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JP3233136B2 - Semiconductor pressure sensor - Google Patents
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JP3233136B2 - Semiconductor pressure sensor - Google Patents

Semiconductor pressure sensor

Info

Publication number
JP3233136B2
JP3233136B2 JP25750299A JP25750299A JP3233136B2 JP 3233136 B2 JP3233136 B2 JP 3233136B2 JP 25750299 A JP25750299 A JP 25750299A JP 25750299 A JP25750299 A JP 25750299A JP 3233136 B2 JP3233136 B2 JP 3233136B2
Authority
JP
Japan
Prior art keywords
semiconductor chip
wall surface
pedestal
introducing hole
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP25750299A
Other languages
Japanese (ja)
Other versions
JP2000065663A (en
Inventor
和彦 古賀
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denso Corp
Original Assignee
Denso Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Denso Corp filed Critical Denso Corp
Priority to JP25750299A priority Critical patent/JP3233136B2/en
Publication of JP2000065663A publication Critical patent/JP2000065663A/en
Application granted granted Critical
Publication of JP3233136B2 publication Critical patent/JP3233136B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Measuring Fluid Pressure (AREA)
  • Pressure Sensors (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は半導体圧力センサに
関し、特に半導体チップの汚染や光劣化を生じないセン
サの構造改良に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor pressure sensor and, more particularly, to an improvement in the structure of a sensor which does not cause contamination or light deterioration of a semiconductor chip.

【0002】[0002]

【従来の技術】図3には従来の半導体圧力センサの構造
を示し、閉鎖ケース1内には底壁面上に矩形ブロック状
のガラス台座2が固定され、該台座2上にシリコン半導
体チップ3が陽極接合により固定してある。半導体チッ
プ3は下面中心部を凹状として薄肉のダイヤフラム部3
1としてあり、該ダイヤフラム部31の上面に圧力セン
サを構成する歪みゲージが拡散形成してある。ダイヤフ
ラム部31の背後の台座2上面との間の密閉空間Sは真
空となっている。
2. Description of the Related Art FIG . 3 shows the structure of a conventional semiconductor pressure sensor. In a closed case 1, a rectangular block-shaped glass pedestal 2 is fixed on a bottom wall surface, and a silicon semiconductor chip 3 is mounted on the pedestal 2. It is fixed by anodic bonding. The semiconductor chip 3 has a thin diaphragm portion 3 with its lower center portion being concave.
The strain gauge constituting the pressure sensor is diffused and formed on the upper surface of the diaphragm portion 31. The closed space S between the upper surface of the pedestal 2 behind the diaphragm 31 is evacuated.

【0003】上記ケース1の頂壁には圧力導入孔15が
貫通形成されて、これを経て大気圧がケース1内に導入
されている。しかし、大気圧の変動に応じてダイヤフラ
ム部31が変形し、歪みゲージより絶対大気圧に応じた
信号出力が得られる。かかる構造は例えば特開昭64−
431号公報に開示されている。
A pressure introduction hole 15 is formed through the top wall of the case 1, through which atmospheric pressure is introduced into the case 1. However, the diaphragm section 31 is deformed according to the fluctuation of the atmospheric pressure, and a signal output corresponding to the absolute atmospheric pressure is obtained from the strain gauge. Such a structure is disclosed in, for example,
No. 431.

【0004】[0004]

【発明が解決しようとする課題】ところで、上記従来の
センサ構造では、大気中の汚染物質や水等が圧力導入孔
15より直接半導体チップ3上に到達して付着し、特性
劣化を起し易いという問題があった。また、圧力導入孔
15を経て光が直接半導体チップ3に入射してこれによ
っても特性劣化のおそれがあった。
By the way, in the above-mentioned conventional sensor structure, pollutants and water in the air reach the semiconductor chip 3 directly from the pressure introducing hole 15 and adhere to the semiconductor chip 3 to easily cause deterioration of characteristics. There was a problem. In addition, light directly enters the semiconductor chip 3 via the pressure introducing hole 15, and there is a possibility that the characteristics may be degraded.

【0005】本発明はかかる課題を解決するもので、汚
染物質等の付着が防止されるとともに、入射光線による
劣化もない半導体圧力センサを提供することを目的とす
る。
An object of the present invention is to provide a semiconductor pressure sensor which can prevent such contaminants from adhering and which is not deteriorated by an incident light beam.

【0006】[0006]

【課題を解決するための手段】本発明の構成を説明する
と、半導体圧力センサは、薄肉のダイヤフラム部の上面
に歪みゲージを有する矩形状の半導体チップと、この半
導体チップが固定されて上記ダイヤフラム部の下面との
間に密閉空間を形成する台座と、この台座を配置固定す
るための領域を設けた内壁面を有する閉鎖空間を有する
閉鎖ケースとを備え、前記閉鎖ケース内の内壁面におい
て、上記台座配置領域は凹部となっており、この凹部に
前記台座が設置されることで、前記凹部周辺の前記内壁
面と前記半導体チップとの水平高さがほぼ同一となるも
のであり、この凹部周辺の前記内壁面上であって前記半
導体チップの矩形の対向する2辺に隣接した2つの電極
領域において、半導体チップとボンディングワイヤにて
電気接続する電極部が形成され、上記内壁面の上記台座
配置領域と異なる領域に上記閉鎖ケースを唯一貫通して
上記圧力導入孔が形成され、当該圧力導入孔の開口が上
記半導体チップの上記歪みゲージを有する面が向く方向
と同じ方向を向きかつ上記閉鎖空間内の上記内壁面に対
向するように配置され、また、この圧力導入孔の開口が
前記電極領域において前記半導体チップの矩形の前記2
辺のうちの1辺と前記電極部とに隣接している。
To explain the structure of the present invention, a semiconductor pressure sensor comprises a rectangular semiconductor chip having a strain gauge on the upper surface of a thin diaphragm portion, and the semiconductor chip fixed to the diaphragm portion. A pedestal forming a closed space between the pedestal and a lower case, and a closed case having a closed space having an inner wall surface provided with a region for arranging and fixing the pedestal. The pedestal arrangement region is a concave portion, and the horizontal height of the inner wall surface around the concave portion and the semiconductor chip becomes substantially the same by installing the pedestal in the concave portion. An electrode electrically connected to the semiconductor chip by a bonding wire in two electrode regions on the inner wall surface and adjacent to two opposing sides of a rectangle of the semiconductor chip; Is formed, the pressure introduction hole is formed only through the closed case in a region different from the pedestal arrangement region of the inner wall surface, and the opening of the pressure introduction hole is a surface of the semiconductor chip having the strain gauge. It is arranged so as to face in the same direction as the direction in which it faces and to face the inner wall surface in the closed space, and the opening of the pressure introducing hole has a rectangular shape of the semiconductor chip in the electrode region.
One of the sides is adjacent to the electrode portion.

【0007】より具体的には、圧力導入孔の開口は前記
半導体チップの矩形の1辺の延びる方向に前記電極部と
共に並べて配置されている。
More specifically, the openings of the pressure introducing holes are arranged side by side with the electrode portions in a direction in which one side of a rectangle of the semiconductor chip extends.

【0008】上記構成において、圧力導入孔15は半導
体チップを設けた面と同じ内壁面に形成してあるから、
圧力導入孔より汚染物質や水等が侵入しても、これらは
半導体チップに対向する内壁面に直接付着あるいは衝突
する。したがって半導体チップへ到達する確率は低い。
In the above configuration, the pressure introducing hole 15 is formed on the same inner wall surface as the surface on which the semiconductor chip is provided.
Even if contaminants, water, and the like enter through the pressure introducing holes, they directly adhere to or collide with the inner wall surface facing the semiconductor chip. Therefore, the probability of reaching the semiconductor chip is low.

【0009】また、圧力導入孔より入射する光も、半導
体チップに対向する内壁面でいったん反射し、あるいは
他の内壁面で数回反射して半導体チップに至るから、チ
ップ上の素子特性への影響は極めて小さい。
Also, the light incident from the pressure introducing hole is reflected once on the inner wall surface facing the semiconductor chip or is reflected several times on the other inner wall surface to reach the semiconductor chip. The effect is very small.

【0010】また、半導体チップとボンディングワイヤ
にて電気的に接続する電極部が半導体チップの矩形の対
向する2辺に隣接した電極領域に形成されるもので、圧
力導入孔の開口が電極領域に形成されるので、圧力導入
孔の開口のための領域を別領域に形成しておらず、閉鎖
ケースの大きさを必要以上に大きくしていない。
An electrode portion electrically connected to the semiconductor chip by a bonding wire is formed in an electrode region adjacent to two opposing sides of a rectangle of the semiconductor chip, and an opening of the pressure introducing hole is formed in the electrode region. Since it is formed, a region for opening the pressure introducing hole is not formed in another region, and the size of the closed case is not made larger than necessary.

【0011】[0011]

【発明の実施の形態】図1、図2において、閉鎖ケース
1は下側容器11と、これを覆って開口縁をレジンボン
ドで密着固定された蓋体12とより構成され、下側容器
11は全体が厚肉で、その内壁面13は中心部が深い矩
形の凹所131となっている。この凹所131には底面
に近い四辺の側壁に内方へ突出するガイド用凸部132
が形成してあり、これら凸部132に外周を近接せしめ
て、凹所底面に矩形ブロック状のガラス台座2がレジン
ボンドで接合固定してある。該台座2の上面には同径の
シリコン半導体チップ3が陽極接合により固定され、上
記台座2は半導体チップ3に近い熱膨張係数を有してい
る。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Referring to FIGS. 1 and 2, a closed case 1 is composed of a lower container 11 and a lid 12 covering the lower container 11 and having an opening edge tightly fixed with a resin bond. Is thick and the inner wall surface 13 is a rectangular recess 131 having a deep center. The recess 131 has guide protrusions 132 projecting inward from four side walls close to the bottom surface.
A rectangular block-shaped glass pedestal 2 is fixed to the bottom of the recess by resin bonding with the outer periphery approaching these convex portions 132. A silicon semiconductor chip 3 of the same diameter is fixed to the upper surface of the pedestal 2 by anodic bonding, and the pedestal 2 has a thermal expansion coefficient close to that of the semiconductor chip 3.

【0012】半導体チップ3は中心部の下面を凹状とし
て薄肉のダイヤフラム部31としてあり、このダイヤフ
ラム部31上面に歪みゲージが拡散形成してある。この
ダイヤフラム部31下方の台座2上面との間の密閉空間
Sは真空としてある。
The semiconductor chip 3 has a thin diaphragm portion 31 with a concave lower surface at the center portion, and a strain gauge is formed on the upper surface of the diaphragm portion 31 by diffusion. The closed space S between the upper surface of the pedestal 2 below the diaphragm 31 is evacuated.

【0013】上記凹所131を囲む内壁面13外周部は
上記半導体チップ3の上面とほぼ同一高さとなってお
り、かかる内壁面13上の三箇所に端子板41,42,
43が埋設されて、これら端子板41〜43と上記半導
体チップ3の間をボンディングワイヤ32で接続してあ
る。そして、端子板41に近い内壁面に、下側容器11
を下方へ貫通する圧力導入孔15が開口して大気圧が閉
鎖ケース1内に導入されている。
The outer peripheral portion of the inner wall surface 13 surrounding the recess 131 is substantially the same height as the upper surface of the semiconductor chip 3, and terminal plates 41, 42,
43 is buried, and these terminal plates 41 to 43 and the semiconductor chip 3 are connected by bonding wires 32. Then, the lower container 11 is placed on the inner wall surface near the terminal plate 41.
A pressure introducing hole 15 penetrating downward is opened, and atmospheric pressure is introduced into the closed case 1.

【0014】上記半導体チップ3の表面はシリコンゲル
33で覆ってあり、また、各端子板41〜43の端部は
それぞれ下側容器11外へ延出して外部端子411,4
21,431となっている。
The surface of the semiconductor chip 3 is covered with a silicon gel 33, and the ends of the terminal plates 41 to 43 extend to the outside of the lower container 11 so that the external terminals 411, 4
21,431.

【0015】上記構造の圧力センサにおいて、大気圧と
真空の差に応じて半導体チップ3のダイヤフラム部31
が変形し、大気の絶対圧に応じた出力信号が外部端子4
11〜431間に得られる。
In the pressure sensor having the above-described structure, the diaphragm 31 of the semiconductor chip 3 depends on the difference between the atmospheric pressure and the vacuum.
Is deformed and the output signal corresponding to the absolute pressure of the atmosphere is
Between 11 and 431.

【0016】圧力導入孔15は厚肉の下側容器11外周
部に形成してあるから充分な長さが確保され、これを経
て閉鎖ケース1内に汚染物質や水等が侵入することは効
果的に防止される。また、たとえ侵入しても、汚染物質
等は圧力導入孔15の開口に対向する蓋体12の内壁面
14に付着し、半導体チップ3上には殆ど到達しない。
Since the pressure introducing hole 15 is formed in the outer peripheral portion of the thick lower container 11, a sufficient length is secured, and it is effective that contaminants, water, and the like enter the closed case 1 through this. Is prevented. Even if it enters, the contaminants and the like adhere to the inner wall surface 14 of the lid 12 facing the opening of the pressure introducing hole 15 and hardly reach the semiconductor chip 3.

【0017】また、外光も、長い圧力導入孔15で閉鎖
ケース1内への直接入射が防止されるとともに、たとえ
ケース1内に入射しても、蓋体12の内壁面14でいっ
たん反射して弱められるから、半導体チップ3に到達し
てもセンサ機能を損なうことはない。
Also, external light is prevented from directly entering the closed case 1 by the long pressure introducing hole 15, and even if it enters the case 1, the external light is once reflected by the inner wall surface 14 of the lid 12. The sensor function is not impaired even when the semiconductor chip 3 is reached.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施形態を示すセンサの全体断面図で
ある。
FIG. 1 is an overall sectional view of a sensor showing an embodiment of the present invention.

【図2】センサの部分破断平面図である。FIG. 2 is a partially broken plan view of a sensor.

【図3】従来例を示すセンサの概略断面図である。FIG. 3 is a schematic sectional view of a sensor showing a conventional example.

【符号の説明】[Explanation of symbols]

1…閉鎖ケース、2…台座、3…半導体チップ、13…
内壁面、15…圧力導入孔
DESCRIPTION OF SYMBOLS 1 ... Closed case, 2 ... Pedestal, 3 ... Semiconductor chip, 13 ...
Inner wall, 15… Pressure introduction hole

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 薄肉のダイヤフラム部の上面に歪みゲー
ジを有する矩形状の半導体チップと、この半導体チップ
が固定されて上記ダイヤフラム部の下面との間に密閉空
間を形成する台座と、この台座を配置固定するための領
域を設けた内壁面を有する閉鎖空間を有する閉鎖ケース
とを備え、 前記閉鎖ケース内の内壁面において、上記台座配置領域
は凹部となっており、この凹部に前記台座が設置される
ことで、前記凹部周辺の前記内壁面と前記半導体チップ
との水平高さがほぼ同一となるものであり、この凹部周
辺の前記内壁面上であって前記半導体チップの矩形の対
向する2辺に隣接した2つの電極領域において、半導体
チップとボンディングワイヤにて電気接続する電極部が
形成され、 上記内壁面の上記台座配置領域と異なる領域に上記閉鎖
ケースを唯一貫通して上記圧力導入孔が形成され、当該
圧力導入孔の開口が上記半導体チップの上記歪みゲージ
を有する面が向く方向と同じ方向を向きかつ上記閉鎖空
間内の上記内壁面に対向するように配置され、また、こ
の圧力導入孔の開口が前記電極領域において前記半導体
チップの矩形の前記2辺のうちの1辺と前記電極部とに
隣接することを特徴とする半導体圧力センサ。
1. A rectangular semiconductor chip having a strain gauge on an upper surface of a thin diaphragm portion, a pedestal to which the semiconductor chip is fixed to form a sealed space between the lower surface of the diaphragm portion, and a pedestal. A closed case having a closed space having an inner wall surface provided with an area for arranging and fixing, wherein the pedestal arrangement area is a concave portion on the inner wall surface in the closed case, and the pedestal is installed in the concave portion. As a result, the horizontal height between the inner wall surface around the concave portion and the semiconductor chip is substantially the same, and the rectangular opposite surface of the semiconductor chip is located on the inner wall surface around the concave portion. In two electrode regions adjacent to the side, an electrode portion electrically connected to the semiconductor chip by a bonding wire is formed, and the electrode portion is formed in a region of the inner wall surface different from the pedestal arrangement region. The pressure introducing hole is formed only through the chain case, and the opening of the pressure introducing hole faces in the same direction as the direction of the surface of the semiconductor chip having the strain gauge and on the inner wall surface in the closed space. A semiconductor pressure sensor arranged so as to face each other, wherein an opening of the pressure introducing hole is adjacent to one of the two sides of the rectangle of the semiconductor chip and the electrode portion in the electrode region. .
【請求項2】 前記圧力導入孔の開口は前記半導体チッ
プの矩形の前記1辺の延びる方向に前記電極部と共に並
べて配置されているものである請求項1に記載の半導体
圧力センサ。
2. The semiconductor pressure sensor according to claim 1, wherein the opening of the pressure introducing hole is arranged along with the electrode portion in a direction in which the one side of the rectangle of the semiconductor chip extends.
JP25750299A 1999-09-10 1999-09-10 Semiconductor pressure sensor Expired - Lifetime JP3233136B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25750299A JP3233136B2 (en) 1999-09-10 1999-09-10 Semiconductor pressure sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25750299A JP3233136B2 (en) 1999-09-10 1999-09-10 Semiconductor pressure sensor

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP4079178A Division JP3004119B2 (en) 1992-02-28 1992-02-28 Semiconductor pressure sensor

Publications (2)

Publication Number Publication Date
JP2000065663A JP2000065663A (en) 2000-03-03
JP3233136B2 true JP3233136B2 (en) 2001-11-26

Family

ID=17307194

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25750299A Expired - Lifetime JP3233136B2 (en) 1999-09-10 1999-09-10 Semiconductor pressure sensor

Country Status (1)

Country Link
JP (1) JP3233136B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI486566B (en) * 2012-02-27 2015-06-01 藤倉股份有限公司 Pressure sensor module

Also Published As

Publication number Publication date
JP2000065663A (en) 2000-03-03

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