JP3404140B2 - Storage case for mask protection device - Google Patents
Storage case for mask protection deviceInfo
- Publication number
- JP3404140B2 JP3404140B2 JP20240794A JP20240794A JP3404140B2 JP 3404140 B2 JP3404140 B2 JP 3404140B2 JP 20240794 A JP20240794 A JP 20240794A JP 20240794 A JP20240794 A JP 20240794A JP 3404140 B2 JP3404140 B2 JP 3404140B2
- Authority
- JP
- Japan
- Prior art keywords
- protection device
- mask
- storage case
- mask protection
- frame
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Packaging Of Annular Or Rod-Shaped Articles, Wearing Apparel, Cassettes, Or The Like (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、マスク保護装置が装着
されるケース本体と、該本体に被せられる上蓋とよりな
り、マスクやレチクル(以下、「マスク」という)に塵
埃等が付着するのを防止する目的で用いられるマスク保
護装置の収納ケースに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention comprises a case body to which a mask protection device is attached, and an upper lid which covers the body, and dust or the like adheres to a mask or reticle (hereinafter referred to as "mask"). The present invention relates to a storage case of a mask protection device used for the purpose of preventing the above.
【0002】[0002]
【従来技術】集積回路の製造工程におけるフォトリソグ
ラフィ工程では、マスク上に塵埃等が付着すると、これ
が半導体ウェハに投影され、不良製品となりがちであ
る。この問題を解消し、マスク上に異物等が付着するの
を防止するため、マスクパターンを囲う大きさの枠の一
側面に透明な薄膜を張設すると共に、他側端面に離型紙
付きの両面粘着テープを接着し、離型紙を剥がしてマス
ク上に接着することにより、マスクを薄膜により一定の
間隔を存して覆うようにしたマスク保護装置が供される
ようになった。2. Description of the Related Art In the photolithography process in the manufacturing process of integrated circuits, if dust or the like adheres to a mask, it is projected onto a semiconductor wafer and tends to be a defective product. In order to solve this problem and prevent foreign matters from adhering to the mask, a transparent thin film is stretched on one side of the frame that is large enough to enclose the mask pattern, and double-sided with release paper on the other end. By adhering an adhesive tape, peeling off a release paper and adhering it on a mask, a mask protection device has been provided in which the mask is covered with a thin film at regular intervals.
【0003】こうしたマスク保護装置は、出荷して使用
に供されるまで通常、塵埃等が付着することのないよう
に、収納ケースに入れられて保管される。図1及び図2
は、従来用いられてきたこの種収納ケースについて示す
もので、枠1と、枠1の一側面に張設される薄膜2と、
枠1の他側端面に貼着される離型紙付きの両面粘着テー
プ(図示しない)とよりなるマスク保護装置3が位置決
めされて装着される台4を中央部に突状に形成した樹脂
製のケース本体5と、ケース本体上に被せて装着され、
マスク保護装置の枠周縁を押える押え部4を形成した樹
脂製の上蓋6と、上蓋6をケース本体5に止めるクリッ
プ7とよりなっている。Such a mask protection device is usually stored in a storage case so that dust or the like does not adhere to it until it is shipped and used. 1 and 2
Shows a conventional storage case of this type, which includes a frame 1, a thin film 2 stretched on one side of the frame 1,
The frame 4 is made of resin and has a pedestal 4 projectingly formed in the center thereof, on which a mask protection device 3 composed of a double-sided adhesive tape (not shown) with release paper attached to the other end face of the frame 1 is positioned and mounted. The case body 5 and the case body 5 are mounted on the case body,
An upper lid 6 made of resin having a holding portion 4 for holding the peripheral edge of the frame of the mask protection device, and a clip 7 for fixing the upper lid 6 to the case body 5 are provided.
【0004】[0004]
【発明が解決しようとする課題】収納ケースから取出し
たマスク保護装置をマスク上に接着する際、マスク保護
装置をマスク上に押付けても粘着材層の変形によりマス
クとの間に浮きを生じ、空気の流通するエアパスが生じ
ることがある。本発明は、粘着材層の変形によるエアパ
スの解消を目的としてなされたものである。When the mask protection device taken out from the storage case is bonded onto the mask, even if the mask protection device is pressed onto the mask, the adhesive layer deforms to cause floating between the mask protection device and the mask. An air path through which air flows may occur. The present invention has been made for the purpose of eliminating an air path due to deformation of an adhesive layer.
【0005】[0005]
【課題の解決手段及び作用】上記の目的を達成する発明
は、枠と、枠一側面に張設される薄膜と、枠の他側端面
に接着される粘着材とよりなるマスク保護装置が装着さ
れる台を備えた樹脂製のケース本体と、該本体に被せら
れる樹脂製の上蓋と、上蓋をケース本体に止めるクリッ
プとよりなるマスク保護装置の収納ケースにおいて、上
記台の取付面の最大変形量を200μm以下、好ましく
は150μm以下、より好ましくは80μ以下に成形し
たことを特徴とする。The invention for achieving the above object is to install a mask protection device comprising a frame, a thin film stretched on one side surface of the frame, and an adhesive material adhered to the other end surface of the frame. In a storage case of a mask protection device including a resin case main body having a table, a resin upper lid that covers the main body, and a clip that fixes the upper lid to the case main body, the maximum deformation of the mounting surface of the table is achieved. The amount is 200 μm or less, preferably 150 μm or less, and more preferably 80 μm or less.
【0006】[0006]
【作用】第1の発明に対し、本発明者らは、粘着材の歪
が収納ケースのマスク保護装置装着用の台の変形に起因
するものと考え、台の変形と、粘着材の歪量及びエアパ
スの関係について種々実験を重ねた。表1及び図3は、
その結果を示すものである。In contrast to the first invention, the present inventors consider that the distortion of the adhesive material is caused by the deformation of the table for mounting the mask protection device of the storage case, and the deformation of the table and the distortion amount of the adhesive material And various experiments were repeated about the relationship of the air path. Table 1 and FIG. 3 show
The results are shown.
【0007】[0007]
【表1】 [Table 1]
【0008】ここで、台の変形量は、縦、横、高さの測
定が可能な三次元測定機を用い、触針荷重3gで触針を
台上に走らせ、針の変位を測定して台の最大値−最小値
=最大変位量を読み取ることにより求めた。また粘着材
の歪量は、図4に示すように、直行ロボット(図示省
略)にセットしたガイド41に非接触光学センサー42
と触診針43をセットすると共に、台44上にライナー
46を装着したマスク装着材45を上にしたマスク保護
装置3をセットする。ついで直行ロボットで針43を触
針荷重5gでライナー46上に走らせ、光学センサー4
2で反射板47からの反射光により針43の変位を測定
し、その最大値と最小値の差から粘着材の最大歪量を求
めた。Here, the amount of deformation of the table is measured by measuring the displacement of the stylus by using a coordinate measuring machine capable of measuring the length, width and height and running the stylus on the table with a stylus load of 3 g. It was determined by reading the maximum value-minimum value = maximum displacement of the table. Further, as shown in FIG. 4, the amount of strain of the adhesive material is measured by the non-contact optical sensor 42 on the guide 41 set on the orthogonal robot (not shown).
Then, the palpation needle 43 is set, and the mask protection device 3 with the mask mounting material 45 with the liner 46 mounted on the table 44 is set. Then, the robot 43 runs the needle 43 on the liner 46 with a stylus load of 5 g, and the optical sensor 4
In 2, the displacement of the needle 43 was measured by the reflected light from the reflection plate 47, and the maximum strain amount of the adhesive material was obtained from the difference between the maximum value and the minimum value.
【0009】また、マスク保護装置の貼付け性の評価テ
ストは、温度24℃、湿度48%のクリーンルーム内で
次のようにして行った。すなわち、歪みをもった粘着材
を用い、30kgの荷重を3分間、マスク保護装置に加
え、接着後3日目で目視により観察した。The evaluation test of the adhesiveness of the mask protector was carried out as follows in a clean room at a temperature of 24 ° C. and a humidity of 48%. That is, using a strained adhesive material, a load of 30 kg was applied to the mask protection device for 3 minutes and visually observed 3 days after the adhesion.
【0010】表1に見られるように、ケースの台の変形
量が200μm以下だと、粘着材の歪みが少なく、エア
パスがないうえ、粘着材の浮きもほとんどなく、台の変
形量が150μm以下だと粘着材の浮きもなかった。ま
た図3に示されるように、台の変形量と粘着材歪み量の
相関は、80μm未満と以上で異なり、80μm以下で
は、台の変形に対する粘着材の歪みの変化はほとんど認
められなかった。したがって台の変形量は、一定以上厳
密にコントロールする必要はないことが判明した。As can be seen from Table 1, when the amount of deformation of the base of the case is 200 μm or less, distortion of the adhesive material is small, there is no air path, and there is almost no floating of the adhesive material, and the amount of deformation of the base is 150 μm or less. Then the adhesive did not float. As also shown in FIG. 3, the correlation of the deformation amount and adhesive distortion amount of base, unlike the above and below 80 [mu] m, 80 [mu] m in the following, the change in strain of the adhesive material to deformation of the platform was hardly observed. Therefore, it became clear that it is not necessary to strictly control the amount of deformation of the table above a certain level.
【0011】[0011]
【発明の効果】本発明は以上のように構成され、次のよ
うな効果を奏する。請求項1記載の収納ケースのよう
に、マスク保護装置装着用の台の取付面の最大変形量が
200μm以下となるように成形すれば、マスク保護装
置の粘着材層の歪みも少なく、マスクに取付けたときの
エアパスを解消することができ、請求項2記載のよう
に、150μm以下となるように成形すれば、浮きも解
消することができる。更に請求項3記載のように、80
μm以下となるように成形すれば、粘着材層の変形をな
くすことができる。The present invention is constructed as described above and has the following effects. Like the storage case according to claim 1, when the mask protection device mounting base is molded so that the maximum amount of deformation of the mounting surface is 200 μm or less, the distortion of the adhesive layer of the mask protection device is small, and the mask is used as a mask. The air path when attached can be eliminated, and if it is molded so as to have a thickness of 150 μm or less as described in claim 2, the floating can be eliminated. Further, as described in claim 3, 80
If the pressure-sensitive adhesive layer is molded so as to have a thickness of μm or less, the pressure-sensitive adhesive layer can be prevented from being deformed.
【図1】マスク保護装置の収納ケースの断面図。FIG. 1 is a cross-sectional view of a storage case of a mask protection device.
【図2】同装置の平面図。FIG. 2 is a plan view of the device.
【図3】ケースの変形量と粘着材の歪み量との関係を示
すグラフ。FIG. 3 is a graph showing the relationship between the deformation amount of the case and the strain amount of the adhesive material.
【図4】測定装置の正面図。FIG. 4 is a front view of the measuring device.
1・・枠 2・・薄膜 3・・マスク保護装置 4・・台 5・・ケース本体 6・・上蓋 7・・クリップ 1 ... frame 2 ... Thin film 3 · Mask protector 4 ... 5 ... Case body 6 ... Top lid 7-clip
フロントページの続き (56)参考文献 特開 平6−208221(JP,A) 特開 昭63−22379(JP,A) 特開 平4−19665(JP,A) 実開 平1−120148(JP,U) (58)調査した分野(Int.Cl.7,DB名) G03F 1/00 - 1/16 Continuation of the front page (56) References JP-A-6-208221 (JP, A) JP-A-63-22379 (JP, A) JP-A-4-19665 (JP, A) Actual Kaihei 1-120148 (JP , U) (58) Fields surveyed (Int.Cl. 7 , DB name) G03F 1/00-1/16
Claims (3)
他側端面に接着される粘着剤とよりなるマスク保護装置
が装着される台を備えた樹脂製のケース本体と、該本体
に被せられる樹脂製の上蓋と、上蓋をケース本体に止め
るクリップとよりなるマスク保護装置の収納ケースにお
いて、上記台の取付け面の最大変形量を200μm以下
に成形したことを特徴とするマスク保護装置の収納ケー
ス。1. A case body made of resin, comprising a frame, a thin film stretched on one side surface of the frame, and a pedestal to which a mask protection device composed of an adhesive adhered to the other end surface of the frame is mounted. In a storage case of a mask protection device comprising a resin-made upper lid that covers the main body and a clip that fixes the upper lid to the case main body, the maximum deformation amount of the mounting surface of the base is molded to 200 μm or less. Storage case for mask protection device.
m以下に成形したことを特徴とする請求項1記載のマス
ク保護装置の収納ケース。2. The maximum deformation of the mounting surface of the table is 150 μm.
The storage case of the mask protection device according to claim 1, wherein the storage case is molded to be m or less.
以下に成形したことを特徴とする請求項1記載のマスク
保護装置の収納ケース。3. The maximum deformation of the mounting surface of the table is 80 μm.
The storage case of the mask protection device according to claim 1, which is molded as follows.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20240794A JP3404140B2 (en) | 1994-08-26 | 1994-08-26 | Storage case for mask protection device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20240794A JP3404140B2 (en) | 1994-08-26 | 1994-08-26 | Storage case for mask protection device |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002273138A Division JP3833980B2 (en) | 2002-09-19 | 2002-09-19 | Mask protector storage case |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0862828A JPH0862828A (en) | 1996-03-08 |
| JP3404140B2 true JP3404140B2 (en) | 2003-05-06 |
Family
ID=16457003
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20240794A Expired - Fee Related JP3404140B2 (en) | 1994-08-26 | 1994-08-26 | Storage case for mask protection device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3404140B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5052106B2 (en) * | 2006-11-22 | 2012-10-17 | 旭化成イーマテリアルズ株式会社 | How to store the pellicle |
| JP6308676B2 (en) | 2014-12-18 | 2018-04-11 | 信越化学工業株式会社 | Pellicle container for lithography. |
-
1994
- 1994-08-26 JP JP20240794A patent/JP3404140B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0862828A (en) | 1996-03-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101515458B1 (en) | Pellicle, pellicle container for receiving pellicle, and method of keeping pellicle in pellicle container | |
| CA2024618A1 (en) | Amorphous fluoropolymer pellicle films | |
| TW505828B (en) | Pellicle, method for producing the same, and photomask | |
| KR20060058001A (en) | Large pellicle | |
| JP4007752B2 (en) | Large pellicle frame and large pellicle | |
| JP3404140B2 (en) | Storage case for mask protection device | |
| JP2006056544A (en) | Pellicle frame and pellicle for photolithography using the frame | |
| JP5269438B2 (en) | Protective film for large pellicle and storage method for large pellicle | |
| JP2002296763A (en) | Large pellicle | |
| JPH01292343A (en) | Pellicle | |
| US20020136965A1 (en) | Pellicle | |
| TWI270745B (en) | Method of installing a large pellicle | |
| US20020142234A1 (en) | Photomask | |
| JPS6222439A (en) | Protective tape for wafer | |
| JP2010060992A (en) | Large pellicle structure and large pellicle housing structure | |
| JPH02125440A (en) | Thin film forming device and forming method for thin film | |
| JP3523939B2 (en) | Adhesive sheet for wafer processing and method for producing the same | |
| JP3938224B2 (en) | Pellicle storage structure | |
| KR20160074402A (en) | Pellicle container for lithography | |
| KR19990077808A (en) | Apparatus for bonding of pellicle liner | |
| JP2002107914A (en) | Pellicle and pellicle mounting method | |
| JP2012112998A (en) | Method and apparatus for sticking pellicle for lithography | |
| JP2003107679A (en) | Storage case of mask protecting device | |
| JPS6315250A (en) | Method and apparatus for reducing particulate substance on photomask | |
| JPH0666250B2 (en) | Masking equipment for proximity exposure |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |