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JP3346858B2 - Cap for semiconductor device - Google Patents
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JP3346858B2 - Cap for semiconductor device - Google Patents

Cap for semiconductor device

Info

Publication number
JP3346858B2
JP3346858B2 JP30504693A JP30504693A JP3346858B2 JP 3346858 B2 JP3346858 B2 JP 3346858B2 JP 30504693 A JP30504693 A JP 30504693A JP 30504693 A JP30504693 A JP 30504693A JP 3346858 B2 JP3346858 B2 JP 3346858B2
Authority
JP
Japan
Prior art keywords
film
cap
light
electrolytic
plating film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP30504693A
Other languages
Japanese (ja)
Other versions
JPH077098A (en
Inventor
猛 依田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinko Electric Industries Co Ltd
Original Assignee
Shinko Electric Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinko Electric Industries Co Ltd filed Critical Shinko Electric Industries Co Ltd
Priority to JP30504693A priority Critical patent/JP3346858B2/en
Publication of JPH077098A publication Critical patent/JPH077098A/en
Application granted granted Critical
Publication of JP3346858B2 publication Critical patent/JP3346858B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

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  • Light Receiving Elements (AREA)
  • Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)
  • Optical Elements Other Than Lenses (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は半導体装置用キャップに
関する。
The present invention relates to relates <br/> the cap for a semiconductor device.

【0002】[0002]

【従来の技術】LD(レーザーディスク)用の投受光装
置は、これが組み込まれる家電製品等が小型化すること
により、必然的に小型化の要請が強い。図4は上記の投
受光装置であり、ステム10の所要個所に投光用のレー
ザー素子11、受光用のレーザー素子12が搭載され、
これら素子を硬質ガラス等からなる光透過用窓体13を
有するキャップ14にて気密に封止している。15はレ
ーザ素子11、12に対応するモニター素子である。光
透過用窓体13はキャップ本体17の透孔18を覆って
低融点ガラス16にて溶着されている。19はホログラ
ムガラスである。
2. Description of the Related Art In a light emitting / receiving device for an LD (laser disk), there is a strong demand for downsizing as home appliances and the like into which the device is incorporated are downsized. FIG. 4 shows the light emitting and receiving device described above, in which a light emitting laser element 11 and a light receiving laser element 12 are mounted on required portions of a stem 10.
These elements are hermetically sealed with a cap 14 having a light transmitting window 13 made of hard glass or the like. Reference numeral 15 denotes a monitor element corresponding to the laser elements 11 and 12. The light transmission window 13 covers the through hole 18 of the cap body 17 and is welded with a low melting point glass 16. 19 is a hologram glass.

【0003】[0003]

【発明が解決しようとする課題】LD用の投受光装置は
従来、投光用、受光用がそれぞれ別個に設けられていた
が、昨今において、上記のように小型化の要請等から共
通のステム上に素子を搭載した投受光兼用の装置が開発
されている。このように装置が小型化していること、ま
た投受光兼用のものになってきていることで最大の問題
は、特に受光の際の迷光による誤動作の問題である。な
お、図5は光透過用窓体を有しないタイプのレーザ素子
搭載装置を示す。この装置ではホログラムガラス19を
樹脂系接着剤でキャップ本体17に接着保持している。
このように光透過用窓体を有しないキャップ14の場合
も上述したと同様な迷光による問題がある。
Conventionally, a light emitting and receiving device for an LD has been provided separately for light emitting and light receiving. However, in recent years, as described above, a common stem is required due to a demand for miniaturization. A device that is capable of transmitting and receiving light with an element mounted thereon has been developed. As described above, the biggest problem due to the miniaturization of the device and the fact that the device is used for both light emission and light reception is a problem of malfunction due to stray light particularly at the time of light reception. FIG. 5 shows a laser device mounting device of a type having no light transmission window. In this apparatus, the hologram glass 19 is bonded and held to the cap body 17 with a resin-based adhesive.
Thus, even in the case of the cap 14 having no light transmission window, there is a problem due to the same stray light as described above.

【0004】そこで、本発明は上記問題点を解決すべく
なされたものであり、その目的とするところは、反射光
を吸収し、迷光を防止できるとともに寿命が長く信頼性
の高い半導体装置用キャップを提供するにある。
Accordingly, the present invention has been made to solve the above problems, and it is an object of the present invention to absorb reflected light, prevent stray light, and have a long service life.
To provide a cap for a semiconductor device with high reliability.

【0005】[0005]

【課題を解決するための手段】本発明は上記目的を達成
するため次の構成を備える。すなわち、光用の透孔が形
成され、前記透孔を覆うように鉛成分を含有する低融点
ガラスにより光透過用窓体が溶着されるとともにキャッ
プ本体に耐蝕下地めっき皮膜が形成され、前記光透過用
窓体の表面を除いて、前記キャップ本体に設けられた
蝕下地めっき皮膜の外部に露出する部位の全面、および
記低融点ガラスの外部に露出する部位の全面が、黒色
ニッケルめっきが施されて析出した黒色ニッケルめっき
皮膜により被覆されていることを特徴とする。また、前
記耐蝕下地めっき皮膜が電解ニッケル皮膜、無電解ニッ
ケル皮膜、電解ニッケル−リン皮膜または電解ニッケル
−ボロン皮膜であることを特徴とする。また、前記黒色
ニッケルめっき皮膜が、電解黒色ニッケル皮膜または電
解錫−ニッケル皮膜であることを特徴とする。
The present invention has the following arrangement to achieve the above object. That is, a light-transmitting hole is formed, a light-transmitting window body is welded with a low-melting glass containing a lead component so as to cover the light-transmitting hole, and a corrosion-resistant base plating film is formed on the cap body. except for the surface of the transmitting window member, to expose the entire surface of the portion exposed to the outside of the resistance <br/>蝕下locations plating film provided on the cap body, and <br/> outside before Symbol low melting glass The entire surface of the portion is covered with a black nickel plating film deposited and deposited by black nickel plating. Further, the corrosion-resistant base plating film is an electrolytic nickel film, an electroless nickel film, an electrolytic nickel-phosphorous film, or an electrolytic nickel-boron film. Further, the black nickel plating film is an electrolytic black nickel film or an electrolytic tin-nickel film.

【0006】[0006]

【作用】本発明に係る半導体装置用キャップによれば、
キャップ本体に設けた耐蝕下地めっき皮膜の外面、およ
び光透過用窓体を溶着している低融点ガラスの露出する
面が、黒色ニッケルめっきが施されて析出した黒色ニッ
ケルめっき皮膜により被覆されていることから、光反射
を防止して迷光の発生を極力防止でき、信頼性の高い半
導体装置用キャップを提供できる。また、キャップ本体
に光透過用窓体を溶着する低融点ガラスの表面に析出し
た黒色ニッケルめっき皮膜が、低融点ガラスの保護膜と
して作用し、寿命の長い半導体装置用キャップを提供で
きる。
According to the semiconductor device cap of the present invention,
The outer surface of the corrosion-resistant base plating film provided on the cap body, and
Exposure of the low-melting-point glass that has fused the light-transmitting window
Since the surface is covered with the black nickel plating film that has been subjected to black nickel plating and deposited , light reflection can be prevented, stray light can be prevented as much as possible, and a highly reliable semiconductor device cap can be provided. Further, deposited on the surface of the low melting point glass welding the light transmitting window body caps body
The black nickel plating film acts as a protective film for the low-melting glass, thereby providing a long-life semiconductor device cap.

【0007】[0007]

【実施例】以下、本発明の好適な実施例を添付図面に基
づいて詳細に説明する。図1は光透過用窓体付のレーザ
素子搭載装置用キャップの第1の実施例を示す。21は
キャップ本体であり、鉄−ニッケル合金、鉄−ニッケル
−コバルト合金等の金属からなる。キャップ本体21の
上面には透孔22が形成されている。キャップ本体21
には、まずその表面に耐蝕下地めっき皮膜23が形成さ
れる。この耐蝕下地めっきとしては電解ニッケルめっ
き、電解ニッケル−リンめっき、電解ニッケル−ボロン
めっき、あるいは無電解ニッケルめっきが好適である。
耐蝕下地めっき皮膜23の厚さは特に限定されないが、
2〜7μm程度でよい。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will be described below in detail with reference to the accompanying drawings. FIG. 1 shows a first embodiment of a laser device mounting device cap with a light transmitting window. Reference numeral 21 denotes a cap body made of a metal such as an iron-nickel alloy and an iron-nickel-cobalt alloy. A through hole 22 is formed in the upper surface of the cap body 21. Cap body 21
First, a corrosion-resistant underlying plating film 23 is formed on the surface. As the corrosion-resistant base plating, electrolytic nickel plating, electrolytic nickel-phosphorus plating, electrolytic nickel-boron plating, or electroless nickel plating is preferable.
Although the thickness of the corrosion-resistant base plating film 23 is not particularly limited,
It may be about 2 to 7 μm.

【0008】次いでキャップ本体21の透孔22を覆う
ように硬質ガラス等からなる光透過用窓体25が低融点
ガラス24により溶着される。この溶着温度は450〜
500℃程度である。このように光透過用窓体25を溶
着したキャップ本体21に電解黒色ニッケルめっきを施
し黒色ニッケルめっき皮膜26を形成する。電解黒色ニ
ッケルめっきには添加剤に硫化亜鉛を含むものや電解錫
−ニッケルめっきなどがある。低融点ガラス24中には
鉛成分が多く含有されているから、黒色ニッケルめっき
皮膜26は耐蝕下地めっき皮膜23上ばかりでなく、低
融点ガラス24の表面上にも析出し、薄い皮膜が形成さ
れる。電解黒色ニッケルめっきによる黒色ニッケルめっ
き皮膜26があまり厚いとキャップをステムに抵抗溶接
等で固定するキャッピングの際の障害となるので、その
厚さは0.1〜1.0μm程度が好適である。
Next, a light-transmitting window 25 made of hard glass or the like is welded with a low-melting glass 24 so as to cover the through-hole 22 of the cap body 21. This welding temperature is 450 ~
It is about 500 ° C. Electrolytic black nickel plating is applied to the cap body 21 to which the light transmitting window 25 is welded to form a black nickel plating film 26. Electrolytic black nickel plating includes zinc sulfide as an additive and electrolytic tin-nickel plating. Since the low-melting glass 24 contains a large amount of lead, the black nickel plating film 26 is deposited not only on the corrosion-resistant underlying plating film 23 but also on the surface of the low-melting glass 24 to form a thin film. You. If the black nickel plating film 26 formed by electrolytic black nickel plating is too thick, it becomes an obstacle in capping when the cap is fixed to the stem by resistance welding or the like. Therefore, the thickness is preferably about 0.1 to 1.0 μm.

【0009】上記のようにして作製したキャップをステ
ムにレーザー溶接により固定し、投受光特性を調べたと
ころ、特に受光の際、入光された光の反射光がキャップ
本体21の黒化処理された内面にて吸収され、迷光の発
生を防止できた。そして、通常、低融点ガラス24は湿
気等に弱く、経時的に徐々に気密性が劣化する傾向にあ
るが、本実施例では上記したように低融点ガラス24上
にも黒色ニッケルめっき皮膜26が形成されることか
ら、該皮膜が低融点ガラス24の保護膜として作用し、
低融点ガラス24の耐候性が格段に向上し、光装置の寿
命特性が改善された。
When the cap produced as described above was fixed to the stem by laser welding and the light emitting and receiving characteristics were examined, the reflected light of the incident light was subjected to a blackening treatment of the cap body 21 especially at the time of light reception. It was absorbed by the inner surface, and stray light was prevented from being generated. Usually, the low melting point glass 24 is vulnerable to moisture and the like, and the airtightness tends to gradually deteriorate with time. However, in this embodiment, as described above, the black nickel plating film 26 Since the film is formed, the film acts as a protective film for the low-melting glass 24,
The weather resistance of the low-melting glass 24 was significantly improved, and the life characteristics of the optical device were improved.

【0010】図2はレーザ素子搭載装置用キャップの第
2の実施例を示す。本実施例では、キャップ本体21を
炉中に入れて加熱して酸化し、表面に酸化皮膜(図示せ
ず)を形成し、この酸化皮膜を介して光透過用窓体25
を低融点ガラス24にてキャップ本体21に溶着する。
低融点ガラス24と酸化膜とのなじみがよいことから、
低融点ガラス24とキャップ本体21との密着性が良好
となる。
FIG. 2 shows a second embodiment of a cap for a laser device mounting apparatus. In this embodiment, the cap main body 21 is placed in a furnace and heated and oxidized to form an oxide film (not shown) on the surface.
Is welded to the cap body 21 with the low melting point glass 24.
Because the affinity between the low melting point glass 24 and the oxide film is good,
The adhesion between the low melting point glass 24 and the cap body 21 is improved.

【0011】次いで、低融点ガラス24が溶着した部分
以外の酸化膜を除去した後、キャップ本体21の露出し
た表面上に耐蝕下地めっき皮膜23を形成する。耐蝕下
地めっき皮膜23は前記実施例と同様の電解ニッケルめ
っき皮膜等とする。そして前記実施例と同様にして、耐
蝕下地めっき皮膜23並びに低融点ガラス24上に黒色
ニッケルめっき皮膜26を形成する。黒色ニッケルめっ
きは電解黒色ニッケルめっき、電解錫−ニッケルめっき
などによる。本実施例の場合も、耐蝕下地めっき皮膜2
3および低融点ガラス24上に黒色ニッケルめっき皮膜
26が設けられるから、実施例1と同様に迷光の発生を
有効に防止することができる。また、黒色ニッケルめっ
き皮膜26が低融点ガラス24の保護膜として作用する
点も同様である。
Next, after removing the oxide film other than the portion where the low melting point glass 24 is welded, a corrosion-resistant base plating film 23 is formed on the exposed surface of the cap body 21. The corrosion-resistant underlying plating film 23 is an electrolytic nickel plating film similar to that of the above-described embodiment. Then, a black nickel plating film 26 is formed on the corrosion-resistant base plating film 23 and the low-melting glass 24 in the same manner as in the above embodiment. Black nickel plating is performed by electrolytic black nickel plating, electrolytic tin-nickel plating, or the like. Also in the case of this embodiment, the corrosion-resistant underlying plating film 2
Since the black nickel plating film 26 is provided on the low melting point glass 3 and the low melting point glass 24, the generation of stray light can be effectively prevented as in the first embodiment. Also, the black nickel plating film 26 functions as a protective film for the low-melting glass 24 in the same manner.

【0012】図3はレーザ素子搭載装置用キャップで光
透過用窓体を有しない例を示す。この例では、まずキャ
ップ本体21に電解ニッケルめっき、あるいは電解ニッ
ケル−リンめっき等の耐蝕下地めっきを施し、さらに黒
色ニッケルめっきを施した後、加熱処理して製品とす
る。耐蝕下地めっき皮膜23の厚さは2〜7μm程度で
よい。また、黒色ニッケルめっきは上記実施例と同様に
電解黒色ニッケルめっき、電解錫−ニッケルめっき等が
使用できる。黒色ニッケルめっき皮膜26の厚さは0.
1〜1.0μm程度が好適である。
[0012] Figure 3 shows an unusual such has a light transmitting window member with a laser device mounting device cap. Example of this, first, electrolytic nickel plating to the cap body 21, or electroless nickel - subjected to corrosion undercoat plating such phosphorus plating, after further subjected to black nickel plating, heat treatment to the product. The thickness of the corrosion-resistant base plating film 23 may be about 2 to 7 μm. As for the black nickel plating, electrolytic black nickel plating, electrolytic tin-nickel plating or the like can be used in the same manner as in the above embodiment. The thickness of the black nickel plating film 26 is 0.
About 1 to 1.0 μm is preferable.

【0013】この例では黒色ニッケルめっきを施した後
に加熱処理を施すが、これは、レーザ素子を実装した
後、加熱状態になった際にめっき膜から水蒸気を含む酸
化性ガスが発生することを防止することを目的とする。
実際には大気中で150℃、60分の熱処理を行った。
このように加熱処理を施すことによってめっき皮膜から
のガスの発生を防止し、レーザ素子搭載装置の信頼性を
向上させることができる。なお、この加熱処理は前述し
た光透過用窓体を有するキャップについても同様に適用
して有効である。本レーザ素子搭載装置用キャップも上
記実施例と同様にキャップの表面に黒色ニッケルめっき
皮膜26を設けたことによって迷光の発生を効果的に防
止することができた。
In this example, the heat treatment is performed after the black nickel plating is performed. This is because the oxidizing gas containing water vapor is generated from the plating film when the laser element is heated after being mounted. The purpose is to prevent it.
Actually, heat treatment was performed at 150 ° C. for 60 minutes in the atmosphere.
By performing the heat treatment in this manner, generation of gas from the plating film can be prevented, and the reliability of the laser device mounting device can be improved. Note that this heat treatment is also effectively applied to the cap having the above-described light transmitting window. This Les chromatography The device mounting device cap also able to effectively prevent the occurrence of stray light by providing the black nickel plating film 26 on the surface of the cap as in the above embodiment.

【0014】上記各実施例において示したレーザ素子搭
載装置用キャップは、投受光兼用の装置ばかりでなく、
投光用、受光用専用の装置にも用いることができること
はもちろんである。またキャップ本体21の内面は鏡面
でなく、梨地加工等により表面を粗面にすることでさら
に光の吸収性を向上させることができる。
The cap for the laser device mounting device shown in each of the above embodiments is not only a device for both light emission and light reception, but also
Needless to say, the present invention can also be used for a device dedicated to light projection and light reception. Further, the inner surface of the cap body 21 is not a mirror surface, but the surface can be made rough by satin processing or the like to further improve the light absorption.

【0015】[0015]

【発明の効果】本発明に係る半導体装置用キャップは、
上述したように、キャップ本体に設けた耐蝕下地めっき
皮膜の外面、および光透過用窓体を溶着している低融点
ガラスの露出する面が、黒色ニッケルめっきにより析出
した黒色ニッケルめっき皮膜によって被覆されることに
より、光反射を防止して迷光の発生を極力防止すること
ができ、誤動作等を防止することができる。また、透
を覆うようにキャップ本体に光透過用窓体を溶着する低
融点ガラスの表面に析出した黒色ニッケルめっき皮膜が
低融点ガラスの保護膜として作用する結果、低融点ガラ
スの耐候性を向上させ寿命の長い半導体装置用キャップ
として提供できる等の著効を奏する。
According to the present invention, there is provided a semiconductor device cap comprising:
As described above, the corrosion-resistant base plating provided on the cap body
Low melting point welding the outer surface of the film and the window for light transmission
Exposed surface of glass is deposited by black nickel plating
Covered with a black nickel plating film
Thus, light reflection can be prevented, stray light can be prevented as much as possible, and malfunctions and the like can be prevented. As a result of black nickel plating film deposited on the surface of the low melting point glass welding the light transmitting window member to the cap body so as to cover the permeable hole acts as a protective film of low-melting glass, low-melting glass
Long life semiconductor device cap with improved weather resistance
It has a significant effect such as being able to be provided as

【図面の簡単な説明】[Brief description of the drawings]

【図1】レーザ素子搭載装置用キャップの実施例を示す
断面図である。
FIG. 1 is a sectional view showing an embodiment of a cap for a laser device mounting apparatus.

【図2】レーザ素子搭載装置用キャップの実施例を示す
断面図である。
FIG. 2 is a sectional view showing an embodiment of a cap for a laser device mounting apparatus.

【図3】 レーザ素子搭載装置用キャップの例を示す断
面図である。
FIG. 3 is a cross-sectional view illustrating an example of a cap for a laser element mounting device.

【図4】従来のレーザ素子搭載装置の断面図である。FIG. 4 is a sectional view of a conventional laser device mounting apparatus.

【図5】従来のレーザ素子搭載装置の断面図である。FIG. 5 is a sectional view of a conventional laser device mounting apparatus.

【符号の説明】[Explanation of symbols]

21 キャップ本体 22 透孔 23 耐蝕下地めっき皮膜 24 低融点ガラス 25 光透過用窓体 26 黒色ニッケルめっき皮膜 DESCRIPTION OF SYMBOLS 21 Cap main body 22 Through-hole 23 Corrosion-resistant base plating film 24 Low-melting glass 25 Light transmission window 26 Black nickel plating film

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) H01L 23/04 G02B 5/00 H01L 23/02 H01L 31/0232 H01L 31/12 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int. Cl. 7 , DB name) H01L 23/04 G02B 5/00 H01L 23/02 H01L 31/0232 H01L 31/12

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 光用の透孔が形成され、前記透孔を覆う
ように鉛成分を含有する低融点ガラスにより光透過用窓
体が溶着されるとともにキャップ本体に耐蝕下地めっき
皮膜が形成され、 前記光透過用窓体の表面を除いて、 前記キャップ本体に設けられた耐蝕下地めっき皮膜の
部に露出する部位の全面、 および前記低融点ガラスの外部に露出する部位の全面
が、 黒色ニッケルめっきが施されて析出した黒色ニッケルめ
っき皮膜により被覆されていることを特徴とする半導体
装置用キャップ。
A light-transmitting window is welded to the light-transmitting window with a low-melting glass containing a lead component so as to cover the light-transmitting hole, and a corrosion-resistant underlying plating film is formed on the cap body. Except for the surface of the light transmitting window body, the outside of the corrosion-resistant underlying plating film provided on the cap body
Site of the entire surface exposed to the parts, and before Symbol entire region exposed to the outside of the low-melting glass
But the semiconductor device cap, characterized in that the black nickel plating is covered with black nickel plating film deposited is subjected.
【請求項2】 耐蝕下地めっき皮膜が、電解ニッケル皮
膜、無電解ニッケル皮膜、電解ニッケル−リン皮膜また
は電解ニッケル−ボロン皮膜であることを特徴とする請
求項1記載の半導体装置用キャップ。
2. The cap for a semiconductor device according to claim 1, wherein the corrosion-resistant underlying plating film is an electrolytic nickel film, an electroless nickel film, an electrolytic nickel-phosphorous film, or an electrolytic nickel-boron film.
【請求項3】 黒色ニッケルめっき皮膜が、電解黒色ニ
ッケル皮膜または電解錫−ニッケル皮膜であることを特
徴とする請求項1または2記載の半導体装置用キャッ
プ。
3. The cap for a semiconductor device according to claim 1, wherein the black nickel plating film is an electrolytic black nickel film or an electrolytic tin-nickel film.
JP30504693A 1993-01-06 1993-12-06 Cap for semiconductor device Expired - Fee Related JP3346858B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30504693A JP3346858B2 (en) 1993-01-06 1993-12-06 Cap for semiconductor device

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP1693593 1993-01-06
JP5-16935 1993-01-06
JP30504693A JP3346858B2 (en) 1993-01-06 1993-12-06 Cap for semiconductor device

Publications (2)

Publication Number Publication Date
JPH077098A JPH077098A (en) 1995-01-10
JP3346858B2 true JP3346858B2 (en) 2002-11-18

Family

ID=26353385

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30504693A Expired - Fee Related JP3346858B2 (en) 1993-01-06 1993-12-06 Cap for semiconductor device

Country Status (1)

Country Link
JP (1) JP3346858B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4519424B2 (en) 2003-06-26 2010-08-04 ルネサスエレクトロニクス株式会社 Resin mold type semiconductor device
JP2007094049A (en) * 2005-09-29 2007-04-12 Shinko Electric Ind Co Ltd Optical component cap and method of manufacturing the same

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
日本プレーティング協会,現場技術者のための実用めっき(▲I▼),日本,槇書店,1989年 7月10日,p.194

Also Published As

Publication number Publication date
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