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JP3342797B2 - Method for manufacturing ceramic circuit board having metal circuit - Google Patents
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JP3342797B2 - Method for manufacturing ceramic circuit board having metal circuit - Google Patents

Method for manufacturing ceramic circuit board having metal circuit

Info

Publication number
JP3342797B2
JP3342797B2 JP04514696A JP4514696A JP3342797B2 JP 3342797 B2 JP3342797 B2 JP 3342797B2 JP 04514696 A JP04514696 A JP 04514696A JP 4514696 A JP4514696 A JP 4514696A JP 3342797 B2 JP3342797 B2 JP 3342797B2
Authority
JP
Japan
Prior art keywords
metal
circuit board
circuit
ceramic
copper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP04514696A
Other languages
Japanese (ja)
Other versions
JPH09246675A (en
Inventor
好彦 辻村
美幸 中村
康人 伏井
博人 堀内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denka Co Ltd
Original Assignee
Denki Kagaku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Denki Kagaku Kogyo KK filed Critical Denki Kagaku Kogyo KK
Priority to JP04514696A priority Critical patent/JP3342797B2/en
Publication of JPH09246675A publication Critical patent/JPH09246675A/en
Application granted granted Critical
Publication of JP3342797B2 publication Critical patent/JP3342797B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0271Arrangements for reducing stress or warp in rigid printed circuit boards, e.g. caused by loads, vibrations or differences in thermal expansion
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0306Inorganic insulating substrates, e.g. ceramic, glass

Landscapes

  • Manufacturing Of Printed Wiring (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、金属回路を有するセラ
ミックス回路基板の製造方法に関するものである。
BACKGROUND OF THE INVENTION The present invention relates to a ceramic having a metal circuit.
The present invention relates to a method for manufacturing a mixed circuit board .

【0002】[0002]

【従来の技術】近年、ロボットやモーター等の産業機器
の高性能化に伴い、大電力・高能率インバーター等大電
力モジュールの変遷が進んでおり、半導体素子から発生
する熱も増加の一途をたどっている。この熱を効率よく
放散させるため、大電力モジュール基板では従来より様
々な方法が取られてきた。特に最近、良好な熱伝導を有
するセラミックス基板が利用できるようになったため、
基板上に銅板等の金属板を接合し、回路を形成後、その
ままあるいはメッキ等の処理を施してから半導体素子を
実装する構造も採用されつつある。
2. Description of the Related Art In recent years, high-performance modules such as high-power and high-efficiency inverters have been transitioning with high performance of industrial equipment such as robots and motors, and the heat generated from semiconductor elements has been increasing steadily. ing. In order to efficiently dissipate this heat, various methods have conventionally been used for large power module substrates. Especially recently, ceramic substrates with good thermal conductivity have become available,
A structure in which a metal plate such as a copper plate is bonded on a substrate to form a circuit, and then a semiconductor element is mounted as it is or after performing a process such as plating has been adopted.

【0003】このようなモジュールは、当初、簡単な工
作機械に使用されてきたが、ここ数年、溶接機、電車の
駆動部、電気自動車に使用されるようになり、より厳し
い環境条件たとえば電流密度を上げるための回路銅厚の
増加や熱衝撃等に対する耐久性の向上と、更なる小型化
が要求されるようになってきた。この要求に対応可能な
セラミックス基板は、現時点では窒化アルミニウム基板
のみである。
[0003] Such modules were initially used for simple machine tools, but have been used for welding machines, train drives and electric vehicles in recent years, and have been subjected to more severe environmental conditions such as electric current. It has been required to increase the circuit copper thickness for increasing the density, to improve the durability against thermal shock and the like, and to further reduce the size. At present, only an aluminum nitride substrate can meet this demand.

【0004】金属とセラミックスを接合する方法には種
々あるが、銅板と窒化アルミニウム基板との接合には、
両者間に活性金属を含むろう材を介在させ、加熱処理し
て接合体とする活性金属ろう付け法(例えば特開昭60
−177634号公報)や、表面が酸化処理された窒化
アルミニウム基板と銅板を銅の融点以下でCu−Oの共
晶温度以上で加熱接合するDBC法(例えば特開昭56
−163093号公報)等がある。
[0004] There are various methods for joining a metal and a ceramic. For joining a copper plate and an aluminum nitride substrate,
An active metal brazing method in which a brazing material containing an active metal is interposed between the two and heat-treated to form a joined body (for example,
177634) and a DBC method in which an aluminum nitride substrate and a copper plate whose surfaces are oxidized are heated and joined at a temperature lower than the melting point of copper and higher than the eutectic temperature of Cu-O (for example, Japanese Patent Application Laid-Open No.
-163093).

【0005】活性金属ろう付け法は、DBC法に比べて
以下の利点がある。 (1)接合体を得るための処理温度が低いので、窒化ア
ルミニウム基板と銅板の熱膨張差によって生じる残留応
力が小さい。 (2)ろう材が延性金属であるので、ヒートショックや
ヒートサイクルに対する耐久性が大である。
[0005] The active metal brazing method has the following advantages over the DBC method. (1) Since the processing temperature for obtaining the joined body is low, the residual stress caused by the difference in thermal expansion between the aluminum nitride substrate and the copper plate is small. (2) Since the brazing material is a ductile metal, the durability against heat shock and heat cycle is high.

【0006】[0006]

【発明が解決しようとする課題】しかしながら、活性金
属ろう付け法は、ろう材の融点近傍にまで温度を上げて
接合するので接合体に応力が残留し、近年のヒートショ
ックやヒートサイクルに対する耐久性の要求を満たし得
ず、更なる改良が待たれていた。
However, in the active metal brazing method, since the joining is performed by increasing the temperature to near the melting point of the brazing material, stress remains in the joined body, and the durability against recent heat shocks and heat cycles. Could not be satisfied, and further improvement was awaited.

【0007】本発明の目的は、上記に鑑み、ヒートショ
ックやヒートサイクルに対する耐久性を更に改善した金
属回路を有するセラミックス回路基板の製造方法を提供
することにある。
In view of the above, it is an object of the present invention to provide a method of manufacturing a ceramic circuit board having a metal circuit with further improved durability against heat shock and heat cycle.

【0008】[0008]

【課題を解決するための手段】すなわち、本発明は、ホ
ーニング処理後に酸化処理を行って、アルミナを含む酸
化表面を有する窒化アルミニウム基板とした後、ジルコ
ニウム又はその化合物とチタン又はその化合物とを含む
活性金属ろう材を用い、その表面には厚み0.3mm以
上の銅製の金属回路を、また裏面には厚み0.2mm以
下の銅製の金属放熱板を形成させ、次いで機械的矯正を
行うことを特徴とする金属回路を有するセラミックス
路基板の製造方法である。この場合において、金属回路
を有するセラミックス回路基板が、単位長さ10mmあ
たりの変形量で定義されるうねりがいかなる個所におい
ても30μm以下であり、しかも回路基板の長手(x
軸)方向の長さをL、それとの交差方向(y軸)の長さ
をWとし、回路基板の中央を原点とした座標を設定した
場合に、うねりの最大値を示す位置が−L/4≦x≦L
/4、−W/4≦y≦W/4の範囲にあることが好まし
い。
That is, the present invention provides an aluminum nitride substrate having an oxidized surface containing alumina by performing an oxidation treatment after a honing treatment, and then comprising zirconium or a compound thereof and titanium or a compound thereof. Using an active metal brazing material, a copper metal circuit with a thickness of 0.3 mm or more is formed on the front surface, and a copper metal radiator plate with a thickness of 0.2 mm or less is formed on the back surface, and then mechanical correction is performed. A method for manufacturing a ceramic circuit board having a characteristic metal circuit. In this case, the swell of the ceramic circuit board having a metal circuit defined by the deformation amount per unit length of 10 mm is 30 μm or less at any point, and the length of the circuit board (x
In the case where the length in the (axis) direction is L, the length in the direction intersecting with the axis (y-axis) is W, and coordinates having the origin at the center of the circuit board are set, the position indicating the maximum value of the undulation is -L / 4 ≦ x ≦ L
/ 4, −W / 4 ≦ y ≦ W / 4.

【0009】[0009]

【発明の実施の形態】以下、さらに詳しく本発明につい
て説明する。
BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in more detail.

【0010】金属回路のパターン又は金属板とセラミッ
クス基板とを接合する場合、全ての接合面が同じように
接合するわけではなく、部分的に反応が早く始まるとこ
ろと遅れるところがでてくる。その時、反応が早く始ま
ったところと遅く始まったところとの間に引張や圧縮の
応力がかかることとなり、それが接合時の残留応力とな
る。この引張又は圧縮の応力がかかった部分は、その応
力の大小に応じて部分的に変形が生じうねりとなって残
る。うねりが大きいということは、大きな残留応力の存
在を意味し、うねりの状態を調べることによって残留応
力の大小を知ることができる。
When a metal circuit pattern or a metal plate is joined to a ceramic substrate, not all joining surfaces are joined in the same manner, and some reactions start early and some are delayed. At that time, a tensile or compressive stress is applied between a place where the reaction starts early and a place where the reaction starts late, and this becomes a residual stress at the time of joining. The portion to which the tensile or compressive stress is applied is partially deformed according to the magnitude of the stress, and remains as undulation. A large undulation means the presence of a large residual stress, and the magnitude of the residual stress can be known by examining the state of the undulation.

【0011】本発明において、うねりは輪郭形状測定に
よることが好ましいが、ダイヤルゲージを用いて数ミリ
単位毎の回路基板の定盤からの高さを測定し、等高線を
描いていくような手法であってもよい。
In the present invention, the undulation is preferably measured by a contour shape. However, the height of the circuit board from the surface plate is measured every several millimeters using a dial gauge, and a contour line is drawn. There may be.

【0012】本発明においては、うねり量は0であるこ
とが最も望ましいが、単位長さ10mmあたりの変形量
がいかなる個所においても30μm以下であれば、ヒー
トショックやヒートサイクルに対する耐久性に及ぼす残
留応力の影響を無視することができる。また、うねりの
最大値(頂点)を示す位置についても、ヒートショック
やヒートサイクルに対する耐久性に関係しており、本発
明においては、その位置は回路基板の中央付近であるこ
とが望ましい。具体的には、回路基板の長手(x軸)方
向の長さをL、それとの交差方向(y軸)の長さをWと
し、回路基板の中央を原点とした座標を設定した場合
に、うねりの最大値を示す位置が、−L/4≦x≦L/
4、−W/4≦y≦W/4の範囲にあることが必要であ
る。これ以外のところにうねりの最大値を示す位置があ
ると、そのうねり量がたとえ上記の値を満たしていて
も、回路基板全体の形状が不安定となり、ヒートショッ
クやヒートサイクルに対する耐久性の更なる改善は望め
なくなる。
In the present invention, it is most preferable that the amount of undulation is 0. However, if the amount of deformation per unit length of 10 mm is 30 μm or less at any point, the residual effect on the durability against heat shock and heat cycle is reduced. The effects of stress can be neglected. Further, the position showing the maximum value (apex) of the undulation is also related to the durability against heat shock and heat cycle. In the present invention, the position is preferably near the center of the circuit board. Specifically, when the length of the circuit board in the longitudinal (x-axis) direction is L, the length of the cross direction (y-axis) thereof is W, and coordinates are set with the origin at the center of the circuit board, The position indicating the maximum value of the undulation is -L / 4 ≦ x ≦ L /
4. It is necessary that −W / 4 ≦ y ≦ W / 4. If there is a position showing the maximum value of the undulation in other places, even if the amount of undulation satisfies the above value, the overall shape of the circuit board will be unstable, and the durability of the circuit board against heat shock and heat cycle will be improved. No further improvement can be expected.

【0013】本発明は、上記耐久性に優れた金属回路を
有するセラミックス回路基板の製造方法であり、上記う
ねり状態をあらかじめ調べることによってその耐久性の
大小を知ることができるものである。
The present invention provides a metal circuit having excellent durability as described above.
A method for producing a ceramic circuit board having
By checking the twist state in advance, its durability
You can know big and small.

【0014】本発明においては、セラミックス基板に金
属板を接合し、その接合体の金属をエッチングして金属
回路を形成させるか、又はあらかじめ金属板から金属回
路のパターンを加工しそれをセラミックス基板に接合し
て金属回路を形成させることによって本発明の金属回路
を有するセラミックス回路基板が製造されるが、うねり
矯正工程は、金属板とセラミックス基板とが接合された
段階、該接合体の金属をエッチングして金属回路を形成
させた段階、及び/又は金属回路のパターンとセラミッ
クス基板とが接合された段階で行われる。望ましくは最
終製品に近い段階で行うことである。
In the present invention, a metal plate is joined to a ceramic substrate, and a metal circuit is formed by etching the metal of the joined body, or a metal circuit pattern is processed from the metal plate in advance and the metal circuit is formed on the ceramic substrate. The ceramic circuit board having the metal circuit of the present invention is manufactured by joining to form a metal circuit.The swell correction step is a step in which the metal plate and the ceramic substrate are joined, and the metal of the joined body is etched. This is performed at a stage where the metal circuit is formed and / or at a stage where the pattern of the metal circuit and the ceramic substrate are joined. Desirably, it is performed at a stage close to the final product.

【0015】本発明において、うねり矯正は機械的な力
を加えることよって行われ、その具体的な方法は、セラ
ミックス基板と金属板及び/又は金属回路との接合体の
上下面をローラーで挟みローラーを転がして矯正する方
法、ショットブラスト等で表面に微粒を叩き付ける方法
等がある。
In the present invention, the swell correction is performed by applying a mechanical force, and a specific method is to sandwich the upper and lower surfaces of a joined body of a ceramics substrate and a metal plate and / or a metal circuit with rollers. And a method of hitting fine particles on the surface by shot blasting or the like.

【0016】本発明で使用されるセラミックス基板は窒
化アルミニウム基板であり、その厚みとしては、厚すぎ
ると熱抵抗が大きくなり、薄すぎると耐久性がなくなる
ので、0.3〜0.8mm程度であることが好ましい。
[0016] The ceramic substrate used in the present invention is nitrogen
Aluminum is the substrate, the thickness thereof is too thick thermal resistance increases, because there is no durability is too thin, it is preferably about 0.3 to 0.8 mm.

【0017】セラミックス基板の表面性状は重要であ
り、微少な欠陥や窪み等は金属板又は金属回路との接触
面積に大きな影響を与えるため平滑であることが望まし
く、それにはホーニングや機械加工等の処理が施されて
いるものが望ましい。本発明においては、熱伝導率の高
い窒化アルミニウム基板が望ましく、特に、大気中、温
度1100℃程度で酸化処理を行い表面にアルミナを含
む酸化表面を形成させた窒化アルミニウム基板が望まし
い。
The surface properties of the ceramic substrate are important, and minute defects and dents have a great effect on the contact area with a metal plate or a metal circuit, so it is desirable that the surface is smooth. Those that have been treated are desirable. In the present invention, an aluminum nitride substrate having high thermal conductivity is desirable, and in particular, an aluminum nitride substrate having an oxidized surface containing alumina formed on the surface by performing an oxidation treatment at a temperature of about 1100 ° C. in the atmosphere is desirable.

【0018】金属回路の材質は銅である。金属回路の厚
みとしては、近年、電流密度が増加していく傾向から
0.3mmよりも厚い方が好ましい。本発明において
は、セラミックス基板の表面に金属回路が、またその裏
面には金属放熱板が形成された構造の回路基板であり、
金属放熱板の材質についても銅が使用され、またその厚
みは0.2mm以下であることが好ましい。
The material of the metal circuit is copper . As the thickness of the metal circuit, it is preferable that the thickness is larger than 0.3 mm from the tendency that the current density increases in recent years. In the present invention, a circuit board having a structure in which a metal circuit is formed on the surface of the ceramic substrate, and a metal radiator plate is formed on the back surface ,
Copper is also used for the material of the metal radiator plate, and its thickness is preferably 0.2 mm or less.

【0019】セラミックス基板の一方の面に金属回路、
他方の面に金属放熱板を形成する方法としては、セラミ
ック基板と金属板との接合体をエッチングする方法、
金属板から打ち抜かれた金属回路及び/又は金属放熱板
のパターンをセラミックス基板に接合する方法等によっ
て行うことができ、これらの際における金属板又は金属
回路パターンとセラミックス基板との接合方法として
は、活性金属ろう付け法が採用される。
A metal circuit is provided on one side of the ceramic substrate,
As a method of forming a metal heat sink on the other surface, a method of etching a joined body of the ceramic <br/> click scan board and the metal plate,
It can be performed by a method of bonding a metal circuit and / or a pattern of a metal heat sink pierced from a metal plate to a ceramic substrate, and the like. In these cases, a bonding method of the metal plate or the metal circuit pattern and the ceramic substrate includes: Active metal brazing is employed.

【0020】活性金属ろう付け法におけるろう材の金属
成分は、銀及び/又は銅を主成分とし、溶融時のセラミ
ックス基板との濡れ性を確保するために活性金属を副成
分とする。この活性金属成分は、セラミックス基板と反
応して酸化物や窒化物を生成させ、それらの生成物がろ
う材とセラミックス基板との結合を強固なものにする。
活性金属の具体例をあげれば、ジルコニウム、チタン、
ハフニウム、ニオブ、タンタル、バナジウムやこれらの
化合物である。好ましくはジルコニウム又はその化合物
であり、特に好ましくはジルコニウム又はその化合物と
チタン又はその化合物と併用することである。これらの
比率の一例は、銀69〜95重量部と銅5〜31重量部
の合計量100重量部あたり活性金属1〜7重量部であ
る。接合温度は、820〜860℃であることが好まし
い。
The metal component of the brazing material in the active metal brazing method contains silver and / or copper as a main component, and an active metal as a sub-component in order to ensure wettability with a ceramic substrate during melting. The active metal component reacts with the ceramic substrate to generate oxides and nitrides, and these products strengthen the bond between the brazing material and the ceramic substrate.
Specific examples of active metals include zirconium, titanium,
Hafnium, niobium, tantalum, vanadium and their compounds. Preferably, zirconium or a compound thereof is used, and particularly preferably, zirconium or a compound thereof is used in combination with titanium or a compound thereof. One example of these ratios is 1 to 7 parts by weight of active metal per 100 parts by weight of total of 69 to 95 parts by weight of silver and 5 to 31 parts by weight of copper. The joining temperature is preferably 820 to 860 ° C.

【0021】[0021]

【実施例】以下、本発明を実施例と比較例をあげて具体
的に説明する。
The present invention will be specifically described below with reference to examples and comparative examples.

【0022】比較例4 窒化アルミニウム粉末96重量部、イットリア4重量
部、オレイン酸2重量部を振動ミルにて予備混合した
後、エチルセルロース8重量部、グリセリントリオレー
ト3重量部及び水12重量部を配合しミキサーで混合を
行った。これを成型速度1.0/分、成型圧力55〜7
0kg/cm2 にて押出成型し、遠赤外線にて120
℃、5分間乾燥を行った後、480℃で10時間空気中
にて脱脂を行い、1920℃で30分間焼成を行った。
得られた窒化アルミニウム焼結体は、表面をホーニング
処理して清浄化した後、60mm×36mm×0.65
mmの窒化アルミニウム基板に加工した。
Comparative Example 4 96 parts by weight of aluminum nitride powder, 4 parts by weight of yttria, and 2 parts by weight of oleic acid were premixed in a vibration mill, and then 8 parts by weight of ethyl cellulose, 3 parts by weight of glycerin triolate and 12 parts by weight of water were added. They were blended and mixed with a mixer. The molding speed is 1.0 / min, the molding pressure is 55-7.
Extrusion molding at 0 kg / cm 2, 120 in far infrared
After drying at 5 ° C. for 5 minutes, degreasing was performed at 480 ° C. for 10 hours in the air, and baking was performed at 1920 ° C. for 30 minutes.
The obtained aluminum nitride sintered body was cleaned by a honing treatment on the surface, and then 60 mm × 36 mm × 0.65 mm.
mm of aluminum nitride substrate.

【0023】銀粉末90重量部、銅粉末10重量部、ジ
ルコニウム粉末3重量部、チタン粉末3重量部、テルピ
ネオール15重量部及びポリイソブチルメタアクリレー
トのトルエン溶液を固形分で5重量部加えて混練し、ろ
う材ペーストを調整した。これを上記窒化アルミニウム
基板の金属回路面(表面)にスクリーン印刷によってパ
ターン率=0.20のL字型パターンに塗布し、放熱面
側(裏面)には全面塗布した。その際の塗布量(乾燥
後)は9mg/cm2 とした。
90 parts by weight of silver powder, 10 parts by weight of copper powder, 3 parts by weight of zirconium powder, 3 parts by weight of titanium powder, 15 parts by weight of terpineol and 5 parts by weight of a toluene solution of polyisobutyl methacrylate are added and kneaded at 5 parts by weight. , Brazing material paste was adjusted. This was applied to the metal circuit surface (front surface) of the aluminum nitride substrate by screen printing to form an L-shaped pattern having a pattern ratio of 0.20, and the entire surface was applied to the heat dissipation surface side (back surface). The coating amount (after drying) at that time was 9 mg / cm 2 .

【0024】次いで、表面には60mm×36mm×
0.3mmの厚みをもつ銅板を、また裏面には60mm
×36mm×0.15mmの厚みを持つ銅板を接触配置
してから、真空度1×10-5Torr以下の真空下、温
度880℃で30分加熱した後、2℃/分の降温速度で
冷却して接合体を製造した。
Next, the surface has a size of 60 mm × 36 mm ×
A copper plate with a thickness of 0.3 mm and 60 mm on the back
A copper plate having a thickness of × 36 mm × 0.15 mm is placed in contact with the plate, heated at a temperature of 880 ° C. for 30 minutes under a vacuum of 1 × 10 −5 Torr or less, and then cooled at a rate of 2 ° C./min. Thus, a joined body was manufactured.

【0025】得られた窒化アルミニウム基板と銅板との
接合体の銅板上にUV硬化タイプのエッチングレジスト
をスクリーン印刷で塗布後、塩化第2銅溶液を用いてエ
ッチング処理を行って銅板不要部分を溶解除去し、さら
にエッチングレジストを5%苛性ソーダ溶液で剥離し
た。このエッチング処理後の接合体には、銅回路パター
ン間に残留不要ろう材や活性金属成分と窒化アルミニウ
ム基板との反応物があるので、それを温度60℃、10
%フッ化アンモニウム溶液に10分間浸漬して除去し
た。
A UV curing type etching resist is applied by screen printing on the obtained copper plate of the joined body of the aluminum nitride substrate and the copper plate, and then an etching process is performed using a cupric chloride solution to dissolve unnecessary portions of the copper plate. The resist was removed, and the etching resist was peeled off with a 5% sodium hydroxide solution. In the joined body after this etching treatment, there is a residual unnecessary brazing material or a reaction product between the active metal component and the aluminum nitride substrate between the copper circuit patterns.
It was immersed in a 10% ammonium fluoride solution for 10 minutes and removed.

【0026】これを更にショットブラストによる機械的
矯正を行って金属回路を有するセラミックス回路基板を
製造した。
This was further mechanically corrected by shot blasting to produce a ceramic circuit board having a metal circuit .

【0027】比較例1 ショットブラストによる機械的矯正を行わなかったこと
以外は、比較例4と同様にして金属回路を有するセラミ
ックス回路基板を製造した。
Comparative Example 1 A ceramic circuit board having a metal circuit was manufactured in the same manner as in Comparative Example 4 except that mechanical correction by shot blast was not performed.

【0028】比較例2 温度880℃で30分加熱するかわりに温度950℃で
30分加熱して接合体を製造したこと、及びショットブ
ラストによる機械的矯正を行わなかったこと以外は、
較例4と同様にして金属回路を有するセラミックス回路
基板を製造した。
[0028] It was prepared conjugate was heated 30 minutes at a temperature 950 ° C. Instead of heating 30 minutes in Comparative Example 2 Temperature 880 ° C., and except that not performed mechanical straightening by shot blasting, the ratio
A ceramic circuit board having a metal circuit was manufactured in the same manner as in Comparative Example 4 .

【0029】比較例3 接合後の降温速度を2℃/分とするかわりに8℃/分と
して接合体を製造したこと、及びショットブラストによ
る機械的矯正を行わなかったこと以外は、比較例4と同
様にして金属回路を有するセラミックス回路基板を製造
した。
Comparative Example 3 Comparative Example 4 was repeated except that a joined body was manufactured at a rate of 8 ° C./min instead of 2 ° C./min after joining, and that mechanical correction by shot blasting was not performed. In the same manner as in the above, a ceramic circuit board having a metal circuit was manufactured.

【0030】実施例1 窒化アルミニウム焼結体をホーニング処理した後、更に
大気中、温度1100℃で60分間酸化処理を行ってか
ら窒化アルミニウム基板を加工し、それを用いたこと以
外は、比較例4と同様にして本発明の金属回路を有する
セラミックス回路基板を製造した。
Example 1 A comparative example was performed except that the aluminum nitride sintered body was subjected to a honing treatment, and then subjected to an oxidation treatment at a temperature of 1100 ° C. for 60 minutes in the air, and then the aluminum nitride substrate was processed and used. In the same manner as in Example 4 , a ceramic circuit board having the metal circuit of the present invention was manufactured.

【0031】これら一連の処理を経て製作された回路基
板について、うねりを測定し、更に放熱側から押した場
合の3点曲げ強度を、スパン30mm、クロスヘッドス
ピード0.5mm/分の条件で測定した。また、気中、
−40℃×30分保持後、25℃×10分間放置、更に
125℃×30分保持後、25℃×10分間放置を1サ
イクルとして耐ヒートサイクル試験を行い、表面の銅回
路又は裏面の銅板が剥離開始した回数を測定した。これ
らの結果を表1に示す。
The undulation was measured on the circuit board manufactured through the above series of processes, and the three-point bending strength when pressed from the heat radiation side was measured under the conditions of a span of 30 mm and a crosshead speed of 0.5 mm / min. did. Also,
After holding at −40 ° C. × 30 minutes, leave at 25 ° C. × 10 minutes, and further hold at 125 ° C. × 30 minutes, and then perform a heat cycle resistance test with leaving at 25 ° C. × 10 minutes as one cycle. Was measured the number of times peeling started. Table 1 shows the results.

【0032】[0032]

【表1】 (注:回路基板の寸法は長さ60mm×幅36mmであ
るので、うねりの最大値を示す本発明の位置(最大値座
標)は、−15≦x≦15、−9≦y≦9の範囲であ
る。)
[Table 1] (Note: Since the dimensions of the circuit board are 60 mm long × 36 mm wide, the position (maximum coordinate) of the present invention showing the maximum value of the undulation is in the range of −15 ≦ x ≦ 15 and -9 ≦ y ≦ 9. Is.)

【0033】[0033]

【発明の効果】本発明によれば、ヒートサイクルに対す
る耐久性を一段と向上させた金属回路を有するセラミッ
クス回路基板を製造することができる。また、本発明に
よれば、セラミックス回路基板の上記耐久性は、製造さ
れたセラミックス回路基板のうねり状態をあらかじめ調
べることによって知ることができる。
According to the present invention, it is possible to manufacture a ceramic circuit board having a metal circuit with further improved durability against a heat cycle. In addition, the present invention
According to the above, the durability of the ceramic circuit board is
The undulation state of the ceramic circuit board
You can know by reading.

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭63−254031(JP,A) 特開 昭56−163093(JP,A) 特開 昭61−225047(JP,A) 特開 平6−164081(JP,A) 特開 平3−250688(JP,A) (58)調査した分野(Int.Cl.7,DB名) H05K 1/02 H05K 3/22 ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-63-254031 (JP, A) JP-A-56-169393 (JP, A) JP-A-61-225047 (JP, A) 164081 (JP, A) JP-A-3-250688 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) H05K 1/02 H05K 3/22

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 ホーニング処理後に酸化処理を行って、
アルミナを含む酸化表面を有する窒化アルミニウム基板
とした後、ジルコニウム又はその化合物とチタン又はそ
の化合物とを含む活性金属ろう材を用い、その表面には
厚み0.3mm以上の銅製の金属回路を、また裏面には
厚み0.2mm以下の銅製の金属放熱板を形成させ、次
いで機械的矯正を行うことを特徴とする金属回路を有す
セラミックス回路基板の製造方法。
An oxidation treatment is performed after the honing treatment,
After forming an aluminum nitride substrate having an oxidized surface containing alumina, using an active metal brazing material containing zirconium or a compound thereof and titanium or a compound thereof, a copper metal circuit having a thickness of 0.3 mm or more is formed on the surface, and A method of manufacturing a ceramic circuit board having a metal circuit, comprising forming a metal heat sink made of copper having a thickness of 0.2 mm or less on a back surface, and then performing mechanical correction.
【請求項2】 金属回路を有するセラミックス回路基板
が、単位長さ10mmあたりの変形量で定義されるうね
りがいかなる個所においても30μm以下であり、しか
も回路基板の長手(x軸)方向の長さをL、それとの交
差方向(y軸)の長さをWとし、回路基板の中央を原点
とした座標を設定した場合に、うねりの最大値を示す位
置が−L/4≦x≦L/4、−W/4≦y≦W/4の範
囲にあることを特徴とする請求項1記載のセラミックス
回路基板の製造方法。
2. A ceramic circuit board having a metal circuit, wherein the undulation defined by the deformation amount per unit length of 10 mm is 30 μm or less at any point, and the length of the circuit board in the longitudinal (x-axis) direction. Is set to L, the length in the direction (y-axis) intersecting with L is set to W, and when coordinates are set with the origin at the center of the circuit board, the position indicating the maximum value of the undulation is -L / 4 ≦ x ≦ L / 4. The method for manufacturing a ceramic circuit board according to claim 1, wherein -W / 4 ≦ y ≦ W / 4.
JP04514696A 1996-03-01 1996-03-01 Method for manufacturing ceramic circuit board having metal circuit Expired - Fee Related JP3342797B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP04514696A JP3342797B2 (en) 1996-03-01 1996-03-01 Method for manufacturing ceramic circuit board having metal circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP04514696A JP3342797B2 (en) 1996-03-01 1996-03-01 Method for manufacturing ceramic circuit board having metal circuit

Publications (2)

Publication Number Publication Date
JPH09246675A JPH09246675A (en) 1997-09-19
JP3342797B2 true JP3342797B2 (en) 2002-11-11

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ID=12711151

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Country Link
JP (1) JP3342797B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5038565B2 (en) * 2000-09-22 2012-10-03 株式会社東芝 Ceramic circuit board and manufacturing method thereof
WO2020044594A1 (en) * 2018-08-28 2020-03-05 三菱マテリアル株式会社 Copper/ceramic bonded body, insulation circuit board, method for producing copper/ceramic bonded body, and method for manufacturing insulation circuit board

Also Published As

Publication number Publication date
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