JP3256873B2 - Light irradiation processing apparatus and method - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a light irradiation processing apparatus and method capable of appropriately processing a printed wiring board in a direction in which each part is reduced, such as a reduction in pitch between printed wiring boards.

[0002]

2. Description of the Related Art In general, communication devices and information devices incorporating a printed wiring board (PWB) are thin, lightweight, have low power consumption and are driven at a low voltage. Under the influence of the mounting process of the microchip module (MCM) and the CSP (Chip size / Scal) in the printed wiring board.
ePackage) attention is attracting attention. The current mainstream method of forming a printed wiring board is the subtractive method.

In this subtractive method, the line-and-space pitch of 100 μm is standardized up to 0.65 mm, but in reality, the pitch is 0.5 m.
m to 0.3 mm or 0.1 mm in the miniaturization direction, and the wiring line between the pitches is 75 μm to 5 mm.
There is a tendency that the width becomes narrower toward a miniaturization direction such as 0 μm or 20 μm. Further, rounds are also in a roundless direction, and therefore cannot be handled by the subtractive method, and a manufacturing method of manufacturing a printed wiring board in the miniaturization direction by a build-up structure by an additive method is emerging. It has been announced as one direction.

[0004] In the printed wiring board (including multilayer), a circuit patterned on the surface or in the inside thereof is miniaturized and comes close to each other. Therefore, a resist is constituted as a permanent insulating film. Originally, various proposals have been made in the process of manufacturing printed wiring boards in order to cope with insulation properties, adhesion properties, breakdown voltage, heat resistance during soldering, etc. when laminating, and to respond to the trend of miniaturization. ing. The photosensitive member used undergoes a photoreaction depending on the light wavelength, temperature, and the like, and an example thereof will be described below. When a permanent insulating film is formed, the sensitivity of the photosensitive member is low, and the sensitivity of the photosensitive member formed by peeling the resist is sharp.

As shown in FIG. 13 (a), it is known that when a photoreaction such as a polymerization reaction of a photosensitive member (here, a dry film) is carried out, it depends particularly on temperature. Here, the values of 25 degrees, 50 degrees, and 75 degrees are measured,
As a result, it is suggested that the reaction occurs almost in proportion to the height of the temperature, and that the temperature condition affects the final curing rate and does not significantly affect the curing time. As the photosensitive member used here, a dry film is used, and the difference in curing reaction depending on the measured temperature of the dry film is shown by a curve.

Further, as shown in FIG. 13B, this graph shows that the photosensitive member has an irradiation wavelength of 365 nm, an irradiation intensity of 5 mW / cm ² , a measurement temperature of 25 ° C.,
7 is a plot of the curing rate α (ΔH _j / ΔH _total ) of the photosensitive member when light irradiation operation is performed at 45 degrees and 60 degrees with respect to time. As the photosensitive member used here, a resist film is used, and a heat flow curve when the resist film is irradiated with light and a corresponding curing rate curve are plotted.

Further, as shown in FIG. 14, as can be seen from the absorption curve of a diazo photosensitive solution used in photolithography as a photosensitive member, the light absorption rate of the diazo photosensitive solution is approximately 360 nm (mμ). Indicates the peak value. Although not shown in the figure, an azide-based photosensitive agent has an absorption characteristic at 390 nm, and dichromic acid has an absorption characteristic at 360 nm.

[0008] The photosensitive member used in the above-described example is configured so that a photocuring reaction can be performed according to the purpose depending on the type of the components of the member such as a photoinitiator and a photosensitive agent, and the amount added. Therefore, depending on the type of the work, the wavelength at which the photoreaction due to the ultraviolet light may be greatly different. In particular,
In printed wiring boards that are becoming finer, photoreaction is performed by giving a large amount of energy.

[0009]

However, in the process of the conventional method of forming a printed wiring board, there were the following problems.

In the process of forming a printed wiring board, a work is performed by irradiating a work with a light irradiating device. The light irradiating work is performed by irradiating ultraviolet rays having a predetermined wavelength, and a large-capacity light source lamp is used. Therefore, light other than ultraviolet light is also irradiated from the light source lamp, so that the work is substantially heated at the time of light irradiation, and is also heated by polymerization heat generated when the photosensitive member causes a photoreaction. . Then, when the light irradiation operation is completed and the work is taken out of the light irradiation device, if the temperature of the work itself is far from room temperature, dew condensation on the surface of the work is highly likely.

Further, when the laminating operation is performed in a state where moisture adheres to the surface of the work, the insulation resistance of a portion which normally requires a large insulation resistance value is remarkably reduced. In addition, if a configuration is used in which cooling air is blown onto the work by air cooling means to lower the temperature of the work itself during the irradiation of ultraviolet rays, there is a high possibility that dust will adhere to the work, and a problem will occur in a later step. Further, if the operating rate of the air cooling means is large, the environment in the working clean room is greatly affected, which hinders adjustment of the clean room.

In the light irradiation device, the photo-initiator of the ultraviolet curable ink used for the work and the photo-initiator of the photolithography for patterning have different absorption characteristic positions. Due to the relationship with the heat of polymerization, etc., it is not possible to respond even if the transfer speed of the work, the light reduction adjustment of the light source lamp, or the irradiation distance between the light source lamp and the work is changed, and light irradiation corresponding to the type of the photosensitive member is not possible. Needed equipment.

Further, the light irradiation device is commonly used when the work is dried after the work is removed with a developing solution, or when the resist on the surface of the work is modified into permanent insulation. However, the original purpose is different between the work for drying the work and the work for modifying the surface, and there is a limit to the use of the light irradiation device especially for the work in the direction of miniaturization. In the work of modifying the surface of the work, the amount of ultraviolet light applied to the work is greatly different depending on the photosensitive member used in the printed wiring board in the direction of miniaturization. Therefore, the photocuring action is further promoted by the light and heat energy received by the photoinitiator, and there is a great possibility that the photosensitive member is degraded, such as being unnecessarily contracted or deformed, and is directed in a direction of quality deterioration. There has been a demand for a structure capable of performing an operation of modifying a photosensitive member for accelerating and controlling the polymerization.

For a work to be irradiated with ultraviolet rays in the work of modifying the photosensitive member, a predetermined amount of ultraviolet rays needs to be evenly distributed over the entire area of the formed pattern while moving along the transport path by the transport mechanism. Since the work transported by the transport mechanism has a pattern formed on the front surface, the configuration of the work loading and unloading sides is simple so that it can be easily connected to work performed before and after the reforming work. In addition, a transport mechanism for securely holding and transporting the pattern portion without contacting the pattern portion has been desired.

SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and prevents dew condensation due to a temperature difference between a work and a room due to light irradiation, and prevents dust from adhering to the cooling means during light irradiation. However, even if the photoreaction state of the photosensitive member is different, it can cope with it.
Further, an object of the present invention is to provide a light irradiation processing apparatus and a method thereof which are excellent in transporting a work at the time of light irradiation work on the work.

[0016]

In order to solve the above-mentioned problems, a light irradiation processing apparatus according to the present invention includes a transport mechanism for transporting a work along a transport path, and a light- transmitting mechanism for transporting the work by the transport mechanism . A light irradiation mechanism that performs light irradiation over the entire surface, and a light distribution mechanism that controls light of a predetermined wavelength that promotes modification of the work by photosensitive member polymerization among the irradiation light from the light irradiation mechanism. The light distribution mechanism is configured to emit light of a predetermined wavelength in advance in accordance with processing contents of the work.
Light distribution unit that can selectively set by reflecting or absorbing light
Configuration .

Further, in the light irradiation processing device, the light distribution mechanism may include a light transmitting member through which light having a predetermined wavelength passes at least once between the workpiece and the discharge lamp.
A light distribution section that can be selectively set by reflecting or absorbing light is provided, and the position of the light distribution section is adjusted and set in advance in accordance with the photosensitive member of the work .

Further, in the light irradiation processing device, the light distribution mechanism has a light transmitting member that transmits light to a discharge lamp of the light irradiation mechanism, and the light transmitting member has at least a part of a predetermined light transmitting member. A light distribution unit that reflects or absorbs light of a wavelength is provided, and the position of the light distribution unit of the light transmitting member is moved and adjusted so that the integrated light amount of light applied over the entire surface of the work becomes uniform. It is configured to be adjusted in advance by fixing with a fixing means.

In the light irradiation processing apparatus, the light distribution mechanism has a light transmitting member on a jacket tube provided along a discharge lamp of the light irradiation mechanism, and the light transmitting member is at least the jacket tube. Is provided with a light distribution member that reflects or absorbs light of a predetermined wavelength emitted from the discharge lamp, and the jacket tube has both ends detachably fixed by fixing means , over the entire surface of the work. as cumulative amount of light applied is equalized, the position of the light distribution member provided on the jacket tube, and configured to advance adjustment.

In the light irradiation processing apparatus, the light transmitting member is a light transmitting plate provided via a rotating mechanism along a discharge lamp of the light irradiation mechanism, and at least one of the light transmitting plates is provided. Partly before absorbing or reflecting light of a given wavelength
The serial light distribution portion is provided such that it said entire cumulative amount of light applied over the workpiece is equalized, and configured to precondition the rotation angle of the transparent plate.

Further, in the light irradiation processing apparatus, the transport mechanism may include an upper end supporting portion for erecting the work and supporting an upper end thereof along a transport path, and a lower end for supporting a lower end of the work along the transport path. A support mechanism, comprising a moving mechanism for moving the lower end support at a predetermined speed, the lower end support is a holding body for holding a predetermined position of the work,
An elastic member that urges the holding body in a contacting direction, and the loading side and the unloading side of the conveyance path, where a part of the holding body comes into contact with the biasing force of the elastic member. It has the structure which has the operation part which operates a holding body in the direction which separates.

As the light irradiation treatment method, a pattern
Oh the illuminance distribution of over the entire surface of the hardening treatment has been work
The work is analyzed in advance , and the work of modifying the work by polymerization of the photosensitive member of the work is performed in accordance with the illuminance distribution .
Make sure that the work
A first step for pre-adjusting the illuminance distribution, before
The light irradiated in serial and a second step of <br/> conveyed to the transfer port by receiving a predetermined speed a work in entrance, and the workpiece being conveyed in the second step to adjust the illuminance distribution at the first step state It consisted of three steps.

[0023]

DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a side view of the light irradiation device,
2 is a plan view of the light irradiation device, FIG. 3 is a side view showing a main part of a transport mechanism of the light irradiation device, FIG. 4 is a cross-sectional view showing a main part of a light source unit of the light irradiation device, and FIG. FIG. 6 is a principle view showing a use state of the light distribution mechanism, FIG. 6 is a front view showing a main part of the work transfer mechanism, FIG. 7 is a plan view showing a main part of the work transfer mechanism, and FIG.
Is a graph showing the peak characteristics of the photoinitiator of the photosensitive member,
FIG. 9 is a graph showing the illuminance distribution of the work, FIG. 10 is a graph showing the insulation resistance value of the work after the reforming operation, FIG.
FIG. 12 is a principle diagram showing a use state of another light distribution mechanism.

As shown in FIGS. 1 to 4, the light irradiating device 1 for the work W includes a transfer mechanism 2 for transferring the work W from a carry-in port 1a formed at one end thereof to a carry-out port 1b formed at the other end. A light irradiating mechanism 3 provided at a predetermined interval along a transport path of the transport mechanism 2, and a light distribution mechanism for distributing a light beam of a predetermined wavelength emitted from the light irradiating mechanism 3 according to a photosensitive member of a work. 4 and a cooling mechanism 5 that cools the light irradiation mechanism 3 so that the temperature does not rise more than a certain level.

As shown in FIGS. 1 and 4, the light irradiating mechanism 3 includes a light source unit 3A for irradiating a light beam of a predetermined wavelength, a reflecting mirror 3B for reflecting the irradiating light beam from the light source unit 3A,
The light source unit 3A includes a power supply unit and the like. The light source unit 3A includes a discharge lamp 3a and the discharge lamp 3a.
An inner jacket tube 3b as a light-transmitting portion provided apart from the inner jacket tube; an outer jacket tube 3c as a light-transmitting member provided at a position concentric with the inner jacket tube 3b; It comprises a jacket fixing portion 3e for fixing the discharge lamps 3b and 3c, and both end support portions 3d and 3d for supporting both ends of the discharge lamp 3a.

The support portions 3d, 3d have the sealing portion of the discharge lamp 3a fitted to a steatite base, and the steatite base is formed by a cooling flow path 5a of the cooling mechanism 5. Lamp holder 3f. Further, the lamp holder 3f has a fitting portion for fitting and supporting both ends of the jacket tubes 3b and 3c.

It should be noted, Remind as FIGS. 4 and 5, the jacket tube 3b, 3c are formed like quartz, reflects or absorbs light of a predetermined wavelength to at least a portion (half in FIG. 5) The light distribution members to be controlled by the light distribution units 4a and 4
It is provided as b. The light distribution units 4a and 4b are provided by being mixed during the production of the jacket tubes 3b and 3c, or by being adhered over a predetermined width after the production of the jacket tubes 3b and 3c. (Attached to the inside or outside of the jacket tubes 3b, 3c). Therefore, the positions of the light distribution units 4a and 4b are moved in accordance with the processing of the work W ( patterning , surface modification, etc.), and the light emitted from the discharge lamp 3a is made to correspond to the characteristics of the work W and the necessity. The light distribution mechanism 4 is thus controlled.

The light distribution section 4 is provided on the jacket tubes 3b and 3c.
When a and 4b are formed, aluminum oxide (Al ₂ O ₃ ), calcium oxide (CaO), boron oxide (B ₂ O ₃ ), and sodium oxide (Na ₂ O) are used with silicon oxide (SiO ₂ ) as a main material. ), A metal oxide such as potassium oxide (K ₂ O), and a small amount of other components.

The positions of the light distribution sections 4a and 4b are determined according to the characteristics of the photosensitive member of the work. this is,
As shown in FIG. 9, since the curing characteristics of the photosensitive member are determined in the wavelength of the ultraviolet light irradiated by the photoinitiator of the photosensitive member used for the work, for example, the thioxanthone curve E If the photosensitive member is constituted centering on, there is a peak of the absorbance at a position around 260 nm of ultraviolet rays. On the other hand, if the photosensitive member is composed mainly of 4,4'-bis (dimethylamino) benzophenone of the curve G, the ultraviolet light is irradiated from the discharge lamp 3a because the peak of the absorbance is about 370 nm. The work W is irradiated with ultraviolet light having a wavelength suitable for the characteristics of the photosensitive member among the light beams.

Thus, in the photoinitiator monomer, 20
It is shown to have photosensitive characteristics in the range of 0 nm to 300 nm, but by using each monomer as a complex,
In some cases, the photosensitive characteristic is changed to 300 nm to 400 nm and the absorption region is moved.

Further, it is known that the irradiation distribution of the discharge lamp 3a is strong on the center side of the work W and weak on the end side of the work W. Therefore, it is considered in consideration of the characteristics of the photosensitive member of the work W. The arrangement positions of the light distribution units 4a and 4b are determined.

As shown in FIG. 5A, this is advantageous when the photosensitive member of the work W has a wide range of photo-initiating characteristics and the required wavelength of ultraviolet rays is also wide. In addition, when the work W is subjected to optical processing, it can be effectively used even when a certain high temperature is required or when the size of the work W is small.

Further, as shown in FIG.
The outer jacket tube 3c is used when the light irradiation intensity is reduced to some extent or when the work has a light start characteristic on a predetermined wavelength side (for example, around 365 nm).
The position of the light distribution unit 4b of the (inner jacket tube 3b) is arranged between the work W and the discharge lamp 3a, and the position of the light distribution unit 4a of the inner jacket tube 3b (the outer jacket tube 3c) is opposite to the position of the work W. It is convenient to use it as a configuration for adjusting the position so that it is arranged at a position on the back side of the discharge lamp 3a on the side.

As shown in FIG. 5 (c), when the ultraviolet light of a predetermined wavelength from the discharge lamp 3a is irradiated in a weakened state, or when the light irradiation on the center side of the discharge lamp 3a is weakened,
By arranging the positions of the light distribution sections 4a, 4b of the jacket tubes 3b, 3c between the workpiece W and the discharge lamp 3a, it is possible to appropriately perform a light processing operation.

Further, as shown in FIG. 5D, when the ultraviolet light of a predetermined wavelength emitted from the discharge lamp 3a to the center of the work is suppressed as much as possible, and the irradiation light on the periphery of the work is suppressed to some extent, A configuration in which one end of the light distribution unit 4b of the jacket tube 3c is disposed between the discharge lamp 3a and the work W, and the other end of the light distribution unit 4a of the inner jacket tube 3b is disposed between the discharge lamp 3a and the work W. And Therefore, the central light emitted from the discharge lamp 3a is suppressed as much as possible by the light distribution units 4a and 4b, and the light emitted from the discharge lamp 3a to the end of the work W passes through the light distribution unit 4a. Alternatively, the work W is irradiated with light suppressed to some extent via the light distribution unit 4b.

The light distribution sections 4a and 4b have been described as being integrally formed by mixing a light distribution member such as a metal oxide into the quartz glass of the jacket tubes 3b and 3c. Alternatively, an interference film as a light distribution unit may be attached to the surface of 3c. Further, although the configuration has been described as being provided on both of the jacket tubes 3b and 3c, the light distribution unit 4a (4b) may be provided on one of the jacket tubes 3b (3c).

Although the light distribution mechanism 4 has been described as having the light distribution portions 4a and 4b provided on both the jacket tubes 3b and 3c, the quartz light of the discharge lamp 3a is used instead of being provided on the both jacket tubes 3b and 3c. A configuration in which an interference film is provided as a light distribution unit on the glass surface or inner surface may be employed. further,
A configuration in which a metal oxide is mixed into a part of the quartz glass of the discharge tube 3a may be adopted. When the structure of the light distribution mechanism 4 is provided in the discharge lamp 3a, the light distribution section 4 is provided in the jacket tubes 3b and 3c.
a, 4b may not be provided, or a light distribution unit 4a (4b) may be provided on one or both of the jacket tubes 3b, 3c. The discharge lamp 3a or one of the jacket tubes 3b, 3c may be provided. Light distribution unit 4a (4b) for both
Is provided, the position of each light distribution unit may be adjusted to perform optimal light irradiation of the work. When two or more light distribution units are provided, each light distribution unit may be configured to absorb or reflect light beams having different wavelengths.

Next, as shown in FIGS. 3 and 6, the transport mechanism 2 for transporting the work W includes an upper end support 2A for supporting the upper end of the work W, and a lower end support for supporting the lower end of the work W. It comprises a portion 2B and a moving device 8 for driving the lower end supporting portion 2B.

The upper end support portion 2A is provided with left and right support columns 2 continuously provided at predetermined intervals along the transfer path of the work W.
a, 2a and rotating rollers 2b, 2b spaced apart from each other at the lower ends of the support columns 2a, 2a. The support columns 2a, 2a are supported by a mounting portion 2D.
The separation distance between the rotating rollers 2a, 2a is formed to be slightly larger than the thickness of the work W.

As shown in FIGS. 3 and 6, the lower end supporting portion 2B is provided with one and the other holding members 2c and 2d for holding the lower end of the work W, and the upper ends of the holding members 2c and 2d. And the two holding members 2g, 2g provided on the
A coil spring 2 serving as an elastic member for supporting the members c and 2d substantially at the center thereof and for urging them in directions in which they contact each other.
f and a cam 2e provided on the lower end side of the one holding body 2c.
It is composed of

The moving device 8 includes a drive chain 2h connected to the lower end of the other holding member 2d, a rotary pulley 2G for driving the drive chain 2h, and a drive for rotating the rotary pulley 2G. 2C. In addition, a plurality of the holding bodies 2c and 2d are provided at predetermined intervals on the drive chain 2h.

As shown in FIG. 7, at the same height position of the cam 2e provided at the lower end of the holding body 2c, near the position of the work entrance side 1a and the work exit side 1b of the work W, an operating portion is provided. Are provided on the support bases 2j, 2j. An auxiliary carry-in section 2E and an auxiliary carry-out section 2F are provided at the positions of the work W entrance 1a and the work exit 1b. The auxiliary carry-in section 2E is for receiving the work W conveyed from the step before the light irradiation processing to the light irradiation device 1 side. In addition, auxiliary discharge section 2F
Is for sending the workpiece W, which has been subjected to the light irradiation processing by the light irradiation device 1, to the next step.

Therefore, when the work W is sent from the auxiliary carry-in section 2E, the cam 2e provided at the lower part of the holding bodies 2c and 2d fixed on the drive chain and moving on the conveyance path.
Is pressed along the shape of the convex portion 2k provided on the carry-in side, and forcibly presses the holding contact portions 2g, 2g on the upper end sides of the holding members 2c, 2d against the elastic force of the coil spring 2f. , And the lower end side of the work W is held at the holding contact portions 2g, 2g.
g, and the upper end of the work W is supported between the rotating rollers 2b, 2b so that the work W is transported in a vertical state.

When the workpiece W is conveyed to the carry-out port 1b after the light irradiation processing, the cam 2e provided at the lower portion of the holding body 2c is pushed along the shape of the convex portion 2k provided on the conveyance path. The workpiece W is forcibly actuated in the direction to separate the holding contact portions 2g, 2g against the elastic force of the coil spring 2f of the holding members 2c, 2d by being moved. , 2d. At this time,
The lower end of the front end of the work W is already placed on the roller portion of the auxiliary discharge section 2F, and the upper end of the work W is
b, 2b, the loading / unloading port 1 of the light irradiation device 1
b.

As shown in FIG. 1, a blower 6 for downflow is provided on the upper side of the light irradiating device 1 so that air from the inside of the clean room or from outside can be filtered through a filter. 1 and blower fan 6a
Hood 6 provided with an opening on the transport path by driving
A gentle wind is sent from top to bottom of the work W along b. Therefore, dust hardly adheres to the work W, and a cause of heating such as polymerization heat due to a photoreaction of the photosensitive member of the work W can be eliminated to some extent.

Next, the procedure of the work of irradiating the work W with light will be described. As shown in FIG. 1 and FIG.
Is determined in advance on the operation panel 11 in accordance with the light processing of the photosensitive member of the work W, the light irradiation intensity, the conveying speed, the temperature setting in the apparatus, and the like.

When the work W is sent to the light irradiation device 1 side, as shown in FIGS. 1 and 3, the work W is received by the auxiliary carry-in section 2E, and is moved to the position of the carry-in entrance 1a. The upper end and the lower end are supported by the upper end support 2A and the lower end support 2B of the transport mechanism 2, and are transported at a predetermined speed on the transport path. As shown in FIGS. 6 and 7, when the work W is supported by the lower end support portion 2B,
c and 2d are sequentially moved by the drive of the drive chain 2h, and the cam 2e at the lower portion of the holding body 2c is pushed at the position of the convex portion 2k, forcibly resisting the elastic force of the coil spring 2f. The gripping contact portions 2g, 2g are separated from each other,
In the meantime, the work W is held. These operations are repeated while the holding bodies 2c and 2d move, and the work W is supported and transported by the plurality of holding bodies 2c and 2d according to the width of the work W.

As shown in FIGS. 3 and 6, the upper end side of the work W is connected to the rotating rollers 2b of the upper support 2A.
2b and is guided and sent along the transport path. At this time, since a plurality of rotating rollers 2b, 2b are always arranged with respect to the width of the work W, the work W can be smoothly guided along the transport path.

When the workpiece W is transported at a predetermined speed (0.5 to 5 m / min) by the transport mechanism in a vertical state, the irradiation light from the discharge lamp 3a is received on the front and back surfaces of the workpiece W. At this time, since the position of the work W on the transport path is at the same distance from the left and right discharge lamps 3a, 3a, the light irradiation amount applied to the work W becomes uniform.

In this light irradiation operation, as shown in FIG. 9, the curves a and b show the relative intensity of light with respect to each part of the work W when the work W is patterned, as a percentage. It can be seen that the light irradiation is strong, and the relative intensity of the light decreases toward the periphery of the work W. Irradiation <br/> distribution over the entire surface of the workpiece W at the time of patterning is measured by measuring the optical power meter, the accumulated amount of light that illuminates the entire surface of the work based on the measurement data, Kai The light distribution mechanism 4 is set in advance so as to be uniform when performing quality work.

Therefore, the work W is reformed,
In order for the work W to uniformly and improve the breakdown voltage, resistance, heat resistance and adhesion resistance, the work W is opposite to the curve showing the relative intensity of light shown in the curves (a) and (b), ie, the work It is necessary to be able to irradiate light so that the center of W is weak and the relative intensity of light around the work W is high. As shown by the curves a, b, and c in FIG. 9, the light irradiation is performed so as to be uniform when the relative intensities of the light with respect to the work W shown by the curves a and b are integrated. For example, as shown in FIG. The structure of the light distribution mechanism 4 is modified by turning on the discharge lamp 3a in a state where the irradiation light from the center of the discharge lamp 3a is irradiated on the work W via the light distribution unit 4a (4b). The aim is to equalize the integrated light quantity during quality.

Assuming that the patterning operation is performed at 100%, the relative intensity of the light used in the modification operation of the work W is larger than the value, for example, 300%.
Light irradiation with a large value of about 600% to 700% is performed. In this way, by giving a large relative intensity of light to the work W, the breakdown voltage, the resistance, the heat resistance,
Adhesion can be improved.

As shown in FIG. 10, the value of the insulation resistance at this time differs depending on the transfer speed of the work, but it can be seen that the value is 10 ¹³ to 10 ¹¹ Ω or more. The conditions at this time are as follows. Six metal hydro lamps (250 W / cm) are used as the discharge lamps 3a, the photosensitive member (resist) of the work W is made to have a thickness of 60 μm, and the reforming operation is performed. After exposing the work for a predetermined time under the condition of 85% humidity and applying a voltage of 24 V DC, the value of the insulation resistance is 10 even after 1000 hours have passed.
The result of being ¹¹ Ω or more was obtained. Also, the value of the withstand voltage at this time was 4 KV. The value is MIL
This is an excellent value even when compared to the (US military) standard of 5 × 10 ⁸ .

When the work W is being irradiated with light, heat which adversely affects the work W is removed, and heat effective for modifying the photosensitive member of the work W is transferred to the discharge lamp 3. The cooling mechanism 5 and the light distribution units 4a and 4b can be used and used more appropriately.

When the light processing operation of the work W is completed, the lower end supporting portion 2 supporting and transporting the work W along the transport path is provided.
B is a projection 2 provided on the cam 2e near the carry-out port 1b.
Since the two holding members 2c and 2d operate in the direction in which the two holding members 2c and 2d are sequentially separated from each other, the workpiece W is moved into a plurality of holding members 2c, 2d and 2
The workpieces W are sequentially opened from the holding bodies 2c, 2d on the distal end side, which are held by c, 2d,.
Send to F side. At this time, since the plurality of rotating rollers 2b that guide the upper end of the work W are also arranged so as to be arranged in the width direction of the work W, the work W
It can be sent out to the auxiliary discharge section 2F with minimum vibration.

The structure of the light distribution mechanism described above is shown in FIG.
May be indicated by. That is, the light distribution mechanism 40 of the light irradiation processing device 50 is configured to include the light distribution unit 42 that is rotatably provided between the discharge lamp 30 and the workpiece W to be conveyed. The light distribution unit 42 is provided on a light transmitting plate 41 as a light transmitting member, and is configured to be able to be set to a predetermined angle by a rotating unit 43 in a stepless manner. Specifically, the set angle is adjusted using a servomotor or using an encoder. The light distribution section 42 is formed by mixing a metal oxide or the like that absorbs or reflects light of a predetermined wavelength into quartz glass in advance, or is formed by attaching an optical interference film to a light-transmitting plate such as quartz glass. It is good also as composition. In addition,
Since the transport mechanism 2 has the same configuration as the above-described configuration, description thereof will be omitted.

Therefore, as shown in FIG.
By rotating the light distribution unit 42 at a predetermined angle so as to correspond to the photosensitive member or to equalize the integrated light amount, the light irradiation on the center side from the discharge lamp 30 is suppressed, The light irradiation on the side can be improved.

That is, as shown in FIG. 12 (b), when the center of the surface of the workpiece W is weak and a certain amount of strong light is required in the periphery, the light transmitting plate 41 is inclined by the rotating part 43 by a predetermined angle. In this state, the light is emitted from the discharge lamp 30 so that the integrated light amount of the work W is equalized. Further, as shown in FIG. 12C, in order to arrange the light distribution unit 42 so that light irradiation is weakened over a wide area in the center portion of the work W, the light transmitting body 41 is vertically moved by the rotating unit 43. In this state, the light is emitted from the discharge lamp 31. In addition, as shown in FIG.
When the work W is irradiated with light without passing through the light distribution unit 42, the light is irradiated from the discharge lamp 30 by setting the light transmitting plate 41 in a horizontal state by the rotating unit 43.

In addition, the light irradiation processing device (1, 5
In the case of performing the reforming work of the work W as in 0), among the plurality of discharge lamps (three in the drawing) provided along the work conveyance path, the discharge lamp is located closer to the carry-in port and goes to the discharge side. , The output of the discharge lamp may be gradually increased. Further, when the size of the work W changes,
It is convenient if the center of the discharge lamp is arranged on the center side of the work W.

The position of the light distribution section may be smaller than the arc rings of the discharge lamp. Further, the light distribution section may have a higher density (higher reflection and absorption) on the center side and a higher density on the periphery. It may be configured such that the density of the light distribution unit gradually decreases as going to (2).

The reflecting mirror used when performing light irradiation may be formed of an aluminum reflecting material, may be formed of a cold mirror that reflects ultraviolet light of a predetermined wavelength, or may be formed by applying gold plating to the reflecting surface. A reflector having such a configuration may be used. Further, the cooling liquid used in the cooling mechanism may be pure water, soft water or tap water. In the case of using pure water or soft water, it is convenient to cover the circulating pipe with a cooling pipe and cool the pipe in which pure water or soft water circulates with a cooling pipe.

Further, the discharge lamp used is a metal hydro lamp, a mercury lamp, or a xenon lamp, and the cooling means of the discharge lamp can use air cooling, water cooling, indirect water cooling, or the like.

[0063]

Since the present invention is configured as described above, it has the following excellent effects. When a workpiece is irradiated with light, the light distribution mechanism can be adjusted according to the characteristics of the photosensitive member of the workpiece and the integrated light amount to irradiate appropriate light, so the breakdown voltage and insulation resistance of the workpiece , Temperature resistance and adhesion of the photosensitive member can be improved. Further, since the work does not need to be forcibly cooled by the air cooling means during the light irradiation, the cause of the dust adhering to the work is reduced, and the adjustment of the air in the clean room is less affected.

Further, the light irradiation processing apparatus can adjust the position of the light distribution mechanism to irradiate a light beam of a desired wavelength to the work in accordance with the light processing state of the work. Proper processing is possible for the photoinitiator of the photosensitive member used for the workpiece in the direction. In addition, it can be appropriately performed even when the purpose of light irradiation is different, such as work patterning and work modification work.

Since the light distribution unit of the light distribution mechanism is provided between the discharge lamp and the work at least once so that light of a predetermined wavelength passes therethrough, the light distribution unit is moved to illuminate the work. By adjusting the relative intensity of light, the photosensitive member of the work can be uniformly irradiated with light as an integrated light amount. Therefore, the values of the insulation resistance and the breakdown voltage of the work can be improved, the temperature resistance to solder performed in a later step can be improved, and the adhesion at the time of lamination can be improved.

A light distribution unit that reflects or absorbs light of a predetermined wavelength is provided on at least a part of the light transmitting member provided in the discharge lamp, and the position of the light distribution unit is equalized in the integrated light amount that irradiates the work with light. Because the position can be adjusted in advance as described above, the work after the reforming operation has improved insulation resistance and breakdown voltage, and has improved the temperature resistance to solder performed in a later process, and the lamination when laminating. Adhesion can be improved.

When the work of modifying the work is performed, a light transmitting member such as a jacket tube or a light transmitting plate is used, a light distribution section is provided in a part thereof, and the integrated light amount is adjusted in accordance with the illuminance distribution of the patterned work. Because the position of the light distribution unit is adjusted so as to be uniform, the photosensitive member of the work
A structure that can be used as a permanent insulating film can be employed.

When performing a light irradiation operation on a work, it is necessary to irradiate a light beam of a predetermined wavelength over the entire surface of the work, so that the work is supported vertically by the upper end support portion and the lower end support portion. Since the workpiece can be transported along the transport path, and the work can be easily supported and separated, the work can be easily loaded into the light irradiation device, supported, and unloaded. In addition, since the light irradiation distance to the work can be kept uniform, accurate light irradiation work can be performed.

The work is conveyed at a predetermined speed by the conveyance mechanism, and light irradiation corresponding to the processing state of the work is performed by the light irradiation mechanism via the light distribution mechanism.
When the work is transferred from the light irradiation device to the next process by the transfer mechanism, the difference between the temperature of the work and the room temperature does not greatly open, and the intrusion of moisture into the work is suppressed,
Post-processing can also be performed appropriately.

[Brief description of the drawings]

FIG. 1 is a side view of a light irradiation device of the present invention.

FIG. 2 is a plan view of the light irradiation device of the present invention.

FIG. 3 is a side view showing a main part of a transport mechanism of the light irradiation device of the present invention.

FIG. 4 is a cross-sectional view showing a main part of a light source unit of the light irradiation device of the present invention.

FIG. 5 is a principle diagram showing a use state of the light distribution mechanism of the light source unit of the present invention.

FIG. 6 is a front view showing a main part of the transport mechanism of the present invention.

FIG. 7 is a plan view showing a main part of a work transfer mechanism of the present invention.

FIG. 8 is a graph showing peak characteristics of a photoinitiator of the photosensitive member of the present invention.

FIG. 9 is a graph showing the illuminance distribution of the work of the present invention.

FIG. 10 is a graph showing the insulation resistance value of the work after the reforming work of the present invention.

FIG. 11 is a principle view showing a use state of another light distribution mechanism of the present invention.

FIG. 12 is a principle view showing a use state of another light distribution mechanism of the present invention.

13A is a graph showing a difference in curing reaction of a conventional photosensitive member depending on a measurement temperature, and FIG. 13B is a graph showing a heat flow curve and a curing rate curve of the conventional photosensitive member.

FIG. 14 is a graph showing light absorption characteristics of a conventional photosensitive member (diazo photosensitive liquid).

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Light irradiation device 1 1a Carry-in port 1b Carry-out port 2 Transport mechanism 2A Upper-end support part 2B Lower-end support part 2C Drive part 2D Attachment part 2E Auxiliary carry-in part 2F Auxiliary carry-out part 2G Rotating pulley 2a Support pillar 2b Rotary roller 2c Holding body 2d Holding member 2e Cam 2f Coil spring 2g Holding contact portion 2h Drive chain 2j Support base 2k Convex portion 3 Light irradiation mechanism 3A Light source unit 3B Reflector mirror 3a Discharge lamp 3b Inner jacket tube (light transmitting member) 3c Outer jacket tube (light transmitting member) 3d Both-ends support part 3e Jacket fixing part 4 Light distribution mechanism 4a Light distribution part 4b Light distribution part 5 Cooling mechanism 5a Cooling flow path 8 Moving device 40 Light distribution mechanism 44 Light transmission plate (light transmission member) 42 Light distribution part

Continuation of the front page (56) References JP-A-4-182128 (JP, A) JP-A-3-288858 (JP, A) JP-A-2-207253 (JP, A) JP-A-62-2229142 (JP) JP-A-62-187345 (JP, A) JP-A-62-162330 (JP, A) JP-A-61-29124 (JP, A) JP-A-55-60944 (JP, A) (58) Field surveyed (Int.Cl. ⁷ , DB name) G03F ^7/ 20-7/24 G03F 9/00-9/02

Claims (7)

(57) [Claims] A transport mechanism for transporting the work along a transport path; and an entire surface of the work transported by the transport mechanism.
A light irradiation mechanism for performing light irradiation over a period of time, and a light distribution for controlling light of a predetermined wavelength that promotes modification by polymerization of a photosensitive member of the work among irradiation light from the light irradiation mechanism. A light distribution unit, wherein the light distribution mechanism has a light distribution unit which can selectively set by reflecting or absorbing light of a predetermined wavelength in advance in accordance with the processing content of the work. . 2. The light distribution mechanism according to claim 1, wherein the light of a predetermined wavelength is reflected or absorbed by a light transmitting member through which the light of a predetermined wavelength passes at least once between the workpiece and the discharge lamp.
Possible provided light distribution portion, in correspondence with the photosensitive member of the workpiece, the light irradiation apparatus according to claim 1, characterized in that set in advance adjusting the position of the light distribution portion. 3. The light distribution mechanism has a light transmitting member that transmits light to a discharge lamp of the light irradiation mechanism, and the light transmitting member reflects or absorbs light of a predetermined wavelength on at least a part thereof. By providing a light distribution unit, and by moving and adjusting the position of the light distribution unit of the light transmitting member and fixing the light distribution unit by a fixing unit so that the integrated light amount of light applied over the entire surface of the work becomes uniform. The light irradiation processing apparatus according to claim 1, wherein the light irradiation processing apparatus is adjusted in advance. 4. The light distribution mechanism has a light-transmitting member on a jacket tube provided along the discharge lamp of the light irradiation mechanism, and the light-transmitting member is provided on at least a part of the jacket tube. provided light distribution member for reflecting or absorbing light of a predetermined wavelength emitted from the lamp, the jacket tube, the ends detachably fixed by fixing means, over the entire surface of the workpiece
As cumulative amount of light applied is equalized Te, the light irradiation apparatus according to claim 1 in which the position of the light distribution member provided on the jacket tube, is adjusted beforehand. 5. The light-transmitting member is a light-transmitting plate provided via a rotating mechanism along a discharge lamp of the light irradiation mechanism, and at least a part of the light-transmitting plate has a predetermined wavelength. said light distribution portion that absorbs the light or reflection provided on the entire surface of the workpiece
3. The light irradiation processing apparatus according to claim 2, wherein the rotation angle of the light-transmitting plate is adjusted in advance so that the integrated light amount applied over the entire surface becomes uniform. 6. A transport mechanism, comprising: an upper end supporter for erecting a work and supporting an upper end thereof along a transfer path; a lower end supporter for supporting a lower end of the work along a transfer path;
A moving mechanism for moving the lower end supporting portion at a predetermined speed, the lower end supporting portion includes a holding body for holding a predetermined position of the work, and an elastic member for biasing the holding body in a contacting direction. And an actuating unit that operates on a carry-in side and a carry-out side of the transport path in a direction of separating the holding body against a biasing force of the elastic member by contacting a part of the holding body. The light irradiation processing apparatus according to any one of claims 1 to 5. 7. An entire surface of a patterned workpiece.
Pre-analysis of the illuminance distribution of the I, the photosensitive of the work
In modification treatment operations by polymerization of sexual member, as entirely integrated quantity of light over the workpiece is equalized in conjunction with the illuminance distribution, to precondition the illuminance distribution of the workpiece
A first step of order, a second step of conveying to the transfer port by receiving a predetermined speed the workpiece carry-in port, the second step
A third step of irradiating the workpiece conveyed in step (1) with the illuminance distribution adjusted in the first step.