JP3220914B2 - Recording medium manufacturing method - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing an ultra-high-density recording medium used in an information processing apparatus using the principle of a scanning tunneling microscope.

[0002]

2. Description of the Related Art In recent years, memory devices have been used at the core of the electronics industry such as computers and related equipment, video disks, digital audio disks, and the like, and their development has been actively promoted. Generally, the performance required of a memory element is (1) high density and large recording capacity (2) fast response time of recording / reproduction (3) low error rate (4) low power consumption (5) ) High productivity and low price.

Until now, magnetic memories and semiconductor memories made of magnetic materials or semiconductors have been the mainstream, but with the recent development of laser technology, inexpensive and high-performance devices using organic thin films such as organic dyes and photopolymers have been developed. Optical memory devices using high-density recording media have appeared.

On the other hand, a scanning tunneling microscope (hereinafter abbreviated as STM) capable of directly observing the electronic structure of surface atoms of a conductor has recently been developed [G. Binnig et al., Fervetica Physica Acta, 55 , 726 (1982). ],
The ability to measure real space images with high resolution regardless of whether it is single crystal or amorphous, and has the advantage of being able to observe at low power without damaging the medium due to current, and to operate in air. It is expected to be widely applied because it is possible.

[0005] Such STM utilizes the fact that when a voltage is applied between a metal probe (probe electrode) and a conductive material to approach a distance of about 1 nm, a tunnel current flows between them. This current is very sensitive to changes in the distance between the two, and by scanning the tip so as to keep the tunnel current constant, it is possible to draw the surface structure in real space, and at the same time the total electron cloud of surface atoms Various information can also be read.

At this time, the resolution in the in-plane direction is about 0.1 nm. Therefore, if the principle of STM is applied, high-density recording / reproducing can be sufficiently performed in the atomic order (0.1 nm). As a recording / reproducing method at this time, recording is performed by changing the surface state of an appropriate recording layer using a high-energy electromagnetic wave such as a particle beam (electron beam, ion beam) or X-ray or an energy beam such as visible or ultraviolet light. And STM for recording and reproduction using a material having a memory effect on the switching characteristics of voltage and current, for example, a thin film layer of a π-electron organic compound or chalcogenide as a recording layer. A method using the method has been proposed.

In the recording / reproducing method as described above, in order to actually record / reproduce a large amount of information, the position detection and correction control (tracking) of the probe electrode in the XY directions (in-plane direction of the recording medium). Is required. As a method of forming this track, already utilizing the atomic arrangement of the recording medium substrate,
Although a method of performing high-density and high-accuracy has been proposed, it has been difficult to handle the atomic arrangement easily because the atomic arrangement must be detected with extremely high accuracy.

Therefore, in order to easily perform tracking, a guide groove (track) is formed by providing irregularities in advance on a substrate of a recording medium, and a probe electrode is made to follow a concave portion or a convex portion of the track. A method of performing tracking has been proposed.

As a method of forming a concave or convex step on such a substrate, a conventional method of etching or lifting off a metal, an inorganic substance, an organic substance or the like using a lithography technique using a resist, or using a resist itself as a step is used. It is also possible. It is also conceivable that the substrate electrode or the substrate is processed by irradiating high-energy radiation such as an electron beam or an ion beam to form a step directly on the substrate electrode or the substrate.

This method of processing an electrode with an ion beam is generally called a focused ion beam method (hereinafter, abbreviated as FIB method) because a focused beam is used. This method can be said to be an extremely simple track forming method since it is a step of merely forming a cat image of a predetermined track pattern directly on an electrode or the like with a beam.

However, in the track formation by the FIB method, the influence of the irradiation of the ion beam may occur outside the diameter of the ion beam, and the smoothness of the electrode surface, which becomes the recording surface of the recording medium, may be reduced. There is a possibility that the bit error rate will increase during recording and reproduction.

[0012] For this reason, a method of eliminating the influence of the outer side of the beam diameter on the surface of the substrate electrode by performing a FIB process after forming a mask layer on the substrate electrode in advance, or a FIB
After processing, by etching the substrate electrode surface,
There was a way to remove the effect on the outside of the beam diameter.

[0013]

However, the above-mentioned method has a problem that the substrate is deformed and dissolved by a material such as a substrate to be used in the etching or the solvent removal for removing the mask layer. This method also has a similar problem since the method described above also performs etching.

Accordingly, an object of the present invention is to provide a recording medium used in an information processing apparatus for performing high-density electric recording / reproducing using a probe electrode in view of the above-mentioned problems of the prior art. And to provide a simpler recording medium manufacturing method that is not limited to materials.

[0015]

According to the present invention, a non-damaged surface generated when forming tracks on an electrode by the FIB method is used as an electrode surface for laminating a recording layer. Thereby, the smoothness of the surface of the recording medium is improved.

That is, the present invention relates to a method for manufacturing a recording medium having a recording layer on a substrate electrode for use in an information processing apparatus for recording and reproducing information by detecting a tunnel current.
Forming a substrate electrode on the substrate, forming a groove penetrating from the substrate electrode side to the first substrate with a focused ion beam, bonding a second substrate to the substrate electrode surface, forming a substrate electrode on the substrate electrode. A method for manufacturing a recording medium, comprising sequentially performing a step of separating from a first substrate and a step of laminating a recording layer on a substrate electrode surface which is a transfer surface of a first substrate surface.

Next, the present invention will be described in detail with reference to the drawings.

FIG. 1 is a process chart showing an example of a recording medium manufacturing method of the present invention. As shown in FIG. 1A, first, a substrate electrode 103 is formed on a first substrate 104. Since the first substrate used in the present invention is used to form tracks while supporting the substrate electrodes, any material may be used as long as the surface is smooth. Depending on the method, the substrate materials available to some extent are limited.

The material of the substrate electrode 103 used in the present invention may be any material having high conductivity.
Numerous materials including metals such as u, Pt, Ag, Pd, Al, In, Sn, Pb, W, and alloys thereof, and graphite, silicide, and conductive oxides such as ITO. These can be applied to the present invention. As a method for forming an electrode using such a material, a conventionally known thin film technique is sufficient. However, as the material of the substrate electrode, it is preferable to use a conductive material whose surface does not form an insulating oxide when forming the recording layer, for example, an oxide conductor such as a noble metal or ITO. It is also preferable that the surface is smooth.

Next, as shown in FIG. 1B, a concave groove serving as a track is formed in the substrate electrode 103 to a depth penetrating to the substrate 104 by the FIB method.

In the FIB method, the ion species may be any as long as a groove can be formed in the substrate electrode.
Numerous types such as i and Be can be mentioned. However, at this time, in order to form a groove reaching the first substrate in the substrate electrode, it is necessary to appropriately set the ion species and the dose.

Next, as shown in FIG. 1C, after forming an adhesive layer (not shown) on the substrate electrode, the second substrate 105 is attached on the adhesive layer. The adhesive layer according to the present invention is preferably a solventless type that does not have volumetric shrinkage, and examples thereof include an epoxy resin-based, an α-cyanoacrylate-based insulating adhesive and a conductive adhesive such as an Epotek silver series. .

In the step of attaching the second substrate to the substrate electrode, if the second substrate and the electrode layer are directly joined, for example, in the case of eutectic bonding or electroforming, the adhesive layer is omitted. Can be. As the second substrate according to the present invention, any material such as a metal, a glass, a ceramic, and a plastic material can be used when an adhesive layer is interposed. In the case of joining by eutectic bonding or electroforming, a relatively smooth material is preferable. Further, when the electrode layer is thick, the second substrate can be omitted.

After attaching the second substrate to the substrate electrode as described above, the substrate electrode is peeled off from the first substrate as shown in FIG. 1D, leaving the substrate electrode on the second substrate. .

Finally, as shown in FIG. 1E, a recording layer 101 is formed on the substrate electrode.

With respect to the formation of the recording layer 101 used in the present invention, specifically, a vapor deposition method, a cluster ion beam method or the like can be applied. Among them, the LB method is very suitable.

According to the LB method, a monomolecular film of an organic compound having a hydrophobic portion and a hydrophilic portion in one molecule or a cumulative film thereof can be easily formed on a substrate, and the thickness on the order of molecules can be obtained. And a uniform and homogeneous organic ultrathin film can be stably supplied over a large area.

In the LB method, in a molecule having a structure having a hydrophilic site and a hydrophobic site in a molecule, when the balance between the two (balance of amphipathicity) is appropriately maintained,
This is a method of forming a monomolecular film or a cumulative film thereof by utilizing the fact that a hydrophilic group is directed downward on a molecular water surface to form a monomolecular layer.

Examples of the group constituting the hydrophobic site include various widely known hydrophobic groups such as saturated and unsaturated hydrocarbon groups, condensed polycyclic aromatic groups and chain polycyclic phenyl groups. Can be Each of these constitutes a hydrophobic site alone or in combination of two or more thereof.

On the other hand, the most typical constituents of the hydrophilic site include, for example, carboxyl group, ester group, acid amide group, imide group, hydroxyl group, and amino group (1, 2, tertiary and quaternary). ) And the like. Each of these may be used alone or in combination with a plurality thereof to constitute the hydrophilic portion of the molecule.

As long as the organic molecule has both a hydrophobic group and a hydrophilic group in a well-balanced and insulating property, it is possible to form a monomolecular film on the water surface. It is a suitable material.

The recording layer used in the present invention is disclosed in
JP-A-3-161552 and JP-A-63-16155
No. 3 discloses a material having a memory switching phenomenon (electric memory effect) in current-voltage characteristics, for example, a group having a π-electron level and a group having a σ-electron level. It is possible to use an organic monomolecular film in which molecules are laminated on an electrode or a cumulative film thereof.

In general, most of organic materials have insulating or semi-insulating properties, so that organic materials having a group having a π-electron level applicable to the present invention are remarkably diversified.

Examples of the structure of the dye having a π-electron system suitable for the present invention include a dye having a porphyrin skeleton such as phthalocyanine and tetraphenylporphyrin, an azulene dye having a squarylylium group and a croconic methine group as a bonding chain. And quinoline, benzothiazole,
Cyanine-like dyes in which two nitrogen-containing heterocycles such as benzoxazole are bonded by a squarylium group and a croconic methine group, or condensed polycyclic aromatics such as cyanine dyes, anthracene and pyrene, and aromatic rings and heterocyclic compounds Is a chain compound and a polymer of a diacetylene group, furthermore, a derivative of tetracyanoquinodimethane or tetrathiafulvalene and an analog thereof and a charge transfer complex thereof, and further, a metal complex such as ferrocene and trisbipyridine ruthenium complex. Compounds.

Examples of the polymer material suitable for the recording layer used in the present invention include addition polymers such as polyacrylic acid derivatives, condensation polymers such as polyimides, ring-opening polymers such as nylon, and bacteriorhodopsin. Biopolymers.

Specific examples of the above-mentioned material which is extremely suitable for the recording layer used in the present invention include, for example, the following molecules. <Organic material> [I] Croconic methine dye

[0037]

Embedded image

[0038]

Embedded image Here, R ₁ corresponds to the group having the above-mentioned σ-electron level, and is a long-chain alkyl group introduced to facilitate the formation of a monomolecular film on the water surface. n ≦ 3
0 is preferred. [II] Squarylium dye A compound in which the croconic methine group of the compound described in [I] is replaced by a squarylium group having the following structure.

[0039]

Embedded image [III] Porphyrin dye compound

[0040]

Embedded image

[0041]

Embedded image

[0042]

Embedded image R is introduced to facilitate the formation of a monomolecular film, and is not limited to the substituents listed here. Also, R ₁
To R ₄ and R correspond to the group having the σ electron level described above. [IV] Fused polycyclic aromatic compound

[0043]

Embedded image [V] Diacetylene compound

[0044]

Embedded image X is a hydrophilic group, generally -COOH is used,
H, -CONH _{2 and the} like can also be used. [VI] Other

[0045]

Embedded image <Organic polymer material>

[0046]

Embedded image Here, R ₁ is a long-chain alkyl group introduced to facilitate the formation of a monomolecular film on the water surface, and the carbon number n is 5 ≦ n.
≦ 30 is preferred. R ₅ is a short-chain alkyl group, and the number of carbon atoms n is preferably 1 ≦ n ≦ 4. The degree of polymerization m is 1
00 ≦ m ≦ 5000 is preferred.

The compounds mentioned as specific examples have only the basic structure, and it goes without saying that various substitution products of these compounds are also suitable in the present invention. It is needless to say that any other organic materials and organic polymer materials suitable for the LB method are suitable for the present invention. For example,
Biomaterials (eg, bacteriorhodopsin and cytochrome C), synthetic polypeptides (PBLG), and the like, which have been actively studied in recent years, can also be applied.

The electric memory effect of these compounds having a π-electron level has been observed at a film thickness of several tens of μm or less. However, a tunnel current flowing between a probe electrode and a substrate electrode during recording / reproduction is used. Therefore, the distance between the probe electrode and the substrate electrode must be reduced so that a tunnel current flows between the probe electrode and the substrate electrode. Several nm or more and 10 nm or less, more preferably, 0.1 nm or less. It is several nm or more and 3 nm or less.

[0049]

DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to embodiments.

Embodiment 1 In this embodiment, a manufacturing method as shown in FIG.
10 lots of recording media were manufactured under the same conditions, and recording / reproducing / erasing experiments were performed.

First, the optically polished glass substrate (first substrate) was washed with a neutral detergent and ethanol, and then Au serving as a substrate electrode was formed to a thickness of 100 nm by a vapor deposition method.

Next, the substrate was irradiated with an Au bivalent positive ion beam using an integrated ion beam irradiation apparatus to form a groove serving as a track to a depth reaching the substrate. The drawing conditions of the ion beam at this time were as follows: acceleration voltage 40 kV, ion current 30 pA, dose amount 1.0 ×
Perform at 10 ¹² ions / cm, 1.0mm × 0.5mm
Was formed at a pitch of 2.0 μm and a groove having a width of about 0.5 μm.

Next, an adhesive (Konishi Hightemp HT-
After 10) is applied on the substrate electrode, another glass substrate (second substrate) is attached on the substrate electrode with an adhesive therebetween.
Bonding of the second substrate is performed at a pressure of 5 kg / cm ² and a temperature of 20 kg.
The test was performed at 0 ° C. for a curing time of 1 hour. After attaching the second substrate to the substrate electrode as described above, the substrate electrode was peeled off from the first substrate as shown in FIG. 1D, leaving the substrate electrode on the second substrate.

Next, the smoothness of the periphery of the track groove on the surface of the substrate electrode which was in contact with the first substrate was confirmed by STM. As a result, all of the 10 lots had the same smoothness as the normal Au surface. It was confirmed that there was. Thereafter, a polyimide LB film serving as a recording layer was formed. Hereinafter, a method for forming the LB film will be described.

A mixed solution of dimethylacetamide and benzene in which a polyamic acid (hereinafter abbreviated as PA) is repeatedly dissolved at a unit concentration of 1.0 mmol / liter is developed on pure water at 20 ° C., and the solvent is removed by evaporation from the water surface. After that, the surface pressure was increased to 25 mN / m to form a monomolecular film on the water surface. Next, with the surface pressure kept constant, the substrate was gently immersed at a speed of 5 mm / min across the surface of the water and further pulled up to accumulate two Y-type monomolecular films. Next, the substrate is heat-treated at 300 ° C. for 10 minutes to imidize the PA accumulation film to obtain polyimide (hereinafter, referred to as polyimide).
A recording layer 101 was formed by forming a thin film (abbreviated as PI).

Next, an experiment of recording / reproducing / erasing was performed on all the recording media manufactured by the above-described method using a recording / reproducing apparatus as shown in FIG.

In FIG. 2, reference numeral 201 denotes a probe electrode for applying a voltage to the recording medium.
By applying a voltage to the recording layer 101 from the
Perform playback.

The recording medium described above is placed on the XY stage 208. The XY stage 208 sets a rough place for recording / reproducing on the recording medium. 2
Reference numeral 06 denotes a probe current amplifier, and reference numeral 205 denotes a servo circuit that controls the Z-direction fine movement control mechanism 203 using a piezoelectric element so that the height of the probe electrode from the recording medium is constant. Reference numeral 207 denotes a pulse power supply for applying a pulse voltage for recording / erasing between the probe electrode 201 and the substrate electrode 103. When a pulse voltage is applied, the probe current changes abruptly.
Controls the HOLD circuit to be ON so that the output voltage becomes constant during that time.

Reference numeral 204 denotes the probe electrode 201 and 202
An XY scanning drive circuit for controlling movement in the XY directions using the XY direction fine movement control mechanism. The coarse movement mechanism 209 and the coarse drive circuit 210 perform coarse movement control of the distance between the probe electrode 201 and the recording medium so that a probe current of about 10 ⁻⁹ A is obtained in advance, or the probe electrode 201 and the substrate Is used to increase the relative displacement in the X and Y directions (outside the range of the fine movement control mechanism).

All of these devices are centrally controlled by a microcomputer 211. Reference numeral 212 denotes a display device.

In this embodiment, as the probe electrode 201, a platinum / rhodium probe electrode produced by a mechanical polishing method was used.

As the material of the probe electrode, any material may be used as long as it shows conductivity. For example, Pt, Pt-I
r, W, Au, Ag and the like. In addition, the tip of the probe electrode needs to be sharpened as much as possible in order to increase the resolution of recording / reproducing / erasing, but the manufacturing method and shape are not limited to this embodiment.

Further, the number of probe electrodes need not be limited to one, but may be divided into those for position detection and those for recording / reproduction.
A plurality of probe electrodes may be used.

The mechanical performance in the movement control using the piezoelectric element of this device is shown below.

Z direction fine movement control range: 0.1 nm to 1 μm Z direction coarse movement control range: 10 nm to 10 mm XY direction scanning range: 0.1 nm to 1 μm XY direction coarse movement control range: 10 nm to 10 mm Measurement and control tolerance: <0.1 nm (at the time of fine movement control) Measurement and control tolerance: <1 nm (at the time of coarse movement control) In this apparatus, the distance (Z) between the probe electrode 201 and the recording layer 101 is controlled by the servo circuit 205 in the Z direction fine movement control. The XY-direction fine movement control mechanism 202 is controlled by applying an appropriate voltage to the mechanism 203 so as to control the movement of the probe electrode 201 in the in-plane (X, Y) direction while maintaining this function. It is controlled by the circuit 204. The recording medium is a high-precision XY stage 2
08 and can be moved to any position. Therefore, recording / reproducing and erasing can be performed at an arbitrary position on the recording medium with the probe electrode 201 by these movement control mechanisms.

The recording layer 101 in which the above-mentioned PI2 layer is accumulated
Was set in the recording / reproducing apparatus. At this time, the track was installed such that the length direction of the track was substantially parallel to the Y direction of the recording / reproducing apparatus. Next, a voltage of −1.0 V is applied to the probe electrode 201 with respect to the substrate electrode 103 of the recording medium, and while monitoring the current flowing through the recording layer 101, the distance (Z) between the probe electrode 201 and the substrate electrode 103 is monitored.
Was adjusted. Thereafter, when the distance between the probe electrode and the surface of the recording layer was changed by controlling the Z-direction fine movement control mechanism 203, current characteristics as shown in FIG. 3 were obtained. The distance (Z) between the probe electrode and the surface of the recording layer can be adjusted by changing the probe current and the probe voltage. However, in order to keep the distance (Z) constant at an appropriate value. And the probe current _IP is 10 ⁻⁷ A ≧ I _P ≧ 10 ⁻¹²
A, preferably, the probe voltage must be adjusted so that 10 ⁻⁸ A ≧ I _P ≧ 10 ⁻¹⁰ A. Here, the probe voltage is 0.5 V, and the probe current I _P is 10 ⁻⁹ A.
(Corresponding to the region b in FIG. 3) to control the distance (Z) between the probe electrode and the surface of the recording layer. next,
While keeping this distance (Z) constant, the probe electrode
After scanning in the direction, that is, in the direction across the track 102, and confirming that the track is formed on the recording medium,
The probe electrode was held between any two adjacent tracks (recording surface).

Next, while scanning the probe electrode along the track, information was recorded at a pitch of 10 nm.
Tracking can be performed even when the output voltage of the servo circuit 205 is constant (HOLD circuit ON) or while the servo circuit 205 is operating (HOLD circuit OFF). At this time, the track is detected when the probe voltage decreases to the measurement limit when the output voltage of the servo circuit 205 is fixed (HOLD circuit ON) and when the servo circuit 205 is operated (HOLD circuit OFF). Recognized the track as a change in the output voltage of the servo circuit with a decrease of 0.1 V. Recording of such information, by applying a threshold voltage V _th ON or more pulse voltage having a waveform as shown in FIG. 4 (V _max = -15V), written ON state. When a pulse voltage is applied, the output voltage of the servo circuit 205 is kept constant. The written information is obtained by controlling the distance between the probe electrode 201 and the surface of the recording layer 101 under the same conditions as at the time of writing, and then keeping the output of the servo circuit 205 constant while keeping the output of the probe electrode 2 constant.
01, and directly reads the change in the probe current between the ON state area and the OFF state area, or scans the probe electrode 201 while the servo circuit 205 is operated (HOLD circuit OFF) to change the ON state area to the ON state area. It can be read by the change in the output voltage of the servo circuit 205 between the OFF state region. In this embodiment, the probe current in the ON state area is 3 times smaller than before the recording (or in the OFF state area).
It was confirmed that it had changed by more than an order of magnitude.

Further, after controlling the distance between the probe electrode 201 and the surface of the recording layer 101 under the same conditions as at the time of writing, the output of the servo circuit 205 is kept constant, and the probe voltage is set to 8 V which is equal to or higher than V _th OFF. After setting and scanning the probe electrode 201 again and applying a pulse voltage having a waveform as shown in FIG. 5 to the recording position, it was also confirmed that all the recording states were erased and the state transited to the OFF state. In the above reproduction experiment, the bit error rate was 3 × 10
It was about ^-6 .

Example 2 In comparison with Example 1, a lot of recording media was formed in the same manner except that a silicon substrate was used as the second substrate and eutectic bonding was used as a method of bonding with the substrate electrode. In the same manner as in Example 1, the smoothness of the peripheral portion of the groove was examined, and recording, reproduction, and erasing experiments were performed. As a result, there was no problem in the smoothness, and the bit error rate was 3 × 10 ⁻⁶ in the experiments of recording, reproducing, and erasing, and erasing was possible. The eutectic bonding was performed by rubbing the silicon substrate as the second substrate on the surface of the substrate electrode while heating the first substrate on which the substrate electrode was formed with a heater to a constant temperature. At this time, the temperature was 400 ° C., the pressure was 2 kg / cm ² , and the holding time was 1 minute.

[0070]

As described above, the present invention has the following effects.

Since the non-damaged surface generated when tracks are formed on the electrodes by the FIB method is used as the electrode surface on which the recording layer is laminated, the bit error rate at the time of reproducing information is very low. A high recording medium can be obtained.

Since the manufacturing process does not require an etching process or a removing process using a solvent, the material of the member of the recording medium is not limited.

A recording medium capable of recording at a much higher density than optical recording can be manufactured by a simple method.

[Brief description of the drawings]

FIG. 1 is a process chart showing an example of a recording medium manufacturing method of the present invention.

FIG. 2 is a block diagram of a recording / reproducing apparatus in which an experiment of recording and reproducing information is performed on a recording medium manufactured according to the present invention.

FIG. 3 is a diagram showing a relationship between a distance between a probe electrode and a recording layer surface and a flowing current.

FIG. 4 is a pulse signal waveform applied when recording is performed on a recording medium according to the present invention.

FIG. 5 is a pulse signal waveform applied when erasing recording on a recording medium according to the present invention.

[Explanation of symbols]

 Reference Signs List 101 recording layer 102 track 103 substrate electrode 104 first substrate 105 second substrate 201 probe electrode 202 XY direction fine movement control mechanism 203 Z direction fine movement control mechanism 204 XY direction scan drive circuit 205 servo circuit 206 probe current amplifier 207 pulse power supply 208 XY stage 209 Coarse movement mechanism 210 Coarse movement drive circuit 211 Microcomputer 212 Display device

────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-4-1947 (JP, A) JP-A-5-314551 (JP, A) JP-A-4-1433941 (JP, A) JP-A-5-141 28547 (JP, A) (58) Field surveyed (Int. Cl. ⁷ , DB name) G11B 9/14

Claims (8)

(57) [Claims] 1. A method for manufacturing a recording medium having a recording layer on a substrate electrode, which is used in an information processing apparatus that performs recording and reproduction of information by detecting a tunnel current, wherein the substrate electrode is formed on a first substrate. Forming a groove penetrating from the substrate electrode side to the first substrate with the focused ion beam;
Bonding the substrate to the surface of the substrate electrode;
A step of sequentially separating the recording layer from the substrate and a step of laminating a recording layer on a substrate electrode surface which is a transfer surface of the first substrate surface. 2. The recording medium manufacturing method according to claim 1, wherein an adhesive is used for bonding the second substrate to the substrate electrode. 3. The method according to claim 1, wherein the method of bonding the second substrate to the substrate electrode is eutectic bonding. 4. The recording layer having a thickness of 0. Several nm or more 10
2. The method according to claim 1, wherein the thickness is not more than nm. 5. The recording layer having a thickness of 0. Several nm or more 3n
2. The method according to claim 1, wherein m is equal to or less than m. 6. The method according to claim 1, wherein the recording layer has a monomolecular film of an organic compound or a cumulative film obtained by accumulating the monomolecular film. 7. The method according to claim 6, wherein the monomolecular film or the cumulative film is formed by an LB method. 8. The method according to claim 6, wherein the organic compound has a group having a π-electron level and a group having a σ-electron level in a molecule.