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JP3243862B2 - Oxide-based conductive ceramic flake, method for producing the same, and lead storage battery using the same - Google Patents
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JP3243862B2 - Oxide-based conductive ceramic flake, method for producing the same, and lead storage battery using the same - Google Patents

Oxide-based conductive ceramic flake, method for producing the same, and lead storage battery using the same

Info

Publication number
JP3243862B2
JP3243862B2 JP33428292A JP33428292A JP3243862B2 JP 3243862 B2 JP3243862 B2 JP 3243862B2 JP 33428292 A JP33428292 A JP 33428292A JP 33428292 A JP33428292 A JP 33428292A JP 3243862 B2 JP3243862 B2 JP 3243862B2
Authority
JP
Japan
Prior art keywords
oxide
conductive ceramic
flake
flakes
based conductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP33428292A
Other languages
Japanese (ja)
Other versions
JPH06187820A (en
Inventor
徹 山本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Corp, Matsushita Electric Industrial Co Ltd filed Critical Panasonic Corp
Priority to JP33428292A priority Critical patent/JP3243862B2/en
Publication of JPH06187820A publication Critical patent/JPH06187820A/en
Application granted granted Critical
Publication of JP3243862B2 publication Critical patent/JP3243862B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10Energy storage using batteries

Landscapes

  • Conductive Materials (AREA)
  • Non-Insulated Conductors (AREA)
  • Battery Electrode And Active Subsutance (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は電池の活物質添加剤や帯
電防止および電磁波シールドタイプのハウジング材の添
加剤および導電性ペースト用フィラーとして用いる酸化
物系導電性セラミックスフレークおよびその製造方法と
その応用に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an oxide-based conductive ceramic flake used as an active material additive for a battery, an additive for a housing material of an antistatic and electromagnetic wave shielding type and a filler for a conductive paste, and a method for producing the same. It is about application.

【0002】[0002]

【従来の技術】従来、導電性セラミックスは液晶ディス
プレイや透明タッチパネル等の透明電極としてITO
(酸化インジウムに錫をドープさせたもの)膜などの薄
膜が多く用いられている。その作製法はスパッター法や
電子ビーム(EB)法などの物理的蒸着法(PVD法)
で膜厚は0.数μm程度の均一膜のみであった。また、
フレーク状のセラミックスとしては天然物としてマイカ
やタルクや鱗片状黒鉛が古くから知られている。
2. Description of the Related Art Conventionally, conductive ceramics have been used as transparent electrodes in liquid crystal displays, transparent touch panels and the like as ITO.
Thin films such as (indium oxide doped with tin) films are widely used. The manufacturing method is a physical vapor deposition method (PVD method) such as a sputtering method or an electron beam (EB) method.
And the film thickness is 0. Only a uniform film of about several μm was found. Also,
As flake-like ceramics, mica, talc, and flaky graphite have been known for a long time as natural products.

【0003】一方、ハウジング材等で導電性を必要とす
るものに対しては樹脂に金属や鱗片状黒鉛や炭素繊維を
フィラーとして混入したものや表面を金属メッキしたも
のが主に用いられてきたが、近年機械的強度、耐腐食性
および耐熱性に優れた導電性フィラーとしてガラスフレ
ークやガラス繊維上にITOを塗着したものが作製され
だした。
[0003] On the other hand, for housing materials and the like that require conductivity, resin materials in which metal, flaky graphite or carbon fibers are mixed as fillers, or materials whose surfaces are metal-plated, have been mainly used. However, in recent years, glass flakes or glass fibers coated with ITO have been produced as conductive fillers having excellent mechanical strength, corrosion resistance and heat resistance.

【0004】これら導電性フィラーの応用分野として
は、例えば電池分野においては導電性材料を活物質に添
加することで集電効果の向上や不動態化の防止により活
物質の利用率を上げ高エネルギー密度、長寿命化をはか
ったり、電磁波シールドタイプのハウジング材では金属
繊維を樹脂中に混合したり、表面を金属メッキしたりし
ていた。また、導電性ペーストではエポキシ樹脂をバイ
ンダーとして銀粉やカーボンなどを混合したものが主に
用いられてきた(近藤弘;機能材料1991年8月号v
ol.11,No.8,p19 、特開昭61−195
178号)。
[0004] As an application field of these conductive fillers, for example, in the field of batteries, by adding a conductive material to an active material, the current collecting effect is improved and the passivation is prevented, thereby increasing the utilization rate of the active material and increasing the energy consumption. In order to increase the density and extend the service life, in the case of an electromagnetic shielding type housing material, metal fibers are mixed in a resin, or the surface is metal-plated. As the conductive paste, a mixture of silver powder, carbon, or the like using an epoxy resin as a binder has been mainly used (Hiroshi Kondo; Functional Materials August 1991, v.
ol. 11, No. 8, p19, JP-A-61-195
178).

【0005】[0005]

【発明が解決しようとする課題】これら導電性フィラー
としてガラス上に導電性セラミックスを塗着させたタイ
プのものではなくて完全に導電性セラミックスだけのフ
ィラーが今まで用いられてこなかったのは、導電性セラ
ミックスで繊維状やフレーク状のものが低コストで容易
に得られなかったためである。酸化亜鉛や酸化銅のよう
な限られたものに関してはホイスカで得られているが、
導電性が低く上記目的には使用できない。酸化物系以外
では炭素繊維や前述の鱗片状黒鉛などがあるが、黒色で
あるため用途が限定され、また表面の濡れ性が悪く樹脂
に混合した際、強度や導電性が計算値ほどは改善されな
い欠点を有していた。
The only reason that fillers made of conductive ceramics have not been used as such conductive fillers, not of the type in which conductive ceramics are coated on glass, has been used. This is because fibrous or flake conductive ceramics could not be easily obtained at low cost. Some of the limited ones, such as zinc oxide and copper oxide, are obtained from whiskers,
It has low conductivity and cannot be used for the above purpose. Other than the oxide type, there are carbon fibers and the above-mentioned flaky graphite, etc., but their use is limited because they are black, and when mixed with resin due to poor surface wettability, the strength and conductivity are improved as calculated values. Had disadvantages which were not.

【0006】導電性フィラーの応用分野を考えてみると
電池分野では電池の活物質添加剤として高エネルギー密
度、長寿命等の電池特性の向上に導電性物質を加えるこ
とが有効といわれているが、電解液が強酸や強アルカリ
であるため金属フィラーでは腐食する欠点がある。そこ
で従来の鉛蓄電池の場合では活物質にガラスフレーク上
に酸化錫を蒸着したフィラーを添加したものや負極活物
質への炭素繊維の添加などの導電性物質の添加がなされ
てきた。
Considering the application field of the conductive filler, it is said that in the field of batteries, it is effective to add a conductive material as an active material additive for batteries to improve battery characteristics such as high energy density and long life. In addition, since the electrolytic solution is a strong acid or strong alkali, there is a disadvantage that the metal filler corrodes. Therefore, in the case of a conventional lead storage battery, a conductive material such as a material obtained by adding a filler obtained by depositing tin oxide on glass flakes to an active material or a carbon fiber to a negative electrode active material has been added.

【0007】しかし、活物質中にガラスフレーク上に酸
化錫を蒸着したフィラーを添加した場合はガラス分の重
量増加は活物質の利用率の低下、重量当たりのエネルギ
ー密度(Wh/kg)の低下につながる欠点を有してい
た(特開昭60−1758号)。
However, when a filler obtained by depositing tin oxide on glass flakes is added to the active material, an increase in the weight of the glass decreases the utilization rate of the active material and the energy density per weight (Wh / kg). (JP-A-60-1758).

【0008】一方、炭素繊維のような炭素骨格を有する
ものは負極には有効であるが、正極への添加は陽極酸化
され、消失する欠点があり、電池特性の大幅な向上が期
待できない(北条英次ほか;湯浅時報 No.72 APRIL P2
3-28(1992)、特開昭48−101523号)。
On the other hand, those having a carbon skeleton such as carbon fiber are effective for the negative electrode, but have the drawback of being anodized and disappearing when added to the positive electrode, so that a significant improvement in battery characteristics cannot be expected (Hojo). Eiji et al .; Yuasa Hourly Report No.72 APRIL P2
3-28 (1992), JP-A-48-101523).

【0009】一方、コンピューター等のハウジング材の
場合は帯電防止や電磁波シールドのために樹脂中に導電
性を有する金属フィラーを添加したり、内側を金属メッ
キしたりしているが、外観(色)的な制約を受けたり、
コストが高くついたりする欠点がある。
On the other hand, in the case of a housing material for a computer or the like, a conductive metal filler is added to a resin or a metal plating is applied to the inside of the resin for antistatic and electromagnetic wave shielding. Restrictions,
There is a disadvantage that the cost is high.

【0010】導電性ペーストに関してはエポキシ樹脂中
に銀や金などの粒子あるいは黒鉛などのフィラーを分散
させたものが主流であるが、金属フィラーの場合はマイ
グレーションや腐食を生じ易く、一方黒鉛の場合は導電
性が低く、バインダーとの濡れ性も悪く接着強度がやや
弱くなる欠点を持つ(近藤弘;機能材料1991年8月
号vol.11,No.8,p19 、特開昭61−1
95178号)。
As for the conductive paste, the mainstream is one in which particles such as silver or gold or filler such as graphite are dispersed in an epoxy resin. However, in the case of a metal filler, migration or corrosion is liable to occur. Has low conductivity, poor wettability with a binder, and has a weakened adhesive strength (Hiroshi Kondo; Functional Materials, August 1991, Vol. 11, No. 8, p19, JP-A-61-1).
95178).

【0011】本発明は上記課題を解決するものであり、
低比抵抗で耐薬品性に優れ腐食やマイグレーションを起
こさずさらに機械的強度も高く、濡れ性にも優れた酸化
物系導電性セラミックスフレークおよびその製造方法を
提供することを目的としている。
The present invention has been made to solve the above problems, and
It is an object of the present invention to provide an oxide-based conductive ceramic flake having low specific resistance, excellent chemical resistance, not causing corrosion or migration, high mechanical strength, and excellent wettability, and a method for producing the same.

【0012】[0012]

【課題を解決するための手段】本発明は上記目的を達成
するために、硬質基板に水溶性樹脂層を設け、その上に
酸化物系導電性セラミックス層を物理的蒸着法で形成し
た後、この基板を水中に浸漬し酸化物系導電性セラミッ
クスフレークを前記硬質基板から分離させ、ろ過し、そ
の後500℃以上の温度で1時間以上酸素中もしくは空
気中で焼成する。そのほか、硬質基板に熱分解性樹脂層
を設け、その上に酸化物系導電性セラミックス層を物理
的蒸着法で形成した後、この基板を空気中もしくは酸素
中で前記熱分解性樹脂の熱分解温度以上、硬質基板の熱
変形温度以下の温度で1時間以上加熱し、熱分解性樹脂
層を除去する。
In order to achieve the above object, the present invention provides a water-soluble resin layer on a hard substrate, and forms an oxide-based conductive ceramic layer thereon by physical vapor deposition. This substrate is immersed in water to separate the oxide-based conductive ceramic flakes from the hard substrate, filtered, and then fired at a temperature of 500 ° C. or more for one hour or more in oxygen or air. In addition, after providing a thermally decomposable resin layer on a hard substrate and forming an oxide-based conductive ceramics layer thereon by physical vapor deposition, the substrate is thermally decomposed in air or oxygen. Heating at a temperature not lower than the temperature and not higher than the heat deformation temperature of the hard substrate for not less than 1 hour to remove the thermally decomposable resin layer.

【0013】また、酸化物系導電性セラミックスフレー
クを活物質に添加剤として1〜8wt%混合した電池特
に鉛蓄電池である。
A battery, particularly a lead-acid battery, in which an oxide-based conductive ceramic flake is mixed with an active material in an amount of 1 to 8 wt% as an additive.

【0014】また、酸化物系導電性セラミックスフレー
クが10wt%以上混合されているハウジング材であ
る。特に透明で、比抵抗が9×10-4Ω・cm以下であ
るとよい。
[0014] The present invention is a housing material in which oxide-based conductive ceramic flakes are mixed in an amount of 10 wt% or more. In particular, the material is preferably transparent and has a specific resistance of 9 × 10 −4 Ω · cm or less.

【0015】また、酸化物系導電性セラミックスフレー
クであって、比抵抗が9×10-4Ω・cm以下のものを
添加した構成である。
[0015] Further, an oxide-based conductive ceramic flake having a specific resistance of 9 × 10 −4 Ω · cm or less is added.

【0016】[0016]

【作用】本発明は上記した構成により、ガラスのような
硬質基板上に樹脂層を設け、その上にスパッター法等の
PVD法でSnO2 のような酸化物系導電性セラミック
スを全面に一旦形成し、この後樹脂層を除去、同時もし
くはその後酸素(空気)中で高温焼成することで酸化物
系導電性セラミックスフレークを作製するものである。
従来からスパッターやEB蒸着法等のPVD法で薄膜形
成した場合、基板との接着性が悪い時には所々で薄膜の
剥離が生じた。この場合はスパッターやEB装置内に部
分的に剥がれ落下したり、又その大きさもばらばらであ
った。本発明の方法では蒸着時は樹脂層で製膜応力を緩
和できるため薄膜の付着強度が強く、水に浸漬したり、
樹脂層を燃やすことで膜厚が0.1μm〜数μmでフレ
ークの平均半径が約50μm以上(膜厚によって平均半
径は異なる)で比抵抗が10 -2Ω・cm程度以下である
酸化物系導電性セラミックスだけのフレークを基板全面
で完全に回収することができる。またPVD法で蒸着し
ただけでは酸素不足あるいは結晶化不足の膜となり、比
抵抗の小さな酸化膜にはならないため、後工程での酸素
もしくは空気中での焼成が重要となる。
According to the present invention, as described above, glass like
A resin layer is provided on a hard substrate, and a sputtering method
SnO by PVD methodTwo Oxide conductive ceramics such as
Is formed once on the entire surface, and then the resin layer is removed.
After that, firing at high temperature in oxygen (air)
This is for producing a system conductive ceramic flake.
Conventionally, thin film type by PVD method such as sputtering or EB evaporation method
If the adhesion to the substrate is poor,
Peeling occurred. In this case, the part should be
It peels off partly and falls, and its size is also different
Was. In the method of the present invention, the film forming stress is moderated by the resin layer during the vapor deposition.
The adhesive strength of the thin film is strong, so it can be immersed in water,
By burning the resin layer, the film thickness is 0.1 μm to several μm,
The average radius of the peak is about 50 μm or more
Diameter is different) and the specific resistance is 10 -2Ω · cm or less
Flakes of oxide-based conductive ceramics only
Can be completely recovered. Also, it is deposited by PVD method
If it is used alone, the film will be insufficient in oxygen or insufficient in crystallization.
Since it does not become an oxide film with low resistance, oxygen
Alternatively, firing in air is important.

【0017】膜厚としてはフレークの機械的強度および
生産性の点で0.1μm〜数μmが最適であり、フレー
クの平均半径としては補強効果や導電性の点から50μ
m以上が要求される。また、製造工程において基板は最
終的には初期状態で回収されるため樹脂層を再び塗布す
ることで繰り返し使用が可能であり、また製膜工程も一
般的なPVD法および蒸着条件(例えば基板温度は常温
で可)で作製できるため、製膜時間が短縮でき(基板加
熱が必要な場合は時間がかかる)酸化物系導電性セラミ
ックスフレークを低コストで作れる利点がある。
The film thickness is optimally 0.1 μm to several μm in view of the mechanical strength and productivity of the flake, and the average radius of the flake is 50 μm in view of the reinforcing effect and conductivity.
m or more is required. In the manufacturing process, the substrate is finally recovered in an initial state, so that the substrate can be repeatedly used by applying a resin layer again. In addition, the film forming process is performed by a general PVD method and evaporation conditions (for example, substrate temperature). Can be formed at room temperature), which has the advantage that the film-forming time can be shortened (it takes time if substrate heating is required), and the oxide-based conductive ceramic flake can be formed at low cost.

【0018】その応用例としては、電池分野においては
活物質への添加剤として強酸や強アルカリに強く、かつ
10-2〜10-3Ω・cmの比抵抗を有し、補強効果もあ
る導電性セラミックスフレークを1〜8wt%以下添加
することで放電時に生成される硫酸鉛が鉛(負極)や二
酸化鉛(正極)上を被覆し活物質を不動態化しても、充
電時においては導電性セラミックスフレーク上を電流が
流れるためほぼ完全に硫酸鉛を鉛や二酸化鉛に再生で
き、サイクル寿命を大きく延ばすことができる。また、
活物質が導電性セラミックスフレークに絡まれているた
め放電時の電流の取り出しも容易となり、高エネルギー
密度も可能となる。従来のガラスフレーク上に導電性セ
ラミックスを形成したものに比べ、添加剤の重量効率に
優れ、高エネルギー密度化の効果が大きい。導電性セラ
ミックスフレークの比抵抗としては鋭意検討した結果1
-2〜10-3Ω・cm(二酸化鉛は10-4Ω・cm)で
十分利用率の向上が計れることがわかった。また比抵抗
を下げるためにアンチモン(Sb)等をドープさせたも
のは高率放電特性および高容量化に対しては有効である
が、サイクル寿命にはSbが負極側に析出し、水素過電
圧をさげるため不利となった。
As an application example, in the field of batteries, a conductive material which is resistant to strong acids and strong alkalis as an additive to an active material, has a specific resistance of 10 -2 to 10 -3 Ω · cm, and has a reinforcing effect. Even if lead sulphate generated at the time of discharge by adding 1 to 8 wt% or less of conductive ceramic flakes covers lead (negative electrode) or lead dioxide (positive electrode) and passivates the active material, it remains conductive during charging. Since current flows on the ceramic flakes, lead sulfate can be almost completely regenerated into lead or lead dioxide, and the cycle life can be greatly extended. Also,
Since the active material is entangled with the conductive ceramic flakes, it is easy to take out a current at the time of discharge, and a high energy density is possible. Compared to conventional glass flakes formed of conductive ceramics, the additive has excellent weight efficiency and a large effect of increasing energy density. As a result of intensive studies on the specific resistance of conductive ceramic flakes, 1
It has been found that the utilization factor can be sufficiently improved at 0 -2 to 10 -3 Ω · cm (10 -4 Ω · cm for lead dioxide). Further, those doped with antimony (Sb) or the like to lower the specific resistance are effective for high-rate discharge characteristics and high capacity, but Sb precipitates on the negative electrode side during the cycle life, and the hydrogen overvoltage is reduced. It was disadvantageous to offer it.

【0019】コンピューター用筐体などの帯電防止や電
磁波シールドタイプのハウジング材に対してフィラーと
して比抵抗が10-4Ω・cm以下の導電性セラミックス
フレークを10wt%以上混合することで帯電防止およ
び電磁波シールドが可能となり、さらに透明な酸化物系
セラミックスを用いることでハウジング材の色(透明を
含む)を自由に選べる利点および機械的強度においても
酸化物系導電性セラミックスフレークが高弾性率である
ため大幅な向上が可能となる。
Antistatic and electromagnetic waves can be obtained by mixing 10 wt% or more of conductive ceramic flakes having a specific resistance of 10 −4 Ω · cm or less as a filler in antistatic or electromagnetic shielding type housing materials such as computer housings. Shielding is possible, and the advantage of using transparent oxide ceramics is that the color (including transparency) of the housing material can be freely selected, and the oxide conductive ceramic flakes have high elasticity in terms of mechanical strength. Significant improvement is possible.

【0020】また、導電性ペーストにおいては比抵抗が
10-4Ω・cm以下のITOなどの導電性セラミックス
フレークを充填可能な限り(約30vol%)バインダ
ーに混合することで銀ペーストや金ペーストのようにマ
イグレーションを起こすことのない安定した導電性ペー
ストが、また安定なカーボン系ペーストよりは低抵抗の
ペーストが得られる。
In the conductive paste, a conductive ceramic flake such as ITO having a specific resistance of 10 −4 Ω · cm or less is mixed with a binder as much as possible (about 30 vol%) to form a silver paste or a gold paste. Thus, a stable conductive paste that does not cause migration and a paste having lower resistance than a stable carbon-based paste can be obtained.

【0021】[0021]

【実施例】以下に本発明の一実施例について図面を参照
しながら説明する。
An embodiment of the present invention will be described below with reference to the drawings.

【0022】(実施例1)図1は第一の実施例における
SnO2 フレークの製造工程図である。図中11はガラ
ス基板、12はポリビニルアルコール、13は水、14
はSnO2 フレークである。以下各工程について説明す
る。ガラス基板11上にポリビニルアルコールPVA1
2(デンカ製デンカポバールB−05)の5wt%水溶
液を塗布、スピンコートし、ガラス上にPVAの樹脂層
(膜厚0.4 μm)を形成した。
(Example 1) FIG. 1 is a manufacturing process diagram of SnO 2 flakes in a first example. In the figure, 11 is a glass substrate, 12 is polyvinyl alcohol, 13 is water, 14
Is SnO 2 flake. Hereinafter, each step will be described. Polyvinyl alcohol PVA1 on glass substrate 11
2 (Denka Poval B-05) was applied and spin-coated to form a PVA resin layer (0.4 μm thick) on the glass.

【0023】次に、このPVAの樹脂層が形成されたガ
ラス基板をEB装置に装着し、SnO2 を蒸着した。蒸
着条件は到達真空度が3×10-4Pa、基板温度は常
温、蒸着速度は400Å/分で30分間蒸着を行った。
Next, the glass substrate on which the PVA resin layer was formed was mounted on an EB apparatus, and SnO 2 was deposited. The deposition conditions were as follows: ultimate vacuum degree was 3 × 10 −4 Pa, substrate temperature was normal temperature, and deposition rate was 400 ° / min for 30 minutes.

【0024】次に、この基板を50℃程度の温水中に浸
漬した。PVA樹脂が直ちに温水に溶け出しフレーク状
の導電性セラミックスがガラス基板全面から完全に分離
した。この後SnO2 フレークを含んだ液を吸引ろ過
し、SnO2 フレークを回収した。
Next, the substrate was immersed in warm water of about 50 ° C. The PVA resin immediately dissolved in the warm water and the flake-shaped conductive ceramic was completely separated from the entire surface of the glass substrate. Thereafter, the liquid containing SnO 2 flakes was subjected to suction filtration to collect SnO 2 flakes.

【0025】次に、この回収したフレークを空気雰囲気
でマッフル炉によって550℃、90分間焼成し低比抵
抗のSnO2 フレーク14を得た。焼成を行わなかった
ものは分子中に酸素が不足しSnOに近い状態で硫酸に
溶解し、比抵抗も大きかった。このSnO2 フレークは
膜厚が1.2μm、平均半径が800μmの板状で比抵
抗は4×10-2Ω・cmであった。
Next, the recovered flakes were fired in a muffle furnace at 550 ° C. for 90 minutes in an air atmosphere to obtain SnO 2 flakes 14 having low specific resistance. Those that were not fired lacked oxygen in the molecule and dissolved in sulfuric acid in a state close to SnO, and had a high specific resistance. This SnO 2 flake had a plate shape with a thickness of 1.2 μm and an average radius of 800 μm and a specific resistance of 4 × 10 −2 Ω · cm.

【0026】次に、このSnO2 フレークを用いて鉛蓄
電池を作製した。鉛粉100重量部に対し上記SnO2
フレークを2重量部添加し、常法に従い水と希硫酸を滴
下しながら練合し、これをPb−Ca−Sn合金からな
る格子に充填した後、熟成、乾燥の工程を経て正極未化
成板を作製した。負極には鉛粉にリグニン及び硫酸バリ
ウムを少量添加し、水と希硫酸を滴下、練合し、Pb−
Ca合金格子に充填した後、熟成、乾燥させた標準的負
極未化成板を得た。
Next, a lead-acid battery was manufactured using the SnO 2 flakes. The above SnO 2 per 100 parts by weight of lead powder
After adding 2 parts by weight of flakes and kneading while dripping water and dilute sulfuric acid according to a conventional method, filling this into a grid made of a Pb-Ca-Sn alloy, passing through aging and drying steps, a positive electrode unformed plate Was prepared. A small amount of lignin and barium sulfate was added to lead powder for the negative electrode, and water and dilute sulfuric acid were added dropwise and kneaded to form Pb-
After filling in a Ca alloy lattice, an aged and dried standard negative electrode non-formed plate was obtained.

【0027】次にこの様にして作製した正極板5枚と負
極板6枚を用い、その間にガラス繊維からなるマット状
セパレータを介在させて組み合わせ、電解液として希硫
酸を含浸させて、電槽化成することで正極律速のシール
型鉛蓄電池の単セルを作製した。
Next, five positive electrode plates and six negative electrode plates manufactured in this manner were combined with a mat-shaped separator made of glass fiber interposed therebetween, and impregnated with dilute sulfuric acid as an electrolytic solution. The formation of a single cell of a sealed rate lead-acid storage battery with positive electrode rate control was performed by chemical formation.

【0028】比較のため従来の正極板と負極板をそれぞ
れ5枚と6枚用いた同体積、同重量である単セルシール
型鉛蓄電池も作製した。
For comparison, single-cell sealed lead-acid batteries of the same volume and weight using five and six conventional positive and negative plates, respectively, were also manufactured.

【0029】これら電池について0.1C充電、1/3
C放電の定電流充放電でサイクル試験を行い、各電池の
容量と充放電サイクル寿命を測定した。なお放電の終止
電圧は1.75V、充電電気量は放電電気量の115%
とし、また充放電サイクル寿命は容量が初期容量の80
%に達したサイクル数とした。
These batteries were charged at 0.1 C, 3
A cycle test was performed with constant current charge / discharge of C discharge, and the capacity and charge / discharge cycle life of each battery were measured. The discharge end voltage is 1.75 V, and the amount of charged electricity is 115% of the amount of discharged electricity.
And the charge / discharge cycle life is 80% of the initial capacity.
% Of the cycle.

【0030】その結果、電池容量は本実施例のもので4
0Ah、従来電池で32Ahであり、そのエネルギー密度は
本実施例のもので45Wh/kg、従来電池で36Wh
/kgであった。またサイクル寿命は本実施例のもので
約950サイクル、従来電池では約260サイクルであ
った。このようにSnO2 フレークを正極活物質に添加
することによって電池のエネルギー密度が従来のものと
比べ3割程度増加し、電池のサイクル寿命も大幅に向上
することが確認できた。図2にSnO2 フレークの混合
量と電池特性を示すが、1〜8wt%の範囲で従来正極
の電池よりもエネルギー密度、サイクル寿命とも優れて
いることがわかった。図3にSnO2 フレークの平均半
径とエネルギー密度の関係を示すが、フレークの平均半
径としては50μm以上であることが要求される。これ
はフレーク間の接触確率とフレーク周辺の活物質量との
バランスから決まるものと考えられる。なお、フレーク
の平均半径はフレークの膜厚と粉砕によって調整した。
最大平均半径としては2mm程度まで有効であった。一
方、膜厚についてはフレークの機械的強度の点から0.
1μm以上が要求され、生産性およびコストの点から数
μm以下が望ましい。これらのフレーク形状に対する要
求は他の応用分野においても同様であった。
As a result, the battery capacity of this embodiment was 4
The energy density is 0 Ah, 32 Ah for the conventional battery, and 45 Wh / kg for the present embodiment, and 36 Wh / kg for the conventional battery.
/ Kg. The cycle life of this embodiment was about 950 cycles, and that of the conventional battery was about 260 cycles. Thus, it was confirmed that by adding SnO 2 flakes to the positive electrode active material, the energy density of the battery was increased by about 30% as compared with the conventional one, and the cycle life of the battery was significantly improved. FIG. 2 shows the amount of SnO 2 flake mixed and the battery characteristics. It was found that the energy density and the cycle life were superior to those of the conventional positive electrode battery in the range of 1 to 8 wt%. FIG. 3 shows the relationship between the average radius of the SnO 2 flake and the energy density. The average radius of the flake is required to be 50 μm or more. This is considered to be determined by the balance between the contact probability between flakes and the amount of active material around the flakes. The average radius of the flakes was adjusted by the flake thickness and pulverization.
The maximum average radius was effective up to about 2 mm. On the other hand, the thickness of the film is 0.1 mm in view of the mechanical strength of the flake.
1 μm or more is required, and several μm or less is desirable in terms of productivity and cost. The requirements for these flake shapes were similar in other applications.

【0031】このSnO2 フレークの比抵抗はPbO2
に比べ1桁以上も低かったが、集電能力やPbSO4
よる不動態化を防ぐには十分であると考えられる。同様
の効果は負極活物質への添加においても認められた。ま
たニカド電池、ニッケル水素電池およびリチウム電池な
どの他の電池系への添加においても有効と思われる。
The specific resistance of this SnO 2 flake is PbO 2
Although it was lower by one order of magnitude or more, it is considered to be sufficient to prevent the passivation due to the current collecting ability and PbSO 4 . A similar effect was observed in addition to the negative electrode active material. It is also considered effective in addition to other battery systems such as nickel-cadmium batteries, nickel-metal hydride batteries, and lithium batteries.

【0032】なお、水溶性樹脂としてはPVA以外にニ
トロセルロース、デンプン、グリコゲン、イヌリンやフ
タロシアニン等の色素が有効であった。
As the water-soluble resin, pigments such as nitrocellulose, starch, glycogen, inulin and phthalocyanine were effective in addition to PVA.

【0033】また、SnO2 にSbを0.5wt%程度
ドープさせたフレークでは比抵抗が10-4Ω・cm程度
と低くなり、高エネルギー密度となったが反面サイクル
寿命は若干短くなった。
The flake obtained by doping SnO 2 with Sb at about 0.5 wt% has a low specific resistance of about 10 −4 Ω · cm, and has a high energy density, but its cycle life is slightly shortened.

【0034】(実施例2)以下に本発明の第二の実施例
について図面を参照しながら説明する。図4は第二の実
施例におけるITOフレークの製造工程図である。図中
21は石英基板、22はポリスチレン、23はアセト
ン、24はITOフレークである。
(Embodiment 2) A second embodiment of the present invention will be described below with reference to the drawings. FIG. 4 is a manufacturing process diagram of the ITO flake in the second embodiment. In the figure, 21 is a quartz substrate, 22 is polystyrene, 23 is acetone, and 24 is ITO flake.

【0035】以下各工程について説明する。石英基板2
1上にポリスチレンPS22の5wt%アセトン23溶
液を塗布、スピンコートし、石英基板上にPSの樹脂層
(膜厚0.2μm)を形成した。
Hereinafter, each step will be described. Quartz substrate 2
1 was coated with a 5 wt% acetone 23 solution of polystyrene PS22 and spin-coated to form a PS resin layer (film thickness 0.2 μm) on a quartz substrate.

【0036】次に、このPS層を形成した基板をスパッ
ター装置に装着し、酸化インジウムに錫を8%混合した
ターゲットを用いて、PS層上にスパッターを行った。
スパッター条件は到達真空度が2×10-4Pa、アルゴ
ンガス圧は0.5Pa、基板は水冷し、スパッター速度
70Å/分で20分間スパッターを行った。
Next, the substrate on which the PS layer was formed was mounted on a sputtering apparatus, and sputtering was performed on the PS layer using a target in which tin was mixed with indium oxide at 8%.
Sputtering conditions were as follows: ultimate vacuum was 2 × 10 −4 Pa, argon gas pressure was 0.5 Pa, the substrate was water-cooled, and sputtering was performed at a sputtering rate of 70 ° / min for 20 minutes.

【0037】次に、この基板を酸素雰囲気でトンネル炉
(600℃、60分)を通し、PS層を消失させ、同時
にITOの結晶化を行った。
Next, the substrate was passed through a tunnel furnace (600 ° C., 60 minutes) in an oxygen atmosphere to eliminate the PS layer and simultaneously crystallize ITO.

【0038】この様にしてできたITOフレーク24は
膜厚が0.14μm、平均半径が200μm程度の板状
で比抵抗は1.2×10-4Ω・cmであった。
The ITO flakes 24 thus formed were plate-like with a thickness of 0.14 μm and an average radius of about 200 μm, and had a specific resistance of 1.2 × 10 −4 Ω · cm.

【0039】次に、このITOフレークを用いてパーソ
ナル・コンピューター(PC)用の筐体を作製した。ま
ず、ポリカーボネートペレット85重量部に対して前記
ITOフレークを15重量部添加し、よく混合した後ホ
ッパーより2軸混練押出機に投入し、ペレタイザーを用
い一旦マスターペレットを作製した。次に、このマスタ
ーペレットを用い射出成型機によりPC用筐体を作製し
た。
Next, a housing for a personal computer (PC) was manufactured using the ITO flake. First, 15 parts by weight of the ITO flake was added to 85 parts by weight of the polycarbonate pellets, mixed well, and then charged into a twin-screw kneading extruder from a hopper, and once a master pellet was prepared using a pelletizer. Next, a PC housing was produced using the master pellet by an injection molding machine.

【0040】この様にして作製したPC用筐体は透明で
かつ導電性および機械的強度が高く、帯電防止および電
磁波シールド効果は実用に差し支えないものであった。
これらの効果を持たせるには9×10-4Ω・cm以下の
比抵抗の導電性セラミックスフレークを10wt%以上
混合すれば良いことがわかった。従来のPC筐体では一
般樹脂(例えば、ABS)を成型後、内側にメッキした
り、樹脂中に金属繊維を混合したりしていたため、透明
感のあるものは得られなかったし、コストも高くつい
た。本発明のフレークの使用によりデザインの幅が大き
くなり、同一重量の金属繊維を混合するよりも高周波数
域でのシールド効果もはるかに大きく、ほぼ片面メッキ
と同等の性能となった。これは筐体の面(壁)に対して
導電性セラミックスフレークが平行に配向しているため
と考えられる。これにより大幅なコストダウンが可能に
なった。
The thus-produced PC housing was transparent, had high conductivity and high mechanical strength, and had an antistatic effect and an electromagnetic wave shielding effect that could be put to practical use.
It has been found that these effects can be provided by mixing conductive ceramic flakes having a specific resistance of 9 × 10 −4 Ω · cm or less by 10 wt% or more. In a conventional PC housing, after molding a general resin (for example, ABS), the inside is plated or a metal fiber is mixed in the resin, so that a transparent material cannot be obtained and the cost is low. It was expensive. The use of the flakes of the present invention increased the width of the design, provided a much higher shielding effect in the high frequency range than the case where the same weight of metal fiber was mixed, and provided performance almost equivalent to that of single-sided plating. This is probably because the conductive ceramic flakes are oriented parallel to the surface (wall) of the housing. This has enabled a significant cost reduction.

【0041】図5にITOフレーク混合量とシールド効
果の関係を示すが、10wt%以上ITOフレークを混
合することで金属繊維並の効果の得られることがわかっ
た。ただし、混合量が40wt%以上になると溶融粘度
が上がりすぎ射出成型ができなくなった。
FIG. 5 shows the relationship between the amount of ITO flake mixed and the shielding effect. It has been found that the effect equivalent to that of metal fibers can be obtained by mixing ITO flake in an amount of 10 wt% or more. However, when the mixing amount was 40 wt% or more, the melt viscosity was too high, and injection molding was not possible.

【0042】なお、導電性セラミックスフレークの製造
工程で熱分解性樹脂としてはPS以外にもポリビニルア
ルコール等の水溶性樹脂あるいはα−メチルスチレン等
の有機溶剤可溶な樹脂が有効であった。
In the production process of the conductive ceramic flakes, as the thermally decomposable resin, a water-soluble resin such as polyvinyl alcohol or a resin soluble in an organic solvent such as α-methylstyrene was effective in addition to PS.

【0043】(実施例3)以下に第三の実施例について
図を参照しながら説明する。第一の実施例と同様にアル
ミナ基板上に1μmのPVA層を形成し、この上にEB
蒸着法で酸化モリブデンを0.2μm程度で蒸着した
(基板は常温)。次に、この基板を空気中で800℃6
0分間マッフル炉で焼成した。この様な工程によって膜
厚0.2μm、平均半径50μmの酸化モリブデンフレ
ークが得られた。これはMo25を主成分とした組成で
比抵抗は約8×10-5Ω・cmと低かった。
(Embodiment 3) A third embodiment will be described below with reference to the drawings. As in the first embodiment, a 1 μm PVA layer is formed on an alumina substrate, and EB is
Molybdenum oxide was deposited to a thickness of about 0.2 μm by a vapor deposition method (the substrate was at room temperature). Next, the substrate is heated at 800 ° C.
It was baked in a muffle furnace for 0 minutes. Through these steps, molybdenum oxide flakes having a thickness of 0.2 μm and an average radius of 50 μm were obtained. This was a composition containing Mo 2 O 5 as a main component, and the specific resistance was as low as about 8 × 10 −5 Ω · cm.

【0044】次に、得られた酸化モリブデンフレークを
エポキシ樹脂中に30vol%混合して導電性ペースト
を作製した。混合には3本ロールを用い、3回通過させ
た。
Next, the obtained molybdenum oxide flakes were mixed in an epoxy resin at 30 vol% to prepare a conductive paste. The mixture was passed three times using a three-roll mill.

【0045】硬化後の導電性ペーストの比抵抗は8×1
-4Ω・cmと従来のカーボンペーストに比べ1桁以上
低い値となった。炭素系(黒鉛を含む)の導電性ペース
トがπ電子共役上からバインダー上を電子が移動する電
荷移動型導電体であるため、電子の移動があまりうまく
行かないのに比較し、本実施例のペーストは金属フィラ
ー混合タイプと同じ複合型導電体であるため比抵抗が低
くなったものと考えられる。さらに銀ペーストなどの金
属フィラー系の導電性ペーストに比べて本実施例の導電
性ペーストはマイグレーションを起こしにくい利点があ
った。
The specific resistance of the conductive paste after curing is 8 × 1.
The value was 0 -4 Ω · cm, which is one digit lower than that of the conventional carbon paste. Since the carbon-based (including graphite) conductive paste is a charge-transfer-type conductor in which electrons move from the π-electron conjugate onto the binder, the transfer of electrons does not proceed very well. It is considered that the paste has a low specific resistance because it is the same composite conductor as the metal filler mixed type. Furthermore, the conductive paste of this embodiment has an advantage that migration is less likely to occur as compared with a metal filler-based conductive paste such as a silver paste.

【0046】酸化物系導電性セラミックスフレークの添
加量としてはバインダーに対してできるだけ多く混合す
ることが望ましいが、下地との接着性を考慮するとバイ
ンダーに対してほぼ30vol%程度が妥当と考えられ
る。また、添加するフレークとしては酸化モリブデン以
外にITOのような比抵抗が10-4Ω・cm以下の低抵
抗のものが要求される。
It is desirable that the oxide-based conductive ceramic flakes be added as much as possible with respect to the binder. However, considering the adhesion to the base, about 30 vol% with respect to the binder is considered appropriate. In addition, flakes to be added are required to have a low resistivity of 10 −4 Ω · cm or less, such as ITO, in addition to molybdenum oxide.

【0047】以上の3つの実施例からもわかるように酸
化物系導電性セラミックスフレークには少なくとも10
-2Ω・cm以下の比抵抗が要求され、膜厚としては0.
1μm〜数μm、フレークの平均半径としては50μm
以上のものが望まれる。
As can be seen from the above three examples, at least 10%
-2 Ω · cm or less specific resistance is required, and the film thickness is 0.1.
1 μm to several μm, average flake radius is 50 μm
The above is desired.

【0048】また、PVD法による蒸着後のセラミック
スの焼成条件としては比抵抗の点から酸素中もしくは空
気中で500℃以上で硬質基板の熱変形温度以下の温度
で少なくとも1時間以上の加熱を要した。本発明の硬質
基板とはガラスや石英などのセラミックス基板、アルミ
やステンレスのような金属基板をさすが、第一の実施例
の場合ポリイミドフィルムのような樹脂系のものでも問
題はなかった。樹脂層の厚さとしては0.1μm〜数μ
m程度が適していた。
As for the firing conditions of the ceramics after the deposition by the PVD method, heating at a temperature of 500 ° C. or more and a heat deformation temperature of the hard substrate for at least 1 hour or more in oxygen or air in terms of specific resistance is required. did. The hard substrate of the present invention refers to a ceramic substrate such as glass or quartz or a metal substrate such as aluminum or stainless steel. In the case of the first embodiment, a resin-based material such as a polyimide film has no problem. 0.1 μm to several μm as the thickness of the resin layer
m was suitable.

【0049】なお、導電性セラミックスをPVD法でな
く、化学的蒸着(CVD)法やディッピング法で作製し
た場合、焼成時に導電性セラミックスが下地の硬質基板
から一部剥がれないことや比抵抗が高くなる傾向があっ
た。
When the conductive ceramic is produced not by the PVD method but by the chemical vapor deposition (CVD) method or the dipping method, the conductive ceramic does not partially peel off from the underlying hard substrate at the time of firing, and the specific resistance is high. Tended to be.

【0050】[0050]

【発明の効果】以上の説明から明らかなように、本発明
によれば水溶性樹脂上に導電性セラミックスを形成し、
その後水に浸漬、ろ過、焼成したり、熱分解性樹脂上に
製膜した後、加熱焼成することで膜厚が0.1μm〜5
μmで平均半径が50μm以上で比抵抗が10-2Ω・c
m以下の導電性セラミックスフレークが低コストで得ら
れる。
As is apparent from the above description, according to the present invention, a conductive ceramic is formed on a water-soluble resin,
Thereafter, the film is immersed in water, filtered, fired, or formed on a thermally decomposable resin, and then heated and fired to have a thickness of 0.1 μm to 5 μm.
μm, average radius of 50 μm or more and specific resistance of 10 −2 Ω · c
m or less can be obtained at low cost.

【0051】この導電性セラミックスフレークを用いる
と、電池分野では活物質中に1〜8wt%添加すること
でエネルギー密度とサイクル寿命の向上が図れる。
When this conductive ceramic flake is used, the energy density and cycle life can be improved by adding 1 to 8 wt% to the active material in the field of batteries.

【0052】ハウジング材への添加では低コストでの帯
電防止や電磁波シールドが可能となると共に透明な筐体
が得られるためデザインの自由度が大きく増加する。
The addition to the housing material makes it possible to prevent static electricity and shield electromagnetic waves at a low cost, and a transparent housing is obtained, thereby greatly increasing the degree of freedom in design.

【0053】また、導電性ペーストへの添加においては
カーボンより比抵抗が低く、かつ金属のようにマイグレ
ーションが起こらず耐食性の優れたものが得られる。
In addition, when added to the conductive paste, a material having a lower specific resistance than carbon and having no corrosion and excellent corrosion resistance like a metal can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の第一の実施例におけるSnO2 フレー
クの製造工程を示す図
FIG. 1 is a diagram showing a manufacturing process of SnO 2 flakes in a first embodiment of the present invention.

【図2】本発明の第一の実施例におけるSnO2 フレー
クの混合量とエネルギー密度との関係を示す図
FIG. 2 is a diagram showing the relationship between the amount of mixed SnO 2 flakes and the energy density in the first embodiment of the present invention.

【図3】本発明の第一の実施例におけるSnO2 フレー
クの平均半径とエネルギー密度との関係を示す図
FIG. 3 is a diagram showing the relationship between the average radius of SnO 2 flakes and the energy density in the first embodiment of the present invention.

【図4】本発明の第二の実施例におけるITOフレーク
の製造工程を示す図
FIG. 4 is a diagram showing a process of manufacturing ITO flakes according to a second embodiment of the present invention.

【図5】本発明の第二の実施例におけるITOフレーク
混合量と電界減衰率との関係を示す図
FIG. 5 is a diagram showing the relationship between the amount of mixed ITO flakes and the electric field attenuation rate in the second embodiment of the present invention.

【符号の説明】[Explanation of symbols]

11 ガラス基板 12 ポリビニルアルコール 13 水 14 SnO2フレーク 21 石英基板 22 ポリスチレン 23 アセトン 24 ITOフレーク11 Glass Substrate 12 Polyvinyl Alcohol 13 Water 14 SnO 2 Flake 21 Quartz Substrate 22 Polystyrene 23 Acetone 24 ITO Flake

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭61−189450(JP,A) 特開 平2−155112(JP,A) 特開 平4−28113(JP,A) 特開 昭51−47233(JP,A) 特開 平1−100023(JP,A) 特開 平6−171908(JP,A) 特開 昭61−295208(JP,A) (58)調査した分野(Int.Cl.7,DB名) H01B 13/00 501 C01G 19/02 H01B 1/08 H01B 5/00 H01M 4/57 ──────────────────────────────────────────────────続 き Continuation of front page (56) References JP-A-61-189450 (JP, A) JP-A-2-155112 (JP, A) JP-A-4-28113 (JP, A) JP-A-51-189 47233 (JP, A) JP-A-1-100023 (JP, A) JP-A-6-171908 (JP, A) JP-A-61-295208 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) H01B 13/00 501 C01G 19/02 H01B 1/08 H01B 5/00 H01M 4/57

Claims (6)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 硬質基板に水溶性樹脂層を設け、その上に
酸化物系導電性セラミックス層を物理的蒸着法で形成し
た後、この基板を水中に浸漬し酸化物系導電性セラミッ
クスフレークを前記硬質基板から分離させ、ろ過し、そ
の後500℃以上の温度で1時間以上酸素中もしくは空
気中で焼成することを特徴とする酸化物系導電性セラミ
ックスフレークの製造方法。
A hard substrate is provided with a water-soluble resin layer, an oxide conductive ceramic layer is formed thereon by physical vapor deposition, and then the substrate is immersed in water to form an oxide conductive ceramic flake. A method for producing an oxide-based conductive ceramic flake, comprising separating from the hard substrate, filtering, and then firing at a temperature of 500 ° C. or more in oxygen or air for 1 hour or more.
【請求項2】 硬質基板に熱分解性樹脂層を設け、その上
に酸化物系導電性セラミックス層を物理的蒸着法で形成
した後、この基板を空気中もしくは酸素中で前記熱分解
性樹脂の熱分解温度以上、硬質基板の熱変形温度以下の
温度で1時間以上加熱し、熱分解性樹脂層を除去するこ
とを特徴とする酸化物系導電性セラミックスフレークの
製造方法。
2. A heat-decomposable resin layer is provided on a hard substrate, and an oxide-based conductive ceramic layer is formed thereon by physical vapor deposition. A method for producing an oxide-based conductive ceramic flake, comprising heating at a temperature not lower than the thermal decomposition temperature of the hard substrate and not higher than the thermal deformation temperature of the hard substrate for at least one hour to remove the heat-decomposable resin layer.
【請求項3】 熱分解性樹脂が水溶性樹脂あるいは有機溶
剤に可溶な樹脂であることを特徴とする請求項2記載
酸化物系導電性セラミックスフレークの製造方法。
3. The method for producing an oxide-based conductive ceramic flake according to claim 2 , wherein the thermally decomposable resin is a water-soluble resin or a resin soluble in an organic solvent.
【請求項4】 有機溶剤に可溶な樹脂はα−メチルスチレ
ンである請求項3記載の酸化物系導電性セラミックスフ
レークの製造方法。
4. The method according to claim 3 , wherein the resin soluble in the organic solvent is α-methylstyrene.
【請求項5】請求項1、2、3または4記載の製造方法5. The method according to claim 1, 2, 3, or 4.
で作製した膜厚が0.1μm〜5μmであって、フレーThe film thickness is 0.1 μm to 5 μm,
クの平均半径が50μm以上でかつ比抵抗が9×10The average radius of the metal is 50 μm or more and the specific resistance is 9 × 10 -2-2
Ωcm以下であることを特徴とする酸化物系導電性セラOxide-based conductive ceramic having a resistivity of Ωcm or less
ミックスフレーク。Mix flakes.
【請求項6】請求項5記載の酸化物系導電性セラミック6. The oxide-based conductive ceramic according to claim 5.
スフレークを電極中に含有することを特徴とする鉛蓄電Lead storage characterized by containing flakes in the electrode
池。pond.
JP33428292A 1992-12-15 1992-12-15 Oxide-based conductive ceramic flake, method for producing the same, and lead storage battery using the same Expired - Fee Related JP3243862B2 (en)

Priority Applications (1)

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JP33428292A JP3243862B2 (en) 1992-12-15 1992-12-15 Oxide-based conductive ceramic flake, method for producing the same, and lead storage battery using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33428292A JP3243862B2 (en) 1992-12-15 1992-12-15 Oxide-based conductive ceramic flake, method for producing the same, and lead storage battery using the same

Publications (2)

Publication Number Publication Date
JPH06187820A JPH06187820A (en) 1994-07-08
JP3243862B2 true JP3243862B2 (en) 2002-01-07

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Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4608682B2 (en) * 2006-06-07 2011-01-12 独立行政法人産業技術総合研究所 Production method and product of functional film
JP2010146726A (en) * 2007-11-30 2010-07-01 Kyoritsu Kagaku Sangyo Kk Conductive composition

Also Published As

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