JP3428526B2 - Liquid crystal devices and electronic equipment - Google Patents

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal device and electronic equipment equipped with this liquid crystal device, and
The present invention relates to a liquid crystal device capable of preventing a short circuit between scan electrodes when forming electrodes by providing a narrow electrode width portion in a part of a stripe electrode serving as a scan electrode or a data electrode.

[0002]

2. Description of the Related Art Conventionally, for example, a TFD element (Thin Film dio
The liquid crystal device using de) has a transparent substrate on which the TFD element and the pixel electrode are formed, a so-called array substrate, and also has a counter substrate facing the transparent substrate.

Polarizing plates are attached to the surfaces of the transparent substrate and the counter substrate opposite to the surfaces thereof facing each other, and an alignment film is formed on the surfaces of the transparent substrate and the counter substrate facing each other. A liquid crystal layer, a spacer, and the like are arranged between the facing alignment films.

FIG. 17 is a plan view of a main part of a counter substrate of the above-mentioned liquid crystal device, and FIG. 18 is a sectional view taken along the line AA 'in FIG. These drawings are for explaining the configuration of the counter substrate, and the sizes, thicknesses, dimensions, etc. of the respective parts shown in the drawings are different from the actual dimensional relationship of the counter substrate.

As shown in FIGS. 17 and 18, the counter substrate 2
A plurality of color material layers 21 ...
A light-shielding layer 22 made of chromium or the like formed in a matrix is provided between the ...

Further, the counter substrate 20 has a structure shown in FIGS.
As shown in, a protective film 23 is provided to cover the color material layers 21 ... And the light shielding layer 22. These color material layers 21, ..., Light-shielding layer 22 and protective film 23 constitute a so-called color filter.

Further, as shown in FIG. 18, the protective film 23
Is the color material layer 21 and the light shielding layer 2 located on the outermost periphery of the effective area.
2. A step 23b is formed by the light-shielding layer outer edge portion 22a forming the outermost peripheral contour of No. 2, and a step 23c due to the thickness of the protective film 23 is also formed on the protective film peripheral edge portion 23a located outside the light-shielding layer outer edge portion 22a. Has been done. These steps 23b,
The total height of the stepped portions due to 23c, that is, the height from the upper surface of the counter substrate 20 (the area where the protective film is not formed 26) to the upper surface of the protective film 23 in the effective area 27 is about 5 μm in a general liquid crystal device. It is considered as a degree.

A plurality of striped stripe electrodes 24 ... Which function as scanning electrodes or data electrodes are formed on the protective film 23.

The striped electrodes 24 ... Are made of ITO (Indium).
It is composed of a transparent conductive film such as a Tin Oxide) film.
Further, as shown in FIG. 18, it is formed on the protective film 23 (the protective film forming region 25) and extends to the non-forming region 26 of the protective film 23 via the protective film peripheral portion 23a.

The protective film non-formation region 26 refers to a region where the protective film 23 is not formed, specifically, a region around the protective film 23 where the upper surface of the substrate 20 is exposed.

The electrode width of the stripe electrode 24 in a currently popular high-definition liquid crystal device is about 100 μm, and the distance between the stripe electrodes 24, 24 (hereinafter referred to as the inter-wiring gap G) is 20 μm or less. ing. Further, especially in the case of a high resolution liquid crystal device, the inter-wiring gap G is formed to be 12 μm or less.

The striped stripe electrodes 24 ... Of ITO are formed by a so-called photolithography technique. That is, the ITO layer is formed on the protective film 23 and the counter substrate 20 by sputtering or the like, the positive resist layer is formed on the ITO layer, the positive resist is patterned by exposure and development, and the ITO layer is formed by using the patterned resist as a mask. Is formed through a process such as etching.

The inter-wiring gap G is defined by the stripe electrode 2
Since it is extremely smaller than the electrode width of No. 4 and may cause variations, the inter-wiring gap G is visually inspected with a microscope or the like after the stripe electrodes 24 are formed.

Since the variation in the inter-wiring gap G causes the positional deviation between the stripe electrodes 24 ... And the pixel electrodes provided on the transparent substrate, the inter-wiring gap G is inspected in the formation region of the protective film 23. It is considered that it is most preferable to carry out at 25.

However, in the region 25 where the protective film 23 is formed, particularly in the effective region 27, the light-shielding layer 22 having a high light reflectance is located below the transparent stripe electrode 24.
Due to the reflected light from the light-shielding layer 22, it becomes difficult to visually recognize the stripe electrodes 24, and it becomes difficult to inspect the inter-wiring gap G in the formation region 25 of the protective film 23. Therefore, the inspection of the inter-wiring gap G is usually performed outside the effective area 27 by utilizing the fact that the electrode width of the stripe electrodes 24 is constant along the longitudinal direction thereof.

[0016]

By the way, in the above-mentioned step of forming the stripe electrodes 24, the thickness of the positive resist laminated on the ITO layer becomes larger than the prescribed thickness in the vicinity of the step portions 23b and 23c. There are cases. In the portion where the thickness of the positive resist is larger than the specified value, the exposure is likely to be incomplete, and therefore, the positive resist in the vicinity of the step portions 23b and 23c may remain after the development. The presence of the remaining portion of the resist causes the generation of burrs 24x of the stripe electrodes 24 and the bridge 24y for short-circuiting the stripe electrodes 24, 24 as shown in FIG.
This has been a cause of the occurrence of the above-mentioned phenomenon, which has been a cause of a decrease in the yield of the liquid crystal device.

Further, when the burrs 24x and the bridges 24y are generated, the electrode widths of the stripe electrodes 24 are not constant along the longitudinal direction thereof, so that it is meaningless to inspect the inter-wiring gap G outside the effective area 27. However, it has been difficult to improve the yield of liquid crystal devices.

In particular, short circuits between the stripe electrodes 24, 24 often occur in a high resolution liquid crystal device having a small inter-wiring gap G, which reduces the yield of the high resolution liquid crystal device.

The present invention has been made in view of the above circumstances, and provides a liquid crystal device in which electrodes are not short-circuited, a yield in a manufacturing process is high, and a gap between wirings can be easily measured. With the goal.

[0020]

In order to achieve the above object, the present invention has the following constitutions.

In the liquid crystal device of the present invention, a plurality of color material layers, a light shielding layer around the color material layer, a protective film covering the color material layer and the light shielding layer, and a protective film on the protective film. A liquid crystal device comprising a substrate having a plurality of electrodes arranged in stripes, wherein a formation region on which the protective film is formed and a non-formation region on which the protective film is not formed are formed on the substrate. The protective film has a step portion at the switching between the protective film forming region and the protective film non-forming region, and the electrode extends to the non-forming region. The width of the upper electrode is narrower than the width of the electrode on the color material layer, and the electrode in the non-formation region is
The width of the electrode has a portion corresponding to the width of the electrode on the color material layer.

Further, in the liquid crystal device of the present invention, a plurality of color material layers, a light shielding layer around the color material layer, a protective film covering the color material layer and the light shielding layer, and the protective film. A liquid crystal device comprising a substrate having a plurality of electrodes arranged in a stripe pattern on the substrate, wherein a formation region in which the protective film is formed and a non-formation in which the protective film is not formed on the substrate. A region, the protective film has a step portion for switching between the formation region of the protective film and the non-formation region of the protective film, and the electrode extends to the non-formation region, The gap between the adjacent electrodes on the step portion is larger than the gap between the adjacent electrodes on the color material layer, and the adjacent electrodes in the non-formation region have a gap between the electrodes. And a gap between the adjacent electrodes on the color material layer And having a match portion.

According to such a liquid crystal device, the width of the electrode is narrowed at the step portion of the protective film, and by this configuration, the distance between the electrodes at the step portion of the protective film (hereinafter,
It becomes possible to prevent a short circuit between the electrodes at the step portion because the inter-wiring gap) is increased.

According to such a liquid crystal device, the width of the electrode is narrowed at the step portion of the protective film, and the electrode width in the region where the protective film is not formed is the width of the electrode provided on the protective film in the effective region. Is configured to match. By adopting this configuration, the inter-wiring gap of the electrodes arranged on the stepped portion of the protective film becomes large, which prevents short-circuiting of the electrodes at the stepped portion.

Since the electrode width on the side where the protective film is not formed matches the electrode width on the effective area, the inter-wiring gap can be measured in the area where the protective film is not formed.
The reflected light of the light shielding layer does not interfere with the measurement of the inter-wiring gap.

In the liquid crystal device, the pair of sides forming the contour of the electrode in the non-formation area is on an extension line of the pair of sides forming the contour of the electrode in the effective area. Characterize.

According to this liquid crystal device, since the pair of sides of the electrode in the region where the protective film is not formed are on the extension lines of the pair of sides of the electrode in the effective region, the inter-wiring gap is formed in the region where the protective film is not formed. It becomes possible to measure more accurately.

[0028]

BEST MODE FOR CARRYING OUT THE INVENTION (First Embodiment) A first embodiment of the present invention will be described below with reference to the drawings.

FIG. 1 shows a perspective view of a liquid crystal device according to a first embodiment of the present invention, and FIG. 2 shows a perspective view of a main part of the liquid crystal device shown in FIG. It should be noted that these drawings are for explaining the configuration of the liquid crystal device, and the sizes, thicknesses, dimensions, etc. of the respective parts shown in the drawings are different from the dimensional relationships of the actual liquid crystal device.

The liquid crystal device 1 shown in FIG. 1 has a TFD element (Thi
n film diode), as shown in FIG.
The transparent substrate 10 on which the FD element is formed, which is a so-called array substrate, is provided, and the counter substrate 20 is arranged at a position facing the transparent substrate 10.

As shown in FIG. 2, the transparent substrate 10 is formed with TFD elements 14 arranged in a matrix and wirings 15 functioning as a plurality of signal lines or scanning lines. Are connected with a plurality of TFD elements 14 in series. Further, the pixel electrodes 16 ... Are connected to the respective TFD elements 14.

Further, as shown in FIG. 2, on the surfaces of the transparent substrate 10 and the counter substrate 20 opposite to the surfaces facing each other,
Polarizing plates 30 and 31 are attached respectively. An alignment film (not shown) is formed on the surfaces of the transparent substrate 10 and the counter substrate 20 that face each other, and a liquid crystal layer, a spacer, and the like are arranged between the facing alignment films.

FIG. 3 shows a plan view of the main part of the counter substrate 20 (inside the two-dot chain line frame shown in FIG. 1), and FIG. 4 shows a sectional view taken along the line BB 'shown in FIG. . In addition, these figures are
Similar to FIGS. 1 and 2, it is for explaining the configuration of the liquid crystal device, and the sizes, thicknesses, dimensions, etc. of the respective parts shown in the drawings are different from the actual dimensional relationship of the liquid crystal device.

As shown in FIGS. 2, 3 and 4, a plurality of color material layers 21 ... Is formed on the counter substrate 20 (lower side of the counter substrate 20 in FIG. 2). A light-shielding layer 22 made of chromium or the like and formed in a matrix is provided in between.

Further, on the counter substrate 20, as shown in FIGS. 2 to 4, the protective film 2 for covering the respective color material layers 21 ... And the light shielding layer 22 is provided.
3 is provided. These color material layers 21 ..., Light-shielding layer 22
A so-called color filter is configured by the protective film 23.

The color material layers 21 ... Are composed of red (R), green (G),
Although it is colored in blue (B) and is arranged in a mosaic pattern in FIG. 3, it may be arranged in another pattern such as a stripe pattern or a triangle pattern.

The light-shielding layer 22 is formed in a matrix shape so as to surround the color material layers 21 and is made of chrome or the like, and has a function of improving contrast, preventing mixing of color materials, and the like.
It has a function as a so-called black matrix.

Further, as shown in FIG. 4, the protective film 23 is
A step 2 formed by the color material layer on the outermost periphery of the effective area 27 and the light-shielding layer outer edge portion 22a forming the outermost periphery of the light-shielding layer 22.
3b and a protective film peripheral portion 23 that constitutes the contour of the protective film 23
a step 23c corresponding to the film thickness of the protective film 23 in a,
It has a step part made of. That is, a region 29 having a step in the protective film (hereinafter referred to as a step portion 29 of the protective film) is provided between the effective region 27 and the region 26 where the protective film is not formed.

Further, since the light shielding layer 22 is covered with the protective film 23, the outer edge portion 22a of the light shielding layer is located closer to the color material layers 21 ... than the peripheral edge portion 23a of the protective film.

The total height of the step portions 23b and 23c is about 5 μm.

Then, on the protective film 23 (the protective film 2 in FIG. 2).
3), a plurality of strip-shaped scanning electrodes or stripe electrodes 24 ... Which function as data lines are formed.

The stripe electrodes 24 ... Are made of ITO (Indium).
A transparent conductive film such as a tin oxide film or the like, and is formed on the protective film 23 (protective film forming region 25) as shown in FIG. 4 and through the protective film peripheral portion 23a.
3 to the non-formed region 26.

The non-formed region 26 of the protective film 23 is
It refers to a region where the protective film 23 is not formed, specifically, a region around the protective film 23 where the upper surface of the substrate 20 is exposed.

Further, hereinafter, the area surrounded by the color material layer located on the outermost periphery of the effective area is referred to as an effective area 27.

The stripe electrode 24 includes an electrode base portion 24a located on the effective area 27, and an electrode narrow portion 24b located on the step portion 29 of the protective film and the protective film non-forming area 26 and connected to the electrode base portion 24a. It consists of In the present embodiment, the electrode narrow portion 24b is connected to the electrode base portion 24a on the light shielding layer outer edge portion 22a, but this connecting portion may be slightly closer to the color material layer 21 side.

The electrode base portion 24a and the electrode narrow portion 24 are also provided.
The width of each electrode of b is constant in each longitudinal direction.

The electrode width of the electrode narrow portion 24b is narrower than the electrode width of the electrode base portion 24a.

In this way, the electrode width of the stripe electrodes 24 in the step portion 29 of the protective film is made narrower than the electrode width in the effective area 27.

As a result, the distance between the stripe electrodes 24 in the step portion 29 of the protective film (hereinafter referred to as the wiring gap G).
2) becomes larger than the interval (hereinafter, referred to as wiring gap G1) between the stripe electrodes 24 on the effective region 27.

Specifically, the electrode width of the electrode base portion 24a is 7
The electrode width of the electrode narrow portion 24b is in the range of 60 to 180 μm, for example, about 96 μm. Further, the inter-wiring gap G1 is 20 μm or less, and the inter-wiring gap G1 in the case of a high-resolution liquid crystal device is 12 μm or less.

As a result, the inter-wiring gap G2 in the electrode narrow portion 24b is 24 μm or less, and the inter-wiring gap G2 in the case of a high-resolution liquid crystal device is 16 μm or less.

The electrode width and the size of the inter-wiring gap are not limited to the ranges described above.
It can be changed arbitrarily.

The stripe electrodes 24 ... Are formed by a photolithography technique as described below.

First, as shown in FIG. 5, a color filter is formed by sequentially stacking a light shielding layer 22, a color material layer 21, ... And a protective film 23 on a counter substrate 20.

Next, as shown in FIG. 6, the ITO layer 24c and the positive photoresist layer 31 are sequentially laminated on the protective film 23 and the counter substrate 20, and light is applied to the positive photoresist using a predetermined mask. The photoresist layer 31 is exposed to light and developed by irradiation, and a part of the ITO layer is removed by etching using the patterned photoresist layer as a mask.

In FIG. 6, the ITO layer 24c is the protective film 2
3 and the counter substrate 20, and the ITO layer 24c
A positive photoresist layer 31 is laminated on top. Therefore, the step portion 31a derived from the step portion 29 is formed in the positive photoresist layer 31, or the resist 31 is applied so as to fill the step portion of the protective film.
Therefore, exposure may be incomplete at the step portion 31a of the resist layer, and a part of the resist layer 31 may remain after etching.

However, since the wiring gap G2 of the stripe electrode 24 formed near the step portion 31a is large, even if the photoresist layer 31 remains at this portion, the wiring gap G2 is formed.
Is large, the resist layer does not remain so as to short-circuit the striped electrodes 24, 24.

Then, as shown in FIG. 7, by removing the remaining photoresist layer 31, striped electrodes 24 ... Are obtained as shown in FIGS.

In the above liquid crystal device, since the electrode width of the electrode narrow portion 24b of the stripe electrode 24 is smaller than the electrode width of the electrode base portion 24a, the inter-wiring gap G2 in the step portion 29 of the protective film becomes large. It is possible to prevent a short circuit between the stripe electrodes 24 ... In the step portion of the protective film.

(Second Embodiment) Next, a second embodiment of the present invention will be described with reference to the drawings.

FIG. 8 is a plan view of a main portion of the counter substrate 20 of the liquid crystal device according to the second embodiment of the present invention, and FIG. 9 is a sectional view taken along the line CC ′ shown in FIG. .

It should be noted that these drawings are for explaining the structure of the liquid crystal device as in FIGS. 1 to 4, and the sizes, thicknesses, dimensions, etc. of the respective parts shown in the drawings are related to the dimensions of the actual liquid crystal device. Is different from.

Of the constituent elements shown in FIGS. 8 and 9, the same constituent elements as those shown in FIGS. 3 and 4 are designated by the same reference numerals as those in FIGS. Omitted or briefly explained.

As shown in FIGS. 8 and 9, the counter substrate 20
A plurality of color material layers 21 ... Are formed on the top of each color material layer 21.
A light-shielding layer 22 made of chromium or the like and formed in a matrix is provided between them.

Further, as shown in FIG. 9, the counter substrate 20 is provided with a protective film 23 for covering the respective color material layers 21 ... And the light shielding layer 22. These color material layers 21, ..., Light-shielding layer 22 and protective film 23 constitute a so-called color filter.

Further, as shown in FIG. 9, in the protective film 23, a step 23b is formed by the coloring material layer located at the outermost periphery of the effective area and the light shielding layer outer edge portion 22a constituting the outermost periphery of the light shielding layer 22. Is formed, and a step 2 corresponding to the film thickness of the protective film 23 is formed on the protective film peripheral portion 23a which constitutes the contour of the protective film 23.
3c is formed. The protective film 23 has a step portion 29 between the protective film 23 and the protective film non-forming region 26 in the effective region 27.

Further, since the light shielding layer 22 is covered with the protective film 23, the light shielding layer outer edge portion 22a is located closer to the color material layers 21 ... than the protective film peripheral portion 23a.

The total height of these step portions 29 is about 5
It is about μm.

Then, on the protective film 23 (in FIG. 2, the protective film 2
A plurality of strip-shaped strip electrodes 44 ...
Are formed.

The stripe electrodes 44 ... Are made of ITO (Indium).
A transparent conductive film such as a tin oxide film, is formed on the protective film 23 (protective film formation region 25) and passes through the protective film peripheral portion 23a as shown in FIGS. It extends to the non-formed region 26 of the protective film 23.

As shown in FIG. 8, the stripe electrode 44
Is an electrode base portion 44a located in the effective region 27, an electrode narrow portion 44b located on the step portion 29 of the protective film and connected to the electrode base portion 44a, and an electrode located in the non-formed formation region 26 of the protective film 23. It is composed of an electrode end portion 44c connected to the narrow portion 44b.

The electrode narrow portion 44b extends from the step portion 29 of the protective film to the outside of the protective film peripheral portion 23a. In the present embodiment, the electrode narrow portion 44b is connected to the electrode base portion 24a on the light shielding layer outer edge portion 22a and is connected to the electrode end portion 44c outside the protective film peripheral portion 23a, but the electrode base portion 44a and the electrode narrow portion are formed. The connection part with 44b may be located in the color material layer.

The electrode width of each of the electrode base portion 44a, the electrode narrow portion 44b and the electrode end portion 44c is constant in the longitudinal direction thereof.

The electrode width of the electrode narrow portion 44b is narrower than the electrode width of the electrode base portion 44a and the electrode end portion 44c. In addition, the electrode width of the electrode base portion 44a and the electrode end portion 44c
Have the same electrode width.

The pair of sides 44d, 44d forming the contour of the electrode end portion 44c in the longitudinal direction are located on the extension lines of the pair of sides 44e, 44e forming the contour of the electrode base 44a in the longitudinal direction. .

As a result, the wiring gap G4 in the step portion 29 of the protective film becomes larger than the inter-wiring gap G3 in the effective region 27. In addition, the inter-wiring gap G3 in the effective region 27 and the inter-wiring gap G5 in the non-forming region 26 of the protective film 23 match.

Specifically, the electrode width of the electrode base portion 44a and the electrode end portion 44c is in the range of 70 to 200 μm, for example, 10
The electrode width of the electrode narrow portion 44b is 60 to 1
The range is 80 μm, for example, about 96 μm. Further, the inter-wiring gaps G3 and G5 at the electrode base portion 44a and the electrode end portion 44c are 20 μm or less, and in the case of a high-resolution liquid crystal device, the inter-wiring gaps G3 and G5 are 12 μm or less.

As a result, the inter-wiring gap G4 in the narrow electrode portion 44b is 24 μm or less, and in the case of a high-resolution liquid crystal device, the inter-wiring gap G4 is 16 μm or less.

The electrode width and the size of the wiring gap are not limited to the ranges described above and can be arbitrarily changed.

In the liquid crystal device of this embodiment, since the electrode width of the electrode narrow portion 44b of the stripe electrode 44 is made narrower than the electrode width of the electrode base portion 44a, the inter-wiring gap G4 in the step portion 29 becomes large, Light-shielding layer outer edge portion 22
It is possible to prevent a short circuit between the stripe electrodes 44 ... In the vicinity of the step 22b of a.

Even if the measurement of the inter-wiring gap G3 in the effective area 27 is hindered by the reflected light from the light-shielding layer 22, the inter-wiring gap G in the electrode end 44c.
Since 5 is the same as the inter-wiring gap G3, the size of the inter-wiring gap G3 can be known by measuring the inter-wiring gap G5.

Further, since the pair of sides 44d, 44d forming the contour of the electrode end portion 44c is located on the extension line of the pair of sides 44e, 44e forming the contour of the electrode base 44a, the inter-wiring gap G5 By measuring the electrode base 4
The inter-wiring gap G3 in 4a can be measured more accurately.

(Another Configuration of Liquid Crystal Device) In the first and second embodiments, the present invention is applied to the TFD element type liquid crystal device. However, the present invention is not limited to this. However, the present invention may be applied to, for example, a simple matrix type liquid crystal device as shown in FIG.

FIG. 10 is a perspective view of a main part of a simple matrix type liquid crystal device. It should be noted that this diagram is for explaining the configuration of the liquid crystal device, and the sizes, thicknesses, dimensions, etc. of the respective parts shown in the figure are different from the actual dimensional relationship of the liquid crystal device.

Here, an example in which the stripe electrode 24 described in the first embodiment is applied will be described.
Of course, the stripe electrode 44 described in the above embodiment may be applied.

The simple matrix type liquid crystal device shown in FIG. 10 has a transparent substrate 50 on which a plurality of strip-shaped electrodes 56 functioning as data lines or scanning lines are formed, and at the position facing the transparent substrate 50. Counter substrate 20
Are arranged.

The electrodes 56 ... Are arranged at a constant interval from each other and extend in the same direction.

Polarizing plates 30 and 31 are attached to the surfaces of the transparent substrate 50 and the counter substrate 20 opposite to the surfaces facing each other. Although not shown, an alignment film is formed on the surfaces of the transparent substrate 50 and the counter substrate 20 that face each other, and a liquid crystal layer, a spacer, and the like are arranged between the facing alignment films.

A plurality of color material layers 21 ... Are formed on the counter substrate 20 (lower side of the counter substrate 20 in FIG. 10).
A light-shielding layer 22 made of chromium formed in a matrix is provided between the color material layers 21.

Further, the counter substrate 20 is provided with a protective film 23 for covering the respective color material layers 21 ... And the light shielding layer 22. These color material layers 21, ..., Light-shielding layer 22 and protective film 23 constitute a so-called color filter.

Then, on the protective film 23 (the protective film 2 in FIG. 2).
3), a plurality of substantially strip-shaped striped electrodes 24 ... Which function as scanning lines or data lines described above in detail are formed. The longitudinal direction of the stripe electrodes 24 ... Crosses the longitudinal direction of the data electrodes 56.

(Electronic Device) Next, an embodiment of an electronic device including the liquid crystal device described in detail above will be described with reference to FIGS. 11 and 12.

Although an example in which the liquid crystal device of the first embodiment is applied will be described here, it goes without saying that the liquid crystal device of the second embodiment may be applied, and the above simple matrix is also applicable. Type liquid crystal device may be applied.

First, FIG. 11 shows a schematic configuration of an electronic apparatus including the liquid crystal device of the first embodiment. In FIG.
The electronic device is configured to include a display information output source 1000, a display information processing circuit 1002, a drive circuit 1004, the liquid crystal device 1 according to the first embodiment, a clock generation circuit 1008, and a power supply circuit 1010.

The display information output source 1000 is a ROM (Read
Only memory), RAM (Random Access Memory), memory such as an optical disk device, a tuning circuit that tunes and outputs an image signal, and the like, and displays an image signal in a predetermined format based on the clock signal from the clock generation circuit 1008. The information is output to the display information circuit 1002.

The display information processing circuit 1002 includes various well-known processing circuits such as an amplification / polarity inversion circuit, a serial-parallel conversion circuit, a rotation circuit, a gamma correction circuit, and a clamp circuit, and is based on a clock signal. Digital signals are sequentially generated from the input display information and output to the drive circuit 1004 together with the clock signal CLK. The drive circuit 1004 drives the liquid crystal device 1.

Next, FIG. 12 shows a specific example of the electronic apparatus configured as described above.

In FIG. 12, a laptop personal computer 1200 for multimedia, which is another example of electronic equipment, is provided with the liquid crystal device 1 of the first embodiment in a top cover case, and further, a CPU ,
A keyboard 1202 as well as a memory, a modem, etc.
A main body 1204 in which

Further, FIG. 13 shows a portable telephone which is another example of the electronic equipment. In FIG. 13, reference numeral 200 indicates a mobile phone main body, and reference numeral 201 indicates a liquid crystal display unit using the liquid crystal device 1.

FIG. 14 shows a portable information processing device such as a word processor or a personal computer, which is another example of the electronic equipment. In FIG. 14, reference numeral 300 is an information processing device, and reference numeral 301.
Is an input unit such as a keyboard, reference numeral 303 is a main body of the information processing apparatus, and reference numeral 302 is a liquid crystal display unit using the liquid crystal device 1.

FIG. 15 shows a wrist watch type electronic device as another example of the electronic device. In FIG. 15, reference numeral 400 indicates a watch body, and reference numeral 401 indicates a liquid crystal display unit using the liquid crystal device 1 described above.

FIG. 16 shows a projection type display device which is another example of electronic equipment.

In FIG. 16, reference numeral 530 is a light source, reference numerals 533 and 534 are dichroic mirrors, reference numeral 535,
Reference numerals 536 and 537 are reflection mirrors, reference numeral 538 is an entrance lens, reference numeral 539 is a relay lens, reference numeral 520 is an exit lens, reference numerals 522, 523 and 524 are liquid crystal light modulators using the liquid crystal device 1, and reference numeral 525 is a cross dichroic. A prism, reference numeral 526, is a projection lens.

The light source 530 is a lamp 531 such as a metal halald and a reflector 53 that reflects the light of the lamp 531.
It consists of 2. The blue light / green light reflecting dichroic mirror 533 transmits red light of the light flux from the light source 530 and reflects blue light and green light. The transmitted red light is reflected by the reflection mirror 537 and is incident on the liquid crystal light modulation device 522 for red light. On the other hand, of the colored light reflected by the dichroic mirror 533, the green light is
The light is reflected by the green light reflecting dichroic mirror 534 and is incident on the liquid crystal light modulator for green light 523. On the other hand, the blue light also passes through the second dichroic mirror 534. For blue light, the light guide unit 5 including a relay lens system including an incident lens 538, a relay lens 539, and an emission lens 520 is provided in order to prevent light loss due to a long optical path.
21 is provided, and blue light is incident on the blue light liquid crystal light modulation device 524 through the light source 21.

The three color lights modulated by the respective light modulators enter the cross dichroic prism 525.
This prism is made up of four right angle prisms,
On the inner surface, a dielectric multilayer film reflecting red and a dielectric multilayer film reflecting blue are formed in a cross shape. The three color lights are combined by these dielectric multilayer films to form light representing a color image. The combined light is projected on the screen by the projection lens 26 which is a projection optical system, and the image is enlarged and displayed.

As described above, in addition to the electronic devices described with reference to FIGS. 12 to 16, a liquid crystal television, a viewfinder type or a monitor direct-view type video tape recorder, a car navigation device, an electronic notebook, a calculator, an engineering workstation. A videophone, a POS terminal, a device equipped with a touch panel, and the like are examples of the electronic device shown in FIG.

[0107]

As described above in detail, in the liquid crystal device of the present invention, the width of the electrode in the step portion of the protective film is made narrower than the width of the electrode in the effective region. The gap between the wirings in the portion becomes large, and it is possible to prevent a short circuit between the electrodes at the step portion, and it is possible to improve the reliability of the liquid crystal device.

Further, in the liquid crystal device of the present invention, the width of the electrode in the step portion of the protective film is made narrower than the width of the electrode in the effective region, and a part of the width of the electrode in the non-formed region of the protective film is effective. Since it is configured to match the width of the electrode in the area, the inter-wiring gap becomes large in the step portion sandwiched between the effective area and the area where the protective film is not formed. It is possible to prevent a short circuit between the electrodes.

Further, the inter-wiring gap can be measured in the region where the protective film is not formed, and the measurement of the inter-wiring gap is not disturbed by the reflected light of the light shielding layer.

Further, in the liquid crystal device of the present invention, the pair of sides forming the longitudinal contour of the electrode in the region where the protective film is not formed is an extension of the pair of sides constituting the longitudinal contour of the electrode in the effective region. Since it is on the line, it is possible to more accurately measure the inter-wiring gap of the electrodes on the effective area in the area where the protective film is not formed, which increases the yield of the high-resolution liquid crystal device and increases the reliability of the liquid crystal device. Can be improved.

[Brief description of drawings]

FIG. 1 is a perspective view showing a TFD type liquid crystal device according to a first embodiment of the present invention.

FIG. 2 is a perspective view showing a main part of the liquid crystal device of FIG.

3 is a diagram showing a main part of a counter substrate of the liquid crystal device shown in FIG. 1, and is a plan view within a two-dot chain line frame in FIG.

FIG. 4 is a cross-sectional view taken along the line B-B ′ in FIG.

5A to 5C are process diagrams for explaining a method of manufacturing the counter substrate of the liquid crystal device shown in FIG.

6A to 6C are process diagrams for explaining a method of manufacturing a counter substrate of the liquid crystal device shown in FIG.

7A to 7C are process diagrams for explaining a method of manufacturing a counter substrate of the liquid crystal device shown in FIG.

FIG. 8 is a plan view showing a main part of a counter substrate of a liquid crystal device according to a second embodiment of the present invention.

9 is a cross-sectional view taken along the line B-B ′ in FIG.

FIG. 10 is a perspective view showing a main part of a simple matrix type liquid crystal device.

FIG. 11 is a block diagram showing a schematic configuration of an embodiment of an electronic device according to the present invention.

FIG. 12 is a front view showing a personal computer as an example of an electronic device.

FIG. 13 is a perspective view showing a mobile phone which is another example of an electronic device.

FIG. 14 is a perspective view showing a portable information device which is another example of an electronic device.

FIG. 15 is a perspective view showing a wrist watch type electronic device which is another example of the electronic device.

FIG. 16 is a schematic configuration diagram showing a projection type display device which is another example of an electronic device.

FIG. 17 is a plan view showing a main part of a counter substrate of a conventional liquid crystal device.

FIG. 18 is a cross-sectional view taken along the line A-A ′ in FIG.

[Explanation of symbols]

1 Liquid crystal device 20 Counter substrate (substrate) 21 Color material layer 22 Light-shielding layer 23 Protective film 24,44 stripe electrodes 44d, 44e sides (a pair of sides) 25 Area for forming protective film 26 Area where protective film is not formed 27 Effective area 29 Step of protective film

─────────────────────────────────────────────────── ─── Continuation of the front page (58) Fields surveyed (Int.Cl. ⁷ , DB name) G02F 1/1343

Claims (4)

(57) [Claims] 1. A plurality of color material layers, a light-shielding layer around the color material layer, a protective film covering the color material layer and the light-shielding layer, and stripes arranged on the protective film. A liquid crystal device including a substrate having a plurality of electrodes, wherein the substrate has a formation region in which the protective film is formed and a non-formation region in which the protective film is not formed, The film has a step portion for switching between the formation region of the protective film and the non-formation region of the protective film, the electrode extends to the non-formation region, and the electrode on the step portion is formed. Is narrower than the width of the electrode on the color material layer, and the electrode in the non-formation region has a portion where the width of the electrode matches the width of the electrode on the color material layer. A liquid crystal device characterized by the above. 2. A plurality of color material layers, a light-shielding layer around the color material layer, a protective film covering the color material layer and the light-shielding layer, and stripes arranged on the protective film. A liquid crystal device having a substrate having a plurality of electrodes, wherein the substrate has a formation region in which the protective film is formed and a non-formation region in which the protective film is not formed, The film has a step portion for switching between the formation region of the protective film and the non-formation region of the protective film, the electrodes extend to the non-formation region, and are adjacent to each other on the step portion. The gap between the electrodes is
The gap between the adjacent electrodes on the coloring material layer is larger than the gap between the adjacent electrodes on the coloring material layer, and the gap between the adjacent electrodes on the coloring material layer of the adjacent electrodes in the non-formation region is large. A liquid crystal device having a portion corresponding to. 3. The liquid crystal device according to claim 1, wherein the pair of sides forming the contour of the electrode in the non-formation region is a pair of sides forming the contour of the electrode in the effective region. Liquid crystal device characterized by being on the extension line of. 4. An electronic apparatus comprising the liquid crystal device according to claim 1.