JP3199441B2 - Manufacturing method of color filter - Google Patents
Manufacturing method of color filterInfo
- Publication number
- JP3199441B2 JP3199441B2 JP10971392A JP10971392A JP3199441B2 JP 3199441 B2 JP3199441 B2 JP 3199441B2 JP 10971392 A JP10971392 A JP 10971392A JP 10971392 A JP10971392 A JP 10971392A JP 3199441 B2 JP3199441 B2 JP 3199441B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- shielding film
- transparent substrate
- color filter
- display area
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Optical Filters (AREA)
- Liquid Crystal (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明はカラー液晶表示装置等に
用いられるカラーフィルターの製造方法に関するもので
ある。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a color filter used in a color liquid crystal display device or the like.
【０００２】[0002]
【従来の技術】カラーフィルターを採用したカラー液晶
表示装置が提案されているが、このカラー液晶表示装置
は、赤、緑、青等の顔料を含有する感光性着色樹脂を透
明基板上に塗布し、フォトリソグラフィー技術で微細な
カラーフィルターを格子状に形成するという技術により
製造され、この技術は通常「顔料分散法」と呼ばれる。2. Description of the Related Art A color liquid crystal display device employing a color filter has been proposed. In this color liquid crystal display device, a photosensitive colored resin containing pigments such as red, green, and blue is coated on a transparent substrate. It is manufactured by a technique of forming fine color filters in a lattice by photolithography, and this technique is usually called a "pigment dispersion method".
【０００３】このカラー液晶表示装置に係るカラーフィ
ルターを図７〜図１０により説明する。A color filter according to the color liquid crystal display device will be described with reference to FIGS.
【０００４】図７において、１はガラス等の透明基板で
あり、この透明基板１の上に真空蒸着やスパッタリング
等で金属クロム等の遮光膜２を形成する。この遮光膜２
は格子状に形成し、その各格子が個々の画素に相当す
る。In FIG. 7, reference numeral 1 denotes a transparent substrate made of glass or the like, on which a light-shielding film 2 made of metal chromium or the like is formed by vacuum evaporation or sputtering. This light shielding film 2
Are formed in a lattice shape, and each lattice corresponds to an individual pixel.
【０００５】次いで図８に示すように例えば赤の顔料を
分散させた感光性樹脂３を印刷やスピンコートで全面に
塗布し、マスク４を介して露光すると、図９のように赤
の画素５が形成される。Next, as shown in FIG. 8, a photosensitive resin 3 in which, for example, a red pigment is dispersed is applied to the entire surface by printing or spin coating, and is exposed through a mask 4 to obtain a red pixel 5 as shown in FIG. Is formed.
【０００６】更に、この工程を緑、青という他の画素に
ついても、それぞれ繰り返し行うと図１０に示すように
緑の画素６と青の画素７ができる。Further, when this process is repeated for other pixels of green and blue, a green pixel 6 and a blue pixel 7 are formed as shown in FIG.
【０００７】[0007]
【発明が解決しようとする問題点】しかしながら、上記
提案のカラーフィルターの場合、透明基板１に遮光膜２
を格子状に形成すると、その形成前に比べて透明基板１
が例えば１００Ｖ〜２００Ｖにまで帯電することが判明
した。However, in the case of the color filter proposed above, the light shielding film 2
Is formed in a lattice shape, the transparent substrate 1
Has been found to be charged to, for example, 100V to 200V.
【０００８】このような透明基板１の帯電については、
透明基板１のスプレーによる純水洗浄の際、その洗浄の
後の乾燥のために、ドライエアーでその水滴を吹き飛ば
す工程が入り、この乾燥工程で静電気が発生することが
考えられる。[0008] Regarding the charging of the transparent substrate 1,
At the time of cleaning the transparent substrate 1 with pure water by spraying, a step of blowing off the water droplets with dry air for drying after the cleaning is included, and it is considered that static electricity is generated in this drying step.
【０００９】従って、このような静電気により種々のパ
ーテクルが遮光膜２に付着することが判った。このパー
テクルは例えばクリーンルーム内にあるダストであり、
有機系のダストとしては、人体より発する皮脂や衣類、
その工程上使用されている樹脂等があり、無機系のダス
トには外部から入り込む珪酸塩、炭酸塩、各種酸化物、
金属粉等がある。そして、このようにパーテクルが遮光
膜２に付着し、そのパーテクルが寸法的に大きい場合、
その後に感光性樹脂３を塗布し、各画素５、６、７を形
成しても、各画素領域にパーテクルが混入することによ
り、そのカラーフィルターが有する色純度や明るさ等の
特性が低下するという問題点がある。Therefore, it was found that various particles adhere to the light shielding film 2 due to such static electricity. This particle is, for example, dust in a clean room,
Organic dust includes sebum and clothing from the human body,
There are resins used in the process, and inorganic dusts such as silicates, carbonates, various oxides,
There are metal powders and the like. When the particles adhere to the light-shielding film 2 and the particles are large in dimensions,
After that, even if the photosensitive resin 3 is applied to form the respective pixels 5, 6, and 7, the particles such as the particles are mixed into the respective pixel regions, and the characteristics such as color purity and brightness of the color filter are reduced. There is a problem.
【００１０】[0010]
【問題点を解決するための手段】本発明のカラーフィル
ターの製造方法は、カラー液晶表示に用いるものであっ
て、真空蒸着もしくはスパッタリングでもって矩形状の
透明基板上に金属からなる遮光膜を格子状に形成すると
同時に、この透明基板上の非表示領域における対向端部
にも上記遮光膜を延在して導電膜を形成し、次いで純水
洗浄し、その後にドライエア−により乾燥させ、しかる
後に各格子に対応する遮光膜の非成膜領域に着色樹脂を
被着させて表示領域を形成する工程を経て、前記導電膜
をアースせしめたことを特徴とする。The method of manufacturing a color filter according to the present invention is used for a color liquid crystal display. A light shielding film made of metal is formed on a rectangular transparent substrate by vacuum evaporation or sputtering. At the same time, the conductive film is formed by extending the light-shielding film also at the opposing end in the non-display area on the transparent substrate, then washed with pure water, and then dried with dry air. The conductive film is grounded through a step of forming a display region by applying a colored resin to a non-film-forming region of the light-shielding film corresponding to each lattice.
【００１１】[0011]
【作用】上記構成のカラーフィルターの製造方法であれ
ば、透明基板上の非表示領域に遮光膜を延在させてお
り、これによって表示領域の静電気に伴う帯電量が減少
し、その結果、静電気によるパーテクルの遮光膜に対す
る付着が低減でき、製造歩留まりが高くなる。According to the method of manufacturing a color filter having the above-described structure, the light-shielding film is extended in the non-display area on the transparent substrate, whereby the amount of charge associated with the static electricity in the display area is reduced. Can reduce the adhesion of the particles to the light-shielding film, thereby increasing the production yield.
【００１２】[0012]
【実施例】以下、本発明の実施例を述べる。Embodiments of the present invention will be described below.
【００１３】図１は、ガラス等の透明基板８の平面図で
あり、図２は図１中のＸ−Ｘ線による断面図である。こ
の透明基板８は充分に洗浄するとともに表面に析出した
アルカリ成分や油分等を除去して用いる。この透明基板
８の表示領域９には真空蒸着やスパッタリング等で金属
クロム等の遮光膜１０を形成する。この遮光膜１０は格
子状に形成し、その各格子が個々の画素に相当し、この
遮光膜１０の線幅は例えば、３〜２０μｍ、厚さは０．
１〜０．３μｍである。そして、この遮光膜１０を真空
蒸着やスパッタリング等で形成する際に、それと同時
に、非表示領域１１に遮光膜１０が延在するように導電
膜１２を形成する。従って、この導電膜１２は遮光膜１
０と電気的に導通している。次いで、このように遮光膜
１０と導電膜１２とを形成した透明基板８に対し、純水
洗浄し、その後にドライエア−により乾燥させる。FIG. 1 is a plan view of a transparent substrate 8 made of glass or the like, and FIG. 2 is a sectional view taken along line XX in FIG. The transparent substrate 8 is used after sufficiently washing and removing alkali components, oils and the like deposited on the surface. In the display area 9 of the transparent substrate 8, a light-shielding film 10 of metal chromium or the like is formed by vacuum evaporation, sputtering, or the like. The light-shielding film 10 is formed in a lattice shape, and each lattice corresponds to an individual pixel. The line width of the light-shielding film 10 is, for example, 3 to 20 μm, and the thickness is 0.
1 to 0.3 μm. When the light-shielding film 10 is formed by vacuum deposition, sputtering, or the like, at the same time, a conductive film 12 is formed so that the light-shielding film 10 extends in the non-display area 11. Therefore, this conductive film 12 is
It is electrically conductive with 0. Next, the transparent substrate 8 on which the light-shielding film 10 and the conductive film 12 are formed is washed with pure water and then dried with dry air.
【００１４】次いで図３に示すように例えば赤の顔料を
分散させた感光性樹脂１３を印刷やスピンコートで全面
に塗布し、マスク１４を介して露光すると、図４のよう
に赤の画素１５が形成される。Next, as shown in FIG. 3, a photosensitive resin 13 in which, for example, a red pigment is dispersed is applied to the entire surface by printing or spin coating, and is exposed through a mask 14, and as shown in FIG. Is formed.
【００１５】そして、この工程を緑、青という他の画素
についても、それぞれ繰り返し行うと、図５に示すよう
に緑の画素１６と青の画素１７ができる。When this process is repeated for the other pixels of green and blue, a green pixel 16 and a blue pixel 17 are formed as shown in FIG.
【００１６】然る後に図６に示すようにエポシキ樹脂や
アクリル樹脂等の透明樹脂を被覆してオーバーコート層
１８を形成し、各画素１５、１６、１７の表面を平滑化
する。そして、真空蒸着やスパッタリング等でインジウ
ム・スズ酸化物等からなる透明電極１９をオーバーコー
ト層１８の上に形成し、これにより、液晶層（図示せ
ず）を制御して各画素１５、１６、１７に対応する表示
を行う。Thereafter, as shown in FIG. 6, a transparent resin such as an epoxy resin or an acrylic resin is coated to form an overcoat layer 18, and the surfaces of the pixels 15, 16 and 17 are smoothed. Then, a transparent electrode 19 made of indium tin oxide or the like is formed on the overcoat layer 18 by vacuum evaporation, sputtering, or the like, thereby controlling a liquid crystal layer (not shown) to control each of the pixels 15, 16, A display corresponding to 17 is performed.
【００１７】かくして上記構成のカラーフィルターであ
れば、遮光膜１０と電気的に導通している導電膜１２を
形成しているので、表示領域の静電気に伴う帯電量が減
少し、その結果、静電気によるパーテクルの導電膜１２
に対する付着が低減でき、製造歩留まりが高くなる。Thus, in the color filter having the above-described structure, since the conductive film 12 which is electrically connected to the light-shielding film 10 is formed, the charge amount due to the static electricity in the display area is reduced. Particle conductive film 12
Can be reduced, and the production yield can be increased.
【００１８】また、この発明の場合には上記導電膜１２
をアースすると、表示領域が帯電しなくなり、パーテク
ルの付着が生じなくなり、一層有利である。In the case of the present invention, the conductive film 12
Grounding is more advantageous because the display area is no longer charged and particles do not adhere.
【００１９】尚、本発明は上記実施例に限られず、本発
明の要旨を逸脱しない範囲内で種々の変更、改良等は何
ら差し支えない。例えば、この実施例では顔料分散法の
場合であるが、その他に染色法、印刷法等であっても同
様である。It should be noted that the present invention is not limited to the above-described embodiment, and various changes and improvements may be made without departing from the scope of the present invention. For example, in this embodiment, the case of the pigment dispersion method is used, but the same applies to other methods such as a dyeing method and a printing method.
【００２０】[0020]
【発明の効果】以上のように、本発明のカラーフィルタ
ーの製造方法によれば、透明基板上に所定のパターンで
形成された遮光膜の非成膜領域に着色樹脂のカラーフィ
ルターを被着させて表示領域を形成するとともに、この
透明基板上の非表示領域に上記遮光膜を延在させたこと
により、表示領域の静電気に伴う帯電量が減少し、その
結果、静電気によるパーテクルの遮光膜に対する付着が
低減でき、製造歩留まりが高くなる。As described above, according to the method for manufacturing a color filter of the present invention, a color filter of a colored resin is applied to a non-film-forming region of a light-shielding film formed in a predetermined pattern on a transparent substrate. In addition to forming the display region by the above and extending the light-shielding film in the non-display region on the transparent substrate, the charge amount due to the static electricity in the display region is reduced, and as a result, the particles of the particle due to the static electricity with respect to the light-shielding film The adhesion can be reduced, and the production yield increases.
【図１】実施例における透明基板の平面図である。FIG. 1 is a plan view of a transparent substrate in an embodiment.
【図２】図１の透明基板のＸ−Ｘ線の線断面図である。FIG. 2 is a sectional view taken along line XX of the transparent substrate of FIG.
【図３】実施例におけるフォトレジスト形成基板の断面
図である。FIG. 3 is a cross-sectional view of a photoresist forming substrate in an example.
【図４】実施例における画素形成時の断面図である。FIG. 4 is a cross-sectional view when a pixel is formed in an example.
【図５】実施例におけるカラーフィルター形成後の断面
図である。FIG. 5 is a cross-sectional view after a color filter is formed in an example.
【図６】実施例における液晶表示用カラーフィルターの
断面図である。FIG. 6 is a cross-sectional view of a liquid crystal display color filter in an example.
【図７】遮光膜が形成された従来における透明基板の断
面図である。FIG. 7 is a cross-sectional view of a conventional transparent substrate on which a light shielding film is formed.
【図８】従来例におけるフォトレジストの形成基板の断
面図である。FIG. 8 is a cross-sectional view of a photoresist forming substrate in a conventional example.
【図９】従来例における画素形成時の断面図である。FIG. 9 is a cross-sectional view when a pixel is formed in a conventional example.
【図１０】従来例におけるカラーフィルター形成後の断
面図である。FIG. 10 is a cross-sectional view after a color filter is formed in a conventional example.
１、８ 透明基板 ２、１０ 遮光膜 ３、１３ 感光性樹脂 ４、１４ マスク ５、６、７、１５、１６、１７ 画素 ９ 表示領域 １１ 非表示領域 １２ 導電膜 1, 8 Transparent substrate 2, 10 Light-shielding film 3, 13 Photosensitive resin 4, 14 Mask 5, 6, 7, 15, 16, 17 Pixel 9 Display area 11 Non-display area 12 Conductive film
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7，ＤＢ名) G02B 5/20 101 G02F 1/1335 505 ──────────────────────────────────────────────────続 き Continued on front page (58) Field surveyed (Int.Cl. 7 , DB name) G02B 5/20 101 G02F 1/1335 505
Claims (1)
矩形状の透明基板上に金属からなる遮光膜を格子状に形
成すると同時に、この透明基板上の非表示領域における
対向端部にも上記遮光膜を延在して導電膜を形成し、次
いで純水洗浄し、その後にドライエア−により乾燥さ
せ、しかる後に各格子に対応する遮光膜の非成膜領域に
着色樹脂を被着させて表示領域を形成する工程を経て、
前記導電膜をアースせしめたことを特徴とするカラー液
晶表示に用いるカラーフィルターの製造方法。(1) vacuum evaporation or sputtering
A light-shielding film made of metal is formed in a grid on a rectangular transparent substrate.
At the same time as the non-display area on this transparent substrate
The light-shielding film is also extended to the opposite end to form a conductive film.
Wash with pure water and dry with dry air.
After that, the non-film formation area of the light shielding film corresponding to each lattice
Through the step of forming a display area by applying a colored resin,
A method for producing a color filter for use in a color liquid crystal display, wherein the conductive film is grounded.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10971392A JP3199441B2 (en) | 1992-04-28 | 1992-04-28 | Manufacturing method of color filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10971392A JP3199441B2 (en) | 1992-04-28 | 1992-04-28 | Manufacturing method of color filter |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05303015A JPH05303015A (en) | 1993-11-16 |
| JP3199441B2 true JP3199441B2 (en) | 2001-08-20 |
Family
ID=14517340
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10971392A Expired - Fee Related JP3199441B2 (en) | 1992-04-28 | 1992-04-28 | Manufacturing method of color filter |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3199441B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1087793C (en) * | 1999-08-25 | 2002-07-17 | 九采罗彩棉产业有限公司 | Process for mixing natural colour cotton fibres uniformly |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012088640A (en) * | 2010-10-22 | 2012-05-10 | Toppan Printing Co Ltd | Color filter substrate for ips (in-plane switching) system, and liquid crystal display device employing ips system |
-
1992
- 1992-04-28 JP JP10971392A patent/JP3199441B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1087793C (en) * | 1999-08-25 | 2002-07-17 | 九采罗彩棉产业有限公司 | Process for mixing natural colour cotton fibres uniformly |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH05303015A (en) | 1993-11-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3199441B2 (en) | Manufacturing method of color filter | |
| JPS6033507A (en) | Prodution of color filter | |
| GB2305765A (en) | Method of forming the black matrix of a liquid crystal display | |
| JPH0486601A (en) | Color filter | |
| JP4810713B2 (en) | Manufacturing method of color filter | |
| KR100710141B1 (en) | Manufacturing Method of Color Filter Substrate | |
| JPH07146407A (en) | Color filter manufacturing method | |
| JP2634708B2 (en) | How to make a color filter | |
| JPH05157907A (en) | Color filter and manufacturing method thereof | |
| JP3125621B2 (en) | Manufacturing method of color filter | |
| JPH08234011A (en) | Color filter substrate and manufacturing method thereof | |
| JPH1048417A (en) | Color filter, method of manufacturing the same, and liquid crystal display device using the color filter | |
| JP2000002805A (en) | Color filter substrate and production of color filter substrate | |
| JPH10123312A (en) | Color filter, color liquid crystal display device, and manufacturing method thereof | |
| JPH0652325B2 (en) | Color filter manufacturing method | |
| CN108761996A (en) | The manufacturing method of mask plate and its manufacturing method and colored filter | |
| JPH05333205A (en) | How to fix color filter | |
| JPH08278499A (en) | Color liquid crystal display device and method for manufacturing color filter substrate | |
| JP2659689B2 (en) | Manufacturing method of color filter | |
| JP3265747B2 (en) | Manufacturing method of color filter | |
| JPH0440419A (en) | Electrode deposited with color filter on top | |
| JPH06235811A (en) | Production of color filter | |
| JP2001042337A (en) | Liquid crystal display device and method of manufacturing the same | |
| JPH0566306A (en) | Color filter manufacturing method | |
| JPH0327015A (en) | Manufacturing method for color LCD substrate |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |