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JP3203889B2 - Semiconductor device - Google Patents
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JP3203889B2 - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JP3203889B2
JP3203889B2 JP17188893A JP17188893A JP3203889B2 JP 3203889 B2 JP3203889 B2 JP 3203889B2 JP 17188893 A JP17188893 A JP 17188893A JP 17188893 A JP17188893 A JP 17188893A JP 3203889 B2 JP3203889 B2 JP 3203889B2
Authority
JP
Japan
Prior art keywords
wiring
substrate
semiconductor chip
lead
center
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP17188893A
Other languages
Japanese (ja)
Other versions
JPH0729936A (en
Inventor
浩 米田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denso Corp
Original Assignee
Denso Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Denso Corp filed Critical Denso Corp
Priority to JP17188893A priority Critical patent/JP3203889B2/en
Publication of JPH0729936A publication Critical patent/JPH0729936A/en
Application granted granted Critical
Publication of JP3203889B2 publication Critical patent/JP3203889B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0201Thermal arrangements, e.g. for cooling, heating or preventing overheating
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/11Printed elements for providing electric connections to or between printed circuits
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/18Printed circuits structurally associated with non-printed electric components
    • H05K1/181Printed circuits structurally associated with non-printed electric components associated with surface mounted components
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/721Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
    • H10W90/724Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between a chip and a stacked insulating package substrate, interposer or RDL

Landscapes

  • Wire Bonding (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】この発明は、液晶表示装置やハイ
ブリッドIC装置その他の半導体装置に関し、特に半導
体チップの直下にも基板配線が施される高密度配線基板
を用いる半導体装置にあって、それら基板配線の断線を
有効に防止する基板配線構造の改良に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device, a hybrid IC device, and other semiconductor devices, and more particularly, to a semiconductor device using a high-density wiring board in which a board wiring is provided immediately below a semiconductor chip. The present invention relates to an improvement in a board wiring structure for effectively preventing a break in a board wiring.

【0002】[0002]

【従来の技術】近年の基板に対する半導体チップ実装密
度の高密度化に伴い、それら装着される半導体チップの
直下にも基板配線を引き廻す需要が増えつつある。
2. Description of the Related Art With the recent increase in the mounting density of semiconductor chips on a substrate, there is an increasing demand for routing a substrate wiring directly under the semiconductor chips to be mounted.

【0003】例えば、特開昭59−125641号公報
には、ICチップの全端子を格子状に配列された外部接
続用端子に配線することで、多数の端子を高密度に取り
出すことを可能としたリードレスチップキャリアが記載
されている。このようなICチップが基板上に装着され
る場合には、自ずと該ICチップの直下にも基板配線が
引き廻されることとなる。
For example, Japanese Patent Application Laid-Open No. Sho 59-125641 discloses that by wiring all terminals of an IC chip to external connection terminals arranged in a grid, it is possible to take out a large number of terminals at high density. A leadless chip carrier is described. When such an IC chip is mounted on a substrate, the substrate wiring is naturally routed immediately below the IC chip.

【0004】また、特開昭61−104868号公報に
は、発熱抵抗体と電気素子(ドライバ用のIC)との配
線を電気素子の真下に引き廻してフェイスダウン接続す
ることにより、電気素子を高密度実装できるようにした
感熱記録ヘッドが記載されている。そしてこの感熱記録
ヘッドでは、上記電気素子(ドライバ用のIC)直下の
引き廻し配線を、直線部から適当な角度により放射状に
引き出し且つ、先端部に行くにしたがってその配線幅が
太くなるよう施すことによって、配線導体間の短絡や配
線導体の断線を防止するようにしている。
Japanese Patent Application Laid-Open No. 61-104868 discloses a method of connecting an electric element by connecting a wiring between a heating resistor and an electric element (driver IC) directly underneath the electric element and making a face-down connection. A thermal recording head capable of high-density mounting is described. In this heat-sensitive recording head, the lead-out wiring directly under the electric element (driver IC) is radially drawn out from the linear part at an appropriate angle, and is applied so that the wiring width becomes wider toward the tip. Thereby, short circuit between the wiring conductors and disconnection of the wiring conductors are prevented.

【0005】[0005]

【発明が解決しようとする課題】このように、IC等の
半導体チップの直下にも基板配線を施すようにすれば、
確かに、それら半導体チップの実装密度は大きく向上さ
れる。
As described above, if the substrate wiring is provided directly under a semiconductor chip such as an IC,
Certainly, the mounting density of these semiconductor chips is greatly improved.

【0006】また、上記特開昭61−104868号公
報に記載の感熱記録ヘッドに見られるように、それら半
導体チップの直下に施される基板配線の配線幅を先端部
に行くにしたがって太くすることで、確かに、それら配
線導体の断線も起こり難くはなる。
In addition, as seen in the thermal recording head described in Japanese Patent Application Laid-Open No. 61-104868, the wiring width of the substrate wiring provided immediately below these semiconductor chips is increased as going toward the tip. Indeed, the disconnection of these wiring conductors is unlikely to occur.

【0007】しかし現実には、それら半導体装置の駆動
に伴って大きな発熱が生じる場合、或いは休止時と駆動
時とで寒暖の差の大きな環境におかれる場合などには、
例えばSi等の材料からなる半導体チップと例えばAl
2 O3 等の材料からなる基板との熱膨張係数の違いに起
因する大きな応力が発生する。すなわち、こうした発熱
等が繰り返されることにより、基板上でそれら半導体チ
ップの端子と電気的且つ物理的に接続される電極部と該
電極部から引き出される基板配線(引き出し配線)との
間に大きなストレスが発生することとなり、やがては、
これら電極部とその引き出し配線との間に破断が生じて
電気的に導通がとれなくなる事態に陥ることとなる。こ
れは、たとえ上述のように、半導体チップの直下に施さ
れる基板配線の配線幅を先端部に行くにしたがって太く
したところで同様であり、上記発生されるストレスによ
ってその一部にでも破断が生じれば(このような破断は
基板にまでも及ぶことがある)、たちどころにそれが進
展し、最悪の場合には、電気的な導通すら維持できなく
なる。このように、半導体チップの直下にも基板配線が
施される高密度配線基板を用いる半導体装置にあっては
避け得ない問題を抱えながらも、従来は、これに良好に
対処し得る方策は講じられていなかった。
However, in reality, when a large amount of heat is generated with the driving of these semiconductor devices, or when the semiconductor device is placed in an environment where there is a large difference in temperature between when the semiconductor device is stopped and when the device is driven, for example,
For example, a semiconductor chip made of a material such as Si
A large stress is generated due to a difference in thermal expansion coefficient from a substrate made of a material such as 2 O3. That is, due to the repetition of such heat generation and the like, a large stress is applied between the electrode portion electrically and physically connected to the terminals of the semiconductor chips on the substrate and the substrate wiring (lead wiring) drawn from the electrode portion. Will occur, and eventually
Breakage occurs between these electrode portions and the lead wires, resulting in a situation where electrical conduction cannot be achieved. This is the same as described above, even when the wiring width of the substrate wiring provided immediately below the semiconductor chip is increased toward the front end portion, and the generated stress causes breakage even in a part thereof. If they do (such breaks can extend to the substrate), they can quickly evolve and, in the worst case, not even maintain electrical continuity. As described above, although there is an inevitable problem in a semiconductor device using a high-density wiring substrate in which a substrate wiring is also provided directly below a semiconductor chip, conventionally, measures have been taken to cope with this problem. Had not been.

【0008】この発明は、こうした実情に鑑みてなされ
たものであり、たとえ上記ストレスが生じようとも、半
導体チップ直下に施される基板配線の断線を良好に防止
することのできる半導体装置を提供することを目的とす
る。
The present invention has been made in view of such circumstances, and provides a semiconductor device capable of favorably preventing disconnection of a substrate wiring provided immediately below a semiconductor chip even if the above-mentioned stress occurs. The purpose is to:

【0009】[0009]

【課題を解決するための手段】こうした目的を達成する
ため、この発明では、半導体チップと該半導体チップが
搭載される基板とを有し、前記基板は、前記搭載される
半導体チップの各端子と電気的且つ物理的に接続される
複数の電極部及びこれら電極部から引き出される引き出
し配線を具えるとともに、これら引き出し配線を通じて
前記半導体チップの直下にも基板配線が施される半導体
装置において、前記各電極部から引き出される引き出し
配線を、それら電極部の、前記搭載される半導体チップ
の中心から各々遠方となる側に配設するようにする。
In order to achieve the above object, according to the present invention, there is provided a semiconductor chip and a substrate on which the semiconductor chip is mounted, wherein the substrate is connected to each terminal of the mounted semiconductor chip. A semiconductor device, comprising: a plurality of electrode portions that are electrically and physically connected; and lead wires drawn out from these electrode portions, wherein a board wire is also provided directly under the semiconductor chip through the lead wires. The lead wires drawn from the electrode portions are arranged on the side of each of the electrode portions that is far from the center of the semiconductor chip to be mounted.

【0010】[0010]

【作用】上記半導体チップの直下にも基板配線が施され
る半導体装置にあっては、・基板の熱膨張係数が半導体
チップの熱膨張係数よりも大きい通常の関係において、
基板配線の破断は、各電極部から見て、同基板に搭載さ
れる半導体チップの中心を向く側に高い確率で発生す
る。ことが、発明者によって発見、確認された。
In a semiconductor device in which a substrate wiring is also provided directly below the semiconductor chip, in a normal relation where the thermal expansion coefficient of the substrate is larger than that of the semiconductor chip,
Breakage of the substrate wiring occurs with a high probability on the side facing the center of the semiconductor chip mounted on the substrate when viewed from each electrode portion. This was discovered and confirmed by the inventor.

【0011】したがって上記のように、各電極部から引
き出される引き出し配線を、それら電極部の、前記搭載
される半導体チップの中心から各々遠方となる側に配設
するようにすれば、たとえ前記破断が生じようとも、ま
たそれが基板自体にまで及ぶことがあろうとも、それら
電極部と引き出し配線との間で電気的に導通がとれなく
なるような事態だけは避けることができるようになる。
Therefore, as described above, if the lead wires drawn from the respective electrode portions are arranged on the sides of the electrode portions that are farther from the center of the semiconductor chip to be mounted, the above-described breakage can be achieved. Irrespective of whether it occurs or even extends to the substrate itself, it is possible to avoid only a situation in which electrical continuity cannot be established between the electrode portions and the lead wiring.

【0012】なお、前記各引き出し配線を特に、前記各
電極部の中心と前記搭載される半導体チップの中心とを
結ぶ直線の延長線上に配設するようにすれば、すなわ
ち、各電極部の中心から半導体チップの中心を見て正反
対となる180度の角度をもって、それら引き出し配線
を電極部から引き出すようにすれば、こうした断線も、
ほぼ確実に避けられることが確認されている。
It is to be noted that the respective lead-out wirings are particularly arranged on an extension of a straight line connecting the center of each of the electrode portions and the center of the semiconductor chip to be mounted, that is, the center of each of the electrode portions. If the lead wires are pulled out from the electrode portion at an angle of 180 degrees that is exactly opposite when looking at the center of the semiconductor chip from the
It has been confirmed that it can almost certainly be avoided.

【0013】[0013]

【実施例】はじめに、この発明の原理について説明す
る。半導体チップの直下にも基板配線が施される半導体
装置における上述した問題、すなわちそれら半導体装置
の駆動に伴って大きな発熱が生じる場合、或いは休止時
と駆動時とで寒暖の差の大きな環境におかれる場合など
に、半導体チップと基板との熱膨張係数の違いに起因し
て基板電極部とその引き出し配線との間に発生する応
力、並びに該応力によるストレスについて実験を行った
ところ、発明者は、次の事実を発見するに至った。すな
わち、・基板の熱膨張係数が半導体チップの熱膨張係数
よりも大きい通常の関係において、基板配線の破断は、
各電極部から見て、同基板に搭載される半導体チップの
中心を向く側に高い確率で発生する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS First, the principle of the present invention will be described. The above-described problem in a semiconductor device in which substrate wiring is also provided immediately below a semiconductor chip, that is, in a case where a large amount of heat is generated due to driving of the semiconductor device, or in an environment where there is a large difference in temperature between a pause and a drive. For example, when the stress was generated between the substrate electrode portion and the lead-out wiring due to the difference in the thermal expansion coefficient between the semiconductor chip and the substrate, as well as the stress caused by the stress, an experiment was performed. Led to the discovery of the following facts: That is, in a normal relationship where the thermal expansion coefficient of the substrate is larger than the thermal expansion coefficient of the semiconductor chip, the breakage of the substrate wiring is
When viewed from each electrode portion, it occurs with a high probability on the side facing the center of the semiconductor chip mounted on the same substrate.

【0014】図6は、こうした実験の結果に基づき、電
極引き出し配線の断線率について、それら電極部の中心
からチップ中心をみた配線引き出し角度と断線率との関
係をグラフにしたものである。
FIG. 6 is a graph showing the relationship between the wire lead-out angle and the wire breakage rate when the chip center is viewed from the center of these electrode portions, based on the results of these experiments.

【0015】この図6にみられるように、各電極部から
半導体チップの中心に向かって引き出される引き出し配
線は、当該半導体装置に対する冷熱サイクルが繰り返え
されることで、ほぼ100%の確率で断線する。しか
し、その引き出し方向を変えることで該配線が断線する
確率も減り、特に、各電極部の中心から半導体チップの
中心を見て正反対となる180度の角度をもって、それ
ら引き出し配線を電極部から引き出した場合には、同様
に冷熱サイクルを繰り返しても、こうした断線はほぼ確
実に避けられるようになる。すなわちこのことは、各電
極部から引き出される引き出し配線を、それら電極部
の、前記搭載される半導体チップの中心から各々遠方と
なる側に配設するようにすれば、たとえ電極部の半導体
チップ中心側に前記破断が生じようとも、またそれが基
板自体にまで及ぶことがあろうとも、それら電極部と引
き出し配線との間で電気的に導通がとれなくなるような
事態は良好に回避されるようになることを意味する。
As shown in FIG. 6, the lead-out wiring drawn from each electrode portion toward the center of the semiconductor chip is disconnected with a probability of almost 100% due to the repetition of the cooling / heating cycle for the semiconductor device. I do. However, by changing the drawing direction, the probability of disconnection of the wiring is reduced, and in particular, the drawing wiring is drawn out of the electrode portion at an angle of 180 degrees which is exactly opposite to the center of the semiconductor chip from the center of each electrode portion. In such a case, such disconnection can be almost certainly avoided even if the cooling and heating cycle is repeated. That is, this means that if the lead wirings drawn out from the respective electrode portions are arranged on the sides of the electrode portions that are farther from the center of the semiconductor chip to be mounted, for example, the center of the semiconductor chip of the electrode portion may be provided. Regardless of whether the break occurs on the side or extends to the substrate itself, a situation in which electrical continuity is not established between the electrode portions and the lead-out wiring is preferably avoided. Means that

【0016】図1に、こうした原理に基づいて構成した
この発明にかかる半導体装置の一実施例を示す。この実
施例の半導体装置では、ソーダガラス板等からなる基板
1上に、フリップチップIC等からなる半導体チップ2
(破線で示す)をはんだ付けにより接合して所望の半導
体装置を構成する。
FIG. 1 shows an embodiment of a semiconductor device according to the present invention constructed based on such a principle. In the semiconductor device of this embodiment, a semiconductor chip 2 made of a flip chip IC or the like is placed on a substrate 1 made of a soda glass plate or the like.
(Shown by broken lines) are joined by soldering to form a desired semiconductor device.

【0017】このため、基板1には予め、上記半導体チ
ップ2の各端子位置に対向するよう電極部3が形成さ
れ、またこれら電極部3の形成に併せて、それら電極部
3から引き出される引き出し配線4、及びこの引き出し
配線4から更に基板1上を引き廻される基板配線5が形
成される。これら電極部3、引き出し配線4、及び基板
配線5は何れも、基板1上への適宜の薄膜金属の蒸着、
並びにエッチングによって、同図1に示される形状に形
成されるものとする。
For this reason, the electrode portions 3 are previously formed on the substrate 1 so as to face the respective terminal positions of the semiconductor chip 2, and the lead-outs drawn from the electrode portions 3 are formed in conjunction with the formation of the electrode portions 3. The wiring 4 and the substrate wiring 5 that is further routed on the substrate 1 from the lead wiring 4 are formed. Each of the electrode portion 3, the lead wiring 4, and the substrate wiring 5 is formed by depositing an appropriate thin-film metal on the substrate 1.
In addition, it is assumed to be formed into the shape shown in FIG. 1 by etching.

【0018】ここで、特に上記各電極部3に対する各引
き出し配線4の配設形状、すなわち引き出し方向は、こ
の図1からも明らかなように、それら電極部3の中心と
上記装着される半導体チップ2の中心6とを結ぶ直線の
延長方向、すなわち各電極部3の中心から半導体チップ
の中心6を見て正反対となる180度の角度をもつ方向
に設定される。これによって、半導体チップ2が基板1
上に実装された後、その使用環境において冷熱サイクル
が繰り返されたとしても、上述した原理に基づき、それ
ら引き出し配線4の断線はほぼ確実に避けられるように
なる。
Here, in particular, the arrangement of the lead wires 4 with respect to the electrode portions 3, that is, the lead direction, as is clear from FIG. 1, shows the center of the electrode portions 3 and the semiconductor chip to be mounted. The direction is set to a direction in which a straight line extending from the center 6 of the semiconductor chip 2 to the center 6 of the semiconductor chip is viewed from the center of each of the electrode portions 3, which is exactly opposite to the angle of 180 degrees. As a result, the semiconductor chip 2 is
Even if the thermal cycle is repeated in the usage environment after being mounted on the above, disconnection of the lead-out wirings 4 can be almost certainly avoided based on the above-described principle.

【0019】図2は、こうした実施例の半導体装置につ
いて、主にその電極部3付近の構造を拡大して示す斜視
断面図である。この図2において、半導体チップ2の端
子と基板1上に形成された電極部3とを電気的且つ物理
的に接続するはんだ7の外周部の、特にチップ中心6に
近い部分をa部、逆にチップ中心6から遠い部分をb部
とすると、上記の冷熱サイクルにより、特に高温から低
温に温度が変化したときに、チップ中心6に近い上記a
部に対して、これをへき開する方向に、半導体チップ2
と基板1との熱膨張係数の違いに起因する最大主応力が
発生することが確認されている。
FIG. 2 is an enlarged perspective view mainly showing the structure near the electrode portion 3 of the semiconductor device of this embodiment. In FIG. 2, the outer peripheral portion of the solder 7 for electrically and physically connecting the terminals of the semiconductor chip 2 and the electrode portions 3 formed on the substrate 1, in particular, the portion near the chip center 6 is an a portion, and Assuming that a portion farther from the chip center 6 is a portion b, the above-mentioned cooling and heating cycle particularly causes the above-mentioned a near the chip center 6 when the temperature changes from a high temperature to a low temperature.
The semiconductor chip 2 in the direction of cleaving it.
It has been confirmed that a maximum principal stress is generated due to a difference in thermal expansion coefficient between the substrate and the substrate 1.

【0020】したがって、この実施例の半導体装置のよ
うに、チップ中心6から遠い上記b部の側から引き出し
配線4を引き出すようにすることで、こうした応力に伴
う該引き出し配線4の破断は回避されるようになる。因
みに図3は、従来の半導体装置が採用していた基板配線
構造を図2に対応して示したものであり、この図3に示
されるように、チップ中心6に近いa部の側に引き出し
配線4が設けられる場合には、上記の応力によって、該
引き出し配線4に対し確実に破断CLが生じることとな
る。このような破断CLは、最悪の場合、基板1自体の
破断を伴うこともある。
Therefore, as in the semiconductor device of this embodiment, the lead-out wiring 4 is drawn out from the side of the part b far from the chip center 6, so that the breakage of the lead-out wiring 4 due to such stress is avoided. Become so. FIG. 3 shows the substrate wiring structure employed in the conventional semiconductor device in correspondence with FIG. 2, and as shown in FIG. In the case where the wiring 4 is provided, the above-mentioned stress surely causes a break CL in the lead wiring 4. In the worst case, such a break CL may be accompanied by breakage of the substrate 1 itself.

【0021】参考までに、この実施例の半導体装置の試
作として、 ・基板1として、ソーダガラス板(熱膨張係数=9.3
×10^-6/℃、ただし^はべき乗を表す)を用いる、 ・半導体チップ2として、チップサイズ12×5mm、
端子数162のフリップチップIC(熱膨張係数=3.
5×10^-6/℃、ただし^はべき乗を表す)を用い
る、 ・これらをはんだ(Sn64%、Pb36%)にて接合
する、 ・基板1上に電極部3、引き出し配線4、及び基板配線
5を形成すべく蒸着する薄膜金属は、Cr、Ni、及び
Auの3層構造とする、 ・電極部3は、直径200μmに、引き出し配線4及び
基板配線5は、それぞれ線幅50μmにエッチング形成
する、 といった条件のもとに半導体装置を製作し、これに冷熱
サイクルを繰り返したところ、引き出し配線4の破断は
皆無であったし、その電気的な導通も良好に維持されて
いる。
For reference, as a prototype of the semiconductor device of this embodiment, a soda glass plate (thermal expansion coefficient = 9.3)
× 10 ^ −6 / ° C., where 表 す represents a power), as the semiconductor chip 2, a chip size of 12 × 5 mm,
Flip chip IC with 162 terminals (coefficient of thermal expansion = 3.
5 × 10 ^ −6 / ° C., where ^ represents a power) ・ These are joined by solder (Sn64%, Pb36%). ・ Electrode portion 3, lead-out wiring 4, and substrate on substrate 1. The thin film metal deposited to form the wiring 5 has a three-layer structure of Cr, Ni, and Au. The electrode part 3 is etched to a diameter of 200 μm, and the lead wiring 4 and the substrate wiring 5 are each etched to a line width of 50 μm. A semiconductor device was manufactured under the following conditions, and the heating and cooling cycle was repeated. As a result, no breakage of the lead-out wiring 4 was observed, and the electrical continuity was maintained well.

【0022】ただし、この実施例の半導体装置におい
て、上記基板1の材料は任意であり、他に金属、樹脂、
セラミック、ガラス等々の材料も同様に用いることがで
きる。通常、基板1として用いられるこれら材料は、上
記実装される半導体チップ2の熱膨張係数よりも大きな
値をもつ。
However, in the semiconductor device of this embodiment, the material of the substrate 1 is arbitrary, and other materials such as metal, resin,
Materials such as ceramic, glass and the like can be used as well. Normally, these materials used as the substrate 1 have a larger value than the thermal expansion coefficient of the semiconductor chip 2 to be mounted.

【0023】また同実施例の装置において、上記電極部
3、引き出し配線4、及び基板配線5等の基板1上への
形成手法やそれら配線材料も、上述した例に限られるこ
となく任意である。他に例えば、これらの配線は、メッ
キや印刷等によって形成してもよく、またその配線材料
としては、ガラス系や樹脂系の導電ペーストを用いるこ
とも可能である。
In the apparatus of the embodiment, the method of forming the electrode portions 3, the lead wires 4, and the substrate wires 5 on the substrate 1 and the wiring materials thereof are not limited to the above-mentioned examples, and are arbitrary. . Alternatively, for example, these wirings may be formed by plating, printing, or the like, and a glass-based or resin-based conductive paste may be used as the wiring material.

【0024】また、上記はんだにしても、その材料は上
記Sn系のものに限られることなく任意であり、半導体
チップ2の各端子と基板電極部3との接合にしても、こ
れを必ずしもはんだ付けによって行う必要はない。すな
わち、導電性接着剤によってそれらの接合を行ってもよ
く、また、Sn、In、或いはAn等の材料を用いてそ
れら接合を実現することも可能である。
The material used for the solder is not limited to the above-mentioned Sn-based material, and any material may be used. There is no need to do this by attaching. That is, the bonding may be performed using a conductive adhesive, or the bonding may be realized using a material such as Sn, In, or An.

【0025】図4に、この発明にかかる半導体装置の他
の実施例を示す。すなわちこの実施例の装置は、引き出
し配線4の配線幅を電極部3の直径よりも十分に大きく
とった基板配線上に絶縁膜8を施した後、フォトリソグ
ラフィ等によって電極部3を形成したものである。そし
てここでも、引き出し配線4は、同図4からも明らかな
ように、それら電極部3の中心と装着される半導体チッ
プ(ここでは図示を割愛)の中心6とを結ぶ直線の延長
方向から引き出されるよう配設される。これにより、こ
の実施例の半導体装置においても、半導体チップが基板
1上に実装された後、その使用環境において冷熱サイク
ルが繰り返されたとしても、先の原理に基づいて、それ
ら引き出し配線4の断線はほぼ確実に避けられるように
なる。
FIG. 4 shows another embodiment of the semiconductor device according to the present invention. That is, the apparatus of this embodiment is one in which the electrode portion 3 is formed by photolithography or the like after the insulating film 8 is formed on the substrate wire where the width of the lead wire 4 is sufficiently larger than the diameter of the electrode portion 3. It is. Also in this case, as is apparent from FIG. 4, the lead wiring 4 is drawn from the direction of extension of a straight line connecting the centers of the electrode portions 3 and the center 6 of the semiconductor chip (not shown here) to be mounted. It is arranged to be. Thus, even in the semiconductor device of this embodiment, even after the semiconductor chip is mounted on the substrate 1 and the cooling and heating cycle is repeated in the use environment, the disconnection of the lead wires 4 is performed based on the above principle. Will almost certainly be avoided.

【0026】この図4に示した実施例の基板配線構造に
対応して従来一般に採用されていた基板配線構造を参考
までに図5に示す。この図5に示されるように、従来
は、上記引き出し配線4が、電極部3から見て半導体チ
ップ(図示は割愛)の中心6方向に配設されることが多
い。またここでの例のように、引き出し配線4をも含め
て、基板配線5の配線幅が電極部3の直径よりも十分に
大きくとられる場合には、これら電極部3とその引き出
し配線4との間に前述した半導体チップと基板との熱膨
張係数の違いに起因する大きなストレスが生じ、ひいて
はこの引き出し配線4に配線クラック(基板クラックを
伴うこともある)が生じても、すぐに同引き出し配線4
が断線に至る可能性は確かに低い。しかし、一旦この引
き出し配線4に上記配線クラックが生じると、該生じた
クラックは、その後も持続されるストレスによって急速
に進展されることとなり、いずれは同引き出し配線4の
電気的な導通を完全に妨げるようになる。すなわち、こ
のような基板配線構造も、結局は、引き出し配線4の断
線についてこれを本質的に回避できるものではない。
FIG. 5 shows, for reference, a board wiring structure generally used in the prior art corresponding to the board wiring structure of the embodiment shown in FIG. As shown in FIG. 5, conventionally, the lead wiring 4 is often arranged in the direction of the center 6 of the semiconductor chip (not shown) as viewed from the electrode portion 3. Also, as in the example here, when the wiring width of the substrate wiring 5 including the lead wiring 4 is sufficiently larger than the diameter of the electrode part 3, these electrode parts 3 and the lead wiring 4 are not connected. Even if a large stress is generated due to the difference in the coefficient of thermal expansion between the semiconductor chip and the substrate during the above-described process, and even if a wiring crack (which may be accompanied by a substrate crack) occurs in the lead-out wiring 4, the wiring is immediately pulled out. Wiring 4
However, the possibility of disconnection is certainly low. However, once the wiring crack occurs in the lead-out wiring 4, the generated crack is rapidly developed by the stress that is maintained thereafter, and eventually the electrical continuity of the lead-out wiring 4 is completely reduced. Will hinder you. That is, even with such a substrate wiring structure, the disconnection of the lead-out wiring 4 cannot be essentially avoided.

【0027】この点、図4に示した実施例の装置の上記
基板配線構造によれば、たとえ電極部3からチップ中心
6を見た側にクラックが発生したとしても、それによっ
て、電極部3とその引き出し配線4との間が断線される
ことはなくなる。
In this respect, according to the substrate wiring structure of the apparatus of the embodiment shown in FIG. 4, even if a crack occurs on the side of the electrode portion 3 when the chip center 6 is viewed, the crack is caused by the electrode portion 3. There is no disconnection between the wire and the lead wire 4.

【0028】このように、この発明にかかる半導体装置
は、図4に示されるような基板配線の配線幅が電極部3
の直径よりも十分に大きくとられる配線構造についても
有効である。
As described above, in the semiconductor device according to the present invention, the wiring width of the substrate wiring as shown in FIG.
It is also effective for a wiring structure sufficiently larger than the diameter of the wiring.

【0029】なお、半導体チップと基板との熱膨張係数
の違いに起因する前述した現象は、その搭載される半導
体チップのチップサイズが大きくなるほど顕著となるも
のであることから、そのような半導体装置にこの発明を
適用することの意義は特に大きい。
The above-mentioned phenomenon caused by the difference in the coefficient of thermal expansion between the semiconductor chip and the substrate becomes more remarkable as the chip size of the semiconductor chip mounted becomes larger. The significance of applying the present invention to the present invention is particularly significant.

【0030】また、上記の各実施例において示したよう
に、各電極部3に対する各引き出し配線4の配設形状、
すなわち引き出し方向は、それら電極部3の中心と上記
装着される半導体チップ2の中心6とを結ぶ直線の延長
方向、すなわち各電極部3の中心から半導体チップの中
心6を見て正反対となる180度の角度をもつ方向に設
定されることで、この発明にかかる半導体装置としての
最大の効果が得られるようになる。ただし、先の図6に
よれば、それら電極部3の中心からチップ中心6をみた
引き出し配線4の引き出し角度が90度付近であって
も、その断線率は大幅に減少されることが明かである。
したがって要は、各電極部から引き出される引き出し配
線は、それら電極部の、前記搭載される半導体チップの
中心から各々遠方となる側に配設される条件が満たされ
さえすれば、この発明にかかる半導体装置としての十分
な効果を得ることができるようになる。
Further, as shown in each of the above-described embodiments, the arrangement shape of each lead-out wiring 4 with respect to each electrode portion 3,
That is, the drawing direction is directly opposite to the extension direction of a straight line connecting the center of the electrode portions 3 and the center 6 of the semiconductor chip 2 to be mounted, that is, the center 6 of the semiconductor chip from the center of each electrode portion 180. By setting the direction to have a degree angle, the maximum effect as the semiconductor device according to the present invention can be obtained. However, according to FIG. 6, it is clear that the disconnection rate is greatly reduced even when the lead-out angle of the lead-out wiring 4 from the center of the electrode portion 3 to the chip center 6 is near 90 degrees. is there.
Therefore, the point is that the lead-out wirings drawn out from the respective electrode portions are related to the present invention as long as the conditions for disposing the electrode portions on the side farther from the center of the semiconductor chip to be mounted are satisfied. A sufficient effect as a semiconductor device can be obtained.

【0031】[0031]

【発明の効果】以上説明したように、この発明によれ
ば、半導体チップの直下にも基板配線が施される半導体
装置にあって、半導体チップとこれが搭載される基板と
の間の熱膨張係数の違いに起因するストレスが生じよう
とも、それら施される基板配線の断線を良好に防止する
ことができる。
As described above, according to the present invention, there is provided a semiconductor device in which a substrate wiring is also provided immediately below a semiconductor chip, wherein a coefficient of thermal expansion between the semiconductor chip and a substrate on which the semiconductor chip is mounted is provided. Therefore, even if stress due to the difference occurs, disconnection of the substrate wiring to be applied can be satisfactorily prevented.

【図面の簡単な説明】[Brief description of the drawings]

【図1】この発明にかかる半導体装置の一実施例とし
て、その基板配線構造を示す平面図である。
FIG. 1 is a plan view showing a substrate wiring structure as one embodiment of a semiconductor device according to the present invention.

【図2】同実施例の半導体装置の基板配線構造の一部を
拡大して示す斜視断面図である。
FIG. 2 is an enlarged perspective view showing a part of a substrate wiring structure of the semiconductor device of the embodiment.

【図3】従来の半導体装置が採用していた基板配線構造
を図2に対応して示す斜視断面図である。
FIG. 3 is a perspective sectional view corresponding to FIG. 2, showing a substrate wiring structure employed in a conventional semiconductor device.

【図4】この発明にかかる半導体装置の他の実施例とし
て、その基板配線構造を示す平面図である。
FIG. 4 is a plan view showing a substrate wiring structure as another embodiment of the semiconductor device according to the present invention.

【図5】図4に示した実施例に対応して従来の半導体装
置が採用していた基板配線構造を示す平面図である。
FIG. 5 is a plan view showing a substrate wiring structure employed in a conventional semiconductor device corresponding to the embodiment shown in FIG.

【図6】電極引き出し配線の断線率について、それら電
極部の中心からチップ中心をみた配線引き出し角度と断
線率との関係を示すグラフである。
FIG. 6 is a graph showing a relationship between a wire lead-out angle and a wire breakage ratio when the chip center is viewed from the center of the electrode portion with respect to the wire breakage ratio of the electrode lead-out wires.

【符号の説明】[Explanation of symbols]

1…基板(ソーダガラス板)、2…半導体チップ(フリ
ップチップIC)、3…電極部、4…引き出し配線、5
…基板配線、6…チップ中心、7…はんだ、8…絶縁
膜。
DESCRIPTION OF SYMBOLS 1 ... Substrate (soda glass plate), 2 ... Semiconductor chip (flip chip IC), 3 ... Electrode part, 4 ... Lead-out wiring, 5
... board wiring, 6 ... chip center, 7 ... solder, 8 ... insulating film.

フロントページの続き (58)調査した分野(Int.Cl.7,DB名) H01L 23/12 H01L 21/60 Continuation of the front page (58) Field surveyed (Int.Cl. 7 , DB name) H01L 23/12 H01L 21/60

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】半導体チップと該半導体チップが搭載され
る基板とを有し、前記基板は、前記搭載される半導体チ
ップの各端子と電気的且つ物理的に接続される複数の電
極部及びこれら電極部から引き出される引き出し配線を
具えるとともに、これら引き出し配線を通じて前記半導
体チップの直下にも基板配線が施される半導体装置にお
いて、 前記各電極部から引き出される引き出し配線は、それら
電極部の、前記搭載される半導体チップの中心から各々
遠方となる側に配設されることを特徴とする半導体装
置。
1. A semiconductor device comprising: a semiconductor chip; and a substrate on which the semiconductor chip is mounted. The substrate includes a plurality of electrode portions electrically and physically connected to respective terminals of the mounted semiconductor chip. In a semiconductor device comprising lead wires drawn out from the electrode portions, and through which the substrate wires are also provided immediately below the semiconductor chip, the lead wires pulled out from each of the electrode portions are formed of the electrode portions, A semiconductor device, which is disposed on a side that is farther from a center of a semiconductor chip to be mounted.
【請求項2】前記各引き出し配線は、前記各電極部の中
心と前記搭載される半導体チップの中心とを結ぶ直線の
延長線上に配設される請求項1に記載の半導体装置。
2. The semiconductor device according to claim 1, wherein each of the lead wirings is provided on an extension of a straight line connecting a center of each of the electrode portions and a center of the mounted semiconductor chip.
JP17188893A 1993-07-12 1993-07-12 Semiconductor device Expired - Lifetime JP3203889B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17188893A JP3203889B2 (en) 1993-07-12 1993-07-12 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17188893A JP3203889B2 (en) 1993-07-12 1993-07-12 Semiconductor device

Publications (2)

Publication Number Publication Date
JPH0729936A JPH0729936A (en) 1995-01-31
JP3203889B2 true JP3203889B2 (en) 2001-08-27

Family

ID=15931666

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17188893A Expired - Lifetime JP3203889B2 (en) 1993-07-12 1993-07-12 Semiconductor device

Country Status (1)

Country Link
JP (1) JP3203889B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3736638B2 (en) 2003-10-17 2006-01-18 セイコーエプソン株式会社 Semiconductor device, electronic module and electronic device

Also Published As

Publication number Publication date
JPH0729936A (en) 1995-01-31

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