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JP3247778B2 - Purification method of glycidyl methacrylate - Google Patents
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JP3247778B2 - Purification method of glycidyl methacrylate - Google Patents

Purification method of glycidyl methacrylate

Info

Publication number
JP3247778B2
JP3247778B2 JP29705093A JP29705093A JP3247778B2 JP 3247778 B2 JP3247778 B2 JP 3247778B2 JP 29705093 A JP29705093 A JP 29705093A JP 29705093 A JP29705093 A JP 29705093A JP 3247778 B2 JP3247778 B2 JP 3247778B2
Authority
JP
Japan
Prior art keywords
gma
distillation
crude
glycidyl methacrylate
ppm
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP29705093A
Other languages
Japanese (ja)
Other versions
JPH07145160A (en
Inventor
滋 横田
悦夫 竹本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daicel Corp
Original Assignee
Daicel Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daicel Chemical Industries Ltd filed Critical Daicel Chemical Industries Ltd
Priority to JP29705093A priority Critical patent/JP3247778B2/en
Publication of JPH07145160A publication Critical patent/JPH07145160A/en
Application granted granted Critical
Publication of JP3247778B2 publication Critical patent/JP3247778B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/52Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts

Landscapes

  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Epoxy Compounds (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、グリシドール(以下、
GDと記す)とメタクリル酸メチル(以下、MMAと記
す)とのエステル交換反応により製造したメタクリル酸
グリシジル(以下、GMAと記す)を精製する方法に関
する。
The present invention relates to glycidol (hereinafter referred to as "glycidol").
The present invention relates to a method for purifying glycidyl methacrylate (hereinafter, referred to as GMA) produced by a transesterification reaction between methyl methacrylate (hereinafter, referred to as MMA) and methyl methacrylate (hereinafter, referred to as MMA).

【0002】GMAは、分子中に反応性の高い二重結合
およびエポキシ基を有しており、塗料用樹脂原料などに
使用される。
[0002] GMA has a highly reactive double bond and an epoxy group in the molecule, and is used as a resin material for coatings.

【0003】[0003]

【従来の技術】GDとMMAとのエステル交換反応によ
ってGMAを製造する方法は、これまでに多く知られて
おり、一般的には、塩基性触媒の存在下、副生するメタ
ノールを蒸留によって系外に除去しながら反応を行う。
2. Description of the Related Art Many processes for producing GMA by transesterification between GD and MMA have been known so far. In general, methanol produced as a by-product is distilled off in the presence of a basic catalyst by distillation. Perform the reaction while removing to the outside.

【0004】反応終了後、反応で使用した触媒は、GM
Aの精製前に濾過(特公昭53−6133/デグッサ、
特公昭61−43351/日本油脂)や水洗(特開昭5
5−105676/三井東圧)等の操作により系外に除
去することが記載されている。
After completion of the reaction, the catalyst used in the reaction is GM
Filtration before purification of A (JP-B-53-6133 / Degussa,
JP-B-61-43351 / Nippon Oil & Fats)
No. 5,105,676 / Mitsui east pressure).

【0005】[0005]

【発明が解決しようとする課題】上記の濾過や水洗で触
媒を粗GMAの精製前に完全に除くことは非常に難し
く、処理後の粗GMAにも若干触媒が残存しているため
に、蒸留精製時に重合しやすい問題が残されている。さ
らに、水洗ではGMAや回収MMAのロスが多くなる等
の問題点がある また、反応の触媒として、アミン類を用いた場合(特開
昭55−94379/ダイセル化学工業)、アミン類が
GMAより低沸点であるために、蒸留によりGMAより
先に系外に除去することができる。しかしながら、ごく
一部のアミンは副反応を起こして、高沸点化合物として
GMA精製時の釜側に残存するために、粗GMA精製時
に重合しやすい問題がある。
It is very difficult to completely remove the catalyst before the purification of the crude GMA by the above-mentioned filtration and washing with water, and since a small amount of the catalyst remains in the crude GMA after the treatment, the distillation is carried out. The problem of easy polymerization during purification remains. Further, there is a problem that loss of GMA and recovered MMA is increased in washing with water. Further, when amines are used as a catalyst for the reaction (JP-A-55-94379 / Daicel Chemical Industries), the amines are less than GMA. Since it has a low boiling point, it can be removed outside the system by distillation prior to GMA. However, since a very small part of the amine undergoes a side reaction and remains as a high-boiling compound on the kettle side during the purification of GMA, there is a problem that the amine is easily polymerized during the purification of crude GMA.

【0006】[0006]

【発明の目的】本発明の目的は、GDとMMAとのエス
テル交換反応によりGMAを製造する方法において、蒸
留精製時に非常に重合しやすい粗GMAの重合を防止
し、高収率で高純度の製品GMAを得る方法を開発する
ことにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a method for producing GMA by transesterification of GD with MMA, which prevents the polymerization of crude GMA which is very liable to polymerize during distillation purification, and provides a high yield and high purity. The aim is to develop a method for obtaining the product GMA.

【0007】[0007]

【課題を解決するための手段】すなわち、本発明は、
「塩基性触媒の存在下、グリシドールとメタクリル酸メ
チルとのエステル交換反応により製造したメタクリル酸
グリシジルを精製する方法において、精製前にスルホン
基をもつ化合物で中和した後、精製することを特徴とす
るメタクリル酸グリシジルの精製方法」である。
That is, the present invention provides:
`` A method for purifying glycidyl methacrylate produced by transesterification of glycidol and methyl methacrylate in the presence of a basic catalyst, characterized in that it is purified by neutralizing with a compound having a sulfone group before purification. And a method for purifying glycidyl methacrylate.

【0008】本発明で述べる塩基性触媒としては、通常
塩基性触媒として用いられる酢酸リチウム、酢酸カリウ
ム、酢酸マグネシウム等のアルカリ金属及びアルカリ土
類金属のカルボン酸塩やトリエチルアミン、トリブチル
アミン、ジブチルアミン等のアミンを挙げることができ
るが、他の塩基性触媒であっても本発明を実施する上で
何らさしつかえない。また、本発明のGDとMMAのエ
ステル交換反応によりGMAの製造は、反応で生成した
メタノ−ルを塔頂から抜く通常の反応蒸留で行うことが
できる。なお、メタノ−ルの共沸剤としてn−ヘキサン
やシクロヘキサンのような溶剤を用いても、本発明を実
施する上で何らさしつかえない。
The basic catalysts described in the present invention include carboxylic acid salts of alkali metals and alkaline earth metals such as lithium acetate, potassium acetate and magnesium acetate, and triethylamine, tributylamine, dibutylamine and the like which are usually used as basic catalysts. However, other basic catalysts can be used in the practice of the present invention. The production of GMA by the transesterification reaction between GD and MMA of the present invention can be carried out by ordinary reactive distillation in which methanol produced by the reaction is removed from the top of the column. It should be noted that even if a solvent such as n-hexane or cyclohexane is used as an azeotropic agent for methanol, there is no problem in practicing the present invention.

【0009】次に、メタノ−ルの生成がなくなるかほと
んどなくなった後に、脱MMA、脱共沸剤、場合によっ
て脱触媒の操作を行うが、この操作中の重合は減圧度に
もよるが、通常実施されているような条件で行えば何ら
問題なく行うことができる。また、不溶性の塩基性触媒
を使用した場合は、通常脱MMA前(場合により脱MM
A後)に濾過等の操作により蒸留系外に除かれるが、依
然として若干の溶存塩基性触媒が粗GMA中に存在する
ことになる。
[0009] Next, after the production of methanol is eliminated or almost eliminated, an operation of removing MMA, an azeotropic agent, and optionally a decatalyst is carried out. The polymerization during this operation depends on the degree of reduced pressure. It can be carried out without any problem under the conditions normally used. In addition, when an insoluble basic catalyst is used, it is usually used before removing MMA (or removing MM in some cases).
After A), it is removed from the distillation system by an operation such as filtration, but some dissolved basic catalyst still exists in the crude GMA.

【0010】通常問題となるのは、脱MMAを行った後
の粗GMA(当然MMAも含まれている)から製品GM
Aを蒸留分離する工程の重合防止である。
[0010] Usually, a problem arises from the crude GMA (which naturally includes MMA) after de-MMA has been performed.
This is to prevent polymerization in the step of separating A by distillation.

【0011】本発明者らが詳細に検討した結果、スルホ
ン基をもつ化合物で中和すると適当な酸性度を持ってい
るために、中和塩自体の塩基性がほとんどなく、中和後
の粗GMAが蒸留精製時に著しく重合しにくくなること
が明らかになった。
As a result of a detailed study by the present inventors, it has been found that neutralization with a compound having a sulfone group has an appropriate acidity, so that the neutralized salt itself has little basicity, and It has been found that GMA becomes extremely difficult to polymerize during distillation purification.

【0012】本発明で使用するスルホン基をもつ化合物
としては、メタンスルホン酸、エタンスルホン酸等の脂
肪族スルホン酸やベンゼンスルホン酸、o−トルエンス
ルホン酸、m−トルエンスルホン酸,p−トルエンスル
ホン酸、ナフタリン−α−スルホン酸、ナフタリン−β
−スルホン酸等の芳香族スルホン酸を使用することがで
きる。しかしながら、入手のし易さ及び価格の点からp
−トルエンスルホン酸が最も好ましい。
The compounds having a sulfone group used in the present invention include aliphatic sulfonic acids such as methanesulfonic acid and ethanesulfonic acid, benzenesulfonic acid, o-toluenesulfonic acid, m-toluenesulfonic acid, p-toluenesulfonic acid. Acid, naphthalene-α-sulfonic acid, naphthalene-β
-Aromatic sulfonic acids such as sulfonic acids can be used. However, in terms of availability and price, p
-Toluene sulfonic acid is most preferred.

【0013】中和に使用するスルホン基をもつ化合物
は、過剰に使用するとGMAのエポキシ基と反応性が高
いために、GMAのロスにつながるだけでなくスルホン
基をもつ化合物の使用率が高くなるので好ましくない。
また、逆にスルホン基をもつ化合物の使用量が少すぎる
と、粗GMAが塩基性となるために、重合物が生成しや
すく好ましくない。
When the compound having a sulfone group used for neutralization is used in excess, the reactivity with the epoxy group of GMA is high, so that not only the loss of GMA is caused but also the use rate of the compound having a sulfone group increases. It is not preferable.
Conversely, if the amount of the compound having a sulfone group is too small, the crude GMA becomes basic, and a polymer is easily formed, which is not preferable.

【0014】スルホン基をもつ化合物の添加方法として
は、未中和の粗GMAを攪拌機で攪拌しながら、そのま
ま添加しても良いし、不活性な溶媒に溶解して攪拌機で
攪拌しながら添加しても良い。いずれにせよ、スルホン
基をもつ化合物のエポキシ基との反応性が非常に高いた
め、粗GMA中でのスルホン基をもつ化合物の濃度が局
部的に高くなるのは好ましくなく、攪拌は出来るだけ激
しく行う方が好ましい。 スルホン基をもつ化合物は数
回に分割して仕込んでも、本発明を実施する上で何ら問
題ない。
As a method of adding the compound having a sulfone group, unneutralized crude GMA may be added as it is while stirring with a stirrer, or may be dissolved in an inert solvent and added with stirring with a stirrer. May be. In any case, since the reactivity of the compound having a sulfone group with the epoxy group is very high, it is not preferable that the concentration of the compound having the sulfone group in the crude GMA becomes locally high, and stirring is carried out as vigorously as possible. It is preferable to do so. Even if the compound having a sulfone group is divided and charged several times, there is no problem in practicing the present invention.

【0015】したがって、通常粗GMAの塩基量を測定
して、塩基のモル量に対してスルホン基のモル量で0.
5〜3倍の範囲で使用される。
Therefore, the base amount of the crude GMA is usually measured, and the molar amount of the sulfone group is 0.1 to the molar amount of the base.
It is used in the range of 5 to 3 times.

【0016】ここで、粗GMA中の塩基量の測定には、
規定塩酸を用いて指示薬法もしくは電位差滴定法による
滴定分析により測定することができる。
Here, in order to measure the amount of base in crude GMA,
It can be measured by titration analysis using an indicator method or potentiometric titration method using normal hydrochloric acid.

【0017】蒸留を行う場合、重合防止の観点から蒸留
中の温度は低い方が好ましいが、減圧器の能力やコンデ
ンサ−の能力を考慮して決める必要がある。コンデンサ
−の能力が小さいのもかかわらず、減圧度を高めて蒸留
温度を低くすると低沸点化合物(例えばMMA)が捕集
しきれなく、回収ロスが大きくなる。したがって、通常
は1〜30Torrの圧力で蒸留を行うのが好ましい。
When performing distillation, the temperature during distillation is preferably low from the viewpoint of preventing polymerization, but it is necessary to determine the temperature in consideration of the capacity of the pressure reducer and the capacity of the condenser. Despite the low capacity of the condenser, if the degree of vacuum is increased and the distillation temperature is lowered, low boiling compounds (for example, MMA) cannot be collected completely, and the recovery loss increases. Therefore, it is usually preferable to carry out the distillation at a pressure of 1 to 30 Torr.

【0018】また、蒸留塔の形式には特に拘らないが、
できれば低圧損の蒸留塔が好ましい。さらに、蒸留塔の
実段数も可能な限り少ないものが好まし。低圧損の蒸留
塔や実段数の少ない蒸留塔の方がボトムの圧力を低く抑
えられ、すなはち、ボトム温度を低く抑えられるため、
重合が起こりにくいからである。
Although the type of the distillation column is not particularly limited,
Preferably, a distillation column having a low pressure loss is used. Further, it is preferable that the actual number of distillation columns is as small as possible. Since the distillation column with low pressure loss and the distillation column with a small number of actual plates can keep the bottom pressure low, that is, the bottom temperature can be kept low,
This is because polymerization hardly occurs.

【0019】蒸留方法としては、バッチ方式でも連続方
式でもよい。
The distillation method may be a batch method or a continuous method.

【0020】具体的には、バッチ方式で行う場合、スル
ホン基をもつ化合物で粗GMAを中和後、重合禁止剤と
一緒に釜に張り込み、塔頂及びコンデンサ−に重合禁止
剤を連続的に添加しながら減圧蒸留する。釜には重合防
止のために、空気もしくは希釈空気を仕込んで蒸留を行
っても良い。
Specifically, when the batch method is used, the crude GMA is neutralized with a compound having a sulfone group, and then charged into a kettle together with a polymerization inhibitor, and the polymerization inhibitor is continuously added to the tower top and the condenser. Distill under reduced pressure while adding. In order to prevent polymerization, distillation may be performed by charging air or dilution air into the kettle.

【0021】また、連続蒸留を行う場合、スルホン基を
もつ化合物で粗GMAを中和後、重合禁止剤と一緒に蒸
留塔に連続的に仕込み、塔頂から未反応MMA等のGM
Aより低沸点の成分を抜き取り、塔底よりGMA及びG
MAより高沸点の成分を抜き取る。塔底より抜けてきた
液は、さらに次の連続蒸留塔に仕込まれ、塔頂より製品
GMAが得られ、塔底よりGMAより高沸点の成分が抜
けてくる。この場合も通常塔頂及びコンデンサ−に重合
禁止剤を連続的に添加しながら減圧蒸留し、釜には重合
防止のために、空気もしくは希釈空気を仕込んで蒸留を
行う。
In the case of performing continuous distillation, crude GMA is neutralized with a compound having a sulfone group, and then charged continuously in a distillation column together with a polymerization inhibitor.
A component having a lower boiling point than A is extracted, and GMA and G
Withdraw components having a higher boiling point than MA. The liquid discharged from the bottom of the column is further charged into the next continuous distillation column, and a product GMA is obtained from the top of the column, and a component having a higher boiling point than GMA is discharged from the bottom of the column. Also in this case, distillation is performed under reduced pressure while continuously adding a polymerization inhibitor to the top of the column and the condenser, and distillation is performed by charging air or dilution air in the kettle to prevent polymerization.

【0022】なお、連続蒸留をサ−モサイホン式リボイ
ラ−を用いて行う場合のリボイラ−の容量は、原料仕込
み量や蒸留塔の能力のもよるが、可能な限り小さいもの
を用いるのが好ましい。したがって、サ−モサイホン式
リボイラ−より滞留時間の短い薄膜蒸発器のような蒸発
器をリボイラ−として用いてもよい。
When the continuous distillation is carried out using a thermosiphon reboiler, the capacity of the reboiler is preferably as small as possible, although it depends on the amount of raw materials charged and the capacity of the distillation column. Therefore, an evaporator such as a thin film evaporator having a shorter residence time than a thermosiphon reboiler may be used as the reboiler.

【0023】次に、実施例を挙げて本発明を説明する
が、本発明はこれらの実施例によって何ら限定されるも
のではない。
Next, the present invention will be described with reference to examples, but the present invention is not limited to these examples.

【0024】[0024]

【実施例1】10段80mmφのオ−ルダショ−蒸留
塔、コンデンサ−、デカンタ−、還流ライン、減圧装置
及び20Lsus316製ジャケット付釜からなる反応
蒸留塔を用いて、粗GMAの製造を行った。20L釜に
MMA15600g、トリエチルアミン65g、n−ヘ
キサン2250g、2,6−ジ−tert−ブチル−4
−メチルフェノ−ル20g及びメトキシフェノ−ル20
gを張り込み、200Torr減圧下ボトム温度53℃
に昇温後、GDを1262gを1時間掛けて仕込み、同
一圧力及び同一温度で4時間保持した。その後、デカン
タ−で分液した上層液を塔に戻しながら下層液を抜き取
り、さらにGD1100gを仕込んだ。ボトムのGDが
0.2wt%以下になるまで反応した後、脱n−ヘキサ
ン,脱トリエチルアミン及び脱MMAを行い、最終的に
粗GMA(MMA1.1wt%,GMA78.6wt
%、GD0.4wt%,その他は不明の高沸点物質及び
低沸点物質)4621gを得た。この時の粗GMA中の
GMA収率は80.7%,GDベ−スのGMA選択性は
81.7%であり、電位差滴定法によりN/100塩酸
で滴定分析したところ、6.5mmol/kgの塩基性
成分の存在することが判明した。
Example 1 Crude GMA was produced using a 10-stage 80 mmφ old-fashioned distillation column, a condenser distillation column, a decanter, a reflux line, a decompression device and a 20 Lsus 316 jacketed kettle. In a 20 L kettle, 15600 g of MMA, 65 g of triethylamine, 2250 g of n-hexane, 2,6-di-tert-butyl-4
-Methylphenol 20 g and methoxyphenol 20
g at 200 Torr under reduced pressure and bottom temperature of 53 ° C.
After the temperature was raised, 1262 g of GD was charged over 1 hour and kept at the same pressure and the same temperature for 4 hours. Thereafter, the lower layer liquid was withdrawn while returning the upper layer liquid separated by a decanter to the tower, and further charged with 1100 g of GD. After reacting until the bottom GD becomes 0.2 wt% or less, de-n-hexane, de-triethylamine and de-MMA are performed, and finally crude GMA (MMA 1.1 wt%, GMA 78.6 wt
%, GD 0.4 wt%, and other unknown high boiling substances and low boiling substances) 4621 g. At this time, the yield of GMA in the crude GMA was 80.7%, and the selectivity of GMA based on GD was 81.7%. Titration analysis with N / 100 hydrochloric acid by potentiometric titration revealed that 6.5 mmol / g was obtained. It was found that there were kg of basic components.

【0025】[0025]

【実施例2】実施例1の粗GMA2500gに測定され
た塩基性成分の1.5倍量のp−トルエンスルホン酸一
水和物4.6gを添加し、塩基性成分を中和した。過剰
のp−トルエンスルホン酸はエポキシ基と反応してなく
なり、中和後再度電位差滴定法により滴定分析したとこ
ろ、塩基性成分は全く検出されなかった。
Example 2 To 2500 g of crude GMA of Example 1, 4.6 g of p-toluenesulfonic acid monohydrate 1.5 times the amount of the basic component measured was added to neutralize the basic component. Excess p-toluenesulfonic acid was not reacted with the epoxy group and disappeared. After neutralization, titration analysis was again performed by potentiometric titration. As a result, no basic component was detected.

【0026】[0026]

【実施例3】図1のような100mlガラス製フラス
コ,ヘリパック(充填剤)を充填した単菅(40mmφ
×300mm、ヘリパック30mm充填)及びコンデン
サ−を備えた装置を用いて、SUS籠に乗せたポップコ
−ン重合物の種が成長する度合いを評価した。
Example 3 A 100 ml glass flask as shown in FIG. 1, a single tube (40 mmφ) filled with Helipack (filler)
× 300 mm, packed with a heli-pack 30 mm) and a condenser were used to evaluate the degree of growth of the popcorn polymer seeds placed on the SUS basket.

【0027】[0027]

【実施例4】実施例1のの粗GMAに重合禁止剤とし
て、N−ニトロソ−N−シクロヘキシルアニリン500
0ppm、メトキシフェノ−ル1000ppm及びハイ
ドロキノン1ppm(以上の禁止剤以外にGMA製造反
応時に使用した2,6−ジ−tert−ブチル−4−メ
チルフェノ−ル4500ppmを含有している)を添加
して、ポップコ−ン重合物の種の成長率を測定した。禁
止剤を添加した粗GMA60gをフラスコに張り込み、
塔頂の温度が100℃になるように減圧度をコントロ−
ルして、6時間全還流状態で運転した。その結果、SU
S籠に乗せたポップコ−ン重合物の種は約19%の重量
増加が認められた(ポップコ−ン重合物の種は全還流終
了後、n−ヘキサンで十分洗浄し、減圧乾燥して重量測
定した)。なお、フラスコ、コンデンサ−及び空塔に重
合物の付着は認められなかった。
Example 4 N-Nitroso-N-cyclohexylaniline 500 was added to the crude GMA of Example 1 as a polymerization inhibitor.
0 ppm, 1000 ppm of methoxyphenol and 1 ppm of hydroquinone (containing 4500 ppm of 2,6-di-tert-butyl-4-methylphenol used during the GMA production reaction in addition to the above inhibitors) The growth rate of the popcorn polymer seed was measured. 60 g of crude GMA to which the inhibitor was added was placed in the flask,
Control the degree of vacuum so that the temperature at the top of the tower is 100 ° C.
And operated at full reflux for 6 hours. As a result, SU
The seeds of the popcorn polymer placed on the S basket showed an increase of about 19% in weight (the seeds of the popcorn polymer were thoroughly washed with n-hexane after completion of the total reflux, dried under reduced pressure and weighed. It was measured). No polymer adhered to the flask, condenser or empty tower.

【0028】[0028]

【比較例1】実施例3と同じ評価装置を用いて評価を行
った。
Comparative Example 1 Evaluation was performed using the same evaluation device as in Example 3.

【0029】実施例1の粗GMAに重合禁止剤として、
N−ニトロソ−N−シクロヘキシルアニリン5000p
pm、メトキシフェノ−ル1000ppm及びハイドロ
キノン1ppm(以上の禁止剤以外にGMA製造反応時
に使用した2,6−ジ−tert−ブチル−4−メチル
フェノ−ル4500ppmを含有している)を添加し
て、ポップコ−ン重合物の種の成長率を測定した。禁止
剤を添加した粗GMA60gをフラスコに張り込み、塔
頂の温度が100℃になるように減圧度をコントロ−ル
して、6時間全還流状態で運転しようしたが、昇温中に
ボトムに重合物が生成したために実験を中止した。ま
た、SUS籠に乗せたポップコ−ン重合物の種は籠から
溢れ出ていた。
As a polymerization inhibitor in the crude GMA of Example 1,
N-nitroso-N-cyclohexylaniline 5000p
pm, 1000 ppm of methoxyphenol and 1 ppm of hydroquinone (containing 4500 ppm of 2,6-di-tert-butyl-4-methylphenol used during the GMA production reaction in addition to the above inhibitor), The growth rate of the popcorn polymer seed was measured. 60 g of crude GMA to which an inhibitor was added was charged into the flask, the degree of vacuum was controlled so that the temperature at the top of the column was 100 ° C., and the system was operated in a totally reflux state for 6 hours. The experiment was stopped due to product formation. The seeds of the popcorn polymer placed on the SUS basket overflowed from the basket.

【0030】比較例1は粗GMAを全還流前にスルホン
基をもつ化合物であるp−トルエンスルホン酸一水和物
で中和しないとポップコ−ンの種が著しく成長し、非常
に重合しやすい液であることを示している。
In Comparative Example 1, if the crude GMA was not neutralized with p-toluenesulfonic acid monohydrate, which is a compound having a sulfone group, before the total reflux, popcorn seeds would grow remarkably and polymerize very easily. It is a liquid.

【0031】[0031]

【実施例5】10段80mmφのオ−ルダショ−蒸留
塔、コンデンサ−、デカンタ−、還流ライン、減圧装置
及び20Lsus316製ジャケット付釜からなる反応
蒸留塔を用いて、粗GMAの製造を行った。20L釜に
MMA16015g、トリエチルアミン65g、n−ヘ
キサン2472g及び2,6−ジ−tert−ブチル−
4−メチルフェノ−ル20gを張り込み、200Tor
r減圧下ボトム温度53℃に昇温後、GDを890gを
1時間掛けて仕込み、同一圧力及び同一温度で4時間保
持した。その後、デカンタ−で分液した上層液を塔に戻
しながら下層液を抜き取り、さらにGD1464gを仕
込んだ。ボトムのGDが0.2wt%以下になるまで反
応した後、脱n−ヘキサン、脱トリエチルアミン及び脱
MMAを行い、最終的に粗GMA(MMA4.6wt
%,GMA85.8wt%、グリシド−ル0.2wt
%,その他は不明の高沸点物質及び低沸点物質)481
2gを得た。この時の粗GMA中のGMA収率は88.
8%、GDベ−スのGMA選択性は89.4%であり、
電位差滴定法によりN/100塩酸で滴定分析したとこ
ろ、5.3mmol/kgの塩基性成分の存在すること
が判明した。
Example 5 Crude GMA was produced using a reaction distillation column comprising a 10-stage 80 mmφ old-order distillation column, a condenser, a decanter, a reflux line, a decompression device and a 20Lsus316 jacketed kettle. In a 20 L kettle, 16015 g of MMA, 65 g of triethylamine, 2472 g of n-hexane and 2,6-di-tert-butyl-
Add 20 g of 4-methylphenol and add 200 Torr
r After raising the bottom temperature to 53 ° C. under reduced pressure, 890 g of GD was charged over 1 hour and kept at the same pressure and the same temperature for 4 hours. Thereafter, the lower layer liquid was withdrawn while returning the upper layer liquid separated by a decanter to the tower, and GD1464 g was further charged. After reacting until the GD of the bottom became 0.2 wt% or less, de-n-hexane, de-triethylamine and de-MMA were performed, and finally crude GMA (MMA 4.6 wt.
%, GMA 85.8wt%, glycidol 0.2wt
%, Others are unknown high-boiling substances and low-boiling substances) 481
2 g were obtained. At this time, the GMA yield in the crude GMA was 88.
8%, GD-based GMA selectivity is 89.4%,
Titration analysis with N / 100 hydrochloric acid by potentiometric titration revealed that 5.3 mmol / kg of a basic component was present.

【0032】[0032]

【実施例6】実施例4の粗GMA2500gに測定され
た塩基性成分の1.5倍量のp−トルエンスルホン酸一
水和物3.8gを添加し、塩基性成分を中和した。過剰
のp−トルエンスルホン酸はエポキシ基と反応してなく
なり、中和後再度電位差滴定法により滴定分析したとこ
ろ、塩基性成分は全く検出されなかった。
Example 6 To 2500 g of crude GMA of Example 4, 3.8 g of p-toluenesulfonic acid monohydrate 1.5 times the amount of the measured basic component was added to neutralize the basic component. Excess p-toluenesulfonic acid was not reacted with the epoxy group and disappeared. After neutralization, titration analysis was again performed by potentiometric titration. As a result, no basic component was detected.

【0033】[0033]

【実施例7】還流ヘッドとトップコンデンサ−を備え、
充填物として住友/スルザ−ラボパッキング(45mm
φ×55mm)を7エレメント充填した真空ジャケット
式蒸留塔を用いて、バッチ蒸留を行った。バッチ釜とし
て、希釈空気仕込みライン、ボトム圧力測定ライン及び
ボトム温度測定ラインを備えた0.5Lガラス製フラス
コを用いて蒸留を行った。実施例5の粗GMA420g
に重合禁止剤として、N−ニトロソ−N−シクロヘキシ
ルアニリン5000ppm、メトキシフェノ−ル100
0ppm及びハイドロキノン1ppm(以上の禁止剤以
外にGMA製造反応時に使用した2,6−ジ−tert
−ブチル−4−メチルフェノ−ル4500ppmを含有
している)を添加して、バッチ蒸留を行った。
Embodiment 7 A reflux head and a top condenser are provided.
Sumitomo / Sulza-Labo Packing (45mm
Batch distillation was performed using a vacuum jacketed distillation tower packed with 7 elements (φ × 55 mm). Distillation was performed using a 0.5 L glass flask equipped with a dilution air charging line, a bottom pressure measurement line, and a bottom temperature measurement line as a batch kettle. 420 g of crude GMA of Example 5
As a polymerization inhibitor, N-nitroso-N-cyclohexylaniline 5000 ppm, methoxyphenol 100
0 ppm and hydroquinone 1 ppm (in addition to the above inhibitors, 2,6-di-tert used in the GMA production reaction)
-Butyl-4-methylphenol) was added and batch distillation was carried out.

【0034】蒸留中、塔頂側にハイドロキノン10pp
mのGMA溶液を10ml/hrで連続的に仕込み、コ
ンデンサ−側にメトキシフェノ−ル500ppmのGM
A溶液を10ml/hrで連続的に仕込みながら塔頂圧
力20Torrで蒸留を行った。蒸留が終了するのに、
約9時間要したが蒸留系のどの部分にも重合物は認めら
れなかった。蒸留収率は90.4%であり、得られた製
品のGMA純度は98.4%であった。
During the distillation, 10 pp of hydroquinone was added to the top of the column.
m of GMA solution was continuously charged at 10 ml / hr, and 500 ppm of methoxyphenol GM was added to the condenser side.
The solution A was continuously charged at 10 ml / hr, and distillation was performed at a top pressure of 20 Torr. When the distillation is over,
It took about 9 hours, but no polymer was found in any part of the distillation system. The distillation yield was 90.4% and the GMA purity of the obtained product was 98.4%.

【0035】[0035]

【実施例8】実施例6の0.5Lガラス製フラスコを2
Lに代えた以外同じバッチ蒸留装置を用いて、実施例5
の粗GMA1680gに重合禁止剤として、N−ニトロ
ソ−N−シクロヘキシルアニリン5000ppm、メト
キシフェノ−ル1000ppm及びハイドロキノン1p
pm(以上の禁止剤以外にGMA製造反応時に使用した
2,6−ジ−tert−ブチル−4−メチルフェノ−ル
4500ppmを含有している)を添加して、バッチ蒸
留を行った。蒸留中、塔頂側にハイドロキノン10pp
mのGMA溶液を10ml/hrで連続的に仕込み、コ
ンデンサ−側にメトキシフェノ−ル500ppmのGM
A溶液を10ml/hrで連続的に仕込みながら塔頂圧
力20Torrで蒸留を行った。蒸留が終了するのに、
約24時間要したが蒸留系のどの部分にも重合物は認め
られなかった。蒸留収率は87.7%であり、得られた
製品のGMA純度は99.5%であった。
Example 8 The 0.5 L glass flask of Example 6 was
Example 5 using the same batch distillation apparatus except that L
N-nitroso-N-cyclohexylaniline 5000 ppm, methoxyphenol 1000 ppm and hydroquinone 1p as polymerization inhibitors in 1680 g of crude GMA
pm (containing 4500 ppm of 2,6-di-tert-butyl-4-methylphenol used during the GMA production reaction in addition to the above inhibitor) and batch distillation was carried out. During the distillation, 10 pp of hydroquinone was added to the top of the column.
m of GMA solution was continuously charged at 10 ml / hr, and 500 ppm of methoxyphenol GM was added to the condenser side.
The solution A was continuously charged at 10 ml / hr, and distillation was performed at a top pressure of 20 Torr. When the distillation is over,
It took about 24 hours, but no polymer was found in any part of the distillation system. The distillation yield was 87.7%, and the GMA purity of the obtained product was 99.5%.

【0036】[0036]

【比較例2】実施例7のバッチ蒸留装置を用いて、実施
例4の粗GMA1680gをp−トルエンスルホン酸一
水和物で中和せずに、N−ニトロソ−N−シクロヘキシ
ルアニリン5000ppm、メトキシフェノ−ル100
0ppm及びハイドロキノン1ppm(以上の禁止剤以
外にGMA製造反応時に使用した2,6−ジ−tert
−ブチル−4−メチルフェノ−ル4500ppmを含有
している)を添加して、バッチ蒸留を行った。蒸留中、
塔頂側にハイドロキノン10ppmのGMA溶液を10
ml/hrで連続的に仕込み、コンデンサ−側にメトキ
シフェノ−ル500ppmのGMA溶液を10ml/h
rで連続的に仕込みながら塔頂圧力20Torrで蒸留
を行った。
Comparative Example 2 Using the batch distillation apparatus of Example 7, 1680 g of the crude GMA of Example 4 was not neutralized with p-toluenesulfonic acid monohydrate, but 5000 ppm of N-nitroso-N-cyclohexylaniline, Phenol 100
0 ppm and hydroquinone 1 ppm (in addition to the above inhibitors, 2,6-di-tert used in the GMA production reaction)
-Butyl-4-methylphenol) was added and batch distillation was carried out. During distillation,
A 10 ppm GMA solution of hydroquinone was added to the top of the column.
ml / hr, and a 500 ppm GMA solution of methoxyphenol was added to the condenser side at 10 ml / hr.
The distillation was carried out at a top pressure of 20 Torr while continuously charging with r.

【0037】蒸留を開始して、1時間目にボトムのガラ
ス製フラスコの気相部にポップコ−ン重合物が生成した
ので、蒸留を中止した。
At the first hour after the distillation was started, a popcorn polymer was formed in the gas phase of the bottom glass flask, and the distillation was stopped.

【0038】比較例2は粗GMAを蒸留前にスルホン基
をもつ化合物であるp−トルエンスルホン酸一水和物で
中和しないと蒸留できないことを示している。
Comparative Example 2 shows that crude GMA cannot be distilled unless neutralized with p-toluenesulfonic acid monohydrate, a compound having a sulfone group, before distillation.

【0039】[0039]

【発明の効果】塩基性触媒存在下、グリシドールとメタ
クリル酸メチルとのエステル交換反応によりメタクリル
酸グリシジルを製造した後、本発明のように精製の前に
スルホン基をもつ化合物で中和することにより、精製時
重合物の生成が著しく抑制され、高収率でメタクリル酸
グリシジルが得られる。(以下余白)
According to the present invention, glycidyl methacrylate is produced by transesterification between glycidol and methyl methacrylate in the presence of a basic catalyst, and then neutralized with a compound having a sulfone group before purification as in the present invention. In addition, production of a polymer during purification is remarkably suppressed, and glycidyl methacrylate can be obtained in high yield. (Below)

Claims (4)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 塩基性触媒の存在下、グリシドールとメ
タクリル酸メチルとのエステル交換反応により製造した
メタクリル酸グリシジルを精製する方法において、精製
前にスルホン基を有する下記式 《ここで、Rはアルキル基や芳香族基を示す》で表され
る化合物で中和した後、精製することを特徴とするメタ
クリル酸グリシジルの精製方法。
1. A method for purifying glycidyl methacrylate produced by a transesterification reaction of glycidol and methyl methacrylate in the presence of a basic catalyst, the following formula having a sulfone group before purification: << where R represents an alkyl group or an aromatic group >> A method for purifying glycidyl methacrylate, which is carried out after neutralization with a compound represented by formula (1).
【請求項2】 スルホン基(式1)をもつ化合物がp−
トルエンスルホン酸である請求項1に記載のメタクリル
酸グリシジルの精製方法。
2. The compound having a sulfone group (formula 1) is p-
The method for purifying glycidyl methacrylate according to claim 1, which is toluenesulfonic acid.
【請求項3】 塩基性触媒が第3級アミンである請求項
1または請求項2に記載のメタクリル酸グリシジルの精
製方法。
3. The method for purifying glycidyl methacrylate according to claim 1, wherein the basic catalyst is a tertiary amine.
【請求項4】 第3級アミンがトリエチルアミンである
請求項1または請求項2または請求項3に記載のメタク
リル酸グリシジルの精製方法。
4. The method for purifying glycidyl methacrylate according to claim 1, wherein the tertiary amine is triethylamine.
JP29705093A 1993-11-26 1993-11-26 Purification method of glycidyl methacrylate Expired - Fee Related JP3247778B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29705093A JP3247778B2 (en) 1993-11-26 1993-11-26 Purification method of glycidyl methacrylate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29705093A JP3247778B2 (en) 1993-11-26 1993-11-26 Purification method of glycidyl methacrylate

Publications (2)

Publication Number Publication Date
JPH07145160A JPH07145160A (en) 1995-06-06
JP3247778B2 true JP3247778B2 (en) 2002-01-21

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ID=17841569

Family Applications (1)

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Country Link
JP (1) JP3247778B2 (en)

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