JP3418776B2 - Bleeding device for absorption chiller / heater - Google Patents
Bleeding device for absorption chiller / heaterInfo
- Publication number
- JP3418776B2 JP3418776B2 JP05799797A JP5799797A JP3418776B2 JP 3418776 B2 JP3418776 B2 JP 3418776B2 JP 05799797 A JP05799797 A JP 05799797A JP 5799797 A JP5799797 A JP 5799797A JP 3418776 B2 JP3418776 B2 JP 3418776B2
- Authority
- JP
- Japan
- Prior art keywords
- storage chamber
- gas
- gas storage
- absorber
- absorption
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Sorption Type Refrigeration Machines (AREA)
Description
【発明の詳細な説明】Detailed Description of the Invention
【0001】[0001]
【発明の属する技術分野】本発明は、吸収冷温水機で発
生する不凝縮性ガスの抽気装置に係り、特に溶液循環ポ
ンプで加圧された吸収液を駆動源とするエゼクタにより
蒸発器/吸収器内の不凝縮性ガスを抽気する抽気装置に
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a device for extracting non-condensable gas generated in an absorption chiller / heater, and more particularly, to an evaporator / absorption by an ejector driven by an absorption liquid pressurized by a solution circulation pump. The present invention relates to a bleeding device for bleeding a non-condensable gas in a container.
【0002】[0002]
【従来の技術】従来、吸収冷温水機で発生する不凝縮性
ガスを、溶液循環ポンプで加圧された吸収液を駆動源と
するエゼクタにより蒸発器/吸収器内から抽気する抽気
装置として、特公平7−84970号公報に開示された
例がある。特公平7−84970号公報に開示された例
では、図6に示すように、ガス貯蔵室と吸収器を吸収液
回路で結び、ガス貯蔵室内に吸収液を流すことによって
ガス貯蔵室と蒸発器/吸収器を均圧化し、暖房運転時、
すなわち、冷房運転時に比較して吸収器内の圧力が高い
運転状態での、ガス貯蔵室内の多量な溶液溜りの防止を
図っている。2. Description of the Related Art Conventionally, a non-condensable gas generated in an absorption chiller / heater is extracted from an evaporator / absorber by an ejector driven by an absorption liquid pressurized by a solution circulation pump as an extraction device. There is an example disclosed in JP-B-7-84970. In the example disclosed in Japanese Examined Patent Publication No. 7-84970, as shown in FIG. 6, the gas storage chamber and the absorber are connected by an absorption liquid circuit, and the absorption liquid is caused to flow into the gas storage chamber and the evaporator. / The pressure of the absorber is equalized, and during heating operation,
That is, it is intended to prevent a large amount of solution pool in the gas storage chamber in an operating state in which the pressure in the absorber is higher than in the cooling operation.
【0003】[0003]
【発明が解決しようとする課題】前記公告公報に記載の
装置では、図6に示すように、ガス貯蔵室内には吸収液
の液面が形成され、ガス貯蔵室から吸収器に至る管P2
は液封されている。そして、溶液循環ポンプ吐出側から
ガス貯蔵室に流入する吸収液の流量はオリフィスO1に
より決まるが、ガス貯蔵室に流入した吸収液を同じ流量
でガス貯蔵室から吸収器に戻す駆動力は、ガス貯蔵室内
の吸収液液面レベルと吸収器内の吸収液液面レベルのヘ
ッド差に基づく差圧である。したがって、冷温水機の運
転状態(負荷率や冷却水温度等)の変動によりガス貯蔵
室に流入する吸収液の流量が増加すると、吸収器への戻
り流量を増加させるために前記ヘッド差を増加させるこ
とになり、結果的にガス貯蔵室内の吸収液液面レベルが
上昇してしまうことになる。つまり、ガス貯蔵室内に多
量の吸収液が溜り、冷凍サイクルを循環する吸収液が減
少してしまう。冷凍サイクルを循環する吸収液が減少す
ると、溶液循環ポンプのキャビテーションや高温再生器
の空焚きなどが生ずるおそれがあり、安定した運転が維
持できない。In the apparatus disclosed in the above-mentioned publication, as shown in FIG. 6, a liquid surface of the absorbing liquid is formed in the gas storage chamber, and a pipe P 2 from the gas storage chamber to the absorber is formed.
Is liquid sealed. The flow rate of the absorption liquid flowing into the gas storage chamber from the discharge side of the solution circulation pump is determined by the orifice O 1 , but the driving force for returning the absorption liquid flowing into the gas storage chamber from the gas storage chamber to the absorber at the same flow rate is It is the differential pressure based on the head difference between the liquid level of the absorbing liquid in the gas storage chamber and the liquid level of the absorbing liquid in the absorber. Therefore, if the flow rate of the absorbing liquid flowing into the gas storage chamber increases due to fluctuations in the operating state (load factor, cooling water temperature, etc.) of the chiller-heater, the head difference increases to increase the return flow rate to the absorber. As a result, the liquid level of the absorbing liquid in the gas storage chamber rises. In other words, a large amount of absorbing liquid accumulates in the gas storage chamber, and the absorbing liquid circulating in the refrigeration cycle decreases. If the amount of absorption liquid circulating in the refrigeration cycle decreases, cavitation of the solution circulation pump or empty heating of the high temperature regenerator may occur, and stable operation cannot be maintained.
【0004】本発明の課題は、溶液循環ポンプで加圧さ
れた吸収液を駆動源とするエゼクタにより蒸発器/吸収
器内の不凝縮性ガスを抽気してガス貯蔵室に送りこむ抽
気装置において、暖房運転時、ガス貯蔵室に吸収液が多
量に溜るのを防ぐにある。An object of the present invention is to extract a non-condensable gas in an evaporator / absorber by an ejector driven by an absorption liquid pressurized by a solution circulation pump and send it to a gas storage chamber. This is to prevent a large amount of absorbing liquid from accumulating in the gas storage chamber during heating operation.
【0005】[0005]
【課題を解決するための手段】上記課題を達成する本発
明の第1の手段は、溶液循環ポンプ2で加圧された吸収
液を用いて蒸発器及び/または吸収器1内から抽気した
不凝縮性ガスと抽気に用いた吸収液を分離するガス分離
器4と、このガス分離器4の上方に配置され該ガス分離
器4にガス上昇管12で配管接続されて前記分離された
不凝縮性ガスを貯蔵するガス貯蔵室3と、前記ガス分離
器4と吸収器1の間に接続され前記分離された吸収液を
吸収器1に戻す分離溶液戻り管13と、溶液循環ポンプ
2の吐出側配管と前記ガス貯蔵室3底面を連通する吸収
液供給管7と、該吸収液供給管7に介装されて吸収液流
量を制限する流量制限手段6と、を含んでなり、ガス貯
蔵室3底面は吸収器1底面よりも距離Hだけ高い位置に
あり、前記分離溶液戻り管13のガス分離器4との接続
位置は吸収器1との接続位置よりも低い位置にある吸収
冷温水機の抽気装置において、ガス貯蔵室の底面とガス
分離器を接続する吸収液戻り管が設けられており、前記
流量制限手段6は、該流量制限手段6を通過してガス貯
蔵室3に流入する吸収液の流量が最大となる運転条件の
とき、該最大流量をガス貯蔵室3から吸収液戻り管8を
通して吸収器1へ還流させるのに必要なヘッド差が前記
H以下となるように流量設定されていることを特徴とす
る。The first means of the present invention for achieving the above object is to extract the air from the inside of the evaporator and / or the absorber 1 using the absorbing liquid pressurized by the solution circulation pump 2. A gas separator 4 for separating a condensable gas and an absorbing liquid used for extraction, and a non-condensed gas separator 4 arranged above the gas separator 4 and connected to the gas separator 4 by a gas rising pipe 12 Gas storage chamber 3 for storing a volatile gas, a separation solution return pipe 13 connected between the gas separator 4 and the absorber 1 for returning the separated absorption liquid to the absorber 1, and a discharge of the solution circulation pump 2. an absorption liquid supply pipe 7 communicating the gas storage chamber 3 bottom and side pipe, a flow restricting means 6 for limiting the absorption liquid flow rate is interposed the absorbent liquid supply pipe 7, it comprises a gas storage chamber 3 The bottom surface is located at a position higher than the bottom surface of the absorber 1 by a distance H. In bleed system of the absorption chiller at a lower position than the connecting position of the connecting position between the gas separator 4 of the return pipe 13 to the absorber 1, the gas storage chamber bottom and a gas
An absorption liquid return pipe for connecting the separator is provided, and the flow rate limiting means 6 operates under the operating condition in which the flow rate of the absorption fluid passing through the flow rate limiting means 6 and flowing into the gas storage chamber 3 is maximum. The flow rate is set so that the head difference required to recirculate the maximum flow rate from the gas storage chamber 3 to the absorber 1 through the absorbent return pipe 8 is equal to or less than H.
【0006】上記課題を達成する本発明の第2の手段
は、前記第1の手段において、吸収液供給管7と吸収液
戻り管8はガス貯蔵室3底面の長手方向両端部に互いに
離れて接続されていること、吸収液戻り管8のガス貯蔵
室3底面開口の吸収液供給管7側に整流板14が設けら
れていること、該整流板14はガス貯蔵室3底面全面に
吸収液流路を形成するものであること、を特徴とする。The second means of the present invention for achieving the above object is the same as the first means, wherein the absorbent supply pipe 7 and the absorbent return pipe 8 are separated from each other at both longitudinal ends of the bottom surface of the gas storage chamber 3. Connection, a rectifying plate 14 is provided on the side of the absorption liquid supply pipe 7 at the opening of the bottom face of the gas storage chamber 3 of the absorption liquid return pipe 8, and the rectification plate 14 is provided on the entire bottom face of the gas storage chamber 3. It forms a flow path.
【0007】[0007]
【発明の実施の形態】以下、本発明の実施例を図面を参
照して説明する。なお、以下の説明においては、吸収冷
温水機の構成についての説明は省略し、抽気装置につい
てのみ、説明する。BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings. In the following description, description of the configuration of the absorption chiller-heater will be omitted, and only the extraction device will be described.
【0008】図1に本発明の第1の実施例を示す。図示
の抽気装置は、吸収器1の底部から吸収液を吸引して加
圧吐出する溶液循環ポンプ2の吐出側配管に分岐して設
けられたエゼクタ溶液管10と、エゼクタ溶液管10の
下流端に駆動水入り口を接続して配置されたエゼクタ5
と、エゼクタ5の吸込口と吸収器1の気相部を連通する
ガス流入管9と、エゼクタ5の下方に配置されエゼクタ
5の吐出口に気液降り管11を介して上部を接続された
ガス分離器4と、ガス分離器4の底部と吸収器1の下部
を連通する分離溶液戻り管13と、底部が吸収器1の底
部よりも高くかつ前記ガス分離器4の上面より高くなる
位置に配置されたガス貯蔵室3と、前記溶液循環ポンプ
2の前記吐出側配管に分岐して設けられ下流端が前記ガ
ス貯蔵室3底部に接続された吸収液供給管7と、吸収液
供給管7に介装された流量制限手段であるオリフィス6
と、ガス貯蔵室3底部と吸収器1の底部を連通する吸収
液戻り管8と、ガス貯蔵室3の気相部と前記ガス分離器
4の上部を連通するガス上昇管12と、を含んで構成さ
れている。FIG. 1 shows a first embodiment of the present invention. The bleeding device shown in the drawing is an ejector solution pipe 10 provided branching to a discharge side pipe of a solution circulation pump 2 for sucking and pressurizing an absorbing liquid from the bottom of the absorber 1, and a downstream end of the ejector solution pipe 10. Ejector 5 connected to the drive water inlet
And a gas inflow pipe 9 which connects the suction port of the ejector 5 and the gas phase portion of the absorber 1, and an upper portion of the gas inflow pipe 9 arranged below the ejector 5 through a gas-liquid descending pipe 11 connected to the discharge port of the ejector 5. Gas separator 4, separation solution return pipe 13 that connects the bottom of gas separator 4 to the lower part of absorber 1, and the position where the bottom is higher than the bottom of absorber 1 and higher than the top of gas separator 4. The gas storage chamber 3 disposed in the gas storage chamber 3 and the discharge side pipe of the solution circulation pump 2, the absorption liquid supply pipe 7 whose downstream end is connected to the bottom of the gas storage chamber 3, and the absorption liquid supply pipe. Orifice 6 which is a flow rate limiting means interposed in 7
An absorption liquid return pipe 8 that connects the bottom of the gas storage chamber 3 to the bottom of the absorber 1, and a gas rising pipe 12 that connects the gas phase portion of the gas storage chamber 3 to the upper portion of the gas separator 4. It is composed of.
【0009】ガス分離器4は、その底面が吸収器1の底
面よりも低くなるように配置され、吸収液戻り管8はそ
の一部が吸収器1の前記底部よりも低い位置を通るよう
に配置されている。分離溶液戻り管13のガス分離器4
との接続位置は、吸収器1との接続位置よりも低い位置
になっている。The gas separator 4 is arranged so that its bottom surface is lower than the bottom surface of the absorber 1, and the absorption liquid return pipe 8 passes through a part of the absorption liquid return pipe 8 lower than the bottom portion of the absorber 1. It is arranged. Gas separator 4 of separation solution return pipe 13
The connection position with and is lower than the connection position with the absorber 1.
【0010】オリフィス6は、オリフィス6を通過する
吸収液流量が最大となる下記,の運転条件における
流量、つまりあらゆる運転条件を通しての最大流量が、
その最大流量に等しい量の吸収液をガス貯蔵室3から吸
収器1に流すのに必要なヘッド差が、図1のH(ガス貯
蔵室3の底面と吸収器1の底面の高低差)よりも小さく
なるような仕様に設定されている。冷却水温度が高
く、最大負荷運転…溶液循環ポンプの吐出圧が最大とな
る条件ガス貯蔵量が0…オリフィス6出口の圧力が最
小となる条件The orifice 6 has a flow rate under the following operating conditions where the flow rate of the absorbing liquid passing through the orifice 6 is maximum, that is, the maximum flow rate under all operating conditions is
The head difference required to flow an amount of absorbing liquid equal to the maximum flow rate from the gas storage chamber 3 to the absorber 1 is calculated from H in FIG. 1 (height difference between the bottom surface of the gas storage chamber 3 and the bottom surface of the absorber 1). Is also set to be smaller. Cooling water temperature is high, maximum load operation is ... Condition that discharge pressure of solution circulation pump is maximum Gas storage amount is 0 ... Condition that outlet 6 outlet pressure is minimum
【0011】上記構成の抽気装置を備えた吸収冷温水機
を運転した場合、オリフィス6を介装した吸収液供給管
7を経てガス貯蔵室3内に流入する吸収液の量、つまり
はガス貯蔵室3から吸収液戻り管8を経て吸収器1に戻
る吸収液の量は、いかなる運転条件においても、前記最
大流量以下である。吸収液を、ガス貯蔵室3から吸収器
1に、前記最大流量で戻すために必要なヘッド差は、ガ
ス貯蔵室3の底面と吸収器1の底面の高低差よりも小さ
くしてあるから、吸収液供給管7を経てガス貯蔵室3内
に流入する吸収液の量が最大流量であっても、ガス貯蔵
室3内に液面が形成されることはない。必要なヘッド差
は、吸収液の液面がガス貯蔵室3の底面よりも低い位
置、すなわち、液面が吸収液戻り管8の中にある状態で
得られる。運転条件が変動して吸収液供給管7を経てガ
ス貯蔵室3内に流入する吸収液の量が変化した場合で
も、吸収液戻り管8内で吸収液の液面位置が変動するだ
けで、ガス貯蔵室3内に液面が上昇することはなく、し
たがって、ガス貯蔵室3内に吸収液が貯溜されることも
なくなる。When the absorption chiller / heater equipped with the bleeder having the above-mentioned structure is operated, the amount of the absorbing liquid flowing into the gas storage chamber 3 through the absorbing liquid supply pipe 7 having the orifice 6 interposed, that is, the gas storage. The amount of absorbing liquid returning from the chamber 3 to the absorber 1 via the absorbing liquid return pipe 8 is below the maximum flow rate under any operating condition. The head difference required to return the absorbing liquid from the gas storage chamber 3 to the absorber 1 at the maximum flow rate is smaller than the height difference between the bottom surface of the gas storage chamber 3 and the bottom surface of the absorber 1. Even if the amount of the absorption liquid flowing into the gas storage chamber 3 through the absorption liquid supply pipe 7 is the maximum flow rate, the liquid surface is not formed in the gas storage chamber 3. The required head difference is obtained at a position where the liquid level of the absorbing liquid is lower than the bottom surface of the gas storage chamber 3, that is, the liquid level is in the absorbing liquid return pipe 8. Even when the operating conditions change and the amount of the absorbing liquid flowing into the gas storage chamber 3 through the absorbing liquid supply pipe 7 changes, the liquid level position of the absorbing liquid changes in the absorbing liquid return pipe 8, The liquid level does not rise in the gas storage chamber 3, and therefore, the absorbing liquid is not stored in the gas storage chamber 3 either.
【0012】本実施例によれば、暖房運転時、吸収液が
ガス貯蔵室内に多量に貯溜されることがなく、冷凍サイ
クル内を循環する吸収液の量が減少して溶液循環ポンプ
がキャビテーションを起こしたり、再生器が空焚き状態
になることが避けられる。According to the present embodiment, during heating operation, a large amount of the absorbing liquid is not stored in the gas storage chamber, the amount of the absorbing liquid circulating in the refrigeration cycle is reduced, and the solution circulation pump causes cavitation. It is possible to avoid waking up and leaving the regenerator in an empty state.
【0013】図2に本発明の第2の実施例を示す。本実
施例が前記第1の実施例と異なるのは、ガス貯蔵室3に
吸収液を導入する吸収液供給管7と、ガス貯蔵室3から
吸収液を吸収器に導く吸収液戻り管8が、ガス貯蔵室3
の長手方向の両端に、互いに離れて接続され、吸収液戻
り管8のガス貯蔵室3底面開口側の位置に、整流板14
が設けられていることである。他の構成は前記第1の実
施例と同じであるので、同一の符号を付して説明は省略
する。整流板14は、ガス貯蔵室3底面の吸収液戻り管
8の周囲に堰状に設けられる。整流板14に代えて、吸
収液戻り管8の端部を底面上にわずかに突出させるよう
にしてもよい。FIG. 2 shows a second embodiment of the present invention. This embodiment is different from the first embodiment in that an absorption liquid supply pipe 7 for introducing the absorption liquid into the gas storage chamber 3 and an absorption liquid return pipe 8 for guiding the absorption liquid from the gas storage chamber 3 to the absorber are provided. , Gas storage room 3
Is connected to both ends in the longitudinal direction of the gas separation chamber 8 so as to be separated from each other, and is arranged at the position of the absorption liquid return pipe 8 on the opening side of the bottom surface of the gas storage chamber 3.
Is provided. Since the other structure is the same as that of the first embodiment, the same reference numerals are given and the description thereof is omitted. The current plate 14 is provided in a weir shape around the absorbent return pipe 8 on the bottom surface of the gas storage chamber 3. Instead of the rectifying plate 14, the end of the absorbent return pipe 8 may be slightly projected on the bottom surface.
【0014】ガス貯蔵室内に吸収液を流すのは、吸収液
の飽和蒸気圧を利用してガス貯蔵室3と吸収器/蒸発器
を均圧化するためであり、そのためには、ガス貯蔵室3
の底面全面に吸収液が流れるのが望ましい。また、ガス
貯蔵室3の底面が傾斜していると、吸収液の流れが偏
り、ガス貯蔵室3の底面全面に吸収液が流れなくなる恐
れがある。ガス貯蔵室3の長手方向に互いに離れた位置
に吸収液の流入口と流出口を設けることにより、吸収液
の流れる範囲を広くし、ガス貯蔵室3の底面全面に吸収
液が流れるようになる。また、吸収液の流出口付近の底
面に整流板を設けることにより、ガス貯蔵室3の底面全
体に吸収液が流れるようになる。The reason why the absorption liquid is caused to flow into the gas storage chamber is to use the saturated vapor pressure of the absorption liquid to equalize the pressures of the gas storage chamber 3 and the absorber / evaporator. Three
It is desirable that the absorption liquid flow over the entire bottom surface of the. Further, if the bottom surface of the gas storage chamber 3 is inclined, the flow of the absorbing liquid may be biased, and the absorbing liquid may not flow over the entire bottom surface of the gas storing chamber 3. By providing an inlet and an outlet for the absorbing liquid at positions separated from each other in the longitudinal direction of the gas storing chamber 3, the flowing range of the absorbing liquid can be widened and the absorbing liquid can flow over the entire bottom surface of the gas storing chamber 3. . Further, by providing the straightening plate on the bottom surface near the outlet of the absorbing liquid, the absorbing liquid can flow over the entire bottom surface of the gas storage chamber 3.
【0015】本実施例によれば、前記第1の実施例の効
果に加え、ガス貯蔵室3の底面全体に吸収液が流れるこ
とにより、吸収液によるガス貯蔵室3と吸収器/蒸発器
の均圧化が確実になる。According to the present embodiment, in addition to the effects of the first embodiment, the absorption liquid flows over the entire bottom surface of the gas storage chamber 3, so that the absorption liquid causes the gas storage chamber 3 and the absorber / evaporator to operate. Ensures equalization.
【0016】図3に本発明の第3の実施例を示す。本実
施例が前記第2の実施例と異なるのは、ガス貯蔵室3底
面と吸収器1の下部を結ぶ吸収液戻り管8に代えて、ガ
ス貯蔵室3底面とガス分離器4の上面を接続する吸収液
戻り管8’を設けたことである。他の構成は前記第2の
実施例と同じであるので、同一の符号を付して説明は省
略する。FIG. 3 shows a third embodiment of the present invention. This embodiment is different from the second embodiment in that the bottom of the gas storage chamber 3 and the top of the gas separator 4 are replaced by the absorption liquid return pipe 8 connecting the bottom of the gas storage chamber 3 and the lower part of the absorber 1. That is, the absorption liquid return pipe 8'to be connected is provided. Since the other structure is the same as that of the second embodiment, the same reference numerals are given and the description thereof is omitted.
【0017】前記第1の実施例において述べたように、
オリフィス6は、オリフィス6を通過する吸収液流量が
最大となる運転条件において、その最大流量をガス貯蔵
室3から吸収器1に流すのに必要なヘッド差が、ガス貯
蔵室3の底面と吸収器1の底面の高低差よりも小さくな
るような仕様に設定されている。このため、図1、図2
の実施例では、吸収液戻り管8内の吸収液液面位置は、
ガス貯蔵室3に貯蔵される不凝縮性ガスの量に応じて、
図4に示す範囲内で変動する。吸収液戻り管8内の液面
位置が図5に示すような位置に低下すると、吸収液戻り
管8内を流下する吸収液の勢いにより、吸収液戻り管8
内のガスが細かい泡となって吸収液とともに、吸収器1
に戻ってしまい、抽気が不完全になり、冷凍サイクルの
能力が低下してしまう。As described in the first embodiment,
The orifice 6 has a head difference required for flowing the maximum flow rate from the gas storage chamber 3 to the absorber 1 under the operating conditions in which the maximum flow rate of the absorbing liquid passing through the orifice 6 is the same as the bottom surface of the gas storage chamber 3. The specifications are set so as to be smaller than the height difference of the bottom surface of the container 1. Therefore, as shown in FIGS.
In this embodiment, the liquid level of the absorbing liquid in the absorbing liquid return pipe 8 is
Depending on the amount of non-condensable gas stored in the gas storage chamber 3,
It varies within the range shown in FIG. When the liquid surface position in the absorbent return pipe 8 is lowered to the position shown in FIG. 5, the force of the absorbent flowing down in the absorbent return pipe 8 causes the absorbent return pipe 8 to move.
The gas inside becomes fine bubbles, and together with the absorbing liquid, the absorber 1
And the bleeding is incomplete, and the capacity of the refrigeration cycle is reduced.
【0018】ガス貯蔵室3底面と吸収器1の下部を結ぶ
吸収液戻り管8に代えて、ガス貯蔵室3底面とガス分離
器4の上面を接続する吸収液戻り管8’を設けることに
より、ガス貯蔵量の増大により低下した液面の効果で、
吸収液とともに吸収液戻り管8’内を気泡となって流れ
る不凝縮性ガスは、ガス分離器4に流入する。ガス分離
器4に流入した不凝縮性ガスは、ここで吸収液と分離さ
れ、ガス上昇管12を経て上昇し、ガス貯蔵室3に貯蔵
される。By replacing the absorbent return pipe 8 connecting the bottom of the gas storage chamber 3 with the lower part of the absorber 1, an absorbent return pipe 8'connecting the bottom of the gas storage chamber 3 with the upper face of the gas separator 4 is provided. , Due to the effect of the liquid level decreased due to the increase in gas storage volume,
The non-condensable gas flowing as bubbles in the absorbent return pipe 8 ′ together with the absorbent flows into the gas separator 4. The non-condensable gas that has flowed into the gas separator 4 is separated from the absorbing liquid here, rises through the gas rising pipe 12, and is stored in the gas storage chamber 3.
【0019】本実施例によれば、前記第2の実施例によ
り得られる効果に加え、ガス貯蔵量が増大した場合で
も、安定した抽気能力を発揮でき、冷凍性能を維持でき
る効果がある。According to this embodiment, in addition to the effect obtained by the second embodiment, there is an effect that even when the gas storage amount is increased, a stable extraction capacity can be exhibited and the refrigerating performance can be maintained.
【0020】[0020]
【発明の効果】本発明によれば、暖房運転時、吸収液が
ガス貯蔵室に多量に貯溜されるのを防ぐことができ、冷
凍サイクルを循環する吸収液の量が大きく減少すること
がないので、溶液循環ポンプのキャビテーションや、再
生器の空焚きなどのおそれがなく、吸収冷温水機の運転
を安定に維持できる。According to the present invention, it is possible to prevent a large amount of the absorbing liquid from being stored in the gas storage chamber during the heating operation, and the amount of the absorbing liquid circulating in the refrigeration cycle is not significantly reduced. Therefore, the operation of the absorption chiller-heater can be stably maintained without the risk of cavitation of the solution circulation pump and emptying of the regenerator.
【図1】本発明の第1の実施例を示す概略構成説明図で
ある。FIG. 1 is a schematic configuration explanatory view showing a first embodiment of the present invention.
【図2】本発明の第2の実施例を示す概略構成説明図で
ある。FIG. 2 is a schematic configuration explanatory view showing a second embodiment of the present invention.
【図3】本発明の第3の実施例を示す概略構成説明図で
ある。FIG. 3 is a schematic configuration explanatory view showing a third embodiment of the present invention.
【図4】本発明の実施例における吸収液戻り管内の吸収
液液面の変動範囲を説明する概念図である。FIG. 4 is a conceptual diagram illustrating a variation range of the liquid level of the absorbent in the absorbent return pipe according to the embodiment of the present invention.
【図5】吸収液戻り管のガス分離室側液面が低いとき
の、不凝縮性ガスの流れを説明する概念図である。FIG. 5 is a conceptual diagram illustrating a flow of a non-condensable gas when the liquid level of the absorption liquid return pipe on the gas separation chamber side is low.
【図6】従来技術の例を示す概略構成説明図である。FIG. 6 is a schematic configuration explanatory view showing an example of a conventional technique.
1 吸収器 2 溶液循環ポンプ 3 ガス貯蔵室 4 ガス分離器 5 エゼクタ 6 オリフィス 7 吸収液供給管 8,8’ 吸収液戻り管 9 ガス流入管 10 エゼクタ溶液管 11 気液降り管 12 ガス上昇管 13 分離溶液戻り管 14 整流板 1 absorber 2 Solution circulation pump 3 gas storage room 4 gas separator 5 ejectors 6 orifices 7 Absorbing liquid supply pipe 8,8 'Absorption liquid return pipe 9 gas inflow pipe 10 ejector solution tube 11 Gas-liquid downfall 12 gas riser 13 Separation solution return pipe 14 Current plate
フロントページの続き (56)参考文献 特開 昭52−7053(JP,A) 特開 昭58−26976(JP,A) 特開 昭63−32267(JP,A) 実開 昭61−259066(JP,U) 特公 平7−84970(JP,B2) (58)調査した分野(Int.Cl.7,DB名) F25B 43/04 F25B 15/00 Continuation of the front page (56) References JP-A-52-7053 (JP, A) JP-A-58-26976 (JP, A) JP-A-63-32267 (JP, A) Actual development 61-259066 (JP) , U) Japanese Patent Publication 7-84970 (JP, B2) (58) Fields investigated (Int.Cl. 7 , DB name) F25B 43/04 F25B 15/00
Claims (2)
いて蒸発器及び/または吸収器内から抽気した不凝縮性
ガスと抽気に用いた吸収液を分離するガス分離器と、こ
のガス分離器の上方に配置され該ガス分離器にガス上昇
管で配管接続されて前記分離された不凝縮性ガスを貯蔵
するガス貯蔵室と、前記ガス分離器と吸収器の間に接続
され前記分離された吸収液を吸収器に戻す分離溶液戻り
管と、溶液循環ポンプの吐出側配管と前記ガス貯蔵室底
面を連通する吸収液供給管と、該吸収液供給管に介装さ
れて吸収液流量を制限する流量制限手段と、を含んでな
り、ガス貯蔵室底面は吸収器底面よりも距離Hだけ高い
位置にあり、前記分離溶液戻り管のガス分離器との接続
位置は吸収器との接続位置よりも低い位置にある吸収冷
温水機の抽気装置において、ガス貯蔵室の底面とガス分
離器を接続する吸収液戻り管が設けられており、前記流
量制限手段は、該流量制限手段を通過してガス貯蔵室に
流入する吸収液の流量が最大となる運転条件のとき、該
最大流量をガス貯蔵室から吸収液戻り管を通して吸収器
へ還流させるのに必要なヘッド差が前記H以下となるよ
うに流量設定されていることを特徴とする吸収冷温水機
の抽気装置。1. A gas separator for separating the non-condensable gas extracted from the evaporator and / or the absorber using the absorption liquid pressurized by a solution circulation pump and the absorption liquid used for the extraction, and this gas. A gas storage chamber disposed above the separator and connected to the gas separator by a gas rising pipe to store the separated non-condensable gas; and a gas storage chamber connected between the gas separator and the absorber. The separated solution return pipe for returning the absorbed liquid to the absorber, the absorption liquid supply pipe communicating the discharge side pipe of the solution circulation pump with the bottom surface of the gas storage chamber, and the absorption liquid flow rate interposed in the absorption liquid supply pipe. comprise a flow restriction means for restricting become, gas storage chamber bottom face is in a position higher distance H than the absorber bottom, the connection position between the gas separator of the separating solution return pipe connection to the absorber For the extraction device of the absorption chiller-heater located at a position lower than the position The bottom of the gas storage room and the gas
An absorption liquid return pipe for connecting a separator is provided, and the flow rate limiting means is configured to maximize the flow rate of the absorption fluid which passes through the flow rate limiting means and flows into the gas storage chamber. An extraction apparatus for an absorption chiller-heater, wherein a flow rate is set so that a head difference required for returning the flow rate from the gas storage chamber to the absorber through the absorption liquid return pipe is equal to or less than H.
室底面の長手方向両端部に互いに離れて接続されている
こと、吸収液戻り管のガス貯蔵室底面開口の吸収液供給
管側に整流板が設けられていること、該整流板はガス貯
蔵室底面全面に吸収液流路を形成するものであること、
を特徴とする請求項1に記載の吸収冷温水機の抽気装
置。2. The absorbing liquid supply pipe and the absorbing liquid return pipe are connected to both ends of the bottom face of the gas storage chamber in the longitudinal direction, and the absorbing liquid supply pipe side of the opening of the gas storage chamber bottom face of the absorbing liquid return pipe. A rectifying plate is provided on the gas storage chamber, and the rectifying plate forms an absorbing liquid flow path on the entire bottom surface of the gas storage chamber.
The extraction device for an absorption chiller-heater according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP05799797A JP3418776B2 (en) | 1997-03-12 | 1997-03-12 | Bleeding device for absorption chiller / heater |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP05799797A JP3418776B2 (en) | 1997-03-12 | 1997-03-12 | Bleeding device for absorption chiller / heater |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH10253202A JPH10253202A (en) | 1998-09-25 |
| JP3418776B2 true JP3418776B2 (en) | 2003-06-23 |
Family
ID=13071655
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP05799797A Expired - Lifetime JP3418776B2 (en) | 1997-03-12 | 1997-03-12 | Bleeding device for absorption chiller / heater |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3418776B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001141930A (en) | 1999-09-03 | 2001-05-25 | Univ Nagoya | Optical waveguide device, three-dimensional optical waveguide circuit, and optical system |
-
1997
- 1997-03-12 JP JP05799797A patent/JP3418776B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH10253202A (en) | 1998-09-25 |
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