JP3340726B2 - Flexible printed circuit board plating equipment - Google Patents
Flexible printed circuit board plating equipmentInfo
- Publication number
- JP3340726B2 JP3340726B2 JP2001030754A JP2001030754A JP3340726B2 JP 3340726 B2 JP3340726 B2 JP 3340726B2 JP 2001030754 A JP2001030754 A JP 2001030754A JP 2001030754 A JP2001030754 A JP 2001030754A JP 3340726 B2 JP3340726 B2 JP 3340726B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- plating
- jig
- copper
- basket
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Chemically Coating (AREA)
- Manufacturing Of Printed Wiring (AREA)
Description
【0001】[0001]
【発明の属する技術分野】本発明は、薄く屈曲性に優
れ、硬質プリント基板間の接続などの配線用として非常
に有用なフレキシブルプリント基板(以下、FPC(F
lexible Printed Circuit))
のめっきを行う、特に、FPCにおける貫通穴であるス
ルーホール内壁部のめっきを行うためのめっき装置に関
するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a flexible printed circuit board (hereinafter referred to as FPC (FPC)) which is thin and has excellent flexibility and is very useful for wiring such as connection between rigid printed circuit boards.
flexible Printed Circuit))
More particularly, the present invention relates to a plating apparatus for plating an inner wall portion of a through hole which is a through hole in an FPC.
【0002】[0002]
【従来の技術】FPCは、ポリエステル、ポリイミド、
ポリアミド紙基材エポキシ樹脂、ガラス布基材エポキシ
樹脂、ガラス布基材BTレジンなどをベースフィルムと
して用い、このベースフィルムの片面あるいは両面に銅
箔、特に可撓性の高い圧延銅箔、特殊例としてアルミニ
ウム箔、ステンレス箔などの導体を積層して、表面を絶
縁フィルムまたは液状レジストなどで被覆したもので、
厚さ数10〜数100μmの薄層である。従って、FP
Cは屈曲性に優れ、電卓、カメラ、プリンターをはじめ
として民生機器、産業機器を問わず、可動部や狭い空間
での配線用として採用されている。2. Description of the Related Art FPC is made of polyester, polyimide,
Polyamide paper-based epoxy resin, glass cloth-based epoxy resin, glass cloth-based BT resin, etc. are used as the base film, and one or both sides of the base film are copper foils, especially highly flexible rolled copper foils, special examples. As a conductor laminated such as aluminum foil, stainless steel foil, the surface of which is covered with an insulating film or liquid resist,
It is a thin layer having a thickness of several tens to several hundreds of micrometers. Therefore, FP
C has excellent flexibility and is used for wiring in movable parts and narrow spaces regardless of consumer equipment and industrial equipment including calculators, cameras and printers.
【0003】両面に銅箔の導体層を有するFPCの製造
工程においては、銅箔を前記絶縁材料のベースフィルム
に積層した基板の所要箇所に、ドリリングマシーンなど
によりスルーホールを穿ち、このスルーホールの内壁部
に銅のみ、あるいははんだとの二重構造のめっきを施す
スルーホールめっきを行い、内外層回路相互間の導通を
可能とする工程がある。尚、非貫通穴であるブラインド
ビアホール内壁部へのめっきも同様のめっき工程で行わ
れる。In the manufacturing process of an FPC having a copper foil conductor layer on both sides, a through hole is drilled at a required portion of a substrate having a copper foil laminated on a base film of the insulating material by a drilling machine or the like. There is a step of performing through-hole plating for plating the inner wall portion with only copper or a double structure with solder to enable conduction between the inner and outer layer circuits. The plating on the inner wall of the blind via hole, which is a non-through hole, is also performed in the same plating step.
【0004】従来、前記スルーホールめっきは、図7に
示す銅などの金属枠部71に固定用のビスとナット72
を備えた基板取付部73を有する金属枠治具70など
で、30cm×50cm程度の大きさの紙のようにペラ
ペラな基板21を伸張した状態で固定し、基板21を固
定した金属枠治具70ごと移動しながら、無電解銅めっ
きと電解銅めっきを連続して行うことにより成される。
この時の作業には、1万m2B/月のラインでは、1ラ
インにつき10〜15人の作業者を必要としている。Conventionally, the through-hole plating is performed by fixing screws and nuts 72 to a metal frame 71 such as copper shown in FIG.
A metal frame jig 70 having a substrate mounting portion 73 provided with a metal frame jig and the like, in which the flaky substrate 21 is stretched and fixed like a paper having a size of about 30 cm × 50 cm, and the substrate 21 is fixed. This is achieved by continuously performing electroless copper plating and electrolytic copper plating while moving the entire 70.
At this time, the line of 10,000 m 2 B / month requires 10 to 15 workers per line.
【0005】無電解銅めっき工程では、基板21を固定
した金属枠治具70ごと、例えば、整面及び表面洗浄
液、ソフトエッチング液、酸洗液、前処理液、キャタリ
スト、アクセラレータ、無電解銅液を容れた各液槽に順
に浸漬し、基板21の貫通穴であるスルーホールにおけ
る不導体であるベースフィルムの内壁部表面に、化学還
元反応で銅を厚さ0.5μm程析出させる。この際、ベ
ースフィルム表面上に析出した銅がベースフィルム両側
の銅箔の内壁部に接触し、スルーホール内壁部に導電性
が付与される。[0005] In the electroless copper plating step, the entire metal frame jig 70 to which the substrate 21 is fixed, for example, a leveling and surface cleaning solution, a soft etching solution, an acid cleaning solution, a pretreatment solution, a catalyst, an accelerator, an electroless copper The liquid is sequentially immersed in each liquid tank, and copper is deposited by a chemical reduction reaction to a thickness of about 0.5 μm on the inner wall surface of the base film which is a non-conductor in the through hole which is a through hole of the substrate 21. At this time, the copper deposited on the surface of the base film contacts the inner walls of the copper foil on both sides of the base film, and the inner walls of the through holes are given conductivity.
【0006】その後、電解銅めっき工程において、例え
ば、硫酸銅、硫酸、微量の塩素イオン及び光沢剤などか
らなる銅めっき液及び陽極に銅板を用い、銅イオン源と
して硫酸銅(CuSO4・5H2O)を用いる酸性浴の
硫酸銅めっきにより、導電性が付与されたスルーホール
の内壁部に銅を析出させ、該スルーホール内壁部全体に
電気回路としての機能が保証できる厚さ、例えば、15
〜20μmの銅を成長させて、基板両面の銅箔が十分に
導通する状態にする。電解銅めっき後の洗浄後は、基板
21を乾燥させる。[0006] Thereafter, the electrolytic copper plating process, for example, copper sulfate, sulfuric acid, using a copper plate to the copper plating solution and an anode made of such as chlorine ion and brighteners traces of copper sulfate as a copper ion source (CuSO 4 · 5H 2 Copper is deposited on the inner wall of the through hole provided with conductivity by copper sulfate plating of an acidic bath using O), and the thickness which can guarantee the function as an electric circuit over the entire inner wall of the through hole, for example, 15
By growing copper of 銅 20 μm, the copper foil on both sides of the substrate is brought into a sufficiently conductive state. After cleaning after the electrolytic copper plating, the substrate 21 is dried.
【0007】尚、めっき液を選択すれば、無電解銅めっ
きのみによりベースフィルム表面上に膜厚15〜20μ
mの銅皮膜を形成することは可能であるが、析出する銅
の物性が悪い、コストが高い、生産性が悪いなどの理由
により、ほとんど実用化されていない。If a plating solution is selected, a film thickness of 15 to 20 μm is formed on the base film surface only by electroless copper plating.
Although it is possible to form a copper film having a thickness of m, it has hardly been put to practical use because of the poor physical properties of the deposited copper, high cost, and poor productivity.
【0008】以上示したように、FPCの製造における
スルーホールめっき工程で使用する従来のめっき装置
は、図7に示すような金属枠治具70及び無電解銅めっ
き工程と電解銅めっき工程に用いる各液槽を備えてい
る。As described above, the conventional plating apparatus used in the through-hole plating step in the production of the FPC uses the metal frame jig 70 as shown in FIG. 7 and the electroless copper plating step and the electrolytic copper plating step. Each liquid tank is provided.
【0009】[0009]
【発明が解決しようとする課題】しかしながら、前記従
来のスルーホールめっき工程で用いためっき装置では、
金属枠治具70に基板21を取り付けたまま無電解銅め
っきと電解銅めっきを行い、電解銅めっきでは金属枠治
具70ごと基板21が陰極になるので、電解銅めっきで
ある硫酸銅めっきを行うごとに、金属枠治具70の金属
枠部71及び基板取付部73等にも銅が析出して次第に
その析出した銅の厚さが厚くなる。従って、金属枠治具
70の基板取付部73にビスとナット72で固定した基
板21に流れる電流値が変化するために、基板21にめ
っきされる銅の膜厚が変化したり、膜厚が不均一になっ
たり、基板取付部73における固定用のビスとナット7
2が回らなくなるなどの不具合が発生し、めっき工程で
金属枠治具70を30回程使用したら新しい金属枠治具
に交換する必要があるという問題点があった。However, in the plating apparatus used in the conventional through-hole plating process,
Electroless copper plating and electrolytic copper plating are performed while the substrate 21 is mounted on the metal frame jig 70. In the electrolytic copper plating, the substrate 21 together with the metal frame jig 70 becomes a cathode. Each time the process is performed, copper is deposited on the metal frame portion 71 of the metal frame jig 70, the substrate mounting portion 73, and the like, and the thickness of the deposited copper gradually increases. Therefore, the current flowing through the substrate 21 fixed to the substrate mounting portion 73 of the metal frame jig 70 with the screw and the nut 72 changes, so that the thickness of the copper plated on the substrate 21 changes or Screws and nuts 7 for fixing in the board mounting portion 73 may be uneven.
The metal frame jig 70 is used for about 30 times in the plating process, and it is necessary to replace the metal frame jig with a new metal frame jig.
【0010】また、前記問題点を解決するためのめっき
装置として、前記金属枠治具70を用いた無電解銅めっ
き工程後の電解銅めっき工程において、基板と電気的接
触をとるため及び基板を固定するための複数箇所に設け
られた小さな金属接点と外部電源に接続される電極以外
に合成樹脂製の枠に金属部が露出していない樹脂枠治具
を用い、樹脂枠治具の前記接点には殆ど銅が析出しない
ために、樹脂枠治具を物理的に壊れるまで使用できるよ
うにしためっき装置を用いることが考えられる。[0010] Further, as a plating apparatus for solving the above-mentioned problems, in the electrolytic copper plating step after the electroless copper plating step using the metal frame jig 70, electrical contact with the substrate is made. In addition to small metal contacts provided at a plurality of locations for fixing and electrodes connected to an external power supply, a resin frame jig in which a metal portion is not exposed in a synthetic resin frame is used, and the contacts of the resin frame jig are used. Since almost no copper is precipitated, it is conceivable to use a plating apparatus that can be used until the resin frame jig is physically broken.
【0011】しかしながら、電解銅めっき工程で前記樹
脂枠治具を用いるとしても、その前工程の無電解銅めっ
き工程で使用する金属枠治具70では、基板21をビス
とナット72を用いた基板取付部73で固定しているた
め、作業者がゴム手袋あるいはビニール製手袋をした手
で無電解銅めっき後の濡れた基板21を金属枠治具70
から外すのに手間が掛かり、作業性が悪い。However, even if the resin frame jig is used in the electrolytic copper plating step, the metal frame jig 70 used in the preceding electroless copper plating step uses the Since it is fixed by the mounting portion 73, the worker holds the wet substrate 21 after electroless copper plating with a metal frame jig 70 by hand wearing rubber gloves or vinyl gloves.
It takes time and effort to remove it from, and workability is poor.
【0012】そこで、無電解銅めっき後に、前記金属枠
治具70に基板21を取り付けたまま基板21を乾燥す
れば、金属枠治具70からの基板21の取り外しにゴム
手袋などを使用する必要がなく、ナイロンあるいは綿の
手袋で基板21の取り外し作業ができるので、作業性は
良くなる。しかし、無電解銅めっき後に、金属枠治具7
0に基板21を取り付けたまま乾燥すると、基板21に
金属枠治具70の基板取付部73の跡が染みとして残る
ので、外観不良となる。Therefore, if the substrate 21 is dried after the electroless copper plating while the substrate 21 is attached to the metal frame jig 70, it is necessary to use rubber gloves or the like to remove the substrate 21 from the metal frame jig 70. Since the work of removing the substrate 21 can be performed with nylon or cotton gloves, the workability is improved. However, after the electroless copper plating, the metal frame jig 7
When the substrate 21 is dried with the substrate 21 attached thereto, the trace of the substrate attaching portion 73 of the metal frame jig 70 remains on the substrate 21 as a stain, resulting in poor appearance.
【0013】また、前記樹脂枠治具に基板を固定したま
ま無電解銅めっきと電解銅めっきを行えば、前記のよう
な作業性が悪い問題は回避できるが、樹脂枠治具は主要
部が不導体であるので、無電解銅めっきにより樹脂枠治
具の合成樹脂部に銅が析出するために、その後の電解銅
めっきにおいて前記金属枠治具70を使用した場合と同
様の不具合が発生するので、樹脂枠治具を用いて無電解
銅めっきを行うことはできない。If the electroless copper plating and the electrolytic copper plating are performed while the substrate is fixed to the resin frame jig, the problem of poor workability as described above can be avoided. Since it is a non-conductor, copper is deposited on the synthetic resin portion of the resin frame jig by electroless copper plating, so that the same problem occurs when the metal frame jig 70 is used in the subsequent electrolytic copper plating. Therefore, electroless copper plating cannot be performed using a resin frame jig.
【0014】また、スルーホールめっきの生産性を上げ
るために、前記基板を複数枚収容できるカゴに入れ、各
基板を横棒で仕切って基板どうしが接触しないようにし
て、複数枚同時に無電解銅めっき処理を行う方法が考え
られる。しかし、基板が紙のようにペラペラなため、カ
ゴに基板同士が接触しないようにして収容するのが困難
であるので、複数枚の基板を同時に処理することはでき
ず、基板の収容に前記金属枠治具70を使用せざるを得
ない。In order to increase the productivity of through-hole plating, a plurality of the substrates are put in a basket capable of accommodating a plurality of the substrates, and the substrates are separated by a horizontal bar so that the substrates do not come into contact with each other. A method of performing a plating process is considered. However, since the substrates are flaky like paper, it is difficult to accommodate the substrates in a basket so that the substrates do not come into contact with each other.Therefore, a plurality of substrates cannot be processed at the same time. The frame jig 70 must be used.
【0015】本発明は前記問題点を解決するためになさ
れたもので、無電解めっきにおいて一度に大量の枚数の
基板を処理でき、めっき後の基板に外観不良が無く、基
板を伸張して固定するための治具の交換回数を大幅に減
らして該治具のコストの低減を図ることができ、且つ作
業性が良いフレキシブルプリント基板のめっき装置を提
供することである。The present invention has been made in order to solve the above-mentioned problems, and a large number of substrates can be processed at a time in electroless plating. It is an object of the present invention to provide a plating apparatus for a flexible printed circuit board, which can reduce the number of times the jig needs to be replaced to greatly reduce the cost of the jig and has good workability.
【0016】[0016]
【課題を解決するための手段】本発明は、フレキシブル
プリント基板のめっきに用いる装置であって、前記基板
を挟持して伸張して固定する取付部材を有する枠部を備
えた導体の治具と、前記導体の治具を収容するカゴと、
前記カゴごと前記基板の無電解めっきを行う処理槽と、
前記カゴを懸架して該カゴに収容された前記導体の治具
に衝撃を与える機構を備えた乾燥炉と、前記基板を固定
する主要部が不導体の治具と、前記主要部が不導体の治
具ごと前記基板の電解めっきを行う処理槽とを備えたも
のである。SUMMARY OF THE INVENTION The present invention relates to an apparatus used for plating a flexible printed circuit board, comprising: a conductor jig having a frame portion having a mounting member for holding, extending and fixing the board; A basket for accommodating the conductor jig;
A processing tank for performing electroless plating of the substrate together with the basket,
A drying oven having a mechanism for suspending the basket and applying an impact to the jig of the conductor housed in the basket, a jig in which a main part for fixing the substrate is non-conductive, and a jig in which the main part is non-conductive And a treatment tank for performing electroplating of the substrate together with the jig.
【0017】また、前記導体の治具に衝撃を与える機構
が、前記カゴを懸架する懸架部材を支持し、該懸架部材
の両端部のそれぞれを交互に上昇させて自然落下により
下降させる機構であるものでもよい。Further, the mechanism for applying an impact to the jig of the conductor is a mechanism for supporting a suspension member for suspending the cage, and alternately raising and lowering both ends of the suspension member by natural fall. It may be something.
【0018】[0018]
【発明の実施の形態】以下、図面等を参照して、本発明
の一実施形態について説明する。図1は、本発明による
フレキシブルプリント基板のめっき装置の実施形態を示
す概略図である。図2は、図1における導体の治具を示
し、(a)は正面図、(b)は側面図である。図3は、
図1における導体の治具を収容したカゴを示す概略斜視
図である。図4は、図1における乾燥炉において懸架部
材の左端部を上昇させたところを示す断面概略図であ
る。図5は、図1における主要部が不導体の治具を示
し、(a)は展開して示した正面図、(b)は側面図で
ある。An embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a schematic diagram showing an embodiment of a plating apparatus for a flexible printed board according to the present invention. 2A and 2B show a conductor jig in FIG. 1, wherein FIG. 2A is a front view and FIG. 2B is a side view. FIG.
It is a schematic perspective view which shows the basket which accommodated the jig of the conductor in FIG. FIG. 4 is a schematic cross-sectional view showing a state where the left end of the suspension member is raised in the drying furnace in FIG. 1. 5A and 5B show a jig in which the main part in FIG. 1 is a non-conductor. FIG. 5A is a front view in which the jig is developed, and FIG. 5B is a side view.
【0019】図1〜図5に示すように、本発明の実施形
態のフレキシブルプリント基板(以下、FPC)のめっ
き装置10は、図6に示す不導体であるポリイミドで形
成されたベースフィルム61に金属箔、この場合は両面
に銅箔62a、62b、を積層した基板21のめっき、
特に、スルーホールめっきに用いる装置であり、基板2
1を複数箇所、例えば4箇所で挟持してばね24で伸張
して固定する取付部材22a、22b、22c、22d
を有する枠部23を備えた導体の治具であるステンレス
枠治具20と、ステンレス枠治具20を複数個、例え
ば、10個収容するステンレス製のカゴ30と、カゴ3
0ごと基板21の無電解めっきを行う処理槽11と、カ
ゴ30を懸架してカゴ30に収容されたステンレス枠治
具20に衝撃を与える機構である上下動機構41を備え
た乾燥炉40と、基板21を固定する主要部が不導体の
治具である樹脂枠治具50と、樹脂枠治具50ごと基板
21の電解めっきを行う処理槽13とを備えたものであ
る。As shown in FIGS. 1 to 5, a plating apparatus 10 for a flexible printed circuit board (hereinafter, referred to as an FPC) according to an embodiment of the present invention employs a base film 61 made of a non-conductive polyimide shown in FIG. Plating of a substrate 21 having a metal foil, in this case, copper foils 62a, 62b laminated on both sides,
In particular, it is an apparatus used for through-hole plating,
Attachment members 22a, 22b, 22c, and 22d which hold and hold 1 at a plurality of locations, for example, four locations, and extend and fix with springs 24.
Frame jig 20 which is a conductor jig provided with a frame portion 23 having: a stainless steel cage 30 for accommodating a plurality of, for example, ten stainless frame jigs 20, and a cage 3
A treatment tank 11 for performing electroless plating of the substrate 21 for every 0; a drying furnace 40 provided with a vertical movement mechanism 41 which is a mechanism for suspending the basket 30 and shocking the stainless steel frame jig 20 accommodated in the basket 30; A resin frame jig 50 whose main part to fix the substrate 21 is a nonconductive jig, and a processing tank 13 for electrolytic plating of the substrate 21 together with the resin frame jig 50.
【0020】尚、FPCのめっき装置10は、その他に
無電解めっき後の乾燥処理後に一時基板21を保管する
ための保管庫12と電解めっき後の乾燥処理後に基板を
保管するための保管庫14とを備えている。尚、保管庫
12及び/又は保管庫14は無くてもよい。また、後処
理液槽及び乾燥炉13cは、乾燥炉が無い形態でもよ
く、その場合は、電解めっきの後処理後に樹脂枠治具5
0から基板21を外して基板21を自然乾燥させる。も
しくは、基板21のみを別途乾燥機で乾燥させる。The FPC plating apparatus 10 has a storage 12 for temporarily storing the substrate 21 after the drying process after the electroless plating and a storage 14 for storing the substrate after the drying process after the electroplating. And Note that the storage 12 and / or the storage 14 may not be provided. In addition, the post-treatment liquid tank and the drying furnace 13c may be in a form without a drying furnace.
The substrate 21 is removed from 0 and the substrate 21 is dried naturally. Alternatively, only the substrate 21 is separately dried by a dryer.
【0021】また、FPCのめっき装置10には、カゴ
30を無電解めっきを行う処理槽11及び乾燥炉40上
に搬送、無電解めっきを行う処理槽11及び乾燥炉40
内へ下降及び無電解めっきを行う処理槽11及び乾燥炉
40から上昇させる搬送装置15が備えられている。搬
送装置15により、例えば、カゴ30を3個懸架した懸
架部材46aを吊り下げて搬送等を行う。In the FPC plating apparatus 10, the basket 30 is transported onto a treatment tank 11 for performing electroless plating and a drying furnace 40, and the treatment tank 11 for performing electroless plating and a drying furnace 40.
There is provided a processing tank 11 for lowering the inside and electroless plating, and a transfer device 15 for raising the processing tank 11 from the drying furnace 40. For example, the transport device 15 suspends and suspends a suspension member 46a in which three cages 30 are suspended.
【0022】更に、基板21を固定した樹脂枠治具50
を電解めっきを行う処理槽13上に搬送、電解めっきを
行う処理槽13内へ下降及び電解めっきを行う処理槽1
3から上昇させる搬送装置16が備えられている。Further, a resin frame jig 50 to which the substrate 21 is fixed
Is transported onto a processing tank 13 for performing electrolytic plating, lowered into the processing tank 13 for performing electrolytic plating, and a processing tank 1 for performing electrolytic plating.
A transport device 16 is provided for ascending from 3.
【0023】尚、搬送装置15、16は、必要に応じた
機能を有する形態で設置されていれば良く、また、搬送
装置15及び/又は搬送装置16は無くても良い。ま
た、カゴ30が無い形態で、ステンレス枠治具20を搬
送装置15に直接取り付ける形態でもよく、また、樹脂
枠治具50を複数個収容できる電解めっき用カゴを用い
る形態でもよい。図1中、15a、15bと15cはそ
れぞれカゴ30の上昇方向、下降方向と搬送方向、16
a、16bと16cはそれぞれ樹脂枠治具50の上昇方
向、下降方向と搬送方向である。The transfer devices 15 and 16 need only be installed in a form having functions as required, and the transfer device 15 and / or the transfer device 16 may not be provided. Alternatively, the stainless steel frame jig 20 may be directly attached to the transfer device 15 without the cage 30, or an electrolytic plating cage capable of accommodating a plurality of resin frame jigs 50 may be used. In FIG. 1, 15a, 15b and 15c denote the ascending direction, descending direction and transport direction of the basket 30, respectively.
Reference numerals a, 16b, and 16c denote an ascending direction, a descending direction, and a transport direction of the resin frame jig 50, respectively.
【0024】ステンレス枠治具20は、図2に示すよう
に、枠部23の一部である横枠25に取付部材22a、
22bが設けられ、枠部23の側枠にガイドされて移動
可能なガイド部26に補助枠部27が固定され、補助枠
部27に取付部材22c、22dが設けられ、補助枠部
27にばね24が取り付けられたものである。尚、前記
ばね24は、基板21を伸張できる部材であればよく、
その取り付け個数は2個が好ましいが、その他の個数で
もよいし、また、ばね24は補助枠部27及び/又は枠
部23の下枠に固定されていてもよい。As shown in FIG. 2, the stainless steel frame jig 20 has a mounting member 22a,
The auxiliary frame 27 is fixed to a guide 26 movable by being guided by a side frame of the frame 23. The auxiliary frame 27 is provided with mounting members 22c and 22d. 24 is attached. The spring 24 may be any member that can extend the substrate 21.
The number of attachments is preferably two, but other numbers may be used, and the spring 24 may be fixed to the auxiliary frame 27 and / or the lower frame of the frame 23.
【0025】取付部材22a、22b、22c、22d
は、基板21を短線状の小接触面積で挟持する挟持部を
有し、前記挟持部はばねで付勢されて基板21を挟持し
ている。従って、取付部22a、22b、22c、22
dに取り付けられた基板21は容易に外れないが、取り
外し用のレバーなどの操作により基板21を容易に外す
ことができる。Mounting members 22a, 22b, 22c, 22d
Has a holding portion for holding the substrate 21 with a short linear contact area, and the holding portion is biased by a spring to hold the substrate 21. Therefore, the mounting portions 22a, 22b, 22c, 22
Although the board 21 attached to d does not easily come off, the board 21 can be easily taken off by operating a lever or the like for removal.
【0026】また、ばね24により取付部材22a、2
2b、22c、22dに固定された基板21を引っ張っ
て伸張している。尚、ガイド部26には固定用部材が備
えられており、基板21をばね24により伸張した後に
固定用部材によりガイド部26を枠部23に固定するこ
とができるので、各処理槽において基板21が揺動され
ても基板21がずれたり弛んだりすることがない。前記
固定用部材としては、例えば、ガイド部26にビスが備
えられ、ガイド部26をガイドする枠部23に前記ビス
が螺合するネジ孔が設けられたものなど、ガイド部26
を枠部23に固定できるものであればよい。Further, the mounting members 22a,
The substrate 21 fixed to 2b, 22c, 22d is pulled and extended. The guide portion 26 is provided with a fixing member, and after the substrate 21 is extended by the spring 24, the guide portion 26 can be fixed to the frame portion 23 by the fixing member. The substrate 21 is not displaced or slackened even if is swung. As the fixing member, for example, a guide portion 26 is provided with a screw, and a frame portion 23 for guiding the guide portion 26 is provided with a screw hole into which the screw is screwed.
Can be fixed to the frame portion 23.
【0027】ステンレス枠治具20は、基板21を小接
触面積で挟持するので、その部分には無電解銅めっき後
の後処理である洗浄等の液が僅かしか残らないので、前
記残液は乾燥炉40で完全に乾燥され、基板21に染み
による外観不良が発生しない。尚、ステンレス枠治具2
0は、前記のような基板21の取付部材を有し、基板2
1を伸張して固定できる構造のものであればよく、ま
た、ステンレス以外の各種処理液に対して耐性のある導
体で少なくとも前記処理液に接触する部分が形成されて
いればよく、更に、主要部が前記導体で形成されている
ものでもよい。Since the stainless steel frame jig 20 sandwiches the substrate 21 with a small contact area, only a small amount of liquid such as cleaning which is post-treatment after electroless copper plating remains in that portion. The substrate 21 is completely dried in the drying furnace 40, and the appearance defect due to the stain on the substrate 21 does not occur. In addition, stainless steel frame jig 2
0 has a mounting member for the substrate 21 as described above,
1 can be used as long as it is a structure that can be extended and fixed, and it is sufficient that at least a portion that is in contact with the processing liquid is formed of a conductor that is resistant to various processing liquids other than stainless steel. The part may be formed of the conductor.
【0028】カゴ30は、図3に示すように、ステンレ
スで形成されており、基板21を固定したステンレス枠
治具20の上下端部を固定具31a、31b、32a、
32bに形成された切り込みで受けて固定する。固定具
31a、31bはカゴ30の底部に固定されており、固
定具32a、32bは取り外し自在で、ステンレス枠治
具20を固定する時はカゴ30の横枠部33に固定され
る。固定具31a、31b、32a、32bにより、隣
接する基板21同士を接触させることなく、10個のス
テンレス枠治具20をカゴ30に固定収容できる。隣接
するステンレス枠治具20の間の距離は固定具31a、
31b、32a、32bにより調整可能であり、20m
m程度が好ましく、この距離であれば無電解めっき処理
に問題がない。As shown in FIG. 3, the basket 30 is formed of stainless steel, and the upper and lower ends of the stainless steel frame jig 20 to which the substrate 21 is fixed are fixed to fixtures 31a, 31b, 32a,
It is received and fixed by the cut formed in 32b. The fixtures 31a and 31b are fixed to the bottom of the basket 30, and the fixtures 32a and 32b are detachable. When the stainless steel frame jig 20 is fixed, it is fixed to the horizontal frame 33 of the basket 30. The fixtures 31a, 31b, 32a, and 32b allow the ten stainless steel frame jigs 20 to be fixedly accommodated in the basket 30 without bringing the adjacent substrates 21 into contact with each other. The distance between the adjacent stainless steel frame jigs 20 is the fixture 31a,
Adjustable by 31b, 32a, 32b, 20m
m is preferable, and there is no problem in the electroless plating treatment at this distance.
【0029】カゴ30の上部には取手34が取り付けら
れており、この取手34でカゴ30を懸架部46aに懸
架する。尚、取手34は、懸架部46aに取り付け及び
取り外しが容易で、且つ乾燥炉40での乾燥処理中に懸
架部46aから外れ難い構造であればよい。また、取手
34が懸架部46a上を図4中で左右に滑らないよう
に、取手34及び/又は懸架部46aに滑り止め部材を
備えていてもよい。A handle 34 is attached to the upper part of the basket 30, and the basket 30 is suspended on the suspension portion 46a by the handle 34. Note that the handle 34 may have a structure that can be easily attached to and detached from the suspension portion 46a and that does not easily come off the suspension portion 46a during the drying process in the drying furnace 40. Further, the handle 34 and / or the suspension portion 46a may be provided with a non-slip member so that the handle 34 does not slide left and right on the suspension portion 46a in FIG.
【0030】尚、カゴ30の材質はステンレスばかりで
はなく、各種処理液に対して耐性のある導体であればよ
く、且つカゴ30は十分な強度が得られる構造であれば
よい。また、ステンレス枠治具20の固定方法は、固定
具31a、31b、32a、32bを用いる方法ばかり
でなく、複数個のステンレス枠治具20を所望の間隔を
おいて固定できる方法であればよい。カゴ30は、複数
個のステンレス枠治具20を収容でき、適度な大きさで
あればよいが、10個のステンレス枠治具20を固定収
容できる大きさが好ましい。The material of the basket 30 is not limited to stainless steel, but may be any conductor that is resistant to various treatment liquids, and the cage 30 may have any structure that can provide sufficient strength. The method for fixing the stainless steel frame jig 20 is not limited to the method using the fixing tools 31a, 31b, 32a, and 32b, but may be any method that can fix a plurality of stainless steel frame jigs 20 at desired intervals. . The basket 30 can accommodate a plurality of stainless steel frame jigs 20 and may have an appropriate size, but preferably has a size capable of fixedly accommodating ten stainless steel frame jigs 20.
【0031】前処理液槽11aは、例えば、整面及び表
面洗浄槽、ソフトエッチング槽、酸洗槽、前処理槽、キ
ャタリスト槽及びアクセラレータ槽などから構成され
る。尚、前処理液槽11aは、必要な前処理を行うこと
ができる処理槽により構成されていればよい。The pretreatment liquid tank 11a is composed of, for example, a leveling and surface cleaning tank, a soft etching tank, an acid cleaning tank, a pretreatment tank, a catalyst tank, an accelerator tank, and the like. Note that the pretreatment liquid tank 11a may be constituted by a treatment tank capable of performing necessary pretreatment.
【0032】無電解めっき槽11bは、無電解銅めっき
を行うためのめっき槽であり、塩化ビニル樹脂などの樹
脂で形成された液槽に、銅イオン源に硫酸銅、アルカリ
源に水酸化ナトリウム、還元剤にホルムアルデヒド、キ
レート剤にロッシェル塩やEDTA(エチレンジアミン
四酢酸)、安定化剤、展性剤に微量の化合物を添加した
液組成の無電解銅めっき液が入れられている。無電解め
っき槽11bには、めっき槽の洗浄装置、めっき液の撹
拌装置、めっき液の濾過装置及びめっき液の温度、濃
度、pHを管理するための制御機構などが設けられてい
る。The electroless plating tank 11b is a plating tank for performing electroless copper plating. A liquid tank formed of a resin such as a vinyl chloride resin contains copper sulfate as a copper ion source and sodium hydroxide as an alkali source. An electroless copper plating solution having a liquid composition in which formaldehyde is added as a reducing agent, Rochelle salt or EDTA (ethylenediaminetetraacetic acid) is added as a chelating agent, and a trace amount of a compound is added as a stabilizer and a malleable agent. The electroless plating tank 11b includes a plating tank cleaning device, a plating solution stirring device, a plating solution filtering device, and a control mechanism for controlling the temperature, concentration, and pH of the plating solution.
【0033】尚、銅以外の金属、例えば、ニッケル、ス
ズなどを無電解めっきする場合には、必要なめっき液を
用いればよいし、無電解めっき槽11bの材質、大き
さ、めっき液などは必要なものを用いればよく、また、
無電解めっき槽11bは必要な機能を有していれば前記
のものに限らない。When a metal other than copper, for example, nickel or tin is electrolessly plated, a necessary plating solution may be used, and the material, size, plating solution and the like of the electroless plating tank 11b may be changed. Just use what you need, and
The electroless plating tank 11b is not limited to the above as long as it has a necessary function.
【0034】後処理液槽11cは、無電解銅めっきした
基板21を洗浄するための洗浄槽などから構成されてい
る。The post-treatment liquid tank 11c is constituted by a cleaning tank for cleaning the substrate 21 plated with electroless copper.
【0035】乾燥炉40は、例えば、図4に示すよう
に、本体42、蓋部43、カゴ30を上下に移動させな
がらステンレス枠治具20に衝撃を与えるための上下動
機構41、温度及び風量制御系を備えた温風循環器4
4、温風循環器44から本体42内に温風を送るための
送風路45及び温風循環器44の吸気口前に取り付けら
れたフィルターを備えている。As shown in FIG. 4, for example, the drying furnace 40 has a vertical movement mechanism 41 for applying an impact to the stainless steel frame jig 20 while moving the main body 42, the cover 43, and the basket 30 up and down, Hot air circulator 4 with air volume control system
4. A ventilation path 45 for sending warm air from the warm air circulator 44 to the inside of the main body 42 and a filter attached in front of the air inlet of the warm air circulator 44 are provided.
【0036】温風は、本体42の底部から排気されて、
フィルターを通って温風循環器44に吸引され、温風循
環器44で一定の温度及び風量で送風路45に送られ、
本体42の側面上側から本体42内に送られる。このよ
うにして、温風は温風の流れ方向47に流れる。尚、温
風の本体42内への吹き出し口及び本体42から温風循
環器44への排気口は、基板21が完全に乾燥できるよ
うな温風の流れが得られる場所に設けられていれば良
く、その開口面積は適宜選択すればよい。また、温風循
環器44で温風を循環させるのではなく、本体42内に
ヒータを設置して加熱し、空気を循環させる形態などで
もよい。The warm air is exhausted from the bottom of the main body 42,
The air is sucked into the hot air circulator 44 through the filter and sent to the air passage 45 at a constant temperature and air volume by the hot air circulator 44.
The paper is sent into the main body 42 from the upper side surface of the main body 42. In this way, the hot air flows in the flow direction 47 of the hot air. The outlet for the hot air into the main body 42 and the outlet for the hot air from the main body 42 to the hot air circulator 44 may be provided in a place where a flow of the hot air is obtained so that the substrate 21 can be completely dried. The opening area may be appropriately selected. Further, instead of circulating hot air with the hot air circulator 44, a heater may be provided in the main body 42 to heat the air and circulate the air.
【0037】尚、本体42には、複数個のカゴ30を収
容できるが、本体42の大きさは、図4に示すように、
3個のカゴ30を収容できる大きさであることが好まし
い。10個のステンレス枠治具20を収容できるカゴ3
0を3個収容できれば、一度に30枚の基板を乾燥する
ことができ、且つ本体42が大き過ぎないのでよい。Although the plurality of baskets 30 can be accommodated in the main body 42, the size of the main body 42 is as shown in FIG.
It is preferable that the size is such that three cages 30 can be accommodated. Basket 3 that can accommodate 10 stainless steel frame jigs 20
If three 0s can be accommodated, 30 substrates can be dried at a time, and the main body 42 is not too large.
【0038】上下動機構41は、カゴ30を懸架した棒
状の懸架部材46aの左右端部を支持し、左右端部のそ
れぞれを交互に数cm上昇させて自然落下により下降さ
せ、導体の治具20及び基板21に衝撃を与えて、基板
21と導体の治具20の取付部材22a、22b、22
c、22dとの隙間などに残った洗浄液などの液体を除
去し易くするための機構である。尚、上下動機構41
は、懸架部材46aの左右端部が最高点から自然落下す
るように、前記左右端部を上下動させる外形が6字状の
カムを各左右端部に対して用いたものである。The vertical movement mechanism 41 supports the left and right ends of a rod-shaped suspension member 46a on which the basket 30 is suspended, alternately raises each of the left and right ends by several centimeters, and lowers them by natural fall. By applying an impact to the substrate 20 and the substrate 21, the mounting members 22 a, 22 b, 22
This is a mechanism for facilitating the removal of a liquid such as a cleaning liquid remaining in a gap between c and 22d. The vertical movement mechanism 41
The cam which has a six-character outer shape for vertically moving the left and right ends so that the left and right ends of the suspension member 46a fall naturally from the highest point is used for each of the left and right ends.
【0039】図4においては、懸架部材46aの左端部
が最高点に達した状態を示し、右端部が最高点に達した
状態の懸架部材46bをニ点鎖線で示す。このように懸
架部材46aの左右端部を交互に上下動させて衝撃を与
えることにより、衝撃を与えない場合よりも短時間で完
全にステンレス枠治具20及び基板21から残った液体
を除去することができる。従って、乾燥炉40では、極
力弱い加熱で乾燥するため、基板21の銅箔の変性が少
なく、電解銅めっき後も基板に異常は生じない。尚、懸
架部材46aは、カゴ30を懸架できれば棒状以外の形
状でもよい。FIG. 4 shows a state in which the left end of the suspension member 46a has reached the highest point, and the suspension member 46b in which the right end has reached the highest point is indicated by a two-dot chain line. In this manner, the left and right ends of the suspension member 46a are alternately moved up and down to apply an impact, thereby completely removing the liquid remaining from the stainless steel frame jig 20 and the substrate 21 in a shorter time than when no impact is applied. be able to. Therefore, in the drying furnace 40, since the drying is performed by heating as weakly as possible, the copper foil of the substrate 21 is less likely to be modified, and no abnormality occurs in the substrate even after the electrolytic copper plating. The suspension member 46a may have a shape other than a rod shape as long as the cage 30 can be suspended.
【0040】また、懸架部材46aは乾燥炉40の上下
動機構41に備えていてもよい。その場合には、後処理
液槽11cでの後処理後に、基板21を固定したステン
レス枠治具20を収容したカゴ30を搬送装置15から
外し、乾燥炉40内に備えられた懸架部材46aにカゴ
30を懸架すればよい。The suspension member 46a may be provided in the vertical movement mechanism 41 of the drying furnace 40. In this case, after the post-processing in the post-treatment liquid tank 11c, the basket 30 containing the stainless steel frame jig 20 to which the substrate 21 is fixed is removed from the transport device 15, and the suspension member 46a provided in the drying furnace 40 is moved to the suspension member 46a. The basket 30 may be suspended.
【0041】また、衝撃を与える機構である上下動機構
41の下降させる機構が、前記カム以外のものを用いた
自然落下させる機構でもよく、更に、自然落下ばかりで
なく、ばねで付勢するなどの方法により強制的に下降さ
せる機構でもよい。また、衝撃を与える機構が、カゴ3
0あるいは懸架部材46aへの打撃等により衝撃を与え
る機構でもよく、懸架部材46aの左右端部を交互に上
昇させた時に衝撃が与えられる機構、例えば、前記6字
状のカムで下降させて、ばねの張力で上昇させて衝撃を
与える機構などでもよい。更に、懸架部材46aの両端
部を同時に上昇させ、同時に自然落下あるいはばねで付
勢して同時に下降させてもよく、また、前記両端部を同
時に上昇させる時に衝撃を与えるようにしてもよい。The mechanism for lowering the vertical movement mechanism 41, which is a mechanism for applying an impact, may be a mechanism for dropping naturally using a mechanism other than the cam. A mechanism for forcibly lowering by the method described above may be used. In addition, the mechanism for giving an impact is the basket 3
A mechanism that applies an impact by hitting the suspension member 46a or zero or the like may be used, and a mechanism that applies an impact when the left and right ends of the suspension member 46a are alternately raised, for example, by lowering with the 6-shaped cam, A mechanism for giving an impact by raising the tension of the spring may be used. Further, both ends of the suspension member 46a may be raised at the same time, and may be simultaneously dropped naturally or urged by a spring to be lowered at the same time, or an impact may be applied when the both ends are simultaneously raised.
【0042】乾燥炉40へのカゴ30の収容は、先ず蓋
部43を開け、搬送装置15に吊り下げられた懸架部材
46aに懸架した3個のカゴ40を下降させて懸架部材
46aごと本体42内に入れ、懸架部材46aの左右端
部を上下動機構41に設置する。搬送装置15から懸架
部材46aを外した後、蓋部43を閉める。乾燥処理終
了後は、蓋部43を開けて、搬送装置15により3個の
カゴ39を懸架部材46aごと吊り上げて、乾燥炉40
から出す。In order to store the basket 30 in the drying oven 40, first, the lid 43 is opened, and the three baskets 40 suspended on the suspension members 46a suspended by the transport device 15 are lowered to form the main body 42 together with the suspension members 46a. And the left and right ends of the suspension member 46 a are installed on the vertical movement mechanism 41. After removing the suspension member 46a from the transport device 15, the lid 43 is closed. After the drying process is completed, the lid 43 is opened, and the three baskets 39 are lifted together with the suspension members 46a by the transport device 15, and the drying furnace 40 is opened.
Get out of
【0043】乾燥処理後に乾燥炉40から基板21を出
した後は、カゴ30からステンレス枠治具20を外し、
ステンレス枠治具20から基板21を外して、保管庫1
2に基板21を重ねて一時保管する。この時の作業は、
綿、ナイロンなどの手袋をして行えるので、作業性がよ
い。After the substrate 21 is taken out of the drying furnace 40 after the drying process, the stainless steel frame jig 20 is removed from the basket 30 and
The substrate 21 is removed from the stainless steel frame jig 20 and the storage 1
2 and temporarily store the substrate 21 thereon. The work at this time is
Workability is good because it can be done with gloves such as cotton and nylon.
【0044】樹脂枠治具50は、図5に示すような従来
品でよく、合成樹脂製の枠51a、51b、51cと、
枠51a、51b、51cに埋め込まれた引出し線52
a、52b、52c、52dと、引出し線52a、52
b、52c、52dに接続される露出した接点53と、
接点に相対向して設けられた合成ゴムなどの弾性体で形
成された押さえ部材54と、外部電源(図示せず)に接
続するための露出した端子54a、54bと、引出し線
52a、52dを端子54a、54bに接続する配線5
5a、55bと、固定部材57とを備えている。枠51
b、51cは枠51aに蝶番で繋がれ、枠51b、51
cを閉じた時に固定部材57により閉じた状態に保持さ
れる。The resin frame jig 50 may be a conventional product as shown in FIG. 5, and includes synthetic resin frames 51a, 51b, and 51c.
Leader line 52 embedded in frames 51a, 51b, 51c
a, 52b, 52c, and 52d, and lead lines 52a and 52
exposed contacts 53 connected to b, 52c, 52d;
A pressing member 54 formed of an elastic body such as synthetic rubber provided opposite to the contact point, exposed terminals 54a and 54b for connecting to an external power supply (not shown), and lead wires 52a and 52d are formed. Wiring 5 connected to terminals 54a, 54b
5 a and 55 b and a fixing member 57 are provided. Frame 51
b, 51c are hinged to the frame 51a,
When closed, c is held in a closed state by the fixing member 57.
【0045】基板21は、図5(a)に示すように、接
点53及び押さえ部材54上に載置されて、枠51b、
51cを閉じた時に、枠51a、51b、51cに設け
られた相対向する接点53と押さえ部材54及び枠51
a、51b、51cとで、基板21の側面5〜10mm
程度が挟持される。このように基板21を挟持すること
により、電解銅めっきにおいて、めっき液を撹拌あるい
は樹脂枠治具50を揺動したとしても、基板21が樹脂
枠治具50からずれたりすることはない。尚、図5
(a)では、固定部材57を省略し、枠51b、51c
を開いた状態で示している。As shown in FIG. 5A, the substrate 21 is placed on the contact 53 and the holding member 54, and the frame 51b,
When closing 51c, opposing contacts 53 provided on frames 51a, 51b, 51c, holding member 54 and frame 51
a, 51b, 51c, the side surface of the substrate 21 is 5 to 10 mm
The degree is pinched. By sandwiching the substrate 21 in this manner, the substrate 21 does not deviate from the resin frame jig 50 even when the plating solution is stirred or the resin frame jig 50 is swung in electrolytic copper plating. FIG.
In (a), the fixing member 57 is omitted, and the frames 51b and 51c are omitted.
Is shown in an open state.
【0046】また、枠51b、51cを閉じた時に、め
っき液が基板21に十分に供給されるように、枠51
a、51b、51cには多くの孔58と大きな開口部が
形成されている。また、接点53の露出部分の面積は小
さく、各接点53は小接触面積で基板21に接触する。When the frames 51b and 51c are closed, the plating solution is supplied to the substrate 21 so that the plating solution is sufficiently supplied to the substrate 21.
Many holes 58 and large openings are formed in a, 51b, and 51c. Also, the area of the exposed portion of the contact 53 is small, and each contact 53 contacts the substrate 21 with a small contact area.
【0047】以上示したように、合成樹脂製の枠51
a、51b、51cと露出面積の小さな接点53を用い
ているので、端子55a、55bがめっき液に浸漬しな
いように電解めっき槽13bに樹脂枠治具50を浸漬し
て電解めっきを行なっても、樹脂枠治具50の余分な箇
所にほとんどめっきされることがないので不具合は起こ
らず、壊れるまで樹脂枠治具50を使用することができ
る。尚、端子55a、55bに繋がっていない固定部材
57及び蝶番などの導体部には電流が流れないので、め
っきされることはない。As described above, the frame 51 made of synthetic resin
a, 51b, and 51c and the contact 53 having a small exposed area are used, so that the resin frame jig 50 is immersed in the electrolytic plating tank 13b so that the terminals 55a and 55b are not immersed in the plating solution. Since there is almost no plating on an extra portion of the resin frame jig 50, no trouble occurs, and the resin frame jig 50 can be used until it is broken. Note that no current flows through the fixing member 57 and the conductors such as hinges that are not connected to the terminals 55a and 55b, and therefore no plating is performed.
【0048】尚、樹脂枠治具50は、前記形態のものば
かりではなく、不導体の枠51a、51b、51cの材
質、形状と大きさ、孔58の大きさと個数、接点53及
び押さえ部材54の個数と配置、固定部材57の個数と
固定方法などが必要な形態のものであり、電解めっき処
理を行った時に、基板21にめっきされ、樹脂枠治具5
0の余分な箇所にほとんどめっきされることがないもの
であればよい。The resin frame jig 50 is not limited to the above-described one, but may be made of the material, shape and size of the non-conductive frames 51a, 51b and 51c, the size and number of the holes 58, the contacts 53 and the holding members 54. The number and arrangement of the fixing members 57 and the number and the fixing method of the fixing members 57 are required. When the electrolytic plating is performed, the substrate 21 is plated and the resin frame jig 5
What is necessary is that the plating is hardly plated on the extra portions of 0.
【0049】また、樹脂枠治具50を複数個収容した電
解めっき用カゴを用いる場合には、電解めっき処理によ
り前記電解めっき用カゴにめっきされないように、電解
めっき用カゴは、樹脂枠治具50の端子55a、55b
など電流が流れる部分に接触する部分があれば、少なく
ともその部分を不導体で構成したものであればよい。従
って、電解めっき用カゴは、合成樹脂などの不導体で全
体を形成したもの、前記電流が流れる部分に接触する部
分のみ不導体で形成して残りの部分をステンレスなどの
導体あるいは導体と不導体とで形成したもの、あるいは
前記電流が流れる部分に接触する部分がなければ、全体
をステンレスなどの導体で形成したものでよい。In the case where a basket for electrolytic plating containing a plurality of resin frame jigs 50 is used, the basket for electrolytic plating is made of a resin frame jig so that the basket for electrolytic plating is not plated by electrolytic plating. 50 terminals 55a, 55b
For example, if there is a portion that contacts a portion where current flows, at least that portion may be made of a nonconductor. Therefore, the basket for electrolytic plating is formed entirely of a non-conductive material such as a synthetic resin, and only a portion in contact with a portion where the current flows is formed of a non-conductive material, and the remaining portion is formed of a conductive material such as stainless steel or a non-conductive material. If there is no portion that contacts the portion where the current flows, or a portion made of a conductor such as stainless steel may be used.
【0050】また、電解めっき用カゴは、カゴ30と同
様な形状であり、複数個の樹脂枠治具50を間隔をおい
て固定収容できる構造のものであればよい。電解めっき
用カゴには、樹脂枠治具50の端子55a、55bが接
続される端子部が設置されていて、前記端子部が外部電
源に接続されるものでもよく、前記端子部が設置されて
いないものでもよい。The basket for electrolytic plating may have the same shape as that of the basket 30 and may have a structure capable of fixedly accommodating a plurality of resin frame jigs 50 at intervals. A terminal portion to which the terminals 55a and 55b of the resin frame jig 50 are connected is installed on the basket for electrolytic plating, and the terminal portion may be connected to an external power supply, and the terminal portion is installed. It may not be.
【0051】樹脂枠治具50に基板21を固定した後
は、樹脂枠治具50を搬送装置16に懸架して搬送し、
電解めっきを行う処理槽13の各液槽上において、下降
させて各液槽に樹脂枠治具50ごと基板21を浸漬させ
て電解めっき処理を行う。前処理液槽13aは基板21
の洗浄等を行う液槽である。After the substrate 21 is fixed to the resin frame jig 50, the resin frame jig 50 is suspended and transported by the transport device 16.
On each liquid tank of the processing tank 13 for performing the electrolytic plating, the substrate 21 is immersed together with the resin frame jig 50 into each liquid tank to perform the electrolytic plating. The pretreatment liquid tank 13a is
This is a liquid tank for cleaning and the like.
【0052】電解めっき槽13bは、例えば、塩化ビニ
ル樹脂などの合成樹脂で形成され、その中央部の陰極
に、樹脂枠治具50の端子55a、55b、即ち、基板
21が接続され、陽極として銅板あるいは銅ボールが備
えられ、電解めっき槽13bには酸性浴あるいはアルカ
リ浴の銅めっき液が入れられている。銅めっき液は、例
えば、酸性浴の硫酸銅めっきであれば、硫酸銅、硫酸、
微量の塩素イオン及び光沢剤などからなり、銅イオン源
として硫酸銅(CuSO4・5H2O)を用いる。The electrolytic plating tank 13b is formed of, for example, a synthetic resin such as a vinyl chloride resin, and the terminals 55a and 55b of the resin frame jig 50, that is, the substrate 21, are connected to the cathode at the center of the electrolytic plating tank 13b. A copper plate or a copper ball is provided, and a copper plating solution of an acidic bath or an alkaline bath is put in the electrolytic plating tank 13b. Copper plating solution is, for example, copper sulfate, sulfuric acid,
Made such as chlorine ion and brighteners traces of copper sulfate (CuSO 4 · 5H 2 O) as a source of copper ions.
【0053】その他に、電解めっき槽13bには、基板
21、即ち、樹脂枠治具50の揺動装置、銅めっき液の
撹拌装置、温度制御装置、電流密度制御装置、不純物管
理装置などが備えられている。また、銅めっき液には光
沢剤や展性剤としての各種の有機化合物が添加されてい
る。In addition, the electrolytic plating tank 13b is provided with a substrate 21, ie, a rocking device for the resin frame jig 50, a stirring device for the copper plating solution, a temperature control device, a current density control device, an impurity management device, and the like. Have been. Further, various organic compounds as brighteners and malleable agents are added to the copper plating solution.
【0054】尚、電解めっき槽13bの材質、深さ、幅
と容量、陰極の配置、陽極の形状と配置、銅めっき液、
及び銅めっき液の撹拌条件、銅めっき液の温度、基板2
1の揺動条件、電流密度と不純物管理などについて、ス
ルーホール内に必要な銅がめっきできるもの及び条件を
用いればよい。また、銅以外の金属、例えば、ニッケ
ル、スズなどをめっきする場合には、必要なめっき液な
どを用いればよい。The material, depth, width and capacity of the electrolytic plating tank 13b, arrangement of the cathode, shape and arrangement of the anode, copper plating solution,
And stirring condition of copper plating solution, temperature of copper plating solution, substrate 2
Regarding the swing condition 1, the current density, the impurity management, and the like, the conditions and conditions under which the necessary copper can be plated in the through holes may be used. When plating a metal other than copper, for example, nickel or tin, a necessary plating solution or the like may be used.
【0055】次に、後処理液槽及び乾燥炉13cの後処
理液槽で洗浄等の処理をした後、搬送装置16から樹脂
枠治具50を外し、樹脂枠治具50から基板21取出し
て、乾燥炉に複数枚の基板21を収容して基板21を乾
燥した後、基板21を保管庫14に保管する。樹脂枠治
具50から基板21を取出す時は、基板21は濡れてい
るので、ゴム手袋などをして作業するが、樹脂枠治具5
0から基板21を取り外し易く、作業性はよい。Next, after processing such as washing is performed in the post-treatment liquid tank and the post-treatment liquid tank of the drying furnace 13c, the resin frame jig 50 is removed from the transfer device 16, and the substrate 21 is taken out from the resin frame jig 50. After the plurality of substrates 21 are stored in a drying furnace and the substrates 21 are dried, the substrates 21 are stored in the storage 14. When taking out the substrate 21 from the resin frame jig 50, the substrate 21 is wet, so work is performed with rubber gloves or the like.
It is easy to remove the substrate 21 from 0, and the workability is good.
【0056】次に、FPCのめっき装置10を用いたF
PCのスルーホールめっきについて、図6などを用いて
簡単に説明する。基板21は、不導体である厚さ25〜
100μm程度のポリイミドで形成されたベースフィル
ム61の両面に、厚さ18μm程度の銅箔62a、62
bを有する薄層である。基板21には、その所要箇所に
複数個のスルーホール63が形成されている。Next, F using the FPC plating apparatus 10
The through hole plating of the PC will be briefly described with reference to FIG. The substrate 21 has a thickness of 25 to
Copper foils 62a and 62 having a thickness of about 18 μm are formed on both sides of a base film 61 made of polyimide having a thickness of about 100 μm.
b is a thin layer. The substrate 21 has a plurality of through holes 63 formed at required locations.
【0057】基板21をステンレス枠治具20に固定し
て、前記したようにして、基板21を前処理液槽11a
で処理した後、無電解めっき槽11bにおいて基板21
に無電解銅めっき処理を行う。無電解銅めっき処理にお
いては、基板21のスルーホール63内壁部の不導体で
あるベースフィルム61内壁に、化学還元反応により銅
64が析出し、ベースフィルム61両面の銅箔62a、
62bに銅64が接触してスルーホール63内壁部全体
に導電性が付与される。析出させる銅64の厚さは0.
5μm程度である。The substrate 21 is fixed to the stainless steel frame jig 20, and the substrate 21 is placed in the pretreatment liquid tank 11a as described above.
And then the substrate 21 in the electroless plating tank 11b.
Is subjected to electroless copper plating. In the electroless copper plating process, copper 64 is precipitated by a chemical reduction reaction on the inner wall of the base film 61 which is a non-conductor on the inner wall of the through hole 63 of the substrate 21, and copper foils 62 a on both surfaces of the base film 61 are formed.
The copper 64 comes into contact with 62 b, and conductivity is given to the entire inner wall of the through hole 63. The thickness of the copper 64 to be deposited is 0.
It is about 5 μm.
【0058】後処理液槽11cで洗浄した後、乾燥炉4
0において基板21を乾燥する。乾燥炉40により、温
風の温度が80℃、乾燥時間が2分で、一度に30枚の
基板21を完全に乾燥できる。基板21の乾燥後は、基
板21を重ねて一時保管庫に保管する。After cleaning in the post-treatment liquid tank 11c, the drying furnace 4
At 0, the substrate 21 is dried. With the drying furnace 40, the temperature of the hot air is 80 ° C., the drying time is 2 minutes, and 30 substrates 21 can be completely dried at a time. After the substrate 21 is dried, the substrates 21 are stacked and stored in a temporary storage.
【0059】次に、樹脂枠治具50に乾燥した基板21
を固定し、前記したようにして、前処理液槽13aで基
板21を処理した後、電解めっき槽13bに基板21を
浸漬して電解銅めっきを行い、スルーホール63内壁部
全体に厚さ15〜20μm程度の銅65を成長させる。
この電解銅めっきにより、スルーホール63内壁部全体
が電気回路としての機能が保証できる厚さの銅65で被
覆され、基板21両面の銅箔62a、62bが十分に導
通する状態になる。尚、基板21両面の銅箔62a、6
2b上にも同様の厚さの銅が成長する。Next, the dried substrate 21 is placed on a resin frame jig 50.
After fixing the substrate 21 in the pretreatment liquid tank 13a as described above, the substrate 21 is immersed in the electrolytic plating tank 13b to perform electrolytic copper plating, and the entire inner wall portion of the through hole 63 has a thickness of 15 mm. A copper 65 of about 20 μm is grown.
By this electrolytic copper plating, the entire inner wall portion of the through hole 63 is covered with the copper 65 having a thickness that can guarantee the function as an electric circuit, and the copper foils 62a and 62b on both surfaces of the substrate 21 are brought into a sufficiently conductive state. The copper foils 62a, 6 on both sides of the substrate 21
Copper of the same thickness grows on 2b.
【0060】電解銅めっき処理後は、後処理液槽及び乾
燥炉13cにおける後処理液槽で基板21を洗浄し、基
板21の洗浄後に樹脂枠治具50から基板21を取出
し、乾燥炉で基板21を乾燥した後、基板21を保管庫
14に保管する。After the electrolytic copper plating treatment, the substrate 21 is washed in the post-treatment liquid tank and the post-treatment liquid tank in the drying furnace 13c. After drying the substrate 21, the substrate 21 is stored in the storage 14.
【0061】尚、本発明の実施形態のFPCのめっき装
置10は、基板の貫通穴であるスルーホール内壁部のめ
っきに用いるばかりでなく、非貫通穴であるブラインド
ビアホールの内壁部のめっき、その他の一部分に銅箔を
有しない基板のその一部分に銅皮膜を形成するため、あ
るいは銅箔を有しない基板に銅皮膜を形成するためなど
に用いてもよい。The FPC plating apparatus 10 according to the embodiment of the present invention is used not only for plating on the inner wall of a through-hole which is a through-hole of a substrate, but also for plating the inner wall of a blind via-hole which is a non-through-hole. It may be used for forming a copper film on a part of a substrate having no copper foil, or for forming a copper film on a substrate having no copper foil.
【0062】また、銅めっきばかりでなく、必要な無電
解めっき用及び電解めっき用のめっき液などを用いるこ
とにより、その他の金属をめっきするために用いてもよ
い。また、めっき処理を行う基板は、図6に示す構造の
ものばかりでなく、不導体のベースフィルムの片面ある
いは両面に導体の箔を積層したものなどでよい。Further, not only copper plating but also other metals may be plated by using a necessary plating solution for electroless plating and electrolytic plating. The substrate on which the plating treatment is performed is not limited to the one having the structure shown in FIG. 6, but may be a non-conductive base film having a conductor foil laminated on one or both sides of a non-conductive base film.
【0063】以上示したように、FPCのめっき装置1
0を用いれば、基板21を20mm程度の間隔をおいて
一度に30枚収容できるカゴ30を用いて無電解銅めっ
き処理を行うことができるので、各種処理液槽の容量を
小さくできるため、設備を小型化できる。また、ステン
レス枠治具20で基板21を小接触面積で挟持し、且つ
カゴ30に収容してステンレス枠治具20ごと基板21
を効率良く乾燥できる乾燥炉40を使用するので、基板
21に残った処理液の残液を短時間で完全に乾燥するこ
とができ、且つ乾燥後の基板21に染みによる外観不良
が発生しない。As described above, the FPC plating apparatus 1
If 0 is used, electroless copper plating can be performed using a cage 30 capable of accommodating 30 substrates 21 at a time at intervals of about 20 mm, so that the capacity of various processing liquid tanks can be reduced. Can be reduced in size. Further, the substrate 21 is sandwiched by the stainless steel frame jig 20 with a small contact area, and is accommodated in the basket 30 so that the stainless steel frame jig 20 and the substrate 21 are held together.
Since the drying furnace 40 capable of efficiently drying the substrate 21 is used, the remaining processing solution remaining on the substrate 21 can be completely dried in a short time, and the substrate 21 after drying does not have poor appearance due to stains.
【0064】また、ステンレス枠治具20への基板21
の取り付け及び取り外し作業を綿あるいはナイロンなど
の手袋をして行うことができるので作業性が良く、更
に、樹脂枠治具50の作業性が良いため基板21の取り
付け及び取り外し作業はゴム手袋をして容易に行うこと
ができるので、従来の金属枠治具を用いる場合よりも、
前記した基板固定用の治具を用いる場合の方が作業性が
よく、且つ少人数で作業ができる。また、無電解めっき
処理及び電解めっき処理に用いられるステンレス枠治具
20及び樹脂枠治具50にめっきされることがほとんど
無いので、壊れるまでステンレス枠治具20及び樹脂枠
治具50を使用することができる。The substrate 21 on the stainless steel frame jig 20
Since the work of attaching and detaching can be performed by using gloves such as cotton or nylon, the workability is good, and further, since the workability of the resin frame jig 50 is good, the work of attaching and detaching the substrate 21 is performed by using rubber gloves. It can be easily performed, so than when using a conventional metal frame jig,
When the above-mentioned jig for fixing a substrate is used, workability is better and work can be performed by a small number of people. Further, since the stainless steel frame jig 20 and the resin frame jig 50 used for the electroless plating process and the electrolytic plating process are hardly plated, the stainless steel frame jig 20 and the resin frame jig 50 are used until they are broken. be able to.
【0065】[0065]
【発明の効果】本発明によれば、一度に大量の枚数の基
板を無電解銅めっき処理及び乾燥処理することができ、
無電解めっき後にステンレス枠治具ごと基板を乾燥する
乾燥時間が短時間であり、前記乾燥後の基板に外観不良
がなく、ステンレス枠治具及び樹脂枠治具への基板の取
り付け及び取り外し作業の作業性がよく、且つ無電解銅
めっき及び電解銅めっきにおいて使用する基板固定用の
ステンレス枠治具及び樹脂枠治具の交換回数を従来の治
具を使用する場合よりも大幅に低減することができる。
従って、生産性の向上、設備の小型化、作業性の向上と
省力化及び基板固定用治具のコスト低減を図ることがで
きる。According to the present invention, a large number of substrates can be subjected to electroless copper plating and drying at a time,
The drying time for drying the substrate together with the stainless steel frame jig after the electroless plating is short, and there is no defective appearance of the substrate after the drying, and the work of attaching and removing the substrate to and from the stainless steel frame jig and the resin frame jig. Workability is good, and the number of replacements of stainless steel frame jigs and resin frame jigs for fixing substrates used in electroless copper plating and electrolytic copper plating can be significantly reduced as compared with the case where conventional jigs are used. it can.
Therefore, it is possible to improve the productivity, reduce the size of the equipment, improve the workability, save labor, and reduce the cost of the jig for fixing the substrate.
【図1】本発明によるフレキシブルプリント基板のめっ
き装置の実施形態を示す概略図である。FIG. 1 is a schematic view showing an embodiment of a flexible printed circuit board plating apparatus according to the present invention.
【図2】図1における導体の治具を示し、(a)は正面
図、(b)は側面図である。2A and 2B show a conductor jig in FIG. 1, wherein FIG. 2A is a front view and FIG. 2B is a side view.
【図3】図1における導体の治具を収容したカゴを示す
概略斜視図である。FIG. 3 is a schematic perspective view showing a basket accommodating a conductor jig in FIG. 1;
【図4】図1における乾燥炉において懸架部材の左端部
を上昇させたところを示す断面概略図である。FIG. 4 is a schematic cross-sectional view showing a state where a left end of a suspension member is raised in the drying furnace in FIG. 1;
【図5】図1における主要部が不導体の治具を示し、
(a)は展開して示した正面図、(b)は側面図であ
る。FIG. 5 shows a jig whose main part in FIG. 1 is a non-conductor,
(A) is an expanded front view, and (b) is a side view.
【図6】スルーホールめっきをするフレキシブルプリン
ト基板を示し、(a)はスルーホール内壁部におけるベ
ースフィルム内壁に無電解銅めっきで銅が析出した状態
の断面図、(b)は(a)で析出した銅上に電解銅めっ
きで銅が析出してスルーホール内壁部が銅皮膜で被覆さ
れた状態の断面図である。6A and 6B are cross-sectional views showing a state in which copper is deposited by electroless copper plating on an inner wall of a base film in an inner wall portion of a through hole, and FIG. FIG. 4 is a cross-sectional view showing a state where copper is deposited on the deposited copper by electrolytic copper plating and the inner wall of the through hole is covered with a copper film.
【図7】従来の金属枠治具を示す図である。FIG. 7 is a view showing a conventional metal frame jig.
10 フレキシブルプリント基板のめっき装置 11 無電解めっきを行う処理槽 11a、13a 前処理液槽 11b 無電解めっき槽 11c 後処理液槽 12、14 保管庫 13 電解めっきを行う処理槽 13b 電解めっき槽 13c 後処理液槽及び乾燥炉 15、16 搬送装置 15a、16a 上昇方向 15b、16b 下降方向 15c、16c 搬送方向 20 ステンレス枠治具 21 基板 22a、22b、22c、22d 取付部材 23 枠部 24 ばね 25 横枠 26 ガイド部 27 補助枠部 30 カゴ 31a、31b、32a、32b 固定具 33 横枠部 34 取手 40 乾燥炉 41 上下動機構 42 本体 43 蓋部 44 温風循環器 45 送風路 46a、46b 懸架部材 47 温風の流れ方法 50 樹脂枠治具 51a、51b、51c 枠 52a、52b、52c、52d 引き出し線 53 接点 54 押さえ部材 55a、55b 端子 56a、56b 配線 57 固定部材 58 孔 61 ベースフィルム 62a、62b 銅箔 63 スルーホール 64、65 銅 70 金属枠治具 71 金属枠部 72 ビスとナット 73 基板取付部 DESCRIPTION OF SYMBOLS 10 Plating apparatus of flexible printed circuit board 11 Treatment tank 11a, 13a Pretreatment liquid tank 11b Electroless plating tank 11c Post-treatment liquid tank 12, 14 Storage 13 Treatment tank 13c performing electroplating 13b Electrolytic plating tank 13c Treatment liquid tank and drying furnace 15, 16 Transfer device 15a, 16a Upward direction 15b, 16b Downward direction 15c, 16c Transport direction 20 Stainless steel frame jig 21 Substrate 22a, 22b, 22c, 22d Mounting member 23 Frame portion 24 Spring 25 Horizontal frame 26 Guide part 27 Auxiliary frame part 30 Basket 31a, 31b, 32a, 32b Fixture 33 Horizontal frame part 34 Handle 40 Drying furnace 41 Vertical movement mechanism 42 Main body 43 Lid part 44 Hot air circulator 45 Air passage 46a, 46b Suspension member 47 Hot air flow method 50 Resin frame jigs 51a, 51b, 51c Frame 52 a, 52b, 52c, 52d Lead wire 53 Contact 54 Pressing member 55a, 55b Terminal 56a, 56b Wiring 57 Fixing member 58 Hole 61 Base film 62a, 62b Copper foil 63 Through hole 64, 65 Copper 70 Metal frame jig 71 Metal frame Part 72 Screw and nut 73 Board mounting part
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平10−145030(JP,A) 特開 平8−23164(JP,A) 特開 平4−173994(JP,A) 特開 昭58−128792(JP,A) 実開 平4−114564(JP,U) 実開 平2−42065(JP,U) (58)調査した分野(Int.Cl.7,DB名) C23C 18/31 C25D 17/00 H05K 3/18 ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-10-145030 (JP, A) JP-A-8-23164 (JP, A) JP-A-4-173994 (JP, A) JP-A-58-1983 128792 (JP, A) JP-A 4-114564 (JP, U) JP-A 2-42065 (JP, U) (58) Fields investigated (Int. Cl. 7 , DB name) C23C 18/31 C25D 17 / 00 H05K 3/18
Claims (2)
いる装置であって、 前記基板を挟持して伸張して固定する取付部材を有する
枠部を備えた導体の治具と、 前記導体の治具を収容するカゴと、 前記カゴごと前記基板の無電解めっきを行う処理槽と、 前記カゴを懸架して該カゴに収容された前記導体の治具
に衝撃を与える機構を備えた乾燥炉と、 前記基板を固定する主要部が不導体の治具と、 前記主要部が不導体の治具ごと前記基板の電解めっきを
行う処理槽と、 を備えたことを特徴とするフレキシブルプリント基板の
めっき装置。1. An apparatus used for plating a flexible printed circuit board, comprising: a conductor jig provided with a frame having a mounting member for holding, extending and fixing the substrate; and a housing for accommodating the conductor jig. A basket for performing electroless plating of the substrate together with the basket; a drying furnace having a mechanism for suspending the basket and applying an impact to a jig of the conductor housed in the basket; and the substrate. A jig having a non-conductive main part for fixing the jig, and a treatment tank for performing electrolytic plating of the substrate together with the jig having the non-conductive main part, a plating apparatus for a flexible printed circuit board.
前記カゴを懸架する懸架部材を支持し、該懸架部材の両
端部のそれぞれを交互に上昇させて自然落下により下降
させる機構であることを特徴とする請求項1に記載のフ
レキシブルプリント基板のめっき装置。2. A mechanism for giving an impact to the conductor jig,
The plating apparatus for a flexible printed board according to claim 1, wherein the mechanism is a mechanism for supporting a suspension member for suspending the basket, and alternately raising and lowering both ends of the suspension member by natural fall. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001030754A JP3340726B2 (en) | 2001-02-07 | 2001-02-07 | Flexible printed circuit board plating equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001030754A JP3340726B2 (en) | 2001-02-07 | 2001-02-07 | Flexible printed circuit board plating equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002235178A JP2002235178A (en) | 2002-08-23 |
| JP3340726B2 true JP3340726B2 (en) | 2002-11-05 |
Family
ID=18894927
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001030754A Expired - Fee Related JP3340726B2 (en) | 2001-02-07 | 2001-02-07 | Flexible printed circuit board plating equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3340726B2 (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3348092B2 (en) | 2001-02-14 | 2002-11-20 | 荏原ユージライト株式会社 | Jig for electroless plating |
| KR101102337B1 (en) * | 2008-05-28 | 2012-01-03 | 엘지전자 주식회사 | Flexible film |
| KR100990598B1 (en) | 2008-06-30 | 2010-10-29 | 박경이 | Plating Basket |
| JP6234731B2 (en) * | 2013-08-08 | 2017-11-22 | 上村工業株式会社 | Holder with clamper |
| TWI737481B (en) * | 2020-09-03 | 2021-08-21 | 台郡科技股份有限公司 | Roll-type feeding Teflon screen frame and feeding system |
| CN116083992B (en) * | 2022-12-20 | 2026-02-06 | 湖南维胜科技电路板有限公司 | Anti-cracking combined circuit board copper deposition electroplating device |
-
2001
- 2001-02-07 JP JP2001030754A patent/JP3340726B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2002235178A (en) | 2002-08-23 |
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