Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JP3283548B2 - Electrode for ultrasonic wire bonding - Google Patents
[go: Go Back, main page]

JP3283548B2 - Electrode for ultrasonic wire bonding - Google Patents

Electrode for ultrasonic wire bonding

Info

Publication number
JP3283548B2
JP3283548B2 JP22405791A JP22405791A JP3283548B2 JP 3283548 B2 JP3283548 B2 JP 3283548B2 JP 22405791 A JP22405791 A JP 22405791A JP 22405791 A JP22405791 A JP 22405791A JP 3283548 B2 JP3283548 B2 JP 3283548B2
Authority
JP
Japan
Prior art keywords
wire
bonding
electrode
ultrasonic
wire bonding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP22405791A
Other languages
Japanese (ja)
Other versions
JPH0563038A (en
Inventor
勝 真貝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP22405791A priority Critical patent/JP3283548B2/en
Publication of JPH0563038A publication Critical patent/JPH0563038A/en
Application granted granted Critical
Publication of JP3283548B2 publication Critical patent/JP3283548B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/01Manufacture or treatment
    • H10W72/019Manufacture or treatment of bond pads
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/075Connecting or disconnecting of bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/075Connecting or disconnecting of bond wires
    • H10W72/07531Techniques
    • H10W72/07532Compression bonding, e.g. thermocompression bonding
    • H10W72/07533Ultrasonic bonding, e.g. thermosonic bonding
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/075Connecting or disconnecting of bond wires
    • H10W72/07551Connecting or disconnecting of bond wires characterised by changes in properties of the bond wires during the connecting
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/29Bond pads specially adapted therefor
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/531Shapes of wire connectors
    • H10W72/5363Shapes of wire connectors the connected ends being wedge-shaped
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/551Materials of bond wires
    • H10W72/552Materials of bond wires comprising metals or metalloids, e.g. silver
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/59Bond pads specially adapted therefor
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/931Shapes of bond pads
    • H10W72/934Cross-sectional shape, i.e. in side view
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/951Materials of bond pads
    • H10W72/952Materials of bond pads comprising metals or metalloids, e.g. PbSn, Ag or Cu
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/751Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
    • H10W90/754Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked insulating package substrate, interposer or RDL

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Wire Bonding (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】この発明は超音波ボンディングに
よって金属製ワイヤと接合する超音波ワイヤボンディン
グ用電極に関し、絶縁基板上の金属配線と半導体基板上
の金属配線とをワイヤボンディングする際に好適なもの
である。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ultrasonic wire bonding electrode joined to a metal wire by ultrasonic bonding, and is suitable for wire bonding between metal wiring on an insulating substrate and metal wiring on a semiconductor substrate. Things.

【0002】[0002]

【従来の技術】ワイヤボンディング技術は金属配線どう
しを電気的に接続するために一般的に用いられている技
術である。半導体製造工程におけるアルミニウム電極と
リードとをワイヤで結ぶワイヤボンディング作業では、
超音波エネルギーを利用して振動圧着を行う超音波ボン
ディングが多用されている。
2. Description of the Related Art The wire bonding technique is a technique generally used for electrically connecting metal wirings. In the wire bonding work that connects the aluminum electrode and the lead with a wire in the semiconductor manufacturing process,
Ultrasonic bonding that performs vibration pressure bonding using ultrasonic energy is frequently used.

【0003】超音波ボンディングは一定の加重の下でツ
ールを通してアルミニウム製のワイヤに超音波振動を加
え、ワイヤに高温下の加圧と同様の塑性流動を生じさせ
て溶着するものである。この塑性流動には、マクロ的な
線材の変形と同時に超音波による波動的流動を伴ってい
るため、両金属界面の酸化膜が破壊されて新生面の接触
による原子的結合がなされる。
[0003] In ultrasonic bonding, ultrasonic vibration is applied to an aluminum wire through a tool under a certain load, and the wire is welded by causing a plastic flow similar to that of pressing under high temperature. Since this plastic flow is accompanied by a wave flow caused by ultrasonic waves at the same time as the macroscopic deformation of the wire, the oxide film at the interface between the two metals is destroyed and an atomic bond is formed by contact of the new surface.

【0004】[0004]

【発明が解決しようとする課題】ところで、前述した超
音波ボンディングでは、図5に示すように、基板10上
に形成したアルミニウム電極11とアルミニウム製のワ
イヤ12との間の溶着が接合面13の全面にではなく変
形部の周辺にドーナツ状に生じ、中央部は溶着されない
状態になる。したがって、一定のボンディング強度を得
るには、加重、超音波出力および時間の各接合パラメー
タを大きく取る必要がある。しかし、その結果、ワイヤ
12の塑性変形が増大し、ワイヤボンディングピッチの
高密度化が困難になるという不都合が生じる。
In the above-described ultrasonic bonding, as shown in FIG. 5, the welding between the aluminum electrode 11 formed on the substrate 10 and the aluminum wire 12 forms the bonding surface 13. The donut is formed not on the entire surface but around the deformed portion, and the central portion is not welded. Therefore, in order to obtain a constant bonding strength, it is necessary to increase each bonding parameter such as weight, ultrasonic output and time. However, as a result, the plastic deformation of the wire 12 increases, and it is difficult to increase the wire bonding pitch.

【0005】接合面13の中心部が溶着されず周辺部が
ドーナツ状に溶着される原因は、図6に示すワイヤボン
ディング時の断面図から明らかなように、ワイヤ12の
中央部がボンディングツール14で強く押し付けられ、
中央部の接触圧(加重)が高くなりワイヤ12およびア
ルミニウム電極11間に超音波振動によるスリップが生
じず、新生面が生成されないため溶着に到らないものと
考えられている。これに対して周辺部は接触圧が低いた
め、スリップが生じて新生面が生成され溶着が起こるも
のと考えられている。図7に、ワイヤ中心からの距離と
接触圧との関係を示す。
The reason why the central portion of the bonding surface 13 is not welded and the peripheral portion is welded in a donut shape is apparent from the sectional view at the time of wire bonding shown in FIG. Strongly pressed with
It is considered that the contact pressure (load) at the center increases, no slip occurs between the wire 12 and the aluminum electrode 11 due to the ultrasonic vibration, and no new surface is generated, so that welding does not occur. On the other hand, since the peripheral portion has a low contact pressure, it is considered that slip occurs, a new surface is formed, and welding occurs. FIG. 7 shows the relationship between the distance from the center of the wire and the contact pressure.

【0006】そこで、この発明では、接合面の中央部に
生じる非溶着部の面積を小さくし、周辺部に生じる溶着
部の面積を大きく取ることによってワイヤの塑性変形を
小さくし、ワイヤボンディングピッチの高密度化を図る
ことを目的とする。
Therefore, in the present invention, the area of the non-welded portion generated at the center of the joint surface is reduced, and the area of the welded portion generated at the peripheral portion is increased to reduce the plastic deformation of the wire, thereby reducing the wire bonding pitch. The purpose is to increase the density.

【0007】[0007]

【課題を解決するための手段】この発明による超音波
イヤボンディング用電極は、基板上にアルミニウム薄膜
からなる電極を形成し、記アルミニウム薄膜のワイヤ
との接合面を結晶粒の粒径0.7μm以上、膜厚1μm
以上の柱状に結晶成長させて表面粗さ0.05〜0.3
0μmとなるように構成する。
Means for Solving the Problems An ultrasonic wa <br/> ear bonding electrode according to the invention forms an electrode made of aluminum thin film on the substrate, the junction surface between the previous SL aluminum thin wire grains Particle size of 0.7 μm or more, film thickness 1 μm
The crystal is grown in a columnar shape as described above and has a surface roughness of 0.05 to 0.3.
The thickness is set to be 0 μm.

【0008】[0008]

【作用】この発明においては、アルミニウム薄膜の接合
面の表面粗さを、従来の表面粗さ(0.03μm以下)
に比べて粗い0.05〜0.30μmとすることによ
り、従来なら溶着が発生しなかった中央部においても接
触圧が低下する部分が生じ、スリップによる新生面が生
起されて溶着が起こるようになる。このため、中央部に
生じる溶着部の面積が大きくなり、加重、超音波出力お
よび時間の各接合パラメータの条件を弱めに設定するこ
とができ、ワイヤの塑性変形を小さくしてワイヤボンデ
ィングピッチの高密度化することができる。また、塑性
変形後のワイヤ幅はワイヤの直径の2倍が適当と考えら
れており、表面粗さが0.05〜0.30μmのときに
塑性変形後のワイヤ幅が直径の2倍以下となることが確
かめられている。
According to the present invention, the surface roughness of the bonding surface of the aluminum thin film is reduced by the conventional surface roughness (0.03 μm or less).
By making the thickness 0.05 to 0.30 μm, which is coarser than that in the prior art, a portion where the contact pressure is reduced occurs even in the central portion where welding did not occur conventionally, and a new surface is generated by slip and welding occurs. . For this reason, the area of the welded portion generated at the center becomes large, and the conditions of the respective joining parameters such as the weight, the ultrasonic output and the time can be set weaker, and the plastic deformation of the wire is reduced to increase the wire bonding pitch. It can be densified. It is considered that the wire width after plastic deformation is twice as large as the diameter of the wire. When the surface roughness is 0.05 to 0.30 μm, the wire width after plastic deformation is less than twice the diameter. Has been confirmed to be.

【0009】[0009]

【実施例】図1は、この発明による超音波ワイヤボンデ
ィング用電極の第1の参考例を示す構成図で、図(a) は
平面図、図(b) はそのA−A線上の断面図である。この
第1の参考例では、基板1上にアルミニウム電極2を形
成し、ワイヤとの接合面3に溝部4および平面部5を形
成する。そして、接合面3の表面粗さを、0.05〜
0.30μmとなるように形成する。この場合、前述し
たボンディングツールの先端の振幅は接合最大1μm
程度と考えられているので、溝部および平面部の幅
はそれぞれ2μm以下とするのが望ましく、溝ピッチは
4μm以下とするのが望ましい。
1 is a schematic view showing a first embodiment of an electrode for ultrasonic wire bonding according to the present invention. FIG. 1 (a) is a plan view, and FIG. 1 (b) is a sectional view taken along line AA. It is. this
In the first reference example , an aluminum electrode 2 is formed on a substrate 1, and a groove 4 and a plane portion 5 are formed on a bonding surface 3 with a wire. Then, the surface roughness of the bonding surface 3 is set to 0.05 to
It is formed to have a thickness of 0.30 μm. In this case, the amplitude of the tip of the bonding tool described above is 1 μm at the maximum at the time of bonding.
Therefore, it is preferable that the width of each of the groove portion 4 and the flat portion 5 is 2 μm or less, and the groove pitch is 4 μm or less.

【0010】図2は、この発明の第2の参考例を示す構
成図で、アルミニウム電極2の接合面3上に多数の微細
孔6を形成したワイヤボンディング用電極である。この
場合も接合面3の表面粗さは0.05〜0.30μmと
なるように形成する。また、微細孔6のピッチは4μm
以下とするのが望ましく、直径はピッチの半分とする。
FIG. 2 is a structural view showing a second embodiment of the present invention, which is a wire bonding electrode in which a large number of fine holes 6 are formed on a joint surface 3 of an aluminum electrode 2. Also in this case, the bonding surface 3 is formed so as to have a surface roughness of 0.05 to 0.30 μm. The pitch of the fine holes 6 is 4 μm.
Preferably, the diameter is half the pitch.

【0011】図3は、本発明の実施例を示す構成図で、
基板1上に結晶粒の粒径0.7μm以上のアルミニウム
膜7を形成した超音波ワイヤボンディング用電極であ
る。アルミニウム膜7は柱状に結晶成長させ、膜厚1μ
m以上に成長させると表面粗さは0.05〜0.30μ
mとなる。このアルミニウム膜7の形成条件としては、
例えば、基板温度300°C以上、成膜速度4〔オング
ストローム/sec 〕の高温低速成膜により達成できる。
FIG. 3 is a block diagram showing an embodiment of the present invention .
This is an electrode for ultrasonic wire bonding in which an aluminum film 7 having a crystal grain size of 0.7 μm or more is formed on a substrate 1. The aluminum film 7 is grown in a columnar crystal and has a thickness of 1 μm.
m, the surface roughness is 0.05-0.30μ
a m. The conditions for forming the aluminum film 7 are as follows.
For example, it can be achieved by high-temperature low-speed film formation at a substrate temperature of 300 ° C. or more and a film formation rate of 4 [angstrom / sec].

【0012】次に、図4に示す特性図を参照して接合面
3の表面粗さを0.05〜0.30μmとする理由につ
いて説明する。この特性図は直径25μmのアルミニウ
ム製ワイヤを用いて表面粗さが異なるアルミニウム電極
面上に超音波ウェッジボンディングを行ったときの接合
を評価する引張試験のワイヤ破断モードとなるときの表
面粗さと塑性変形後のワイヤ幅との関係を示す特性図で
ある。図中、横軸は接合面の表面粗さ、縦軸は塑性変形
後のワイヤ幅である。
Next, the reason why the surface roughness of the bonding surface 3 is set to 0.05 to 0.30 μm will be described with reference to a characteristic diagram shown in FIG. This characteristic diagram evaluates the bonding when ultrasonic wedge bonding is performed on aluminum electrode surfaces with different surface roughness using aluminum wires with a diameter of 25 μm. Surface roughness and plasticity in the wire breaking mode of the tensile test FIG. 9 is a characteristic diagram illustrating a relationship with a wire width after deformation. In the figure, the horizontal axis represents the surface roughness of the joining surface, and the vertical axis represents the wire width after plastic deformation.

【0013】一般に塑性変形後のワイヤ幅はワイヤの直
径Dの2倍(2D)が適当と考えられている。直径25
μmのワイヤでは、2D=50μmとなるので、図中の
2D(=50μm)の箇所にラインLを引いてある。こ
の特性図から明らかなように、表面粗さが0.05〜
0.30μmのときに塑性変形後のワイヤ幅は2D以下
となり、塑性変形の小型化によるワイヤボンディングピ
ッチの高密度化に有利な範囲であることが分かる。
Generally, it is considered that the width of the wire after plastic deformation is twice (2D) the diameter D of the wire. Diameter 25
In the case of a wire of μm, since 2D = 50 μm, a line L is drawn at a position of 2D (= 50 μm) in the drawing. As is clear from this characteristic diagram, the surface roughness is 0.05 to
At 0.30 μm, the wire width after the plastic deformation is 2D or less, which indicates that the wire width is in a range that is advantageous for increasing the wire bonding pitch by miniaturizing the plastic deformation.

【0014】[0014]

【発明の効果】この発明によれば、アルミニウム薄膜の
ワイヤとの接合面の表面粗さを0.05〜0.30μm
としたので、一般的なアルミニウム薄膜の表面粗さ
(0.03μm以下)と比べて表面に凹凸が生じ、従来
なら溶着が発生しなかった中央部においても接触圧が低
下する部分が生じてスリップによる新生面が生起されて
溶着が起こる。
According to the present invention, the surface roughness of the bonding surface of the aluminum thin film with the wire is reduced to 0.05 to 0.30 μm.
As a result, the surface roughness of the aluminum thin film (0.03 μm or less) is more uneven than that of a general aluminum thin film. A new surface is created and welding occurs.

【0015】また、平面形状では表面の酸化膜が破壊さ
れてもその酸化膜の逃げ場所がないため、酸化膜が新生
面の溶着を妨げるが、この発明によれば、窪みの部分に
酸化膜の一部が追い込まれるため、新生面の溶着が容易
になる。こうして中央部に溶着が出来ることにより、加
重、超音波出力および時間の各接合パラメータの条件を
弱めに設定することができ、ワイヤの塑性変形を小さく
してワイヤボンディングピッチの高密度化を図ることが
可能となる。
Further, in the planar shape, even if the oxide film on the surface is broken, there is no place for the oxide film to escape, so that the oxide film hinders the welding of the newly formed surface. Since a part is driven, welding of the new surface becomes easy. By welding at the center in this way, it is possible to set the conditions of the welding parameters such as load, ultrasonic output and time to be weaker, to reduce the plastic deformation of the wire, and to increase the density of the wire bonding pitch. Becomes possible.

【図面の簡単な説明】[Brief description of the drawings]

【図1】この発明の第1の参考例を示す構成図である。FIG. 1 is a configuration diagram showing a first reference example of the present invention.

【図2】この発明の第2の参考例を示す構成図である。FIG. 2 is a configuration diagram showing a second reference example of the present invention.

【図3】本発明の実施例を示す構成図である。FIG. 3 is a configuration diagram showing an embodiment of the present invention .

【図4】表面粗さと塑性変形後のワイヤ幅との関係を示
す特性図である。
FIG. 4 is a characteristic diagram showing a relationship between surface roughness and a wire width after plastic deformation.

【図5】ワイヤボンディングしたワイヤを接合面から剥
離した図である。
FIG. 5 is a diagram in which a wire subjected to wire bonding is peeled from a bonding surface.

【図6】ワイヤボンディング時の断面配置図である。FIG. 6 is a sectional layout view during wire bonding.

【図7】ワイヤ中心からの距離と接触圧との関係を示す
特性図である。
FIG. 7 is a characteristic diagram showing a relationship between a distance from a wire center and a contact pressure.

【符号の説明】[Explanation of symbols]

1 基板 2 アルミニウム電極 3 接合面 4 溝部 5 平面部 6 微細孔 7 アルミニウム電極(柱状粒) DESCRIPTION OF SYMBOLS 1 Substrate 2 Aluminum electrode 3 Joining surface 4 Groove part 5 Plane part 6 Micro hole 7 Aluminum electrode (columnar grain)

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 超音波ワイヤボンディング用電極であっ
て、基板上にアルミニウム薄膜からなる電極を形成し、
記アルミニウム薄膜のワイヤとの接合面を結晶粒の粒
径0.7μm以上、膜厚1μm以上の柱状に結晶成長さ
せて表面粗さ0.05〜0.30μmとなるように構成
することを特徴とする超音波ワイヤボンディング用電
極。
An electrode for ultrasonic wire bonding.
To form an electrode made of an aluminum thin film on the substrate,
Particle bonding surfaces of the wire before Symbol aluminum film grain
Crystals are grown in columns with a diameter of 0.7 μm or more and a film thickness of 1 μm or more.
To the surface roughness 0. An electrode for ultrasonic wire bonding, wherein the electrode has a thickness of 0.5 to 0.30 μm.
JP22405791A 1991-09-04 1991-09-04 Electrode for ultrasonic wire bonding Expired - Fee Related JP3283548B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22405791A JP3283548B2 (en) 1991-09-04 1991-09-04 Electrode for ultrasonic wire bonding

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22405791A JP3283548B2 (en) 1991-09-04 1991-09-04 Electrode for ultrasonic wire bonding

Publications (2)

Publication Number Publication Date
JPH0563038A JPH0563038A (en) 1993-03-12
JP3283548B2 true JP3283548B2 (en) 2002-05-20

Family

ID=16807905

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22405791A Expired - Fee Related JP3283548B2 (en) 1991-09-04 1991-09-04 Electrode for ultrasonic wire bonding

Country Status (1)

Country Link
JP (1) JP3283548B2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4526813B2 (en) * 2003-12-16 2010-08-18 株式会社フジクラ Manufacturing method of joined body
JP4526814B2 (en) * 2003-12-18 2010-08-18 株式会社フジクラ Manufacturing method of joined body
JP2007172697A (en) 2005-12-20 2007-07-05 Fujitsu Ltd Flying lead joining method
JP2007173362A (en) 2005-12-20 2007-07-05 Fujitsu Ltd Flying lead joining method
JP6847020B2 (en) * 2017-11-17 2021-03-24 株式会社 日立パワーデバイス Semiconductor chips and power modules and their manufacturing methods

Also Published As

Publication number Publication date
JPH0563038A (en) 1993-03-12

Similar Documents

Publication Publication Date Title
JP2697411B2 (en) TAB inner lead joining method
JP3765778B2 (en) Capillary for wire bonding and wire bonding method using the same
US5660319A (en) Ultrasonic bonding process
US4842662A (en) Process for bonding integrated circuit components
JP3440190B2 (en) Wire bonding method
JP2008529303A (en) Ribbon bonding tool and rebonding method
JP2735022B2 (en) Bump manufacturing method
JPH0945736A (en) Ultrasonic bonding method and ultrasonic bonding apparatus
US6105848A (en) Wire bonding method, wire bonding apparatus and semiconductor device produced by the same
CN103177979A (en) Wire bonding device, tool and main body, semiconductor device manufacturing and bonding device
JP3283548B2 (en) Electrode for ultrasonic wire bonding
EP1049253B1 (en) Surface acoustic wave device having bump electrodes and method for producing the same
JP3882734B2 (en) Wire bonding method for power semiconductor device
JP2001110946A (en) Electronic device and manufacturing method thereof
JP4041045B2 (en) Ultrasonic flip chip bonding method
JP2500778B2 (en) Bonding tool and bonding method
JPH10303355A (en) Semiconductor device
JP2980447B2 (en) Semiconductor device and capillary for manufacturing semiconductor device
JPH0341744A (en) Ultrasonic wave wire bonding method
JP2500725B2 (en) TAB inner lead joining method
JP2914337B2 (en) Wire bonding equipment
JP2000299347A (en) Bonding tool
JP4178083B2 (en) Semiconductor device and ultrasonic bonding method thereof
JPH0748507B2 (en) Wire bonding method
JP3501292B2 (en) Method for manufacturing stator of ultrasonic motor

Legal Events

Date Code Title Description
A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 19991214

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090301

Year of fee payment: 7

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100301

Year of fee payment: 8

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110301

Year of fee payment: 9

LAPS Cancellation because of no payment of annual fees