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JP3149503B2 - Plasma cleaning equipment for substrates - Google Patents
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JP3149503B2 - Plasma cleaning equipment for substrates - Google Patents

Plasma cleaning equipment for substrates

Info

Publication number
JP3149503B2
JP3149503B2 JP3593292A JP3593292A JP3149503B2 JP 3149503 B2 JP3149503 B2 JP 3149503B2 JP 3593292 A JP3593292 A JP 3593292A JP 3593292 A JP3593292 A JP 3593292A JP 3149503 B2 JP3149503 B2 JP 3149503B2
Authority
JP
Japan
Prior art keywords
substrate
flange
mounting portion
conveyor
casing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP3593292A
Other languages
Japanese (ja)
Other versions
JPH05235144A (en
Inventor
勇 森迫
哲博 岩井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Corp, Matsushita Electric Industrial Co Ltd filed Critical Panasonic Corp
Priority to JP3593292A priority Critical patent/JP3149503B2/en
Publication of JPH05235144A publication Critical patent/JPH05235144A/en
Application granted granted Critical
Publication of JP3149503B2 publication Critical patent/JP3149503B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/0711Apparatus therefor
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/01Manufacture or treatment
    • H10W72/015Manufacture or treatment of bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/01Manufacture or treatment
    • H10W72/015Manufacture or treatment of bond wires
    • H10W72/01571Cleaning, e.g. oxide removal or de-smearing
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/075Connecting or disconnecting of bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/075Connecting or disconnecting of bond wires
    • H10W72/07511Treating the bonding area before connecting, e.g. by applying flux or cleaning
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/751Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
    • H10W90/754Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked insulating package substrate, interposer or RDL

Landscapes

  • Cleaning In General (AREA)
  • Control Of Conveyors (AREA)
  • Drying Of Semiconductors (AREA)
  • Wire Bonding (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は基板のプラズマクリーニ
ング装置に係り、詳しくは基板をプラズマ発生用ケーシ
ングに出し入れするための載置部や基板搬送手段の組付
構造に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plasma cleaning apparatus for a substrate, and more particularly, to an assembling structure of a mounting portion for transferring a substrate into and out of a casing for plasma generation and a substrate transfer means.

【0002】[0002]

【従来の技術】電子部品が搭載される基板の製造工程に
おいて、基板に搭載された半導体チップの電極と、基板
の電極とをワイヤで接続することが行われる。このよう
なワイヤボンディング工程において、基板の電極に不純
物が付着していると、ワイヤを電極にしっかり接合させ
ることはできない。この不純物としては、作業者が基板
を手で取り扱った場合に付着する手脂、空気中に浮遊す
るガス化したオイル、電極表面に自然形成される酸化
膜、空気中の酸素やチッソ等のガス吸着膜等がある。
2. Description of the Related Art In a manufacturing process of a substrate on which electronic components are mounted, an electrode of a semiconductor chip mounted on the substrate and an electrode of the substrate are connected by wires. In such a wire bonding step, if impurities are attached to the electrodes of the substrate, the wires cannot be firmly bonded to the electrodes. These impurities include hand grease that adheres when workers handle the substrate by hand, gasified oil that floats in the air, oxide films that are naturally formed on the electrode surface, and gases such as oxygen and nitrogen in the air. There are adsorption films and the like.

【0003】ワイヤボンディングに先立って、このよう
な不純物を除去するための手段として、本出願人は先
に、プラズマクリーニング装置を提案した(特開平3−
159143号)。このものは、特にその図1及び図2
に示されるように、第1のコンベヤ17により搬送され
てきた基板20を、受渡し手段21により載置部10上
に転載し、この載置部10をケーシング1内に進入させ
て蓋部材11により開口部2を密閉した後、ケーシング
1内にArガス等のプラズマを発生させて、基板20の
表面をクリーニングし、次いで載置部10をケーシング
1から引出し、載置部10上の基板20を受渡し手段2
1により第2のコンベヤ18に転載し、次の工程へ搬送
するようになっていた。
As a means for removing such impurities prior to wire bonding, the present applicant has previously proposed a plasma cleaning apparatus (Japanese Unexamined Patent Publication No. Hei.
No. 159143). This is particularly the case in FIGS. 1 and 2
As shown in FIG. 2, the substrate 20 conveyed by the first conveyor 17 is transferred onto the receiver 10 by the transfer means 21, the receiver 10 is advanced into the casing 1, and After closing the opening 2, plasma such as Ar gas is generated in the casing 1 to clean the surface of the substrate 20, and then the mounting portion 10 is pulled out of the casing 1, and the substrate 20 on the mounting portion 10 is removed. Delivery means 2
1, the paper is transferred to the second conveyor 18 and transported to the next step.

【0004】[0004]

【発明が解決しようとする課題】上記プラズマクリーニ
ング装置にあっては、載置部10、第1のコンベヤ1
7、第2のコンベヤ18、受渡し手段21はそれぞれ別
個に組みたてられるようになっていた。しかしながらこ
れら手段10、17、18、21を別個に組み立てる
と、かなり大きな組付誤差が生じ、その結果受渡し手段
21による第1のコンベヤ17から載置部10、及び載
置部10から第2のコンベヤ18への基板20の受渡し
ミスを生じやすい問題点があった。
In the above-described plasma cleaning apparatus, the mounting section 10, the first conveyor 1
7, the second conveyor 18 and the delivery means 21 are separately assembled. However, when these means 10, 17, 18, 21 are assembled separately, a considerably large assembling error occurs, and as a result, the first conveyor 17 to the receiver 10 and the second to the second receiver 10 by the transfer means 21. There was a problem that the delivery error of the substrate 20 to the conveyor 18 was likely to occur.

【0005】また上記従来手段のように、載置部10と
一体的に蓋部材11を設け、この載置部10の出入りに
より、ケーシング1の開口部2を開閉するよう構成した
場合、同様の組付誤差のために蓋部材11により開口部
2をしっかり密閉できず、ケーシング1の気密性が損な
われやすい問題点があった。
In the case where a lid member 11 is provided integrally with the receiver 10 and the opening 2 of the casing 1 is opened and closed by entering and exiting the receiver 10 as in the above-mentioned conventional means, the same applies. Due to an assembly error, the opening 2 cannot be tightly closed by the lid member 11, and there is a problem that the airtightness of the casing 1 is easily impaired.

【0006】したがって本発明は、上記従来手段の問題
点を解消できるプラズマクリーニング装置を提供するこ
とを目的とする。
Accordingly, an object of the present invention is to provide a plasma cleaning apparatus which can solve the above-mentioned problems of the conventional means.

【0007】[0007]

【課題を解決するための手段】このために本発明は、載
置部、第1のコンベヤ、第2のコンベヤ及び受渡し手段
を位置決めして装着する装着部を、プラズマ発生用ケー
シングに装着されたフランジに設けて、これらの手段を
このフランジに一体的に組み付けるようにしている。
According to the present invention, a mounting portion for positioning and mounting a mounting portion, a first conveyor, a second conveyor and a delivery means is mounted on a plasma generating casing. A flange is provided so that these means can be integrally assembled to the flange.

【0008】[0008]

【作用】上記構成によれば、各手段は同一フランジに一
体的に組付けられるので、各々の組付誤差をほぼ解消す
ることができ、基板の受渡しを確実に行うことができ
る。
According to the above construction, since each means is integrally mounted on the same flange, each mounting error can be substantially eliminated, and the transfer of the substrate can be performed reliably.

【0009】[0009]

【実施例】次に、図面を参照しながら本発明の実施例を
説明する。図1はプラズマクリーニング装置の全体斜視
図である。1は円筒形のケーシングであり、その上部に
はArガスのようなプラズマ発生用ガスを供給するパイ
プ2が立設されている。8はケーシング1を設置する本
体ボックスである。3はケーシング1の前面に装着され
たフランジであり、以下に述べる構成部品が組付けられ
ている。
Next, an embodiment of the present invention will be described with reference to the drawings. FIG. 1 is an overall perspective view of the plasma cleaning apparatus. Reference numeral 1 denotes a cylindrical casing, and a pipe 2 for supplying a plasma generating gas such as Ar gas is provided upright on the upper part of the casing. Reference numeral 8 denotes a main body box in which the casing 1 is installed. Reference numeral 3 denotes a flange mounted on the front surface of the casing 1, to which components described below are attached.

【0010】10はフランジ3にスリット状に開口され
た開口部4から出入りするアルミ板から成る載置部であ
って、その後部には開口部4の蓋部材11が装着されて
いる。蓋部材11は、ナット部12に立設されたブラケ
ット14に支持されている。13はこのナット部12が
螺合する送りねじ、15はその駆動用モータであり、モ
ータ15が駆動すると、ナット部12は送りねじ13に
沿ってY方向に移動し、載置部10は開口部4からケー
シング1の内部に出入りする。また蓋部材11は載置部
10と一体的に移動し、開口部4を開閉する。すなわち
ナット部12と送りねじ13は、載置部10をY方向に
往復移動させる移動手段を構成している。図5におい
て、29は開口部4を密閉するパッキンである。
Reference numeral 10 denotes a mounting portion made of an aluminum plate which enters and exits from an opening 4 formed in the flange 3 in a slit shape, and a lid member 11 of the opening 4 is attached to a rear portion thereof. The lid member 11 is supported by a bracket 14 erected on the nut 12. Reference numeral 13 denotes a feed screw with which the nut portion 12 is screwed. Reference numeral 15 denotes a drive motor for driving the nut portion. When the motor 15 is driven, the nut portion 12 moves in the Y direction along the feed screw 13 and the mounting portion 10 is opened. It goes in and out of the casing 1 from the part 4. In addition, the lid member 11 moves integrally with the placement unit 10 to open and close the opening 4. That is, the nut part 12 and the feed screw 13 constitute a moving means for reciprocating the mounting part 10 in the Y direction. In FIG. 5, reference numeral 29 denotes a packing for sealing the opening 4.

【0011】図1において、9は蓋部材11の両側部に
装着されたブラケットであり、ガイドロッド16が取り
付けられている。17、18は、載置部10を挟んで、
この載置部10と交差する方向に配設されたコンベヤで
あって、基板20を上記載置部10の移動方向であるY
方向と直交するX方向に搬送する(図4も参照)。19
は基板20を停止させるストッパーである。21は基板
20の受渡し手段であって、横長のホルダー22と、こ
のホルダー22に配設されたタイミングベルト23と、
このタイミングベルト23に保持された駆動部25と、
この駆動部25に駆動されて昇降する吸着パッド24
と、タイミングベルト23の駆動用モータ26から成っ
ている。吸着パッド24はコンベヤ17と載置部10の
間、及び載置部10とコンベヤ18の間をX方向に往復
動し、基板20を吸着して受渡しする。
In FIG. 1, reference numerals 9 denote brackets mounted on both sides of the lid member 11, on which guide rods 16 are mounted. 17, 18 sandwich the mounting portion 10,
This is a conveyor arranged in a direction intersecting with the mounting portion 10, and the substrate 20 is moved in the Y direction which is the moving direction of the mounting portion 10.
It is transported in the X direction perpendicular to the direction (see also FIG. 4). 19
Is a stopper for stopping the substrate 20. Reference numeral 21 denotes a delivery unit for transferring the substrate 20, which includes a horizontally long holder 22, a timing belt 23 provided in the holder 22,
A drive unit 25 held by the timing belt 23;
The suction pad 24 driven up and down by the drive unit 25
And a drive motor 26 for the timing belt 23. The suction pad 24 reciprocates in the X direction between the conveyor 17 and the placement unit 10 and between the placement unit 10 and the conveyor 18 to suck and transfer the substrate 20.

【0012】図2は上記各手段10、17、18、21
のフランジ3への組み付け手段を示している。31はフ
ランジ3に装着されたスライドベアリングであり、上記
ガイドロッド16をこのスライドベアリング31に挿入
することにより、載置部10はフランジ3に組付けられ
る。32は上記コンベヤ17、18が支持されたL字形
のブラケットであり、図3に示すようにフランジ3の両
側下部に突設されたピン33にその上面を当接させて位
置決めし、ねじ34を孔部35に螺入することによりフ
ランジ3に組付けられる。36はフランジ3の上部に突
設されたピンであり、上記受渡し手段21はそのホルダ
ー22の下面をこのピン36に載置し、ねじ34を螺入
することによりフランジ3に組付けられる。
FIG. 2 shows the above means 10, 17, 18, 21.
2 shows an assembling means to the flange 3. Reference numeral 31 denotes a slide bearing mounted on the flange 3, and the mounting portion 10 is assembled to the flange 3 by inserting the guide rod 16 into the slide bearing 31. Reference numeral 32 denotes an L-shaped bracket on which the above-mentioned conveyors 17 and 18 are supported. As shown in FIG. It is assembled to the flange 3 by screwing into the hole 35. Reference numeral 36 denotes a pin protruding from the upper part of the flange 3. The delivery means 21 is mounted on the flange 3 by placing the lower surface of the holder 22 on the pin 36 and screwing a screw 34 into the pin.

【0013】図2において、37はL字板であり、フラ
ンジ3の下部に取り付けられている。38はフランジ3
に突設されたピンであり、L字板37の上面に当接す
る。このフランジ3は、L字板37を介して上記本体ボ
ックス8に組み付けられる。このように上記各手段1
0、17、18、21は、フランジ3に設けられたスラ
イドベアリング31、ピン33、36、孔部35等の装
着部に位置決めして、フランジ3に一体的に組付けられ
るので、組付誤差をきわめて小さくすることができる。
In FIG. 2, reference numeral 37 denotes an L-shaped plate, which is attached to a lower portion of the flange 3. 38 is the flange 3
, And comes into contact with the upper surface of the L-shaped plate 37. The flange 3 is assembled to the main body box 8 via an L-shaped plate 37. Thus, each of the above means 1
0, 17, 18 and 21 are positioned on mounting portions such as the slide bearing 31, pins 33 and 36, and the hole 35 provided on the flange 3 and are integrally mounted on the flange 3, so that an assembling error is caused. Can be made extremely small.

【0014】このプラズマクリーニング装置の動作は、
上記特開平3−159143号のものと同様であり、以
下その動作を説明する。図1及び図4において、コンベ
ヤ17により搬送されてきた基板20は、ストッパー1
9に当たって停止する。そこで受渡し手段21の吸着パ
ッド24はこの基板20を吸着してテイクアップし、載
置部10に移載する(図5参照)。このとき載置部10
は、モータ15が駆動することにより、ケーシング1へ
向かってピッチ送りされており、このピッチ送りに同期
して、吸着パッド24がコンベヤ17と載置部10の間
を往復して基板20を載置部10に移載することによ
り、基板20は載置部10に1枚ずつ順に整列して搭載
される。
The operation of this plasma cleaning apparatus is as follows.
The operation is similar to that of the above-mentioned Japanese Patent Application Laid-Open No. 3-159143, and its operation will be described below. 1 and 4, the substrate 20 conveyed by the conveyor 17 is a stopper 1
Stop at 9 Then, the suction pad 24 of the transfer means 21 sucks and takes up the substrate 20 and transfers it to the mounting portion 10 (see FIG. 5). At this time, the receiver 10
Is driven toward the casing 1 by driving the motor 15, and the suction pad 24 reciprocates between the conveyor 17 and the mounting portion 10 to mount the substrate 20 in synchronization with the pitch feeding. By transferring the substrate 20 to the mounting portion 10, the substrates 20 are sequentially aligned and mounted on the mounting portion 10 one by one.

【0015】このようにして多数枚の基板20が搭載さ
れると、載置部10はケーシング1内に完全に進入し、
蓋部材11は開口部4を閉鎖する(図6参照)。次いで
真空ポンプ(図外)が作動し、ケーシング1内は減圧さ
れるとともに、ケーシング1内にArガスが供給され、
次いでケーシング1の電極部に高周波交流電圧が印加さ
れることにより、ケーシング1の内部にプラズマが発生
する。この時、Arガスの一部はイオン化し、Arガス
分子や、イオン化したAr+、マイナス電子はケーシン
グ1内を激しく高速運動し、基板20の表面に衝突して
電極部に付着する不純物を除去し、除去された不純物は
真空ポンプに吸引除去される。
When a large number of substrates 20 are mounted in this way, the mounting portion 10 completely enters the casing 1 and
The lid member 11 closes the opening 4 (see FIG. 6). Next, a vacuum pump (not shown) is operated to reduce the pressure inside the casing 1 and supply Ar gas into the casing 1.
Next, plasma is generated inside the casing 1 by applying a high-frequency AC voltage to the electrode portion of the casing 1. At this time, a part of the Ar gas is ionized, and the Ar gas molecules and the ionized Ar + and minus electrons move violently at high speed in the casing 1 to collide with the surface of the substrate 20 to remove impurities adhering to the electrode portion. The removed impurities are sucked and removed by a vacuum pump.

【0016】このようにして不純物を除去したならば、
バルブ(図外)を開いてケーシング1内を常圧にもど
す。次いで載置部10を先程と逆方向にピッチ送りして
ケーシング1から引き出す。この時、このピッチ送りに
同期して、吸着パッド24は載置部10とコンベヤ18
の間を往復し、基板20をコンベヤ18に受渡し、次に
ワイヤボンディング工程へ搬送する。上記動作におい
て、載置部10、コンベヤ17、18、受渡し手段21
等はフランジ3に組付誤差なく正確に組付けられている
ので、基板20の受渡しを確実に行うことができる。ま
た図5に示すように蓋部材11が閉じた状態で、パッキ
ン9はフランジ3にしっかり当接し、開口部を完全に密
閉できる。
After the impurities have been removed in this manner,
Open the valve (not shown) to return the inside of the casing 1 to normal pressure. Next, the mounting portion 10 is pitch-fed in the direction opposite to the previous direction and is pulled out of the casing 1. At this time, in synchronism with the pitch feed, the suction pad 24 moves the placement unit 10 and the conveyor 18.
The substrate 20 is transferred to the conveyor 18 and then transferred to a wire bonding step. In the above operation, the placing section 10, the conveyors 17, 18, the delivery means 21
And the like are accurately assembled to the flange 3 without an assembly error, so that the substrate 20 can be reliably delivered. Also, as shown in FIG. 5, with the lid member 11 closed, the packing 9 firmly contacts the flange 3 and the opening can be completely sealed.

【0017】[0017]

【発明の効果】以上説明したように本発明は、載置部、
第1のコンベヤ、第2のコンベヤ及び受渡し手段を位置
決めして装着する装着部をフランジに設けて、これらの
手段をこのフランジに一体的に組み付けるようにしてい
るので、各々の組付誤差をほぼ解消することができ、受
渡し手段による基板の受渡しを確実に行うことができ
る。
As described above, according to the present invention, the mounting portion,
A mounting portion for positioning and mounting the first conveyor, the second conveyor, and the delivery means is provided on the flange, and these means are integrally mounted on the flange. Thus, the delivery of the substrate by the delivery means can be reliably performed.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係るプラズマクリーニング装置の斜視
FIG. 1 is a perspective view of a plasma cleaning apparatus according to the present invention.

【図2】本発明に係るプラズマクリーニング装置の要部
分解図
FIG. 2 is an exploded view of a main part of the plasma cleaning apparatus according to the present invention.

【図3】本発明に係るプラズマクリーニング装置の要部
側面図
FIG. 3 is a side view of a main part of the plasma cleaning apparatus according to the present invention.

【図4】本発明に係るプラズマクリーニング装置の部分
平面図
FIG. 4 is a partial plan view of the plasma cleaning apparatus according to the present invention.

【図5】本発明に係るプラズマクリーニング装置の部分
側面図
FIG. 5 is a partial side view of the plasma cleaning apparatus according to the present invention.

【図6】本発明に係るプラズマクリーニング装置の部分
断面図
FIG. 6 is a partial sectional view of a plasma cleaning apparatus according to the present invention.

【符号の説明】[Explanation of symbols]

1 ケーシング 3 フランジ 4 開口部 10 載置部 17 第1のコンベヤ 18 第2のコンベヤ 20 基板 21 受渡し手段 31 装着部 33 装着部 35 装着部 36 装着部 DESCRIPTION OF SYMBOLS 1 Casing 3 Flange 4 Opening 10 Mounting | placing part 17 1st conveyor 18 2nd conveyor 20 Substrate 21 Delivery means 31 Mounting part 33 Mounting part 35 Mounting part 36 Mounting part

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI H01L 21/60 301 H01L 21/302 N (58)調査した分野(Int.Cl.7,DB名) H01L 21/68 H01L 21/304 645 H01L 21/304 648 ──────────────────────────────────────────────────続 き Continuation of the front page (51) Int.Cl. 7 identification code FI H01L 21/60 301 H01L 21/302 N (58) Investigated field (Int.Cl. 7 , DB name) H01L 21/68 H01L 21 / 304 645 H01L 21/304 648

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】プラズマを発生させるケーシングと、この
ケーシングに装着されたフランジと、このフランジの前
方に設けられて、このフランジに形成された開口部から
出入する基板の載置部と、この載置部に基板を搬送する
第1のコンベヤと、この載置部から基板を搬出する第2
のコンベヤと、この載置部とこの第1のコンベヤ及び第
2のコンベヤ間に基板を受渡しする受渡し手段とがあ
り、上記載置部、第1のコンベヤ、第2のコンベヤ及び
受渡し手段を位置決めして装着する装着部を上記フラン
ジに設けてこのフランジに一体的に組付けたことを特徴
とする基板のプラズマクリーニング装置。
1. A casing for generating plasma, a flange mounted on the casing, a mounting portion for a substrate provided in front of the flange and entering and exiting from an opening formed in the flange, A first conveyor for transporting the substrate to the mounting portion, and a second conveyor for unloading the substrate from the mounting portion.
And a transfer means for transferring the substrate between the mounting portion and the first and second conveyors, and positioning the mounting portion, the first conveyor, the second conveyor and the transfer means. A plasma cleaning apparatus for a substrate, wherein a mounting portion to be mounted and mounted is provided on the flange and integrally mounted on the flange.
JP3593292A 1992-02-24 1992-02-24 Plasma cleaning equipment for substrates Expired - Fee Related JP3149503B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3593292A JP3149503B2 (en) 1992-02-24 1992-02-24 Plasma cleaning equipment for substrates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3593292A JP3149503B2 (en) 1992-02-24 1992-02-24 Plasma cleaning equipment for substrates

Publications (2)

Publication Number Publication Date
JPH05235144A JPH05235144A (en) 1993-09-10
JP3149503B2 true JP3149503B2 (en) 2001-03-26

Family

ID=12455804

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3593292A Expired - Fee Related JP3149503B2 (en) 1992-02-24 1992-02-24 Plasma cleaning equipment for substrates

Country Status (1)

Country Link
JP (1) JP3149503B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113877896A (en) * 2021-10-12 2022-01-04 苏州汇创芯精密智能装备有限公司 Plasma cleaning device and cleaning process thereof
CN117696539B (en) * 2023-12-27 2026-01-06 广州兴森快捷电路科技有限公司 An automatic cleaning system and method for plate surfaces after development

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2705255B2 (en) 1989-11-16 1998-01-28 松下電器産業株式会社 Plasma cleaning device for substrate in pre-process of wire bonding
JP2921067B2 (en) 1990-08-28 1999-07-19 松下電器産業株式会社 Plasma cleaning equipment
JP2924141B2 (en) 1990-09-14 1999-07-26 松下電器産業株式会社 Plasma cleaning device for substrate in pre-process of wire bonding

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2705255B2 (en) 1989-11-16 1998-01-28 松下電器産業株式会社 Plasma cleaning device for substrate in pre-process of wire bonding
JP2921067B2 (en) 1990-08-28 1999-07-19 松下電器産業株式会社 Plasma cleaning equipment
JP2924141B2 (en) 1990-09-14 1999-07-26 松下電器産業株式会社 Plasma cleaning device for substrate in pre-process of wire bonding

Also Published As

Publication number Publication date
JPH05235144A (en) 1993-09-10

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