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JP3433671B2 - Acceleration sensor - Google Patents
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JP3433671B2 - Acceleration sensor - Google Patents

Acceleration sensor

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Publication number
JP3433671B2
JP3433671B2 JP14457498A JP14457498A JP3433671B2 JP 3433671 B2 JP3433671 B2 JP 3433671B2 JP 14457498 A JP14457498 A JP 14457498A JP 14457498 A JP14457498 A JP 14457498A JP 3433671 B2 JP3433671 B2 JP 3433671B2
Authority
JP
Japan
Prior art keywords
acceleration sensor
support
weight
mass
mass portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP14457498A
Other languages
Japanese (ja)
Other versions
JPH11337570A (en
Inventor
宏 齊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP14457498A priority Critical patent/JP3433671B2/en
Publication of JPH11337570A publication Critical patent/JPH11337570A/en
Application granted granted Critical
Publication of JP3433671B2 publication Critical patent/JP3433671B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、半導体基板を加工
して形成される加速度センサに関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an acceleration sensor formed by processing a semiconductor substrate.

【0002】[0002]

【従来の技術】図は、従来の加速度センサの構成を示
す構成図である。この図において、センサチップ1は異
方性エッチング加工が施されて裏面にダイヤフラムから
成る薄肉の支持体3が形成され、該センサチップ1の中
央部側にはマス部4が、周端縁側には厚肉部5がそれぞ
れ形成される。また、マス部4の周囲には、貫通溝6が
形成されている。このマス部4と厚肉部5は、前記エッ
チング加工により形成された支持体3によってのみ連結
され、この支持体3は片持ち支えとしてマス部4を支持
している。さらに、前記支持体3の表面には、ゲージ抵
抗7が形成され、これらゲージ抵抗7を結線することで
ホイートストンブリッジ回路を構成している。
2. Description of the Related Art FIG. 4 is a configuration diagram showing a configuration of a conventional acceleration sensor. In this figure, the sensor chip 1 is subjected to anisotropic etching to form a thin support body 3 made of a diaphragm on the back surface, and a mass portion 4 is formed on the central side of the sensor chip 1 and a peripheral edge side is formed on the peripheral edge side. The thick portions 5 are formed respectively. A through groove 6 is formed around the mass portion 4. The mass portion 4 and the thick portion 5 are connected only by the support body 3 formed by the etching process, and the support body 3 supports the mass portion 4 as a cantilever support. Further, gauge resistors 7 are formed on the surface of the support 3, and the gauge resistors 7 are connected to form a Wheatstone bridge circuit.

【0003】このセンサチップ1の厚肉部5の両面側に
ガラスストッパ2a、2bが陽極接合により接合される
が、ガラスストッパ2a、2bにはそれぞれ凹部9が設
けられており、マス部4と、マス部4と対向するガラス
ストッパ2a、2bとの間には隙間8が形成される。こ
の隙間8は、加速度が加わった際のマス部4の揺動範囲
であり、ガラスストッパ2a、2bはマス部4が加速度
センサの垂直方向(図矢印で示す方向)に過度に変位
することを規制する働きをしている。
Glass stoppers 2a and 2b are joined to both sides of the thick portion 5 of the sensor chip 1 by anodic bonding, and the glass stoppers 2a and 2b are provided with recesses 9 respectively, and are connected to the mass portion 4. A gap 8 is formed between the mass portion 4 and the glass stoppers 2a and 2b facing each other. The gap 8 is a swing range of the mass portion 4 when acceleration is applied, and the glass stoppers 2a and 2b are such that the mass portion 4 is excessively displaced in the vertical direction of the acceleration sensor (direction shown by an arrow in FIG. 4 ). It regulates the

【0004】このガラスストッパ2a、2bの材料とし
てはパイレックスガラス#7740等を用い、これらを
センサチップ1の両面に陽極接合により接合し、内部に
エアー又はオイルを封入することにより、エアーダンピ
ング構造を形成している。これにより、加速度センサに
過度の加速度が加わった際に、マス部4を支持する支持
体3を衝撃から保護する構造になっている。また、同様
にマス部4が過度に揺動した際に、マス部4がガラスス
トッパ2a、2bに触れ、動きが規制されるため、支持
体3の折れや、破損を防止する。
Pyrex glass # 7740 or the like is used as the material of the glass stoppers 2a and 2b. These are bonded to both sides of the sensor chip 1 by anodic bonding, and air or oil is sealed inside to form an air damping structure. Is forming. As a result, when the acceleration sensor receives an excessive acceleration, the support body 3 supporting the mass portion 4 is protected from an impact. Similarly, when the mass portion 4 swings excessively, the mass portion 4 touches the glass stoppers 2a and 2b and the movement is restricted, so that the support body 3 is prevented from being broken or damaged.

【0005】次に、この加速度センサの動作を説明す
る。いま、加速度αが加速度センサチップ1と垂直方向
に加えられると、マス部4に力F=mαが発生する。こ
の力Fによって支持体3が撓み、表面に歪みが発生し、
この歪みによって支持体3の表面に形成されたゲージ抵
抗7の値が変化する。このとき、外部から電圧をホイー
トストンブリッジ回路に供給すると、このゲージ抵抗7
の抵抗値の変化により、加速度に比例した電圧信号をワ
イヤ12を介して外部に検出する構造となっている。
Next, the operation of this acceleration sensor will be described. Now, when the acceleration α is applied in the direction perpendicular to the acceleration sensor chip 1, a force F = mα is generated in the mass portion 4. This force F causes the support 3 to bend, causing distortion on the surface,
This distortion changes the value of the gauge resistance 7 formed on the surface of the support 3. At this time, if a voltage is externally supplied to the Wheatstone bridge circuit, the gauge resistance 7
The voltage signal proportional to the acceleration is detected to the outside through the wire 12 due to the change in the resistance value of.

【0006】[0006]

【発明が解決しようとする課題】しかしながら、このよ
うに構成された加速度センサは、製造時に、マス部4が
支持体3と同一のシリコンウェハから異方性エッチング
加工により形成されるため、マス部4の重さを増加さ
せ、感度を向上させることが困難であった。
However, in the acceleration sensor configured as described above, the mass portion 4 is formed by anisotropic etching from the same silicon wafer as the support 3 at the time of manufacture. It was difficult to increase the weight of No. 4 and improve the sensitivity.

【0007】このため、マス部4にガラスの重りを陽極
接合により接合し、加速度センサの感度の向上を図った
構造が考えられている(特開平5−288770号公報
参照)。
Therefore, a structure has been considered in which a glass weight is bonded to the mass portion 4 by anodic bonding to improve the sensitivity of the acceleration sensor (see Japanese Patent Laid-Open No. 5-288770).

【0008】しかし、陽極接合では、高温中(約400
℃)で、高電圧(約600〜1000V)を印加するた
めに、ガラスとシリコンの熱膨張係数の差異により、支
持体3に応力が加わり、ゲージ抵抗7に歪みが発生する
という問題があった。このため、製造時のオフセット感
度における特性が不安定で、さらに、ガラスとマス部4
の接合による残留応力により、温度による特性変化が生
じるという問題があった。
However, in anodic bonding, high temperature (about 400
In order to apply a high voltage (about 600 to 1000 V) at (° C.), there was a problem that stress was applied to the support body 3 due to the difference in thermal expansion coefficient between glass and silicon, and strain was generated in the gauge resistance 7. . Therefore, the characteristics of the offset sensitivity during manufacturing are unstable, and the glass and the mass portion 4 are
There is a problem in that the residual stress due to the joining causes the characteristics to change with temperature.

【0009】本発明は、上記問題点を解決するためにな
されたもので、加速度センサの感度の向上を図るととも
に、温度特性(オフセット温度特性と感度温度特性)が
良好な加速度センサを提供しようとするものである。
The present invention has been made to solve the above problems, and aims to improve the sensitivity of the acceleration sensor and to provide an acceleration sensor having good temperature characteristics (offset temperature characteristic and sensitivity temperature characteristic). To do.

【0010】[0010]

【課題を解決するための手段】請求項1の発明は、上記
目的を達成するために、半導体基板を加工して支持体に
揺動自在に支持されるマス部を形成するとともに、該支
持体の表面にゲージ抵抗を形成して成るセンサチップ
と、センサチップの両面に設けられてマス部の揺動範囲
を規制するストッパとを備えた加速度センサにおいて、
少なくともマス部の一面側に低融点ガラス薄膜を介して
半導体から成る同じ厚みを持つ複数の重りをほぼ等間隔
接合することにより、センサチップと重りの熱膨張係
数が等しくなり、これらを接合する際にゲージ抵抗に歪
みが生じることがなく、加速度センサの温度特性が向上
するとともに、感度の向上を図ることができる。さら
に、加速度センサに加わる衝撃を複数の重りに分割し、
過度の衝撃を緩和することができる。
In order to achieve the above object, the invention of claim 1 processes a semiconductor substrate to form a mass portion which is swingably supported by a support, and the support. An acceleration sensor having a sensor chip formed by forming a gauge resistance on the surface of and a stopper provided on both surfaces of the sensor chip to restrict the swing range of the mass part
A plurality of weights made of semiconductor and having the same thickness are arranged at least equidistantly on at least one surface of the mass portion through a low melting point glass thin film.
The by bonding, the thermal expansion coefficient of the sensor chip and the weight are equal, these without distortion occurs in the gauge resistance when bonding, the temperature characteristic of the acceleration sensor is improved, to improve the sensitivity You can Furthermore
In addition, divide the impact applied to the acceleration sensor into multiple weights,
Excessive impact can be mitigated.

【0011】請求項2の発明は、半導体基板を加工して
支持体に揺動自在に支持されるマス部を形成するととも
に、該支持体の表面にゲージ抵抗を形成して成るセンサ
チップと、センサチップの両面に設けられてマス部の揺
動範囲を規制するストッパとを備えた加速度センサにお
いて、少なくともマス部の一面側に低融点ガラス薄膜を
介して半導体から成る重りを接合し、重りの少なくとも
両端部が、マス部の両端部又は周辺部と接合され、重り
のストッパと対向する面に凸部を形成したことにより、
センサチップと重りの熱膨張係数が等しくなり、これら
を接合する際にゲージ抵抗に歪みが生じることがなく、
加速度センサの温度特性が向上するとともに、感度の向
上を図ることができる。さらに、衝撃が加速度センサに
加わった際に、凸部がガラスストッパと接触し、過度の
衝撃を緩和することができる。
According to a second aspect of the present invention, the semiconductor substrate is processed.
Forming a mass part that is swingably supported on the support
And a sensor formed by forming a gauge resistance on the surface of the support
It is provided on both sides of the chip and the sensor chip, and the mass part shakes.
For an acceleration sensor equipped with a stopper that limits the range of motion.
The low melting point glass thin film on at least one side of the mass part.
Join the weights made of semiconductors through at least the weights
Both ends are joined to both ends of the mass part or the peripheral part,
By forming a convex portion on the surface facing the stopper of,
The sensor chip and the weight have the same coefficient of thermal expansion,
There is no strain in the gauge resistance when joining
The temperature characteristics of the acceleration sensor are improved and the sensitivity is improved.
You can go up. In addition, the impact on the acceleration sensor
When it is added, the convex part comes into contact with the glass stopper and
Shock can be mitigated.

【0012】[0012]

【発明の実施の形態】(実施形態1) 図1は、本発明の基本構成を示す断面図である。なお、
本実施形態及び以下に述べる実施形態の基本構成は、従
来例とほぼ共通するので共通する部分については同一の
符号を付して説明を省略することとし、本実施形態及び
以下に述べる実施形態の特徴となる部分についてのみ説
明することとする。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS (Embodiment 1) FIG. 1 is a sectional view showing the basic structure of the present invention. In addition,
Since the basic configurations of the present embodiment and the embodiments described below are almost the same as those of the conventional example, the common parts are denoted by the same reference numerals and the description thereof will be omitted. Only the characteristic parts will be described.

【0013】まず本実施形態の基本構成は、図1に示す
ように、センサチップ1のマス部4の少なくとも一面に
半導体から成る重り10(以下、シリコン重りと呼ぶ)
をガラス薄膜11により接合したものである
First , as shown in FIG. 1, the basic structure of this embodiment is that a weight 10 made of a semiconductor (hereinafter referred to as a silicon weight) is provided on at least one surface of a mass portion 4 of a sensor chip 1.
The is obtained by bonding by glass film 11.

【0014】ここで、マス部4は、支持体3に支持され
る側の一面が幅広で、他面の幅が狭い端面を有する形状
に形成され、シリコン重り10は薄板の平板状に形成さ
れている。さらに、このマス部4と接合されるシリコン
重り10の幅は、マス部4の幅広の面の幅とほぼ同じに
形成され、シリコン重り10の一面をマス部4の幅広の
面に低融点のガラス薄膜11により接合することでマス
部4の重さを増加させ、加速度センサの感度の向上を図
っている。
Here, the mass portion 4 is formed in such a shape that one side on the side supported by the support 3 is wide and the other side has a narrow end surface, and the silicon weight 10 is formed in the shape of a thin flat plate. ing. Further, the width of the silicon weight 10 joined to the mass portion 4 is formed to be substantially the same as the width of the wide surface of the mass portion 4, and one surface of the silicon weight 10 has a low melting point on the wide surface of the mass portion 4. By bonding with the glass thin film 11, the mass of the mass portion 4 is increased, and the sensitivity of the acceleration sensor is improved.

【0015】前記低融点のガラス薄膜11は、例えば鉛
系非晶質ガラスを用い、重り10となるシリコンウェハ
にRFスパッタ方法等で数μm程度の厚みで形成し、こ
の重り10とセンサチップ1を重ね、約50℃〜80℃
の温度下で、重り10側を負極にして数10Vの直流電
圧を印加することにより接合する。
The low-melting-point glass thin film 11 is made of, for example, lead-based amorphous glass and is formed on a silicon wafer to be the weight 10 to have a thickness of about several μm by an RF sputtering method or the like. The weight 10 and the sensor chip 1 are formed. Over, about 50 ℃ ~ 80 ℃
At the temperature of, the weight 10 side is made a negative electrode and a direct current voltage of several tens of volts is applied to join.

【0016】このようにシリコン重り10とマス部4を
接合すると、従来のガラスをマス部4に陽極接合する場
合と比べて、低温、低電圧で接合することができ、重り
10とセンサチップ1に同じシリコン材料を用いている
ので熱膨張係数が等しくなり、接合時に歪みがほとんど
生じない。このため、ゲージ抵抗7に応力が生じること
もなく、加速度センサのオフセット温度特性や感度温度
特性を向上させることができる。
When the silicon weight 10 and the mass portion 4 are bonded in this manner, bonding can be performed at a lower temperature and a lower voltage as compared with the case where conventional glass is anodically bonded to the mass portion 4, and the weight 10 and the sensor chip 1 are bonded. Since the same silicon material is used for the two, the coefficients of thermal expansion are equal and almost no strain occurs during bonding. Therefore, stress is not generated in the gauge resistor 7, and the offset temperature characteristic and the sensitivity temperature characteristic of the acceleration sensor can be improved.

【0017】一方、シリコン重り10と対向するガラス
ストッパ2a、2bには凹部9が形成され、凹部9の深
さが充分深いために、マス部4との間にシリコン重り1
0が配置されるのに充分な空間が確保される。このた
め、上述のようにシリコン重り10をマス部4に接合し
ても、シリコン重り10と対向するガラスストッパ2a
との間には一定の隙間8が設けられ、マス部4が揺動可
能となる。そして、ガラスストッパ2aの凹部9の深さ
を変えることにより、隙間8の幅を設定し、マス部4の
揺動範囲を制御することができる構造となっている。
On the other hand, a concave portion 9 is formed in the glass stoppers 2a, 2b facing the silicon weight 10 and the depth of the concave portion 9 is sufficiently deep so that the silicon weight 1 is formed between the concave portion 9 and the mass portion 4.
Enough space is secured for the 0s to be placed. Therefore, even if the silicon weight 10 is bonded to the mass portion 4 as described above, the glass stopper 2a facing the silicon weight 10 is provided.
A constant gap 8 is provided between and, so that the mass portion 4 can swing. The width of the gap 8 is set by changing the depth of the concave portion 9 of the glass stopper 2a, and the swing range of the mass portion 4 can be controlled.

【0018】加速度センサを上述のように構成すれば、
マス部4に、シリコン重り10の重量だけ重さを増すこ
とができ、この結果、加速度センサの感度を向上させる
ことができる。さらに、シリコン重り10とセンサチッ
プ1の熱膨張係数が等しいため、これらを接合する際に
生じる歪みが極めて小さくなり、従来の他の重りを用い
る場合と比較して、加速度センサのオフセット温度特性
や感度温度特性が向上することになる。
If the acceleration sensor is constructed as described above,
It is possible to increase the weight of the mass portion 4 by the weight of the silicon weight 10, and as a result, it is possible to improve the sensitivity of the acceleration sensor. Furthermore, since the silicon weight 10 and the sensor chip 1 have the same coefficient of thermal expansion, the strain generated when joining them becomes extremely small, and the offset temperature characteristics of the acceleration sensor and the offset temperature characteristics of the acceleration sensor are smaller than those when other conventional weights are used. The sensitivity temperature characteristic is improved.

【0019】そして本実施形態では、図2に示すよう
に、同じ厚みを持つ複数のシリコン重 り10を、ほぼ等
間隔にガラス薄膜11を介してマス部4に接合したこと
に特徴がある。ここで、シリコン重り10は、均一の厚
みで複数個設けられているために、外部から過度の加速
度が垂直方向(図2の矢印で示す方向)に加えられた場
合に、その衝撃は、複数のシリコン重り10に分割さ
れ、その衝撃力が分散し、支持体3の破損を防ぐことが
できる。
In this embodiment, as shown in FIG.
To a plurality of silicon heavy Ri 10 having the same thickness, approximately equal
Joined to the mass part 4 via the glass thin film 11 at intervals
Is characterized by. Here, the silicon weight 10 has a uniform thickness.
Excessive acceleration from the outside because there are multiple
When the degree is added in the vertical direction (the direction shown by the arrow in Fig. 2)
In that case, the impact is divided into multiple silicon weights 10.
The impact force is dispersed, and damage to the support 3 can be prevented.
it can.

【0020】(実施形態2)本実施形態では、シリコン重り10に、図3に示すよう
に、ガラスストッパ2aと対向する側の面に凸部19を
設け、シリコン重り10の両端部又は周辺部とマス部4
をガラス薄膜11により接合している。これにより、シ
リコン重り10の凸部19の頂上付近のガラスストッパ
2aとの隙間8は狭くなり、外部から過度の加速度が加
わった際に、シリコン重り10の凸部19が、まず対向
するガラスストッパ2aと接触する構造となっている。
そして、このとき、シリコン重り10は、両端部又は周
辺部がマス部4の幅広の面に接合され、その中央下部は
接合されず空間が設けられているので、シリコン重り1
0が撓み、これにより、加速度センサに加わる過度の衝
撃を緩和することができる。
(Embodiment 2) In the present embodiment, the silicon weight 10 is attached to the silicon weight 10 as shown in FIG.
In addition, the convex portion 19 is provided on the surface facing the glass stopper 2a.
Provided, both ends or the peripheral portion of the silicon weight 10 and the mass portion 4
Are joined by a glass thin film 11. This allows
Glass stopper near the top of the convex portion 19 of the recon weight 10
The gap 8 with 2a becomes narrower and excessive acceleration is applied from the outside.
When crossed, the convex portion 19 of the silicon weight 10 first faces
The glass stopper 2a is in contact with the glass stopper 2a.
Then, at this time, the silicon weight 10 has both ends or a circumference.
The side part is joined to the wide surface of the mass part 4, and the lower center part is
Since it is not joined and a space is provided, silicon weight 1
0 bends, which causes excessive impact on the acceleration sensor.
The attack can be mitigated.

【0021】[0021]

【発明の効果】請求項1の発明は、半導体基板を加工し
て支持体に揺動自在に支持されるマス部を形成するとと
もに、該支持体の表面にゲージ抵抗を形成して成るセン
サチップと、センサチップの両面に設けられてマス部の
揺動範囲を規制するストッパとを備えた加速度センサに
おいて、少なくともマス部の一面側に低融点ガラス薄膜
を介して半導体から成る同じ厚みを持つ複数の重りを
ぼ等間隔に接合することにより、センサチップと重りの
熱膨張係数が等しくなり、これらを接合する際にゲージ
抵抗に歪みが生じることがなく、加速度センサの温度特
性が向上するとともに、感度の向上を図ることができる
という効果がある。さらに、加速度センサに加わる衝撃
を複数の重りに分割し、過度の衝撃を緩和することがで
きるという効果がある。
According to the invention of claim 1, a sensor chip is formed by processing a semiconductor substrate to form a mass portion swingably supported by a support, and forming a gauge resistance on the surface of the support. And an acceleration sensor having stoppers provided on both sides of the sensor chip for restricting the swinging range of the mass portion, and a plurality of semiconductor sensors having the same thickness formed on at least one surface side of the mass portion with a low melting point glass thin film interposed therebetween. Carved of weight
By joining the sensor chips at equal intervals, the coefficient of thermal expansion of the sensor chip becomes equal to that of the weight, and the gauge resistance is not distorted when joining them, improving the temperature characteristics of the acceleration sensor and improving the sensitivity. There is an effect that can be achieved. In addition, the shock applied to the acceleration sensor
Can be divided into multiple weights to reduce excessive shock.
There is an effect that you can.

【0022】請求項2の発明は、半導体基板を加工して
支持体に揺動自在に支持されるマス部を形成するととも
に、該支持体の表面にゲージ抵抗を形成して成るセンサ
チップと、センサチップの両面に設けられてマス部の揺
動範囲を規制するストッパとを備えた加速度センサにお
いて、少なくともマス部の一面側に低融点ガラス薄膜を
介して半導体から成る重りを接合し、重りの少なくとも
両端部が、マス部の両端部又は周辺部と接合され、重り
のストッパと対向する面に凸部を形成したことにより、
センサチップと重りの熱膨張係数が等しくなり、これら
を接合する際にゲージ抵抗に歪みが生じることがなく、
加速度センサの温度特性が向上するとともに、感度の向
上を図ることができるという効果がある。さらに、衝撃
が加速度センサに加わった際に、凸部がガラスストッパ
と接触し、過度の衝撃を緩和することができるという効
果がある。
According to a second aspect of the present invention, a semiconductor substrate is processed.
Forming a mass part that is swingably supported on the support
And a sensor formed by forming a gauge resistance on the surface of the support
It is provided on both sides of the chip and the sensor chip, and the mass part shakes.
For an acceleration sensor equipped with a stopper that limits the range of motion.
The low melting point glass thin film on at least one side of the mass part.
Join the weights made of semiconductors through at least the weights
Both ends are joined to both ends of the mass part or the peripheral part,
By forming a convex portion on the surface facing the stopper of,
The sensor chip and the weight have the same coefficient of thermal expansion,
There is no strain in the gauge resistance when joining
The temperature characteristics of the acceleration sensor are improved and the sensitivity is improved.
There is an effect that it can improve. Furthermore, the shock
The glass stopper on the acceleration sensor
The effect of being able to contact with
There is a fruit.

【図面の簡単な説明】[Brief description of drawings]

【図1】本願発明の基本構成を示す断面図である。FIG. 1 is a sectional view showing a basic configuration of the present invention .

【図2】実施形態1を示す断面図である。 FIG. 2 is a cross-sectional view showing the first embodiment.

【図3】実施形態2を示す断面図である。 FIG. 3 is a sectional view showing a second embodiment.

【図4】従来例を示す断面図である。 FIG. 4 is a cross-sectional view showing a conventional example.

【符号の説明】[Explanation of symbols]

1 センサチップ 2aガラスストッパ 2bガラスストッパ 3 支持体 4 マス部 7 ゲージ抵抗 10 シリコン重り 11 ガラス薄膜 1 sensor chip 2a glass stopper 2b glass stopper 3 support 4 squares 7 gauge resistance 10 silicon weights 11 Glass thin film

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平7−167888(JP,A) 特開 平7−146307(JP,A) 特開 平8−320340(JP,A) 特開 平8−122361(JP,A) 特開 平9−105760(JP,A) 特開 平7−128360(JP,A) 特開 平7−306223(JP,A) 特開 平7−306224(JP,A) 特開 平5−273230(JP,A) 特開 平6−300774(JP,A) 特開 平3−49267(JP,A) 実開 平3−115862(JP,U) (58)調査した分野(Int.Cl.7,DB名) G01P 15/12 H01L 29/84 ─────────────────────────────────────────────────── ─── Continuation of the front page (56) Reference JP-A-7-167888 (JP, A) JP-A-7-146307 (JP, A) JP-A-8-320340 (JP, A) JP-A-8- 122361 (JP, A) JP 9-105760 (JP, A) JP 7-128360 (JP, A) JP 7-306223 (JP, A) JP 7-306224 (JP, A) JP-A-5-273230 (JP, A) JP-A-6-300774 (JP, A) JP-A-3-49267 (JP, A) Practical application 3-1-15862 (JP, U) (58) Fields investigated (Int.Cl. 7 , DB name) G01P 15/12 H01L 29/84

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 半導体基板を加工して支持体に揺動自在
に支持されるマス部を形成するとともに、該支持体の表
面にゲージ抵抗を形成して成るセンサチップと、センサ
チップの両面に設けられてマス部の揺動範囲を規制する
ストッパとを備えた加速度センサにおいて、少なくとも
マス部の一面側に低融点ガラス薄膜を介して半導体から
成る同じ厚みを持つ複数の重りをほぼ等間隔に接合する
ことを特徴とする加速度センサ。
1. A sensor chip formed by processing a semiconductor substrate to form a mass part swingably supported by a support, and forming a gauge resistance on the surface of the support, and on both sides of the sensor chip. In an acceleration sensor provided with a stopper for restricting the swing range of the mass portion , a plurality of weights having the same thickness made of a semiconductor are provided at substantially equal intervals on at least one surface of the mass portion via a low melting point glass thin film. An acceleration sensor characterized by being joined.
【請求項2】 半導体基板を加工して支持体に揺動自在
に支持されるマス部を形成するとともに、該支持体の表
面にゲージ抵抗を形成して成るセンサチップと、センサ
チップの両面に設けられてマス部の揺動範囲を規制する
ストッパとを備えた加速度センサにおいて、少なくとも
マス部の一面側に低融点ガラス薄膜を介して半導体から
成る重りを接合し、重りの少なくとも両端部が、マス部
の両端部又は周辺部と接合され、重りのストッパと対向
する面に凸部を形成したことを特徴とする加速度セン
サ。
2. A semiconductor substrate is processed to be freely swingable on a support.
A mass portion supported by the support and the surface of the support.
A sensor chip formed by forming a gauge resistance on the surface, and a sensor
Provided on both sides of the chip to regulate the swing range of the mass part
In an acceleration sensor having a stopper, at least
From the semiconductor through a low melting point glass thin film on one side of the mass part
The weights are joined, and at least both ends of the weight are
It is joined to both ends or the peripheral part of the and faces the stopper of the weight.
An acceleration sensor characterized in that a convex portion is formed on a surface to be formed .
JP14457498A 1998-05-26 1998-05-26 Acceleration sensor Expired - Fee Related JP3433671B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14457498A JP3433671B2 (en) 1998-05-26 1998-05-26 Acceleration sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14457498A JP3433671B2 (en) 1998-05-26 1998-05-26 Acceleration sensor

Publications (2)

Publication Number Publication Date
JPH11337570A JPH11337570A (en) 1999-12-10
JP3433671B2 true JP3433671B2 (en) 2003-08-04

Family

ID=15365356

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14457498A Expired - Fee Related JP3433671B2 (en) 1998-05-26 1998-05-26 Acceleration sensor

Country Status (1)

Country Link
JP (1) JP3433671B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014021094A (en) * 2012-07-24 2014-02-03 Seiko Epson Corp Manufacturing method for physical quantity detector, physical quantity detector, electronic apparatus and movable body

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006214743A (en) * 2005-02-01 2006-08-17 Matsushita Electric Works Ltd Semiconductor acceleration sensor
JP4848696B2 (en) * 2005-07-26 2011-12-28 パナソニック電工株式会社 Sensor module
JP4665733B2 (en) * 2005-11-25 2011-04-06 パナソニック電工株式会社 Sensor element
JP5544762B2 (en) * 2009-06-08 2014-07-09 大日本印刷株式会社 Method for manufacturing mechanical quantity sensor
JP2014153171A (en) * 2013-02-07 2014-08-25 Seiko Instruments Inc Displacement detection device and manufacturing method of the same

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JP3115862U (en) 2005-08-18 2005-11-17 トリンプ・インターナショナル・ジャパン株式会社 camisole

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3115862U (en) 2005-08-18 2005-11-17 トリンプ・インターナショナル・ジャパン株式会社 camisole

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014021094A (en) * 2012-07-24 2014-02-03 Seiko Epson Corp Manufacturing method for physical quantity detector, physical quantity detector, electronic apparatus and movable body

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