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JP3134583B2 - Press mold for optical glass element and method for producing the same - Google Patents
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JP3134583B2 - Press mold for optical glass element and method for producing the same - Google Patents

Press mold for optical glass element and method for producing the same

Info

Publication number
JP3134583B2
JP3134583B2 JP05067839A JP6783993A JP3134583B2 JP 3134583 B2 JP3134583 B2 JP 3134583B2 JP 05067839 A JP05067839 A JP 05067839A JP 6783993 A JP6783993 A JP 6783993A JP 3134583 B2 JP3134583 B2 JP 3134583B2
Authority
JP
Japan
Prior art keywords
mold
press
thin film
optical glass
glass element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP05067839A
Other languages
Japanese (ja)
Other versions
JPH06279036A (en
Inventor
吉成 柏木
梅谷  誠
健二 井上
秀直 片岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Corp, Matsushita Electric Industrial Co Ltd filed Critical Panasonic Corp
Priority to JP05067839A priority Critical patent/JP3134583B2/en
Publication of JPH06279036A publication Critical patent/JPH06279036A/en
Application granted granted Critical
Publication of JP3134583B2 publication Critical patent/JP3134583B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B11/00Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
    • C03B11/06Construction of plunger or mould
    • C03B11/08Construction of plunger or mould for making solid articles, e.g. lenses
    • C03B11/084Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
    • C03B11/086Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor of coated dies
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B11/00Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
    • C03B11/06Construction of plunger or mould
    • C03B11/08Construction of plunger or mould for making solid articles, e.g. lenses
    • C03B11/082Construction of plunger or mould for making solid articles, e.g. lenses having profiled, patterned or microstructured surfaces
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00Press-moulding glass
    • C03B2215/02Press-mould materials
    • C03B2215/08Coated press-mould dies
    • C03B2215/14Die top coat materials, e.g. materials for the glass-contacting layers
    • C03B2215/16Metals or alloys, e.g. Ni-P, Ni-B, amorphous metals
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00Press-moulding glass
    • C03B2215/02Press-mould materials
    • C03B2215/08Coated press-mould dies
    • C03B2215/14Die top coat materials, e.g. materials for the glass-contacting layers
    • C03B2215/16Metals or alloys, e.g. Ni-P, Ni-B, amorphous metals
    • C03B2215/17Metals or alloys, e.g. Ni-P, Ni-B, amorphous metals comprising one or more of the noble meals, i.e. Ag, Au, platinum group metals
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00Press-moulding glass
    • C03B2215/02Press-mould materials
    • C03B2215/08Coated press-mould dies
    • C03B2215/30Intermediate layers, e.g. graded zone of base/top material
    • C03B2215/32Intermediate layers, e.g. graded zone of base/top material of metallic or silicon material
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00Press-moulding glass
    • C03B2215/02Press-mould materials
    • C03B2215/08Coated press-mould dies
    • C03B2215/30Intermediate layers, e.g. graded zone of base/top material
    • C03B2215/34Intermediate layers, e.g. graded zone of base/top material of ceramic or cermet material, e.g. diamond-like carbon
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00Press-moulding glass
    • C03B2215/40Product characteristics
    • C03B2215/41Profiled surfaces
    • C03B2215/412Profiled surfaces fine structured, e.g. fresnel lenses, prismatic reflectors, other sharp-edged surface profiles

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は光学ガラス素子の成形に
関し、高精度な光学ガラス素子をプレス成形する際に用
いる光学ガラス素子のプレス成形用型及びその金型の作
製方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to molding of an optical glass element, and more particularly to a mold for press-molding an optical glass element used for press-molding a high-precision optical glass element, and a method of manufacturing a mold therefor.

【0002】[0002]

【従来の技術】高精度な光学ガラス素子をプレス成形に
より、繰り返し成形するためには、型材料として高温で
も安定で、耐酸化性に優れ、ガラスに対して不活性であ
り、プレスした時に形状精度が崩れないような機械的強
度の優れたものが必要であるが、その反面、加工性に優
れ、精密加工が容易にできなくてはいけない。
2. Description of the Related Art In order to repeatedly mold a high-precision optical glass element by press molding, the mold material is stable even at high temperatures, has excellent oxidation resistance, is inert to glass, and has a shape when pressed. It is necessary to have a material having excellent mechanical strength so that the accuracy is not lost, but on the other hand, it must be excellent in workability and easy to perform precision processing.

【0003】以上のような光学ガラス素子のプレス成形
用型に必要な条件を、ある程度満足する型材として、チ
タンカーバイド(TiC)及び金属の混合材料(特開昭
59−121126号公報)や超硬合金母材上に貴金属
薄膜を形成したもの(特開昭62−96331号公報)
などが検討されている。
[0003] As a mold material which satisfies the above-mentioned conditions necessary for the press molding mold of an optical glass element to some extent, a mixed material of titanium carbide (TiC) and a metal (JP-A-59-121126) or a super hard Noble metal thin film formed on an alloy base material (JP-A-62-96331)
Are being studied.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、従来の
型材料では、上記の条件を全て満足するものは得られて
いない。例えば型材としてTiC及び金属の混合材料を
用いた場合では、非常に硬く、機械的強度は優れている
ものの、加工性に劣り、高精度な加工が困難である。さ
らには、光学ガラス素子の構成成分である鉛(Pb)や
アルカリ元素と反応しやすいという欠点を有している。
However, no conventional mold material has been obtained which satisfies all of the above conditions. For example, when a mixed material of TiC and a metal is used as a mold, it is very hard and has excellent mechanical strength, but is inferior in workability and difficult to perform high-precision processing. Further, it has a drawback that it easily reacts with lead (Pb) or an alkali element which is a component of the optical glass element.

【0005】また、超硬合金母材上に貴金属薄膜を形成
した型では、超硬合金をダイヤモンド砥石を用いて加工
を行うと、ダイヤモンド砥石の摩耗が激しく、精密な形
状加工が困難であり、特別な加工装置が必要である。ま
た、加工時間も長く、金型コストが非常に高いという問
題があった。
[0005] In a mold in which a noble metal thin film is formed on a cemented carbide base material, when the cemented carbide is machined using a diamond grindstone, the diamond grindstone is severely worn, and precise shape machining is difficult. Special processing equipment is required. Further, there is a problem that the processing time is long and the die cost is very high.

【0006】以上のように、従来の型材料では前述の型
材料としての必要条件を全て満足するには至っていな
い。
[0006] As described above, the conventional mold material has not yet satisfied all of the requirements for the mold material described above.

【0007】本発明はこのような従来の課題を解消し、
機械加工では困難な形状の光学ガラス素子を、繰り返し
プレス成形することが可能なプレス成形用型を提供する
ことを目的とする。
The present invention solves such a conventional problem,
An object of the present invention is to provide a press-molding die that can repeatedly press-mold an optical glass element having a shape that is difficult to machine.

【0008】[0008]

【課題を解決するための手段】この目的を達成するため
に、本発明ではWCを主成分とする超硬合金、TiCあ
るいはTiNを主成分とするサーメット、またはWC焼
結体からなる母材上に加工層としてSiまたはSiO2
薄膜を形成し、ドライエッチング法によって精密加工を
行った後、該薄膜上に保護層としてPt、Pd、Ir、
Rh、Os、Ru、Re、W、Taのうち少なくとも1
種類以上の金属を含む貴金属系合金薄膜を形成して構成
される金型を作製することによって、機械加工では困難
な形状の光学ガラス素子を成形するためのプレス成形用
型を提供するものである。
In order to achieve this object, the present invention provides a method for forming a base material comprising a cemented carbide containing WC as a main component, a cermet containing TiC or TiN as a main component, or a WC sintered body. Si or SiO 2 as a processing layer
After forming a thin film and performing precision processing by a dry etching method, Pt, Pd, Ir,
At least one of Rh, Os, Ru, Re, W, and Ta
By providing a mold formed by forming a noble metal-based alloy thin film containing more than one type of metal, a press-forming mold for forming an optical glass element having a shape difficult to machine by machining is provided. .

【0009】[0009]

【作用】本発明では、型母材にWCを主成分とする超硬
合金、TiCあるいはTiNを主成分とするサーメッ
ト、またはWC焼結体を用いることにより、プレス成形
に充分耐える強度を持たせ、加工層にSiまたはSiO
2薄膜を用い、該薄膜をドライエッチング法によって微
細加工することにより、加工層を機械加工では困難な形
状に加工することを可能とした。
According to the present invention, by using a cemented carbide containing WC as a main component, a cermet containing TiC or TiN as a main component, or a WC sintered body as a mold base material, the mold base material has sufficient strength to withstand press forming. , Si or SiO for processing layer
By using the two thin films and finely processing the thin films by dry etching, the processed layer can be processed into a shape that is difficult to machine.

【0010】さらに、保護層としてPt、Pd、Ir、
Rh、Os、Ru、Re、W、Taのうち少なくとも1
種類以上の金属を含む貴金属系合金薄膜を用いることに
よって、ガラスとの融着を防止したものである。従っ
て、本発明の型は、前記した型材料として要求される必
要条件を全て満足したものとなる。
Further, Pt, Pd, Ir,
At least one of Rh, Os, Ru, Re, W, and Ta
By using a noble metal-based alloy thin film containing more than one kind of metal, fusion with glass is prevented. Therefore, the mold of the present invention satisfies all the necessary conditions required as the mold material described above.

【0011】このようにして作製した本発明の型を用い
て、ガラスをプレス成形すると、機械加工では困難な形
状の光学ガラス素子を大量に製造することが可能とな
る。しかも、この型は、従来に比べて繰り返し使用可能
回数が大幅に増大しているので、従来プレス成形では得
られなかった光学ガラス素子を安価に、かつ大量に製造
することを可能にしたものである。
When glass is press-formed using the mold of the present invention thus produced, it becomes possible to mass-produce optical glass elements having a shape difficult to machine. In addition, since the number of times this mold can be repeatedly used is greatly increased as compared with the conventional one, it has made it possible to manufacture optical glass elements which could not be obtained by conventional press molding at low cost and in large quantities. is there.

【0012】[0012]

【実施例】以下、本発明の一実施例について図面を参照
しながら説明する。
An embodiment of the present invention will be described below with reference to the drawings.

【0013】図1は、本発明のプレス成形用型の一実施
例である回折格子のプレス成形用型を、その製造方法と
共に示すものである。
FIG. 1 shows a press-molding die for a diffraction grating, which is an embodiment of the press-molding die according to the present invention, together with a method of manufacturing the same.

【0014】まず、同図(a)に示すように直径20m
m、厚さ5mmの円板状の、WCを主成分とする超硬合
金母材11のプレス面となる一平面を、超微細なダイヤ
モンド砥粒を用いて鏡面に研磨した。
First, as shown in FIG.
A flat surface serving as a pressed surface of a disk-shaped hard metal preform 11 mainly composed of WC and having a thickness of 5 mm and a thickness of 5 mm was polished to a mirror surface using ultrafine diamond abrasive grains.

【0015】次に、同図(b)に示すようにこの鏡面上
にスパッタ法により1μmの厚みでSi薄膜12をコー
ティングし、その後、同図(c)に示すように、Si薄
膜12上にノボラック系フォトレジスト13を均一な厚
みで塗布し、プリベークを行なった。
Next, as shown in FIG. 2B, a 1 μm thick Si thin film 12 is coated on the mirror surface by sputtering, and then, as shown in FIG. A novolak-based photoresist 13 was applied with a uniform thickness, and prebaked.

【0016】次に、同図(d)に示す様にラインとスペ
ースの比が1対1で、ピッチ100μmのラインアンド
スペースパターンのフォトマスク14をフォトレジスト
13上に密着させ、水銀ランプを用いてフォトレジスト
を露光した後、現像、ポストベークにより、同図(e)
に示すようにフォトレジストのマスクを形成した。この
状態の型をRFプラズマドライエッチング装置の陰極上
に配置した。
Next, as shown in FIG. 1D, a line-and-space pattern photomask 14 having a line-to-space ratio of 1: 1 and a pitch of 100 μm is brought into close contact with the photoresist 13 and a mercury lamp is used. After the photoresist is exposed to light, development and post-baking are performed, as shown in FIG.
A photoresist mask was formed as shown in FIG. The mold in this state was placed on the cathode of the RF plasma dry etching apparatus.

【0017】そして、CF4のエッチングガスのRFプ
ラズマを発生させ、プラズマ中のCF3 +等のイオンを、
陰極上に配置した型に衝突させることで、フォトレジス
トマスクのない部分のSi薄膜12をエッチングした。
残ったレジストをO2プラズマアッシングにより除去
し、同図(f)に示すようにSi薄膜12に100μm
ピッチの凹凸の溝を形成した。
Then, an RF plasma of a CF 4 etching gas is generated, and ions such as CF 3 + in the plasma are generated.
By colliding with the mold placed on the cathode, the portion of the Si thin film 12 where there was no photoresist mask was etched.
The remaining resist was removed by O 2 plasma ashing, and a 100 μm thick Si thin film 12 was formed as shown in FIG.
Grooves with pitch irregularities were formed.

【0018】次に、同図(g)に示すように、この凹凸
上に、スパッタ法によりPt−Ir合金薄膜15を3μ
mの厚みでコーティングして回折格子のプレス成形用型
を作製した。また中間層にSiO2薄膜を用いた型も同
様の方法で作製した。
Next, as shown in FIG. 1G, a 3 μm thick Pt—Ir alloy thin film 15 is
m to form a diffraction grating press-molding die. A mold using an SiO 2 thin film for the intermediate layer was produced in the same manner.

【0019】以上のようにして、機械加工では作製する
ことが非常に困難である形状の回折格子のプレス成形用
型を容易に作製することができた。
As described above, it was possible to easily manufacture a press-molding mold for a diffraction grating having a shape that is very difficult to manufacture by machining.

【0020】次に、作製した回折格子のプレス成形用型
を用いて、ガラスを成形素材としてプレス成形する方法
について述べる。
Next, a method of press-forming glass as a forming material by using the press-forming mold for the diffraction grating produced will be described.

【0021】図2に本実施例で用いたプレス成形機の概
略図を示した。図2において21は上型用固定ブロッ
ク、22は上型用加熱ヒーター、23は上型、24はガ
ラス素材、25は下型、26は下型用加熱ヒーター、2
7は下型用固定ブロック、28は上型用熱電対、29は
下型用熱電対、210はプランジャー、211は位置決
め用センサー、212はストッパー、213は覆いであ
る。
FIG. 2 is a schematic view of the press molding machine used in this embodiment. In FIG. 2, 21 is an upper mold fixed block, 22 is an upper mold heater, 23 is an upper mold, 24 is a glass material, 25 is a lower mold, 26 is a lower mold heater, 2
7 is a fixed block for the lower mold, 28 is a thermocouple for the upper mold, 29 is a thermocouple for the lower mold, 210 is a plunger, 211 is a positioning sensor, 212 is a stopper, and 213 is a cover.

【0022】前述の方法で作製した回折格子のプレス成
形用型を上型23とし、下型25には、直径20mm、
厚さ5mmのWCを主成分とする超硬合金円板の平面部
分を鏡面に研磨した母材の表面に、スパッタ法により3
μmの厚みでPt−Ir合金薄膜を保護層として形成し
た平面型を用いた。この下型25の上に半径10mm、
厚さ1mmの円板形状に加工したSF系平板ガラス24
を置き、その上に上型23を置いて、そのまま500℃
まで昇温し、窒素雰囲気中で約40kg/cm2のプレス
圧により2分間圧力を保持し、その後、そのままの状態
で400℃まで冷却して、成形された光学ガラス素子を
取り出して、光学ガラス素子のプレス成形の工程を完了
する。
The press-molding mold for the diffraction grating produced by the above method is referred to as an upper mold 23, and the lower mold 25 has a diameter of 20 mm.
A flat surface of a 5 mm thick hard metal disc mainly composed of WC is polished to a mirror surface, and the surface of the base metal is sputtered onto the surface.
A flat type in which a Pt-Ir alloy thin film having a thickness of μm was formed as a protective layer was used. A radius of 10 mm is placed on the lower mold 25,
SF-based flat glass 24 processed into a disk shape with a thickness of 1 mm
And put the upper mold 23 on it,
And kept at a pressure of about 40 kg / cm 2 for 2 minutes in a nitrogen atmosphere, and then cooled to 400 ° C. as it was, and the molded optical glass element was taken out and the optical glass was removed. The step of press forming the element is completed.

【0023】以上の工程を繰り返して10000回目の
プレス終了時に、上下の型23及び25をプレス成形機
より取りはずして、プレス面の状態を光学顕微鏡で観察
し、その時のプレス面の表面粗さ(RMS値、Å)を測
定して、それぞれの型精度を評価した。
At the end of the 10000th press by repeating the above steps, the upper and lower dies 23 and 25 are removed from the press molding machine, the state of the press surface is observed with an optical microscope, and the surface roughness of the press surface at that time ( RMS values, Δ) were measured to evaluate the accuracy of each mold.

【0024】比較実験として、従来の型材料では本実施
例に示した高精度な回折格子形状に直接加工することが
できないので、従来使用されていたSiC焼結体の平板
型及び超硬合金母材上にPt薄膜を形成した型を作製
し、図2に示したプレス成形機にセットし、上述のプレ
ス成形の工程を10000回繰り返し行い、同様の型精
度の評価を行った。これらの結果を(表1)に示した。
As a comparative experiment, since the conventional mold material cannot be directly processed into the high-precision diffraction grating shape shown in the present embodiment, the flat type and the cemented carbide base of the conventionally used SiC sintered body were used. A mold in which a Pt thin film was formed on a material was prepared, set in the press molding machine shown in FIG. 2, and the above-described press molding process was repeated 10,000 times to evaluate the same mold accuracy. These results are shown in (Table 1).

【0025】[0025]

【表1】 [Table 1]

【0026】試料No.3のSiC焼結体で作製した型
は、50回のプレス成形によって上下両方の型共に表面
にガラスが付着し、それ以上ガラスをプレスすることが
できなかった。すなわちNo.3の型では、光学素子を
量産出来ないことがわかる。
Sample No. In the mold made of the SiC sintered body of No. 3, the glass adhered to the surface of both the upper and lower molds by 50 times of press molding, and the glass could not be further pressed. That is, No. It can be seen that the optical element cannot be mass-produced with the mold No. 3.

【0027】また、試料No.4のようにPtスパッタ
膜でコーティングした型では、ガラス付着は起こらない
が、10000回プレス後には、表面粗さ(RMS値)
で264.3Åと非常に粗くなり、表面が白濁し実用的でな
いことがわかる。
The sample No. In the mold coated with a Pt sputtered film as in No. 4, no glass adhesion occurs, but after pressing 10,000 times, the surface roughness (RMS value)
It turned out to be very coarse at 264.3 °, and the surface became cloudy, indicating that it was not practical.

【0028】一方、試料No.1及びNo.2の本実施
例の成形型は、繰り返し10000回プレスした時で
も、表面状態はほとんど変化せず、表面粗さはほとんど
プレス前と変化がなかった。すなわち、本発明の方法で
得られた回折格子のプレス成形用型を用いてガラス平板
をプレス成形することによって、回折格子のような機械
加工では作製することが困難な形状の光学ガラス素子を
大量にプレス成形することが可能となった。
On the other hand, the sample No. 1 and No. 1 In the mold of Example 2 of Example 2, the surface condition was hardly changed even after being repeatedly pressed 10,000 times, and the surface roughness was hardly changed from that before pressing. That is, a glass flat plate is press-formed using the press-forming mold for the diffraction grating obtained by the method of the present invention, so that a large number of optical glass elements having a shape that is difficult to manufacture by machining such as a diffraction grating. Press molding is now possible.

【0029】以上のように、本発明の型は前述した高精
度な光学ガラス素子を直接プレス成形するための必要条
件を全て満たし、これまで成形で作製できなかった回折
格子のような形状の光学ガラス素子を、大量にプレス成
形することが可能となった。
As described above, the mold of the present invention satisfies all of the requirements for directly press-molding the above-described high-precision optical glass element, and has an optical shape such as a diffraction grating which could not be produced by molding. It has become possible to press-mold glass elements in large quantities.

【0030】なお、本発明を説明するために、実施例に
おいて回折格子のプレス成形用型を用いたが、回折格子
以外の微細光学素子(例えばマイクロレンズアレイ、マ
イクロフレネルレンズなど)も成形可能となることは言
うまでもない。またプレス成形用型の母材として、WC
を主成分とする超硬合金を用いたが、TiNあるいはT
iCを主成分とするサーメットあるいはWC焼結体を母
材に用いてもまったく同様の結果が得られた。
Although a press mold for a diffraction grating is used in the embodiments to explain the present invention, a fine optical element (for example, a micro lens array, a micro Fresnel lens, etc.) other than the diffraction grating can be formed. Needless to say. In addition, WC is used as the base material for the press molding die.
Is used, but TiN or TN
Exactly the same results were obtained when a cermet or WC sintered body containing iC as a main component was used as a base material.

【0031】[0031]

【発明の効果】以上のように、本発明は光学ガラス素子
のプレス成形用型を作製するにあたり、母材として超硬
合金、サーメット及びWC焼結体を用い、該母材上に中
間層としてSiまたはSiO2薄膜を形成し、該薄膜を
ドライエッチング法により所望の形状に精密加工した
後、該薄膜上に保護層としてPt、Pd、Ir、Rh、
Os、Ru、Re、W、Taのうち少なくとも1種類以
上の金属を含む貴金属系合金薄膜を形成することによ
り、ガラス成形用型材料に要求される必要条件をすべて
満たした機械加工では作製することが困難な形状の光学
ガラス素子のプレス成形用型を提供したものであり、こ
の型を用いて光学ガラスを繰り返しプレス成形すること
によって、従来プレス成形では得られなかった形状の光
学ガラス素子を安価に、かつ、大量に製造することが可
能となった。
As described above, the present invention uses a cemented carbide, a cermet, and a WC sintered body as a base material in producing a press mold for an optical glass element, and forms an intermediate layer on the base material. After forming a Si or SiO 2 thin film and precisely processing the thin film into a desired shape by a dry etching method, Pt, Pd, Ir, Rh,
By forming a noble metal-based alloy thin film containing at least one kind of metal among Os, Ru, Re, W, and Ta, it can be manufactured by machining that satisfies all necessary conditions for a glass forming mold material. It provides a mold for press-forming optical glass elements with difficult-to-form shapes, and by repeatedly pressing optical glass using this mold, optical glass elements with shapes that could not be obtained by conventional press-forming are inexpensive. In addition, it has become possible to mass-produce.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例の回折格子のプレス成形用型
の製造工程図
FIG. 1 is a manufacturing process diagram of a press mold for a diffraction grating according to one embodiment of the present invention.

【図2】同回折格子の成形型を用いた回折格子のプレス
成形機の概略図
FIG. 2 is a schematic diagram of a press machine for forming a diffraction grating using the mold for forming the diffraction grating.

【符号の説明】[Explanation of symbols]

11 超硬合金母材 12 Si薄膜 13 フォトレジスト 14 フォトマスク 15 Pt−Ir合金薄膜 21 上型用固定ブロック 22 上型用加熱ヒーター 23 上型 24 ガラス素材 25 下型 26 下型用加熱ヒーター 27 下型用固定ブロック 28 上型用熱電対 29 下型用熱電対 210 プランジャー 211 位置決め用センサー 212 ストッパー 213 覆い DESCRIPTION OF SYMBOLS 11 Cemented carbide base material 12 Si thin film 13 Photoresist 14 Photomask 15 Pt-Ir alloy thin film 21 Upper die fixing block 22 Upper die heater 23 Upper die 24 Glass material 25 Lower die 26 Lower die heater 27 Lower Mold fixed block 28 Upper mold thermocouple 29 Lower mold thermocouple 210 Plunger 211 Positioning sensor 212 Stopper 213 Cover

───────────────────────────────────────────────────── フロントページの続き (72)発明者 片岡 秀直 大阪府門真市大字門真1006番地 松下電 器産業株式会社内 (56)参考文献 特開 平6−191863(JP,A) 特開 平5−24865(JP,A) 特開 平4−170331(JP,A) 特開 昭60−264333(JP,A) 特開 昭62−96331(JP,A) 特開 昭59−121126(JP,A) (58)調査した分野(Int.Cl.7,DB名) C03B 11/00 ──────────────────────────────────────────────────続 き Continuation of the front page (72) Inventor Hidenao Kataoka 1006 Oaza Kadoma, Kadoma City, Osaka Prefecture Matsushita Electric Industrial Co., Ltd. (56) References JP-A-6-1911863 (JP, A) JP-A-5-205 24865 (JP, A) JP-A-4-170331 (JP, A) JP-A-60-264333 (JP, A) JP-A-62-96331 (JP, A) JP-A-59-121126 (JP, A) (58) Field surveyed (Int. Cl. 7 , DB name) C03B 11/00

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】母材にタングステンカーバイド(WC)を
主成分とする超硬合金、チタンカーバイド(TiC)あ
るいはチタンナイトライド(TiN)を主成分とするサ
ーメット、またはWC焼結体を用い、該母材上に中間層
としてSiまたはSiO2薄膜を備え、該中間層上に白
金(Pt)、パラジウム(Pd)、イリジウム(I
r)、ロジウム(Rh)、オスミウム(Os)、ルテニ
ウム(Ru)、レニウム(Re)、タングステン
(W)、タンタル(Ta)のうち少なくとも1種類以上
の金属を含む貴金属系合金薄膜が形成されたことを特徴
とする光学ガラス素子のプレス成形用型。
1. A cemented carbide mainly containing tungsten carbide (WC), a cermet mainly containing titanium carbide (TiC) or titanium nitride (TiN), or a WC sintered body as a base material. A thin film of Si or SiO 2 is provided as an intermediate layer on a base material, and platinum (Pt), palladium (Pd), iridium (I
r), a noble metal-based alloy thin film containing at least one metal selected from the group consisting of rhodium (Rh), osmium (Os), ruthenium (Ru), rhenium (Re), tungsten (W), and tantalum (Ta). A press molding die for an optical glass element, characterized in that:
【請求項2】母材のタングステンカーバイド(WC)を
主成分とする超硬合金、チタンカーバイド(TiC)あ
るいはチタンナイトライド(TiN)を主成分とするサ
ーメット、またはWC焼結体上に、SiまたはSiO2
薄膜を形成し、該薄膜をドライエッチング法により所望
の形状に精密加工した後、該薄膜上に保護層としてP
t、Pd、Ir、Rh、Os、Ru、Re、W、Taの
うち少なくとも1種類以上の金属を含む貴金属系合金薄
膜を形成して作製することを特徴とする光学ガラス素子
のプレス成形用型の製造方法。
2. A cemented carbide mainly containing tungsten carbide (WC) as a base material, a cermet mainly containing titanium carbide (TiC) or titanium nitride (TiN), or a WC sintered body. Or SiO 2
A thin film is formed, and the thin film is precisely processed into a desired shape by a dry etching method.
A mold for press-molding an optical glass element, wherein the mold is formed by forming a noble metal-based alloy thin film containing at least one metal selected from the group consisting of t, Pd, Ir, Rh, Os, Ru, Re, W and Ta. Manufacturing method.
JP05067839A 1993-03-26 1993-03-26 Press mold for optical glass element and method for producing the same Expired - Fee Related JP3134583B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP05067839A JP3134583B2 (en) 1993-03-26 1993-03-26 Press mold for optical glass element and method for producing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP05067839A JP3134583B2 (en) 1993-03-26 1993-03-26 Press mold for optical glass element and method for producing the same

Publications (2)

Publication Number Publication Date
JPH06279036A JPH06279036A (en) 1994-10-04
JP3134583B2 true JP3134583B2 (en) 2001-02-13

Family

ID=13356527

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP3134583B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10039208A1 (en) * 2000-08-10 2002-04-18 Fraunhofer Ges Forschung Process for producing a tool that can be used to create optically effective surface structures in the sub-mum range, and a related tool
CN101182100B (en) 2006-11-13 2011-07-20 亚洲光学股份有限公司 Manufacturing method of glass molding core with microstructure and glass molding core

Also Published As

Publication number Publication date
JPH06279036A (en) 1994-10-04

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