JP3158684B2 - Copper electrorefining method - Google Patents
Copper electrorefining methodInfo
- Publication number
- JP3158684B2 JP3158684B2 JP19905692A JP19905692A JP3158684B2 JP 3158684 B2 JP3158684 B2 JP 3158684B2 JP 19905692 A JP19905692 A JP 19905692A JP 19905692 A JP19905692 A JP 19905692A JP 3158684 B2 JP3158684 B2 JP 3158684B2
- Authority
- JP
- Japan
- Prior art keywords
- copper
- electrolytic
- electrolytic solution
- concentration
- electrolysis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
Landscapes
- Electrolytic Production Of Metals (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、銅の電解精製を行なう
方法に関し、特にピンホールの少ない電気銅の製造方法
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for electrolytically refining copper, and more particularly to a method for producing electrolytic copper having few pinholes.
【0002】[0002]
【従来の技術】電気銅のピンホールとは、液中のエアー
又は、電解時のガス等によって発生した気泡がカソード
表面に付着し、そのまま周囲に銅が電着する為、泡の付
着部分が電着せずに図1に示した様な直径3mm程度、
深さ10mm程度の穴となって残ったものを言う。この
ピンホール中に電解液が残留して電気銅のイオウ含有量
を高くしたり、製品の外観が悪くなるので極力少ない事
が望ましい。2. Description of the Related Art A pinhole made of electrolytic copper means that bubbles generated by air in a liquid or gas during electrolysis adhere to the cathode surface, and copper is electrodeposited directly around the cathode. Without electrodeposition, about 3 mm in diameter as shown in FIG. 1,
A hole having a depth of about 10 mm is left. Since the electrolytic solution remains in the pinholes to increase the sulfur content of the electrolytic copper and deteriorate the appearance of the product, it is desirable that the electrolytic solution be as small as possible.
【0003】このピンホールの原因となる気泡の生成原
因は主に電解液の循環ポンプや循環槽でのエアーの巻き
込みによると考えられるがはっきりとは確定できておら
ず、その時々によりポンプの調整、給液量の調整、給、
排液温度の調整等種々の対応を行っていた。特に電解の
電流密度が240アンペア/m2 以上の高電流密度の電
解では、カソード表面での銅イオンの供給が不足しない
様にする為に、電解液の銅濃度を高めなければならな
く、結果的に電解液の粘性が高くなり、カソード表面に
付着した気泡が剥離し難くなって電気銅のピンホールが
多くなる傾向があった。[0003] It is considered that the cause of the formation of bubbles that cause this pinhole is mainly due to the circulation pump of the electrolyte or the entrainment of air in the circulation tank, but it has not been clearly determined, and the pump may be adjusted from time to time. , Adjustment of liquid supply, supply,
Various measures such as adjustment of the drainage temperature were performed. In particular, in electrolysis at a high current density of 240 amperes / m 2 or more, the copper concentration in the electrolyte must be increased in order to prevent the supply of copper ions on the cathode surface from being insufficient. As a result, the viscosity of the electrolytic solution was increased, bubbles attached to the cathode surface were hardly separated, and pinholes of electrolytic copper tended to increase.
【0004】一般に、特殊な有機質添加剤を添加して電
気銅の表面を平滑にすることが提案されているが(たと
えば特公昭61−33918号公報)、有機質添加剤が
高価である等の問題点があった。[0004] In general, it has been proposed to add a special organic additive to smooth the surface of electrolytic copper (for example, Japanese Patent Publication No. 61-33918), but the problem is that the organic additive is expensive. There was a point.
【0005】[0005]
【発明が解決しようとする課題】本発明は、特に電流密
度が高い電解条件で電気銅の表面にピンホールが発生
し、それにより電気銅のS含有率が高くなる等があまり
生じない銅電解精製法を提案することを目的とする。SUMMARY OF THE INVENTION The present invention relates to a copper electrolysis method in which pinholes are generated on the surface of electrolytic copper particularly under electrolytic conditions having a high current density, and thereby the S content of the electrolytic copper is not significantly increased. The aim is to propose a purification method.
【0006】[0006]
【課題を解決するための手段】本発明による銅電解精製
法は、電流密度が240アンペア/m2 以上の銅電解方
法において、電解温度および有機質添加剤添加量を一定
とし、電解液の銅濃度、硫酸濃度およびニッケル濃度の
うち1以上を調整して電解液の比重を1.250〜1.
263とする点に特徴がある。The copper electrorefining method according to the present invention is a copper electrolysis method having a current density of 240 amperes / m 2 or more, in which the electrolytic temperature and the amount of organic additives are kept constant and the copper concentration of the electrolytic solution is kept constant. , Sulfuric acid concentration and nickel concentration are adjusted so that the specific gravity of the electrolyte is 1.250 to 1.
263.
【0007】[0007]
【作用】電気銅のピンホールは、前記の通り電解液中の
気泡が陰極表面から離れ難い為に起り、従って電解液の
粘性が大きく影響すると考えられるが、実際の操業現場
で電解液の粘性を経続的に精度良く測定するのは困難な
ので、その代用特性として電解液の比重を電流密度が2
60アンペア/m2 で電解液温度(61.5℃)および
有機質添加剤(にかわ80g/電着銅トン、チオ尿素7
0g/電着銅トン、アビトン20g/電着銅トン)が一
定の電解条件下で測定しピンホールの発生率との関係を
調査したところ図2に示す通りの関係となることを見出
して本発明に至った。As described above, the pinhole of electrolytic copper occurs because bubbles in the electrolytic solution are unlikely to separate from the cathode surface, and thus the viscosity of the electrolytic solution is considered to have a large effect. It is difficult to measure the current continuously and with high accuracy.
At 60 amps / m 2 , the electrolyte temperature (61.5 ° C.) and the organic additives (paste 80 g / electrodeposited copper ton, thiourea 7
0g / copper ton and 20g of avidone / copper ton) were measured under a constant electrolysis condition, and the relationship with the pinhole occurrence rate was investigated. Invented the invention.
【0008】電解液の比重が1.263を超える値では
電気銅のピンホール発生率が高くなってしまい、1.2
50未満の値では電解液の比重を低下させるのに電解液
の銅濃度等の調整をかなり行なわなければならず経済的
ではないので電解液の比重は1.250〜1.263で
ある必要がある。If the specific gravity of the electrolytic solution exceeds 1.263, the pinhole occurrence rate of electrolytic copper increases, and
If the value is less than 50, the specific gravity of the electrolytic solution must be considerably adjusted in order to reduce the specific gravity of the electrolytic solution, which is not economical. Therefore, the specific gravity of the electrolytic solution must be 1.250 to 1.263. is there.
【0009】操業中に電解温度および有機質添加剤の種
類と添加量を変化させると図2に示した関係から大きく
ずれてしまうので、電解温度および有機質添加剤添加量
を一定とする必要がある。If the electrolysis temperature and the type and amount of the organic additive are changed during the operation, the relationship shown in FIG. 2 is greatly deviated. Therefore, it is necessary to keep the electrolysis temperature and the organic additive amount constant.
【0010】電解温度および有機質添加剤の種類と添加
量は通常の電解において問題とならない様に選択すれば
良いが、適正な値としては、電解温度60〜65℃、ニ
カワ50〜100g/電着銅トン、チオ尿素50〜10
0g/電着銅トン、アビトン10〜30g/電着銅トン
である。The electrolysis temperature and the type and amount of the organic additive may be selected so as not to cause a problem in ordinary electrolysis, but appropriate values are as follows: electrolysis temperature of 60 to 65 ° C., glue of 50 to 100 g / electrodeposition. Copper ton, thiourea 50-10
0 g / ton of electrodeposited copper and 10 to 30 g of Aviton / ton of electrodeposited copper.
【0011】電解液の比重を調節するに電解液の銅濃
度、硫酸濃度、ニッケル濃度を変化させて行なうのであ
るが、電解液の銅濃度はアノードから過剰に化学的に溶
解する銅を脱銅電解法等により電解液から除去する程度
を調整して実施する。又、電解液のニッケル濃度は電解
液からニッケル分を電気蒸発法等により硫酸ニッケルと
して除去する程度を調整して実施する。電解液中の硫酸
濃度は添加する硫酸量を調整して行なう。The specific gravity of the electrolytic solution is adjusted by changing the copper concentration, sulfuric acid concentration, and nickel concentration of the electrolytic solution. The copper concentration of the electrolytic solution is determined by removing excessively chemically soluble copper from the anode. The degree of removal from the electrolytic solution is adjusted by an electrolytic method or the like. The nickel concentration of the electrolytic solution is adjusted so as to remove nickel from the electrolytic solution as nickel sulfate by an electric evaporation method or the like. The concentration of sulfuric acid in the electrolyte is adjusted by adjusting the amount of sulfuric acid to be added.
【0012】電解液の銅濃度、硫酸濃度、ニッケル濃度
のいづれを調整して電解液の比重を調整しても良いが、
電解の状況を悪化させない様、通常実施される条件を選
択するのが良い。電解液の銅濃度は本発明のような高電
流密度での電解では47〜51g/lが望ましい。電解
液の硫酸濃度は高い方が電解液の浴抵抗が下がるため好
ましいが、余り高いとアノードの不動態化や電気銅の品
質悪化を生じる惧れがあるので150〜210g/lが
望ましい。電解液のニッケル濃度は高い方が電解液の浴
抵抗を増大させ、硫酸ニッケル結晶が晶出してスケーリ
ング等のトラブルが生じてしまう惧れもあるのでなるべ
く低い方が良いが、浄液装置の能力、目標アノード品
位、浄液コスト等が各電解設備によって異なるので明確
ではないが、17〜23g/lが望ましい。The specific gravity of the electrolytic solution may be adjusted by adjusting any of the copper concentration, sulfuric acid concentration and nickel concentration of the electrolytic solution.
It is preferable to select the conditions that are usually performed so as not to deteriorate the state of electrolysis. The copper concentration of the electrolytic solution is desirably 47 to 51 g / l in electrolysis at a high current density as in the present invention. A higher sulfuric acid concentration in the electrolytic solution is preferable because the bath resistance of the electrolytic solution is reduced. However, an excessively high concentration may cause passivation of the anode or deteriorate the quality of electrolytic copper, and is therefore preferably 150 to 210 g / l. The higher the nickel concentration of the electrolyte, the higher the bath resistance of the electrolyte and the risk of crystallization of nickel sulfate crystals, which may cause problems such as scaling. The lower the better, the better. The target anode quality, the purification cost and the like are not clear because they vary depending on each electrolysis facility, but 17 to 23 g / l is desirable.
【0013】[0013]
【実施例】精製炉で処理し、ターンテーブルで鋳造して
得られたアノードおよび種板電解で得られたカソードを
用いて下記の条件で電解を行なった。各試験においては
(試験期間は各1カ月である)電解温度および有機質添
加剤の種類、添加量は一定で電解液の比重が目標値にな
るように電解液の銅濃度、硫酸濃度、ニッケル濃度を調
整した。電解液の組成、比重(いずれも1カ月平均値で
ある)および電気銅のピンホール発生率の結果を表1に
示した。EXAMPLE An electrolysis was performed under the following conditions using an anode obtained by casting in a refining furnace and casting on a turntable and a cathode obtained by seed plate electrolysis. In each test (the test period is one month each), the concentration of copper, sulfuric acid, and nickel in the electrolyte were adjusted so that the electrolysis temperature and the type and amount of the organic additive were constant and the specific gravity of the electrolyte was the target value. Was adjusted. Table 1 shows the results of the composition of the electrolytic solution, the specific gravity (all are average values for one month), and the pinhole occurrence rate of electrolytic copper.
【0014】 電解条件 電解温度 61.5℃±0.5℃ 有機質添加剤添加量 にかわ 80g/電着銅トン チオ尿素 70g/電着銅トン アビトン 20g/電着銅トン 電流密度 260アンペア/m2 電解槽寸法 5.6m×1.25m×1.4m 槽数 256個 アノード枚数 50枚/槽 品位 Cu99.2%、Ni0.1〜0.3% 寸法 1.04m×1.03m×35cm 重量 370kg 枚数 51枚/槽 カソード寸法 1.07m×1.03m×0.7cm 重量 6.6kg 電気銅産出量 6000 トン/月 極間距離 105mmElectrolysis conditions Electrolysis temperature 61.5 ° C. ± 0.5 ° C. Organic additive addition amount 80 g / electrodeposited copper ton thiourea 70 g / electrodeposited copper ton Aviton 20 g / electrodeposited copper ton Current density 260 amps / m 2 Electrolytic cell dimensions 5.6m × 1.25m × 1.4m Number of cells 256 Anode number 50 / cell Grade Cu 99.2%, Ni 0.1 ~ 0.3% Dimensions 1.04m × 1.03m × 35cm Weight 370kg Number 51 sheets / bath Cathode dimensions 1.07m × 1.03m × 0.7cm Weight 6.6kg Electrolytic copper output 6000 tons / month Distance between poles 105mm
【0015】[0015]
【表1】 [Table 1]
【0016】表1において、比重は浮き秤式の比重計を
用いて、温度57〜62℃で測定した値であり、ピンホ
ール発生率とは1枚の電気銅にピンホールが10個以上
発生した枚数の占める割合を示したものである。In Table 1, the specific gravity is a value measured at a temperature of 57 to 62 ° C. by using a floating-type hydrometer, and the pinhole generation rate means that 10 or more pinholes are generated in one piece of electrolytic copper. It shows the ratio of the total number of sheets.
【0017】比較の為に、実施例と同じ電解条件で、電
解液の比重が本発明の特許請求の範囲から外れた試験の
結果を表1に示した。For comparison, Table 1 shows the results of a test in which the specific gravity of the electrolytic solution was outside the scope of the claims of the present invention under the same electrolytic conditions as in the examples.
【0018】表1の結果により、電解液の比重が本発明
の特許請求の範囲から外れた場合には電気銅のピンホー
ル発生率が高いことが判る。From the results shown in Table 1, it can be seen that when the specific gravity of the electrolytic solution is outside the scope of the present invention, the pinhole occurrence rate of electrolytic copper is high.
【0019】[0019]
【発明の効果】以上のように、本発明により電気銅のピ
ンホールが激減し、ピンホールのない電気銅を安定して
生産することができ、電気銅の品質向上が図ることがで
きる。As described above, according to the present invention, the number of pinholes in electrolytic copper is drastically reduced, electrolytic copper without pinholes can be stably produced, and the quality of electrolytic copper can be improved.
【図1】電気銅のピンホールの状態を示めす電気銅の断
面図である。FIG. 1 is a cross-sectional view of an electrolytic copper showing a state of a pinhole of the electrolytic copper.
【図2】電解液の比重とピンホールの発生率との関係を
示めす図である。FIG. 2 is a graph showing the relationship between the specific gravity of an electrolytic solution and the incidence of pinholes.
1 電着銅 2 種板 3 ピンホール 1. Electroplated copper 2. Seed plate 3. Pinhole
Claims (1)
銅電解方法において、電解温度および有機質添加剤添加
量を一定とし、電解液の銅濃度、硫酸濃度およびニッケ
ル濃度のうち1以上を調整して電解液の比重を1.25
0〜1.263とすることを特徴とする銅電解精製法。In a copper electrolysis method having a current density of 240 amps / m 2 or more, the electrolysis temperature and the amount of organic additives added are kept constant, and one or more of the copper concentration, sulfuric acid concentration and nickel concentration of the electrolytic solution are adjusted. The specific gravity of the electrolyte is 1.25
A copper electrorefining method characterized by being 0 to 1.263.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19905692A JP3158684B2 (en) | 1992-07-03 | 1992-07-03 | Copper electrorefining method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19905692A JP3158684B2 (en) | 1992-07-03 | 1992-07-03 | Copper electrorefining method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0625882A JPH0625882A (en) | 1994-02-01 |
| JP3158684B2 true JP3158684B2 (en) | 2001-04-23 |
Family
ID=16401375
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19905692A Expired - Lifetime JP3158684B2 (en) | 1992-07-03 | 1992-07-03 | Copper electrorefining method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3158684B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103726070A (en) * | 2013-12-13 | 2014-04-16 | 金川集团股份有限公司 | Copper electrolyte additive and application method thereof |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101928957B (en) * | 2010-10-04 | 2012-07-11 | 普宁市长欣五金有限公司 | Method for electrolytically refining copper at room temperature |
| JP2019026866A (en) * | 2017-07-25 | 2019-02-21 | 国立大学法人九州大学 | Method for electrolytic purification of copper |
| JP7089862B2 (en) * | 2017-11-09 | 2022-06-23 | Jx金属株式会社 | Copper electrorefining method |
| JP7271917B2 (en) * | 2018-11-27 | 2023-05-12 | 住友金属鉱山株式会社 | Copper electrolytic refining method |
-
1992
- 1992-07-03 JP JP19905692A patent/JP3158684B2/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103726070A (en) * | 2013-12-13 | 2014-04-16 | 金川集团股份有限公司 | Copper electrolyte additive and application method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0625882A (en) | 1994-02-01 |
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