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JP3135941B2 - High frequency thin film transformer and high frequency thin film inductor - Google Patents
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JP3135941B2 - High frequency thin film transformer and high frequency thin film inductor - Google Patents

High frequency thin film transformer and high frequency thin film inductor

Info

Publication number
JP3135941B2
JP3135941B2 JP03173556A JP17355691A JP3135941B2 JP 3135941 B2 JP3135941 B2 JP 3135941B2 JP 03173556 A JP03173556 A JP 03173556A JP 17355691 A JP17355691 A JP 17355691A JP 3135941 B2 JP3135941 B2 JP 3135941B2
Authority
JP
Japan
Prior art keywords
conductor
thin film
transformer
high frequency
frequency
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP03173556A
Other languages
Japanese (ja)
Other versions
JPH0521243A (en
Inventor
正人 三野
一彦 榊原
利明 谷内
章男 田子
佳一 柳沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
NTT Inc USA
Original Assignee
Nippon Telegraph and Telephone Corp
NTT Inc USA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp, NTT Inc USA filed Critical Nippon Telegraph and Telephone Corp
Priority to JP03173556A priority Critical patent/JP3135941B2/en
Publication of JPH0521243A publication Critical patent/JPH0521243A/en
Application granted granted Critical
Publication of JP3135941B2 publication Critical patent/JP3135941B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F17/00Fixed inductances of the signal type
    • H01F17/0006Printed inductances
    • H01F2017/0053Printed inductances with means to reduce eddy currents

Landscapes

  • Coils Or Transformers For Communication (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、コンバータやスイッチ
ング電源等に好適で、導電性パターンにより小形に構成
された高周波特性に優れる高周波用薄膜トランスおよび
高周波用薄膜インダクタに関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a high-frequency thin-film transformer and a high-frequency thin-film inductor which are suitable for a converter, a switching power supply and the like, and are formed in a small size by using a conductive pattern and have excellent high-frequency characteristics.

【0002】[0002]

【従来の技術】近年、電子機器構成部品の小形化・軽量
化の要請は厳しく、高品質な電力が得られるスイッチン
グ電源等においても小形化は必須の課題であり、スイッ
チング周波数の高周波化により、トランス,インダク
タ,コンデンサ等の部品を小さくすることで小形化が進
められてきた。半導体部品やコンデンサ部品では、LS
Iや積層セラミックコンデンサに代表されるように、早
くから薄膜技術が用いられ、構成部品小形化の要請に十
分応えてきた。一方、トランスやインダクタはこれまで
に最も小形化しにくく、また高周波化に伴う損失増加を
抑えることが難しいため、電源の小形化を妨げる第一の
原因であった。このため、現在、高周波スイッチング電
源の体積は、特にトランスによって決定されると言って
も過言ではない。そこで近年、高周波化に対応すべく薄
膜形成技術を用いた薄膜トランスの研究が進められ、ス
イッチング周波数をMHZ帯域まで高めた小形電源の開
発が強く望まれるようになった。
2. Description of the Related Art In recent years, there has been a severe demand for downsizing and weight reduction of electronic device components, and downsizing is an essential issue even in switching power supplies that can obtain high-quality power. Miniaturization has been promoted by making components such as transformers, inductors and capacitors smaller. For semiconductor parts and capacitor parts, LS
As represented by I and multilayer ceramic capacitors, thin-film technology has been used from an early stage and has sufficiently responded to the demand for downsizing of components. On the other hand, transformers and inductors have been most difficult to miniaturize so far, and it is difficult to suppress an increase in loss due to the increase in frequency. For this reason, it is no exaggeration to say that the volume of the high-frequency switching power supply is determined by the transformer in particular. In recent years, thin film transformers studies using thin film forming techniques to respond to high frequencies is advanced, began to develop small power with an increased switching frequency to MH Z bandwidth is highly desirable.

【0003】図3に従来の薄膜形成技術で作製された薄
膜トランスの構造模式図を示す。図中、1は基板、2は
絶縁層、3は磁性膜、4は1次導線、5は2次導線を示
している。従来、この種の薄膜トランスの作製は、以下
のように行われていた。すなわち、表面が絶縁性である
基板1上に、下部導体層をスパッタ等の薄膜形成手法で
成膜し、これをパターニングして帯状の下部導体を形成
し、この上に絶縁層2をフォトレジスト,SiO2,S
iO,Al23,ポリイミド樹脂等で形成し、これを平
坦化したのち磁性膜層をスパッタ等で形成し、パターニ
ングして長方形形状の磁性膜3としたのち、この上にふ
たたび絶縁層2を形成し、上部導体層形成後、パターニ
ングで帯状の上部導体を形成する。これら上部導体と下
部導体とはエッチングによるスルーホールを通して接続
され、磁性膜3を取り巻くように1次導線4、2次導線
5が構成され、トランスが作製される。
FIG. 3 is a schematic structural view of a thin film transformer manufactured by a conventional thin film forming technique. In the figure, 1 is a substrate, 2 is an insulating layer, 3 is a magnetic film, 4 is a primary conductor, and 5 is a secondary conductor. Conventionally, this type of thin film transformer has been manufactured as follows. That is, a lower conductor layer is formed on a substrate 1 having an insulating surface by a thin film forming method such as sputtering, and is patterned to form a strip-shaped lower conductor. , SiO 2 , S
It is formed of iO, Al 2 O 3 , polyimide resin or the like, flattened, and then a magnetic film layer is formed by sputtering or the like, and patterned to form a rectangular magnetic film 3. After forming the upper conductor layer, a strip-shaped upper conductor is formed by patterning. The upper conductor and the lower conductor are connected through a through hole formed by etching, and a primary conductor 4 and a secondary conductor 5 are formed so as to surround the magnetic film 3, and a transformer is manufactured.

【0004】図4は上記従来例の薄膜トランスの中心磁
性膜3と、1次導線4、2次導線5の構造を示す断面図
である。このような従来例の薄膜トランスによる高周波
化のポイントは、スパッタ等による薄膜形成技術を用い
て、薄い導体と磁性層を形成し高周波における渦電流損
を低減させることにあった。
FIG. 4 is a sectional view showing the structure of the central magnetic film 3 and the primary conductor 4 and the secondary conductor 5 of the above-mentioned conventional thin film transformer. The point of increasing the frequency by such a conventional thin film transformer is to reduce the eddy current loss at a high frequency by forming a thin conductor and a magnetic layer using a thin film forming technique such as sputtering.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、上記従
来の技術により、薄膜トランスの磁性層・導体層を単に
薄帯化するだけでは損失の低減は十分ではなく、スイッ
チング周波数が数MHZを越える領域で特性が著しく劣
化する問題がある。図5(中心磁性膜3のみの試料にお
ける漏れ磁束発生の模式図)に示すように、中心部のコ
ア内の磁束が、磁性体端部の反磁界により、導線3,4
と錯交する状態が出現する。その結果、薄帯状の導線
3,4に対して、平面方向から垂直に磁束が侵入するた
めに導線3,4内に渦電流が発生し、高周波における導
体抵抗が急激に増加する。さらに、図6(下部磁性膜6
付きの試料における漏れ磁束発生の模式図)に示すよう
に、インダクタンスを向上させるために、下部磁性層6
を設置した場合、さらに低い周波数から導体抵抗の増加
が現れる。この高周波における導体抵抗の増加は、Q
値,効率の著しい低下を来たし、使用できる周波数の上
限を決定する。
However [0007] By the conventional art, the reduction of just losses simply thin strip of a magnetic layer, the conductive layer of the thin film transformer is not sufficient, the area where the switching frequency exceeds several MH Z In this case, there is a problem that characteristics are significantly deteriorated. As shown in FIG. 5 (a schematic diagram of the generation of leakage magnetic flux in a sample having only the center magnetic film 3), the magnetic flux in the core at the center is changed by the demagnetizing field at the end of the magnetic material into the conductors 3 and 4.
And a state appears to be intersected. As a result, an eddy current is generated in the conductive wires 3 and 4 because magnetic flux penetrates perpendicularly from the plane direction into the thin conductive wires 3 and 4, and the conductor resistance at high frequencies increases rapidly. 6 (lower magnetic film 6).
In order to improve the inductance, as shown in FIG.
When the conductor is installed, the conductor resistance increases from a lower frequency. This increase in conductor resistance at high frequencies is due to Q
Values and efficiency are significantly reduced, and the upper limit of usable frequencies is determined.

【0006】本発明は、上記問題点を解決するためにな
されたものであり、その目的は、高周波における導体抵
抗の増加を低減し、使用できる周波数ならびに効率を向
上させることにある。
SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and an object of the present invention is to reduce an increase in conductor resistance at high frequencies and to improve usable frequencies and efficiency.

【0007】[0007]

【課題を解決するための手段】上記の目的を達成するた
め、本発明の高周波用薄膜トランスおよび高周波用薄膜
インダクタにおいては、それらの導線を構成している
状導体に導体長手方向のスリットを入れて、前記帯状導
の一部分あるいは全体を短冊状に細分化したことを特
徴としている。
In order to achieve the above object, in the high-frequency thin film transformer and the high-frequency thin film inductor of the present invention, the band forming the conductive wire is used.
A slit in the longitudinal direction of the conductor is inserted into the
It is characterized in that a part or the whole of the body is subdivided into strips .

【0008】[0008]

【作用】本発明の高周波用薄膜トランスおよび高周波用
薄膜インダクタでは、その薄膜トランスまたは薄膜イン
ダクタを構成する導体の一部分あるいは全体を短冊状の
導体に分割することにより、磁束の錯交する面の断面積
を減じ、渦電流の発生を低減し、高周波における導体抵
抗の増加を抑制して効率の向上および使用できる周波数
の高周波化を可能にしている。
In the high-frequency thin-film transformer and high-frequency thin-film inductor of the present invention, a part or the whole of the conductor constituting the thin-film transformer or the thin-film inductor is divided into strip-shaped conductors to cut off the surface where the magnetic flux intersects. The area is reduced, the generation of eddy current is reduced, the increase in conductor resistance at high frequencies is suppressed, and the efficiency can be improved and the usable frequency can be increased.

【0009】[0009]

【実施例】以下、本発明の実施例を、図面を参照して詳
細に説明する。図1(a),(b)は本発明の実施例を
示す平面図(a)およびそのA−A′断面図(b)であ
る。本実施例は、図4に示す従来例の導体が平板状の断
面形状を持つのに対し、導体を導体長手方向に短冊状に
分割して形成したものである。図中、1は基板、2は絶
縁層、3は中心磁性膜、4は一部を分割した1次導線、
5は一部を分割した2次導線、6は下部磁性膜である。
この実施例の作製方法は、図3に示した従来例と同様な
工程で行うが、導体層のパターニングの際にスリット入
れたマスクを使用することで、導線4,5を形成するた
めの導体層を部分的に短冊状に分割する。すなわち、基
板1上に磁性膜層をスパッタ等で形成し、パターニング
して長方形形状の下部磁性膜6としたのち、この上に絶
縁層2をフォトレジスト,SiO2,SiO,Al
23,ポリイミド樹脂等で形成し、これを平坦化したの
ち下部導体層をスパッタ等の薄膜形成手法で成膜し、こ
れをパターニングして帯状の下部導体を形成し、この上
にふたたび絶縁層2を上記同様に形成する。これを平坦
化したのち磁性膜層をスパッタ等で形成し、パターニン
グして長方形形状の中心磁性膜3としたのち、この上に
さらに絶縁層2を形成し、上部導体層形成後、パターニ
ングで帯状の上部導体を形成し、最後に絶縁層2を形成
する。これら上部導体と下部導体とはエッチングによる
スルーホールを通して接続され、中心磁性膜3を取り巻
くように1次導線4,2次導線5が構成され、トランス
が作製される。
Embodiments of the present invention will be described below in detail with reference to the drawings. 1A and 1B are a plan view showing an embodiment of the present invention and a sectional view taken along line AA 'of FIG. In the present embodiment, the conductor of the conventional example shown in FIG. 4 has a flat cross section, but is formed by dividing the conductor into strips in the longitudinal direction of the conductor. In the figure, 1 is a substrate, 2 is an insulating layer, 3 is a center magnetic film, 4 is a partially divided primary conductor,
Reference numeral 5 denotes a partially divided secondary conductor, and reference numeral 6 denotes a lower magnetic film.
The manufacturing method of this embodiment is performed in the same process as that of the conventional example shown in FIG. 3, but by using a mask provided with a slit when patterning the conductor layer, the conductors for forming the conductors 4 and 5 can be formed. The layer is partially divided into strips. That is, a magnetic film layer is formed on the substrate 1 by sputtering or the like, and is patterned to form a rectangular lower magnetic film 6, on which an insulating layer 2 is formed by photoresist, SiO 2 , SiO, Al
It is made of 2 O 3 , polyimide resin, etc., flattened, and then a lower conductor layer is formed by a thin film forming technique such as sputtering, and is patterned to form a strip-shaped lower conductor, which is then insulated again. Layer 2 is formed as described above. After flattening this, a magnetic film layer is formed by sputtering or the like, and patterned to form a rectangular central magnetic film 3. After that, an insulating layer 2 is further formed thereon, and an upper conductor layer is formed. Is formed, and finally the insulating layer 2 is formed. The upper conductor and the lower conductor are connected through a through-hole formed by etching, and the primary conductor 4 and the secondary conductor 5 are formed so as to surround the central magnetic film 3, thereby producing a transformer.

【0010】以上のように構成した一実施例の作用を述
べる。本実施例の高周波薄膜トランスでは、その薄膜ト
ランスを構成する1次導線4,2次導線5の導体部分の
うち各磁性膜3,6から成る磁性体の端部周辺の導体を
短冊状の導体に分割することにより、磁束の錯交する面
の断面積を減じている。このように断面積を減じると、
渦電流の発生は低減され、高周波における導体抵抗の増
加が抑制される。その結果、効率が向上するとともに、
高周波まで使用可能となる。
The operation of the embodiment constructed as described above will be described. In the high-frequency thin-film transformer of the present embodiment, the conductors around the ends of the magnetic material composed of the magnetic films 3 and 6 among the conductors of the primary conductor 4 and the secondary conductor 5 constituting the thin-film transformer are strip-shaped conductors. , The cross-sectional area of the plane where the magnetic flux intersects is reduced. When the cross-sectional area is reduced in this way,
The occurrence of eddy current is reduced, and the increase in conductor resistance at high frequencies is suppressed. As a result, efficiency is improved,
It can be used up to high frequencies.

【0011】以下に、上記した実施例の作用を図6の従
来例と比較して述べる。図2は薄膜トランスの1次巻線
(1次導線4)のインダクタンスの周波数特性および導
体抵抗について、上記2種のトランスについて比較した
ものである。図中(1)は図6の従来例の薄膜トランス
の場合、図中(2)は本実施例による薄膜トランスの場
合を示す。始めに、導体抵抗の値は低周波域でほぼ同一
であるが、(1)の従来例の薄膜トランスでは、1MH
Z付近から増加しはじめているのに対し、(2)の実施
例の薄膜トランスでは、数十MHZまで低抵抗を維持し
た後徐々に増加する程度である。一方、インダクタンス
についても、(1)の従来例の場合、導体抵抗の増加に
合わせて、数MHZ程度からインダクタンスが低下して
いるのに対し、(2)の実施例では数十MHZ程度まで
周波数特性が改善されている。Q値で評価すると、従来
例に比べ一桁以上向上していることが明らかである。
The operation of the above embodiment will be described below in comparison with the conventional example shown in FIG. FIG. 2 compares the frequency characteristics of inductance and the conductor resistance of the primary winding (primary conductor 4) of the thin film transformer for the two types of transformers. FIG. 1A shows the case of the conventional thin film transformer of FIG. 6, and FIG. 2B shows the case of the thin film transformer according to the present embodiment. Initially, the value of the conductor resistance is almost the same in the low frequency range, but in the conventional thin film transformer of (1), the value is 1 MHz.
Whereas the starting to increase from around Z, in the thin film transformer embodiment of (2) is the degree to which gradually increased and maintained a low resistance up to several tens MH Z. On the other hand, for the inductance, the conventional case of (1), in accordance with the increase of conductor resistance, to the order of several MH Z to inductance is reduced, several tens MH Z in the embodiment of (2) Up to frequency characteristics have been improved. When evaluated by the Q value, it is clear that the value is improved by one digit or more compared to the conventional example.

【0012】なお、上記実施例では、磁性体の端部周辺
の導体についてのみ、スリットを入れて導体の分割を行
ったが、導体全体を分割しても同様な効果が得られるこ
とは言うまでもない。また、本実施例の薄膜トランス構
造において2次巻線(2次導線)を有しない構造の薄膜
インダクタにおいても、導体の細分化により同様な効果
が得られることは明らかである。さらに、本発明は上記
構造以外の薄膜トランスや薄膜インダクタであって、磁
束と導線が錯交する状態の発生する構造のものに対し適
用可能であることは当然である。このように本発明は、
その主旨に沿って種々に応用され、種々の実施態様を取
り得るものである。
In the above embodiment, the conductor is divided by slitting only the conductor near the end of the magnetic body. However, it goes without saying that the same effect can be obtained by dividing the entire conductor. . It is apparent that the same effect can be obtained by subdividing the conductors even in a thin film inductor having no secondary winding (secondary conductor) in the thin film transformer structure of this embodiment. Further, the present invention is naturally applicable to a thin film transformer or a thin film inductor having a structure in which a magnetic flux and a conducting wire intersect with each other. Thus, the present invention
Various applications can be made along the gist and various embodiments can be taken.

【0013】[0013]

【発明の効果】以上の説明で明らかなように、本発明の
高周波用薄膜トランスおよび高周波用薄膜インダクタに
よれば、高周波における導体抵抗を低減することが可能
となり、高周波化・高効率化した特性を有する小形なト
ランスまたはインダクタを提供することが可能となる。
As is clear from the above description, according to the high-frequency thin film transformer and the high-frequency thin film inductor of the present invention, it is possible to reduce the conductor resistance at high frequencies, and to obtain the characteristics of higher frequency and higher efficiency. It is possible to provide a small transformer or inductor having the following.

【図面の簡単な説明】[Brief description of the drawings]

【図1】(a)は本発明の一実施例の構造を示す平面
図、(b)はその断面図
FIG. 1A is a plan view showing the structure of one embodiment of the present invention, and FIG.

【図2】上記実施例と従来例のインダクタンスおよび抵
抗の周波数依存性を示す比較特性図
FIG. 2 is a comparative characteristic diagram showing the frequency dependence of the inductance and resistance of the embodiment and the conventional example.

【図3】従来例の構造模式図FIG. 3 is a schematic structural view of a conventional example.

【図4】上記従来例の断面図FIG. 4 is a sectional view of the conventional example.

【図5】中心磁性膜のみの試料の漏れ磁束発生の模式図FIG. 5 is a schematic view of generation of leakage magnetic flux of a sample having only a center magnetic film.

【図6】下部磁性膜付き試料の漏れ磁束発生の模式図FIG. 6 is a schematic diagram of generation of leakage magnetic flux of a sample with a lower magnetic film.

【符号の説明】[Explanation of symbols]

1…基板、2…絶縁層、3…中心磁性膜、4…1次導
線、5…2次導線、6…下部磁性膜。
DESCRIPTION OF SYMBOLS 1 ... Substrate, 2 ... Insulating layer, 3 ... Central magnetic film, 4 ... Primary conductor, 5 ... Secondary conductor, 6 ... Lower magnetic film.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 田子 章男 東京都千代田区内幸町一丁目1番6号 日本電信電話株式会社内 (72)発明者 柳沢 佳一 東京都千代田区内幸町一丁目1番6号 日本電信電話株式会社内 (56)参考文献 特開 平2−166707(JP,A) 特開 昭58−130511(JP,A) 実開 昭59−36210(JP,U) (58)調査した分野(Int.Cl.7,DB名) H01F 30/00 - 38/42 ──────────────────────────────────────────────────続 き Continuation of the front page (72) Inventor Akio Tago 1-1-6 Uchisaiwaicho, Chiyoda-ku, Tokyo Nippon Telegraph and Telephone Corporation (72) Keiichi Yanagisawa 1-1-6 Uchisaiwaicho, Chiyoda-ku, Tokyo No. Nippon Telegraph and Telephone Corporation (56) References JP-A-2-166707 (JP, A) JP-A-58-130511 (JP, A) JP-A-59-36210 (JP, U) (58) Field (Int.Cl. 7 , DB name) H01F 30/00-38/42

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 一つまたは複数個の磁性膜層と1次導線
および2次導線から成る薄膜トランスにおいて、 前記1次導線および2次導線を帯状導体により構成し、 前記帯状導体に導体長手方向のスリットを入れて、前記
帯状導体 の一部分あるいは全体を短冊状に細分化したこ
とを特徴とする高周波用薄膜トランス。
1. A thin-film transformer comprising one or a plurality of magnetic film layers, a primary wire and a secondary wire, wherein the primary wire and the secondary wire are constituted by a band-shaped conductor, and the band-shaped conductor is provided in a conductor longitudinal direction. Put the slit of the above
A high-frequency thin-film transformer characterized in that a part or the whole of a strip conductor is subdivided into strips .
【請求項2】 一つまたは複数個の磁性膜層と導線から
成る薄膜インダクタにおいて、 前記導線を帯状導体により構成し、 前記帯状導体に導体長手方向のスリットを入れて、前記
帯状導体 の一部分あるいは全体を短冊状に細分化したこ
とを特徴とする高周波用薄膜インダクタ。
2. A thin-film inductor comprising one or a plurality of magnetic film layers and a conductive wire, wherein the conductive wire is formed of a band-shaped conductor, and a slit is formed in the band-shaped conductor in a conductor longitudinal direction.
A high-frequency thin film inductor characterized in that a part or the whole of a strip conductor is subdivided into strips .
JP03173556A 1991-07-15 1991-07-15 High frequency thin film transformer and high frequency thin film inductor Expired - Lifetime JP3135941B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP03173556A JP3135941B2 (en) 1991-07-15 1991-07-15 High frequency thin film transformer and high frequency thin film inductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP03173556A JP3135941B2 (en) 1991-07-15 1991-07-15 High frequency thin film transformer and high frequency thin film inductor

Publications (2)

Publication Number Publication Date
JPH0521243A JPH0521243A (en) 1993-01-29
JP3135941B2 true JP3135941B2 (en) 2001-02-19

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP03173556A Expired - Lifetime JP3135941B2 (en) 1991-07-15 1991-07-15 High frequency thin film transformer and high frequency thin film inductor

Country Status (1)

Country Link
JP (1) JP3135941B2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0814767B2 (en) * 1987-06-12 1996-02-14 株式会社クボタ Steering control device for automated vehicle
JP3614816B2 (en) * 2001-12-26 2005-01-26 松下電器産業株式会社 Magnetic element and power source using the same
TWI224798B (en) 2003-04-04 2004-12-01 Via Tech Inc Transformer formed between two layout layers
JP4867698B2 (en) 2007-02-20 2012-02-01 Tdk株式会社 Thin film magnetic device and electronic component module having the same
CN112992476B (en) * 2021-02-05 2022-08-12 合肥矽力杰半导体技术有限公司 Transformers, and Packaged Modules

Also Published As

Publication number Publication date
JPH0521243A (en) 1993-01-29

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