JP3381244B2 - Method for recovering antimony and bismuth from copper electrolyte - Google Patents
Method for recovering antimony and bismuth from copper electrolyteInfo
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- JP3381244B2 JP3381244B2 JP01876595A JP1876595A JP3381244B2 JP 3381244 B2 JP3381244 B2 JP 3381244B2 JP 01876595 A JP01876595 A JP 01876595A JP 1876595 A JP1876595 A JP 1876595A JP 3381244 B2 JP3381244 B2 JP 3381244B2
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- copper
- sulfuric acid
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Description
【0001】[0001]
【産業上の利用分野】本発明は、銅電解精錬において使
用された銅電解液に不純物として含まれるSbおよびB
iを選択的に回収する方法の改良に関する。BACKGROUND OF THE INVENTION The present invention relates to Sb and B contained as impurities in a copper electrolytic solution used in copper electrolytic refining.
The present invention relates to improvement of a method for selectively recovering i.
【0002】[0002]
【従来の技術】銅電解精錬において、銅電解液中のS
b、Bi、Feなどの不純物の濃度がある一定値を超え
ると製品である電気銅の品質に悪い影響を及ぼすため、
これらの不純物を除去する銅電解液の浄液が行われる。
この浄液は、主として脱銅電解法で行われている。しか
しながら、この方法は、電力効率が低い上、作業環境上
も好ましくないなどの欠点がある。これらの欠点を解消
する方法として、近年、電解液に亜硫酸ナトリウムを用
い、Sb、BiおよびFeを吸着し得るキレート樹脂
に、あるいはSbを選択的に吸着し得るキレート樹脂に
該銅電解液を接触させ、さらに、該キレート樹脂に溶離
液を接触させることにより、SbやBiを銅電解液から
分離して回収する方法が提案されている(特開昭60−
50192、特開平2−141541など)。しかしな
がら、上記調整方法は、溶離液として塩酸を使用するた
め、コスト的に脱銅電解にとってかわることはできな
い。さらに、空気の巻き込みなどにより調整した電位を
所望の値に維持することが難しい。2. Description of the Related Art In electrolytic copper refining, S in copper electrolytic solution
If the concentration of impurities such as b, Bi, and Fe exceeds a certain value, the quality of the electrolytic copper product is adversely affected.
Purification of a copper electrolytic solution that removes these impurities is performed.
This cleaning solution is mainly performed by a copper removal electrolytic method. However, this method has drawbacks such as low power efficiency and unfavorable working environment. As a method of solving these drawbacks, in recent years, sodium sulfite has been used as an electrolytic solution, and the copper electrolytic solution is brought into contact with a chelate resin capable of adsorbing Sb, Bi and Fe, or a chelate resin capable of selectively adsorbing Sb. In addition, a method has been proposed in which Sb and Bi are separated from the copper electrolytic solution and recovered by bringing the chelating resin into contact with an eluent (JP-A-60-
50192, JP-A-2-141541 and the like). However, since the above-mentioned adjustment method uses hydrochloric acid as an eluent, it cannot replace costly decopperization. Further, it is difficult to maintain the potential adjusted by the entrainment of air at a desired value.
【0003】[0003]
【発明が解決しようとする課題】そこで、本発明の目的
は、上記問題点を解消し、上記SbおよびBiを回収す
る方法において、銅電解液に含まれるFeイオンの濃度
管理が可及的に簡便になるように該銅電解液の酸化還元
電位を調整することができる方法を提供することにあ
る。SUMMARY OF THE INVENTION Therefore, an object of the present invention is to solve the above problems and to control the concentration of Fe ions contained in a copper electrolytic solution as much as possible in the method of recovering Sb and Bi described above. It is an object of the present invention to provide a method capable of adjusting the oxidation-reduction potential of the copper electrolytic solution so as to be simple.
【0004】[0004]
【課題を解決するための手段】本発明は、上記目的を達
成するものとして、不純物としてSb、BiおよびFe
を含む銅電解液に銅材を浸漬することにより、3価の鉄
イオンを減少させると共に該銅電解液の酸化還元電位を
650mV未満に調整して、該銅電解液をキレート樹脂
に接触させ、SbおよびBiを吸着させ、次いで該キレ
ート樹脂に溶離液を接触させることにより、Sbおよび
Biを溶離回収する方法である。In order to achieve the above object, the present invention provides Sb, Bi and Fe as impurities.
By dipping a copper material in a copper electrolytic solution containing, reduce trivalent iron ions and adjust the redox potential of the copper electrolytic solution to less than 650 mV, and contact the copper electrolytic solution with a chelate resin, In this method, Sb and Bi are adsorbed, and then the chelating resin is brought into contact with an eluent to elute and recover Sb and Bi.
【0005】[0005]
【作用】本発明に係るプロセスのフローチャートを図1
に示す。本発明において、まず、不純物としてSb、B
iおよびFeを含む銅電解液の酸化還元電位(ORP)
を650mV(vs.SCE(対飽和甘汞電極))未満
に調整する際、該銅電解液に銅材を浸漬することにより
該酸化還元電位の調整を行うことが重要である。このよ
うにすることによって、銅電解液中に存在している3価
のFeを2価に還元する。この還元によって銅材から銅
電解液中に溶解するCuは、銅電解液の主要な成分元素
であり、不純物元素として溶解するものではない。従っ
て、銅電解液に含まれる不純物イオンの濃度管理には影
響しない。なお、この点から、銅材は純銅が好ましい。
銅電解液に浸漬する銅材の形状としては、塊状、板状、
粉状など種々のものを用いることができる。1 is a flow chart of the process according to the present invention.
Shown in. In the present invention, first, as impurities, Sb, B
Redox potential (ORP) of copper electrolyte containing i and Fe
Is adjusted to less than 650 mV (vs. SCE (vs. saturated sweet and dry electrode)), it is important to adjust the redox potential by immersing a copper material in the copper electrolytic solution. By doing so, trivalent Fe existing in the copper electrolytic solution is reduced to divalent. Cu which is dissolved from the copper material into the copper electrolytic solution by this reduction is a main component element of the copper electrolytic solution and is not dissolved as an impurity element. Therefore, it does not affect the control of the concentration of impurity ions contained in the copper electrolytic solution. From this point, the copper material is preferably pure copper.
The shape of the copper material immersed in the copper electrolytic solution is a lump, a plate,
Various materials such as powder can be used.
【0006】次に、上記のようにして電位を調整した銅
電解液をキレート樹脂に接触させて、Sb、Biをキレ
ート樹脂に吸着させる。Feは、ほとんどが2価になっ
ていて、その吸着量は極めて少ない。キレート樹脂とし
ては、公知の、ミヨシ油脂社製商品名エポラスMX−
2、住友化学社製商品名デュオライトC−467、ユニ
チカ社製商品名ユニセレックUR−3300などが挙げ
られる。このようにして、SbおよびBiを吸着した上
記キレート樹脂からSbおよびBiを溶離するための溶
離液として、塩化ナトリウムと硫酸を含む水溶液、チオ
尿素と硫酸を含む水溶液を用いることができる。これら
の溶離液は、安価でリサイクルが容易であるので、浄液
コストの低減が可能である。Next, the copper electrolyte whose potential is adjusted as described above is brought into contact with the chelate resin to adsorb Sb and Bi to the chelate resin. Most of Fe is divalent, and its adsorption amount is extremely small. As a chelate resin, a known trade name, Eporus MX-, manufactured by Miyoshi Yushi Co., Ltd.
2, Duolite C-467 manufactured by Sumitomo Chemical Co., Ltd., Uniselec UR-3300 manufactured by Unitika Ltd., and the like. In this way, an aqueous solution containing sodium chloride and sulfuric acid or an aqueous solution containing thiourea and sulfuric acid can be used as an eluent for eluting Sb and Bi from the chelate resin having Sb and Bi adsorbed thereon. Since these eluents are cheap and easy to recycle, the cost of cleaning can be reduced.
【0007】上記塩化ナトリウムと硫酸を含む水溶液に
おいて、塩化ナトリウム濃度は60〜180g/lが好
ましく、120〜180g/lがより好ましい。そし
て、硫酸の濃度は30〜200g/lが好ましく、50
〜200g/lがより好ましい。また、上記チオ尿素と
硫酸を含む水溶液において、チオ尿素濃度は5〜20g
/lが好ましく、10〜20g/lがより好ましい。そ
して、硫酸の濃度は25〜300g/lが好ましく、1
50〜200g/lがより好ましい。上記溶離液を上記
キレート樹脂と接触させる際の温度は、低すぎるとSb
とBiの溶離反応が緩慢になる。また、高すぎると、溶
離液が塩化ナトリウムと硫酸を含む水溶液の場合は、特
に40℃以上ではSbとBiの溶離率に向上がみられ
ず、溶離液がチオ尿素と硫酸を含む水溶液の場合は、特
に50℃以上ではチオ尿素の分解が著しくなる。従っ
て、溶離液が塩化ナトリウムと硫酸を含む水溶液の場
合、その温度は10〜60℃が好ましく、30〜40℃
がより好ましい。また、溶離液がチオ尿素と硫酸を含む
水溶液の場合、その温度は25〜60℃が好ましく、3
0〜50℃がより好ましい。In the aqueous solution containing sodium chloride and sulfuric acid, the sodium chloride concentration is preferably 60 to 180 g / l, more preferably 120 to 180 g / l. The concentration of sulfuric acid is preferably 30 to 200 g / l, 50
-200 g / l is more preferable. Further, in the aqueous solution containing thiourea and sulfuric acid, the thiourea concentration is 5 to 20 g.
/ L is preferable, and 10 to 20 g / l is more preferable. The concentration of sulfuric acid is preferably 25 to 300 g / l, and 1
50 to 200 g / l is more preferable. If the temperature at which the eluent is brought into contact with the chelate resin is too low, Sb
And the elution reaction of Bi becomes slow. On the other hand, if the eluent is an aqueous solution containing sodium chloride and sulfuric acid, the elution rate of Sb and Bi does not improve at 40 ° C. or higher if the eluent is an aqueous solution containing thiourea and sulfuric acid. In particular, the decomposition of thiourea becomes remarkable at 50 ° C. or higher. Therefore, when the eluent is an aqueous solution containing sodium chloride and sulfuric acid, the temperature is preferably 10 to 60 ° C, and 30 to 40 ° C.
Is more preferable. When the eluent is an aqueous solution containing thiourea and sulfuric acid, the temperature is preferably 25 to 60 ° C and 3
0-50 degreeC is more preferable.
【0008】[0008]
[実施例1〜4、比較例1〜4]ミヨシ油脂社製エポラ
スMX−2なるキレート樹脂の官能基を水素型とした。
次に、硫酸に硫酸第2鉄を200g/l溶解して3価の
Feイオン濃度が0.4g/l、0.8g/l、1.6
g/l、2.4g/lの4種の水溶液を作成し、それぞ
れを2等分した。2等分した一方の各水溶液はそのまま
とし(比較例1、2、3、4)、他方のそれぞれの水溶
液に銅板を浸漬し酸化還元電位を下げた(実施例1、
2、3、4)。そのままとした水溶液の電位は650m
Vであり、銅板を浸漬したものは、約580mVであっ
た。上記2種の各水溶液に上記キレート樹脂を夫々浸漬
し40℃で60分撹拌した。次いで該キレート樹脂と水
溶液を分離し、各々のキレート樹脂への鉄の吸着量を求
めた。得られた結果を表1に示した。[Examples 1 to 4 and Comparative Examples 1 to 4] The functional group of the chelate resin Epolas MX-2 manufactured by Miyoshi Yushi Co., Ltd. was hydrogen type.
Next, 200 g / l of ferric sulfate was dissolved in sulfuric acid to obtain trivalent Fe ion concentrations of 0.4 g / l, 0.8 g / l, and 1.6.
Four kinds of aqueous solutions of g / l and 2.4 g / l were prepared, and each was divided into two equal parts. Each of the two equally divided aqueous solutions was left as it was (Comparative Examples 1, 2, 3, 4), and the copper plate was immersed in the other aqueous solution to lower the oxidation-reduction potential (Example 1,
2, 3, 4). The potential of the aqueous solution as it is is 650 m
V, and the immersion amount of the copper plate was about 580 mV. The chelate resin was immersed in each of the two aqueous solutions and stirred at 40 ° C. for 60 minutes. Next, the chelate resin and the aqueous solution were separated, and the amount of iron adsorbed on each chelate resin was determined. The obtained results are shown in Table 1.
【0009】[0009]
【表1】 [Table 1]
【0010】表1より、銅電解液に銅板を浸漬すること
により、銅電解液の酸化還元電位を有効に低下すること
ができ、Feの吸着を抑制し得ることが分かる。It can be seen from Table 1 that the redox potential of the copper electrolyte can be effectively lowered and the adsorption of Fe can be suppressed by immersing the copper plate in the copper electrolyte.
【0011】[実施例5]ミヨシ油脂社製エポラスMX
−2なるキレート樹脂の官能基を水素型とした。次に、
この樹脂20mlを銅電解液(Sb0.55g/l、B
i0.52g/l)400mlに浸漬して、60℃で6
0分撹拌した。この樹脂を純水で洗浄した後、塩化ナト
リウムを120g/l、硫酸を100g/l含む200
mlの水溶液に浸漬して、10℃で60分撹拌してSb
とBiを溶離した。この結果、SbとBiの回収率は5
2.3重量%であった。[Embodiment 5] Eporus MX manufactured by Miyoshi Yushi Co., Ltd.
The functional group of the chelate resin of -2 was hydrogen type. next,
20 ml of this resin is used as a copper electrolytic solution (Sb 0.55 g / l, B
i 0.52 g / l) 400 ml at 60 ° C
Stir for 0 minutes. After washing this resin with pure water, 200 g of sodium chloride and 100 g / l of sulfuric acid were added.
Immerse it in 10 ml of aqueous solution and stir at 10 ° C for 60 minutes to remove Sb.
And Bi were eluted. As a result, the recovery rate of Sb and Bi is 5
It was 2.3% by weight.
【0012】[実施例6〜9]溶離温度を、25℃、4
0℃、50℃および60℃とした以外は、実施例5と同
様に実施した。その結果を表2に示す。[Examples 6 to 9] The elution temperature was 25 ° C and 4
It carried out like Example 5 except having set it as 0 ° C, 50 ° C, and 60 ° C. The results are shown in Table 2.
【0013】[0013]
【表2】 [Table 2]
【0014】[実施例10〜15]塩化ナトリウム濃度
と、硫酸濃度とを表3のようにした以外は、実施例6と
同様に25℃で実施した。得られた結果を合わせて表3
に示した。[Examples 10 to 15] The same procedure as in Example 6 was carried out at 25 ° C except that the sodium chloride concentration and the sulfuric acid concentration were as shown in Table 3. Table 3 shows the results obtained.
It was shown to.
【0015】[0015]
【表3】 溶離液中濃度 Sb+Bi回収率 (g/l) (重量%) NaCl H2SO4 実施例10 60 100 12.2 実施例11 120 30 43.2 実施例12 120 50 53.7 実施例6 120 100 54.5 実施例13 120 120 55.2 実施例14 120 200 80.8 実施例15 180 100 79.0Table 3 Eluent concentration Sb + Bi recovery rate (g / l) (wt%) NaCl H 2 SO 4 Example 10 60 100 100 2.2 Example 11 120 30 43.2 Example 12 120 50 53.7 Example Example 6 120 100 54.5 Example 13 120 120 55.2 Example 14 120 200 80.8 Example 15 180 180 100 79.0
【0016】なお、実施例14および15において、N
aClは飽和濃度となっていた。表2および表3より、
塩化ナトリウムと硫酸を含む水溶液は、SbおよびBi
を溶離する溶離液として好ましいことが分かる。In Examples 14 and 15, N
The aCl had a saturated concentration. From Table 2 and Table 3,
The aqueous solution containing sodium chloride and sulfuric acid is Sb and Bi.
It can be seen that it is preferable as an eluent for eluting.
【0017】[実施例16〜19]実施例5と同様にし
て、SbとBiとを吸着させたキレート樹脂を水洗浄し
た後、チオ尿素を20g/l、硫酸を200g/l含む
200mlの水溶液に浸漬して、表4に示した温度でそ
れぞれ60分撹拌してSbとBiを溶離した。得られた
SbとBiの回収率を表4に示した。[Examples 16 to 19] In the same manner as in Example 5, the chelate resin having Sb and Bi adsorbed thereon was washed with water and then 200 ml of an aqueous solution containing 20 g / l of thiourea and 200 g / l of sulfuric acid. Sb and Bi were eluted by immersing in and being stirred for 60 minutes at each temperature shown in Table 4. The recovery rates of the obtained Sb and Bi are shown in Table 4.
【0018】[0018]
【表4】 [Table 4]
【0019】実施例19において、Sb+Biの回収率
は減少した。これは、チオ尿素が一部分解したためと考
えられる。In Example 19, the recovery rate of Sb + Bi decreased. This is probably because thiourea was partially decomposed.
【0020】[実施例20〜28]チオ尿素濃度と、硫
酸濃度とを表5のようにした以外は、実施例17と同様
に40℃で実施した。得られた結果を合わせて表5に示
した。[Examples 20 to 28] The same procedure as in Example 17 was carried out at 40 ° C except that the thiourea concentration and the sulfuric acid concentration were as shown in Table 5. The obtained results are shown in Table 5 together.
【0021】[0021]
【表5】 溶離液中濃度 Sb+Bi回収率 (g/l) (重量%) チオ尿素 H2SO4 実施例20 5 200 11.4 実施例21 10 25 2.1 実施例22 10 50 5.8 実施例23 10 100 13.4 実施例24 10 150 21.5 実施例25 10 200 30.2 実施例26 10 300 20.6 実施例27 15 200 36.5 実施例17 20 200 42.1 実施例28 20 300 42.6Table 5 in the eluent concentration Sb + Bi recovery (g / l) (wt%) thiourea H 2 SO 4 Example 20 5 200 11.4 Example 21 10 25 2.1 Example 22 10 50 5.8 Example 23 10 100 13.4 Example 24 10 150 21.5 Example 25 10 200 30.2 Example 26 10 300 20.6 Example 27 15 15 200 36.5 Example 17 20 200 2002.1 Example 28 20 300 42.6
【0022】表4および表5より、チオ尿素と硫酸を含
む水溶液は、SbおよびBiを溶離する溶離液として好
ましいことが分かる。From Tables 4 and 5, it can be seen that an aqueous solution containing thiourea and sulfuric acid is preferable as an eluent for eluting Sb and Bi.
【0023】[実施例29]住友化学工業社製デュオラ
イトC−467なるキレート樹脂100mlをカラムに
充填し、該キレート樹脂の官能基を水素型とした。次
に、約50gの銅板を浸漬して鉄イオンを3価から2価
に還元して、Sbが0.55g/l、Biが0.52g
/l、Fe2+が0.4g/lとなった銅電解液(酸化還
元電位580mV)を上記カラムに通液した。通液条件
は、通液温度が60℃、通液速度がSV10(樹脂1リ
ットル(l)当たり10リットル(l)/hr)および
通液量がBV100であった。さらに、60℃の純水を
BV20の通液量で上記カラムに通液し、上記キレート
樹脂を洗浄して上記銅電解液を完全に除去した。この
後、チオ尿素を10g/l、硫酸を200g/l含む水
溶液を上記カラムに通液した。通液条件は、通液温度が
40℃、通液速度がSV3および通液量がBV20であ
った。その結果、Sb+Biの回収率は19.8重量%
であった。Example 29 A column was filled with 100 ml of chelating resin, Duolite C-467 manufactured by Sumitomo Chemical Co., Ltd., and the chelating resin had a hydrogen group as a functional group. Next, about 50 g of a copper plate is immersed to reduce iron ions from trivalent to divalent, Sb is 0.55 g / l, Bi is 0.52 g.
/ L, Fe 2+ became 0.4 g / l copper electrolytic solution (oxidation-reduction potential 580 mV) was passed through the column. Regarding the liquid passing conditions, the liquid passing temperature was 60 ° C., the liquid passing speed was SV10 (10 liter (l) / hr per 1 liter (l) of resin), and the liquid passing amount was BV100. Further, pure water at 60 ° C. was passed through the column at a flow rate of BV20 to wash the chelate resin to completely remove the copper electrolytic solution. Then, an aqueous solution containing 10 g / l of thiourea and 200 g / l of sulfuric acid was passed through the column. Regarding the liquid passing conditions, the liquid passing temperature was 40 ° C., the liquid passing speed was SV3, and the liquid passing amount was BV20. As a result, the recovery rate of Sb + Bi is 19.8% by weight.
Met.
【0024】[実施例30]
ミヨシ油脂社製エポラスMX−2なるキレート樹脂10
0mlをカラムに充填し、該キレート樹脂の官能基を水
素型とした。次に、約50gの銅板を浸漬して鉄イオン
を3価から2価に還元して、Sbが0.55g/l、B
iが0.52g/l、Fe2+が0.4g/lとなった銅
電解液(酸化還元電位580mV)を上記カラムに通液
した。通液条件は、通液温度が60℃、通液速度がSV
10(樹脂1リットル(l)当たり10リットル(l)
/hr)、および通液量がBV100(樹脂1リットル
(l)当たり100リットル(l))であった。さら
に、60℃の純水をBV20の通液量で上記カラムに通
液し、上記キレート樹脂を洗浄して上記銅電解液を完全
に除去した。この後、塩化ナトリウムを180g/l、
硫酸を100g/l含む水溶液を上記カラムに通液し
た。通液条件は、通液温度が40℃、通液速度がSV3
および通液量がBV15であった。この結果、Sb+B
iの回収率は、91.6重量%であった。なお、通液量
がBV15に至るまでのSbとBiの溶出液濃度を図2
に示す。[Example 30] Chelating resin 10 Epolas MX-2 manufactured by Miyoshi Yushi Co., Ltd.
The column was filled with 0 ml, and the chelate resin had a functional group of hydrogen type. Next, about 50 g of a copper plate is immersed to reduce the iron ions from trivalent to divalent, Sb is 0.55 g / l, B
A copper electrolyte solution (oxidation-reduction potential of 580 mV) in which i was 0.52 g / l and Fe 2+ was 0.4 g / l was passed through the column. The liquid passing conditions are as follows: the liquid passing temperature is 60 ° C and the liquid passing speed is SV.
10 (10 liters (l) per 1 liter (l) of resin
/ Hr), and the flow rate was BV100 (100 liters (l) per 1 liter (l) of resin). Further, pure water at 60 ° C. was passed through the column at a flow rate of BV20 to wash the chelate resin to completely remove the copper electrolytic solution. After this, 180 g of sodium chloride,
An aqueous solution containing 100 g / l of sulfuric acid was passed through the column. The liquid passing conditions are a liquid passing temperature of 40 ° C and a liquid passing speed of SV3.
And the flow rate was BV15. As a result, Sb + B
The recovery rate of i was 91.6% by weight. Incidentally, FIG. 2 elution solution concentration of Sb and Bi to passing liquid amount reaches BV15
Shown in.
【0025】[実施例31]
ミヨシ油脂製エポラスMX−2なるキレート樹脂を10
0mlカラムに充填し、水素型とした。硫酸に硫酸第2
鉄を200g/l溶解して3価の鉄イオン合成液を作成
し、約50gの銅板を浸漬して鉄イオンを3価から2価
に還元してから、上記カラムに通液して、アンチモン、
ビスマスを前記キレート樹脂に吸着させた。次いで、純
水60℃でBV20(20l/l樹脂)まで洗浄して銅
電解液を完全に除去した後、チオ尿素10g/l、硫酸
200g/lの混合液を用いて、40℃でSV3(3l
/hr/l樹脂)、BV20(20l/l樹脂)まで通
液して、アンチモン、ビスマスの回収率を調べた。この
結果を図3に示す。すなわち、図3は、チオ尿素10g
/l、硫酸200g/lの混合液の通液量が40℃でB
V20に至るまでのアンチモン、ビスマスの溶出液濃度
を示している。図3に見られるように、アンチモン、ビ
スマスが溶離されていることがわかる。[Example 31] A chelating resin called Eporus MX-2 manufactured by Miyoshi Yushi Co., Ltd. was used.
It was packed in a 0 ml column and made into a hydrogen type. Sulfuric acid to sulfuric acid second
Iron is dissolved in 200 g / l to prepare a trivalent iron ion synthesis solution, and about 50 g of a copper plate is immersed in the solution to reduce the ferric ion from trivalent to divalent, and then the solution is passed through the column to obtain antimony. ,
Bismuth was adsorbed on the chelate resin. Then, after the pure water was washed with BV20 (20 l / l resin) at 60 ° C. to completely remove the copper electrolytic solution, SV3 (40 V) was used at 40 ° C. with a mixed solution of thiourea 10 g / l and sulfuric acid 200 g / l. 3 liters
/ Hr / l resin) and BV20 (20 l / l resin) were passed through, and the recovery rates of antimony and bismuth were examined. The result is shown in FIG. That is, FIG. 3 shows thiourea 10 g.
/ L, 200g / l sulfuric acid mixture flow rate is 40 ℃ B
Antimony up to V20, shows elution solution concentration of bismuth. As shown in FIG. 3, it can be seen that antimony and bismuth are eluted.
【0026】[実験例32〜35、比較例5〜8]
ユニチカ製UR−3300キレート樹脂の官能基を水素
型とした。硫酸第2鉄を200g/l硫酸に溶解して3
価の鉄イオン合成液を作成して二等分した。上記合成液
の一方に銅板を入れ、もう一方はそのままで40℃で上
記キレート樹脂を入れて60分間撹拌した。なお、鉄イ
オン濃度が0.4g/l(実施例32、比較例5)、
0.8g/l(実施例33、比較例6)、1.6g/l
(実施例34、比較例7)、2.4g/l(実施例3
5、比較例8)の4種について上記合成液を作製した。
図4は、銅板を入れた場合(実施例)と入れない場合
(比較例)のUR−3300の吸着量(g/樹脂l)と
吸着終了時の酸化還元電位(ORP)の値および鉄イオ
ン濃度を示している。図4に見られるように、銅板によ
って鉄イオンのキレート樹脂への吸着が抑えられること
がわかる。すなわち、銅板を入れた場合は、吸着終了時
の鉄イオン濃度が、始めの濃度に対して0.3g/l以
下の減少にすぎず(Fe2+で残っている)、吸着量(F
e3+)が6g/樹脂l以下であるのに対し、銅板を入れ
ない場合は、吸着終了時の鉄イオン濃度が大幅に低下し
てキレート樹脂への吸着量が多くなっている。また、銅
板を入れない場合は、酸化還元電位(ORP)が吸着の
結果、鉄イオン濃度が0に近くなっても650mV以上
になることが認められる。このように鉄イオンの吸着を
抑えたキレート樹脂を溶離液に入れて撹拌した結果、回
収金属は実質的にSbとBiからなり、Feは極めて少
なかった。[Experimental Examples 32 to 35, Comparative Examples 5 to 8] The functional group of the Unitika UR-3300 chelate resin was a hydrogen type. Dissolve ferric sulfate in 200 g / l sulfuric acid for 3
A valent iron ion synthetic solution was prepared and divided into two equal parts. A copper plate was put in one of the synthetic solutions, and the other was left as it was, and the chelate resin was put in at 40 ° C. and stirred for 60 minutes. The iron ion concentration was 0.4 g / l (Example 32, Comparative example 5),
0.8 g / l (Example 33, Comparative Example 6), 1.6 g / l
(Example 34, Comparative Example 7) 2.4 g / l (Example 3)
The above-mentioned synthetic solutions were prepared for four kinds of No. 5, Comparative Example 8).
FIG. 4 shows the adsorption amount (g / resin l) of UR-3300 with and without a copper plate (Example) and the value of the oxidation-reduction potential (ORP) at the end of adsorption and iron ion. The concentration is shown. As can be seen from FIG. 4, the copper plate suppresses the adsorption of iron ions on the chelate resin. That is, when a copper plate was added, the iron ion concentration at the end of adsorption was only 0.3 g / l or less of the initial concentration (remaining as Fe 2+ ), and the adsorption amount (F
e 3+ ) is 6 g / l of resin or less, whereas when the copper plate is not inserted, the iron ion concentration at the end of adsorption is significantly reduced, and the amount of adsorption to the chelate resin is large. Further, when the copper plate is not inserted, it is recognized that the redox potential (ORP) is 650 mV or more even when the iron ion concentration approaches 0 as a result of adsorption. As a result of putting the chelate resin in which the adsorption of iron ions is suppressed in the eluent and stirring, the recovered metals consisted essentially of Sb and Bi, and Fe was extremely small.
【0027】[0027]
【発明の効果】本発明の銅電解液からのSbおよびBi
の回収方法によれば、銅電解液中に純銅材を浸漬するこ
とにより、キレート樹脂と接触させる銅電解液中の鉄を
3価から2価に還元するので、銅電解液に含まれる不純
物イオンの濃度管理が極めて簡便になる。従って、銅電
解液からのSbおよびBiの回収を極めて効率よく行う
ことができる。EFFECT OF THE INVENTION Sb and Bi from the copper electrolyte of the present invention
According to the recovery method of No. 3, since the pure copper material is immersed in the copper electrolytic solution, the iron in the copper electrolytic solution brought into contact with the chelate resin is reduced from trivalent to divalent, so that the impurity ions contained in the copper electrolytic solution are reduced. Concentration management is extremely simple. Therefore, the recovery of Sb and Bi from the copper electrolytic solution can be performed extremely efficiently.
【図1】本発明のプロセスを示すフローチャートであ
る。FIG. 1 is a flow chart showing the process of the present invention.
【図2】塩化ナトリウム・硫酸混合液によるSbとBi
の溶離の状態を示すため、通液量(BV)と溶出液濃度
との関係をプロットしたグラフ(溶離曲線)である。[Fig. 2] Sb and Bi with sodium chloride / sulfuric acid mixture
To indicate the state of elution, a liquid passing amount graph plotting the relationship (BV) and the elution solution concentration (elution curve).
【図3】チオ尿素・硫酸混合液によるSbとBiの溶離
の状態を示すために通液量(BV)に対する溶出液濃度
の関係をプロットしたグラフ(溶離曲線)である。3 is a passed through amount to indicate the state of elution of Sb and Bi according thiourea sulfate mixture graph plotting the relationship between the elution solution concentration for (BV) (elution curve).
【図4】銅電解液中に銅板を浸漬した効果を示すため
に、吸着前液Fe濃度が各々0.4g/l、0.8g/
l、1.6g/l、2.4g/lである銅電解液にキレ
ート樹脂吸着した後の吸着量、酸化還元電位およびFe
濃度を銅板浸漬有りと無しについて示すグラフである。FIG. 4 shows the Fe concentration before adsorption of 0.4 g / l and 0.8 g / l, respectively, to show the effect of immersing a copper plate in a copper electrolyte.
1, 1.6 g / l, 2.4 g / l, the adsorption amount after adsorption of the chelate resin on the copper electrolyte solution, the redox potential and Fe
It is a graph which shows a density with and without a copper plate immersion.
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭60−50192(JP,A) 特開 昭60−180918(JP,A) 特開 昭63−171899(JP,A) 特開 昭63−286599(JP,A) (58)調査した分野(Int.Cl.7,DB名) C22B 1/00 - 61/00 ─────────────────────────────────────────────────── ─── Continuation of the front page (56) Reference JP-A-60-50192 (JP, A) JP-A-60-180918 (JP, A) JP-A-63-171899 (JP, A) JP-A-63- 286599 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) C22B 1/00-61/00
Claims (5)
む銅電解液に銅材を浸漬することにより、3価の鉄イオ
ンを減少させると共に該銅電解液の酸化還元電位を65
0mV未満に調整して、該銅電解液をキレート樹脂に接
触させてSb、Biを吸着させ、次いで該キレート樹脂
に溶離液を接触させることにより、SbおよびBiを溶
離回収することを特徴とする銅電解液からSbおよびB
iを回収する方法。1. By dipping a copper material in a copper electrolyte solution containing Sb, Bi and Fe as impurities, trivalent iron ions are reduced and the redox potential of the copper electrolyte solution is reduced to 65.
It is characterized in that the copper electrolyte is brought into contact with a chelate resin to adsorb Sb and Bi, and then the chelate resin is brought into contact with an eluent to elute and recover Sb and Bi by adjusting to less than 0 mV. Sb and B from copper electrolyte
A method of recovering i.
求項1に記載の銅電解液からSbおよびBiを回収する
方法。2. The method for recovering Sb and Bi from the copper electrolytic solution according to claim 1, wherein the copper material is a lump, a plate, or a powder.
水溶液またはチオ尿素と硫酸を含む水溶液である請求項
1または2に記載の銅電解液からSbおよびBiを回収
する方法。3. The method for recovering Sb and Bi from the copper electrolytic solution according to claim 1, wherein the eluent is an aqueous solution containing sodium chloride and sulfuric acid or an aqueous solution containing thiourea and sulfuric acid.
塩化ナトリウム濃度が60〜180g/l、硫酸濃度が
30〜200g/lであり、温度が10〜60℃である
請求項3に記載の銅電解液からSbおよびBiを回収す
る方法。4. An aqueous solution containing sodium chloride and sulfuric acid,
The method for recovering Sb and Bi from the copper electrolytic solution according to claim 3, wherein the sodium chloride concentration is 60 to 180 g / l, the sulfuric acid concentration is 30 to 200 g / l, and the temperature is 10 to 60 ° C.
尿素濃度が5〜20g/l、硫酸濃度が25〜300g
/lであり、温度が25〜60℃である請求項3に記載
の銅電解液からSbおよびBiを回収する方法。5. The aqueous solution containing thiourea and sulfuric acid has a thio urea concentration of 5 to 20 g / l and a sulfuric acid concentration of 25 to 300 g.
/ L and the temperature is 25 to 60 ° C, The method for recovering Sb and Bi from the copper electrolytic solution according to claim 3.
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP01876595A JP3381244B2 (en) | 1995-01-12 | 1995-01-12 | Method for recovering antimony and bismuth from copper electrolyte |
| CA002167026A CA2167026C (en) | 1995-01-12 | 1996-01-11 | Method of recovering antimony and bismuth from copper electrolyte |
| US08/584,549 US6153081A (en) | 1995-01-12 | 1996-01-11 | Method of recovering antimony and bismuth from copper electrolyte |
| CNB961008687A CN1158409C (en) | 1995-01-12 | 1996-01-12 | Method for recovering antimony and bismuth from copper electrolyte |
| KR1019960000498A KR100207041B1 (en) | 1995-01-12 | 1996-01-12 | How to recover antimony and bismuth from copper electrolyte |
| CNB021227012A CN1249269C (en) | 1995-01-12 | 1996-01-12 | Method for recovering stibium and bismuth from copper electrolyte |
| AU40964/96A AU695321B2 (en) | 1995-01-12 | 1996-01-12 | Method of recovering antimony and bismuth from copper electrolyte |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP01876595A JP3381244B2 (en) | 1995-01-12 | 1995-01-12 | Method for recovering antimony and bismuth from copper electrolyte |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH08193230A JPH08193230A (en) | 1996-07-30 |
| JP3381244B2 true JP3381244B2 (en) | 2003-02-24 |
Family
ID=11980744
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP01876595A Expired - Lifetime JP3381244B2 (en) | 1995-01-12 | 1995-01-12 | Method for recovering antimony and bismuth from copper electrolyte |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3381244B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA2653392A1 (en) | 2009-02-10 | 2010-08-10 | Patricio A. Riveros | Improved method to remove antimony from copper electrolytes |
-
1995
- 1995-01-12 JP JP01876595A patent/JP3381244B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH08193230A (en) | 1996-07-30 |
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