JP3435752B2 - Diamino compound and method for producing the same - Google Patents
Diamino compound and method for producing the sameInfo
- Publication number
- JP3435752B2 JP3435752B2 JP25934193A JP25934193A JP3435752B2 JP 3435752 B2 JP3435752 B2 JP 3435752B2 JP 25934193 A JP25934193 A JP 25934193A JP 25934193 A JP25934193 A JP 25934193A JP 3435752 B2 JP3435752 B2 JP 3435752B2
- Authority
- JP
- Japan
- Prior art keywords
- bis
- liquid crystal
- phenyl
- aminobenzyl
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 150000001875 compounds Chemical class 0.000 title claims description 33
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- WLHJCCUFRCTNRZ-UHFFFAOYSA-N (1-phenylcyclohexyl)benzene Chemical class C1CCCCC1(C=1C=CC=CC=1)C1=CC=CC=C1 WLHJCCUFRCTNRZ-UHFFFAOYSA-N 0.000 claims description 8
- SKDHHIUENRGTHK-UHFFFAOYSA-N 4-nitrobenzoyl chloride Chemical class [O-][N+](=O)C1=CC=C(C(Cl)=O)C=C1 SKDHHIUENRGTHK-UHFFFAOYSA-N 0.000 claims description 8
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 4
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 3
- 238000009833 condensation Methods 0.000 claims description 2
- 230000005494 condensation Effects 0.000 claims description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 68
- 239000010408 film Substances 0.000 description 40
- 239000000243 solution Substances 0.000 description 38
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 34
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 30
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 24
- 238000006243 chemical reaction Methods 0.000 description 23
- 238000000034 method Methods 0.000 description 19
- 210000004027 cell Anatomy 0.000 description 18
- 238000001816 cooling Methods 0.000 description 16
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 16
- 239000000758 substrate Substances 0.000 description 15
- 210000002858 crystal cell Anatomy 0.000 description 14
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 12
- 229920005575 poly(amic acid) Polymers 0.000 description 12
- 238000003756 stirring Methods 0.000 description 12
- 239000003054 catalyst Substances 0.000 description 11
- 239000000203 mixture Substances 0.000 description 11
- 239000002904 solvent Substances 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 10
- 206010047571 Visual impairment Diseases 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 10
- 238000000576 coating method Methods 0.000 description 10
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 9
- 239000013078 crystal Substances 0.000 description 9
- 229920001721 polyimide Polymers 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 239000004642 Polyimide Substances 0.000 description 7
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 239000004697 Polyetherimide Substances 0.000 description 6
- 238000005538 encapsulation Methods 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- 239000001257 hydrogen Substances 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 239000011259 mixed solution Substances 0.000 description 6
- 229920001601 polyetherimide Polymers 0.000 description 6
- 238000004528 spin coating Methods 0.000 description 6
- AQRLNPVMDITEJU-UHFFFAOYSA-N triethylsilane Chemical compound CC[SiH](CC)CC AQRLNPVMDITEJU-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 238000004811 liquid chromatography Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 5
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 4
- QJPHZZUBQAASNR-UHFFFAOYSA-N 4,4-diphenylcyclohexan-1-one Chemical class C1CC(=O)CCC1(C=1C=CC=CC=1)C1=CC=CC=C1 QJPHZZUBQAASNR-UHFFFAOYSA-N 0.000 description 4
- IMBDDGNKFSRAQH-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]phenyl]cyclohexyl]phenyl]methyl]aniline Chemical compound C1=CC(N)=CC=C1CC1=CC=C(C2(CCCCC2)C=2C=CC(CC=3C=CC(N)=CC=3)=CC=2)C=C1 IMBDDGNKFSRAQH-UHFFFAOYSA-N 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 4
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 239000012141 concentrate Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000007865 diluting Methods 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 230000014759 maintenance of location Effects 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 238000010926 purge Methods 0.000 description 3
- 238000001256 steam distillation Methods 0.000 description 3
- OPBHPTFZYLPAFQ-UHFFFAOYSA-N (4-butyl-1-phenylcyclohex-3-en-1-yl)benzene Chemical compound C1CC(CCCC)=CCC1(C=1C=CC=CC=1)C1=CC=CC=C1 OPBHPTFZYLPAFQ-UHFFFAOYSA-N 0.000 description 2
- JMKXDYJWNIVECB-UHFFFAOYSA-N (4-butyl-1-phenylcyclohexyl)benzene Chemical compound C1CC(CCCC)CCC1(C=1C=CC=CC=1)C1=CC=CC=C1 JMKXDYJWNIVECB-UHFFFAOYSA-N 0.000 description 2
- SSEVIEAITQMVGE-UHFFFAOYSA-N (4-butylidene-1-phenylcyclohexyl)benzene Chemical compound C1CC(=CCCC)CCC1(C=1C=CC=CC=1)C1=CC=CC=C1 SSEVIEAITQMVGE-UHFFFAOYSA-N 0.000 description 2
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 2
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 2
- OOTZSZHNDJGXTE-UHFFFAOYSA-N 1-[(4-nitrophenyl)methyl]-4-[1-[4-[(4-nitrophenyl)methyl]phenyl]cyclohexyl]benzene Chemical compound C1=CC([N+](=O)[O-])=CC=C1CC1=CC=C(C2(CCCCC2)C=2C=CC(CC=3C=CC(=CC=3)[N+]([O-])=O)=CC=2)C=C1 OOTZSZHNDJGXTE-UHFFFAOYSA-N 0.000 description 2
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- MEJQNPUKRTVBDA-UHFFFAOYSA-N 3-methylcyclobutane-1,1,2,2-tetracarboxylic acid Chemical compound CC1CC(C(O)=O)(C(O)=O)C1(C(O)=O)C(O)=O MEJQNPUKRTVBDA-UHFFFAOYSA-N 0.000 description 2
- SIBJQHOWJFPFGC-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]phenyl]-4-butylcyclohexyl]phenyl]methyl]aniline Chemical compound C1CC(CCCC)CCC1(C=1C=CC(CC=2C=CC(N)=CC=2)=CC=1)C(C=C1)=CC=C1CC1=CC=C(N)C=C1 SIBJQHOWJFPFGC-UHFFFAOYSA-N 0.000 description 2
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- UJAAQCCNKHQCKD-UHFFFAOYSA-N [4-[1-[4-(4-nitrobenzoyl)phenyl]cyclohexyl]phenyl]-(4-nitrophenyl)methanone Chemical compound C1=CC([N+](=O)[O-])=CC=C1C(=O)C1=CC=C(C2(CCCCC2)C=2C=CC(=CC=2)C(=O)C=2C=CC(=CC=2)[N+]([O-])=O)C=C1 UJAAQCCNKHQCKD-UHFFFAOYSA-N 0.000 description 2
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 2
- -1 alcohol compound Chemical class 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- GGBJHURWWWLEQH-UHFFFAOYSA-N butylcyclohexane Chemical compound CCCCC1CCCCC1 GGBJHURWWWLEQH-UHFFFAOYSA-N 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 239000003456 ion exchange resin Substances 0.000 description 2
- 229920003303 ion-exchange polymer Polymers 0.000 description 2
- MUMZUERVLWJKNR-UHFFFAOYSA-N oxoplatinum Chemical compound [Pt]=O MUMZUERVLWJKNR-UHFFFAOYSA-N 0.000 description 2
- 229910003446 platinum oxide Inorganic materials 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 239000009719 polyimide resin Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 2
- 239000000741 silica gel Substances 0.000 description 2
- 229910002027 silica gel Inorganic materials 0.000 description 2
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 2
- 235000017557 sodium bicarbonate Nutrition 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 238000010408 sweeping Methods 0.000 description 2
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- YXNQGWHETRHZNC-UHFFFAOYSA-N (1-phenyl-4-propylcyclohexyl)benzene Chemical compound C1CC(CCC)CCC1(C=1C=CC=CC=1)C1=CC=CC=C1 YXNQGWHETRHZNC-UHFFFAOYSA-N 0.000 description 1
- VZJYUYCOWVMAQR-UHFFFAOYSA-N (4-heptyl-1-phenylcyclohexyl)benzene Chemical compound C1CC(CCCCCCC)CCC1(C=1C=CC=CC=1)C1=CC=CC=C1 VZJYUYCOWVMAQR-UHFFFAOYSA-N 0.000 description 1
- YCLUJEYUNKZRKN-UHFFFAOYSA-N (4-hexyl-1-phenylcyclohexyl)benzene Chemical compound C1CC(CCCCCC)CCC1(C=1C=CC=CC=1)C1=CC=CC=C1 YCLUJEYUNKZRKN-UHFFFAOYSA-N 0.000 description 1
- ZVKVBTYICJPIPW-UHFFFAOYSA-N (4-methyl-1-phenylcyclohexyl)benzene Chemical compound C1CC(C)CCC1(C=1C=CC=CC=1)C1=CC=CC=C1 ZVKVBTYICJPIPW-UHFFFAOYSA-N 0.000 description 1
- UOIOUSYNLFKHSL-UHFFFAOYSA-N (4-octyl-1-phenylcyclohexyl)benzene Chemical compound C1CC(CCCCCCCC)CCC1(C=1C=CC=CC=1)C1=CC=CC=C1 UOIOUSYNLFKHSL-UHFFFAOYSA-N 0.000 description 1
- QIZBSHNUCZDJKO-UHFFFAOYSA-N (4-pentyl-1-phenylcyclohexyl)benzene Chemical compound C1CC(CCCCC)CCC1(C=1C=CC=CC=1)C1=CC=CC=C1 QIZBSHNUCZDJKO-UHFFFAOYSA-N 0.000 description 1
- VORHCVGDBFIAAQ-UHFFFAOYSA-N 1-[4-butyl-1-(2-ethylphenyl)cyclohexyl]-2-ethylbenzene Chemical compound C1CC(CCCC)CCC1(C=1C(=CC=CC=1)CC)C1=CC=CC=C1CC VORHCVGDBFIAAQ-UHFFFAOYSA-N 0.000 description 1
- BVBBHDFPBCKXAL-UHFFFAOYSA-N 1-[4-butyl-1-(2-fluorophenyl)cyclohexyl]-2-fluorobenzene Chemical compound C1CC(CCCC)CCC1(C=1C(=CC=CC=1)F)C1=CC=CC=C1F BVBBHDFPBCKXAL-UHFFFAOYSA-N 0.000 description 1
- IXRXDPFBEGDZJH-UHFFFAOYSA-N 1-[4-butyl-1-(2-methylphenyl)cyclohexyl]-2-methylbenzene Chemical compound C1CC(CCCC)CCC1(C=1C(=CC=CC=1)C)C1=CC=CC=C1C IXRXDPFBEGDZJH-UHFFFAOYSA-N 0.000 description 1
- RWGMVGPKCBLBPN-UHFFFAOYSA-N 1-[4-butyl-1-(2-propylphenyl)cyclohexyl]-2-propylbenzene Chemical compound C1CC(CCCC)CCC1(C=1C(=CC=CC=1)CCC)C1=CC=CC=C1CCC RWGMVGPKCBLBPN-UHFFFAOYSA-N 0.000 description 1
- YWNNLUMSAVSPNN-UHFFFAOYSA-N 1-[4-butyl-1-(3-ethylphenyl)cyclohexyl]-3-ethylbenzene Chemical compound C1CC(CCCC)CCC1(C=1C=C(CC)C=CC=1)C1=CC=CC(CC)=C1 YWNNLUMSAVSPNN-UHFFFAOYSA-N 0.000 description 1
- ZMOJUUQOGDEQGG-UHFFFAOYSA-N 1-[4-butyl-1-(3-fluorophenyl)cyclohexyl]-3-fluorobenzene Chemical compound C1CC(CCCC)CCC1(C=1C=C(F)C=CC=1)C1=CC=CC(F)=C1 ZMOJUUQOGDEQGG-UHFFFAOYSA-N 0.000 description 1
- DZNBXWXIPFVHEP-UHFFFAOYSA-N 1-[4-butyl-1-(3-methylphenyl)cyclohexyl]-3-methylbenzene Chemical compound C1CC(CCCC)CCC1(C=1C=C(C)C=CC=1)C1=CC=CC(C)=C1 DZNBXWXIPFVHEP-UHFFFAOYSA-N 0.000 description 1
- UYNOUICHKMPJMT-UHFFFAOYSA-N 1-[4-butyl-1-(3-propylphenyl)cyclohexyl]-3-propylbenzene Chemical compound C1CC(CCCC)CCC1(C=1C=C(CCC)C=CC=1)C1=CC=CC(CCC)=C1 UYNOUICHKMPJMT-UHFFFAOYSA-N 0.000 description 1
- JTKLVACMABHMQB-UHFFFAOYSA-N 1-[4-ethyl-1-(2-fluorophenyl)cyclohexyl]-2-fluorobenzene Chemical compound C1CC(CC)CCC1(C=1C(=CC=CC=1)F)C1=CC=CC=C1F JTKLVACMABHMQB-UHFFFAOYSA-N 0.000 description 1
- MAVYZKURTFFWLJ-UHFFFAOYSA-N 1-[4-ethyl-1-(2-methylphenyl)cyclohexyl]-2-methylbenzene Chemical compound C1CC(CC)CCC1(C=1C(=CC=CC=1)C)C1=CC=CC=C1C MAVYZKURTFFWLJ-UHFFFAOYSA-N 0.000 description 1
- FUDLWTYSXOAVBV-UHFFFAOYSA-N 1-[4-ethyl-1-(2-propylphenyl)cyclohexyl]-2-propylbenzene Chemical compound CCCC1=CC=CC=C1C1(C=2C(=CC=CC=2)CCC)CCC(CC)CC1 FUDLWTYSXOAVBV-UHFFFAOYSA-N 0.000 description 1
- DCEZAQDGGGGDNQ-UHFFFAOYSA-N 1-[4-ethyl-1-(3-fluorophenyl)cyclohexyl]-3-fluorobenzene Chemical compound C1CC(CC)CCC1(C=1C=C(F)C=CC=1)C1=CC=CC(F)=C1 DCEZAQDGGGGDNQ-UHFFFAOYSA-N 0.000 description 1
- VGRJVRWUKHTZMU-UHFFFAOYSA-N 1-[4-ethyl-1-(3-methylphenyl)cyclohexyl]-3-methylbenzene Chemical compound C1CC(CC)CCC1(C=1C=C(C)C=CC=1)C1=CC=CC(C)=C1 VGRJVRWUKHTZMU-UHFFFAOYSA-N 0.000 description 1
- KKXRGZIILDRDQP-UHFFFAOYSA-N 1-[4-ethyl-1-(3-propylphenyl)cyclohexyl]-3-propylbenzene Chemical compound CCCC1=CC=CC(C2(CCC(CC)CC2)C=2C=C(CCC)C=CC=2)=C1 KKXRGZIILDRDQP-UHFFFAOYSA-N 0.000 description 1
- SUAKMXVULYLWRX-UHFFFAOYSA-N 1-[4-heptyl-1-(2-methylphenyl)cyclohexyl]-2-methylbenzene Chemical compound C1CC(CCCCCCC)CCC1(C=1C(=CC=CC=1)C)C1=CC=CC=C1C SUAKMXVULYLWRX-UHFFFAOYSA-N 0.000 description 1
- UYKJOROUTGUITH-UHFFFAOYSA-N 1-[4-heptyl-1-(2-propylphenyl)cyclohexyl]-2-propylbenzene Chemical compound C1CC(CCCCCCC)CCC1(C=1C(=CC=CC=1)CCC)C1=CC=CC=C1CCC UYKJOROUTGUITH-UHFFFAOYSA-N 0.000 description 1
- LKTLHKCZMSRFQI-UHFFFAOYSA-N 1-[4-heptyl-1-(3-methylphenyl)cyclohexyl]-3-methylbenzene Chemical compound C1CC(CCCCCCC)CCC1(C=1C=C(C)C=CC=1)C1=CC=CC(C)=C1 LKTLHKCZMSRFQI-UHFFFAOYSA-N 0.000 description 1
- OTURKNXPHRECLR-UHFFFAOYSA-N 1-[4-heptyl-1-(3-propylphenyl)cyclohexyl]-3-propylbenzene Chemical compound C1CC(CCCCCCC)CCC1(C=1C=C(CCC)C=CC=1)C1=CC=CC(CCC)=C1 OTURKNXPHRECLR-UHFFFAOYSA-N 0.000 description 1
- OLCURMZSZDRZDG-UHFFFAOYSA-N 1-[4-hexyl-1-(2-methylphenyl)cyclohexyl]-2-methylbenzene Chemical compound C1CC(CCCCCC)CCC1(C=1C(=CC=CC=1)C)C1=CC=CC=C1C OLCURMZSZDRZDG-UHFFFAOYSA-N 0.000 description 1
- FCZQUWGFGDMZBO-UHFFFAOYSA-N 1-[4-hexyl-1-(2-propylphenyl)cyclohexyl]-2-propylbenzene Chemical compound C1CC(CCCCCC)CCC1(C=1C(=CC=CC=1)CCC)C1=CC=CC=C1CCC FCZQUWGFGDMZBO-UHFFFAOYSA-N 0.000 description 1
- WBIAJVKVXVHAAH-UHFFFAOYSA-N 1-[4-hexyl-1-(3-methylphenyl)cyclohexyl]-3-methylbenzene Chemical compound C1CC(CCCCCC)CCC1(C=1C=C(C)C=CC=1)C1=CC=CC(C)=C1 WBIAJVKVXVHAAH-UHFFFAOYSA-N 0.000 description 1
- NZBVCLLJPVSYBB-UHFFFAOYSA-N 1-[4-hexyl-1-(3-propylphenyl)cyclohexyl]-3-propylbenzene Chemical compound C1CC(CCCCCC)CCC1(C=1C=C(CCC)C=CC=1)C1=CC=CC(CCC)=C1 NZBVCLLJPVSYBB-UHFFFAOYSA-N 0.000 description 1
- BPMMVKIHKCNKJX-UHFFFAOYSA-N 1-[4-methyl-1-(2-propylphenyl)cyclohexyl]-2-propylbenzene Chemical compound CCCC1=CC=CC=C1C1(C=2C(=CC=CC=2)CCC)CCC(C)CC1 BPMMVKIHKCNKJX-UHFFFAOYSA-N 0.000 description 1
- PBTGVCFMXVOWNQ-UHFFFAOYSA-N 1-[4-methyl-1-(3-propylphenyl)cyclohexyl]-3-propylbenzene Chemical compound CCCC1=CC=CC(C2(CCC(C)CC2)C=2C=C(CCC)C=CC=2)=C1 PBTGVCFMXVOWNQ-UHFFFAOYSA-N 0.000 description 1
- ZPZZURISIJHLDW-UHFFFAOYSA-N 1-[4-octyl-1-(2-propylphenyl)cyclohexyl]-2-propylbenzene Chemical compound C1CC(CCCCCCCC)CCC1(C=1C(=CC=CC=1)CCC)C1=CC=CC=C1CCC ZPZZURISIJHLDW-UHFFFAOYSA-N 0.000 description 1
- GUJXCJMVYUBGKZ-UHFFFAOYSA-N 1-[4-octyl-1-(3-propylphenyl)cyclohexyl]-3-propylbenzene Chemical compound C1CC(CCCCCCCC)CCC1(C=1C=C(CCC)C=CC=1)C1=CC=CC(CCC)=C1 GUJXCJMVYUBGKZ-UHFFFAOYSA-N 0.000 description 1
- RGLMAWIGRQQWLU-UHFFFAOYSA-N 1-[4-pentyl-1-(2-propylphenyl)cyclohexyl]-2-propylbenzene Chemical compound C1CC(CCCCC)CCC1(C=1C(=CC=CC=1)CCC)C1=CC=CC=C1CCC RGLMAWIGRQQWLU-UHFFFAOYSA-N 0.000 description 1
- QVMDTKRKCGJUAX-UHFFFAOYSA-N 1-[4-pentyl-1-(3-propylphenyl)cyclohexyl]-3-propylbenzene Chemical compound C1CC(CCCCC)CCC1(C=1C=C(CCC)C=CC=1)C1=CC=CC(CCC)=C1 QVMDTKRKCGJUAX-UHFFFAOYSA-N 0.000 description 1
- MXUBNCJIUURODD-UHFFFAOYSA-N 1-ethyl-2-[1-(2-ethylphenyl)-4-heptylcyclohexyl]benzene Chemical compound C1CC(CCCCCCC)CCC1(C=1C(=CC=CC=1)CC)C1=CC=CC=C1CC MXUBNCJIUURODD-UHFFFAOYSA-N 0.000 description 1
- FJJAUDQSYHRYGS-UHFFFAOYSA-N 1-ethyl-2-[1-(2-ethylphenyl)-4-hexylcyclohexyl]benzene Chemical compound C1CC(CCCCCC)CCC1(C=1C(=CC=CC=1)CC)C1=CC=CC=C1CC FJJAUDQSYHRYGS-UHFFFAOYSA-N 0.000 description 1
- RPERAIWWUQWIAQ-UHFFFAOYSA-N 1-ethyl-2-[1-(2-ethylphenyl)-4-methylcyclohexyl]benzene Chemical compound CCC1=CC=CC=C1C1(C=2C(=CC=CC=2)CC)CCC(C)CC1 RPERAIWWUQWIAQ-UHFFFAOYSA-N 0.000 description 1
- URCSIMDWSARLPK-UHFFFAOYSA-N 1-ethyl-2-[1-(2-ethylphenyl)-4-octylcyclohexyl]benzene Chemical compound C1CC(CCCCCCCC)CCC1(C=1C(=CC=CC=1)CC)C1=CC=CC=C1CC URCSIMDWSARLPK-UHFFFAOYSA-N 0.000 description 1
- OMEGMGCKHFNDJS-UHFFFAOYSA-N 1-ethyl-2-[1-(2-ethylphenyl)-4-pentylcyclohexyl]benzene Chemical compound C1CC(CCCCC)CCC1(C=1C(=CC=CC=1)CC)C1=CC=CC=C1CC OMEGMGCKHFNDJS-UHFFFAOYSA-N 0.000 description 1
- IFWKTQZQIVAQHO-UHFFFAOYSA-N 1-ethyl-2-[1-(2-ethylphenyl)-4-propylcyclohexyl]benzene Chemical compound C1CC(CCC)CCC1(C=1C(=CC=CC=1)CC)C1=CC=CC=C1CC IFWKTQZQIVAQHO-UHFFFAOYSA-N 0.000 description 1
- RMMHMDDKXDZMOX-UHFFFAOYSA-N 1-ethyl-2-[1-(2-ethylphenyl)cyclohexyl]benzene Chemical compound CCC1=CC=CC=C1C1(C=2C(=CC=CC=2)CC)CCCCC1 RMMHMDDKXDZMOX-UHFFFAOYSA-N 0.000 description 1
- VSMPLRQWNGXGHU-UHFFFAOYSA-N 1-ethyl-2-[4-ethyl-1-(2-ethylphenyl)cyclohexyl]benzene Chemical compound C1CC(CC)CCC1(C=1C(=CC=CC=1)CC)C1=CC=CC=C1CC VSMPLRQWNGXGHU-UHFFFAOYSA-N 0.000 description 1
- OWVCXTUJEWANSB-UHFFFAOYSA-N 1-ethyl-3-[1-(3-ethylphenyl)-4-heptylcyclohexyl]benzene Chemical compound C1CC(CCCCCCC)CCC1(C=1C=C(CC)C=CC=1)C1=CC=CC(CC)=C1 OWVCXTUJEWANSB-UHFFFAOYSA-N 0.000 description 1
- NGZBJDOKVQTHCA-UHFFFAOYSA-N 1-ethyl-3-[1-(3-ethylphenyl)-4-hexylcyclohexyl]benzene Chemical compound C1CC(CCCCCC)CCC1(C=1C=C(CC)C=CC=1)C1=CC=CC(CC)=C1 NGZBJDOKVQTHCA-UHFFFAOYSA-N 0.000 description 1
- MEDOWXJGFCHEKO-UHFFFAOYSA-N 1-ethyl-3-[1-(3-ethylphenyl)-4-methylcyclohexyl]benzene Chemical compound CCC1=CC=CC(C2(CCC(C)CC2)C=2C=C(CC)C=CC=2)=C1 MEDOWXJGFCHEKO-UHFFFAOYSA-N 0.000 description 1
- SWFFIGYQSQAOLY-UHFFFAOYSA-N 1-ethyl-3-[1-(3-ethylphenyl)-4-octylcyclohexyl]benzene Chemical compound C1CC(CCCCCCCC)CCC1(C=1C=C(CC)C=CC=1)C1=CC=CC(CC)=C1 SWFFIGYQSQAOLY-UHFFFAOYSA-N 0.000 description 1
- UHIXPNVCQPFJFN-UHFFFAOYSA-N 1-ethyl-3-[1-(3-ethylphenyl)-4-pentylcyclohexyl]benzene Chemical compound C1CC(CCCCC)CCC1(C=1C=C(CC)C=CC=1)C1=CC=CC(CC)=C1 UHIXPNVCQPFJFN-UHFFFAOYSA-N 0.000 description 1
- MHFLIRIGVIIIMT-UHFFFAOYSA-N 1-ethyl-3-[1-(3-ethylphenyl)-4-propylcyclohexyl]benzene Chemical compound C1CC(CCC)CCC1(C=1C=C(CC)C=CC=1)C1=CC=CC(CC)=C1 MHFLIRIGVIIIMT-UHFFFAOYSA-N 0.000 description 1
- IGPUYOKGMRCPMM-UHFFFAOYSA-N 1-ethyl-3-[1-(3-ethylphenyl)cyclohexyl]benzene Chemical compound CCC1=CC=CC(C2(CCCCC2)C=2C=C(CC)C=CC=2)=C1 IGPUYOKGMRCPMM-UHFFFAOYSA-N 0.000 description 1
- CYGLRWFNQWHWNA-UHFFFAOYSA-N 1-ethyl-3-[4-ethyl-1-(3-ethylphenyl)cyclohexyl]benzene Chemical compound C1CC(CC)CCC1(C=1C=C(CC)C=CC=1)C1=CC=CC(CC)=C1 CYGLRWFNQWHWNA-UHFFFAOYSA-N 0.000 description 1
- RWUWRQSKLLSNGV-UHFFFAOYSA-N 1-fluoro-2-[1-(2-fluorophenyl)-4-heptylcyclohexyl]benzene Chemical compound C1CC(CCCCCCC)CCC1(C=1C(=CC=CC=1)F)C1=CC=CC=C1F RWUWRQSKLLSNGV-UHFFFAOYSA-N 0.000 description 1
- JMOKAMBGACFKJX-UHFFFAOYSA-N 1-fluoro-2-[1-(2-fluorophenyl)-4-hexylcyclohexyl]benzene Chemical compound C1CC(CCCCCC)CCC1(C=1C(=CC=CC=1)F)C1=CC=CC=C1F JMOKAMBGACFKJX-UHFFFAOYSA-N 0.000 description 1
- YVHNCVDOUDAKBT-UHFFFAOYSA-N 1-fluoro-2-[1-(2-fluorophenyl)-4-methylcyclohexyl]benzene Chemical compound C1CC(C)CCC1(C=1C(=CC=CC=1)F)C1=CC=CC=C1F YVHNCVDOUDAKBT-UHFFFAOYSA-N 0.000 description 1
- VTXZGSSVMMROND-UHFFFAOYSA-N 1-fluoro-2-[1-(2-fluorophenyl)-4-octylcyclohexyl]benzene Chemical compound C1CC(CCCCCCCC)CCC1(C=1C(=CC=CC=1)F)C1=CC=CC=C1F VTXZGSSVMMROND-UHFFFAOYSA-N 0.000 description 1
- JOIAMTWVUZJVCA-UHFFFAOYSA-N 1-fluoro-2-[1-(2-fluorophenyl)-4-pentylcyclohexyl]benzene Chemical compound C1CC(CCCCC)CCC1(C=1C(=CC=CC=1)F)C1=CC=CC=C1F JOIAMTWVUZJVCA-UHFFFAOYSA-N 0.000 description 1
- AUUALWIZOUKUSU-UHFFFAOYSA-N 1-fluoro-2-[1-(2-fluorophenyl)-4-propylcyclohexyl]benzene Chemical compound C1CC(CCC)CCC1(C=1C(=CC=CC=1)F)C1=CC=CC=C1F AUUALWIZOUKUSU-UHFFFAOYSA-N 0.000 description 1
- OFOWQQZXUZFIJQ-UHFFFAOYSA-N 1-fluoro-2-[1-(2-fluorophenyl)cyclohexyl]benzene Chemical compound FC1=CC=CC=C1C1(C=2C(=CC=CC=2)F)CCCCC1 OFOWQQZXUZFIJQ-UHFFFAOYSA-N 0.000 description 1
- ITJINJFOGXNXDL-UHFFFAOYSA-N 1-fluoro-3-[1-(3-fluorophenyl)-4-heptylcyclohexyl]benzene Chemical compound C1CC(CCCCCCC)CCC1(C=1C=C(F)C=CC=1)C1=CC=CC(F)=C1 ITJINJFOGXNXDL-UHFFFAOYSA-N 0.000 description 1
- MIACEOSSXODTKN-UHFFFAOYSA-N 1-fluoro-3-[1-(3-fluorophenyl)-4-hexylcyclohexyl]benzene Chemical compound C1CC(CCCCCC)CCC1(C=1C=C(F)C=CC=1)C1=CC=CC(F)=C1 MIACEOSSXODTKN-UHFFFAOYSA-N 0.000 description 1
- ZZNLEGIRHIOFQC-UHFFFAOYSA-N 1-fluoro-3-[1-(3-fluorophenyl)-4-methylcyclohexyl]benzene Chemical compound C1CC(C)CCC1(C=1C=C(F)C=CC=1)C1=CC=CC(F)=C1 ZZNLEGIRHIOFQC-UHFFFAOYSA-N 0.000 description 1
- AXOPXEYXYVZMIG-UHFFFAOYSA-N 1-fluoro-3-[1-(3-fluorophenyl)-4-octylcyclohexyl]benzene Chemical compound C1CC(CCCCCCCC)CCC1(C=1C=C(F)C=CC=1)C1=CC=CC(F)=C1 AXOPXEYXYVZMIG-UHFFFAOYSA-N 0.000 description 1
- QXHFTKANGMQNOR-UHFFFAOYSA-N 1-fluoro-3-[1-(3-fluorophenyl)-4-pentylcyclohexyl]benzene Chemical compound C1CC(CCCCC)CCC1(C=1C=C(F)C=CC=1)C1=CC=CC(F)=C1 QXHFTKANGMQNOR-UHFFFAOYSA-N 0.000 description 1
- ZDGAIIJNWUABHR-UHFFFAOYSA-N 1-fluoro-3-[1-(3-fluorophenyl)-4-propylcyclohexyl]benzene Chemical compound C1CC(CCC)CCC1(C=1C=C(F)C=CC=1)C1=CC=CC(F)=C1 ZDGAIIJNWUABHR-UHFFFAOYSA-N 0.000 description 1
- IKNSWYMBFRTTSH-UHFFFAOYSA-N 1-fluoro-3-[1-(3-fluorophenyl)cyclohexyl]benzene Chemical compound FC1=CC=CC(C2(CCCCC2)C=2C=C(F)C=CC=2)=C1 IKNSWYMBFRTTSH-UHFFFAOYSA-N 0.000 description 1
- JVYQTFLZLWKBDQ-UHFFFAOYSA-N 1-methyl-2-[1-(2-methylphenyl)-4-octylcyclohexyl]benzene Chemical compound C1CC(CCCCCCCC)CCC1(C=1C(=CC=CC=1)C)C1=CC=CC=C1C JVYQTFLZLWKBDQ-UHFFFAOYSA-N 0.000 description 1
- XGPCGEGKVHQLQJ-UHFFFAOYSA-N 1-methyl-2-[1-(2-methylphenyl)-4-pentylcyclohexyl]benzene Chemical compound C1CC(CCCCC)CCC1(C=1C(=CC=CC=1)C)C1=CC=CC=C1C XGPCGEGKVHQLQJ-UHFFFAOYSA-N 0.000 description 1
- FYSDEXHZSMTLKL-UHFFFAOYSA-N 1-methyl-2-[1-(2-methylphenyl)-4-propylcyclohexyl]benzene Chemical compound C1CC(CCC)CCC1(C=1C(=CC=CC=1)C)C1=CC=CC=C1C FYSDEXHZSMTLKL-UHFFFAOYSA-N 0.000 description 1
- LQPWCUVQPKKNCY-UHFFFAOYSA-N 1-methyl-2-[1-(2-methylphenyl)cyclohexyl]benzene Chemical compound CC1=CC=CC=C1C1(C=2C(=CC=CC=2)C)CCCCC1 LQPWCUVQPKKNCY-UHFFFAOYSA-N 0.000 description 1
- NIPWURNMBYRRPS-UHFFFAOYSA-N 1-methyl-2-[4-methyl-1-(2-methylphenyl)cyclohexyl]benzene Chemical compound C1CC(C)CCC1(C=1C(=CC=CC=1)C)C1=CC=CC=C1C NIPWURNMBYRRPS-UHFFFAOYSA-N 0.000 description 1
- WNZXMBMXQARLLZ-UHFFFAOYSA-N 1-methyl-3-[1-(3-methylphenyl)-4-octylcyclohexyl]benzene Chemical compound C1CC(CCCCCCCC)CCC1(C=1C=C(C)C=CC=1)C1=CC=CC(C)=C1 WNZXMBMXQARLLZ-UHFFFAOYSA-N 0.000 description 1
- URFZSQAYNHFUBT-UHFFFAOYSA-N 1-methyl-3-[1-(3-methylphenyl)-4-pentylcyclohexyl]benzene Chemical compound C1CC(CCCCC)CCC1(C=1C=C(C)C=CC=1)C1=CC=CC(C)=C1 URFZSQAYNHFUBT-UHFFFAOYSA-N 0.000 description 1
- SQPMLKYTQDYTPO-UHFFFAOYSA-N 1-methyl-3-[1-(3-methylphenyl)-4-propylcyclohexyl]benzene Chemical compound C1CC(CCC)CCC1(C=1C=C(C)C=CC=1)C1=CC=CC(C)=C1 SQPMLKYTQDYTPO-UHFFFAOYSA-N 0.000 description 1
- VLLCKZRVRVCQSD-UHFFFAOYSA-N 1-methyl-3-[1-(3-methylphenyl)cyclohexyl]benzene Chemical compound CC1=CC=CC(C2(CCCCC2)C=2C=C(C)C=CC=2)=C1 VLLCKZRVRVCQSD-UHFFFAOYSA-N 0.000 description 1
- HHOMYDRHGJWSTB-UHFFFAOYSA-N 1-methyl-3-[4-methyl-1-(3-methylphenyl)cyclohexyl]benzene Chemical compound C1CC(C)CCC1(C=1C=C(C)C=CC=1)C1=CC=CC(C)=C1 HHOMYDRHGJWSTB-UHFFFAOYSA-N 0.000 description 1
- IRIAJRVJQNRUIQ-UHFFFAOYSA-N 1-propyl-2-[1-(2-propylphenyl)cyclohexyl]benzene Chemical compound CCCC1=CC=CC=C1C1(C=2C(=CC=CC=2)CCC)CCCCC1 IRIAJRVJQNRUIQ-UHFFFAOYSA-N 0.000 description 1
- UBIXIMDDGLQBHP-UHFFFAOYSA-N 1-propyl-2-[4-propyl-1-(2-propylphenyl)cyclohexyl]benzene Chemical compound C1CC(CCC)CCC1(C=1C(=CC=CC=1)CCC)C1=CC=CC=C1CCC UBIXIMDDGLQBHP-UHFFFAOYSA-N 0.000 description 1
- CWYLZRJMXFYDDN-UHFFFAOYSA-N 1-propyl-3-[1-(3-propylphenyl)cyclohexyl]benzene Chemical compound CCCC1=CC=CC(C2(CCCCC2)C=2C=C(CCC)C=CC=2)=C1 CWYLZRJMXFYDDN-UHFFFAOYSA-N 0.000 description 1
- FTNPIYMWDDYRQU-UHFFFAOYSA-N 1-propyl-3-[4-propyl-1-(3-propylphenyl)cyclohexyl]benzene Chemical compound C1CC(CCC)CCC1(C=1C=C(CCC)C=CC=1)C1=CC=CC(CCC)=C1 FTNPIYMWDDYRQU-UHFFFAOYSA-N 0.000 description 1
- GCIAWCGKMWRBFM-UHFFFAOYSA-N 2-ethyl-4-nitrobenzoyl chloride Chemical compound CCC1=CC([N+]([O-])=O)=CC=C1C(Cl)=O GCIAWCGKMWRBFM-UHFFFAOYSA-N 0.000 description 1
- BUBMAUUSVWQBMS-UHFFFAOYSA-N 2-fluoro-4-nitrobenzoyl chloride Chemical compound [O-][N+](=O)C1=CC=C(C(Cl)=O)C(F)=C1 BUBMAUUSVWQBMS-UHFFFAOYSA-N 0.000 description 1
- LMDIDOFTXQERLH-UHFFFAOYSA-N 2-methyl-4-nitrobenzoyl chloride Chemical compound CC1=CC([N+]([O-])=O)=CC=C1C(Cl)=O LMDIDOFTXQERLH-UHFFFAOYSA-N 0.000 description 1
- MCUJXGFZTXZVAQ-UHFFFAOYSA-N 3-ethyl-4-nitrobenzoyl chloride Chemical compound CCC1=CC(C(Cl)=O)=CC=C1[N+]([O-])=O MCUJXGFZTXZVAQ-UHFFFAOYSA-N 0.000 description 1
- DPAMLESDGWVDBW-UHFFFAOYSA-N 3-fluoro-4-nitrobenzoyl chloride Chemical compound [O-][N+](=O)C1=CC=C(C(Cl)=O)C=C1F DPAMLESDGWVDBW-UHFFFAOYSA-N 0.000 description 1
- DUEGOHNPUBPUIV-UHFFFAOYSA-N 3-methyl-4-nitrobenzoyl chloride Chemical compound CC1=CC(C(Cl)=O)=CC=C1[N+]([O-])=O DUEGOHNPUBPUIV-UHFFFAOYSA-N 0.000 description 1
- VIDPINWAGZKWJR-UHFFFAOYSA-N 4-(4,4-diaminocyclohexa-1,5-dien-1-yl)oxycyclohexa-2,4-diene-1,1-diamine Chemical compound C1=CC(N)(N)CC=C1OC1=CCC(N)(N)C=C1 VIDPINWAGZKWJR-UHFFFAOYSA-N 0.000 description 1
- KHYXYOGWAIYVBD-UHFFFAOYSA-N 4-(4-propylphenoxy)aniline Chemical compound C1=CC(CCC)=CC=C1OC1=CC=C(N)C=C1 KHYXYOGWAIYVBD-UHFFFAOYSA-N 0.000 description 1
- GEJTWKRTAUCTQL-UHFFFAOYSA-N 4-[(4-cyclohexylphenyl)methyl]aniline Chemical class C1=CC(N)=CC=C1CC1=CC=C(C2CCCCC2)C=C1 GEJTWKRTAUCTQL-UHFFFAOYSA-N 0.000 description 1
- KMKWGXGSGPYISJ-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=CC(N)=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=C(N)C=C1 KMKWGXGSGPYISJ-UHFFFAOYSA-N 0.000 description 1
- AQKHTMZODDWPHJ-UHFFFAOYSA-N 4-[[4-(4-methylcyclohexyl)phenyl]methyl]aniline Chemical compound C1CC(C)CCC1C(C=C1)=CC=C1CC1=CC=C(N)C=C1 AQKHTMZODDWPHJ-UHFFFAOYSA-N 0.000 description 1
- JDSVFSNABNJAJL-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-amino-3-ethylphenyl)methyl]phenyl]-4-methylcyclohexyl]phenyl]methyl]-2-ethylaniline Chemical compound C1=C(N)C(CC)=CC(CC=2C=CC(=CC=2)C2(CCC(C)CC2)C=2C=CC(CC=3C=C(CC)C(N)=CC=3)=CC=2)=C1 JDSVFSNABNJAJL-UHFFFAOYSA-N 0.000 description 1
- ULEBHJSDTVVVNT-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-amino-3-ethylphenyl)methyl]phenyl]-4-propylcyclohexyl]phenyl]methyl]-2-ethylaniline Chemical compound C1CC(CCC)CCC1(C=1C=CC(CC=2C=C(CC)C(N)=CC=2)=CC=1)C(C=C1)=CC=C1CC1=CC=C(N)C(CC)=C1 ULEBHJSDTVVVNT-UHFFFAOYSA-N 0.000 description 1
- BYCORGRJCLCQQR-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-amino-3-ethylphenyl)methyl]phenyl]cyclohexyl]phenyl]methyl]-2-ethylaniline Chemical compound C1=C(N)C(CC)=CC(CC=2C=CC(=CC=2)C2(CCCCC2)C=2C=CC(CC=3C=C(CC)C(N)=CC=3)=CC=2)=C1 BYCORGRJCLCQQR-UHFFFAOYSA-N 0.000 description 1
- ZFEHLQWARIICSR-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-amino-3-fluorophenyl)methyl]phenyl]-4-methylcyclohexyl]phenyl]methyl]-2-fluoroaniline Chemical compound C1CC(C)CCC1(C=1C=CC(CC=2C=C(F)C(N)=CC=2)=CC=1)C(C=C1)=CC=C1CC1=CC=C(N)C(F)=C1 ZFEHLQWARIICSR-UHFFFAOYSA-N 0.000 description 1
- SPNHOALWOCLPQP-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-amino-3-fluorophenyl)methyl]phenyl]-4-propylcyclohexyl]phenyl]methyl]-2-fluoroaniline Chemical compound C1CC(CCC)CCC1(C=1C=CC(CC=2C=C(F)C(N)=CC=2)=CC=1)C(C=C1)=CC=C1CC1=CC=C(N)C(F)=C1 SPNHOALWOCLPQP-UHFFFAOYSA-N 0.000 description 1
- YPWNZHFSFHQSQB-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-amino-3-fluorophenyl)methyl]phenyl]cyclohexyl]phenyl]methyl]-2-fluoroaniline Chemical compound C1=C(F)C(N)=CC=C1CC1=CC=C(C2(CCCCC2)C=2C=CC(CC=3C=C(F)C(N)=CC=3)=CC=2)C=C1 YPWNZHFSFHQSQB-UHFFFAOYSA-N 0.000 description 1
- JYRDTJJWTPJXQK-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-amino-3-methylphenyl)methyl]phenyl]-4-butylcyclohexyl]phenyl]methyl]-2-methylaniline Chemical compound C1CC(CCCC)CCC1(C=1C=CC(CC=2C=C(C)C(N)=CC=2)=CC=1)C(C=C1)=CC=C1CC1=CC=C(N)C(C)=C1 JYRDTJJWTPJXQK-UHFFFAOYSA-N 0.000 description 1
- ZXYPLQLEKNDKOM-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-amino-3-methylphenyl)methyl]phenyl]-4-ethylcyclohexyl]phenyl]methyl]-2-methylaniline Chemical compound C1CC(CC)CCC1(C=1C=CC(CC=2C=C(C)C(N)=CC=2)=CC=1)C(C=C1)=CC=C1CC1=CC=C(N)C(C)=C1 ZXYPLQLEKNDKOM-UHFFFAOYSA-N 0.000 description 1
- VVDRQCSZBDNYOB-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-amino-3-methylphenyl)methyl]phenyl]-4-heptylcyclohexyl]phenyl]methyl]-2-methylaniline Chemical compound C1CC(CCCCCCC)CCC1(C=1C=CC(CC=2C=C(C)C(N)=CC=2)=CC=1)C(C=C1)=CC=C1CC1=CC=C(N)C(C)=C1 VVDRQCSZBDNYOB-UHFFFAOYSA-N 0.000 description 1
- FGEYRHBMPJHAFS-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-amino-3-methylphenyl)methyl]phenyl]-4-hexylcyclohexyl]phenyl]methyl]-2-methylaniline Chemical compound C1CC(CCCCCC)CCC1(C=1C=CC(CC=2C=C(C)C(N)=CC=2)=CC=1)C(C=C1)=CC=C1CC1=CC=C(N)C(C)=C1 FGEYRHBMPJHAFS-UHFFFAOYSA-N 0.000 description 1
- ZRCPHDFTAQTQKB-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-amino-3-methylphenyl)methyl]phenyl]-4-methylcyclohexyl]phenyl]methyl]-2-methylaniline Chemical compound C1CC(C)CCC1(C=1C=CC(CC=2C=C(C)C(N)=CC=2)=CC=1)C(C=C1)=CC=C1CC1=CC=C(N)C(C)=C1 ZRCPHDFTAQTQKB-UHFFFAOYSA-N 0.000 description 1
- QCPKKVFWAXQZJS-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-amino-3-methylphenyl)methyl]phenyl]-4-octylcyclohexyl]phenyl]methyl]-2-methylaniline Chemical compound C1CC(CCCCCCCC)CCC1(C=1C=CC(CC=2C=C(C)C(N)=CC=2)=CC=1)C(C=C1)=CC=C1CC1=CC=C(N)C(C)=C1 QCPKKVFWAXQZJS-UHFFFAOYSA-N 0.000 description 1
- VWGDSNFXDPOYJR-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-amino-3-methylphenyl)methyl]phenyl]-4-pentylcyclohexyl]phenyl]methyl]-2-methylaniline Chemical compound C1CC(CCCCC)CCC1(C=1C=CC(CC=2C=C(C)C(N)=CC=2)=CC=1)C(C=C1)=CC=C1CC1=CC=C(N)C(C)=C1 VWGDSNFXDPOYJR-UHFFFAOYSA-N 0.000 description 1
- CWVYRZUIDLNKGI-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-amino-3-methylphenyl)methyl]phenyl]-4-propylcyclohexyl]phenyl]methyl]-2-methylaniline Chemical compound C1CC(CCC)CCC1(C=1C=CC(CC=2C=C(C)C(N)=CC=2)=CC=1)C(C=C1)=CC=C1CC1=CC=C(N)C(C)=C1 CWVYRZUIDLNKGI-UHFFFAOYSA-N 0.000 description 1
- FGCZQQFBQXISNO-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-amino-3-methylphenyl)methyl]phenyl]cyclohexyl]phenyl]methyl]-2-methylaniline Chemical compound C1=C(N)C(C)=CC(CC=2C=CC(=CC=2)C2(CCCCC2)C=2C=CC(CC=3C=C(C)C(N)=CC=3)=CC=2)=C1 FGCZQQFBQXISNO-UHFFFAOYSA-N 0.000 description 1
- XOKFXSBLORMSPD-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-amino-3-propylphenyl)methyl]phenyl]-4-methylcyclohexyl]phenyl]methyl]-2-propylaniline Chemical compound C1=C(N)C(CCC)=CC(CC=2C=CC(=CC=2)C2(CCC(C)CC2)C=2C=CC(CC=3C=C(CCC)C(N)=CC=3)=CC=2)=C1 XOKFXSBLORMSPD-UHFFFAOYSA-N 0.000 description 1
- XOWZIHPRHSHWJN-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-amino-3-propylphenyl)methyl]phenyl]-4-propylcyclohexyl]phenyl]methyl]-2-propylaniline Chemical compound C1CC(CCC)CCC1(C=1C=CC(CC=2C=C(CCC)C(N)=CC=2)=CC=1)C(C=C1)=CC=C1CC1=CC=C(N)C(CCC)=C1 XOWZIHPRHSHWJN-UHFFFAOYSA-N 0.000 description 1
- LGMLBNJIZHEASF-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-amino-3-propylphenyl)methyl]phenyl]cyclohexyl]phenyl]methyl]-2-propylaniline Chemical compound C1=C(N)C(CCC)=CC(CC=2C=CC(=CC=2)C2(CCCCC2)C=2C=CC(CC=3C=C(CCC)C(N)=CC=3)=CC=2)=C1 LGMLBNJIZHEASF-UHFFFAOYSA-N 0.000 description 1
- VMCTYDVKMBDOKM-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]-2-methylphenyl]-4-butylcyclohexyl]-3-methylphenyl]methyl]aniline Chemical compound C1CC(CCCC)CCC1(C=1C(=CC(CC=2C=CC(N)=CC=2)=CC=1)C)C(C(=C1)C)=CC=C1CC1=CC=C(N)C=C1 VMCTYDVKMBDOKM-UHFFFAOYSA-N 0.000 description 1
- LOVNOUYQBDWHSJ-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]-2-methylphenyl]-4-ethylcyclohexyl]-3-methylphenyl]methyl]aniline Chemical compound C1CC(CC)CCC1(C=1C(=CC(CC=2C=CC(N)=CC=2)=CC=1)C)C(C(=C1)C)=CC=C1CC1=CC=C(N)C=C1 LOVNOUYQBDWHSJ-UHFFFAOYSA-N 0.000 description 1
- FBWXXPWASXDBKA-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]-2-methylphenyl]-4-heptylcyclohexyl]-3-methylphenyl]methyl]aniline Chemical compound C1CC(CCCCCCC)CCC1(C=1C(=CC(CC=2C=CC(N)=CC=2)=CC=1)C)C(C(=C1)C)=CC=C1CC1=CC=C(N)C=C1 FBWXXPWASXDBKA-UHFFFAOYSA-N 0.000 description 1
- LMKRHBGKOJTMEV-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]-2-methylphenyl]-4-hexylcyclohexyl]-3-methylphenyl]methyl]aniline Chemical compound C1CC(CCCCCC)CCC1(C=1C(=CC(CC=2C=CC(N)=CC=2)=CC=1)C)C(C(=C1)C)=CC=C1CC1=CC=C(N)C=C1 LMKRHBGKOJTMEV-UHFFFAOYSA-N 0.000 description 1
- VCTRYTDLRFGMSI-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]-2-methylphenyl]-4-methylcyclohexyl]-3-methylphenyl]methyl]aniline Chemical compound C1CC(C)CCC1(C=1C(=CC(CC=2C=CC(N)=CC=2)=CC=1)C)C(C(=C1)C)=CC=C1CC1=CC=C(N)C=C1 VCTRYTDLRFGMSI-UHFFFAOYSA-N 0.000 description 1
- VNZHJYKDDGMHDH-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]-2-methylphenyl]-4-octylcyclohexyl]-3-methylphenyl]methyl]aniline Chemical compound C1CC(CCCCCCCC)CCC1(C=1C(=CC(CC=2C=CC(N)=CC=2)=CC=1)C)C(C(=C1)C)=CC=C1CC1=CC=C(N)C=C1 VNZHJYKDDGMHDH-UHFFFAOYSA-N 0.000 description 1
- KNXDPORRTLMREY-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]-2-methylphenyl]-4-pentylcyclohexyl]-3-methylphenyl]methyl]aniline Chemical compound C1CC(CCCCC)CCC1(C=1C(=CC(CC=2C=CC(N)=CC=2)=CC=1)C)C(C(=C1)C)=CC=C1CC1=CC=C(N)C=C1 KNXDPORRTLMREY-UHFFFAOYSA-N 0.000 description 1
- QBUNYFZPYDKQMS-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]-2-methylphenyl]-4-propylcyclohexyl]-3-methylphenyl]methyl]aniline Chemical compound C1CC(CCC)CCC1(C=1C(=CC(CC=2C=CC(N)=CC=2)=CC=1)C)C(C(=C1)C)=CC=C1CC1=CC=C(N)C=C1 QBUNYFZPYDKQMS-UHFFFAOYSA-N 0.000 description 1
- ZFFFBCRJIGPPBM-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]-3-ethylphenyl]-4-ethylcyclohexyl]-2-ethylphenyl]methyl]aniline Chemical compound C1CC(CC)CCC1(C=1C=C(CC)C(CC=2C=CC(N)=CC=2)=CC=1)C(C=C1CC)=CC=C1CC1=CC=C(N)C=C1 ZFFFBCRJIGPPBM-UHFFFAOYSA-N 0.000 description 1
- HTUZRVBITABSSQ-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]-3-ethylphenyl]-4-methylcyclohexyl]-2-ethylphenyl]methyl]aniline Chemical compound CCC1=CC(C2(CCC(C)CC2)C=2C=C(CC)C(CC=3C=CC(N)=CC=3)=CC=2)=CC=C1CC1=CC=C(N)C=C1 HTUZRVBITABSSQ-UHFFFAOYSA-N 0.000 description 1
- SREJARORTGYXDG-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]-3-ethylphenyl]-4-propylcyclohexyl]-2-ethylphenyl]methyl]aniline Chemical compound C1CC(CCC)CCC1(C=1C=C(CC)C(CC=2C=CC(N)=CC=2)=CC=1)C(C=C1CC)=CC=C1CC1=CC=C(N)C=C1 SREJARORTGYXDG-UHFFFAOYSA-N 0.000 description 1
- DENXNIPSDAXSED-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]-3-ethylphenyl]cyclohexyl]-2-ethylphenyl]methyl]aniline Chemical compound CCC1=CC(C2(CCCCC2)C=2C=C(CC)C(CC=3C=CC(N)=CC=3)=CC=2)=CC=C1CC1=CC=C(N)C=C1 DENXNIPSDAXSED-UHFFFAOYSA-N 0.000 description 1
- SWPYPHCYNWMWHZ-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]-3-fluorophenyl]-4-ethylcyclohexyl]-2-fluorophenyl]methyl]aniline Chemical compound C1CC(CC)CCC1(C=1C=C(F)C(CC=2C=CC(N)=CC=2)=CC=1)C(C=C1F)=CC=C1CC1=CC=C(N)C=C1 SWPYPHCYNWMWHZ-UHFFFAOYSA-N 0.000 description 1
- GSJZGLNNYPQHLY-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]-3-fluorophenyl]-4-methylcyclohexyl]-2-fluorophenyl]methyl]aniline Chemical compound C1CC(C)CCC1(C=1C=C(F)C(CC=2C=CC(N)=CC=2)=CC=1)C(C=C1F)=CC=C1CC1=CC=C(N)C=C1 GSJZGLNNYPQHLY-UHFFFAOYSA-N 0.000 description 1
- JRIOHJCKKDRORE-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]-3-fluorophenyl]-4-propylcyclohexyl]-2-fluorophenyl]methyl]aniline Chemical compound C1CC(CCC)CCC1(C=1C=C(F)C(CC=2C=CC(N)=CC=2)=CC=1)C(C=C1F)=CC=C1CC1=CC=C(N)C=C1 JRIOHJCKKDRORE-UHFFFAOYSA-N 0.000 description 1
- HYMGYUHFQKLRFR-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]-3-fluorophenyl]cyclohexyl]-2-fluorophenyl]methyl]aniline Chemical compound C1=CC(N)=CC=C1CC1=CC=C(C2(CCCCC2)C=2C=C(F)C(CC=3C=CC(N)=CC=3)=CC=2)C=C1F HYMGYUHFQKLRFR-UHFFFAOYSA-N 0.000 description 1
- UEYCPSHRKZOUEH-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]-3-methylphenyl]-4-butylcyclohexyl]-2-methylphenyl]methyl]aniline Chemical compound C1CC(CCCC)CCC1(C=1C=C(C)C(CC=2C=CC(N)=CC=2)=CC=1)C(C=C1C)=CC=C1CC1=CC=C(N)C=C1 UEYCPSHRKZOUEH-UHFFFAOYSA-N 0.000 description 1
- RZMNSGXAOFPWTO-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]-3-methylphenyl]-4-ethylcyclohexyl]-2-methylphenyl]methyl]aniline Chemical compound C1CC(CC)CCC1(C=1C=C(C)C(CC=2C=CC(N)=CC=2)=CC=1)C(C=C1C)=CC=C1CC1=CC=C(N)C=C1 RZMNSGXAOFPWTO-UHFFFAOYSA-N 0.000 description 1
- OOCUXUCXGQRPAW-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]-3-methylphenyl]-4-heptylcyclohexyl]-2-methylphenyl]methyl]aniline Chemical compound C1CC(CCCCCCC)CCC1(C=1C=C(C)C(CC=2C=CC(N)=CC=2)=CC=1)C(C=C1C)=CC=C1CC1=CC=C(N)C=C1 OOCUXUCXGQRPAW-UHFFFAOYSA-N 0.000 description 1
- HQJNKWVFCOTFOO-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]-3-methylphenyl]-4-hexylcyclohexyl]-2-methylphenyl]methyl]aniline Chemical compound C1CC(CCCCCC)CCC1(C=1C=C(C)C(CC=2C=CC(N)=CC=2)=CC=1)C(C=C1C)=CC=C1CC1=CC=C(N)C=C1 HQJNKWVFCOTFOO-UHFFFAOYSA-N 0.000 description 1
- BUJNZCYKFFTBLX-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]-3-methylphenyl]-4-methylcyclohexyl]-2-methylphenyl]methyl]aniline Chemical compound C1CC(C)CCC1(C=1C=C(C)C(CC=2C=CC(N)=CC=2)=CC=1)C(C=C1C)=CC=C1CC1=CC=C(N)C=C1 BUJNZCYKFFTBLX-UHFFFAOYSA-N 0.000 description 1
- MIIDNIDOIQWKNX-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]-3-methylphenyl]-4-octylcyclohexyl]-2-methylphenyl]methyl]aniline Chemical compound C1CC(CCCCCCCC)CCC1(C=1C=C(C)C(CC=2C=CC(N)=CC=2)=CC=1)C(C=C1C)=CC=C1CC1=CC=C(N)C=C1 MIIDNIDOIQWKNX-UHFFFAOYSA-N 0.000 description 1
- XAGRKJKNIDBUGQ-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]-3-methylphenyl]-4-pentylcyclohexyl]-2-methylphenyl]methyl]aniline Chemical compound C1CC(CCCCC)CCC1(C=1C=C(C)C(CC=2C=CC(N)=CC=2)=CC=1)C(C=C1C)=CC=C1CC1=CC=C(N)C=C1 XAGRKJKNIDBUGQ-UHFFFAOYSA-N 0.000 description 1
- XNQQJGJCWSAJTK-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]-3-methylphenyl]-4-propylcyclohexyl]-2-methylphenyl]methyl]aniline Chemical compound C1CC(CCC)CCC1(C=1C=C(C)C(CC=2C=CC(N)=CC=2)=CC=1)C(C=C1C)=CC=C1CC1=CC=C(N)C=C1 XNQQJGJCWSAJTK-UHFFFAOYSA-N 0.000 description 1
- AIIJHVYZGNUSPN-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]-3-methylphenyl]cyclohexyl]-2-methylphenyl]methyl]aniline Chemical compound CC1=CC(C2(CCCCC2)C=2C=C(C)C(CC=3C=CC(N)=CC=3)=CC=2)=CC=C1CC1=CC=C(N)C=C1 AIIJHVYZGNUSPN-UHFFFAOYSA-N 0.000 description 1
- WKVNJMIEZOKYFT-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]-3-propylphenyl]-4-ethylcyclohexyl]-2-propylphenyl]methyl]aniline Chemical compound CCCC1=CC(C2(CCC(CC)CC2)C=2C=C(CCC)C(CC=3C=CC(N)=CC=3)=CC=2)=CC=C1CC1=CC=C(N)C=C1 WKVNJMIEZOKYFT-UHFFFAOYSA-N 0.000 description 1
- PIBNBFFLUWXZBJ-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]-3-propylphenyl]-4-methylcyclohexyl]-2-propylphenyl]methyl]aniline Chemical compound CCCC1=CC(C2(CCC(C)CC2)C=2C=C(CCC)C(CC=3C=CC(N)=CC=3)=CC=2)=CC=C1CC1=CC=C(N)C=C1 PIBNBFFLUWXZBJ-UHFFFAOYSA-N 0.000 description 1
- CUFYQVZEJDKWNU-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]-3-propylphenyl]-4-propylcyclohexyl]-2-propylphenyl]methyl]aniline Chemical compound C1CC(CCC)CCC1(C=1C=C(CCC)C(CC=2C=CC(N)=CC=2)=CC=1)C(C=C1CCC)=CC=C1CC1=CC=C(N)C=C1 CUFYQVZEJDKWNU-UHFFFAOYSA-N 0.000 description 1
- OYFYHCHWOIITPI-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]-3-propylphenyl]cyclohexyl]-2-propylphenyl]methyl]aniline Chemical compound CCCC1=CC(C2(CCCCC2)C=2C=C(CCC)C(CC=3C=CC(N)=CC=3)=CC=2)=CC=C1CC1=CC=C(N)C=C1 OYFYHCHWOIITPI-UHFFFAOYSA-N 0.000 description 1
- VVDAWGAIFXNPDD-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]phenyl]-4-ethylcyclohexyl]phenyl]methyl]aniline Chemical compound C1CC(CC)CCC1(C=1C=CC(CC=2C=CC(N)=CC=2)=CC=1)C(C=C1)=CC=C1CC1=CC=C(N)C=C1 VVDAWGAIFXNPDD-UHFFFAOYSA-N 0.000 description 1
- ZHVBBDVBERFGCH-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]phenyl]-4-heptylcyclohexyl]phenyl]methyl]aniline Chemical compound C1CC(CCCCCCC)CCC1(C=1C=CC(CC=2C=CC(N)=CC=2)=CC=1)C(C=C1)=CC=C1CC1=CC=C(N)C=C1 ZHVBBDVBERFGCH-UHFFFAOYSA-N 0.000 description 1
- JVXQOLIEWKYRCE-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]phenyl]-4-hexylcyclohexyl]phenyl]methyl]aniline Chemical compound C1CC(CCCCCC)CCC1(C=1C=CC(CC=2C=CC(N)=CC=2)=CC=1)C(C=C1)=CC=C1CC1=CC=C(N)C=C1 JVXQOLIEWKYRCE-UHFFFAOYSA-N 0.000 description 1
- PABZZTDVDMEISW-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]phenyl]-4-octylcyclohexyl]phenyl]methyl]aniline Chemical compound C1CC(CCCCCCCC)CCC1(C=1C=CC(CC=2C=CC(N)=CC=2)=CC=1)C(C=C1)=CC=C1CC1=CC=C(N)C=C1 PABZZTDVDMEISW-UHFFFAOYSA-N 0.000 description 1
- KDDANMXDPWKKFS-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]phenyl]-4-pentylcyclohexyl]phenyl]methyl]aniline Chemical compound C1CC(CCCCC)CCC1(C=1C=CC(CC=2C=CC(N)=CC=2)=CC=1)C(C=C1)=CC=C1CC1=CC=C(N)C=C1 KDDANMXDPWKKFS-UHFFFAOYSA-N 0.000 description 1
- GMZQIPROJDVZDV-UHFFFAOYSA-N 4-[[4-[1-[4-[(4-aminophenyl)methyl]phenyl]-4-propylcyclohexyl]phenyl]methyl]aniline Chemical compound C1CC(CCC)CCC1(C=1C=CC(CC=2C=CC(N)=CC=2)=CC=1)C(C=C1)=CC=C1CC1=CC=C(N)C=C1 GMZQIPROJDVZDV-UHFFFAOYSA-N 0.000 description 1
- CNODSORTHKVDEM-UHFFFAOYSA-N 4-trimethoxysilylaniline Chemical compound CO[Si](OC)(OC)C1=CC=C(N)C=C1 CNODSORTHKVDEM-UHFFFAOYSA-N 0.000 description 1
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical class [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 1
- LVZKQLKSWNRELX-UHFFFAOYSA-N CCC1CCC(CC1)(C2=CC=C(C=C2)CC3=CC(=C(C=C3)N)CC)C4=CC=C(C=C4)CC5=CC(=C(C=C5)N)CC Chemical compound CCC1CCC(CC1)(C2=CC=C(C=C2)CC3=CC(=C(C=C3)N)CC)C4=CC=C(C=C4)CC5=CC(=C(C=C5)N)CC LVZKQLKSWNRELX-UHFFFAOYSA-N 0.000 description 1
- BYVIAJXDSZVRPJ-UHFFFAOYSA-N CCC1CCC(CC1)(C2=CC=C(C=C2)CC3=CC(=C(C=C3)N)F)C4=CC=C(C=C4)CC5=CC(=C(C=C5)N)F Chemical compound CCC1CCC(CC1)(C2=CC=C(C=C2)CC3=CC(=C(C=C3)N)F)C4=CC=C(C=C4)CC5=CC(=C(C=C5)N)F BYVIAJXDSZVRPJ-UHFFFAOYSA-N 0.000 description 1
- RYPIZEGDVLTREI-UHFFFAOYSA-N CCCC1=C(C=CC(=C1)CC2=CC=C(C=C2)C3(CCC(CC3)CC)C4=CC=C(C=C4)CC5=CC(=C(C=C5)N)CCC)N Chemical compound CCCC1=C(C=CC(=C1)CC2=CC=C(C=C2)C3(CCC(CC3)CC)C4=CC=C(C=C4)CC5=CC(=C(C=C5)N)CCC)N RYPIZEGDVLTREI-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 238000003747 Grignard reaction Methods 0.000 description 1
- 239000004988 Nematic liquid crystal Substances 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000007868 Raney catalyst Substances 0.000 description 1
- 229910000564 Raney nickel Inorganic materials 0.000 description 1
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 description 1
- ZDZIXJZVVMSKQC-UHFFFAOYSA-N [4-[4-butyl-1-[4-(4-nitrobenzoyl)phenyl]cyclohexyl]phenyl]-(4-nitrophenyl)methanone Chemical compound C1CC(CCCC)CCC1(C=1C=CC(=CC=1)C(=O)C=1C=CC(=CC=1)[N+]([O-])=O)C1=CC=C(C(=O)C=2C=CC(=CC=2)[N+]([O-])=O)C=C1 ZDZIXJZVVMSKQC-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000004791 alkyl magnesium halides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000012267 brine Substances 0.000 description 1
- RBHJBMIOOPYDBQ-UHFFFAOYSA-N carbon dioxide;propan-2-one Chemical compound O=C=O.CC(C)=O RBHJBMIOOPYDBQ-UHFFFAOYSA-N 0.000 description 1
- QGJOPFRUJISHPQ-NJFSPNSNSA-N carbon disulfide-14c Chemical compound S=[14C]=S QGJOPFRUJISHPQ-NJFSPNSNSA-N 0.000 description 1
- 229920001429 chelating resin Polymers 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- IGARGHRYKHJQSM-UHFFFAOYSA-N cyclohexylbenzene Chemical group C1CCCCC1C1=CC=CC=C1 IGARGHRYKHJQSM-UHFFFAOYSA-N 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 125000005462 imide group Chemical group 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 125000003232 p-nitrobenzoyl group Chemical group [N+](=O)([O-])C1=CC=C(C(=O)*)C=C1 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Liquid Crystal (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、液晶配向膜に適したジ
アミノ化合物およびその製造方法に関する。TECHNICAL FIELD The present invention relates to a diamino compound suitable for a liquid crystal alignment film and a method for producing the same.
【0002】[0002]
【従来の技術】時計や電卓に用いられてる液晶表示素子
には、上、下2枚で一対をなす電極基板の間でネマチッ
ク液晶分子の配列方向を90度に捻った構造のツイスト
・ネマチック(以下、TNと略す。)モードが主に採用
されている。また、ねじれ角を180〜300度と大き
くしたスーパーツイステッドネマチック(以下STNと
略す)モードも開発され、大画面でも表示品位の良好な
液晶表示素子が得られるようになった。さらに、近年で
は、マトリクス表示やカラー表示等を行うようになって
きたため、多数の画素電極とこれらのON−OFFを行
うことのできるアクティブ型ツイストネマチックモード
を採用したMIM(金属−絶縁相−金属)素子や、TF
T(電界効果型薄膜トランジスタ) 素子の開発が盛ん
になってきた。2. Description of the Related Art A liquid crystal display element used in a clock or a calculator has a twisted nematic structure in which an arrangement direction of nematic liquid crystal molecules is twisted by 90 degrees between a pair of upper and lower electrode substrates. Hereinafter, abbreviated as TN) mode is mainly adopted. In addition, a super twisted nematic (hereinafter abbreviated as STN) mode having a large twist angle of 180 to 300 degrees has been developed, and a liquid crystal display device having a good display quality even on a large screen can be obtained. Further, in recent years, since matrix display and color display have come to be performed, a large number of pixel electrodes and an MIM (metal-insulation phase-metal) adopting an active type twisted nematic mode capable of performing ON-OFF of these pixel electrodes. ) Elements and TF
The development of T (Field Effect Thin Film Transistor) elements has become popular.
【0003】これらのモード全てに共通する問題とし
て、同一画面を長時間表示した後、他の画面に移ると前
の画像が残像として残る現象が生じることである。特
に、高品質の液晶表示素子を得るためには、この残像現
象を改善することが非常に重要な問題である。残像現象
の原因は、液晶表示素子に印加されるDC成分により、
配向膜表面の液晶中に含まれる不純物のイオン成分によ
る電気二重層が生じ、上下の基板の間で電荷の偏りが生
じ、その偏りが安定に保たれることによる電位差が原因
であると考えられる。特に、TFT素子においては、素
子の特性上、DC成分を除去することができないので、
残像現象は、TN、STNよりも目だちやすく深刻であ
る。またTFTモードにおいては、画面のちらつきを防
止するために高い電圧保持率が要求される。A problem common to all of these modes is that when the same screen is displayed for a long time and then moved to another screen, the previous image remains as an afterimage. In particular, in order to obtain a high quality liquid crystal display device, it is a very important problem to improve the afterimage phenomenon. The cause of the afterimage phenomenon is due to the DC component applied to the liquid crystal display element.
It is considered that the electric double layer is generated by the ionic component of impurities contained in the liquid crystal on the surface of the alignment film, the electric charges are biased between the upper and lower substrates, and the potential difference is caused by keeping the bias stable. . In particular, in the TFT element, the DC component cannot be removed due to the characteristics of the element.
The afterimage phenomenon is more noticeable and more serious than TN and STN. In addition, in the TFT mode, a high voltage holding ratio is required to prevent flickering of the screen.
【0004】このような液晶表示素子に使用される配向
膜として、おもにポリイミドやポリアミドなどの有機系
の膜が用いられており、特開昭51−65960号公報
では、As an alignment film used in such a liquid crystal display device, an organic film such as polyimide or polyamide is mainly used, and in JP-A-51-65960,
【0005】[0005]
【化5】 [Chemical 5]
【0006】で表される反復単位を有するポリイミド樹
脂を用いた液晶配向膜を備えた液晶表示素子が開示され
ている。しかし、この様なポリエーテル化合物を用いて
得られるポリイミド配向膜を用いた素子では、残像現象
が発生し易い。A liquid crystal display device having a liquid crystal alignment film using a polyimide resin having a repeating unit represented by the following is disclosed. However, an afterimage phenomenon is likely to occur in an element using a polyimide alignment film obtained by using such a polyether compound.
【0007】[0007]
【発明が解決しようとする課題】本発明の目的は、上記
の問題点を解決することであり、残像現象がなく、電圧
保持率の優れた液晶配向膜が得られるポリイミド原料を
得るのに適したジアミノ化合物およびその製造方法を提
供することである。SUMMARY OF THE INVENTION An object of the present invention is to solve the above problems, and is suitable for obtaining a polyimide raw material from which a liquid crystal alignment film having an excellent voltage holding ratio without an afterimage phenomenon can be obtained. Another object of the present invention is to provide a diamino compound and a method for producing the same.
【0008】[0008]
【課題を解決するための手段】本発明者らは、鋭意研究
開発を進めた結果、残像現象は、配向膜表面の極性と相
関があり、配向膜用のポリイミド原料として、この極性
を小さくすることのできるある特定の構造を有するジア
ミノ化合物を用いることにより、残像現象が抑えられる
ことを見いだし、本発明を完成させた。該ジアミノ化合
物とは、−O−,−SO2− の様な極性原子は持たず、
アミンの分子量を大きくすることによってイミド基の割
合を相対的に減らし、極性成分の割合を極力小さくした
ものである。As a result of intensive research and development, the inventors of the present invention have found that the afterimage phenomenon has a correlation with the polarity of the surface of the alignment film, and as a polyimide raw material for the alignment film, the polarity is reduced. It was found that the afterimage phenomenon can be suppressed by using a diamino compound having a certain specific structure capable of producing the present invention, and completed the present invention. The diamino compound does not have a polar atom such as —O— and —SO 2 —,
By increasing the molecular weight of amine, the proportion of imide groups is relatively reduced and the proportion of polar components is minimized.
【0009】本発明の内容をさらに詳細に説明すると、 1)一般式The details of the present invention will be described below. 1) General formula
【0010】[0010]
【化6】 [Chemical 6]
【0011】で表されるジアミノ化合物。 2)一般式A diamino compound represented by: 2) General formula
【0012】[0012]
【化7】 [Chemical 7]
【0013】で表されるジフェニルシクロヘキサン誘導
体に、一般式The diphenylcyclohexane derivative represented by
【0014】[0014]
【化8】 [Chemical 8]
【0015】で表されるパラニトロベンゾイルクロライ
ド誘導体を縮合させた後、カルボニル基およびニトロ基
を還元することを特徴とする、一般式After condensation of the para-nitrobenzoyl chloride derivative represented by the formula (1), a carbonyl group and a nitro group are reduced, and a general formula
【0016】[0016]
【化9】 [Chemical 9]
【0017】で表されるジアミノ化合物の製造方法であ
る。A method for producing a diamino compound represented by:
【0018】本発明のジアミノ化合物は、前記(1)式
で表されるものであり、具体例をあげると、1,1−ビ
ス[4−(4−アミノベンジル)フェニル]シクロヘキ
サン、1,1−ビス[4−(4−アミノベンジル)フェ
ニル]−4−メチルシクロヘキサン、1,1−ビス[4
−(4−アミノベンジル)フェニル]−4−エチルシク
ロヘキサン、1,1−ビス[4−(4−アミノベンジ
ル)フェニル]−4−プロピルシクロヘキサン、1,1
−ビス[4−(4−アミノベンジル)フェニル]−4−
ブチルシクロヘキサン、1,1−ビス[4−(4−アミ
ノベンジル)フェニル]−4−ペンチルシクロヘキサ
ン、1,1−ビス[4−(4−アミノベンジル)フェニ
ル]−4−ヘキシルシクロヘキサン、1,1−ビス[4
−(4−アミノベンジル)フェニル]−4−ヘプチルシ
クロヘキサン、1,1−ビス[4−(4−アミノベンジ
ル)フェニル]−4−オクチルシクロヘキサン、The diamino compound of the present invention is represented by the above formula (1), and specific examples thereof include 1,1-bis [4- (4-aminobenzyl) phenyl] cyclohexane and 1,1. -Bis [4- (4-aminobenzyl) phenyl] -4-methylcyclohexane, 1,1-bis [4
-(4-Aminobenzyl) phenyl] -4-ethylcyclohexane, 1,1-bis [4- (4-aminobenzyl) phenyl] -4-propylcyclohexane, 1,1
-Bis [4- (4-aminobenzyl) phenyl] -4-
Butylcyclohexane, 1,1-bis [4- (4-aminobenzyl) phenyl] -4-pentylcyclohexane, 1,1-bis [4- (4-aminobenzyl) phenyl] -4-hexylcyclohexane, 1,1 -Bis [4
-(4-aminobenzyl) phenyl] -4-heptylcyclohexane, 1,1-bis [4- (4-aminobenzyl) phenyl] -4-octylcyclohexane,
【0019】1,1−ビス[4−(4−アミノ−3−メ
チルベンジル)フェニル]−4−メチルシクロヘキサ
ン、1,1−ビス[4−(4−アミノ−3−メチルベン
ジル)フェニル]−4−エチルシクロヘキサン、1,1
−ビス[4−(4−アミノ−3−メチルベンジル)フェ
ニル]−4−プロピルシクロヘキサン、1,1−ビス
[4−(4−アミノ−3−メチルベンジル)フェニル]
−4−ブチルシクロヘキサン、1,1−ビス[4−(4
−アミノ−3−メチルベンジル)フェニル]−4−ペン
チルシクロヘキサン、1,1−ビス[4−(4−アミノ
−3−メチルベンジル)フェニル]−4−ヘキシルシク
ロヘキサン、1,1−ビス[4−(4−アミノ−3−メ
チルベンジル)フェニル]−4−ヘプチルシクロヘキサ
ン、1,1−ビス[4−(4−アミノ−3−メチルベン
ジル)フェニル]−4−オクチルシクロヘキサン、1,1-bis [4- (4-amino-3-methylbenzyl) phenyl] -4-methylcyclohexane, 1,1-bis [4- (4-amino-3-methylbenzyl) phenyl]- 4-ethylcyclohexane, 1,1
-Bis [4- (4-amino-3-methylbenzyl) phenyl] -4-propylcyclohexane, 1,1-bis [4- (4-amino-3-methylbenzyl) phenyl]
-4-Butylcyclohexane, 1,1-bis [4- (4
-Amino-3-methylbenzyl) phenyl] -4-pentylcyclohexane, 1,1-bis [4- (4-amino-3-methylbenzyl) phenyl] -4-hexylcyclohexane, 1,1-bis [4- (4-amino-3-methylbenzyl) phenyl] -4-heptylcyclohexane, 1,1-bis [4- (4-amino-3-methylbenzyl) phenyl] -4-octylcyclohexane,
【0020】1,1−ビス[4−(4−アミノベンジ
ル)−3−メチルフェニル]−4−メチルシクロヘキサ
ン、1,1−ビス[4−(4−アミノベンジル)−3−
メチルフェニル]−4−エチルシクロヘキサン、1,1
−ビス[4−(4−アミノベンジル)−3−メチルフェ
ニル]−4−プロピルシクロヘキサン、1,1−ビス
[4−(4−アミノベンジル)−3−メチルフェニル]
−4−ブチルシクロヘキサン、1,1−ビス[4−(4
−アミノベンジル)−3−メチルフェニル]−4−ペン
チルシクロヘキサン、1,1−ビス[4−(4−アミノ
ベンジル)−3−メチルフェニル]−4−ヘキシルシク
ロヘキサン、1,1−ビス[4−(4−アミノベンジ
ル)−3−メチルフェニル]−4−ヘプチルシクロヘキ
サン、1,1−ビス[4−(4−アミノベンジル)−3
−メチルフェニル]−4−オクチルシクロヘキサン、1,1-bis [4- (4-aminobenzyl) -3-methylphenyl] -4-methylcyclohexane, 1,1-bis [4- (4-aminobenzyl) -3-
Methylphenyl] -4-ethylcyclohexane, 1,1
-Bis [4- (4-aminobenzyl) -3-methylphenyl] -4-propylcyclohexane, 1,1-bis [4- (4-aminobenzyl) -3-methylphenyl]
-4-Butylcyclohexane, 1,1-bis [4- (4
-Aminobenzyl) -3-methylphenyl] -4-pentylcyclohexane, 1,1-bis [4- (4-aminobenzyl) -3-methylphenyl] -4-hexylcyclohexane, 1,1-bis [4- (4-Aminobenzyl) -3-methylphenyl] -4-heptylcyclohexane, 1,1-bis [4- (4-aminobenzyl) -3
-Methylphenyl] -4-octylcyclohexane,
【0021】1,1−ビス[4−(4−アミノベンジ
ル)−2−メチルフェニル]−4−メチルシクロヘキサ
ン、1,1−ビス[4−(4−アミノベンジル)−2−
メチルフェニル]−4−エチルシクロヘキサン、1,1
−ビス[4−(4−アミノベンジル)−2−メチルフェ
ニル]−4−プロピルシクロヘキサン、1,1−ビス
[4−(4−アミノベンジル)−2−メチルフェニル]
−4−ブチルシクロヘキサン、1,1−ビス[4−(4
−アミノベンジル)−2−メチルフェニル]−4−ペン
チルシクロヘキサン、1,1−ビス[4−(4−アミノ
ベンジル)−2−メチルフェニル]−4−ヘキシルシク
ロヘキサン、1,1−ビス[4−(4−アミノベンジ
ル)−2−メチルフェニル]−4−ヘプチルシクロヘキ
サン、1,1−ビス[4−(4−アミノベンジル)−2
−メチルフェニル]−4−オクチルシクロヘキサン、1,1-bis [4- (4-aminobenzyl) -2-methylphenyl] -4-methylcyclohexane, 1,1-bis [4- (4-aminobenzyl) -2-
Methylphenyl] -4-ethylcyclohexane, 1,1
-Bis [4- (4-aminobenzyl) -2-methylphenyl] -4-propylcyclohexane, 1,1-bis [4- (4-aminobenzyl) -2-methylphenyl]
-4-Butylcyclohexane, 1,1-bis [4- (4
-Aminobenzyl) -2-methylphenyl] -4-pentylcyclohexane, 1,1-bis [4- (4-aminobenzyl) -2-methylphenyl] -4-hexylcyclohexane, 1,1-bis [4- (4-Aminobenzyl) -2-methylphenyl] -4-heptylcyclohexane, 1,1-bis [4- (4-aminobenzyl) -2
-Methylphenyl] -4-octylcyclohexane,
【0022】1,1−ビス[4−(4−アミノ−3−メ
チルベンジル)フェニル]シクロヘキサン、1,1−ビ
ス[4−(4−アミノ−3−エチルベンジル)フェニ
ル]シクロヘキサン、1,1−ビス[4−(4−アミノ
−3−プロピルベンジル)フェニル]シクロヘキサン、
1,1−ビス[4−(4−アミノ−3−フルオロベンジ
ル)フェニル]シクロヘキサン、1,1-bis [4- (4-amino-3-methylbenzyl) phenyl] cyclohexane, 1,1-bis [4- (4-amino-3-ethylbenzyl) phenyl] cyclohexane, 1,1 -Bis [4- (4-amino-3-propylbenzyl) phenyl] cyclohexane,
1,1-bis [4- (4-amino-3-fluorobenzyl) phenyl] cyclohexane,
【0023】1,1−ビス[4−(4−アミノベンジ
ル)−3−メチルフェニル]シクロヘキサン、1,1−
ビス[4−(4−アミノベンジル)−3−エチルフェニ
ル]シクロヘキサン、1,1−ビス[4−(4−アミノ
ベンジル)−3−プロピルフェニル]シクロヘキサン、
1,1−ビス[4−(4−アミノベンジル)−3−フル
オロフェニル]シクロヘキサン、1,1-bis [4- (4-aminobenzyl) -3-methylphenyl] cyclohexane, 1,1-
Bis [4- (4-aminobenzyl) -3-ethylphenyl] cyclohexane, 1,1-bis [4- (4-aminobenzyl) -3-propylphenyl] cyclohexane,
1,1-bis [4- (4-aminobenzyl) -3-fluorophenyl] cyclohexane,
【0024】1,1−ビス[4−(4−アミノ−3−エ
チルベンジル)フェニル]−4−メチルシクロヘキサ
ン、1,1−ビス[4−(4−アミノ−3−プロピルベ
ンジル)フェニル]−4−メチルシクロヘキサン、1,
1−ビス[4−(4−アミノ−3−フルオロベンジル)
フェニル]−4−メチルシクロヘキサン、1,1-bis [4- (4-amino-3-ethylbenzyl) phenyl] -4-methylcyclohexane, 1,1-bis [4- (4-amino-3-propylbenzyl) phenyl]- 4-methylcyclohexane, 1,
1-bis [4- (4-amino-3-fluorobenzyl)
Phenyl] -4-methylcyclohexane,
【0025】1,1−ビス[4−(4−アミノベンジ
ル)−3−エチルフェニル]−4−メチルシクロヘキサ
ン、1,1−ビス[4−(4−アミノベンジル)−3−
プロピルフェニル]−4−メチルシクロヘキサン、1,
1−ビス[4−(4−アミノベンジル)−3−フルオロ
フェニル]−4−メチルシクロヘキサン、1,1-bis [4- (4-aminobenzyl) -3-ethylphenyl] -4-methylcyclohexane, 1,1-bis [4- (4-aminobenzyl) -3-
Propylphenyl] -4-methylcyclohexane, 1,
1-bis [4- (4-aminobenzyl) -3-fluorophenyl] -4-methylcyclohexane,
【0026】1,1−ビス[4−(4−アミノ−3−エ
チルベンジル)フェニル]−4−エチルシクロヘキサ
ン、1,1−ビス[4−(4−アミノ−3−プロピルベ
ンジル)フェニル]−4−エチルシクロヘキサン、1,
1−ビス[4−(4−アミノ−3−フルオロベンジル)
フェニル]−4−エチルシクロヘキサン、1,1-bis [4- (4-amino-3-ethylbenzyl) phenyl] -4-ethylcyclohexane, 1,1-bis [4- (4-amino-3-propylbenzyl) phenyl]- 4-ethylcyclohexane, 1,
1-bis [4- (4-amino-3-fluorobenzyl)
Phenyl] -4-ethylcyclohexane,
【0027】1,1−ビス[4−(4−アミノベンジ
ル)−3−エチルフェニル]−4−エチルシクロヘキサ
ン、1,1−ビス[4−(4−アミノベンジル)−3−
プロピルフェニル]−4−エチルシクロヘキサン、1,
1−ビス[4−(4−アミノベンジル)−3−フルオロ
フェニル]−4−エチルシクロヘキサン、1,1-bis [4- (4-aminobenzyl) -3-ethylphenyl] -4-ethylcyclohexane, 1,1-bis [4- (4-aminobenzyl) -3-
Propylphenyl] -4-ethylcyclohexane, 1,
1-bis [4- (4-aminobenzyl) -3-fluorophenyl] -4-ethylcyclohexane,
【0028】1,1−ビス[4−(4−アミノ−3−エ
チルベンジル)フェニル]−4−プロピルシクロヘキサ
ン、1,1−ビス[4−(4−アミノ−3−プロピルベ
ンジル)フェニル]−4−プロピルシクロヘキサン、
1,1−ビス[4−(4−アミノ−3−フルオロベンジ
ル)フェニル]−4−プロピルシクロヘキサン、1,1-bis [4- (4-amino-3-ethylbenzyl) phenyl] -4-propylcyclohexane, 1,1-bis [4- (4-amino-3-propylbenzyl) phenyl]- 4-propylcyclohexane,
1,1-bis [4- (4-amino-3-fluorobenzyl) phenyl] -4-propylcyclohexane,
【0029】1,1−ビス[4−(4−アミノベンジ
ル)−3−エチルフェニル]−4−プロピルシクロヘキ
サン、1,1−ビス[4−(4−アミノベンジル)−3
−プロピルフェニル]−4−プロピルシクロヘキサン、
1,1−ビス[4−(4−アミノベンジル)−3−フル
オロフェニル]−4−プロピルシクロヘキサン、などが
ある。1,1-bis [4- (4-aminobenzyl) -3-ethylphenyl] -4-propylcyclohexane, 1,1-bis [4- (4-aminobenzyl) -3
-Propylphenyl] -4-propylcyclohexane,
1,1-bis [4- (4-aminobenzyl) -3-fluorophenyl] -4-propylcyclohexane, and the like.
【0030】本発明のジアミノ化合物の製造について、
具体的に説明する。本発明で用いられるジフェニルシク
ロヘキサンもしくはその誘導体は、前記(2)式で表さ
れるものであり、具体例として、1,1−ジフェニルシ
クロヘキサン、1,1−ジフェニル−4−メチルシクロ
ヘキサン、1,1−ジフェニル−4−エチルシクロヘキ
サン、1,1−ジフェニル−4−プロピルシクロヘキサ
ン、1,1−ジフェニル−4−ブチルシクロヘキサン、
1,1−ジフェニル−4−ペンチルシクロヘキサン、
1,1−ジフェニル−4−ヘキシルシクロヘキサン、
1,1−ジフェニル−4−ヘプチルシクロヘキサン、
1,1−ジフェニル−4−オクチルシクロヘキサン、For the production of the diamino compound of the present invention,
This will be specifically described. The diphenylcyclohexane or its derivative used in the present invention is represented by the above formula (2), and specific examples include 1,1-diphenylcyclohexane, 1,1-diphenyl-4-methylcyclohexane, 1,1. -Diphenyl-4-ethylcyclohexane, 1,1-diphenyl-4-propylcyclohexane, 1,1-diphenyl-4-butylcyclohexane,
1,1-diphenyl-4-pentylcyclohexane,
1,1-diphenyl-4-hexylcyclohexane,
1,1-diphenyl-4-heptylcyclohexane,
1,1-diphenyl-4-octylcyclohexane,
【0031】1,1−ビス(2−メチルフェニル)シク
ロヘキサン、1,1−ビス(2−メチルフェニル)−4
−メチルシクロヘキサン、1,1−ビス(2−メチルフ
ェニル)−4−エチルシクロヘキサン、1,1−ビス
(2−メチルフェニル)−4−プロピルシクロヘキサ
ン、1,1−ビス(2−メチルフェニル)−4−ブチル
シクロヘキサン、1,1−ビス(2−メチルフェニル)
−4−ペンチルシクロヘキサン、1,1−ビス(2−メ
チルフェニル)−4−ヘキシルシクロヘキサン、1,1
−ビス(2−メチルフェニル)−4−ヘプチルシクロヘ
キサン、1,1−ビス(2−メチルフェニル)−4−オ
クチルシクロヘキサン、1,1-bis (2-methylphenyl) cyclohexane, 1,1-bis (2-methylphenyl) -4
-Methylcyclohexane, 1,1-bis (2-methylphenyl) -4-ethylcyclohexane, 1,1-bis (2-methylphenyl) -4-propylcyclohexane, 1,1-bis (2-methylphenyl)- 4-butylcyclohexane, 1,1-bis (2-methylphenyl)
-4-pentylcyclohexane, 1,1-bis (2-methylphenyl) -4-hexylcyclohexane, 1,1
-Bis (2-methylphenyl) -4-heptylcyclohexane, 1,1-bis (2-methylphenyl) -4-octylcyclohexane,
【0032】1,1−ビス(3−メチルフェニル)シク
ロヘキサン、1,1−ビス(3−メチルフェニル)−4
−メチルシクロヘキサン、1,1−ビス(3−メチルフ
ェニル)−4−エチルシクロヘキサン、1,1−ビス
(3−メチルフェニル)−4−プロピルシクロヘキサ
ン、1,1−ビス(3−メチルフェニル)−4−ブチル
シクロヘキサン、1,1−ビス(3−メチルフェニル)
−4−ペンチルシクロヘキサン、1,1−ビス(3−メ
チルフェニル)−4−ヘキシルシクロヘキサン、1,1
−ビス(3−メチルフェニル)−4−ヘプチルシクロヘ
キサン、1,1−ビス(3−メチルフェニル)−4−オ
クチルシクロヘキサン、1,1-bis (3-methylphenyl) cyclohexane, 1,1-bis (3-methylphenyl) -4
-Methylcyclohexane, 1,1-bis (3-methylphenyl) -4-ethylcyclohexane, 1,1-bis (3-methylphenyl) -4-propylcyclohexane, 1,1-bis (3-methylphenyl)- 4-butylcyclohexane, 1,1-bis (3-methylphenyl)
-4-pentylcyclohexane, 1,1-bis (3-methylphenyl) -4-hexylcyclohexane, 1,1
-Bis (3-methylphenyl) -4-heptylcyclohexane, 1,1-bis (3-methylphenyl) -4-octylcyclohexane,
【0033】1,1−ビス(2−エチルフェニル)シク
ロヘキサン、1,1−ビス(2−エチルフェニル)−4
−メチルシクロヘキサン、1,1−ビス(2−エチルフ
ェニル)−4−エチルシクロヘキサン、1,1−ビス
(2−エチルフェニル)−4−プロピルシクロヘキサ
ン、1,1−ビス(2−エチルフェニル)−4−ブチル
シクロヘキサン、1,1−ビス(2−エチルフェニル)
−4−ペンチルシクロヘキサン、1,1−ビス(2−エ
チルフェニル)−4−ヘキシルシクロヘキサン、1,1
−ビス(2−エチルフェニル)−4−ヘプチルシクロヘ
キサン、1,1−ビス(2−エチルフェニル)−4−オ
クチルシクロヘキサン、1,1-bis (2-ethylphenyl) cyclohexane, 1,1-bis (2-ethylphenyl) -4
-Methylcyclohexane, 1,1-bis (2-ethylphenyl) -4-ethylcyclohexane, 1,1-bis (2-ethylphenyl) -4-propylcyclohexane, 1,1-bis (2-ethylphenyl)- 4-butylcyclohexane, 1,1-bis (2-ethylphenyl)
-4-pentylcyclohexane, 1,1-bis (2-ethylphenyl) -4-hexylcyclohexane, 1,1
-Bis (2-ethylphenyl) -4-heptylcyclohexane, 1,1-bis (2-ethylphenyl) -4-octylcyclohexane,
【0034】1,1−ビス(3−エチルフェニル)シク
ロヘキサン、1,1−ビス(3−エチルフェニル)−4
−メチルシクロヘキサン、1,1−ビス(3−エチルフ
ェニル)−4−エチルシクロヘキサン、1,1−ビス
(3−エチルフェニル)−4−プロピルシクロヘキサ
ン、1,1−ビス(3−エチルフェニル)−4−ブチル
シクロヘキサン、1,1−ビス(3−エチルフェニル)
−4−ペンチルシクロヘキサン、1,1−ビス(3−エ
チルフェニル)−4−ヘキシルシクロヘキサン、1,1
−ビス(3−エチルフェニル)−4−ヘプチルシクロヘ
キサン、1,1−ビス(3−エチルフェニル)−4−オ
クチルシクロヘキサン、1,1-bis (3-ethylphenyl) cyclohexane, 1,1-bis (3-ethylphenyl) -4
-Methylcyclohexane, 1,1-bis (3-ethylphenyl) -4-ethylcyclohexane, 1,1-bis (3-ethylphenyl) -4-propylcyclohexane, 1,1-bis (3-ethylphenyl)- 4-butylcyclohexane, 1,1-bis (3-ethylphenyl)
-4-pentylcyclohexane, 1,1-bis (3-ethylphenyl) -4-hexylcyclohexane, 1,1
-Bis (3-ethylphenyl) -4-heptylcyclohexane, 1,1-bis (3-ethylphenyl) -4-octylcyclohexane,
【0035】1,1−ビス(2−プロピルフェニル)シ
クロヘキサン、1,1−ビス(2−プロピルフェニル)
−4−メチルシクロヘキサン、1,1−ビス(2−プロ
ピルフェニル)−4−エチルシクロヘキサン、1,1−
ビス(2−プロピルフェニル)−4−プロピルシクロヘ
キサン、1,1−ビス(2−プロピルフェニル)−4−
ブチルシクロヘキサン、1,1−ビス(2−プロピルフ
ェニル)−4−ペンチルシクロヘキサン、1,1−ビス
(2−プロピルフェニル)−4−ヘキシルシクロヘキサ
ン、1,1−ビス(2−プロピルフェニル)−4−ヘプ
チルシクロヘキサン、1,1−ビス(2−プロピルフェ
ニル)−4−オクチルシクロヘキサン、1,1-bis (2-propylphenyl) cyclohexane, 1,1-bis (2-propylphenyl)
-4-methylcyclohexane, 1,1-bis (2-propylphenyl) -4-ethylcyclohexane, 1,1-
Bis (2-propylphenyl) -4-propylcyclohexane, 1,1-bis (2-propylphenyl) -4-
Butylcyclohexane, 1,1-bis (2-propylphenyl) -4-pentylcyclohexane, 1,1-bis (2-propylphenyl) -4-hexylcyclohexane, 1,1-bis (2-propylphenyl) -4 -Heptylcyclohexane, 1,1-bis (2-propylphenyl) -4-octylcyclohexane,
【0036】1,1−ビス(3−プロピルフェニル)シ
クロヘキサン、1,1−ビス(3−プロピルフェニル)
−4−メチルシクロヘキサン、1,1−ビス(3−プロ
ピルフェニル)−4−エチルシクロヘキサン、1,1−
ビス(3−プロピルフェニル)−4−プロピルシクロヘ
キサン、1,1−ビス(3−プロピルフェニル)−4−
ブチルシクロヘキサン、1,1−ビス(3−プロピルフ
ェニル)−4−ペンチルシクロヘキサン、1,1−ビス
(3−プロピルフェニル)−4−ヘキシルシクロヘキサ
ン、1,1−ビス(3−プロピルフェニル)−4−ヘプ
チルシクロヘキサン、1,1−ビス(3−プロピルフェ
ニル)−4−オクチルシクロヘキサン、1,1-bis (3-propylphenyl) cyclohexane, 1,1-bis (3-propylphenyl)
-4-methylcyclohexane, 1,1-bis (3-propylphenyl) -4-ethylcyclohexane, 1,1-
Bis (3-propylphenyl) -4-propylcyclohexane, 1,1-bis (3-propylphenyl) -4-
Butylcyclohexane, 1,1-bis (3-propylphenyl) -4-pentylcyclohexane, 1,1-bis (3-propylphenyl) -4-hexylcyclohexane, 1,1-bis (3-propylphenyl) -4 -Heptylcyclohexane, 1,1-bis (3-propylphenyl) -4-octylcyclohexane,
【0037】1,1−ビス(2−フルオロフェニル)シ
クロヘキサン、1,1−ビス(2−フルオロフェニル)
−4−メチルシクロヘキサン、1,1−ビス(2−フル
オロフェニル)−4−エチルシクロヘキサン、1,1−
ビス(2−フルオロフェニル)−4−プロピルシクロヘ
キサン、1,1−ビス(2−フルオロフェニル)−4−
ブチルシクロヘキサン、1,1−ビス(2−フルオロフ
ェニル)−4−ペンチルシクロヘキサン、1,1−ビス
(2−フルオロフェニル)−4−ヘキシルシクロヘキサ
ン、1,1−ビス(2−フルオロフェニル)−4−ヘプ
チルシクロヘキサン、1,1−ビス(2−フルオロフェ
ニル)−4−オクチルシクロヘキサン、1,1-bis (2-fluorophenyl) cyclohexane, 1,1-bis (2-fluorophenyl)
-4-Methylcyclohexane, 1,1-bis (2-fluorophenyl) -4-ethylcyclohexane, 1,1-
Bis (2-fluorophenyl) -4-propylcyclohexane, 1,1-bis (2-fluorophenyl) -4-
Butylcyclohexane, 1,1-bis (2-fluorophenyl) -4-pentylcyclohexane, 1,1-bis (2-fluorophenyl) -4-hexylcyclohexane, 1,1-bis (2-fluorophenyl) -4 -Heptylcyclohexane, 1,1-bis (2-fluorophenyl) -4-octylcyclohexane,
【0038】1,1−ビス(3−フルオロフェニル)シ
クロヘキサン、1,1−ビス(3−フルオロフェニル)
−4−メチルシクロヘキサン、1,1−ビス(3−フル
オロフェニル)−4−エチルシクロヘキサン、1,1−
ビス(3−フルオロフェニル)−4−プロピルシクロヘ
キサン、1,1−ビス(3−フルオロフェニル)−4−
ブチルシクロヘキサン、1,1−ビス(3−フルオロフ
ェニル)−4−ペンチルシクロヘキサン、1,1−ビス
(3−フルオロフェニル)−4−ヘキシルシクロヘキサ
ン、1,1−ビス(3−フルオロフェニル)−4−ヘプ
チルシクロヘキサン、1,1−ビス(3−フルオロフェ
ニル)−4−オクチルシクロヘキサン、などがあげられ
る。1,1-bis (3-fluorophenyl) cyclohexane, 1,1-bis (3-fluorophenyl)
-4-methylcyclohexane, 1,1-bis (3-fluorophenyl) -4-ethylcyclohexane, 1,1-
Bis (3-fluorophenyl) -4-propylcyclohexane, 1,1-bis (3-fluorophenyl) -4-
Butylcyclohexane, 1,1-bis (3-fluorophenyl) -4-pentylcyclohexane, 1,1-bis (3-fluorophenyl) -4-hexylcyclohexane, 1,1-bis (3-fluorophenyl) -4 -Heptylcyclohexane, 1,1-bis (3-fluorophenyl) -4-octylcyclohexane, and the like.
【0039】また、必要に応じてこれらの2種以上の化
合物を併用しても良い。これらのジフェニルシクロヘキ
サンもしくはその誘導体は、ジフェニルシクロヘキサノ
ン誘導体のカルボニル基の還元や、ジフェニルシクロヘ
キサノン誘導体とアルキルマグネシウムハライドとのグ
リニャール反応で生成したアルコール体を脱水し、さら
に生じた二重結合を接触水素還元などの方法で還元する
こと、あるいはジフェニルシクロヘキサノン誘導体とア
ルキルリチウムとの反応で生成したアルコール体を脱水
し、さらに生じた二重結合を接触水素還元などの方法で
還元することによって、容易に得られる。If necessary, two or more kinds of these compounds may be used in combination. These diphenylcyclohexanes or their derivatives can be used to reduce the carbonyl group of diphenylcyclohexanone derivatives, dehydrate alcohols produced by the Grignard reaction between diphenylcyclohexanone derivatives and alkylmagnesium halides, and further reduce the resulting double bonds by catalytic hydrogen reduction. It can be easily obtained by reducing by the method described above, or by dehydrating the alcohol compound produced by the reaction of the diphenylcyclohexanone derivative and alkyllithium, and further reducing the resulting double bond by a method such as catalytic hydrogen reduction.
【0040】本発明で用いられるパラニトロベンゾイル
クロライドもしくはその誘導体は、前記(3)式で表さ
れるものであり、具体例として、4−ニトロベンゾイル
クロライド、2−メチル−4−ニトロベンゾイルクロラ
イド、2−エチル−4−ニトロベンゾイルクロライド、
2−プロピチル−4−ニトロベンゾイルクロライド、2
−フルオロ−4−ニトロベンゾイルクロライド、3−メ
チル−4−ニトロベンゾイルクロライド、3−エチル−
4−ニトロベンゾイルクロライド、3−プロピチル−4
−ニトロベンゾイルクロライド、3−フルオロ−4−ニ
トロベンゾイルクロライド、などがあげられる。また、
必要に応じてこれら2種以上の化合物を併用しても差し
支えない。The para-nitrobenzoyl chloride or its derivative used in the present invention is represented by the above formula (3), and specific examples thereof include 4-nitrobenzoyl chloride, 2-methyl-4-nitrobenzoyl chloride, 2-ethyl-4-nitrobenzoyl chloride,
2-propytyl-4-nitrobenzoyl chloride, 2
-Fluoro-4-nitrobenzoyl chloride, 3-methyl-4-nitrobenzoyl chloride, 3-ethyl-
4-nitrobenzoyl chloride, 3-propytyl-4
-Nitrobenzoyl chloride, 3-fluoro-4-nitrobenzoyl chloride, and the like. Also,
If necessary, these two or more compounds may be used in combination.
【0041】ジフェニルシクロヘキサンもしくはその誘
導体とパラニトロベンゾイルクロライドもしくはその誘
導体との反応には、通常、触媒が使用される。触媒に
は、AlCl3、SbCl5、FeCl3、TeCl2、S
nCl4、TiCl4、BiCl3、ZnCl2等があげら
れるが、反応性の面からAlCl3が好ましい。また、
反応にあたっては、必要に応じて溶媒が使用される。該
溶媒には、二硫化炭素、ジクロロメタン、クロロホル
ム、ジクロロエタン、ニトロベンゼン等があるが、ニト
ロベンゼンが好ましい。A catalyst is usually used in the reaction of diphenylcyclohexane or its derivative with para-nitrobenzoyl chloride or its derivative. The catalyst includes AlCl 3 , SbCl 5 , FeCl 3 , TeCl 2 , S
Examples thereof include nCl 4 , TiCl 4 , BiCl 3 , ZnCl 2 and the like, but AlCl 3 is preferable from the viewpoint of reactivity. Also,
In the reaction, a solvent is used if necessary. The solvent includes carbon disulfide, dichloromethane, chloroform, dichloroethane, nitrobenzene and the like, and nitrobenzene is preferable.
【0042】反応は、無溶媒もしくは溶媒中で、触媒と
パラニトロベンゾイルクロライドもしくはその誘導体と
を攪拌混合し、0℃から150℃でジフェニルシクロヘ
キサンもしくはその誘導体(必要に応じて溶媒に溶解さ
せたもの)を滴下し、反応させる。反応速度が低下した
ときは、反応温度をあげてもよいが、150℃を越えな
い範囲で行わなくてはならない。反応終了後、触媒を失
活させるため、反応混合液を氷に注ぎ、水洗、蒸留、水
蒸気蒸留などで溶媒等を除き、精製することにより1,
1−ビス[4−(4−アミノベンジル)フェニル]シク
ロヘキサン誘導体が得られる。In the reaction, the catalyst and para-nitrobenzoyl chloride or its derivative are mixed with stirring in the absence of solvent or in a solvent, and diphenylcyclohexane or its derivative (dissolved in a solvent as necessary) at 0 ° C to 150 ° C. ) Is added dropwise and reacted. When the reaction rate decreases, the reaction temperature may be raised, but it must be carried out within the range not exceeding 150 ° C. After the completion of the reaction, in order to deactivate the catalyst, the reaction mixture is poured into ice, and the solvent and the like are removed by washing with water, distillation, steam distillation, etc.
A 1-bis [4- (4-aminobenzyl) phenyl] cyclohexane derivative is obtained.
【0043】カルボニル基の還元は、トリフルオロメタ
ンスルホン酸、四塩化チタン等の触媒の存在下、トリア
ルキルシラン、具体的にはトリエチルシラン等を反応さ
せることにより行うことが出来る。その時の反応温度
は、0℃から100℃の間が好ましい。反応にあたって
は、溶媒を使用しても良く、ジクロロメタン、クロロホ
ルム、ジクロロエタン等のハロゲン化炭化水素が好まし
い。ニトロ基の還元には、トルエン、キシレン、メタノ
ール、エタノール、テトラヒドロフラン等の溶媒中で、
白金・カーボン、酸化白金、ラネーニッケル、パラジウ
ム・カーボン(以下Pd−Cと略す)等の触媒を用い、
常圧または加圧下、10〜80℃で水素還元することに
より行われる。前記式(2)、(3)の置換基R、X、
YおよびZを適宜選択する事により、目的のジアミノ化
合物を製造することができる。The reduction of the carbonyl group can be carried out by reacting a trialkylsilane, specifically triethylsilane, in the presence of a catalyst such as trifluoromethanesulfonic acid or titanium tetrachloride. The reaction temperature at that time is preferably between 0 ° C and 100 ° C. A solvent may be used in the reaction, and halogenated hydrocarbons such as dichloromethane, chloroform and dichloroethane are preferred. To reduce the nitro group, in a solvent such as toluene, xylene, methanol, ethanol, tetrahydrofuran,
Using a catalyst such as platinum / carbon, platinum oxide, Raney nickel, palladium / carbon (hereinafter abbreviated as Pd-C),
It is carried out by hydrogen reduction at 10 to 80 ° C. under normal pressure or pressure. The substituents R, X in the formulas (2) and (3),
By appropriately selecting Y and Z, the desired diamino compound can be produced.
【0044】[0044]
【実施例】以下、本発明の化合物に関して、実施例によ
り、より詳細に例示するとともに、この化合物を用いる
ことにより得られる製品、すなわちポリイミド樹脂の液
晶配向膜を応用例として示すが、本発明ではこれらの実
施例に限定されるものではない。EXAMPLES The compounds of the present invention will be illustrated below in more detail with reference to Examples, and products obtained by using the compounds, that is, liquid crystal alignment films of polyimide resin will be shown as application examples. It is not limited to these examples.
【0045】以下に示す応用例および応用比較例におい
て、残像現象の度合は、C−Vカーブ法を用いて測定し
た。C−Vカーブ法は、液晶セルに25mV、1kHz
の交流を印加し、さらに周波数0.0036Hzの直流
の三角波(以下、DC電圧という。)を重たんさせ、D
C電圧をー10Vから10Vの範囲で掃引することによ
り変化する容量Cを記録する方法である。DC電圧を正
側(0→10V)に掃引すると、容量は大きくなる。次
に負側(10→0V)に掃引すると、容量は小さくな
る。0より負側(0→ー10V)に掃引すると、また容
量は大きくなり、正側(ー10→0V)に掃引するとま
た小さくなる。これを数サイクル繰り返した後の波形
は、図1のようになる。液晶配向膜表面に電荷の偏りが
生じ、この偏りが安定化した場合、電圧が正側、負側両
方においてヒステリシスカーブを描く。残留電荷は、正
側、負側両方でC−V曲線に接線を2本づつひき、これ
らとそれぞれDC電圧0のときの容量(C0 )との交点
(α1〜α4)をそれぞれ求め、正側は|α1−α2|、負
側は|α3−α4|の各2点間の電圧差を求めた後、これ
らの平均の電圧差、すなわち(|α1−α2|+|α3−
α4|)/2を求めることにより決定される。この値
は、液晶セルの膜厚及び配向膜の膜厚が同じであれば、
電荷の偏り安定化のパラメーターとなる。すなわち残留
電荷の小さい配向膜を用いるほど残像現象を緩和でき
る。In the application examples and application comparative examples shown below, the degree of the afterimage phenomenon was measured by the CV curve method. The C-V curve method uses a liquid crystal cell of 25 mV and 1 kHz.
Is applied, and a direct current triangular wave (hereinafter, referred to as DC voltage) having a frequency of 0.0036 Hz is further overlapped, and D
It is a method of recording the capacitance C which changes by sweeping the C voltage in the range of -10V to 10V. When the DC voltage is swept to the positive side (0 → 10V), the capacity increases. Next, the capacitance is reduced by sweeping to the negative side (10 → 0V). When the voltage is swept from 0 to the negative side (0 → -10V), the capacity increases again, and when the voltage is swept to the positive side (-10 → 0V), the capacity decreases again. The waveform after repeating this for several cycles is as shown in FIG. When the bias of the charges is generated on the surface of the liquid crystal alignment film and the bias is stabilized, the voltage draws a hysteresis curve on both the positive side and the negative side. For the residual charge, draw two tangents on the C-V curve on both the positive side and the negative side, and find the intersections (α 1 to α 4 ) of these and the capacitance (C 0 ) when the DC voltage is 0, respectively. , The positive side is | α 1 −α 2 |, the negative side is | α 3 −α 4 |, and the average voltage difference between these two points is calculated, that is, (| α 1 −α 2 | │ + │α 3 −
It is determined by finding α 4 |) / 2. If the film thickness of the liquid crystal cell and the film thickness of the alignment film are the same, this value is
It is a parameter for stabilizing the bias of electric charge. That is, the residual image phenomenon can be alleviated by using an alignment film having a small residual charge.
【0046】電圧保持率は、図2のような回路で測定し
た。測定方法は、ゲートパルス幅69μs、周波数60
Hz、波高±4.5Vの矩形波(VS )をソースに印加
することにより変化するドレイン(VD )をオシロスコ
ープより読み取ることによって行った。例えば、ソース
に正の矩形波が印加されると次に負の矩形波が印加され
るまでの間、ドレイン(VD )は正の値を示す。もし、
保持率が100%の場合、図3に示すVD は、点線で表
される長方形の軌道をとるのだが、普通VD は、除々に
0近づく実線の軌道となる。そこで、測定した軌道の面
積(V=0と軌道によって囲まれる面積)すなわち斜線
部分を算出し、これを4回行ない、平均値を求めた。ま
ったく電圧が減少しなかった場合の面積を100%とし
て、これに対し、測定した面積の相対値を電圧保持率
(%)とした。プレチルト角の測定は、クリスタルロー
テーション法を用いて実施した。The voltage holding ratio was measured by a circuit as shown in FIG. The measurement method is as follows: gate pulse width 69 μs, frequency 60
It was performed by reading a drain (V D ) which was changed by applying a rectangular wave (V S ) of Hz and a wave height of ± 4.5 V to the source with an oscilloscope. For example, when a positive rectangular wave is applied to the source, the drain (V D ) shows a positive value until the next negative rectangular wave is applied. if,
When the retention rate is 100%, V D shown in FIG. 3 takes a rectangular orbit represented by a dotted line, but normally V D becomes a solid line orbit that gradually approaches 0. Therefore, the area of the measured track (the area surrounded by the track where V = 0 and the track), that is, the shaded area was calculated, and this was repeated four times to obtain the average value. The area when the voltage did not decrease at all was defined as 100%, while the relative value of the measured area was defined as the voltage holding ratio (%). The pretilt angle was measured by using the crystal rotation method.
【0047】実施例1
塩化アルミニウム375.70gとニトロベンゼン65
0ミリリットルを混合し、氷冷下パラニトロベンゾイル
クロライド212.00gを投入し、溶解させた。次
に、1,1−ジフェニルシクロヘキサン78.43gの
ニトロベンゼン150ミリリットル溶液を30分かけて
滴下した。滴下終了30分後、氷浴を外し、マントルヒ
ーターで4時間かけて75℃まで徐々に昇温した。液体
クロマトグラフィーで反応の終了を確認したのち、反応
液を2.5リットルの氷に注ぎ、次いでクロロホルム
1.0リットルで抽出した。この溶液を6N−HCl水
溶液、炭酸水素ナトリウム水溶液、食塩水及び水で洗浄
し、ロータリーエバポレーターでクロロホルムを除去し
た後、水蒸気蒸留でニトロベンゼンを除去した。酢酸エ
チルで再結晶することにより、黒紫色の1,1−ビス
[4−(4−ニトロベンゾイル)フェニル]シクロヘキ
サンの結晶118.64gを得た。融点は174.2〜
176.1℃であった。1,1−ビス[4−(4−ニト
ロベンゾイル)フェニル]シクロヘキサン106.63
gをジクロロメタン1300ミリリットルに溶解し、氷
冷下、四塩化チタン120gのジクロロメタン200ミ
リリットル溶液を1時間かけて滴下した。続いて、トリ
エチルシラン115.5gのジクロロメタン150ミリ
リットル溶液を90分かけて滴下した。滴下終了30分
後、氷浴を外し、室温で4時間攪拌した。液体クロマト
グラフィーで反応の終了を確認したのち、反応液を炭酸
ナトリウム水溶液で中和し、水洗した。ロータリーエバ
ポレーターでジクロロメタンを除去した後、トルエンに
溶解し、アルミナカラム処理を行い、その溶出液から溶
媒を留去した。濃縮物を酢酸エチル溶媒で再結晶するこ
とにより、淡黄色の1,1−ビス[4−(4−ニトロベ
ンジル)フェニル]シクロヘキサンの結晶93.5gを
得た。融点は125.4〜126.5℃であった。1,
1−ビス[4−(4−ニトロベンジル)フェニル]シク
ロヘキサン98.93gをテトラヒドロフラン1100
ミリリットルに溶解し、Pd−C触媒(5%品、水分5
5.9%含)9.8gを加え、常圧にて水冷、攪拌しな
がら水素ガスと接触させた。水素の吸収が停止した後
に、触媒を濾別し、溶液を濃縮した。濃縮物をトルエン
溶媒で再結晶することにより、本発明のジアミノ化合物
である、1,1−ビス[4−(4−アミノベンジル)フ
ェニル]シクロヘキサン71.71gを得た。 融点は
154.4〜155.5℃であった。この化合物のプロ
トン核磁気共鳴スペクトル(1H-NMR)を図4に、I
Rチャートを図5に示す。Example 1 375.70 g of aluminum chloride and 65 of nitrobenzene
0 ml was mixed, and 212.00 g of para-nitrobenzoyl chloride was added under ice cooling and dissolved. Next, a solution of 78.43 g of 1,1-diphenylcyclohexane in 150 ml of nitrobenzene was added dropwise over 30 minutes. Thirty minutes after the completion of dropping, the ice bath was removed, and the temperature was gradually raised to 75 ° C. over 4 hours with a mantle heater. After confirming the completion of the reaction by liquid chromatography, the reaction solution was poured into 2.5 liters of ice and then extracted with 1.0 liter of chloroform. This solution was washed with a 6N-HCl aqueous solution, a sodium hydrogen carbonate aqueous solution, saline and water, and after removing chloroform by a rotary evaporator, nitrobenzene was removed by steam distillation. By recrystallizing from ethyl acetate, 118.64 g of black-purple crystals of 1,1-bis [4- (4-nitrobenzoyl) phenyl] cyclohexane were obtained. Melting point 174.2-
It was 176.1 ° C. 1,1-bis [4- (4-nitrobenzoyl) phenyl] cyclohexane 106.63
g was dissolved in 1300 ml of dichloromethane, and a solution of 120 g of titanium tetrachloride in 200 ml of dichloromethane was added dropwise over 1 hour under ice cooling. Subsequently, a solution of 115.5 g of triethylsilane in 150 ml of dichloromethane was added dropwise over 90 minutes. Thirty minutes after the completion of dropping, the ice bath was removed and the mixture was stirred at room temperature for 4 hours. After confirming the completion of the reaction by liquid chromatography, the reaction solution was neutralized with an aqueous sodium carbonate solution and washed with water. After removing dichloromethane with a rotary evaporator, the residue was dissolved in toluene and treated with an alumina column, and the solvent was distilled off from the eluate. The concentrate was recrystallized with an ethyl acetate solvent to obtain 93.5 g of pale yellow 1,1-bis [4- (4-nitrobenzyl) phenyl] cyclohexane crystals. The melting point was 125.4-126.5 ° C. 1,
1-Bis [4- (4-nitrobenzyl) phenyl] cyclohexane 98.93 g was added to tetrahydrofuran 1100.
Dissolve in milliliter, Pd-C catalyst (5% product, water content 5
5.9 g (containing 5.9%) was added, and the mixture was cooled with water at normal pressure and brought into contact with hydrogen gas while stirring. After the absorption of hydrogen ceased, the catalyst was filtered off and the solution was concentrated. By recrystallizing the concentrate with a toluene solvent, 71.71 g of 1,1-bis [4- (4-aminobenzyl) phenyl] cyclohexane, which is the diamino compound of the present invention, was obtained. The melting point was 154.4 to 155.5 ° C. The proton nuclear magnetic resonance spectrum ( 1 H-NMR) of this compound is shown in FIG.
The R chart is shown in FIG.
【0048】実施例2
窒素シール下、4,4−ジフェニルシクロヘキサノン5
4.0gを脱水精製したテトラヒドロフラン700ミリ
リットルに攪拌溶解し、ドライアイス−アセトンで冷却
した。次に、n−ブチルリチウム(1.6モル/リット
ル、ヘキサン溶液)200ミリリットルを2時間かけて
滴下した。滴下終了2時間後、冷却をやめ、4時間かけ
て室温まで昇温した。液体クロマトグラフィーで反応の
終了を確認した後、反応液に300ミリリットルの飽和
塩化アンモニウム水溶液を注ぎ、トルエン700ミリリ
ットルで抽出した。この溶液を食塩水で洗浄し、ロータ
リーエバポレーターでトルエンを除去した。次いで、こ
れをトルエン450ミリリットルに溶解し、イオン交換
樹脂(アンバーリスト15E、オルガノ(株)製)2.
8gを混合し3時間加熱還流させた。イオン交換樹脂を
ろ別した後、ロータリーエバポレーターでトルエンを除
去し、トルエン/ヘプタン=1/4(v/v)に溶解
し、シリカゲルカラムで精製することにより、4,4−
ジフェニル−1−ブチルシクロヘキセン(4,4−ジフ
ェニル−1−ブチリデンシクロヘキサンを含む)32.
97gを得た。4,4−ジフェニル−1−ブチルシクロ
ヘキセン(4,4−ジフェニル−1−ブチリデンシクロ
ヘキサンを含む)32.0gをテトラヒドロフラン20
0ミリリットル、酢酸300ミリリットルに溶解し、酸
化白金1.0gを加え、常圧にて水冷、攪拌しながら水
素ガスと接触させた。水素の吸収が停止した後に、触媒
を濾別し、水2リットルを加え、トルエン1リットルで
抽出した。この溶液を水で洗浄し、ロータリーエバポレ
ーターでトルエンを除去し、1,1−ジフェニル−4−
ブチルシクロヘキサン30.58gを得た。塩化アルミ
ニウム101.22gとニトロベンゼン200ミリリッ
トルを混合し、氷冷下パラニトロベンゾイルクロライド
57.10gを投入し、溶解させた。次に、1,1−ジ
フェニル−4−ブチルシクロヘキサン30.00gのニ
トロベンゼン50ミリリットル溶液を30分かけて滴下
した。滴下終了30分後、氷浴を外し、マントルヒータ
ーで5時間かけて67℃まで徐々に昇温した。液体クロ
マトグラフィーで反応の終了を確認した後、反応液を
1.5リットルの氷に注ぎ、次いでクロロホルム1.0
リットルで抽出した。この溶液を6N−HCl水溶液、
炭酸水素ナトリウム水溶液、食塩水及び水で洗浄し、ロ
ータリーエバポレーターでクロロホルムを除去した後、
水蒸気蒸留でニトロベンゼンを除去した。トルエンに溶
解し、シリカゲルカラムで精製することにより、1,1
−ビス[4−(4−ニトロベンゾイル)フェニル]−4
−ブチルシクロヘキサン45.40gを得た。1,1−
ビス[4−(4−ニトロベンゾイル)フェニル]−4−
ブチルシクロヘキサン45.40gをジクロロメタン6
60ミリリットルに溶解し、氷冷下、トリフルオロ硫酸
36.9gのジクロロメタン80ミリリットル溶液を1
時間かけて滴下した。続いて、トリエチルシラン47.
38gのジクロロメタン80ミリリットル溶液を90分
かけて滴下した。滴下終了30分後、氷浴を外し、室温
で5時間攪拌した。液体クロマトグラフィーで反応の終
了を確認した後、反応液を炭酸ナトリウム水溶液で中和
し、水洗した。ロータリーエバポレーターでジクロロメ
タンを除去した後、トルエンに溶解し、アルミナカラム
処理を行い、その溶出液から溶媒を留去し、1,1−ビ
ス[4−(4−ニトロベンジル)フェニル]−4−ブチ
ルシクロヘキサン38.0gを得た。1,1−ビス[4
−(4−ニトロベンジル)フェニル]−4−ブチルシク
ロヘキサン38.0gをテトラヒドロフラン500ミリ
リットルに溶解し、Pd−C触媒(5%品、水分55.
9%含)4.0gを加え、常圧にて水冷、攪拌しながら
水素ガスと接触させた。水素の吸収が停止した後に、触
媒を濾別し、溶液を濃縮した。濃縮物をエタノール87
%、メタノール13%の混合溶媒で再結晶することによ
り、本発明のジアミノ化合物である、1,1−ビス[4
−(4−アミノベンジル)フェニル]−4−ブチルシク
ロヘキサン14.22gを得た。融点は58.5〜6
0.1℃であった。この化合物のプロトン核磁気共鳴ス
ペクトル(1H-NMR)を図6に、IRチャートを図7
に示す。Example 2 4,4-diphenylcyclohexanone 5 under nitrogen blanket
4.0 g of the product was dissolved in 700 ml of dehydrated and purified tetrahydrofuran with stirring and cooled with dry ice-acetone. Next, 200 ml of n-butyllithium (1.6 mol / liter, hexane solution) was added dropwise over 2 hours. Two hours after the completion of dropping, cooling was stopped and the temperature was raised to room temperature over 4 hours. After confirming the completion of the reaction by liquid chromatography, 300 ml of a saturated ammonium chloride aqueous solution was poured into the reaction solution, followed by extraction with 700 ml of toluene. This solution was washed with brine and the toluene was removed by a rotary evaporator. Then, this was dissolved in 450 ml of toluene, and an ion exchange resin (Amberlyst 15E, manufactured by Organo Co.) 2.
8 g was mixed and heated under reflux for 3 hours. After the ion exchange resin was filtered off, the toluene was removed by a rotary evaporator, and the residue was dissolved in toluene / heptane = 1/4 (v / v) and purified by a silica gel column to give 4,4-
Diphenyl-1-butylcyclohexene (including 4,4-diphenyl-1-butylidenecyclohexane) 32.
97 g are obtained. Tetrahydrofuran 20 was added to 32.0 g of 4,4-diphenyl-1-butylcyclohexene (including 4,4-diphenyl-1-butylidenecyclohexane).
It was dissolved in 0 ml of acetic acid and 300 ml of acetic acid, 1.0 g of platinum oxide was added, and the mixture was cooled with water under normal pressure and brought into contact with hydrogen gas while stirring. After the absorption of hydrogen was stopped, the catalyst was filtered off, 2 liters of water was added, and the mixture was extracted with 1 liter of toluene. This solution was washed with water, toluene was removed by a rotary evaporator, and 1,1-diphenyl-4-
30.58 g of butylcyclohexane was obtained. Aluminum chloride (101.22 g) and nitrobenzene (200 ml) were mixed, and para-nitrobenzoyl chloride (57.10 g) was added under ice-cooling and dissolved. Next, a solution of 30.00 g of 1,1-diphenyl-4-butylcyclohexane in 50 ml of nitrobenzene was added dropwise over 30 minutes. Thirty minutes after the completion of dropping, the ice bath was removed, and the temperature was gradually raised to 67 ° C. over 5 hours with a mantle heater. After confirming the completion of the reaction by liquid chromatography, the reaction solution was poured into 1.5 liter of ice, and then chloroform 1.0
Extracted in liters. This solution is a 6N-HCl aqueous solution,
After washing with an aqueous solution of sodium hydrogen carbonate, saline and water, and removing the chloroform with a rotary evaporator,
Nitrobenzene was removed by steam distillation. By dissolving in toluene and purifying with a silica gel column, 1,1
-Bis [4- (4-nitrobenzoyl) phenyl] -4
45.40 g of -butylcyclohexane was obtained. 1,1-
Bis [4- (4-nitrobenzoyl) phenyl] -4-
Butylcyclohexane 45.40 g was added to dichloromethane 6
Dissolve in 60 ml, and under ice cooling, add 16.9 ml of a solution of 36.9 g of trifluorosulfuric acid in 80 ml of dichloromethane.
It dripped over time. Subsequently, triethylsilane 47.
A solution of 38 g of 80 ml of dichloromethane was added dropwise over 90 minutes. Thirty minutes after the completion of dropping, the ice bath was removed and the mixture was stirred at room temperature for 5 hours. After confirming the completion of the reaction by liquid chromatography, the reaction solution was neutralized with an aqueous sodium carbonate solution and washed with water. After removing dichloromethane with a rotary evaporator, the residue was dissolved in toluene and treated with an alumina column, and the solvent was distilled off from the eluate to obtain 1,1-bis [4- (4-nitrobenzyl) phenyl] -4-butyl. 38.0 g of cyclohexane was obtained. 1,1-bis [4
38.0 g of-(4-nitrobenzyl) phenyl] -4-butylcyclohexane was dissolved in 500 ml of tetrahydrofuran, and a Pd-C catalyst (5% product, moisture 55.
4.0 g (containing 9%) was added, and the mixture was cooled with water at normal pressure and brought into contact with hydrogen gas while stirring. After the absorption of hydrogen ceased, the catalyst was filtered off and the solution was concentrated. Concentrate the ethanol 87
%, And 13% methanol 13% to recrystallize the diamino compound of the present invention, 1,1-bis [4
14.22 g of-(4-aminobenzyl) phenyl] -4-butylcyclohexane was obtained. Melting point is 58.5-6
It was 0.1 ° C. The proton nuclear magnetic resonance spectrum ( 1 H-NMR) of this compound is shown in FIG. 6, and the IR chart is shown in FIG.
Shown in.
【0049】応用例1
攪拌装置、温度計、コンデンサー及び窒素置換装置を付
した200ミリリットルの4つ口フラスコに脱水精製し
たN−メチル−2−ピロリドン50g、ついで1,1−
ビス[4−(4−アミノベンジル)フェニル]シクロヘ
キサン7.43gを仕込み攪拌溶解した。これを13℃
に冷却してピロメリット酸二無水物3.69gを一度に
投入し、冷却しながら攪はん反応させた。一時間後、パ
ラアミノフェニルトリメトキシシラン0.11gを加え
て20℃で1時間攪拌反応させた。その後、反応液をN
−メチル−2−ピロリドン(NMP)51.1gで希釈
することによりポリアミック酸10重量%の透明溶液が
得られた。この溶液の25℃における粘度は1870セ
ンチポイズであった。この溶液にブチルセロソルブとN
MPとの1:1の混合溶液を加えてポリアミック酸を3
重量%に希釈した後、片面にITO電極を設けた透明ガ
ラス基盤上に回転塗布法(スピンナー法)で塗布した。
回転条件は5000rpm 、15秒であった。塗膜後10
0度で10分乾燥した後、オーブン中で一時間かけて2
00℃まで昇温を行い、200℃で90分間加熱処理を
行い、膜厚約600オングストロームポリベンジルイミ
ドを得た。このポリベンジルイミド膜が形成された基盤
2枚の塗膜面をそれぞれラビング処理し液晶配向膜と
し、ラビング方向が平行で、かつ互いに対向するように
セル厚6ミクロンの液晶セルを組み立て、チッソ社製T
FT用液晶FB01を封入した。封入後120℃で30
分間アイソトロピック処理を行い、室温まで徐冷して液
晶素子を得た。なお、プレチルト角の測定には、メルク
社の液晶ZLI−1132を入れたセル厚20ミクロン
の液晶セルを同様にして作った。この液晶素子の配向性
は良好であり、クリスタルローテーション法によって測
定したこの液晶のプレチルト角は7.3度であった。ま
たこのセルの残留電荷は25℃で0.06V、保持率は
97.4%であった。Application Example 1 50 g of dehydrated and refined N-methyl-2-pyrrolidone was placed in a 200 ml four-necked flask equipped with a stirrer, a thermometer, a condenser and a nitrogen purging device, and then 1,1-
Bis [4- (4-aminobenzyl) phenyl] cyclohexane (7.43 g) was charged and dissolved with stirring. This is 13 ℃
After cooling, 3.69 g of pyromellitic dianhydride was added at once, and the reaction was stirred while cooling. After 1 hour, 0.11 g of para-aminophenyltrimethoxysilane was added, and the mixture was reacted with stirring at 20 ° C. for 1 hour. After that, the reaction solution is
A clear solution of 10% by weight of polyamic acid was obtained by diluting with 51.1 g of -methyl-2-pyrrolidone (NMP). The viscosity of this solution at 25 ° C. was 1870 centipoise. Add butyl cellosolve and N to this solution.
Add 1: 1 mixed solution with MP to add polyamic acid to 3
After diluting to a weight percentage, it was applied by spin coating (spinner method) on a transparent glass substrate having an ITO electrode on one side.
The rotation conditions were 5000 rpm and 15 seconds. 10 after coating
After drying at 0 degrees for 10 minutes, 2 hours in the oven
The temperature was raised to 00 ° C., and heat treatment was performed at 200 ° C. for 90 minutes to obtain a film thickness of about 600 Å polybenzylimide. The coating surfaces of the two substrates on which the polybenzylimide film was formed were rubbed to form a liquid crystal alignment film, and a liquid crystal cell having a cell thickness of 6 microns was assembled so that the rubbing directions were parallel and opposed to each other. Made T
The liquid crystal FB01 for FT was enclosed. 30 after encapsulation at 120 ° C
The liquid crystal element was obtained by performing isotropic treatment for minutes and gradually cooling to room temperature. For the measurement of the pretilt angle, a liquid crystal cell containing a liquid crystal ZLI-1132 manufactured by Merck & Co. Inc. and having a cell thickness of 20 μm was similarly prepared. The alignment of this liquid crystal element was good, and the pretilt angle of this liquid crystal measured by the crystal rotation method was 7.3 degrees. The residual charge of this cell was 0.06 V at 25 ° C., and the retention rate was 97.4%.
【0050】応用例2
攪拌装置、温度計、コンデンサー及び窒素置換装置を付
した200ミリリットルの4つ口フラスコに脱水精製し
たN−メチル−2−ピロリドン50g、ついで1,1−
ビス[4−(4−アミノベンジル)フェニル]シクロヘ
キサン7.43gを仕込み攪拌溶解した。これを13℃
に冷却してメチルシクロブタンテトラカルボン酸二無水
物3.68gを一度に投入し、冷却しながら攪はん反応
させた。一時間後、パラアミノフェニルトリメトキシシ
ラン0.33gを加えて20℃で1時間攪拌反応させ
た。その後、反応液をN−メチル−2−ピロリドン(N
MP)53.0gで希釈することによりポリアミック酸
10重量%の透明溶液が得られた。この溶液の25℃に
おける粘度は104.5センチポイズであった。この溶
液にブチルセロソルブとNMPとの7:3の混合溶液を
加えてポリアミック酸を3重量%に希釈した後、片面に
ITO電極を設けた透明ガラス基盤上に回転塗布法(ス
ピンナー法)で塗布した。回転条件は3000rpm 、1
5秒であった。塗膜後100度で10分乾燥した後、オ
ーブン中で一時間かけて200℃まで昇温を行い、20
0℃で90分間加熱処理を行い、膜厚約600オングス
トロームポリベンジルイミドを得た。このポリベンジル
イミド膜が形成された基盤2枚の塗膜面をそれぞれラビ
ング処理し液晶配向膜とし、ラビング方向が平行で、か
つ互いに対向するようにセル厚6ミクロンの液晶セルを
組み立て、チッソ社製TFT用液晶FB01を封入し
た。封入後120℃で30分間アイソトロピック処理を
行い、室温まで徐冷して液晶素子を得た。なお、プレチ
ルト角の測定には、メルク社の液晶ZLI−1132を
入れたセル厚20ミクロンの液晶セルを同様にして作っ
た。この液晶素子の配向性は良好であり、クリスタルロ
ーテーション法によって測定したこの液晶のプレチルト
角は3.1度であった。またこのセルの残留電荷は25
℃で0.01V、電圧保持率は97.3%であった。Application Example 2 50 g of dehydrated and purified N-methyl-2-pyrrolidone in a 200 ml four-necked flask equipped with a stirrer, a thermometer, a condenser and a nitrogen purging device, and then 1,1-
Bis [4- (4-aminobenzyl) phenyl] cyclohexane (7.43 g) was charged and dissolved with stirring. This is 13 ℃
After cooling, the mixture was charged with 3.68 g of methylcyclobutanetetracarboxylic dianhydride at once, and the mixture was stirred while cooling. After one hour, 0.33 g of paraaminophenyltrimethoxysilane was added, and the mixture was reacted with stirring at 20 ° C. for 1 hour. Then, the reaction solution was mixed with N-methyl-2-pyrrolidone (N
A transparent solution containing 10% by weight of polyamic acid was obtained by diluting with 53.0 g of MP). The viscosity of this solution at 25 ° C. was 104.5 centipoise. A 7: 3 mixed solution of butyl cellosolve and NMP was added to this solution to dilute the polyamic acid to 3% by weight, and then applied by spin coating (spinner method) on a transparent glass substrate provided with an ITO electrode on one side. . Rotation condition is 3000 rpm, 1
It was 5 seconds. After the coating film is dried at 100 ° C for 10 minutes, the temperature is raised to 200 ° C in an oven for 1 hour, and
A heat treatment was performed at 0 ° C. for 90 minutes to obtain a film thickness of about 600 Å polybenzylimide. The coating surfaces of the two substrates on which the polybenzylimide film was formed were rubbed to form a liquid crystal alignment film, and a liquid crystal cell having a cell thickness of 6 microns was assembled so that the rubbing directions were parallel and opposed to each other. The liquid crystal FB01 for TFT was enclosed. After encapsulation, isotropic treatment was performed at 120 ° C. for 30 minutes, and the liquid crystal element was obtained by gradually cooling to room temperature. For the measurement of the pretilt angle, a liquid crystal cell containing a liquid crystal ZLI-1132 manufactured by Merck & Co. Inc. and having a cell thickness of 20 μm was similarly prepared. The alignment of this liquid crystal element was good, and the pretilt angle of this liquid crystal measured by the crystal rotation method was 3.1 degrees. The residual charge of this cell is 25
The temperature was 0.01 V and the voltage holding ratio was 97.3%.
【0051】応用例3
攪拌装置、温度計、コンデンサー及び窒素置換装置を付
した200ミリリットルの4つ口フラスコに脱水精製し
たN−メチル−2−ピロリドン50g、ついで1,1−
ビス[4−(4−アミノベンジル)フェニル]−4−ブ
チルシクロヘキサン8.36gを仕込み攪拌溶解した。
これを13℃に冷却してピロメリット酸二無水物3.6
9gを一度に投入し、冷却しながら攪拌し反応させた。
一時間後、パラアミノフェニルトリメトキシシラン0.
11gを加えて20℃で1時間攪拌し反応させた。その
後、反応液をN−メチル−2−ピロリドン(NMP)5
9.4gで希釈することによりポリアミック酸10重量
%の透明溶液が得られた。この溶液の25℃における粘
度は1540センチポイズであった。この溶液にブチル
セロソルブとNMPとの1:1の混合溶液を加えてポリ
アミック酸を3重量%に希釈した後、片面にITO電極
を設けた透明ガラス基盤上に回転塗布法(スピンナー
法)で塗布した。回転条件は5000rpm 、15秒であ
った。塗膜後100度で10分乾燥した後、オーブン中
で一時間かけて200℃まで昇温を行い、200℃で9
0分間加熱処理を行い、膜厚約600オングストローム
ポリベンジルイミドを得た。このポリベンジルイミド膜
が形成された基盤2枚の塗膜面をそれぞれラビング処理
し液晶配向膜とし、ラビング方向が平行で、かつ互いに
対向するようにセル厚6ミクロンの液晶セルを組み立
て、チッソ社製TFT用液晶FB01を封入した。封入
後120℃で30分間アイソトロピック処理を行い、室
温まで徐冷して液晶素子を得た。なお、プレチルト角の
測定には、メルク社の液晶ZLI−1132を入れたセ
ル厚20ミクロンの液晶セルを同様にして作った。この
液晶素子の配向性は良好であり、クリスタルローテーシ
ョン法によって測定したこの液晶のプレチルト角は5.
0度であった。またこのセルの残留電荷は25℃で0.
07V、保持率は95.6%であった。Application Example 3 50 g of dehydrated and purified N-methyl-2-pyrrolidone in a 200 ml four-necked flask equipped with a stirrer, a thermometer, a condenser and a nitrogen purging device, and then 1,1-
Bis [4- (4-aminobenzyl) phenyl] -4-butylcyclohexane (8.36 g) was charged and dissolved with stirring.
This is cooled to 13 ° C. and pyromellitic dianhydride 3.6 is added.
9 g was added at once, and the mixture was reacted with stirring while cooling.
After one hour, para-aminophenyltrimethoxysilane.
11 g was added and reacted at 20 ° C. for 1 hour with stirring. Then, the reaction solution was mixed with N-methyl-2-pyrrolidone (NMP) 5
Dilution with 9.4 g gave a clear solution of 10% by weight polyamic acid. The viscosity of this solution at 25 ° C. was 1540 centipoise. A 1: 1 mixed solution of butyl cellosolve and NMP was added to this solution to dilute the polyamic acid to 3% by weight, and then applied by spin coating (spinner method) on a transparent glass substrate having an ITO electrode on one side. . The rotation conditions were 5000 rpm and 15 seconds. After the coating film is dried at 100 ° C for 10 minutes, the temperature is raised to 200 ° C in an oven for 1 hour, and the temperature is increased to 9 ° C at 200 ° C.
A heat treatment was performed for 0 minutes to obtain a film thickness of about 600 Å polybenzylimide. The coating surfaces of the two substrates on which the polybenzylimide film was formed were rubbed to form a liquid crystal alignment film, and a liquid crystal cell having a cell thickness of 6 microns was assembled so that the rubbing directions were parallel and opposed to each other. The liquid crystal FB01 for TFT was enclosed. After encapsulation, isotropic treatment was performed at 120 ° C. for 30 minutes, and the liquid crystal element was obtained by gradually cooling to room temperature. For the measurement of the pretilt angle, a liquid crystal cell containing a liquid crystal ZLI-1132 manufactured by Merck & Co. Inc. and having a cell thickness of 20 μm was similarly prepared. The orientation of this liquid crystal element was good, and the pretilt angle of this liquid crystal measured by the crystal rotation method was 5.
It was 0 degrees. The residual charge of this cell is 0.
The voltage was 07 V and the retention rate was 95.6%.
【0052】応用比較例1
2,2−ビス[4−(4−アミノフェノキシ)フェニ
ル]プロパン8.06gとピロメリット酸二無水物4.
36gとパラアミノフェニルトリメトキシシラン0.1
1gを重合し、ポリアミック酸溶液を得た。この溶液に
ブチルセロソルブとNMPとの1:1の混合溶液を加え
てポリアミック酸を3重量%に希釈した後、片面にIT
O電極を設けた透明ガラス基盤上に回転塗布法(スピン
ナー法)で塗布した。回転条件は3000rpm 、15秒
であった。塗膜後100度で10分乾燥した後、オーブ
ン中で一時間かけて200℃まで昇温を行い、200℃
で90分間加熱処理を行い、膜厚約600オングストロ
ームポリエーテルイミドを得た。このポリエーテルイミ
ド膜が形成された基盤2枚の塗膜面をそれぞれラビング
処理し液晶配向膜とし、ラビング方向が平行で、かつ互
いに対向するようにセル厚6ミクロンの液晶セルを組み
立て、チッソ社製TFT用液晶FB01を封入した。封
入後120℃で30分間アイソトロピック処理を行い、
室温まで徐冷して液晶素子を得た。なお、プレチルト角
の測定には、メルク社の液晶ZLI−1132を入れた
セル厚20ミクロンの液晶セルを同様にして作った。こ
の液晶素子の配向性は良好であり、クリスタルローテー
ション法によって測定したこの液晶のプレチルト角は
3.7度であった。またこのセルの残留電荷は25℃で
0.20V、電圧保持率は90.0%であった。Application Comparative Example 1 2,6-bis [4- (4-aminophenoxy) phenyl] propane 8.06 g and pyromellitic dianhydride 4.
36 g and p-aminophenyltrimethoxysilane 0.1
1 g was polymerized to obtain a polyamic acid solution. A 1: 1 mixed solution of butyl cellosolve and NMP was added to this solution to dilute the polyamic acid to 3% by weight, and then IT was coated on one side.
It was applied by a spin coating method (spinner method) on a transparent glass substrate provided with an O electrode. The rotation conditions were 3000 rpm and 15 seconds. After the coating film is dried at 100 degrees for 10 minutes, the temperature is raised to 200 ° C in an oven for 1 hour, and the temperature is increased to 200 ° C.
At 90 ° C. for 90 minutes to obtain a film thickness of about 600 Å polyether imide. The coating surfaces of the two substrates on which the polyetherimide film was formed were each rubbed to form a liquid crystal alignment film, and a liquid crystal cell with a cell thickness of 6 microns was assembled so that the rubbing directions were parallel and opposed to each other. The liquid crystal FB01 for TFT was enclosed. After encapsulation, perform isotropic treatment at 120 ° C for 30 minutes,
The liquid crystal element was obtained by gradually cooling to room temperature. For the measurement of the pretilt angle, a liquid crystal cell containing a liquid crystal ZLI-1132 manufactured by Merck & Co. Inc. and having a cell thickness of 20 μm was similarly prepared. The alignment of this liquid crystal element was good, and the pretilt angle of this liquid crystal measured by the crystal rotation method was 3.7 degrees. The residual charge of this cell was 0.20 V at 25 ° C., and the voltage holding ratio was 90.0%.
【0053】応用比較例2
2,2−ビス[4−(4−アミノフェノキシ)フェニ
ル]プロパン8.06gとメチルシクロブタンテトラカ
ルボン酸二無水物3.92gとパラアミノフェニルトリ
メトキシシラン0.11gを重合し、ポリアミック酸溶
液を得た。この溶液にブチルセロソルブとNMPとの
7:3の混合溶液を加えてポリアミック酸を3重量%に
希釈した後、片面にITO電極を設けた透明ガラス基盤
上に回転塗布法(スピンナー法)で塗布した。回転条件
は5000rpm 、15秒であった。塗膜後100度で1
0分乾燥した後、オーブン中で一時間かけて200℃ま
で昇温を行い、200℃で90分間加熱処理を行い、膜
厚約600オングストロームのポリエーテルイミドを得
た。このポリエーテルイミド膜が形成された基盤2枚の
塗膜面をそれぞれラビング処理し液晶配向膜とし、ラビ
ング方向が平行で、かつ互いに対向するようにセル厚6
ミクロンの液晶セルを組み立て、チッソ社製TFT用液
晶FB01を封入した。封入後120℃で30分間アイ
ソトロピック処理を行い、室温まで徐冷して液晶素子を
得た。なお、プレチルト角の測定には、メルク社の液晶
ZLI−1132を入れたセル厚20ミクロンの液晶セ
ルを同様にして作った。この液晶素子の配向性は良好で
あり、クリスタルローテーション法によって測定したこ
の液晶のプレチルト角は1.5度であった。またこのセ
ルの残留電荷は25℃で0.15V、電圧保持率は8
9.0%であった。Application Comparative Example 2 Polymerization of 8.02 g of 2,2-bis [4- (4-aminophenoxy) phenyl] propane, 3.92 g of methylcyclobutanetetracarboxylic dianhydride and 0.11 g of paraaminophenyltrimethoxysilane. Then, a polyamic acid solution was obtained. A 7: 3 mixed solution of butyl cellosolve and NMP was added to this solution to dilute the polyamic acid to 3% by weight, and then applied by spin coating (spinner method) on a transparent glass substrate provided with an ITO electrode on one side. . The rotation conditions were 5000 rpm and 15 seconds. 1 at 100 degrees after coating
After drying for 0 minutes, the temperature was raised to 200 ° C. over 1 hour in an oven, and heat treatment was performed at 200 ° C. for 90 minutes to obtain a polyetherimide having a film thickness of about 600 Å. The coated surfaces of the two substrates on which the polyetherimide film was formed were rubbed to form liquid crystal alignment films, and the cell thickness was set to 6 so that the rubbing directions were parallel and opposed to each other.
A micron liquid crystal cell was assembled, and a TFT liquid crystal FB01 manufactured by Chisso Corporation was enclosed. After encapsulation, isotropic treatment was performed at 120 ° C. for 30 minutes, and the liquid crystal element was obtained by gradually cooling to room temperature. For the measurement of the pretilt angle, a liquid crystal cell containing a liquid crystal ZLI-1132 manufactured by Merck & Co. Inc. and having a cell thickness of 20 μm was similarly prepared. The alignment of this liquid crystal element was good, and the pretilt angle of this liquid crystal measured by the crystal rotation method was 1.5 degrees. The residual charge of this cell was 0.15 V at 25 ° C, and the voltage holding ratio was 8
It was 9.0%.
【0054】応用比較例3
4,4−ジアミノフェニルエーテル3.46gとピロメ
リット酸二無水物4.36gとパラアミノフェニルトリ
メトキシシラン0.11gを重合し、ポリアミック酸溶
液を得た。この溶液にブチルセロソルブとNMPとの
1:1の混合溶液を加えてポリアミック酸を3重量%に
希釈した後、片面にITO電極を設けた透明ガラス基盤
上に回転塗布法(スピンナー法)で塗布した。回転条件
は3000rpm 、15秒であった。塗膜後100度で1
0分乾燥した後、オーブン中で一時間かけて200℃ま
で昇温を行い、200℃で90分間加熱処理を行い、膜
厚約600オングストロームポリエーテルイミドを得
た。このポリエーテルイミド膜が形成された基盤2枚の
塗膜面をそれぞれラビング処理し液晶配向膜とし、ラビ
ング方向が平行で、かつ互いに対向するようにセル厚6
ミクロンの液晶セルを組み立て、チッソ社製TFT用液
晶FB01を封入した。封入後120℃で30分間アイ
ソトロピック処理を行い、室温まで徐冷して液晶素子を
得た。なお、プレチルト角の測定には、メルク社の液晶
ZLI−1132を入れたセル厚20ミクロンの液晶セ
ルを同様にして作った。この液晶素子の配向性は良好で
あり、クリスタルローテーション法によって測定したこ
の液晶のプレチルト角は0.5度であった。またこのセ
ルの残留電荷は25℃で0.90V、電圧保持率は7
8.0%であった。Application Comparative Example 3 3.46 g of 4,4-diaminophenyl ether, 4.36 g of pyromellitic dianhydride and 0.11 g of paraaminophenyltrimethoxysilane were polymerized to obtain a polyamic acid solution. A 1: 1 mixed solution of butyl cellosolve and NMP was added to this solution to dilute the polyamic acid to 3% by weight, and then applied by spin coating (spinner method) on a transparent glass substrate having an ITO electrode on one side. . The rotation conditions were 3000 rpm and 15 seconds. 1 at 100 degrees after coating
After drying for 0 minutes, the temperature was raised to 200 ° C. in an oven for 1 hour, and heat treatment was performed at 200 ° C. for 90 minutes to obtain a film thickness of about 600 Å polyether imide. The coated surfaces of the two substrates on which the polyetherimide film was formed were rubbed to form liquid crystal alignment films, and the cell thickness was set to 6 so that the rubbing directions were parallel and opposed to each other.
A micron liquid crystal cell was assembled, and a TFT liquid crystal FB01 manufactured by Chisso Corporation was enclosed. After encapsulation, isotropic treatment was performed at 120 ° C. for 30 minutes, and the liquid crystal element was obtained by gradually cooling to room temperature. For the measurement of the pretilt angle, a liquid crystal cell containing a liquid crystal ZLI-1132 manufactured by Merck & Co. Inc. and having a cell thickness of 20 μm was similarly prepared. The alignment of this liquid crystal element was good, and the pretilt angle of this liquid crystal measured by the crystal rotation method was 0.5 degrees. The residual charge of this cell was 0.90 V at 25 ° C, and the voltage holding ratio was 7.
It was 8.0%.
【0055】[0055]
【発明の効果】本発明により新規なジアミノ化合物およ
びこれらの製造方法が提供された。該ジアミノ化合物を
原料として用いたポリイミド化合物は、液晶配向膜とし
て優れた効果を有する。例えば、該ポリイミド化合物
は、通常のラビング処理によって、STN液晶表示素子
に要求されている広い表示面積の基板全域にわたり均一
でかつ高いプレチルト角を有する液晶配向膜となる。ま
た、該液晶配向膜を用いた液晶表示素子は、残像現象の
発生もなく電圧保持率に優れた高品位なものである。こ
れは、原料のジアミノ化合物のもつフェニルシクロヘキ
サン環とそれに結合するアルキル基によってもたらされ
るものと考えられる。このような特徴をもつ本発明のジ
アミノ化合物は、液晶配向膜の原料中間体を主目的とし
てデザインされたが、その他のポリイミド、ポリアミド
等の高分子化合物およびその改質にも使用可能であり、
エポキシ架橋材等の他の目的に使用し、また高分子化合
物に新しい特性を導入することが期待できる。INDUSTRIAL APPLICABILITY The present invention provides a novel diamino compound and a method for producing them. A polyimide compound using the diamino compound as a raw material has an excellent effect as a liquid crystal alignment film. For example, the polyimide compound becomes a liquid crystal alignment film that is uniform and has a high pretilt angle over the entire substrate having a wide display area required for an STN liquid crystal display element by a normal rubbing treatment. Further, the liquid crystal display element using the liquid crystal alignment film is of high quality with excellent voltage holding ratio without occurrence of afterimage phenomenon. It is considered that this is caused by the phenylcyclohexane ring of the starting diamino compound and the alkyl group bonded to it. The diamino compound of the present invention having such characteristics was designed mainly as a raw material intermediate for a liquid crystal alignment film, but it can also be used for other polyimide, polymer compounds such as polyamide and modification thereof.
It is expected to be used for other purposes such as epoxy cross-linking material and to introduce new properties into polymer compounds.
【0056】[0056]
【図1】C−Vヒステリシス曲線を示す図である。FIG. 1 is a diagram showing a CV hysteresis curve.
【図2】電圧保持率の測定に用いられる回路図である。FIG. 2 is a circuit diagram used for measuring a voltage holding ratio.
【図3】VS は、ゲートパルス幅69μs、周波数60
Hz、波高±4.5Vの矩形波である。VD は、図2に
示す回路のソースにVS を印加し、オシロスコープより
読み取った波形である。[Figure 3] V S, the gate pulse width 69μs, frequency 60
It is a rectangular wave of Hz and a wave height of ± 4.5V. V D is a waveform read by an oscilloscope by applying V S to the source of the circuit shown in FIG.
【図4】実施例1で得られたジアミノ化合物の1H-NM
Rスペクトル図である。FIG. 4 1 H-NM of diamino compound obtained in Example 1
It is an R spectrum figure.
【図5】実施例1で得られたジアミノ化合物のIRチャ
ート図である。5 is an IR chart diagram of the diamino compound obtained in Example 1. FIG.
【図6】実施例2で得られたジアミノ化合物の1H-NM
Rスペクトル図である。FIG. 6 1 H-NM of diamino compound obtained in Example 2
It is an R spectrum figure.
【図7】実施例2で得られたジアミノ化合物のIRチャ
ート図である。7 is an IR chart diagram of the diamino compound obtained in Example 2. FIG.
フロントページの続き (51)Int.Cl.7 識別記号 FI C08G 73/10 C08G 73/10 (56)参考文献 特開 平6−157434(JP,A) 特開 平3−214122(JP,A) 特開 平3−89319(JP,A) 特開 平6−138465(JP,A) (58)調査した分野(Int.Cl.7,DB名) C07C 211/00 CA(STN) REGISTRY(STN)Continuation of front page (51) Int.Cl. 7 identification code FI C08G 73/10 C08G 73/10 (56) Reference JP-A-6-157434 (JP, A) JP-A-3-214122 (JP, A) JP-A-3-89319 (JP, A) JP-A-6-138465 (JP, A) (58) Fields investigated (Int.Cl. 7 , DB name) C07C 211/00 CA (STN) REGISTRY (STN)
Claims (2)
合させた後、カルボニル基およびニトロ基を還元するこ
とを特徴とする、一般式 【化4】 で表されるジアミノ化合物の製造方法。2. A general formula: The diphenylcyclohexane derivative represented by the general formula: After the condensation of the para-nitrobenzoyl chloride derivative represented by the formula, the carbonyl group and the nitro group are reduced, and the general formula: The manufacturing method of the diamino compound represented by.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25934193A JP3435752B2 (en) | 1992-12-07 | 1993-09-22 | Diamino compound and method for producing the same |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4-351340 | 1992-12-07 | ||
| JP35134092 | 1992-12-07 | ||
| JP25934193A JP3435752B2 (en) | 1992-12-07 | 1993-09-22 | Diamino compound and method for producing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH06228061A JPH06228061A (en) | 1994-08-16 |
| JP3435752B2 true JP3435752B2 (en) | 2003-08-11 |
Family
ID=26544078
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25934193A Expired - Fee Related JP3435752B2 (en) | 1992-12-07 | 1993-09-22 | Diamino compound and method for producing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3435752B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4026327B2 (en) * | 2001-06-04 | 2007-12-26 | チッソ株式会社 | Bisaniline derivatives |
-
1993
- 1993-09-22 JP JP25934193A patent/JP3435752B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH06228061A (en) | 1994-08-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3731229B2 (en) | Polyamide acid, polyimide film, liquid crystal alignment film using the same, and liquid crystal display element | |
| US5382688A (en) | Diamino compounds and their production method | |
| JP2011133825A (en) | Liquid crystal aligning agent, liquid crystal aligning film, and liquid crystal display element | |
| JP2720053B2 (en) | Novel diamino compound, dinitro compound, diol compound and production method | |
| JP3123621B2 (en) | Liquid crystal alignment film and liquid crystal display device | |
| JP4487343B2 (en) | Diamino compound, resin composition using the same, liquid crystal alignment film, and liquid crystal display element | |
| JP7425537B2 (en) | Diamine, polymer, liquid crystal alignment agent, liquid crystal alignment film, and liquid crystal display element | |
| JP3435752B2 (en) | Diamino compound and method for producing the same | |
| US5414126A (en) | Diamino compounds and liquid crystal aligning films | |
| US6476266B1 (en) | Diamino compound and production process for the same | |
| JP3658798B2 (en) | Diamino compound and method for producing the same | |
| KR102813566B1 (en) | Liquid crystal alignment agent, liquid crystal alignment film and liquid crystal display element | |
| JP3635697B2 (en) | Diamino compounds | |
| JP3636204B2 (en) | Diamino compound and method for producing the same | |
| JP3175361B2 (en) | Diamino compounds and their intermediates | |
| JP4013957B2 (en) | Diamino compound and method for producing the same | |
| JP5034411B2 (en) | Tetracarboxylic dianhydride, liquid crystal aligning agent, and liquid crystal display element | |
| JP3931320B2 (en) | Composite membrane | |
| JP2616796B2 (en) | Diamino compounds | |
| JPH08120078A (en) | Novel polyimide | |
| JP2005097318A (en) | Diamino compound and process for producing the same | |
| JP4882146B2 (en) | Imide compound, resin composition containing the same, liquid crystal alignment film, liquid crystal composition, and liquid crystal display element | |
| JP3252564B2 (en) | Liquid crystal alignment film and liquid crystal display device | |
| HK1001838B (en) | Diamino compounds and their production method and liquid crystal alignment layers using the compounds | |
| JPH0873589A (en) | Polyamide having side chain |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 5 Free format text: PAYMENT UNTIL: 20080606 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090606 Year of fee payment: 6 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100606 Year of fee payment: 7 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100606 Year of fee payment: 7 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110606 Year of fee payment: 8 |
|
| S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 8 Free format text: PAYMENT UNTIL: 20110606 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 8 Free format text: PAYMENT UNTIL: 20110606 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110606 Year of fee payment: 8 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 9 Free format text: PAYMENT UNTIL: 20120606 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120606 Year of fee payment: 9 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130606 Year of fee payment: 10 |
|
| LAPS | Cancellation because of no payment of annual fees |