JP3228375B2 - Laminated polystyrene film - Google Patents
Laminated polystyrene filmInfo
- Publication number
- JP3228375B2 JP3228375B2 JP15036393A JP15036393A JP3228375B2 JP 3228375 B2 JP3228375 B2 JP 3228375B2 JP 15036393 A JP15036393 A JP 15036393A JP 15036393 A JP15036393 A JP 15036393A JP 3228375 B2 JP3228375 B2 JP 3228375B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- thin film
- gas barrier
- weight
- aluminum oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000004793 Polystyrene Substances 0.000 title claims description 17
- 229920002223 polystyrene Polymers 0.000 title claims description 17
- 239000010408 film Substances 0.000 claims description 69
- 239000010409 thin film Substances 0.000 claims description 50
- 230000004888 barrier function Effects 0.000 claims description 45
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 25
- 230000005484 gravity Effects 0.000 claims description 23
- 229920000642 polymer Polymers 0.000 claims description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 14
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 12
- 239000011342 resin composition Substances 0.000 claims description 3
- 239000007789 gas Substances 0.000 description 36
- 239000002245 particle Substances 0.000 description 24
- 238000000034 method Methods 0.000 description 19
- 229920010524 Syndiotactic polystyrene Polymers 0.000 description 15
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 14
- 239000001301 oxygen Substances 0.000 description 14
- 229910052760 oxygen Inorganic materials 0.000 description 14
- 239000000314 lubricant Substances 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- -1 poly (p- Chemical compound 0.000 description 5
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 230000035699 permeability Effects 0.000 description 4
- 239000002985 plastic film Substances 0.000 description 4
- 229920006255 plastic film Polymers 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 3
- 239000004952 Polyamide Substances 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- VIJYFGMFEVJQHU-UHFFFAOYSA-N aluminum oxosilicon(2+) oxygen(2-) Chemical compound [O-2].[Al+3].[Si+2]=O VIJYFGMFEVJQHU-UHFFFAOYSA-N 0.000 description 3
- 238000005452 bending Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000001771 impaired effect Effects 0.000 description 3
- 229920002647 polyamide Polymers 0.000 description 3
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229920000219 Ethylene vinyl alcohol Polymers 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- DIKBFYAXUHHXCS-UHFFFAOYSA-N bromoform Chemical compound BrC(Br)Br DIKBFYAXUHHXCS-UHFFFAOYSA-N 0.000 description 2
- 229910000019 calcium carbonate Inorganic materials 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 238000005188 flotation Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229920000620 organic polymer Polymers 0.000 description 2
- 239000012785 packaging film Substances 0.000 description 2
- 229920006280 packaging film Polymers 0.000 description 2
- 238000004806 packaging method and process Methods 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 238000004062 sedimentation Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- OXHSYXPNALRSME-UHFFFAOYSA-N (4-ethenylphenyl)-trimethylsilane Chemical compound C[Si](C)(C)C1=CC=C(C=C)C=C1 OXHSYXPNALRSME-UHFFFAOYSA-N 0.000 description 1
- KKLSEIIDJBCSRK-UHFFFAOYSA-N 1-(chloromethyl)-2-ethenylbenzene Chemical compound ClCC1=CC=CC=C1C=C KKLSEIIDJBCSRK-UHFFFAOYSA-N 0.000 description 1
- SSZOCHFYWWVSAI-UHFFFAOYSA-N 1-bromo-2-ethenylbenzene Chemical compound BrC1=CC=CC=C1C=C SSZOCHFYWWVSAI-UHFFFAOYSA-N 0.000 description 1
- BOVQCIDBZXNFEJ-UHFFFAOYSA-N 1-chloro-3-ethenylbenzene Chemical compound ClC1=CC=CC(C=C)=C1 BOVQCIDBZXNFEJ-UHFFFAOYSA-N 0.000 description 1
- FIPBXQBXPNTQAA-UHFFFAOYSA-N 1-ethenyl-2-ethoxybenzene Chemical compound CCOC1=CC=CC=C1C=C FIPBXQBXPNTQAA-UHFFFAOYSA-N 0.000 description 1
- YNQXOOPPJWSXMW-UHFFFAOYSA-N 1-ethenyl-2-fluorobenzene Chemical compound FC1=CC=CC=C1C=C YNQXOOPPJWSXMW-UHFFFAOYSA-N 0.000 description 1
- NVZWEEGUWXZOKI-UHFFFAOYSA-N 1-ethenyl-2-methylbenzene Chemical compound CC1=CC=CC=C1C=C NVZWEEGUWXZOKI-UHFFFAOYSA-N 0.000 description 1
- XKMDZVINHIFHLY-UHFFFAOYSA-N 1-ethenyl-3,5-dimethylbenzene Chemical compound CC1=CC(C)=CC(C=C)=C1 XKMDZVINHIFHLY-UHFFFAOYSA-N 0.000 description 1
- ZJSKEGAHBAHFON-UHFFFAOYSA-N 1-ethenyl-3-fluorobenzene Chemical compound FC1=CC=CC(C=C)=C1 ZJSKEGAHBAHFON-UHFFFAOYSA-N 0.000 description 1
- PECUPOXPPBBFLU-UHFFFAOYSA-N 1-ethenyl-3-methoxybenzene Chemical compound COC1=CC=CC(C=C)=C1 PECUPOXPPBBFLU-UHFFFAOYSA-N 0.000 description 1
- JZHGRUMIRATHIU-UHFFFAOYSA-N 1-ethenyl-3-methylbenzene Chemical compound CC1=CC=CC(C=C)=C1 JZHGRUMIRATHIU-UHFFFAOYSA-N 0.000 description 1
- ATWSNVQTZGZQRL-UHFFFAOYSA-N 1-ethenyl-4-[4-[4-(4-ethenylphenyl)butoxy]butyl]benzene Chemical compound C1=CC(C=C)=CC=C1CCCCOCCCCC1=CC=C(C=C)C=C1 ATWSNVQTZGZQRL-UHFFFAOYSA-N 0.000 description 1
- KEZDVVCDQRDBDN-UHFFFAOYSA-N 1-ethenyl-4-fluoro-2-methylbenzene Chemical compound CC1=CC(F)=CC=C1C=C KEZDVVCDQRDBDN-UHFFFAOYSA-N 0.000 description 1
- QEDJMOONZLUIMC-UHFFFAOYSA-N 1-tert-butyl-4-ethenylbenzene Chemical compound CC(C)(C)C1=CC=C(C=C)C=C1 QEDJMOONZLUIMC-UHFFFAOYSA-N 0.000 description 1
- MMIOSYPJSGTWEM-UHFFFAOYSA-N 2-(2-ethenylphenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC=C1C=C MMIOSYPJSGTWEM-UHFFFAOYSA-N 0.000 description 1
- ISRGONDNXBCDBM-UHFFFAOYSA-N 2-chlorostyrene Chemical compound ClC1=CC=CC=C1C=C ISRGONDNXBCDBM-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical class [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 229950005228 bromoform Drugs 0.000 description 1
- 229910000389 calcium phosphate Inorganic materials 0.000 description 1
- 239000001506 calcium phosphate Substances 0.000 description 1
- 235000011010 calcium phosphates Nutrition 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 238000004581 coalescence Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- NZZFYRREKKOMAT-UHFFFAOYSA-N diiodomethane Chemical compound ICI NZZFYRREKKOMAT-UHFFFAOYSA-N 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 208000028659 discharge Diseases 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000010954 inorganic particle Substances 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 229910052622 kaolinite Inorganic materials 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- SFBTTWXNCQVIEC-UHFFFAOYSA-N o-Vinylanisole Chemical compound COC1=CC=CC=C1C=C SFBTTWXNCQVIEC-UHFFFAOYSA-N 0.000 description 1
- 239000011146 organic particle Substances 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、ガスバリア性、耐レト
ルト性、ゲルボ特性に優れた食品、医薬品、電子部品等
の気密性を要求される包装材料、または、ガス遮断材料
として優れた特性を持つ積層シンジオタクチックポリス
チレン系フィルムに関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an excellent gas barrier property, a retort resistance and a gelling property. The present invention relates to a laminated syndiotactic polystyrene film.
【0002】[0002]
【従来の技術】シンジオタクチック構造をもつポリスチ
レン系重合体が開発され、優れた結晶性を持ち耐熱性や
耐溶剤性に優れた素材であることが知られている。(特
公平3-7685号公報)。これらを用いた延伸フィルムの開
発も行われている(特開平1-110122号、同1-168709号、
同1-182346号、同2-279731号、同3-74437 号、同3-1094
53号、同3-99828 号、同3-124427号、同3-131644号)。
これらシンジオタクチックポリスチレン系フィルムは機
械特性、透明性、耐薬品性、誘電損失や誘電率等の電気
特性が優れており、各種工業用、包装用フィルムに展開
されることが期待されている。しかしながら、シンジオ
タクチックポリスチレン系フィルムはガスバリア性が不
良であると言う問題点があった。ガスバリア性の優れた
フィルムとしては、プラスチックフィルム上にアルミニ
ウムを積層したもの、塩化ビニリデンやエチレンビニー
ルアルコール共重合体をコーティングしたものが知られ
ている。また、無機薄膜を利用したものとしては、酸化
珪素、酸化アルミニウム薄膜等を積層したものが知られ
ている。2. Description of the Related Art A polystyrene-based polymer having a syndiotactic structure has been developed and is known to be a material having excellent crystallinity and excellent heat resistance and solvent resistance. (Japanese Patent Publication No. 3-7685). Stretched films using these have also been developed (JP-A-1-110122, JP-A-1-168709,
1-182346, 2-79731, 3-74437, 3-1094
No. 53, No. 3-99828, No. 3-124427, No. 3-316444).
These syndiotactic polystyrene films have excellent electrical properties such as mechanical properties, transparency, chemical resistance, dielectric loss and dielectric constant, and are expected to be applied to various industrial and packaging films. However, there is a problem that the syndiotactic polystyrene film has poor gas barrier properties. Films having excellent gas barrier properties include those obtained by laminating aluminum on a plastic film, and those coated with vinylidene chloride or ethylene vinyl alcohol copolymer. Further, as a device using an inorganic thin film, a device in which a silicon oxide, an aluminum oxide thin film, or the like is laminated is known.
【0003】[0003]
【発明が解決しようとする課題】ガスバリア性フィルム
のベースフィルムとしてポリエステル系フィルムやポリ
アミド系フィルムを使用した場合には、高温高湿下や高
温水中下で加水分解を発生するという問題点があった。
また、このような環境下においてはフィルムが湿度膨張
するためにカールを発生したり、繰り返し環境変化が生
じると無機薄膜層等が剥離やひびわれを発生しガスバリ
ヤ性が低下する場合があった。When a polyester film or a polyamide film is used as a base film of a gas barrier film, there is a problem that hydrolysis occurs under high temperature and high humidity or high temperature water. .
Further, in such an environment, the film may be curled due to humidity expansion, or if the environment repeatedly changes, the inorganic thin film layer or the like may be peeled or cracked, and the gas barrier property may be reduced.
【0004】また、従来のガスバリア性フィルムは、次
のような課題を有していた。アルミニウム積層品は、経
済性、ガスバリア性の優れたものではあるが、不透明な
ため、包装時の内容物が見えず、また、マイクロ波を透
過しないため電子レンジの使用ができない。塩化ビニリ
デンやエチレンビニールアルコール共重合体をコーティ
ングしたものは、水蒸気、酸素等のガスバリア性が十分
でなく、特に高温処理においてその低下が著しい。ま
た、塩化ビニリデン系については、焼却時の塩素ガスの
発生等があり、地球環境への影響も懸念されている。一
方、内容物が見え、電子レンジの使用が可能なガスバリ
アフィルムとして、特公昭51−48511 号に、合成樹脂体
表面にSixOy(例えばSiO2)を蒸着したガスバリ
アフィルムが提案されているが、ガスバリア性の良好な
SiOx系(x=1.3 〜1.8 )は、やや褐色を有してお
り、透明ガスバリアフィルムとしては、不十分なもので
ある。The conventional gas barrier film has the following problems. Although the aluminum laminate is excellent in economics and gas barrier properties, it is opaque, so that the contents at the time of packaging cannot be seen, and it does not transmit microwaves, so that a microwave oven cannot be used. Those coated with vinylidene chloride or ethylene vinyl alcohol copolymer do not have sufficient gas barrier properties against water vapor, oxygen, etc., and the decrease is remarkable especially at high temperature treatment. In addition, with respect to vinylidene chloride, there is generation of chlorine gas at the time of incineration, and there is also a concern about the influence on the global environment. On the other hand, visible contents, as a gas barrier film that can be used in the microwave oven, in JP-B-51-48511, a gas barrier film formed by depositing a Si x O y (e.g., SiO 2) in the synthetic resin surface is proposed However, the SiO x system (x = 1.3 to 1.8) having a good gas barrier property has a slightly brown color and is insufficient as a transparent gas barrier film.
【0005】酸化アルミニウムを主体としたものとして
(特開昭62−101428)に見られるようなものもあるが、
酸素バリア性が不十分であり、耐屈曲性の問題もある。
又、レトルト性を有するガスバリアフィルムとしてのA
l2O3・SiO2系の例としては、(特開平2−19494
4)に提案されているものもあるが、Al2O3とSiO 2
を積層したものであり、装置が大がかりなものとなる。
また、これらの薄膜系ガスバリアフィルムについても、
そのガスバリア特性、耐屈曲性は、まだまだ不十分なも
のである。すなわち、耐レトルト性を有するには、ある
程度以上(例えば2000Å)の薄膜の厚みが要求されるの
に対し、耐屈曲性を向上させるには、できるだけ薄い方
がよいという問題を有しており、現在レトルト用として
使用されているものは、その取扱いに注意を要するもの
である。このように、充分な酸素バリア性と水蒸気バリ
ア性を兼ね備え、耐レトルトを有し、屈曲性の高い透明
ガスバリアフィルムはないのが現状である。[0005] As those mainly composed of aluminum oxide
(Japanese Patent Application Laid-Open No. 62-101428)
Oxygen barrier properties are insufficient, and there is also a problem of bending resistance.
Further, A as a gas barrier film having retort properties
lTwoOThree・ SiOTwoExamples of the system include (Japanese Patent Laid-Open No.
Although there is a proposal in 4), AlTwoOThreeAnd SiO Two
Are stacked, and the device becomes large-scale.
In addition, for these thin-film gas barrier films,
Its gas barrier properties and flex resistance are still insufficient
It is. In other words, to have retort resistance,
The thickness of the thin film is required
On the other hand, to improve bending resistance,
Has the problem that
Items that require careful handling are used
It is. Thus, sufficient oxygen barrier and water vapor barrier
, Retort-resistant, highly flexible and transparent
At present, there is no gas barrier film.
【0006】[0006]
【課題を解決するための手段】本発明は、ガスバリア
性、耐レトルト性に優れ、かつ、耐屈曲性の高い酸化ア
ルミニウム・酸化硅素系ガスバリアフィルムを提供せん
とするものである。すなわち、本発明は、シンジオタク
チック構造を有するポリスチレン系重合体を含有する樹
脂組成物からなるフィルム上に、酸化アルミニウム・酸
化硅素薄膜が形成されたガスバリア性フィルムにおい
て、該薄膜内に酸化アルミニウムの比率が20重量%以上
99重量%以下であって、該薄膜の比重と薄膜内の酸化ア
ルミニウム組成比率との関係をD=0.01A+b(D:薄
膜の比重,A:薄膜中の酸化アルミニウムの重量%)と
いう関係式で表す時、該薄膜の比重が、1.6 ≦b≦2.2
で決まる範囲内にあることを特徴とする積層ポリスチレ
ン系フィルム。SUMMARY OF THE INVENTION An object of the present invention is to provide an aluminum oxide / silicon oxide based gas barrier film which is excellent in gas barrier properties and retort resistance and has high bending resistance. That is, the present invention provides a gas barrier film in which an aluminum oxide / silicon oxide thin film is formed on a film made of a resin composition containing a polystyrene-based polymer having a syndiotactic structure. 20% by weight or more
The relationship between the specific gravity of the thin film and the aluminum oxide composition ratio in the thin film is D = 0.01A + b (D: specific gravity of the thin film, A: weight% of aluminum oxide in the thin film). When expressed, the specific gravity of the thin film is 1.6 ≦ b ≦ 2.2
A laminated polystyrene film characterized by being within the range determined by:
【0007】本発明に用いられる立体規則性がシンジオ
タクチック構造であるポリスチレン系重合体は、側鎖で
あるフェニル基又は置換フェニル基が核磁気共鳴法によ
り定量されるタクテイシテイがダイアッド(構成単位が
二個)で85%以上、ペンタッド(構成単位が5個)で50
%以上のシンジオタクチック構造であることが望まし
い。該ポリスチレン系重合体としては、ポリスチレン、
ポリ(p-、m-又はo-メチルスチレン)、ポリ(2,4-、2,
5-、3,4-又は3,5-ジメチルスチレン)、ポリ(p-ターシ
ャリーブチルスチレン)等のポリ(アルキルスチレ
ン)、ポリ(p-、m-又はo-クロロスチレン)、ポリ(p
-、m-又はo-ブロモスチレン)、ポリ(p-、m-又はo-フ
ルオロスチレン)、ポリ(o-メチル-p- フルオロスチレ
ン)等のポリ(ハロゲン化スチレン)、ポリ(p-、m-又
はo-クロロメチルスチレン)等のポリ(ハロゲン置換ア
ルキルスチレン)、ポリ(p-、m-又はo-メトキシスチレ
ン)、ポリ(p-、m-又はo-エトキシスチレン)等のポリ
(アルコキシスチレン)、ポリ(p-、m-又はo-カルボキ
シメチルスチレン)等のポリ(カルボキシアルキルスチ
レン)ポリ(p-ビニルベンジルプロピルエーテル)等の
ポリ(アルキルエーテルスチレン)、ポリ(p-トリメチ
ルシリルスチレン)等のポリ(アルキルシリルスチレ
ン)、さらにはポリ(ビニルベンジルジメトキシホスフ
ァイド)等が挙げられる。本発明においては、前記ポリ
スチレン系重合体のなかで、特にポリスチレンが好適で
ある。また、本発明で用いるシンジオタクチック構造を
有するポリスチレン系重合体は、必ずしも単一化合物で
ある必要はなく、シンジオタクティシティが前記範囲内
であればアタクチック構造やアイソタクチック構造のポ
リスチレン系重合体との混合物や、共重合体及びそれら
の混合物でもよい。In the polystyrene polymer having a stereoregular syndiotactic structure used in the present invention, the phenyl group or the substituted phenyl group, which is a side chain, is quantified by nuclear magnetic resonance. 85% or more for 2) and 50 for pentad (5 constituent units)
% Or more of the syndiotactic structure. As the polystyrene-based polymer, polystyrene,
Poly (p-, m- or o-methylstyrene), poly (2,4-, 2,
5- (3,4- or 3,5-dimethylstyrene), poly (alkylstyrene) such as poly (p-tert-butylstyrene), poly (p-, m- or o-chlorostyrene), poly (p
-(M- or o-bromostyrene), poly (p-, m- or o-fluorostyrene), poly (halogenated styrene) such as poly (o-methyl-p-fluorostyrene), poly (p-, Poly (halogen-substituted alkylstyrene) such as m- or o-chloromethylstyrene, poly (p-, m- or o-methoxystyrene), and poly (p-, m- or o-ethoxystyrene) Poly (carboxyalkylstyrene) such as alkoxy (styrene), poly (p-, m- or o-carboxymethylstyrene), poly (alkyletherstyrene) such as poly (p-vinylbenzylpropylether), poly (p-trimethylsilylstyrene) ), And poly (vinylbenzyldimethoxyphosphide). In the present invention, among the polystyrene-based polymers, polystyrene is particularly preferred. Further, the polystyrene-based polymer having a syndiotactic structure used in the present invention does not necessarily need to be a single compound, and a polystyrene-based polymer having an atactic structure or an isotactic structure as long as the syndiotacticity is within the above range. It may be a mixture with a coalescence, a copolymer or a mixture thereof.
【0008】また本発明に用いるポリスチレン系重合体
は、重量平均分子量が10,000以上、更に好ましくは50,0
00以上である。重量平均分子量が10,000未満のもので
は、強伸度特性や耐熱性に優れたフィルムを得ることが
できない。重量平均分子量の上限について特に限定され
るものではないが、1500,000以上では延伸張力の増大に
伴う破断の発生等が生じることもあり、余り好ましくな
い。The polystyrene-based polymer used in the present invention has a weight average molecular weight of 10,000 or more, more preferably 50,000 or more.
00 or more. When the weight average molecular weight is less than 10,000, a film having excellent elongation characteristics and heat resistance cannot be obtained. The upper limit of the weight-average molecular weight is not particularly limited. However, when the weight-average molecular weight is 1500,000 or more, breakage may occur due to an increase in the stretching tension, which is not preferred.
【0009】本発明に用いられるポリスチレン系重合体
には静電密着性、易滑性、延伸性、加工適性、耐衝撃性
等を向上するため他の樹脂、無機粒子、有機粒子、可塑
剤、相溶化剤、着色剤、酸化防止剤、帯電防止剤等を適
量配合したものを用いることができ、その透明度は特に
限定するものではないが、透明ガスバリアフィルムとし
て使用する場合には、50%以上の透過率をもつものが好
ましい。The polystyrene-based polymer used in the present invention contains other resins, inorganic particles, organic particles, plasticizers, etc. in order to improve electrostatic adhesion, lubricity, stretchability, workability, impact resistance and the like. It is possible to use a compound in which an appropriate amount of a compatibilizer, a colorant, an antioxidant, an antistatic agent, and the like are blended, and the transparency is not particularly limited. However, when used as a transparent gas barrier film, 50% or more is used. Is preferred.
【0010】易滑性、加工適性と透明性を両立させるた
めには滑剤粒子の種類及び添加量の最適化が重要とな
り、粗さの中心面における単位面積当たりの突起数PCC
値と三次元表面粗さSRaがPCC 値≧20000 ×SRa の関
係を満たしている方がよい。そのためには、添加する滑
剤粒子として、シリカ、二酸化チタン、タルク、カオリ
ナイト等の金属酸化物、炭酸カルシウム、リン酸カルシ
ウム、硫酸バリウム等の金属の塩または架橋ポリスチレ
ン樹脂、架橋アクリル樹脂、シリコン樹脂、および架橋
ポリエステル樹脂等の有機ポリマーからなる粒子等のシ
ンジオタクチックポリスチレン系ポリマーに対し不活性
な粒子が例示される。そして、これらの滑剤は、いずれ
か一種を単独で用いてもよく、また2種以上を併用して
もよいが、使用する滑剤の平均粒子系は0.01μm以上3.
5 μm以下が好ましく、粒子径のばらつき度(標準偏差
と平均粒子径との比率)が25%以下が好ましく、添加量
はシンジオタクチックポリスチレン系ポリマー100 重量
%に対し0.005 重量%以上2.0 重量%以下含有すること
が好ましく、特に1.0 重量%以下が好ましい。また、滑
剤粒子の形状は、面積形状係数が60% 以上のものが1種
類以上含まれていることが走行特性には好ましい。It is important to optimize the type and amount of lubricant particles in order to achieve both easy lubricity, workability and transparency, and the number of protrusions per unit area on the central surface of roughness PCC
It is preferable that the value and the three-dimensional surface roughness SRa satisfy the relationship of PCC value ≧ 20000 × SRa. For that purpose, as lubricant particles to be added, silica, titanium dioxide, talc, metal oxides such as kaolinite, calcium carbonate, calcium phosphate, metal salts such as barium sulfate or cross-linked polystyrene resin, cross-linked acrylic resin, silicon resin, and Examples include particles that are inert to syndiotactic polystyrene-based polymers, such as particles composed of an organic polymer such as a crosslinked polyester resin. These lubricants may be used alone or in combination of two or more, but the average particle system of the lubricant used is 0.01 μm or more.
The particle size variation (the ratio of the standard deviation to the average particle size) is preferably 25% or less, and the amount of addition is 0.005% to 2.0% by weight based on 100% by weight of the syndiotactic polystyrene-based polymer. The content is preferably not more than 1.0% by weight. In addition, it is preferable in terms of running characteristics that the shape of the lubricant particles includes one or more types having an area shape factor of 60% or more.
【0011】更に、本発明のシンジオタクチックポリス
チレン系フィルムは、公知の方法、例えば、縦延伸及び
横延伸を順に行なう逐次二軸延伸方法のほか、横・縦・
縦延伸法、縦・横・縦延伸法、縦・縦・横延伸法等の延
伸方法を採用することができる。本発明におけるシンジ
オタクチックポリスチレン系フィルムは高温における耐
熱性の優れたフィルムを要求されることがある。この耐
熱性としては150 ℃における熱収縮率が3%以下である
ことが好ましい。その場合には、これらの延伸方式の選
択のほかに、延伸の条件が大きく影響し、優れた耐熱性
とするためには、熱固定処理、縦弛緩処理、横弛緩処理
等を施すことが好ましい。Further, the syndiotactic polystyrene-based film of the present invention can be prepared by a known method, for example, a sequential biaxial stretching method in which longitudinal stretching and transverse stretching are sequentially performed, as well as a transverse / longitudinal / longitudinal stretching method.
Stretching methods such as longitudinal stretching, longitudinal / horizontal / longitudinal stretching, and longitudinal / longitudinal / horizontal stretching can be employed. The syndiotactic polystyrene film in the present invention may be required to be a film having excellent heat resistance at high temperatures. As for the heat resistance, the heat shrinkage at 150 ° C. is preferably 3% or less. In that case, in addition to the selection of these stretching methods, the conditions of the stretching greatly affect, and in order to obtain excellent heat resistance, it is preferable to perform a heat fixing treatment, a longitudinal relaxation treatment, a horizontal relaxation treatment, or the like. .
【0012】本発明のプラスチックフィルムは、本発明
の目的を損なわない限りにおいて、薄膜層を積層するに
先行して、該フィルムをコロナ放電処理、グロー放電処
理、その他の表面粗面化処理を施してもよく、また、公
知のアンカーコート処理、印刷、装飾が施されていても
よい。本発明のプラスチックフィルムは、その厚さとし
て5〜500 μmの範囲が好ましく、さらに好ましくは8
〜300 μmの範囲である。As long as the object of the present invention is not impaired, the plastic film of the present invention is subjected to corona discharge treatment, glow discharge treatment and other surface roughening treatment prior to lamination of the thin film layer. Or a known anchor coat treatment, printing, or decoration. The thickness of the plastic film of the present invention is preferably in the range of 5 to 500 μm, more preferably 8 to 500 μm.
300300 μm.
【0013】酸化アルミニウム・酸化硅素薄膜は酸化ア
ルミニウムと酸化硅素の混合物、あるいは化合物等とか
ら成り立っていると考えられる。ここでいう酸化アルミ
ニウムとは、Al,AlO,Al2O 等の各種アルミニ
ウム酸化物の混合物から成り立ち、酸化アルミニウム内
での各々の含有率等は作成条件で異なる。酸化珪素と
は、Si,SiO,SiO2等から成り立っていると考
えられ、これらの比率も作成条件で異なる。本発明にお
ける該薄膜の酸化アルミニウムの比率としては、20重量
%以上、99重量%以下であって、好ましくは30重量%以
上、95重量%以下である。また、この成分中に、特性が
損なわれない範囲で微量(全成分に対して高々3 %ま
で)の他成分を含んでもよい。該薄膜の厚さとしては、
特にこれを限定するものではないが、ガスバリア性及び
可尭性の点からは、50〜8000Åが好ましく、更に好まし
くは、70〜5000Åである。It is considered that the aluminum oxide / silicon oxide thin film is composed of a mixture or a compound of aluminum oxide and silicon oxide. The aluminum oxide referred to herein, Al, AlO, consists of a mixture of various aluminum oxides Al 2 O or the like, each of the content, such as in the aluminum oxide differs create conditions. Silicon oxide is considered to be composed of Si, SiO, SiO 2 and the like, and their ratios also differ depending on the preparation conditions. In the present invention, the ratio of aluminum oxide in the thin film is 20% by weight or more and 99% by weight or less, preferably 30% by weight or more and 95% by weight or less. Also, this component may contain a trace amount (up to 3% of all components) of other components as long as the properties are not impaired. As the thickness of the thin film,
Although not particularly limited, it is preferably from 50 to 8000 °, more preferably from 70 to 5000 °, from the viewpoint of gas barrier properties and flexibility.
【0014】かかる酸化アルミニウム・酸化硅素系薄膜
の作成には、真空蒸着法、スパッタ−法、イオンプレ−
テイングなどのPVD法(物理蒸着法)、あるいは、C
VD法(化学蒸着法)などが適宜用いられる。例えば、
真空蒸着法においては、蒸着源材料としてAl2O3とS
iO2やAlとSiO2の混合物等が用いられ、また、加
熱方式としては、抵抗加熱、高周波誘導加熱、電子ビ−
ム加熱等を用いることができる。また、反応性ガスとし
て、酸素、窒素、水蒸気等を導入したり、オゾン添加、
イオンアシスト等の手段を用いた反応性蒸着を用いても
よい。また、基板にバイアス等を加えたり、基板温度を
上昇、あるいは、冷却したり等、本発明の目的を損なわ
ない限りに於て、作成条件を変更してもよい。スパッタ
−法やCVD法等のほかの作成法でも同様である。In order to form such an aluminum oxide / silicon oxide thin film, a vacuum deposition method, a sputtering method, an ion
PVD method (physical vapor deposition method) such as ting, or C
A VD method (chemical vapor deposition method) or the like is appropriately used. For example,
In the vacuum deposition method, Al 2 O 3 and S
iO 2 or a mixture of Al and SiO 2 is used also as a heating method, resistance heating, high frequency induction heating, electron beam -
Heating or the like can be used. In addition, as a reactive gas, oxygen, nitrogen, water vapor, etc. are introduced, ozone is added,
Reactive deposition using means such as ion assist may be used. Further, the production conditions may be changed as long as the object of the present invention is not impaired, such as applying a bias to the substrate, increasing the substrate temperature, or cooling. The same applies to other production methods such as a sputtering method and a CVD method.
【0015】本発明品は、そのままで使用されてもよい
が、他の有機高分子のフィルム、または薄層をラミネー
トまたはコーティングして使用してもよい。The product of the present invention may be used as it is, or may be used by laminating or coating a film or a thin layer of another organic polymer.
【0016】本発明でいう比重とは、ある温度で、ある
体積を占める物質の質量と、それと同体積の標準物質の
質量(4℃における水)との比をいう。比重の測定は、
通常物体の質量と体積を測り、同体積の4℃の水の質量
との比を求めればよいが、本発明の薄膜の測定では、体
積の測定が困難である。そこで、まず基板から薄膜をは
がす、あるいは、基板のみを溶解することにより、薄膜
のみからなる単独膜の状態としたのちに、(JIS K
7112)にあるような比重測定法を用いることが望まし
い。例えば、浮沈法では、試料を比重既知の溶液の中に
浸せきさせ、その浮沈状態から薄膜の比重を測定するこ
とができる。この溶液としては、四塩化炭素とブロモホ
ルム、または、ヨウ化メチレンなどの混合液を用いるこ
とができる。また、連続的な密度勾配をもつ溶液中に単
独膜を浸積させる密度勾配管法によっても比重の値を測
定できる。The specific gravity referred to in the present invention refers to the ratio of the mass of a substance occupying a certain volume at a certain temperature to the mass of a standard substance having the same volume (water at 4 ° C.). The measurement of specific gravity is
Normally, the mass and volume of the object may be measured, and the ratio of the mass to the same volume of water at 4 ° C. may be obtained. However, it is difficult to measure the volume in the measurement of the thin film of the present invention. Then, first, the thin film is peeled off from the substrate or only the substrate is dissolved to form a single film consisting of only the thin film.
It is desirable to use a specific gravity measurement method as described in 7112). For example, in the flotation method, a sample is immersed in a solution having a known specific gravity, and the specific gravity of the thin film can be measured from the flotation state. As this solution, a mixed solution of carbon tetrachloride and bromoform, methylene iodide, or the like can be used. The specific gravity value can also be measured by a density gradient tube method in which a single film is immersed in a solution having a continuous density gradient.
【0017】このようにして得られた該薄膜の比重の値
が、薄膜中の酸化アルミニウムの重量%との関係を、D
=0.01A+b(D:薄膜の比重、A:薄膜中の酸化アル
ミニウムの重量%)という式で示すとき、bの値が1.6
よりも小さい領域のときには、酸化アルミニウム・酸化
硅素薄膜の構造が粗雑となり、充分なガスバリア性が得
られない。また、該薄膜の比重の値が、b値で、2.2 よ
りも大きい領域の場合、成膜後の初期ガスバリア特性は
優れているものの、膜が硬くなりすぎ、機械特性、特に
ゲルボ特性が劣り、処理後のガスバリア性の低下が大き
くなり、ガスバリアフィルムとしての使用に適していな
い。以上の理由からガスバリアフィルムとして好ましい
酸化アルミニウム・酸化硅素薄膜の比重は、該薄膜の比
重と薄膜内の酸化アルミニウム組成比率との関係をD=
0.01A+b(D:薄膜の比重、A:薄膜中の酸化アルミ
ニウムの重量%)という関係式であらわす時、bの値で
1.6 から2.2 であり、更に好ましくは1.7 から2.1 であ
る。The relationship between the specific gravity value of the thin film thus obtained and the weight% of aluminum oxide in the thin film is expressed by D
= 0.01A + b (D: specific gravity of the thin film, A: weight% of aluminum oxide in the thin film), the value of b is 1.6
If the area is smaller than the above range, the structure of the aluminum oxide / silicon oxide thin film becomes coarse and sufficient gas barrier properties cannot be obtained. In addition, when the value of the specific gravity of the thin film is in a region where the b value is larger than 2.2, the initial gas barrier properties after film formation are excellent, but the film is too hard, and the mechanical properties, particularly the gelbo properties are inferior. The gas barrier property after treatment is greatly reduced, and is not suitable for use as a gas barrier film. For the above reasons, the specific gravity of the aluminum oxide / silicon oxide thin film, which is preferable as the gas barrier film, is expressed by the following formula: D = D
When the relational expression of 0.01A + b (D: specific gravity of the thin film, A: weight% of aluminum oxide in the thin film) is expressed by the value of b,
1.6 to 2.2, more preferably 1.7 to 2.1.
【0018】[0018]
【実施例】以下に実施例にて本発明を具体的に説明する
が、本発明はこれら実施例のみに限定されるものではな
い。以下に実施例および比較例で作成されたポリスチレ
ン系透明ガスバリアフィルムおよび用いられる不活性粒
子の特性を測定する方法を示す。EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to only these examples. Hereinafter, a method for measuring the characteristics of the polystyrene-based transparent gas barrier films prepared in Examples and Comparative Examples and the inert particles used will be described.
【0019】(1)150 ℃における熱収縮率 無張力の状態で150 ℃の雰囲気中30分におけるフィルム
の収縮率を求めた。(1) Thermal Shrinkage at 150 ° C. The shrinkage of the film was measured for 30 minutes in an atmosphere of 150 ° C. in an untensioned state.
【0020】(2)三次元表面粗さSRa フィルム表面を触針式3次元表面粗さ計(SE-3AK, 株式
会社小坂研究所社製)を用いて、針の半径2μm、荷重
30mgの条件化に、フィルムの長手方向にカットオフ値0.
25mmで、測定長1mmにわたって測定し、2μmピッチで5
00 点に分割し、各点の高さを3次元粗さ解析装置(SPA
-11) に取り込ませた。これと同様の操作をフィルムの
幅方向について2μm間隔で連続的に150 回、即ちフィ
ルムの幅方向0.3mm にわたって行ない、解析装置にデー
タを取り込ませた。次に、解析装置を用いて、SRa を求
めた。(2) Three-dimensional surface roughness SRa The film surface was measured using a stylus type three-dimensional surface roughness meter (SE-3AK, manufactured by Kosaka Laboratory Co., Ltd.) with a needle radius of 2 μm and a load.
A cut-off value of 0 in the longitudinal direction of the film with a condition of 30 mg.
Measured over a measurement length of 1 mm at 25 mm,
It is divided into 00 points, and the height of each point is determined by a three-dimensional roughness analyzer (SPA).
-11). The same operation was continuously performed 150 times at intervals of 2 μm in the width direction of the film, that is, over 0.3 mm in the width direction of the film, and the data was taken into the analyzer. Next, SRa was determined using an analyzer.
【0021】(4)PCC 値 SRa の算出時における基準高さを有する基準面から0.00
625 μm以上の高さをもつ突起数を1mm2当たりについて
表したもの。(4) From the reference plane having the reference height when calculating the PCC value SRa, 0.00
The number of protrusions having a 625 [mu] m or more in height that represents the per 1 mm 2.
【0022】(4)平均粒子径 滑剤粒子を(株)日立製作所製S-510型走査型電子顕
微鏡で観察し、写真撮影したものを拡大して複写し、滑
剤の外形をトレースし任意に200 個の粒子を黒く塗りつ
ぶした。この像をニコレ(株)製ルーゼックス500 型画
像解析装置を用いて、それぞれの粒子の水平方向のフェ
レ径を測定し、その平均値を平均粒子径とした。また、
粒子径のばらつき度は下記の式により算出した。 ばらつき度=(粒子径の標準偏差/平均粒子径)× 10
0 (%)(4) Average particle size The lubricant particles were observed with a scanning electron microscope (S-510, manufactured by Hitachi, Ltd.), and the photograph was enlarged and copied, and the outer shape of the lubricant was traced and arbitrarily determined. Individual particles were painted black. This image was measured for the horizontal Feret diameter of each particle using a Luzex 500 image analyzer manufactured by Nicole Co., Ltd., and the average value was defined as the average particle diameter. Also,
The degree of dispersion of the particle diameter was calculated by the following equation. Variation = (standard deviation of particle size / average particle size) x 10
0 (%)
【0023】(5)面積形状係数 平均粒子径の測定に用いたトレース像から任意に20個の
粒子を選び(4)で用いた画像解析装置を用いて、それ
ぞれの粒子の投影断面積を測定した。また、それらの粒
子に外接する円の面積を算出し、下記の式により算出し
た。 面積形状係数=(粒子の投影断面積/粒子に外接する円
の面積)× 100 (%)(5) Area Shape Coefficient An arbitrary 20 particles are selected from the trace image used for measuring the average particle diameter, and the projected cross-sectional area of each particle is measured using the image analyzer used in (4). did. Further, the area of a circle circumscribing the particles was calculated, and calculated by the following equation. Area shape factor = (projected cross-sectional area of particle / area of circle circumscribing the particle) x 100 (%)
【0024】(6)酸素透過率の測定方法 作成したガスバリアフィルムの酸素透過率を酸素透過率
測定装置(モダンコントロールズ社製 OX−TRAN
100 )を用いて測定した。(6) Method of Measuring Oxygen Permeability The oxygen permeability of the prepared gas barrier film was measured using an oxygen permeability measuring device (OX-TRAN manufactured by Modern Controls).
100).
【0025】 (7)耐屈曲疲労性(以下ゲルボ特性)のテスト方法 耐屈曲疲労性は、いわゆるゲルボフレックステスター
(理学工業( 株) 社製)を用いて評価した。条件として
は(MIL−B131 H)で11.2inch×8inchの
試料片を直径3(1/2)inchの円筒状とし、両端
を保持し、初期把持間隔7inchとし、ストロークの
3(1/2)inchで、400 度のひねりを加えるもの
でこの動作の繰り返し往復運動を40回/minの速さ
で、20℃、相対湿度65%の条件下で行った。(7) Test method for flex fatigue resistance (hereinafter referred to as gelbo property) The flex fatigue resistance was evaluated using a so-called gelbo flex tester (manufactured by Rigaku Corporation). The conditions are (MIL-B131H), a sample piece of 11.2 inch × 8 inch is made into a cylindrical shape having a diameter of 3 (1 /) inch, both ends are held, an initial holding interval is 7 inch, and a stroke is 3 (1 /). The reciprocation of this operation was performed at a speed of 40 times / min at 20 ° C. and a relative humidity of 65% using an inch with a twist of 400 degrees.
【0026】(実施例1)滑剤として、平均粒子径1.0
μm、ばらつき度20% 、面積形状係数80% の炭酸カルシ
ウムをシンジオタクチックポリスチレン(重量平均分子
量300000)100 重量%に対して1.0 重量%添加したポリ
マーチップと、滑剤の添加されていないポリマーチップ
を重量比で0.5 対9.5 の割合で混合した後、乾燥し、31
0 ℃で溶融し、800 μmのリップギャップのT ダイから
押し出し、50℃の冷却ロールに静電印荷法により密着・
冷却固化し、135 μmの無定形シートを得た。Example 1 As a lubricant, an average particle size of 1.0
A polymer chip containing 1.0% by weight of 100% by weight of syndiotactic polystyrene (weight average molecular weight: 300,000) and a polymer chip without a lubricant added to 100% by weight of calcium carbonate having μm, a dispersion of 20%, and an area shape coefficient of 80%. After mixing at a weight ratio of 0.5 to 9.5, dry and mix
Melted at 0 ° C, extruded from T-die with lip gap of 800μm, and adhered to cooling roll at 50 ° C by electrostatic imprinting method.
After cooling and solidification, an amorphous sheet of 135 μm was obtained.
【0027】該無定形シートをまずセラッミクロールに
より95℃に予熱し、シリコンゴムロールにより138 ℃に
加熱し、縦方向に3.5 倍延伸し、ついで120 ℃のセラミ
ックロールと40℃の金属ロールの間で20%縦弛緩処理
し、テンターでフィルムを120℃に予熱し、横方向に延
伸温度120 ℃で1.8 倍延伸し、更に180 ℃で横方向に1.
9 倍延伸し、250 ℃で12秒熱固定処理した。その後、21
5 ℃で3%横弛緩処理し、更に210 ℃で2%縦弛緩処理し
た。得られたフィルムの厚みは14μmであった。150 ℃
における熱収縮率は2.5 %であった。The amorphous sheet was first preheated to 95 ° C. with a cellulomicrol, heated to 138 ° C. with a silicone rubber roll, stretched 3.5 times in the machine direction, and then placed between a ceramic roll at 120 ° C. and a metal roll at 40 ° C. After 20% longitudinal relaxation, the film is preheated to 120 ° C by a tenter, stretched 1.8 times in the transverse direction at 120 ° C, and further stretched in the transverse direction at 180 ° C.
The film was stretched 9 times and heat-set at 250 ° C. for 12 seconds. Then 21
It was subjected to a 3% transverse relaxation treatment at 5 ° C. and a 2% longitudinal relaxation treatment at 210 ° C. The thickness of the obtained film was 14 μm. 150 ° C
Was 2.5%.
【0028】得られたフィルムに、蒸着源として、3 〜
5 mm程度の大きさの粒子状のAl 2O3(純度99.5%)
とSiO2(純度99.9%)を用い、電子ビ−ム蒸着法
で、酸化アルミニウム酸化硅素薄膜の形成を行った。蒸
着材料は、混合せずに、ハ−ス内をカ−ボン板で2 つに
仕切り、、加熱源として一台の電子銃(以下EB銃)を
用い、Al2O3とSiO2のそれぞれを時分割で加熱し
た。その時のEB銃のエミッション電流を0.8 〜2.2 A
と変化させ、Al2O3とSiO2への加熱比は、20:10
〜50:10と変え、組成を変化させた。フィルム送り速度
は、30〜120 m/minと変化させ、500 〜5000Å厚の
膜を作った。又、蒸気圧は、酸素ガスの供給量を変える
こと等で、1×10-5〜8×10-3Torrまで条件を変え
た。In the obtained film, 3 to 3
Particulate Al with a size of about 5 mm TwoOThree(Purity 99.5%)
And SiOTwo(Purity 99.9%) using electron beam evaporation
Thus, an aluminum oxide silicon oxide thin film was formed. Steam
The dressing materials are not mixed, and the inside of the heart is halved with a carbon plate.
One electron gun (hereinafter EB gun) as a partition and heating source
Used, AlTwoOThreeAnd SiOTwoEach in a time-sharing manner
Was. The emission current of the EB gun at that time is 0.8 to 2.2 A
And AlTwoOThreeAnd SiOTwoHeating ratio to 20:10
組成 50:10 and the composition was changed. Film feed speed
Is changed to 30-120 m / min, and 500-5000 mm thick
Made a membrane. Also, the vapor pressure changes the supply amount of oxygen gas.
1 × 10-Five~ 8 × 10-3Change the conditions until Torr
Was.
【0029】得られたフィルムの湿度膨張係数は5×10
-7/%RHと非常に低い数値を示し、また熱膨張係数も2×
10-5/ ℃と良好な値であるため、薄膜層形成後の加工時
や使用時における環境変化による寸法安定性に優れてお
り環境変化に基づく薄膜層の剥離、ひび割れ、そり、波
打ち等の欠点発生が生じなかった。このようにして得ら
れた膜の比重をシンジオタクチックポリスチレンフィル
ムを溶解したのち、浮沈法で測定した。The film obtained has a coefficient of humidity expansion of 5 × 10 5
It shows a very low value of -7 /% RH, and the coefficient of thermal expansion is 2 ×
Because of the good value of 10 -5 / ° C, it is excellent in dimensional stability due to environmental changes during processing and use after forming the thin film layer, and the thin film layer can be peeled, cracked, warped, wavy, etc. due to environmental changes. No defects occurred. The specific gravity of the thus obtained film was measured by dissolving the syndiotactic polystyrene film and then using the floatation / sedimentation method.
【0030】更に、このシンジオタクチックポリスチレ
ン上の複合膜に対し、また、厚さ40μmの未延伸ポリプ
ロピレンフィルム(OPPフィルム)を二液硬化型ポリ
ウレタン系接着剤(厚さ2μm)を用いて、ドライラミ
ネ−トして、本発明応用の包装用プラスチックフィルム
を得た。この包装用フィルムに対して、レトルト処理
(120 度×30分)、または、ゲルボ処理を施したのち、
酸素バリア性を測定した。Further, an unstretched polypropylene film (OPP film) having a thickness of 40 μm was dried on the composite film on the syndiotactic polystyrene using a two-component curing type polyurethane adhesive (2 μm in thickness). To obtain a plastic film for packaging according to the present invention. This packaging film is subjected to retort treatment (120 degrees x 30 minutes) or gelbo treatment,
The oxygen barrier properties were measured.
【0031】このようにして測定した酸素透過率は、1.
0 cc前後と非常に優秀であった。さらに200 回ゲルボ
試験後の結果も、2〜3cc前後の上昇に留まり、総合
特性の優れたガスバリアフィルムが得られた。(表1、
2)The oxygen permeability measured in this way is 1.
It was very good, around 0 cc. Further, the result after the 200 times gelbo test also showed a rise of only about 2 to 3 cc, and a gas barrier film having excellent overall characteristics was obtained. (Table 1,
2)
【0032】(比較例1)実施例1 と同様にEB蒸着で
酸化アルミニウム酸化硅素系透明ガスバリア薄膜の作成
を行ない、得られたサンプルに対して、比重測定および
レトルト処理、または、ゲルボ処理後の酸素バリア性を
測った。その結果、酸素バリア性、耐レトルト性、ある
いは、ゲルボ特性のいずれかが不十分なものになり、総
合判定で不良となった。(表1、2)Comparative Example 1 A transparent gas barrier thin film of aluminum oxide silicon oxide was prepared by EB vapor deposition in the same manner as in Example 1, and the obtained sample was subjected to specific gravity measurement and retort treatment or gelbo treatment. The oxygen barrier properties were measured. As a result, one of the oxygen barrier properties, retort resistance, and gelbo properties became insufficient, and the overall judgment was poor. (Tables 1 and 2)
【0033】(比較例2)シンジオタクチックポリスチ
レンフィルムの代わりにポリエチレンテレフタレートフ
ィルム(東洋紡績(株):E5007)を使用した以外は実
施例1 と同様にEB蒸着で酸化アルミニウム酸化硅素系
透明ガスバリア薄膜の作成を行なった。このようにして
得られた膜の比重をシンジオタクチックポリスチレンフ
ィルムを溶解したのち、浮沈法で測定した。その結果、
酸素バリア性、耐レトルト性、あるいは、ゲルボ特性に
ついては十分なものであったが、使用したポリエチレン
テレフタレートフィルムの湿度膨張係数は120 ×10-7/%
RHであり、シンジオタクチックポリスチレンフィルムと
比較し湿度膨張が大きいため、薄膜層形成後の加工時や
使用時における湿度変化やレトルト処理によりフィルム
にそりが発生し、総合判定で不良となった。Comparative Example 2 An aluminum oxide silicon oxide-based transparent gas barrier thin film was formed by EB deposition in the same manner as in Example 1 except that a polyethylene terephthalate film (Toyobo Co., Ltd .: E5007) was used instead of the syndiotactic polystyrene film. Was made. The specific gravity of the thus obtained film was measured by dissolving the syndiotactic polystyrene film and then using the floatation / sedimentation method. as a result,
Oxygen barrier properties, retort resistance, or gelbo properties were sufficient, but the polyethylene terephthalate film used had a humidity expansion coefficient of 120 × 10 -7 /%
Since it is RH and the humidity expansion is larger than that of the syndiotactic polystyrene film, the film was warped due to humidity change and retort treatment during processing or use after the formation of the thin film layer, and the overall judgment was poor.
【0034】(比較例3)シンジオタクチックポリスチ
レンフィルムの代わりにポリアミドフィルム(東洋紡績
(株):N1100 )を使用した以外は実施例1 と同様にE
B蒸着で酸化アルミニウム酸化硅素系透明ガスバリア薄
膜の作成を行ない、得られたサンプルに対して、比重測
定およびレトルト処理、または、ゲルボ処理後の酸素バ
リア性を測った。その結果、酸素バリア性、耐レトルト
性、あるいは、ゲルボ特性については十分なものであっ
たが、使用したポリアミドフィルムの湿度膨張係数は10
00×10-7/%RHであり、シンジオタクチックポリスチレン
フィルムと比較し湿度膨張が非常に大きいため、薄膜層
形成後の加工時や使用時における湿度変化やレトルト処
理によりフィルムにカールが発生し、総合判定で不良と
なった。Comparative Example 3 E was the same as in Example 1 except that a polyamide film (Toyobo Co., Ltd .: N1100) was used instead of the syndiotactic polystyrene film.
An aluminum-silicon oxide-based transparent gas barrier thin film was prepared by B vapor deposition, and the obtained sample was measured for specific gravity and oxygen barrier properties after retort treatment or gelbo treatment. As a result, the oxygen barrier properties, retort resistance, or gelbo properties were sufficient, but the humidity expansion coefficient of the polyamide film used was 10%.
It is 00 × 10 -7 /% RH, and its humidity expansion is much larger than that of syndiotactic polystyrene film.Therefore, the film will curl due to humidity change and retort processing during processing or use after forming the thin film layer. , The overall judgment was poor.
【0035】[0035]
【発明の効果】シンジオタクチック構造を有するポリス
チレン系重合体を含有する樹脂組成物からなるフィルム
上に、酸化アルミニウム・酸化硅素系薄膜が形成された
ガスバリアフィルムにおいて、該薄膜内の酸化アルミニ
ウムの比率が20重量%以上99重量%以下であって、該薄
膜の比重と薄膜内の酸化アルミニウム組成比率との関係
をD=0.01A+b(D:薄膜の比重,A:薄膜中の酸化
アルミニウムの重量%)という関係式で表す時、該薄膜
の比重を、1.6 ≦b≦2.2 であらわされる範囲内とする
ことによって、ガスバリア性に優れ、また耐レトルト
性、屈曲性の高い、総合的に実用特性のすぐれた酸化ア
ルミニウム・酸化珪素系ガスバリアフィルムを提供でき
る。As described above, in a gas barrier film in which an aluminum oxide / silicon oxide thin film is formed on a film made of a resin composition containing a polystyrene polymer having a syndiotactic structure, the ratio of aluminum oxide in the thin film Is not less than 20% by weight and not more than 99% by weight, and the relation between the specific gravity of the thin film and the composition ratio of aluminum oxide in the thin film is D = 0.01A + b (D: specific gravity of the thin film, A: weight% of aluminum oxide in the thin film) )), By setting the specific gravity of the thin film within the range represented by 1.6 ≦ b ≦ 2.2, the thin film has excellent gas barrier properties, high retort resistance, high flexibility, and overall practical characteristics. An excellent aluminum oxide / silicon oxide based gas barrier film can be provided.
【0036】[0036]
【表1】 [Table 1]
【0037】[0037]
【表2】 [Table 2]
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平4−103757(JP,A) 特開 平2−143851(JP,A) 特開 昭60−23037(JP,A) 特開 平4−99165(JP,A) (58)調査した分野(Int.Cl.7,DB名) B32B 1/00 - 35/00 ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-4-103375 (JP, A) JP-A-2-1433851 (JP, A) JP-A-60-23037 (JP, A) JP-A-4- 99165 (JP, A) (58) Field surveyed (Int. Cl. 7 , DB name) B32B 1/00-35/00
Claims (1)
チレン系重合体を含有する樹脂組成物からなるフィルム
上に酸化アルミニウム・酸化硅素薄膜が形成されたガス
バリア性フィルムにおいて、該薄膜内に酸化アルミニウ
ムの比率が20重量%以上、99重量%以下であって、該薄
膜の比重が下記式を満足することを特徴とする積層ポリ
スチレン系フィルム。 D=0.01A+b 但し D:薄膜の比重、A:薄膜中の酸化アルミニウム
の重量% 1.6 ≦b≦2.21. A gas barrier film comprising an aluminum oxide / silicon oxide thin film formed on a film made of a resin composition containing a polystyrene polymer having a syndiotactic structure, wherein the ratio of aluminum oxide in the thin film is A laminated polystyrene-based film, wherein the specific gravity of the thin film satisfies the following formula: not less than 20% by weight and not more than 99% by weight. D = 0.01A + b, where D: specific gravity of the thin film, A: weight% of aluminum oxide in the thin film 1.6 ≦ b ≦ 2.2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15036393A JP3228375B2 (en) | 1993-06-22 | 1993-06-22 | Laminated polystyrene film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15036393A JP3228375B2 (en) | 1993-06-22 | 1993-06-22 | Laminated polystyrene film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH071644A JPH071644A (en) | 1995-01-06 |
| JP3228375B2 true JP3228375B2 (en) | 2001-11-12 |
Family
ID=15495361
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15036393A Expired - Fee Related JP3228375B2 (en) | 1993-06-22 | 1993-06-22 | Laminated polystyrene film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3228375B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003334902A (en) | 2002-05-17 | 2003-11-25 | Toyobo Co Ltd | Easy adhesion syndiotactic polystyrene-based stretched film |
| GB0822479D0 (en) | 2008-12-10 | 2009-01-14 | Johnson Matthey Plc | Improvements in catalysts |
-
1993
- 1993-06-22 JP JP15036393A patent/JP3228375B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH071644A (en) | 1995-01-06 |
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