JP3472992B2 - How to connect electrodes - Google Patents
How to connect electrodesInfo
- Publication number
- JP3472992B2 JP3472992B2 JP08314494A JP8314494A JP3472992B2 JP 3472992 B2 JP3472992 B2 JP 3472992B2 JP 08314494 A JP08314494 A JP 08314494A JP 8314494 A JP8314494 A JP 8314494A JP 3472992 B2 JP3472992 B2 JP 3472992B2
- Authority
- JP
- Japan
- Prior art keywords
- electrodes
- electrode
- adhesive
- connection
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistors
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits
- H05K3/328—Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits by welding
Landscapes
- Manufacturing Of Electrical Connectors (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
Description
【0001】[0001]
【産業上の利用分野】この発明は、接着剤を用いて電極
を接続する方法に関するもので、特に半導体チップ、回
路基板からなる高密度の電極の接続方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for connecting electrodes using an adhesive, and more particularly to a method for connecting high density electrodes composed of a semiconductor chip and a circuit board.
【0002】[0002]
【従来の技術】近年、高密度電極の接続方法として、従
来のはんだや共晶などを用いたリジットな接続に比べ、
ソフトな接続が得られ熱応力の緩和が可能な接着剤によ
る接続方法が盛んになってきている。2. Description of the Related Art In recent years, as a method of connecting high density electrodes, compared to conventional rigid connection using solder or eutectic,
The connection method using an adhesive, which is capable of soft connection and capable of relieving thermal stress, is becoming popular.
【0003】この方法には、粒子等の導電材料を所定量
含有した液状接着剤や膜状物により電極間に導電材料を
介在させる方法、あるいは導電材料を含有せずに導電性
を有しない絶縁性接着剤により相対峙する電極間もしく
は電極上に配置した導電材料を接触状態で接着固定する
方法等が知られている。This method includes a method in which a conductive material is interposed between electrodes by a liquid adhesive or a film-like material containing a predetermined amount of a conductive material such as particles, or an insulating material containing no conductive material and having no conductivity. There is known a method of adhering and fixing a conductive material disposed between electrodes facing each other or on an electrode with a conductive adhesive in a contact state.
【0004】この接続に際して、赤外線ヒータやパルス
電流によって加熱される加熱金型等の熱盤により圧着す
るプレス法が一般的であり、この時、電極基板と熱盤間
にシリコーンゴムシートやテフロンなどの高分子フィル
ム類よりなる薄片体を載置して熱圧着することが行われ
ている。At the time of this connection, a press method is generally used in which a heating plate such as an infrared heater or a heating die heated by a pulse current is pressure-bonded. At this time, a silicone rubber sheet, Teflon, or the like is placed between the electrode substrate and the heating plate. It has been practiced to place a thin piece made of the above polymer films and thermocompression-bond it.
【0005】上記の方法で熱圧着すると上記薄片体がク
ッション性を有するので、例えば電極基板がポリイミド
やポリエステルのようなフレキシブルの場合、一括接続
時に電極高さのばらつきを吸収することができる。また
流出した接着剤が熱盤を汚染するのを防止し、さらに基
板の損傷も防止する保護作用も合わせて得ることができ
る。Since the thin piece body has a cushioning property when thermocompression-bonded by the above-mentioned method, when the electrode substrate is flexible such as polyimide or polyester, it is possible to absorb variations in the electrode height at the time of collective connection. Further, it is possible to prevent the adhesive from flowing out from contaminating the hot platen and also to protect the substrate from damage.
【0006】[0006]
【発明が解決しようとする課題】しかしながら、上記の
如きシリコーンゴムシートや高分子フィルム類よりなる
薄片体を載置した場合、接着剤による接続が完了するま
での間に基板が比較的自由に動くので電極の高さのばら
つきを吸収できるものの、電極の面方向にずれが生じて
しまい、特に最近の電極の微細化の進展とも合わせて相
対峙する電極との位置合わせがずれてしまうという不具
合が生じてきた。However, when a thin piece made of a silicone rubber sheet or a polymer film is placed as described above, the substrate moves relatively freely until the connection with the adhesive is completed. Therefore, although it is possible to absorb the variation in the height of the electrode, there is a problem in that the surface direction of the electrode is misaligned, and in particular, the misalignment with the relatively opposing electrode is misaligned with the recent progress in miniaturization of the electrode. Has occurred.
【0007】また、これらの薄片体は熱伝導率が小さい
ので接着剤が接続温度に達するのに時間がかかり生産性
に劣るという欠点もある。さらにこれら上記薄片体は絶
縁体であるので、接続作業時に発生する静電気のために
半導体チップなどの電子部品に破壊が生じるという問題
点も発生している。Further, since these thin pieces have a low thermal conductivity, it takes a long time for the adhesive to reach the connection temperature, and there is a drawback that the productivity is poor. Further, since these thin pieces are insulators, there is a problem that electronic parts such as a semiconductor chip may be broken due to static electricity generated during connection work.
【0008】そこで、この発明は上記問題を解決すべく
なされたもので、相対峙する電極とのずれが生じ難く、
また生産性や静電気対策にも優れた電極の接続方法を提
供することを目的とする。Therefore, the present invention has been made to solve the above-mentioned problems, and it is difficult to cause a gap between the electrodes facing each other.
Another object of the present invention is to provide an electrode connecting method which is excellent in productivity and measures against static electricity.
【0009】[0009]
【課題を解決するための手段】上記目的を達成するた
め、請求項1記載の発明は、基板に設けられた電極と相
対峙する電極との間に接着剤を介し、熱盤を用いて圧着
する電極の接続方法において、少なくとも一方の基板と
熱盤との間に可撓性金属箔を載置し、その後、熱圧着す
ることを特徴とする。In order to achieve the above-mentioned object, the invention according to claim 1 is such that an adhesive is interposed between an electrode provided on a substrate and an electrode facing each other, and a pressure plate is used for pressure bonding. In the electrode connecting method described above, a flexible metal foil is placed between at least one of the substrates and the heating plate, and then thermocompression bonding is performed.
【0010】請求項2記載の発明は、請求項1記載の発
明において、上記可撓性金属箔は、その厚さが500μ
m以下であり、アルミニウム、銅、鉄、もしくはこれら
を50重量%以上含有する合金類のいずれかであること
を特徴とする。According to a second aspect of the present invention, in the first aspect, the flexible metal foil has a thickness of 500 μm.
m or less, and is characterized by being any of aluminum, copper, iron, and alloys containing 50% by weight or more of these.
【0011】図1は、この発明の一実施例の接続方法を
示す構成断面図である。FIG. 1 is a sectional view showing the construction of a connecting method according to an embodiment of the present invention.
【0012】この発明に用いる基板1は半導体チップ類
のシリコーンやガリウム・ヒ素等や、ガラス、セラミッ
クス、絶縁処理金属、ガラス・エポキシ複合体、プラス
チック等の一般的な絶縁基板である。The substrate 1 used in the present invention is a general insulating substrate of semiconductor chips such as silicone, gallium / arsenic, etc., glass, ceramics, insulating metal, glass / epoxy composite, plastic, etc.
【0013】上記絶縁基板に設けた電極2には、半導体
チップ類のバンプやパッド、絶縁基板上に銅箔などの突
出した電極を有する印刷回路板などがある。The electrodes 2 provided on the insulating substrate include bumps and pads of semiconductor chips and a printed circuit board having protruding electrodes such as copper foil on the insulating substrate.
【0014】これら上記電極2は、相対峙する電極2′
の少なくとも一方が基板面より突出していることが電極
の接触が得やすく好ましいが、他の対向する電極は、例
えば薄膜法やアディティブ法などで得た、いわゆる平面
電極や、バンプレス半導体チップ類の場合のような凹状
電極でもよい。バンプレス半導体チップ類の電極は、表
面絶縁層から数ミクロン程度凹状に形成されるが、この
場合も相対峙する電極が基板面より突出する(例えば転
写バンプなど)ことで適用可能である。These electrodes 2 are electrodes 2'that face each other.
It is preferable that at least one of them protrudes from the substrate surface because it is easy to obtain contact with the electrodes, but other opposing electrodes are obtained by, for example, a thin film method or an additive method, so-called planar electrodes, bumpless semiconductor chips, etc. It may be a concave electrode as in the case. The electrodes of the bumpless semiconductor chips are formed in a concave shape of about several microns from the surface insulating layer, but in this case as well, the electrodes facing each other can be applied by projecting from the substrate surface (for example, transfer bumps or the like).
【0015】接着剤3は、導電材料としての導電性粒子
を所定量含有した接着剤や膜状物で電極間に導電材料を
介在するか、あるいは導電材料を含有せずに導電性を有
しない絶縁性接着剤により相対峙する電極間を接触状態
で接着固定する導電性粒子を添加することで、相対峙す
る電極の接触をより効率的に得ることも可能である。こ
の場合に注意すべきことは、粒径を隣接電極間距離より
も小さくすることや、添加量を20体積%以下、好まし
くは15体積%以下として、隣接電極とショートさせな
いことである。The adhesive 3 is an adhesive or a film-like material containing a predetermined amount of conductive particles as a conductive material, which interposes a conductive material between electrodes, or does not contain a conductive material and has no conductivity. It is also possible to more efficiently obtain contact between the electrodes facing each other by adding conductive particles that adhere and fix the electrodes facing each other with an insulating adhesive in a contact state. In this case, it should be noted that the particle size is made smaller than the distance between the adjacent electrodes, and the addition amount is set to 20% by volume or less, preferably 15% by volume or less so as not to short-circuit with the adjacent electrodes.
【0016】接着剤3としては、熱可塑性材料や、熱や
光により硬化性を示す接着性を有する材料が広く適用で
きる。これらは接続後の耐熱性や耐湿性に優れており、
なかでも硬化性材料の適用が好ましい。特にエポキシ系
接着剤は、短時間硬化が可能で接続作業性がよく、分子
構造上接着性に優れる等の特徴から好ましく適用でき
る。As the adhesive 3, a thermoplastic material or a material having adhesiveness which is curable by heat or light can be widely applied. These are excellent in heat resistance and moisture resistance after connection,
Of these, application of a curable material is preferable. In particular, an epoxy adhesive is preferably applicable because it can be cured for a short time, has good workability in connection, and has excellent adhesiveness due to its molecular structure.
【0017】上記エポキシ系接着剤は、例えば高分子量
のエポキシ、固形エポキシと液状エポキシを主成分と
し、硬化剤や触媒、カップリング剤、充填剤などを添加
してなるものが一般的である。The above-mentioned epoxy-based adhesive is generally composed of, for example, a high molecular weight epoxy, a solid epoxy and a liquid epoxy as a main component, and a curing agent, a catalyst, a coupling agent, a filler and the like are added.
【0018】導電粒子としては、Au,Ag,Ni,C
u,W,Sb,Sn、はんだ等の金属粒子やカーボン等
があり、またこれらの導電粒子を核材とするか、あるい
は非導電性のガラス、セラミックス、プラスチック等の
高分子、などからなる核材に上述したような材質からな
る導電層を被覆などにより形成したものでもよい。As the conductive particles, Au, Ag, Ni, C are used.
There are metal particles such as u, W, Sb, Sn, and solder, carbon, etc., and these conductive particles are used as the core material, or cores made of non-conductive glass, ceramics, polymers such as plastics, etc. The material may be formed by coating a conductive layer made of the above-mentioned material.
【0019】さらに、上述したような導電粒子を絶縁層
で被覆してなる絶縁被覆粒子や、導電粒子と絶縁粒子の
併用なども可能である。Further, it is also possible to use insulating coated particles obtained by coating the above-mentioned conductive particles with an insulating layer, and to use both conductive particles and insulating particles in combination.
【0020】これら上記導電性粒子の中では、はんだ等
の熱溶融金属や、プラスチック等の高分子核材に導電層
を形成したものが加熱加圧もしくは加圧により変形性を
有するため積層した際に、回路との接触面積が増加し接
触信頼性が向上するので好ましい。特に高分子類を核と
した場合、電極2、2′の厚みや平坦性のばらつきに対
応しやすい接続部材が得られるので特に好ましい。Among these conductive particles, those having a conductive layer formed on a hot-melting metal such as solder or a polymer core material such as plastic are heated and pressed or are deformable by pressurization. In addition, the contact area with the circuit is increased and the contact reliability is improved, which is preferable. In particular, when a polymer is used as a core, a connecting member that can easily cope with variations in the thickness and flatness of the electrodes 2 and 2'can be obtained, which is particularly preferable.
【0021】可撓性金属箔4は、撓み性を有する金属の
各種箔類が適用できる。曲率半径10mm以下で180
度の曲げが可能な場合に撓み性があるという。この撓み
性を有することで、接続体の損傷を防止し、折り曲げた
箔に挟んだ形でプレスすることもできる。また、上記可
撓性金属箔4は、厚みが500μm以下のものをいい取
扱いの可能な限り薄いもの、例えば厚みは2〜200μ
m程度が好ましが、より好適な厚みは5〜50μmであ
る。As the flexible metal foil 4, various kinds of flexible metal foils can be applied. 180 with a radius of curvature of 10 mm or less
It is said to have flexibility when it can be bent to a certain degree. With this flexibility, damage to the connection body can be prevented, and pressing can be performed with the folded foil sandwiched. The flexible metal foil 4 has a thickness of 500 μm or less, and is as thin as possible for handling, for example, a thickness of 2 to 200 μm.
About m is preferable, but a more preferable thickness is 5 to 50 μm.
【0022】上記可撓性金属箔4の材質としては、アル
ミニウム、銅、鉄、もしくはこれらを50重量%以上含
有する合金類でもよい。これらの表面はなるべく平滑で
あることが好ましく、導電性を有することが接続時の静
電破壊防止上好ましい。The material of the flexible metal foil 4 may be aluminum, copper, iron, or an alloy containing 50% by weight or more of these. It is preferable that these surfaces are as smooth as possible, and it is preferable that they have conductivity in order to prevent electrostatic breakdown during connection.
【0023】上記可撓性金属箔4として用いられるアル
ミニウム箔は、展延性と導電性の点からアルミニウム成
分が90%以上、好ましくは95%以上のものが好適で
ある。これらはJIS、H4160、4170およびZ
4170に規定されているものが、入手が容易でありま
た比較的安価なことから採用しやすく特に好ましい。The aluminum foil used as the flexible metal foil 4 is preferably an aluminum foil having an aluminum content of 90% or more, preferably 95% or more, from the viewpoint of spreadability and conductivity. These are JIS, H4160, 4170 and Z
4170 is particularly preferred because it is easy to obtain and relatively inexpensive because it is easily available.
【0024】銅箔は電解箔でも圧延箔でもよいが、圧延
箔のほうが可撓性を有し表面平滑のものが入手しやすく
好ましい。銅の合金類として、亜鉛、錫、鉛、銀、ニッ
ケルなどが知られている。また、鉄などの磁性金属類の
場合は、磁化により熱盤とセットできる。The copper foil may be an electrolytic foil or a rolled foil, but a rolled foil having flexibility and a smooth surface is preferable because it is easily available. Zinc, tin, lead, silver, nickel and the like are known as copper alloys. Also, in the case of magnetic metals such as iron, they can be set on a heating plate by magnetization.
【0025】この発明に用いる上記可撓性金属箔4は、
定盤6と熱盤5の両者に接して存在することが好ましい
が、少なくとも熱盤5側の基板1に接して存在する必要
がある。The flexible metal foil 4 used in the present invention is
It is preferable that it exists in contact with both the surface plate 6 and the heating plate 5, but at least it must exist in contact with the substrate 1 on the heating plate 5 side.
【0026】また、上記可撓性金属箔4の熱盤5側には
他のシート類が存在してもよいが、熱伝導性を向上する
ためにはない方が好ましい。なお、熱盤5は片方だけで
なく定盤6側も熱盤としてもよい。Although other sheets may be present on the heating plate 5 side of the flexible metal foil 4, it is preferable not to improve the thermal conductivity. The hot platen 5 may be not only one but also the platen 6 side.
【0027】上記接着剤3を用いた接続に際しては、接
着剤3を基板1に設けた電極2を相対峙する電極2′と
の間に形成し、両電極2、2′を位置合わせし少なくと
も一方の基板1と熱盤5との間に上記可撓性金属箔4を
載置して熱圧着する。この時接着剤3は、加熱による低
粘度可により1000ポイズ以下として接続すること
が、電極相互あるいは電極と導電粒子との接触が良好と
なるため好ましい。In the connection using the adhesive 3, the adhesive 3 is formed between the electrode 2 provided on the substrate 1 and the electrode 2'which faces the electrode 2, and both electrodes 2 and 2'are aligned to each other. The flexible metal foil 4 is placed between the one substrate 1 and the heating plate 5 and thermocompression bonded. At this time, it is preferable that the adhesive 3 is connected at a poise of 1000 poise or less due to low viscosity due to heating, since the contact between the electrodes or between the electrodes and the conductive particles is good.
【0028】[0028]
【作用】この発明では、一方の基板と熱盤との間に上記
可撓性金属箔を載置して熱圧着する。そのため金属であ
る上記可撓性金属箔はゴムシートや高分子フィルムに比
べて高弾性率であり、基板の変形に同調しないので相対
峙する電極とのずれが生じ難く、熱伝導率が大きいこと
から接着剤が接続温度に達するのに短時間で可能であり
生産性が向上する。In the present invention, the flexible metal foil is placed between one of the substrates and the heating plate and thermocompression bonded. Therefore, the flexible metal foil, which is a metal, has a higher elastic modulus than a rubber sheet or a polymer film, and since it does not synchronize with the deformation of the substrate, it is unlikely to be displaced from the electrodes facing each other, and has a large thermal conductivity. Therefore, it is possible for the adhesive to reach the connection temperature in a short time, and the productivity is improved.
【0029】また、上記可撓性金属箔の撓み性を有し、
高弾性率や熱伝導率が高いという性質を持つことから、
それ自体の厚みが薄くても取扱い可能な強度を有するの
で接続体の損傷を防ぐとともに、熱源を有効に利用でき
るので省資源や低コスト化が図れる。Further, the flexible metal foil has the flexibility,
Because of its high elastic modulus and high thermal conductivity,
Even if the thickness of itself is small, it has a strength that can be handled, so that damage to the connection body can be prevented, and since a heat source can be effectively used, resource saving and cost reduction can be achieved.
【0030】さらに、導電体であることから接続作業時
に発生する静電気を、例えば熱接着装置を経由してアー
スすることにより排除できるので半導体チップなどの電
子部品の静電気破壊を生じない。Further, since it is a conductor, static electricity generated during connection work can be eliminated by grounding it via, for example, a thermal bonding device, so that electrostatic damage to electronic parts such as semiconductor chips does not occur.
【0031】また、上記可撓性金属箔は耐有機溶剤性を
有するので洗浄が容易であり、汚染後の再使用も可能で
ある。Further, since the flexible metal foil is resistant to organic solvents, it is easy to wash and can be reused after being contaminated.
【0032】[0032]
【実施例】以下、この発明を実施例に基づいて詳細に説
明するが、この発明は以下に記載される実施例に限定さ
れるものではない。EXAMPLES The present invention will now be described in detail based on examples, but the present invention is not limited to the examples described below.
【0033】まず、この発明の第一〜第二の実施例を説
明する。First, first and second embodiments of the present invention will be described.
【0034】ポリイミドフィルム上に高さ18μmの銅
の回路を有する幅30mmのFPC回路板(回路ピッチ
は100μm、電極幅50μmの平行回路の電極)と、
ガラス1.1mm上に酸化インジウム厚み0.2μm
(ITO、表面抵抗20Ω/□)の薄膜回路を有するガ
ラス電極とを接続した。An FPC circuit board having a width of 30 mm and having a copper circuit having a height of 18 μm on a polyimide film (a circuit pitch is 100 μm, electrodes of a parallel circuit having an electrode width of 50 μm),
Indium oxide thickness 0.2 μm on glass 1.1 mm
It was connected to a glass electrode having a thin film circuit of (ITO, surface resistance 20 Ω / □).
【0035】接続は、ガラス電極にアニソルムAC−7
144(異方導電フィルム、分解能14本/mm,エポ
キシ系熱硬化系接着剤に粒径5μmのプラスチックにめ
っきした導電粒子を含有、日立化成工業株式会社製商品
名)を1.5mm幅で貼り付け、セパレータを剥離した
後、FPC回路板と両電極を位置合わせした後、これを
2枚のサンホイル(サンアルミニウム工業株式会社製、
厚み15ミクロンのアルミニウム箔、曲率半径2mmで
180度の曲げが可能)に挟み、160℃、30kgf
/mm2 、15秒で加熱した。この時、常時加熱式の熱
盤を上部に有する熱圧着装置(日立化成工業株式会社
製、商品名AC−S3000C、熱盤はアース線で接
地)で温度を250℃に設定したところ昇温開始後2秒
で接着剤温度が160℃となった。(第一の実施例)
そのため第一の実施例の15秒に対し、より短時間の5
秒でも接続したものを第二の実施例とした。また、接続
後のFPCの伸び量を三次元測定装置(株式会社三豊
製、商品名AE−100)で行ったところ、両実施例と
もに最大5μmであった。また両実施例とも、接続体の
信頼性(85%RH、1000時間後)評価における接
続抵抗の変化もほとんど見られず良好であった。上記二
つの実施例では、家庭用のアルミニウム箔を用いたので
安価であり、アルミニウム箔の汚染時の交換も容易であ
った。The connection was made by connecting the glass electrode to Anisorum AC-7.
144 (Anisotropic conductive film, resolution 14 lines / mm, containing epoxy conductive thermosetting adhesive conductive particles plated on plastic of particle size 5 μm, trade name manufactured by Hitachi Chemical Co., Ltd.) with a width of 1.5 mm After attaching and peeling the separator, the FPC circuit board and both electrodes are aligned, and then two sun foils (manufactured by Sun Aluminum Industry Co., Ltd.,
It is sandwiched between aluminum foil with a thickness of 15 microns and can be bent 180 degrees with a radius of curvature of 2 mm), 160 ° C, 30 kgf
/ Mm 2 , It heated for 15 seconds. At this time, when the temperature was set to 250 ° C. with a thermocompression bonding apparatus (manufactured by Hitachi Chemical Co., Ltd., trade name AC-S3000C, the heating plate is grounded with an earth wire) having a constant heating type heating plate on the top, the temperature starts to rise. Two seconds later, the adhesive temperature reached 160 ° C. (First embodiment) Therefore, in comparison with 15 seconds of the first embodiment, a shorter time of 5
The second embodiment was connected even in seconds. Further, when the elongation amount of the FPC after connection was measured by a three-dimensional measuring device (manufactured by Mitoyo Co., Ltd., trade name AE-100), the maximum was 5 μm in both Examples. Further, in both Examples, there was almost no change in the connection resistance in the reliability evaluation of the connected body (85% RH, after 1000 hours), which was good. In the above two examples, household aluminum foil was used, so it was inexpensive and easy to replace when the aluminum foil was contaminated.
【0036】上記二つの実施例との比較例1〜2を下記
に示す。Comparative examples 1 and 2 of the above two examples are shown below.
【0037】比較例1〜2は、アルミニウム箔を用いな
い場合(比較例1)と、従来の厚み250μmのシリコ
ーンゴムによる場合(比較例2)とし、他の条件は第一
の実施例と同様にして測定した。Comparative Examples 1 and 2 are the case where the aluminum foil is not used (Comparative Example 1) and the case where the conventional silicone rubber having a thickness of 250 μm is used (Comparative Example 2). Other conditions are the same as those of the first embodiment. Was measured.
【0038】比較例1の昇温速度や伸び量は第一の実施
例と同様であったが、熱盤に接着剤が流出して硬化して
しまい、接続体の取り出しが大変困難であり、また熱盤
の清掃に長時間を要したことから、連続作業が困難であ
った。The temperature rising rate and elongation amount of Comparative Example 1 were the same as those of the first example, but the adhesive flowed out to the hot plate and was cured, and it was very difficult to take out the connected body. Further, since it took a long time to clean the hot platen, continuous work was difficult.
【0039】比較例2の場合、160℃の到達に16秒
を要し、伸び量は最大47μmと大きかった。この場
合、対抗する電極の重なり面積が少ないことや、接続時
の熱容量不足のために、接続体の信頼性が第一の実施例
に比べ低下した。In the case of Comparative Example 2, it took 16 seconds to reach 160 ° C. and the maximum elongation was 47 μm. In this case, the reliability of the connection body was lower than that of the first embodiment due to the small overlapping area of the opposing electrodes and the insufficient heat capacity during connection.
【0040】次に、この発明の第三の実施例を説明す
る。Next, a third embodiment of the present invention will be described.
【0041】第三の実施例は、FPCに変えて、ICチ
ップ(2×10mm、高さ0.5mm、4辺周囲にバン
プと呼ばれる50μm角、高さ20μm角、高さ20μ
mの金電極が200個形成)を用いたが、他の各条件は
第一の実施例と同様にした。ガラス側のITO電極を上
記ICチップのバンプ電極のサイズに対応するように変
更した。In the third embodiment, instead of the FPC, an IC chip (2 × 10 mm, height 0.5 mm, 50 μm square called bump around the four sides, height 20 μm square, height 20 μm) is used.
Although 200 gold electrodes of m were formed), other conditions were the same as those in the first embodiment. The ITO electrode on the glass side was changed so as to correspond to the size of the bump electrode of the IC chip.
【0042】上記実施例では、バンプ電極のずれは5μ
m以下であり、ICチップの静電気破壊が見られず、ま
た接続体の信頼性も良好であった。アルミニウム箔の有
する可撓性により、ICチップの端面欠けや割れの発生
も見られなかった。In the above embodiment, the displacement of the bump electrode is 5 μm.
m was less than or equal to m, no electrostatic damage to the IC chip was observed, and the reliability of the connected body was good. Due to the flexibility of the aluminum foil, no chipping or cracking of the end surface of the IC chip was observed.
【0043】次に、第四の実施例および比較例3につい
て説明する。Next, the fourth embodiment and comparative example 3 will be described.
【0044】第四の実施例はアニソルムAC−7144
の接着剤の導電粒子を添加しなかったが、他の各条件は
第三の実施例と同様にした。この場合も、両電極の接触
により導通可能であり、その後の剥離や接着剤による接
続も良好で、接着固定による信頼性に優れた接続が得ら
れた。The fourth embodiment is Anisorum AC-7144.
No conductive particles of the adhesive were added, but the other conditions were the same as in the third embodiment. In this case as well, it was possible to conduct electricity by the contact of both electrodes, and the subsequent peeling and connection with an adhesive were also good, and a connection with excellent reliability was obtained by adhesive fixing.
【0045】また、比較例3では、比較例2のシリコー
ンゴムを熱盤との間に用いた。In Comparative Example 3, the silicone rubber of Comparative Example 2 was used between the hot platen and the silicone rubber.
【0046】上記第四の実施例では、バンプ電極のずれ
は5μm以下であり、ICチップの静電気破壊が見られ
ず、また接続体の信頼性も良好であった。バンプ電極と
基板との接触状況は均一であり、均一加圧によるバンプ
平坦化の硬化も合わせて得られた。In the fourth embodiment, the displacement of the bump electrodes was 5 μm or less, no electrostatic breakdown of the IC chip was observed, and the reliability of the connection body was good. The contact condition between the bump electrode and the substrate was uniform, and the curing of the bump flattening by uniform pressure was also obtained.
【0047】一方比較例3では、バンプ電極のずれが2
0μmあり、ICチップの静電気破壊が見られた。ま
た、バンプ電極と基板との接触に片当たりが見られた。On the other hand, in Comparative Example 3, the displacement of the bump electrode is 2
It was 0 μm, and electrostatic breakdown of the IC chip was observed. In addition, the contact between the bump electrode and the substrate was found to be uneven.
【0048】次に、第五の実施例について説明する。Next, a fifth embodiment will be described.
【0049】第五の実施例はアルミニウム箔に変えて、
圧延銅箔(厚み35μmの両面光沢平滑品、曲率半径2
mmで180度の曲げが可能)を用いたが、他の条件は
第一の実施例と同様とした。The fifth embodiment uses aluminum foil instead of
Rolled copper foil (35 μm thick double-sided glossy smooth product, radius of curvature 2
However, the other conditions were the same as those in the first embodiment.
【0050】上記第5の実施例では、昇温速度や伸び
量、信頼性は第一の実施例と同様に良好であった。ま
た、電子工業界での一般的な材料である銅箔を使用で
き、入手が容易であった。In the fifth embodiment, the rate of temperature rise, the amount of elongation, and the reliability were as good as those in the first embodiment. Further, copper foil, which is a general material in the electronic industry, can be used, and it is easily available.
【0051】[0051]
【発明の効果】以上説明したように、この発明によれ
ば、接着する際に相対峙する電極とのずれが生じ難く、
熱伝導率が大きいことから接着剤が接続温度に達するの
に短時間で可能であり生産性が向上する
また、上記可撓性金属箔が撓み性を有し、高弾性率や熱
伝導率が高いという性質を持つことから、接続体の損傷
を防ぐとともに、熱源を有効に利用できるので省資源や
低コスト化が図れる。さらに、導電体であることから接
続作業時に発生する静電気を、アースすることにより排
除できるので静電気対策にも優れた接続方法を提供する
ことができる。As described above, according to the present invention, the gap between the electrodes facing each other when bonding is less likely to occur,
Since the thermal conductivity is high, it is possible for the adhesive to reach the connection temperature in a short time and the productivity is improved.The flexible metal foil has flexibility and has a high elastic modulus and thermal conductivity. Since it has a high property, damage to the connection body can be prevented and the heat source can be effectively used, so that resource saving and cost reduction can be achieved. Further, since it is a conductor, static electricity generated during connection work can be eliminated by grounding, so that it is possible to provide a connection method that is also excellent against static electricity.
【図1】接続方法を示す構成断面図。FIG. 1 is a configuration cross-sectional view showing a connection method.
1、1′ 基板 2、2′ 電極 3 接着剤 4 可撓性金属箔 5 熱盤 6 定盤 1,1 'substrate 2, 2'electrode 3 adhesive 4 Flexible metal foil 5 hot plate 6 surface plate
フロントページの続き (72)発明者 井坂 和博 茨城県下館市大字小川1500番地 日立化 成工業株式会社 下館研究所内 (72)発明者 小島 和良 茨城県下館市大字小川1500番地 日立化 成工業株式会社 下館研究所内 (72)発明者 太田 共久 茨城県下館市大字小川1500番地 日立化 成工業株式会社 下館研究所内 (56)参考文献 特開 平5−218634(JP,A) (58)調査した分野(Int.Cl.7,DB名) H01R 43/00 H05K 3/32 Front page continuation (72) Inventor Kazuhiro Isaka 1500 Ogawa, Shimodate, Ibaraki Hitachi Chemical Co., Ltd. Shimodate Research Laboratory (72) Inventor Kayoshi Kojima 1500 Ogawa, Shimodate, Ibaraki Hitachi Shimodate In the laboratory (72) Kyohisa Ota, 1500 Ogawa, Ogawa, Shimodate, Ibaraki Hitachi Chemical Co., Ltd. in the Shimodate laboratory (56) Reference JP-A-5-218634 (JP, A) (58) Fields investigated (58) Int.Cl. 7 , DB name) H01R 43/00 H05K 3/32
Claims (2)
との間に接着剤を介し、熱盤を用いて圧着する電極の接
続方法において、 少なくとも一方の基板と熱盤との間に可撓性金属箔を載
置し、その後、熱圧着することを特徴とする電極の接続
方法。1. A method of connecting electrodes, in which an electrode provided on a substrate and an electrode facing each other are pressure-bonded to each other with an adhesive agent interposed therebetween, in a method of connecting the electrodes to at least one of the substrate and the heating plate. A method for connecting electrodes, comprising placing a flexible metal foil and then thermocompression bonding.
μm以下であり、アルミニウム、銅、鉄、もしくはこれ
らを50重量%以上含有する合金類のいずれかであるこ
とを特徴とする請求項1記載の電極の接続方法。2. The flexible metal foil has a thickness of 500.
2. The method for connecting electrodes according to claim 1, wherein the electrode has a thickness of less than or equal to .mu.m and is aluminum, copper, iron, or an alloy containing 50% by weight or more thereof.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP08314494A JP3472992B2 (en) | 1994-04-21 | 1994-04-21 | How to connect electrodes |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP08314494A JP3472992B2 (en) | 1994-04-21 | 1994-04-21 | How to connect electrodes |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH07296932A JPH07296932A (en) | 1995-11-10 |
| JP3472992B2 true JP3472992B2 (en) | 2003-12-02 |
Family
ID=13794031
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP08314494A Expired - Lifetime JP3472992B2 (en) | 1994-04-21 | 1994-04-21 | How to connect electrodes |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3472992B2 (en) |
-
1994
- 1994-04-21 JP JP08314494A patent/JP3472992B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07296932A (en) | 1995-11-10 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101689716B (en) | Anisotropic conductive film, bonding body and manufacturing method thereof | |
| JP6209313B2 (en) | Anisotropic conductive film, connection structure, method for manufacturing connection structure, and connection method | |
| JP5690637B2 (en) | Anisotropic conductive film, connection method and connection structure | |
| JP3624818B2 (en) | Anisotropic conductive connection material, connection body, and manufacturing method thereof | |
| CN101755022A (en) | Adhesive film, connection method, and assembly | |
| JP5509542B2 (en) | Wiring member connection structure and wiring member connection method | |
| US20060113511A1 (en) | Anisotropic conductive film | |
| JP2013182823A (en) | Manufacturing method of connection body and anisotropic conductive adhesive | |
| JP3622792B2 (en) | Connection member and electrode connection structure and connection method using the connection member | |
| JP2010251336A (en) | Anisotropic conductive film and method for manufacturing connection structure using the same | |
| KR20140035391A (en) | Anisotropic conductive connection material, film laminate, connection method, and connection structure | |
| KR20120022580A (en) | Manufacturing method of mounting device, connecting method and anisotropic conductive film | |
| JP3219140B2 (en) | Electrical and electronic equipment | |
| JP5024117B2 (en) | Circuit member mounting method | |
| JP3472992B2 (en) | How to connect electrodes | |
| JP4282097B2 (en) | Circuit board connection method, connection structure, and adhesive film used therefor | |
| JP4378788B2 (en) | IC chip connection method | |
| KR102758192B1 (en) | Adhesive composition | |
| JP6562750B2 (en) | Electronic component, connection body, manufacturing method of connection body, connection method of electronic component, cushioning material | |
| JP5143329B2 (en) | Manufacturing method of circuit connection body | |
| JP4670859B2 (en) | Connection member and electrode connection structure using the same | |
| JP4155470B2 (en) | Electrode connection method using connecting members | |
| KR100735211B1 (en) | Anisotropic conductive film with conductive particles with excellent connection reliability | |
| JP4572929B2 (en) | Connection member and electrode connection structure using the same | |
| JP4670858B2 (en) | Repair property imparting method and connecting member |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080919 Year of fee payment: 5 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090919 Year of fee payment: 6 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090919 Year of fee payment: 6 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100919 Year of fee payment: 7 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100919 Year of fee payment: 7 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110919 Year of fee payment: 8 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110919 Year of fee payment: 8 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120919 Year of fee payment: 9 |