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JP3354267B2 - Semiconductor memory - Google Patents
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JP3354267B2 - Semiconductor memory - Google Patents

Semiconductor memory

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Publication number
JP3354267B2
JP3354267B2 JP02098494A JP2098494A JP3354267B2 JP 3354267 B2 JP3354267 B2 JP 3354267B2 JP 02098494 A JP02098494 A JP 02098494A JP 2098494 A JP2098494 A JP 2098494A JP 3354267 B2 JP3354267 B2 JP 3354267B2
Authority
JP
Japan
Prior art keywords
power supply
supply line
common
divided
memory cell
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP02098494A
Other languages
Japanese (ja)
Other versions
JPH07230699A (en
Inventor
洋一 鈴木
真 瀬川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP02098494A priority Critical patent/JP3354267B2/en
Publication of JPH07230699A publication Critical patent/JPH07230699A/en
Application granted granted Critical
Publication of JP3354267B2 publication Critical patent/JP3354267B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • For Increasing The Reliability Of Semiconductor Memories (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
  • Semiconductor Memories (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、不良メモリセルを救済
する冗長セルを有する半導体メモリに関するもので、特
にスタンバイ時の電流の低減化が要求されるメモリに使
用されるものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor memory having a redundant cell for repairing a defective memory cell, and more particularly to a semiconductor memory which requires a reduction in a standby current.

【0002】[0002]

【従来の技術】半導体メモリにおいては、待機時(スタ
ンバイ時)の電流消費の低減化が要求される場合が多
い。即ちメモリセルにおいては、正常に動作して機能的
な問題ないが、リーク電流が、許容値よりも多く流れる
場合がある。この様なメモリセルが存在すると、スタン
バイ時の電流が増加してしまうので、不良メモリセルと
みなして不使用とし、冗長メモリセルと切り替えるのが
望ましい。
2. Description of the Related Art Semiconductor memories are often required to reduce current consumption during standby (standby). That is, although the memory cell operates normally and has no functional problem, a leak current may flow more than an allowable value. If such a memory cell is present, the current at the time of standby increases. Therefore, it is desirable that the memory cell is regarded as a defective memory cell, is not used, and is switched to a redundant memory cell.

【0003】図7は、この様な不都合を防止する従来の
手段を示す。図7において、1は、行方向に並んだメモ
リセル、2は、セルよう共通電源線、3は、電源電圧V
ccを共通電源線2に供給する電源端子、4はヒューズ
である。
FIG. 7 shows a conventional means for preventing such inconvenience. In FIG. 7, 1 is a memory cell arranged in the row direction, 2 is a common power supply line, and 3 is a power supply voltage V.
A power supply terminal for supplying cc to the common power supply line 2 and a fuse 4 are provided.

【0004】ここで、許容値以上にリーク電流が生じる
メモリセルを、テスタを用いて発見し、その不良とみな
せるメモリセルと電源端子3との間に接続されているレ
ーザ・ヒューズ4を溶断することによって、リーク経路
を断つことにより、予備(冗長)のメモリセルに置き換
えている。また近時、メモリ容量の増大化が行われてお
り、そのようなために共通電源線2の配線抵抗が大きく
なると、各メモリセル1への電源電圧供給が、端子3か
ら遠距離になるにしたがって低下するため、動作マージ
ンの低下をおこし、問題である。つまり、近時メモリ容
量が大容量化されており、共通電源線2が長尺化される
ことからも問題である。
[0004] Here, a memory cell in which a leak current exceeding the allowable value is found is found by using a tester, and the laser fuse 4 connected between the power supply terminal 3 and the memory cell which can be regarded as a defect is blown. As a result, the memory cell is replaced with a spare (redundant) memory cell by cutting off the leak path. Recently, the memory capacity has been increased, and when the wiring resistance of the common power supply line 2 increases due to such a situation, the supply of the power supply voltage to each memory cell 1 becomes longer from the terminal 3. As a result, the operation margin is reduced, which is a problem. That is, there is a problem in that the memory capacity has recently been increased, and the common power supply line 2 has been lengthened.

【0005】[0005]

【発明が解決しようとする課題】本発明は、上記実情に
鑑みてなされたもので、メモリセルがマトリクス状に配
置されたメモリセル・アレイを有する半導体メモリにお
いて、行方向に並ぶメモリセルへ電源供給する共通電源
線の配線抵抗の増大による電源電圧の低下およびチップ
サイズの増大を招くことなく、リーク電流が許容値より
も大きいメモリセルを冗長セルへ置き換え可能で、かつ
安定した動作を期待できるようにしたものである。
SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and in a semiconductor memory having a memory cell array in which memory cells are arranged in a matrix, power is supplied to memory cells arranged in a row direction. A memory cell having a leak current larger than an allowable value can be replaced with a redundant cell, and stable operation can be expected without causing a decrease in power supply voltage and an increase in chip size due to an increase in wiring resistance of a common power supply line to be supplied. It is like that.

【0006】[0006]

【課題を解決するための手段と作用】本発明は、メモリ
セルがマトリクス状に配置されたメモリセル・アレイを
有する半導体メモリにおいて、行方向にある複数のメモ
リセルへ共通に電源を供給する形でN(Nは1以上の整
数)分割され、一端側から他端側へ電源を供給する共通
電源線と、この共通電源線をN分割して得られる各分割
電源線の隣接相互間にそれぞれ介在され、前記電源の供
給を行う一端側から見て近い方に隣接した分割電源線か
らの電圧を増幅することにより得た電源電圧レベルを、
前記電源の供給端から見て遠い方に隣接した分割電源線
へ供給させる電源電圧供給手段と、前記共通電源線の一
端側の電源供給端とこの電源供給端から数えて1番目に
位置した分割電源線との間に介在されたヒューズと、こ
のヒューズを切断して後、前記共通電源線を接地電位に
保持する電位保持手段と、前記ヒューズの切断後、その
ヒューズを切断した行の代りに用いる冗長セルとを具備
したことを特徴とする半導体メモリである。
According to the present invention, there is provided a semiconductor memory having a memory cell array in which memory cells are arranged in a matrix form, wherein power is commonly supplied to a plurality of memory cells in a row direction. (N is an integer of 1 or more), and a common power supply line for supplying power from one end to the other end, and a common power supply line obtained by dividing the common power supply line into N portions between adjacent ones of the divided power supply lines. A power supply voltage level obtained by amplifying a voltage from a divided power supply line that is interposed and is closer to one side as viewed from one end side that supplies the power,
A power supply voltage supply means for supplying power to a divided power supply line which is farther from the power supply supply end, a power supply supply end on one end side of the common power supply line, and a division located first from the power supply supply end A fuse interposed between the power supply line and a potential holding means for holding the common power supply line at a ground potential after cutting the fuse; and And a redundant cell to be used.

【0007】即ち本発明は、共通電源線をN分割して、
その分割点の境目毎にそれらをつなぐごとく、増副作用
を行う電源電圧供給手段を設け、該手段から見て電源供
給端に近い方の分割電源線からの降下電源電圧を降下前
の電源電圧まで上昇させて、電源供給端から遠い側の電
圧低下を防止することにより、行方向に渡る各メモリセ
ルへの供給電源電圧を高く保持する。このため、各メモ
リセルでの動作が確実となり、かつ動作の過渡応答にお
いても電源の変動をおさえることができ、しかもヒュー
ズ切断後は、共通電源線を接地電位に保持し続けるよう
にして、ヒューズを切断した共通電源線のフローティン
グ状態をなくするなどのことから、動作の安定化を期待
できる。また、複数本の行選択線については、1本の共
通電源線、1個のヒューズの使用で済ませるので、チッ
プ占有面積を縮小化が可能となると共に、切断すべきヒ
ューズの数が極少となって、信頼性が向上する。このこ
とは、近時の大容量メモリ化のもとでは、一本の共通電
源線、行選択線に付随するメモリセル数が多くなるた
め、もしヒューズの数が多くなって、ヒューズの切断回
数が多くなると、信頼性が低下することからもいえるこ
とである。
That is, according to the present invention, the common power supply line is divided into N parts,
Power supply voltage supply means for increasing the side effect is provided so as to connect them at each boundary of the division point, and the power supply voltage dropped from the divided power supply line closer to the power supply end as viewed from the means is reduced to the power supply voltage before dropping. The power supply voltage to each memory cell in the row direction is kept high by raising the voltage to prevent a voltage drop on the side remote from the power supply end. For this reason, the operation of each memory cell is ensured, and the fluctuation of the power supply can be suppressed even in the transient response of the operation. Since the floating state of the common power supply line, which has been disconnected, is eliminated, the operation can be stabilized. Further, since a single common power supply line and a single fuse can be used for a plurality of row selection lines, the area occupied by the chip can be reduced, and the number of fuses to be cut becomes extremely small. And the reliability is improved. This is because the number of memory cells attached to one common power supply line and row selection line increases under the recent trend of large-capacity memory, and if the number of fuses increases, the number of fuse cuts increases. This can be said from the fact that as the number increases, the reliability decreases.

【0008】[0008]

【実施例】以下図面を参照して本発明の実施例を説明す
る。図1は、メモリセルがマトリクス状に配列されたメ
モリセル・アレイにおいて、行方向にあるメモリセルが
付随する共通電源線の1列のみを示したもので、図7の
ものに対応させた場合の例である。このため、図1にお
いて図7のものと対応する箇所には同一符号を付してお
く。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 shows only one column of a common power supply line accompanied by memory cells in a row direction in a memory cell array in which memory cells are arranged in a matrix, and corresponds to FIG. This is an example. Therefore, in FIG. 1, the same reference numerals are given to portions corresponding to those in FIG.

【0009】図1では、共通電源線2を2分割した場合
の例である。その分割電源線2aと2bとの分割点の境
目は、電源電圧供給手段11で接続される。この手段1
1は、ここではCMOSインバータ11a、11bを縦
続接続したものを用いている。CMOSインバータは、
通常、その電源Vcc側にPMOSトランジスタが、配
置されるため、CMOSインバータ出力端に電源Vcc
レベルが得られて、好ましい。
FIG. 1 shows an example in which the common power supply line 2 is divided into two parts. The boundary of the division point between the divided power supply lines 2a and 2b is connected by the power supply voltage supply means 11. This means 1
1 uses a CMOS inverter 11a, 11b cascaded here. CMOS inverters
Usually, since a PMOS transistor is arranged on the power supply Vcc side, the power supply Vcc is connected to the output terminal of the CMOS inverter.
Levels are obtained and preferred.

【0010】電源Vccの供給端子3に接続されるヒュ
ーズ4と該ヒューズに一番近いメモリセル1との間の分
割電源線2aには、共通電源線2を接地電位に保持する
電位保持手段12の出力端12aが接続されている。こ
の手段12は、トランジスタ13〜15の部分のフリッ
プフロップ部と、カップリング容量16からなってい
る。この手段12の動作は、ヒューズ4が切断されてい
ない状態では、端子3からヒューズ4を介して電源Vc
c(“1”)レベルが供給され続け、反対側のノード1
2bは“0”レベルになっている。一方、図1のメモリ
セル1のいずれかにリーク不良が検出されたときは、レ
ーザ溶断等によって、ヒューズ4を切断し、冗長セルと
の切り替えを行う。尚、ヒューズ4を切断するときは、
電源Vccの印加は一切なされていない。よって、ヒュ
ーズ4の切断後に電源Vccが再投入されると、容量1
6を介してノード12bが“1”レベルとなり、ノード
12aが“0”つまり接地レベルに保持され続け、共通
電源線2は接地レベルに保持され続けるものである。
A divided power supply line 2a between the fuse 4 connected to the supply terminal 3 of the power supply Vcc and the memory cell 1 closest to the fuse has a potential holding means 12 for holding the common power supply line 2 at the ground potential. Are connected to the output terminal 12a. The means 12 includes a flip-flop portion corresponding to transistors 13 to 15 and a coupling capacitor 16. The operation of this means 12 is such that when the fuse 4 is not blown, the power supply Vc from the terminal 3 via the fuse 4
c (“1”) level continues to be supplied, and the other node 1
2b is at the “0” level. On the other hand, when a leak failure is detected in any of the memory cells 1 in FIG. 1, the fuse 4 is cut by laser fusing or the like, and switching to the redundant cell is performed. When cutting the fuse 4,
The power supply Vcc is not applied at all. Therefore, when the power supply Vcc is turned on again after the fuse 4 is cut, the capacity 1
6, the node 12b becomes "1" level, the node 12a is kept at "0", that is, the ground level, and the common power supply line 2 is kept at the ground level.

【0011】図2、図3は、図1の構成の作用効果説明
するためのものである。ここで図2(a)は、図1の電
源電圧供給手段11を介在させないもので、いわば従来
例のものに相当する。図2(b)は、図1を等価回路的
に示したものである。ここでLは共通電源線2の長さ、
L/2は、それぞれ分割電源線2a、2bの長さ、iは
共通電源線2を流れる電流、Rは共通電源線の配線抵
抗、Va、Va´は、それぞれ図2(a)、(b)の遠
端側電圧である。図3は、電源線2の抵抗による電圧降
下状態を示している。
FIG. 2 and FIG. 3 are for explaining the operation and effect of the configuration of FIG. Here, FIG. 2A does not interpose the power supply voltage supply means 11 of FIG. 1, and is equivalent to a conventional example. FIG. 2B shows FIG. 1 as an equivalent circuit. Here, L is the length of the common power supply line 2,
L / 2 is the length of each of the divided power supply lines 2a and 2b, i is the current flowing through the common power supply line 2, R is the wiring resistance of the common power supply line, and Va and Va 'are FIGS. 2A and 2B, respectively. ) Is the far end voltage. FIG. 3 shows a voltage drop state due to the resistance of the power supply line 2.

【0012】即ち図2(b)に示すように、共通電源線
2を2分割しかつ増幅による電源電圧供給手段11を配
置することにより、手段11で、分割電源線2bにその
始端から末端に向けて、改めてVccを供給できること
により、従来例に比し、図3にも示される如く Va´=Va/2 の電圧降下となり、電圧降下を従来例の半分にできる。
このため、各メモリセル1には、従来例よりも電圧効果
の少ない、比較的高い電源電圧を供給できるものであ
る。またこのため、動作の過渡応答においても、電源の
変動が小となり、動作マージンが向上する。加えて、共
通電源線2を接地レベルに保持しておくため、動作の安
定化も期待できるものである。
That is, as shown in FIG. 2 (b), by dividing the common power supply line 2 into two parts and arranging the power supply voltage supply means 11 by amplification, the means 11 allows the divided power supply line 2b to be divided from the start end to the end. By supplying Vcc again, the voltage drop becomes Va ′ = Va / 2 as shown in FIG. 3 as compared with the conventional example, and the voltage drop can be reduced to half of the conventional example.
Therefore, each memory cell 1 can be supplied with a relatively high power supply voltage having a smaller voltage effect than the conventional example. For this reason, even in the transient response of the operation, the fluctuation of the power supply becomes small, and the operation margin is improved. In addition, since the common power supply line 2 is kept at the ground level, the operation can be expected to be stabilized.

【0013】図4、図5に、メモリの大容量化および共
通電源線の配線抵抗が上昇したときのメモリセル・アレ
イ(共通電源線1本分)を示す。図4は、本発明を更に
具体化した場合の実施例、図5は、通常の手段を用いて
考えられる共通電源線の電圧降下防止手段(それぞれヒ
ューズ4を介したVcc供給)を用いたものを示す。図
4、図5共に、ここでは本発明において1本化できる共
通電源線をN分割している。
FIGS. 4 and 5 show a memory cell array (for one common power supply line) when the memory capacity is increased and the wiring resistance of the common power supply line is increased. FIG. 4 shows an embodiment in which the present invention is further embodied, and FIG. 5 shows an embodiment using a common power supply line voltage drop prevention means (supplying Vcc via fuses 4) which can be considered by using ordinary means. Is shown. 4 and 5, the common power supply line that can be integrated into one in the present invention is divided into N here.

【0014】図4、図5において、21、21、…は行
選択回路(ローデコーダ)、22、22、…は行選択線
つまりワード線、23、23、…はN分割された共通電
源線、2、2、…もN分割された電源線を示す。又メモ
リセル1、1、…は、ここではフリップフロップ構成の
スタティック型RAMセルを仮定している。このメモリ
セル1、1、…は、N分割の共通電源線23、23、…
で(図4)、また2、2、…で(図5)それぞれ動作さ
れ、1つのメモリセル1に着目して、行線22につなが
る2本の線の一方は、メモリセル1の記憶データをビッ
ト線(図示せず)に通電するスイッチ(トランスファゲ
ート)(図示せず)を開閉制御するためのもの、上記2
本の線の他方は、上記記憶データとは相補関係にあるデ
ータを、上記ビット線とは相補関係にあるビット線(図
示せず)に通電するスイッチを開閉制御するためのもの
である。
4, 21 are row selection circuits (row decoders), 22, 22,... Are row selection lines or word lines, and 23, 23,. , 2, 2, ... also indicate power lines divided into N. The memory cells 1, 1,... Are assumed here to be static RAM cells having a flip-flop configuration. The memory cells 1, 1,... Are divided into N divided common power supply lines 23, 23,.
(FIG. 4) and 2, 2,... (FIG. 5). One of the two lines connected to the row line 22 is focused on one memory cell 1, and one of the two lines is the storage data of the memory cell 1. For controlling the opening and closing of a switch (transfer gate) (not shown) for supplying a current to a bit line (not shown).
The other of these lines is for controlling the opening and closing of a switch for supplying data complementary to the stored data to a bit line (not shown) complementary to the bit line.

【0015】しかして近時、メモリ容量は増大化されて
いるが、図5のものは、大容量メモリであるから、共通
電源線2の数及びそれに伴うヒューズ4の数とか行選択
線22の数が多くなるし、1本の共通電源線、行選択線
の長さも長くなるし、これら線中のメモリセル1の数も
多くなるため、チップ占有面積が増大すると共に、1本
の共通電源線、行選択線中にリーク大のメモリセルが存
在する可能性が大であり、従ってセル・アレイ中の複数
のヒューズ4を溶断する必要性が大となって、信頼性に
問題が生じる。しかし図4のものは、各行選択線22に
ついても共通の共通電源線23は1本とみなすことがで
き、しかもVcc供給端の1個のヒューズ4を切断する
だけでよいから、チップ占有面積の増大も少なく、かつ
ヒューズ切断時の信頼性も向上するものである。
In recent years, the memory capacity has been increased. However, since the memory shown in FIG. 5 is a large-capacity memory, the number of common power supply lines 2 and the number of fuses 4 associated therewith and the number of row selection lines 22 are large. Therefore, the number of memory cells 1 in these lines increases, so that the area occupied by the chip increases and the number of common power supply lines increases. There is a high possibility that a memory cell having a large leak exists in a line or a row selection line, and thus the necessity of blowing a plurality of fuses 4 in a cell array increases, thereby causing a problem in reliability. However, in FIG. 4, the common power supply line 23 common to each row selection line 22 can be regarded as one, and only one fuse 4 at the Vcc supply end needs to be cut off. The increase is small and the reliability at the time of fuse cutting is also improved.

【0016】図6は、電源供給手段11の異なる実施例
である。この手段11も、前実施例の場合と同様に、共
通電源線23を分割する如く配置され、この線23の手
前で降下しかけた電源電圧を、CMOSインバータ3
1、PMOSトランジスタ32により、Vccまで上昇
させる。
FIG. 6 shows another embodiment of the power supply means 11. As in the case of the previous embodiment, this means 11 is also arranged so as to divide the common power supply line 23, and the power supply voltage which has dropped before this line 23 is supplied to the CMOS inverter 3
1. The voltage is increased to Vcc by the PMOS transistor 32.

【0017】この図6の場合、図1のインバータ2段の
ものより小規模回路化できるし、PMOSトランジスタ
32を介して電源電圧Vccを電源線23に伝えるか
ら、電圧Vccがトランジスタ32を通っても、そのま
まの電源電圧値を電源線23に伝えることができるもの
である。
In the case of FIG. 6, the circuit can be made smaller than the two-stage inverter shown in FIG. 1, and the power supply voltage Vcc is transmitted to the power supply line 23 through the PMOS transistor 32. The power supply voltage value can be transmitted to the power supply line 23 as it is.

【0018】[0018]

【発明の効果】以上説明したごとく本発明によれば、メ
モリセルがマトリクス状に配置されたメモリセル・アレ
イを有する半導体メモリにおいて、行方向に並ぶメモリ
セルへ電源供給する共通電源線の配線抵抗の増大による
電源電圧の低下およびチップサイズの増大を招くことな
く、リーク電流が許容値よりも大きいメモリセルを冗長
セルへ置き換え可能で、かつ安定した動作を期待できる
ものである。
As described above, according to the present invention, in a semiconductor memory having a memory cell array in which memory cells are arranged in a matrix, the wiring resistance of a common power supply line for supplying power to memory cells arranged in a row direction. It is possible to replace a memory cell having a leak current larger than an allowable value with a redundant cell and to expect a stable operation without causing a decrease in power supply voltage and an increase in chip size due to an increase in memory cell size.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例を示す回路構成図。FIG. 1 is a circuit diagram showing an embodiment of the present invention.

【図2】図1の作用効果の説明図。FIG. 2 is an explanatory diagram of the operation and effect of FIG. 1;

【図3】図1の作用効果の説明図。FIG. 3 is an explanatory diagram of the operation and effect of FIG. 1;

【図4】図1をさらに具体化した実施例の回路構成図。FIG. 4 is a circuit configuration diagram of an embodiment that further embodies FIG. 1;

【図5】図4の回路と比較するため、従来例を改良した
回路図。
FIG. 5 is a circuit diagram in which a conventional example is improved for comparison with the circuit of FIG. 4;

【図6】本発明の異なる実施例の要部の回路図。FIG. 6 is a circuit diagram of a main part of another embodiment of the present invention.

【図7】従来のメモリ回路図。FIG. 7 is a conventional memory circuit diagram.

【符号の説明】[Explanation of symbols]

1…メモリセル、2、23…共通電源線、2a、2b…
分割電源線、3…電源端子、4…ヒューズ、11…電源
電圧供給手段、12…電位保持手段、21…行デコー
ダ、22…行選択線。
1 ... memory cell, 2, 23 ... common power supply line, 2a, 2b ...
Divided power supply lines, 3 power supply terminals, 4 fuses, 11 power supply voltage supply means, 12 potential holding means, 21 row decoders, 22 row selection lines.

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平5−121687(JP,A) 特開 平3−149867(JP,A) (58)調査した分野(Int.Cl.7,DB名) G11C 29/00 603 ────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-5-121687 (JP, A) JP-A-3-149867 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) G11C 29/00 603

Claims (5)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】メモリセルがマトリクス状に配置されたメ
モリセル・アレイを有する半導体メモリにおいて、行方
向にある複数のメモリセルへ共通に電源を供給する形で
N(Nは1以上の整数)分割され、一端側から他端側へ
電源を供給するメモリセル用の共通電源線と、この共通
電源線をN分割して得られる各分割電源線の隣接相互間
にそれぞれ介在され、前記電源の供給を行う一端側から
見て近い方に隣接した分割電源線からの電圧を増幅する
ことにより得た電源電圧レベルを、前記電源の供給端か
ら見て遠い方に隣接した分割電源線へ供給させる電源電
圧供給手段と、前記共通電源線の一端側の電源供給端と
この電源供給端から数えて1番目に位置した分割電源線
との間に介在されたヒューズと、このヒューズを切断し
て後、前記共通電源線を接地電位に保持する電位保持手
段と、前記ヒューズの切断後、そのヒューズを切断した
行の代りに用いる冗長セルとを具備したことを特徴とす
る半導体メモリ。
1. In a semiconductor memory having a memory cell array in which memory cells are arranged in a matrix, N (N is an integer of 1 or more) is used to supply power to a plurality of memory cells in a row direction in common. A common power supply line for a memory cell, which is divided and supplies power from one end to the other end, and is interposed between adjacent divided power supply lines obtained by dividing the common power supply line into N parts, respectively. A power supply voltage level obtained by amplifying a voltage from a divided power supply line adjacent to the power supply closer to the power supply end is supplied to a divided power supply line adjacent to the power supply end farther from the supply end of the power supply. A power supply voltage supply means, a fuse interposed between a power supply end on one end side of the common power supply line and a divided power supply line located first from the power supply end, , The common telephone The semiconductor memory for the potential holding means for holding the line at the ground potential, after cutting of the fuse, characterized by comprising a redundancy cell used in place of the line cut the fuse.
【請求項2】前記ヒューズの切断は、スタンバイ時のリ
ーク電流が、許容値を越えるメモリセルが存在する共通
電源線について行われる請求項1に記載の半導体メモ
リ。
2. The semiconductor memory according to claim 1, wherein the fuse is cut for a common power supply line in which a memory cell having a leakage current in a standby state exceeding an allowable value exists.
【請求項3】前記共通電源線の分割数とその共通電源線
に付随するメモリセル用の行選択線の数とは対応する請
求項1に記載の半導体メモリ。
3. The semiconductor memory according to claim 1, wherein the number of divisions of said common power supply line corresponds to the number of memory cell row selection lines associated with said common power supply line.
【請求項4】前記電源電圧供給手段は、PMOSトラン
ジスタを介して電源を分割電源線へ供給する請求項1に
記載の半導体メモリ。
4. The semiconductor memory according to claim 1, wherein said power supply voltage supply means supplies power to a divided power supply line via a PMOS transistor.
【請求項5】前記メモリセルは、フリップフロップ構成
のスタティック型セルである請求項1に記載の半導体メ
モリ。
5. The semiconductor memory according to claim 1, wherein said memory cell is a flip-flop type static cell.
JP02098494A 1994-02-18 1994-02-18 Semiconductor memory Expired - Fee Related JP3354267B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP02098494A JP3354267B2 (en) 1994-02-18 1994-02-18 Semiconductor memory

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP02098494A JP3354267B2 (en) 1994-02-18 1994-02-18 Semiconductor memory

Publications (2)

Publication Number Publication Date
JPH07230699A JPH07230699A (en) 1995-08-29
JP3354267B2 true JP3354267B2 (en) 2002-12-09

Family

ID=12042424

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP3354267B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4530527B2 (en) 2000-12-08 2010-08-25 ルネサスエレクトロニクス株式会社 Static semiconductor memory device

Also Published As

Publication number Publication date
JPH07230699A (en) 1995-08-29

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