JP3282804B2 - Excimer irradiation equipment - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an excimer irradiation apparatus, and more particularly, to a large-area irradiation type excimer irradiation apparatus capable of suppressing a temperature rise even when a plurality of excimer lamps are provided.

[0002]

2. Description of the Related Art An excimer irradiator has at least an excimer lamp and a power supply unit, and emits a single wavelength of ultraviolet light (hereinafter referred to as "excimer light") from the excimer lamp by a dielectric barrier discharge called silent discharge. It is a device for irradiation. In a dielectric barrier discharge, when a high voltage is applied to an excimer lamp filled with a discharge gas that forms excimer molecules, excimer molecules are formed in the excimer lamp and the excimer molecules transition to a ground state. This is a discharge type that emits a single wavelength excimer light. An excimer irradiation device using such a dielectric barrier discharge,
172n depending on the type of discharge gas in the excimer lamp
An excimer light having a wavelength of m, 193 nm, 222 nm or 248 nm is generated.

[0003] Excimer light can react with air or water to generate excited oxygen atoms or OH radicals that effectively decompose organic compounds, and is therefore used for decomposing contaminants composed of organic compounds. I have. Excimer light has a high photon energy, and is therefore used for a surface modification treatment or the like in which an excimer light is directly reacted with an irradiation target. For example, in the field of the semiconductor industry, it is applied to dry cleaning for decomposing organic compounds contaminating silicon wafers and glass substrates, or to surface activation treatment and soft ashing of semiconductor materials. In addition, it has been applied in various fields such as surface emission treatment or surface modification treatment of resins and metal materials in the fields of fluorescence emission of plasma display panels, LCD processes, and materials. Furthermore, excimer light is used in the field of environmental technology for ozone generation, water and air pollution purification, and ultrapure water production processes.

[0004] With the expansion of such application fields, there is a demand for irradiating a large-area irradiated object at a time or for a predetermined time in a process of continuously moving. For example, LC
Excimer irradiation with a large-area excimer irradiation surface capable of efficiently decomposing contaminants attached to large-area display elements such as D (liquid crystal panel) and PDP (plasma display panel) Equipment is required.

[0005]

The conventional excimer irradiator does not have an excimer irradiator having a large-area excimer irradiating surface, and the above demand can be met by connecting a plurality of excimer irradiators in series. Was. for that reason,
High capital investment was required. In addition, such an excimer irradiation apparatus generates excimer light by applying a high voltage of about 10 kV to an excimer lamp at a frequency of several tens of kHz, and has a low luminous efficiency and involves large heat generation.

Conventionally, to solve such a problem, as disclosed in Japanese Patent Application Laid-Open No. Hei 8-46922, the excimer lamp is cooled by water cooling to suppress an increase in the temperature of the excimer irradiation device.

However, in such means, since cooling water is piped, the apparatus becomes complicated, the irradiation efficiency is not improved at all, and no essential solution has been achieved.

An object of the present invention is to solve the above-mentioned problems and to provide a large-area irradiation type excimer irradiation apparatus capable of suppressing a temperature rise even when a large number of excimer lamps are provided.

[0009]

According to a first aspect of the present invention, there is provided an excimer irradiation apparatus comprising: an excimer irradiation unit having two or more excimer lamps ;
Within the range, the capacitance and resonance point of the excimer lamp match.
A power supply unit for applying a high frequency voltage comprising a frequency condition that,
An excimer irradiator comprising: an excimer irradiator, the excimer irradiator includes an irradiating surface that transmits the excimer light generated from the excimer lamp, and a reflecting surface that is provided on a surface opposite to the irradiating surface and reflects the excimer light. Having an excimer lamp, a discharge tube, an inner tube disposed inside the discharge tube, a discharge gas filled in the discharge tube, and an external electrode disposed outside the discharge tube, An internal electrode disposed inside the internal tube, wherein the reflecting surface is provided with a blowing port for cooling and filling gas, and the internal tube is provided with a cooling gas inlet. It is characterized by being.

According to the invention, the excimer lamp includes:
Frequency conditions at which the resonance point and the capacitance of the excimer lamp match
In this case, a high frequency voltage in the range of 1 to 20 MHz is applied.
Therefore, the applied voltage required to generate excimer light is suppressed to a small value.
Can be obtained. As a result, the light emission
The heat generation rate of the excimer lamp is reduced,
It is possible to suppress a rise in the temperature of the kisima irradiation apparatus. like this
The effect of suppressing the rise in temperature has been achieved by using multiple excimer lamps.
Especially for large area irradiation type excimer irradiation equipment
preferable. Further, according to the present invention, the blowing port provided on the reflection surface acts to blow the cooling and filling gas into the excimer irradiation unit, particularly the excimer lamp,
The inlet provided in the inner pipe acts to introduce a cooling gas into the inner pipe. The gas blown and introduced in this way cools the excimer lamp directly from the outside and the inside thereof, so that the temperature rise of the excimer lamp can be suppressed. As a result, an excimer irradiation device having a large number of excimer lamps can be configured, and the life of the excimer lamp can be improved. Furthermore, since the cooling of the excimer lamp can effectively cool the excimer lamp with such a simple configuration,
A reflection surface for excimer light can be provided on the surface opposite to the irradiation surface, and the irradiation efficiency to the irradiation object can be improved.

According to a second aspect of the present invention, in the excimer irradiation apparatus according to the first aspect, the power supply unit is 10 to 15 MHz.
Converted to the frequency of z, by the matching controller
The high-frequency voltage adjusted to a value within the range of 1 to 3 kV
It is characterized in that it is applied to a maramp .

[0012]

[0013] The invention according to claim 3, in the excimer irradiation device according to claim 1, wherein the power supply unit, press the DC voltage
The frequency is converted to 1-3MHz by the
The high-frequency voltage adjusted to a value within the range of 1 to 3 kV
It is characterized in that it is applied to a Kisima lamp .

[0014]

According to a fourth aspect of the present invention, a discharge tube and the discharge tube are provided.
And an inner tube disposed inside the discharge tube and filled in the discharge tube.
Discharge gas and an external power source arranged outside the discharge tube.
And an internal electrode disposed inside the internal tube.
And a high-frequency voltage is applied between the external electrode and the internal electrode.
Excimer lamp that excimer is formed
Wherein the high-frequency voltage is within a range of 1 to 20 MHz.
At which the resonance point and the capacitance of the excimer lamp match
It is characterized by consisting of conditions .

[0016]

[0017]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, an excimer irradiation apparatus according to the present invention will be described with reference to the drawings.

FIG. 1 is a plan view showing an example of the excimer irradiation apparatus of the present invention, FIG. 2 is a side view of the excimer irradiation apparatus of FIG. 1, and FIG. 3 is a sectional view showing an example of an excimer lamp. FIG. 4 is a plan view showing an example of a large-area irradiation surface provided in the excimer irradiation device. The excimer irradiation device 1 is a device that generates excimer light and irradiates the object with irradiation, and as shown in FIGS. 1 and 2, an excimer irradiation unit 2 having an excimer lamp 4 and a high-frequency And a power supply section 3 for applying a voltage. In the excimer irradiation device 1, the excimer irradiation unit 2 and the power supply unit 3 may be provided in one case 11 or may be provided in separate cases.

First, the excimer irradiation section 2 will be described. The excimer irradiation unit 2 is a part that plays a role of irradiating the object to be irradiated with the generated excimer light. The excimer irradiation unit 2 includes two or more excimer lamps 4, for example, four excimer lamps 4 in FIGS. 1 and 2.
And an irradiation surface 5 for transmitting the excimer light generated from the excimer lamp 4 and a reflection surface 6 provided on a surface opposite to the irradiation surface 5 and reflecting the generated excimer light. The excimer lamps 4 are arranged at regular intervals, and are provided at a substantially intermediate position between the irradiation surface 5 and the reflection surface 6.

The excimer irradiation device 1 is arranged such that the irradiation surface 5 is located at a position facing the object to be irradiated.
The irradiation surface 5 arranged in this way plays a role of transmitting the excimer light generated from the excimer lamp 4 and the excimer light reflected by the reflection surface 6, and usually a synthetic quartz plate having good light transmission is used. Can be As shown in FIG. 4, in the case of an excimer irradiation device 41 having a large-area irradiation surface 45, a large-area synthetic quartz plate or a continuous synthetic quartz plate of a normal size is used.

The reflecting surface 6 has a role of reflecting, out of the excimer light generated from the excimer lamp 4, the excimer light emitted toward the opposite side of the irradiation surface 5 to the irradiation surface 5 side. , Mirror-finished stainless steel or coated aluminum material is used,
There is no particular limitation as long as it reflects the excimer light. The surface shape of the reflection surface 6 may be any shape as long as it can reflect the excimer light to the irradiation surface 5 side, and is not limited to the flat surface shape as shown in FIGS.

In the excimer irradiating section 2, a gas such as a nitrogen gas or an argon gas which does not hinder the transmission of the excimer light (hereinafter referred to as "gas") is used.
These are called "inactive gas 8". ) Is filled. Since the transmittance of excimer light decreases due to the presence of oxygen, the inert gas 8 may be any gas containing no oxygen, and nitrogen gas is preferably used from the viewpoint of economy.

At a predetermined portion of the reflecting surface 6, a blowing port 7 is provided. The blowing port 7 plays a role of blowing a cooling gas for cooling the excimer lamp 4 toward the inside of the excimer irradiation unit 2, particularly preferably to the excimer lamp 4. It is preferable that the portion where the blowing port 7 is provided is directly above the excimer lamps or directly above the excimer lamps 4. Further, in order to increase the cooling effect, a plurality of spray ports 7 can be provided along the longitudinal direction of the excimer lamp 4. The shape and material of the blowing port 7 are not particularly limited, and a commonly used so-called shower nozzle or a similar nozzle can be used. The blowing port 7 is provided with a pipe (not shown) from a cooling gas supply device.

The cooling gas is blown from the blowing port 7 to the excimer lamp 4 to cool the excimer lamp 4 which generates heat from outside. As the cooling gas, it is preferable to use the same gas as the inactive gas 8 filled in the excimer irradiation unit 2 described above, and to efficiently cool the excimer lamp 4 without lowering the excimer light transmittance. Can be. In particular, it is preferable to use nitrogen gas from the viewpoint of economy and safety. The cooling gas can be used by circulating and exchanging heat with the circulating cooling device.

In the present invention, since the blowing ports 7 are provided corresponding to the respective excimer lamps 4, the excimer lamps 4 can be cooled effectively. As a result, as shown in FIG.
In the excimer irradiation device 41 having the above, the temperature rise of the excimer irradiation unit can be suppressed as much as possible.

Next, the excimer lamp will be described.
As shown in FIGS. 1 and 2, the excimer lamps 4 are generally provided at substantially equal intervals in a position between the irradiation surface 5 and the reflection surface 6 in the excimer irradiation unit 2.

The excimer lamp 4 is, as shown in FIG.
Discharge tube 31 and internal tube 3 arranged inside discharge tube 31
2, a discharge gas 33 filled in the discharge tube 31, an external electrode 34 arranged outside the discharge tube 31,
2 and an internal electrode 35 disposed inside the
The internal pipe 32 is provided with an inlet 36 for a cooling gas 37. Excimer lamp 4 used in the present invention
Since the excimer lamp 4 can be cooled from the inside by the cooling gas 37 introduced into the inner tube 32, the temperature of the excimer irradiating section having a large-area irradiating surface provided with a large number of excimer lamps is particularly preferable. The rise can be suppressed.

The discharge tube 31 is provided with a predetermined type of discharge gas 3.
3 is made of a dielectric material through which generated excimer light is easily transmitted. Usually, a quartz tube or a synthetic quartz tube having excellent light transmittance is used. A quartz tube or a synthetic quartz tube having a thickness of about 1.0 to 2.0 mm is used. In the present invention, the excimer lamp 4
However, since it is sufficiently cooled by the cooling gas from the outside and the inside, it is not necessary to use a quartz tube having a thickness of about 1.5 to 2.0 mm in consideration of heat resistance as in the related art, and it is lightweight. Those having a thickness of 1.5 mm or less, which is effective for the formation, can be used. Such weight reduction is particularly preferable in an excimer irradiation device in which a large number of excimer lamps are provided. Note that the length and diameter of the discharge tube 31 are appropriately set according to the size of the irradiation surface designed according to the size of the irradiation target and the irradiation time. Normally, the diameter is about 30 mm and the length is 250
An excimer lamp of about mm is used.

The inner tube 32 is provided substantially at the center of the discharge tube 31, and usually a quartz tube or a synthetic quartz tube is used. The internal tube 32 has an internal electrode 35 provided inside thereof and an inlet 36 for cooling gas 37 provided at one end thereof.

The excimer light is generated by applying a high-frequency voltage described below between an external electrode 34 provided outside the discharge tube 31 and an internal electrode 35 provided inside the internal tube 32. The wavelength of the excimer light is
It differs depending on the type of the discharge gas 33 filled therein.
For example, krypton (Kr) gas is 146 nm, xenon (Xe) gas is 172 nm, and KrI gas is 19 nm.
Excimer light of 1 nm, 193 nm of ArF gas, 222 nm of KrCl gas, and 248 nm of KrF gas are generated at a single wavelength. Therefore, by selecting the discharge gas 33, it is possible to generate excimer light according to the purpose of use. The pressure of the discharge gas 33 in the discharge tube 31 is appropriately set in accordance with the type of gas and the desired illuminance of excimer light.
It is about 0 kPa.

The external electrode 34 is disposed over the entire outer peripheral surface of the discharge tube 31 and is made of stainless steel, aluminum,
Aluminum alloys, copper, copper oxide or their alloys,
Those exhibiting good metal conductivity and having a high discharge rate, such as yttrium oxide and yttrium aluminum oxide, are preferably selected. The shape of the external electrode 34 is a plate shape,
Although not particularly limited, such as a mesh shape, it is preferable to use a punching metal having a thickness of about 0.5 mm in which a large number of through holes such as hexagons are formed so as not to disturb the optical path of the excimer light emitted from the discharge tube 31.

The inner electrode 35 is provided inside the inner tube 32 and can be made of the same material as the material used for the above-mentioned outer electrode 34. The inner electrode 35 exhibits good metal conductivity and has a high discharge rate. Is preferably selected. Internal electrode 35
Is preferably a shape that allows the cooling gas 37 entering through the inlet 36 to easily pass through the inner tube 32, for example, a mesh electrode. Since the mesh electrode has a space between the meshes, the cooling gas 37 easily passes therethrough. Therefore, the cooling effect of the inner tube 32 is enhanced, and the discharge effect can be improved as compared with a round bar electrode or the like. In addition, since such an internal electrode 35 does not directly contact the discharge gas 33,
Excimer light can be uniformly generated in each part in the discharge tube 31.

A cooling gas 37 is introduced into the inner tube 32 from the inlet 36, and the inner tube 32 is cooled. The type of the cooling gas 37 is not particularly limited, but air or nitrogen gas is preferably used from the viewpoint of economy, ease of piping, and the like. By lowering the temperature of the cooling gas 37 introduced into the inner tube 32 by a heat exchanger or the like, the inner tube 32 can be further cooled, and the temperature rise of the entire excimer lamp 4 can be suppressed. Normally, the inlet 36 may be provided at one end of the inner tube 32, and the shape and material of the constituent members of the inlet 36 are not particularly limited. The internal pipe 32 having both open ends may be used so that the cooling gas 37 introduced from the inlet 36 easily flows through the internal pipe 32. When the internal pipe 32 having one open end is used, it is preferable that a small-diameter pipe 38 that can guide the cooling gas 37 to the inside of the internal pipe 32 is further connected to the inlet 36. This facilitates the introduction of the cooling gas 37 into the internal pipe 32 and causes the flow to improve the cooling performance.

Accordingly, the excimer lamp 4 has the inner tube 32
Gas 37 introduced from an inlet 36 provided in
, And is cooled from the outside by a cooling gas blown from a blowing port 7 provided in the reflection surface 6. As a result, the excimer lamp 4 is efficiently cooled, and the temperature rise is suppressed. Particularly, in an excimer irradiation apparatus having a large-area irradiation surface as shown in FIG.
Excellent effects are achieved in terms of maintenance of the excimer irradiation device, extension of the life of the excimer lamp, and stable irradiation of the excimer light.

In the excimer irradiation apparatus 41 having a large-area irradiation surface 45 as shown in FIG. 4, a small number of long excimer lamps or a large number of short excimer lamps 44 may be provided. In consideration of economic efficiency including the above, it is preferable to provide a large number of short excimer lamps 44. At this time, the size of the irradiation surface 45 is set to a vertical length L corresponding to the effective length of the excimer lamp 44 and a horizontal length W corresponding to a length at least twice the effective length of the excimer lamp 44.
Large area LCD
Even a display element such as a (liquid crystal panel) or a PDP (plasma display panel) can be decomposed by subjecting contaminants adhering thereto to an efficient excimer irradiation treatment. Here, the effective length is the length of a portion related to excimer light irradiation in the entire length of the excimer lamp.

Next, the power supply unit will be described. Power supply unit 3
Is provided for applying a high-frequency voltage between the external electrode 34 and the internal electrode 35 constituting the excimer lamp 4.

The high-frequency voltage has a frequency condition in which the resonance point coincides with the capacitance of the excimer lamp 4 within a frequency range of 1 to 20 MHz, and is output from the power supply unit 3. Under such frequency conditions, a silent discharge (so-called dielectric barrier discharge) can be caused in the excimer lamp 4 even with an applied voltage as low as 1 to 3 kV, for example. This means that even if the power applied to the excimer lamp 4 is reduced,
Since sufficient excimer light can be generated, the luminous efficiency of the excimer lamp 4 can be improved. As a result, in combination with the above-described cooling means using the cooling gas, heat generation of the excimer lamp 4 and temperature rise of the excimer irradiation device 1 due to the heat generation can be suppressed. It becomes possible to configure.

FIGS. 5 and 6 are explanatory diagrams showing an example of a power supply section for outputting a high-frequency voltage under the above-mentioned frequency conditions. Each of the power supply units 51 and 61 is configured by a power supply circuit that applies a high-frequency voltage of 1 to 20 MHz. FIG. 5 shows a method (hereinafter, referred to as “first conversion method”) in which a high frequency voltage converted to a predetermined frequency is adjusted to a predetermined voltage by a matching controller and applied (hereinafter, referred to as “first conversion method”). It shows a system (hereinafter, referred to as a “second conversion system”) in which an oscillator converts the frequency to a predetermined frequency, and then amplifies, adjusts to a predetermined voltage, and applies the voltage. By these methods, a high-frequency voltage based on a frequency condition at which the capacitance of the excimer lamp matches the resonance point is adjusted and applied to the excimer lamp.

As shown in FIG. 5, the power supply unit 51 based on the first conversion method has, as a basic configuration, a high-frequency power supply 52, a matching controller 53, and inductances L1 and L1.
2 and variable capacitors C1 and C2.

The high-frequency power supply 52 converts the AC power 54 input thereto into a predetermined frequency within a range of 1 to 20 MHz. The frequency is preferably 10 to 15 MHz from the viewpoint of excimer light emission efficiency, and 13.56 MHz.
z is particularly preferred. Such frequencies are typically between 0.1 and 1
It is output from the high frequency power supply 52 at 0V, preferably 0.1 to 5V. Next, in order to match the impedance Z1 when output from the high frequency power supply 52 and the impedance Z2 when applied to the excimer lamp 4,
The variable capacitor C1 is adjusted by the matching controller 53, and the applied voltage is adjusted so that the excimer light from the excimer lamp 4 is emitted most efficiently. The preferable applied voltage at this time is 1 to 3 kV, particularly preferably 2 kV.

Since the excimer irradiation device of the present invention includes two or more excimer lamps 4, a high-frequency voltage is applied to each of the excimer lamps 4. As an example, 13.5
When a high-frequency voltage of 6 MHz and 2 kV is applied, excimer light can be irradiated from the outer peripheral surface of the discharge tube 31 at an illuminance of 10 mW / cm ² , and excimer light can be generated with high luminous efficiency.

As shown in FIG. 6, the power supply unit 61 based on the second conversion system has a DC power supply 62, a power controller 63, an oscillator 65, an amplifier 6
6 is comprised.

The DC power supply 62 converts the AC power 64 input thereto into a DC voltage of about 12 to 15 V (normally about 12 V) and outputs the DC voltage. Then the DC voltage is
After being set to a predetermined frequency by the oscillator 65 and amplified to a predetermined voltage by the amplifier 66, the inductance L
The Q value is adjusted 67 and applied to the excimer lamp 4. As an example, preferable frequencies at this time are 1 to 3
MHz, and the preferred applied voltage is 1-3 kV. Further, in the second conversion method, the illuminance of the excimer light is adjusted by the power controller 63. This illuminance adjustment is performed by duty control of the above-described high-frequency voltage.
By adjusting the duty within the range of 10%, the illuminance of the excimer lamp 4 is maintained within a certain range. It is preferable to adjust the illuminance by using the afterimage phenomenon of the excimer light and by duty-controlling the application time of the high-frequency voltage.

By providing the first or second conversion type power supply units 51 and 61, the excimer lamp 4
Since the luminous efficiency of the excimer lamp 4 can be improved, the heat generation of the excimer lamp 4 and the accompanying temperature rise of the excimer irradiation device can be effectively suppressed. As a result, by combining with the cooling means by the above-mentioned cooling gas,
A large-area excimer irradiation device including a large number of excimer lamps can be configured.

[0045]

As described above, according to the excimer irradiation apparatus of the present invention , an excimer lamp is
In the frequency condition where the resonance point and the capacitance of the
Since a high-frequency voltage in the range of 0 MHz is applied,
It is possible to keep the applied voltage necessary to generate
Wear. As a result, the luminous efficiency with respect to the applied power is improved.
Therefore, the heat generation of the excimer lamp is suppressed,
The temperature rise of the device can be suppressed. Such temperature rise
Equipped with a large number of excimer lamps due to the suppression effect of
Large area irradiation type excimer irradiation equipment can be configured.
You. The excimer lamp is cooled directly from the outside by the cooling and filling gas blown from the blowing port, and is also cooled directly from the inside by the cooling gas from the inlet provided in the internal pipe. Therefore, the temperature rise of the excimer lamp can be effectively suppressed. As a result, an excimer irradiator having a large number of excimer lamps can be configured, and the life of the excimer lamp can be improved. Further, an excimer irradiation apparatus having a large-area irradiation surface can be configured.

According to the excimer lamp of the present invention,
Frequency conditions at which the resonance point and the capacitance of the excimer lamp match
High frequency voltage in the range of 1 to 20 MHz is applied
Therefore, the applied voltage required to generate excimer light is kept low.
Can be As a result, the luminous efficiency with respect to the applied power
The heat generated by the excimer lamp is reduced,
Temperature rise can be suppressed.

[0047]

[0048]

[Brief description of the drawings]

FIG. 1 is a front view showing an example of an excimer irradiation apparatus according to the present invention.

FIG. 2 is a side view of the excimer irradiation apparatus of FIG.

FIG. 3 is a schematic plan view showing an example of an excimer lamp.

FIG. 4 is a front view showing an example of a large-area irradiation surface provided in the excimer irradiation device.

FIG. 5 is an explanatory diagram illustrating an example of a power supply unit that outputs a high-frequency voltage.

FIG. 6 is an explanatory diagram illustrating another example of a power supply unit that outputs a high-frequency voltage.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1, 41 Excimer irradiation apparatus 2 Excimer irradiation part 3, 51, 61 Power supply part 4, 44 Excimer lamp 5, 45 Irradiation surface 6 Reflection surface 7 Spray port 8 Inactive gas 31 Discharge tube 32 Inner tube 33 Discharge gas 34 External electrode 35 internal electrode 36 inlet 37 cooling gas 38 small diameter pipe 55 circulation cooling device

Continuation of front page (58) Field surveyed (Int.Cl. ⁷ , DB name) H01J 65/00 B01J 19/12

Claims (4)

(57) [Claims] An excimer irradiator provided with two or more excimer lamps, and the excimer lamp has a frequency range of 1 to 20 MHz.
The capacitance and resonance point of the excimer lamp match within the box
A power supply unit for applying a high-frequency voltage consisting of frequency conditions , and an excimer irradiation unit, wherein the excimer irradiation unit has an irradiation surface that transmits excimer light generated from the excimer lamp and a surface opposite to the irradiation surface. A reflecting surface provided to reflect the excimer light, the excimer lamp includes a discharge tube, an internal tube disposed inside the discharge tube, and a discharge gas filled in the discharge tube; An external electrode arranged outside the discharge tube and an internal electrode arranged inside the internal tube, wherein the reflection surface is provided with a gas blowing port for cooling and filling, and the internal tube Is an excimer irradiator provided with an inlet for cooling gas. 2. The power supply section has a frequency of 10 to 15 MHz.
Convert to numbers, 1-3k by matching controller
Excimer lamp with high frequency voltage adjusted to a value within the range of V
2. The excimer according to claim 1, wherein the voltage is applied to the excimer.
Irradiation device. 3. The power supply section includes a DC voltage oscillator.
Is converted to a frequency of 1 to 3 MHz and then amplified.
The high-frequency voltage adjusted to a value within the range of 3 kV
2. The pump according to claim 1, wherein the voltage is applied to a pump.
Shima irradiation equipment. 4. A discharge tube, disposed inside the discharge tube.
An internal tube, a discharge gas filled in the discharge tube,
An external electrode disposed outside the discharge tube, and the internal tube
Having an internal electrode disposed inside, and the external electrode and
When a high-frequency voltage is applied between the internal electrode and the
An excimer lamp on which a excimer is formed, wherein the high-frequency voltage is within the range of 1 to 20 MHz.
Because of the frequency conditions where the lamp capacitance and resonance point match.
An excimer lamp characterized in that: