JP3335262B2 - Magnetic recording medium substrate and method of manufacturing the same - Google Patents
Magnetic recording medium substrate and method of manufacturing the sameInfo
- Publication number
- JP3335262B2 JP3335262B2 JP06182095A JP6182095A JP3335262B2 JP 3335262 B2 JP3335262 B2 JP 3335262B2 JP 06182095 A JP06182095 A JP 06182095A JP 6182095 A JP6182095 A JP 6182095A JP 3335262 B2 JP3335262 B2 JP 3335262B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- magnetic recording
- recording medium
- molded product
- polycarbodiimide resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 title claims description 43
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 229920005989 resin Polymers 0.000 claims description 20
- 239000011347 resin Substances 0.000 claims description 20
- 229910021397 glassy carbon Inorganic materials 0.000 claims description 16
- 239000011148 porous material Substances 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 7
- 238000003763 carbonization Methods 0.000 claims description 5
- 238000000465 moulding Methods 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 3
- 239000002994 raw material Substances 0.000 claims description 3
- 238000010000 carbonizing Methods 0.000 claims description 2
- 230000000704 physical effect Effects 0.000 description 14
- 239000000243 solution Substances 0.000 description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
- 229910052799 carbon Inorganic materials 0.000 description 8
- 125000005442 diisocyanate group Chemical group 0.000 description 8
- 239000010408 film Substances 0.000 description 8
- 230000007547 defect Effects 0.000 description 6
- 239000011521 glass Substances 0.000 description 5
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- 229920001568 phenolic resin Polymers 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- XPFVYQJUAUNWIW-UHFFFAOYSA-N furfuryl alcohol Chemical compound OCC1=CC=CO1 XPFVYQJUAUNWIW-UHFFFAOYSA-N 0.000 description 3
- 230000005484 gravity Effects 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- RUELTTOHQODFPA-UHFFFAOYSA-N toluene 2,6-diisocyanate Chemical compound CC1=C(N=C=O)C=CC=C1N=C=O RUELTTOHQODFPA-UHFFFAOYSA-N 0.000 description 3
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 2
- YMKWWHFRGALXLE-UHFFFAOYSA-N 4-methyl-1-phenyl-2,3-dihydro-1$l^{5}-phosphole 1-oxide Chemical compound C1CC(C)=CP1(=O)C1=CC=CC=C1 YMKWWHFRGALXLE-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- KNHJIEOCVVIBIV-UHFFFAOYSA-N 2,3-dimethylphenyl isocyanate Chemical compound CC1=CC=CC(N=C=O)=C1C KNHJIEOCVVIBIV-UHFFFAOYSA-N 0.000 description 1
- 229910018134 Al-Mg Inorganic materials 0.000 description 1
- 229910018467 Al—Mg Inorganic materials 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- WMTLVUCMBWBYSO-UHFFFAOYSA-N N=C=O.N=C=O.C=1C=CC=CC=1OC1=CC=CC=C1 Chemical compound N=C=O.N=C=O.C=1C=CC=CC=1OC1=CC=CC=C1 WMTLVUCMBWBYSO-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical group ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 description 1
- 239000006061 abrasive grain Substances 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- KQWGXHWJMSMDJJ-UHFFFAOYSA-N cyclohexyl isocyanate Chemical compound O=C=NC1CCCCC1 KQWGXHWJMSMDJJ-UHFFFAOYSA-N 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- SLGWESQGEUXWJQ-UHFFFAOYSA-N formaldehyde;phenol Chemical class O=C.OC1=CC=CC=C1 SLGWESQGEUXWJQ-UHFFFAOYSA-N 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 229920005610 lignin Polymers 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- HAMGRBXTJNITHG-UHFFFAOYSA-N methyl isocyanate Chemical compound CN=C=O HAMGRBXTJNITHG-UHFFFAOYSA-N 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- DGTNSSLYPYDJGL-UHFFFAOYSA-N phenyl isocyanate Chemical compound O=C=NC1=CC=CC=C1 DGTNSSLYPYDJGL-UHFFFAOYSA-N 0.000 description 1
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229950011008 tetrachloroethylene Drugs 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
Landscapes
- Carbon And Carbon Compounds (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は磁気記録媒体用基板及び
その製造方法に関するものであり、更に詳しくは、コン
ピュータやデータープロセッサ等における記録装置用と
して有用な磁気記録媒体用基板及びその製造方法に関す
るものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic recording medium substrate and a method of manufacturing the same, and more particularly, to a magnetic recording medium substrate useful for a recording device in a computer or a data processor and a method of manufacturing the same. Things.
【0002】[0002]
【従来の技術】周知のように、従来より磁気ディスク等
の磁気記録媒体のための基板材としては、非磁性材であ
るアルミニウム(Al)合金が多用されており、例えば
アルミニウム−マグネシウム(Al−Mg)合金による
基板上に無電解メッキ法によってニッケル−リン(Ni
−P)層を形成し、更にその上にスパッタリングにより
クロム(Cr)層、コバルト(Co)合金層及び炭素
(C)保護膜を順次形成したもの等が良く知られてい
る。2. Description of the Related Art As is well known, as a substrate material for a magnetic recording medium such as a magnetic disk, an aluminum (Al) alloy, which is a non-magnetic material, is frequently used. Nickel-phosphorus (Ni) on a substrate made of
-P) layer is formed, and a chromium (Cr) layer, a cobalt (Co) alloy layer, and a carbon (C) protective film are sequentially formed thereon by sputtering.
【0003】又、近年になって、記録容量を向上させる
ため、表面がより平滑なガラス基板を用い、スパッタリ
ングによりCr層、Co合金層及びC保護膜を順次形成
したもの等が知られるようになってきており、最近で
は、フェノール−ホルムアルデヒド系樹脂を原料にした
ガラス状炭素を用い、上記と同様に磁気薄膜を作成した
記録媒体も現れるようになった。In recent years, in order to improve the recording capacity, a glass substrate having a smoother surface and a Cr layer, a Co alloy layer and a C protective film sequentially formed by sputtering has been known. In recent years, a recording medium using a glassy carbon made of a phenol-formaldehyde resin as a raw material and forming a magnetic thin film in the same manner as described above has also appeared.
【0004】このように、特に近年の磁気記録再生装置
としては、記録容量が大きなものが望まれており、従っ
て、装置の小型化や軽量化が更に求められているのであ
るが、従来の磁気記録媒体用基板はこのような市場要求
を満たすことはできず、そのため新しい磁気記録媒体用
基板の開発が望まれていた。As described above, in particular, a magnetic recording / reproducing apparatus of recent years is desired to have a large recording capacity. Therefore, further miniaturization and weight reduction of the apparatus are required. A recording medium substrate cannot satisfy such market demands, and therefore, development of a new magnetic recording medium substrate has been desired.
【0005】[0005]
【発明が解決しようとする課題】即ち、上記Al−Mg
合金基板は、比重が大きい(約2.6)上に、厚みを1
mm以下にすることが困難であるため、基板及び記録装
置の小型化、軽量化が不可能であり、又、上記ガラス基
板を用いたものは、厚みを1mm以下にすることは可能
である一方で、比重が約2.5と大きく、小型、軽量化
には、不十分である。That is, the above Al-Mg
The alloy substrate has a high specific gravity (about 2.6) and a thickness of 1
mm or less, it is impossible to reduce the size and weight of the substrate and the recording apparatus, and the thickness using the glass substrate can be reduced to 1 mm or less. However, the specific gravity is as large as about 2.5, which is insufficient for reducing the size and weight.
【0006】更に、特開平3−52116号公報ににお
いては、フェノール−ホルムアルデヒド樹脂を用い、プ
レス成型した後、炭素化し焼成してガラス状炭素による
基板を得、気孔を低減するために2000℃以上で10
00気圧以上もの圧力を前記基板に加えて再焼成する方
法により、比重が1.85と比較的軽量の磁気記録媒体
が得られているものの、工程が複雑で、2000℃以上
で1000気圧以上もの圧力を加えるため、コスト高に
なるばかりか、このフェノール−ホルムアルデヒドを用
いた基板には、低減されたとはいっても基板表面に気
孔、即ち表面欠陥が存在するという難点がある。Further, Japanese Patent Application Laid-Open No. 3-52116 discloses that a phenol-formaldehyde resin is press-molded, then carbonized and fired to obtain a glassy carbon substrate. At 10
Although a relatively light-weight magnetic recording medium having a specific gravity of 1.85 is obtained by the method of re-baking by applying a pressure of at least 00 atm to the substrate, the process is complicated, and a pressure of at least 1000 atm at 2,000 ° C or more Not only is the cost increased due to the application of pressure, but also the substrate using this phenol-formaldehyde has the disadvantage that pores, ie, surface defects, are present on the substrate surface even though it is reduced.
【0007】特に、基板上の磁性層の膜厚が0.1μm
以下の薄膜磁気ディスクでは、基板の表面状態は磁性層
表面に反映されるため、基板表面のピンホール等の気孔
(表面欠陥)は、磁気記録のビットエラーを引き起こす
原因となる。In particular, when the thickness of the magnetic layer on the substrate is 0.1 μm
In the following thin-film magnetic disks, since the surface state of the substrate is reflected on the surface of the magnetic layer, pores (surface defects) such as pinholes on the substrate surface cause bit errors in magnetic recording.
【0008】又、特公平3−11005号公報に記載の
方法では、ポリアクリロニトリル系ガラス状炭素、ビッ
チ系ガラス状炭素、リグニン系ガラス状炭素、フェノー
ル樹脂系ガラス状炭素、フラン樹脂系ガラス状炭素、ア
ルキッド樹脂系ガラス状炭素、不飽和ポリエステル系ガ
ラス状炭素、キシレン樹脂系ガラス状炭素を用いたディ
スク基板が示されており、このディスク基板も比重1.
5と軽量ではあるが、表面に2μm以上の気孔からなる
表面欠陥が、直径130mmのディスク状基板当り5〜
10以上もあり、磁気記録媒体用基板としては適してい
ない。In the method described in Japanese Patent Publication No. 3-11005, polyacrylonitrile glassy carbon, bitch glassy carbon, lignin glassy carbon, phenolic resinous glassy carbon, furan resinous glassy carbon are disclosed. And a disk substrate using an alkyd resin-based glassy carbon, an unsaturated polyester-based glassy carbon, and a xylene resin-based glassy carbon.
5, the surface defect consisting of pores of 2 μm or more on the surface is 5 to 5 per disk-shaped substrate with a diameter of 130 mm.
There are more than 10 and it is not suitable as a substrate for a magnetic recording medium.
【0009】本発明は、上記のような従来技術の問題点
に鑑みてなされたもので、その目的は軽量かつ薄板化が
可能で機械的強度に優れ、表面が平滑緻密であって気孔
からなる表面欠陥がなく、しかも低コストで作製提供し
得る磁気記録媒体用基板及びその製造方法を提供するも
のである。SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems of the prior art, and has as its object the purpose of being lightweight, capable of being thinned, having excellent mechanical strength, having a smooth and dense surface, and having pores. An object of the present invention is to provide a magnetic recording medium substrate which can be manufactured and provided at low cost without surface defects and a method for manufacturing the same.
【0010】上記課題を解決するために本発明が採用し
た磁気記録媒体の構成は、主として、ポリカルボジイミ
ド樹脂を原料として製造したガラス状炭素からなること
を特徴とするものであり、又、その製造方法の構成は、
ポリカルボジイミド樹脂或いは主としてポリカルボジイ
ミド樹脂よりなる組成物を適宜の形状に成形し、次いで
該成形物を炭素化してガラス状炭素とした後、磁気記録
媒体用基板に加工することを特徴とするものである。[0010] The structure of the magnetic recording medium employed in the present invention to solve the above-mentioned problem is characterized in that it is mainly composed of glassy carbon produced using a polycarbodiimide resin as a raw material. The configuration of the method is
The method is characterized in that a polycarbodiimide resin or a composition mainly composed of a polycarbodiimide resin is molded into an appropriate shape, and then the molded product is carbonized into glassy carbon, and then processed into a substrate for a magnetic recording medium. is there.
【0011】以下に本発明を詳細に説明する。Hereinafter, the present invention will be described in detail.
【0012】上記ポリカルボジイミド樹脂それ自体は周
知ものか、或いは、周知のものと同様にして製造するこ
とができるものであって{米国特許第2,94l,95
6号明細書;特公昭47−33279号公報;J.Or
g.Chem.,28,2069〜2075(196
3)Chemical Review l98l,vo
l.8l.No.4,6l9〜62l等参照}、例え
ば、カルボジイミド化触媒の存在下、有機ジイソシアネ
ートの脱二酸化炭素を伴う縮合反応により容易に製造す
ることができる。The above-mentioned polycarbodiimide resin itself is known or can be produced in the same manner as known ones. US Pat. No. 2,941,95
No. 6, JP-B-47-33279; Or
g. Chem. , 28 , 2069-2075 (196
3) Chemical Review 198l, vo
l. 8l. No. For example, it can be easily produced by a condensation reaction involving the removal of carbon dioxide from an organic diisocyanate in the presence of a carbodiimidization catalyst.
【0013】上記ポリカルボジイミド樹脂の製造に使用
される有機ジイソシアネートとしては、脂肪族系、脂環
式系、芳香族系、芳香−脂肪族系等のいずれのタイプも
のであってもよく、これらは単独で用いても、或いは、
2種以上を組み合わせて使用してもよい。The organic diisocyanate used in the production of the polycarbodiimide resin may be any of aliphatic, alicyclic, aromatic, and aromatic-aliphatic types. Used alone or
Two or more kinds may be used in combination.
【0014】具体的には、2,4−トリレンジイソシア
ネート、2,6−トリレンジイソシアネート、2,4−
トリレンジイソシアネートと2,6−トリレンジイソシ
アネートの混合物、粗トリレンジイソシアネート、キシ
レンジイソシアネート、m−フェニルジイソシアネー
ト、ナフチレン−1,5−ジイソシアネート、4,4,
−ビピフェニレンジイソシアネートや3,3,−ジメト
キシ−4,4,−ビフェニルジイソシアネート、或いは
これらの混合物を上記有機ジイソシアネートとして例示
することができる。Specifically, 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, 2,4-tolylene diisocyanate,
Mixture of tolylene diisocyanate and 2,6-tolylene diisocyanate, crude tolylene diisocyanate, xylene diisocyanate, m-phenyl diisocyanate, naphthylene-1,5-diisocyanate, 4,4,4
-Bipiphenylene diisocyanate, 3,3, -dimethoxy-4,4, -biphenyl diisocyanate, or a mixture thereof can be exemplified as the organic diisocyanate.
【0015】而して、本発明において使用されるポリカ
ルボジイミド樹脂には、下記式 −R−N=C=N− (但し、式中のRは有機ジイソシアネート残基を表す)
で示される少なくともl種の繰り返し単位からなる単独
重合体または共重合体が包含される。The polycarbodiimide resin used in the present invention has the following formula: -RN = C = N- (wherein R represents an organic diisocyanate residue)
And a homopolymer or a copolymer comprising at least one type of repeating unit represented by the formula:
【0016】有機ジイソシアネート残基である上記式に
おけるRとしては、中でも芳香族ジイソシアネート残基
が好適である(ここで、有機ジイソシアネート残基と
は、有機ジイソシアネート分子から2つのイソシアネー
ト基(NCO)を除いた残りの部分をいう)。このよう
なポリカルボジイミド樹脂の具体例としては、以下のも
のを挙げることができる。As R in the above formula which is an organic diisocyanate residue, an aromatic diisocyanate residue is particularly preferable (here, the organic diisocyanate residue is a group obtained by removing two isocyanate groups (NCO) from an organic diisocyanate molecule). The rest). Specific examples of such a polycarbodiimide resin include the following.
【化1】 Embedded image
【0017】上記各式中において、nはl0〜l0,0
00の範囲内、好ましくは50〜5,000の範囲内で
あり、又、ポリカルボジイミド樹脂の末端は、モノイソ
シアネート等により封止されていてもよく、このように
ポリカルボジイミドの端末を封止してその分子量を制御
するためのモノイソシアネートとしては、フェニルイソ
シアネート、(オルト、メタ、パラ)−トリルイソシア
ネート、ジメチルフェニルイソシアネート、シクロヘキ
シルイソシアネート、メチルイソシアネート等を例示す
ることができる。In the above formulas, n is 10 to 10 and 0.
00, preferably in the range of 50 to 5,000, and the terminal of the polycarbodiimide resin may be sealed with monoisocyanate or the like, thus sealing the terminal of the polycarbodiimide. Examples of the monoisocyanate for controlling the molecular weight thereof include phenyl isocyanate, (ortho, meta, para) -tolyl isocyanate, dimethylphenyl isocyanate, cyclohexyl isocyanate, and methyl isocyanate.
【0018】上記ポリカルボジイミド樹脂は、溶液のま
ま或いは溶液から沈殿させた粉末として得ることがで
き、このようにして得られたポリカルボジイミド樹脂
は、液状で得られるポリカルボジイミド樹脂の場合は、
そのまま或いは溶媒を留去して、又、粉末として得られ
るポリカルボジイミド樹脂の場合は、そのまま或いは溶
媒に溶解して液状とした後に使用すればよい。The above-mentioned polycarbodiimide resin can be obtained as a solution or as a powder precipitated from the solution. The polycarbodiimide resin thus obtained is, in the case of a polycarbodiimide resin obtained in a liquid form,
In the case of a polycarbodiimide resin obtained as it is or by distilling off the solvent, or in the case of a polycarbodiimide resin obtained as a powder, it may be used as it is or after dissolving it in a solvent to form a liquid.
【0019】本発明では、上記のポリカルボジイミド樹
脂或いはポリカルボジイミド樹脂溶液により、まず、例
えば板状或いは円板状の成形物を成形する。この成形物
を成形する方法は、一般にこのような工程で使用される
方法を利用することができ、特に制限はないが、例えば
射出成形、圧縮成形、注型成形、真空成形や押出成形等
を挙げることができる。In the present invention, first, for example, a plate-shaped or disk-shaped molded product is formed from the above-mentioned polycarbodiimide resin or polycarbodiimide resin solution. The method for molding this molded product can be generally used in such a step, and is not particularly limited. Examples thereof include injection molding, compression molding, casting molding, vacuum molding, and extrusion molding. Can be mentioned.
【0020】次いで、上記のようにして成形された成形
物を加熱し、前記ポリカルボジイミド樹脂を炭素化する
ことにより、目的とする板状或いは円板状のガラス状炭
素成形物を得ることができる。この炭素化工程は、真空
中や窒素ガス中等の不活性雰囲気下において行うことが
でき、その際の最終焼成温度は、好ましくは1000℃
〜3000℃である。Next, by heating the molded product molded as described above and carbonizing the polycarbodiimide resin, a desired plate-shaped or disk-shaped glassy carbon molded product can be obtained. . This carbonization step can be performed under an inert atmosphere such as in a vacuum or in a nitrogen gas, and the final firing temperature at that time is preferably 1000 ° C.
33000 ° C.
【0021】尚、上記炭素化工程における最終焼成温度
までの昇温速度は、2℃/時間以下であることが好まし
く、あまりに早く最終焼成温度に達すると、気孔率が
0.02%以上になったり、更には表面に0.1μm以
上の大きさの気孔が生じるので好ましくない。The rate of temperature rise to the final firing temperature in the carbonization step is preferably 2 ° C./hour or less, and if the final firing temperature is reached too early, the porosity becomes 0.02% or more. It is not preferable because pores having a size of 0.1 μm or more are generated on the surface.
【0022】このようにして得られたガラス状炭素成形
物は、軽量かつ薄膜化が可能で、機械的強度に優れると
共に、極めて平滑緻密であり、その物性を測定したとこ
ろ、例えば気孔率が0〜0.019%、かさ密度が1.
51〜1.70g/cm3であり、表面に0.1μm以
上の気孔が存在しないという、極めて優れた磁気記録媒
体用基板のための素材であることが判明した。The glassy carbon molded product obtained in this way is lightweight, can be formed into a thin film, has excellent mechanical strength, is extremely smooth and dense, and is measured for physical properties. ~ 0.019%, bulk density is 1.
It was found to be 51 to 1.70 g / cm 3, which is an extremely excellent material for a substrate for a magnetic recording medium, having no pores of 0.1 μm or more on the surface.
【0023】上記のような優れた物性を有する結果、前
記ガラス状炭素を、外径及び内径を整えたディスク状に
加工し、更に必要であれば磁気ヘッド浮揚面と磁気記録
媒体表面との吸着現象を防止するためのテクスチャー処
理を磁気記録媒体表面に施すことにより得られる本発明
の磁気記録媒体用基板は、記録密度を高めることができ
るばかりではなく、記録媒体の軽量化を可能とし、これ
により記録装置駆動モーターを小型化することができ、
記録装置の小型化、軽量化が可能となる。又、本発明の
製造方法は比較的簡単であるため、記録媒体の製造のコ
スト低減も可能となった。As a result of having the above-mentioned excellent physical properties, the glassy carbon is processed into a disk having an adjusted outer diameter and inner diameter, and, if necessary, adsorption between a magnetic head floating surface and a magnetic recording medium surface. The magnetic recording medium substrate of the present invention obtained by performing texture processing on the surface of the magnetic recording medium to prevent the phenomenon not only can increase the recording density, but also enables the weight of the recording medium to be reduced. Allows the recording device drive motor to be downsized,
It is possible to reduce the size and weight of the recording device. Further, since the manufacturing method of the present invention is relatively simple, the cost of manufacturing the recording medium can be reduced.
【0024】又、上記本発明の磁気記録媒体用基板は、
表面に0.1μm以上の気孔(表面欠陥)が存在しない
ため、特に薄膜磁気ディスクとした場合でも、磁気記録
のビットエラーを引き起こすことがない。Further, the substrate for a magnetic recording medium of the present invention includes:
Since there are no pores (surface defects) of 0.1 μm or more on the surface, a bit error of magnetic recording does not occur even when a thin film magnetic disk is used.
【0025】[0025]
【実施例】以下に本発明を実施例により更に説明する。EXAMPLES The present invention will be further described below with reference to examples.
【0026】実施例1〜6 2,4−トリレンジイソシアネート/2,6−トリレン
ジイソシアネートの混合物(80:20)〔TDI〕5
4gをテトラクロロエチレン500ml中で、カルボジ
イミド化触媒(1−フェニル−3−メチルホスフォレン
オキサイド)0.12gと共に、120℃で5時間反応
させ、ポリカルボジイミド溶液を得た。Examples 1 to 6 Mixture of 2,4-tolylene diisocyanate / 2,6-tolylene diisocyanate (80:20) [TDI] 5
4 g was reacted in 500 ml of tetrachloroethylene together with 0.12 g of a carbodiimidation catalyst (1-phenyl-3-methylphospholene oxide) at 120 ° C. for 5 hours to obtain a polycarbodiimide solution.
【0027】ガラスシャーレに反応液を流し、60℃で
20時間、120℃で20時間乾燥した後1℃/時間の
昇温速度で200℃まで加熱し、硬化した板を得た。得
られた硬化板を、2℃/時間の昇温速度で1500℃ま
で昇温した。The reaction solution was passed through a glass Petri dish, dried at 60 ° C. for 20 hours and at 120 ° C. for 20 hours, and then heated to 200 ° C. at a rate of 1 ° C./hour to obtain a cured plate. The temperature of the obtained cured plate was increased to 1500 ° C. at a rate of 2 ° C./hour.
【0028】このようにして得られた炭素板に対し、内
外径加工及び板圧均一化加工を行い、その後、両面同時
研削とダイヤモンド砥粒を用いた両面同時研磨加工を行
い、下記の表1に示すような磁気記録媒体用基板を作成
した。The carbon plate thus obtained was subjected to inner and outer diameter processing and processing for equalizing the plate pressure, and then to both-side simultaneous grinding and simultaneous double-side polishing using diamond abrasive grains. The substrate for a magnetic recording medium shown in FIG.
【表1】[Table 1]
【0029】 その後、表面粗度計(東京精密(株)製)によって表面
祖さを測定し、又、その他にかさ密度及び光学顕微鏡に
より表面の気孔(0.1μm以上)の存在を調べた。
又、ショア硬度、気孔率も測定した。結果を以下の表2
に示す。尚、表2中の「表面欠陥」は、基板1枚当りの
表面における0.1μm以上の気孔の数を表す。[0029] Thereafter, the surface roughness was measured with a surface roughness meter (manufactured by Tokyo Seimitsu Co., Ltd.), and the bulk density and the presence of pores (0.1 μm or more) on the surface were examined by an optical microscope.
In addition, Shore hardness and porosity were also measured. The results are shown in Table 2 below.
Shown in Note that “surface defect” in Table 2 represents the number of pores of 0.1 μm or more on the surface of one substrate.
【表2】 [Table 2]
【0030】又、上記基板に対し、第1膜としてCr膜
を、第2膜としてCo−NiCr合金膜を、保護膜とし
てC膜をスパッタリングによって作成して磁気記録媒体
とし、記録再生特性評価を行ったところ、以下の表3に
示すように良好な特性を有することが明らかになった。On the above-mentioned substrate, a Cr film was formed as a first film, a Co—NiCr alloy film was formed as a second film, and a C film was formed as a protective film by sputtering to obtain a magnetic recording medium. As a result, as shown in Table 3 below, it was found that the composition had good characteristics.
【表3】 [Table 3]
【0031】実施例7 メチレンジフェニルジイソシアネート〔MDI〕50g
をテトラヒドロフラン880ml中で、カルボジイミド
化触媒(1−フェニル−3−メチルホスフォレンオキサ
イド)0.12gと共に、68℃で15時間反応させ、
ポリカルボジイミド溶液を得た。Example 7 Methylene diphenyl diisocyanate [MDI] 50 g
In 880 ml of tetrahydrofuran with 0.12 g of a carbodiimidation catalyst (1-phenyl-3-methylphospholene oxide) at 68 ° C. for 15 hours,
A polycarbodiimide solution was obtained.
【0032】ガラスシャーレに反応液を流し、40℃で
20時間、120℃で40時間乾燥した後、1℃/時間
の昇温速度で200℃まで加熱し、硬化した板を得た。
得られた硬化板を、2℃/時間の昇温速度で2000℃
まで昇温した。The reaction solution was passed through a glass Petri dish, dried at 40 ° C. for 20 hours and at 120 ° C. for 40 hours, and then heated to 200 ° C. at a rate of 1 ° C./hour to obtain a cured plate.
The obtained cured plate was heated at 2000 ° C. at a heating rate of 2 ° C./hour.
Temperature.
【0033】このようにして得られた炭素板を、実施例
2の炭素板と同様に機械加工し、磁気記録媒体用基板を
作製して、実施例2と同様の方法により磁気記録媒体を
得、物性の測定及び記録再生物性評価を行った。結果を
以下の表4及び表5に示す。The carbon plate thus obtained was machined in the same manner as the carbon plate of Example 2 to prepare a substrate for a magnetic recording medium, and a magnetic recording medium was obtained in the same manner as in Example 2. , Physical properties and recording / reproducing physical properties were evaluated. The results are shown in Tables 4 and 5 below.
【0034】実施例8 ジフェニルエーテルジイソシアネート54gをテトラヒ
ドロフラン850ml中で、カルボジイミド化触媒(1
−フェニル−3−メチルホスフォレンオキサイド)0.
12gと共に、68℃で15時間反応させ、ポリカルボ
ジイミド溶液を得た。Example 8 54 g of diphenyl ether diisocyanate was added to 850 ml of tetrahydrofuran in a carbodiimidization catalyst (1).
-Phenyl-3-methylphospholene oxide) 0.
The mixture was reacted at 68 ° C. for 15 hours together with 12 g to obtain a polycarbodiimide solution.
【0035】ガラスシャーレに反応液を流し、40℃で
20時間、120℃で30時間乾燥した後、1℃/時間
の昇温速度で200℃まで加熱し、硬化した板を得た。
得られた硬化板を、2℃/時間の昇温速度で1800℃
まで昇温した。The reaction solution was passed through a glass Petri dish, dried at 40 ° C. for 20 hours and at 120 ° C. for 30 hours, and then heated to 200 ° C. at a rate of 1 ° C./hour to obtain a cured plate.
The obtained cured plate was heated at a rate of 2 ° C./hour to 1800 ° C.
Temperature.
【0036】このようにして得られた炭素板を、実施例
2の炭素板と同様に機械加工し、磁気記録媒体用基板を
作製して、実施例2と同様の方法により物性の測定及び
記録再生物性評価を行った。結果を以下の表4及び表5
に示す。The carbon plate thus obtained was machined in the same manner as the carbon plate of Example 2 to prepare a substrate for a magnetic recording medium, and the physical properties were measured and recorded in the same manner as in Example 2. The recycled physical properties were evaluated. The results are shown in Tables 4 and 5 below.
Shown in
【0037】実施例9 実施例1で得られた硬化板を1℃/時間の昇温速度で1
500℃まで昇温し、このようにして得られた炭素板
を、実施例2と同様に機械加工し、磁気記録媒体用基板
を作製して、実施例2と同様の方法により物性の測定及
び記録再生物性評価を行った。結果を以下の表4及び表
5に示す。Example 9 The cured plate obtained in Example 1 was heated at a rate of 1 ° C./hour for 1 hour.
The temperature was raised to 500 ° C., and the carbon plate thus obtained was machined in the same manner as in Example 2 to prepare a substrate for a magnetic recording medium, and physical properties were measured and measured in the same manner as in Example 2. The recording / reproducing physical properties were evaluated. The results are shown in Tables 4 and 5 below.
【表4】 [Table 4]
【表5】 [Table 5]
【0038】比較例1 フェノールホルムアルデヒド樹脂を用い、実施例2と同
様の方法により磁気記録媒体用基板を作成し、同様に物
性の測定及び記録再生物性評価を行った。結果を以下の
表6及び表7に示す。Comparative Example 1 Using a phenol formaldehyde resin, a substrate for a magnetic recording medium was prepared in the same manner as in Example 2, and the physical properties were measured and the recording / reproducing physical properties were evaluated in the same manner. The results are shown in Tables 6 and 7 below.
【0039】比較例2 フルフリルアルコールにP−トルエンスルホン酸を0.
4重量部加えて混合し、実施例2と同様の方法により磁
気記録媒体用基板を作成し、同様に物性の測定及び記録
再生物性評価を行った。結果を以下の表6及び表7に示
す。Comparative Example 2 P-toluenesulfonic acid was added to furfuryl alcohol at a concentration of 0.1%.
4 parts by weight were added and mixed, a magnetic recording medium substrate was prepared in the same manner as in Example 2, and the physical properties were measured and the recording / reproducing physical properties were evaluated in the same manner. The results are shown in Tables 6 and 7 below.
【0040】比較例3 実施例1で得られた硬化板を5℃/時間の昇温速度で1
500℃まで昇温し、このようにして得られた炭素板
を、実施例2と同様に機械加工し、磁気記録媒体用基板
を作製して、実施例2と同様の方法により物性の測定及
び記録再生物性評価を行った。結果を以下の表6及び表
7に示す。Comparative Example 3 The cured plate obtained in Example 1 was heated at a rate of 5 ° C./hour at a rate of 1
The temperature was raised to 500 ° C., and the carbon plate thus obtained was machined in the same manner as in Example 2 to prepare a substrate for a magnetic recording medium, and physical properties were measured and measured in the same manner as in Example 2. The recording / reproducing physical properties were evaluated. The results are shown in Tables 6 and 7 below.
【表6】 [Table 6]
【表7】 [Table 7]
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平5−347276(JP,A) 特開 平3−247504(JP,A) 特開 平2−152167(JP,A) 特開 昭62−234232(JP,A) 特開 昭64−72322(JP,A) 特開 平3−52116(JP,A) 特公 平3−11005(JP,B2) (58)調査した分野(Int.Cl.7,DB名) G11B 5/73 ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-5-347276 (JP, A) JP-A-3-247504 (JP, A) JP-A-2-152167 (JP, A) JP-A-62-167 234232 (JP, A) JP-A-64-72322 (JP, A) JP-A-3-52116 (JP, A) JP-B-3-11005 (JP, B2) (58) Fields investigated (Int. 7 , DB name) G11B 5/73
Claims (7)
造したガラス状炭素からなることを特徴とする磁気記録
媒体用基板。1. A substrate for a magnetic recording medium, comprising a glassy carbon produced using a polycarbodiimide resin as a raw material.
0g/cm3、気孔率が0〜0.019%である請求項
1に記載の磁気記録媒体用基板。2. A bulk density of 1.51 g / cm 3 to 1.7.
0 g / cm 3, a substrate for a magnetic recording medium according to claim 1 porosity of from 0 to 0.019%.
い請求項1に記載の磁気記録媒体用基板。3. The substrate for a magnetic recording medium according to claim 1, wherein pores of 0.1 μm or more do not exist on the surface.
ポリカルボジイミド樹脂よりなる組成物を適宜の形状に
成形し、次いで該成形物を炭素化した後、磁気記録媒体
用基板に加工することを特徴とする磁気記録媒体用基板
の製造方法。4. A magnetic recording method comprising: molding a polycarbodiimide resin or a composition mainly composed of a polycarbodiimide resin into an appropriate shape; carbonizing the molded product; and processing the resultant into a substrate for a magnetic recording medium. A method for manufacturing a medium substrate.
囲気中で行う請求項4に記載の磁気記録媒体用基板の製
造方法。5. The method for producing a substrate for a magnetic recording medium according to claim 4, wherein the carbonization of the molded product is performed in a vacuum or in an inert atmosphere.
0℃の温度範囲で行う請求項5に記載の磁気記録媒体用
基板の製造方法。6. The carbonization of the molded product is carried out at 1000 ° C. to 300 ° C.
The method for producing a substrate for a magnetic recording medium according to claim 5, which is performed in a temperature range of 0 ° C.
温速度で行う請求項6に記載の磁気記録媒体用基板の製
造方法。7. The method for producing a substrate for a magnetic recording medium according to claim 6, wherein the carbonization of the molded product is performed at a heating rate of 2 ° C./hour or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP06182095A JP3335262B2 (en) | 1994-02-28 | 1995-02-24 | Magnetic recording medium substrate and method of manufacturing the same |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6-54649 | 1994-02-28 | ||
| JP5464994 | 1994-02-28 | ||
| JP06182095A JP3335262B2 (en) | 1994-02-28 | 1995-02-24 | Magnetic recording medium substrate and method of manufacturing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH07287842A JPH07287842A (en) | 1995-10-31 |
| JP3335262B2 true JP3335262B2 (en) | 2002-10-15 |
Family
ID=26395443
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP06182095A Expired - Fee Related JP3335262B2 (en) | 1994-02-28 | 1995-02-24 | Magnetic recording medium substrate and method of manufacturing the same |
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| Country | Link |
|---|---|
| JP (1) | JP3335262B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10316893A (en) * | 1997-05-16 | 1998-12-02 | Tomoegawa Paper Co Ltd | Heat resistant powder coating |
-
1995
- 1995-02-24 JP JP06182095A patent/JP3335262B2/en not_active Expired - Fee Related
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| JPH07287842A (en) | 1995-10-31 |
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