JP3317894B2 - Vacuum electromagnet device - Google Patents
Vacuum electromagnet deviceInfo
- Publication number
- JP3317894B2 JP3317894B2 JP08594698A JP8594698A JP3317894B2 JP 3317894 B2 JP3317894 B2 JP 3317894B2 JP 08594698 A JP08594698 A JP 08594698A JP 8594698 A JP8594698 A JP 8594698A JP 3317894 B2 JP3317894 B2 JP 3317894B2
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- electromagnet
- coil
- duct
- inflector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000004020 conductor Substances 0.000 claims description 7
- 238000005452 bending Methods 0.000 claims description 5
- 239000002245 particle Substances 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- 238000010894 electron beam technology Methods 0.000 description 9
- 239000000498 cooling water Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 229920002799 BoPET Polymers 0.000 description 2
- 239000005041 Mylar™ Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Landscapes
- Particle Accelerators (AREA)
Description
【0001】[0001]
【発明の属する技術分野】本発明は、真空中を進行する
電子や陽電子等の荷電粒子ビームを曲げるための真空電
磁石装置に係り、特に、シンクロトロン用インフレクタ
(セプタム電磁石とも称する)に用いるのに好適な、製
作が容易で、高真空を比較的容易に実現することがで
き、保守性にも優れた真空電磁石装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum electromagnet apparatus for bending a charged particle beam such as electrons and positrons traveling in a vacuum, and more particularly to an inflector for a synchrotron (also referred to as a septum electromagnet). TECHNICAL FIELD The present invention relates to a vacuum electromagnet apparatus which is easy to manufacture, can easily realize a high vacuum relatively easily, and is excellent in maintainability.
【0002】[0002]
【従来の技術】例えばレーストラック型と呼ばれる長円
形の電子蓄積リングを用いたシンクロトロンが知られて
いる。このシンクロトロンにおいては、図4に示す如
く、2つの偏向電磁石20A、20Bで曲率半径Rの円
弧状軌道12A、12Bが形成され、該2つの円弧状軌
道12A、12Bの間を2本の直線軌道14A、14B
で連絡して、真空容器内にレーストラック型の周回軌道
10が形成される。2. Description of the Related Art For example, a synchrotron using an elliptical electron storage ring called a race track type is known. In this synchrotron, as shown in FIG. 4, two deflecting electromagnets 20A and 20B form arc-shaped orbits 12A and 12B having a radius of curvature R, and two straight lines pass between the two arc-shaped orbits 12A and 12B. Tracks 14A and 14B
To form a race-track-type orbit 10 in the vacuum vessel.
【0003】前記直線軌道14A、14Bには、例えば
4つの第1の4極電磁石22A、22B、22C、22
Dと、4つの第2の4極電磁石24A、24B、24
C、24Dと、高周波(RF)加速空洞26が配置され
ている。その他に、電子や陽電子等の荷電粒子ビーム
(ここでは、電子ビームと総称する)の入射部に、入射
電子ビーム8の進行方向を変えて、前記周回軌道10に
乗せるためのインフレクタ30が配置されている。[0003] For example, four first quadrupole electromagnets 22A, 22B, 22C, 22 are provided on the linear orbits 14A, 14B.
D and four second quadrupole electromagnets 24A, 24B, 24
C, 24D and a radio frequency (RF) accelerating cavity 26 are arranged. In addition, an inflector 30 for changing the traveling direction of the incident electron beam 8 and placing the beam on the orbit 10 is arranged at an incident portion of a charged particle beam (herein, collectively referred to as an electron beam) such as an electron or a positron. Have been.
【0004】入射加速器(図示省略)で作られた電子ビ
ーム8が、インフレクタ30に導入され、磁界によりそ
の進行方向が曲げられる。進行方向が曲げられて周回軌
道10に乗せられた電子ビームは、RF加速空洞26及
び偏向電磁石20A、20Bで加速あるいは所望の曲率
で偏向されて、周回軌道10を光速に近い速度で周回す
る。An electron beam 8 produced by an incidence accelerator (not shown) is introduced into an inflector 30 and its traveling direction is bent by a magnetic field. The electron beam whose traveling direction is bent and placed on the orbit 10 is accelerated or deflected at a desired curvature by the RF acceleration cavity 26 and the bending electromagnets 20A and 20B, and orbits the orbit 10 at a speed close to the speed of light.
【0005】このようなシンクロトロンにおいて、従来
のインフレクタ30は、図5に断面を示す如く、全体が
真空槽40の中に置かれていた。図5において、32は
略コの字型のコアブロック、34はコイル、36は、真
空槽40内にインフレクタ30を吊り下げるためのサポ
ート、38は、前記コイル34を冷却するための冷却水
管路、42は、真空槽40の上蓋、44は排気ダクトで
ある。[0005] In such a synchrotron, the conventional inflector 30 is entirely placed in a vacuum chamber 40 as shown in cross section in FIG. In FIG. 5, 32 is a substantially U-shaped core block, 34 is a coil, 36 is a support for suspending the inflector 30 in the vacuum chamber 40, and 38 is a cooling water pipe for cooling the coil 34. A passage 42 is an upper lid of the vacuum chamber 40, and 44 is an exhaust duct.
【0006】ここで、インフレクタ30の全体を真空槽
40の内部に配置していたのは、通常、インフレクタ3
0は、発熱防止のため、入射電子ビーム8が通過すると
きだけパルス的にコイル34に電流が流されて励磁され
るため、磁極間にステンレス等の金属製のダクトを置く
と、渦電流を生じ、ダクト内にまで磁場が入り込まなく
なるからである。Here, the reason why the entire inflector 30 is arranged inside the vacuum chamber 40 is that the inflector 3
In the case of No. 0, the current is applied to the coil 34 in a pulsed manner only when the incident electron beam 8 passes to excite it to prevent heat generation. Therefore, when a metal duct such as stainless steel is placed between the magnetic poles, the eddy current is reduced. This is because the magnetic field does not enter the duct.
【0007】[0007]
【発明が解決しようとする課題】しかしながら、インフ
レクタ30を入れる真空槽40は必然的に特殊形状とな
り、且つ、大型化する上、インフレクタ30自身が高真
空を妨害するガスを発生するので、シンクロトロンに要
求される高真空を達成するのは容易ではない。又、保守
点検等の際には、真空槽40を一旦大気解放してインフ
レクタ30を取り出し、作業が終わった後は、再び、イ
ンフレクタ30を真空槽40内に収納して、真空を引き
直す手間がかかる。更には、コイル34を冷却するため
に冷却水を真空槽40内に引き込む必要があり、真空槽
40内での水洩れの心配も生じてくる。又、パルス励磁
は、コイル34の振動による絶縁破壊という問題も発生
し、コイルの支持方法も問題となってくる。However, the vacuum chamber 40 in which the inflector 30 is to be accommodated has a special shape and is inevitably increased in size, and the inflector 30 itself generates a gas that interferes with a high vacuum. Achieving the high vacuum required for synchrotrons is not easy. Further, at the time of maintenance and inspection, the vacuum tank 40 is once released to the atmosphere and the inflector 30 is taken out. After the work is completed, the inflector 30 is stored in the vacuum tank 40 again, and the vacuum is evacuated. It takes time to fix. Further, in order to cool the coil 34, it is necessary to draw cooling water into the vacuum tank 40, and there is a fear of water leakage in the vacuum tank 40. In addition, the pulse excitation also causes a problem of dielectric breakdown due to the vibration of the coil 34, and the method of supporting the coil also becomes a problem.
【0008】本発明は、前記従来の問題点を解消するべ
くなされたもので、製作が容易で、高真空を比較的容易
に実現することができ、保守性にも優れた真空電磁石装
置を提供することを目的とする。The present invention has been made to solve the above-mentioned conventional problems, and provides a vacuum electromagnet device which is easy to manufacture, can relatively easily realize a high vacuum, and has excellent maintainability. The purpose is to do.
【0009】[0009]
【課題を解決するための手段】本発明は、真空中を進行
する荷電粒子ビームを曲げるための真空電磁石装置にお
いて、非真空雰囲気に配設され、時間的に変化する電流
が流される電磁石と、該電磁石の磁極間に挿入される、
断面形状が外側に平坦面を有する形状とされ、内部が真
空とされ、前記外側の平坦面に前記電磁石のコイルが密
着配置された、ビーム進行用の真空ダクトとを備えるこ
とにより、前記課題を解決したものである。Means for Solving the Problems The present invention is the vacuum electromagnetic device for bending a charged particle beam traveling in a vacuum, disposed in a non-vacuum atmosphere, the time-varying current
An electromagnet is Ru flowed, is inserted between the magnetic poles of the electromagnet,
The cross-sectional shape is a shape having a flat surface on the outside, the inside is evacuated, and the coil of the electromagnet is disposed in close contact with the flat surface on the outside, and a vacuum duct for beam advance is provided, thereby solving the above problem. It is a solution.
【0010】又、前記コイルを、前記真空ダクト外側の
平坦面に、帯状材により縛り付けて固定することによ
り、コイルの支持を容易としたものである。又、前記コ
イルの導体を中空とし、その中に冷却水を流すようにし
たものである。 [0010] Also, the pre-Symbol coil, the flat surface of the vacuum duct outer, by fixing strapped by strip material, is obtained by facilitating the support of the coil. In addition,
Make the conductor of the yl hollow and allow cooling water to flow through it
It is a thing.
【0011】[0011]
【発明の実施の形態】以下図面を参照して、本発明の実
施形態を詳細に説明する。Embodiments of the present invention will be described below in detail with reference to the drawings.
【0012】本実施形態は、図1(平面図)及び図2
(図1のII−II線に沿う横断面図)に示す如く、市販の
ステンレス製の角ダクトを入射電子ビーム8の軌道に沿
って曲げたものを真空ダクト46として用い、インフレ
クタ48のコの字形のコアブロック50の磁極50A、
50Bの間に配置したものである。FIG. 1 (plan view) and FIG.
As shown in FIG. 1 (a cross-sectional view taken along the line II-II in FIG. 1), a commercially available stainless steel square duct bent along the trajectory of the incident electron beam 8 is used as a vacuum duct 46, and a coil of an inflector 48 is used. , The magnetic poles 50A of the core block 50,
It is arranged between 50B.
【0013】前記コアブロック50は、外形が略直方体
とされ、真空ダクト46の曲率に合わせて、例えば3個
に分割配置されている。The core block 50 has a substantially rectangular parallelepiped outer shape, and is divided into, for example, three pieces in accordance with the curvature of the vacuum duct 46.
【0014】前記真空ダクト46の厚さは、例えば1m
mとし、材質はSUS304(電気伝導度ρ=1.4×
106 /m)とすることができる。The thickness of the vacuum duct 46 is, for example, 1 m.
m, and the material is SUS304 (electrical conductivity ρ = 1.4 ×
10 6 / m).
【0015】2本の平行な導体からなるコイル52は、
図3に詳細に示す如く、それぞれ個別にカプトンマイラ
(デュポン社製)等の絶縁材54で絶縁された上、全て
のコアブロック50を貫通するよう、真空ダクト46の
外側側面に沿って平行に配置され、更に上から、カプト
ンマイラ等の固定用帯状材56を巻いて縛り付けられて
いる。A coil 52 composed of two parallel conductors
As shown in detail in FIG. 3, they are individually insulated by an insulating material 54 such as Kapton Mylar (manufactured by DuPont), and run in parallel along the outer side surface of the vacuum duct 46 so as to penetrate all the core blocks 50. It is arranged, and is further tied up from above by winding a fixing strip 56 such as Kapton Mylar.
【0016】該コイル52の導体は、例えば中空とさ
れ、その中に冷却水を流すようにされている。The conductor of the coil 52 is, for example, hollow, through which cooling water flows.
【0017】図において、58は、前記コイル52を電
源に接続するための電流導入部であり、コイル52の他
端は、図示しない導体によって接続され、矢印Aに示す
如く、電流が流れるようにされている。In the figure, reference numeral 58 denotes a current introducing portion for connecting the coil 52 to a power source. The other end of the coil 52 is connected by a conductor (not shown) so that a current flows as shown by an arrow A. Have been.
【0018】前記インフレクタ48は、例えばパルス幅
500μ秒の正弦半波で励磁され、その繰り返し周波数
は3Hzとされている。The inflector 48 is excited by, for example, a half sine wave having a pulse width of 500 μs, and its repetition frequency is set to 3 Hz.
【0019】一般に、角周波数ωで震動する電磁波が、
電気伝導度ρ、透磁率μの導体に入射した場合、表面か
ら深さdの場所での強度は、次式に従って減衰する。Generally, an electromagnetic wave vibrating at an angular frequency ω is
When incident on a conductor having an electric conductivity ρ and a magnetic permeability μ, the intensity at a depth d from the surface attenuates according to the following equation.
【0020】 B=B0 exp (−d/δ) …(1)B = B 0 exp (−d / δ) (1)
【0021】ここで、B、B0 は、それぞれ電磁波の深
さd及び表面における強度である。又、δは表皮厚と呼
ばれ、次式で表わされる。Here, B and B0 are the depth d of the electromagnetic wave and the intensity at the surface, respectively. Δ is called a skin thickness and is expressed by the following equation.
【0022】 δ=√{2/(ρωμ)} …(2)Δ = {2 / (ρωμ)} (2)
【0023】真空ダクト46を通過するパルス磁場の場
合にも、上記と同じ考えが適用でき、本実施形態の場
合、表皮厚δ=13mm、電磁波の強度比B/B0 =
0.9となる。なお、角周波数ωは、パルス幅500μ
秒から、次のように概算している。The same concept can be applied to the case of a pulsed magnetic field passing through the vacuum duct 46. In the case of this embodiment, the skin thickness δ = 13 mm, and the electromagnetic wave intensity ratio B / B0 =
0.9. Note that the angular frequency ω has a pulse width of 500 μ
From seconds, it is estimated as follows.
【0024】 ω=2π/(500μ秒×2) =6.28×103 (1/秒) …(3)Ω = 2π / (500 μsec × 2) = 6.28 × 10 3 (1 / sec) (3)
【0025】従って、電磁波強度、即ち、磁場強度が1
0%程度減衰することになるが、この分は、電源容量を
増やすことでカバーできる。Therefore, the electromagnetic wave intensity, that is, the magnetic field intensity is 1
Attenuation is about 0%, but this can be covered by increasing the power supply capacity.
【0026】なお、パルス幅を伸ばすことにより、磁場
強度の減衰をもっと小さく抑えることも可能であるが、
この場合、コイルの発熱量が問題となる。即ち、コイル
の発熱量は、パルス幅に比例して大きくなり、本実施形
態の場合、240Wで、この程度が現状で水冷できる限
界である。このように、パラメータを適当に選ぶこと
で、渦電流による磁場強度の減衰を抑えることができ
る。Although the attenuation of the magnetic field strength can be further reduced by increasing the pulse width,
In this case, the heat value of the coil becomes a problem. That is, the amount of heat generated by the coil increases in proportion to the pulse width. In the case of the present embodiment, it is 240 W, which is the current limit of water cooling. Thus, by appropriately selecting the parameters, the attenuation of the magnetic field strength due to the eddy current can be suppressed.
【0027】本実施形態では、断面が長方形の角ダクト
を用いているので、水平方向に偏平に広がった形状をし
ている入射電子ビーム8の形状に合わせて配置すること
で、デッドスペースを少なくすることができ、装置をコ
ンパクト化することができる。更に、インフレクタ48
の磁極50A、50Bを入射電子ビーム8に近付けるこ
とで、電力を節約することも可能となる。又、角ダクト
の両側に平らな導体からなるコイル52を配置している
ので、コイル52を真空ダクト46の側面に縛り付けて
固定することができ、別体のサポートが不要で、支持も
容易である。In the present embodiment, since a rectangular duct having a rectangular cross section is used, the dead space is reduced by arranging it in accordance with the shape of the incident electron beam 8 which has a shape that spreads flat in the horizontal direction. And the device can be made compact. Further, the inflector 48
By bringing the magnetic poles 50A and 50B closer to the incident electron beam 8, power can also be saved. In addition, since the coil 52 made of a flat conductor is disposed on both sides of the square duct, the coil 52 can be fixed by being tied to the side surface of the vacuum duct 46, so that a separate support is not required and the support is easy. is there.
【0028】なお、真空ダクトの断面形状は長方形に限
定されず、正方形とすることも可能である。又、コイル
を固定する方法も、帯状材を用いる方法に限定されな
い。[0028] The cross-sectional shape of the vacuum duct is not limited to rectangular, square and be Rukoto are possible. Further, the method for fixing the coil is not limited to the method using the belt-shaped material.
【0029】又、本実施形態においては、コアブロック
50が、真空ダクト46の曲率に合わせて、3個に分割
されているので、ビーム軌道の変更への対応が容易であ
り、コンパクト化も可能である。なお、分割数は3に限
定されず、又、分割せず一体とすることも可能である。In this embodiment, since the core block 50 is divided into three according to the curvature of the vacuum duct 46, it is easy to cope with a change in the beam trajectory, and it is possible to reduce the size. It is. Note that the number of divisions is not limited to three, and may be integrated without dividing.
【0030】前記実施形態においては、本発明が、長円
形の電子蓄積リングを用いたシンクロトロン用のインフ
レクタに適用されていたが、本発明の適用対象はこれに
限定されず、略長方形等、他の形状の電子蓄積リングを
用いたシンクロトロン用インフレクタや、真空中を進行
する電子や陽電子以外の荷電粒子ビームを曲げるため
の、インフレクタ以外の電磁石一般にも適用できること
は明らかである。In the above embodiment, the present invention is applied to a synchrotron inflector using an elliptical electron storage ring, but the present invention is not limited to this. It is apparent that the present invention can be applied to an inflector for a synchrotron using an electron storage ring of another shape and an electromagnet other than the inflector for bending a charged particle beam other than electrons and positrons traveling in a vacuum.
【0031】[0031]
【発明の効果】本発明によれば、市販の角ダクトを真空
ダクトとして用いることができ、真空電磁石装置の製作
が容易である。又、電磁石を非真空雰囲気に配設するこ
とができ、保守も容易となる。According to the present invention may be a commercially available corner ducts as a vacuum duct, it is easy to manufacture the vacuum electromagnetic device. Also, the electromagnet can be arranged in a non-vacuum atmosphere, and maintenance is easy.
【図1】本発明の実施形態の概略構成を示す平面図FIG. 1 is a plan view showing a schematic configuration of an embodiment of the present invention.
【図2】図1のII−II線に沿う横断面図FIG. 2 is a cross-sectional view taken along the line II-II of FIG.
【図3】前記実施形態の真空ダクト周辺を拡大して示す
横断面図FIG. 3 is an enlarged cross-sectional view showing the vicinity of the vacuum duct of the embodiment.
【図4】本発明の適用対象の1つであるレーストラック
型シンクロトロンの概略構成を示す平面図FIG. 4 is a plan view showing a schematic configuration of a race track type synchrotron to which one of the present invention is applied;
【図5】前記シンクロトロンで用いられている従来のイ
ンフレクタの配置を示す横断面図FIG. 5 is a cross-sectional view showing an arrangement of a conventional inflector used in the synchrotron.
8…入射電子ビーム 10…周回軌道 46…真空ダクト 48…インフレクタ 50…コアブロック 50A、50B…磁極 52…コイル 56…固定用帯状材 Reference numeral 8: incident electron beam 10: orbit 46: vacuum duct 48: inflector 50: core block 50A, 50B: magnetic pole 52: coil 56: fixing strip
フロントページの続き (56)参考文献 特開 平8−288126(JP,A) 特開 平6−68996(JP,A) 特開 平4−104500(JP,A) 特開 平5−226100(JP,A) 特開 平11−283794(JP,A) 特開 平7−263194(JP,A) 特開2000−114000(JP,A) 特開 平6−5398(JP,A) 特開 平5−196799(JP,A) 特開 平3−37999(JP,A) 特開 平3−20700(JP,A) 特開 昭61−95298(JP,A) 特開 昭61−264650(JP,A) 特開 昭61−284100(JP,A) 実開 平5−18000(JP,U) (58)調査した分野(Int.Cl.7,DB名) H05H 7/08 Continuation of front page (56) References JP-A-8-288126 (JP, A) JP-A-6-68996 (JP, A) JP-A-4-104500 (JP, A) JP-A-5-226100 (JP) JP-A-11-283794 (JP, A) JP-A-7-263194 (JP, A) JP-A-2000-114000 (JP, A) JP-A-6-5398 (JP, A) JP-A-5 JP-A-196799 (JP, A) JP-A-3-37999 (JP, A) JP-A-3-20700 (JP, A) JP-A-61-95298 (JP, A) JP-A-61-264650 (JP, A) JP-A-61-284100 (JP, A) Japanese Utility Model Application Laid-Open No. 5-18000 (JP, U) (58) Fields investigated (Int. Cl. 7 , DB name) H05H 7/08
Claims (3)
ための真空電磁石装置において、 非真空雰囲気に配設され、時間的に変化する電流が流さ
れる電磁石と、 該電磁石の磁極間に挿入される、断面形状が外側に平坦
面を有する形状とされ、内部が真空とされ、前記外側の
平坦面に前記電磁石のコイルが密着配置された、ビーム
進行用の真空ダクトと、 を備えたことを特徴とする真空電磁石装置。1. A vacuum electromagnet device for bending a charged particle beam traveling in a vacuum, wherein the device is disposed in a non-vacuum atmosphere and a time-varying electric current is applied.
An electromagnet that Re is inserted between the magnetic poles of the electromagnet, is shaped sectional shape to have a flat surface on the outside, inside is vacuum, the coil of the electromagnet is disposed in close contact with the flat surface of the outer, A vacuum electromagnet device comprising: a vacuum duct for beam advancement;
て、前記コイルが、前記真空ダクト外側の平坦面に、帯
状材により縛り付けて固定されていることを特徴とする
真空電磁石装置。In vacuum electromagnet apparatus according to claim 1, before Symbol coil, the flat surface of the vacuum duct outside the vacuum electromagnetic device characterized in that it is fixed strapped by strip material.
おいて、前記コイルの導体が中空とされ、その中に冷却In this case, the conductor of the coil is made hollow,
水が流されることを特徴とする真空電磁石装置。A vacuum electromagnet device characterized by flowing water.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP08594698A JP3317894B2 (en) | 1998-03-31 | 1998-03-31 | Vacuum electromagnet device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP08594698A JP3317894B2 (en) | 1998-03-31 | 1998-03-31 | Vacuum electromagnet device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11283793A JPH11283793A (en) | 1999-10-15 |
| JP3317894B2 true JP3317894B2 (en) | 2002-08-26 |
Family
ID=13872942
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP08594698A Expired - Fee Related JP3317894B2 (en) | 1998-03-31 | 1998-03-31 | Vacuum electromagnet device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3317894B2 (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000114000A (en) | 1999-11-19 | 2000-04-21 | Mitsubishi Electric Corp | Pulse charged particle orbit deflector |
-
1998
- 1998-03-31 JP JP08594698A patent/JP3317894B2/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000114000A (en) | 1999-11-19 | 2000-04-21 | Mitsubishi Electric Corp | Pulse charged particle orbit deflector |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH11283793A (en) | 1999-10-15 |
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