JP3284645B2 - Exposure apparatus and exposure method - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus and a method for exposing a semiconductor or liquid crystal substrate to a desired pattern.

[0002]

2. Description of the Related Art In an exposure apparatus of this type, in order to cope with an increase in the size of a sample to be exposed, an exposure area of the sample is divided into a plurality of areas, and exposure corresponding to each area is repeated. Are synthesized using a screen combining method.
When synthesizing the screen, the pattern break at the boundary position of each exposure area due to the drawing error of the reticle for pattern projection, the aberration of the lens of the projection optical system, the positioning error of the stage for positioning the sample, etc. In order to prevent the occurrence, the exposure is performed by overlapping the boundaries of the respective exposure regions by a very small amount. However, when superimposing the exposed area, this part 2
The line width at the joint portion of the pattern changes due to the double exposure.
In addition, when screen synthesis is performed, a step may occur at a joint portion of a pattern due to a shift in the position of an adjacent exposure region, and the characteristics of the device may be impaired. Furthermore, when the process of superimposing the screen-combined pattern in multiple layers is shared by a plurality of exposure apparatuses, the overlay error of the exposure area of each layer is discontinuous at the joint of the pattern due to the difference in the lens aberration of each exposure apparatus. In particular, in the case of an active matrix liquid crystal device, the contrast is intermittently changed at a pattern joint portion, and the quality of the device is significantly reduced to zero.

As means for eliminating such inconveniences in screen synthesis, Japanese Patent Publication No. 63-49218 discloses a dimming method for reducing the amount of transmitted light at a position corresponding to a reticle or a pattern seam portion of a filter superimposed on the reticle. There is disclosed an apparatus in which a portion is provided so that an exposure amount of a superimposed portion of a pattern substantially coincides with an exposure amount of another portion.

[0004]

However, the means described in the above publication has the following problems. First, when the reticle itself is provided with a dimming characteristic, the number of man-hours for manufacturing the reticle increases, and the risk of pattern defects during the manufacturing increases, so that the burden on the reticle manufacturing process increases. on the other hand,
When a filter to be superimposed on a reticle is used, there is a problem in reticle maintenance management, such as the risk that the reticle is damaged or contaminated by the attachment and detachment of the filter.
In addition, before and after the reticle, a pellicle of a certain thickness is often provided to prevent foreign substances such as dust from adhering to the pattern, so that at least the filter and the reticle pattern are separated by the pellicle thickness. As a result, it is difficult to obtain ideal light-reducing characteristics on the pattern. Furthermore, it is necessary to prepare a dedicated filter for each reticle, and the labor required for manufacturing and maintaining the filter cannot be ignored.

SUMMARY OF THE INVENTION It is an object of the present invention to eliminate the need to provide a pattern transfer member such as a reticle with a dimming characteristic or to provide a different dimming means for each pattern transfer member. It is an object of the present invention to provide an exposure apparatus and an exposure method capable of obtaining ideal light-reducing characteristics on the above member.

[0006]

According to an embodiment of the present invention, a pattern of a first object (9) is formed by a light beam from a light source (1). An exposure apparatus for exposing a second object (11), comprising: an illumination optical system (4, 5, 8) for guiding the light beam to the first object (9) and illuminating the first object (9); Setting means (6) for setting the irradiation area of the first object (9) such that a part of the pattern of the first object (9) overlaps a part of the pattern exposed on the two objects (11); ) And dimming means (601A, B) arranged in the illumination optical system (4, 5, 8) for dimming the amount of light around the illumination area of the first object (9) set by the setting means (6).
And In the exposure apparatus according to the second aspect, the dimming means (601A, B) is provided in the setting means (6).
The exposure apparatus according to claim 3, wherein the dimming means (601A, B)
However, in the pattern of the first object (9), dimming is performed so that the light amount of the portion where the overlapping exposure is performed and the light amount of the portion where the overlapping portion is not performed are substantially equal. According to a fourth aspect of the present invention, in the pattern of the first object (9) in which the dimming means (601A, B) performs the overlapping exposure, the line width of the portion where the overlapping portion is not performed is substantially equal to the line width of the portion where the overlapping portion is not performed. Dimming is performed so that The exposure apparatus according to claim 5, wherein the dimming means (601A,
Dimmer position adjusting means (61) for adjusting the dimming position by B)
A, B). In the exposure apparatus according to the sixth aspect, the dimming means (601A, B) changes the dimming ratio in the peripheral portion. In the exposure method according to the present invention, the light beam from the light source (1) is guided to the first object (9) by the illumination optical system (4, 5, 8) to change the pattern of the first object (9). An exposure method for exposing two objects (11), wherein dimming means (601A, B) are provided in the illumination optical system (4, 5, 8).
The irradiation area of the first object (9) is set so that a part of the pattern of the first object (9) overlaps with a part of the pattern exposed on the second object (11). When illuminating the object (9), the first object (9) is reduced by the dimming means (601A, B).
The amount of light at the periphery of the irradiation area is reduced. In the exposure method according to the eighth aspect, the light is reduced so that the light amount of the portion where the overlapping exposure is performed and the light amount of the portion where the overlapping portion is not performed in the pattern (9) of the first object are substantially equal. In the exposure method according to the ninth aspect, the light is reduced so that the line width of the portion where the overlapping exposure is performed and the portion where the overlapping portion is not performed in the pattern of the first object (9) are substantially equal. . Claim 10
In the described exposure method, the dimming position for dimming the peripheral portion is adjusted. In the exposure method according to the eleventh aspect, the dimming ratio is changed in the peripheral portion.

[0007]

According to the first aspect of the present invention, there is provided an exposure apparatus comprising:
1A, B) accurately reduces the light amount in the peripheral portion of the illumination area of the first object (9) set by the setting means (6) according to the dimming characteristic. In the exposure apparatus according to the second aspect, the dimming means (601A, B) is provided in the setting means (6). In the exposure apparatus according to the third aspect, as shown in FIG. 6, the light amount of the portion where the overlapping exposure is performed and the light amount of the portion where the overlapping portion is not performed are made substantially equal by the dimming means (601A and B). The exposure apparatus according to claim 4, wherein the dimming means (601)
A and B) make the line width of the portion where the overlap exposure is performed substantially equal to that of the portion where the overlap portion is not performed. In the exposure apparatus according to the fifth aspect, the dimming position adjusting means (61A, B) is the first type.
The dimming range is adjusted according to the size of the object (9) or the change in the illumination range of the first object (9). In the exposure apparatus according to the sixth aspect, the dimming means (601A, B) changes the dimming ratio in the peripheral portion. In the exposure method according to the seventh aspect, the amount of light at the periphery of the illumination area of the first object (9) is accurately reduced. In the exposure method according to the eighth aspect, the light amount of the portion where the overlapping exposure is performed is substantially equal to the light amount of the portion where the overlapping portion is not performed. In the exposure method according to the ninth aspect, the line width of the portion where the overlapping exposure is performed is substantially equal to the line width of the portion where the overlapping portion is not performed. In the exposure method according to the tenth aspect, the dimming position for dimming the peripheral portion is adjusted according to the size of the first object (9) or a change in the illumination range of the first object (9). In the exposure method according to the eleventh aspect, the dimming ratio is changed in the peripheral portion.

[0008] In the means and means for solving the above-mentioned problems which explain the constitution of the present invention, the drawings of the embodiments are used to make the present invention easy to understand. However, the present invention is not limited to this.

[0009]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to FIGS. FIG. 1 shows a schematic configuration of an exposure apparatus according to the present embodiment. Reference numeral 1 denotes an extra-high pressure mercury lamp as an exposure light source, the illumination light of which is collected by an elliptical mirror 2 and reflected by a reflection mirror 3. The light enters the wavelength filter 4. The wavelength filter 4 allows only the wavelength necessary for exposure (generally, the wavelength of g-line or i-line) to pass, and the illumination light passing through the wavelength filter 4 is converted into a light beam having a uniform illuminance distribution by the fly-eye integrator 5. To reach the blind 6. The blind 6 adjusts the irradiation range of the illumination light by increasing or decreasing the size of the opening S, and details thereof will be described later.

The illumination light that has passed through the opening S of the blind 6 is reflected by the reflection mirror 7 and enters the lens 8. The lens 8 forms an image of the opening S of the blind 6 on the reticle 9, and The desired area is illuminated. The image of the pattern existing in the illumination range of the reticle 9 is formed on the sample 11 by the lens 10, whereby a specific region of the sample 11 is exposed according to the pattern of the reticle 9. Sample 1
Reference numeral 1 denotes a wafer in the process of manufacturing a semiconductor integrated circuit, and a glass plate in the process of manufacturing a liquid crystal.

A sample 11 is fixed on a stage 12.
The stage 12 is a well-known one in which a pair of blocks movable in directions orthogonal to each other are overlapped.
2 adjusts the position of the sample 11 in the horizontal plane. When synthesizing the screen, after one exposure is completed, the reticle 9 is replaced and the stage 12 is driven to set another position of the sample 11 to the next exposure area. Is repeated to expose the entire area of the sample 11. It should be noted that a pattern may be formed a plurality of times on a single or a plurality of reticles, and an irradiation area in the reticle may be changed in conjunction with a change in the exposure area of the sample 11 to perform screen synthesis. Reference numeral 13 denotes a laser interferometer system that positions the stage 12 based on the current position of the stage 12 detected by the moving mirror 14.

As shown in FIG. 1 to FIG.
Is a combination of a pair of blades 60A and 60B bent in an L-shape in a state of being orthogonal to the optical path of the illumination light to generate a rectangular opening S. The positions of the blades 60A and 60B are moved by moving mechanisms 61A and 61B. To change the size of the opening S. As shown in FIG. 2 and FIG.
A and 61B are obtained by superimposing a second block 611 and a third block 612 on a first block 610 to which the blades 60A and 60B are fixed, and are a feed (not shown) combining a servo motor and a ball screw. By the mechanism, the first block 610 is moved along the guide grooves y1 and y2, and the second block 611 is moved along the guide grooves x1 and x.
2 to move the blades 60A and 60B in a plane perpendicular to the optical path of the illumination light. As shown in FIG. 3, the moving mechanisms 61A and 61B are arranged on opposite sides of the blades 60A and 60B, and each of the third blocks 61A and 61B.
2 is integrally fixed to a main body (not shown) of the exposure apparatus by a frame (not shown). In addition, in FIG.
Only the moving mechanism 61A on the 0A side is shown, but the other blade 60
The moving mechanism 61B on the B side has the same configuration.

As shown in FIGS. 1, 4 and 5, the blades 60A and 60B are provided on the surfaces of the light-shielding plates 600A and 600B.
The D filters 601A and 601B are integrally attached, and the ends of the ND filters 601A and 601B on the opening S side are provided so as to protrude slightly from the light shielding plates 600A and 600B. As shown in FIG. 5, the ND filter 601A,
The protruding portions of the light shielding plates 601B from the light shielding plates 600A and 600B are formed in a triangular cross section which becomes thinner in proportion to the amount of projection from the light shielding plates 600A and 600B.
Is 100% on the opening S, and decreases in proportion to the distance from the center of the opening S at the periphery of the opening S to become 0% at the edge positions of the light shielding plates 600A and 600B. ND
Light shielding plates 600A, 600 of filters 601A, 601B
The amount of protrusion L from B is constant over the entire circumference of the opening S,
As a result, the dimming characteristics at the periphery of the opening S are equal over the entire circumference except for the diagonal corners of the opening S where the ND filters 601A and 601B overlap. The appropriate dimension of the protrusion amount L will be described later. Note that the protrusion amount L may be such that the opposing sides of the opening S are equal.

FIG. 6 shows an exposure image and an exposure amount distribution on the sample 11 when the size of the opening S of the blind 6 is appropriately determined and exposure is performed without the reticle 9. As shown in FIG. 6A, when the exposure position is completely separated and exposure is performed a plurality of times, ND filters are formed on the entire periphery of the rectangular exposure images P1 and P2 formed on the sample 11. Dimming regions R1 and R2 due to 601A and 601B appear, and the exposure amount in these portions decreases. As shown in FIG. 6B, when one side of the dimming regions R1 and R2 is exposed while being overlapped, as shown in FIG. 6C, one of the dimming regions R1 and R2 overlaps in the overlapping range. The light amount changes so as to compensate for the fluctuation of the other light reduction amount. As a result, as shown in FIG. 6D, the combined exposure amount in the overlapping range of the light reduction regions R1 and R2 is reduced by the ND filter 6.
It corresponds to the exposure amount of the portion not affected by 01A and 601B.

Next, the procedure for synthesizing screens in the apparatus of this embodiment will be described. FIG. 7 shows an example in which the pattern Pr is synthesized by dividing the sample 11 into four rectangular exposure areas Ra to Rd. When such synthesis is performed, as shown in FIG. Four reticles 9a corresponding to Rd
To 9d are used in order. The reticles 9a to 9d are:
Only the overlapping part at the time of screen composition is drawn so as to have the same pattern. A light-shielding band IB having a transmittance of 0% is formed around the reticles 9a to 9d to completely block the passage of light. Although not shown in FIG. 7, the boundary portions of the exposure regions Ra to Rd are overlapped by a desired amount, and the blades 6 of the blind 6 are overlapped.
Positions 0A and 60B are positioned at each exposure so that the light-attenuated area by the ND filters 601A and 601B coincides with the overlapping portion of the exposure areas Ra to Rd.

That is, when exposing the upper left exposure area Ra in FIG. 7, the blade 60A located on the right side and lower side of the reticle 9a as shown in FIG. The blade 60B positioned so as to protrude and positioned on the left side and upper side of the reticle 9a is positioned so as to completely retract into the light shielding band IB. When exposing the upper right exposure region Rb, as shown in FIG. 8B, the blades 60A, 60B are set so that the dimming regions of the blades 60A, 60B protrude from the light shielding band IB on the left side and the lower side of the reticle 9b. 60B is positioned. Lower left exposure area R
When exposing c, as shown in FIG.
The blades 60A, 60B are so set that the light-reducing areas of 0A, 60B protrude from the light-shielding band IB on the right side and the upper side of the reticle 9c.
OB is positioned. When exposing the lower right exposure region Rd, as shown in FIG.
The blades 60A, 60B are arranged such that the dimming areas of the blades A, 60B protrude from the light-shielding band IB on the left side and the upper side of the reticle 9d.
B is positioned.

By the above operation, in the overlapping range of the exposure regions Ra to Rd, the dimming region at the time of the previous exposure and the dimming region at the time of the subsequent exposure overlap as shown in FIG. Is equal to the other portions as shown in FIG. 6 (D). For this reason, the exposure amount of the pattern Pr becomes uniform, and the line width does not change even at the joint portion of the pattern Pr.

Further, according to the above, the step at the joint portion of the pattern is also eliminated. This will be described with reference to FIG. FIG. 9 (A) shows screen synthesis by a conventional method. In this example, if a position shift of δ occurs in an adjacent exposure area, a step is generated in a joint portion of the patterns Pr1 and Pr2 by the same amount. On the other hand, in the case of this embodiment, FIG.
As shown in (B), even if the position shift of δ occurs in the adjacent exposure area, the left and right patterns Pr1 and Pr2 continue smoothly as shown by the thick line in FIG. That is, since the joint portion between the patterns Pr1 and Pr2 coincides with the dimming range (range of the width W) of the exposure area, the patterns Pr1 and Pr2
The exposure amount at each of the cross-sectional positions d1 to d5 of the seam portion 2 decreases toward the respective edges as shown in FIG. In addition, the patterns Pr1, at the cross-sectional positions d1 to d5
The waveform indicating the exposure amount distribution of Pr2 is the deviation amount δ of the exposure region.
9C only appears in the left-right direction in FIG.

Since the combined exposure amounts at the positions where the patterns Pr1 and Pr2 completely overlap are equal, the combined exposure amounts at the cross-sectional positions d1 to d5 in FIG. 9B show a distribution as shown in FIG. 9D. The maximum value of the combined exposure amount at each of the cross-sectional positions d1 to d5 becomes equal. For such an exposure distribution, a constant exposure Qc (in the illustrated example, the maximum exposure 50
%), When the resist characteristics are determined so that the portions exceeding the percentage remain on the sample 11 even after development, the pattern widths at the cross-sectional positions d1 to d5 become constant as shown in FIG. As shown by the thick line in FIG. Thus, the pattern Pr1,
When the seam portion of Pr2 is smoothly continuous, discontinuous change of the overlay error at the seam portion of each layer is suppressed even when the screen synthesis is repeated many layers. For this reason, even in the case of a liquid crystal device, discontinuous change in contrast at a joint portion of a screen is eliminated, and display quality is improved.

Here, the degree of change in the joint portion of the pattern becomes gentler as the length W of the overlapping range of the pattern is increased, as is apparent from FIG. 9B. However, if the overlapping range W is too large, the number of screen composites increases and the efficiency decreases. Therefore, the length W of the overlapping range is set based on the degree that a change cannot be perceived by human eyes when used in a liquid crystal device. do it. Generally, it is sufficient to set the thickness to about 5 to 10 mm. And the length W is shown in FIG.
Are determined by the projection amount L of the ND filters 601A and 601B and the projection magnification of the lenses 8 and 10.

As described above, according to the exposure apparatus of this embodiment, the ND filters 601A and 601 having the light attenuating characteristics are provided.
Since the image forming lens 8 is interposed between the sample 11B and the sample 11, the images of the ND filters 601A and 601B can be formed on the sample 11 to obtain an ideal dimming characteristic on the sample 11. In addition, the exposure amount at the joint portion of the pattern can be controlled with high precision, and the effect of the dimming can be maximized. N
Since the D filters 601A and 601B are separated from the reticle 9 via the lens 8, it is not necessary to provide the reticle 9 with a dimming characteristic, and there is no possibility that the reticle 9 is damaged or contaminated. Further, the moving mechanisms 61A, 6A
Since the dimming position on the reticle 9 can be adjusted by 1B, the dimming area can be changed in accordance with the size of the reticle 9 and a change in the exposure area.

In this embodiment, the ND filters 601A and 601B are attached to the blades 60A and 60B of the blind 6 for adjusting the illumination range of the reticle 9.
As shown in FIG. 10 , ND filters 601A, 601B
Are separated from the blades 60A, 60B, and the blades 60A, 60B
May be driven by the moving mechanisms 61A and 61B, while the ND filters 601A and 601B may be independently driven by the moving mechanisms 61C and 61D. In this case, ND filters 601A and 601 are used for sides that do not require dimming during screen composition.
B is retracted from the illumination area set by the blades 60A and 60B. In this example, the light-shielding band formed on the reticle is ND
The reticle can be used effectively by setting it narrower than the width of the dimming region by the filters 601A and 601B. By the way,
The ND filters 601A and 601B are connected to the blades 60A and 60B.
ND filter 601
A, the light shielding width of 601B or more is required. The blade 60
ND filters 601A and 601 separated from A and 60B
1B, a light shielding plate 600A similar to the blades 60A and 60B,
600B may be provided.

FIG. 11 shows another example, in which the ND filter is removed from the light shielding plates 600A and 600B of the blind 6A, while the blade 700 composed of only the ND filter is provided.
A and 700B and an ND blind 70 having a moving mechanism (not shown) for driving these blades 700A and 700B are newly provided, and an image of the ND blind 70 is formed between the ND blind 70 and the blind 6A on the blind 6A. A lens 80 for imaging is provided. Blades 700A, 700
Details of B are shown in the ND filters 601A and 601B in the example of FIG.
It is omitted because it is the same as. In this example, since the ND blind 7 is at a position conjugate with the blind 6A, even if the dimming means is separated from the blind 6A, an ideal dimming characteristic can be obtained on the reticle 9.

In correspondence between the above embodiment and the claims,
Reticles 9, 9a to 9d are the first object , and sample 11 is the second object .
Construct an object . Further, in the embodiment of FIGS. 1-5, the ultra-high pressure mercury lamp 1 is a light source, a filter 4, a fly-eye in
The teigrator 5, the lens 8 set the illumination optical system, the ND filters 601A and 601B set the dimming means, and the blind 6 set
Means, moving mechanism 61A of the blind 6, 61B constitute the dimming position adjusting means, in the example of FIG. 11, an ultra-high pressure mercury lamp 1 is a light source, a filter 4, a fly-eye integrators
The lens 5, the lens 80, and the lens 8 are illumination optical systems, the ND blind 70 is dimming means, and the blind 6A is setting means.
The movement mechanism of the ND blind 70 constitutes the dimming position adjusting means.

FIGS. 12 and 13 show a modification of the moving mechanism 61A shown in FIG. This moving mechanism
Blocks 613x, 613y provided orthogonal to each other from the corners of the blade 60A, and rollers 615x, 6 fitted in the grooves 614x, 614y of the blocks 613x, 613y.
15y. As shown in FIG.
x and 615y are nuts 61 to be screwed with the ball screw 616.
7 is rotatably mounted. Ball screw 616
Are provided one by one in the x direction and the y direction in FIG.
The ball screw 616 extending in the direction includes a roller 615y and y
The ball screw 616 extending in the direction is connected to the roller 615x. Reference numeral 618 denotes a ball screw 616 which is connected to the main body F of the exposure apparatus.
The bearing 619 is a servo motor. When the ball screw 616 is rotated by the servo motor 619 to move the nut 617 in the axial direction, the roller 6
15x and 615y move in a direction orthogonal to the grooves 614x and 614y, and the blade 60A moves in a plane orthogonal to the optical path.

The dimming means used in the present invention is not limited to an optical filter, but may be any type that can reduce the amount of light, such as liquid crystal or EC. The dimming characteristic by the ND filter is not limited to the example in which the transmitted light amount is linearly reduced in proportion to the distance from the center of the opening S, and the combined exposure amount in the overlapping range of the exposure region is substantially equal to the exposure amount in other portions. If they match, it may be changed in a curve. The light can also be dimmed by shifting the focus of the lens and blurring the edge image of the opening of the blind. In addition to the conventional blind, a second blind may be provided shifted in the optical axis direction, and the image of the opening of the second blind may be blurred on a reticle to reduce the light.

[0027]

As described above, in the exposure apparatus according to the first aspect, ideal light-reducing characteristics can be obtained on the first object by the light-reducing means. Further, since the dimming means is separated from the first object, the first object does not need to have a dimming characteristic, and the first object can be prevented from being damaged or contaminated. In the exposure apparatus according to the second aspect, the dimming means is provided in the setting means, so that the dimming means and the setting means can be driven by a common driving means. In the exposure apparatus according to the third aspect, since the light amount of the portion where the overlapping exposure is performed and the portion where the overlapping portion is not performed are substantially equal due to the dimming means, there is no step or overlap error in the overlapping exposure portion. Continuous changes can be eliminated. In the exposure apparatus according to the fourth aspect, since the line width of the portion where the overlapping exposure is performed by the dimming means and the line width of the portion where the overlapping portion is not performed are substantially equal, there is no step or overlap error in the overlapping exposure portion. Continuous changes can be eliminated. In the exposure apparatus according to the fifth aspect, since the dimming position adjusting means adjusts the dimming position, the same dimming means is used regardless of the size of the first object or a change in the overlapping exposure position of the exposure area. Therefore, it is not necessary to prepare various types of dimming means, and the labor required for manufacturing and maintaining and managing the dimming means can be reduced. In the exposure apparatus according to the sixth aspect, the dimming means can change the ratio of the dimming in the peripheral portion. In the exposure method according to the seventh aspect, the light amount in the peripheral portion of the first object can be accurately reduced. it can. The dimming means is the first
Since the first object is separated from the object, the first object itself does not need to have a dimming property, and the first object is not likely to be damaged or contaminated, and the burden of manufacturing and maintaining the first object can be reduced. According to the exposure method of the present invention, since the light amount of the portion where the overlapping exposure is performed and the light amount of the portion where the overlapping portion is not performed are made substantially equal, the step and the discontinuous change of the overlay error in the overlapping exposure portion are eliminated. can do. In the exposure method according to the ninth aspect, the line width of the portion where the overlapping exposure is performed and the line width of the portion where the overlapping portion is not performed are substantially equal. Can be eliminated. In the exposure method according to the tenth aspect, the same dimming means can be used regardless of the size of the first object or the change in the overlapping exposure position of the exposure area, so that it is not necessary to prepare various types of dimming means. The labor required for the manufacture and maintenance of the dimming means can be reduced. In the exposure method according to the eleventh aspect, the ratio of the dimming can be changed in the peripheral portion.

[Brief description of the drawings]

FIG. 1 is a diagram showing a schematic configuration of an exposure apparatus according to one embodiment of the present invention.

FIG. 2 is a perspective view showing a configuration on one blade side of the blind of the embodiment.

FIG. 3 is a side view of the blind of the embodiment.

FIG. 4 is a front view of a blade portion of the blind of the embodiment.

FIG. 5 is a diagram showing a cross section taken along line VV of FIG. 4 and transmittance in the cross section.

FIG. 6 is a diagram showing a relationship between an exposure image and an exposure amount on a sample 11;

FIG. 7 is a diagram showing an example of screen composition.

FIG. 8 is a diagram showing a positional relationship between a reticle and a blade when performing the screen combining of FIG. 7;

FIG. 9 is a diagram for explaining a reason for eliminating a step at a joint portion of a pattern.

FIG. 10 is a diagram illustrating an example in which an ND filter is separated from a blade for setting an illumination range.

FIG. 11 is a diagram showing a schematic configuration of an exposure apparatus according to another example of the present invention.

FIG. 12 is a view showing a modified example of a blind moving mechanism.

FIG. 13 is a diagram showing a configuration around a ball screw in the example of FIG. 12;

[Explanation of symbols]

 REFERENCE SIGNS LIST 1 ultra-high pressure mercury lamp 6 blind 8 lens 9, 9a, 9b, 9c, 9d reticle 10 lens 11 sample 60A, 60B blade 70 ND blind 600A, 600B blade light shielding plate 601A, 601B ND filter S aperture

Claims (11)

(57) [Claims] 1. A pattern of a first object formed by a light beam from a light source.
An exposure apparatus for exposing a light beam to a second object , comprising: an illumination optical system that guides the light beam to the first object and illuminates the first object; and an illumination optical system that partially exposes the pattern to the second object. First thing
The first object is illuminated so that a part of the body pattern overlaps.
Comprising setting means for setting the elevation region, disposed in the illumination optical system, a light-reducing means for reducing a light quantity periphery of the illumination region before said setting means has set <br/> Symbol first object An exposure apparatus characterized in that: Wherein said dimming means, an exposure apparatus according to claim 1, characterized in that provided on the setting means. 3. The light reducing means according to claim 1, wherein said light reducing means comprises a pattern for said first object.
3. The exposure apparatus according to claim 1, wherein the dimming is performed so that a light amount of a portion where the overlap exposure is performed and a light amount of a portion where the overlap portion is not performed are substantially equal. 4. The method according to claim 1, wherein the dimming unit includes a pattern for the first object.
3. The exposure apparatus according to claim 1, wherein the dimming is performed such that a line width of a portion where the overlapping exposure is performed and a portion where the overlapping portion is not performed are substantially equal. 5. A dimming position adjusting means for adjusting a dimming position by said dimming means.
Exposure apparatus according to any one claim of 4. 6. The dimming unit according to claim 1, wherein the dimming ratio changes the dimming ratio in the peripheral portion.
Exposure apparatus according to any one claim of 5. 7. An exposure method for guiding a light beam from a light source to a first object by an illumination optical system and exposing a pattern of the first object to a second object, wherein the illumination optical system is provided with dimming means. A part of the pattern exposed on the second object;
The first object is illuminated so that a part of the body pattern overlaps.
An exposure method comprising: setting a projection area; and illuminating the first object, the dimming unit diminishes a light amount in a peripheral portion of an irradiation area of the first object. 8. The method according to claim 1, wherein, in the pattern of the first object, the dimming is performed so that a light amount of a portion where the overlapping exposure is performed and a light amount of a portion where the overlapping portion is not performed are substantially equal. Item 8. The exposure method according to Item 7 . 9. The method according to claim 1, wherein the dimming is performed so that a line width of a portion where the overlapping exposure is performed and a portion where the overlapping portion is not performed in the pattern of the first object are substantially equal. The exposure method according to claim 7 . 10. The exposure method according to claim 7 , wherein a dimming position of the dimming of the peripheral portion is adjusted. 11. The dim light according to claim 7 , wherein the rate of the dim light is changed in the peripheral portion.
0. The exposure method according to any one of 0 .