JP3139239B2 - Electroless composite plating bath - Google Patents
Electroless composite plating bathInfo
- Publication number
- JP3139239B2 JP3139239B2 JP05243707A JP24370793A JP3139239B2 JP 3139239 B2 JP3139239 B2 JP 3139239B2 JP 05243707 A JP05243707 A JP 05243707A JP 24370793 A JP24370793 A JP 24370793A JP 3139239 B2 JP3139239 B2 JP 3139239B2
- Authority
- JP
- Japan
- Prior art keywords
- plating
- electroless
- plating bath
- composite plating
- composite
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
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- Chemically Coating (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、フッ素樹脂等の水不溶
性微粒子又は短繊維を無電解(化学)めっきによりめっ
き皮膜の析出と同時にめっき皮膜中に共析複合させるた
めの無電解複合めっき浴に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electroless composite plating bath in which water-insoluble fine particles such as fluororesin or short fibers are co-deposited in a plating film simultaneously with the deposition of the plating film by electroless (chemical) plating. About.
【0002】[0002]
【従来の技術及び発明が解決しようとする課題】従来よ
り、無電解ニッケルめっき液等の無電解めっき液中にフ
ッ素樹脂、黒鉛、フッ化黒鉛、二硫化モリブデン、窒化
ホウ素等の微粒子や短繊維を分散した複合めっき浴を用
い、この複合めっき浴に被めっき物を浸漬することによ
り化学的に金属皮膜を析出させると同時にこの金属皮膜
中に微粒子や短繊維を共析させ、金属マトリックス中に
上記微粒子や短繊維が分散した複合めっき皮膜を形成す
ることが知られている。2. Description of the Related Art Fine particles and short fibers of fluorine resin, graphite, graphite fluoride, molybdenum disulfide, boron nitride, etc. have been conventionally used in an electroless plating solution such as an electroless nickel plating solution. A metal plating is chemically deposited by immersing the object to be plated in the composite plating bath, and fine particles and short fibers are co-deposited in the metal coating, and the metal matrix is dispersed in the metal matrix. It is known to form a composite plating film in which the fine particles and short fibers are dispersed.
【0003】例えば、ポリテトラフルオロエチレン(P
TFE)の微粒子を無電解Ni−Pめっき液中に分散し
た複合めっき浴に被めっき物を浸漬することにより、N
i−P合金マトリックス中にPTFE粒子が共析分散し
た複合めっき皮膜を被めっき物に形成することが知られ
ており、これによりNi−P合金にPTFE粒子の潤滑
性、耐摩耗性を付与した皮膜が得られ、この無電解Ni
−P/PTFE複合めっき皮膜は、摺動部材等の潤滑
性、耐摩耗性が要求される用途など、種々の用途に使用
されている。For example, polytetrafluoroethylene (P
By immersing the object to be plated in a composite plating bath in which fine particles of TFE) are dispersed in an electroless Ni-P plating solution,
It is known that a composite plating film in which PTFE particles are eutectoidally dispersed in an i-P alloy matrix is formed on an object to be plated, thereby imparting the lubricity and wear resistance of the PTFE particles to the Ni-P alloy. A film is obtained and this electroless Ni
The P / PTFE composite plating film is used for various applications such as applications requiring lubricity and wear resistance of sliding members and the like.
【0004】この場合、フッ素樹脂や黒鉛、フッ化黒鉛
等の撥水性粒子はめっき液に対する濡れ生に劣り、その
ままではめっき液中に分散させることができないので、
通常水溶性のカチオン性界面活性剤を分散助剤として使
用することにより撥水性粒子の分散性を向上させ、複合
めっきを行っている。In this case, water-repellent particles such as fluororesin, graphite, and fluorinated graphite are inferior in wettability to the plating solution and cannot be dispersed in the plating solution as it is.
Usually, a water-soluble cationic surfactant is used as a dispersing aid to improve the dispersibility of the water-repellent particles, and composite plating is performed.
【0005】しかし、従来用いられているカチオン性界
面活性剤を使用しためっき浴には、皮膜外観の不良が発
生したり、被めっき物の鋭角部分での析出ムラが発生し
たり等の問題点が多く、このため実際にめっき処理する
場合、めっき浴の組成やめっき条件、めっき方法に対し
て非常に厳しい制約や経験などによる難解なノウハウが
必要であり、特に現実的には無電解複合めっきをバレル
めっきや1m角以上の大型被めっき物へ適用することは
困難であった。[0005] However, the plating bath using a cationic surfactant which has been conventionally used has problems such as poor film appearance and uneven deposition at an acute angle portion of an object to be plated. Therefore, in the case of actual plating, very strict restrictions on the composition of the plating bath, plating conditions, and plating methods and difficult know-how based on experience are required. It was difficult to apply the method to barrel plating or a large plating object of 1 m square or more.
【0006】本発明は、上記事情に鑑みなされたもの
で、析出ムラが発生し難く、外観の良好な皮膜を容易に
得ることができ、バレルめっきや大型被めっき物の複合
めっきを可能とする無電解複合めっき浴を提供すること
を目的とする。SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and it is possible to easily obtain a film having a good appearance without causing uneven deposition, thereby enabling barrel plating and composite plating of a large plating object. An object of the present invention is to provide an electroless composite plating bath.
【0007】[0007]
【課題を解決するための手段及び作用】本発明者は、上
記目的を達成するため鋭意検討を重ねた結果、水不溶性
微粒子又は短繊維をカチオン性界面活性剤により分散さ
せ、金属めっき皮膜(マトリックス)中にこれら水不溶
性微粒子又は短繊維が分散複合した無電解複合めっき皮
膜をめっきするための無電解複合めっき浴において、カ
チオン性界面活性剤として下記式(1)で示される化合
物を使用することにより、無電解バレルめっきに適用し
たり、大型の被めっき物を無電解めっきした場合におい
ても、フッ素樹脂等の微粒子や短繊維を均一に共析分散
した外観の良好な複合めっき皮膜を析出ムラを生じさせ
ることなく容易確実に形成することができることを知見
した。The present inventors have made intensive studies to achieve the above object, and as a result, dispersed water-insoluble fine particles or short fibers with a cationic surfactant to form a metal plating film (matrix). A) a compound represented by the following formula (1) as a cationic surfactant in an electroless composite plating bath for plating an electroless composite plating film in which these water-insoluble fine particles or short fibers are dispersed and composited in Even when applied to electroless barrel plating or electroless plating of large-sized workpieces, a fine-grained composite plating film with uniform eutectoid dispersion of fine particles such as fluororesin and short fibers is uniformly deposited. It has been found that they can be easily and surely formed without causing the occurrence of a crack.
【0008】[0008]
【化2】 (但し、式中A1〜A9は水素原子又は低級アルキル基、
R1〜R8は水素原子、ヒドロキシル基又は低級アルキル
基、Xは原子量又は分子量100以下の陰イオンであ
り、nはXの原子価である。)Embedded image (Where A 1 to A 9 are a hydrogen atom or a lower alkyl group,
R 1 to R 8 are a hydrogen atom, a hydroxyl group or a lower alkyl group, X is an anion having an atomic weight or a molecular weight of 100 or less, and n is a valence of X. )
【0009】この場合、上記式(1)で示されるカチオ
ン性界面活性剤は、複合電気めっき浴に使用されること
は公知である(特公平4−28797号公報)。In this case, it is known that the cationic surfactant represented by the above formula (1) is used for a composite electroplating bath (Japanese Patent Publication No. 4-28797).
【0010】しかし、無電解複合めっき浴は、還元剤が
含有されているため、複合材(水不溶性微粒子や短繊
維)をめっき浴中に分散させるための分散剤(界面活性
剤)が還元剤の還元作用を受け、このため電気めっきに
用いられた分散剤を無電解めっきに使用した場合、複合
材をめっき浴中に均一に分散させることは可能である
が、得られる複合めっき皮膜の外観を不良にしたり(例
えば斑点やすじなどが生じる場合がある)、めっき析出
を害し、ムラづきを生じさせることがしばしば生じる。However, since the electroless composite plating bath contains a reducing agent, a dispersant (surfactant) for dispersing the composite material (water-insoluble fine particles and short fibers) in the plating bath is used as a reducing agent. When the dispersant used for electroplating is used for electroless plating, it is possible to uniformly disperse the composite material in the plating bath, but the appearance of the resulting composite plating film In some cases (for example, spots or streaks may occur), impair plating deposition, and cause unevenness.
【0011】実際、本発明者は、上記式(1)におい
て、従来より用いられ、市販されているXがヨウ素であ
る化合物を用いて無電解複合めっきを行った場合、電気
複合めっきであれば良好な複合めっき皮膜が得られ、ま
た無電解複合めっき浴への複合材の分散性や複合材のぬ
れ生は良好であったが、無電解複合めっきに用いる次亜
りん酸塩、ジメチルアミンボラン(DMAB)等の還元
剤の酸化と同時に起こる金属イオンの還元反応に対し
て、式(1)中のXがヨウ素などの大きい原子量である
こと、この還元反応に強く影響し、外観やつきまわりな
どに決定的な不良が発生し易いことを知見した。In fact, in the above formula (1), in the case of performing electroless composite plating using a compound that is conventionally used and is commercially available, wherein X is iodine, if the electro-composite plating is performed, Although a good composite plating film was obtained and the dispersibility of the composite material in the electroless composite plating bath and the wettability of the composite material were good, the hypophosphite and dimethylamine borane used for the electroless composite plating were good. X in the formula (1) has a large atomic weight, such as iodine, against the reduction reaction of metal ions that occurs simultaneously with the oxidation of a reducing agent such as (DMAB). It has been found that critical defects are likely to occur.
【0012】ところが、式(1)の化合物として、Xが
原子量又は分子量100以下の陰イオン、例えばフッ
素、塩素、臭素などであると、複合材のめっき浴への分
散性、複合材のぬれ性が良好であることはもとより、意
外にも無電解複合めっき皮膜の外観に悪影響を与えた
り、無電解めっき析出を阻害することがなく、外観が良
好でムラづきのない良好な無電解複合めっき皮膜を得る
ことができることを知見し、本発明をなすに至ったもの
である。However, when the compound of the formula (1) is an anion having an atomic weight or a molecular weight of 100 or less, for example, fluorine, chlorine, bromine, etc., the dispersibility of the composite material in the plating bath and the wettability of the composite material Good electroless composite plating film with good appearance and no unevenness, without adversely affecting the appearance of the electroless composite plating film or hindering the deposition of the electroless plating. It has been found that the present invention can be obtained, and the present invention has been accomplished.
【0013】従って、本発明は、水不溶性微粒子又は短
繊維をカチオン性界面活性剤により分散させてなる無電
解複合めっき浴において、上記カチオン性界面活性剤と
して上記式(1)で示される化合物を使用することを特
徴とする無電解複合めっき浴を提供する。Accordingly, the present invention provides an electroless composite plating bath in which water-insoluble fine particles or short fibers are dispersed with a cationic surfactant, wherein the compound represented by the above formula (1) is used as the cationic surfactant. An electroless composite plating bath characterized by being used.
【0014】以下、本発明について更に詳しく説明する
と、本発明の無電解複合めっき浴は、上述したように下
記式(1)で示されるカチオン性界面活性剤を用いるも
のである。Hereinafter, the present invention will be described in more detail. The electroless composite plating bath of the present invention uses a cationic surfactant represented by the following formula (1) as described above.
【0015】[0015]
【化3】 Embedded image
【0016】この式(1)中、A1〜A9は水素原子又は
メチル基、エチル基等の低級アルキル基、R1〜R8は水
素原子、ヒドロキシル基又はメチル基、エチル基等の低
級アルキル基、Xは原子量又は分子量100以下の陰イ
オン、例えばフッ素原子、塩素原子、臭素原子又は硫酸
基である。nはXの原子価であり、フッ素、塩素、臭素
のハロゲン原子の場合は1、硫酸基の場合は2であ
る。) この場合、上記式(1)のカチオン性界面活性剤の使用
量は500ppm以下、特に100〜300ppmの範
囲とすることが好ましい。In the formula (1), A 1 to A 9 represent a hydrogen atom or a lower alkyl group such as a methyl group or an ethyl group, and R 1 to R 8 represent a hydrogen atom, a hydroxyl group or a lower group such as a methyl group or an ethyl group. The alkyl group, X, is an anion having an atomic weight or molecular weight of 100 or less, for example, a fluorine atom, a chlorine atom, a bromine atom or a sulfate group. n is the valence of X, and is 1 for a halogen atom of fluorine, chlorine or bromine, and 2 for a sulfate group. In this case, the use amount of the cationic surfactant of the above formula (1) is preferably 500 ppm or less, particularly preferably in the range of 100 to 300 ppm.
【0017】本発明の無電解複合めっき浴は、無電解ニ
ッケルめっき液、コバルトめっき液、これらの合金めっ
き液等の無電解めっき液に複合材(水不溶性微粒子又は
短繊維)を上記式(1)のカチオン性界面活性剤により
分散してなるものであるが、無電解めっき液の組成は公
知の組成とすることができる。この場合、無電解ニッケ
ルめっき液、コバルトめっき液、これらの合金めっき液
には、還元剤として次亜リン酸塩やジメチルアミンボラ
ン等のホウ素系還元剤が用いられる。In the electroless composite plating bath of the present invention, a composite material (water-insoluble fine particles or short fibers) is added to an electroless plating solution such as an electroless nickel plating solution, a cobalt plating solution, or an alloy plating solution of the above formula (1). The composition of the electroless plating solution can be a known composition, although the composition is dispersed by the cationic surfactant of the above (1). In this case, a boron-based reducing agent such as hypophosphite or dimethylamine borane is used as a reducing agent in the electroless nickel plating solution, the cobalt plating solution, and the alloy plating solution thereof.
【0018】また、複合材は適宜選定され、例えばポリ
テトラフルオロエチレン等のフッ素樹脂、黒鉛、フッ化
黒鉛、二硫化モリブデン、窒化硼素などが挙げられ、複
合材の粒径は0.01〜30μm、特に0.1〜10μ
mの範囲が好ましい。なお、複合材の使用量は、通常
0.5〜50g/l、特に1〜10g/lとされる。The composite material is appropriately selected, for example, a fluororesin such as polytetrafluoroethylene, graphite, fluorinated graphite, molybdenum disulfide, boron nitride and the like. The particle size of the composite material is 0.01 to 30 μm. , Especially 0.1-10μ
The range of m is preferred. The amount of the composite used is usually 0.5 to 50 g / l, particularly 1 to 10 g / l.
【0019】更に、上記式(1)の界面活性剤を添加し
た無電解複合めっき浴は、特にpH4〜10のめっき浴
においてその効果を有効に発揮する。Further, the electroless composite plating bath to which the surfactant of the above formula (1) is added exhibits its effect particularly in a plating bath having a pH of 4 to 10.
【0020】なお、本発明の無電解複合めっき浴を用い
て無電解めっきする場合の条件は、通常のめっき条件と
することができる。The conditions for electroless plating using the electroless composite plating bath of the present invention can be ordinary plating conditions.
【0021】[0021]
【発明の効果】本発明の無電解複合めっき浴は、無電解
バレルめっきに適用したり、大型の被めっき物に適用し
た場合においても、外観が良好でムラづきのない無電解
複合めっき皮膜を与えるものである。The electroless composite plating bath of the present invention provides an electroless composite plating film having a good appearance and no unevenness even when applied to electroless barrel plating or to a large-sized workpiece. Is to give.
【0022】[0022]
【実施例】以下、実施例と比較例を示し、本発明を具体
的に示すが、本発明は下記の実施例に制限されるもので
はない。EXAMPLES The present invention will be specifically described below with reference to examples and comparative examples, but the present invention is not limited to the following examples.
【0023】〔実施例1,2、比較例1,2〕表1に示
すカチオン性界面活性剤を用いた下記組成の無電解複合
めっき浴を用いて1×1mのスチール板に下記条件で無
電解複合めっきを行い、約10μmの無電解複合めっき
皮膜を得た。得られためっき皮膜の外観、ムラづきの有
無を目視観察した結果を表1に示す。めっき液組成及び条件 PTFE微粒子(平均粒径0.2μm) 3g/l カチオン性界面活性剤 40ppm 硫酸ニッケル 20g/l クエン酸ニッケル 8g/l マロン酸ナトリウム 15g/l 次亜リン酸ナトリウム 20g/l 硫酸アンモニウム 10g/l pH 5.0 浴温 90℃ 撹拌 マイルドな機械撹拌[Examples 1 and 2, Comparative Examples 1 and 2] A 1 × 1 m steel plate was prepared on a 1 × 1 m steel plate under the following conditions using an electroless composite plating bath having the following composition using a cationic surfactant shown in Table 1. Electrolytic composite plating was performed to obtain an electroless composite plating film of about 10 μm. Table 1 shows the results of visual observation of the appearance of the plating film and the presence or absence of unevenness. Plating solution composition and conditions PTFE fine particles (average particle size 0.2 μm) 3 g / l cationic surfactant 40 ppm nickel sulfate 20 g / l nickel citrate 8 g / l sodium malonate 15 g / l sodium hypophosphite 20 g / l ammonium sulfate 10g / l pH 5.0 Bath temperature 90 ° C Stirring Mild mechanical stirring
【0024】[0024]
【表1】 [Table 1]
【0025】〔実施例3,4、比較例3,4〕上記実施
例1,2と同様なめっき浴、めっき条件で長さ50m
m,φ5mmの大きさのスチール製ボルトをバレルめっ
きした。この場合、バレルの回転数は20rpmとし、
60分間めっきを行った。[Examples 3 and 4, Comparative Examples 3 and 4] The same plating bath and plating conditions as those in Examples 1 and 2 were used, and the length was 50 m.
A steel bolt having a size of m and φ5 mm was barrel-plated. In this case, the rotation speed of the barrel is 20 rpm,
Plating was performed for 60 minutes.
【0026】得られためっき皮膜の外観及びムラづきの
有無を評価した結果を表2に示す。Table 2 shows the results of evaluating the appearance of the plating film and the presence or absence of unevenness.
【0027】[0027]
【表2】 [Table 2]
フロントページの続き (58)調査した分野(Int.Cl.7,DB名) C23C 18/00 - 18/54 Continuation of front page (58) Field surveyed (Int.Cl. 7 , DB name) C23C 18/00-18/54
Claims (1)
界面活性剤により分散させてなる無電解複合めっき浴に
おいて、上記カチオン性界面活性剤として下記式(1)
で示される化合物を使用することを特徴とする無電解複
合めっき浴。 【化1】 (但し、式中A1〜A9は水素原子又は低級アルキル基、
R1〜R8は水素原子、ヒドロキシル基又は低級アルキル
基、Xは原子量又は分子量100以下の陰イオンであ
り、nはXの原子価である。)1. An electroless composite plating bath in which water-insoluble fine particles or short fibers are dispersed with a cationic surfactant, wherein the cationic surfactant is represented by the following formula (1):
An electroless composite plating bath characterized by using a compound represented by the formula: Embedded image (Where A 1 to A 9 are a hydrogen atom or a lower alkyl group,
R 1 to R 8 are a hydrogen atom, a hydroxyl group or a lower alkyl group, X is an anion having an atomic weight or a molecular weight of 100 or less, and n is a valence of X. )
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP05243707A JP3139239B2 (en) | 1993-09-03 | 1993-09-03 | Electroless composite plating bath |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP05243707A JP3139239B2 (en) | 1993-09-03 | 1993-09-03 | Electroless composite plating bath |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0770758A JPH0770758A (en) | 1995-03-14 |
| JP3139239B2 true JP3139239B2 (en) | 2001-02-26 |
Family
ID=17107793
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP05243707A Expired - Fee Related JP3139239B2 (en) | 1993-09-03 | 1993-09-03 | Electroless composite plating bath |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3139239B2 (en) |
-
1993
- 1993-09-03 JP JP05243707A patent/JP3139239B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0770758A (en) | 1995-03-14 |
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