JP3252430B2 - Manufacturing method of lead wire for hermetic terminal - Google Patents
Manufacturing method of lead wire for hermetic terminalInfo
- Publication number
- JP3252430B2 JP3252430B2 JP05972392A JP5972392A JP3252430B2 JP 3252430 B2 JP3252430 B2 JP 3252430B2 JP 05972392 A JP05972392 A JP 05972392A JP 5972392 A JP5972392 A JP 5972392A JP 3252430 B2 JP3252430 B2 JP 3252430B2
- Authority
- JP
- Japan
- Prior art keywords
- lead wire
- wire
- manufacturing
- balance
- terminal according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 title claims description 35
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 238000000034 method Methods 0.000 claims description 15
- 238000012545 processing Methods 0.000 claims description 5
- 239000011521 glass Substances 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 238000000137 annealing Methods 0.000 claims description 2
- 238000003486 chemical etching Methods 0.000 claims description 2
- 239000000654 additive Substances 0.000 claims 3
- 230000000996 additive effect Effects 0.000 claims 3
- 230000000149 penetrating effect Effects 0.000 claims 1
- 238000009751 slip forming Methods 0.000 claims 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 6
- 238000005530 etching Methods 0.000 description 6
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 6
- 238000007789 sealing Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 239000005388 borosilicate glass Substances 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000005484 gravity Effects 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 238000005266 casting Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- 229910003271 Ni-Fe Inorganic materials 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229960002089 ferrous chloride Drugs 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- NMCUIPGRVMDVDB-UHFFFAOYSA-L iron dichloride Chemical compound Cl[Fe]Cl NMCUIPGRVMDVDB-UHFFFAOYSA-L 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Landscapes
- Manufacturing Of Electrical Connectors (AREA)
- Connections Arranged To Contact A Plurality Of Conductors (AREA)
Description
【０００１】[0001]
【産業上の利用分野】この発明は水晶振動子やトランジ
スタ等に使用される気密端子用リード線の製造方法に関
する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a lead wire for a hermetic terminal used for a crystal oscillator, a transistor, and the like.
【０００２】[0002]
【従来の技術】図４に示すように水晶振動子は、気密構
造とするためにリード線１１を金属外環１２のリード線
挿入穴に挿入し、この穴とリード線１１の隙間をガラス
（例えばホウケイ酸ガラス）１３等を用いてシールして
いる。尚、この図において１４は水晶片、１５はキャッ
プである。2. Description of the Related Art As shown in FIG. 4, in a quartz oscillator, a lead wire 11 is inserted into a lead wire insertion hole of a metal outer ring 12 to form an airtight structure. For example, sealing is performed using borosilicate glass 13 or the like. In this figure, 14 is a crystal blank and 15 is a cap.
【０００３】上記の水晶振動子において、リード線１１
とのガラス封止性を高めるためには図５に示すような工
程で表面処理がなされている。In the above-described quartz oscillator, the lead wire 11
In order to improve the glass sealing property, a surface treatment is performed in a process as shown in FIG.
【０００４】即ち、リード線となるコイル状の線材をカ
ットプレス（成型）し、次いで表面エッチングの工程で
塩化第２鉄等を用いて表面を０．１〜１０．０μｍの凹
凸にし、この凹凸面に封止工程にてホウケイ酸ガラスが
かみ込み封止性を良好にする方法が行われている。[0004] That is, a coil-shaped wire material serving as a lead wire is cut and pressed (molded), and then the surface is made to have a roughness of 0.1 to 10.0 µm using ferric chloride or the like in a surface etching step. A method has been used in which a borosilicate glass bites into a surface in a sealing step to improve sealing properties.
【０００５】この工程の場合、線材をプレス切断加工
（カットプレス）して複雑な形状になった部品をエッチ
ング処理するため、網状のケースに入れてバッチ処理す
る。[0005] In this step, in order to subject a wire material to a complicated shape by press cutting (cut pressing), the wire material is put into a net-like case and batch-processed.
【０００６】[0006]
【発明が解決しようとする課題】上記の加工方法の場
合、線が曲ったり、ひっかかったりするために不良品が
多くなる。又、バッチ処理のため、ケース内において、
線が重なっているところはうまくエッチングできないの
で、全部品を均一にエッチング処理することが不可能で
ある等の問題が生じ、得られた気密封止栓にバラツキが
見られる。In the case of the above-mentioned processing method, the number of defective products increases because the wire is bent or caught. Also, for batch processing, in the case,
Since the portions where the wires are overlapped cannot be etched well, there arises a problem that it is impossible to uniformly etch all the parts, and the obtained hermetic sealing plug varies.
【０００７】このため、図６に示すように、リード線材
を予めコイルの状態で表面エッチングして０．１〜１
０．０μｍ凹凸状としたのち、ワイヤーカット、ヘッダ
ー加工等のカットプレスを行ったのち、ガラス封止する
工程が実施されている。For this reason, as shown in FIG. 6, the surface of the lead wire is etched in advance in the state of a coil by 0.1 to 1 mm.
After forming a 0.0 μm uneven shape, a process of performing a wire press, a header processing, and other cut presses, and then performing a glass sealing process is performed.
【０００８】しかし、この方法もエッチングによって金
属表面に微細な凹凸ができるとともに、その凹凸部は活
性になっており、表面積も大きくなるため、凹部にエッ
チング後の洗浄液が残ったり、乾燥ドライを行っても凹
部の活性面が先に酸化したりして、カットプレス前に完
全に酸化して錆となり、正常なリード線とならないとい
う問題が生じている。However, in this method, fine irregularities are formed on the metal surface by etching, and the irregularities are activated, and the surface area is increased. Therefore, a cleaning liquid after etching remains in the concave portions, or drying and drying are performed. However, there is a problem in that the active surface of the concave portion is oxidized first, and is completely oxidized to rust before the cut press, so that a normal lead wire is not obtained.
【０００９】この発明の課題は、上記のような従来方法
の問題点に鑑みて、微細な凹凸が形成されてホウケイ酸
ガラスのかみ込みが良好であり、しかも錆の発生が殆ど
ない気密端子用リード線の製造方法を提供することであ
る。SUMMARY OF THE INVENTION In view of the problems of the conventional method as described above, an object of the present invention is to provide an airtight terminal which has fine irregularities, has good borosilicate glass penetration, and hardly generates rust. An object of the present invention is to provide a method for manufacturing a lead wire.
【００１０】[0010]
【課題を解決するための手段】上記の課題を解決するた
めに、この発明が講じた手段は、リード線は予め線材の
状態で連続的に槽中で化学的エッチング処理して表面に
Ｒ＝０．１〜１０μｍの凹凸を有する長尺体としたの
ち、Ｈ２を含む高温炉において還元処理を施すことであ
る。Means for Solving the Problems In order to solve the above-mentioned problems, the means taken by the present invention is that a lead wire is continuously subjected to a chemical etching treatment in a bath in the state of a wire material in advance, and the lead wire is formed on a surface thereof.
After forming a long body having irregularities of R = 0.1 to 10 μm , a reduction treatment is performed in a high-temperature furnace containing H 2 .
【００１１】[0011]
【作用】この発明は上記した工程により、エッチング後
の塩化第２鉄液、塩酸液、又は洗浄液が多少残っても完
全に除去できる。又、エッチング後しばらく放置して多
少酸化が進んでいても還元処理されて正常なものにな
る。更に、この発明で処理したものは、その凹凸が均一
に活性化されるので部分的な錆の発生は見られない。According to the present invention, according to the above-described steps, even if a ferric chloride solution, a hydrochloric acid solution, or a cleaning solution after etching slightly remains, it can be completely removed. Further, even if oxidation is slightly progressed after being left for a while after the etching, a reduction treatment is performed to become normal. Furthermore, in the case of the treatment according to the present invention, since the irregularities are uniformly activated, no partial rusting is observed.
【００１２】[0012]
【実施例】以下、この発明の実施例を添付図面に基づい
て説明する。Embodiments of the present invention will be described below with reference to the accompanying drawings.
【００１３】図１乃至図３に示す実施例において、リー
ド線の材料として真空溶解又は大気溶解法により合金化
された５０％Ｎｉ−Ｆｅ合金と２９％Ｎｉ−１７％Ｃｏ
−Ｆｅ合金製のものを用意した。In the embodiment shown in FIGS. 1 to 3, 50% Ni-Fe alloy and 29% Ni-17% Co alloyed by vacuum melting or air melting are used as the material of the lead wire.
-An alloy made of Fe was prepared.
【００１４】又、他の例として４２％Ｎｉ−６Ｃｒ−Ｆ
ｅ合金、Ｆｅ−１８％Ｃｒ合金も用意した。Another example is 42% Ni-6Cr-F.
e alloy and Fe-18% Cr alloy were also prepared.
【００１５】これらの成分を溶解してインゴットに成
型、鋳造後、線材圧延、伸線、軟化を繰り返し０．４５
ｍｍφのコイル状の線材１とした。この線材１の抗張力
は５０〜９０ｋｇ／ｍｍ2 であった。After dissolving these components into an ingot, casting and casting, wire rolling, drawing and softening are repeated 0.45
This was a coiled wire rod 1 of mmφ. The tensile strength of the wire 1 was 50 to 90 kg / mm 2 .
【００１６】このコイル状線材１を図２の符号２に示す
ように塩化第２鉄溶液槽（溶液の比重：３５〜４６ボー
メ，ｐＨ１以下）中を２〜１０ｍ／分で通過させ、次い
で水洗槽３、乾燥ライン４、並びにＨ2 還元炉５を順次
通過させて巻き取った。The coiled wire 1 is passed through a ferric chloride solution tank (specific gravity of the solution: 35 to 46 Baume, pH 1 or less) at a rate of 2 to 10 m / min as shown by reference numeral 2 in FIG. Winding was performed by sequentially passing through the tank 3, the drying line 4, and the H 2 reduction furnace 5.
【００１７】上記に於いて、２の塩化第２鉄槽は塩酸及
び水を調節して比重を４２ボーメ，ｐＨは１以下程度と
し、液温は３０℃±５℃にコントロールした。又、Ｈ2
還元炉５は連続的にインライン中で処理してもよく、バ
ッチ処理として巻取工程後コイル状で行ってもよい。In the above, the ferric chloride tank 2 was adjusted to a specific gravity of 42 Baume and a pH of about 1 or less by controlling hydrochloric acid and water, and the liquid temperature was controlled at 30 ° C. ± 5 ° C. Also, H 2
The reduction furnace 5 may be continuously processed in-line, or may be performed in a coil form after the winding step as a batch processing.
【００１８】以下に各例について詳細に説明する。Hereinafter, each example will be described in detail.
【００１９】例１ 連続ラインの場合（図２） Ｈ2 を含む還元炉５は炉温を２５０℃〜１２００℃とし
てＨ2 を５％以上残りをＨ2 又はＡｒなどの不活性ガス
を有する炉を用いた。この炉は線材１の入口からＨ2 が
外に出る開放型である。ここで温度を２５０℃以上とし
たのは、時に２００℃以下では線速２〜２０ｍ／分で連
続的に通過させた場合に線材表面に吸着した水分や塩鉄
をＨ2 と反応させて分解させる能力がないためで、４０
０℃〜１０００℃が最適である。[0019] Example 1 In continuous line furnace having (Figure 2) inert gas remaining reducing furnace 5 of H 2 5% or more of furnace temperature as 250 ° C. to 1200 ° C. containing H 2 such as H 2 or Ar Was used. This furnace is of an open type in which H 2 exits from the inlet of the wire 1. The reason why the temperature is set to 250 ° C. or higher is that, when passing continuously at a linear speed of 2 to 20 m / min at a temperature of 200 ° C. or lower, water or salt iron adsorbed on the surface of the wire reacts with H 2 to decompose. 40
0 ° C to 1000 ° C is optimal.
【００２０】炉温は１２００℃以上でも効果は同じであ
るが、省エネルギーの面で適当でないので１２００℃ま
でとした。ここでＨ2 を５％〜１００％としたのはＨ2
の還元能力から４％以下では炉長を極めて長くする必要
があるので量産ラインとしてふさわしくないためであ
る。一般的には７５％Ｈ2 〜１００％Ｈ2 とするのが適
当である。The effect is the same when the furnace temperature is 1200 ° C. or higher, but the temperature is set to 1200 ° C. because it is not appropriate in terms of energy saving. Here, H 2 is set to 5% to 100% because H 2
If the reduction capacity is 4% or less, the furnace length must be extremely long, which is not suitable for a mass production line. In general, it is appropriate to the 75% H 2 ~100% H 2 .
【００２１】又、炉中の通過時間を２秒以上としたのは
２秒以下１秒未満ではＨ2 による還元能力が不十分にな
るからである。The reason why the passage time in the furnace is 2 seconds or more is that if the time is 2 seconds or less and 1 second or less, the reducing ability by H 2 becomes insufficient.
【００２２】例２ バッチ処理の場合（図３） 線材１を図２に示す塩化第２鉄液槽２を通過させた後、
コイル状に巻取って、コイル状線材６とし、これをバッ
チ炉として、Ｈ2 ５％以上を含むポット型焼鈍炉７で還
元処理する。炉中にはＨ2 を５％以上にして外側の炉体
８により室温より昇温して２５０℃以上に設定した温度
にしたのち炉冷した。Example 2 In the case of batch processing (FIG. 3) After passing the wire 1 through the ferric chloride liquid tank 2 shown in FIG.
It is wound into a coil to form a coiled wire 6, which is used as a batch furnace and reduced in a pot-type annealing furnace 7 containing 5% or more of H 2 . The oven was cooled later furnace to a temperature set above 250 ° C. the temperature was raised from room temperature outside of the furnace body 8 and of H 2 5% or more.
【００２３】温度及びＨ2 の効果は前記した例１と同じ
である。ここで、バッチ炉は炉中に入れ、取り出すまで
に数十分から数時間を要するのはその構造からやむを得
ぬ時間である。The effects of temperature and H 2 are the same as in Example 1 above. Here, it takes tens of minutes to several hours to put the batch furnace into the furnace and take it out, which is unavoidable time due to its structure.
【００２４】[0024]
【発明の効果】この発明は上記のように予め線材の状態
で連続的にエッチング処理して表面に凹凸を有する長尺
体としたのち、Ｈ2 を含む高温炉において還元処理を施
すことを特徴とするものであるが、この発明方法を実施
した線材と、上記還元処理を施さない従来方法の線材と
を比較した。As described above, the present invention is characterized in that a long body having irregularities on its surface is continuously subjected to etching in advance in the state of a wire as described above, and then subjected to a reduction treatment in a high-temperature furnace containing H 2. A comparison was made between a wire that had been subjected to the method of the present invention and a wire that had not undergone the above-described reduction treatment according to the conventional method.
【００２５】線材は何れも２９Ｈｉ−１７Ｃｏ−Ｆｅを
用いた。Each of the wires used was 29Hi-17Co-Fe.
【００２６】条件として塩化鉄２鉄溶液、比重：４２ボ
ーメ、液温３０℃、線速１０ｍ／分で表面粗さＲ＝３〜
４μｍとしたのちに水洗、乾燥ブロアー通過後、Ｈ2 ＝
７５％、Ｎ2 ＝２５％のＮＨ3 分解ガス炉、４５０℃に
して通過させ還元処理したこの発明の線材Ａと、このよ
うな還元処理を施さなかった従来のままの線材Ｂとを約
３０ｃｍづつ吊下げ１日〜１ヶ月間空気中に於いて暴露
テストを行った（常温で湿度６０％）。ｎ＝１０本づつAs conditions, a ferrous chloride solution, specific gravity: 42 Baume, a liquid temperature of 30 ° C., a linear velocity of 10 m / min, and a surface roughness R = 3 to
After washing with water and passing through a dry blower after 4 μm, H 2 =
A wire A of the present invention, which has been passed through a 75% N 2 = 25% NH 3 decomposition gas furnace at 450 ° C. and subjected to a reduction treatment, and a conventional wire B not subjected to such a reduction treatment are about 30 cm in length. An exposure test was performed in the air for one day to one month under hanging conditions (60% humidity at room temperature). n = 10 each
【００２７】上記の実験の結果、従来の線材Ｂは１日〜
３日で赤く発錆した。これに対してこの発明方法により
処理した線材Ａは１０日目にやや発錆し、１ヶ月ほどで
赤く錆が発生した。As a result of the above-mentioned experiment, the conventional wire rod B has been
Rusted in 3 days. On the other hand, the wire A treated by the method of the present invention slightly rusted on the 10th day, and red rust was generated in about one month.
【００２８】上記で明らかなように、この発明の処理方
法は錆の発生が遅いので気密端子用リード線として用い
た場合、気密性の良好なリード線となる。As is clear from the above, the treatment method of the present invention produces a good hermetic seal when used as a lead wire for hermetic terminals because rust is generated slowly.
【図１】実施例を示すブロック図。FIG. 1 is a block diagram showing an embodiment.
【図２】実施例の一部縦断側面図。FIG. 2 is a partially longitudinal side view of the embodiment.
【図３】他の実施例の縦断側面図。FIG. 3 is a longitudinal sectional side view of another embodiment.
【図４】水晶振動子の縦断正面図。FIG. 4 is a vertical sectional front view of the crystal unit.
【図５】従来方法のブロック図。FIG. 5 is a block diagram of a conventional method.
【図６】他の従来方法のブロック図。FIG. 6 is a block diagram of another conventional method.
１ 線材 ２ 塩化第２鉄溶液槽 ３ 水洗槽 ４ 乾燥ライン ５ Ｈ2 還元炉Reference Signs List 1 wire rod 2 ferric chloride solution tank 3 washing tank 4 drying line 5 H 2 reduction furnace
───────────────────────────────────────────────────── フロントページの続き (72)発明者 津田 明 兵庫県伊丹市昆陽北一丁目１番１号 住 友電気工業株式会社 伊丹製作所内 (56)参考文献 特開 平５−5170（ＪＰ，Ａ) 特開 平４−3970（ＪＰ，Ａ) 特開 平３−274232（ＪＰ，Ａ) (58)調査した分野(Int.Cl.7，ＤＢ名) H01R 9/16 H01L 23/48 H01R 43/16 ──────────────────────────────────────────────────続 き Continuation of the front page (72) Inventor Akira Tsuda 1-1-1, Kunyokita, Itami-shi, Hyogo Sumitomo Electric Industries, Ltd. Itami Works (56) References JP-A-5-5170 (JP, A JP-A-4-3970 (JP, A) JP-A-3-274232 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) H01R 9/16 H01L 23/48 H01R 43 / 16
Claims (8)
該穴に挿入して、ガラスを介して気密絶縁封止するリー
ド線において、該リード線は予め線材の状態で連続的に
槽中で化学的エッチング処理して表面にＲ＝０．１〜１
０μｍの凹凸を有する長尺体としたのち、Ｈ２を含む高
温炉において還元処理を施すことを特徴とする気密端子
用リード線の製造方法。1. A lead wire which is inserted into the hole of a metal outer ring having a hole for penetrating a lead wire and hermetically insulated and sealed through glass, wherein the lead wire is continuously formed in a wire state in advance.
R = 0.1-1 on the surface by chemical etching in a bath
A method for manufacturing a lead wire for an airtight terminal, comprising: forming a long body having irregularities of 0 μm, and performing a reduction treatment in a high-temperature furnace containing H 2 .
りＮ２、又はＡｒを含む高温炉で処理することを特徴と
する請求項１記載の気密端子用リード線の製造方法。 2. The method for manufacturing a lead wire for a hermetic terminal according to claim 1, wherein said lead wire is treated in a high-temperature furnace containing 5 to 100% of H 2 and the balance of N 2 or Ar.
ド線の温度を２５０℃〜７００℃、処理時間１０分以上
の還元処理を施すことを特徴とする請求項１記載の気密
端子用リード線の製造方法。 3. The lead wire uses a batch furnace.
Wire temperature is 250 ℃ ~ 700 ℃, treatment time is more than 10 minutes
The method for producing a lead wire for an airtight terminal according to claim 1 , wherein a reduction treatment is performed .
使用し、リード線の温度を４００℃〜１２００℃、処理
時間２秒以上の還元処理を施すことを特徴とする請求項
１記載の気密端子用リード線の製造方法。 4. The lead wire is an open type continuous processing annealing furnace.
Use, the temperature of the lead wire is 400 ℃ ~ 1200 ℃, treatment
2. The method for manufacturing a lead wire for an airtight terminal according to claim 1, wherein a reduction treatment is performed for a time of 2 seconds or more .
加元素として１．０％以下のＳｉ、Ｍｎ、Ｔｉ、Ａｌ、
Ｃを含有し、残部のＦｅの組成からなることを特徴とす
る請求項１記載の気密端子用リード線の製造方法。 5. The lead wire according to claim 1, wherein said lead wire comprises 40% to 52% of Ni, and 1.0% or less of an additive element such as Si, Mn, Ti, Al,
2. The method for producing a lead wire for a hermetic terminal according to claim 1, wherein C is contained and the balance is Fe.
ｏ１７％〜２０％、添加元素として１．０％以下のＳ
ｉ、Ｍｎ、Ｔｉ、Ａｌ、Ｃを含有し、残部のＦｅの組成
からなることを特徴とする請求項１記載の気密端子用リ
ード線の製造方法。 6. The lead wire according to claim 1, wherein said lead wire comprises 27% to 30% of Ni,
o 17% to 20%, 1.0% or less of S as an additive element
2. The method for manufacturing a lead wire for a hermetic terminal according to claim 1, comprising i, Mn, Ti, Al, C, and a balance of Fe.
加元素として１．０％以下のＳｉ、Ｍｎ、Ｔｉ、Ｃを含
有し、残部のＦｅの組成からなることを特徴とする請求
項１記載の気密端子用リード線の製造方法。 7. The lead wire according to claim 1, wherein the lead wire contains 16% to 20% of Cr, 1.0% or less of additional elements of Si, Mn, Ti, and C, and has a balance of Fe. A method for producing a lead wire for an airtight terminal as described in the above.
Ｃｒ４％〜８％、添加元素として１．０％以下のＳｉ、
Ｍｎ、Ｔｉ、Ｃを含有し、残部のＦｅの組成からなるこ
とを特徴とする請求項１記載の気密端子用リード線の製
造方法。 8. The method according to claim 1 , wherein the lead wire is 40% to 45% Ni.
Cr 4% to 8%, as an additive element 1.0% or less of Si,
2. The method for producing a lead wire for a hermetic terminal according to claim 1, wherein Mn, Ti, and C are contained and the balance is Fe.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP05972392A JP3252430B2 (en) | 1992-02-13 | 1992-02-13 | Manufacturing method of lead wire for hermetic terminal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP05972392A JP3252430B2 (en) | 1992-02-13 | 1992-02-13 | Manufacturing method of lead wire for hermetic terminal |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05226018A JPH05226018A (en) | 1993-09-03 |
| JP3252430B2 true JP3252430B2 (en) | 2002-02-04 |
Family
ID=13121411
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP05972392A Expired - Fee Related JP3252430B2 (en) | 1992-02-13 | 1992-02-13 | Manufacturing method of lead wire for hermetic terminal |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3252430B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002343531A (en) * | 2001-05-18 | 2002-11-29 | Denso Corp | Terminal molded part and method of manufacturing the same |
-
1992
- 1992-02-13 JP JP05972392A patent/JP3252430B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH05226018A (en) | 1993-09-03 |
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