JP3358282B2 - Manufacturing method of thin film laminated porous ceramic hollow fiber - Google Patents
Manufacturing method of thin film laminated porous ceramic hollow fiberInfo
- Publication number
- JP3358282B2 JP3358282B2 JP07935694A JP7935694A JP3358282B2 JP 3358282 B2 JP3358282 B2 JP 3358282B2 JP 07935694 A JP07935694 A JP 07935694A JP 7935694 A JP7935694 A JP 7935694A JP 3358282 B2 JP3358282 B2 JP 3358282B2
- Authority
- JP
- Japan
- Prior art keywords
- hollow fiber
- porous ceramic
- thin film
- ceramic hollow
- porous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Separation Using Semi-Permeable Membranes (AREA)
- Porous Artificial Stone Or Porous Ceramic Products (AREA)
- Artificial Filaments (AREA)
- Multicomponent Fibers (AREA)
- Spinning Methods And Devices For Manufacturing Artificial Fibers (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、薄膜積層多孔質セラミ
ックス中空糸の製造法に関する。更に詳しくは、外壁面
上に薄膜を積層させ、気体分離膜、膜型反応器用分離膜
などとして有効に使用される多孔質セラミックス中空糸
の製造法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a thin film laminated porous ceramic hollow fiber. More specifically, the present invention relates to a method for producing a porous ceramic hollow fiber which is effectively used as a gas separation membrane, a separation membrane for a membrane reactor or the like by laminating a thin film on an outer wall surface.
【0002】[0002]
【従来の技術】多孔質膜を用いてガスの分離を行う場
合、例えばH2とCO、H2とN2などの分離に際しては、クヌ
ーセン拡散支配になるように、多孔質膜の細孔径を数10
〜数100Å程度に調整したものを使用する必要がある。2. Description of the Related Art When a gas is separated using a porous membrane, for example, when separating H 2 and CO and H 2 and N 2 , the pore diameter of the porous membrane is controlled so as to be governed by Knudsen diffusion. Number 10
It is necessary to use one adjusted to about several hundred square meters.
【0003】そして、具体的なガス分離膜としては、約
40Åの細孔径を有する無機多孔質バイコールガラスが従
来から知られている。このバイコールガラスは、高けい
酸塩であることから、耐熱性および耐食性にすぐれてい
るという特徴を有しているが、強度上その膜厚を約0.5m
m以下にすることが困難であるため、単位面積当りのガ
ス透過速度が小さいという欠点がある。[0003] As a specific gas separation membrane, about
An inorganic porous Vycor glass having a pore size of 40 ° has been conventionally known. Since this Vycor glass is a high silicate, it has the characteristic of being excellent in heat resistance and corrosion resistance, but its thickness is about 0.5 m in terms of strength.
Since it is difficult to reduce the diameter to less than m, there is a disadvantage that the gas permeation rate per unit area is small.
【0004】従って、ガスの透過速度の大きい分離膜を
製造するには、クヌーセン拡散支配となるように多孔質
膜の細孔径を調整し、膜厚を薄くすることが望ましい
が、機械的強度上膜厚を極端には薄くできないので、膜
厚の薄いガス分離層を膜厚が1mm程度で比較的細孔径の
大きい多孔質支持体上にコーティングして補強した、い
わゆる多層構造のものが採用されている。Therefore, in order to produce a separation membrane having a high gas permeation rate, it is desirable to adjust the pore diameter of the porous membrane so as to be governed by Knudsen diffusion and to reduce the thickness, but this is not desirable in terms of mechanical strength. Since the film thickness cannot be extremely thin, a so-called multi-layer structure, in which a thin gas separation layer is coated on a porous support having a film thickness of about 1 mm and a relatively large pore diameter and reinforced, is adopted. ing.
【0005】ここで用いられる薄膜積層多孔質構造体
は、取扱上あるいは強度上から通常は中空管状で使用さ
れることが多く、それの製造は、一般に使用されている
粉末冶金法、焼結法などにより、まず厚さ1mm程度の多
孔質中空管を製造し、これに種々の方法で微細孔を有す
る薄膜を積層させている。[0005] The thin-film laminated porous structure used here is usually used in the form of a hollow tube in terms of handling or strength, and its production is generally carried out by powder metallurgy or sintering. First, a porous hollow tube having a thickness of about 1 mm is manufactured, and a thin film having micropores is laminated thereon by various methods.
【0006】かかる薄膜の積層方法としては、厚さ1μm
程度の極薄膜を形成させる真空蒸着法、スパッタリング
法などがあるが、これらの方法では均一な孔径の制御が
困難であり、また装置容積に制限があることから実用的
ではなく、従って通常は微粉末を数10μmの厚さに付着
させる方法が用いられている。As a method of laminating such a thin film, a thickness of 1 μm
There are vacuum deposition method and sputtering method for forming an extremely thin film to the extent that these methods are not practical because of the difficulty in controlling the uniform pore size and the limitation of the apparatus volume, and therefore, it is usually not practical. A method of attaching powder to a thickness of several tens of μm is used.
【0007】このような微粉末層形成方法には、乾式法
と湿式法とがあるが、乾式法は粉末粒子の流動性が悪
く、均一な厚みの層を形成させることが極めて困難なた
め、湿式法が主流となっている。[0007] Such a method of forming a fine powder layer includes a dry method and a wet method. However, the dry method has poor fluidity of powder particles and is extremely difficult to form a layer having a uniform thickness. The wet method is the mainstream.
【0008】この湿式法には、多孔質中空管を回転さ
せ、中空管内部に微粉末スラリを供給し、遠心力によっ
て粉末を付着させる遠心法、スラリの表面電位を利用す
る電気泳動により多孔質中空管にスラリを付着させる電
気泳動法、一般によく用いられている塗布法などがあ
り、これらの方法では微粉末に水またはアルコール、ア
セトンなどの有機溶媒を加えてスラリとして用いている
ので、流動性が良く、均一な厚みの層を容易に形成する
ことができるという特徴を有している。In the wet method, a porous hollow tube is rotated, a fine powder slurry is supplied to the inside of the hollow tube, and the powder is adhered by centrifugal force. Electrophoresis using the surface potential of the slurry is carried out. There are an electrophoresis method of attaching a slurry to a porous hollow tube, and a commonly used coating method. In these methods, water or an organic solvent such as alcohol or acetone is added to a fine powder and used as a slurry. Therefore, it has a feature that it has good fluidity and a layer having a uniform thickness can be easily formed.
【0009】このように、湿式法では均一な薄膜を形成
させることが可能であるが、容易に形成できる細孔径は
数1000Å以上であり、数10〜数100Åの細孔径を得るた
めに、約1000Å以下の超微粉末を用いる場合には、スラ
リの付着層を形成後、液体を蒸発させて乾燥する際、ク
ラックを生じ易いという欠点がみられる。クラックの発
生を防止するために、スラリに粘結剤を加える方法もあ
るが、後で粘結剤を除去し、微小細孔を得ることは困難
である。As described above, a uniform thin film can be formed by the wet method, but the pore diameter which can be easily formed is several thousand mm or more. When an ultrafine powder of 1000 ° or less is used, there is a disadvantage that cracks are easily generated when the liquid is evaporated and dried after the formation of the slurry adhesion layer. There is also a method of adding a binder to the slurry in order to prevent the generation of cracks, but it is difficult to remove the binder later to obtain fine pores.
【0010】また、微小細孔を得る方法の一つとして、
粗孔性基質に浸漬法により微粒子を充填して多孔性物質
を製造する方法もあるが、この方法では粗孔性基質全体
に微粒子が充填されてしまうという欠点がある。[0010] One of the methods for obtaining micropores is as follows.
There is also a method of producing a porous substance by filling fine particles in a coarse porous substrate by an immersion method, but this method has a disadvantage that the fine particles are filled in the entire coarse porous substrate.
【0011】そこで本発明者は先に、従来技術にみられ
るこのような各種の欠点、即ち均一な孔径の制御、微細
孔径化、薄膜化などが困難であり、またクラックの発
生、剥離強度が低いなどといった問題をいずれも克服す
るために、多孔質アルミナ中空糸内にシリカゾルを流入
接触後、乾燥、焼成して薄膜積層多孔質アルミナ中空糸
を製造する方法を提案している(特開平5-132,822号公
報)。Therefore, the present inventor has previously found that it is difficult to control such various drawbacks found in the prior art, namely, to control the uniform pore size, to make the pore size smaller, to make the film thinner, and to reduce the occurrence of cracks and peel strength. In order to overcome any problems such as low temperature, a method has been proposed in which a silica sol is flowed into and contacted with a porous alumina hollow fiber, and then dried and fired to produce a thin-film laminated porous alumina hollow fiber (Japanese Patent Laid-Open No. Hei 5 (1994)). -132,822 publication).
【0012】この提案された方法により製造された薄膜
積層多孔質アルミナ中空糸は、所期の目的を達成させる
ものの、例えばH2/N2分離係数に対してH2透過速度が低
下するなどの気体分離膜としての性能の面でのなお一段
の向上が求められた。Although the thin-film laminated porous alumina hollow fiber produced by the proposed method achieves the intended purpose, for example, the H 2 / N 2 separation coefficient has a lower H 2 permeation rate. Further improvement in performance as a gas separation membrane was required.
【0013】[0013]
【発明が解決しようとする課題】本発明の目的は、多孔
質セラミックス中空糸内にシリカゾルを流入接触後、乾
燥、焼成して得られる薄膜積層多孔質セラミックス中空
糸の気体分離膜性能を一段と向上せしめたものを製造す
る方法を提供することにある。SUMMARY OF THE INVENTION It is an object of the present invention to further improve the gas separation membrane performance of a thin film laminated porous ceramic hollow fiber obtained by flowing silica sol into a porous ceramic hollow fiber, drying and firing the silica sol. It is an object of the present invention to provide a method for manufacturing a product.
【0014】[0014]
【課題を解決するための手段】かかる本発明の目的は、
多孔質セラミックス中空糸内にシリカゾルを流入接触
後、乾燥、焼成させて得られた多孔質セラミックス中空
糸基材を、シリカゾル中に浸漬させ、引き上げた後、乾
燥、焼成して、薄膜積層多孔質セラミックス中空糸を製
造することによって達成される。ここで、多孔質セラミ
ックス中空糸基材は、前記特許公開公報記載の方法に従
って製造される。SUMMARY OF THE INVENTION The object of the present invention is as follows.
The porous ceramic hollow fiber base material obtained by flowing the silica sol into the porous ceramic hollow fiber, contacting, drying and firing is immersed in the silica sol, pulled up, dried and fired to obtain a thin film laminated porous material. Achieved by manufacturing ceramic hollow fibers. Here, the porous ceramic hollow fiber substrate is manufactured according to the method described in the above-mentioned patent publication.
【0015】多孔質セラミックス中空糸としては、一般
にAl2O3中空糸が用いられるが、これ以外にもY2O3、Mg
O、SiO2、Si3N4、ZrO2等の中空糸を用いることもでき
る。約0.1〜10μm、好ましくは約0.1〜2μmの平均細孔
径を有するこれらの中空糸内へ流入させるシリカゾル
は、テトラエトキシシランなどのテトラアルコキシシラ
ンを硝酸などの無機酸を用いて水溶液中で加水分解する
ことにより調製される。このようにして調製されたシリ
カゾルの中空糸内への流入、接触は、中空糸の一端側か
らローラポンプなどの液送ポンプを用い、約1〜30秒間
程度接触させることにより行われる。その後、必要に応
じて例えば40℃、90%RHの恒温恒湿条件下で約70〜75時
間程度の乾燥工程を経た後、約100〜200℃で約0.5〜2時
間程度乾燥させ、次いで約400〜500℃で約1〜10時間程
度焼成される。このような操作は、一般に複数回くり返
して行われる。As the porous ceramic hollow fiber, Al 2 O 3 hollow fiber is generally used, but other than this, Y 2 O 3 , Mg
Hollow fibers such as O, SiO 2 , Si 3 N 4 and ZrO 2 can also be used. The silica sol that flows into these hollow fibers having an average pore diameter of about 0.1 to 10 μm, preferably about 0.1 to 2 μm is obtained by hydrolyzing tetraalkoxysilane such as tetraethoxysilane in an aqueous solution using an inorganic acid such as nitric acid. It is prepared by The silica sol thus prepared flows into the hollow fiber and comes into contact with the hollow fiber from one end side of the hollow fiber using a liquid feed pump such as a roller pump for about 1 to 30 seconds. Thereafter, if necessary, for example, a drying process of about 70 to 75 hours under a constant temperature and humidity condition of 40 ° C. and 90% RH, followed by drying at about 100 to 200 ° C. for about 0.5 to 2 hours, and then about It is fired at 400-500 ° C for about 1-10 hours. Such an operation is generally performed a plurality of times.
【0016】このようにして得られる多孔質セラミック
ス中空糸基材は、その外壁面上に約1μm程度の厚みでシ
リカ薄膜が形成され、更にそれ以上のシリカ薄膜は、約
1〜5μm程度の厚みで多孔質中空糸の細孔内へと成長し
て形成されるため、分離性能を有するシリカ薄膜層にク
ラック・剥離などが生じ難い。The porous ceramic hollow fiber base material thus obtained has a silica thin film formed on its outer wall surface with a thickness of about 1 μm.
Since it is formed by growing into the pores of the porous hollow fiber with a thickness of about 1 to 5 μm, cracks and peeling are unlikely to occur in the silica thin film layer having separation performance.
【0017】また、シリカゾル溶液は流動性に富み、一
旦シリカ層が形成されると透水性がなくなるため、シリ
カゾルの流入、接触をくり返すことにより、シリカ層未
形成部位にシリカゾルが選択的に移動し、そこで新たな
シリカ層を形成させることから、均一な薄膜化も容易で
ある。Further, the silica sol solution is rich in fluidity, and once the silica layer is formed, the water permeability is lost. Therefore, the silica sol selectively moves to the portion where the silica layer is not formed by repeating the inflow and the contact of the silica sol. However, since a new silica layer is formed there, uniform thinning is easy.
【0018】本発明においては、かかる多孔質セラミッ
クス中空糸基材に対し、これを更にシリカゾル中に浸漬
させ、引き上げた後、乾燥、焼成する工程が適用され
る。この際、中空糸基材の両端はエポキシ接着剤等で一
応封止し、中空糸管内へのシリカゾルの流入を防止した
上で用いられる。浸漬および引上げは、ステッピングモ
ータなどの低速モータを用い、浸漬速度を約3mm/秒以
上、好ましくは約5〜20mm/秒に、また引上げ速度を約1.
5mm/秒以上、好ましくは約1.6〜3mm/秒に設定して行わ
れる。その後の乾燥および焼成は、前記と同様の条件下
で行われ、このような一連の工程が一般に複数回くり返
して行われ、外表面上に膜厚約0.1〜5μm程度のシリカ
薄膜層を形成させる。In the present invention, the porous ceramic hollow fiber substrate is further immersed in silica sol, pulled up, dried and fired. At this time, both ends of the hollow fiber base material are temporarily sealed with an epoxy adhesive or the like to prevent silica sol from flowing into the hollow fiber tube before use. Immersion and pulling are performed using a low-speed motor such as a stepping motor, and the immersion speed is about 3 mm / sec or more, preferably about 5 to 20 mm / sec, and the pulling rate is about 1.
It is performed at a setting of 5 mm / sec or more, preferably about 1.6 to 3 mm / sec. Subsequent drying and baking are performed under the same conditions as described above, and such a series of steps is generally performed a plurality of times to form a silica thin film layer having a thickness of about 0.1 to 5 μm on the outer surface. .
【0019】[0019]
【発明の効果】表面細孔がシリカ層によって閉塞された
多孔質セラミックス中空糸基材をシリカゾル中に浸漬
し、細孔内へのシリカゾルの侵入を防ぎながら、外表面
層に更にシリカ薄膜層を形成させ、成長させることによ
り、シリカ層の剥離やクラックの発生を十分に防いだ積
層薄膜化が達成される。この結果、得られた薄膜積層多
孔質セラミックス中空糸を気体分離膜として用いた場
合、H2/N2分離係数に対するH2透過速度の低下を抑制す
ることができるなどの気体分離性能の向上が図られる。According to the present invention, a porous ceramic hollow fiber base material whose surface pores are closed by a silica layer is immersed in silica sol, and a silica thin film layer is further formed on the outer surface layer while preventing silica sol from entering the pores. By forming and growing, it is possible to achieve a laminated thin film in which peeling of the silica layer and generation of cracks are sufficiently prevented. As a result, improvement in gas separation performance, such as thin film multilayer porous ceramic hollow fiber obtained was when used as a gas separation membrane, it is possible to suppress the reduction of the H 2 permeation rate for H 2 / N 2 separation factor It is planned.
【0020】[0020]
【実施例】次に、実施例について本発明を説明する。Next, the present invention will be described with reference to examples.
【0021】実施例 テトラエトキシシラン25g、エタノール37.6g、35%塩酸
0.3gおよび水23.5gを室温条件下で2時間撹拌し、加水分
解させて、シリカゾルを調製した。このシリカゾルを、
多孔質アルミナ中空糸(平均細孔径1μm、気孔率35%、
内径1.5mm、外径2.0mm、長さ300mm)内に、液送ポンプを
用いて、5秒間流入、接触させた後、40℃、90%RHの恒温
恒湿条件下において72時間の乾燥を行い、次いで200
℃、2時間および500℃、5時間の焼成を行った。このよ
うな一連の操作を2回行って、多孔質セラミックス中空
糸基材を得た。EXAMPLE 25 g of tetraethoxysilane, 37.6 g of ethanol, 35% hydrochloric acid
0.3 g and 23.5 g of water were stirred at room temperature for 2 hours and hydrolyzed to prepare a silica sol. This silica sol is
Porous alumina hollow fiber (average pore diameter 1 μm, porosity 35%,
(Inner diameter 1.5 mm, outer diameter 2.0 mm, length 300 mm) using a liquid feed pump for 5 seconds, after contact and then drying at 40 ° C, 90% RH for 72 hours. Done, then 200
Firing was performed at 2 hours at 500 ° C and 5 hours at 500 ° C. Such a series of operations was performed twice to obtain a porous ceramic hollow fiber substrate.
【0022】得られた長さ300mmの多孔質セラミックス
中空糸基材の両端を、エポキシ接着剤で封止した上で、
ステッピングモータを用いて、上記と同様にして調製さ
れたシリカゾル中に浸漬速度5mm/秒、引上げ速度1.6mm/
秒で浸漬および引上げを行った。その後、40℃、90%RH
の恒温恒湿条件下において2時間の乾燥を行い、次いで2
00℃、2時間および500℃、5時間の焼成を行った。この
ような多孔質セラミックス中空糸基材に対する一連の操
作を所定回数行って、下記膜厚のシリカ薄膜層を外表面
上に形成させた分離膜を得た。After sealing both ends of the obtained porous ceramic hollow fiber substrate having a length of 300 mm with an epoxy adhesive,
Using a stepping motor, immersion speed 5 mm / sec in silica sol prepared as described above, pulling speed 1.6 mm /
Dipping and pulling were performed in seconds. After that, 40 ° C, 90% RH
2 hours under constant temperature and humidity conditions, then
Firing was performed at 00 ° C. for 2 hours and at 500 ° C. for 5 hours. A series of operations on such a porous ceramic hollow fiber substrate were performed a predetermined number of times to obtain a separation membrane having a silica thin film layer having the following film thickness formed on the outer surface.
【0023】このようにして得られた各分離膜につい
て、523K、0.5×105Paの条件下でH2透過速度およびH2/N
2分離係数を測定し、次のような結果を得た。 操作回数 膜厚(μm) H2透過速度(モル・m-2・s-1・Pa-1) H2/N2分離係数 2 0.2 1.32×10-7 4.59 3 0.5 1.07×10-7 6.70 4 0.9 1.75×10-7 8.53 7 3.0 4.12×10-8 10.31With respect to each of the separation membranes thus obtained, the H 2 permeation rate and the H 2 / N ratio were determined under the conditions of 523 K and 0.5 × 10 5 Pa.
2 The separation coefficient was measured, and the following results were obtained. Number of operations Film thickness (μm) H 2 permeation rate (mol ・ m -2・ s -1・ Pa -1 ) H 2 / N 2 separation coefficient 2 0.2 1.32 × 10 -7 4.59 3 0.5 1.07 × 10 -7 6.70 4 0.9 1.75 × 10 -7 8.53 7 3.0 4.12 × 10 -8 10.31
【0024】また、H2透過速度とH2/N2分離係数との関
係を、図1のグラフに●で示した。The relationship between the H 2 permeation rate and the H 2 / N 2 separation coefficient is indicated by a black circle in the graph of FIG.
【0025】比較例 実施例において、多孔質セラミックス中空糸基材を得る
ための一連の操作を所定回数行い、得られた多孔質セラ
ミックス中空糸基材について、H2透過速度およびH2/N2
分離係数を測定し、これら両者間の関係を図1のグラフ
に○で併記した。Comparative Example In the examples, a series of operations for obtaining a porous ceramic hollow fiber substrate was performed a predetermined number of times, and the H 2 permeation rate and H 2 / N 2
The separation coefficient was measured, and the relationship between the two was also indicated by a circle in the graph of FIG.
【図1】実施例および比較例における、H2透過速度とH2
/N2分離係数との関係を示すグラフである。FIG. 1 shows H 2 permeation rate and H 2 in Examples and Comparative Examples.
6 is a graph showing a relationship with a / N 2 separation coefficient.
Claims (2)
ルを流入接触後、乾燥、焼成させて得られた多孔質セラ
ミックス中空糸基材を、シリカゾル中に浸漬させ、引き
上げた後、乾燥、焼成することを特徴とする薄膜積層多
孔質セラミックス中空糸の製造法。1. A porous ceramic hollow fiber substrate obtained by flowing silica gel sol into a porous ceramic hollow fiber, contacting, drying and firing, immersing the porous ceramic hollow fiber substrate in the silica sol, pulling up, drying and firing. A method for producing a hollow fiber thin film laminated with porous ceramics, characterized in that:
孔質セラミックス中空糸よりなる気体分離膜。2. A gas separation membrane comprising a thin film-laminated porous ceramic hollow fiber produced by the method of claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP07935694A JP3358282B2 (en) | 1994-03-25 | 1994-03-25 | Manufacturing method of thin film laminated porous ceramic hollow fiber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP07935694A JP3358282B2 (en) | 1994-03-25 | 1994-03-25 | Manufacturing method of thin film laminated porous ceramic hollow fiber |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH07256065A JPH07256065A (en) | 1995-10-09 |
| JP3358282B2 true JP3358282B2 (en) | 2002-12-16 |
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| Application Number | Title | Priority Date | Filing Date |
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| JP07935694A Expired - Lifetime JP3358282B2 (en) | 1994-03-25 | 1994-03-25 | Manufacturing method of thin film laminated porous ceramic hollow fiber |
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| JP (1) | JP3358282B2 (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2017051932A (en) * | 2015-09-11 | 2017-03-16 | 東洋ゴム工業株式会社 | Gas separation membrane forming method |
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1994
- 1994-03-25 JP JP07935694A patent/JP3358282B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07256065A (en) | 1995-10-09 |
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