Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JP3338757B2 - Deposition prevention plate for vacuum melting equipment - Google Patents
[go: Go Back, main page]

JP3338757B2 - Deposition prevention plate for vacuum melting equipment - Google Patents

Deposition prevention plate for vacuum melting equipment

Info

Publication number
JP3338757B2
JP3338757B2 JP01036197A JP1036197A JP3338757B2 JP 3338757 B2 JP3338757 B2 JP 3338757B2 JP 01036197 A JP01036197 A JP 01036197A JP 1036197 A JP1036197 A JP 1036197A JP 3338757 B2 JP3338757 B2 JP 3338757B2
Authority
JP
Japan
Prior art keywords
plate
vacuum
prevention plate
melting
deposition prevention
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP01036197A
Other languages
Japanese (ja)
Other versions
JPH10206035A (en
Inventor
兼次 安彦
等 河野
正徳 津田
泰弘 中井
賢人 中嶋
正信 原田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP01036197A priority Critical patent/JP3338757B2/en
Publication of JPH10206035A publication Critical patent/JPH10206035A/en
Application granted granted Critical
Publication of JP3338757B2 publication Critical patent/JP3338757B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/25Process efficiency

Landscapes

  • Physical Vapour Deposition (AREA)
  • Furnace Details (AREA)
  • Manufacture And Refinement Of Metals (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、真空溶解装置内に
架空支持される蒸着防止板に関し、とくに超高真空中で
高純度の金属・合金、例えば、鉄やその合金を精製する
際に、溶解時に発生する不純な蒸着物を捕捉するのに用
いる蒸着防止板を提案する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a deposition prevention plate which is supported overhead in a vacuum melting apparatus, and particularly to a method for purifying a high-purity metal or alloy, for example, iron or its alloy in an ultra-high vacuum. We propose a deposition prevention plate used to capture impure deposits generated during melting.

【0002】[0002]

【従来の技術】従来、金属の精製には、真空溶解法、浮
遊帯溶融法などが広く用いられており、これらはともに
電子ビームや高周波誘導エネルギー等を熱源とする方法
であり、特に後者の方法は溶融時に耐火物から不純物が
入るおそれがなく有利な方法として注目されている。
2. Description of the Related Art Conventionally, vacuum melting, floating zone melting and the like have been widely used for refining metals. Both of these methods use an electron beam or high-frequency induction energy as a heat source. The method is attracting attention as an advantageous method because there is no possibility of impurities entering from the refractory during melting.

【0003】その他に従来、図1に示すような、高真空
容器内に配設したるつぼ内被溶解金属を高周波誘導加熱
することにより、高純度の金属を精製するための真空溶
解装置がある。この装置は、真空容器1内にるつぼ2を
配設し、このるつぼ2のまわりに高周波誘導加熱用コイ
ル3を囲繞配置した構成を有し、前記コイルに通電する
ことにより、るつぼ2内被溶解金属を真空誘導加熱して
溶解するものである。
[0003] In addition, as shown in Fig. 1, there is a vacuum melting apparatus for purifying a high-purity metal by high-frequency induction heating of a metal to be melted in a crucible disposed in a high vacuum vessel as shown in Fig. 1. This apparatus has a configuration in which a crucible 2 is disposed in a vacuum vessel 1 and a high-frequency induction heating coil 3 is disposed around the crucible 2. The metal is melted by vacuum induction heating.

【0004】例えば、上記の装置によって、るつぼ2内
被溶解金属を加熱し真空溶解すると、溶融面からは被溶
解金属などの蒸気が発生し、真空容器1内面、および視
界確保のために設けた覗き窓4などに付着(蒸着)す
る。とくに覗き窓4への付着は、溶解中の対象物(被溶
解金属)の視野を遮ぎるという問題があり、また真空容
器1内面への蒸着は、溶解操業後の清掃に時間がかかる
という問題が起きる。このことを避けるため、一般に
は、るつぼ内溶融面の直上に蒸発物を遮蔽する蒸着防止
板5を設置するのが普通である。
[0004] For example, when the metal to be melted in the crucible 2 is heated and melted in vacuum by the above-described apparatus, vapor of the metal to be melted is generated from the melted surface, and is provided for securing the inner surface of the vacuum vessel 1 and the visibility. It adheres (deposits) to the viewing window 4 and the like. In particular, the adhesion to the viewing window 4 has a problem that the field of view of the melting target (metal to be melted) is obstructed, and the vapor deposition on the inner surface of the vacuum vessel 1 requires a long time for cleaning after the melting operation. Happens. In order to avoid this, it is common to install a deposition prevention plate 5 for shielding evaporants immediately above the melting surface in the crucible.

【0005】また、上記蒸着防止板5は、真空溶解時に
は、溶解中のるつぼ溶融面からの輻射熱およびコイル2
からの高周波誘導エネルギーのために、500 ℃程度に加
熱され、その結果として、板の表面よりさらなるガスの
放出が起こり、真空を乱す要因ともなっている。また、
この放出されたガスが溶融物にとりこまれ純度低下の原
因ともなった。
[0005] Further, during the vacuum melting, the vapor deposition preventing plate 5 radiates heat from the melting surface of the melting crucible and the coil 2.
Due to the high frequency induction energy from the plate, it is heated to about 500 ° C., and as a result, more gas is released from the surface of the plate, which also disturbs the vacuum. Also,
The released gas was taken into the melt and caused a decrease in purity.

【0006】[0006]

【発明が解決しようとする課題】従来装置では、上記蒸
着防止板5は、るつぼ2の直上にステンレス製円板を回
動する軸などの保持具6にて進退可能に架空保持し、る
つぼ2内の溶解状況を観察するときのみ、これを退避さ
せて覗き窓4から覗いて観察するようになっている。な
お、この蒸着防止板5は、溶解に先立って真空容器1を
ベーキング(脱ガス処理)する時、主として輻射熱によ
って加熱する結果、100 ℃程度に加熱される。
In the conventional apparatus, the deposition preventing plate 5 is held overhead by a holding tool 6 such as a rotating shaft of a stainless steel disc directly above the crucible 2 so as to be able to advance and retreat. Only when observing the state of dissolution in the inside, it is retracted and observed through the observation window 4. When the vacuum vessel 1 is baked (degassed) prior to melting, it is heated to about 100 ° C. as a result of being heated mainly by radiant heat.

【0007】しかしながら、実際の真空溶解時では、真
空容器1を超高真空(10-7〜10-11トール)にしている
こと、およびるつぼを高周波誘導加熱することから、る
つぼ2内溶融面からの輻射熱とコイル3による誘導加熱
の相乗作用によって500 ℃位に昇温する。従って、該蒸
着防止板 (SUS 304)に付着した水分やガス (N2, O2)あ
るいは清掃用エチルアルコールの分解ガス、さらにはそ
れらの反応ガスがこのときに発生することになる。その
結果、真空容器1内真空度の低下、溶解金属の純度の低
下が起こるのである。
However, during the actual vacuum melting, since the vacuum vessel 1 is kept at an ultra-high vacuum (10 -7 to 10 -11 Torr) and the crucible is heated by high frequency induction, the melting surface inside the crucible 2 is reduced. The temperature rises to about 500 ° C. by the synergistic action of the radiant heat of the coil 3 and the induction heating by the coil 3. Therefore, water and gas (N 2 , O 2 ) or decomposition gas of ethyl alcohol for cleaning attached to the deposition prevention plate (SUS 304), and their reaction gas are generated at this time. As a result, a reduction in the degree of vacuum in the vacuum vessel 1 and a reduction in the purity of the molten metal occur.

【0008】そこで上述した従来技術が抱えている問題
点を克明する技術の開発が必要となり、本発明に想到し
た。本発明の目的は、真空度の低下や発生不純ガスによ
る溶解金属の純度の低下がない蒸着防止板を提案するこ
とにある。
Therefore, it is necessary to develop a technique for overcoming the problems of the prior art described above, and arrived at the present invention. SUMMARY OF THE INVENTION An object of the present invention is to propose a deposition preventing plate in which the degree of vacuum does not decrease and the purity of a molten metal does not decrease due to generated impurity gas.

【0009】[0009]

【課題を解決するための手段】上掲の目的を実現するに
は、下記の要旨構成からなる蒸着防止板が有利であるこ
との結論に達して本発明を完成した。即ち、本発明は、
真空容器と、この容器内に配設される誘導溶解炉とから
主としてなる真空溶解装置の該誘導溶解炉直上に保持具
を介して進退可能に支持された蒸着防止板において、こ
の板が高い熱伝導率を有する金属板にて形成されると共
に、複数の鎖交磁束防止用スリットを有することを特徴
とする真空溶解装置の蒸着防止板である。本発明におい
て、板の表面または内部にベーキング用加熱手段をもう
けることが好ましい。また、本発明においては、ベーキ
ング用加熱手段を板の退避位置に配設してベーキングす
るように構成することが好ましい。
SUMMARY OF THE INVENTION The present invention has been completed by the conclusion that a vapor deposition preventing plate having the following gist configuration is advantageous for realizing the above object. That is, the present invention
In a deposition prevention plate which is supported so as to be able to advance and retreat via a holder directly above the induction melting furnace of a vacuum melting apparatus mainly including a vacuum container and an induction melting furnace disposed in the container, the plate has a high heat. An evaporation prevention plate for a vacuum melting apparatus, which is formed of a metal plate having conductivity and has a plurality of slits for preventing interlinkage magnetic flux. In the present invention, it is preferable to provide a heating means for baking on the surface or inside of the plate. Further, in the present invention, it is preferable that the baking heating means is arranged at the retreat position of the plate to perform baking.

【0010】[0010]

【発明の実施の形態】本発明において用いる真空溶解装
置は、図1に示すとおり、主として真空容器1と、その
内部に収容される誘導溶解炉、即ちるつぼ2とそのまわ
りに配設した誘導加熱用コイル3とで構成されたもので
あり、この真空容器1内のるつぼ2の直上の覗き窓4の
直下には、蒸着防止板5が進退可能に架空保持される。
即ち、真空容器1に回転可能に取付けた保持具6の下端
には、該蒸着防止板5が固定してあり、その蒸着防止板
5は前記保持具6の回転軸を介して旋回することによ
り、るつぼ2の直上に進み出たり退避位置まで退いたり
する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS As shown in FIG. 1, a vacuum melting apparatus used in the present invention mainly comprises a vacuum vessel 1, an induction melting furnace housed therein, that is, a crucible 2 and an induction heating apparatus arranged around the crucible. A vapor deposition preventing plate 5 is held overhead so as to be able to advance and retreat under the observation window 4 immediately above the crucible 2 in the vacuum vessel 1.
That is, the vapor deposition preventing plate 5 is fixed to the lower end of the holder 6 rotatably attached to the vacuum vessel 1, and the vapor deposition preventing plate 5 is rotated by the rotation axis of the holder 6. , Advance right above the crucible 2 or retreat to the retreat position.

【0011】つまり、この蒸着防止板5は、高周波誘導
溶解時、覗き窓4から観察するときを除いてるつぼ2の
直上に位置し、るつぼ2から蒸発するガスや被溶解物か
らの蒸発物質を遮蔽し、これらの飛散を防止するために
用いられる。一方、覗き窓4からるつぼ2内を観察する
ときは、上記保持具6を作動させることにより、退避位
置まで旋回退避させる。なお、この退避位置において、
該蒸着防止板5は、必要に応じ、後述するように分離配
置した加熱手段7と接して加熱されるように構成しても
よい。
That is, the vapor deposition preventing plate 5 is located immediately above the crucible 2 except when observing from the viewing window 4 during high-frequency induction melting, and prevents gas evaporated from the crucible 2 and vaporized substances from the substance to be dissolved. It is used to shield and prevent these from scattering. On the other hand, when observing the inside of the crucible 2 from the viewing window 4, the holder 6 is operated to be turned and retracted to the evacuation position. In this evacuation position,
If necessary, the deposition prevention plate 5 may be configured to be heated in contact with a separately arranged heating means 7 as described later.

【0012】一般に、上述した真空溶解装置において重
要なことは、真空容器1内雰囲気を超高真空状態に維持
することである。そのためには、上記蒸着防止板5から
のガスの放出や蒸発物の発生を極力抑えることが必要で
ある。そのためには、溶解操業に先立つ真空容器1内の
乾燥 (ベーキング) 時に、いわゆる真空誘導加熱時に予
想される最高温度以上の温度に加熱することにより、付
着水やガスを発生させて予め排出しておくことが必要で
ある。
In general, what is important in the above-described vacuum melting apparatus is to maintain the atmosphere in the vacuum vessel 1 in an ultra-high vacuum state. For this purpose, it is necessary to minimize the emission of gas from the deposition prevention plate 5 and the generation of evaporated substances. For this purpose, at the time of drying (baking) in the vacuum vessel 1 prior to the melting operation, by heating to a temperature higher than the maximum temperature expected during so-called vacuum induction heating, attached water and gas are generated and discharged in advance. It is necessary to put.

【0013】このような要請に応えられる蒸着防止板5
の構成について鋭意研究した結果、本発明では、溶解
加熱時にこの蒸着防止板5が上記高周波誘導加熱コイル
3によって誘導加熱されにくい構造にすること、および
真空容器1の乾燥ベーキング時になるべく高い温度、
たとえば、200 ℃以上に加熱して付着水やガスを完全に
放出しておくために加熱手段を設けることが有効である
との結論に達した。
An evaporation preventing plate 5 which can meet such a demand.
As a result of intensive research on the configuration of the present invention, in the present invention, the deposition prevention plate 5 has a structure that is hardly induction-heated by the high-frequency induction heating coil 3 during melting and heating, and a temperature as high as possible during dry baking of the vacuum vessel 1.
For example, it has been concluded that it is effective to provide a heating means in order to completely release attached water and gas by heating to 200 ° C. or more.

【0014】このような考え方の下に開発した本発明の
蒸着防止板5の好適実施例を図2に示す。この例は、円
形の板の半径方向に、少なくとも4個、好ましくは8個
程度の複数のスリット5aを入れることにより、鎖交磁
束による発熱を抑え、誘導加熱されにくい構造としたも
のである。また、蒸着防止板5を、ステンレス鋼などに
代えて熱伝導率の良好な、例えばアルミニウムや銅の如
き金属を素材とした場合に、冷却フィンのような作用を
伴って放熱を促進し、溶解加熱時のるつぼ2からの輻射
熱による昇温を抑制するという効果もある。
FIG. 2 shows a preferred embodiment of the deposition preventing plate 5 of the present invention developed under such a concept. In this example, at least four, and preferably about eight slits 5a are provided in the radial direction of a circular plate to suppress heat generation due to interlinkage magnetic flux and to make it difficult for induction heating. When the evaporation preventing plate 5 is made of a metal having good thermal conductivity, such as aluminum or copper, instead of stainless steel or the like, heat dissipation is promoted with the action of a cooling fin, and There is also an effect of suppressing temperature rise due to radiant heat from the crucible 2 during heating.

【0015】次に、付着水やガスの放出を促進するため
に、該蒸着防止板5の表面や内部表面に抵抗加熱式ヒー
ターの如き加熱手段7を直接にまたは間接的に配設す
る。前者の場合は、図2に示すように、該蒸着防止板5
にシーズヒーターなどを直接取付けた例であり、一方後
者の場合は、図1に示すように、該蒸着防止板5を保持
具6を介して退避させた位置において分離配置したヒー
ター7′にて、200 ℃以上に加熱し、ベーキングが終わ
ったらるつぼ2の直上に移す形式のものである。本発明
では、そのいずれの形式のものでも適用が可能である。
Next, a heating means 7 such as a resistance heating type heater is directly or indirectly provided on the surface or the inner surface of the deposition preventing plate 5 in order to promote the release of adhering water and gas. In the former case, as shown in FIG.
In the latter case, as shown in FIG. 1, a heater 7 'which is separated and arranged at a position where the vapor deposition preventing plate 5 is retracted via the holder 6, as shown in FIG. , Heated to 200 ° C. or more, and transferred to a position just above the crucible 2 when the baking is completed. In the present invention, any of these types can be applied.

【0016】[0016]

【発明の効果】以上説明したように、本発明において用
いられる蒸着防止板によれば、るつぼ内からの蒸発物を
効果的に遮蔽できると共に、溶解に先立ってガスの排出
が完全にできるから、真空容器内を超高真空に維持する
のに有効であり、ひいては高純度の金属を溶解精製する
ことができる。
As described above, according to the vapor deposition preventing plate used in the present invention, the evaporant from the crucible can be effectively shielded and the gas can be completely discharged prior to melting. This is effective for maintaining the inside of the vacuum vessel at an ultra-high vacuum, and thus enables high-purity metal to be dissolved and refined.

【図面の簡単な説明】[Brief description of the drawings]

【図1】真空溶解装置の略線図である。FIG. 1 is a schematic diagram of a vacuum melting apparatus.

【図2】本発明にかかる蒸着防止板の略線図である。FIG. 2 is a schematic diagram of a deposition prevention plate according to the present invention.

【符号の説明】[Explanation of symbols]

1 真空容器 2 るつぼ 3 誘導加熱用コイル 4 覗き窓 5 蒸着防止板 5a 鎖交磁束防止用スリット 6 支持具、 7 加熱手段 DESCRIPTION OF SYMBOLS 1 Vacuum container 2 Crucible 3 Induction heating coil 4 Viewing window 5 Deposition prevention plate 5a Slit for preventing interlinkage magnetic flux 6 Support, 7 Heating means

───────────────────────────────────────────────────── フロントページの続き (72)発明者 津田 正徳 三重県伊勢市竹ケ鼻町100番地 神鋼電 機株式会社伊勢製作所内 (72)発明者 中井 泰弘 三重県伊勢市竹ケ鼻町100番地 神鋼電 機株式会社伊勢製作所内 (72)発明者 中嶋 賢人 三重県伊勢市竹ケ鼻町100番地 神鋼電 機株式会社 伊勢製作所内 (72)発明者 原田 正信 東京都中央区日本橋3丁目12番2号 神 鋼電機株式会社内 (56)参考文献 特開 昭63−105969(JP,A) 特開 昭62−263935(JP,A) 特開 平10−110223(JP,A) 特開 平5−70932(JP,A) 特開 平5−70946(JP,A) 特開 平7−102374(JP,A) 実開 昭63−167167(JP,U) 実開 平4−25858(JP,U) 実公 平6−38112(JP,Y2) (58)調査した分野(Int.Cl.7,DB名) F27D 11/06 F27D 7/06 C22B 9/16 C23C 14/52 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Masanori Tsuda 100 Takegahana-cho, Ise-city, Mie Prefecture Inside Ise Seisakusho Co., Ltd. Inside Ise Works (72) Inventor Kento Nakajima 100 Takegahana-cho, Ise City, Mie Prefecture Inside Shinko Electric Machinery Co., Ltd. (56) References JP-A-63-105969 (JP, A) JP-A-62-263935 (JP, A) JP-A-10-110223 (JP, A) JP-A-5-70932 (JP, A) JP-A-5-70946 (JP, A) JP-A-7-102374 (JP, A) JP-A-63-167167 (JP, U) JP-A-4-25858 (JP, U) JP 6-38112 ( JP, Y2) (58) Field surveyed (Int.Cl. 7 , DB name) F27D 11/06 F27D 7/06 C22B 9/16 C23C 14/52

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 真空容器と、この容器内に配設される誘
導溶解炉とから主としてなる真空溶解装置の該誘導溶解
炉直上に保持具を介して進退可能に支持された蒸着防止
板において、この板が高い熱伝導率を有する金属板にて
形成されると共に、複数の鎖交磁束防止用スリットを有
することを特徴とする真空溶解装置の蒸着防止板。
1. A deposition prevention plate which is supported so as to be able to advance and retreat via a holder directly above the induction melting furnace of a vacuum melting apparatus mainly comprising a vacuum vessel and an induction melting furnace disposed in the vessel. A deposition prevention plate for a vacuum melting apparatus, wherein the plate is formed of a metal plate having a high thermal conductivity and has a plurality of interlinkage flux preventing slits.
【請求項2】 板の表面または内部にベーキング用加熱
手段を直接配設したことを特徴とする請求項1に記載の
蒸着防止板。
2. The deposition preventing plate according to claim 1, wherein a heating means for baking is directly arranged on the surface or inside of the plate.
【請求項3】 ベーキング用加熱手段を板の退避位置に
配設してベーキングするように構成されている請求項1
に記載の蒸着防止板。
3. The apparatus according to claim 1, wherein the baking heating means is arranged at a retracted position of the plate to perform baking.
2. The deposition prevention plate according to 1.
JP01036197A 1997-01-23 1997-01-23 Deposition prevention plate for vacuum melting equipment Expired - Fee Related JP3338757B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP01036197A JP3338757B2 (en) 1997-01-23 1997-01-23 Deposition prevention plate for vacuum melting equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP01036197A JP3338757B2 (en) 1997-01-23 1997-01-23 Deposition prevention plate for vacuum melting equipment

Publications (2)

Publication Number Publication Date
JPH10206035A JPH10206035A (en) 1998-08-07
JP3338757B2 true JP3338757B2 (en) 2002-10-28

Family

ID=11748036

Family Applications (1)

Application Number Title Priority Date Filing Date
JP01036197A Expired - Fee Related JP3338757B2 (en) 1997-01-23 1997-01-23 Deposition prevention plate for vacuum melting equipment

Country Status (1)

Country Link
JP (1) JP3338757B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20250144976A1 (en) * 2023-11-02 2025-05-08 Fca Us Llc Vehicle having auxiliary fan to improve hvac performance

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001351823A (en) * 2000-06-08 2001-12-21 Mitsubishi Materials Corp Material for evaporation, method for producing material for evaporation and method for evaporation
CN103740949B (en) * 2013-12-31 2015-02-04 深圳市华星光电技术有限公司 Device and method for pre-treating magnesium metal
JP6668708B2 (en) * 2015-04-13 2020-03-18 富士電機機器制御株式会社 Heat treatment equipment
CN105695763B (en) * 2016-04-11 2017-08-25 湖南荣鹏环保科技股份有限公司 A kind of silver-colored collection device of improved vacuum drying oven

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20250144976A1 (en) * 2023-11-02 2025-05-08 Fca Us Llc Vehicle having auxiliary fan to improve hvac performance

Also Published As

Publication number Publication date
JPH10206035A (en) 1998-08-07

Similar Documents

Publication Publication Date Title
JP5690586B2 (en) Melting furnace including wire discharge ion plasma electron emitter
CN101210290B (en) Articles for use with highly reactive alloys
CA2094132C (en) Vapour deposition apparatus and method
JP3801418B2 (en) Surface treatment method
US3230110A (en) Method of forming carbon vapor barrier
JP4775911B2 (en) Method for producing aluminum-lithium alloy target and aluminum-lithium alloy target
JPH11108556A (en) Straight furnace floor-type furnace for refining titanium
JPH0793116B2 (en) Anode of X-ray tube, method for stabilizing performance of rotary target type X-ray tube, and method for substantially suppressing formation of carbon monoxide in X-ray tube
JP3338757B2 (en) Deposition prevention plate for vacuum melting equipment
WO1990012485A2 (en) Multiple source evaporation for alloy production
JP2001335854A (en) Apparatus and method for refining high purity metal
UA21807C2 (en) Method for high-speed vacuum evaporation of metals and alloys with the use of intermediary bath
RU2287023C1 (en) Method of electron-beam zone melting of metal and device for realization of this method
JPH04504283A (en) Medium pressure electron beam furnace
JP3076306B2 (en) Condensate retention equipment for low temperature hearth refining.
US5534313A (en) Induction heating of diffusion coatings
JPH0693429A (en) Crucible for vacuum deposition equipment
JPH0673543A (en) Continuous vacuum deposition equipment
JPS60152670A (en) Vapor source using high frequency induction heating
JPH0225987B2 (en)
JPH11189872A (en) Formation of coating of base material by condensation
JPH0593263A (en) Hearth liner and deposition method
Thomas New technique for producing thin boron films
KR100226891B1 (en) Resistant heating evaporation source for reactive substance evaporation and its manufacturing method
JPS5855249Y2 (en) Water-cooled copper crucible equipment

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080809

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090809

Year of fee payment: 7

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100809

Year of fee payment: 8

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100809

Year of fee payment: 8

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100809

Year of fee payment: 8

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100809

Year of fee payment: 8

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110809

Year of fee payment: 9

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120809

Year of fee payment: 10

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120809

Year of fee payment: 10

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130809

Year of fee payment: 11

LAPS Cancellation because of no payment of annual fees