JP3248982B2 - Permanent magnet and manufacturing method thereof - Google Patents
Permanent magnet and manufacturing method thereofInfo
- Publication number
- JP3248982B2 JP3248982B2 JP12846193A JP12846193A JP3248982B2 JP 3248982 B2 JP3248982 B2 JP 3248982B2 JP 12846193 A JP12846193 A JP 12846193A JP 12846193 A JP12846193 A JP 12846193A JP 3248982 B2 JP3248982 B2 JP 3248982B2
- Authority
- JP
- Japan
- Prior art keywords
- permanent magnet
- acid
- plating
- treatment
- zinc phosphate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 238000007747 plating Methods 0.000 claims description 60
- 239000010410 layer Substances 0.000 claims description 40
- LRXTYHSAJDENHV-UHFFFAOYSA-H zinc phosphate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LRXTYHSAJDENHV-UHFFFAOYSA-H 0.000 claims description 36
- 229910000165 zinc phosphate Inorganic materials 0.000 claims description 36
- 239000002253 acid Substances 0.000 claims description 29
- 239000011248 coating agent Substances 0.000 claims description 24
- 238000000576 coating method Methods 0.000 claims description 24
- 150000003839 salts Chemical class 0.000 claims description 17
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 13
- 229910017604 nitric acid Inorganic materials 0.000 claims description 13
- 229910052742 iron Inorganic materials 0.000 claims description 11
- 229910052761 rare earth metal Inorganic materials 0.000 claims description 10
- 239000011701 zinc Substances 0.000 claims description 10
- 239000011247 coating layer Substances 0.000 claims description 9
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 7
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 claims description 6
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 claims description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 57
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 25
- 238000000034 method Methods 0.000 description 19
- 230000007797 corrosion Effects 0.000 description 16
- 238000005260 corrosion Methods 0.000 description 16
- 239000000243 solution Substances 0.000 description 15
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 14
- 238000012545 processing Methods 0.000 description 13
- 239000000853 adhesive Substances 0.000 description 12
- 230000001070 adhesive effect Effects 0.000 description 12
- 239000011241 protective layer Substances 0.000 description 11
- 239000007788 liquid Substances 0.000 description 10
- 239000000203 mixture Substances 0.000 description 10
- 238000004090 dissolution Methods 0.000 description 9
- 230000000694 effects Effects 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- 238000007654 immersion Methods 0.000 description 8
- 229910052759 nickel Inorganic materials 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- 230000007423 decrease Effects 0.000 description 6
- 230000006872 improvement Effects 0.000 description 6
- PTFCDOFLOPIGGS-UHFFFAOYSA-N Zinc dication Chemical compound [Zn+2] PTFCDOFLOPIGGS-UHFFFAOYSA-N 0.000 description 5
- -1 alkali metal salts Chemical class 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- 238000009713 electroplating Methods 0.000 description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 5
- 238000005245 sintering Methods 0.000 description 5
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 4
- 230000004913 activation Effects 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910001453 nickel ion Inorganic materials 0.000 description 4
- 230000001590 oxidative effect Effects 0.000 description 4
- 238000006467 substitution reaction Methods 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 3
- 238000010306 acid treatment Methods 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 230000032683 aging Effects 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 3
- 239000004327 boric acid Substances 0.000 description 3
- 229910052796 boron Inorganic materials 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 150000002222 fluorine compounds Chemical class 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000000877 morphologic effect Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 229940085991 phosphate ion Drugs 0.000 description 3
- 238000004663 powder metallurgy Methods 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 238000004506 ultrasonic cleaning Methods 0.000 description 3
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical group Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 229910052779 Neodymium Inorganic materials 0.000 description 2
- 229910021585 Nickel(II) bromide Inorganic materials 0.000 description 2
- IOVCWXUNBOPUCH-UHFFFAOYSA-M Nitrite anion Chemical compound [O-]N=O IOVCWXUNBOPUCH-UHFFFAOYSA-M 0.000 description 2
- 229910052772 Samarium Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
- 229910001437 manganese ion Inorganic materials 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- IPLJNQFXJUCRNH-UHFFFAOYSA-L nickel(2+);dibromide Chemical compound [Ni+2].[Br-].[Br-] IPLJNQFXJUCRNH-UHFFFAOYSA-L 0.000 description 2
- 229940005654 nitrite ion Drugs 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 150000002910 rare earth metals Chemical class 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000000176 sodium gluconate Substances 0.000 description 2
- 235000012207 sodium gluconate Nutrition 0.000 description 2
- 229940005574 sodium gluconate Drugs 0.000 description 2
- 239000011975 tartaric acid Substances 0.000 description 2
- 235000002906 tartaric acid Nutrition 0.000 description 2
- 229910052727 yttrium Inorganic materials 0.000 description 2
- KWMLJOLKUYYJFJ-UHFFFAOYSA-N 2,3,4,5,6,7-Hexahydroxyheptanoic acid Chemical compound OCC(O)C(O)C(O)C(O)C(O)C(O)=O KWMLJOLKUYYJFJ-UHFFFAOYSA-N 0.000 description 1
- 229910020674 Co—B Inorganic materials 0.000 description 1
- QXKAIJAYHKCRRA-JJYYJPOSSA-N D-arabinonic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)C(O)=O QXKAIJAYHKCRRA-JJYYJPOSSA-N 0.000 description 1
- RGHNJXZEOKUKBD-MGCNEYSASA-N D-galactonic acid Chemical compound OC[C@@H](O)[C@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-MGCNEYSASA-N 0.000 description 1
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 description 1
- RGHNJXZEOKUKBD-MBMOQRBOSA-N D-mannonic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@H](O)C(O)=O RGHNJXZEOKUKBD-MBMOQRBOSA-N 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- FBOZXECLQNJBKD-ZDUSSCGKSA-N L-methotrexate Chemical compound C=1N=C2N=C(N)N=C(N)C2=NC=1CN(C)C1=CC=C(C(=O)N[C@@H](CCC(O)=O)C(O)=O)C=C1 FBOZXECLQNJBKD-ZDUSSCGKSA-N 0.000 description 1
- WAEMQWOKJMHJLA-UHFFFAOYSA-N Manganese(2+) Chemical compound [Mn+2] WAEMQWOKJMHJLA-UHFFFAOYSA-N 0.000 description 1
- 229910001122 Mischmetal Inorganic materials 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 241000080590 Niso Species 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- HLCFGWHYROZGBI-JJKGCWMISA-M Potassium gluconate Chemical compound [K+].OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O HLCFGWHYROZGBI-JJKGCWMISA-M 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 1
- 229910052775 Thulium Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 229910001297 Zn alloy Inorganic materials 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- JZQOJFLIJNRDHK-CMDGGOBGSA-N alpha-irone Chemical compound CC1CC=C(C)C(\C=C\C(C)=O)C1(C)C JZQOJFLIJNRDHK-CMDGGOBGSA-N 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 150000007514 bases Chemical class 0.000 description 1
- 238000005282 brightening Methods 0.000 description 1
- UDSAIICHUKSCKT-UHFFFAOYSA-N bromophenol blue Chemical compound C1=C(Br)C(O)=C(Br)C=C1C1(C=2C=C(Br)C(O)=C(Br)C=2)C2=CC=CC=C2S(=O)(=O)O1 UDSAIICHUKSCKT-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical class OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000002738 chelating agent Substances 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 238000005237 degreasing agent Methods 0.000 description 1
- 239000013527 degreasing agent Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 239000000174 gluconic acid Substances 0.000 description 1
- 235000012208 gluconic acid Nutrition 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910001172 neodymium magnet Inorganic materials 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- BFDHFSHZJLFAMC-UHFFFAOYSA-L nickel(ii) hydroxide Chemical compound [OH-].[OH-].[Ni+2] BFDHFSHZJLFAMC-UHFFFAOYSA-L 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000004224 potassium gluconate Substances 0.000 description 1
- 235000013926 potassium gluconate Nutrition 0.000 description 1
- 229960003189 potassium gluconate Drugs 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000011002 quantification Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 238000000550 scanning electron microscopy energy dispersive X-ray spectroscopy Methods 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 238000005480 shot peening Methods 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 235000019333 sodium laurylsulphate Nutrition 0.000 description 1
- NMTDPTPUELYEPL-UHFFFAOYSA-M sodium;heptanoate Chemical compound [Na+].CCCCCCC([O-])=O NMTDPTPUELYEPL-UHFFFAOYSA-M 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- FDDDEECHVMSUSB-UHFFFAOYSA-N sulfanilamide Chemical compound NC1=CC=C(S(N)(=O)=O)C=C1 FDDDEECHVMSUSB-UHFFFAOYSA-N 0.000 description 1
- 229940124530 sulfonamide Drugs 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
- H01F41/0253—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets
- H01F41/026—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets protecting methods against environmental influences, e.g. oxygen, by surface treatment
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Environmental & Geological Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Manufacturing Cores, Coils, And Magnets (AREA)
- Powder Metallurgy (AREA)
- Hard Magnetic Materials (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、永久磁石およびその製
造方法に関し、更に詳細には、R(ただし、RはYを含
む希土類元素のうち少なくとも1種以上)、T(ただ
し、TはFeまたはFeおよびCo)およびBを含有
し、実質的に正方晶系の主相を有する永久磁石とその製
造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a permanent magnet and a method for producing the same, and more particularly, to R (where R is at least one of rare earth elements including Y), T (where T is Fe The present invention also relates to a permanent magnet containing Fe and Co) and B and having a substantially tetragonal main phase and a method for producing the same.
【0002】[0002]
【従来の技術】高性能を有する希土類磁石としては、粉
末治金法によるSm−Co系磁石でエネルギー積32M
GOeのものが量産されている。2. Description of the Related Art Rare earth magnets having high performance include Sm-Co magnets manufactured by powder metallurgy and having an energy product of 32M.
GOe is mass-produced.
【0003】しかし、このものは、Sm,Coの原料価
格が高いという欠点を有する。希土類元素の中では原子
量の小さい元素、例えばCeやPr,Ndは、Smより
も豊富にあり価格が安い。また、FeはCoに比べ安価
である。そこで、近年Nd−Fe−B磁石やNd−Fe
−Co−B磁石等のR−T−B系磁石(TはFeまたは
FeおよびCo)が開発され、特開昭59−46008
号公報には焼結磁石が開示されている。焼結法による磁
石では、従来のSm−Co系の粉末治金プロセス(溶解
→母合金インゴット鋳造→インゴット粗粉砕→微粉砕→
成形→焼結→磁石)を適用でき、また高い磁気特性を得
ることも容易である。However, this has a disadvantage that the raw material price of Sm and Co is high. Among the rare earth elements, elements having a small atomic weight, for example, Ce, Pr, and Nd are more abundant and cheaper than Sm. Fe is less expensive than Co. Therefore, in recent years, Nd-Fe-B magnets and Nd-Fe
R-T-B magnets (T is Fe or Fe and Co) such as -Co-B magnets have been developed.
The publication discloses a sintered magnet. In the magnet by the sintering method, the conventional Sm-Co powder metallurgy process (melting → mother alloy ingot casting → ingot coarse grinding → fine grinding →
Molding → sintering → magnet) can be applied, and it is easy to obtain high magnetic properties.
【0004】しかしこのものは、主成分として酸化され
やすい希土類元素と鉄とを含有するため、耐食性が低
く、性能の劣化、バラツキ等が問題となっている。この
ようなR−T−B系磁石の耐食性の低さを改善すること
を目的として、上記磁石の表面をNiめっきを設ける技
術が提案されている。[0004] However, since these materials contain a rare earth element which is easily oxidized and iron as main components, they have low corrosion resistance and have problems such as performance deterioration and variation. For the purpose of improving the low corrosion resistance of the RTB-based magnet, a technique of providing the surface of the magnet with Ni plating has been proposed.
【0005】Niめっきは量産性に優れ、また単に耐食
性を改善するだけではなく、機械的強度においても補強
効果を発揮するため有用である。Ni plating is excellent in mass productivity and is useful because it not only improves corrosion resistance but also exerts a reinforcing effect on mechanical strength.
【0006】しかしながら、その化学的安定性のため、
接着や樹脂塗装を行う場合等には接着強度が確保できな
いという問題があった。However, due to its chemical stability,
There has been a problem that the bonding strength cannot be secured when performing bonding or resin coating.
【0007】その改善策として、「金属被膜+化成処
理」という技術が提案されている(特開昭62−602
12号公報、特開昭63−110707号公報、特開平
1−223712号公報、特開平4−144101号公
報、特開平4−276603号公報)。As a remedy, a technique called "metal coating + chemical conversion treatment" has been proposed (JP-A-62-602).
12, JP-A-63-110707, JP-A-1-223712, JP-A-4-144101, JP-A-4-276603).
【0008】具体的には、上記特開昭62−60212
号公報には、Nd磁石上にAlメッキ層を施し、その表
面をショットピーニング処理し、更にその上にクロメー
ト処理を行い、耐食性を向上させる技術が開示されてい
る。また、特開昭63−110707号公報には、Nd
磁石上にNiめっき層を形成し、このNiめっき層表面
をクロメート処理し、その上に樹脂層を形成することに
より、耐食性の向上および樹脂層の密着性を向上させ、
脱落防止を図る技術が開示されている。また、特開平1
−223712号公報には、Nd磁石表面をショットプ
ラストで処理し、その表面にZn合金めっき層を施し、
更にこのメッキ層表面をクロメート処理した上で樹脂層
を形成し、これにより耐塩水性、密着性を向上させる技
術が開示されている。また、特開平4−144101号
公報には、Nd磁石上にNiめっき層を施し、そのメッ
キ層上にクロム酸塩被膜を形成し、耐食性を向上させる
技術が開示されている。また、特開平4−276603
号公報には、Nd磁石上にNiめっき層を施し、その上
に強い撥水性を有するクロム酸塩被膜を形成し、耐食性
を改善する技術が開示されている。Specifically, the above-mentioned Japanese Patent Application Laid-Open No. 62-60212 is disclosed.
Japanese Patent Application Laid-Open Publication No. Hei 11 (1995) discloses a technique for improving the corrosion resistance by applying an Al plating layer on an Nd magnet, performing a shot peening treatment on the surface thereof, and further performing a chromate treatment thereon. JP-A-63-110707 discloses Nd.
By forming a Ni plating layer on the magnet, performing a chromate treatment on the surface of the Ni plating layer, and forming a resin layer thereon, to improve the corrosion resistance and the adhesion of the resin layer,
A technique for preventing dropout is disclosed. Also, Japanese Patent Application Laid-Open
No. 223712 discloses that the surface of an Nd magnet is treated with a shot blast, and a Zn alloy plating layer is applied to the surface.
Further, a technique has been disclosed in which a resin layer is formed after the plating layer surface is subjected to a chromate treatment, thereby improving salt water resistance and adhesion. Also, Japanese Patent Application Laid-Open No. 4-144101 discloses a technique in which a Ni plating layer is provided on an Nd magnet and a chromate film is formed on the Ni plating layer to improve corrosion resistance. Further, Japanese Patent Application Laid-Open No. 4-276603
Japanese Patent Application Laid-Open Publication No. H11-163873 discloses a technique in which a Ni plating layer is formed on an Nd magnet, and a chromate film having strong water repellency is formed thereon to improve corrosion resistance.
【0009】前記のように、めっき表面の処理方法とし
ては、「クロメート処理」に関するものがほとんどであ
った。As described above, most of the methods for treating the plating surface relate to "chromate treatment".
【0010】クロメート処理は、樹脂コートの下地処理
としてはたいへん優れているが、被膜自体が熱に弱く1
00度前後の加熱により次第に脱水して不溶性となり、
被膜に亀裂が生じCr6+による補修効果はなくなり、耐
食性が低下するといわれている。また、処理直後のクロ
メート被膜は優れた塗装性能、接着性能を示すが、時間
の経過とともに撥水性が強くなり、塗装不良、接着不良
を起こす場合がある。従って、クロメート処理は、特に
接着性および耐食性の面から最終表面処理としては不向
きであるといえる。The chromate treatment is very excellent as a base treatment for a resin coat, but the coating itself is weak to heat.
By heating around 00 degrees, it gradually dehydrates and becomes insoluble,
It is said that the coating cracks and the repair effect by Cr 6+ is lost, and the corrosion resistance is reduced. In addition, the chromate film immediately after the treatment shows excellent coating performance and adhesion performance, but the water repellency becomes stronger with the passage of time, which may cause poor coating and poor adhesion. Therefore, it can be said that the chromate treatment is not suitable as a final surface treatment particularly from the viewpoints of adhesiveness and corrosion resistance.
【0011】ところが、永久磁石にあっては、回路基板
等に接着剤により接着し、使用することが多いので、接
着剤による接着性の改善が望まれていた。However, permanent magnets are often used after being bonded to a circuit board or the like by means of an adhesive, and thus it has been desired to improve the adhesiveness of the permanent magnet.
【0012】一方、「リン酸塩処理」の報告はNd系磁
石については、「 Paper No.W3.1 Presented at the Ele
0nth International Workshop on Rare-Earth Magnets
andTheir Applications,Pittsburgh,PA,21-24 Octobe
r,1990.(Proceedings Book:Carnegie Mellon Universit
y,Pittsburgh,PA 15213,USA). 」にて報告されている
が、内容としては磁石体表面にリン酸亜鉛処理を行い、
さらに樹脂塗装を行う場合のリン酸亜鉛の条件等につい
て詳細に書かれたものである。そして、Niめっき上に
も応用可能であり、密着性、耐食性を向上させるとして
いるが、Niめっきの場合のリン酸亜鉛処理についての
記載はそれにとどまるものであった。[0012] On the other hand, the report of “phosphate treatment” is described in “Paper No. W3.1 Presented at the Ele” for Nd-based magnets.
0nth International Workshop on Rare-Earth Magnets
andTheir Applications, Pittsburgh, PA, 21-24 Octobe
r, 1990. (Proceedings Book: Carnegie Mellon Universit
y, Pittsburgh, PA 15213, USA).
Further, it describes in detail the conditions and the like of zinc phosphate when performing resin coating. It is also applicable to Ni plating and improves the adhesion and corrosion resistance. However, the description of the zinc phosphate treatment in the case of Ni plating is limited thereto.
【0013】このように、「金属被膜+化成処理」とい
う組合わせは、金属被膜上に樹脂塗装を行なう場合の金
属被膜と樹脂の密着性向上と耐食性の向上を目的として
いる。As described above, the combination of “metal film + chemical conversion treatment” aims at improving the adhesion between the metal film and the resin and the corrosion resistance when a resin coating is performed on the metal film.
【0014】[0014]
【発明が解決しようとする課題】接着性という面から前
記の「Niめっき層+クロメート皮膜層」を見た場合、
改善点はクロメート皮膜層の形成時の濡れ性の向上だけ
で、構造的、形態的には何の効果もないため、親和性の
よい接着剤を選択しなければならないという欠点があ
る。In view of the above “Ni plating layer + chromate film layer” from the viewpoint of adhesiveness,
The only improvement is the improvement of the wettability during the formation of the chromate film layer, and there is no structural or morphological effect. Therefore, there is a disadvantage that an adhesive having good affinity must be selected.
【0015】また、従来のクロメート皮膜層は前述した
ように耐熱性の問題もあるため、使用環境が高温である
ような用途には特に効果が期待できず、場合によっては
悪影響を及ぼすおそれもある。Further, the conventional chromate film layer also has the problem of heat resistance as described above, so that it cannot be expected to be particularly effective in applications where the use environment is at a high temperature, and in some cases, it may have an adverse effect. .
【0016】本発明は、クロメートよりも耐熱性に優
れ、接着性において濡れ性だけではなく構造的、形態的
な効果も併せ持つことにより、接着性の著しい向上をも
たらす永久磁石を提供することを目的とする。It is an object of the present invention to provide a permanent magnet which is superior in heat resistance to chromate and has not only wettability but also structural and morphological effects in adhesiveness, thereby significantly improving adhesiveness. And
【0017】[0017]
【課題を解決するための手段】このような目的は、下記
(1)〜(5)の本発明により達成される。 (1)R(ただし、RはYを含む希土類元素のうち少な
くとも1種以上)、T(ただし、TはFeまたはFeお
よびCo)およびBを含有し、実質的に正方晶系の主相
を有する永久磁石体表面にNiめっき層を有し、このN
iめっき層上にリン酸亜鉛被膜層が形成された構造を有
し、かつ前記リン酸亜鉛被膜のZn/Niが、重量比で
8以上30以下であることを特徴とする永久磁石。 (2)前記リン酸亜鉛被膜の膜厚が0.1μm 以上10
μm 以下である上記(1)に記載の永久磁石。 (3)前記Niめっき層がスルファミン酸浴により設層
される上記(2)または(3)に記載の永久磁石。 (4)上記(1)ないし(3)のいずれかの永久磁石の
製造方法であって、前記リン酸亜鉛皮膜層を形成する前
に、Niめっき層表面を可溶性フッ化物を含む酸で処理
することを特徴とする永久磁石の製造方法。 (5)Niめっき層を形成する前に、永久磁石体表面
を、アルドン酸またはその塩と硝酸とを含有する処理液
で処理する上記(4)の永久磁石の製造方法。This and other objects are achieved by the present invention which is defined below as (1) to (5). (1) R (where R is at least one of rare earth elements including Y), T (where T is Fe or Fe and Co) and B, and a substantially tetragonal main phase Having a Ni plating layer on the surface of the permanent magnet body
A permanent magnet having a structure in which a zinc phosphate coating layer is formed on an i-plated layer, and wherein the zinc phosphate coating has a Zn / Ni weight ratio of 8 or more and 30 or less. (2) The thickness of the zinc phosphate coating is 0.1 μm or more and 10 or more.
The permanent magnet according to the above (1), which is not more than μm. (3) The permanent magnet according to (2) or (3), wherein the Ni plating layer is provided by a sulfamic acid bath. (4) The method for producing a permanent magnet according to any one of the above (1) to (3), wherein the surface of the Ni plating layer is treated with an acid containing soluble fluoride before forming the zinc phosphate coating layer. A method for producing a permanent magnet, comprising: (5) The method for producing a permanent magnet according to the above (4), wherein the surface of the permanent magnet body is treated with a treatment solution containing aldonic acid or a salt thereof and nitric acid before forming the Ni plating layer.
【0018】[0018]
【作用および効果】本発明では、R−T−B系永久磁石
体表面に、Niめっき層を有し、このNiめっき層上に
リン酸亜鉛被膜層が形成されている。そして、このリン
酸亜鉛被膜のZn/Niを、重量比で8以上30以下に
設定することにより、構成する各層間の密着性を向上さ
せるとともに、接着剤を用いての接着性を向上させるこ
とができる。しかも、本発明の永久磁石体は、耐食性が
向上し、信頼性が向上した。In the present invention, a Ni-plated layer is provided on the surface of the RTB-based permanent magnet body, and a zinc phosphate coating layer is formed on the Ni-plated layer. By setting Zn / Ni of the zinc phosphate coating to a weight ratio of 8 or more and 30 or less, the adhesion between the constituent layers is improved, and the adhesion using an adhesive is improved. Can be. Moreover, the permanent magnet body of the present invention has improved corrosion resistance and reliability.
【0019】[0019]
【具体的構成】以下、本発明の具体的構成について詳細
に説明する。本発明においては永久磁石に保護層を設層
する前に、所定の処理液を用いて前処理を行う。[Specific Configuration] Hereinafter, a specific configuration of the present invention will be described in detail. In the present invention, before forming the protective layer on the permanent magnet, a pretreatment is performed using a predetermined treatment liquid.
【0020】めっき前処理に用いる酸としては、塩酸、
硫酸等の非酸化性の酸が用いられることが多い。しか
し、特に永久磁石が希土類元素を含む場合には、これら
の酸を用いて処理を行うと、酸により発生する水素が、
永久磁石表面に吸蔵され、吸蔵部位が脆化して、多量の
粉状未溶解物が発生する。この粉状未溶解物は、保護層
の欠陥の原因となったり、密着性低下を引き起こしたり
するので、できれば、これらの非酸化性の酸は処理液に
含有させないことが好ましい。従って、用いる酸として
は水素の発生の少ない酸化性の酸である硝酸を用いるこ
とが好ましい。硝酸を用いることにより、その酸化作用
で磁石表面に化学エッチングが施され、肉眼では確認不
可能な程度の微細な凹凸構造が形成される。The acid used for the plating pretreatment is hydrochloric acid,
A non-oxidizing acid such as sulfuric acid is often used. However, particularly when the permanent magnet contains a rare earth element, when the treatment is performed using these acids, hydrogen generated by the acids becomes
It is occluded on the surface of the permanent magnet, the occluded site is embrittled, and a large amount of undissolved powder is generated. Since this powdery undissolved substance causes a defect in the protective layer or causes a decrease in adhesion, it is preferable that these non-oxidizing acids are not contained in the treatment liquid if possible. Therefore, it is preferable to use nitric acid, which is an oxidizing acid that generates little hydrogen, as the acid to be used. By using nitric acid, the surface of the magnet is chemically etched by its oxidizing action, and a fine uneven structure that cannot be visually confirmed is formed.
【0021】本発明では処理液に、この硝酸のほかに、
アルドン酸またはその塩を含有させる。In the present invention, in addition to this nitric acid,
Contains aldonic acid or a salt thereof.
【0022】このアルドン酸またはその塩を含有させる
と、硝酸により溶出したFeイオンとアルドン酸塩が安
定なキレート化合物を形成し、Feよりイオン化傾向の
大きいNdの遊離Feイオンとの置換反応による溶解を
抑えることができる。したがって、アルドン酸やその塩
を添加することにより、硝酸のみでは局所的および突発
的に起る化学エッチングが、より穏やかに進行し、磁石
表面に、均質で、局所的に急激に深い凹部が存在しな
い、微細で均質な凹凸構造が形成され、保護層の密着性
を向上することができる。When this aldonic acid or a salt thereof is contained, the Fe ion eluted by nitric acid and the aldonic acid salt form a stable chelate compound, and dissolution by substitution reaction with free Fe ion of Nd having a higher ionization tendency than Fe. Can be suppressed. Therefore, by adding aldonic acid or its salt, the chemical etching that occurs locally and suddenly with nitric acid alone proceeds more gently, and there is a uniform, locally sharply deep recess on the magnet surface. No, a fine and uniform uneven structure is formed, and the adhesion of the protective layer can be improved.
【0023】そして、このような密着性の向上は、アル
ドン酸またはその塩によって選択的に実現し、他のキレ
ート剤、例えばクエン酸、酒石酸等では実現しない。Such an improvement in adhesion can be selectively realized by aldonic acid or a salt thereof, and cannot be realized by other chelating agents such as citric acid and tartaric acid.
【0024】このような前処理による磁石体の溶解量
は、表面から、平均厚みで5μm 以上、より好ましく
は、10〜15μm とするのが好適である。5μm 未満
の溶解量では磁石体表面の加工による変質層、酸化層を
完全に除去することができないために十分な密着性が得
られない。The amount of dissolution of the magnet body by such pretreatment is preferably 5 μm or more, more preferably 10 to 15 μm in average thickness from the surface. If the amount of dissolution is less than 5 μm, a deteriorated layer and an oxidized layer due to the processing of the magnet body surface cannot be completely removed, so that sufficient adhesion cannot be obtained.
【0025】また、凹凸の平均深さ(谷から山までの深
さ)は、1〜5μm 程度が好ましい。また凹凸の平均ピ
ッチは10〜50μm 程度であることが好ましい。これ
らにより密着性が向上する。The average depth of the unevenness (the depth from the valley to the peak) is preferably about 1 to 5 μm. The average pitch of the unevenness is preferably about 10 to 50 μm. These improve the adhesion.
【0026】このような前処理に用いられる処理液の硝
酸の濃度は1規定以下、特に0.6規定以下、より好ま
しくは0.5規定以下とするのが望ましい。硝酸濃度が
1規定を越える場合には、磁石体の溶解速度が極めて早
くなり、溶解量の制御が困難で所望の寸法精度の製品を
得ることができない。またバレル処理のような大量処理
に際しては処理状態のバラツキも大きくなる。また、硝
酸濃度がうすいと、液量が多くなりすぎ、溶解量が不足
してくる。このため硝酸濃度は1規定以下、特に好まし
くは0.05〜0.5規定以下が望ましい。It is desirable that the concentration of nitric acid in the treatment liquid used for such pretreatment is 1 N or lower, particularly 0.6 N or lower, more preferably 0.5 N or lower. When the nitric acid concentration exceeds 1N, the dissolution rate of the magnet body becomes extremely fast, and it is difficult to control the amount of dissolution, so that a product having desired dimensional accuracy cannot be obtained. Further, in the case of a large amount of processing such as barrel processing, the dispersion of the processing state becomes large. In addition, when the nitric acid concentration is low, the amount of the solution becomes too large, and the amount of dissolution becomes insufficient. For this reason, the nitric acid concentration is desirably 1 normal or less, particularly preferably 0.05 to 0.5 normal or less.
【0027】処理液に添加されるアルドン酸またはその
塩の添加量は、処理時に溶解するFeと等モル以上とす
るのが好ましい。アルドン酸やその塩の添加量が処理終
了時に処理液に溶解しているFe量の等モル未満である
と、凹凸形成作用が十分でなく、密着性が低くなり好ま
しくない。The amount of aldonic acid or a salt thereof added to the treatment solution is preferably at least equimolar to Fe dissolved during the treatment. If the amount of the aldonic acid or salt thereof is less than the equimolar amount of Fe dissolved in the treatment liquid at the end of the treatment, the effect of forming irregularities is not sufficient, and the adhesion is undesirably low.
【0028】処理終了時のFe溶解量は、1〜10g/リ
ットル程度とする。従ってアルドン酸またはその塩は、
一般に0.02〜0.2モル/リットル程度含有させ
る。すなわち、バッチ処理により溶解処理を行い、この
ようなFe溶解量となったとき処理液を廃棄すればよ
い。The amount of Fe dissolved at the end of the treatment is about 1 to 10 g / liter. Thus, aldonic acid or a salt thereof is
Generally, about 0.02 to 0.2 mol / liter is contained. That is, the dissolution treatment is performed by batch processing, and when the Fe dissolution amount is reached, the treatment liquid may be discarded.
【0029】アルドン酸またはその塩はHOCH2 (C
HOH)nCOOY(YはHまたはカチオン)で示され
る化合物であり、例えばn=3〜5のグルコン酸、アラ
ボン酸、マンノン酸、ガラクトン酸、ヘプトン酸等いず
れであってもよい。この場合、特に純度の高い試薬を入
手可能な点では、これらのアルカリ金属塩が好ましい。Aldonic acid or a salt thereof is HOCH 2 (C
HOH) nCOOY (Y is H or a cation), and may be, for example, any of gluconic acid, arabonic acid, mannonic acid, galactonic acid, heptonic acid and the like in which n = 3 to 5. In this case, these alkali metal salts are preferable because a highly pure reagent can be obtained.
【0030】これらのうち、特に、グルコン酸ナトリウ
ム、グルコン酸カリウム、ヘプトン酸ナトリウム等は最
も好適に使用でき、粉状未溶解物を増加させることな
く、均一で微細な凹凸を形成することができる。Of these, sodium gluconate, potassium gluconate, sodium heptanoate and the like can be most preferably used, and uniform and fine irregularities can be formed without increasing powdery undissolved matter. .
【0031】酸処理液には、アルドン酸やその塩以外
に、例えばクエン酸、酒石酸、オキシ酢酸等のヒドロキ
シカルボン酸の塩が加えられることがあるが、これらを
添加した場合にはアルドン酸やその塩を加えた場合に認
められる微細な凹凸の形成作用が得られず、本発明にお
けるような密着性の改善が達成できない。また、粉状未
溶解物量も増加する。In addition to aldonic acid and salts thereof, for example, salts of hydroxycarboxylic acids such as citric acid, tartaric acid and oxyacetic acid may be added to the acid treatment solution. The effect of forming fine irregularities, which is observed when the salt is added, cannot be obtained, and the improvement in adhesion as in the present invention cannot be achieved. In addition, the amount of powdery undissolved matter also increases.
【0032】さらに、酸処理液には、ラウリル硫酸ナト
リウム、ポリオキシエチレンノニルフェニルエーテル等
の界面活性剤が加えられる場合があるが、本発明の処理
液にこれらを加えた場合には、粉状未溶解物の増加を招
き、また処理後の磁石体表面への吸着も起こって密着性
を逆に低下させるため望ましくない。Furthermore, surfactants such as sodium lauryl sulfate and polyoxyethylene nonyl phenyl ether may be added to the acid treatment liquid, but when these are added to the treatment liquid of the present invention, powdery substances may be added. This is not desirable because it causes an increase in undissolved substances and also causes adsorption to the surface of the magnet body after the treatment, thereby deteriorating the adhesion.
【0033】処理液による処理温度は40℃以下、特に
30℃以下、より好ましくは20℃以下とするのがよ
い。処理温度が40℃を越える場合には、硝酸による磁
石体溶解作用が優勢となり、アルドン酸塩の添加効果が
消失してしまうため、好ましくない。なお、処理時間は
処理液組成、温度、所望のエッチング量によって適宜調
整すればよいが通常1〜20分間とするのが好ましい。The processing temperature with the processing solution is preferably 40 ° C. or lower, particularly 30 ° C. or lower, more preferably 20 ° C. or lower. If the treatment temperature exceeds 40 ° C., the dissolving action of the magnet by the nitric acid becomes dominant, and the effect of adding the aldone salt is lost, which is not preferable. The treatment time may be appropriately adjusted depending on the composition of the treatment liquid, the temperature, and the desired etching amount, but is usually preferably 1 to 20 minutes.
【0034】このような、前処理を行なった磁石体表面
から少量の未溶解物および、残存酸成分を完全に除去す
るため、超音波を使用した洗浄を実施することが好まし
い。この超音波洗浄は、イオン交換水等の塩素イオン含
有量の少ない水、若しくはそれに残存酸の中和を目的と
した少量の塩基性化合物を溶解した溶液中で行なうのが
望ましい。洗浄液に塩素イオンが含まれると磁石表面に
錆が発生する原因となる。In order to completely remove a small amount of undissolved substances and residual acid components from the surface of the pretreated magnet body, it is preferable to perform cleaning using ultrasonic waves. This ultrasonic cleaning is desirably performed in water having a low chlorine ion content, such as ion-exchanged water, or a solution in which a small amount of a basic compound is dissolved for the purpose of neutralizing the residual acid. If chloride ions are contained in the cleaning solution, rust may be generated on the magnet surface.
【0035】また必要に応じて、前記超音波洗浄の前後
に同様な水あるいは塩基性水溶液による浸漬洗浄を行な
ってもよい。さらに、前記前処理を行なう前に磁石体の
加工方法・保存状態に応じて、機械的な研磨処理およ
び、めっき前処理として通常行なわれる浸漬または電解
脱脂処理もしくはアルカリ脱錆処理を行なっても良い。If necessary, the same immersion cleaning with water or a basic aqueous solution may be performed before and after the ultrasonic cleaning. Further, before performing the pretreatment, mechanical polishing and immersion or electrolytic degreasing or alkali derusting, which are usually performed as plating pretreatment, may be performed according to the processing method and storage state of the magnet body. .
【0036】なお、前記前処理においては、超音波印加
を、行わないことが好ましい。凹凸が大きくなりすぎる
場合があるからである。In the pretreatment, it is preferable not to apply ultrasonic waves. This is because the unevenness may be too large.
【0037】洗浄を行った磁石表面上に電気めっきによ
り保護層を設層する。保護膜を電気めっきにより設層す
ることにより、量産性に優れた高性能耐食膜を形成する
ことができる。A protective layer is formed on the cleaned magnet surface by electroplating. By forming the protective film by electroplating, a high-performance corrosion-resistant film having excellent mass productivity can be formed.
【0038】このようにして形成される保護層はNiを
主成分とすることが好ましい。The protection layer thus formed preferably contains Ni as a main component.
【0039】保護層としてNiを用いることにより、保
護層の強度を高め、優れた防錆効果を得ることができ
る。このようなNiの電気めっきに用いるめっき浴とし
ては、塩化ニッケル成分を含有しないワット浴、スルフ
ァミン酸浴や、ホウフッ化浴、臭化ニッケル浴等が挙げ
られる。ただし、この場合陽極の溶解が少なくなるた
め、ニッケルイオンを浴に補充する必要が生じる。この
ニッケルイオンは、硫酸ニッケルあるいは臭化ニッケル
の溶液として補充するのが好ましい。By using Ni as the protective layer, the strength of the protective layer can be increased and an excellent rust prevention effect can be obtained. Examples of the plating bath used for the electroplating of Ni include a Watt bath containing no nickel chloride component, a sulfamic acid bath, a fluorinated bath, and a nickel bromide bath. However, in this case, since the dissolution of the anode is reduced, it is necessary to replenish the bath with nickel ions. The nickel ions are preferably replenished as a solution of nickel sulfate or nickel bromide.
【0040】例えば、これらのうちでは、より高い剥離
強度を示すスルファミン酸浴を用いることが好ましく、
以下の組成のものが挙げられる。For example, among these, it is preferable to use a sulfamic acid bath exhibiting higher peel strength.
The following composition is mentioned.
【0041】 Ni(NH2 SO3 )2 ・4H2 O 150〜600g/リットル NiBr2 ・6H2 O 0〜30g/リットル ホウ酸 30〜60g/リットルNi (NH 2 SO 3 ) 2 .4H 2 O 150-600 g / l NiBr 2 .6H 2 O 0-30 g / l Boric acid 30-60 g / l
【0042】この際、浴中の水も塩素を含有しないこと
が好ましく、浴中の塩素量は100ppm 以下とすること
が好ましい。このように、めっき浴から塩素成分を除く
ことによって主に経時によるフクレの発生を防止するこ
とができる。At this time, the water in the bath preferably does not contain chlorine, and the chlorine content in the bath is preferably 100 ppm or less. As described above, by removing the chlorine component from the plating bath, it is possible to prevent blisters mainly due to aging.
【0043】めっき条件は、pH3〜6、特に好ましくは
4.0〜5.0、温度30〜70℃、電流密度0.1〜
10A/m2程度とすればよい。pHがこの範囲未満では、磁
石体が溶解してしまい、pHがこの範囲をこえると水酸化
ニッケルの沈澱が折出して、めっき膜が脆くなってしま
う。また、電流密度がこの範囲未満では、めっき膜中へ
の、例えばCu、Co等の不純物の共折が多く、外観の
悪い耐食性の低い膜となってしまい、電流密度がこの範
囲をこえると陰極近傍での水素発生が増大して磁性体に
吸蔵され、密着性低下の原因となる。The plating conditions are pH 3 to 6, particularly preferably 4.0 to 5.0, temperature 30 to 70 ° C., and current density 0.1 to 0.1.
It may be about 10 A / m 2 . If the pH is lower than this range, the magnet body will be dissolved, and if the pH is higher than this range, nickel hydroxide precipitates and the plating film becomes brittle. If the current density is less than this range, impurities such as Cu, Co and the like in the plating film are often folded, resulting in a film having poor appearance and low corrosion resistance. Hydrogen generation in the vicinity increases and is absorbed by the magnetic material, causing a decrease in adhesion.
【0044】本発明においては、必要に応じてめっき技
術ガイドブック(東京鍍金材料共同組合発行)115ペ
ージに記載されているような自然電位の異なる公知のダ
ブルニッケルめっき、トリニッケルめっき等の耐食性向
上を目的とした多層めっきも好ましく用いることができ
る。なお、塩化物を含む通常のワット浴、スルファミン
浴を用いた場合でも本発明の密着性の向上、耐食性の向
上効果を得ることができる。In the present invention, if necessary, the improvement of the corrosion resistance of known double nickel plating, trinickel plating and the like having different natural potentials as described on page 115 of the plating technique guidebook (published by Tokyo Plating Materials Cooperative Union). Multi-layer plating for the purpose can also be preferably used. In addition, even when a normal watt bath or a sulfamine bath containing a chloride is used, the effects of improving the adhesion and the corrosion resistance of the present invention can be obtained.
【0045】これらの電気めっきによる保護層の設層に
際しては磁石体の寸法・形状に応じてラックめっき法ま
たはバレルめっき法を適宜適用する。When the protective layer is formed by electroplating, a rack plating method or a barrel plating method is appropriately applied according to the size and shape of the magnet body.
【0046】一般に、ラックめっき法で処理されるよう
な寸法の大きい磁石体では無欠陥な保護層を必要とする
面積が広いため、保護層厚みを厚くする必要があり、電
気めっきのみによる保護層の望ましい厚みは20〜30
μm である。一方、バレルめっき法で大量に処理される
ような表面積が小さく、自重数十g 以下の磁石体におけ
る電気めっきのみによる望ましい保護層厚みは10〜2
0μm である。In general, a magnet body having a large size which is processed by the rack plating method requires a large area requiring a defect-free protective layer. Therefore, it is necessary to increase the thickness of the protective layer. The preferred thickness is 20-30
μm. On the other hand, the desirable protective layer thickness by electroplating only for a magnet body having a small surface area such as being processed in large quantities by barrel plating and having a weight of several tens g or less is 10 to 2 g.
0 μm.
【0047】[リン酸亜鉛処理の前処理]Niめっき自
体が非常に安定なため(反応性が低いため)、リン酸亜
鉛被膜の前処理は重要である。このため活性化酸浸漬処
理により、Niめっき表面の酸化被膜を除去し活性化さ
せた後、表面調整およびリン酸亜鉛処理を行うことによ
り密着性の良好な被膜が得られる。使用する処理液とし
ては、一般的なめっき用活性化処理剤でよいが、望まし
くは可溶性フッ化物を含む酸が適している。なぜなら
ば、一般の活性化酸処理剤では酸化したNi表面の活性
化を主目的としているが、実際にはNiめっき終了後め
っき最表面にめっき浴成分の光沢剤等が付着し、これが
以後のコーティングに対し密着不良を引き起こす可能性
が大きいため、このような有機物等を除去するためには
可溶性フッ化物を含む酸が適している。しかしながら、
めっき浴成分の光沢剤等に有機物を使用しない場合に
は、活性化処理は不要となる。また表面調整について
は、リン酸亜鉛の結晶成長を助け結晶を緻密かつ微細に
できるため実施することが望ましく、より好ましくはア
ルカリ性コロイドチタンを含む処理剤が適している。[Pretreatment of Zinc Phosphate Treatment] Since the Ni plating itself is very stable (because of low reactivity), the pretreatment of the zinc phosphate coating is important. Therefore, after the oxide film on the Ni plating surface is removed and activated by the activating acid immersion treatment, the surface is adjusted and zinc phosphate treatment is performed to obtain a film having good adhesion. The treatment solution to be used may be a general activation treatment agent for plating, but is preferably an acid containing a soluble fluoride. This is because the general purpose of the activated acid treatment agent is to mainly activate the oxidized Ni surface, but in actuality, the brightening agent of the plating bath component adheres to the outermost surface of the plating after the completion of the Ni plating, and this is the subsequent phenomenon. Since the possibility of causing poor adhesion to the coating is great, an acid containing a soluble fluoride is suitable for removing such organic substances and the like. However,
When an organic substance is not used as a brightener or the like of a plating bath component, the activation treatment is unnecessary. The surface adjustment is desirably performed because the crystal growth of zinc phosphate is assisted and the crystal can be made dense and fine, and a treatment agent containing alkaline colloidal titanium is more preferable.
【0048】[リン酸亜鉛被膜]この発明で用いる処理
液の成分には、亜鉛イオン、リン酸イオン、単純フッ化
物、錯フッ化物、活性フッ化物および被膜化成促進剤等
が上げられる。被膜化成促進剤としては、亜硝酸イオ
ン、m−ニトロベンゼンスルホン酸イオン、過酸化水素
から選ばれる少なくとも1種が用いられる。これらの好
ましい濃度(かっこ内はより好ましい濃度)は、たとえ
ば、次のとおりである。[Zinc phosphate coating] The components of the treatment liquid used in the present invention include zinc ions, phosphate ions, simple fluorides, complex fluorides, active fluorides and film formation accelerators. As the film formation accelerator, at least one selected from nitrite ions, m-nitrobenzenesulfonic acid ions, and hydrogen peroxide is used. These preferred concentrations (more preferred concentrations in parentheses) are, for example, as follows.
【0049】亜鉛イオン :0.15〜3.0(0.4
5〜3.0)g/l リン酸イオン:7.5〜60(15〜45)g/l 亜硝酸イオン:0.015〜0.75(0.015〜
0.6)g/l m−ニトロベンゼンスルホン酸イオン:0.075〜
7.5(0.15〜6)g/l 過酸化水素(H2 O2 100%換算):0.75〜15
(1.5〜12)g/lZinc ion: 0.15 to 3.0 (0.4
5 to 3.0) g / l phosphate ion: 7.5 to 60 (15 to 45) g / l nitrite ion: 0.015 to 0.75 (0.015 to 15)
0.6) g / l m-nitrobenzenesulfonic acid ion: 0.075 to
7.5 (0.15~6) g / l of hydrogen peroxide (H 2 O 2 100% conversion): 0.75 to 15
(1.5-12) g / l
【0050】遊離酸度(FA)を1.0〜4.0の範囲
に調節するのが好ましい。It is preferable to adjust the free acidity (FA) in the range of 1.0 to 4.0.
【0051】亜鉛イオン濃度が0.15g/l 未満ではニ
ッケル表面に均一なリン酸亜鉛被膜が生成せず、スケが
多くなることがある。また、亜鉛イオン濃度が3.0g/
l を越えると均一なリン酸亜鉛被膜は生成するが、被膜
中のZn/Niの比率が高くなりすぎて、Niめっきと
リン酸亜鉛被膜の密着性が不十分となってしまう。If the zinc ion concentration is less than 0.15 g / l, a uniform zinc phosphate film is not formed on the nickel surface, and the scale may increase. The zinc ion concentration was 3.0 g /
If it exceeds l, a uniform zinc phosphate coating will be formed, but the Zn / Ni ratio in the coating will be too high and the adhesion between the Ni plating and the zinc phosphate coating will be insufficient.
【0052】リン酸イオン濃度が7.5g/l 未満では不
均一被膜を形成しやすく、また60g/l を越えても効果
の向上が期待できない。If the phosphate ion concentration is less than 7.5 g / l, a non-uniform film is easily formed, and if it exceeds 60 g / l, no improvement in the effect can be expected.
【0053】被膜化成促進剤の濃度が前記範囲よりも低
いとニッケル表面で十分な被膜化成ができず、また、前
記範囲を越えるとニッケルの不動態化を招き被膜が生成
しない。When the concentration of the film formation promoting agent is lower than the above range, sufficient film formation cannot be performed on the nickel surface, and when the concentration exceeds the above range, passivation of nickel is caused and no film is formed.
【0054】FAは処理液10mlをプロムフェノールブ
ルーを指示薬として中和するのに要する0.1N−Na
OHの消費ml数で定義されるが、0.1未満であるとニ
ッケル表面に均一なリン酸亜鉛被膜が形成されず、4.
0を越えると被膜中のZn/Niの比率が低くなりすぎ
て良好なリン酸亜鉛被膜が得られない。(リン片状の結
晶が得られず、接着性に対する構造的、形態的効果が十
分得られない。)FA is 0.1 N-Na required to neutralize 10 ml of the treatment solution using bromophenol blue as an indicator.
It is defined by the number of consumed OH ml. If it is less than 0.1, a uniform zinc phosphate film is not formed on the nickel surface.
If it exceeds 0, the ratio of Zn / Ni in the coating becomes too low, so that a good zinc phosphate coating cannot be obtained. (Scaly flake-like crystals cannot be obtained, and sufficient structural and morphological effects on the adhesiveness cannot be obtained.)
【0055】またこの発明で用いられる処理液は、上記
成分のほかにマンガンイオン、ニッケルイオンを含有さ
せてもよい。The treatment liquid used in the present invention may contain manganese ions and nickel ions in addition to the above components.
【0056】また処理温度は20〜70℃が好ましく、
35〜60℃がより好ましい。この範囲よりも低いと被
膜化成性が悪く、長時間の処理を要することになる。ま
た、この範囲よりも高いと被膜化成促進剤の分解および
処理液の沈澱発生などで処理液のバランスがくずれやす
く、良好な被膜が得られにくい。The processing temperature is preferably 20 to 70 ° C.
35-60 degreeC is more preferable. If it is lower than this range, the film-forming property is poor and a long-time treatment is required. On the other hand, if it is higher than this range, the balance of the processing solution tends to be lost due to decomposition of the film formation accelerator and precipitation of the processing solution, and it is difficult to obtain a good film.
【0057】リン酸亜鉛被膜中のZn/Niの重量比は
8〜30が望ましく、より好ましくは10〜20がよ
い。重量比が8未満であるとNiの比率が高く、Znの
比率が低すぎるため均一で良好な被膜が得られない(F
Aが4.0を越えた場合の理由と同じ)。また重量比が
30を越えると均一なリン酸亜鉛被膜は生成するが、N
iの比率が低すぎることより、Niめっきとリン酸亜鉛
の密着性が不十分となってしまう。The weight ratio of Zn / Ni in the zinc phosphate coating is preferably from 8 to 30, more preferably from 10 to 20. If the weight ratio is less than 8, the ratio of Ni is high and the ratio of Zn is too low, so that a uniform and good coating cannot be obtained (F
A is the same as when A exceeds 4.0). When the weight ratio exceeds 30, a uniform zinc phosphate film is formed,
When the ratio of i is too low, the adhesion between Ni plating and zinc phosphate becomes insufficient.
【0058】次に処理時間と膜厚の関係であるが、上記
範囲の浴組成で処理時間は3〜30分、より好ましくは
5〜15分である。3分未満では均一なリン酸亜鉛被膜
が得られず、30分を越えると被膜が厚くなりすぎて密
着性が低下する。Next, regarding the relationship between the processing time and the film thickness, the processing time is 3 to 30 minutes, more preferably 5 to 15 minutes, with the bath composition in the above range. If the time is less than 3 minutes, a uniform zinc phosphate film cannot be obtained, and if the time exceeds 30 minutes, the film becomes too thick and the adhesion is reduced.
【0059】従って、膜厚としては0.1〜10μm が
よく、より好ましくは0.5〜5μm である。Accordingly, the film thickness is preferably from 0.1 to 10 μm, more preferably from 0.5 to 5 μm.
【0060】本発明において保護層が表面に設層される
永久磁石体は、R(ただし、RはYを含む希土類元素の
1種以上)、FeおよびBを含有するものである。In the present invention, the permanent magnet body on which the protective layer is provided on the surface contains R (where R is one or more rare earth elements including Y), Fe and B.
【0061】R、FeおよびBの含有量は、 5.5at%≦R≦30at% 42at%≦Fe≦90at% 2at%≦B≦28at% であることが好ましい。The content of R, Fe and B is preferably 5.5 at% ≦ R ≦ 30 at% 42 at% ≦ Fe ≦ 90 at% 2 at% ≦ B ≦ 28 at%.
【0062】特に、永久磁石体を焼結法により製造する
場合、下記の組成であることが好ましい。In particular, when the permanent magnet body is manufactured by the sintering method, the following composition is preferable.
【0063】希土類元素Rとしては、Nd、Pr、H
o、Tbのうち少なくとも1種、あるいはさらに、L
a、Sm、Ce、Gd、Er、Eu、Pm、Tm、Y
b、Yのうち1種以上を含むものが好ましい。As the rare earth element R, Nd, Pr, H
o, at least one of Tb, or L
a, Sm, Ce, Gd, Er, Eu, Pm, Tm, Y
Those containing at least one of b and Y are preferable.
【0064】なお、Rとして2種以上の元素を用いる場
合、原料としてミッシュメタル等の混合物を用いること
もできる。When two or more elements are used as R, a mixture such as misch metal can be used as a raw material.
【0065】Rの含有量は、8〜30at%であることが
好ましい。The R content is preferably 8 to 30 at%.
【0066】8at%未満では、結晶構造がα−鉄と同一
構造の立方晶組織となるため、高い保磁力(iHc)が
得られず、30at%を超えると、Rリッチな非磁性相が
多くなり、残留磁束密度(Br)が低下する。If the content is less than 8 at%, a high coercive force (iHc) cannot be obtained since the crystal structure becomes a cubic structure having the same structure as that of α-iron, and if it exceeds 30 at%, many R-rich nonmagnetic phases are formed. And the residual magnetic flux density (Br) decreases.
【0067】Feの含有量は42〜90at%であること
が好ましい。The content of Fe is preferably 42 to 90 at%.
【0068】Feが42at%未満であるとBrが低下
し、90at%を超えるとiHcが低下する。When Fe is less than 42 at%, Br decreases, and when it exceeds 90 at%, iHc decreases.
【0069】Bの含有量は、2〜28at%であることが
好ましい。The B content is preferably 2 to 28 at%.
【0070】Bが2at%未満であると菱面体組織となる
ためiHcが不十分であり、28at%を超えるとBリッ
チな非磁性相が多くなるため、Brが低下する。If B is less than 2 at%, a rhombohedral structure is formed, resulting in insufficient iHc. If B exceeds 28 at%, the B-rich non-magnetic phase increases and Br decreases.
【0071】なお、Feの一部をCoで置換することに
より、磁気特性を損うことなく温度特性を改善すること
ができる。この場合、Co置換量がFeの50%を超え
ると磁気特性が劣化するため、Co置換量は50%以下
とすることが好ましい。By replacing part of Fe with Co, the temperature characteristics can be improved without impairing the magnetic characteristics. In this case, if the amount of Co substitution exceeds 50% of Fe, the magnetic properties deteriorate, so the amount of Co substitution is preferably set to 50% or less.
【0072】また、R、FeおよびBの他、不可避的不
純物としてNi、Si、Al、Cu、Ca等が全体の3
at%以下含有されていてもよい。In addition to R, Fe and B, Ni, Si, Al, Cu, Ca, etc.
at% or less may be contained.
【0073】さらに、Bの一部を、C、P、S、Cuの
うちの1種以上で置換することにより、生産性の向上お
よび低コスト化が実現できる。この場合、置換量は全体
の4at%以下であることが好ましい。また、保磁力の向
上、生産性の向上、低コスト化のために、Al、Ti、
V、Cr、Mn、Bi、Nb、Ta、Mo、W、Sb、
Ge、Sn、Zr、Ni、Si、Hf等の1種以上を添
加してもよい。この場合、添加量は総計で10at%以下
とすることが好ましい。Further, by substituting a part of B with one or more of C, P, S and Cu, it is possible to improve productivity and reduce costs. In this case, the substitution amount is preferably 4 at% or less of the whole. In order to improve coercive force, improve productivity, and reduce cost, Al, Ti,
V, Cr, Mn, Bi, Nb, Ta, Mo, W, Sb,
One or more of Ge, Sn, Zr, Ni, Si, Hf and the like may be added. In this case, it is preferable that the total amount is 10 at% or less.
【0074】本発明における永久磁石体は、実質的に正
方晶系の結晶構造の主相を有する。この主相の粒径は、
1〜100μm 程度であることが好ましい。そして、通
常、体積比で1〜50%の非磁性相を含むものである。The permanent magnet according to the present invention has a main phase having a substantially tetragonal crystal structure. The particle size of this main phase is
It is preferably about 1 to 100 μm. And it usually contains 1 to 50% of a non-magnetic phase by volume ratio.
【0075】このような永久磁石体は、前述した特開昭
61−185910号公報等に開示されている。Such a permanent magnet body is disclosed in the aforementioned Japanese Patent Application Laid-Open No. 61-185910.
【0076】上記のような永久磁石体は、以下に述べる
ような焼結法により製造されることが好ましい。まず、
所望の組成の合金を鋳造し、インゴットを得る。得られ
たインゴットを、スタンプミル等により粒径10〜10
0μm 程度に粗粉砕し、次いで、ボールミル等により
0.5〜5μm 程度の粒径に微粉砕する。The above-described permanent magnet body is preferably manufactured by a sintering method as described below. First,
An alloy having a desired composition is cast to obtain an ingot. The obtained ingot is subjected to a particle size of 10 to 10 using a stamp mill or the like.
The material is roughly pulverized to about 0 μm and then finely pulverized by a ball mill or the like to a particle size of about 0.5 to 5 μm.
【0077】得られた粉末を、好ましくは磁場中にて成
形する。この場合、磁場強度は10kOe 以上、成形圧力
は1〜5t/cm2 程度であることが好ましい。The obtained powder is molded preferably in a magnetic field. In this case, the magnetic field strength is preferably 10 kOe or more, and the molding pressure is preferably about 1 to 5 t / cm 2 .
【0078】得られた成形体を、1000〜1200℃
で0.5〜5時間焼結し、急冷する。なお、焼結雰囲気
は、Arガス等の不活性ガス雰囲気であることが好まし
い。この後、好ましくは不活性ガス雰囲気中で、500
〜900℃にて1〜5時間時効処理を行う。The obtained molded body was heated at 1000 to 1200 ° C.
And quenched for 0.5-5 hours. The sintering atmosphere is preferably an inert gas atmosphere such as Ar gas. After that, preferably in an inert gas atmosphere,
Perform aging treatment at ~ 900 ° C for 1-5 hours.
【0079】[0079]
【実施例】以下、本発明の具体的実施例を示し、本発明
をさらに詳細に説明する。EXAMPLES Hereinafter, the present invention will be described in more detail by showing specific examples of the present invention.
【0080】粉末治金法によって作成した27.4Nd
−3.0Dy−1.0B−bal.Fe(数字は重量
%)の組成をもつ焼結体をアルゴン雰囲気中で600℃
にて2時間時効処理を施し、直径23.5mm、厚さ3.
4mmの大きさの円盤状に加工し、更にバレル研磨処理に
より面取りを行って永久磁石を得た。27.4 Nd prepared by powder metallurgy
-3.0Dy-1.0B-bal. A sintered body having a composition of Fe (the number is% by weight) was heated at 600 ° C. in an argon atmosphere.
Aging treatment for 2 hours, diameter 23.5mm, thickness 3.
A permanent magnet was obtained by processing into a disk having a size of 4 mm and chamfering by barrel polishing.
【0081】上記試料100個を硝酸濃度:0.5N、
グルコン酸ナトリウム濃度:0.025モル/リットル
の処理液50リットルに10℃で3分間浸漬して表面層
を溶解した。平均溶解量は6μm であった。The above 100 samples were subjected to nitric acid concentration: 0.5N,
Sodium gluconate concentration: The surface layer was dissolved by immersion in 50 liters of a treatment solution having a concentration of 0.025 mol / liter at 10 ° C. for 3 minutes. The average amount dissolved was 6 μm.
【0082】上記処理済みの試料をイオン交換水中で超
音波洗浄した後、下記に示す組成・条件のスルファミン
酸めっき浴を用いてバレル法によりNiめっきを行っ
た。The treated sample was subjected to ultrasonic cleaning in ion-exchanged water, and then Ni plating was performed by a barrel method using a sulfamic acid plating bath having the following composition and conditions.
【0083】 Ni(NH2 SO3 )2 ・4H2 O 180g/l NiBr2 ・6H2 O 5g/l ホウ酸 45g/l LiNH2 SO3 200g/l 浴温度 50℃ pH 4.5Ni (NH 2 SO 3 ) 2 .4H 2 O 180 g / l NiBr 2 .6H 2 O 5 g / l Boric acid 45 g / l LiNH 2 SO 3 200 g / l Bath temperature 50 ° C. pH 4.5
【0084】平均陰極電流密度は、0.3A/dm2 、めっ
き膜の平均厚さは10μm とした。The average cathode current density was 0.3 A / dm 2 , and the average thickness of the plating film was 10 μm.
【0085】さらにアルカリ脱脂剤を用いて45℃で1
0分間浸漬処理を行い、次いで可溶性フッ化物を含む酸
(具体的には、日本マクダーミッド(株)製・メテック
スアシッドソルトM−629、120g/l )を用いて3
5℃で5分間浸漬し、Niめっき層表面の活性化処理を
行なった後、アルカリ性コロイドチタンを含む表面調整
剤にて室温で1分間浸漬処理を行った。Further, at 45 ° C. using an alkaline degreasing agent,
After immersion treatment for 0 minutes, the solution was treated with an acid containing a soluble fluoride (specifically, Metex Acid Salt M-629, manufactured by Nippon MacDermid Co., 120 g / l).
After immersion at 5 ° C. for 5 minutes to activate the surface of the Ni plating layer, immersion treatment was performed for 1 minute at room temperature with a surface conditioner containing alkaline colloidal titanium.
【0086】次に、下記に示す組成・条件のリン酸亜鉛
処理浴を用いて処理を行った。Next, treatment was carried out using a zinc phosphate treatment bath having the following composition and conditions.
【0087】 亜鉛イオン 1.5g/l リン酸イオン 25g/l 亜硝酸イオン 0.3g/l 単純フッ化物 HFで0.25g/l 錯フッ化物 H2 SiF6 で1.2g/l (マンガンイオン:0.8g/l 、ニッケルイオン:0.
8g/l ) 全酸度(TA):34、遊離酸度(FA):2.5、浴
温度:45℃、処理時間:10分Zinc ion 1.5 g / l Phosphate ion 25 g / l Nitrite ion 0.3 g / l Simple fluoride HF 0.25 g / l Complex fluoride H 2 SiF 6 1.2 g / l (manganese ion : 0.8 g / l, nickel ion: 0.
8g / l) Total acidity (TA): 34, free acidity (FA): 2.5, bath temperature: 45 ° C, treatment time: 10 minutes
【0088】そして、80℃、10分の乾燥を行った。
以上により、実施例1のサンプルを作製した。Then, drying was performed at 80 ° C. for 10 minutes.
Thus, a sample of Example 1 was produced.
【0089】また、リン酸亜鉛処理条件を表1に示すよ
うに種々変更して実施例2〜7のサンプルおよび比較例
1〜3のサンプルを作製した。Further, the samples of Examples 2 to 7 and the samples of Comparative Examples 1 to 3 were prepared by changing the zinc phosphate treatment conditions variously as shown in Table 1.
【0090】[0090]
【表1】 [Table 1]
【0091】また、以下の組成・条件のワット浴を用い
てバレル法によりNiめっきを行った他は実施例1と同
様にして実施例8のサンプルを作製した。A sample of Example 8 was prepared in the same manner as in Example 1 except that Ni plating was performed by a barrel method using a Watt bath having the following composition and conditions.
【0092】NiSO4 ・6H2 O 280g/l NiCl2 ・6H2 O 50g/l ホウ酸 45g/l 市販光沢剤(有機系) 15ml/l 浴温度 50℃ pH 4.5NiSO 4 .6H 2 O 280 g / l NiCl 2 .6H 2 O 50 g / l Boric acid 45 g / l Commercial brightener (organic) 15 ml / l Bath temperature 50 ° C. pH 4.5
【0093】平均陰極電流密度は0.3A/dm2 、めっき
膜の平均厚さは10μm とした。The average cathode current density was 0.3 A / dm 2 , and the average thickness of the plating film was 10 μm.
【0094】更にまた、実施例1において、Niめっき
層表面の活性化処理を行なわずに、リン酸亜鉛皮膜層を
施して実施例9のサンプルを作製し、上記実施例8にお
いてNiめっき層表面の活性化処理を行なわずに、リン
酸亜鉛皮膜層を施して実施例10のサンプルを作製し
た。Further, in Example 1, a sample of Example 9 was prepared by applying a zinc phosphate coating layer without performing the activation treatment on the surface of the Ni plating layer. The sample of Example 10 was produced by applying a zinc phosphate coating layer without performing the activation treatment of.
【0095】以上の実施例および比較例のサンプルにつ
き、リン酸亜鉛皮膜層の膜厚、Zn/Ni比、および初
期圧縮せん断強度を測定した。その結果を表2に示し
た。The thickness of the zinc phosphate coating layer, the Zn / Ni ratio, and the initial compressive shear strength of the samples of the above Examples and Comparative Examples were measured. The results are shown in Table 2.
【0096】[0096]
【表2】 [Table 2]
【0097】なお、膜厚測定は、サンプルのリン酸亜鉛
皮膜層の一部を掻き落とし、表面粗さ計を使ってその段
差を測定し、これをリン酸亜鉛被膜の膜厚とした。ま
た、被膜中のZn/Ni比は、リン酸亜鉛皮膜層の一部
を掻き落とし、SEM−EDXにて無標準定量を行い亜
鉛とニッケルの重量%比を求めた。In the measurement of the film thickness, a part of the zinc phosphate film layer of the sample was scraped off, and the level difference was measured using a surface roughness meter, and this was taken as the film thickness of the zinc phosphate film. The Zn / Ni ratio in the coating was determined by scraping off a part of the zinc phosphate coating layer and performing non-standard quantification by SEM-EDX to determine the weight% ratio of zinc to nickel.
【0098】更に、接着強度を示す初期圧縮せん断強度
については、具体的には、以下のような試験を行った。
なお、剥離箇所の欄における例えばNi/素体は、Ni
めっき層と素体の間で剥離が生じたことを意味する。Further, the following tests were specifically conducted for the initial compressive shear strength indicating the adhesive strength.
Note that, for example, Ni / element in the column of the peeled portion is Ni
It means that peeling occurred between the plating layer and the element body.
【0099】〔接着剤〕:スリーボンド3062(嫌気
性、UV硬化接着剤)[Adhesive]: ThreeBond 3062 (anaerobic, UV-curable adhesive)
【0100】〔接着方法〕:接着剤をサンプルに塗布
後、素体であるAlブロックに十分に圧着しUV照射
(4kW、200mV/cm2)を5分行い、更に72時間常温
放置し硬化させた。[Adhesion method]: After applying the adhesive to the sample, the sample was sufficiently pressed against an Al block as a body, irradiated with UV (4 kW, 200 mV / cm 2 ) for 5 minutes, and left standing at room temperature for 72 hours to cure. Was.
【0101】〔接着試験〕:圧縮速さ5mm/minで圧縮せ
ん断強度をn=5にて測定。[Adhesion test]: The compression shear strength was measured at n = 5 at a compression speed of 5 mm / min.
【0102】なお、上記実施例の全ての種類のサンプル
につき、プレッシャークッカーテスト(120℃、10
0%RH)n=50にて100hrを行なったところ、全
てで外観に異常は見られなかった。Note that the pressure cooker test (120 ° C., 10
When 100 hours were performed at 0% RH) n = 50, no abnormalities were observed in the appearance in all cases.
【0103】一方、実施例1のスルファミン酸めっき浴
によるNiめっき層のみを形成し、リン酸亜鉛処理をし
なかったものを比較例4のサンプルとした。On the other hand, a sample of Comparative Example 4 was formed by forming only the Ni plating layer using the sulfamic acid plating bath of Example 1 and not performing the zinc phosphate treatment.
【0104】また、実施例8のワット浴によるNiめっ
き層のみを施し、リン酸亜鉛処理を行なわなかったサン
プルを比較例5とした。Further, Comparative Example 5 was obtained by applying only the Ni plating layer in the Watt bath of Example 8 and not performing the zinc phosphate treatment.
【0105】また、上記比較例5のサンプルを20g/l
−無水クロム酸溶液に30℃、5分間浸漬してクロメー
ト処理を行い、Niめっき層上に、クロメート皮膜層を
形成して、比較例6のサンプルとした。The sample of Comparative Example 5 was added at 20 g / l.
-Chromate treatment was performed by immersion in a chromic anhydride solution at 30 ° C for 5 minutes, and a chromate film layer was formed on the Ni plating layer to obtain a sample of Comparative Example 6.
【0106】これら比較例5および6のサンプルについ
ても上記と同様の圧縮せん断強度の試験を行なった。そ
の結果も表2に示した。The samples of Comparative Examples 5 and 6 were also subjected to the same compressive shear strength test as described above. The results are also shown in Table 2.
【0107】以上の表から本発明の効果が明らかであ
る。すなわち、本発明の永久磁石においては、永久磁石
を接着剤を用いて素体上に接着したもの全体をみて、接
着強度、密着強度が60kgf/m2 以上と大きいのに
対して比較例のものでは、最大でも40kgf/m2 と
小さかった。From the above table, the effect of the present invention is clear. That is, in the permanent magnet of the present invention, when the permanent magnet is adhered onto the element body using an adhesive, the adhesive strength and the adhesive strength are as large as 60 kgf / m 2 or more. Then, the maximum was as small as 40 kgf / m 2 .
【0108】以上から明らかなように、本発明によれば
接着剤による接着強度の大きい永久磁石を得ることがで
きる。As is clear from the above, according to the present invention, it is possible to obtain a permanent magnet having a high adhesive strength by an adhesive.
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) H01F 1/032 - 1/117 H01F 41/02 B22F 3/24 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. 7 , DB name) H01F 1/032-1/117 H01F 41/02 B22F 3/24
Claims (5)
うち少なくとも1種以上)、T(ただし、TはFeまた
はFeおよびCo)およびBを含有し、実質的に正方晶
系の主相を有する永久磁石体表面にNiめっき層を有
し、このNiめっき層上にリン酸亜鉛被膜層が形成され
た構造を有し、かつ前記リン酸亜鉛被膜のZn/Ni
が、重量比で8以上30以下であることを特徴とする永
久磁石。Claims 1. R (where R is at least one of rare earth elements including Y), T (where T is Fe or Fe and Co) and B, and a substantially tetragonal system A Ni plating layer on the surface of the permanent magnet body having a phase, a zinc phosphate coating layer formed on the Ni plating layer, and Zn / Ni of the zinc phosphate coating.
Wherein the weight ratio is 8 or more and 30 or less.
以上10μm 以下である請求項1に記載の永久磁石。2. The film thickness of the zinc phosphate coating is 0.1 μm.
2. The permanent magnet according to claim 1, which is not less than 10 μm.
より設層される請求項2または3に記載の永久磁石。3. The permanent magnet according to claim 2, wherein the Ni plating layer is provided by a sulfamic acid bath.
の製造方法であって、前記リン酸亜鉛皮膜層を形成する
前に、Niめっき層表面を可溶性フッ化物を含む酸で処
理することを特徴とする永久磁石の製造方法。4. The method for producing a permanent magnet according to claim 1, wherein the surface of the Ni plating layer is treated with an acid containing soluble fluoride before forming the zinc phosphate coating layer. A method for producing a permanent magnet, comprising:
体表面を、アルドン酸またはその塩と硝酸とを含有する
処理液で処理する請求項4の永久磁石の製造方法。5. The method for producing a permanent magnet according to claim 4, wherein the surface of the permanent magnet body is treated with a treatment solution containing aldonic acid or a salt thereof and nitric acid before forming the Ni plating layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12846193A JP3248982B2 (en) | 1993-04-30 | 1993-04-30 | Permanent magnet and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12846193A JP3248982B2 (en) | 1993-04-30 | 1993-04-30 | Permanent magnet and manufacturing method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH06318512A JPH06318512A (en) | 1994-11-15 |
| JP3248982B2 true JP3248982B2 (en) | 2002-01-21 |
Family
ID=14985292
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12846193A Expired - Fee Related JP3248982B2 (en) | 1993-04-30 | 1993-04-30 | Permanent magnet and manufacturing method thereof |
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| Country | Link |
|---|---|
| JP (1) | JP3248982B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6663129B1 (en) | 1998-09-21 | 2003-12-16 | Technical Edge Pty. Limited | Motorcycle pivoting foot pegs |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0984460B1 (en) | 1998-08-31 | 2004-03-17 | Sumitomo Special Metals Co., Ltd. | Fe-B-R based permanent magnet having corrosion-resistant film, and process for producing the same |
| JP2003007556A (en) * | 2001-06-18 | 2003-01-10 | Nippon Parkerizing Co Ltd | Permanent magnet composite material of rare-earth-iron- boron system having excellent corrosion proof characteristic and method of manufacturing the same |
| US20060234085A1 (en) * | 2005-03-29 | 2006-10-19 | Tdk Corporation | Bonded magnet and process for its manufacture |
| JP4797747B2 (en) * | 2005-03-31 | 2011-10-19 | Tdk株式会社 | Bond magnet |
| JP2019096868A (en) * | 2017-11-24 | 2019-06-20 | Tdk株式会社 | Magnet and motor using the same |
-
1993
- 1993-04-30 JP JP12846193A patent/JP3248982B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6663129B1 (en) | 1998-09-21 | 2003-12-16 | Technical Edge Pty. Limited | Motorcycle pivoting foot pegs |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH06318512A (en) | 1994-11-15 |
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