JP3194876B2 - Stainless steel for dilute hydrogen fluoride and its manufacturing method - Google Patents
Stainless steel for dilute hydrogen fluoride and its manufacturing methodInfo
- Publication number
- JP3194876B2 JP3194876B2 JP30034296A JP30034296A JP3194876B2 JP 3194876 B2 JP3194876 B2 JP 3194876B2 JP 30034296 A JP30034296 A JP 30034296A JP 30034296 A JP30034296 A JP 30034296A JP 3194876 B2 JP3194876 B2 JP 3194876B2
- Authority
- JP
- Japan
- Prior art keywords
- stainless steel
- oxide film
- hydrogen fluoride
- sample
- metal ions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 229910001220 stainless steel Inorganic materials 0.000 title claims description 27
- 239000010935 stainless steel Substances 0.000 title claims description 26
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 title claims description 16
- 229910000040 hydrogen fluoride Inorganic materials 0.000 title claims description 12
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 238000010438 heat treatment Methods 0.000 claims description 11
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 10
- 229910044991 metal oxide Inorganic materials 0.000 claims description 10
- 150000004706 metal oxides Chemical class 0.000 claims description 10
- 239000011651 chromium Substances 0.000 claims description 8
- 238000005498 polishing Methods 0.000 claims description 8
- 229910052804 chromium Inorganic materials 0.000 claims description 7
- 230000001590 oxidative effect Effects 0.000 claims description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 5
- 229910052742 iron Inorganic materials 0.000 claims description 4
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 claims description 3
- 229910000423 chromium oxide Inorganic materials 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 3
- 229910021645 metal ion Inorganic materials 0.000 description 19
- 238000010828 elution Methods 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 7
- 239000007864 aqueous solution Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000007654 immersion Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- -1 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 1
- 101150000971 SUS3 gene Proteins 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
Landscapes
- Chemical Treatment Of Metals (AREA)
- ing And Chemical Polishing (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、金属イオンの溶出
を極端に嫌う半導体製造装置等の分野において使用され
る配管・機器等を構成するステンレス鋼及びその製造方
法に関し、詳しくは、希フッ化水素に対する金属イオン
の溶出量が極めて少ないステンレス鋼及びその製造方法
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to stainless steel constituting piping and equipment used in the field of semiconductor manufacturing equipment and the like which extremely dislikes elution of metal ions, and a method for manufacturing the same. The present invention relates to a stainless steel having a very small amount of metal ions eluted with respect to hydrogen and a method for producing the same.
【０００２】[0002]
【従来の技術および発明が解決しようとする課題】半導
体基盤表面に付着しているパーティクル、有機物、金
属、ケミカルオキサイド等の除去、洗浄には不可欠とな
っている希フッ化水素であるが、従来、金属を使用する
と、希フッ化水素に対して耐性がなく、著しい金属イオ
ンの溶出が問題となっていた。そこで、フッ素樹脂（例
えば、ポリテトラフルオロエチレン）等の樹脂が用いら
れているが、劣化によりパーティクルが発生すること、
耐熱性が充分でないこと、さらには機械的強度が十分で
ない等の問題がある。2. Description of the Related Art Dilute hydrogen fluoride is indispensable for removing and cleaning particles, organic substances, metals, chemical oxides and the like adhering to the surface of a semiconductor substrate. However, when a metal is used, there is no resistance to dilute hydrogen fluoride, and there has been a problem of remarkable elution of metal ions. Therefore, a resin such as a fluororesin (for example, polytetrafluoroethylene) is used.
There are problems such as insufficient heat resistance and insufficient mechanical strength.
【０００３】また、従来より、金属イオンの溶出を抑え
るために、ステンレス鋼の表面を研磨して平滑化する方
法が知られている。例えば、バフ研磨を施したステンレ
ス鋼は表面にスクラッチのある粒状の組織となるため、
Ｆｅ、Ｃｒ、Ｎｉ等の酸化物の不動態被膜は不均一に形
成され、Ｆｅイオン等の金属イオンの溶出量は多く、本
発明の対象とする分野に適用することはできない。[0003] In addition, there has been conventionally known a method of polishing and smoothing the surface of stainless steel in order to suppress elution of metal ions. For example, buffed stainless steel has a granular structure with scratches on the surface,
Passive films of oxides such as Fe, Cr and Ni are formed non-uniformly, and the amount of metal ions such as Fe ions eluted is large and cannot be applied to the field targeted by the present invention.
【０００４】さらに、電解研磨を施したステンレス鋼で
は、上記した粒状の組織は電気化学的な溶解で除去さ
れ、加工変質層を持たない平滑な健全組織が得られる
が、その表面に形成される自然酸化による不動態酸化被
膜は極めて薄く、この場合も金属イオンの溶出量は十分
に低くないので、本発明の対象とする分野に適用するこ
とはできない。Further, in stainless steel which has been subjected to electrolytic polishing, the above-mentioned granular structure is removed by electrochemical dissolution, and a smooth sound structure having no work-affected layer is obtained, but is formed on the surface thereof. The passive oxide film formed by natural oxidation is extremely thin. In this case, too, the elution amount of metal ions is not sufficiently low, so that it cannot be applied to the field targeted by the present invention.
【０００５】本発明は従来の技術の有するこのような問
題点に鑑みてなされたものであって、その目的は、希フ
ッ化水素に対する金属イオンの溶出量が極めて少ないス
テンレス鋼及びその製造方法を提供することにある。The present invention has been made in view of the above-mentioned problems of the prior art, and an object of the present invention is to provide a stainless steel having a very small amount of metal ions eluted from dilute hydrogen fluoride and a method for producing the same. To provide.
【０００６】[0006]
【課題を解決するための手段】上記目的を達成するため
に本発明は、電解研磨処理を施した表面上に５０〜１０
０×１０-8ｃｍの厚みのクロム系酸化物を主とする金属
酸化物の被膜が形成されたステンレス鋼を配管・機器等
の構成材料として用いることにより、上記金属酸化物の
被膜がバリヤーとなって、希フッ化水素への金属イオン
の溶出量は極めて少なくなる。In order to achieve the above-mentioned object, the present invention provides a method of forming a polishing pad on a surface which has been subjected to electrolytic polishing treatment.
By using stainless steel on which a metal oxide film mainly composed of chromium oxide having a thickness of 0 × 10 −8 cm is formed as a constituent material for piping, equipment, etc., the metal oxide film serves as a barrier. As a result, the amount of metal ions eluted into dilute hydrogen fluoride becomes extremely small.
【０００７】[0007]
【発明の実施の形態】すなわち、電解研磨処理を施した
表面上に５０〜１００×１０-8ｃｍの厚みのクロム系酸
化物を主とする金属酸化物の被膜が形成された希フッ化
水素用ステンレス鋼を第一の発明とし、ステンレス鋼表
面に電解研磨処理を施した後、酸化性雰囲気中で加熱す
ることにより、鉄系酸化物を主とする金属酸化物の着色
酸化被膜を表面に形成し、次いで、この着色酸化皮膜を
溶解除去することにより、５０〜１００×１０-8ｃｍの
厚みのクロム系酸化物を主とする金属酸化物の被膜を表
面に形成することを特徴とする希フッ化水素用ステンレ
ス鋼の製造方法を第二の発明とし、上記第二の発明にお
いて、加熱条件が、４００〜５００℃で１〜３時間加熱
するものであることを特徴とする希フッ化水素用ステン
レス鋼の製造方法を第三の発明とする。DESCRIPTION OF THE PREFERRED EMBODIMENTS That is, a diluted hydrogen fluoride having a 50-100.times.10.sup.- 8 cm-thick chromium-based oxide-based metal oxide film formed on an electropolished surface. Stainless steel for the first invention, the surface of the stainless steel is subjected to electrolytic polishing, and then heated in an oxidizing atmosphere to form a colored oxide film of a metal oxide mainly composed of iron-based oxide on the surface. Forming and then dissolving and removing the colored oxide film to form a metal oxide film mainly composed of a chromium-based oxide having a thickness of 50 to 100 × 10 −8 cm on the surface. A method for producing a stainless steel for dilute hydrogen fluoride is a second invention, wherein in the second invention, heating conditions are heating at 400 to 500 ° C. for 1 to 3 hours. Method for producing stainless steel for hydrogen And the third aspect of the present invention.
【０００８】電解研磨処理を施すことにより、ステンレ
ス鋼の表面の平滑性は向上するが、自然酸化による不動
態酸化被膜は薄く、金属イオンの溶出を抑えることはで
きない。Although the surface smoothness of stainless steel is improved by performing the electropolishing treatment, the passive oxide film formed by natural oxidation is thin, and the elution of metal ions cannot be suppressed.
【０００９】しかし、電解研磨後のステンレス鋼を酸化
性雰囲気中で一定温度で加熱することにより、図４に示
すように、表面に鉄系酸化物（ＦｅＯ、Ｆｅ3Ｏ4、Ｆｅ
2Ｏ3）を主とする金属酸化物の着色酸化被膜が形成さ
れ、着色酸化被膜と下層母材との界面ではＣｒ，Ｎｉ成
分が相対的に多くなる。従って、表層のＦｅ成分の多い
着色酸化被膜を除去することにより、図５に示すよう
に、緻密なクロム系酸化物（Ｃｒ2Ｏ3）を主とする金属
酸化物の被膜が表面に露出するので、この被膜が希フッ
化水素中への金属イオンの溶出を低減するものと考えら
れる。However, by heating the stainless steel after the electropolishing at a constant temperature in an oxidizing atmosphere, as shown in FIG. 4, the surface of the stainless steel is made of an iron-based oxide (FeO, Fe 3 O 4 , Fe
A colored oxide film of a metal oxide mainly composed of 2 O 3 ) is formed, and the Cr and Ni components are relatively increased at the interface between the colored oxide film and the lower base material. Therefore, by removing the colored oxide film having a large amount of Fe component on the surface layer, as shown in FIG. 5, a dense metal oxide film mainly composed of a chromium-based oxide (Cr 2 O 3 ) is exposed on the surface. Therefore, it is considered that this coating reduces elution of metal ions into dilute hydrogen fluoride.
【００１０】本発明において、希フッ化水素とは、１０
００ｐｐｍ以下の濃度のフッ化水素酸の水溶液をいう。In the present invention, dilute hydrogen fluoride refers to 10
It refers to an aqueous solution of hydrofluoric acid having a concentration of 00 ppm or less.
【００１１】加熱温度が４００℃未満では、酸化被膜の
形成が不充分であり、５００℃より高温に加熱すると、
酸化被膜が過度に厚くなると同時に脆くなる。同様に、
加熱時間が１時間より短いと、酸化被膜の形成が不充分
であり、一方、３時間より長くなると、酸化被膜が過厚
となる。従って、加熱条件としては、４００〜５００℃
で１〜３時間加熱するのが好ましい。When the heating temperature is lower than 400 ° C., the formation of an oxide film is insufficient.
The oxide film becomes too thick and brittle at the same time. Similarly,
When the heating time is shorter than 1 hour, formation of an oxide film is insufficient, while when it is longer than 3 hours, the oxide film becomes too thick. Therefore, the heating condition is 400 to 500 ° C.
And heating for 1 to 3 hours.
【００１２】[0012]
【実施例】以下、実施例として、ＳＵＳ３１６Ｌステン
レス鋼製の厚み２ｍｍ、幅３０ｍｍ、長さ４０ｍｍの試
料を、りん酸・硫酸系電解液により電解電流密度１０Ａ
／ｄｍ2 で８分間電解研磨して表面の加工変質層を１０
〜５０μｍ除去することで健全な母材表面を得、次い
で、抵抗率１８ＭΩ・ｃｍ以上の超純水により精密洗浄
を行ってから、酸化雰囲気で４５０℃×２時間の加熱処
理を行い、次に、１Ｎ塩酸で着色酸化被膜の除去を行う
ことにより、厚みが５０〜１００×１０-8ｃｍのクロム
系酸化物の被膜（図５参照）が表面に形成された本発明
の試料を得た。比較例として、同上寸法のステンレス鋼
製試料について同上条件で電解研磨のみを行った、比較
例の試料を得た。EXAMPLE As an example, a SUS316L stainless steel sample having a thickness of 2 mm, a width of 30 mm, and a length of 40 mm was subjected to an electrolytic current density of 10 A using a phosphoric acid / sulfuric acid-based electrolyte.
/ Dm 2 for 8 minutes by electropolishing to make the surface damaged layer 10
~ 50μm removal to obtain a sound base material surface, then precision cleaning with ultrapure water with a resistivity of 18MΩcm or more, then heat treatment at 450 ° C x 2 hours in an oxidizing atmosphere, By removing the colored oxide film with 1N hydrochloric acid, a sample of the present invention having a chromium-based oxide film having a thickness of 50 to 100 × 10 −8 cm (see FIG. 5) formed on the surface was obtained. As a comparative example, a sample of a comparative example in which only a stainless steel sample having the same dimensions as above was subjected to electrolytic polishing only under the same conditions as above was obtained.
【００１３】次いで、フッ化水素酸（以下「ＨＦ」とい
う）の１００ｃｃの溶液（１０ｐｐｍ、１００ｐｐｍ、
１０００ｐｐｍの３種類の濃度のもの）をポリエチレン
製の容器に入れ、上記のようにして作製した各試料を容
器内のＨＦ中に浸漬した後、蓋をしてクリーンルーム室
内に静置した。そして、試験開始後７日目、１４日目、
２８日目に容器内のＨＦ水を取り替え、ＩＣＰ−ＭＳ
（誘導結合プラズマ質量分析計）で金属イオンの分析を
行った。すなわち、ＨＦ水の交換の有無に関わらず、浸
漬試料は同じものを浸漬した。例えば、１４日目のもの
は、８日目より１４日目までの７日間の浸漬結果であ
り、２８日目のものは、１５日目より２８日目までの１
４日間の浸漬結果である。金属イオン（μｇ／ｍ2・
日） の測定結果を図１〜３に示す。以下、各図につい
て説明する。なお、図における棒グラフの意味は、黒い
ものは７日目のデータを示し、灰色のものは１４日目の
データを示し、白いものは２８日目のデータを示す。Next, a 100 cc solution of hydrofluoric acid (hereinafter referred to as "HF") (10 ppm, 100 ppm,
(Three concentrations of 1000 ppm) were placed in a polyethylene container, and each sample prepared as described above was immersed in HF in the container. And on the 7th and 14th day after the test started,
On the 28th day, the HF water in the container was replaced and ICP-MS
(Inductively coupled plasma mass spectrometer) was used to analyze metal ions. That is, the same immersion sample was immersed regardless of whether or not the HF water was replaced. For example, on the 14th day, the result of immersion for 7 days from the 8th day to the 14th day, and on the 28th day, the result of
It is a result of immersion for 4 days. Metal ion (μg / m 2
1) to 3) are shown in FIGS. Hereinafter, each figure will be described. The meanings of the bar graphs in the figure are as follows: black indicates data on day 7, gray indicates data on day 14, and white indicates data on day 28.
【００１４】（１）図１ 図１はＨＦ水が１０ｐｐｍの場合を示し、具体的な数値
は表１に示すとおりである。(1) FIG. 1 FIG. 1 shows a case where HF water is 10 ppm, and specific numerical values are as shown in Table 1.
【００１５】[0015]
【表１】 [Table 1]
【００１６】図１および表１に明らかなとおり、ＨＦ水
が１０ｐｐｍの場合では、比較例の試料も本実施例の試
料も同様に金属イオンの溶出量は少なく、ＨＦに対して
優れた耐性を示している。As is clear from FIG. 1 and Table 1, when the HF water content is 10 ppm, the sample of the comparative example and the sample of the present example also have a small amount of metal ions eluted and have excellent resistance to HF. Is shown.
【００１７】（２）図２ 図２はＨＦ水が１００ｐｐｍの場合を示し、具体的な数
値は表２に示すとおりである。(2) FIG. 2 FIG. 2 shows a case where HF water is 100 ppm, and specific numerical values are as shown in Table 2.
【００１８】[0018]
【表２】 [Table 2]
【００１９】図２および表２に明らかなとおり、ＨＦ水
が１００ｐｐｍの場合では、１０ｐｐｍのＨＦ水に浸漬
した場合に比べて金属イオンの溶出量は増えている。し
かし、７日目の数値に比して、１４日目、２８日目にな
ると、本実施例の試料も比較例の試料も同様に溶出量は
低下しており、この期間内では比較例の試料も本実施例
の試料と同様に、ＨＦに対する耐性はあるものと判断さ
れる。しかし、溶出量の数値そのものは本実施例の試料
は比較例の試料の約１／２であり、本実施例の試料の方
がＨＦに対する耐性が優れていることは明らかである。As is clear from FIG. 2 and Table 2, the amount of metal ions eluted when HF water is 100 ppm is greater than when immersed in 10 ppm HF water. However, on the 14th day and the 28th day, the elution amount of the sample of this example and the sample of the comparative example similarly decreased compared to the numerical value on the 7th day. The sample is also determined to have resistance to HF, similarly to the sample of this example. However, the value of the elution amount itself is about 1/2 of that of the sample of the present example compared to the sample of the comparative example, and it is clear that the sample of this example has better resistance to HF.
【００２０】（３）図３ 図３はＨＦ水が１０００ｐｐｍの場合を示し、具体的な
数値は表３に示すとおりである。(3) FIG. 3 FIG. 3 shows a case where the HF water content is 1000 ppm, and specific numerical values are as shown in Table 3.
【００２１】[0021]
【表３】 [Table 3]
【００２２】図３および表３に明らかなとおり、ＨＦ水
が１０００ｐｐｍになると、比較例の試料の金属イオン
の溶出量は激増しており、ＨＦに対する耐性のないこと
は明らかである。本実施例の試料の溶出量も増加してい
るが、２８日浸漬後の試料を目視観察した結果、比較例
の試料は光沢は失われて白濁化していたが、本実施例の
試料は金属光沢を有しており、ＨＦに対する耐性は失わ
れていないと言える。なお、２８日間のデータより腐食
速度（μｍ／年）を求めると、本実施例の場合、次の表
４のようになる。As is clear from FIG. 3 and Table 3, when the HF water content becomes 1000 ppm, the elution amount of the metal ions of the sample of the comparative example increases drastically, and it is clear that there is no resistance to HF. Although the elution amount of the sample of the present example was also increased, the sample of the comparative example was visually observed after immersion for 28 days. It has gloss and it can be said that resistance to HF has not been lost. In addition, when the corrosion rate (μm / year) is obtained from the data for 28 days, in the case of the present embodiment, it is as shown in Table 4 below.
【００２３】[0023]
【表４】 [Table 4]
【００２４】今、本実施例の試料表面のクロム酸化膜の
厚さが１００×１０-8ｃｍ（０．０１μｍ）であるとす
れば、ＨＦの濃度が１００ｐｐｍの場合、１年以上の寿
命があり、ＨＦの濃度が１０ｐｐｍになると、長期間に
わたってＨＦに対する耐性があると言える。Now, assuming that the thickness of the chromium oxide film on the sample surface of this embodiment is 100 × 10 −8 cm (0.01 μm), the life of one year or more is obtained when the concentration of HF is 100 ppm. That is, when the concentration of HF becomes 10 ppm, it can be said that there is resistance to HF for a long period of time.
【００２５】本実施例ではステンレス鋼としてＳＵＳ３
１６Ｌを使用したが、ＳＵＳ３１６等であってもよく、
各種ステンレス鋼が使用できる。In this embodiment, SUS3 is used as stainless steel.
Although 16L was used, SUS316 or the like may be used.
Various stainless steels can be used.
【００２６】[0026]
【発明の効果】本発明によれば、希フッ化水素に対する
金属イオンの溶出量が極めて少ないステンレス鋼及びそ
の製造方法を提供することができる。According to the present invention, it is possible to provide a stainless steel having a very small amount of metal ions eluted with respect to dilute hydrogen fluoride and a method for producing the same.
【図面の簡単な説明】[Brief description of the drawings]
【図１】ＨＦの濃度が１０ｐｐｍの水溶液に対する金属
イオンの溶出量を示す図である。FIG. 1 is a diagram showing the elution amount of metal ions in an aqueous solution having a HF concentration of 10 ppm.
【図２】ＨＦの濃度が１００ｐｐｍの水溶液に対する金
属イオンの溶出量を示す図である。FIG. 2 is a graph showing the amount of metal ions eluted from an aqueous solution having a HF concentration of 100 ppm.
【図３】ＨＦの濃度が１０００ｐｐｍの水溶液に対する
金属イオンの溶出量を示す図である。FIG. 3 is a diagram showing the amount of metal ions eluted with respect to an aqueous solution having a HF concentration of 1000 ppm.
【図４】電解研磨後に酸化雰囲気で加熱処理を行ったス
テンレス鋼表面の厚さ方向の原子濃度分布を示す図であ
る。FIG. 4 is a diagram showing an atomic concentration distribution in a thickness direction of a stainless steel surface subjected to a heat treatment in an oxidizing atmosphere after electrolytic polishing.
【図５】電解研磨後に酸化雰囲気で加熱処理を行い、さ
らに、酸化被膜の除去処理を行ったステンレス鋼表面の
厚さ方向の原子濃度分布を示す図である。FIG. 5 is a diagram showing an atomic concentration distribution in a thickness direction of a stainless steel surface subjected to a heat treatment in an oxidizing atmosphere after electrolytic polishing and further subjected to an oxide film removal treatment.
Claims (3)
００×１０-8ｃｍの厚みのクロム系酸化物を主とする金
属酸化物の被膜が形成された希フッ化水素用ステンレス
鋼。1. The method according to claim 1, further comprising the step of:
A stainless steel for dilute hydrogen fluoride on which a metal oxide film mainly composed of a chromium oxide having a thickness of 00 × 10 −8 cm is formed.
た後、酸化性雰囲気中で加熱することにより、鉄系酸化
物を主とする金属酸化物の着色酸化被膜を表面に形成
し、次いで、この着色酸化皮膜を溶解除去することによ
り、５０〜１００×１０ -8 ｃｍの厚みのクロム系酸化物
を主とする金属酸化物の被膜を表面に形成することを特
徴とする希フッ化水素用ステンレス鋼の製造方法。2. A stainless steel surface is subjected to an electrolytic polishing treatment, and then heated in an oxidizing atmosphere to form a colored oxide film of a metal oxide mainly composed of an iron-based oxide on the surface. Dissolving and removing the colored oxide film to form a metal oxide film mainly composed of a chromium-based oxide having a thickness of 50 to 100 × 10 −8 cm on the surface. Method of manufacturing stainless steel.
時間加熱するものであることを特徴とする請求項２記載
の希フッ化水素用ステンレス鋼の製造方法。3. The heating conditions are 400 to 500 ° C. and 1 to 3
3. The method for producing a stainless steel for diluted hydrogen fluoride according to claim 2, wherein the stainless steel is heated for a time.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30034296A JP3194876B2 (en) | 1996-11-12 | 1996-11-12 | Stainless steel for dilute hydrogen fluoride and its manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30034296A JP3194876B2 (en) | 1996-11-12 | 1996-11-12 | Stainless steel for dilute hydrogen fluoride and its manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH10140323A JPH10140323A (en) | 1998-05-26 |
| JP3194876B2 true JP3194876B2 (en) | 2001-08-06 |
Family
ID=17883628
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30034296A Expired - Fee Related JP3194876B2 (en) | 1996-11-12 | 1996-11-12 | Stainless steel for dilute hydrogen fluoride and its manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3194876B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102223547B1 (en) | 2020-09-08 | 2021-03-05 | (주)후성 | Method for making noodles using dodam rice and konjac and noodles manufactured using the same |
-
1996
- 1996-11-12 JP JP30034296A patent/JP3194876B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102223547B1 (en) | 2020-09-08 | 2021-03-05 | (주)후성 | Method for making noodles using dodam rice and konjac and noodles manufactured using the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH10140323A (en) | 1998-05-26 |
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