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JP3386655B2 - Coating device - Google Patents
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JP3386655B2 - Coating device - Google Patents

Coating device

Info

Publication number
JP3386655B2
JP3386655B2 JP10278696A JP10278696A JP3386655B2 JP 3386655 B2 JP3386655 B2 JP 3386655B2 JP 10278696 A JP10278696 A JP 10278696A JP 10278696 A JP10278696 A JP 10278696A JP 3386655 B2 JP3386655 B2 JP 3386655B2
Authority
JP
Japan
Prior art keywords
coating
supply port
supply
substrate
coating liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP10278696A
Other languages
Japanese (ja)
Other versions
JPH09293653A (en
Inventor
出 井関
哲 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Screen Holdings Co Ltd
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Screen Holdings Co Ltd
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Screen Holdings Co Ltd, Dainippon Screen Manufacturing Co Ltd filed Critical Screen Holdings Co Ltd
Priority to JP10278696A priority Critical patent/JP3386655B2/en
Priority to KR1019970012175A priority patent/KR100240210B1/en
Publication of JPH09293653A publication Critical patent/JPH09293653A/en
Application granted granted Critical
Publication of JP3386655B2 publication Critical patent/JP3386655B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor

Landscapes

  • Coating Apparatus (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、半導体ウエハや液
晶表示器のガラス基板等の各種基板上にフォトレジスト
液等の塗布膜を形成する塗布装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a coating apparatus for forming a coating film such as a photoresist solution on various substrates such as semiconductor wafers and glass substrates for liquid crystal displays.

【0002】[0002]

【従来の技術】従来のこの種の塗布装置は、図6に示す
ように、基板Wを真空吸着するステージ101と、この
ステージ101上で基板Wに沿って移動するスリット状
の供給口102を有する塗布ヘッド103とを備え、こ
の塗布ヘッド103をそのスリット状の供給口102か
ら塗布液を供給しながら一定速度で移動させることによ
り基板W上に塗布膜を形成するようにしたものである。
2. Description of the Related Art As shown in FIG. 6, a conventional coating apparatus of this type includes a stage 101 for vacuum-adsorbing a substrate W and a slit-shaped supply port 102 that moves along the substrate W on the stage 101. The coating head 103 is provided, and the coating film is formed on the substrate W by moving the coating head 103 at a constant speed while supplying the coating liquid from the slit-shaped supply port 102.

【0003】また、塗布ヘッド103の移動方向におけ
る終端側の待機位置には乾燥防止用の溶剤Sの収納され
た溶剤ポット104が上下動可能に配置されており、塗
布膜の形成作業の終了した塗布ヘッド103が上記待機
位置に移動したとき、溶剤ポット104が上昇して塗布
ヘッド103の供給口102側が溶剤雰囲気中に配置さ
れ、供給口102に存在する塗布液の乾燥が防止される
ようになっている。
A solvent pot 104 containing a solvent S for drying prevention is vertically movable at a standby position on the terminal side in the moving direction of the coating head 103, and the work of forming the coating film is completed. When the coating head 103 moves to the standby position, the solvent pot 104 rises and the side of the supply port 102 of the coating head 103 is placed in the solvent atmosphere so that the coating liquid existing in the supply port 102 is prevented from drying. Has become.

【0004】また、溶剤ポット104を備えていない場
合には、待機時間が長くなると塗布ヘッド103の供給
口102に存在している塗布液が乾燥して供給口102
からの塗布液の供給に支障が生じるため、例えば、上記
待機位置に図7に示すような樹脂等からなる掻き取り部
材105を配置しておき、待機していた塗布ヘッド10
3を作動させて塗布膜を形成する直前に掻き取り部材1
05を塗布ヘッド103の供給口102に沿って移動さ
せることにより供給口102の半固化状態や固化状態の
塗布液を掻き取るようにし、供給口102からの塗布液
の供給が可能となるようにされる。
In the case where the solvent pot 104 is not provided, the coating solution existing in the supply port 102 of the coating head 103 is dried and the supply port 102 is dried when the waiting time becomes long.
Since the supply of the coating liquid from the hindrance may be hindered, for example, the scraping member 105 made of resin or the like as shown in FIG.
Scraping member 1 immediately before actuating 3 to form a coating film
05 is moved along the supply port 102 of the coating head 103 so that the coating liquid in the semi-solidified or solidified state of the supply port 102 can be scraped off so that the coating liquid can be supplied from the supply port 102. To be done.

【0005】[0005]

【発明が解決しようとする課題】上記の塗布装置におい
て、塗布ヘッド103の供給口102側を溶剤ポット1
04の溶剤雰囲気中に配置するようにした場合には、塗
布ヘッド103の供給口102から内部に乾燥防止用の
溶剤が浸入してその付近で塗布液が薄められるため、塗
布膜を形成する直前に塗布液を仮吐出させて溶剤の混入
部分を排出する必要が生じ、その結果、別途その吐出領
域や受け部が必要になると共に、塗布液が無駄になると
いう問題がある。
In the above coating apparatus, the solvent pot 1 is provided on the supply port 102 side of the coating head 103.
In the case of arranging in the solvent atmosphere of 04, the solvent for drying prevention enters the inside of the supply port 102 of the coating head 103 and the coating liquid is diluted in the vicinity thereof, so that immediately before forming the coating film. It is necessary to temporarily discharge the coating liquid to discharge the mixed portion of the solvent, and as a result, there is a problem that the discharge region and the receiving portion are separately required and the coating liquid is wasted.

【0006】また、掻き取り部材105で塗布ヘッド1
03の供給口102の半固化状態や固化状態の塗布液を
掻き取るようにした場合には、塗布ヘッド103の待機
時間が長くなると供給口102内部の塗布液も部分的に
半固化状態や固化状態となるため、塗布液を完全に掻き
取ることができなくなる場合が生じ、その結果、正常な
塗布膜の形成が困難になるという問題がある。
Further, the scraping member 105 is used for the coating head 1.
When the coating liquid in the semi-solidified state or the solidified state of the supply port 102 of No. 03 is scraped off, the coating liquid inside the supply port 102 is partially semi-solidified or solidified when the standby time of the coating head 103 becomes long. As a result, the coating solution may not be completely scraped off, resulting in a problem that it becomes difficult to form a normal coating film.

【0007】本発明は、上記課題に鑑みてなされたもの
であり、待機中の塗布ヘッドを作動させて基板上に塗布
膜を形成する場合に、塗布液を無駄にせずに所定厚を有
する適正な塗布膜が形成できるようにした塗布装置を提
供することを目的とするものである。
The present invention has been made in view of the above problems, and when operating a coating head in standby to form a coating film on a substrate, the coating liquid is not wasted and a proper thickness is provided. An object of the present invention is to provide a coating apparatus capable of forming a different coating film.

【0008】[0008]

【課題を解決するための手段】請求項1に記載の塗布装
置は、基板の表面に塗布膜を形成する塗布装置であっ
て、基板を保持する基板保持手段と、基板に塗布液を供
給するためのスリット状の供給口を有する塗布液供給手
段と、基板の表面と前記供給口とが相対的に移動するよ
うに、前記基板保持手段と前記塗布液供給手段とを相対
的に移動させる第1の移動手段と、前記供給口と接触可
能であり、かつ前記供給口を清掃するための長尺状の部
材、前記長尺状の部材を巻装した供給ローラ、および前
記供給ローラから前記長尺状の部材を引き出す巻き取り
ローラを有する清掃手段と、前記供給口と前記長尺状の
部材とを接触させつつ、前記塗布液供給手段と前記清掃
手段とを相対的に移動させる第2の移動手段と、前記長
尺状の部材に溶剤を供給する溶剤供給手段と、を備えた
ものである。
A coating apparatus according to claim 1 is a coating apparatus for forming a coating film on a surface of a substrate, the substrate holding means for holding the substrate, and a coating liquid supplied to the substrate. A coating liquid supply unit having a slit-shaped supply port for moving the substrate holding unit and the coating liquid supply unit so that the surface of the substrate and the supply port relatively move. No. 1 moving means, an elongated member that can be in contact with the supply port and is for cleaning the supply port, a supply roller around which the elongated member is wound, and the supply roller to the length. A second means for relatively moving the coating liquid supply means and the cleaning means while bringing the cleaning means having a take-up roller for drawing out the long member and the supply port and the long member into contact with each other. Transfer means and solvent to the long member A solvent supply means for supplying, in which with a.

【0009】請求項1に記載の塗布装置では、塗布液供
給手段の供給口から塗布液を基板に供給して基板の表面
に塗布膜を形成する前に、第2の移動手段が供給口と清
掃手段の長尺状の部材とを接触させつつ、塗布液供給手
段と清掃手段とを相対的に移動させて、溶剤供給手段に
より溶剤の供給された長尺状の部材が供給口を拭き取っ
ているので、供給口周辺に付着した半固化状態や固化状
態の塗布液が確実に除去される。
In the coating apparatus according to the first aspect of the present invention, before the coating liquid is supplied to the substrate from the supply port of the coating liquid supply unit to form the coating film on the surface of the substrate, the second moving unit serves as the supply port. While contacting the elongated member of the cleaning means, the coating liquid supply means and the cleaning means are relatively moved, and the elongated member to which the solvent is supplied by the solvent supply means wipes off the supply port. Therefore, the semi-solidified or solidified coating liquid adhering to the periphery of the supply port is reliably removed.

【0010】請求項2に記載の塗布装置は、請求項1に
記載の塗布装置であって、さらに、前記基板保持手段と
前記塗布液供給手段とが待機状態にある場合に、前記供
給口を閉塞する封止部材と、前記供給口と前記封止部材
とを対向させた状態で、前記塗布液供給手段と前記封止
部材とを接離方向に相対的に移動させる第3の移動手段
と、を備えたものである。
According to a second aspect of the present invention, there is provided the coating device according to the first aspect, wherein when the substrate holding means and the coating liquid supply means are in a standby state, the supply port is opened. A closing member for closing, and a third moving unit for relatively moving the coating liquid supplying unit and the sealing member in the contacting and separating direction in a state where the supply port and the sealing member face each other. , Are provided.

【0011】請求項2に記載の塗布装置では、基板保持
手段と塗布液供給手段とが待機状態にある場合に、第3
の移動手段により塗布液供給手段と封止部材とを近接さ
せ、塗布液供給手段の供給口を封止部材で閉塞するの
で、塗布液の乾燥が防止される。
In the coating apparatus according to the second aspect, when the substrate holding means and the coating liquid supply means are in the standby state, the third
Since the coating liquid supply unit and the sealing member are brought close to each other by the moving unit and the supply port of the coating liquid supply unit is closed by the sealing member, the drying of the coating liquid is prevented.

【0012】請求項3に記載の塗布装置は、請求項2に
記載の塗布装置であって、前記清掃手段は、さらにガイ
ドプレートを有しており、前記ガイドプレートの一面側
に前記供給ローラが配設されるとともに、前記ガイドプ
レートの他面側に前記巻き取りローラが配設され、一面
側の前記供給ローラから引き出された前記長尺状の部材
を前記ガイドプレートの先端部で方向反転させて他面側
の前記巻き取りローラに巻き取らせ、前記第2の移動手
段は、前記封止部材と前記長尺状の部材とを接触させつ
つ、前記封止部材と前記清掃手段とを相対的に移動させ
るものである。
A coating apparatus according to a third aspect is the coating apparatus according to the second aspect, wherein the cleaning means further has a guide plate, and the supply roller is provided on one surface side of the guide plate. The winding roller is disposed on the other surface side of the guide plate, and the elongated member pulled out from the supply roller on the one surface side is turned over at the tip of the guide plate. And the second moving means brings the sealing member and the cleaning means into contact with each other while bringing the sealing member and the elongated member into contact with each other. To move it.

【0013】請求項3に記載の塗布装置では、ガイドプ
レートの一面側の供給ローラから引き出された長尺状の
部材をガイドプレートの先端部で方向反転させて他面側
の巻き取りローラに巻き取らせ、第2の移動手段が封止
部材と長尺状の部材とを接触させつつ、封止部材と清掃
手段とを相対的に移動させているので、供給口の清掃の
みならず、封止部材の清掃も同時に行われる。
In the coating apparatus according to the third aspect of the present invention, the long member drawn out from the supply roller on one surface of the guide plate is turned around at the tip of the guide plate and wound on the winding roller on the other surface. Since the second moving means relatively moves the sealing member and the cleaning means while the second moving means makes the sealing member and the elongated member in contact with each other, not only cleaning the supply port but also sealing the supply port. The stop member is also cleaned at the same time.

【0014】請求項4に記載の塗布装置は、請求項2ま
たは請求項3に記載の塗布装置であって、前記封止部材
は、弾性部材で形成され、かつ前記供給口と接触可能で
ある封止部を備えたものである。
A coating apparatus according to a fourth aspect is the coating apparatus according to the second or third aspect, wherein the sealing member is formed of an elastic member and can contact the supply port. It is provided with a sealing portion.

【0015】請求項4に記載の塗布装置では、供給口と
接触する封止部が、弾性部材で形成されているので、供
給口が弾力的に閉塞されて確実に塗布液の乾燥が防止さ
れる。
In the coating apparatus according to the fourth aspect, since the sealing portion that comes into contact with the supply port is formed of the elastic member, the supply port is elastically closed to reliably prevent the coating liquid from drying. It

【0016】[0016]

【発明の実施の形態】図1は本発明に係る塗布装置の一
実施形態を示す全体斜視図である。この塗布装置は、基
板Wを吸着保持するステージ10と、ステージ10に吸
着保持された基板W上にフォトレジスト液等の塗布液を
供給する塗布ヘッド20と、塗布ヘッド20を基板W上
に沿って移動させるヘッド水平移動手段30と、塗布ヘ
ッド20を基板W面と直交する上下方向に移動させるヘ
ッド垂直移動手段40と、塗布ヘッド20の移動方向に
おける終端側に配設されたヘッドレストを構成する封止
部材50と、封止部材50と同じ終端側に配設された清
掃手段としてのヘッドクリーナ60と、ヘッドクリーナ
60を塗布ヘッド20と封止部材50とに接触した状態
で移動させるクリーナ移動手段70と、ヘッドクリーナ
60に溶剤を供給する溶剤供給手段80とを備えてい
る。
1 is an overall perspective view showing an embodiment of a coating apparatus according to the present invention. This coating apparatus includes a stage 10 that sucks and holds a substrate W, a coating head 20 that supplies a coating liquid such as a photoresist liquid onto the substrate W that is sucked and held by the stage 10, and a coating head 20 that runs along the substrate W. A head horizontal moving means 30 for moving the coating head 20, a head vertical moving means 40 for moving the coating head 20 in a vertical direction orthogonal to the surface of the substrate W, and a headrest arranged on the end side in the moving direction of the coating head 20. A sealing member 50, a head cleaner 60 as a cleaning means disposed on the same end side as the sealing member 50, and a cleaner movement for moving the head cleaner 60 in contact with the coating head 20 and the sealing member 50. A means 70 and a solvent supply means 80 for supplying a solvent to the head cleaner 60 are provided.

【0017】ステージ10は、中央部に形成された基板
Wを載置するための載置部11と、この載置部11の両
側部に形成されたヘッド水平移動手段30の後述する摺
動体32,33を移動させるガイド用のレール12,1
3とを備えている。載置部11には、上下方向に貫通す
る複数の貫通孔14が形成されている。基板Wは、この
ステージ10の載置部11上に図略の搬送ロボットによ
り載置され、貫通孔14を介して下面側から真空吸引さ
れて載置部11上に固定されるようになっている。
The stage 10 has a mounting portion 11 for mounting the substrate W formed in the central portion thereof, and a slide body 32 of the head horizontal moving means 30 formed on both sides of the mounting portion 11, which will be described later. , Guide rails 12 for moving 33
3 and 3. The mounting portion 11 is formed with a plurality of through holes 14 penetrating in the vertical direction. The substrate W is mounted on the mounting portion 11 of the stage 10 by a transfer robot (not shown), and is vacuum-sucked from the lower surface side through the through holes 14 to be fixed on the mounting portion 11. There is.

【0018】塗布ヘッド20は、図2に示すように、一
対の対向壁21,22が突き合わされ、内部に塗布液の
供給路23を有すると共に、下面にその供給路23に連
なるスリット状の供給口24が開口するように構成され
たもので、基板Wの幅方向に配置されている。また、塗
布ヘッド20の上面中央部には、給送パイプ25が取り
付けられ、この給送パイプ25を介して図略の塗布液供
給タンクからフォトレジスト液等の塗布液が一定の圧力
で塗布ヘッド20内に給送されるようになっている。
As shown in FIG. 2, the coating head 20 has a pair of facing walls 21 and 22 butted against each other, has a supply passage 23 for the coating liquid therein, and has a slit-like supply on the lower surface which is continuous with the supply passage 23. The mouth 24 is configured to be open and is arranged in the width direction of the substrate W. Further, a feed pipe 25 is attached to the central portion of the upper surface of the coating head 20, and a coating liquid such as a photoresist liquid is applied from the coating liquid supply tank (not shown) through the feeding pipe 25 at a constant pressure. It will be delivered within 20.

【0019】ヘッド水平移動手段30は、ステージ10
の両側端部のレール12,13上を移動するもので、ス
テージ10の下方に幅方向に亘って配設された基部31
と、この基部31の両側に上方に屈曲され、さらに上端
が互いに内側に屈曲して形成された摺動部32,33
と、基部31の中央部であってレール12,13と同じ
方向に穿設されている雌ねじに螺合されたねじ軸34
と、図略の本体フレームに固設され、回転軸がねじ軸3
4に連結されたステッピングモータ等からなる塗布ヘッ
ド移動モータ35とを備えている。これにより、塗布ヘ
ッド移動モータ35が回転駆動してねじ軸34が回転す
ると、基部31が前後方向に移動することにより摺動体
32,33がステージ10のレール12,13上を移動
する。
The horizontal head moving means 30 is used for the stage 10.
Which moves on the rails 12 and 13 at both side ends of the base 31 and is arranged below the stage 10 in the width direction.
And the sliding portions 32, 33 formed by bending both sides of the base portion 31 upward and further bending the upper ends inward.
And a screw shaft 34 screwed into a female screw formed in the center of the base 31 in the same direction as the rails 12 and 13.
And is fixed to the body frame (not shown), and the rotating shaft is the screw shaft 3
4 and a coating head moving motor 35 including a stepping motor and the like. As a result, when the coating head moving motor 35 is rotationally driven and the screw shaft 34 rotates, the base 31 moves in the front-rear direction, so that the sliding bodies 32 and 33 move on the rails 12 and 13 of the stage 10.

【0020】ヘッド垂直移動手段40は、塗布ヘッド2
0の長手方向両側端部から突出する固定軸26,27を
固定支持する支持体41,42と、支持体41,42の
上面から下方向に貫通して穿設された雌ねじにそれぞれ
螺合されると共に、先端側が摺動体32,33に軸支さ
れたねじ軸43,44と、図略のフレームにより摺動体
32,33に固設され、回転軸がねじ軸43,44にそ
れぞれ連結されたステッピングモータ等からなる塗布ヘ
ッド昇降モータ45,46とを備えている。これによ
り、塗布ヘッド昇降モータ45,46が同時に回転駆動
してねじ軸43,44が回転すると、支持体41,42
が摺動体32,33に対して昇降することにより塗布ヘ
ッド20が上下方向に移動する。
The head vertical moving means 40 is used for the coating head 2.
0 are fixed to support bodies 41 and 42 for fixedly supporting the fixed shafts 26 and 27 projecting from both side ends in the longitudinal direction, and female screws threaded downward from the upper surfaces of the support bodies 41 and 42, respectively. At the same time, the tip ends are fixedly mounted on the sliding bodies 32 and 33 by screw shafts 43 and 44 whose axes are supported by the sliding bodies 32 and 33, and the rotary shafts are connected to the screw shafts 43 and 44, respectively. The coating head raising / lowering motors 45 and 46 including a stepping motor and the like are provided. Accordingly, when the coating head elevating motors 45 and 46 are driven to rotate simultaneously and the screw shafts 43 and 44 rotate, the support bodies 41 and 42 are rotated.
The coating head 20 moves up and down by moving up and down with respect to the sliding bodies 32 and 33.

【0021】封止部材50は、塗布ヘッド20の供給口
24を押し付けることにより供給口24を封止する好ま
しくはシリコンゴム等の弾性材料から形成された長尺状
の封止部51と、この封止部51の塗布ヘッド20の供
給口24と対向する部分を露出した状態で収納保持する
樹脂や金属等の非弾性部材からなる断面コの字状の長尺
状の保持部材52とから構成されており、封止部51の
供給口24との対向面がステージ10の載置部11上の
基板Wと略同じ平面に位置するようにして基板Wの幅方
向に沿って配設されている。上記封止部51は、供給口
24の両端に対しても確実に閉塞するためにその長手方
向の寸法がスリット状の供給口24の寸法に等しいかそ
の寸法よりも多少大きくなるように形成されており、塗
布ヘッド20の供給口24を封止部材50の封止部51
に押し付けることにより空気を遮断して供給口24に存
在する塗布液の乾燥を防止する。
The sealing member 50 is an elongated sealing portion 51 which is preferably made of an elastic material such as silicon rubber for sealing the supply port 24 by pressing the supply port 24 of the coating head 20, and It is composed of a long holding member 52 having a U-shaped cross section and made of an inelastic member such as a resin or a metal that stores and holds a portion of the sealing portion 51 facing the supply port 24 of the coating head 20 in an exposed state. The sealing portion 51 is arranged along the width direction of the substrate W so that the surface of the sealing portion 51 facing the supply port 24 is located on substantially the same plane as the substrate W on the mounting portion 11 of the stage 10. There is. The sealing portion 51 is formed such that the longitudinal dimension thereof is equal to or slightly larger than the dimension of the slit-shaped supply port 24 in order to reliably close both ends of the supply port 24. The supply port 24 of the coating head 20 is connected to the sealing portion 51 of the sealing member 50.
By pressing it against, the air is blocked and the coating liquid existing in the supply port 24 is prevented from drying.

【0022】なお、塗布ヘッド20の供給口24を封止
部材50の封止部51に直接押し付けなくても、次のよ
うにすれば上記と同様に封止部51により供給口24を
閉塞して塗布液の乾燥を防止することができる。すなわ
ち、塗布ヘッド20の供給口24を僅かな空隙を持たせ
て封止部51に対向させ、供給口24から塗布液を微量
だけ漏洩させて封止部51との間で乾燥皮膜を形成す
る。この皮膜は供給口24を覆うことになり、その結
果、空気が遮断されて供給口24に存在する塗布液の乾
燥が防止される。
Even if the supply port 24 of the coating head 20 is not directly pressed against the sealing portion 51 of the sealing member 50, the supply port 24 is closed by the sealing portion 51 in the same manner as described above by the following. It is possible to prevent the coating liquid from drying. That is, the supply port 24 of the coating head 20 is made to face the sealing portion 51 with a slight gap, and a small amount of the coating liquid is leaked from the supply port 24 to form a dry film with the sealing portion 51. . This coating covers the supply port 24, and as a result, air is blocked and the coating liquid existing in the supply port 24 is prevented from drying.

【0023】ヘッドクリーナ60は、支持体61と、こ
の支持体61から水平方向前方に突出するガイドプレー
ト62と、このガイドプレート62の上面側(一面側)
であって支持体61に近接した位置に配設された供給ロ
ーラ63と、ガイドプレート62の下面側(他面側)で
あって支持体61に近接した位置に配設された巻き取り
ローラ64と、この巻き取りローラ64を回転駆動する
駆動手段としてのステッピングモータ等からなる巻き取
りモータ65と、供給ローラ63に巻装された長尺状の
拭き取り部材66とを備えている。
The head cleaner 60 includes a support body 61, a guide plate 62 that horizontally projects from the support body 61, and an upper surface side (one surface side) of the guide plate 62.
And a take-up roller 64 arranged at a position close to the support 61, and a take-up roller 64 arranged at a position on the lower surface side (other surface side) of the guide plate 62 close to the support 61. And a take-up motor 65 including a stepping motor as a driving means for rotating the take-up roller 64, and an elongated wiping member 66 wound around the supply roller 63.

【0024】上記拭き取り部材66は、フェルト、4フ
ッ化エチレン重合体材料等からなる長尺状の材料で構成
され、巻き取りローラ64により巻き取られることによ
り供給ローラ63から引き出されると共に、ガイドプレ
ート62の先端部で方向反転されてガイドプレート62
の両面に沿って移動するようになっている。なお、ガイ
ドプレート62は、下面側の拭き取り部材66が上記封
止部材50の封止部51に接触する高さ位置になるよう
に位置設定されている。また、ガイドプレート62の先
端部には、拭き取り部材66の方向反転に支障が生じな
いように丸みが形成されている。この丸みの代わりにロ
ーラを配設してもよい。
The wiping member 66 is made of a long material such as felt and tetrafluoroethylene polymer material, and is taken up from the supply roller 63 by being wound by the winding roller 64 and is also guided by the guide plate. The direction of the guide plate 62 is reversed at the tip of the guide plate 62.
It is designed to move along both sides of. The guide plate 62 is positioned so that the wiping member 66 on the lower surface side is at a height position where it contacts the sealing portion 51 of the sealing member 50. In addition, a rounded portion is formed at the tip of the guide plate 62 so as not to hinder the reversal of the direction of the wiping member 66. A roller may be provided instead of this roundness.

【0025】クリーナ移動手段70は、支持体61に穿
設された水平方向の雌ねじに螺合されると共に、基板W
の幅方向に沿って配置されたねじ軸71と、図略の本体
フレームに固設され、回転軸がねじ軸71に連結された
ステッピングモータ等からなる拭き取りモータ72とか
ら構成されており、拭き取りモータ72の回転駆動によ
るねじ軸71の回転によってヘッドクリーナ60が一端
側の退避位置と他端側との間を往復移動する。なお、ヘ
ッドクリーナ60の退避位置は、図示では拭き取り部材
66の一部が封止部材50の端部に重なっているが、封
止部材50から完全に離間していてもよい。
The cleaner moving means 70 is screwed into a horizontal female screw formed in the support 61, and the substrate W
And a wiping motor 72, which is fixed to a main body frame (not shown) and has a rotating shaft connected to the screw shaft 71, and which includes a stepping motor and the like. The head cleaner 60 reciprocates between the retracted position on one end side and the other end side by the rotation of the screw shaft 71 due to the rotational driving of the motor 72. In the retracted position of the head cleaner 60, although a part of the wiping member 66 overlaps the end of the sealing member 50 in the drawing, it may be completely separated from the sealing member 50.

【0026】溶剤供給手段80は、塗布液の拭き取りに
好適な溶剤を収納してヘッドクリーナ60の上部位置に
配設された溶剤タンク81と、この溶剤タンク81内の
溶剤を上記拭き取り部材66側に排出する供給パイプ8
2と、供給パイプ82の先端に連結され、溶剤を上記拭
き取り部材66に供給する供給口83と、供給パイプ8
2の中間に配設され、溶剤タンク81の溶剤の供給口8
3への供給を制御する電磁バルブ84とを備えている。
The solvent supply means 80 stores a solvent suitable for wiping off the coating liquid, and a solvent tank 81 arranged at an upper position of the head cleaner 60, and the solvent in the solvent tank 81 to the wiping member 66 side. Supply pipe 8 to discharge to
2, a supply port 83 connected to the tip of the supply pipe 82 for supplying the solvent to the wiping member 66, and the supply pipe 8
The solvent supply port 8 of the solvent tank 81 is disposed in the middle of
3 and a solenoid valve 84 for controlling the supply to the No. 3 unit.

【0027】図3は、上記のように構成された塗布装置
の主要な制御構成を示すブロック図である。制御部90
は、本装置の動作全般の制御を行うためのCPU91、
そのための所定の制御プログラムが記憶されているRO
M92、制御処理中に発生するデータを一時的に記憶す
るRAM93等から構成されている。
FIG. 3 is a block diagram showing the main control configuration of the coating apparatus configured as described above. Control unit 90
Is a CPU 91 for controlling the overall operation of the apparatus,
RO storing a predetermined control program therefor
The M92 and the RAM 93 for temporarily storing data generated during the control process are included.

【0028】すなわち、CPU91は、図略のスタート
スイッチSWや位置センサ等から所定の信号が入力され
ることにより、モータ駆動回路35a,45a,46
a,65a,72a、及びバルブ駆動回路84aをそれ
ぞれ介して塗布ヘッド移動モータ35、塗布ヘッド昇降
モータ45,46、巻き取りモータ65、拭き取りモー
タ72、及び電磁バルブ84の各動作を制御する。
That is, the CPU 91 receives a predetermined signal from a start switch SW, a position sensor, or the like (not shown), so that the motor drive circuits 35a, 45a, 46.
The operations of the coating head moving motor 35, the coating head elevating motors 45 and 46, the winding motor 65, the wiping motor 72, and the electromagnetic valve 84 are controlled via a, 65a, 72a, and the valve drive circuit 84a, respectively.

【0029】また、図示はしていないが、CPU91
は、搬送ロボット駆動回路を介して基板Wの受渡しを行
う搬送ロボットを制御し、真空装置駆動回路を介して基
板Wをステージ10上に吸着保持する真空装置を制御す
るようになっている。
Although not shown, the CPU 91
Controls the transfer robot that transfers the substrate W via the transfer robot drive circuit, and controls the vacuum device that sucks and holds the substrate W on the stage 10 via the vacuum device drive circuit.

【0030】上記のように構成された塗布装置は次のよ
うに動作する。まず、制御部90の指令に基づき、搬送
ロボットにより基板Wがステージ10上に載置される
と、真空装置により基板Wがステージ10上に吸着保持
され、塗布ヘッド20が塗布ヘッド昇降モータ45,4
6の駆動により基板W上の所定高さ位置に設定されると
共に、塗布ヘッド移動モータ35の駆動により図1の手
前側の始端位置から矢印方向に一定速度で移動する。
The coating apparatus constructed as described above operates as follows. First, based on a command from the control unit 90, when the substrate W is placed on the stage 10 by the transfer robot, the substrate W is sucked and held on the stage 10 by the vacuum device, and the coating head 20 moves the coating head lifting motor 45, Four
A predetermined height position on the substrate W is set by driving 6 and the coating head moving motor 35 is driven to move the starting end position on the front side in FIG.

【0031】この塗布ヘッド20の移動開始と同時に、
塗布ヘッド20内部に塗布液が図略の塗布液タンクから
一定の圧力で供給され、塗布ヘッド20は供給口24か
ら塗布液を一定の供給圧で基板W上に供給しながら終端
位置にまで移動する。これにより基板W上に塗布膜が形
成され、この塗布膜の形成された基板Wは搬送ロボット
により次の工程に搬送される。その後、次の基板Wが順
次ステージ10上に載置されて吸着保持され、塗布ヘッ
ド20が始端位置に戻って上記と同様にして基板W上に
塗布膜を形成する。
Simultaneously with the start of movement of the coating head 20,
The coating liquid is supplied to the inside of the coating head 20 from a coating liquid tank (not shown) at a constant pressure, and the coating head 20 moves to the end position while supplying the coating liquid from the supply port 24 at a constant supply pressure onto the substrate W. To do. As a result, a coating film is formed on the substrate W, and the substrate W on which the coating film is formed is transferred to the next step by the transfer robot. After that, the next substrate W is sequentially placed on the stage 10 and held by suction, and the coating head 20 returns to the starting end position to form a coating film on the substrate W in the same manner as above.

【0032】塗布膜の形成作業が終了すると、塗布ヘッ
ド20は塗布ヘッド移動モータ35の駆動により待機位
置である封止部材50の位置にまで移動し、塗布ヘッド
昇降モータ45,46の駆動によって供給口24が図4
に示すように封止部材50の封止部51を軽く押し付け
る位置にまで降下する。これにより、供給口24が封止
部51によって空気と遮断され、供給口24に存在する
塗布液の乾燥が防止される。塗布ヘッド20は、この状
態で次の塗布膜の形成作業時まで待機する。
When the work of forming the coating film is completed, the coating head 20 is moved to the position of the sealing member 50 which is the standby position by driving the coating head moving motor 35, and is supplied by driving the coating head elevating motors 45 and 46. The mouth 24 is shown in FIG.
As shown in FIG. 5, the sealing member 51 of the sealing member 50 is lowered to a position where it is lightly pressed. As a result, the supply port 24 is shielded from the air by the sealing portion 51, and the coating liquid existing in the supply port 24 is prevented from drying. In this state, the coating head 20 stands by until the next coating film forming operation.

【0033】制御部90から次の塗布膜の形成作業の指
令が出されると、封止部材50の封止部51と接触した
状態にあった塗布ヘッド20は、塗布ヘッド昇降モータ
45,46の駆動によって封止部材50位置から上方に
移動し、供給口24がヘッドクリーナ60のガイドプレ
ート62の上面側に位置する拭き取り部材66に等しい
高さ位置で停止する。
When the control unit 90 issues a command for the next work of forming the coating film, the coating head 20 that was in contact with the sealing portion 51 of the sealing member 50 is driven by the coating head lifting motors 45 and 46. The drive moves upward from the position of the sealing member 50, and the supply port 24 stops at a height position equal to that of the wiping member 66 located on the upper surface side of the guide plate 62 of the head cleaner 60.

【0034】一方、上記形成作業の指令が出されると溶
剤供給手段80の電磁バルブ84が作動し、その弁が開
かれて溶剤タンク81から溶剤が供給パイプ82と供給
口83を介して拭き取り部材66に供給される。そし
て、溶剤が供給されている状態で巻き取りモータ65が
駆動され、拭き取り部材66が巻き取りローラ64に巻
き取られる。これにより、ガイドプレート62の上下両
面には溶剤の供給された拭き取り部材66が配置される
ことになる。この時点で電磁バルブ84の弁が閉じられ
て溶剤の供給が停止される。なお、拭き取り部材66に
供給された溶剤はその供給位置で拭き取り部材66に吸
収される。
On the other hand, when the forming operation command is issued, the electromagnetic valve 84 of the solvent supply means 80 is actuated, the valve is opened, and the solvent is removed from the solvent tank 81 via the supply pipe 82 and the supply port 83. 66. Then, the winding motor 65 is driven while the solvent is being supplied, and the wiping member 66 is wound around the winding roller 64. As a result, the wiping members 66 to which the solvent is supplied are arranged on the upper and lower surfaces of the guide plate 62. At this point, the electromagnetic valve 84 is closed and the supply of solvent is stopped. The solvent supplied to the wiping member 66 is absorbed by the wiping member 66 at the supply position.

【0035】次いで、拭き取りモータ72が駆動され、
一端側の退避位置にあるヘッドクリーナ60が他端側と
の間を往復移動する。このとき、ガイドプレート62の
上面側の拭き取り部材66は塗布ヘッド20の供給口2
4に接触する位置にあり、ガイドプレート62の下面側
の拭き取り部材66は封止部材50の封止部51に接触
する位置にあるため、ヘッドクリーナ60は図5に示す
ように拭き取り部材66が塗布ヘッド20の供給口24
と封止部材50の封止部51の両方に接触した状態で移
動することになる。
Then, the wiping motor 72 is driven,
The head cleaner 60 at the retracted position on the one end side reciprocates between the head cleaner 60 and the other end side. At this time, the wiping member 66 on the upper surface side of the guide plate 62 has the supply port 2 of the coating head 20
4 and the wiping member 66 on the lower surface side of the guide plate 62 is in the position of contacting the sealing portion 51 of the sealing member 50, the head cleaner 60 has the wiping member 66 as shown in FIG. Supply port 24 of coating head 20
And the sealing portion 51 of the sealing member 50 are in contact with each other.

【0036】そのため、塗布ヘッド20の待機中に塗布
ヘッド20の供給口24と封止部材50の封止部51に
塗布液が半固化状態や固化状態で付着した場合でも、そ
の塗布液が拭き取り部材66に供給されている溶剤によ
り溶解されると共に、摩擦力により拭き取り部材66に
拭き取られ、塗布ヘッド20の供給口24と封止部材5
0の封止部51の両方が同時に清掃されることになる。
なお、拭き取り部材66は、ガイドプレート62面に沿
って配置されているため、塗布ヘッド20の供給口24
と封止部材50の封止部51に接触したときにはガイド
プレート62に対して軽く押圧された状態となり、供給
口24と封止部51の清掃を確実に行うことができる。
Therefore, even when the coating liquid adheres to the supply port 24 of the coating head 20 and the sealing portion 51 of the sealing member 50 in a semi-solidified or solidified state while the coating head 20 is on standby, the coating liquid is wiped off. It is dissolved by the solvent supplied to the member 66 and is wiped off by the wiping member 66 by frictional force, and the supply port 24 of the coating head 20 and the sealing member 5 are removed.
Both zero seals 51 will be cleaned at the same time.
Since the wiping member 66 is arranged along the surface of the guide plate 62, the supply port 24 of the coating head 20 is provided.
When contacting the sealing portion 51 of the sealing member 50, the guide plate 62 is lightly pressed, and the supply port 24 and the sealing portion 51 can be reliably cleaned.

【0037】ヘッドクリーナ60が往復移動して元の退
避位置に戻るか、または往動が終了すると、塗布ヘッド
昇降モータ45,46及び塗布ヘッド移動モータ35が
駆動され、塗布ヘッド20は所定の高さ位置に降下され
ると共に始端位置に戻り、基板Wに対する塗布膜の形成
作業が開始される。塗布ヘッド20は、待機中には封止
部材50により供給口24の塗布液の乾燥が防止され、
塗布膜の形成作業開始前には供給口24がヘッドクリー
ナ60により清掃されているので、供給口24から塗布
液が正常に供給されて基板W上に所定厚の塗布膜を形成
することができることになる。
When the head cleaner 60 reciprocates to return to the original retracted position or when the forward movement is completed, the coating head lifting motors 45 and 46 and the coating head moving motor 35 are driven, and the coating head 20 moves to a predetermined height. Then, the work of forming the coating film on the substrate W is started. In the coating head 20, the sealing member 50 prevents the coating liquid from drying at the supply port 24 during standby,
Since the supply port 24 is cleaned by the head cleaner 60 before the start of the coating film forming operation, the coating liquid can be normally supplied from the supply port 24 to form a coating film of a predetermined thickness on the substrate W. become.

【0038】なお、上記の実施形態において、基板Wに
対する塗布膜の形成は塗布ヘッド20を基板Wに対して
移動することにより行うようにしているが、塗布ヘッド
20を固定しておいて基板Wを移動するようにしたり、
塗布ヘッド20と基板Wの両者を互いに逆方向に移動す
るようにしてもよい。すなわち、塗布ヘッド20と基板
Wが相対移動するようにされておればよい。
Although the coating film is formed on the substrate W by moving the coating head 20 with respect to the substrate W in the above embodiment, the coating head 20 is fixed and the substrate W is fixed. To move
Both the coating head 20 and the substrate W may be moved in opposite directions. That is, it suffices that the coating head 20 and the substrate W move relative to each other.

【0039】また、上記の実施形態において、塗布ヘッ
ド20の供給口24と封止部材50の封止部51の清掃
は塗布ヘッド20と封止部材50に対してヘッドクリー
ナ60を移動することにより行うようにしているが、ヘ
ッドクリーナ60を固定しておき塗布ヘッド20と封止
部材50を移動できるように構成したり、ヘッドクリー
ナ60と、塗布ヘッド20及び封止部材50とを互いに
逆方向に移動できるような構成としてもよい。すなわ
ち、ヘッドクリーナ60と、塗布ヘッド20及び封止部
材50とが相対移動するようにされておればよい。
Further, in the above embodiment, the supply port 24 of the coating head 20 and the sealing portion 51 of the sealing member 50 are cleaned by moving the head cleaner 60 with respect to the coating head 20 and the sealing member 50. However, the head cleaner 60 is fixed and the coating head 20 and the sealing member 50 can be moved, or the head cleaner 60 and the coating head 20 and the sealing member 50 are in opposite directions. It may be configured so that it can be moved to. That is, it suffices that the head cleaner 60 and the coating head 20 and the sealing member 50 move relative to each other.

【0040】また、上記の実施形態において、塗布ヘッ
ド20は塗布ヘッド昇降モータ45,46により上下方
向に移動するようになっているが、この構成に代えて封
止部材50を上下方向に移動できる構成にしてもよい。
これによると、上記実施形態の場合と同様に、待機中に
は封止部材50の封止部51により塗布ヘッド20の供
給口24に存在する塗布液の乾燥を防止することがで
き、塗布膜の形成作業開始前にはヘッドクリーナ60の
拭き取り部材66により塗布ヘッド20の供給口24と
封止部材50の封止部51の両方を同時に清掃すること
が可能となる。すなわち、塗布ヘッド20と封止部材5
0とが接離方向に相対移動するように構成されておれば
よい。
Further, in the above-described embodiment, the coating head 20 is moved in the vertical direction by the coating head lifting motors 45 and 46, but instead of this structure, the sealing member 50 can be moved in the vertical direction. It may be configured.
According to this, as in the case of the above-described embodiment, it is possible to prevent the coating liquid existing in the supply port 24 of the coating head 20 from being dried by the sealing portion 51 of the sealing member 50 during standby, and thus the coating film. Before the start of the work of forming (1), the wiping member 66 of the head cleaner 60 can simultaneously clean both the supply port 24 of the coating head 20 and the sealing portion 51 of the sealing member 50. That is, the coating head 20 and the sealing member 5
It suffices that it is configured such that 0 and 0 relatively move in the contact and separation directions.

【0041】[0041]

【発明の効果】以上説明したように、請求項1に記載の
塗布装置によれば、溶剤供給手段により溶剤の供給され
た長尺状の部材が供給口を拭き取ることにより、供給口
周辺に付着した半固化状態や固化状態の塗布液を確実に
除去することができ、供給口からの塗布液の正常な供給
が可能となる。また、従来の塗布装置のように、供給口
内に乾燥防止用の溶剤が混入することによる混入部分を
排出する必要もないので、塗布液を無駄にしなくてもよ
いという効果がある。
As described above, according to the coating apparatus of the first aspect, the long member, to which the solvent is supplied by the solvent supplying means, adheres to the periphery of the supply port by wiping the supply port. The coating liquid in the semi-solidified state or the solidified state can be surely removed, and the coating liquid can be normally supplied from the supply port. Further, unlike the conventional coating apparatus, there is no need to discharge the mixed portion due to the mixing of the solvent for drying prevention into the supply port, so that there is an effect that the coating liquid is not wasted.

【0042】請求項2に記載の塗布装置によれば、基板
保持手段と塗布液供給手段とが待機状態にある場合に、
塗布液供給手段の供給口を封止部材で閉塞することによ
り、供給口周辺にある塗布液の乾燥が防止できる。
According to the coating apparatus of the second aspect, when the substrate holding means and the coating liquid supply means are in the standby state,
By closing the supply port of the coating liquid supply means with the sealing member, it is possible to prevent the coating liquid around the supply port from drying.

【0043】請求項3に記載の塗布装置によれば、第2
の移動手段が封止部材と長尺状の部材とを接触させつ
つ、封止部材と清掃手段とを相対的に移動させているの
で、両面で塗布液供給手段の供給口と封止部材を同時に
清掃することができる。
According to the coating apparatus of the third aspect, the second
The moving means moves the sealing member and the cleaning means relative to each other while bringing the sealing member and the elongated member into contact with each other. Can be cleaned at the same time.

【0044】請求項4に記載の塗布装置によれば、供給
口と接触する封止部が、弾性部材で形成されているの
で、塗布液の乾燥を効果的に防止することができる。
According to the coating apparatus of the fourth aspect, since the sealing portion that comes into contact with the supply port is formed of the elastic member, it is possible to effectively prevent the coating liquid from drying.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施形態における塗布装置の斜視図
である。
FIG. 1 is a perspective view of a coating device according to an embodiment of the present invention.

【図2】図1に示す塗布装置に採用されている塗布ヘッ
ドの要部側断面図である。
FIG. 2 is a side sectional view of a main part of a coating head used in the coating apparatus shown in FIG.

【図3】本発明の塗布装置の制御構成を示すブロック図
である。
FIG. 3 is a block diagram showing a control configuration of a coating apparatus of the present invention.

【図4】本発明の塗布装置の塗布ヘッドと封止部材との
接触状態を説明するための図である。
FIG. 4 is a diagram for explaining a contact state between a coating head and a sealing member of the coating apparatus of the present invention.

【図5】本発明の塗布装置の塗布ヘッド、封止部材及び
ヘッドクリーナとの接触状態を説明するための図であ
る。
FIG. 5 is a diagram for explaining a contact state between the coating head, the sealing member, and the head cleaner of the coating device of the present invention.

【図6】従来の塗布装置の斜視図である。FIG. 6 is a perspective view of a conventional coating device.

【図7】従来の塗布装置に採用される掻き取り部材の斜
視図である。
FIG. 7 is a perspective view of a scraping member used in a conventional coating device.

【符号の説明】[Explanation of symbols]

10 ステージ(基板保持手段) 11 載置部 14 貫通孔 20 塗布ヘッド(塗布液供給手段) 21,22 対向壁 24 供給口 30 ヘッド水平移動手段(第1の移動手段) 40 ヘッド垂直移動手段(第3の移動手段) 50 封止部材 51 封止部 52 保持部 60 ヘッドクリーナ 61 支持体 62 ガイドプレート 63 供給ローラ 64 巻き取りローラ 65 巻き取りモータ 66 拭き取り部材 70 クリーナ移動手段(第2の移動手段) 80 溶剤供給手段 90 制御部 10 stages (substrate holding means) 11 Placement section 14 through holes 20 coating head (coating liquid supply means) 21,22 opposite wall 24 supply port 30 Head horizontal moving means (first moving means) 40 head vertical moving means (third moving means) 50 sealing member 51 Sealing part 52 holding unit 60 head cleaner 61 Support 62 Guide plate 63 supply roller 64 winding roller 65 winding motor 66 Wiping member 70 cleaner moving means (second moving means) 80 Solvent supply means 90 Control unit

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭64−8621(JP,A) 特開 平6−20936(JP,A) 特開 平7−29789(JP,A) (58)調査した分野(Int.Cl.7,DB名) H01L 21/027 G03F 7/16 B05C 5/02 ─────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP 64-8621 (JP, A) JP 6-20936 (JP, A) JP 7-29789 (JP, A) (58) Field (Int.Cl. 7 , DB name) H01L 21/027 G03F 7/16 B05C 5/02

Claims (4)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 基板の表面に塗布膜を形成する塗布装置
であって、 基板を保持する基板保持手段と、 基板に塗布液を供給するためのスリット状の供給口を有
する塗布液供給手段と、 基板の表面と前記供給口とが
相対的に移動するように、前記基板保持手段と前記塗布
液供給手段とを相対的に移動させる第1の移動手段と、 前記供給口と接触可能であり、かつ前記供給口を清掃す
るための長尺状の部材、前記長尺状の部材を巻装した供
給ローラ、および前記供給ローラから前記長尺状の部材
を引き出す巻き取りローラを有する清掃手段と、 前記供給口と前記長尺状の部材とを接触させつつ、前記
塗布液供給手段と前記清掃手段とを相対的に移動させる
第2の移動手段と、 前記長尺状の部材に溶剤を供給する溶剤供給手段と、を
備えたことを特徴とする塗布装置。
1. A coating apparatus for forming a coating film on a surface of a substrate, comprising: a substrate holding means for holding the substrate; and a coating liquid supply means having a slit-shaped supply port for supplying the coating liquid to the substrate. A first moving unit that relatively moves the substrate holding unit and the coating liquid supply unit so that the surface of the substrate and the supply port move relative to each other; And a cleaning means having a long member for cleaning the supply port, a supply roller around which the long member is wound, and a winding roller for pulling out the long member from the supply roller, A second moving unit that relatively moves the coating liquid supply unit and the cleaning unit while bringing the supply port and the long member into contact with each other; and supplying a solvent to the long member. And a solvent supply means for Applicator to collect.
【請求項2】 請求項1に記載の塗布装置であって、さ
らに、 前記基板保持手段と前記塗布液供給手段とが待機状態に
ある場合に、前記供給口を閉塞する封止部材と、 前記供給口と前記封止部材とを対向させた状態で、前記
塗布液供給手段と前記封止部材とを接離方向に相対的に
移動させる第3の移動手段と、を備えたことを特徴とす
る塗布装置。
2. The coating apparatus according to claim 1, further comprising a sealing member that closes the supply port when the substrate holding unit and the coating liquid supply unit are in a standby state, A third moving unit that relatively moves the coating liquid supply unit and the sealing member in the contacting / separating direction with the supply port and the sealing member facing each other. Coating device.
【請求項3】 請求項2に記載の塗布装置であって、 前記清掃手段は、さらにガイドプレートを有しており、
前記ガイドプレートの一面側に前記供給ローラが配設さ
れるとともに、前記ガイドプレートの他面側に前記巻き
取りローラが配設され、一面側の前記供給ローラから引
き出された前記長尺状の部材を前記ガイドプレートの先
端部で方向反転させて他面側の前記巻き取りローラに巻
き取らせ、 前記第2の移動手段は、前記封止部材と前記長尺状の部
材とを接触させつつ、前記封止部材と前記清掃手段とを
相対的に移動させることを特徴とする塗布装置。
3. The coating apparatus according to claim 2, wherein the cleaning means further has a guide plate,
The supply roller is disposed on one surface side of the guide plate, the winding roller is disposed on the other surface side of the guide plate, and the elongated member is pulled out from the supply roller on the one surface side. To reverse the direction at the tip of the guide plate to be taken up by the take-up roller on the other surface side, the second moving means, while contacting the sealing member and the elongated member, An applicator characterized in that the sealing member and the cleaning means are moved relative to each other.
【請求項4】 請求項2または請求項3に記載の塗布装
置であって、 前記封止部材は、弾性部材で形成され、かつ前記供給口
と接触可能である封止部を備えたことを特徴とする塗布
装置。
4. The coating apparatus according to claim 2 or 3, wherein the sealing member includes a sealing portion formed of an elastic member and capable of contacting with the supply port. Characteristic coating device.
JP10278696A 1996-04-24 1996-04-24 Coating device Expired - Fee Related JP3386655B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP10278696A JP3386655B2 (en) 1996-04-24 1996-04-24 Coating device
KR1019970012175A KR100240210B1 (en) 1996-04-24 1997-04-02 A coating apparatus provide with a supply port cleaner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10278696A JP3386655B2 (en) 1996-04-24 1996-04-24 Coating device

Publications (2)

Publication Number Publication Date
JPH09293653A JPH09293653A (en) 1997-11-11
JP3386655B2 true JP3386655B2 (en) 2003-03-17

Family

ID=14336821

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10278696A Expired - Fee Related JP3386655B2 (en) 1996-04-24 1996-04-24 Coating device

Country Status (2)

Country Link
JP (1) JP3386655B2 (en)
KR (1) KR100240210B1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100468529B1 (en) * 2002-05-18 2005-01-27 엘지.필립스 엘시디 주식회사 etchant coating apparatus and wet etching method using thereof
KR100780718B1 (en) 2004-12-28 2007-12-26 엘지.필립스 엘시디 주식회사 Slit coater with coating liquid supply device
KR100675643B1 (en) 2004-12-31 2007-02-02 엘지.필립스 엘시디 주식회사 Slit Coater
KR100700181B1 (en) 2004-12-31 2007-03-27 엘지.필립스 엘시디 주식회사 Slit coater with nozzle waiting portion and coating method using the same
JP4832963B2 (en) * 2006-06-06 2011-12-07 アスリートFa株式会社 Resin coating system
CN114226174B (en) * 2022-01-24 2025-12-23 福建华佳彩有限公司 Coating equipment cutter wetting groove device

Also Published As

Publication number Publication date
KR100240210B1 (en) 2000-01-15
JPH09293653A (en) 1997-11-11
KR970072019A (en) 1997-11-07

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