JP3301251B2 - Electron beam processing method and electron beam processing apparatus - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to the treatment of an object to be processed by irradiating the object with an electron beam, decomposing a part of the object to generate low molecular active species, thereby promoting a chemical reaction. To an electron beam processing apparatus.

[0002]

2. Description of the Related Art In an "irradiation method of gaseous substance by an electron beam" disclosed in Japanese Patent Application Laid-Open No. 53-88656, an electron beam generated by accelerating a thermoelectron obtained by heating a metal such as tungsten by an electric field is generated. Describes a windowless type electron beam generator that directly irradiates the object to be processed such as exhaust gas in an irradiation container through a minute hole.

Further, an "electron beam generator" disclosed in Japanese Patent Application Laid-Open No. 63-114036 discloses a method for generating a single electron beam having a large output electron beam amount having a sectional area of 10 (cm ² ) or more. Is described.

[0004]

SUMMARY OF THE INVENTION The above-mentioned Japanese Patent Application Laid-Open No. Sho 53-88656
In the technology disclosed in Japanese Patent Application Laid-Open No. 63-114,036, a single electron beam with a large output electron beam amount disclosed in Japanese Patent Application Laid-Open No. 63-114036 is employed because the processing capability of the electron beam processing device is small, and the processing capability is increased. It is possible to do. However,
In this case, since the cross-sectional area of the electron beam is very large, the opening area of the hole through which the electron beam passes becomes large, and an extremely large-capacity exhaust pump system is required to reduce the pressure in the decompression chamber. There is a problem.

Accordingly, it is an object of the present invention to provide an electron beam processing method and an electron beam processing apparatus for processing a large number of objects with a small exhaust pump system.

[0006]

According to a first aspect of the present invention, there is provided an electron beam processing method which divides a predetermined output electron beam amount into a plurality of pieces, and calculates a total sum of output electron beam quantities of the plurality of divided electron beams. The plurality of electron beams are extracted from the electron beam source in which a single plasma is confined to a decompression chamber so as to have a predetermined output electron beam amount. The plurality of electron beams having the same diameter as the predetermined beam diameter provided on a partition partitioning between the decompression chamber and the atmospheric pressure chamber corresponding to each of the electron beams. In this method, the object to be processed is processed by irradiating the object to be processed introduced into the atmospheric pressure chamber with the electron beams by passing through a through hole and taking out the object into the atmospheric pressure chamber.

An electron beam processing apparatus for achieving the above object has an electron beam source in which a single plasma is confined, a decompression chamber, and an electron beam generating means for generating an electron beam having a predetermined processing capability. Evacuation means for decompressing the decompression chamber, an atmospheric pressure chamber for processing the introduced object to be processed, and a partition partitioning between the decompression chamber and the atmospheric pressure chamber, wherein the electron beam generating means is provided in a plurality. Beam extraction means for extracting the plurality of electron beams from the electron beam source to the decompression chamber so that the total processing capacity of the divided electron beams becomes the predetermined processing ability; and Beam diaphragm means for narrowing down to a predetermined beam diameter for the space charge effect to be maximized, wherein the partition wall is for extracting each of the electron beams to the atmospheric pressure chamber, The same beam diameter as the constant beam diameter, and having the same number of electron beam passing holes as the respective electron beams, irradiating the object to be processed with the respective electron beams taken out from the respective electron beam passing holes, The object to be processed is processed with a processing capacity.

[0008] The predetermined beam diameter for maximizing the electron beam space charge effect can be the beam diameter db obtained from equation (1).

Db = cs (Ib ^1.36 / Vb ^2.05 ) ( ^Equation 1) (where cs: constant such as focal length of lens, Ib: beam current Vb: acceleration voltage)

[0010]

According to the structure of the present invention, in an electron beam processing apparatus having an electron beam having a predetermined processing capability, the opening area of an electron beam passage hole provided in a partition partitioning between a decompression chamber and an atmospheric pressure chamber is greatly reduced. Become. Therefore, the flow rate of the processing target such as the exhaust gas flowing from the atmospheric pressure chamber side to the decompression chamber side is significantly reduced, and the capacity of the exhaust pump for making the decompression chamber high vacuum is also significantly reduced. That is, it is sufficient to use a very small exhaust pump to obtain a predetermined processing capacity. In other words, it can be said that a large number of objects can be processed by a practical exhaust pump system.

The details are as follows. In general, the electron beam space charge effect is considered in order to maximize the electron beam processing capability. The optimum “minimum stop diameter db of the electron beam” when the space charge effect is considered, that is, the optimum predetermined beam diameter is obtained from the following relational expression.

Db = cs (Ib ^1.36 / Vb ^2.05 ) ( ^Equation 1) cs: Constant such as focal length of lens Ib: Beam current (however, set value) Vb: Acceleration voltage (however, predetermined value) (Equation 1) The source of the ceremony is “Sugata et al., Electron and Ion Beam Handbook, 2nd edition, p.359, Nikkan Kogyo Shimbun”.

The diameter of the electron beam passage hole provided in the partition wall is determined by the above-mentioned optimum predetermined beam diameter (minimum aperture diameter d).
It is desirable to have the same diameter as b). The reason is,
This is because the larger the electron beam passage hole, the larger the flow rate of exhaust gas and the like flowing from the atmospheric pressure chamber side to the decompression chamber side, and the capacity of the exhaust pump increases. On the other hand, if it is too small, the progress of the electron beam is hindered, which leads to energy loss. Actually, the hole diameter is enlarged to a predetermined beam diameter by an electron beam.

Next, if the equation (1) is converted into the relation of the area ratio, the following equation is obtained.

Db ² = cs ² (Ib ^2.72 / Vb ^4.10 ) ( ^Equation 2) For example, the output electron beam amount of 100 to 200 (keV) and 4000 (mA) is set to 400 (keV) and 400 (mA) as in the embodiment of the present invention. mA) into 10 electron beams. Therefore, the total output electron beam amount is 4000 (mA).

The total opening area of the electron beam passage holes when ten electron beams are extracted to the atmospheric pressure chamber side is s _0, and the opening area when a single electron beam of 4000 (mA) is extracted is Assuming that St, the area ratio can be expressed by the following equation. (However, ib = 400 mA) St / s ₀ = (10 ib) ^2.72 / (10 ib ^2.72 ) = 52 (Equation 3) From this, when the output electron beam amount, that is, the electron beam processing capacity is set to a predetermined value, As in the present invention, the electron beam is divided into a plurality of electron beams, extracted, and taken out to the atmospheric pressure chamber side.
It turns out that it becomes small with 2.

Therefore, the diameter is the same as the optimum predetermined beam diameter (minimum stop diameter db) taking into account the electron beam space charge effect, and
In addition, by providing the same number of electron beam passage holes between the decompression chamber and the atmospheric pressure chamber, the object to be processed flowing from the atmospheric pressure chamber side to the decompression chamber side is greatly reduced, for example, by 1/52. Therefore, the capacity of the exhaust pump can be reduced to 1/52.

In other words, it can be said that an electron pump having a large output electron beam amount can be obtained and a large amount of the object can be processed by an exhaust pump system having a small capacity within a practically usable range.

[0019]

Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a configuration diagram showing an electron beam processing apparatus according to one embodiment of the present invention. The configuration in the figure is as follows. The reaction chamber 1 as an atmospheric pressure chamber is a chamber in which exhaust gas or the like as an object to be processed is introduced and processed. Reaction chamber 1
And differential exhaust chambers 2, 3, and 4 as decompression chambers, respectively.
Be linked. Then, an electron beam chamber 5 as another decompression chamber included in the electron beam generating means is connected to the differential exhaust chamber 4. Further, an electron beam source 6 containing a single plasma for generating an electron beam 10 is confined.
Are connected to the electron beam chamber 5. Then, in the electron beam chamber 5 and the electron beam source 6 as electron beam generating means, ten electron beams 10 are generated via the extraction electrode 105.

On the other hand, between the differential exhaust chambers 2, 3, 4 and the electron beam chamber 5, three partition walls having ten electron beam passage holes 7, 8, 9 each having a diameter of 3 (mm) are provided. It is divided by. The chamber between the reaction chamber 1 and the differential exhaust chamber 2 is partitioned by a partition having 10 electron beam passage holes 20 having a diameter of 1 (mm). Therefore, the reaction chamber 1, the differential exhaust chambers 2, 3, and 4 and the electron beam chamber 5 communicate with each other through the electron beam passage holes 20, 7, 8, and 9. That is, the ten electron beams 10 generated by the electron beam chamber 5 and the electron beam source 6 correspond to the ten electron beam passage holes 98, 7, and 20, respectively, and pass through the passage holes. I have.

A magnetic field of about 200 to 2,000 ampere turns is applied in parallel to the traveling direction of the electron beam 10 by a solenoid coil 18 (magnetic lens) as a beam stop means. The beam diameter is narrowed to an optimum predetermined beam diameter (that is, the minimum aperture diameter db). Squeezing prevents divergence of the beam. Considering that the number of the electron beams 10 is as large as ten, this means for preventing the divergence of the electron beams is necessary. is there.

Further, a valve 21 is provided in the differential exhaust chambers 2 and 3.
And 10000 through the mesh filter 22 for product collection.
(l / min) rotary pumps 11 and 12 are connected one by one. After the valve 21 and the mesh filter 22, a 1500 (l / sec) mechanical booster pump 13 and a 2000 (l / min) rotary pump 14 are connected to the differential exhaust chamber 4. After the valve 21 and the mesh filter 22, a 3000 (l / sec) turbo molecular pump 15, a mechanical booster pump 16, and a rotary pump 17 are connected to the electron beam chamber 5 as a decompression chamber.

The pressure of the electron beam chamber 5 is raised to a high vacuum (0.1 Pa or less) with respect to the reaction chamber 1 at atmospheric pressure (101 325 Pa) by the above-described multi-stage pressure reducing system (exhaust pump system). To generate the electron beam 10.

The shape of the reaction chamber 1 is 15 (cm) in height,
This duct has a cross section of 45 (cm) in width. And height 1
Ten electron beam passage holes 20 for extracting ten electron beams 10 for irradiating the object to be processed in the reaction chamber 1 are provided in a partition part corresponding to 5 (cm).
The differential exhaust chambers 2, 3, and 4 and the electron beam generating means are also connected to the other partition wall of the reaction chamber 1.

The operation of the above configuration will be briefly described as follows. Ten electron beams 10 are extracted from an electron beam source 6 containing a single plasma into an electron beam chamber 5 via an extraction electrode 105 having an “extraction electrode hole” having a diameter of 7 (mm), which will be described later. It is. In the case of the present embodiment, since the system is a multi-stage decompression system, the extracted electron beam 10 is narrowed by the respective solenoid coils 18 while being passed through the electron beam passage holes 7, 3 (mm) in diameter.
8 and 9 respectively. Then, it is further narrowed down, and finally, ten electron beams 10 are passed through the electron beam passage holes 20 having a diameter of 1 (mm) provided in the partition wall between the differential evacuation chamber 2 and the reaction chamber 1. Taken out to reaction chamber 1
The object to be processed in the reaction chamber 1 is irradiated to decompose the object to be processed.

At this time, the electron beam 10 reduces the space charge effect of the electron beam so that a predetermined output electron beam amount (predetermined processing capability of the electron beam) set in the electron beam processing apparatus is maximized. The aperture is narrowed down to a predetermined beam diameter (for example, the minimum aperture diameter db obtained by Expression 1). The diameter of the electron beam passage hole 20 is the same as the predetermined beam diameter.

Next, specific numerical values will be shown and effects will be described. It is assumed that the predetermined output electron beam amount set for the electron beam processing apparatus is 130 (keV) and 4000 (mA). In the prior art, the minimum stop diameter db as a predetermined beam diameter of one electron beam is required to be 22.5 (mm) in diameter. On the other hand, in the case of the present embodiment, the minimum stop diameter db of one electron beam for ten electron beams is
The diameter is 1 (mm). Therefore, for the same output electron beam amount, a diameter of 1 (mm) can be obtained from one passage hole having a diameter of 22.5 (mm).
In this embodiment, the total opening area of the passage holes of the partition wall between the differential exhaust chamber 2 and the reaction chamber 1 is reduced to 1/50. Specifically, St = 395 (mm ² ), s ₀
= 7.85 (mm ² ). Then, as an example with respect to such an opening area s _0, in which the configuration of FIG. 1 is shown.

That is, as shown in FIG. 1, the number of the exhaust pumps connected to the differential exhaust chambers 2 and 3 is 10000 (l / min), that is, one rotary pump 11 and 12 each. On the other hand, in the case of the opening area of the prior art, 50 rows each of the row
Tali pumps 11 and 12 are required. And, if you show the specifications of one rotary pump that can secure the performance of 10,000 (l / min) as the effective capacity, the weight is 2-3 tons, the price is 5-7 million yen, and the power consumption is about 50-60 Kw. is there. Therefore, it can be said that it is not practical to install as many as 50 such exhaust pumps. Note that the output electron beam amount described in the present embodiment is required when processing exhaust gas from a coal-fired power plant having an output of 100,000 Kw.

Therefore, judging from a practical point of view also as a large-scale processing apparatus for a coal-fired power plant, it can be said that the limit is to install 10 exhaust pumps each. It can be said that the number of 20 is desirably three or more. (If the number of pumps for one passage hole is assumed to be 50, the calculation is 14 for 2 pumps and 7 for 3 pumps.
4 units, 4 units, 5 units, 3 units, 10 units, 1 unit. )
In addition, if the electron beam processing device has an output electron beam amount of 100 to 200 (keV) and 4000 (mA) or more, it is more difficult to put it into practical use, and the effect of the present invention is further exhibited. Become.

On the other hand, for reference, the respective pressures of the reaction chamber 1, the differential exhaust chambers 2, 3, 4 and the electron beam chamber 5 are 101325 Pa, 1000, 10, 1 Pa and 0.1 Pa or less. As can be seen, the pressure difference between the reaction chamber 1 and the differential exhaust chamber 2 is extremely large. Therefore, it is understood that the opening area of the passage hole provided in the partition wall needs to be minimized between the reaction chamber 1 and the differential exhaust chamber 2. In other words, the diameter of the passage hole is made equal to the predetermined beam diameter,
And an electron beam passage hole 20 between the differential evacuation chamber 2. However, in the case of a single-stage decompression system without the differential exhaust chambers 2, 3, and 4, the electron beam passage hole provided in the partition between the reaction chamber 1 and the electron beam chamber 5 is adjusted to a predetermined beam diameter. Become. That is, the electron beam passage hole provided between the atmospheric pressure chamber and the decompression chamber is adjusted to a predetermined beam diameter.

Also, taking into account the pressure difference between the chambers, the diameter of the passage hole provided in each partition (ie, the opening area)
May be changed. For example, φ7, φ5, φ3, φ1 (m
m) and so on. Furthermore, the electron beam passage hole 20
Is not limited to the same diameter division having 10 holes of φ1 as in this embodiment, but may be divided into different diameters in which holes other than φ1 are mixed.

By the way, when the electron beam is split, the current value of the output electron beam amount becomes small, so that the influence of the beam diameter expansion due to the space charge effect of the electron beam becomes small. When the influence is small, it is possible to use a lens effect of a magnetic field or an electric field to narrow the beam diameter to a smaller one. This means that it is easier to increase the number of divisions and thereby reduce the electron beam passage hole, and thus it is possible to further reduce the size of the exhaust pump system.

FIG. 2 is a block diagram showing an electron beam generating means according to one embodiment of the present invention. The electron beam generating means includes an electron beam chamber 5 from which a plurality of electron beams 10 are extracted, and an electron beam source 6 in which a single plasma is confined.

As shown in FIG. 2, the electron beam source 6 introduces a helium gas or a hydrogen gas from a gas inlet 101 to generate a DC arc discharge between an anode 103 and a cathode 104 in a plasma generation chamber 102. The cathode 104, which is a hot filament made of tungsten, is heated by a direct current to emit plasma (thermoelectrons). At this time, a large number of permanent magnets 106 are provided on the outer wall of the anode 103, and a multi-pole magnetic field is formed by alternately arranging N poles and S poles. I'm trapped.

An extraction electrode 105 as beam extraction means for extracting ten electron beams 10 into the electron beam chamber 5.
Is a stack of three electrode plates each having 10 “lead electrode holes” having a diameter of 7 (mm) and securing an insulation distance of 5 to 20 (mm). Thereby, in the electron beam chamber 5, 100 to 200
(keV) energy and 400 (mA) beam current of 10
The electron beam 10 is extracted, that is, an electron beam having a total output electron beam amount of 4000 (mA).

FIG. 3 is a block diagram showing an electron beam generating means according to another embodiment of the present invention. In the embodiment of FIG.
Instead of the hot filament method of FIG. 2, a microwave method is used. That is, the microwave is guided to the plasma generation chamber 102 through the microwave waveguide 107 to generate plasma. Plasma confinement is achieved by permanent magnets
Performed with a multipole magnetic field according to 106. Then, ten electron beams 10 are extracted to the electron beam chamber 5 from the extraction electrode 105 having ten electrode holes.

By the way, in order to obtain a plurality of electron beams, a method of arranging a plurality of electron beam sources in which a single plasma is confined can be considered, but the structure is complicated, the number of parts is large, and the cost and reliability are high. It is self-evident that it is disadvantageous in terms of gender and conservation.

Referring back to FIG. 1, the diameter 1 (mm) of the ten electron beam passage holes 20 provided on the partition wall between the reaction chamber 1 and the differential evacuation chamber 2 can be calculated from the above equation (1). It is a diameter corresponding to the “minimum aperture diameter db of the electron beam” as the obtained predetermined beam diameter, that is, it is basically that the predetermined beam diameter and the passage hole diameter are the same. However, simply add one
If only 0 holes with a diameter of 1 (mm) are made, all of the 10 electron beams with a diameter of 1 (mm) will not be decentered, and the diameter of the electron beam will be 1 mm.
(mm) is difficult to pass through. That is, it is difficult to secure the assembly alignment dimension of the electron beam and the electron beam passage hole, that is, to reduce the eccentricity to zero. In particular, it becomes more difficult as the number of differential exhaust chambers increases as in the embodiment of FIG. .

In order to avoid the above-mentioned eccentricity, the prior art employs a method in which the number of electron beams is one and the diameter of the passage hole is larger than a predetermined beam diameter.

On the other hand, the countermeasure method for ensuring the assembly alignment dimension according to the present invention is a method of processing the passage hole with the electron beam of the apparatus itself. That is, after assembling the electron beam processing apparatus, a processing method in which the partition wall is irradiated with ten electron beams generated by the apparatus itself, and a passage hole is formed with the electron beam. As a result, the diameter of the electron beam passage hole can be made substantially the same as the predetermined beam diameter of the electron beam, and the eccentricity can be made zero.

In this case, the partition to be perforated may be all between the decompression chamber including the atmospheric pressure chamber and the differential exhaust chamber, or may be only the partition adjacent to the atmospheric pressure chamber. The latter case is advantageous from the viewpoint of productivity such as processing time.

The following effect is newly obtained by the above-described method of processing the through hole. That is, the fact that the electron beam and the passage hole are substantially the same means that there is almost no gap between the outermost diameter of the electron beam and the electron beam passage hole. Accordingly, since the electron beam passes through the passage hole, the gas molecules flowing from the atmospheric pressure chamber side to the decompression chamber side through the electron beam passage hole always collide with the electron flow of the electron beam. Accordingly, the gas molecules are more effectively prevented from flowing into the decompression chamber than in the case where there is a gap between the outermost diameter of the electron beam and the electron beam passage hole. This is because the amount of gas flowing from the atmospheric pressure chamber side to the decompression chamber side is
It is linked to further reduction.

FIG. 4 is a view showing one embodiment of treating exhaust gas using the electron beam processing apparatus according to the present invention. The configuration shown in the figure includes a cooling tower 201, a reaction chamber 1, and a differential exhaust chamber.
2, 3, 4, an electron beam chamber 5 and an electron beam source 6, an electric precipitator 203, a heating device 204, and a blower 205.

The operation is as follows. Exhaust gas 200 containing nitrogen oxides, sulfur oxides, etc., cooled in the cooling tower 201
Is a reaction chamber 1 which is irradiated with an electron beam 10 through an introduction means.
Will be introduced. Separately, ammonia gas 202 for converting nitrogen oxides and sulfur oxides into ammonium salts is introduced into the reaction chamber 1 from another introduction means. The differential exhaust chambers 2, 3, 4, the electron beam chamber 5, the electron beam source 6, and the like are connected to the partition walls on both sides of the reaction chamber 1, and the electron beam 10 obtained by them is applied to the partition walls on both sides. The mixture gas of the exhaust gas 200 and the ammonia gas 202 in the reaction chamber 1 is irradiated through the electron beam passage hole 20 provided.

The exhaust gas 200 treated in the reaction chamber 1
Are released to the atmosphere by the exhaust fan 205. The ammonium salt generated in the reaction chamber 1 is collected by the electric precipitator 203. The collected ammonium salt is supplied to the heating device 204
After being heated and chemically stabilized, it is recovered as ammonium nitrate or ammonium sulfate and used separately.

Although the above embodiment has been described with reference to an example of the treatment of exhaust gas from a coal-fired power plant, the present invention is also applicable to the detoxification of gas containing dioxin, polychlorinated biphenyl and the like generated when household or industrial waste is incinerated. The electron beam processing apparatus according to the present invention can be used. The present invention is also applied to miniaturization of the processing device and the like.

Incidentally, the reduction in the opening area of the electron beam passage hole also leads to a reduction in the flow rate of the polluted exhaust gas flowing into the exhaust pump. Accordingly, the degree of contamination of the exhaust pump and the like by the contaminated exhaust gas is reduced, and clogging of the exhaust pump is reduced. That is, the present invention improves the reliability and maintainability of the exhaust pump and the like.

Next, an example for further improving this will be described. FIG. 5 is a diagram showing an embodiment in which a buffer chamber is provided between an atmospheric pressure chamber and a decompression chamber. As shown in FIG.
A buffer chamber 19 having a clean air layer is provided between the differential exhaust chamber 2 and the differential exhaust chamber 2. Thereby, the buffer room 1
9, the amount of exhaust gas and the like flowing from the atmospheric pressure chamber side to the decompression chamber side through the electron beam passage hole 20 increases.
There is an effect that it can be further reduced.

At the same time, since a clean air layer was interposed,
The gas flowing into the decompression chamber is clean air. Therefore,
Dirty exhaust gas and the like do not enter the exhaust pump, and there is also an effect that breakdown of the exhaust pump and the like due to contamination can be further reduced. The object to be processed includes gas, liquid, solid, and a mixture thereof. In the case of liquid or solid processing, it is common that the liquid or solid is placed in a gas atmosphere such as an atmospheric pressure chamber.

[0050]

According to the present invention, since the opening area of the electron beam passage hole is greatly reduced, the flow rate of the object flowing from the atmospheric pressure chamber to the decompression chamber is reduced, and the pressure in the decompression chamber is reduced. This has the effect of greatly reducing the number of exhaust pumps.

That is, if the output electron beam amount is the same, the object to be processed can be processed with a small capacity of the exhaust pump, which has an effect of reducing cost and saving energy.

Further, since the amount of polluted exhaust gas and the like entering the exhaust pump and the like is reduced, problems (for example, a clogging accident) due to the contamination of the exhaust pump are reduced, and the reliability and maintainability are improved.

Further, it is easy to secure the assembly alignment dimension, and in addition to the improvement of the processing efficiency, there is an effect that the productivity (perforation workability and apparatus assemblability) is improved.

[Brief description of the drawings]

FIG. 1 is a configuration diagram showing an electron beam processing apparatus according to an embodiment of the present invention.

FIG. 2 is a configuration diagram showing an electron beam generating means of one embodiment according to the present invention.

FIG. 3 is a configuration diagram showing an electron beam generating means according to another embodiment of the present invention.

FIG. 4 is a view showing one embodiment of processing exhaust gas using the electron beam processing apparatus according to the present invention.

FIG. 5 is a diagram showing an embodiment in which a buffer chamber is provided between an atmospheric pressure chamber and a decompression chamber.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 ... Reaction chamber 2, 3, 4 ... Differential exhaust chamber 5 ... Electron beam chamber 6 ... Electron beam source 7, 8, 9, 20 ... Electron beam passage hole 10 ... Electron beam 11, 12, 14, 17 ... Rotary pump 13, 16 ... mechanical booster pump 15 ... turbo molecular pump 18 ... solenoid coil 19 ... buffer chamber 21 ... valve 22 ... mesh filter 101 ... gas inlet 102 ... plasma generation chamber 103 ... anode 104 ... cathode 105 ... extraction electrode 1
06 ... Permanent magnet 200 ... Exhaust gas 201 ... Cooling tower 202 ... Ammonia gas 2
03… Electric dust collector 204… Heating device 205… Air blower

──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Shigeo Shiono 1-1-1, Kokubuncho, Hitachi City, Ibaraki Prefecture Inside the Kokubu Plant of Hitachi, Ltd. No. 1 In the Kokubu Plant of Hitachi, Ltd. (58) Field surveyed (Int. Cl. ⁷ , DB name) G21K 5/04 B01D 53/32 B01J 19/08 G21K 5/00 H01J 37/30

Claims (4)

(57) [Claims] A predetermined output electron beam amount is divided into a plurality of electron beam amounts;
The sum of the output electron beam amounts of the plurality of divided electron beams is equal to the predetermined output electron beam amount. From the electron beam source in which a single plasma is confined to the decompression chamber, each of the plurality of Extracting an electron beam, narrowing each of the electron beams to a predetermined beam diameter for maximizing an electron beam space charge effect, and partitioning between the decompression chamber and the atmospheric pressure chamber corresponding to each of the electron beams. Passing through the plurality of electron beam passage holes having the same diameter as the predetermined beam diameter, taken out into the atmospheric pressure chamber, and irradiating the object to be processed introduced into the atmospheric pressure chamber with the respective electron beams. And an electron beam processing method for processing the object. 2. The method according to claim 1, wherein the predetermined output electron beam amount is divided into a plurality of parts.
The sum of the output electron beam amounts of the plurality of divided electron beams is equal to the predetermined output electron beam amount. From the electron beam source in which a single plasma is confined to the decompression chamber, each of the plurality of An electron beam is extracted, each of the electron beams is narrowed down to a beam diameter db obtained from Equation (1), and the beam is provided on a partition wall that partitions between the decompression chamber and the atmospheric pressure chamber corresponding to each of the electron beams. Passing through the plurality of electron beam passage holes having the same diameter as the diameter db, taking out to the atmospheric pressure chamber, and irradiating each of the electron beams to the object to be processed introduced into the atmospheric pressure chamber; An electron beam processing method for processing the body. db = cs (Ib ^1.36 / Vb ^2.05 ) ( ^Equation 1) (where, cs: constants such as the focal length of the lens, Ib: beam current Vb: acceleration voltage) 3. An electron beam generator having an electron beam source in which a single plasma is confined, a decompression chamber, and an electron beam generating means for generating an electron beam having a predetermined processing capacity; An atmospheric pressure chamber for processing the object to be processed, and a partition partitioning between the decompression chamber and the atmospheric pressure chamber, wherein the electron beam generating means has a total processing capacity of each of the plurality of divided electron beams. To achieve the predetermined processing capacity
Beam extracting means for extracting each of the plurality of electron beams from the electron beam source to the decompression chamber; and a beam stop for narrowing each of the electron beams to a predetermined beam diameter for maximizing an electron beam space charge effect. Means for extracting each of the electron beams to the atmospheric pressure chamber, the same diameter as the predetermined beam diameter of each electron beam, and the same number of electron beams as each of the electron beams. An electron beam processing apparatus having a passage hole, irradiating each of the electron beams extracted from each of the electron beam passage holes to the object, and processing the object with the predetermined processing capability. 4. An electron beam generating means for generating an electron beam having a predetermined processing capability, comprising: an electron beam source in which a single plasma is confined; a decompression chamber; and an exhaust means for decompressing the decompression chamber. An atmospheric pressure chamber for processing the object to be processed, and a partition partitioning between the decompression chamber and the atmospheric pressure chamber, wherein the electron beam generating means has a total processing capacity of each of the plurality of divided electron beams. To achieve the predetermined processing capacity
A beam extracting means for extracting each of the plurality of electron beams from the electron beam source to the decompression chamber; and a beam constricting means for narrowing each of the electron beams to a beam diameter db determined by the equation (1). The partition has the same diameter as the predetermined beam diameter of each electron beam for extracting each electron beam into the atmospheric pressure chamber, and has the same number of electron beam passage holes as each electron beam. An electron beam processing apparatus, comprising: irradiating each of the electron beams extracted from each of the electron beam passage holes onto the object to be processed, and processing the object with the predetermined processing capability. db = cs (Ib ^1.36 / Vb ^2.05 ) ( ^Equation 1) (where, cs: constants such as the focal length of the lens, Ib: beam current Vb: acceleration voltage)