JP3404871B2 - Color filter manufacturing method and TFT circuit manufacturing method - Google Patents

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a color filter and a method of manufacturing a TFT circuit, and more specifically, a method of manufacturing a color filter on a glass substrate by using a photolithographic method and a method of using a photolithographic method. The present invention relates to a method of manufacturing a TFT circuit on a glass substrate.

[0002]

2. Description of the Related Art Conventionally, in manufacturing a color filter for an LCD (liquid crystal display) or a TFT circuit on a glass substrate, a photolithographic method may be adopted for fine processing. The photolithography method is one of the suitable methods for performing fine processing, in which a photosensitive resist is applied on a glass substrate, an exposure process is performed using a mask suitable for the fine processing pattern, and then a development process is performed. This is a method of forming a mask pattern on the glass substrate by performing the process and then removing the remaining photosensitive resist.

In the developing process, the exposed glass substrate is immersed in the developing solution and, if necessary, the developing solution is sprayed (shower) and remains on the surface of the glass substrate. In order to reduce the developing solution, a second step of performing an air knife process (a process of returning most of the developing solution on the surface of the glass substrate to the first step by air or collecting it), and any treatment to the glass substrate It is composed of a third step of carrying only the sheet without carrying it and a fourth step of washing the glass substrate with water to remove the developing solution remaining on the surface.

Therefore, most of the developing solution remaining on the surface of the glass substrate is removed by the air knife treatment, and the glass substrate in which the remaining amount of the developing solution is reduced is subjected to the cleaning treatment. It seems that a good development process can be achieved by effectively preventing the risk of the developer removed in the process from entering the washing process.

[0005]

However, when the conventional developing method is adopted, only a glass substrate is conveyed for a considerably long time after the air knife treatment and before the water washing treatment. Since the third step is interposed, the glass substrate is partially dried at the time when the washing process is started, and unevenness occurs in the washing process due to the influence of the partial drying, which leads to development. There is an inconvenience that unevenness occurs.

If development unevenness occurs, the desired fine processing cannot be achieved. Further, although only the developing process has been described above, similar inconvenience occurs when the processing liquid is washed away after performing a predetermined processing using the processing liquid, such as the wet etching process.

[0007]

SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and it is possible to prevent the occurrence of unevenness in processing using a processing liquid and to manufacture a color filter and a TFT circuit of high quality. A method and a method for manufacturing a TFT circuit are provided.

[0008]

According to a first aspect of the present invention, there is provided a method of manufacturing a color filter, wherein a treatment liquid is used to treat a film on a glass substrate, and a treatment liquid deposited in the treatment portion is purified water. This is a method in which a connection portion is provided between the cleaning portion and the washing portion, and pure water is applied to the glass substrate within 3 seconds after the processing liquid is cut off at the connection portion.

According to a second aspect of the present invention, there is provided a method of manufacturing a color filter, wherein the film processing section employs a developing solution for developing a photosensitive resist on a glass substrate.

According to a third aspect of the present invention, there is provided a method of manufacturing a TFT circuit between a film processing section for performing processing on a film on a glass substrate using a processing solution and a cleaning section for rinsing the processing solution attached in the film processing section with pure water. Is provided with a connection part, and pure water is applied to the glass substrate within 3 seconds after the processing liquid is cut off at the connection part.

According to a fourth aspect of the present invention, there is provided a method of manufacturing a TFT circuit, which employs a film processing section for developing a photosensitive resist on a glass substrate using a developing solution.

[0012]

According to the color filter manufacturing method of claim 1,
When manufacturing a color filter on a glass substrate using the photolithography method, a film processing unit that processes the film on the glass substrate using the processing liquid, and a cleaning process that rinses the processing liquid that has adhered in the film processing unit with pure water Since a connection portion is provided between the glass substrate and the glass substrate, pure water is applied to the glass substrate within 3 seconds after the processing liquid is cut off at the connection portion.
It is possible to prevent the inconvenience that at least a part of the glass substrate is dried before the treatment liquid is washed out after the treatment liquid is drained, and the water after the treatment liquid is washed away can be prevented. The load required for processing can be reduced.

According to the color filter manufacturing method of the second aspect, since the film processing section employs a developing solution to develop the photosensitive resist on the glass substrate, the development processing is claimed. A function similar to that of 1 can be achieved.

According to the TFT circuit manufacturing method of claim 3,
When manufacturing a TFT circuit on a glass substrate using the photolithography method, a film processing unit that processes the film on the glass substrate using the processing liquid, and a cleaning process in which the processing liquid attached in the film processing unit is washed away with pure water. Since a pure water is applied to the glass substrate within 3 seconds after the processing liquid is drained at the connection portion, the processing liquid is removed after the processing liquid is drained. It is possible to prevent the inconvenience of at least a part of the glass substrate being dried before the flushing, and reduce the load required for the treatment of the water after flushing the treatment liquid. .

According to the method of manufacturing a TFT circuit of claim 4,
Since the film processing section employs a developing solution for developing the photosensitive resist on the glass substrate,
With respect to the development processing, it is possible to achieve the same effect as that of the third aspect.

[0016]

[0017]

DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described in detail below with reference to the accompanying drawings showing embodiments. FIG. 1 is a schematic view showing a main part of an embodiment of a color filter manufacturing method of the present invention, in which a developing section 2, a neutral section 3 and a cleaning section 4 are continuously arranged at a predetermined position of a glass substrate transfer line 1 in this order. Are arranged. An air knife portion 3a for cutting off the developing solution is provided at a predetermined position near the developing portion 2 in the neutral portion 3, and a pure water shower is provided at a predetermined position slightly closer to the cleaning portion 4 than the air knife portion 3a. 3b is provided.

The developing section 2 is of a so-called immersion type in which a glass substrate is transported in a developing solution contained in a developing solution tank 2a, but by providing a developing solution shower (not shown), dipping and spraying. The developing solution may be supplied to the glass substrate by both. The neutral part 3 is set to have a length capable of accommodating at least one glass substrate, and the developing part 2 and the cleaning part 4 are completely separated from each other, so that the amount of the developer entering the cleaning part 4 is significantly increased. Can be reduced.

The air knife portion 3a is for injecting high-pressure air onto both surfaces of the glass substrate to remove most of the developing solution remaining on the surface of the glass substrate. Although not shown in the drawing, the removed developing solution is returned to the developing unit 2 for reuse or recovery. The pure water shower 3b sprays pure water almost uniformly over a predetermined range of the glass substrate. By transporting the glass substrate toward the cleaning unit, the pure water shower 3b sprays pure water over the entire range of the glass substrate. You can Further, the pure water shower 3b is arranged at a predetermined position so that the pure water can be sprayed within 3 seconds after the developing solution is removed by the air knife portion 3a. Specifically, the total length of the developing unit 2 is 250
0 mm, the total length of the neutral part 3 is 500 mm, the total length of the cleaning part 4 is 1500 mm, and the transfer speed of the glass substrate is 12 mm.
00 mm / min, air knife part 3a and pure water shower 3b
If the distance between and is 50 mm, it takes 2.5 seconds until the pure water is sprayed by the pure water shower 3b after the developing solution is cut off by the air knife portion 3a.

The cleaning section 4 sprays a sufficient amount of pure water on both sides of the glass substrate to completely wash away the developing solution from the entire area of the glass substrate. I am trying to lead to the department. Therefore, after the exposure process for the photosensitive resist on the glass substrate is performed, the developing process is performed in the developing unit 2, the developing solution is removed by the air knife unit 3a in the neutral unit 3, and the pure water is removed by the pure water shower 3b. Spraying is performed to prevent the glass substrate from drying. Then, the dried glass substrate is guided to the cleaning unit 4, where the developing solution is washed away with pure water, and the remaining developing solution can be completely removed over the entire area of the glass substrate.
As a result, it is possible to surely prevent the inconvenience that the developing solution partially remains and the development partially advances (the uneven development occurs).

Although only the developing step in the color filter manufacturing method has been described above, when the wet etching process is performed in manufacturing the color filter, the glass substrate is immersed in the etching solution and the etching solution is washed away. By providing a neutral portion between the treatment and the neutral portion, the etching solution is removed by the air knife portion and the pure water is sprayed by the pure water shower, whereby it is possible to prevent uneven etching.

Further, although only the color filter manufacturing method has been described above, in the TFT circuit manufacturing method as well, there is a developing step as in the color filter manufacturing method and, if applicable, a wet etching process. Therefore, the above method can be applied to these developing step and wet etching treatment, and the same effect can be achieved.

[0023]

According to the first aspect of the present invention, it is possible to prevent the inconvenience of at least a part of the glass substrate being dried before the processing solution is washed out after the processing solution is drained. In addition to the above, it is possible to reduce the load required for treating the water after the treatment liquid is washed off, which is a unique effect. The invention of claim 2 has the same effect as that of claim 1 with respect to the developing process.

According to the third aspect of the present invention, it is possible to prevent the inconvenience of at least a part of the glass substrate being dried before the processing solution is washed out after the processing solution is drained. The unique effect of being able to reduce the load required for the treatment of water after the treatment liquid has been washed out is exhibited. The invention of claim 4 has the same effect as that of claim 3 with respect to the developing process.

[0025]

[Brief description of drawings]

FIG. 1 is a schematic view showing a main part of an embodiment of a color filter manufacturing method of the present invention.

[Explanation of symbols]

2 Development part 3 Neutral part 4 Cleaning section

─────────────────────────────────────────────────── --- Continuation of front page (56) References JP-A-6-61137 (JP, A) JP-A-4-246183 (JP, A) JP-B-52-21463 (JP, B2) (58) Field (Int.Cl. ⁷ , DB name) G02B 5/20 101 G03F 7/30 501 H01L 21/304 641

Claims (4)

(57) [Claims] 1. A method for manufacturing a color filter on a glass substrate by using a photolithographic method, wherein a film processing unit (2) for processing a film on the glass substrate using a processing liquid and a film processing unit (2). ), A connection part (3) is provided between the cleaning part (4) for rinsing the processing liquid adhering to the glass substrate with pure water. A method of manufacturing a color filter, characterized in that pure water is applied to the color filter. 2. The method for producing a color filter according to claim 1, wherein the film processing section (2) develops the photosensitive resist on the glass substrate using a developing solution. 3. A method for manufacturing a TFT circuit on a glass substrate by using a photolithography method, wherein a film processing unit (2) for processing a film on the glass substrate using a processing liquid.
And a cleaning unit (4) for flushing the processing liquid adhered in the film processing unit (2) with pure water, a connection unit (3) is provided, and after the processing liquid is cut off in the connection unit (3), 3 TFT characterized by applying pure water to a glass substrate within a second
Circuit manufacturing method. 4. The method of manufacturing a TFT circuit according to claim 3, wherein the film processing section (2) develops the photosensitive resist on the glass substrate using a developing solution.