JP3233243B2 - Wet process equipment - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a wet process apparatus for transporting and cleaning a glass substrate or the like used for a liquid crystal display panel by a transport system, and more particularly to rusting of a rotating mechanism such as a bearing portion, and The present invention relates to a wet process apparatus capable of preventing dust generated from a rotation mechanism from adhering to a glass substrate.

[0002]

2. Description of the Related Art For example, a glass substrate is used for a liquid crystal display panel. If a foreign substance such as dust adheres to the glass substrate, alignment unevenness of liquid crystal molecules, sealing failure, segment failure, and the like occur in the whole manufacturing process. Unexpected troubles such as a short circuit between the electrode and the common electrode may occur. Therefore, conventionally, the glass substrate is cleaned as needed before and after each manufacturing process of the liquid crystal display panel.

In this type of glass substrate cleaning apparatus, FIG.
As shown in the figure, the glass substrate carried into the cleaning line by the loader b from the direction of the arrow a passes through a neutral zone (not shown) provided to prevent the processing liquid from flowing out to the loader b, and the shower room. c, is sprayed with a processing liquid, for example, a detergent liquid in the shower room c, and is then cleaned with a brush in the brush cleaning room d, and then adhered to the surface in the liquid draining room e. Cutting is performed.
Thereafter, the glass substrate is carried into the jet cleaning chamber f,
Here, after being washed by the jet stream, the wafer is further dried in the drying room i through the shower room g and the ultrasonic cleaning room h, and finally carried out of the washing line by the unloader j. Note that a roller transfer device is used to transfer the glass substrate to each chamber in the cleaning line. In such a glass substrate cleaning apparatus, the combination can be appropriately changed as necessary. A transfer device using a rotating shaft for each chamber for transferring the glass substrate to each of these chambers is used.

[0004] By the way, the drive unit of the roller such as the motor and the coupling of the above-mentioned roller transfer device is disposed outside the washing tank or the like to prevent dust or the like from the drive unit from entering the washing tank. However, in order to install a long roller shaft rotatably in the washing tank, it is necessary to support at least both ends of the roller shaft by bearings or the like.
However, since these bearings are always provided in a humid washing tank, glass balls or ceramic bearings are adopted as rust prevention measures to prevent rust powder generated from the bearing part from scattering into the washing tank. Was. However, bearings made of glass balls or ceramics are not only expensive but also have poor durability, and rusting from parts made of materials other than glass and ceramics cannot be prevented. There is a problem that the powder scatters and adheres to the glass substrate.

[0005] In order to solve these problems, the applicant of the present invention disclosed in Japanese Patent Application No. Hei 5-15896, for example, a brush rotating shaft bearing mechanism having a suction port and a discharge port communicating with the bearing mechanism. Is surrounded by a casing formed with gas, and gas is introduced from the suction port and gas is discharged out of the treatment tank system from the discharge port, so that water droplets from the cleaning layer scatter to the bearing mechanism and from the bearing mechanism. A brush cleaning device for effectively suppressing adhesion of generated dust and the like to a cleaning glass substrate is provided.

[0006]

However, in the above-described brush cleaning apparatus disclosed in Japanese Utility Model Application No. Hei 5-15896, it is necessary to further provide a complicated mechanism around a bearing having a generally complicated mechanism. There is also room for improvement in terms of maintainability. Further, in the conventional brush cleaning device, a brush vertical mechanism for adjusting the position of the brush in the vertical direction is generally provided in the processing tank, and the dust generated by the operation of the vertical mechanism adheres to the glass substrate. there were. The above-described problem similarly occurs not only in the brush cleaning but also in a transport system used for other wet processing.

SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems of the prior art, and enhances the durability of a bearing mechanism and suppresses the adhesion of dust and the like to a glass substrate in a liquid crystal process without using a complicated mechanism. It is an object of the present invention to provide a wet process apparatus capable of performing the above-mentioned processes.

[0008]

SUMMARY OF THE INVENTION In order to solve the above-mentioned problems of the prior art, a wet processing apparatus according to the present invention comprises:
Means for providing an external chamber outside the wet atmosphere adjacent to the wet atmosphere, arranging the rotating shaft in the wet atmosphere, arranging the rotating mechanism in the external chamber provided outside the wet atmosphere, and exhausting the external chamber Is provided. In the wet process apparatus of the present invention, since the rotating shaft mechanism is provided in the external chamber provided outside the wet atmosphere, dust such as rust powder generated from the rotating mechanism can be prevented from adhering to the glass substrate, and the substrate can be cleaned. Can be performed with high accuracy.

Further, in the wet process apparatus of the present invention, since the exhaust means is provided in the external chamber to exhaust the dust generated from the rotating mechanism to the outside of the wet process apparatus, for example, the dust generated from the rotating mechanism is introduced into the wet process chamber. Adhesion to the glass substrate can be more effectively prevented, and there is no need to provide a complicated mechanism for exhaust around the rotating shaft mechanism such as a bearing having a generally complicated mechanism, and in terms of maintainability etc. Are better.

[0010]

In the wet processing apparatus of the present invention, for example, when a substrate to be cleaned is placed on the rotating shaft of the transport system, the substrate is transported in accordance with the rotation of the rotating shaft, and is moved in the wet processing chamber. It is cleaned by a cleaning means such as a rotating brush. Also, dust such as rust powder generated from the rotating shaft mechanism is exhausted by an exhaust means provided in the external chamber.
For example, the gas is exhausted out of the system of the wet process device.

[0011]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS As a preferred embodiment of a wet process apparatus according to the present invention, a brush cleaning apparatus for cleaning a conveyed liquid crystal glass substrate using a rotating brush will be described below. FIG. 1 is a longitudinal sectional view showing a brush cleaning device according to the present embodiment,
FIG. 2 is a side view of the brush cleaning device viewed from the direction A shown in FIG. 1, and FIG. 3 is an enlarged sectional view showing a bearing mechanism according to the embodiment.

Reference numeral 1 shown in FIG. 1 denotes a processing tank for cleaning (hereinafter also referred to as a cleaning tank), in which a roller transfer device for transferring a glass substrate is provided. When a glass substrate is inserted into a gap 30 formed by a transport shaft 2a and a transport shaft 2b provided as upper and lower rotating shafts, the roller transport device transfers the glass substrate to the transport shafts 2a and 2b.
Are sequentially transported along the transport path L (see FIG. 2) in conjunction with the rotation of. Steps 3a and 3b are attached to the transfer shafts 2a and 2b, respectively, and the glass substrate is transferred along the steps 3a and 3b. The transport shafts 2a and 2b pass through holes provided in covers 7 and 8 as first shield members constituting a part of the cleaning tank 1. Covers 7, 8 and frame 3
Bearing plates 2a and 2b are provided on bearing plates 6 and 9 located in outer chambers 32 and 34 formed by “0”.
In this brush cleaning apparatus, cleaning water is sprayed from a shower (not shown) provided in the cleaning tank 1 onto the glass substrate inserted into the gap 30, and the glass substrate rotates in contact with the upper and lower surfaces of the glass substrate. Brush 60a provided as follows,
60b cleans both sides of the glass substrate. The washing tank 1 and the outer chambers 32 and 34 are shielded by covers 7 and 8 so that washing water from a shower provided in the washing tank 1 or steam thereof is not scattered in the outer chambers 32 and 34. It is configured. The inside of the cleaning layer 1 is in a wet state because the cleaning water is sprayed,
2, 34 are not wet because they are shielded. In the present specification, the cleaning water and its vapor are referred to as a wet medium.

FIG. 3A is an enlarged view of the external chamber 32 in FIG. 1, and FIG. 3B is an enlarged view of the external chamber 34 in FIG. As shown in FIG. 3A, the bearing plate 9 is provided with bearing portions 20a and 20b of the transport shafts 2a and 2b, and the washing water that could not be shielded by the cover 7 is not transmitted to the bearing portions 20a and 20b. As described above, from the cover 7 toward the bearing plate 9,
a and 14b are attached to the transport shafts 2a and 2b, respectively, and then a shield plate 11 is provided. The shield plate 11 has a penetrating portion (hole) through which the transport shafts 2a and 2b pass.
Are formed. The draining plates 14a and 14b drop the washing water that has transmitted along the transport shafts 2a and 2b without being shielded by the cover 7 and has entered. Even if the washing water is transmitted from the draining plates 14a and 14b to the rotation mechanism side, the washing water from the washing tank 1 is almost completely removed because the shield plate 11 is provided in addition to the draining plates 14a and 14b. Transmission to the bearing portions 20a and 20b can be prevented. A helical gear 5 is attached to the leading end of the transport shaft 2b so as to mesh with the drive gear 4, and the transport shaft 2b rotates in conjunction with the rotation of the drive gear 4. When the transport shaft 2b rotates, the transport shaft 2a is rotated via gears 13a and 13b which are attached to the transport shafts 2a and 2b, respectively.
a rotates. In this embodiment, the bearing, the helical gear 5, the drive gear 4, and a brush shaft bearing bracket to be described later are widely referred to as a rotation mechanism. The frame 30 has an exhaust port 42 for exhausting dust or moist air generated from the bearings 20 a and 20 b in the outer chamber 32, and the bearings 22 a and 2 in the outer chamber 34.
Dust and moist air generated from 2b
An intake port 46 for inhaling through the intake port 4 is provided.

As shown in FIG. 3B, the bearing plate 6 is provided with bearing portions 22a and 22b for the transport shafts 2a and 2b. In order to remove the washing water that could not be shielded, in the direction from the cover 8 to the bearing plate 6, first, the draining plates 14a and 14b are attached to the transport shafts 2a and 2b, respectively, and then the seed plate 24 is provided. I have. The shield plate 24 has a penetrating portion through which the transport shafts 2a and 2b penetrate. The frame 30 is provided with an exhaust port 48 for exhausting dust, moist air, and the like generated from the bearings 22 a and 22 b in the outer chamber 34 into the outer chamber 32 through the conduit 44. The pipe 44 is not shielded by the shield mechanism, and is connected to the outside chamber 3 from the cleaning tank 1.
A discharge port 45 is provided for discharging the cleaning water that has entered the inside of the brush cleaning device outside the system.

[0015] Above the exhaust port 42 of the frame 30, FIG.
The exhaust means 41 is provided as shown in FIG. 3, and dust or moist air inside the external chamber 32 and the external chamber 34 are provided on the frame 30 by the suction force from the exhaust means 41 via the pipe 44. The exhaust gas is exhausted from the exhaust port 42 to the outside of the cleaning tank via an exhaust chamber 40 as an exhaust amount adjusting unit.

The exhaust chamber 40 is, for example, shown in FIG.
(A) and (B), circular holes 52a, 54a
Plates 52 and 54 each having a hole 52a and a hole 54a.
The gas is exhausted to the outside of the system of the cleaning tank through the hole 56 formed by a. The size of the hole 56 is adjusted by changing the relative position between the plate 52 and the plate 54, and the displacement can be adjusted by adjusting the size of the hole 56.

As described above, in the brush cleaning apparatus of this embodiment, the shield plate 24 is provided between the cleaning tank 1 and the bearings of the transport shafts 2a, 2b in addition to the covers 7, 8 and the draining plates 14a, 14b. Since the entire outer chambers 32 and 34 are exhausted, not only the bearings but also other rotating mechanisms can be placed in the outer chambers 32 and 34 outside the wet atmosphere. Therefore, there is no need to provide a complicated mechanism around the bearing unit to exhaust only the bearing unit, and it is possible to prevent dust generated from a rotating mechanism such as the bearing unit from entering the cleaning tank 1 and to prevent the dust from entering the cleaning tank 1. It is possible to suppress the washing water from being scattered to the bearing portion, and it is possible to increase the cleanliness of the glass substrate in the washing atmosphere. As a result, various problems such as uneven alignment of liquid crystal molecules caused by dust such as rust powder adhering to the glass substrate, poor sealing, or short circuit between the segment electrode and the common electrode can be effectively suppressed. Steel or stainless steel, which is more durable than glass balls and ceramics but is disadvantageous for rusting, can be used as the material of the bearing portion.

Next, a mechanism for vertically adjusting the position of the brush of the brush cleaning apparatus according to the present embodiment will be described. As shown in FIGS. 1 and 2, brush shafts 62 and 63 are provided at positions above and below the glass substrate transport path L, and brushes 60 and 61 are attached to the brush shafts 62 and 63. Bearing brackets 64a and 64b supporting the upper brush shaft 62 and bearing brackets 66a and 66b supporting the lower brush shaft 63 are located in the outer chambers 32 and 34, respectively. As a result, dust generated from the bearing brackets 64a, 64b, 66a, 66b hardly enters the cleaning tank 1 by the shield mechanism.
The cleanliness of the glass substrate in the cleaning atmosphere can be increased. As shown in FIGS. 1 and 2, the lower bearing grackets 66a, 66b are connected to joints 68a, 68b.
(Not shown) are connected to the support shafts 70a and 70b, and the tips of the support rods 70a and 70b are tapered surfaces 72.
a and 72b. Similarly, the upper bearing grackets 64a and 64b are connected to support shafts 70c and 70d (not shown) via joints 68c and 68d (not shown), and the tips of the support rods 70c and 70d are tapered. 72c and 72d (not shown). Support rod 70
As shown in FIGS. 3 (A) and 3 (B), non-contact type a to 70d are provided in order to maintain the suction force of the exhaust means 41 and prevent dust from flowing into the external chambers 32 and 34 from the outside. Labyrinth seal 71a, 71b and labyrinth seal 7
1c and 71d (not shown) are provided, respectively.

As shown in FIGS. 1 and 2, a roller 74b is positioned in contact with the tapered surface 72b, and the roller 74b is attached to a block 76b. The block 76b is attached to the LM rail 78 via a load ball, and the block 76b moves along the LM rail 78 according to the rotation of the handle 80, and
6b is connected to the block 76a by a connecting rod.
Move along the LM rail 78 in conjunction with the movement of the LM rail. When the rollers 74b, 74a move along the LM rail 78, the taper surfaces 72b, 74a move up and down with this movement, and the bearing brackets 66b, 66a move up and down as the taper surfaces 72a, 72b move up and down. Move in each direction. Therefore, by rotating the handle 80, the vertical position of the brush 61 can be adjusted, and the inclination of the tapered surfaces 72a, 72b and the movement of the rollers 74a, 74b due to the rotation of the handle 80 are appropriately set. This enables fine positioning of the brush 61 in the vertical direction.

Similarly, a roller 74d (not shown) is positioned in contact with the tapered surface 72d (not shown),
4b is attached to a block 76d (not shown). The block 76d is connected to the LM rail 7 via the load ball.
9 (not shown) and attached to block 76d
Moves along an LM rail 79 (not shown) in response to the rotation of a handle 81 (not shown), and a block 76c connected to the block 76d by a connecting rod moves in conjunction with the movement of the block 76d. Move along. When the rollers 74d and 74c move along the LM rail 79,
With this movement, the tapered surfaces 72d, 74c move up and down, and as the tapered surfaces 72d, 72c move up and down, the bearing brackets 66d and 66c also move up and down, respectively. Therefore, by rotating the handle 79, the vertical position of the brush 60 can be adjusted, and the inclination of the tapered surfaces 72d, 72c and the handle 8 can be adjusted.
By appropriately setting the movement of the rollers 74c and 74d by one rotation, the brush 60 can be finely positioned in the vertical direction.

At this time, the shield mechanism between the cleaning tank 1 and the outer chambers 32 and 34 needs to function also with respect to the vertical movement of the brush shafts 62 and 63. However, in the brush cleaning apparatus of this embodiment, For example, the cover 7 is shown in FIGS.
As shown in FIG. 3, covers 7a and 7b having notches 9a and 9b, respectively, through which the rotating shaft 2a penetrates in opposite directions, are overlapped, and the washing water from the washing tank 1
2 is suppressed. FIG. 6A shows a perspective view of the cover 7, and FIG. 6C shows a front view. The cover 8 is also provided with a shield mechanism similar to that shown in FIGS. Here, if the cover 7a and the cover 7b are arranged at a predetermined interval as shown in FIG.
The angle of incidence of the cleaning water necessary to pass through both the cutouts 9a and 9b formed in the covers 7a and 7b and enter the external chamber 32 is limited, and the cleaning water from the cleaning tank 1 is supplied to the external chamber 32. Scattering can be more effectively suppressed.

As a shield mechanism between the cleaning tank 1 and the outer chambers 32 and 34, for example, as shown in FIG. 7, an elastic body 10 such as rubber is provided in the upper tank 82 and the cleaning tank 1.
The elastic body 10 and the covers 7 and 8 are configured to slide so that the cleaning water in the cleaning tank 1 flows from the covers 7 and 8 and the upper tank 82 and the cleaning tank 1 into the outer chambers 32 and 34. Leakage may be prevented.

As described above, in the brush cleaning apparatus of this embodiment, the vertical position of the brush can be finely adjusted, and the mechanism for adjusting the vertical position of the brush is provided outside the cleaning tank 1. In addition, it is possible to effectively prevent dust and the like generated by the operation of this mechanism from adhering to the glass substrate of the cleaning tank 1. Further, in the brush cleaning apparatus of the present embodiment, the mechanism for adjusting the vertical position of the brush is provided outside the processing tank, so that the maintainability of this mechanism can be improved.

The brush cleaning device of the present embodiment is roughly divided into
As shown in FIGS. 1 and 5, the cleaning tank 1 as a lower tank, the frame 30 as an intermediate tank, and the cover 8 as an upper tank.
2 is combined. In this manner, the brush cleaning device having the three-tank structure can improve its maintainability.

Although the apparatus for cleaning a glass substrate for a liquid crystal display has been described as an embodiment of the wet processing apparatus of the present invention, the wet processing apparatus of the present invention can also be applied to an apparatus for cleaning a semiconductor substrate. Further, the wet process apparatus of the present invention can be applied to an apparatus for performing a dipping process, a coating apparatus for applying a color resist and a protective film, and the like, in addition to the cleaning apparatus. Also,
As the washing water, pure water or chemicals is used.
The exhaust port 42 of the external chamber 32 shown in FIG. 1 may be provided at the lower part of the frame 30 instead of at the upper part of the frame 30. Instead of exhausting the external chamber 34 through the pipe 44, exhaust ports for exhausting the system outside the cleaning device may be provided in the external chambers 32 and 34 independently. Further, an exhaust port 47 is provided at the drain port 45 without using the exhaust port 42 and the exhaust unit 41, and the like.
The humid air inside the external chambers 32 and 34 is exhausted by the exhaust port 4.
7 may be exhausted.

[0026]

According to the wet process apparatus of the present invention, rust from the rotating mechanism and dust generated from the rotating mechanism can be reduced without providing a complicated mechanism around the rotating mechanism connected to the rotating shaft. Adhesion to the substrate can be effectively suppressed. Moreover, since the rotating mechanism can be made of steel or stainless steel without using a special material such as glass or ceramic, the durability of the rotating mechanism can be enhanced. Further, according to the wet process apparatus of the present invention, it is possible to vertically position the rotating shaft on which the cleaning member is mounted by using the elevating means, and since these elevating means are provided outside the wet process chamber, the elevating means It is possible to effectively suppress the dust generated from the substrate from adhering to the substrate. Further, according to the wet process apparatus of the present invention, the maintainability of the lifting / lowering means and the rotating mechanism can be improved.

[Brief description of the drawings]

FIG. 1 is a longitudinal sectional view showing a brush cleaning device according to an embodiment of the present invention.

FIG. 2 is a side view showing a brush cleaning device according to one embodiment of the present invention.

FIG. 3 is an enlarged sectional view showing a bearing mechanism of the brush cleaning device according to one embodiment of the present invention.

FIG. 4A is a front view of an exhaust chamber provided in a brush cleaning device according to one embodiment of the present invention, and FIG.
FIG. 4 is a side view of an exhaust chamber.

FIG. 5 is a view for explaining a method of combining a cleaning tank and a frame constituting the brush cleaning apparatus according to one embodiment of the present invention.

FIG. 6A is a perspective view of a shield mechanism of a cover provided between a cleaning tank and an external chamber, FIG. 6B is a perspective view of another example of FIG. ) Is (A),
It is a front view of the cover shown in (B).

FIG. 7 is a view for explaining another example of the shield mechanism shown in FIG. 6;

FIG. 8 is a process diagram showing a general cleaning line.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 ... Cleaning tank 2a, 2b ... Transport shaft 62a, 62b ... Brush shaft 3a, 3b ... Step 6, 9 ... Shield plate 7, 8 ... Cover 10 ... Elastic body 20a, 20b, 22a, 22b ... bearing part 30 ... frame 40 ... exhaust chamber 41 ... exhaust means 42, 48 ... exhaust port 44 ... conduit 46 ... intake port 52 , 54 ... plate 60a, 60b ... brush 64a, 64b ... bearing bracket 70a, 70b, 70c ... support shaft 72a, 72b, 72c ... tapered surface 74a, 74b, 74c ... roller 80 ... handle 82 ... cover

Claims (5)

(57) [Claims] An external chamber is provided outside the wet atmosphere adjacent to the wet atmosphere, a rotating shaft is provided in the wet atmosphere, and a rotating mechanism is provided in the external chamber provided outside the wet atmosphere. A wet process apparatus comprising means for exhausting a chamber. A first shield member forming a part of the external chamber; a liquid drop member attached to a part of the rotating shaft in the external chamber; and a liquid drop member and the rotation mechanism. The second that was placed between
2. The wet process apparatus according to claim 1, further comprising a shield means having a hole formed by said rotary member and penetrating said rotary shaft. 3. The wet process apparatus according to claim 1, wherein said exhaust means has an exhaust amount adjusting unit. 4. A rotating means for raising and lowering the rotary shaft on which the rotary cleaning member is mounted to adjust the height of the rotary cleaning member is provided outside the wet atmosphere, and the shield means is provided in a vertical direction of the rotary shaft. The wet processing apparatus according to any one of claims 1 to 3, wherein the wet medium is configured to seal a wet medium that enters the external chamber from within the wet atmosphere even when the position changes. 5. The wet atmosphere is defined using a lower layer, an intermediate tank, and an upper tank, and the outer chamber forms an intermediate tank connecting the lower tank and the upper tank, and the upper tank and the intermediate tank are connected to each other. The wet process apparatus according to any one of claims 1 to 4, wherein the apparatus is configured to be capable of being divided into a lower layer and a lower layer.