JP3452503B2 - Molding method of base for semiconductor package - Google Patents
Molding method of base for semiconductor packageInfo
- Publication number
- JP3452503B2 JP3452503B2 JP08738099A JP8738099A JP3452503B2 JP 3452503 B2 JP3452503 B2 JP 3452503B2 JP 08738099 A JP08738099 A JP 08738099A JP 8738099 A JP8738099 A JP 8738099A JP 3452503 B2 JP3452503 B2 JP 3452503B2
- Authority
- JP
- Japan
- Prior art keywords
- base
- package
- heat
- semiconductor device
- semiconductor package
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
- Punching Or Piercing (AREA)
- Shaping Metal By Deep-Drawing, Or The Like (AREA)
Description
【発明の詳細な説明】
【0001】
【発明の属する技術分野】本願発明は、半導体パッケー
ジ用ベースの成形方法に関するものである。当該ベース
は、ICチップやLSIチップ等のチップを搭載する基
板を意味する。該ベースは、熱放散性が良く、更に半導
体パッケージ製造時等の熱変化履歴や半導体装置として
の稼動時の経時寸法変化の少ない金属組織構造を有する
ことが望まれる。
【0002】
【従来の技術】近年コンピュータ装置等に用いられてい
るICやLSIは、素子の高集積化及び作動の高速化が
進むに伴いチップの発熱量が増大している。半導体装置
の信頼性の向上にとっては温度上昇は好ましくはなく、
ある温度以上にならないよう放熱特性を改善させる必要
がある。
【0003】このため、温度上昇を制御するための種々
のパッケージ構造が提案されている。例えば、パッケー
ジ材料を樹脂或いはセラミックスから熱伝導性の良い
銅、アルミニウムやその合金で構成した気密封止半導体
容器がU.S.Pat.4524238、特開昭59―33
851或いは特開平5-501638に開示されている。
【0004】このパッケージは金属製基板を使用してい
るので、従来の構成に比較して放熱能力は向上している
が、チップの発熱量を放熱するための主要構成部が基礎
(基板)部材と窓枠部材に分離され、これらを接着する
構造になっているため、半導体装置の組み立ての際の作
業は行い易いが構成が複雑となる上放熱特性に関しては
十分な配慮がなされていないと言える。
【0005】分離構造ではなく一体構造の金属製放熱体
を備えた半導体パッケージとしてはパッケージベースの
中央部に凹部を設け、この部分に半導体装置を固定する
パッケージが特表平8―501414或いはU.S.P
at.4888449に開示されている。これらの中で
特に重要部であるパッケージベースの凹部の加工法に関
してはU.S.Pat.4939316に開示されてい
る。
【0006】加工法は主にミリング、研削やエッチング
法あるいは代替法として変形プロセスがある。ミリング
や研削加工によるパッケージベースの凹部の成形法は、
基本的には切削加工あるいは削除によるので、凹部の薄
肉部(底部)の強度は元の素材強度のままであり、また
表面の平坦度と面荒さは使用する工具、加工設備及び稼
動条件によって決まることになり、常に再現性よく一定
の表面状態に加工面を維持することは困難である。
【0007】エッチング法も形状を形成する上では原理
的に同様である。以上の加工方法によれば、何れも金属
組織の結晶粒は凹部と加工をしない周辺縁部とは分断さ
れている。
【0008】即ち前記従来の加工方法の内、打ち抜き法
は、図4に示すように、外周縁部6になる厚さの板を打
ち抜き、この穴に薄肉部7を接着して製品とする方法で
ある。
【0009】他方、図5に示すように、上記外周縁部6
になる板を薄肉部7に相当する厚さだけ残して半加工す
れば、外周縁部6になる板の裏面に前述の凸部9が形成
される。この凸部9は切削加工で取り除かれる。以上の
方式は前述のエッチング法などの削除方式に比較して表
面の平坦度と面荒さ及び成形品の品質の再現性の上では
優れている方式であるが、凹部の強化に関しては何ら配
慮されていない。
【0010】更に、従来の例によれば、半導体パッケー
ジ組み立て製作時の温度履歴、或いは半導体装置の作動
時の発熱による放熱体の熱変位による半導体装置とパッ
ケージベースとの界面の熱伝達に関し、何ら考慮されて
いないと共に、凹部キャビティの中央で発生した熱を凹
部外周縁部を含むパッケージベース全体へ熱伝導により
均一に分散させるための放熱体の金属組織の結晶粒の構
造に関しても配慮されていない。
【0011】
【発明が解決しようとする課題】半導体装置で発生する
熱を高効率に外部に放熱するには、半導体装置とパッケ
ージベースとなる基板との界面の接着状態を良好にし
て、界面での熱抵抗を減少させる事、及び半導体装置を
固定する凹部の厚さをある範囲内で薄くする事等であ
る。
【0012】界面の接着状態を良好にする因子である
が、凹部の接着部の平坦度、表面荒さ、接着方法等があ
る。ここで特に平坦度は、パッケージ組み立て時や半導
体装置を装着し稼動の際の熱変化履歴を受けた後も維持
しなければならない。
【0013】一方、パッケージベースの対象となる基板
材料であるが、熱伝導率の高い事と価格の上から銅、ア
ルミニウムやその合金が使用される。これらの素材は半
導体装置であるシリコンに比較して線膨張係数が大きい
と共に材料強度も低い。
【0014】半導体装置とパッケージベースの接着部
は、線膨張係数と強度の異なる材料の組み合わせによる
一種のバイメタル構造と考えられる。この状態でパッケ
ージ組み立て時、或いはパッケージとしての稼動時の熱
変化履歴をうける。この熱変化履歴により半導体装置、
パッケージべース及び界面に熱抵抗になるような欠陥の
発生を防止するためには凹部の部材に一定の強度を付与
しと共に、熱伝導に対し異方性を持たせ、面方向に均一
に熱を分散させる構造にしてておく必要がある。
【0015】強度を高くするには、この部分の厚さを増
すか合金元素を添加して強化した素材を用いるかがある
が、いずれにしても、それに伴って熱伝導率が減少する
等の現象が生じ効果的ではない。
【0016】本発明の目的は、金属材から成る凹状のキ
ャビティを有する半導体パッケージの凹部の強度を上
げ、熱変化履歴に強くし、更に熱伝導に異方性を付与
し、放熱特性及び信頼性の優れたパッケージべースの成
形方法を提供することにある。
【0017】本発明の他の目的は、凹部の強化を塑性流
動のみで付与する方式で、特にパッケージベースのキャ
ビティ部の両表面を切削加工をしないで形成する方法に
関する。
【0018】更に他の目的は、パッケージベースのキャ
ビティ部に熱伝導に異方性を付与すると共に、厚肉外周
部との間で金属組織上結晶粒が実質的に連続させて熱拡
散通路をより有利にした金属組織を有するパッケージベ
ースの成形方法を提供することにある。
【0019】
【課題を解決するための手段】半導体装置とパッケージ
ベースとの界面を無酸素銅を例として説明すると、線膨
張は3倍以上の開きがあるので、パッケージ組み立て時
や稼動時に繰り返し熱応力を生じる。その結果、凹部の
強度が低いと界面には塑性変形などに基ずき熱拡散を阻
害する空孔や亀裂等の欠陥が発生し、性能低下になる。
【0020】一方、無酸素銅の強度は、図2に示すよう
に冷間加工率によって強度が改善される。強度は加工率
と共に向上するが、パッケージベースの様な使用法では
冷間加工率が均一になり、明確に強度が高くなる20%以
上が望ましい。即ち、半導体装置が搭載される金属材料
部を均一に塑性流動させることにより均一に加工硬化さ
せて強化させると共に、この部分の結晶粒を面方向に塑
性流動させて面方向への熱伝導に対し有利になるよう異
方性を持たせることが望ましい。
【0021】さらに、熱拡散性を改善させるには凹部の
塑性流動部と外周縁部の非塑性流動部との間の金属組織
の結晶粒が図3に示す様に実質的に連続している構造に
して成形し、熱伝導度の高い結晶粒内を通して厚肉部ま
で熱放散させることも重要である。
【0022】
【発明の実施の形態】図1に、パッケージ用ベースであ
る製品4を成形にて得る工程図を示す。素材1は、方形
のアルミニウム、銅などの板で、コイル材あるいは定尺
材から打ち抜き加工或いはカット加工にとって準備され
る。素材1は金型によって、予備成形され予備成形品2
になる。
【0023】予備成形品2には、薄くて平らな底部2
a、テーパ部2bが形成されている。底部2aはこれか
らの工程において更に加工されることなく、この寸法形
状が維持される。
【0024】予備成形品2は、成形加工工程により成形
され成形品3になる。成形品3は、底部3a、エッジ3
b、余肉部3cが形成されている。
【0025】エッジ3bは、予備成形品2のテーパ部2
bの肉で形成されることになるので、エッジ3bが正規
の寸法、形状に成形されるためにはテーパ部2bのテー
パが重要な要素となる。
【0026】製品4にとって不要な肉は、余肉部3cに
集められ、次のトリム工程でトリムされ、スクラップ5
として除去される。
【0027】上記の加工を行うと、製品4は、所謂加工
硬化をしているので、剛性が大である。更に、製品4は
結晶粒が連続して構成されている。即ち、切削加工で製
品4を製造すると、結晶粒の流れが段部で切断されるこ
とになる。
【0028】上記の一連の加工は、金型の強度の関係で
所謂トランスファ加工方式で行われる。即ち、上記加工
を所謂プログレッシブ加工方法で行う場合は、金型の配
置に起因する金型強度の問題があり、アイドル工程を設
けるなどの配慮が必要である。
【0029】
【発明の効果】本願発明によれば、半導体パッケージ用
ベースを塑性加工により成形して製造するので、素材が
加工硬化し、剛性が大で、変形しにくいため、結果とし
て界面の熱伝導上有利であること、切削、せん断等の加
工を伴わないので結晶粒子が連続しているので熱伝導上
有利であること、平坦度が良く、表面が滑らかなので界
面の熱伝導上有利であること、トランスファ加工なので
生産性が良いことなどの効果がある。Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming a base for a semiconductor package. The base means a substrate on which a chip such as an IC chip or an LSI chip is mounted. The base is desired to have a good heat dissipation property and to have a metallographic structure in which the history of heat change during the production of a semiconductor package or the like and the dimensional change over time during operation as a semiconductor device are small. 2. Description of the Related Art In recent years, in ICs and LSIs used in computer devices and the like, the amount of heat generated by chips has increased with the progress of high integration of elements and high-speed operation. Temperature rise is not preferable for improving the reliability of semiconductor devices,
It is necessary to improve the heat radiation characteristics so as not to exceed a certain temperature. For this reason, various package structures for controlling the temperature rise have been proposed. For example, a hermetically sealed semiconductor container in which a package material is made of resin, ceramics, or copper, aluminum, or an alloy thereof having good thermal conductivity is disclosed in U.S. Pat. S. Pat. 4524238, JP-A-59-33
851 or Japanese Patent Application Laid-Open No. Hei 5-50138. Since this package uses a metal substrate, its heat radiation capability is improved as compared with the conventional structure. However, a main component for dissipating heat generated by the chip is a base (substrate) member. And a window frame member, and these are bonded to each other, so that the work at the time of assembling the semiconductor device is easy to perform, but the configuration becomes complicated and the heat radiation characteristics are not sufficiently considered. . As a semiconductor package having a metal heat radiator having an integral structure instead of a separated structure, a concave portion is provided at the center of a package base and a semiconductor device is fixed to this portion in Japanese Patent Application Laid-Open No. 8-501414 or U.S. Pat. S. P
at. 4,888,449. Regarding the processing method of the concave portion of the package base, which is a particularly important part among these, U.S. Pat. S. Pat. 4,939,316. The processing method mainly includes a milling, grinding, etching method or a deformation process as an alternative method. The method of forming the concave part of the package base by milling or grinding
Basically, because of cutting or removal, the strength of the thin portion (bottom) of the recess remains the same as the original material strength, and the flatness and surface roughness of the surface are determined by the tools, processing equipment and operating conditions used. That is, it is difficult to always maintain the processed surface in a constant surface state with good reproducibility. The etching method is similar in principle in forming a shape. According to the above-mentioned processing methods, the crystal grains of the metal structure are separated from the concave portions and the peripheral edge portions which are not processed. That is, among the above-mentioned conventional processing methods, the punching method is, as shown in FIG. 4, a method of punching a plate having a thickness to become an outer peripheral portion 6 and bonding a thin portion 7 to the hole to form a product. It is. On the other hand, as shown in FIG.
If the plate to be formed is semi-processed while leaving the thickness corresponding to the thin portion 7, the above-mentioned convex portion 9 is formed on the back surface of the plate to be the outer peripheral edge portion 6. The projection 9 is removed by cutting. The above method is superior in terms of surface flatness, surface roughness, and reproducibility of the quality of a molded product as compared with the above-described deletion methods such as the etching method, but no consideration is given to strengthening the concave portion. Not. Further, according to the conventional example, there is no description regarding the heat history at the interface between the semiconductor device and the package base due to the temperature history at the time of assembling and manufacturing the semiconductor package or the thermal displacement of the radiator due to the heat generated during the operation of the semiconductor device. No consideration is given, and no consideration is given to the structure of the crystal grains of the metallographic structure of the radiator for uniformly dispersing the heat generated at the center of the recess cavity to the entire package base including the outer periphery of the recess by heat conduction. . In order to efficiently radiate the heat generated in the semiconductor device to the outside, the bonding state of the interface between the semiconductor device and the substrate serving as a package base is improved, and And reducing the thickness of the concave portion for fixing the semiconductor device within a certain range. Factors that improve the bonding state at the interface include the flatness, surface roughness, bonding method, and the like of the bonding portion of the concave portion. Here, the flatness in particular must be maintained even after receiving a history of thermal change during assembly of the package or mounting and operation of the semiconductor device. On the other hand, as a substrate material to be used as a package base, copper, aluminum and alloys thereof are used because of their high thermal conductivity and cost. These materials have a higher linear expansion coefficient and lower material strength than silicon, which is a semiconductor device. The bonding portion between the semiconductor device and the package base is considered to be a kind of bimetal structure made of a combination of materials having different linear expansion coefficients and strengths. In this state, a history of heat change during package assembly or operation as a package is received. The semiconductor device,
In order to prevent the occurrence of defects that cause thermal resistance at the package base and at the interface, the concave member should be given a certain strength and have anisotropy with respect to heat conduction, so that it can be uniformly distributed in the plane direction. It is necessary to have a structure that disperses heat. In order to increase the strength, there is a method of increasing the thickness of this portion or using a material reinforced by adding an alloy element. In any case, the thermal conductivity is reduced. A phenomenon occurs and it is not effective. SUMMARY OF THE INVENTION It is an object of the present invention to increase the strength of a concave portion of a semiconductor package having a concave cavity made of a metal material, to enhance the history of heat change, and to further impart anisotropy to heat conduction, thereby improving heat dissipation characteristics and reliability. An object of the present invention is to provide a method of forming a package base excellent in the above. Another object of the present invention relates to a method in which the concave portions are strengthened only by plastic flow, and particularly to a method for forming both surfaces of the cavity portion of the package base without cutting. Still another object is to impart anisotropy to heat conduction in the cavity portion of the package base and to make crystal grains substantially continuous in the metal structure between the cavity portion and the thick outer peripheral portion, thereby forming a heat diffusion passage. It is an object of the present invention to provide a method of forming a package base having a more advantageous metal structure. If the interface between the semiconductor device and the package base is explained using oxygen-free copper as an example, the linear expansion is three times or more, so that the thermal expansion is repeated during the assembly and operation of the package. Generates stress. As a result, if the strength of the concave portion is low, defects such as vacancies and cracks that inhibit thermal diffusion are generated at the interface based on plastic deformation and the like, and the performance is reduced. On the other hand, the strength of oxygen-free copper is improved by the cold working rate as shown in FIG. Although the strength increases with the working ratio, in a usage such as a package base, it is desirable that the cold working ratio be uniform and the strength be clearly higher than 20%. That is, the metal material portion on which the semiconductor device is mounted is uniformly plastic-flowed to uniformly work-harden and strengthen it, and the crystal grains in this portion are plastically flowed in the plane direction to prevent heat conduction in the plane direction. It is desirable to have anisotropy to be advantageous. Furthermore, in order to improve the thermal diffusivity, the crystal grains of the metal structure between the plastic flow portion of the concave portion and the non-plastic flow portion of the outer peripheral edge are substantially continuous as shown in FIG. It is also important to form the structure and to dissipate the heat through the crystal grains having high thermal conductivity to the thick part. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 shows a process chart for obtaining a product 4 as a package base by molding. The material 1 is a rectangular plate made of aluminum, copper, or the like, and is prepared for punching or cutting from a coil material or a fixed-length material. The raw material 1 is preformed by a mold and the preformed product 2
become. The preform 2 has a thin, flat bottom 2
a, a tapered portion 2b is formed. The dimensions and shape of the bottom 2a are maintained without further processing in the subsequent steps. The preformed product 2 is formed into a molded product 3 by a forming process. The molded product 3 has a bottom 3a, an edge 3
b, a surplus portion 3c is formed. The edge 3b corresponds to the tapered portion 2 of the preform 2
Therefore, the taper of the tapered portion 2b is an important factor in order to form the edge 3b into a regular size and shape. Unnecessary meat for the product 4 is collected in the surplus portion 3c, trimmed in the next trimming step, and scrap 5
Removed. When the above processing is performed, the product 4 is so-called work hardened, and therefore has high rigidity. Further, the product 4 is formed of continuous crystal grains. That is, when the product 4 is manufactured by cutting, the flow of the crystal grains is cut at the step. The above-described series of processing is performed by a so-called transfer processing method in view of the strength of the mold. That is, when the above-mentioned processing is performed by a so-called progressive processing method, there is a problem of the mold strength due to the arrangement of the mold, and it is necessary to provide an idle step or the like. According to the present invention, since the base for the semiconductor package is manufactured by plastic working, the material is hardened and hardened and hardly deformed. It is advantageous for conduction, it is advantageous for heat conduction because crystal grains are continuous because it does not involve processing such as cutting and shearing, and it is good for heat conduction at the interface because of good flatness and smooth surface. In addition, there is an effect that the productivity is good because of the transfer processing.
【図面の簡単な説明】
【図1】工程図
【図2】加工硬化の説明図
【図3】結晶粒が連続していることの説明図
【図4】従来の製品の説明図
【図5】従来の製品の説明図
【符号の説明】
1は素材、2は予備成形品、2aは底部、2bはテーパ
部、3は成形品、3aは底部、3bはエッジ、3cは余
肉、4は製品、5はスクラップ、6は外周縁部、7は薄
肉部、8は接着部、9は凸部である。BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 Process drawing FIG. 2 Explanatory drawing of work hardening FIG. 3 Explanatory drawing of continuous crystal grains FIG. 4 Explanatory drawing of conventional product FIG. DESCRIPTION OF THE PRIOR ART PRODUCTS [Description of References] 1 is a material, 2 is a preformed product, 2a is a bottom portion, 2b is a tapered portion, 3 is a molded product, 3a is a bottom portion, 3b is an edge, 3c is excess, 4 Is a product, 5 is a scrap, 6 is an outer peripheral portion, 7 is a thin portion, 8 is an adhesive portion, and 9 is a convex portion.
フロントページの続き (58)調査した分野(Int.Cl.7,DB名) H01L 23/12 H01L 23/50 B21D 22/02 Continuation of the front page (58) Field surveyed (Int. Cl. 7 , DB name) H01L 23/12 H01L 23/50 B21D 22/02
Claims (1)
に予備成形工程を設け、該予備成形工程において半導体
チップが搭載される平らな底部と該底部から外に向けて
テーパ部を成形することを特徴とする半導体パッケージ
用ベースの成形方法。(57) Claims 1. A preforming step is provided in a step of forming a base for a semiconductor package, and in the preforming step, a flat bottom portion on which a semiconductor chip is mounted and a flat bottom portion are directed outward from the bottom portion. A method for forming a base for a semiconductor package.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP08738099A JP3452503B2 (en) | 1999-03-30 | 1999-03-30 | Molding method of base for semiconductor package |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP08738099A JP3452503B2 (en) | 1999-03-30 | 1999-03-30 | Molding method of base for semiconductor package |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000286358A JP2000286358A (en) | 2000-10-13 |
| JP3452503B2 true JP3452503B2 (en) | 2003-09-29 |
Family
ID=13913302
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP08738099A Expired - Fee Related JP3452503B2 (en) | 1999-03-30 | 1999-03-30 | Molding method of base for semiconductor package |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3452503B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20030054588A (en) * | 2001-12-26 | 2003-07-02 | 동부전자 주식회사 | Tab ball grid array semiconductor package |
| JP3862737B1 (en) * | 2005-10-18 | 2006-12-27 | 栄樹 津島 | Cladding material and manufacturing method thereof, cladding material molding method, and heat dissipation substrate using cladding material |
-
1999
- 1999-03-30 JP JP08738099A patent/JP3452503B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2000286358A (en) | 2000-10-13 |
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