JP3276249B2 - Slant complex permittivity type spatial light modulator - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a spatial light modulator in which a first transparent electrode, a photoconductive layer, a light absorbing layer, a dielectric multilayer mirror, a light modulating layer and a second transparent electrode are laminated, or a first transparent electrode. A spatial light modulator in which a photoconductive layer, a dielectric multilayer mirror, a light modulation layer, and a second transparent electrode are stacked;
It has a transparent electrode, a photoconductive layer, a dielectric multilayer mirror, a light modulating layer, and a second transparent electrode, and at least two or more transparent layers (or between the photoconductive layer and the second transparent electrode) , An opaque layer).
In particular, of the layers constituting the dielectric multilayer mirror inserted between the photoconductive layer and the light modulation layer, the light modulation of two adjacent layers having different refractive indices and being adjacent to each other. The complex permittivity of each layer constituting the dielectric multilayer mirror is set so that the absolute value of the complex permittivity near the layer is not greater than the absolute value of the complex permittivity near the photoconductive layer. Thus, two-dimensional information such as an image or a data pattern incident in the form of writing light is captured, and the two-dimensional information is displayed with high definition based on the incident reading light. The present invention relates to a modulation element.

[Summary of the Invention] The present invention relates to a spatial light modulating element in which a first transparent electrode, a photoconductive layer, a light absorbing layer, a dielectric multilayer mirror, a light modulating layer and a second transparent electrode are laminated,
A spatial light modulating element in which a transparent electrode, a photoconductive layer, a dielectric multilayer mirror, a light modulating layer and a second transparent electrode are laminated, or a first transparent electrode, a photoconductive layer, a dielectric multilayer mirror, a light modulating layer and The invention relates to a spatial light modulator having two transparent electrodes and having at least two or more transparent layers (or opaque layers) between the photoconductive layer and the second transparent electrode. Of the layers constituting the dielectric multilayer mirror inserted between the layer and the light modulating layer, the two layers having different refractive indices and being closer to the light modulating layer of the two adjacent layers By setting the complex permittivity of each layer constituting the dielectric multilayer mirror so that the absolute value of the complex permittivity of is not larger than the absolute value of the complex permittivity closer to the photoconductive layer, To display images with resolution It is intended.

[0003]

2. Description of the Related Art A spatial light modulator for capturing two-dimensional information such as an image or a data pattern incident in the form of writing light and displaying the two-dimensional information with high definition based on the incident reading light. Conventionally, U.S. Patent N
o. No. 4,127,322 (Rodony D. Stele)
rling, Robert D. Te Kolste, Joseph M. Haggerty, Thom
asC.Borah and William P.Bleha: “Video-rate liquid
-crystal light-valve using an amorphous silicon ph
The element shown in "otoconductor" SID 90 Digest pp.327-329 (1990)) is known.

As shown in FIG. 11, a spatial light modulator shown in the patent specification and the patent document includes a fiber plate substrate 101, a first transparent electrode 102, and a photoconductive layer 103.
Light absorption layer 104, dielectric multilayer mirror 105,
A first alignment layer 106, a nematic liquid crystal layer 107, and a second
Orientation layer 108, second transparent electrode 109, quartz substrate 11
0 are sequentially stacked in close contact with each other. An AC voltage is applied between the first transparent electrode 102 and the second transparent electrode 109 by the AC power supply 111, and light is applied to the fiber plate substrate 101 side. When a writing light 112 containing information is made incident, the resistance value of the photoconductive layer 103 is changed, and optical information is two-dimensionally written on the nematic liquid crystal layer 107 sealed with the sealing layer 113, and the quartz substrate 110 is written.
The information written in the nematic liquid crystal layer 107 is read out by the reading light 114 incident on the side, and this is emitted as the display light 115.

[0005]

However, the above-mentioned conventional spatial light modulator has the following problems.

That is, although the photoconductive layer 103 and the light absorbing layer 104, the dielectric multilayer mirror 105, and the nematic liquid crystal layer 107 are all formed of thin films, the resolution of the spatial light modulator is low.

For example, in the above document, FIG.
As shown in FIG. 5, a set of black and white gratings is written as optical information between the 1-mm width on the photoconductive layer 103 constituting the spatial light modulator, and the first alignment layer 106, the nematic liquid crystal layer 107, and the second When the maximum value of the number of grids that can be read from the nematic liquid crystal layer 107 of the liquid crystal light modulation layer 116 constituted by the alignment layer 108 is defined as a limit resolution, and when this is expressed as lp (line pairs) / mm, the limit resolution Is difficult to be about 30 lp / mm or more.
For this reason, there is a problem that a high-definition image cannot be displayed unless a large spatial light modulator having a diagonal length of 2 inches or more is used.

Further, when the size of the spatial light modulator is increased as described above, an optical system for writing an image to the spatial light modulator and an optical system for reading an image from the spatial light modulator are also increased in size. There has been a problem that the projection type display using the modulation element and the entire image processing apparatus become large and the manufacturing cost increases.

In view of the above circumstances, the present invention can greatly improve the resolution of the element itself, and can display a high-definition image without increasing the size of the element itself and each optical system. An object of the present invention is to provide an inclined complex permittivity type spatial light modulator capable of achieving high definition of an image without increasing the size of a display or an image processing apparatus itself and without increasing manufacturing costs. I have.

[0010]

In order to achieve the above object, the present invention provides a tilted complex permittivity type spatial light modulator according to claim 1, wherein the first transparent electrode, the photoconductive layer, the light absorbing layer, A dielectric multilayer mirror, a light modulating layer, and a second transparent electrode are laminated and formed. From the first transparent electrode side, a voltage is repeatedly applied between the first transparent electrode and the second transparent electrode. Based on the incident write light, the impedance of the photoconductive layer is changed to change the state of the light modulation layer, and the read light incident from the second transparent electrode side is two-dimensionally changed by the light modulation layer. In the spatial light modulator, which is reflected by the dielectric multilayer mirror and emitted from the second transparent electrode side while modulating, the spatial light modulator includes a dielectric multilayer mirror inserted between the photoconductive layer and the light modulation layer. Each component layer The absolute value of the complex permittivity of the two adjacent layers having different refractive indices and being closer to the light modulating layer does not become larger than the absolute value of the complex permittivity of the two adjacent layers closer to the photoconductive layer. Thus, the present invention is characterized in that the complex dielectric constant of each layer constituting the dielectric multilayer mirror is set.

According to a second aspect of the present invention, there is provided a tilted complex permittivity type spatial light modulator formed by laminating a first transparent electrode, a photoconductive layer, a dielectric multilayer mirror, a light modulation layer, and a second transparent electrode. Changing the impedance of the photoconductive layer based on writing light incident from the first transparent electrode side while repeatedly applying a voltage between the first transparent electrode and the second transparent electrode. The state of the modulation layer is changed, and while the readout light incident from the second transparent electrode side is two-dimensionally modulated by the light modulation layer, the readout light is reflected by a dielectric multilayer mirror and is reflected from the second transparent electrode side. In the spatial light modulation element to be emitted, among the layers constituting the dielectric multilayer mirror inserted between the photoconductive layer and the light modulation layer, each of the layers has a different refractive index and is adjacent to the other. Two layers The complex permittivity of each layer constituting the dielectric multilayer mirror is adjusted so that the absolute value of the complex permittivity closer to the light modulating layer is not larger than the absolute value of the complex permittivity closer to the photoconductive layer. It is characterized by setting.

According to a third aspect of the present invention, there is provided an inclined complex dielectric constant type spatial light modulator having a first transparent electrode, a photoconductive layer, a dielectric multilayer mirror, a light modulation layer, and a second transparent electrode. Between the layer and the second transparent electrode, at least 1
One or more transparent layers, or an opaque layer, while repeatedly applying a voltage between the first transparent electrode and the second transparent electrode, while writing light incident from the first transparent electrode side Based on this, the state of the light modulation layer is changed by changing the impedance of the photoconductive layer, and the read light incident from the second transparent electrode side is changed by the light modulation layer into two.
In a spatial light modulation element that modulates dimensionally and emits it,
Among the layers constituting the dielectric multilayer mirror inserted between the photoconductive layer and the light modulating layer, two adjacent light modulating layers having different refractive indices and being adjacent to each other. So that the absolute value of the complex permittivity closer to is not larger than the absolute value of the complex permittivity closer to the photoconductive layer.
It is characterized in that the complex dielectric constant of each layer constituting the dielectric multilayer mirror is set.

According to a fourth aspect of the present invention, in the inclined complex dielectric constant type spatial light modulator according to any one of the first to third aspects, the light modulating layer includes a nematic liquid crystal, a cholesteric liquid crystal, a smectic liquid crystal, The liquid crystal display is characterized in that at least one selected from the group consisting of a mixture of these nematic liquid crystal, cholesteric liquid crystal and smectic liquid crystal is used.

According to a fifth aspect of the present invention, in the tilted complex permittivity type spatial light modulator according to any one of the first, second, and third aspects, the light modulation layer includes a nematic liquid crystal, a cholesteric liquid crystal, a smectic liquid crystal, These nematic liquid crystal, cholesteric liquid crystal, ordinary light refractive index of any one or more liquid crystal of the group composed of a mixture of smectic liquid crystal, extraordinary light refractive index or equivalent to any of the refractive indexes when the liquid crystal is randomly aligned. One of a liquid crystal and a resin composite in which the liquid crystal is dispersed in a resin having a refractive index and a liquid crystal and a resin composite in which the resin is dispersed in the liquid crystal are used.

According to a sixth aspect of the present invention, in the tilted complex permittivity type spatial light modulator according to any one of the first, second, and _third aspects, the light modulation layer is formed of LiNbO ₃ , LiTa.
O ₃ , KDP, DKDP, ADP, KTP, KNb
O ₃ , Sr _x Ba _1-x Nb ₂ O ₆ , GaAs, InP,
It is characterized in that one or more electro-optical crystals selected from the group consisting of GaP crystals are used.

According to a seventh aspect of the present invention, in the inclined complex permittivity type spatial light modulator according to any one of the first to third aspects, the photoconductive layer is made of silicon, germanium, or carbon. It is characterized in that an amorphous film made of any one or more elements of the group is used.

According to an eighth aspect of the present invention, in the inclined complex permittivity type spatial light modulator according to any one of the first, second, and third aspects, the photoconductive layer includes an amorphous silicon film and a hydrogenated amorphous silicon film. , Amorphous silicon carbide film, hydrogenated amorphous silicon carbide film, amorphous selenium film, amorphous SeAs
It is characterized by using at least one film of a group consisting of a film, an amorphous ZnS film, an amorphous CdS film, and an amorphous CdSe film.

[0018] According to claim 9, in inclined complex dielectric constant type spatial light modulator according to claim 1, 2, 3, as the photoconductive layer, GaAs crystal, GaP crystal, Bi ₁₂ SiO It is characterized in that one or more crystals selected from the group consisting of ₂₀ crystals and Bi ₁₂ GeO ₂₀ crystals are used.

According to claim 10, claims 1, 2, and 3
In the inclined complex dielectric constant type spatial light modulator according to any one of the above, as the photoconductive layer, a phthalocyanine pigment, an azo pigment, a polycyclic quinone pigment, a perylene pigment,
Perinone pigments, anthraquinone pigments, indigo pigments, thioindigo pigments, dioxazine pigments, azo lake pigments, thiapyrylium pigments, quinacridone pigments, cyanine pigments, pyrrol pigments, porphyrin pigments, anthantone pigments, squarylium pigments , Azulhenium dye, ZnO, TiO, CdS or CdSe
Is characterized by using a material in which is dispersed in a resin.

According to an eleventh aspect of the present invention, in the inclined complex dielectric constant type spatial light modulator according to the first aspect, the light absorbing layer is substantially composed of a CdTe film, a diamond-like carbon film, or silicon, carbon, and germanium. The feature is that one or more films selected from the group constituted by the amorphous films configured in a symmetrical manner are used.

According to a twelfth aspect of the present invention, in the inclined complex dielectric constant type spatial light modulator according to the first aspect, the light absorbing layer is selected from the group consisting of an inorganic pigment, an organic pigment, carbon, and a dye. It is characterized by using a resin composite in which one or more of the obtained materials are dispersed in a resin.

According to claim 13, claims 1, 2, and 3
In the inclined complex permittivity type spatial light modulator according to any one of the above, the dielectric multilayer mirror may be made of SiO
₂ film, TiO ₂ film, HfO ₂ film, Ta ₂ O ₅ film, ZnS
Film, Al ₂ O ₃ film, Na ₂ AlF ₆ film, MgF ₂ film, L
aF ₃ film, GdF ₃ film, SmF ₃ film, CeF ₃ film, Zr
It is characterized by using a multilayer film in which two or more films selected from the group consisting of an O ₂ film and a CeO ₂ film are stacked.

[0023]

In the above structure, in the inclined complex permittivity type spatial light modulator according to claim 1, the first transparent electrode, the photoconductive layer,
The first transparent electrode is formed by laminating a light absorbing layer, a dielectric multilayer mirror, a light modulating layer, and a second transparent electrode, and the first transparent electrode and the second transparent electrode are repeatedly applied with a voltage between the first transparent electrode and the second transparent electrode. Based on the writing light incident from the transparent electrode side, the state of the light modulation layer is changed by changing the impedance of the photoconductive layer, and the read light incident from the second transparent electrode side is changed by the light modulation layer. In a spatial light modulation element that reflects light by a dielectric multilayer mirror and emits light from the second transparent electrode side while modulating two-dimensionally, a dielectric material inserted between the photoconductive layer and the light modulation layer Among the layers constituting the multilayer mirror, the absolute value of the complex dielectric constant of the two adjacent layers having different refractive indices and being closer to the light modulating layer is closer to the photoconductive layer. The absolute value of the complex permittivity of Also, by setting the complex permittivity of each layer constituting the dielectric multilayer mirror so as not to increase, the resolution of the element itself is greatly improved, without increasing the size of the element itself and each optical system, A high-definition image is displayed, thereby achieving high-definition of the image without increasing the size of the projection display or the image processing apparatus itself and without increasing the manufacturing cost.

Further, in the inclined complex permittivity type spatial light modulator according to the second aspect, the first transparent electrode, the photoconductive layer, the dielectric multilayer mirror, the light modulating layer and the second transparent electrode are laminated. Changing the impedance of the photoconductive layer based on writing light incident from the first transparent electrode side while repeatedly applying a voltage between the first transparent electrode and the second transparent electrode. The state of the modulation layer is changed, and while the readout light incident from the second transparent electrode side is two-dimensionally modulated by the light modulation layer, the readout light is reflected by a dielectric multilayer mirror and is reflected from the second transparent electrode side. In the spatial light modulation element to be emitted, among the layers constituting the dielectric multilayer mirror inserted between the photoconductive layer and the light modulation layer, each of the layers has a different refractive index and is adjacent to the other. Two layers The complex permittivity of each layer constituting the dielectric multilayer mirror is adjusted so that the absolute value of the complex permittivity closer to the light modulating layer is not larger than the absolute value of the complex permittivity closer to the photoconductive layer. By setting, the resolution of the element itself is greatly improved, and a high-definition image is displayed without increasing the size of the element itself and each optical system, thereby increasing the size of the projection display and the image processing apparatus itself. Achieving high definition of an image without and without increasing the production cost.

According to a third aspect of the present invention, there is provided an inclined complex dielectric constant type spatial light modulator having a first transparent electrode, a photoconductive layer, a dielectric multilayer mirror, a light modulation layer, and a second transparent electrode. A layer having at least two or more transparent layers or an opaque layer between the layer and the second transparent electrode;
While repeatedly applying a voltage between the transparent electrode and the second transparent electrode, the impedance of the photoconductive layer is changed based on the writing light incident from the first transparent electrode side to change the state of the light modulation layer. In the spatial light modulation element that modulates the readout light incident from the second transparent electrode side two-dimensionally by the light modulation layer and emits the readout light, between the photoconductive layer and the light modulation layer. Among the layers constituting the dielectric multilayer mirror to be inserted, the absolute value of the complex dielectric constant of the two adjacent layers having different refractive indices and being closer to the light modulation layer is equal to By setting the complex permittivity of each layer constituting the dielectric multilayer mirror so as not to be larger than the absolute value of the complex permittivity closer to the conductive layer, the resolution of the element itself is greatly improved,
High-definition images can be displayed without increasing the size of the element itself or each optical system, thereby increasing the resolution of images without increasing the size of the projection display or image processing device itself and without increasing the manufacturing cost. To achieve.

According to a fourth aspect of the present invention, in the tilted complex permittivity type spatial light modulator according to any one of the first, second, and third aspects, the light modulation layer includes a nematic liquid crystal, a cholesteric liquid crystal, a smectic liquid crystal, By selecting and using one or more liquid crystals of a group composed of a mixture of these nematic liquid crystal, cholesteric liquid crystal, and smectic liquid crystal, each element constituting the element is specified,
The effects described in claims 1, 2, and 3 are obtained by the existing material.

According to a fifth aspect of the present invention, in the inclined complex dielectric constant type spatial light modulator according to any one of the first to third aspects, the light modulating layer includes a nematic liquid crystal, a cholesteric liquid crystal, a smectic liquid crystal, These nematic liquid crystal, cholesteric liquid crystal, ordinary light refractive index of any one or more liquid crystal of the group composed of a mixture of smectic liquid crystal, extraordinary light refractive index or equivalent to any of the refractive indexes when the liquid crystal is randomly aligned. By using either a liquid crystal / resin composite in which the liquid crystal is dispersed in a resin having a refractive index, or a liquid crystal / resin composite in which the resin is dispersed in the liquid crystal, each element constituting the element Is specified, and the effects described in claims 1, 2, and 3 are obtained by the existing material.

According to a sixth aspect of the present invention, in the tilted complex permittivity type spatial light modulator according to any one of the first, second, and _third aspects, the light modulating layer is formed of LiNbO ₃ , LiTa.
O ₃ , KDP, DKDP, ADP, KTP, KNb
O ₃ , Sr _x Ba _1-x Nb ₂ O ₆ , GaAs, InP,
By using one or more electro-optic crystals selected from the group consisting of GaP crystals, each element constituting the element is specified, and the elements are specified according to existing materials.
The effect shown in FIG.

According to a seventh aspect of the present invention, in the inclined complex permittivity type spatial light modulator according to any one of the first, second, and third aspects, the photoconductive layer is made of silicon, germanium, or carbon. By using an amorphous film made of any one or more elements of the group, each element constituting the element is specified, and an existing material is used.
The effects shown in 2 and 3 are obtained.

According to claim 8, in the inclined complex permittivity type spatial light modulator according to any one of claims 1, 2, and 3, the amorphous silicon film and the hydrogenated amorphous silicon film are used as the photoconductive layer. , Amorphous silicon carbide film, hydrogenated amorphous silicon carbide film, amorphous selenium film, amorphous SeAs
Claims 1 and 2 wherein each element constituting an element is specified by using at least one film of a group constituted by a film, an amorphous ZnS film, an amorphous CdS film, and an amorphous CdSe film, and the material is used. The effect shown in FIG.

According to a ninth aspect of the present invention, in the tilted complex permittivity type spatial light modulator according to any one of the first, second, and third aspects, the photoconductive layer is formed of a GaAs crystal, a GaP crystal, or a Bi ₁₂ SiO crystal. By using one or more crystals selected from the group consisting of ₂₀ crystals and Bi ₁₂ GeO ₂₀ crystals, each element constituting the device is specified, and the elements are specified according to existing materials. Get the effect.

According to claim 10, claims 1, 2, 3
In the inclined complex dielectric constant type spatial light modulator according to any one of the above, as the photoconductive layer, a phthalocyanine pigment, an azo pigment, a polycyclic quinone pigment, a perylene pigment,
Perinone pigments, anthraquinone pigments, indigo pigments, thioindigo pigments, dioxazine pigments, azo lake pigments, thiapyrylium pigments, quinacridone pigments, cyanine pigments, pyrrol pigments, porphyrin pigments, anthantone pigments, squarylium pigments , Azulhenium dye, ZnO, TiO, CdS or CdSe
By using a material in which is dispersed in a resin, each element constituting the element is specified, and the effects described in claims 1, 2 and 3 are obtained by the existing material.

In the eleventh aspect, in the inclined complex permittivity type spatial light modulator according to the first aspect, the light absorbing layer is substantially composed of a CdTe film, a diamond-like carbon film, or silicon, carbon, and germanium. By using one or more films selected from the group constituted by the amorphous films formed in a specific manner, each element constituting the element is specified, and the effect described in claim 1 is obtained by the existing material.

According to a twelfth aspect of the present invention, in the inclined complex dielectric constant type spatial light modulator according to the first aspect, the light absorbing layer is selected from the group consisting of an inorganic pigment, an organic pigment, carbon, and a dye. By using a resin composite in which one or more of the above-mentioned materials are dispersed in a resin, each element constituting the element is specified, and the effect described in claim 1 is obtained by the existing material.

According to claim 13, claims 1, 2, and 3
In the inclined complex permittivity type spatial light modulator according to any one of the above, the dielectric multilayer mirror may be made of SiO
₂ film, TiO ₂ film, HfO ₂ film, Ta ₂ O ₅ film, ZnS
Film, Al ₂ O ₃ film, Na ₂ AlF ₆ film, MgF ₂ film, L
aF ₃ film, GdF ₃ film, SmF ₃ film, CeF ₃ film, Zr
By using a multilayer film in which two or more films selected from the group consisting of an O ₂ film and a CeO ₂ film are stacked,
Each element constituting the element is specified, and the effects described in claims 1, 2 and 3 are obtained by the existing material.

[0036]

【Example】

<< Explanation of Basic Principle >> First, considering the reason why the resolution of a conventionally known spatial light modulator is low, the cause is considered. Among the layers constituting the dielectric multilayer mirror 105, the absolute value of the complex dielectric constant of the two adjacent layers having different refractive indices and being closer to the liquid crystal light modulation layer 116 is light It was concluded that the complex permittivity of each layer constituting the dielectric multilayer mirror 105 was not set so that the absolute value of the complex permittivity closer to the conductive layer 103 would not become larger.

That is, US Pat. 4127322
In the specification of the issue, the dielectric content of the spatial light modulator described in the same specification is obtained from the description contents of lines 30 to 35 of page 9 and lines 15 to 20 of page 9. The body multilayer mirror 105 is composed of a TiO ₂ thin film and a SiO ₂ thin film, and it is specified that the mirror has a thickness of 1.54 μm and a sheet resistance of 10 ¹⁰ Ω / □ or more. In other words, this dielectric multilayer mirror 105
It can be described as having a specific resistance of 1.54 × 10 ⁶ Ωcm or more.

However, in general, since the spatial light modulator using liquid crystal for the liquid crystal light modulating layer 116 is driven by an AC voltage, the sheet resistance or specific resistance of the dielectric multilayer mirror 105 constituting the spatial light modulator is generally used. The device design method of this patent specification using only electrical parameters is clearly wrong.

Therefore, when designing a spatial light modulator driven by an AC voltage, the dielectric constant of the dielectric multilayer mirror 105, the dielectric constant, and the complex dielectric constant including the frequency of the drive voltage are used as electrical parameters to set the dielectric constant. Body multilayer mirror 10
It is necessary to properly determine the electrical characteristics of each of the layers constituting the layer 5. In particular, in order to design a high-resolution spatial light modulator, the photoconductive layer 103 and the liquid crystal light
Of the layers constituting the dielectric multilayer mirror 105 inserted between the two layers, the two adjacent layers have different refractive indices, and the complex dielectric of the two adjacent layers which is closer to the liquid crystal light modulation layer 116. In order that the absolute value of the permittivity does not become larger than the absolute value of the complex permittivity closer to the photoconductive layer 103,
The complex permittivity of each layer constituting the dielectric multilayer mirror 105 must be set.

In the following, US Pat. 4127322
Using the embodiment of the spatial light modulator described in the above, the absolute value of the complex permittivity of two types of dielectric thin films having different refractive indices among the layers constituting the dielectric multilayer mirror 105 was obtained. The reason why the resolution of the spatial light modulator is low will be clarified numerically.

First, US Pat. No. 4,127,322 describes a dielectric multilayer mirror 105 for a spatial light modulator.
The relative permittivity of the TiO ₂ thin film and the relative permittivity of the SiO ₂ thin film constituting the above are determined. The relative permittivity of these materials is
U.S. Pat. Although not described in the specification of US Pat. No. 4,127,322, it generally has the values shown in Table 1.
However, Table 1 shows that the relative permittivity of the TiO ₂ single crystal in the C-axis direction (ε _e ), the relative permittivity in the direction perpendicular to the C-axis (ε _o ), and the relative permittivity of the fused quartz (ε _c) ). These numerical values have some differences depending on the literature, but all are generally well-known values.

[0042]

[Table 1] Then, SiO ₂ constituting the dielectric multilayer mirror 105 is formed.
The dielectric constant of the film (epsilon _S) is approximately equivalent to the relative dielectric constant and the refractive index of fused quartz is given by _{ε S ≒ ε c = 4.1 ...} (1).

On the other hand, since the TiO ₂ film constituting the dielectric multilayer mirror 105 is considered to have polycrystallinity, its relative dielectric constant ε _T is given by: ε _T = (2ε _o + ε _e ) / 3 ( 2) can be used. Based on these values and the values shown in Table 1, the relative dielectric constant _{T T} of the TiO ₂ film is _T = 148.9 (3).

Then, the specific resistance of the TiO ₂ film constituting the dielectric multilayer mirror 105 and the specific resistance of the SiO ₂ film are calculated as follows:
Assuming that ρ _T and ρ _S , respectively, and that the angular frequency of the AC voltage driving the spatial light modulator is ω, the complex permittivity ε _ZT of the TiO ₂ film and the complex permittivity ε _ZS of the SiO ₂ film are ε _ZT , respectively. _{= ε V ε T + (jωρ} T) -1 ... (4) ε ZS = ε V ε S + (jωρ S) is given by ^-1 ... (5). Where ε _V is the dielectric constant in vacuum and j is j
An imaginary unit represented by ² = -1. Thereby, Ti
The absolute values | ε _ZT | and | ε _ZS | of the complex permittivity ε _ZT of the O ₂ film and the complex permittivity ε _ZS of the SiO ₂ film are, respectively,

[Number 1] _{| ε ZT | = {(ε} V ε T) 2 + (ωρ T) -2} 0.5 ... (6) | ε ZS | = {(ε V ε S) 2 + (ωρ S) -2 ｝ ^0.5 ... (7) Here, when the both sides of the equations (6) and (7) are divided by the vacuum permittivity ε _V , the absolute values of the complex relative permittivity | ε _ZCT | and | ε _ZCS | The absolute values of the relative dielectric constants | ε _ZCT | and | ε _ZCS | are respectively | ε _ZCT | = | ε _ZT | / ε _V (8) | ε _ZCS | = | ε _ZS | / ε _V (9 ).

Using the above equations (1) to (9), US Pat. No. 4,127,322, which constitutes a dielectric multilayer mirror 105 of a spatial light modulator.
The absolute value of the complex relative permittivity of the iO ₂ film | ε _ZCT |
The absolute value of the complex relative permittivity of the _two films | ε _ZCS | can be easily derived.

As an example, TiO having the characteristics shown in Table 1
The absolute value of the complex relative permittivity of ₂ film | epsilon _{ZC T} | and the absolute value of the complex relative permittivity of the SiO ₂ film | epsilon _ZCS | and seek. However, the specific resistance ρ _T of the TiO ₂ film and the specific resistance ρ _S of the SiO ₂ film both belong to the range of 10 ⁷ to 10 ¹¹ Ωcm. These figures are given in US Pat.
o. No. 4,127,322 sufficiently satisfies the various conditions of the dielectric multilayer mirror 105 of the spatial light modulator.

Further, the frequency f of the AC voltage for driving the spatial light modulator is set to 10 to 10 ⁴ Hz, and
By substituting the numerical values of the specific resistance ρ _T of the iO ₂ film and the specific resistance ρ _S of the SiO ₂ film and the values shown in Table 1 into the expressions (1) to (9), the components of the dielectric multilayer mirror 105 are used. Some Si
O ₂ film absolute value of the complex relative permittivity of | epsilon _ZCS | a, TiO ₂
When the complex relative permittivity | ε _ZCT | of the film was calculated, the values shown in Tables 2 and 3 could be obtained.

[0048]

[Table 2]

[Table 3] Table 2 shows the specific resistance ρ _T and frequency f of the TiO ₂ film.
Of the complex relative permittivity of the TiO ₂ film according to the change of
epsilon _ZCT | indicates vary from 17,993 to 148.87, also Table 3 in accordance with a change in the resistivity [rho _S and the frequency f of the SiO ₂ film, the absolute value of the complex relative permittivity of the SiO ₂ film | epsilon _ZCS | Changes from 17993 to 4.1.

Here, comparing the contents of Table 2 with the contents of Table 3, it is found that the specific resistance ρ _T of the TiO ₂ film and the specific resistance ρ _S of the SiO ₂ film are ρ _T = ρ _S = 10 ⁷ Ωcm. TiO ₂ film and SiO ₂ except for the case where the frequency f is f = 10 Hz.
_It can be seen that the _two films have different complex relative dielectric constants.

By the way, as is well known, 2N
The dielectric multilayer mirror 105 composed of a multilayer film of +1 (N is a positive integer larger than 1) is a high refractive index thin film of N + 1 layers (in the spatial light modulator described in US Pat. No. 4,127,322, TiO 2 is used). _Two films correspond to this) and N
A low refractive index thin film (in the spatial light modulator described in US Pat. No. 4,127,322) corresponds to an SiO ₂ film which is alternately stacked.

That is, US Pat. Starting with the spatial light modulator described in US Pat. No. 4,127,322,
When manufacturing the dielectric multilayer mirror 105, the N + 1 layer T
Since the iO ₂ film are made of the same film formation conditions, any TiO ₂ film constituting the dielectric multilayer film mirror 105, have substantially the same electrical characteristics. In other words, each TiO
_{The two} films have approximately the same specific resistance and dielectric constant (or approximately the same complex relative dielectric constant).

Similarly, in the N-layer SiO ₂ film constituting the dielectric multilayer mirror 105, each layer has substantially the same electrical characteristics, that is, the N-layer SiO ₂ films have substantially the same specific resistance and dielectric constant ( Or, the complex relative permittivity).

In summary, the dielectric multilayer mirror 105 has two kinds of layers having different refractive indices, which are constituents thereof, having different complex dielectric constants.
Nos. 3,078,098, 5,81,898, 5,8,7,8, and 7, are alternately stacked.
All of the conventional dielectric multilayer mirrors, including the dielectric multilayer mirror 105 of the spatial light modulator described in Japanese Patent No. 4127322, have a periodicity in the thickness direction. This is considered to be a cause of greatly deteriorating the resolution of the light modulation element.

That is, the absolute value of the complex relative permittivity is changed from a layer having a small absolute value of the complex relative permittivity (in the spatial light modulator described in US Pat. No. 4,127,322, the SiO ₂ film corresponds to this). Large layer (US Pat. No. 412)
No. 7322 describes a spatial light modulation element which is made of TiO ₂
When the line of electric force travels toward
At a boundary between a layer having a small absolute value of the complex relative permittivity and a layer having a large absolute value of the complex relative permittivity, the power line is refracted and spreads in a direction orthogonal to the thickness direction of the dielectric multilayer mirror 105. As a result, the resolution of the spatial light modulator is reduced.

In general, the dielectric constant of a high refractive index layer is larger than that of a low refractive index layer. 4127
In addition to the spatial light modulator described in No. 322, in the conventional spatial light modulator, due to the periodicity of the complex permittivity of each layer constituting the dielectric multilayer mirror 105 which is a component of the device, The resolution of the device is greatly reduced.

As is apparent from the above description, a spatial light modulator (US) in which only the specific resistance of the dielectric multilayer mirror 105 inserted between the photoconductive layer 103 and the second transparent electrode 109 is determined. In the spatial light modulator described in Japanese Patent No. 4127322), the above-described mismatch is established not only in the cases shown in Tables 2 and 3, but also in many cases, and the resolution of this spatial light modulator is Is greatly reduced.

Therefore, in the inclined complex permittivity type spatial light modulator according to the present invention, the dielectric multilayer mirror 105 inserted between the photoconductive layer 103 and the liquid crystal light modulating layer 116 is a constituent element. Liquid crystal light modulating layers 116 of two adjacent layers having different refractive indices from each other.
The complex permittivity of each layer constituting the dielectric multilayer mirror 105 is set such that the absolute value of the complex permittivity closer to the photoconductive layer 103 does not become larger than the absolute value of the complex permittivity closer to the photoconductive layer 103. Accordingly, the basic principle is to increase the resolution of the spatial light modulator.

<< Description of First Embodiment >> FIG. 1 is a structural diagram showing a first embodiment of an inclined complex permittivity type spatial light modulator according to the present invention based on the above-described basic principle.

<Explanation of the Overall Configuration of the First Embodiment> The inclined complex permittivity type spatial light modulator 1 shown in this figure comprises a first transparent substrate 2, a first transparent electrode 3, a photoconductive layer 4, Light absorbing layer 5
A dielectric multilayer mirror 6, a light modulation layer 7, a second transparent electrode 8, a first antireflection film 9, a second transparent substrate 10,
The first anti-reflection film 11 is an element formed by successively closely contacting and laminating the second anti-reflection film 11. The first anti-reflection film 11 is formed by applying an AC voltage between the first transparent electrode 2 and the second
By making the writing light 13 incident on the transparent substrate 2 side,
The optical information is two-dimensionally written to the light modulation layer 7 by changing the resistance value of the photoconductive layer 4, and the read light 14 is incident on the second antireflection film 11 side, whereby the light is written to the light modulation layer 7. The read out information is read out and emitted as display light 15 to the outside.

<Description of AC Power Supply 12>
Is the AC voltage having a voltage value equal to or higher than a predetermined voltage value, that is, the major axis of the liquid crystal molecules in the liquid crystal / resin complex 19 (see FIGS. 2, 3, and 4) constituting the light modulation layer 7. An AC voltage value having an effective value larger than the effective value of the AC voltage necessary to match the direction of the applied electric field, for example, 10 to 10
An AC voltage having a voltage value of about 200 V is generated and applied to the first transparent electrode 3 and the second transparent electrode 8.

<Description of First Transparent Substrate 2>
The transparent substrate 2 is composed of the inclined complex permittivity type spatial light modulator 1
And a flat glass substrate serving as a substrate of the photoconductive layer 4.
The transparent electrode 3 is inserted.

<Description of First Transparent Electrode 3> First Transparent Electrode 3
Is a 0.05 μm thick ITO transparent electrode film formed by adding 5% Sn to In ₂ O ₃ , for example, between one surface of the photoconductive layer 4 and one surface of the first transparent substrate 2. In addition, a voltage is applied to the photoconductive layer 4 based on an AC voltage supplied from the AC power supply 12.

<Description of Photoconductive Layer 4> The photoconductive layer 4 is made of silicon,
Amorphous film consisting of one or more elements selected from the group consisting of germanium and carbon, amorphous silicon film, hydrogenated amorphous silicon film, amorphous silicon carbide film, hydrogenated amorphous silicon carbide film, etc. The light absorption layer 5 is laminated on one surface of a material whose impedance greatly changes.

As the photoconductive layer 4, for example, an amorphous selenium film, an amorphous S
eAs film, amorphous ZnS film, amorphous CdS
A film or an amorphous CdSe film can also be used. Further, as the photoconductive layer 4, a GaAs crystal,
GaP crystal, Bi ₁₂ SiO ₂₀ crystal, or Bi ₁₂ Ge
A crystal such as an O ₂₀ crystal, whose impedance changes significantly by light irradiation, is also suitable.

In addition, as the photoconductive layer 4, a dispersion type photoconductive film in which particles made of a photoconductive material are dispersed in a resin can be used. In this case, as the photoconductive material used for the dispersed photoconductive film, phthalocyanine pigments, azo pigments, polycyclic quinone pigments, perylene pigments, perinone pigments, anthraquinone pigments, indigo pigments, thioindigo pigments, Dioxazine pigments, azo lake pigments,
Thiapyrylium-based pigments, quinacridone-based pigments, cyanine-based pigments, pyrrol-based pigments, porphyrin-based pigments, anthantone-based pigments, squarylium-based pigments, azurenium-based pigments,
ZnO, TiO, CdS, CdSe, or the like can be used.

<Description of Light Absorbing Layer 5> The light absorbing layer 5 is made of CdT
e film, diamond-like carbon film, at least one film selected from the group consisting of amorphous film substantially composed of silicon, carbon and germanium, or composed of inorganic pigment, organic pigment, carbon, dye It is composed of a resin composite or the like in which one or more materials selected from a group to be dispersed are dispersed in a resin. Even if the write light 13 and the read light 14 are absorbed, the change in specific resistance is small, and It is made of a material that absorbs the reading light 14 particularly strongly, and the dielectric multilayer mirror 6 is laminated on one surface thereof.

<Description of Dielectric Multilayer Mirror 6> The dielectric multilayer mirror 6 is made of a SiO ₂ film, a TiO ₂ film, an HfO ₂ film,
Ta ₂ O ₅ film, ZnS film, Al ₂ O ₃ film, Na ₂ AlF
₆ film, MgF ₂ film, LaF ₃ film, GdF ₃ film, SmF ₃
The light modulating layer 7 is formed by laminating two or more films selected from the group consisting of a film, a CeF ₃ film, a ZrO ₂ film, and a CeO ₂ film.

In the inclined complex permittivity type spatial light modulator 1 of the first embodiment, among the layers inserted between the photoconductive layer 4 and the second transparent electrode 8, the photoconductive layer 2 and the light modulating layer 7 inserted between the light modulating layers 7, two adjacent layers of the light modulating layer 7 having different refractive indices from each other. The complex permittivity of each layer constituting the dielectric multilayer mirror 6 is set such that the absolute value of the complex permittivity closer to the photoconductive layer 4 does not become larger than the absolute value of the complex permittivity closer to the photoconductive layer 4. Have been.

<Description of Light Modulating Layer 7> As shown in FIG. 2, the light modulating layer 7 is composed of one or more liquid crystals 17 selected from the group consisting of a nematic liquid crystal, a cholesteric liquid crystal, a smectic liquid crystal, or a mixture of these liquid crystals. And the ordinary or extraordinary refractive index of the liquid crystal 17 or the liquid crystal 17
3 has a refractive index equivalent to one of the refractive indexes when randomly oriented, and a transparent resin 18 in which the liquid crystal 17 is dispersed.
As shown in the figure, a liquid crystal / resin composite 19 in which the transparent resin 18 is dispersed in the liquid crystal 17 is provided, and writing light 13 is incident from the first transparent substrate 2 side, and this is transmitted through the first transparent electrode 3. When the light enters the photoconductive layer 4 and the impedance of the photoconductive layer 4 changes to change the electric field applied to the light modulation layer 7, the refractive index of the liquid crystal 17 changes. Then, when the readout light 14 is incident from the second antireflection film 11 side and passes through the second transparent substrate 10, the first antireflection film 9, and the second transparent electrode 8, the refractive index of the liquid crystal 17 is reduced. After this is modulated two-dimensionally, the transmitted light is reflected by the dielectric multilayer mirror 6 and emitted as display light 15.

In this case, the liquid crystal / resin composite 19 is a liquid crystal / resin composite in which the ordinary or extraordinary refractive index of the liquid crystal 17 and the refractive index of the transparent resin 18 are substantially the same. 19, the liquid crystal / resin composite 1
When an electric field is not applied to the liquid crystal 9, the refractive index of the liquid crystal 17 and the refractive index of the transparent resin 18 are different from each other. When a sufficiently large electric field is applied to the liquid crystal / resin composite 19, the refractive index of the liquid crystal 17 substantially matches the refractive index of the transparent resin 18. When the readout light 14 is incident on the resin composite 19, it is transmitted without being scattered by the liquid crystal / resin composite 19.

In the liquid crystal / resin composite 19, the refractive index when the liquid crystal 17 as a component thereof is randomly oriented and the refractive index of the transparent resin 18 are substantially the same.
In the case of the resin composite 19, the liquid crystal / resin composite 19
When no electric field is applied, the refractive index of the liquid crystal 17 and
Since the refractive index of the transparent resin 18 matches, when the readout light 14 is incident on the liquid crystal / resin composite 19, it is transmitted as it is, and a sufficiently large electric field is applied to the liquid crystal / resin composite 19. The LCD 17
Is different from the refractive index of the transparent resin 18, when the writing light 14 is incident on the liquid crystal / resin composite 19, this is scattered by the liquid crystal / resin composite 19.

As described above, in the first embodiment, both of these liquid crystal / resin composites 19 can be used.
However, among these liquid crystal / resin composites 19, as in the former liquid crystal / resin composites 19, the ordinary light refractive index or extraordinary light refractive index of the liquid crystal 17 and the refractive index of the transparent resin 18 are substantially the same. It is preferable to use the type that is used. This is because the refractive index of the liquid crystal 17 when the liquid crystal 17 is randomly aligned and the refractive index of the transparent resin 18 are almost the same.
This is because, in the resin composite 19, when each part of the entire surface of the liquid crystal / resin composite 19 is viewed macroscopically, the random state of the liquid crystal 17 is different for each part, and the liquid crystal 17 appears to be uneven in the light transmitting state. . On the other hand, in the liquid crystal / resin composite 19 of the type in which the ordinary or extraordinary refractive index of the liquid crystal 17 matches the refractive index of the transparent resin 18, an electric field is applied to cause the liquid crystal molecules to move in a certain direction. Since the light is transmitted in the state of being arranged in a random arrangement, the light is transmitted almost uniformly even if the alignment is biased at the time of random alignment. Further, in a state where no electric field is applied, the state is substantially the same as when the molecules of the liquid crystal 17 are arranged on the wall surface of the transparent resin 18 and randomly aligned. This state is a light scattering state, and unlike a light transmitting state, even if the refractive index is slightly shifted, it is hardly noticeable. Therefore, in the spatial light modulation element using this type of liquid crystal / resin composite 19 as the light modulation layer 7, unevenness is hardly recognized.

In particular, among these, a liquid crystal / resin composite 19 of the type in which the ordinary light refractive index of the liquid crystal 17 and the refractive index of the transparent resin 18 are almost the same is optimal in terms of its performance.

The liquid crystal / resin composite 19 is prepared by mixing the liquid crystal 17 and the material constituting the transparent resin 18 to form a solution or a latex, which is subjected to photo-curing, thermal curing, and solvent removal. By curing, reaction curing, etc.
The transparent resin 18 and the liquid crystal 17 are separated, and the liquid crystal 17 is dispersed in the transparent resin 18 in the form of particles as shown in FIG. 2 or the liquid crystal 1 is dispersed in the transparent resin 18 as shown in FIG.
It is manufactured by dispersing the liquid crystal 7 in a communicating state or by dispersing the transparent resin 18 in the liquid crystal 17 as shown in FIG.

In this case, since the transparent resin 18 of the photo-curing or thermosetting type can be cured in a closed system,
It is preferable to use this type of transparent resin 18 from the viewpoint of device fabrication. In particular, the light-curing type transparent resin 18 can be cured in a short time, and after being cured, it is not easily affected by heat.

As a specific manufacturing method, as in the case of the conventional twisted nematic liquid crystal, a cell is formed using a sealing material, and an uncured nematic liquid crystal which becomes liquid crystal 17 from the injection port and a resin precursor which becomes transparent resin 18 are formed. After enclosing a body (a state before the resin is cured, here, for example, a state of a monomer or an oligomer is used as a generic term), it can be cured.

In the case of the liquid crystal / resin composite 19 of the present invention, for example, the first transparent electrode 3, the photoconductive layer 4, the light absorbing layer 5, and the dielectric material are formed on the first transparent substrate 2 without using a sealing material. The multi-layer mirror 6 is overlaid and adhered, a mixture of the uncured resin precursor and the liquid crystal 17 is applied thereon, and the second transparent electrode 8, the first antireflection film 9, the second transparent substrate 10, Second
After laminating the antireflection film 11, the resin precursor is cured by light irradiation or the like to form the inclined complex dielectric constant type spatial light modulator 1 having the liquid crystal / resin composite 19. Of course, after that, a sealing material may be applied to the periphery.
According to this manufacturing method, the mixture of the uncured liquid crystal 17 and the resin precursor may be simply supplied by roll coating, spin coating, printing, coating with a dispenser, or the like. Performance can be greatly improved.

The mixture of the uncured resin precursor and the liquid crystal 17 includes spacers such as ceramic particles, plastic particles, glass particles, and glass fibers for controlling the gap between the substrates, pigments, dyes, viscosity modifiers, and the like. In addition, additives that do not adversely affect the performance of the present invention may be added.

<Description of Second Transparent Substrate 10> The second transparent substrate 10 is formed of the inclined complex permittivity type spatial light modulator 1.
The first anti-reflection film 9 is laminated on one surface thereof, and the second anti-reflection film 11 is laminated on the other surface thereof.

<Description of Second Anti-reflection Film 11> The second anti-reflection film 11 is made of a SiO ₂ film, a TiO ₂ film, a HfO ₂ film, or a Ta film.
₂ O ₅ film, ZnS film, Na ₂ AlF ₆ film, MgF ₂ film,
It is composed of a multilayer film in which one or more films selected from the group consisting of a CeF ₃ film, a ZrO ₂ film, and a CeO ₂ film are laminated.

<Description of First Anti-Reflection Film 9> The first anti-reflection film 9 is made of a SiO ₂ film, a TiO ₂ film, a HfO ₂ film, a T
a ₂ O ₅ film, ZnS film, Na ₂ AlF ₆ film, MgF
A multilayer film is formed by laminating one or more films selected from the group consisting of _two films, a CeF ₃ film, a ZrO ₂ film, and a CeO ₂ film, and the second transparent electrode 8 is laminated on one surface thereof.

<Description of Second Transparent Electrode 8> Second Transparent Electrode 8
On the first antireflection film 9, for example, In ₂ O ₃ 5%
Is an ITO transparent electrode film having a thickness of 0.05 μm formed by adding Sn, and applies an electric field to the light modulation layer 7 based on an AC voltage supplied from the AC power supply 12.

As described above, in the first embodiment,
Among the layers inserted between the photoconductive layer 4 and the second transparent electrode 8, the components of the dielectric multilayer mirror 6 inserted between the photoconductive layer 4 and the light modulating layer 7 Of the two layers having different refractive indices, the absolute value of the complex permittivity of the two adjacent layers closer to the light modulation layer 7 is the absolute value of the complex permittivity closer to the photoconductive layer 4. Since the complex permittivity of each layer constituting the dielectric multilayer mirror 6 is set so as not to become larger than the absolute value, the resolution of the element itself is greatly improved, and It is possible to display a high-definition image without increasing the size, and without increasing the size of the projection display or the image processing apparatus itself, and without increasing the manufacturing cost.
High definition of an image can be achieved.

In the first embodiment, the first,
Although the second antireflection films 9 and 11 are used,
Either one of the first and second antireflection films 9 and 11,
Alternatively, even if both are deleted, the same effect as in the first embodiment can be obtained.

Further, in the first embodiment, the first antireflection film 9 is arranged between the second transparent electrode 8 and the second transparent substrate 10, but the second transparent electrode 8 First
The same effect can be obtained by replacing the anti-reflection film 9 and disposing the second transparent electrode 8 between the first anti-reflection film 9 and the second transparent substrate 10.

<< Description of Second Embodiment >> FIG. 5 is a sectional view showing a second embodiment of the inclined complex permittivity type spatial light modulator according to the present invention. In this figure, the same parts as those in FIG. 1 are denoted by the same reference numerals.

<Explanation of Entire Configuration of Second Embodiment> The point that the inclined complex permittivity type spatial light modulator 1 shown in this figure differs from the element shown in FIG. 1 is that the inclined complex permittivity type spatial light modulator shown in FIG. The first transparent substrate 2 is removed from the spatial light modulator 1 except for the light absorbing layer 5.
, A first transparent electrode 3, a photoconductive layer 4, a dielectric multilayer mirror 6, a light modulation layer 7, a second transparent electrode 8, a first antireflection film 9, a second transparent substrate 10, The second anti-reflection film 11
Are successively adhered and laminated.

Then, in a state where an AC voltage is applied between the first transparent electrode 3 and the second transparent electrode 8 by the AC power supply 12, the writing light 13 is made incident on the first transparent substrate 2 side, thereby The light modulation layer 7 is formed by changing the resistance value of the conductive layer 4.
The optical information is two-dimensionally written on the optical modulation layer 7 and the readout light 14 is made incident on the second antireflection film 11 side, thereby reading out the information written on the light modulation layer 7 and reading the information on the display light 1.
The light is emitted to the outside as 5.

In this case, in the inclined complex permittivity type spatial light modulator 1 of the second embodiment, the photoconductive layer 4 and the second transparent electrode 8 have a photoconductive layer Of the layers constituting the dielectric multilayer mirror 6 inserted between the layer 4 and the light modulating layer 7, two adjacent light modulating layers having different refractive indices and having different refractive indices. 7 so that the absolute value of the complex permittivity closer to 7 does not become larger than the absolute value of the complex permittivity closer to the photoconductive layer 4. Is set.

Even in this case, as in the first embodiment, the resolution of the element itself is greatly improved, and a high-definition image can be displayed without increasing the size of the element itself and each optical system. Accordingly, it is possible to achieve high definition of an image without increasing the size of the projection display or the image processing apparatus itself and without increasing the manufacturing cost.

In the second embodiment, the first,
Although the second antireflection films 9 and 11 are used,
Either one of the first and second antireflection films 9 and 11,
Alternatively, even if both are deleted, the same effect as in the second embodiment can be obtained.

In the second embodiment, the second transparent electrode 8 is inserted between the light modulating layer 7 and the first anti-reflection film 9. The same effect can be obtained by replacing the two transparent electrodes 8 and inserting the first antireflection film 9 between the light modulation layer 7 and the second transparent electrode 8.

<< Explanation of Third Embodiment >> FIG. 6 is a sectional view showing a third embodiment of the inclined complex permittivity type spatial light modulator according to the present invention. In this figure, the same parts as those in FIG. 1 are denoted by the same reference numerals.

<Explanation of Overall Configuration of Third Embodiment> The point that the inclined complex permittivity type spatial light modulator 1 shown in this figure is different from the element shown in FIG. 1 is that the light modulating layer 7 has a nematic liquid crystal, a cholesteric One selected from the group consisting of liquid crystals, smectic liquid crystals and mixtures of these nematic liquid crystals, cholesteric liquid crystals and smectic liquid crystals.
At least one liquid crystal is used and a dielectric multilayer mirror 6 is used.
A first alignment layer 20 for aligning liquid crystal molecules is provided between the light modulating layer 7 and the second transparent electrode 8.
A second alignment layer 21 for aligning liquid crystal molecules is provided between the first transparent substrate 2, the first transparent electrode 3, the photoconductive layer 4, the light absorbing layer 5, and the dielectric multilayer mirror. 6, the first alignment layer 20, the light modulation layer 7, the second alignment layer 21, the second transparent electrode 8, the first antireflection film 9, and the second transparent substrate 1.
0 and the second anti-reflection film 11 are successively adhered and laminated.

Then, in a state where an AC voltage is applied between the first transparent electrode 3 and the second transparent electrode 8 by the AC power supply 12, the writing light 13 is made incident on the first transparent substrate 2 side, thereby The light modulation layer 7 is formed by changing the resistance value of the conductive layer 4.
The optical information is two-dimensionally written on the optical modulation layer 7 and the readout light 14 is made incident on the second antireflection film 11 side, thereby reading out the information written on the light modulation layer 7 and reading the information on the display light 1.
The light is emitted to the outside as 5.

In this case, in the inclined complex dielectric constant type spatial light modulator 1 of the third embodiment, the photoconductive layer 4 and the second transparent electrode 8 have a photoconductive layer Of the layers constituting the dielectric multilayer mirror 6 inserted between the layer 4 and the light modulating layer 7, two adjacent light modulating layers having different refractive indices and having different refractive indices. 7 so that the absolute value of the complex permittivity closer to 7 does not become larger than the absolute value of the complex permittivity closer to the photoconductive layer 4. Is set.

Even in this case, as in the first embodiment, the resolution of the element itself is greatly improved, and a high-definition image can be displayed without increasing the size of the element itself or each optical system. Accordingly, it is possible to achieve high definition of an image without increasing the size of the projection display or the image processing apparatus itself and without increasing the manufacturing cost.

In the third embodiment, the first,
Although the second antireflection films 9 and 11 are used,
Either one of the first and second antireflection films 9 and 11,
Alternatively, even if both are deleted, the same effect as in the third embodiment can be obtained.

In the third embodiment, the second transparent electrode 8 is inserted between the light modulating layer 7 and the first anti-reflection film 9. The same effect can be obtained by replacing the two transparent electrodes 8 and inserting the first antireflection film 9 between the light modulation layer 7 and the second transparent electrode 8.

<< Description of Fourth Embodiment >> FIG. 7 is a sectional view showing a fourth embodiment of the inclined complex permittivity type spatial light modulator according to the present invention. In this figure, the same parts as those in FIG. 1 are denoted by the same reference numerals.

<Description of Overall Configuration of Fourth Embodiment> The inclined complex permittivity type spatial light modulator 1 shown in this figure differs from the element shown in FIG. 1 in that the inclined complex permittivity type spatial light modulator shown in FIG. From the spatial light modulator 1 to the first antireflection film 9 and the second transparent substrate 1
0 and the second antireflection film 11, and LiNbO ₃ , LiTaO ₃ , KDP, DK
DP, ADP, KTP, KNbO ₃ , Sr _x Ba _1-x N
One or more electro-optic crystals selected from the group consisting of b ₂ O ₆ , GaAs, InP, and GaP crystals are used, and an antireflection film 22 is further provided between the light modulation layer 7 and the second transparent electrode 8. The first transparent substrate 2, the first transparent electrode 3, the photoconductive layer 4, the light absorbing layer 5, the dielectric multilayer mirror 6, the light modulating layer 7, the antireflection film 22, , Second
That is, the transparent electrode 8 and the transparent electrode 8 are successively adhered and laminated.

Then, in a state where an AC voltage is applied between the first transparent electrode 3 and the second transparent electrode 8 by the AC power supply 12, the writing light 13 is made incident on the first transparent substrate 2 side, thereby The light modulation layer 7 is formed by changing the resistance value of the conductive layer 4.
The information written in the light modulation layer 7 is read out by two-dimensionally writing optical information on the second transparent electrode 8 and the reading light 14 is made incident on the second transparent electrode 8 side, and the read out light is emitted as display light 15 to the outside. .

In this case, in the inclined complex dielectric constant type spatial light modulator 1 of the fourth embodiment, the photoconductive layer 4 and the second transparent electrode 8 Of the layers constituting the dielectric multilayer mirror 6 inserted between the layer 4 and the light modulating layer 7, two adjacent light modulating layers having different refractive indices and having different refractive indices. 7 so that the absolute value of the complex permittivity closer to 7 does not become larger than the absolute value of the complex permittivity closer to the photoconductive layer 4. Is set.

Even in this case, as in the first embodiment described above, the resolution of the element itself is greatly improved, and a high-definition image can be displayed without increasing the size of the element itself and each optical system. Accordingly, it is possible to achieve high definition of an image without increasing the size of the projection display or the image processing apparatus itself and without increasing the manufacturing cost.

Further, in the fourth embodiment, an AC voltage is applied to the first transparent electrode 3 and the second transparent electrode 8 using the AC power supply 12.
Instead of using a DC power supply, the first transparent electrode 3 and the second
A DC voltage may be applied to the transparent electrode 8.

<< Description of Fifth Embodiment >> FIG. 8 is a sectional view showing a fifth embodiment of the inclined complex permittivity type spatial light modulator according to the present invention. In this figure, the same parts as those in FIG. 1 are denoted by the same reference numerals.

<Explanation of the Overall Configuration of the Fifth Embodiment> The inclined complex permittivity type spatial light modulator 1 shown in this figure is different from the element shown in FIG. 1 in that the inclined complex permittivity type spatial light modulator shown in FIG. The first anti-reflection film 9 is removed from the spatial light modulation element 1, an anti-reflection film 23 is inserted between the second transparent electrode 8 and the light modulation layer 7, and the second transparent electrode 8, the second transparent substrate 10, Second
The size of the antireflection film 11 is increased, and as the light modulating layer 7, LiNbO ₃ , LiTaO ₃ , KDP, DKDP,
ADP, KTP, KNbO ₃ , Sr _x Ba _1-x Nb ₂ O
₆ , one or more electro-optic crystals selected from the group consisting of GaAs, InP, and GaP crystals, and the first transparent substrate 2, the first transparent electrode 3, the photoconductive layer 4
, The light absorption layer 5, the dielectric multilayer mirror 6, the light modulation layer 7, the antireflection film 23, the second transparent electrode 8, the second transparent substrate 10, and the second antireflection film 11. That is, they were sequentially formed by close contact lamination.

Then, the writing light 13 is made incident on the first transparent substrate 2 in a state where an AC voltage is applied between the first transparent electrode 3 and the second transparent electrode 8 by the AC power supply 12, whereby The light modulation layer 7 is formed by changing the resistance value of the conductive layer 4.
The optical information is two-dimensionally written on the optical modulation layer 7 and the readout light 14 is made incident on the second antireflection film 11 side, thereby reading out the information written on the light modulation layer 7 and reading the information on the display light 1.
The light is emitted to the outside as 5.

In this case, in the inclined complex permittivity type spatial light modulator 1 of the fifth embodiment, the photoconductive layer 4 and the second transparent electrode 8 have a photoconductive layer Of the layers constituting the dielectric multilayer mirror 6 inserted between the layer 4 and the light modulating layer 7, two adjacent light modulating layers having different refractive indices and having different refractive indices. 7 so that the absolute value of the complex permittivity closer to 7 does not become larger than the absolute value of the complex permittivity closer to the photoconductive layer 4. Is set.

Also in this case, as in the first embodiment described above, the resolution of the element itself can be greatly improved, and a high-definition image can be displayed without increasing the size of the element itself and each optical system. Accordingly, it is possible to achieve high definition of an image without increasing the size of the projection display or the image processing apparatus itself and without increasing the manufacturing cost.

In the fifth embodiment, the anti-reflection film 23 and the second anti-reflection film 11 are used.
Even if one or both are deleted, this fifth
An effect similar to that of the embodiment can be obtained.

Further, in the fifth embodiment, the antireflection film 23 is inserted between the light modulating layer 7 and the second transparent electrode 8, but the antireflection film 23 and the second transparent electrode 8 And the same effect can be obtained by inserting the second transparent electrode 8 between the light modulation layer 7 and the antireflection film 23.

<< Operation of Slant Complex Permittivity Type Spatial Light Modulating Element >> Next, the ordinary light refractive index of the liquid crystal 17 and the refractive index of the transparent resin 18 substantially match, and the liquid crystal / resin composite of the structure of FIG. The operation of the inclined complex permittivity type spatial light modulator of the present invention will be described with reference to the inclined complex permittivity type spatial light modulator 1 of FIG.

First, when there is no writing light 13, most of the voltage applied to the inclined complex permittivity type spatial light modulator 1 is applied to the photoconductive layer 4, and the liquid crystal
Since the voltage applied to the resin composite 19 is small, the molecules of the liquid crystal 17 face various directions according to the irregular wall surface of the transparent resin 18.

At this time, since the liquid crystal 17 has a refractive index different from the refractive index of the transparent resin 18 surrounding the liquid crystal 17, when the readout light 14 is incident, this is the liquid crystal / resin composite 1
9 scattered.

Next, when the writing light 13 enters the photoconductive layer 4 side, the impedance of the photoconductive layer 4 decreases according to the intensity of the writing light 13 and the voltage applied to the liquid crystal / resin composite 19 increases. I do. When the intensity of the writing light 13 is sufficiently large, the long axis of the liquid crystal molecules is oriented in the direction of application of the electric field. Thus, a refractive index substantially equal to the ordinary light refractive index of the liquid crystal 17 is given. At this time,
Since the ordinary light refractive index of the liquid crystal 17 and the refractive index of the transparent resin 18 are extremely close, the reading light 14 is not scattered,
After going straight through the resin composite 19 and being reflected by the dielectric multilayer mirror 6, going straight again through the liquid crystal / resin composite 19,
Second transparent electrode 8, first antireflection film 9, second transparent substrate 1
0, the light passes through the second antireflection film 11 and is emitted outside the inclined complex permittivity type spatial light modulator 1.

<< Example of Use of Slant Complex Permittivity Type Spatial Light Modulator >> As described above, the slope complex permittivity type spatial light modulator 1 according to the present invention controls the reading light 14 in accordance with the intensity of the writing light 13. Since the light is made to scatter or go straight, the inclined complex permittivity type spatial light modulator 1, the lens 25, and the aperture 26 are combined as shown in FIG.
When the scattered light is blocked by the aperture 26, the writing light 13 including the image or the two-dimensional pattern to be wavelength-converted is made incident on one surface side of the inclined complex permittivity type spatial light modulator 1 while the writing light 13 An image and a two-dimensional data pattern included in the writing light 13 are read by causing a reading light 14 having a wavelength different from the wavelength to be incident on the other surface side of the inclined complex permittivity type spatial light modulator 1. It can be converted into the wavelength of the light 14 and displayed with a high contrast ratio.

<< Prototype Example of Slant Complex Permittivity Type Spatial Light Modulator >> Next, as the photoconductive layer 4, Bi having a thickness of 0.25 mm was used.
_{Using a 12} SiO ₂₀ crystal plate, the light absorbing layer 5 has a thickness of 1.3.
A 1.3 μm thick multilayer film in which 17 layers of a TiO ₂ film and a SiO ₂ film are alternately stacked as a dielectric multilayer mirror 6 using a diamond-like carbon film having a thickness of μm, and used as a light modulating layer 7. As a liquid crystal / resin composite 19, a 10 μm thick composite film in which a nematic liquid crystal having the characteristics shown in Table 4 and a transparent resin precursor having the characteristics shown in Table 5 were mixed at a weight ratio of 1: 1 was used. The thickness of 0.05 μm obtained by adding 5% of Sn to In ₂ O ₃ as the transparent electrode 3 and the second transparent electrode 8.
m ITO transparent electrode film, and a first anti-reflection film 9
As the second antireflection film 11 using an MgF ₂ film
The method of manufacturing the inclined complex permittivity type spatial light modulator 1 using an eF ₃ film, a ZrO ₂ film, and a MgF ₂ film will be described in detail.

[0119]

[Table 4]

[Table 5] First, a wafer having an appropriate thickness is cut out from a Bi ₁₂ SiO ₂₀ crystal, and the wafer is optically polished to a thickness of 0.25 mm to form a photoconductive layer 4. A first transparent electrode 3 is formed by depositing a 0.05 μm ITO transparent electrode.

Next, the plasma C was produced using methane gas as a raw material.
VD method is applied to the other surface of the Bi ₁₂ SiO ₂₀ crystal.
A 3 μm diamond-like carbon film is formed and used as a light absorbing layer 5. The diamond-like carbon film obtained at this time has a wavelength of
It shows a transmittance of 2% and a specific resistance of 2.2 × 10
It was ⁸ Ωcm.

Next, Ti is applied to the diamond-like carbon film by ion beam assist (IAD).
Seventeen layers of O ₂ films and SiO ₂ films are alternately laminated to form a dielectric multilayer mirror 6 having a thickness of 1.3 μm. In this case, the IAD method is a film forming method in which low-energy oxygen ions are irradiated onto a substrate on which a deposited film is formed during electron beam vapor deposition, and a thin film having a high refractive index and a low light absorption characteristic is formed at a low temperature. be able to. While the dielectric multilayer mirror 6 is being formed, the specific resistance of the dielectric multilayer mirror 6 is controlled by changing the energy of the oxygen ion beam applied to the substrate so as to achieve a desired value. Value.

As a result, in the TiO ₂ film layer and the SiO ₂ film layer constituting the dielectric multilayer mirror 6, the absolute value of the complex permittivity of the layer close to the light modulation layer 7 is close to that of the photoconductive layer 4. The specific resistance of each layer is controlled so that it does not become larger than the absolute value of the complex permittivity of.

The dielectric multilayer mirror 6 obtained by the above-described method is capable of transmitting 9 to the light having a wavelength of 500 to 590 nm.
It shows a high reflectance of 8% or more, and the frequency f of the driving voltage of the inclined complex permittivity type spatial light modulator 1 is 100 Hz.
In this case, the _samples had specific resistances as shown in Tables 6 and 7, and absolute values of complex relative permittivity | ε _ZCT | and | ε _ZCS |. Here, | ε _ZCT | is the absolute value of the TiO ₂ film constituting the dielectric multilayer mirror 6, and | ε _ZCS | is the absolute value of the SiO ₂ film constituting the dielectric multilayer mirror 6. The layer numbers are numbers assigned to the nine-layer TiO ₂ film and the eight-layer SiO ₂ film, which are constituent elements of the dielectric multilayer mirror 6. the TiO ₂ film in contact with the 19 first layer, the SiO ₂ film in contact with the TiO ₂ film second layer, a TiO ₂ film in contact with the SiO ₂ film and so third layer further odd number TiO ₂ film The even numbers are given to the SiO ₂ films.

[0124]

[Table 6]

[Table 7] As shown in Tables 6 and 7, the absolute value of the complex relative permittivity of the TiO ₂ film and the SiO ₂ film constituting the dielectric multilayer mirror 6 increases as the number assigned to each layer increases. In the inclined complex permittivity type spatial light modulator 1 according to the present invention, “the photoconductive layer 4 and the light modulating layer 7 among the layers inserted between the photoconductive layer 4 and the second transparent electrode 8”. Of the two constituent layers of the dielectric multilayer mirror 6 inserted between the two layers have different refractive indices, and the complex permittivity of the two adjacent layers closer to the light modulating layer 7 Is set so that the absolute value of the complex dielectric constant of the dielectric multilayer mirror 6 is not larger than the absolute value of the complex dielectric constant closer to the photoconductive layer 4 ". I have.

Next, an MgF ₂ film is formed on the glass substrate serving as the second transparent substrate 10 on the side on which the light modulation layer 7 is laminated by an electron beam evaporation method, and this is used as a first anti-reflection film 9. A CeF ₃ film, a ZrO ₂ film and a Mn film on the other surface of the glass substrate by electron beam evaporation.
After forming a gF ₂ film to form a second anti-reflection film 11, 5% of S _{2 is} added to In ₂ O ₃ on the first anti-reflection film 9.
A 0.05 μm-thick ITO layer to which n is added is formed and used as a second transparent electrode 8.

Next, a nematic liquid crystal having the characteristics shown in Table 4 and a transparent resin precursor having the characteristics shown in Table 5 were mixed at a weight ratio of 1: 1 and an appropriate amount of spacer spheres having a diameter of 10 μm was added. This mixed liquid is applied to a glass substrate (second transparent substrate 10) on which the dielectric multilayer mirror 6, the first antireflection film 9, the second transparent electrode 8, and the second antireflection film 11 are laminated.
With a wavelength of 365 nm and a light intensity of 20 mW / c.
Irradiation with ultraviolet rays of m ² , thickness 10 μm, specific resistance 2 × 10
By forming a liquid crystal / resin composite 19 (light modulation layer 7) of ¹⁰ Ωcm, the inclined complex permittivity type spatial light modulation element 1 was manufactured.

<< Example of Image Characteristics of Gradient Complex Permittivity Type Spatial Light Modulator >> The performance of the gradient complex permittivity type spatial light modulator 1 according to the present invention prepared by the above-described process and the conventional spatial light In order to compare the performance of the modulator, three spatial light modulators were manufactured, and the performance of the inclined complex permittivity type spatial light modulator 1 according to the present invention was compared with that of the conventional spatial light modulator. The performance was evaluated.

The first group includes In ₂ O as the first transparent electrode 3.
₃ is a 0.05 μm thick ITO film in which 5% Sn is added, and the photoconductive layer 4 is a 0.25 mm thick Bi ₁₂ S
Using an iO ₂₀ crystal plate, the light absorbing layer 5 was 1.3 μm thick.
m, a diamond-like carbon film having a specific resistance of 2.2 × 10 ⁸ Ωcm, and an IAD as the dielectric multilayer mirror 6.
A 1.3 μm-thick multilayer film in which 17 layers of a TiO ₂ film and a SiO ₂ film alternately formed by the method are used, and the nematic shown in Table 4 is used as a liquid crystal / resin composite 19 to be the light modulating layer 7. A liquid crystal / resin composite film having a thickness of 10 μm obtained by mixing a liquid crystal and a transparent resin precursor shown in Table 5 at a weight ratio of 1: 1 was used. As the second transparent electrode 8, 5% of Sn was contained in In ₂ O _3. Using the added 0.05 μm thick ITO film, the first
A space which becomes the inclined complex dielectric constant type spatial light modulator 1 according to the present invention using an MgF ₂ film as the anti-reflection film 9 and a CeF ₃ film, a ZrO ₂ film and an MgF ₂ film as the second anti-reflection film 11. It is a light modulation element. In this case, this first
Each of the spatial light modulation elements belonging to the group has the same configuration except that the specific resistance of the dielectric multilayer mirror 6 is different for each element.

The first, second, and third groups belonging to the first group
The nine-layer TiO ₂ film and the eight-layer SiO ₂ film constituting the dielectric multilayer mirror 6 of the third spatial light modulator are shown in Tables 6, 7, 8, 9, 9, and 11, respectively. In addition, various specific resistances and absolute values of complex relative permittivity | ε _ZCT |, | ε
_ZCS | have a (f = 100Hz of value) and. Here, | ε _ZCT | is the absolute value of the complex relative permittivity of the TiO ₂ film (the layer having an odd number), and | ε _ZCS | is the absolute value of the complex relative permittivity of the SiO ₂ film (the layer having an even number). Value.

[0130]

[Table 8]

[Table 9]

[Table 10]

[Table 11] As is clear from Tables 6, 7, 8, 9 and 10, 11, the spatial light modulator which becomes the inclined complex permittivity type spatial light modulator 1 according to the present invention comprises the light modulating layer 7. The TiO ₂ film closest to the liquid crystal / resin composite layer has the smallest absolute value of complex relative permittivity | ε _ZCT |, and the TiO ₂ film closest to the photoconductive layer 4 has the largest absolute value of complex relative permittivity. It is manufactured to have | ε _ZCT |.

On the other hand, the spatial light modulators belonging to the second group are different from the spatial light modulators belonging to the first group only in the conventional spatial light modulators which differ only in the electrical characteristics of the dielectric multilayer mirror 6. It is.

That is, the nine-layer TiO ₂ film and the eight-layer SiO ₂ film constituting the dielectric multilayer mirror 6 of the first, second and third spatial light modulators belonging to the second group are layer numbers. , And the dielectric multilayer mirror 6 composed of these thin films has a specific resistance ρ _M as shown in Table 12.

[0133]

[Table 12] Then, these spatial light modulators were installed in the optical system 30 shown in FIG. 10, and their image characteristics were measured.

In this optical system 30, a xenon lamp 31
And a writing light source 33 generated by a writing light source 33 composed of a reflecting mirror 32, and an ultraviolet cut filter 34,
An infrared cut filter 35, a color filter 36 having a transmission band of 400 to 500 nm,
3 is converted into blue light, and the blue light is converted into parallel light by a lens 37. Then, the parallel light is applied to a pattern 38 for resolution evaluation. Blue light) 13 at a voltage value of 80 V (effective value) and 300H
An image is formed on a spatial light modulator for measurement to which a rectangular wave voltage (AC voltage) having a repetition frequency of z is applied.

At this time, when a USAF1951 resolution chart is used as the resolution evaluation pattern 38 and an image is formed at the position of the spatial light modulator through the lens 39, 1
Recognition was possible up to 00 lp / mm.

On the other hand, the xenon lamp 45 and the reflecting mirror 4
The read light 14 is generated by a read light source 47 composed of a light source 6, and the read light 14 is converted into green light by an ultraviolet cut filter 48, an infrared cut filter 49, and a color filter 50 having a transmission band of 500 to 590 nm. After the light path is changed by the reflecting mirror 52 while the green light is condensed by the lens 51, the spatial light modulator is irradiated with the readout light (green light) by the lens 53.

Then, the display light 15 from the spatial light modulator is taken in by the lens 53 and the scattered light contained in the display light 15 is cut off by the aperture 54 while condensing the light. After the ratio has been improved, the image is enlarged and projected onto the screen 56 by the lens 55 to have a diagonal length of 2 m.

The resolution of each of the spatial light modulators belonging to the first group and the resolution of each of the spatial light modulators belonging to the second group were measured by the procedure described above. , The resolution characteristics shown in Table 13 could be obtained, and the resolution characteristics shown in Table 12 could be obtained for each of the second group of spatial light modulators.

[0139]

[Table 13] As is clear from Tables 12 and 13, among the layers constituting the dielectric multilayer mirror 6 inserted between the photoconductive layer 4 and the light modulating layer 7, different refractive indices are used. And two adjacent light modulation layers 7
The absolute value of the complex permittivity closer to the photoconductive layer 4 is not larger than the absolute value of the complex permittivity closer to the photoconductive layer 4.
The inclined complex permittivity type spatial light modulator 1 according to the present invention, in which the complex permittivity of each layer constituting the dielectric multilayer mirror 6 is set, shows a high resolution. In the conventional spatial light modulator composed of the dielectric layer film mirror 6 having an absolute value of, the resolution is low.

[0140]

As described above, according to the present invention, in the first, second and third aspects, the resolution of the element itself is greatly improved, and the resolution of the element itself and each optical system can be increased without increasing the size. A high-definition image can be displayed, whereby high-definition of an image can be achieved without increasing the size of the projection display or the image processing apparatus itself and without increasing the manufacturing cost. Further, in claims 4 to 13, by specifying each element constituting the element, the effects described in claims 1, 2, and 3 can be obtained by existing materials.

[Brief description of the drawings]

FIG. 1 is a structural view showing a first embodiment of an inclined complex permittivity type spatial light modulator according to the present invention.

FIG. 2 is a cross-sectional view showing an example of a liquid crystal / resin composite constituting the light modulation layer shown in FIG.

FIG. 3 is a sectional view showing another example of the liquid crystal / resin composite constituting the light modulation layer shown in FIG.

FIG. 4 is a sectional view showing another example of the liquid crystal / resin composite constituting the light modulation layer shown in FIG.

FIG. 5 is a sectional view showing a second embodiment of the inclined complex permittivity type spatial light modulator according to the present invention.

FIG. 6 is a sectional view showing a third embodiment of an inclined complex permittivity type spatial light modulator according to the present invention.

FIG. 7 is a sectional view showing a fourth embodiment of the inclined complex permittivity type spatial light modulator according to the present invention.

FIG. 8 is a sectional view showing a fifth embodiment of an inclined complex permittivity type spatial light modulator according to the present invention.

FIG. 9 is a configuration diagram showing an example of use of the inclined complex permittivity type spatial light modulator according to the present invention.

FIG. 10 is a configuration diagram showing an optical system when measuring image characteristics of a plurality of spatial light modulators having an absolute value of a complex relative permittivity including a tilted complex permittivity type spatial light modulator according to the present invention. .

FIG. 11 is a sectional view showing an example of a conventionally known spatial light modulator.

[Explanation of symbols]

 Reference Signs List 1 inclined complex permittivity type spatial light modulator 2 first transparent substrate 3 first transparent electrode 4 photoconductive layer 5 light absorption layer 6 dielectric multilayer mirror 7 light modulation layer 8 second transparent electrode 9 first antireflection film DESCRIPTION OF SYMBOLS 10 2nd transparent substrate 11 2nd antireflection film 12 AC power supply 13 Writing light 14 Readout light 15 Display light 17 Liquid crystal 18 Transparent resin 19 Liquid crystal / resin composite

────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-6-3693 (JP, A) JP-A-4-141629 (JP, A) JP-A-4-130420 (JP, A) JP-A-3-130 217825 (JP, A) Table 2-2-1334 (JP, A) (58) Fields studied (Int. Cl. ⁷ , DB name) G02F 1/135 G02F 1/03 G02F 1/1333 G02B 5/08

Claims (13)

(57) [Claims] 1. A first transparent electrode, a photoconductive layer, a light absorbing layer, a dielectric multilayer mirror, a light modulating layer, and a second transparent electrode are laminated to form the first transparent electrode and the second transparent electrode. While repeatedly applying a voltage between the second transparent electrode and the second transparent electrode, the impedance of the photoconductive layer is changed based on the writing light incident from the first transparent electrode side to change the state of the light modulation layer. A spatial light modulating element for two-dimensionally modulating the read light incident from the electrode side by the light modulating layer and reflecting the light by a dielectric multilayer mirror to emit the light from the second transparent electrode side; And the respective layers constituting the dielectric multilayer mirror inserted between the light modulating layer and the light modulating layer, the two adjacent layers having different refractive indexes and being closer to the light modulating layer. The absolute value of the complex permittivity is Than the absolute value of the closer complex permittivity of the conductive layer, so as not to increase,
An inclined complex permittivity-type spatial light modulation device, wherein a complex permittivity of each layer constituting a dielectric multilayer mirror is set. 2. A first transparent electrode, a photoconductive layer, a dielectric multilayer mirror, a light modulating layer and a second transparent electrode are laminated and formed between the first transparent electrode and the second transparent electrode. While repeatedly applying a voltage, based on the writing light incident from the first transparent electrode side, the impedance of the photoconductive layer is changed to change the state of the light modulation layer, and the incident light is incident from the second transparent electrode side. A spatial light modulator that reflects the read-out light two-dimensionally by the light modulation layer, reflects the light by a dielectric multilayer mirror, and emits the light from the second transparent electrode side; Among the layers constituting the dielectric multilayer mirror inserted between the two layers, the layers having different refractive indices and having a complex dielectric constant closer to the light modulating layer between two adjacent layers. Absolute value is applied to the photoconductive layer Than the absolute value of the stomach the way the complex dielectric constant of, so as not to become larger,
An inclined complex permittivity-type spatial light modulation device, wherein a complex permittivity of each layer constituting a dielectric multilayer mirror is set. 3. A semiconductor device comprising a first transparent electrode, a photoconductive layer, a dielectric multilayer mirror, a light modulating layer, and a second transparent electrode, wherein at least two are provided between the photoconductive layer and the second transparent electrode. Having the above transparent layer or opaque layer, based on the writing light incident from the first transparent electrode side while repeatedly applying a voltage between the first transparent electrode and the second transparent electrode. Spatial light that changes the state of the light modulation layer by changing the impedance of the photoconductive layer, modulates the readout light incident from the second transparent electrode side two-dimensionally with the light modulation layer, and emits the readout light. In the modulation element, among the layers constituting the dielectric multilayer mirror inserted between the photoconductive layer and the light modulation layer, each of the layers has a different refractive index from each other and includes two adjacent layers. , The complex dielectric closer to the light modulation layer Absolute value of, than the absolute value of the complex dielectric constant which is closer to the photoconductive layer, so as not to increase,
An inclined complex permittivity-type spatial light modulation device, wherein a complex permittivity of each layer constituting a dielectric multilayer mirror is set. 4. The inclined complex dielectric constant type spatial light modulator according to claim 1, wherein the light modulating layer includes a nematic liquid crystal, a cholesteric liquid crystal, a smectic liquid crystal, a nematic liquid crystal, and a cholesteric liquid crystal. A gradient complex dielectric constant type spatial light modulator, wherein one or more liquid crystals selected from a group consisting of a liquid crystal and a mixture of smectic liquid crystals are selected and used. 5. The inclined complex permittivity type spatial light modulator according to claim 1, wherein the light modulating layer is a nematic liquid crystal, a cholesteric liquid crystal, a smectic liquid crystal, a nematic liquid crystal, or a cholesteric liquid crystal. Liquid crystal, a resin having a refractive index equivalent to one of the ordinary light refractive index, the extraordinary light refractive index, or the refractive index when the liquid crystal is randomly aligned of one or more liquid crystals of a group constituted by a mixture of smectic liquid crystals. One of a liquid crystal / resin composite in which the liquid crystal is dispersed, or a liquid crystal / resin composite in which the resin is dispersed in the liquid crystal, Modulation element. 6. The inclined complex dielectric constant type spatial light modulator according to claim 1, wherein the light modulating layer is LiNbO ₃ , LiTaO ₃ , K.
DP, DKDP, ADP, KTP, KNbO ₃ , Sr _x
An inclined complex dielectric constant type spatial light modulator using one or more electro-optic crystals selected from the group consisting of Ba _1-x Nb ₂ O ₆ , GaAs, InP, and GaP crystals. 7. The inclined complex permittivity type spatial light modulator according to claim 1, wherein said photoconductive layer is made of one of a group consisting of silicon, germanium, and carbon. A gradient complex dielectric constant type spatial light modulator comprising: an amorphous film made of two or more elements. 8. The inclined complex dielectric constant type spatial light modulator according to claim 1, wherein the photoconductive layer is an amorphous silicon film, a hydrogenated amorphous silicon film, or an amorphous silicon carbide. A film comprising at least one of a group consisting of a film, a hydrogenated amorphous silicon carbide film, an amorphous selenium film, an amorphous SeAs film, an amorphous ZnS film, an amorphous CdS film, and an amorphous CdSe film. An inclined complex permittivity type spatial light modulator. 9. The inclined complex permittivity type spatial light modulator according to claim 1, wherein the photoconductive layer is a GaAs crystal, a GaP crystal, or a Bi crystal.
A tilted complex permittivity type spatial light modulator using one or more crystals selected from the group consisting of ₁₂ SiO ₂₀ crystals and Bi ₁₂ GeO ₂₀ crystals. 10. The spatial light modulator according to claim 1, wherein the photoconductive layer includes a phthalocyanine pigment, an azo pigment, a polycyclic quinone pigment. Perylene pigments, perinone pigments, anthraquinone pigments, indigo pigments, thioindigo pigments, dioxazine pigments, azo lake pigments,
Thiapyrylium-based pigments, quinacridone-based pigments, cyanine-based pigments, pyrrol-based pigments, porphyrin-based pigments, anthantone-based pigments, squarylium-based pigments, azurenium-based pigments,
A gradient complex dielectric constant type spatial light modulator, comprising a material in which ZnO, TiO, CdS or CdSe is dispersed in a resin. 11. The inclined complex dielectric constant type spatial light modulator according to claim 1, wherein the light absorbing layer is substantially constituted by a CdTe film, a diamond-like carbon film, silicon, carbon, and germanium. 1. An inclined complex permittivity type spatial light modulator, wherein one or more films selected from the group consisting of amorphous films are used. 12. The inclined complex dielectric constant type spatial light modulator according to claim 1, wherein the light absorbing layer includes an inorganic pigment, an organic pigment, carbon,
Using a resin complex in which one or more materials selected from the group consisting of dyes are dispersed in a resin, characterized by a gradient complex permittivity type spatial light modulator, 13. The inclined complex permittivity type spatial light modulator according to claim 1, wherein the dielectric multilayer mirror is a SiO ₂ film or a TiO ₂ film.
Film, HfO ₂ film, Ta ₂ O ₅ film, ZnS film, Al ₂ O ₃
Film, Na ₂ AlF ₆ film, MgF ₂ film, LaF ₃ film, Gd
F ₃ film, SmF ₃ film, CeF ₃ film, ZrO ₂ film, CeO
Using a multilayer film formed by laminating two or more films selected from the group constituted by ₂ film, inclined complex dielectric constant spatial light modulator, characterized in that.