JP3370271B2 - Epoxy resin composition for encapsulation and semiconductor device - Google Patents
Epoxy resin composition for encapsulation and semiconductor deviceInfo
- Publication number
- JP3370271B2 JP3370271B2 JP04077898A JP4077898A JP3370271B2 JP 3370271 B2 JP3370271 B2 JP 3370271B2 JP 04077898 A JP04077898 A JP 04077898A JP 4077898 A JP4077898 A JP 4077898A JP 3370271 B2 JP3370271 B2 JP 3370271B2
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- resin composition
- structural formula
- curing
- skeleton represented
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000003822 epoxy resin Substances 0.000 title claims description 91
- 229920000647 polyepoxide Polymers 0.000 title claims description 91
- 239000000203 mixture Substances 0.000 title claims description 46
- 239000004065 semiconductor Substances 0.000 title claims description 19
- 238000005538 encapsulation Methods 0.000 title claims description 8
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims description 40
- 235000010290 biphenyl Nutrition 0.000 claims description 20
- 239000004305 biphenyl Substances 0.000 claims description 20
- 239000003795 chemical substances by application Substances 0.000 claims description 18
- 239000000126 substance Substances 0.000 claims description 9
- -1 tertiary amine compounds Chemical class 0.000 claims description 9
- 239000005011 phenolic resin Substances 0.000 claims description 8
- 238000007789 sealing Methods 0.000 claims description 8
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 claims description 7
- 239000000945 filler Substances 0.000 claims description 7
- 239000000654 additive Substances 0.000 claims description 5
- 230000000996 additive effect Effects 0.000 claims description 5
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 5
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 150000008064 anhydrides Chemical class 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- 150000002903 organophosphorus compounds Chemical class 0.000 claims description 3
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims description 2
- 229920001568 phenolic resin Polymers 0.000 claims description 2
- 238000000465 moulding Methods 0.000 description 14
- 229920005989 resin Polymers 0.000 description 11
- 239000011347 resin Substances 0.000 description 11
- 229920003986 novolac Polymers 0.000 description 7
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 4
- 239000007822 coupling agent Substances 0.000 description 4
- 230000009849 deactivation Effects 0.000 description 4
- 239000003063 flame retardant Substances 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 4
- 238000001721 transfer moulding Methods 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 239000003638 chemical reducing agent Substances 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000005350 fused silica glass Substances 0.000 description 3
- UTOPWMOLSKOLTQ-UHFFFAOYSA-N octacosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCCCCCCCC(O)=O UTOPWMOLSKOLTQ-UHFFFAOYSA-N 0.000 description 3
- 235000013824 polyphenols Nutrition 0.000 description 3
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 239000004203 carnauba wax Substances 0.000 description 2
- 235000013869 carnauba wax Nutrition 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000004898 kneading Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 125000002298 terpene group Chemical group 0.000 description 2
- 125000005591 trimellitate group Chemical group 0.000 description 2
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 2
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 2
- FKBMTBAXDISZGN-BOJSHJERSA-N (3ar,7as)-5-methyl-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1C(C)CC[C@@H]2C(=O)OC(=O)[C@H]12 FKBMTBAXDISZGN-BOJSHJERSA-N 0.000 description 1
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 description 1
- PPNCOQHHSGMKGI-UHFFFAOYSA-N 1-cyclononyldiazonane Chemical compound C1CCCCCCCC1N1NCCCCCCC1 PPNCOQHHSGMKGI-UHFFFAOYSA-N 0.000 description 1
- QDCPNGVVOWVKJG-VAWYXSNFSA-N 2-[(e)-dodec-1-enyl]butanedioic acid Chemical compound CCCCCCCCCC\C=C\C(C(O)=O)CC(O)=O QDCPNGVVOWVKJG-VAWYXSNFSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- YWVFNWVZBAWOOY-UHFFFAOYSA-N 4-methylcyclohexane-1,2-dicarboxylic acid Chemical compound CC1CCC(C(O)=O)C(C(O)=O)C1 YWVFNWVZBAWOOY-UHFFFAOYSA-N 0.000 description 1
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 1
- FKBMTBAXDISZGN-UHFFFAOYSA-N 5-methyl-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1C(C)CCC2C(=O)OC(=O)C12 FKBMTBAXDISZGN-UHFFFAOYSA-N 0.000 description 1
- SVLTVRFYVWMEQN-UHFFFAOYSA-N 5-methylcyclohex-3-ene-1,2-dicarboxylic acid Chemical compound CC1CC(C(O)=O)C(C(O)=O)C=C1 SVLTVRFYVWMEQN-UHFFFAOYSA-N 0.000 description 1
- GPYZZWFCOCCLQZ-UHFFFAOYSA-N 6-methylcyclohex-3-ene-1,2-dicarboxylic acid Chemical compound CC1CC=CC(C(O)=O)C1C(O)=O GPYZZWFCOCCLQZ-UHFFFAOYSA-N 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- 235000010919 Copernicia prunifera Nutrition 0.000 description 1
- 244000180278 Copernicia prunifera Species 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 239000004844 aliphatic epoxy resin Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- IFDVQVHZEKPUSC-UHFFFAOYSA-N cyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCC=CC1C(O)=O IFDVQVHZEKPUSC-UHFFFAOYSA-N 0.000 description 1
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- GPAYUJZHTULNBE-UHFFFAOYSA-N diphenylphosphine Chemical compound C=1C=CC=CC=1PC1=CC=CC=C1 GPAYUJZHTULNBE-UHFFFAOYSA-N 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000004382 potting Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- USFPINLPPFWTJW-UHFFFAOYSA-N tetraphenylphosphonium Chemical compound C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 USFPINLPPFWTJW-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
Landscapes
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Description
【発明の詳細な説明】Detailed Description of the Invention
【0001】[0001]
【発明の属する技術分野】本発明は、ダイオード、トラ
ンジスター、集積回路等の電気・電子部品や半導体装置
等の保護、封止に使用されるエポキシ樹脂組成物と、こ
れを用いた半導体装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin composition used for protection and encapsulation of electric / electronic parts such as diodes, transistors and integrated circuits and semiconductor devices, and a semiconductor device using the same.
【0002】[0002]
【従来の技術】ダイオード、トランジスター、集積回路
等の電気・電子部品や半導体装置などの封止方法として
は、たとえば、エポキシ樹脂やシリコン樹脂等による封
止方法や、ガラス、金属、セラミック等を用いたハーメ
チックシール法が採用されているが、近年では、信頼性
の向上とともに大量生産が可能であり、かつ、コストの
面でメリットのあるエポキシ樹脂を用いた低圧トランス
ファー成形による樹脂封止が主流を占めている。2. Description of the Related Art As a sealing method for electric / electronic parts such as diodes, transistors and integrated circuits, and semiconductor devices, for example, a sealing method using epoxy resin or silicon resin, glass, metal, ceramic or the like is used. However, in recent years, resin encapsulation by low-pressure transfer molding using epoxy resin, which has improved reliability and can be mass-produced and has cost advantages, has become mainstream. is occupying.
【0003】このエポキシ樹脂を用いる封止法において
は、o−クレゾールノボラック型エポキシ樹脂を基体樹
脂成分とし、その硬化剤としてフェノールノボラック樹
脂を用いたエポキシ樹脂組成物からなる成形材料が一般
的に使用されている。しかしながら、IC、LSI、V
LSI等の電子部品や半導体装置の高密度化、高集積化
に伴って、モールド樹脂の薄肉化のためには、従来のエ
ポキシ樹脂組成物では必ずしも満足に対応することがで
きなくなっている。In the encapsulation method using this epoxy resin, a molding material composed of an o-cresol novolac type epoxy resin as a base resin component and an epoxy resin composition using a phenol novolac resin as a curing agent is generally used. Has been done. However, IC, LSI, V
With the increase in density and integration of electronic parts such as LSIs and semiconductor devices, conventional epoxy resin compositions cannot always satisfactorily meet the demand for thinner mold resins.
【0004】たとえば、表面実装用デバイスにおいて
は、実装時にデバイス自身が半田に直接浸漬される等、
急激に高温過酷な環境下にさらされるため、パッケージ
クラック等の発生が避けられない事態となっている。す
なわち、成形後の保管中に吸湿された水分が高温にさら
される際に急激に気化膨張し、封止樹脂がこれに耐えき
れずにパッケージにクラックが生じる。For example, in a surface mounting device, the device itself is directly immersed in solder during mounting,
Since it is rapidly exposed to high temperature and harsh environment, the occurrence of package cracks is unavoidable. That is, when the moisture absorbed during storage after molding is rapidly vaporized and expanded when exposed to high temperatures, the sealing resin cannot withstand this and cracks occur in the package.
【0005】このような問題点を解消するため、封止用
エポキシ樹脂組成物については、耐熱性、密着性等の向
上等の検討がなされ、実際に、これらの特性の改良がな
されてきている。たとえば、ビフェニル骨格を有するビ
フェニル型エポキシ樹脂の使用が検討され、改良がなさ
れてきた。In order to solve these problems, the encapsulating epoxy resin composition has been studied for improvement in heat resistance, adhesiveness, etc., and these characteristics have been actually improved. . For example, the use of a biphenyl type epoxy resin having a biphenyl skeleton has been studied and improved.
【0006】[0006]
【発明が解決しようとする課題】ところが、ビフェニル
型エポキシ樹脂を用いた場合、反応架橋密度の低下や水
分による硬化促進剤の失活等が原因で、成形硬化時の剛
性が確保できず、成形トラブル、特に離型トラブルの原
因となっていた。そこで、本発明の課題は、ビフェニル
型エポキシ樹脂を用いたエポキシ樹脂組成物において、
成形硬化時の剛性を充分確保でき、離型トラブル等の成
形トラブルが生じにくい封止用エポキシ樹脂組成物と、
これを用いた半導体装置を提供することにある。However, when a biphenyl type epoxy resin is used, the rigidity at the time of molding and curing cannot be ensured due to a decrease in the reaction cross-linking density, deactivation of the curing accelerator due to water, etc. It caused troubles, especially mold release troubles. Therefore, an object of the present invention is to provide an epoxy resin composition using a biphenyl type epoxy resin,
An epoxy resin composition for encapsulation, which can sufficiently secure rigidity during molding and curing, and is unlikely to cause molding problems such as mold release problems.
It is to provide a semiconductor device using this.
【0007】[0007]
【課題を解決するための手段】上記課題を解決するた
め、本発明者らは、鋭意検討を重ねた結果、下記のこと
を見出し、本発明を完成するに至った。すなわち、ビフ
ェニル型エポキシ樹脂を用いたエポキシ樹脂組成物に、
添加剤として少なくとも1つのシクロ環を有するカルボ
ン酸の無水物を下記所定量添加すれば、ビフェニル型エ
ポキシ樹脂を用いた従来の封止用エポキシ樹脂組成物と
比べて、ビフェニル型エポキシ樹脂の使用による反応架
橋密度の低下や水分による硬化促進剤の失活等が防止さ
れ、その結果、成形硬化時の剛性が充分確保されて、離
型トラブル等の成形トラブルが生じにくくなるというこ
とである。In order to solve the above problems, the inventors of the present invention have made extensive studies, and as a result, have found the following and have completed the present invention. That is, an epoxy resin composition using a biphenyl type epoxy resin,
When the following predetermined amount of an anhydride of a carboxylic acid having at least one cyclo ring is added as an additive, compared with the conventional encapsulating epoxy resin composition using a biphenyl type epoxy resin, the use of the biphenyl type epoxy resin is This means that the decrease in the reaction cross-linking density and the deactivation of the curing accelerator due to water are prevented, and as a result, the rigidity during molding and curing is sufficiently secured, and molding troubles such as mold release troubles are less likely to occur.
【0008】すなわち、本発明にかかる封止用エポキシ
樹脂組成物は、下記構造式(1)で示されるビフェニル
骨格を有するビフェニル型エポキシ樹脂を少なくとも含
むエポキシ樹脂と、硬化剤と、硬化促進剤と、充填材と
を必須成分として含有してなる封止用エポキシ樹脂組成
物において、前記硬化剤は、フェノール樹脂からなり、
前記エポキシ樹脂1当量に対して0.5〜1.5当量を
含み、前記硬化促進剤は、エポキシ樹脂組成物全体に対
して0.25〜5重量%を含み、さらに、添加剤として
少なくとも1つのシクロ環を有するカルボン酸の無水物
を全樹脂量に対して0.1〜3.0重量%含むことを特
徴とする。That is, the epoxy resin composition for sealing according to the present invention comprises an epoxy resin containing at least a biphenyl type epoxy resin having a biphenyl skeleton represented by the following structural formula (1), a curing agent, and a curing accelerator. In the epoxy resin composition for encapsulation containing a filler as an essential component, the curing agent comprises a phenol resin ,
The epoxy resin may be included in an amount of 0.5 to 1.5 equivalents, the curing accelerator may be included in an amount of 0.25 to 5% by weight based on the total amount of the epoxy resin composition, and at least 1 as an additive. It is characterized in that it contains 0.1 to 3.0% by weight of an anhydride of a carboxylic acid having one cyclo ring with respect to the total amount of the resin.
【0009】[0009]
【化4】 [Chemical 4]
【0010】(式中、R1 〜R8 は水素原子または炭素
数1〜5のアルキル基。)
本発明にかかる半導体装置は、半導体素子を本発明の封
止用エポキシ樹脂組成物で封止してなる。(In the formula, R 1 to R 8 are hydrogen atoms or alkyl groups having 1 to 5 carbon atoms.) In the semiconductor device according to the present invention, a semiconductor element is sealed with the epoxy resin composition for sealing according to the present invention. I will do it.
【0011】[0011]
【発明の実施の形態】(エポキシ樹脂組成物)エポキシ
樹脂として用いられるビフェニル型エポキシ樹脂は、前
記構造式(1)で示されるビフェニル骨格を有する。式
(1)中、R1 〜R8 は水素原子または炭素数1〜5の
アルキル基であれば特に限定はされない。BEST MODE FOR CARRYING OUT THE INVENTION (Epoxy Resin Composition) A biphenyl type epoxy resin used as an epoxy resin has a biphenyl skeleton represented by the structural formula (1). In formula (1), R 1 to R 8 are not particularly limited as long as they are hydrogen atoms or alkyl groups having 1 to 5 carbon atoms.
【0012】エポキシ樹脂としては、前記ビフェニル型
エポキシ樹脂が必ず使用されるが、これ以外のエポキシ
樹脂を併用しても良い。ビフェニル型エポキシ樹脂と併
用可能なエポキシ樹脂は、1分子中に2個以上のエポキ
シ基を持っていれば特に制限はないが、好ましい例とし
ては、下記構造式(2):As the epoxy resin, the above biphenyl type epoxy resin is always used, but other epoxy resins may be used together. The epoxy resin that can be used in combination with the biphenyl type epoxy resin is not particularly limited as long as it has two or more epoxy groups in one molecule, but a preferable example is the following structural formula (2):
【0013】[0013]
【化5】 [Chemical 5]
【0014】で示されるジシクロペンタジエン骨格を有
するジシクロペンタジエン型エポキシ樹脂、クレゾール
(ノボラック)型エポキシ樹脂、ビスフェノール型(A
型、F型、S型等)エポキシ樹脂、トリフェニルメタン
型エポキシ樹脂、ブロム含有エポキシ樹脂、ナフタレン
環含有エポキシ樹脂、脂環式エポキシ樹脂、トリグリシ
ジルイソシアヌレート、脂肪族系エポキシ樹脂等が挙げ
られ、これらの中から1種のみまたは2種以上選んで使
用できる。これらの中でもジシクロペンタジエン型エポ
キシ樹脂が、低吸湿性、耐(湿)リフロー性等の点から
特に好ましい。A dicyclopentadiene type epoxy resin having a dicyclopentadiene skeleton represented by, a cresol (novolak) type epoxy resin, and a bisphenol type (A
Type, F type, S type, etc.) epoxy resin, triphenylmethane type epoxy resin, brominated epoxy resin, naphthalene ring-containing epoxy resin, alicyclic epoxy resin, triglycidyl isocyanurate, aliphatic epoxy resin and the like. Of these, only one kind or two or more kinds can be selected and used. Among these, the dicyclopentadiene type epoxy resin is particularly preferable from the viewpoint of low hygroscopicity, (wet) reflow resistance and the like.
【0015】上記ジシクロペンタジエン型エポキシ樹脂
としては、特に限定はされないが、たとえば、下記構造
式(2−1)で示されるものが挙げられる。The dicyclopentadiene type epoxy resin is not particularly limited, but examples thereof include those represented by the following structural formula (2-1).
【0016】[0016]
【化6】 (式中、nは0〜6の整数。)[Chemical 6] (In the formula, n is an integer of 0 to 6.)
【0017】前記構造式(2−1)で示されるエポキシ
樹脂は、たとえば、大日本インキ化学工業(株)EXA
7200の他、日本化薬(株)から市販されている。前
記ビフェニル型エポキシ樹脂の使用量は、エポキシ樹脂
組成物中の全エポキシ樹脂に対し、20〜100重量%
の割合であることが好ましい。20重量%を下回ると、
耐熱性、密着性等の向上効果が低くなる傾向がある。The epoxy resin represented by the structural formula (2-1) is, for example, EXA manufactured by Dainippon Ink and Chemicals, Inc.
In addition to 7200, it is commercially available from Nippon Kayaku Co., Ltd. The amount of the biphenyl type epoxy resin used is 20 to 100% by weight based on the total epoxy resin in the epoxy resin composition.
Is preferable. Below 20% by weight,
The effect of improving heat resistance and adhesion tends to be low.
【0018】硬化剤としては、エポキシ樹脂と反応する
ものであれば特に制限はないが、光半導体封止のために
は比較的着色の少ないものが好ましい。好ましい例とし
ては、1分子中にフェノール性水酸基を2個以上有する
もの、たとえば、フェノールノボラック、クレゾールノ
ボラック、フェノールアラルキル、ナフトールアラルキ
ル、トリフェニルメタン型フェノール、その他の各種多
価フェノール化合物などを1種または2種以上用いるこ
とができる。多価フェノール化合物の中でも、下記構造
式(3)で示される骨格を有するフェノールアラルキル
樹脂および下記構造式(4)で示されるテルペン骨格を
有するフェノール樹脂からなる群の中から選ばれた少な
くとも1種を使用することが、低吸湿性、耐(湿)リフ
ロー性等の点で特に好ましい。The curing agent is not particularly limited as long as it reacts with the epoxy resin, but those having relatively little coloring are preferable for encapsulating the optical semiconductor. As a preferable example, one having two or more phenolic hydroxyl groups in one molecule, for example, phenol novolac, cresol novolac, phenol aralkyl, naphthol aralkyl, triphenylmethane type phenol, and other various polyphenol compounds are used. Alternatively, two or more kinds can be used. Among the polyphenol compounds, at least one selected from the group consisting of a phenol aralkyl resin having a skeleton represented by the following structural formula (3) and a phenol resin having a terpene skeleton represented by the following structural formula (4). It is particularly preferable to use (1) in terms of low hygroscopicity, (wet) reflow resistance and the like.
【0019】[0019]
【化7】 [Chemical 7]
【0020】(式中、nは1〜5の整数。)
使用硬化剤全体に対する前記構造式(3)および/また
は前記構造式(4)のフェノール樹脂の使用割合は、2
0〜100重量%であることが好ましい。20重量%を
下回ると、これらのフェノール樹脂を使用した効果が充
分に得られない恐れがある。(In the formula, n is an integer of 1 to 5.) The ratio of the phenol resin of the above structural formula (3) and / or the above structural formula (4) to the whole curing agent used is 2
It is preferably from 0 to 100% by weight. If it is less than 20% by weight, the effect of using these phenol resins may not be sufficiently obtained.
【0021】エポキシ樹脂組成物中、硬化剤の配合割合
は、エポキシ樹脂1当量に対して硬化剤の当量を0.5
〜1.5の範囲に設定することが好ましく、特に好まし
くは0.7〜1.0である。硬化剤の当量が0.5未満
であれば離型性が悪く、1.5を超えると吸湿が増加
し、信頼性が悪くなる傾向がある。硬化促進剤として
は、エポキシ樹脂と硬化剤の反応を促進させる作用があ
るものであれば特に制限はないが、好ましい例として
は、トリフェニルホスフィン、ジフェニルホスフィン等
の有機ホスフィン類等の有機リン化合物;2−メチルイ
ミダゾール、2−フェニルイミダゾール、2−フェニル
−4−メチルイミダゾール等のイミダゾール類;1,8
−ジアザビシクロ〔5,4,0〕ウンデセン−7(「D
BU」とも言う)、ジアザビシクロノナン(「DBN」
とも言う)、トリエタノールアミン、ベンジルジメチル
アミン等の3級アミン化合物;テトラフェニルホスホニ
ウム・テトラフェニルボレート等の有機塩類等を用いる
ことができる。これらは1種のみ用いてもよいし2種以
上併用してもよい。これらの中でも有機リン化合物およ
び/または3級アミン化合物の使用が、耐湿信頼性、耐
(湿)リフロー性等の点で特に好ましい。In the epoxy resin composition, the mixing ratio of the curing agent is 0.5 equivalent to 1 equivalent of the epoxy resin.
It is preferable to set in the range of 1.5 to 1.5, and particularly preferably 0.7 to 1.0. If the equivalent of the curing agent is less than 0.5, the releasability tends to be poor, and if it exceeds 1.5, moisture absorption tends to increase and reliability tends to deteriorate. The curing accelerator is not particularly limited as long as it has an action of accelerating the reaction between the epoxy resin and the curing agent, but preferable examples include organic phosphorus compounds such as triphenylphosphine and diphenylphosphine. Imidazoles such as 2-methylimidazole, 2-phenylimidazole and 2-phenyl-4-methylimidazole; 1,8
-Diazabicyclo [5,4,0] undecene-7 ("D
BU)), diazabicyclononane (“DBN”)
(Also referred to as), tertiary amine compounds such as triethanolamine and benzyldimethylamine; organic salts such as tetraphenylphosphonium and tetraphenylborate, and the like. These may be used alone or in combination of two or more. Among these, use of an organic phosphorus compound and / or a tertiary amine compound is particularly preferable in terms of moisture resistance reliability, (wet) reflow resistance, and the like.
【0022】硬化促進剤の配合割合は、エポキシ樹脂組
成物全体に対して0.25〜5重量%であることが好ま
しい。硬化促進剤の配合量が0.25重量%未満では、
ゲル化時間が遅くなり、硬化不足により作業性を著しく
低下させる傾向がみられ、逆に5重量%を超えると、硬
化が急速に進み、その結果、発熱が大きくなってクラッ
クや発泡、成形トラブルを生じる恐れがあるからであ
る。The mixing ratio of the curing accelerator is preferably 0.25 to 5% by weight based on the whole epoxy resin composition. If the compounding amount of the curing accelerator is less than 0.25% by weight,
Gelation time is delayed and workability tends to be significantly reduced due to insufficient curing. Conversely, if it exceeds 5% by weight, curing proceeds rapidly, resulting in large heat generation and cracks, foaming, or molding problems. This is because there is a risk that
【0023】本発明にかかるエポキシ樹脂組成物には、
樹脂硬化物にクラックを生じにくくさせたりするため
に、充填材が配合される。充填材としては、特に限定す
る訳ではないが、たとえば、溶融シリカ、結晶シリカ、
アルミナ、窒化珪素等の無機充填材等を1種または2種
以上用いることができる。これらの中でも溶融シリカ
が、流動性、耐(湿)リフロー性等の点で好ましい。The epoxy resin composition according to the present invention includes
A filler is blended in order to make the resin cured product less likely to crack. The filler is not particularly limited, for example, fused silica, crystalline silica,
One or more inorganic fillers such as alumina and silicon nitride can be used. Of these, fused silica is preferable in terms of fluidity, (wet) reflow resistance, and the like.
【0024】充填材の配合割合は組成物全体の65〜9
0重量%であることが好ましい。本発明の封止用エポキ
シ樹脂組成物には、ビフェニル型エポキシ樹脂の使用に
よる反応架橋密度の低下や水分による硬化促進剤の失活
等を防止して成形硬化時の剛性を充分確保するために、
添加剤として、少なくとも1つのシクロ環を有するカル
ボン酸の無水物が配合される。その具体例としては、特
に限定はされないが、たとえば、テトラヒドロフタル
酸、ヘキサヒドロフタル酸、4−メチルテトラヒドロフ
タル酸、4−メチルヘキサヒドロフタル酸、3−メチル
テトラヒドロフタル酸、コハク酸、ドデセニルコハク
酸、ポリアゼライン酸、エチレングリコールビス(トリ
メリテート)、グリセロールトリス(トリメリテート)
等のカルボン酸の無水物およびその変性物等が挙げられ
る。これらは1種のみ用いても2種以上併用してもよ
い。The mixing ratio of the filler is 65 to 9 of the whole composition.
It is preferably 0% by weight. In the encapsulating epoxy resin composition of the present invention, in order to sufficiently secure the rigidity at the time of molding and curing by preventing the reduction of the reaction crosslink density due to the use of the biphenyl type epoxy resin and the deactivation of the curing accelerator due to moisture. ,
An carboxylic acid anhydride having at least one cyclo ring is mixed as an additive. Specific examples thereof include, but are not particularly limited to, for example, tetrahydrophthalic acid, hexahydrophthalic acid, 4-methyltetrahydrophthalic acid, 4-methylhexahydrophthalic acid, 3-methyltetrahydrophthalic acid, succinic acid, dodecenylsuccinic acid. , Polyazelaic acid, ethylene glycol bis (trimellitate), glycerol tris (trimellitate)
And carboxylic acid anhydrides and modified products thereof. These may be used alone or in combination of two or more.
【0025】エポキシ樹脂組成物中、上記カルボン酸の
無水物の配合量は、エポキシ樹脂組成物の全樹脂量に対
して0.1〜3.0重量%の割合であり、好ましくは
0.3〜1.5重量%、より好ましくは0.5〜1.0
重量%である。0.1重量%未満だと、添加した効果が
充分に得られない恐れがあり、3.0重量%を超える
と、耐湿信頼性が悪化する恐れがある。In the epoxy resin composition, the amount of the carboxylic acid anhydride compounded is 0.1 to 3.0% by weight, preferably 0.3% by weight, based on the total amount of the resin in the epoxy resin composition. ~ 1.5 wt%, more preferably 0.5-1.0
% By weight. If it is less than 0.1% by weight, the effect of addition may not be sufficiently obtained, and if it exceeds 3.0% by weight, the moisture resistance reliability may be deteriorated.
【0026】なお、上記カルボン酸の無水物は、組成物
への配合時や組成物の保存時等に、その一部が水分と反
応してカルボン酸になっても差し支えない。エポキシ樹
脂組成物による樹脂封止は金型を用いて行うのが、普通
であり、脱型を容易にするために、本発明にかかるエポ
キシ樹脂組成物でも離型剤を配合しておくことが好まし
い。離型剤としては、例えば、天然カルナバ系、高級脂
肪酸、ポリエチレン系ワックスなどを用いることがで
き、1種のみ用いても2種以上併用してもよい。具体的
には、カルナバワックス、ステアリン酸、ステアリン酸
誘導体、モンタン酸、モンタン酸誘導体、カルボキシル
基含有ポリオレフイン等が好ましく用いられる。これら
は1種のみ使用されるほか、2種以上が併用されること
もある。離型剤の配合割合は組成物全体の0.05〜
1.5重量%であることが好ましい。The carboxylic acid anhydride may react with water to form a carboxylic acid when it is added to the composition or when the composition is stored. It is usual to perform resin encapsulation with an epoxy resin composition using a mold, and in order to facilitate demolding, the epoxy resin composition according to the present invention may also contain a release agent. preferable. As the releasing agent, for example, natural carnauba-based, higher fatty acid, polyethylene-based wax and the like can be used, and one kind may be used or two or more kinds may be used in combination. Specifically, carnauba wax, stearic acid, stearic acid derivative, montanic acid, montanic acid derivative, carboxyl group-containing polyolefin and the like are preferably used. These may be used alone or in combination of two or more. The compounding ratio of the release agent is 0.05 to the whole composition.
It is preferably 1.5% by weight.
【0027】本発明にかかる封止用エポキシ樹脂組成物
には、必要に応じて、着色剤、低応力化剤、難燃剤、カ
ップリング剤等が適宜量添加されていてもよい。着色剤
としては、例えばカーボンブラック、酸化チタン等の顔
料等が挙げられる。低応力化剤としては、例えば、シリ
コーンゲル、シリコーンゴム、シリコーンオイル等が挙
げられる。難燃剤としては、例えば、三酸化アンチモ
ン、ハロゲン化合物、リン化合物等が挙げられる。カッ
プリング剤としては、例えば、γ−グリシドキシプロピ
ルトリメトキシシラン、γ−メルカプトプロピルトリメ
トキシシラン等のシランカップリング剤等が挙げられ
る。前記着色剤、低応力化剤、難燃剤、カップリング剤
等はそれぞれ2種類以上を併用することもできる。A colorant, a stress reducing agent, a flame retardant, a coupling agent and the like may be added to the encapsulating epoxy resin composition of the present invention in appropriate amounts, if necessary. Examples of the colorant include pigments such as carbon black and titanium oxide. Examples of the stress reducing agent include silicone gel, silicone rubber, silicone oil and the like. Examples of the flame retardant include antimony trioxide, halogen compounds, phosphorus compounds and the like. Examples of the coupling agent include silane coupling agents such as γ-glycidoxypropyltrimethoxysilane and γ-mercaptopropyltrimethoxysilane. Two or more kinds of the colorant, the stress reducing agent, the flame retardant, the coupling agent and the like may be used in combination.
【0028】本発明のエポキシ樹脂組成物は、前述した
各成分をミキサー、ブレンダー等によって均一に混合し
たのち、ロール、ニーダー等によって混練することで製
造することができる。成分の配合順序は特に制限はな
い。本発明のエポキシ樹脂組成物は、より具体的には、
例えば、エポキシ樹脂、硬化剤、硬化促進剤、充填材、
カルボン酸の無水物、さらには必要に応じてその他の配
合成分を溶解混合又は溶融混合した後、3本ロール等で
溶融混練し、この混練物を冷却・固化した後、粉砕し、
必要ならタブレット状に打錠することにより製造するこ
とができる。性状が室温で液状の場合は、溶解混合又は
溶融混練までで製造することができる。
(半導体装置の封止)このようにして得られたエポキシ
樹脂組成物は、金型を用い、固形の場合はタブレットを
トランスファー成形することにより、また、液状の場合
はキャスティングやポッティング、印刷等の方式で注
型、硬化させることにより、光半導体装置等の半導体装
置のリードフレームや積層板に搭載した半導体素子を封
止することができる。The epoxy resin composition of the present invention can be produced by uniformly mixing the above-mentioned components with a mixer, a blender or the like, and then kneading them with a roll, a kneader or the like. The order of mixing the components is not particularly limited. More specifically, the epoxy resin composition of the present invention,
For example, epoxy resin, curing agent, curing accelerator, filler,
Anhydrous carboxylic acid, and further, if necessary, other mixing components are melt-mixed or melt-mixed, and then melt-kneaded with a three-roll or the like, and the kneaded product is cooled and solidified, and then pulverized,
If necessary, it can be manufactured by tableting into tablets. When the property is liquid at room temperature, it can be produced by melt mixing or melt kneading. (Sealing of semiconductor device) The epoxy resin composition thus obtained is used for transfer molding a tablet in the case of a solid using a mold, and in the case of a liquid, casting, potting, printing, etc. By casting and curing by a method, a semiconductor element mounted on a lead frame or a laminated plate of a semiconductor device such as an optical semiconductor device can be sealed.
【0029】上記リードフレームとしては、電気伝導性
および熱伝導性(より高機能の素子および大型素子は発
熱量がより多い)の点で銅や銅合金製のリードフレーム
が、また、熱膨張率の点で42アロイ合金製のリードフ
レームが一般に使用される。これらのリードフレーム
は、金線等のボンディングワイヤーとの接着性が低いた
め、リードフレームのボンディングワイヤーと接続しよ
うとする部分にあらかじめ銀メッキや金メッキを行った
後、ボンディングワイヤーと接続し、接続の信頼性を改
良するようにしている。銅系のリードフレームではニッ
ケルや銀、金のメッキ処理を行うことが多い。As the above-mentioned lead frame, a lead frame made of copper or copper alloy in terms of electrical conductivity and thermal conductivity (more sophisticated elements and large-sized elements generate a larger amount of heat), and a coefficient of thermal expansion. In this regard, a lead frame made of 42 alloy alloy is generally used. Since these lead frames have low adhesiveness with bonding wires such as gold wires, the parts of the lead frame that are to be connected to the bonding wires are silver-plated or gold-plated in advance, and then connected to the bonding wires. I try to improve reliability. Copper-based lead frames are often plated with nickel, silver or gold.
【0030】[0030]
【実施例】以下、実施例及び比較例によって本発明を詳
細に説明する。なお、本発明は下記実施例に限定されな
い。
<実施例1〜8および比較例1〜3>表1〜3に示す配
合(配合量の単位は重量基準)でエポキシ樹脂組成物を
製造し、半導体装置の封止を行った。表中、各成分の詳
細は下記の通り。EXAMPLES The present invention will be described in detail below with reference to examples and comparative examples. The present invention is not limited to the examples below. <Examples 1 to 8 and Comparative Examples 1 to 3> Epoxy resin compositions were produced with the formulations shown in Tables 1 to 3 (the unit of the formulation amount is the weight basis), and the semiconductor device was sealed. Details of each component in the table are as follows.
【0031】エポキシ樹脂A:前記構造式(1)のビフ
ェニル骨格を有するビフェニル型エポキシ樹脂(油化シ
ェルエポキシ(株)製、エポキシ当量195、品番YX
4000H)。
エポキシ樹脂B:前記構造式(2−1)のジシクロペン
タジエン型エポキシ樹脂(大日本インキ化学(株)製、
エポキシ当量264、品番HP7200)。Epoxy resin A: Biphenyl type epoxy resin having a biphenyl skeleton of the above structural formula (1) (produced by Yuka Shell Epoxy Co., Ltd., epoxy equivalent 195, product number YX)
4000H). Epoxy resin B: dicyclopentadiene type epoxy resin represented by the structural formula (2-1) (manufactured by Dainippon Ink and Chemicals, Inc.,
Epoxy equivalent 264, product number HP7200).
【0032】エポキシ樹脂C:o−クレゾールノボラッ
ク型エポキシ樹脂(住友化学(株)製、エポキシ当量1
95、品番ESCN−195XL)。
エポキシ樹脂D:ブロム化エポキシ樹脂(住友化学
(株)製、エポキシ当量400、品番ESB400
T)。
硬化剤A:前記構造式(3)の骨格を有するフェノール
アラルキル樹脂(住金化工(株)製、水酸基当量16
9、品番HE100)。Epoxy resin C: o-cresol novolac type epoxy resin (Sumitomo Chemical Co., Ltd., epoxy equivalent 1
95, product number ESCN-195XL). Epoxy resin D: Brominated epoxy resin (Sumitomo Chemical Co., Ltd., epoxy equivalent 400, product number ESB400
T). Curing agent A: Phenol aralkyl resin having the skeleton of the structural formula (3) (manufactured by Sumikin Kako Co., Ltd., hydroxyl equivalent 16)
9, product number HE100).
【0033】硬化剤B:前記構造式(4)のテルペン骨
格を有するフェノール樹脂(油化シェル(株)製、水酸
基当量175、品番MP402FPY)。
硬化剤C:フェノールノボラック樹脂(荒川化学(株)
製、水酸基当量105、品番タマノール)。
カルボン酸無水物:4−メチルヘキサヒドロ無水フタル
酸(新日本理化(株)製、品番リカシッドMH)。Curing agent B: Phenolic resin having a terpene skeleton represented by the structural formula (4) (produced by Yuka Shell Co., Ltd., hydroxyl equivalent 175, product number MP402FPY). Hardener C: Phenol novolac resin (Arakawa Chemical Co., Ltd.)
Made, hydroxyl equivalent 105, product number Tamanol). Carboxylic anhydride: 4-methylhexahydrophthalic anhydride (manufactured by Shin Nippon Rika Co., Ltd., product number RIKACID MH).
【0034】硬化促進剤A:トリフェニルホスフィン
(北興化学(株)製)。
硬化促進剤B:1,8−ジアザビシクロ〔5,4,0〕
ウンデセン−7(サンアプロ(株)製)。
硬化促進剤C:2−フェニルイミダゾール(四国化成工
業(株)製)。
離型剤:天然カルナバワックス。Curing accelerator A: triphenylphosphine (manufactured by Kitako Chemical Co., Ltd.). Curing accelerator B: 1,8-diazabicyclo [5,4,0]
Undecen-7 (manufactured by San-Apro Co., Ltd.). Curing accelerator C: 2-phenylimidazole (manufactured by Shikoku Chemicals Co., Ltd.). Release agent: Natural carnauba wax.
【0035】難燃剤:三酸化二アンチモン(三菱マテリ
アル(株)製、品番Sb203−NT)。
顔料:カーボンブラック(三菱マテリアル(株)製、品
番750−B)。
充填材:溶融シリカ(龍森社製)。
カップリング剤:γ−グリシドキシプロピルトリメトキ
シシラン(信越化学(株)製、品番KBM403E)。Flame retardant: Antimony trioxide (manufactured by Mitsubishi Materials Corp., product number Sb203-NT). Pigment: carbon black (manufactured by Mitsubishi Materials Corp., product number 750-B). Filler: fused silica (Tatsumori Co., Ltd.). Coupling agent: γ-glycidoxypropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., product number KBM403E).
【0036】エポキシ樹脂組成物の製造条件は以下のと
おりであった。
(エポキシ樹脂組成物の製造条件):各成分をミキサ
ー、ブレンダー等によって30分間均一に混合した後、
ロール、ニーダー等によって処理し、次いで冷却固化し
た。その後、粉砕機で粉砕して、封止材料を得た。The production conditions of the epoxy resin composition were as follows. (Production conditions for epoxy resin composition): After uniformly mixing the respective components for 30 minutes with a mixer, a blender or the like,
It was treated with a roll, a kneader or the like, and then cooled and solidified. Then, it grind | pulverized with the grinder and obtained the sealing material.
【0037】得られた各エポキシ樹脂組成物およびその
成形品について、以下の方法で特性評価試験を行った。
(吸湿率):材料をタブレット化し、トランスファー成
形することにより得られた直径50mm、厚さ3.0m
mの円板状のテストピースを85℃、85%RHの雰囲
気下に72時間放置した時の吸湿率を測定した。
(ショアーD硬度):材料をタブレット化し、トランス
ファー成形することにより得られた直径50mm、厚さ
3.0mmの円板状のテストピースを成形完了後、金型
が開き始めてから20±5秒後にショアーD硬度計(東
洋精機(株)製)で測定した。測定値が70以下になる
と離型不良等の成形トラブルが発生する。
(耐湿リフロー性):金型温度175±5℃、注入時間
(スピード)10秒、加圧(キュアー)時間120秒、
注入圧力60kg/cm2 の成形条件で得られた成形品
を175℃で6時間アフターキュアーすることにより、
60QFP TEG(外径サイズ:15mm×19mm
×厚さ2.4mm)の評価用パッケージを得た。このパ
ッケージを85℃、85%RHの雰囲気下に72時間放
置して吸湿させた後、IRリフロー処理(EIAJ規
格)を行い、実体顕微鏡でクラックの有無を観察した。
(耐湿信頼性):上記耐湿リフロー性処理後のパッケー
ジをPCT:133℃/100%RHの条件下に500
時間放置した時のオープン不良発生数をカウントした。A characteristic evaluation test was conducted on each of the obtained epoxy resin compositions and molded articles thereof by the following method. (Moisture absorption rate): Diameter 50 mm, thickness 3.0 m obtained by tabletizing the material and transfer molding
The disc-shaped test piece of m was allowed to stand for 72 hours in an atmosphere of 85 ° C. and 85% RH to measure the moisture absorption rate. (Shore D hardness): 20 ± 5 seconds after the mold starts to open after the completion of molding of a disc-shaped test piece with a diameter of 50 mm and a thickness of 3.0 mm obtained by tableting the material and transfer molding It was measured with a Shore D hardness meter (manufactured by Toyo Seiki Co., Ltd.). If the measured value is 70 or less, molding trouble such as defective release occurs. (Moisture reflow resistance): Mold temperature 175 ± 5 ° C., injection time (speed) 10 seconds, pressurization (cure) time 120 seconds,
By after-curing the molded product obtained under the molding condition of the injection pressure of 60 kg / cm 2 at 175 ° C. for 6 hours,
60QFP TEG (Outer diameter size: 15mm x 19mm
A thickness of 2.4 mm) for evaluation was obtained. This package was left to stand in an atmosphere of 85 ° C. and 85% RH for 72 hours to absorb moisture, then subjected to IR reflow treatment (EIAJ standard) and observed with a stereoscopic microscope for the presence or absence of cracks. (Moisture resistance reliability): The package after the above moisture reflow resistance treatment is subjected to PCT: 133 ° C./100% RH under the condition of 500.
The number of occurrences of open defects when left for a time was counted.
【0038】結果を表1〜3に示す。The results are shown in Tables 1-3.
【0039】[0039]
【表1】 [Table 1]
【0040】[0040]
【表2】 [Table 2]
【0041】[0041]
【表3】 [Table 3]
【0042】[0042]
【発明の効果】本発明の封止用エポキシ樹脂組成物は、
添加剤として少なくとも1つのシクロ環を有するカルボ
ン酸の無水物を前記所定量含むため、ビフェニル型エポ
キシ樹脂の使用による耐熱性、密着性等の向上の利点を
生かしつつ、反応架橋密度の低下や水分による硬化促進
剤の失活等を防止でき、成形硬化時の剛性を充分確保で
きるので、離型トラブル等の成形トラブルを生じにく
い。The encapsulating epoxy resin composition of the present invention is
Since the above-mentioned predetermined amount of the carboxylic acid anhydride having at least one cyclo ring is contained as an additive, the reduction of the reaction crosslink density and the water content can be achieved while taking advantage of the improvement of the heat resistance and the adhesiveness due to the use of the biphenyl type epoxy resin. Since it is possible to prevent deactivation of the curing accelerator due to the above, and to secure sufficient rigidity during molding and curing, it is difficult to cause molding trouble such as mold release trouble.
【0043】本発明の半導体装置は、半導体素子を上記
本発明の封止用エポキシ樹脂組成物で封止してなるもの
であるため、耐熱性、密着性等の性能に優れるととも
に、樹脂封止時に離型トラブル等の成形トラブルを生じ
ることなく製造することができる。Since the semiconductor device of the present invention is obtained by encapsulating a semiconductor element with the encapsulating epoxy resin composition of the present invention, the semiconductor device is excellent in heat resistance, adhesiveness and the like and is resin-encapsulated. Sometimes it can be produced without causing molding troubles such as mold release troubles.
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) C08L 63/00 - 63/10 C08G 59/62 C08K 5/09 H01L 23/29 ─────────────────────────────────────────────────── ─── Continued Front Page (58) Fields surveyed (Int.Cl. 7 , DB name) C08L 63/00-63/10 C08G 59/62 C08K 5/09 H01L 23/29
Claims (5)
格を有するビフェニル型エポキシ樹脂を少なくとも含む
エポキシ樹脂と、硬化剤と、硬化促進剤と、充填材とを
必須成分として含有してなる封止用エポキシ樹脂組成物
において、 前記硬化剤は、フェノール樹脂からなり、前記エポキシ
樹脂1当量に対して0.5〜1.5当量を含み、 前記硬化促進剤は、エポキシ樹脂組成物全体に対して
0.25〜5重量%を含み、 さらに、添加剤として少なくとも1つのシクロ環を有す
るカルボン酸の無水物を全樹脂量に対して0.1〜3.
0重量%含むことを特徴とする、封止用エポキシ樹脂組
成物。 【化1】 (式中、R1 〜R8 は水素原子または炭素数1〜5のア
ルキル基。)1. A seal containing, as essential components, an epoxy resin containing at least a biphenyl type epoxy resin having a biphenyl skeleton represented by the following structural formula (1), a curing agent, a curing accelerator, and a filler. In the epoxy resin composition for stopping, the curing agent is made of a phenolic resin and contains 0.5 to 1.5 equivalents relative to 1 equivalent of the epoxy resin, and the curing accelerator is based on the entire epoxy resin composition. 0.25 to 5% by weight, and further, as an additive, an anhydride of a carboxylic acid having at least one cyclo ring is added in an amount of 0.1 to 3.
An epoxy resin composition for encapsulation, comprising 0% by weight. [Chemical 1] (In the formula, R1 to R8 are a hydrogen atom or an alkyl group having 1 to 5 carbon atoms.)
で示されるジシクロペンタジエン骨格を有するジシクロ
ペンタジエン型エポキシ樹脂をさらに含む、請求項1に
記載の封止用エポキシ樹脂組成物。 【化2】 2. The structural formula (2) below as the epoxy resin.
The epoxy resin composition for sealing according to claim 1, further comprising a dicyclopentadiene type epoxy resin having a dicyclopentadiene skeleton represented by: [Chemical 2]
される骨格を有するフェノール樹脂および下記構造式
(4)で示される骨格を有するフェノール樹脂からなる
群の中から選ばれた少なくとも1種を少なくとも含む、
請求項1または2に記載の封止用エポキシ樹脂組成物。 【化3】 (式中、nは1〜5の整数。)3. At least one selected from the group consisting of a phenol resin having a skeleton represented by the following structural formula (3) and a phenol resin having a skeleton represented by the following structural formula (4) as the curing agent. Including at least seeds,
The epoxy resin composition for sealing according to claim 1 or 2. [Chemical 3] (In the formula, n is an integer of 1 to 5.)
よび3級アミン化合物からなる群の中から選ばれた少な
くとも1種を少なくとも含む、請求項1から3までのい
ずれかに記載の封止用エポキシ樹脂組成物。4. The encapsulating material according to claim 1, wherein the curing accelerator contains at least one selected from the group consisting of organic phosphorus compounds and tertiary amine compounds. Epoxy resin composition.
かに記載の封止用エポキシ樹脂組成物で封止してなる半
導体装置。5. A semiconductor device obtained by encapsulating a semiconductor element with the encapsulating epoxy resin composition according to any one of claims 1 to 4.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP04077898A JP3370271B2 (en) | 1998-02-23 | 1998-02-23 | Epoxy resin composition for encapsulation and semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP04077898A JP3370271B2 (en) | 1998-02-23 | 1998-02-23 | Epoxy resin composition for encapsulation and semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11236489A JPH11236489A (en) | 1999-08-31 |
| JP3370271B2 true JP3370271B2 (en) | 2003-01-27 |
Family
ID=12590098
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP04077898A Expired - Fee Related JP3370271B2 (en) | 1998-02-23 | 1998-02-23 | Epoxy resin composition for encapsulation and semiconductor device |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4543477B2 (en) * | 2000-02-24 | 2010-09-15 | 住友ベークライト株式会社 | Epoxy resin composition for optical semiconductor encapsulation and optical semiconductor device |
| JP3598963B2 (en) * | 2000-09-26 | 2004-12-08 | 松下電工株式会社 | Resin composition for optical semiconductor device |
| WO2006022693A1 (en) * | 2004-08-05 | 2006-03-02 | Fry's Metals, Inc. | Low voiding no flow fluxing underfill for electronic devices |
| JP5207658B2 (en) * | 2007-05-17 | 2013-06-12 | 日東電工株式会社 | Epoxy resin composition for sealing optical semiconductor element, cured product thereof, and optical semiconductor device using the same |
| JP5681432B2 (en) * | 2010-10-01 | 2015-03-11 | ナミックス株式会社 | Epoxy resin composition and semiconductor device using the same |
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1998
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| Publication number | Publication date |
|---|---|
| JPH11236489A (en) | 1999-08-31 |
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