the upper end portion of the suspending portion 208 is formed.
12 is hooked and attached to a pin 210 provided on the side plate 202.

On the surfaces of the pair of sub side plates 206 facing each other, a bearing housing 2 for supporting the upstream roller pair 52 is provided.
14. A bearing housing 216 supporting the downstream roller pair 53
Is installed. In addition, the bearing accommodating parts 214 and 216
Have the same shape, and the angle of attachment to the sub side plate 206 is changed according to the inclination angle of the roller pair to be accommodated.
A screw (not shown) is screwed into the nut and is firmly attached.

The bearings 220 into which the rotating shafts 218 of the rollers of the transport roller pairs 52 and 53 are inserted are inserted into the bearing housing portions 214 and 216. As a result, the upstream roller pair 52 and the downstream roller pair 53 are arranged in a state where the upper and lower rollers are in contact with each other and the bearings 220 in the bearing housing portions 214 and 216 are separated.

When the sub side plate 206 is attached to the side plate 202, the lower end of the bearing accommodating portion 214 is inserted into the first tank 64 of the tray 62, and the lower end of the bearing accommodating portion 216 is inserted in the second tank. 66 is inserted into the end. Thus, the lower portions of the lower rollers of the upstream roller pair 52 and the downstream roller pair 53 are accommodated in the first tank 64 and the second tank 66, respectively.

Here, the fixing of the bearing 220 housed in the bearing housing portions 214 and 216 will be described by taking the bearing housing portion 216 as an example. As shown in FIG.
6, a coil spring 224 is rotatably supported by a fixing pin 226 screwed and fixed to the sub side plate 206. One end 224 </ b> A of the coil spring 224 can be brought into contact with the inner surface of a ring-shaped recess 228 formed in the bearing 220 of the upper roller housed in the bearing housing 216. Also, the other tip 224
B is engageable with a fixing pin 230 screwed and fixed above the upper opening of the bearing housing 216.

The transport roller pair 52 is a coil spring 2
24 with the recess 228 of the upper bearing 220.
In this state, the distal end portion 224B of the coil spring 224 is locked to the fixing pin 230 and temporarily fixed (shown in FIG. 4). Thereby, the coil spring 22
4 urges the upper bearing 220 in a direction approaching the lower bearing 220 to prevent the bearing 220 from being detached from the bearing accommodating portion 216 and to apply a predetermined urging force between the transport roller pair 52. . With this urging force, the conveying roller pair 53 can apply a conveying force to the PS plate 12 when nipping the PS plate 12.

In a state where the bearing 220 of the pair of transport rollers 53 is temporarily fixed, the movement is restricted by the regulating plate 232. The regulating plate 232 has a distal end inserted between the fixing pin 230 and the bearing 220, and
4 is screwed into the screw hole 242 to adjust the adjustment pin 2
44 and the fixing pins 226 and 230
Can be firmly fixed at a predetermined position of the sub side plate 206. In this state, even if the urging of the bearing 220 by the coil spring 224 is released or the PS plate 12 is nipped by the transport roller pair 53, the bearings 220 accommodated in the bearing accommodating portion 216 do not separate from each other. Thus, a predetermined large clamping force can be applied between the pair of transport rollers 53.

The upstream roller pair 52 is also attached in the same structure as the downstream roller pair 53, and while nipping and transporting the PS plate 12 with a predetermined nipping force, ensures that washing water adhering to the surface of the PS plate 12 is removed. Can be squeezed out.

A plurality of metal stays 240 are stretched between the sub side plates 206 arranged in pairs, and the stays 240 maintain a constant distance without being separated from each other. It has become.

The PS plate 12 washed in the washing tank 28 is sent to the finisher tank 30. A pair of transport rollers 78 is provided above the finisher liquid tank 30, and the PS plate 12 is guided between the transport rollers 78. In this case, the line connecting the axes of the upper roller and the lower roller of the downstream roller pair 53 is inclined about 10 ° clockwise with respect to the perpendicular. This allows
The transport of the PS plate 12 in the finisher liquid tank 30 has an inclined surface that gradually decreases along the transport direction, so that the finisher liquid on the PS plate 12 does not flow into the washing tank 28.

On the upstream side of the transport roller 78, spray pipes 82 and 188 are provided in the vertical direction of the transport path. Each of the spray pipes 82 and 188 is provided with a discharge port (not shown) communicating with the inside on the outer periphery.
When the finisher liquid within 0 is supplied, the finisher liquid is discharged from the discharge port and supplied to the front and back surfaces of the PS plate 12. A guide plate 84 is mounted around the spray pipe 82 to guide the transport of the PS plate 12 and to spread the finisher liquid from the spray pipe 82 uniformly.
It is made to flow down to the surface.

On the other hand, the spray pipe 188 and the PS plate 12
A guide plate 86 is disposed along the conveyance path between the conveyances. The upstream end of the guide plate 86 is bent at a substantially right angle to form a vertical wall portion 86A, and has a substantially L-shape as a whole. Corresponding to the vertical wall portion 86A, the vertical wall portion 86
A crank-shaped bracket 88 having a vertical wall portion 88A parallel to A is provided. The vertical wall portion 88A and the bottom plate portion 88B of the bracket 88 and the vertical wall portion 86A of the guide plate 86
Thereby, a vertical groove 90 is formed. In this vertical groove 90,
The finisher liquid discharged from the spray pipe 188 flows in through a hole provided in the vertical wall portion 86A, and the finisher liquid overflows from the upper end opening to guide the guide plate 86.
Is uniformly attached to the back surface of the PS plate 12 passing through the upper surface side. A hard sponge 92 is provided at the bottom of the vertical groove 90 to prevent leakage of the finisher liquid.

The finisher liquid applied to the front and back surfaces of the PS plate 12 in this way is squeezed by the conveying roller 78 at the portion which is excessively adhered, and is uniformly applied. The squeezed finisher liquid is collected in the finisher liquid tank 30. A part of the lower roller of the transport roller 78 is immersed in the finisher liquid in the finisher liquid tank 30, and the finisher liquid taken out by the lower roller of the transport roller 78 is mainly used for the PS plate 12. Is applied to the back side of
8 to prevent the finisher liquid from depositing and sticking to the surface of the transport roller 78.

The PS plate 12 on which the finisher solution has been applied passes through the outlet 104 and is discharged out of the PS plate processor 10 to be stocked or sent to the drying section 31. I have.

Around the opening of the discharge port 104, a rubber box-shaped blade 228 is extended toward the conveying roller 78, and the four ends of the box-shaped blade 228 are respectively connected to the conveying roller 78. The PS plate 1 is in contact with the peripheral surface, so that the PS plate 1
The second conveyance path is divided and formed. Accordingly, the vicinity of the outlet 104 and the inside of the PS plate processor 10 are tightly partitioned, so that the air near the outlet 104 does not flow into the adjacent processing liquid processing unit 11. .

The discharge port 104 has a shutter 94.
Is provided, and the shutter 94 causes the PS
When the plate 12 is not processed, the discharge port 104 is completely closed. For this reason, the space between each processing tank (the developing tank 18, the washing tank 28 and the finisher liquid tank 30) of the processing liquid processing unit 11 and the lid 70 is formed by the above-described insertion port 102.
The blade 106, the blade 152 of the reentry insertion port 150, and the shutter 94 or the blade 228 of the discharge port 104 are isolated from the outside of the machine and are substantially airtightly maintained.

Here, the transport rollers (for example, the transport roller pairs 52 and 53 and the transport roller 78) disposed outside the processing liquid in the substantially sealed portion are formed by adding an antibacterial agent. . For example, when forming each of the transport roller pairs 52 and 53 using silicone rubber, 0.5 to 1.0% of Amorden SK-950 (trade name of Daiwa Chemical Co., Ltd.) is used as an antibacterial agent. (Weight ratio), and molded.

As another antibacterial agent, Vinazine (trade name, manufactured by Morton Thiokol, USA)
Etc., and are mixed at a ratio of about 2 to 5% (weight ratio).

By adding an antimicrobial agent to the transport roller pairs 52 and 53 outside the liquid, the transport roller 78 and the like and forming them, the peripheral surface of the roller becomes wet, and water in the air condenses to form water droplets. Even if it adheres, generation of mold and the like can be prevented for a long period of time.

In addition, the surface of the metal stay 240, the surface of the spray pipe 56, the portions of the pair of sub side plates 206 that are not immersed in the processing liquid, and the like are likely to cause dew condensation (for example, S).
US 304 etc.) is coated with a paint mixed with an antibacterial agent. This paint is made by Kansai Paint,
15% (weight ratio) of antibacterial agent Amorden SK-950 manufactured by Daiwa Chemical Co., Ltd. was added to Evagrad # 3245.
Baking finish is applied. Note that the end surfaces of both ends of the stay 240 may not be painted so that the paint does not peel off by rubbing with the sub side plate 206. not going.

As shown in FIG. 6, a receiving portion 140 made of metal (for example, the material is SUS304 or the like) and a frame 1 are provided.
4A, a paint containing the antibacterial agent is applied to a portion of the bracket 146 where dew condensation may occur (a hatched area in FIG. 6). In addition, as a primer (undercoat), a two-component epoxy-based paint manufactured by Nagashima Special Paint Co., Ltd. is melted with a predetermined ratio of thinner as a primer (undercoat).
After coating at 5 μm, it is also possible to apply a coating made by Nagashima Special Paint Co., Ltd. to which the following antibacterial agent is added.

The primer (undercoat) manufactured by Nagashima Special Paint Co., Ltd. and a paint to which an antibacterial agent is added may be applied to a portion of the rear surface of the upper lid 70 where dew condensation is likely to occur.

<Composition of antibacterial paint>-Microencapsulated BCM active ingredient 0.04% by weight-Algaeproofing agent R 2.0% by weight-Hydrolysis-resistant polyurethane emulsion resin 40.0% by weight-Hydrophilic organic solvent 4 3.0% by weight Deionized water 53.6% by weight

The BCM of the microencapsulated BCM
As the drug substance, 2- (carbomethoxyamino) -benzimidazole (trade name: MEGAL BCM, manufactured by Hoechst AG, West Germany) shown in Chemical Formula 1 is used. Since this antibacterial paint encapsulates an antibacterial agent, the antibacterial property can be maintained for an extremely long time.

[0068]

Embedded image

On the other hand, the conveying roller pair 52, 5
3 and a coil spring 224 (shown in FIG. 4) for fixing the transport roller 78 of the finisher liquid tank 30 is subjected to an antibacterial treatment by applying a sealant 100 to which an antibacterial agent described later is added. In addition, Bascoke (trade name, manufactured by Cemedine Co.) can be used as a sealing material containing an antibacterial agent.

As shown in FIG. 5, in the machine casing 14,
A substantially L-shaped receiving portion 140 is attached to a frame 14A (for example, the material is SUS304 or the like) corresponding to the peripheral portion of the upper lid 70.
It is prevented from flowing out of 1. This receiving part 140
The sealing tape 142 is provided at a position where the sealing tape 142 contacts the lid 70.
Is affixed. At this time, the receiving portion 1 of the frame 14A
After sufficiently applying the sealing material 100 to the sealing tape 40, the sealing tape 142 is pressed firmly to make it tightly adhere. The sealing tape 142 is formed by pouring the sealing material 100 into a rectangular parallelepiped mold and fixing the sealing material 100 into a tape shape.

In place of the sealing tape 142,
Using a non-water-absorbing resin sponge or the like, the sealing material 100 or the above-mentioned bath cork or the like may be filled between the resin sponge and the receiving portion 140, and the antibacterial agent (Amorden SK-950 or Binazine and the like may be contained.

As shown in FIGS. 5 and 6, the processing tank 2
2 has a flange 144 attached to the lower peripheral edge of the upper opening, and the flange 144 is attached to the frame 14A.
Is fixed to a bracket 146 attached to the bracket. A step portion at the peripheral edge of the joint between the flange portion 144 of the processing tank 22 and the bracket 146 of the frame 14A is filled with a sealing material 100 mixed with an antibacterial agent. Water droplets and the like are prevented from penetrating between the flange portion 144 and the bracket 146 at the stepped portion, and mold and the like are prevented from being generated by the water droplets attached to the stepped portion. In addition, as shown in FIG.
No. 0 is filled over the entire joint portion between the processing tank 22 and the frame 14A. In addition, the sealing material 100 is also filled or applied to a joint portion such as a corner portion of the processing tank 22 (only a part is shown in FIG. 6).

As the sealant 100 to which the antibacterial agent is added, sealant No. 4588 (a sealant containing an antibacterial agent manufactured by Shin-Etsu Chemical Co., Ltd.) is used. Bass coke (trade name, manufactured by Cemedine Co., Ltd.)
And the like can be applied.

As shown in FIG. 7, for example, the periphery of the spray receiver 160 to which the spray pipes 82 and 188 of the finisher liquid tank 30 are connected and the finisher liquid tank 3
The seal material 100 is also filled in the gap with the zero tank wall. Further, the sealing material 100 is also applied around a screw hole for inserting or screwing a screw for fixing each component such as a thumb screw 158 for fixing the blade 106, so that water droplets permeate into the screw hole. And mold and the like are prevented from being generated in water droplets attached around the screw hole.

As described above, the sealing material 10
0, the upper part of the processing tank 22 and the lid 7
In addition to enhancing the airtightness of the space between zero, the antibacterial property of the gap where water droplets or the like are likely to adhere and remain is enhanced.

The spray pipe 56 shown in FIG. 3 is replaced by a metal (for example, SUS304) and the soft vinyl chloride resin is replaced with the antibacterial agent Amorden SK-950 or Vinadine (Vi
nygene (trade name of Morton Thiokol, USA) is mixed. Further, the antibacterial agent Amorden SK-950 or binadine may be mixed in the synthetic resin of the synthetic resin components such as the developing tank 18, the washing tank 28, the finisher liquid tank 30, the upper lid 70, and the floating lid 50.

The operation of the present embodiment will be described below. PS plate 12 on which an image is recorded by a printing device (not shown) or the like
Is placed on the insertion table 16 and sent to the back of the insertion table 16. Thus, the PS plate 12 reaches the insertion slot 102. A blade 106 is disposed in the insertion port 102, and when the PS plate 12 does not elastically deform the blade 106 by pressing the blade 106, it reliably prevents outside air from entering the developing tank 18 from the insertion port 102. The PS plate 12 inserted from the insertion opening 102 is smoothly sent into the developing tank 18 by elastically deforming the blade 106.

Further, the tip of the PS plate 12 is
After passing through 2, the insertion sensor 108 detects the PS plate 12 and detects that the processing of the PS plate 12 has started.
Thus, for example, water is supplied to the spray pipe 56 after a lapse of a predetermined time, and the water washing of the PS plate 12 is started.

The P inserted from the insertion slot 102 of the machine frame 14
The S plate 12 is immersed in a developer in a developing tank 18. The PS plate 12 immersed in the developing solution is guided by the guide plate 168, inserted between the rollers 42, and passed through the developing tank 18 by the guide rollers 34 and the like. Thereafter, the photosensitive layer-side surface of the PS plate 12 is rubbed with the rotating brush rollers 38 and 170 to accelerate development, and unnecessary photosensitive layers are removed according to the printed image.

The developed PS plate 12 is placed in a washing tank 28.
To be transported by the transport rollers 52 and 53. At this time, since the PS plate 12 is guided so as to contact the lower roller of the transport roller 52, the washing water pumped up from the tray 62 by the rotation of the lower roller flows around the surface of the PS plate 12, When the PS plate 12 is sandwiched between the transport rollers 52, a liquid pool can be formed. This makes it possible to reliably perform the water washing process from the tip of the PS plate 12.

Thereafter, the PS plate 12 is moved to the downstream roller pair 53.
Is washed with new water dripped from the spray pipe 56 to the upper roller of the downstream roller pair 53 at the timing of reaching the downstream side.
Among them, washing is performed by washing water taken out by a lower roller.

When the water washing process is completed, the PS plate 12 is sent to the finisher liquid tank 30 and is nipped and conveyed by the conveying rollers 78. Here, the PS plate 12 is subjected to a desensitization treatment by applying a finisher liquid discharged from the spray pipes 82 and 188. At this time, the line connecting the axes of the upper and lower rollers of the transport roller pair 53 is inclined with respect to the perpendicular, and the leading end side of the PS plate 12 is gradually lowered.
The flow direction of the finisher liquid attached to the plate 12 can be made constant.

PS plate 12 coated with finisher liquid
Passes through the space between the blades 228 and reaches the discharge port 104 while the excess finisher liquid is removed by the transport roller 78. Thereafter, the PS plate 12 is subjected to a drying process in a drying unit 31 provided as necessary.

As described above, the PS version processor 10
The washing tank 18 inside the machine frame 14 is moved to the blades 106 and 174.
The outside of the machine and the developing tank 18 are isolated by the blades 174 and 152 on the side of the washing tank 28 and the finisher liquid tank 30 where the PS plate 12 is inserted. Since it is isolated from the outside of the apparatus at 228, even when the apparatus is in operation, particularly when the PS plate 12 is being fed toward the discharge port 104 by the transport roller 78 and the shutter 94 is in the open state, Since the intrusion of outside air can be reliably prevented and the deterioration of the processing solution due to outside air can be suppressed, the replenishment amount of the processing solution to compensate for the deterioration of the processing solution due to evaporation or carbon dioxide gas fatigue can be greatly reduced. In addition, the running cost of the apparatus can be reduced.

Also, normally, the outlet 104 is provided with the shutter 9
4, the transport roller 78, which easily comes into contact with the outside air entering from the discharge port 104, can be reliably prevented from coming into contact with the outside air, and the finisher liquid adheres and hardens to the surface of the transfer roller 78. Can be prevented. As a result, in the conventional processing apparatus, the cleaning operation using the cleaning plate (about 1 to 3 plates) which is necessary at the start of work can be made unnecessary.

On the other hand, by making the inside of the processing liquid processing unit 11 airtight, the air in the processing liquid processing unit 11 does not flow out of the apparatus, and the moisture evaporated during the operation of the apparatus is removed from the processing liquid processing unit. Stay in 11. This evaporated water is
After the operation of the apparatus is stopped, dew condensation gradually occurs, and adheres to components outside the liquid as dew drops. Such dew drops are likely to remain in small gaps such as joints of component parts, and mold, bacteria, etc. are generated in portions where such dew drops are attached,
It may cause the inside of the device to become dirty. Also, if the mold adheres to the surface of a roller (for example, the pair of transport rollers 52 and 53 of the washing tank 28) disposed outside the liquid and mold is generated on the surface of the roller, the PS plate 12 where the mold or the like is processed is formed. When the contact is made, it is transferred to the surface of the PS plate 12, which causes the finish of the PS plate 12 to be impaired.

Here, in the PS plate processor 10, since antibacterial agents are contained in the transfer rollers that come in contact with the PS plate 12 disposed outside the liquid, molds and the like are generated on the surfaces of these transfer rollers, and the transfer is performed. This prevents the surface of the roller from being stained. Since the surface of the transport roller is not contaminated by mold or the like, the surface dirt of the transport roller is not transferred to the surface of the PS plate 12 and contaminates the PS plate 12, so that the finish is not impaired.

Further, the surface of the metal stay 240 and the spray pipe 56 which are not directly immersed in the developing solution, the washing water, the finisher solution, and the washing water of the sub side plate 206,
The part that is not immersed in the finisher liquid or the like is painted with a paint containing an antibacterial agent. In addition, a sealing material 100 containing an antibacterial agent is filled in a joint portion of the processing bath 22, a step portion that comes into contact with a bracket 146 for attaching the processing bath 22 to the frame 14 </ b> A, and a coil spring 224.

Further, a sealing tape made of a sealing material containing an antibacterial agent is attached to the receiving portion 140 with this sealing material. Also, a gap between the periphery of the spray receiver 160 to which the spray pipes 82 and 188 of the finisher liquid tank 30 are connected and the tank wall of the finisher liquid tank 30 is filled with a sealing material 100 containing an antibacterial agent. Further, a sealing material 100 containing an antimicrobial agent is applied around a screw hole for inserting or screwing a screw for fixing each component such as a thumb screw 158 for fixing the blade 106.

Therefore, even if dew drops adhere to these, there is no possibility that mold or the like will be generated and the inside of the processing liquid processing section 11 will be soiled. In particular, dew drops adhere to and remain on the steps around the bracket 146 and the coil spring 224, and mold and the like are easily generated. However, such generation of the mold and the like can be reliably prevented. In addition, since the sealant 100 is filled or coated with an antibacterial agent, the inside of the treatment liquid processing unit 11 is easily cleaned, and the maintainability of the apparatus becomes extremely good.

This embodiment shows an example of the application of the present invention, and does not limit the antibacterial agent and the method of applying the antibacterial agent. As the antibacterial agent, commonly used antibacterial zeolites, antibacterial silica gel, imidazole-based organic substances, thiazoline-based organic substances, antibacterial glass, etc. can be selected and applied. can do.

This embodiment does not limit the configuration of the photosensitive material processing apparatus to which the present invention is applied. The photosensitive material processing apparatus applicable to the present invention is applicable not only to a photosensitive material processing apparatus for processing a photosensitive lithographic printing plate such as a PS plate, but also to a photosensitive material processing apparatus for processing other photosensitive materials such as photographic paper and film. The antimicrobial treatment may be applied to the components arranged outside the liquid by an appropriate method.

[0093]

As described above, in the photosensitive material processing apparatus of the present invention, the processing solution processing section storing the processing solution is substantially sealed to suppress the deterioration and evaporation of carbon dioxide gas in the processing solution, and the replenishing solution is replenished. The required amount is reduced. At this time, even if water vapor in the air in the apparatus is condensed and adheres to components outside the processing liquid, mold and the like do not occur, so that the inside of the apparatus can always be kept clean. Further, since no mold or the like is generated on the surface of a roller or the like disposed outside the processing liquid, an excellent effect of preventing the mold or the like from adhering to the surface of the photosensitive material and impairing the finish is provided.

[Brief description of the drawings]

FIG. 1 is a schematic perspective view of a PS plate processor applied to the present embodiment.

FIG. 2 is a schematic configuration diagram of a PS plate processor applied to the embodiment.

FIG. 3 is a perspective view illustrating a schematic configuration of a water washing unit.

FIG. 4 is a schematic side view illustrating attachment of a roller pair of a washing section.

FIG. 5 is a schematic sectional view showing a state in which a lid is attached to a frame.

FIG. 6 is a schematic perspective view showing a processing tank.

FIG. 7 is a cross-sectional view of a main part showing a state where a spray pipe is attached.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 10 PS plate processor (photosensitive material processing apparatus) 11 Processing liquid processing part 12 PS plate (photosensitive material) 52, 53 Roller outside liquid 100 Sealing material 94 Shutter 106, 152, 228 Blade 224 Coil spring 240 Stay

──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int. Cl. ⁷ , DB name) G03F 7/30 501 G03D 3/00

Claims (4)

(57) [Claims] 1. A photosensitive material processing apparatus for processing a photosensitive material with a processing liquid in a substantially sealed processing liquid processing unit, wherein the processing unit is disposed outside the processing liquid stored in the processing liquid processing unit. An apparatus for processing a photosensitive material, wherein antibacterial treatment is applied to components of the apparatus. 2. The photosensitive material processing apparatus according to claim 1, wherein an antibacterial agent is contained in a roller for transporting the photosensitive material disposed outside the processing liquid as the component. 3. A photosensitive material processing apparatus according to claim 1, wherein said component constituting a movable portion of said processing apparatus disposed outside said processing liquid is coated with a coating material containing an antibacterial agent. 4. A photosensitive material processing apparatus according to claim 1, wherein a sealing material containing an antibacterial agent is provided at a gap between said constituent parts outside said processing solution or at a joint between the constituent parts.