JP3365321B2 - Thin film magnetic recording head - Google Patents

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION The present invention relates to a thin film magnetic recording head.
In particular, the present invention relates to an inductive type thin film magnetic recording head which forms a part of an MR / inductive composite type magnetic head and is formed into a thin film .

[0002]

2. Description of the Related Art The recent increase in the recording density of hard disk devices is remarkable. Looking at the recording density since 1990, it tends to increase at an annual rate of almost 60%. To improve the recording density of the hard disk drive,
It is necessary to reduce the track width of the magnetic head for magnetically recording on the disk medium of the disk device to improve the recording track density. Further, in order to improve the recording density, it is equally important to improve the recording bit density.

To improve the recording bit density (high density recording), it is necessary to increase the coercive force Hc of the recording medium.
Writing to a recording medium having a high coercive force Hc requires a recording head having high recording ability. In order to efficiently detect a signal from a minute recording bit, recently, a magnetic recording head formed by combining a magnetoresistive (MR) reproducing head and a thin film magnetic recording head, that is, MR / inductive. A composite magnetic head (hereinafter referred to as "composite magnetic head") has been developed.

This composite type magnetic head is manufactured by a thin film process and generally has a sectional structure as shown in FIG. Here, reference numeral 501 indicates an MR reproducing head portion, and reference numeral 502 indicates a thin film magnetic recording head portion. In the composite magnetic head shown in FIG. 8, the lower shield layer pattern 101, the read gap insulating layer 103, and the first magnetic pole layer 112 are sequentially laminated on the substrate / insulating layer 100.

Here, the MR magneto-sensitive element 102, which constitutes the essential part of the reproducing MR head section 501 for detecting the signal magnetic field from the magnetic recording medium, is laminated in the above-mentioned lower shield layer pattern 101. The first magnetic pole layer 112 is a reproducing MR.
It also serves as a magnetic shield for improving the reproducing resolution of the head section 501 and as a reading side recording magnetic pole of the magnetic recording head section 502.

Further, on the upper side of FIG. 8 of the first magnetic pole layer 112, there is provided a recording magnetic gap layer 114 made of an insulating layer which defines a gap of the magnetic recording head. Then, on the magnetic gap layer 114,
A first step-elimination layer 111 that forms an insulating layer, a recording head coil pattern (excitation coil) 121, and a second step-elimination layer 112 that eliminates irregularities of the coil pattern 121.
And are sequentially stacked.

Here, reference numeral 115 denotes a recording pole on the trailing side of the magnetic recording head portion 502 provided on the second step eliminating layer 112 corresponding to the above-described MR magneto-sensitive element 102. This recording pole 115 has a width (see FIG. 6).
The length in the direction orthogonal to the
It is formed to be slightly larger than the width of 2. The recording pole 115 also serves as the second magnetic pole layer of the inductive magnetic recording head portion 502 described later. Further, at the left end portion of FIG. 8, the above-described first step eliminating layer 111 is not extended, and the above-described recording pole (second pole layer) 115
Are directly laminated on the recording magnetic gap layer 105 described above.

The end of the first step eliminating layer 111 on the side facing the magnetic recording medium described above, that is, the region where the recording pole (second magnetic pole layer) 115 is directly laminated on the magnetic gap layer 114, The gap depth D of the inductive thin film magnetic recording head is defined. Here, in order to improve the recording ability during high density recording, it is necessary to reduce the gap depth D to about 1 [μm] or less.

The recording pole (second magnetic pole layer) 115 on the trailing side of the magnetic recording head portion 501 is directly formed on the gap depth D as described above. As described above, on the medium facing surface Fs side of the region of the recording pole (second magnetic pole layer) 115, as shown in FIG. 8, the magnetic gap layer 114 is formed on the first magnetic pole layer 112 described above. The recording pole (second magnetic pole layer) 115 is in a stacked state. Reference numeral 116 indicates a protective layer made of an alumina layer.

[0010]

However, in the above-mentioned composite magnetic head, the magnetic recording head portion 5 for writing is used.
Various problems shown below occur in the area 02.

FIG. 9 shows the structure of the surface (medium facing surface) of the composite magnetic head shown in FIG. 8 which faces the magnetic medium. In FIG. 9, the recording track width is generally determined by the width of the second magnetic pole layer 115 in the track width direction, and the width of the first magnetic pole layer 112 is the second magnetic pole layer 115.
The width of the recording magnetic field leaking from the second magnetic pole layer 115 to the magnetic gap layer 114 is larger than the width of the second magnetic pole layer 115. As a result, the magnetization width in the track width direction recorded on the magnetic recording medium becomes large, which is a significant obstacle to reducing the track width required for high density recording.

In order to prevent this obstacle, as shown in FIG. 10, the aforementioned second magnetic pole layer 115 of the first magnetic pole layer 112 is formed.
On the surface (on the side of the second magnetic pole layer 115) that is magnetically opposed to
The convex magnetic pole layer 112A having a function as a magnetic pole is provided, and the width of the side surface of the convex magnetic pole layer 112A defining the width in the track width direction is matched with the side surface defining the width of the second magnetic pole layer 115 in the track width direction. . As a result, a method of suppressing an increase in the width of the recording magnetic field with respect to the width of the second magnetic pole layer 115 has been studied.

As a method for obtaining the shape shown in FIG. 10, for example, in Japanese Unexamined Patent Publication No. 7-262519, the magnetic pole layer 115 and the first magnetic pole layer are formed by ion beam using the second magnetic pole layer 115 as a mask. A new technique has been proposed in which 112 is etched to form the convex magnetic pole layer 112A.

However, when this method is used, the thickness of the second magnetic pole layer 115 is reduced during the ion beam etching, and as a result, the recording characteristics are deteriorated. In order to solve this, a method of forming the second magnetic pole layer 115 thick in consideration of the thickness reduction of the second magnetic pole layer 115 by the ion beam etching was studied.

In this case, forming the second magnetic pole layer 115 with a large thickness is contrary to forming the second magnetic pole layer 115 with a small width. Therefore, it has been found that the limit of 2 [μm] is to reduce the magnetization width in the track width direction recorded on the magnetic recording medium by the method disclosed in Japanese Patent Laid-Open No. 7-262519. .

On the other hand, another publication, Japanese Patent Laid-Open No. 7-2259.
In Japanese Patent Publication No. 17, as shown in FIG. 11, first, a convex magnetic pole layer 115a having the same side surface as the convex magnetic pole layer 112A on the first magnetic pole layer 112 and magnetically coupled to the second magnetic pole layer 115 is formed.
And the convex magnetic pole layer 112A on the first magnetic pole layer 112 are formed all at once by ion beam etching using a photomask that determines the width of the convex magnetic pole layer 115a described above.
Then, after the step formed by the convex magnetic pole layer 112A, the magnetic gap layer 114 and the convex magnetic pole layer 115a is filled with an alumina film and polished and flattened, the second magnetic pole layer 115 is formed.
A method of forming a is disclosed.

However, since this method also performs etching with an ion beam, the photomask itself becomes narrower as the width of the convex magnetic pole layer in the track width direction is narrowed. Therefore, the mask shape becomes unstable due to the damage caused by the ion beam, and the manufacturing yield deteriorates.

Further, in the method disclosed in Japanese Patent Application Laid-Open No. 7-225917, it is necessary to separately introduce a polishing technique, which causes a problem of remaining polishing powder due to polishing, a troublesome alignment of the photomask after polishing, etc. , There was a new issue to be solved.

[0019]

It is an object of the present invention to improve the disadvantages of the conventional example, and particularly to suppress the increase of the width of the recording magnetic field with respect to the magnetic pole width of the second magnetic pole layer, thereby enabling high density recording on the recording medium. It is an object of the present invention to provide a thin film magnetic recording head having the above structure.

[0020]

[Means for Solving the Problems] To achieve the above object,
According to the present invention, the magnetic recording layer is provided with the first magnetic pole layer and the second magnetic pole layer, and the magnetic gap layer made of a non-magnetic member is provided between the magnetic pole layers. In a thin film magnetic recording head for magnetically recording predetermined information on a medium, the width in the track direction of the surface of the first pole layer facing the above-mentioned magnetic recording medium is set to be the width in the track direction of the second pole layer. It is set to be larger than that of the first magnetic pole layer, and a convex magnetic pole layer that functions as a magnetic pole is provided on the side of the first magnetic pole layer on the side of the second magnetic pole layer described above. And
The magnetic gap layer is arranged between the convex magnetic pole layer and the second magnetic pole layer.

Therefore, in the present invention, in the magnetic gap layer located between the convex magnetic pole layer and the second magnetic pole layer, the width of the leakage magnetic flux for recording is regulated by the width of the convex magnetic pole layer, and the width is more than necessary. Since the width of the recording magnetic field becomes smaller even if the width of the second pole layer is set to the same size as that of the conventional one, the recording density of the magnetic recording medium is smaller than that of the above-mentioned conventional example. It is possible to increase (enhance the track density).

Here, a flattening layer made of a non-magnetic member is provided on both sides of the above-mentioned convex magnetic pole layer and between the above-mentioned first magnetic pole layer and the magnetic gap layer. In addition, this flattening layer,
It is preferable to set the film thickness to the same as that of the above-mentioned convex magnetic pole layer. By doing so, the flattening layer functions effectively and the convex magnetic pole layer is reliably and robustly laminated between the first magnetic pole layer and the magnetic gap layer.

[0023] The planarization layer described above forms a part located on the magnetic medium facing surface side in mineral. Further, this inorganic substance may be alumina. Further, in the above-mentioned flattening layer, a portion located away from the magnetic medium facing surface is formed of an organic material. In this case, a photoresist may be used as the organic substance forming a part of the planarizing layer. Further, the width of the end face that defines the track width of the convex pole layer on the medium facing surface is the same as the width of the end face of the second pole layer that defines the track width on the medium facing surface. With a width dimension, the convex magnetic pole layer and the second magnetic pole layer are aligned and arranged in parallel on the medium facing surface. By doing so, the width of the leakage magnetic flux for recording can be effectively narrowed, and the recording operation can be continued in a stable state.

Furthermore, the width dimension of the end face that defines the track width on the medium facing surface of the convex magnetic pole layer is smaller than the width dimension of the end face that defines the track width on the medium facing surface of the second pole layer. The width dimension may be set, and at the same time, the convex magnetic pole layer may be disposed inside so as to correspond to the end surface of the second magnetic pole layer on the medium facing surface.

In this way, the width of the leakage magnetic flux for recording can be formed more effectively and the recording operation can be continued with high density in a stable state. The width of the end face defining the track width on the medium facing surface of the second magnetic pole layer is either left or right with respect to the width of the end face defining the track width on the medium facing surface of the convex magnetic pole layer. You may arrange | position in the state shifted in the direction.

Further, in the thin film magnetic recording head according to the present invention, a magnetic pole is formed by the frame plating method on the first magnetic pole layer on the wafer which is the base on which the magnetic material pattern which is the first magnetic pole layer is formed. A first step of forming a convex magnetic pole film having a function, a second step of forming an organic material for flattening the convex magnetic pole layer in close contact with both side surfaces of the convex magnetic pole layer, and the organic material and the convex magnetic pole A third step of forming a second magnetic pole layer and an exciting coil covered with an insulator via a magnetic gap layer on a flat surface composed of a layer, and non-magnetic insulation for protecting the exciting coil A fourth step of covering the body; a fifth step of forming a terminal of the coil described above and then cutting the wafer to form a medium facing surface and removing the vicinity of the organic material of the medium facing surface; The surface is coated with a non-magnetic inorganic substance It is prepared with the procedure comprising a sixth step of forming a surface layer by embedding alumina in a recess formed by the retraction of the organic material described above from polished the bearing surface the medium facing surface with.

In this way, the thin film magnetic recording head according to the present invention can be mass-produced more reliably and efficiently, and the thin film magnetic recording head capable of high density recording can be obtained at a relatively low cost.

[0028]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings.

(First Embodiment) FIG. 1 is a block diagram of a thin film magnetic recording head according to the present invention as viewed from the medium facing surface. Further, FIG. 2 shows a schematic sectional view taken along the line AA of FIG. 1, and FIG. 3 shows a schematic sectional view taken along the line BB of FIG.

The thin film magnetic recording head 1 shown in FIGS.
Is a first magnetic pole layer 2 laminated on an underlayer (not shown).
And a second magnetic pole layer 5, and a magnetic gap layer 4 made of a non-magnetic member interposed between the magnetic pole layers 2 and 5. The leakage magnetic flux generated in the magnetic gap layer 5 portion is configured to magnetically record predetermined information on a magnetic recording medium (not shown).

Further, in this embodiment, the width in the track direction of the surface of the first magnetic pole layer 2 facing the above-mentioned magnetic recording medium (hereinafter, referred to as "medium facing surface") is the second width. Is set larger than the width F of the magnetic pole layer 5 in the track direction, and the convex magnetic pole layer that functions as a magnetic pole is provided on the side of the second magnetic pole layer 5 (upper side in FIG. 1) of the first magnetic pole layer 2 described above. 2A is installed side by side. Then, this convex magnetic pole layer 2
The magnetic gap layer 4 described above is disposed between A and the second magnetic pole layer 5 described above. Reference symbol E indicates the width of the convex magnetic pole layer 4.

A flattening layer 6 made of a non-magnetic member is provided on both sides of the convex magnetic pole layer 2A and on the medium facing surface side between the first magnetic pole layer 2 and the magnetic gap layer 4 described above. There is. In the present embodiment, the flattening layer 6 is set to have the same film thickness as that of the above-mentioned convex magnetic pole layer 2A, whereby the uniformity of the surface between the films is secured and the adhesion is strengthened.
Further, the flattening layer 6 is composed of a non-magnetic member made of a different material between the portion located near the medium facing surface and the portion located away from the medium facing surface. .

More specifically, in the flattening layer 6 made of the above-mentioned non-magnetic member, the portion located on the medium facing surface side is formed of the inorganic flattening layer 6A. In this case, alumina is used as the inorganic portion of the flattening layer 6A. Further, in the above-described flattening layer 6, a portion located away from the medium facing surface is formed of the organic flattening layer 6B. In this case, a photoresist is used as the organic portion of the flattening layer 6B.

The width E of the end surface of the convex magnetic pole layer 2A that defines the track width on the medium facing surface is equal to the width F of the end surface of the second magnetic pole layer 5 that defines the track width on the medium facing surface.
The width dimension (E = F) is almost the same as The above-mentioned convex magnetic pole layer 2A and the second magnetic pole layer 5 are aligned and arranged in parallel and close to each other on the medium facing surface.

As a result, in the magnetic gap layer 4 located between the convex magnetic pole layer 2A and the second magnetic pole layer 5, the width of the leakage magnetic flux for recording is restricted to the width E of the convex magnetic pole layer 2A, and the width is more than necessary. Since the width of the recording magnetic field becomes small even if the width of the second magnetic pole layer 5 is set to the same size as that of the conventional one, the recording on the magnetic recording medium is performed as compared with the above-mentioned conventional example. It is possible to increase the density (higher track density).

This will be described in more detail. When the thin film magnetic recording head described above is configured as a composite head with the MR reproducing head as described above, the first magnetic pole layer 2 is also shared as a magnetic shield on the MR reproducing head 121 side (see FIG. 10 in the conventional example). To be done. In this case, the first pole layer 2
Is a NiFe film having a film thickness of 1 to 3 [μm], and a NiFe film having a film thickness of 0.2 to 2 [μm] is formed on the first magnetic pole layer 2.
The convex magnetic pole layer 2A made of a film is formed.

The surface of the convex magnetic pole layer 2A in contact with the magnetic gap layer 4 is flattened by the flattening layers 6A made of an alumina film arranged on both sides thereof. This flattening layer 6
A is as shown in FIG. 3 (cross section BB in FIG. 1),
It exists only in the vicinity of the medium facing surface, and the flattening layer 6B made of an organic material such as a photoresist film is provided on the back side thereof as described above.

With this structure, when organic matter such as photoresist is exposed to the medium facing surface, dimensional instability occurs due to water supply and the like, and a head / medium interface failure occurs due to this. Can be effectively prevented.

Further, the magnetic gap layer 4 has a film thickness of 0.1 to 0.1.
A 0.3 [μm] alumina film is provided, on which an exciting coil 21 is provided which is insulated by being covered with a first step difference elimination layer 11 and a second step difference elimination layer 12 made of photoresist. 2 and 3).

Further, a second magnetic pole layer 5 having a side surface which is well aligned with a side surface which defines the track width on the medium facing surface of the convex magnetic pole layer 2A is provided. Second pole layer 5
Is a NiFe film, and the film thickness on the medium facing surface is 2 to
It is 5 [μm]. The above element is covered with a protective layer 13 made of an alumina film. With this configuration, a thin film magnetic recording head suitable for higher track density is realized in which the increase of the width of the recording magnetic field with respect to the width of the second magnetic pole layer 5 is suppressed on the medium facing surface.

In this thin film magnetic recording head, not only the NiFe film but also CoTaZ was used as the first magnetic pole layer 2.
An amorphous film typified by the r film, a microcrystalline film typified by the FeTaN film, a CoFeNi film, or the like may be used. Similarly, as the convex magnetic pole layer 2A, not only the NiFe film but also C
An oFeNi film or the like may be used. Further, as the second magnetic pole layer 5, not only a NiFe film but also a CoFeNi film or the like may be used.

Next, a method of manufacturing the above-mentioned thin film magnetic recording head will be described with reference to FIG. In FIG. 4, the first magnetic pole layer 2 is a predetermined underlayer 103 (for example, an MR layer) formed on a wafer as a base as shown in FIG.
It is laminated in a thin film on the read gap insulating layer of the head) (pre-process). The first magnetic pole layer 2 is formed of amorphous CoTa by a method of forming a NiFe film pattern by a frame plating method or a vapor phase growth method such as a sputtering method.
It is formed by a method such as ion beam etching after forming a Zr film or a NiFe film. Then, as shown below, a convex magnetic pole film 2A having a function as a magnetic pole is formed on the first magnetic pole layer 2 by a frame plating method.

4B and 4C show a step (first step) of forming the convex magnetic pole layer 2A which functions as a magnetic pole. The convex magnetic pole layer 2A is formed by frame plating. In FIG. 4B, reference numeral 20 indicates a resist frame. A pattern such as a NiFe film or a CoFeNi film is formed as the convex magnetic pole layer 2A by the frame plating method using the resist frame 20. Figure 4 (c)
Shows the state where the resist frame 20 is removed.

FIG. 4D shows a step (second step) of planarizing the convex magnetic pole layer 2A with the resist 6B. In this case, after the photoresist 6B is spin-coated, the side surface of the convex magnetic pole layer 2A is exposed and developed using an optimally aligned mask, and baked to form the photoresist 6B and the convex magnetic pole layer. The flattening is performed as a whole by effectively acting the meniscus force between the side surface of 2A.

4 (e) to 4 (f), the magnetic gap layer 4 is provided on the flattened surface composed of the convex magnetic pole layer 2A and the photoresist (organic material) 6B arranged on both side surfaces thereof. A third step of forming the exciting coil 107 covered with the second magnetic pole layer 5 and the insulator is shown. Here, FIG.
(E) shows a step of forming an alumina film by a sputtering method and using this as the magnetic gap layer 4. Also, FIG. 4 (e) shows
A step of forming the second magnetic pole layer 5 will be shown. The second magnetic pole layer 5 is formed in a predetermined pattern by a NiFe film or a CoFeNi film by a plating method using the resist frame 18.

In this case, the first step eliminating layer 11 made of photoresist is formed between the steps of FIGS. 4 (e) and 4 (f).
And a step of forming the exciting coil 21 insulated by the second step eliminating layer 12 made of photoresist, which is omitted in FIG. FIG. 4G shows a state where the resist frame 18 is removed. In FIG. 4 (h),
A fourth step is shown in which the alumina protective layer 13, which is a non-magnetic insulator for protecting the exciting coil 21 and the like, is coated and formed by the bias sputtering method.

Then, in the fifth step, after the above-mentioned wafer step is completed, the wafer is cut to form the element facing surface of the element in a state of being exposed, and the exposed photoresist (convex magnetic pole) is used. (The portion where the layer 2A is flattened)
The above-mentioned medium facing surface side of 6B is removed by etching to form a recess.

Then, following this, in the sixth step,
The recess formed at this time is filled with an alumina film by the bias sputtering method, and then the medium facing surface is polished, whereby a flattening layer as a surface layer made of alumina (inorganic member) having a depth D (see FIG. 3). 6A is formed. This is shown in FIG.

Here, the step shown in FIG. 4I will be described in more detail with reference to FIG. FIG. 5 shows a bar processing process after the wafer process is completed. First, Figure 5
(A) is a wafer process, and the process described above (see FIG. 4)
Equivalent to.

Next, FIG. 5B shows a step of cutting the wafer into a bar state (a state in which a plurality of magnetic head portions are formed in a row). FIG. 5C shows a step of roughly polishing the medium facing surface of the element to expose the element to the medium facing surface. Figure 5
In the exposed element, (d) is a step of retracting the planarized resist of the convex magnetic pole layer 2A from the medium facing surface by a method such as oxygen ashing.

FIG. 5E shows a step of covering the recess formed by the recession of the resist in the step of FIG. 5D described above with an alumina film by the bias sputtering method. FIG. 5F shows a step of determining the gap depth D (see FIG. 3) of the magnetic recording head by polishing the medium facing surface (ABS surface) on which the alumina film is formed. FIG. 5G is a configuration diagram showing the medium facing surface at the time when the above steps are completed.

Through the above steps, FIG. 1, FIG. 2 and FIG.
A thin film magnetic recording head having the structure shown in is obtained. With this thin film magnetic recording head, an increase in the width of the recording magnetic field with respect to the width of the second magnetic pole layer 5 is suppressed, and a thin film magnetic recording head suitable for increasing the track density can be realized.

(Second Embodiment) Next, a second embodiment will be described with reference to FIG. FIG. 2 is a schematic configuration diagram of the thin film magnetic recording head according to the present embodiment as viewed from the medium facing surface. In this thin-film magnetic recording head, the side surface defining the track width on the medium facing surface of the convex magnetic pole layer 2A is the medium facing surface of the second magnetic pole layer 5 in comparison with the first embodiment described in FIG. It is characterized in that it is inside the side surface that defines the track width of. Other configurations are the same as those of the first embodiment shown in FIG. 1 described above.

In this case, it is not easy to form the width of the second magnetic pole layer 5 to be narrow because of its large thickness. On the other hand, in the present embodiment, since the second magnetic pole layer 5 can be formed wider than the width of the convex magnetic pole 2A because it has the flattened magnetic gap layer 4, the width of the convex magnetic pole layer 2A can be narrowed. For example, the track width can be reduced even if the width of the second magnetic pole layer 5 is wide. Since the convex magnetic pole layer 2A has a relatively small thickness, it can be easily formed in a narrow width.

Therefore, also in this embodiment, it is possible to surely suppress the increase of the width of the recording magnetic field with respect to the width of the second magnetic pole layer 5, and the thin film magnetic recording head suitable for increasing the track density. Can be realized.

(Third Embodiment) Next, a third embodiment will be described with reference to FIG. FIG. 7 is a schematic configuration diagram of the thin-film magnetic recording head according to the present embodiment as viewed from the medium facing surface. In the thin-film magnetic recording head of the first embodiment described with reference to FIG. 1, the convex pole layer 2A has a medium facing surface on the side facing the track width on the medium facing surface, and the second magnetic pole layer 5 has a medium facing surface on the side surface. The thin film magnetic recording head is characterized in that the side surface defining the track width is shifted in one of the left and right directions. FIG. 7 shows a case where the second magnetic pole layer 5 is displaced rightward with respect to the convex magnetic pole layer 2A. Other configurations are the same as those shown in FIG.
It is the same as the first embodiment shown in FIG.

When the magnetic gap layer 4 has the flattened surface as described above, the second magnetic pole layer 5 can be formed so as to be offset from the convex magnetic pole layer 2A. In this structure, the track width is mainly defined by the overlapping width of the convex magnetic pole layer 2A and the second magnetic pole layer 5, so that the width of the convex magnetic pole layer 2A and the width of the second magnetic pole layer 5 are narrowed. No need to form
Manufacturing is easy. With this head, the second magnetic pole layer 5
A track width narrower than the track width can be obtained, and a thin film magnetic recording head suitable for high track density can be realized.

[0058]

Since the present invention is constructed and functions as described above, according to this, it is possible to effectively suppress the expansion of the width of the recording magnetic field with respect to the magnetic pole width of the second magnetic pole layer due to the action of the convex magnetic pole layer. Therefore, even if the width of the second magnetic pole layer is set to the same size as the conventional one, the width of the recording magnetic field becomes smaller, so that the recording density on the magnetic recording medium is increased (increased track density). It is possible to provide an excellent thin film magnetic recording head which has not been achieved in the past.

[0059] Moreover, both sides of the convex magnetic pole layer and the first magnetic pole
Between the magnetic layer and the magnetic gap layer, made of non-magnetic material, flat
A flattening layer is provided, and the flattening layer is provided on the side facing the magnetic recording medium.
The part to be positioned is made of inorganic material, and is
A portion located away from the organic material was formed. this
As a result, organic materials such as photoresist have been conventionally used on the medium facing surface.
If an object is exposed, dimensional instability will not occur due to water supply etc.
But due to this The resulting head / medium interface
Therefore, it is possible to effectively prevent the occurrence of a failure.

[Brief description of drawings]

FIG. 1 is a schematic configuration diagram showing an arrangement of each component on a medium facing surface of a thin film magnetic recording head according to an embodiment of the present invention.

FIG. 2 is a partial cross-sectional view taken along the arrow AA of FIG.

3 is a partial cross-sectional view taken along the arrow BB of FIG.

FIG. 4 is an explanatory view showing an example of a manufacturing method of the embodiment shown in FIG. 1, and proceeds in the order of (a) to (i).

5 is an explanatory diagram showing details of the final step in FIG. 4, and proceeds in the order of (a) to (g).

FIG. 6 is an explanatory diagram showing a second embodiment of the present invention.

FIG. 7 is an explanatory diagram showing a third embodiment of the present invention.

FIG. 8 is a cross-sectional view showing a conventional example.

9 is an explanatory diagram showing an example of the arrangement of each component on the medium facing surface of FIG.

FIG. 10 is an explanatory diagram showing another conventional example.

FIG. 11 is an explanatory diagram showing still another conventional example.

[Explanation of symbols] 2 First pole layer 2A convex pole layer 4 Magnetic gap layer 5 Second pole layer 6A, 6B flattening layer 11 First step elimination layer 12 Second step elimination layer 13 Protective layer 21 Excitation coil 100 base

─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Haruo Urai 5-7 Shiba 5-chome, Minato-ku, Tokyo Within NEC Corporation (56) Reference JP 10-21508 (JP, A) JP 9 -305921 (JP, A) JP-A-11-3510 (JP, A) JP-A-2000-36109 (JP, A) JP-A-2-244413 (JP, A) (58) Fields investigated (Int.Cl. ⁷ , DB name) G11B 5/31

Claims (7)

(57) [Claims] 1. A magnetic gap layer comprising a first magnetic pole layer and a second magnetic pole layer and comprising a non-magnetic member between the magnetic pole layers, and magnetic flux is generated by a leakage magnetic flux generated in the magnetic gap layer portion. In a thin-film magnetic recording head for magnetically recording predetermined information on a recording medium, a track-direction width of a surface of the first magnetic pole layer facing the magnetic recording medium is defined as a track direction width of the second magnetic pole layer. A convex magnetic pole layer that functions as a magnetic pole is provided on the side of the second magnetic pole layer of the first magnetic pole layer while being set larger than the width, and between the convex magnetic pole layer and the second magnetic pole layer. The magnetic gap layer is provided on the magnetic pole layer, and a flattening layer made of a non-magnetic member is provided on both sides of the convex magnetic pole layer and between the first magnetic pole layer and the magnetic gap layer. Located on the side facing the magnetic recording medium
The thin film magnetic recording head is characterized in that the portion is formed of an inorganic material, and the portion located away from the magnetic recording medium facing surface is formed of an organic material. 2. The thin film magnetic recording head according to claim 1, wherein the flattening layer is set to have the same film thickness as that of the convex magnetic pole layer. 3. A mineral constituting a part of the planarization layer is characterized as claims 1 or 2 thin film magnetic recording head according the alumina. Wherein the organic substance forms a part of the planarization layer according to claim 1, 2 or characterized in that a photoresist
3. The thin film magnetic recording head described in 3 . 5. The width of the end surface of the convex magnetic pole layer defining the track width on the medium facing surface is the same as the width of the end surface defining the track width on the medium facing surface of the second magnetic pole layer. 5. The thin film as claimed in claim 1 , wherein the convex magnetic pole layer and the second magnetic pole layer are arranged in parallel on the medium facing surface. Magnetic recording head. 6. A width dimension of an end surface of the convex magnetic pole layer that defines a track width on the medium facing surface is larger than a width dimension of an end surface of the second magnetic pole layer that defines a track width on the medium facing surface. 5. The thin film as set forth in claim 1 , wherein the thin film is set to have a small width and is located inside so as to correspond to the end face of the second magnetic pole layer on the medium facing surface. Magnetic recording head. 7. The width of the end face defining the track width of the second pole layer on the medium facing surface is smaller than the width of the end face defining the track width of the convex pole layer on the medium facing surface, 5. The thin film magnetic recording head according to claim 1 , wherein the thin film magnetic recording head is arranged so as to be displaced in one of the left and right directions.