JP3168609B2 - Method of manufacturing stamper for optical recording medium and method of manufacturing optical recording medium - Google Patents
Method of manufacturing stamper for optical recording medium and method of manufacturing optical recording mediumInfo
- Publication number
- JP3168609B2 JP3168609B2 JP15151891A JP15151891A JP3168609B2 JP 3168609 B2 JP3168609 B2 JP 3168609B2 JP 15151891 A JP15151891 A JP 15151891A JP 15151891 A JP15151891 A JP 15151891A JP 3168609 B2 JP3168609 B2 JP 3168609B2
- Authority
- JP
- Japan
- Prior art keywords
- recording medium
- optical recording
- manufacturing
- stamper
- resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000003287 optical effect Effects 0.000 title claims description 24
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 229920005989 resin Polymers 0.000 claims description 29
- 239000011347 resin Substances 0.000 claims description 29
- 238000000034 method Methods 0.000 claims description 9
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 3
- 239000012954 diazonium Substances 0.000 claims description 3
- 150000001989 diazonium salts Chemical class 0.000 claims description 3
- SQDFHQJTAWCFIB-UHFFFAOYSA-N n-methylidenehydroxylamine Chemical compound ON=C SQDFHQJTAWCFIB-UHFFFAOYSA-N 0.000 claims description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 3
- 229920000036 polyvinylpyrrolidone Polymers 0.000 claims description 3
- 239000001267 polyvinylpyrrolidone Substances 0.000 claims description 3
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 claims description 3
- 238000000465 moulding Methods 0.000 claims description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 18
- 239000000758 substrate Substances 0.000 description 12
- 229910052759 nickel Inorganic materials 0.000 description 9
- UIZLQMLDSWKZGC-UHFFFAOYSA-N cadmium helium Chemical compound [He].[Cd] UIZLQMLDSWKZGC-UHFFFAOYSA-N 0.000 description 8
- -1 alkyl sulfocarboxylates Chemical class 0.000 description 7
- 239000011521 glass Substances 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- 229910019142 PO4 Inorganic materials 0.000 description 3
- 239000012670 alkaline solution Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000010452 phosphate Substances 0.000 description 3
- 229920000098 polyolefin Polymers 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 150000008051 alkyl sulfates Chemical class 0.000 description 2
- 239000003945 anionic surfactant Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- 238000003698 laser cutting Methods 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 229910052714 tellurium Inorganic materials 0.000 description 2
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910001260 Pt alloy Inorganic materials 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- RSWGJHLUYNHPMX-ONCXSQPRSA-N abietic acid Chemical compound C([C@@H]12)CC(C(C)C)=CC1=CC[C@@H]1[C@]2(C)CCC[C@@]1(C)C(O)=O RSWGJHLUYNHPMX-ONCXSQPRSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 125000005210 alkyl ammonium group Chemical group 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000004359 castor oil Substances 0.000 description 1
- 235000019438 castor oil Nutrition 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- LQZZUXJYWNFBMV-UHFFFAOYSA-N dodecan-1-ol Chemical compound CCCCCCCCCCCCO LQZZUXJYWNFBMV-UHFFFAOYSA-N 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- ZEMPKEQAKRGZGQ-XOQCFJPHSA-N glycerol triricinoleate Natural products CCCCCC[C@@H](O)CC=CCCCCCCCC(=O)OC[C@@H](COC(=O)CCCCCCCC=CC[C@@H](O)CCCCCC)OC(=O)CCCCCCCC=CC[C@H](O)CCCCCC ZEMPKEQAKRGZGQ-XOQCFJPHSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- QVEIBLDXZNGPHR-UHFFFAOYSA-N naphthalene-1,4-dione;diazide Chemical compound [N-]=[N+]=[N-].[N-]=[N+]=[N-].C1=CC=C2C(=O)C=CC(=O)C2=C1 QVEIBLDXZNGPHR-UHFFFAOYSA-N 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- XOAAWQZATWQOTB-UHFFFAOYSA-N taurine Chemical class NCCS(O)(=O)=O XOAAWQZATWQOTB-UHFFFAOYSA-N 0.000 description 1
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000004711 α-olefin Substances 0.000 description 1
Landscapes
- Manufacturing Optical Record Carriers (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、光記録媒体用スタンパ
の製造法および光記録媒体の製造方法に関する。The present invention relates to a method for manufacturing a stamper for an optical recording medium and a method for manufacturing an optical recording medium.
【0002】[0002]
【従来の技術】従来の光記録媒体は以下のようにして作
成されていた。まず、ガラス製の原盤の上に、ポジ型の
レジストを塗布し、レーザー光を用いて露光した後、ア
ルカリ溶液によりレジストを現像する。そしてその現像
部分をニッケルを真空成膜することにより導体化し、そ
の導体化部分を電極にしてニッケルを電鋳してガラス原
盤から剥離してスタンパを形成する。そのスタンパを用
いて基板を成形し、その基板に記録層を成膜することに
よって光記録媒体を作成していた。このとき露光に用い
られるレーザーはヘリウムカドミウムレーザーなど40
0ナノメートル台の波長のもので、描ける最も細い線で
0.4マイクロメートル程度であり、それより細い線を
引くことができなかった。従って、溝の幅は0.4マイ
クロメートル程度でトラックピッチ1.6マイクロメー
トル程度であった。そして、光記録媒体の記録再生には
800ナノメートル程度の波長のレーザーを用いてい
た。2. Description of the Related Art A conventional optical recording medium has been manufactured as follows. First, a positive resist is applied on a glass master and exposed using a laser beam, and then the resist is developed with an alkaline solution. Then, the developed portion is converted into a conductor by forming a vacuum film of nickel, and the conductive portion is used as an electrode to electroform nickel and peel off from the glass master to form a stamper. An optical recording medium has been created by forming a substrate using the stamper and forming a recording layer on the substrate. At this time, the laser used for the exposure is a helium cadmium laser or the like.
It has a wavelength of the order of 0 nanometer, the finest line that can be drawn is about 0.4 micrometer, and no thinner line can be drawn. Therefore, the width of the groove was about 0.4 μm and the track pitch was about 1.6 μm. Then, a laser having a wavelength of about 800 nanometers was used for recording and reproduction of the optical recording medium.
【0003】[0003]
【発明が解決しようとする課題】しかし、従来の技術で
はヘリウムカドミウムレーザーを用いてトラッキング用
の溝やピットを形成していたため、ヘリウムカドミウム
レーザーの波長に対応したカッティングしかできず、実
質的に0.4マイクロメートルより細い溝やピットは形
成できなかったので、SHG素子などを用いて短波長化
したレーザー光を用いた記録再生用の基板は存在せず、
自ずと高密度記録には限界があるという課題を有してい
た。However, in the prior art, since grooves and pits for tracking are formed using a helium cadmium laser, cutting can be performed only in accordance with the wavelength of the helium cadmium laser, and substantially zero. Since grooves and pits thinner than .4 micrometers could not be formed, there was no recording / reproducing substrate using laser light having a shorter wavelength using an SHG element or the like.
Naturally, there was a problem that high-density recording had a limit.
【0004】そこで本発明はこのような課題を解決する
もので、その目的とするところはヘリウムカドミウムレ
ーザーの波長に対応した溝やピットより細い溝やピット
を形成するため、SHG素子を用いて短波長化されたレ
ーザー光などを用いた高密度記録可能な光ディスクを提
供するというところにある。Accordingly, the present invention has been made to solve such a problem, and an object thereof is to form a groove or a pit narrower than a groove or a pit corresponding to the wavelength of a helium cadmium laser by using an SHG element. An object of the present invention is to provide an optical disk capable of high-density recording using a wavelength-converted laser beam or the like.
【0005】[0005]
【課題を解決するための手段】本発明は、表面が平滑な
原盤の表面にポジ型のレジストを塗布する工程と、前記
レジスト上に、光退色性樹脂と、前記レジストが感光す
る光に対して透明である水溶性樹脂と、を含有する樹脂
層を形成する工程と、前記レジストを感光させて現像
し、所望のパターンを形成する工程と、を有することを
特徴とする。前記水溶性樹脂は、ポリビニルアルコール
又はポリビニルピロリドンを含有することを特徴とす
る。前記水溶性樹脂はニトロン又はジアゾニウム塩を含
有することを特徴とする。また、上記の光記録媒体用ス
タンパの製造方法により製造された光記録媒体用スタン
パを型として成形する工程を有することを特徴とする。According to the present invention, there is provided a step of applying a positive resist on the surface of a master having a smooth surface, a photobleachable resin on the resist, and a light sensitive to the resist. A step of forming a resin layer containing a transparent and water-soluble resin, and a step of exposing and developing the resist to form a desired pattern. The water-soluble resin contains polyvinyl alcohol or polyvinylpyrrolidone. The water-soluble resin contains a nitrone or diazonium salt. The method further comprises a step of molding a stamper for an optical recording medium manufactured by the method for manufacturing a stamper for an optical recording medium as a mold.
【0006】[0006]
【実施例】本発明について図面に基づいて詳細に説明す
る。図1は本発明の光記録媒体を作成するための概念図
である。1はガラス原盤、2はポジ型のレジスト層、3
は光退色性樹脂を混合した水溶性樹脂層で、これの水溶
性樹脂は2のレジストの感光波長で透明でなければなら
ない。4は露光部分、5はパターン、6はニッケル膜、
7はニッケル層、8はスタンパ、9は非晶性ポリオレフ
ィンの基板、10は記録層である。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described in detail with reference to the drawings. FIG. 1 is a conceptual diagram for producing the optical recording medium of the present invention. 1 is a glass master, 2 is a positive resist layer, 3
Is a water-soluble resin layer mixed with a photobleachable resin, which must be transparent at the photosensitive wavelength of the second resist. 4 is an exposed portion, 5 is a pattern, 6 is a nickel film,
7 is a nickel layer, 8 is a stamper, 9 is an amorphous polyolefin substrate, and 10 is a recording layer.
【0007】1のガラス原盤の表面を清浄化し、ヘキサ
メチルジシラザンによりレジストとの密着性を良くす
る。次に2のポジ型のレジストを塗布し、ポストベーク
によりレジストの溶剤を取り除く。そして3のレジスト
の感光波長で透明な水溶性樹脂と光退色性樹脂を混合し
たものを水に溶かして塗布し乾燥させる。ここで用いる
水溶性樹脂の例としてはポリビニルアルコール、ポリビ
ニルピロリドンなど水溶性であり、レジストの感光波長
で余分な吸収がないものが適当である。この場合、2の
レジスト層と3の水溶性樹脂層は接着してはならないの
で、3の水溶性樹脂を塗布するまえに、2のレジスト層
と3の水溶性樹脂層の密着を確保するためにシランカッ
プリング剤などで表面を処理するとよい。水溶性樹脂の
数平均分子量は作業性や光退色性樹脂との混合性などを
考慮して1000から100000程度のものが好まし
い。3の水溶性樹脂として、アミン基、アミド基、カル
ボキシル基、OH基を含有するものは好ましくなく、レ
ジストの適切な現像を妨げる。従って、これらの極性の
大きな基を多く含まないものを選択し、溶剤にはジオキ
サン、エーテル類などで極性が弱いものを用いる必要が
ある。また、この光退色性樹脂の例としては水溶性樹脂
との混合がよく、レーザーの感光波長で明確な光退色性
を示すニトロンまたはジアゾニウム塩からなるものを選
ぶとよい。(1) The surface of the glass master is cleaned and hexamethyldisilazane is used to improve the adhesion to the resist. Next, a positive resist 2 is applied, and the solvent of the resist is removed by post-baking. Then, a mixture of a water-soluble resin and a photobleachable resin which are transparent at the photosensitive wavelength of the resist 3 is dissolved in water, applied and dried. Suitable examples of the water-soluble resin used herein include those which are water-soluble, such as polyvinyl alcohol and polyvinyl pyrrolidone, and do not have extra absorption at the photosensitive wavelength of the resist. In this case, the second resist layer and the third water-soluble resin layer must not adhere to each other. Therefore, before applying the third water-soluble resin, the second resist layer and the third water-soluble resin layer must be adhered to each other. The surface may be treated with a silane coupling agent or the like. The number average molecular weight of the water-soluble resin is preferably about 1,000 to 100,000 in consideration of workability, miscibility with the photobleachable resin, and the like. As the water-soluble resin (3), those containing an amine group, an amide group, a carboxyl group, and an OH group are not preferred, and hinder proper development of the resist. Therefore, it is necessary to select a solvent which does not contain a large number of these groups having a large polarity, and use a solvent having a weak polarity such as dioxane or ether. In addition, as an example of the photobleachable resin, a mixture of a water-soluble resin and a nitrone or diazonium salt exhibiting a clear photobleachability at the photosensitive wavelength of a laser may be selected.
【0008】次に、4の部分をヘリウムカドミウムレー
ザーを用いて露光し、現像して5のパターンを形成す
る。現像はアルカリ液にもよるが、まず水洗して3のレ
ジストの感光波長で透明である水溶性樹脂と、光退色性
樹脂と、を混合した樹脂層を除去した後の方が好まし
い。その後、6のニッケル膜を真空成膜によって100
0オングストローム成膜して、その成膜部分を電極にし
て7のニッケル層を0.3ミリメートル電鋳する。6の
ニッケル膜を形成するまえに、スタンパの表面を清浄化
するために、白金や白金合金のように真空成膜したとき
のグレインサイズの小さいものを成膜するのもよい。そ
して、1のガラス原盤から剥離して内外径を加工して8
のスタンパを形成する。そして8のスタンパを用いて非
晶性ポリオレフィンにより9の基板を形成する。この9
の基板はポリカーボネート樹脂を用いた射出圧縮成形に
よるものでも構わない。さらに、9の基板に10の記録
層を成膜して光ディスクを作成する。この場合の記録層
としては希土類金属と遷移金属の合金よりなる光磁気記
録膜、テルルと酸化テルルの混合物による光相変化型、
あるいはシアニンなどの様々なものを用いることが可能
である。Next, the portion 4 is exposed using a helium cadmium laser and developed to form a pattern 5. Although the development depends on the alkaline solution, it is more preferable to first remove the resin layer obtained by washing with water and mixing a water-soluble resin which is transparent at the photosensitive wavelength of the resist 3 and a photobleachable resin. Thereafter, a nickel film of 6 is formed by vacuum film formation to 100
A 0 angstrom film is formed, and a nickel layer of 0.3 mm is electroformed by using the film-formed portion as an electrode. Before forming the nickel film of No. 6, in order to clean the surface of the stamper, a film having a small grain size when vacuum film forming such as platinum or a platinum alloy may be formed. Then, the inner and outer diameters are processed by peeling from the one glass master and 8
Forming a stamper. Then, the substrate 9 is formed from the amorphous polyolefin using the stamper 8. This 9
The substrate may be formed by injection compression molding using a polycarbonate resin. Further, an optical disk is formed by forming 10 recording layers on 9 substrates. As the recording layer in this case, a magneto-optical recording film made of an alloy of a rare earth metal and a transition metal, an optical phase change type by a mixture of tellurium and tellurium oxide,
Alternatively, various substances such as cyanine can be used.
【0009】次に、2のレジストについて説明する。2
のポジ型のレジスト層はナフトキノンジアジド、フェノ
ールノボラック樹脂をセルソルブアセテートに溶解した
ものを用いるが、露光に用いる光で高感度のものが好ま
しい。すなわち、ヘルウムカドミウムレーザーの波長で
高感度のものを用いる。レジストの解像度を向上させる
ため、フェノールノボラック樹脂の分子量の分散(重量
平均分子量/数平均分子量)は3未満になるように合成
されたものを用いることが好ましい。より好ましくは2
未満である。現像はアルカリ液によって行なうが、ケイ
酸ナトリウム、燐酸ナトリウム水酸化第4アルキルアン
モニウムなどが用いられる。アルカリ金属を含まない有
機アルカリや弱酸と強アルカリからなるアルカリ緩衝液
を用いるのもよい。Next, the second resist will be described. 2
The positive resist layer is prepared by dissolving naphthoquinonediazide and phenol novolak resin in cellosolve acetate, and preferably has high sensitivity to light used for exposure. That is, a high sensitivity helium cadmium laser is used. In order to improve the resolution of the resist, it is preferable to use a phenol novolak resin synthesized so that the molecular weight dispersion (weight average molecular weight / number average molecular weight) is less than 3. More preferably 2
Is less than. The development is carried out with an alkaline solution, but sodium silicate, sodium quaternary alkyl ammonium hydroxide or the like is used. It is also possible to use an organic buffer containing no alkali metal or an alkali buffer comprising a weak acid and a strong base.
【0010】また、この現像液には現像の均一性をはか
るため界面活性剤を添加した方がよい。添加する界面活
性剤は現像の阻害効果の少なく、アルカリとの相性のよ
いアニオン界面活性剤が好ましく、アニオン界面活性剤
のなかでも現像液との相溶性や安定性などを考慮して分
子量が比較的大きく浸透性が高く安定なものがよい。そ
の例としてはアルキルスルホカルボン酸塩、α−オレフ
ィンスルホン酸塩、ポリオキシエチレンアルキルエーテ
ル酢酸塩、Nーアシルアミノ酸およびその塩、Nーアシ
ルメチルタウリン塩、アルキル硫酸塩ポリオキシアルキ
ルエーテル硫酸塩、アルキル硫酸塩ポリオキシエチレン
アルキルエーテル燐酸塩、ロジン酸石鹸、ヒマシ油硫酸
エステル塩、ラウリルアルコール硫酸エステル塩、アル
キルフェノール型燐酸エステル、アルキル型燐酸エステ
ル、アルキルアリルスルホン酸塩などが挙げられる。Further, it is preferable to add a surfactant to this developer in order to measure the uniformity of development. The surfactant to be added is preferably an anionic surfactant that has little effect on development and has good compatibility with alkali. Among the anionic surfactants, the molecular weights are compared in consideration of compatibility with the developer and stability. It is desirable to use a material that is large and has high permeability and is stable. Examples thereof include alkyl sulfocarboxylates, α-olefin sulfonates, polyoxyethylene alkyl ether acetates, N-acyl amino acids and salts thereof, N-acylmethyl taurine salts, alkyl sulfate polyoxyalkyl ether sulfates, alkyl Sulfate polyoxyethylene alkyl ether phosphate, rosin acid soap, castor oil sulfate, lauryl alcohol sulfate, alkyl phenol type phosphate, alkyl type phosphate, alkyl allyl sulfonate and the like.
【0011】次に本発明になる方法により作成した光記
録媒体用の基板を用いて、本発明になる光記録媒体を作
製した場合について説明する。Next, a case where an optical recording medium according to the present invention is manufactured using a substrate for an optical recording medium manufactured by the method according to the present invention will be described.
【0012】まず本実施例に示したようにして従来より
トラックピッチとピットのピッチが半分になるようにレ
ーザーカッティングマシンを用いて露光する。従来はト
ラックピッチが1.6マイクロメートルであったのでこ
れを0.8マイクロメートルにする。ピット列も同様に
間隔を半分にする。そして現像を行なって、本実施例に
示した方法により基板を作製する。この結果作成された
基板を走査型電子顕微鏡で観察したところ、0.2マイ
クロメートル幅の溝およびピット列が形成できたことが
確認できた。その基板を用いて、記録層として白金とコ
バルトからなる多層膜を成膜した光ディスクを用いて、
830ナノメートルの波長のレーザーをSHG素子で4
15ナノメートルの波長にした光学系で記録再生を行な
ったところ従来の4倍の高密度化が可能であった。First, as shown in this embodiment, exposure is performed by using a laser cutting machine so that the track pitch and the pit pitch are reduced to half those of the prior art. Conventionally, the track pitch was 1.6 micrometers, which is reduced to 0.8 micrometers. Similarly, the interval of the pit row is halved. Then, development is performed, and a substrate is manufactured by the method described in this embodiment. Observation of the resulting substrate with a scanning electron microscope confirmed that grooves and pit rows having a width of 0.2 μm could be formed. Using the substrate, using an optical disc on which a multilayer film made of platinum and cobalt is formed as a recording layer,
830nm wavelength laser with SHG element 4
When recording and reproduction were performed with an optical system having a wavelength of 15 nanometers, it was possible to achieve a density four times higher than in the past.
【0013】尚、本発明はこれらの実施例に限定される
と考えるべきではなく、本発明の主旨を逸脱しない限り
種々の変更は可能である。The present invention should not be considered to be limited to these embodiments, and various changes can be made without departing from the gist of the present invention.
【0014】[0014]
【発明の効果】以上述べたように本発明によれば従来不
可能であったヘリウムカドミウムレーザーの波長に対応
した溝やピットより細い溝やピットを形成するため、S
HG素子を用いて短波長化されたレーザー光などを用い
た高密度記録可能な光記録媒体を提供できるという効果
を有する。しかも従来から用いられているヘリウムカド
ミウムレーザーを用いたレーザーカッティング装置がそ
のまま使用できる。As described above, according to the present invention, grooves and pits narrower than grooves and pits corresponding to the wavelength of a helium cadmium laser, which have not been conventionally possible, are formed.
This has the effect of providing an optical recording medium capable of high-density recording using laser light or the like having a shorter wavelength using an HG element. In addition, a conventionally used laser cutting device using a helium cadmium laser can be used as it is.
【図1】本発明の光記録媒体の作製方法を示す図であ
る。FIG. 1 is a diagram illustrating a method for manufacturing an optical recording medium of the present invention.
1 ガラス原盤 2 ポジ型のレジスト層 3 水溶性樹脂と光退色性樹脂を混合した層 4 露光部分 5 パターン 6 ニッケル膜 7 ニッケル層 8 スタンパ 9 非晶性ポリオレフィンの基板 10 記録層 DESCRIPTION OF SYMBOLS 1 Glass master 2 Positive resist layer 3 Layer which mixed water-soluble resin and photobleachable resin 4 Exposure part 5 Pattern 6 Nickel film 7 Nickel layer 8 Stamper 9 Amorphous polyolefin substrate 10 Recording layer
Claims (4)
ストを塗布する工程と、 前記レジスト上に、光退色性樹脂と、前記レジストが感
光する光に対して透明である水溶性樹脂と、を含有する
樹脂層を形成する工程と、 前記レジストを感光させて現像し、所望のパターンを形
成する工程と、 を有することを特徴とする光記録媒体用スタンパの製造
方法。A step of applying a positive resist on the surface of a master having a smooth surface; a photobleachable resin on the resist; and a water-soluble resin transparent to light to which the resist is exposed. And forming a desired pattern by exposing and developing the resist to form a desired pattern.
ル又はポリビニルピロリドンを含有することを特徴とす
る請求項1に記載の光記録媒体用スタンパの製造方法。2. The method for manufacturing a stamper for an optical recording medium according to claim 1, wherein the water-soluble resin contains polyvinyl alcohol or polyvinyl pyrrolidone.
ウム塩を含有することを特徴とする請求項1に記載の光
記録媒体用スタンパの製造方法。3. The method for manufacturing a stamper for an optical recording medium according to claim 1, wherein the water-soluble resin contains a nitrone or diazonium salt.
の製造方法により製造された光記録媒体用スタンパを型
として成形する工程を有することを特徴とする光記録媒
体の製造方法。4. A method of manufacturing an optical recording medium, comprising a step of molding a stamper for an optical recording medium manufactured by the method of manufacturing a stamper for an optical recording medium according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15151891A JP3168609B2 (en) | 1991-06-24 | 1991-06-24 | Method of manufacturing stamper for optical recording medium and method of manufacturing optical recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15151891A JP3168609B2 (en) | 1991-06-24 | 1991-06-24 | Method of manufacturing stamper for optical recording medium and method of manufacturing optical recording medium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04372740A JPH04372740A (en) | 1992-12-25 |
| JP3168609B2 true JP3168609B2 (en) | 2001-05-21 |
Family
ID=15520268
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15151891A Expired - Fee Related JP3168609B2 (en) | 1991-06-24 | 1991-06-24 | Method of manufacturing stamper for optical recording medium and method of manufacturing optical recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3168609B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06302015A (en) * | 1993-04-16 | 1994-10-28 | Nec Corp | Apparatus for production of optical master disk |
-
1991
- 1991-06-24 JP JP15151891A patent/JP3168609B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH04372740A (en) | 1992-12-25 |
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