JP3481006B2 - Rotary coating device - Google Patents
Rotary coating deviceInfo
- Publication number
- JP3481006B2 JP3481006B2 JP06498895A JP6498895A JP3481006B2 JP 3481006 B2 JP3481006 B2 JP 3481006B2 JP 06498895 A JP06498895 A JP 06498895A JP 6498895 A JP6498895 A JP 6498895A JP 3481006 B2 JP3481006 B2 JP 3481006B2
- Authority
- JP
- Japan
- Prior art keywords
- spin
- shaft
- cleaning liquid
- substrate
- fluid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Coating Apparatus (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、半導体や液晶ディスプ
レイ素子、光ディスクなどの製造過程に使用される基板
に、遠心力を利用して、液体を均一に塗布するための回
転塗布装置に関するもので、特に高精度な塗布を目的と
する回転塗布装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a spin coater for uniformly applying a liquid to a substrate used in the manufacturing process of semiconductors, liquid crystal display devices, optical disks and the like by utilizing centrifugal force. In particular, the present invention relates to a spin coating device for high precision coating.
【0002】[0002]
【従来技術】従来の回転塗布装置としては、図3に示す
構造のものがあり、基板1はシリコンウェハーであり、
一部を切り落とした円板状の形をしている。基板1は、
それと同様な平面形状の基板受台2上に載置される。な
お基板1はこの形に限らず、真円形や中心に穴のある円
形、正方形や長方形、あるいは多角形の板でもよい。こ
れらの場合、基板受台2の形状は基板1と同様な平面形
状となる。基板受台2はスピン軸3と一体構造で、軸受
4を介して軸受ケース5に保持される。スピン軸3の下
端には、軸継手6が取り付けられ、スピン駆動モータ7
の出力軸との間を結合している。2. Description of the Related Art A conventional spin coating apparatus has a structure shown in FIG. 3, in which a substrate 1 is a silicon wafer,
It has a disk shape with a part cut off. Substrate 1 is
It is placed on the substrate pedestal 2 having a similar planar shape. The substrate 1 is not limited to this shape, and may be a true circle, a circle having a hole in the center, a square, a rectangle, or a polygonal plate. In these cases, the substrate pedestal 2 has the same planar shape as the substrate 1. The substrate pedestal 2 has an integral structure with the spin shaft 3, and is held by a bearing case 5 via a bearing 4. A shaft coupling 6 is attached to the lower end of the spin shaft 3, and a spin drive motor 7
Is connected to the output shaft of.
【0003】スピン軸3の下部は、2つの環状シールリ
ング10を介して洗浄液供給部材11の内部を貫通して
いる。洗浄液供給部材11には、配管継手12を介して
洗浄液配管13が接続される。この洗浄液供給部材11
は、スピン軸3の上部に配置することもでき、その方が
製作はしやすいが、その場合にはシールリング10とス
ピン軸3の摺動に起因する発熱が基板1に伝わりやす
く、基板1上の塗膜が乱れがちとなる。したがって、高
精度な塗布を行う装置では洗浄液供給部材11をスピン
軸3の下方に配置することが多い。また、必要に応じて
洗浄液供給部材11の外面に冷却フィンを形成すること
もある。The lower portion of the spin shaft 3 penetrates the inside of the cleaning liquid supply member 11 via two annular seal rings 10. A cleaning liquid pipe 13 is connected to the cleaning liquid supply member 11 via a pipe joint 12. This cleaning liquid supply member 11
Can be arranged above the spin shaft 3, which is easier to manufacture, but in that case, heat generated due to the sliding of the seal ring 10 and the spin shaft 3 is easily transmitted to the substrate 1, The top coating tends to be disturbed. Therefore, the cleaning liquid supply member 11 is often disposed below the spin shaft 3 in an apparatus that performs highly accurate coating. Further, cooling fins may be formed on the outer surface of the cleaning liquid supply member 11 as needed.
【0004】基板受台2の上面外周部は基板1から若干
離されており、ここに、洗浄液吹出口15があけられて
いる。これは基板受台2の内部からスピン軸3内を通り
洗浄液供給部材11の内部へ貫通する洗浄液通路16に
つながっている。一方、基板受台2の上面中央部には、
真空受圧面積を広くして充分な基板保持力を得るための
真空吸着溝17が形成されており、これはスピン軸3内
部の真空排気通路18につながっている。この真空排気
通路18は、軸受ケース5内部のラビリンスシール19
で挟まれた空間に貫通しており、この空間には配管継手
20を介して真空配管21が接続される。なお、基板受
台2の周囲には、回転塗布時に飛散する塗布液滴を捕集
する固定チャンバ22が配置される。The outer peripheral portion of the upper surface of the substrate pedestal 2 is slightly separated from the substrate 1, and a cleaning liquid outlet 15 is opened in this portion. This is connected to the cleaning liquid passage 16 that penetrates from the inside of the substrate pedestal 2 through the inside of the spin shaft 3 to the inside of the cleaning liquid supply member 11. On the other hand, in the center of the upper surface of the substrate pedestal 2,
A vacuum suction groove 17 is formed to widen the vacuum pressure receiving area to obtain a sufficient substrate holding force, and this is connected to a vacuum exhaust passage 18 inside the spin shaft 3. The vacuum exhaust passage 18 is provided with a labyrinth seal 19 inside the bearing case 5.
A vacuum pipe 21 is connected to this space through a pipe joint 20. A fixed chamber 22 is arranged around the substrate pedestal 2 to collect coating droplets scattered during spin coating.
【0005】動作を説明すると、まず基板1を基板受台
2上に載置し、図示しない真空源の作動により真空配管
21内、及び真空排気通路18内、真空吸着溝17内を
大気圧より低圧にして、基板1を基板受台2上に吸着固
定する。その後、図示しない塗布液供給機構により基板
1上に塗布液を滴下または噴霧し、スピン駆動モータ7
が起動して回転塗布を行う。スピン回転を開始すると同
時に、図示しない洗浄液供給源より、洗浄液が洗浄液配
管13を通って洗浄液供給部材11の空洞部11A内へ
送り込まれる。このときシールリング10の先端が、回
転するスピン軸3に密着して洗浄液の漏れを封止する。
洗浄液は、洗浄液通路16を通って洗浄液吹出口15か
ら基板1の裏面外周部へ吹き付けられる。これにより、
スピン回転によって基板裏面へまわり込む塗布液を洗い
流すことができる。To explain the operation, first, the substrate 1 is placed on the substrate pedestal 2 and the inside of the vacuum pipe 21, the vacuum exhaust passage 18, and the vacuum suction groove 17 are exposed to atmospheric pressure by the operation of a vacuum source (not shown). The substrate 1 is sucked and fixed on the substrate pedestal 2 by applying a low pressure. After that, the coating liquid is dripped or sprayed onto the substrate 1 by a coating liquid supply mechanism (not shown), and the spin drive motor 7
Is activated and spin coating is performed. Simultaneously with the start of the spin rotation, the cleaning liquid is fed from the cleaning liquid supply source (not shown) into the cavity 11A of the cleaning liquid supply member 11 through the cleaning liquid pipe 13. At this time, the tip of the seal ring 10 comes into close contact with the rotating spin shaft 3 to seal the leakage of the cleaning liquid.
The cleaning liquid passes through the cleaning liquid passage 16 and is sprayed from the cleaning liquid outlet 15 to the outer periphery of the back surface of the substrate 1. This allows
By the spin rotation, it is possible to wash away the coating liquid that goes around to the back surface of the substrate.
【0006】[0006]
【発明が解決しようとする課題】しかし、このような従
来の回転塗布装置においては、高精度な塗布を行うに際
して次のような問題点があった。まず第1には、基板1
の裏面にまわり込む塗布液を洗い流すために必要な洗浄
液を、回転するスピン軸に導入するための液体封止に関
する問題点である。即ち、接触式のシールリング10部
分の摩擦熱に起因する温度上昇は、その設置場所が基板
1から離れているとはいえ、塗膜に悪影響を与える。ま
た、摺動するシールリング10の剥離片が洗浄液へ混入
したり、シールリング10の寿命が短くなるため液漏れ
が生じ易いという問題がある。However, such a conventional spin coating apparatus has the following problems in performing highly accurate coating. First of all, the substrate 1
There is a problem with liquid sealing for introducing a cleaning liquid necessary for washing away the coating liquid that wraps around the back surface of the above into the rotating spin shaft. That is, the temperature rise due to the frictional heat of the contact-type seal ring 10 portion has a bad influence on the coating film, although the installation location is away from the substrate 1. In addition, there is a problem that the peeling pieces of the sliding seal ring 10 are mixed into the cleaning liquid, and the life of the seal ring 10 is shortened, so that liquid leakage easily occurs.
【0007】第2には、基板1を基板受台2上に固定す
るための真空を、やはり回転するスピン軸に導入するた
めの気体封止に関する問題点である。基板1を基板受台
2上に固定する場合、真空を使用せず、ピンやツメなど
で機械的に把持する方法も考えられるが、この場合、把
持具に付いた塗布液が基板の被塗布面を汚したり、把持
具でつかんでいる箇所の近傍の塗膜が盛り上がってしま
ったりする危険があり、高精度の塗布には向かない。Secondly, there is a problem with gas sealing for introducing the vacuum for fixing the substrate 1 onto the substrate pedestal 2 into the spin shaft which also rotates. When the substrate 1 is fixed on the substrate pedestal 2, a method of mechanically grasping with a pin or a claw without using a vacuum may be considered, but in this case, the coating liquid attached to the grasping tool is applied to the substrate. There is a risk that the surface will be soiled or the coating film in the vicinity of where it is gripped by the gripping tool will rise, which is not suitable for high-precision coating.
【0008】基板1を固定するのに真空を使用する場合
でも、上記のような理由で接触式のシール機構は採用し
難い。そこで、図3の従来例では、非接触式のラビリン
スシール19を採用している。ラビリンスシール19
は、スピン軸3との隙間が急拡大と急縮小を繰り返すこ
とで、空気のような圧縮性を持つ流体の流動抵抗が極め
て大きくなるようにした非接触式シールで、真空漏れを
少量に抑えられる。ところが、高精度の塗布をするため
にスピン回転数を高くしたり、基板1周囲の気圧を低く
してスピン回転時の気流の影響を抑制しようとすると、
基板1を固定する力を強くするために、より真空度を高
めて吸引力を大きくしなければならない。この場合、ラ
ビリンスシール19からの真空漏れの影響が大きくな
り、過大な容量の真空源が必要になってしまう。なお、
この部分に、磁性流体の膜を磁石で保持して相対的に回
転する部分の封止を行う磁性流体シールが採用できれば
上記の問題の解決に有効なのだが、後述する理由により
困難である。Even when a vacuum is used to fix the substrate 1, it is difficult to adopt the contact type seal mechanism for the above reasons. Therefore, in the conventional example of FIG. 3, a non-contact type labyrinth seal 19 is adopted. Labyrinth seal 19
Is a non-contact type seal in which the flow resistance of a fluid having compressibility such as air is extremely increased by repeating rapid expansion and contraction of the gap between the spin shaft 3 and vacuum leakage to a small extent. To be However, if the spin rotation speed is increased to achieve high-precision coating or the atmospheric pressure around the substrate 1 is reduced to suppress the influence of the air flow during the spin rotation,
In order to increase the force for fixing the substrate 1, it is necessary to further increase the degree of vacuum and increase the suction force. In this case, the influence of vacuum leakage from the labyrinth seal 19 becomes large, and a vacuum source having an excessive capacity is required. In addition,
If a magnetic fluid seal that holds a magnetic fluid film with a magnet and seals a relatively rotating portion can be adopted in this portion, it will be effective in solving the above problem, but it will be difficult for the reason described later.
【0009】第3には、上記のように洗浄液や空気の吸
引という各種流体を回転部分に導入する機構が不可欠で
あるために、高精度の塗布の前提条件である回転振れの
ほとんどないスピン回転機構を製作することが難しくな
ってしまうという問題点である。回転振れのほとんどな
いスピン回転機構を作るためには、基板受台2とスピン
軸3との間の同心度と垂直度の条件を厳しく製作すると
共に、スピン軸3自体の剛性を確保するために充分太く
し、かつスピン軸3自体の心振れがないように製作する
ため必要以上に長くしないことが重要である。ところが
図3の従来例の場合、接触式シール部では摺動速度を過
大にしないため、及び非接触シール部ではその全隙間面
積を小さくせねばならず、したがってスピン軸3を充分
太くできない。また、シール機構の取付によりスピン軸
3が長くなってしまう。つまり、各種流体導入機構の制
約により、スピン軸3の製作が困難になってしまってい
ることは否定できない。また、高い回転精度を得るため
に必要な太さのスピン軸3に上記磁性流体シールを使用
すると、磁性流体の回転半径が大きくなり、スピン回転
数が高い場合には、その流動速度が過大になって、磁性
流体の粘性に起因する発熱が無視できなくなったり、磁
石による膜の保持ができないなどの問題が生じてしま
う。Thirdly, since a mechanism for introducing various fluids such as the cleaning liquid and the suction of air into the rotating portion is indispensable as described above, a spin rotation with almost no runout which is a prerequisite for high precision coating. The problem is that it becomes difficult to manufacture the mechanism. In order to make a spin rotation mechanism with almost no rotation shake, the conditions of concentricity and perpendicularity between the substrate pedestal 2 and the spin shaft 3 are strictly manufactured, and the rigidity of the spin shaft 3 itself is secured. It is important not to make it longer than necessary in order to make it sufficiently thick and to prevent the spin shaft 3 itself from swinging. However, in the case of the conventional example of FIG. 3, since the sliding speed is not excessive in the contact type seal portion and the total clearance area is required to be small in the non-contact seal portion, the spin shaft 3 cannot be made sufficiently thick. Further, the spin shaft 3 becomes long due to the attachment of the seal mechanism. That is, it cannot be denied that the manufacture of the spin shaft 3 has become difficult due to restrictions of various fluid introduction mechanisms. Further, if the magnetic fluid seal is used for the spin shaft 3 having a thickness necessary for obtaining high rotation accuracy, the radius of rotation of the magnetic fluid becomes large, and when the spin rotation speed is high, the flow velocity becomes excessively high. As a result, the heat generated due to the viscosity of the magnetic fluid cannot be ignored, and the film cannot be held by the magnet.
【0011】本発明では、スピン軸を分割して、それぞ
れ専用の基板載置用軸と流体導入用軸とを軸継手と配管
で接続することにより、一般的なシール機構を採用して
も前述問題点を除去できるばかりでなく、基板部分の回
転振れがほとんどなく、高精度な塗布が可能でありなが
ら製作の容易な回転塗布装置を提供することを課題とす
る。In the present invention, the spin shaft is divided, and the dedicated substrate mounting shaft and the fluid introducing shaft are connected to each other by the shaft coupling and the pipe, so that the general seal mechanism is adopted. It is an object of the present invention to provide a spin coating apparatus which can not only eliminate the problems but also has almost no rotational runout of the substrate portion and can be coated with high precision while being easy to manufacture.
【0012】[0012]
【課題を解決するための手段】第1の発明は、上記課題
を解決するために、回転塗布装置のスピン軸が、被塗布
基板を載置する基板受台を回転させるスピン主軸部と、
被塗布基板を吸着するための吸引通路及び被塗布基板の
裏面を洗浄するための洗浄液が供給されている洗浄液圧
送容器に垂直に延び、前記洗浄液を通流する流体通路の
少なくとも一方を備えた流体導入軸部とからなり、前記
スピン主軸部は軸継手を通して流体導入軸部に連結され
ると共に、スピン駆動装置に結合され、前記流体導入軸
には一つ以上の流体シールユニットを通して前記吸引通
路、流体通路に連通する配管が接続されていることを特
徴とする回転塗布装置を提供するものである。In order to solve the above-mentioned problems, a first aspect of the present invention provides a spin coating apparatus, wherein a spin shaft rotates a substrate pedestal on which a substrate to be coated is mounted,
A suction passage for sucking the substrate to be coated and a cleaning liquid pressure for supplying a cleaning liquid for cleaning the back surface of the substrate to be coated
And a fluid introduction shaft portion which extends vertically to the container and has at least one of fluid passages through which the cleaning liquid flows. The spin main shaft portion is connected to the fluid introduction shaft portion through a shaft coupling, and a spin drive device. And a pipe communicating with the suction passage and the fluid passage through at least one fluid seal unit is connected to the fluid introduction shaft.
【0013】第2の発明は、上記課題を解決するため
に、上記流体導入軸部が、導入する流体の数に応じて複
数に分割されており、それらが軸継手で連結されている
と共に、導入される流体が上記スピン主軸部へ送られる
ように配管が各軸部間に配設されていることを特徴とす
る前記第1の発明に記載の回転塗布装置を提供するもの
である。According to a second aspect of the invention, in order to solve the above-mentioned problems, the fluid introducing shaft portion is divided into a plurality of portions according to the number of fluids to be introduced, and these are connected by a shaft coupling. The spin coating apparatus according to the first aspect of the present invention is characterized in that a pipe is arranged between the shafts so that the introduced fluid is sent to the spin main shaft.
【0014】第3の発明は、上記課題を解決するため
に、スピン軸の分割された軸部同士を連結する軸継手
が、各軸部間の偏心や取付角度誤差を吸収できる可撓性
の軸継手であると共に、各軸部間に配設される配管が可
撓性をもつ材質でできていることを特徴とする前記第1
の発明又は第2の発明に記載の回転塗布装置を提供する
ものである。In order to solve the above-mentioned problems, a third aspect of the present invention is such that a shaft coupling for connecting shaft portions divided into spin shafts is flexible so as to absorb eccentricity between the shaft portions and a mounting angle error. The first joint characterized by being a shaft joint, and the pipes arranged between the respective shaft parts are made of a flexible material.
The invention provides the spin coating apparatus according to the invention or the second invention.
【0015】[0015]
【実施例】図1は、本発明の第1の実施例を説明するた
めの図である。まず構成を説明する。基板1及び基板受
台2に関しては、図3に示す従来例と同様である。スピ
ン主軸部23は、軸受24を介して軸受ケース25によ
り保持される。洗浄液通路16は、基板受台2の周辺部
に形成された複数個の洗浄吹出口15からその内部を放
射内方向を中心点まで延び、スピン主軸部23の中心に
集合して中心軸線に沿ってその下端部まで延びている。
また真空排気通路18は、スピン主軸部23内部の洗浄
液通路16とは違う位置を通って下方に貫通している。
スピン主軸部23の下部側にはスプロケット26が取り
付けられており、このスプロケット26はタイミングベ
ルト28によってスピン駆動モータ7の出力軸に取り付
けられたスプロケット27に結合されている。FIG. 1 is a diagram for explaining a first embodiment of the present invention. First, the configuration will be described. The substrate 1 and the substrate pedestal 2 are the same as in the conventional example shown in FIG. The spin main shaft portion 23 is held by a bearing case 25 via a bearing 24. The cleaning liquid passage 16 extends from a plurality of cleaning outlets 15 formed in the peripheral portion of the substrate pedestal 2 to the center point in the radial direction inward, and gathers at the center of the spin main shaft portion 23 along the central axis line. It extends to the lower end.
Further, the vacuum exhaust passage 18 passes through a position different from the cleaning liquid passage 16 inside the spin main shaft portion 23 and penetrates downward.
A sprocket 26 is attached to the lower side of the spin main shaft portion 23, and the sprocket 26 is connected by a timing belt 28 to a sprocket 27 attached to the output shaft of the spin drive motor 7.
【0016】スピン主軸部23の下端は、軸継手30を
介して流体導入軸部31に連結される。軸継手30は、
スピン主軸部23下端に取り付けられる上部部材30a
と、流体導入軸部31上端に取り付けられる下部部材3
0bと、中間部材30cで構成される。これら部材のそ
れぞれは、ある厚みをもったゴム材料、又はゴム材料の
横方向の偏位を抑制するためにゴム材料に延びるピン
(図示せず)などを組み合わせた一対の環状の弾性部材
30dを上部部材30aと中間部材30c、中間部材3
0cと下部部材30bに固着させることにより結合され
る。したがって、スピン主軸部23と流体導入軸部31
の間に偏心や取付角度誤差があっても、この弾性部材3
0dの変形によって吸収され、スピン主軸部23の回転
が流体導入軸部31に円滑に伝えられる。The lower end of the spin main shaft portion 23 is connected to a fluid introduction shaft portion 31 via a shaft coupling 30. The shaft coupling 30 is
An upper member 30a attached to the lower end of the spin spindle 23
And the lower member 3 attached to the upper end of the fluid introducing shaft portion 31.
0b and the intermediate member 30c. Each of these members has a pair of annular elastic members 30d in which a rubber material having a certain thickness or a pin (not shown) extending to the rubber material in order to suppress lateral displacement of the rubber material is combined. Upper member 30a, intermediate member 30c, intermediate member 3
0c and the lower member 30b are fixed to each other to be joined. Therefore, the spin main shaft portion 23 and the fluid introduction shaft portion 31
Even if there is an eccentricity or an attachment angle error between the elastic members 3
It is absorbed by the deformation of 0d, and the rotation of the spin main shaft portion 23 is smoothly transmitted to the fluid introduction shaft portion 31.
【0017】流体導入軸部31は、2つの磁性流体シー
ルユニット32内を貫通し、洗浄液圧送容器33内に入
り込んでいる。磁性流体シールユニット32では、磁性
材管32aが一対のOリング32bを介して流体導入軸
部31に固定され、この間の隙間が密閉される。磁性材
管32aの両端は2つの軸受32cによって回転自在に
支持され、ケース32dに取り付けられる。2つの軸受
32cの間には、円筒状の永久磁石32eが固定され
る。この永久磁石32eのN極の内壁面から放射内方向
に突出する輪状の内周部32fと、S極の内壁面から放
射内方向に突出する輪状の内周部32gは尖った形状を
なし、磁束を集中させ強い磁界を作っている。N極の内
周部32f及びS極の内周部32gと磁性材管32aと
の隙間に磁性流体32hを充填してあり、これらN極と
S極、これらと若干離れて対向する磁性材管32a、及
び磁性流体32hは磁気回路を形成する。この磁性流体
32hを保持する磁界が充分強いので、流体導入軸部3
1の高速回転に伴って磁性流体32hが流動しても、磁
性流体32hの膜は切れずに気密性を保持する。The fluid introduction shaft portion 31 penetrates through the two magnetic fluid seal units 32 and enters the cleaning liquid pressure-feeding container 33. In the magnetic fluid seal unit 32, the magnetic material pipe 32a is fixed to the fluid introduction shaft portion 31 via the pair of O-rings 32b, and the gap between them is sealed. Both ends of the magnetic material pipe 32a are rotatably supported by two bearings 32c and attached to the case 32d. A cylindrical permanent magnet 32e is fixed between the two bearings 32c. A ring-shaped inner peripheral portion 32f protruding radially inward from the inner wall surface of the N pole of the permanent magnet 32e and a ring-shaped inner peripheral portion 32g protruding radially inward from the inner wall surface of the S pole form a pointed shape, The magnetic flux is concentrated to create a strong magnetic field. A magnetic fluid 32h is filled in a gap between the inner peripheral portion 32f of the N pole and the inner peripheral portion 32g of the S pole and the magnetic material tube 32a, and the N pole and the S pole are opposed to each other with a slight distance therebetween. 32a and the magnetic fluid 32h form a magnetic circuit. Since the magnetic field holding the magnetic fluid 32h is sufficiently strong, the fluid introduction shaft portion 3
Even if the magnetic fluid 32h flows along with the high speed rotation of 1, the film of the magnetic fluid 32h does not break and maintains airtightness.
【0018】流体導入軸部31の内部に形成された真空
排気通路34は、流体導入軸部31の部から2つの磁性
流体シールユニット32で挟まれた空間に貫通してい
る。この空間には、配管継手20を介して真空配管21
が接続される。流体導入軸部31の中心軸線に沿って形
成された洗浄液通路35は、流体導入軸部31の上端か
ら下端までを貫通する。流体導入軸部31の下端部が内
側底近くまで入り込む洗浄液圧送容器33の下部には、
配管継手12を介して洗浄液配管13が外部から接続さ
れる。また、その上方には、洗浄液圧送容器33の液を
加圧するためのエアーを供給するエアー配管37が配管
継手36を介して外部から接続される。さらに、洗浄液
圧送容器33の内側底近くに液面下限センサ38が設置
され、配管継手36よりやや低い位置に液面上限センサ
39が設置される。ここで、液面下限センサ38及び液
面上限センサ39は、双方ともそれ自身のフロートの浮
沈により電気接点の開閉を行うフロートスイッチである
が、別のタイプのセンサを使用してもよい。The vacuum exhaust passage 34 formed inside the fluid introducing shaft portion 31 penetrates from the fluid introducing shaft portion 31 into the space sandwiched between the two magnetic fluid seal units 32. In this space, a vacuum pipe 21 is provided via a pipe joint 20.
Are connected. The cleaning liquid passage 35 formed along the central axis of the fluid introducing shaft portion 31 penetrates from the upper end to the lower end of the fluid introducing shaft portion 31. In the lower part of the cleaning liquid pressure-feeding container 33, in which the lower end of the fluid introduction shaft 31 enters near the inner bottom,
The cleaning liquid pipe 13 is connected from the outside via the pipe joint 12. Further, an air pipe 37 for supplying air for pressurizing the liquid in the cleaning liquid pressure-feeding container 33 is connected to the upper side thereof via a pipe joint 36 from the outside. Further, a liquid level lower limit sensor 38 is installed near the inner bottom of the cleaning liquid pressure-feeding container 33, and a liquid level upper limit sensor 39 is installed at a position slightly lower than the pipe joint 36. Here, the liquid level lower limit sensor 38 and the liquid level upper limit sensor 39 are both float switches that open and close the electrical contacts by floating and sinking their own float, but other types of sensors may be used.
【0019】スピン主軸部23の下端部にある洗浄液通
路16の口と、流体導入軸部31の上端部にある洗浄液
通路35の口には、それぞれ配管継手12が配設され、
それらは、フッ素樹脂などの可撓性をもつ材質でできた
洗浄液配管40にて接続される。また、スピン主軸部2
3の下部にある真空排気穴18の口と、流体導入軸部3
1の上部にある真空排気穴34の口には、それぞれ配管
継手41が配設され、それらは、ウレタン樹脂などの可
撓性をもつ材質からなる真空配管42にて接続される。
このとき洗浄液通路16と洗浄液通路35と洗浄液配管
40は通常では同一直線上にあるが、洗浄液通路16と
洗浄液通路35が偏心していたり、取付け角度誤差があ
る場合もあり、このようなとき可撓性をもつ洗浄液配管
40がそれら洗浄液通路のズレを吸収する。真空配管4
2は、スピン回転時の遠心力に抗するため、支持具43
にて軸継手30に支持される。The pipe joints 12 are arranged at the mouth of the cleaning liquid passage 16 at the lower end of the spin main shaft portion 23 and the mouth of the cleaning liquid passage 35 at the upper end of the fluid introducing shaft portion 31, respectively.
They are connected by a cleaning liquid pipe 40 made of a flexible material such as fluororesin. In addition, the spin spindle 2
Of the vacuum exhaust hole 18 in the lower part of 3 and the fluid introduction shaft portion 3
Piping joints 41 are respectively provided at the ports of the vacuum exhaust holes 34 in the upper part of 1, and they are connected by a vacuum pipe 42 made of a flexible material such as urethane resin.
At this time, the cleaning liquid passage 16, the cleaning liquid passage 35, and the cleaning liquid pipe 40 are normally on the same straight line, but the cleaning liquid passage 16 and the cleaning liquid passage 35 may be eccentric or have an attachment angle error. The cleaning liquid pipe 40 having the property absorbs the deviation of the cleaning liquid passages. Vacuum piping 4
2 supports the support tool 43 in order to resist centrifugal force during spin rotation.
Is supported by the shaft coupling 30.
【0020】次に動作を説明する。基板1の基板受台2
への吸着固定については図3に示した従来例と同様であ
る。スピン駆動モータ7が動作を開始すると、その回転
力はスプロケット27とタイミングベルト28とスプロ
ケット26を通してスピン主軸部23に伝達され、これ
を回転させる。スピン主軸部23の回転は、軸継手30
を通して流体導入軸部31に伝達され、これを同一回転
数で回転させる。このとき真空配管42も一緒に回転す
る。このように、スピン主軸部23は基板受台2から最
小必要限度離れた位置で回転駆動されているので、スピ
ン軸の長さによる機械的振れを最小にすることができ、
したがって基板受台2の回転精度を向上させることがで
きる。Next, the operation will be described. Substrate pedestal 2 of substrate 1
The adsorption and fixation to the substrate is the same as in the conventional example shown in FIG. When the spin drive motor 7 starts to operate, its rotational force is transmitted to the spin main shaft portion 23 through the sprocket 27, the timing belt 28 and the sprocket 26, and causes the spin main shaft portion 23 to rotate. The rotation of the spin main shaft portion 23 depends on the rotation of the shaft coupling 30.
Is transmitted to the fluid introduction shaft portion 31 through and is rotated at the same rotation speed. At this time, the vacuum pipe 42 also rotates together. As described above, since the spin main shaft portion 23 is rotationally driven at a position separated from the substrate pedestal 2 by the minimum necessary limit, mechanical shake due to the length of the spin axis can be minimized,
Therefore, the rotation accuracy of the substrate pedestal 2 can be improved.
【0021】このようなスピン回転によって、基板1の
裏面にまわり込む塗布液を洗い流すための洗浄液の吹き
出しは、次の通り行われる。洗浄液圧送容器33内に、
あらかじめ液面下限センサ38と液面上限センサ39の
間のレベルまで洗浄液を入れておき、スピン回転開始と
同時に、図示しない洗浄液供給源より洗浄液配管13よ
り洗浄液の供給を開始すると共に、図示しないエアー源
より、エアー配管37を通して洗浄液供給圧力と同じ圧
力を加える。これにより洗浄液圧送容器33内の洗浄液
レベルをほとんど変えずに、洗浄液配管40、洗浄液通
路35、及び洗浄液通路16を通して複数の洗浄液吹出
口15から洗浄液を吹き出すことができる。また、スピ
ン主軸部23の回転に伴い、流体導入軸部31が回転し
ても、洗浄液に浸っている部分が小径なので、回転によ
って洗浄液面がほとんど乱れず、洗浄液吹き出しに支障
はない。By the spin rotation as described above, the cleaning liquid is blown out in order to wash away the coating liquid that wraps around the back surface of the substrate 1. In the cleaning liquid pressure-feeding container 33,
The cleaning liquid is put in advance to a level between the liquid level lower limit sensor 38 and the liquid level upper limit sensor 39, and at the same time as the spin rotation starts, the supply of the cleaning liquid from the cleaning liquid supply source (not shown) from the cleaning liquid pipe 13 is started, and the air (not shown) From the source, the same pressure as the cleaning liquid supply pressure is applied through the air pipe 37. Thereby, the cleaning liquid can be blown out from the plurality of cleaning liquid outlets 15 through the cleaning liquid pipe 40, the cleaning liquid passage 35, and the cleaning liquid passage 16 without changing the cleaning liquid level in the cleaning liquid pressure-feeding container 33. Further, even if the fluid introduction shaft portion 31 rotates as the spin main shaft portion 23 rotates, since the portion immersed in the cleaning liquid has a small diameter, the rotation hardly disturbs the cleaning liquid surface, and the cleaning liquid is not spoiled.
【0022】次に本実施例の作用、及び構造上の利点に
ついて説明する。第1に、スピン主軸部23は、各種の
流体導入には無関係に各部の寸法、形状を決めることが
できるので、円滑な回転に必要な剛性を確保できる太さ
や、心振れなく製作するのに適した長さにできる。これ
により、従来例なみの精度のスピン回転機構であればよ
り容易に作ることができ、また従来例よりさらに高精度
のスピン回転機構を作ることも可能になる。Next, the operation and structural advantages of this embodiment will be described. First, since the spin main shaft portion 23 can determine the size and shape of each portion irrespective of the introduction of various fluids, the spin main shaft portion 23 is thick enough to ensure the rigidity necessary for smooth rotation, and can be manufactured without sway. It can be of any suitable length. As a result, it is possible to easily manufacture a spin rotating mechanism having the same precision as the conventional example, and it is also possible to make a spin rotating mechanism having a higher precision than the conventional example.
【0023】第2に、流体導入軸部31は、真空排気通
路34と洗浄液通路35を形成できる寸法であればよい
ので、充分小径にすることができ、スピン主軸部23が
高速回転しても磁性流体シールユニット32内の磁性流
体32h部の流動速度を低く抑えられるので、シール性
を損なうことなく磁性流体シールユニット32を使用で
きる。これにより真空の漏れをほとんど無くすことがで
きるので、容量の小さい真空源を使用しても、より低い
圧力の真空を導入でき、基板1の固定する力を強くする
ことができる。したがって、高精度の塗布を行うために
スピン回転数を高くしたり、基板1周囲の気圧を低くし
てスピン回転時の気流の影響を抑制する用途に充分対応
できる。Secondly, since the fluid introducing shaft portion 31 has a size capable of forming the vacuum exhaust passage 34 and the cleaning liquid passage 35, it can have a sufficiently small diameter, and even when the spin main shaft portion 23 rotates at a high speed. Since the flow velocity of the magnetic fluid 32h portion in the magnetic fluid seal unit 32 can be suppressed low, the magnetic fluid seal unit 32 can be used without impairing the sealing property. Since this makes it possible to almost completely eliminate vacuum leakage, a vacuum of lower pressure can be introduced even if a vacuum source having a small capacity is used, and the fixing force of the substrate 1 can be strengthened. Therefore, the spin rotation speed can be increased to perform highly accurate coating, or the atmospheric pressure around the substrate 1 can be lowered to sufficiently suppress the influence of the air flow during the spin rotation.
【0024】第3に、流体導入軸部31は磁性流体シー
ルユニット32取付部の気密性が破れない程度の、あま
り高くない精度で製作すればよく、またスピン主軸部2
3との連結時に若干の偏心や取付角度誤差があっても軸
継手30部にて吸収できるので、流体導入部の製作が容
易にできる。Thirdly, the fluid introducing shaft portion 31 may be manufactured with a precision not so high that the airtightness of the mounting portion of the magnetic fluid seal unit 32 is not broken, and the spin main shaft portion 2
Even if there is a slight eccentricity or a mounting angle error at the time of connection with 3, the shaft coupling 30 can absorb it, so that the fluid introduction part can be easily manufactured.
【0025】図2は、本発明の第2の実施例を説明する
ための図で、基板周囲を密閉して気圧を低くし、スピン
回転時の気流を抑制し、塗膜の乱れを防ぐようにしたも
のである。基板受台2を内包するように、固定チャンバ
22内に回転カップ44が装備され、その上部に装着さ
れるカップカバー45と共に、基板1の周囲に密閉空間
を形成する。基板受台2の下部には排気通路46が形成
されており、これは基板受台2を通りスピン主軸部47
の下部へ貫通する。FIG. 2 is a view for explaining the second embodiment of the present invention, in which the atmosphere around the substrate is closed to reduce the atmospheric pressure, the air flow during spin rotation is suppressed, and the coating film is prevented from being disturbed. It is the one. A rotating cup 44 is provided in the fixed chamber 22 so as to include the substrate pedestal 2, and a closed space is formed around the substrate 1 together with a cup cover 45 mounted on the fixed cup 22. An exhaust passage 46 is formed in the lower portion of the substrate pedestal 2, and this exhaust passage 46 passes through the substrate pedestal 2 and spin main shaft portion 47.
Penetrate to the bottom of.
【0026】流体導入軸部48が内部を貫通する磁性流
体シールユニット32は3つ装備される。流体導入軸部
48には、図1の実施例と同様に、基板1の吸着用の真
空排気通路34及び洗浄液通路35が形成されている
が、それに加えて、真空配管42’を通して上記排気通
路46に接続される排気通路49が形成されている。上
から第1、第2の一対の磁性流体シールユニット32に
挟まれた空間には真空排気通路34が貫通している。一
方、第2、第3の一対の磁性流体シールユニット32に
挟まれた空間には排気通路49が貫通しており、そこに
は配管継手20’を介してカップ内排気用配管50が接
続される。排気通路46と49の間の接続は、図1の実
施例における真空排気通路18と34の場合と同じであ
る。この実施例の場合、基板1が基板受台2上に吸着さ
れる圧力は、吸着用の真空系の圧力と回転カップ内の気
圧の差圧になる。従って、スピン回転時の気流抑制効果
を充分発揮させるほど回転カップ内の気圧を下げるため
には、吸着用の真空系の圧力を大きく下げる必要があ
り、従来例のような構造では実現できず、本実施例の構
造が必要となる。Three magnetic fluid seal units 32, through which the fluid introducing shaft portion 48 penetrates, are provided. Similar to the embodiment of FIG. 1, the fluid introduction shaft portion 48 is formed with a vacuum exhaust passage 34 and a cleaning liquid passage 35 for adsorbing the substrate 1. In addition to this, the exhaust passage is provided through a vacuum pipe 42 ′. An exhaust passage 49 connected to 46 is formed. A vacuum exhaust passage 34 penetrates the space sandwiched between the pair of first and second magnetic fluid seal units 32 from above. On the other hand, an exhaust passage 49 penetrates through the space sandwiched by the pair of second and third magnetic fluid seal units 32, and the in-cup exhaust pipe 50 is connected thereto through the pipe joint 20 ′. It The connection between the exhaust passages 46 and 49 is the same as for the vacuum exhaust passages 18 and 34 in the embodiment of FIG. In the case of this embodiment, the pressure at which the substrate 1 is adsorbed on the substrate pedestal 2 is the differential pressure between the pressure of the vacuum system for adsorption and the atmospheric pressure in the rotary cup. Therefore, in order to lower the air pressure in the rotating cup enough to fully exert the airflow suppressing effect during spin rotation, it is necessary to greatly lower the pressure of the vacuum system for adsorption, which cannot be realized with the structure of the conventional example. The structure of this embodiment is required.
【0027】なお、以上の実施例では流体導入軸部を単
一のものとして説明してきたが、流体導入軸部の製作上
などの都合から、短い流体導入軸部を複数用い、それら
の間を軸継手を結合しても良い。また、必要に応じて真
空配管は軸継手の内部を通過さても良い。さらに、流体
導入軸部の寸法を長くすることが可能であるので、従来
よりもシール幅を長くしてシール性を向上させたラビリ
ンスシールを用いることができる。スピン主軸部23の
回転によってシール部材の支承部分が摩擦などにより発
熱しても、その発熱部と基板受台2との間の距離が従来
よりも長いこと、及び回転している軸継手30が良好な
放熱体の役割を果たすので、その熱が実質的に基板受台
2上の基板1に悪影響を与えることはない。これらのこ
とは、場合によって接触式シール機構を用いることを可
能とし、シール方法の選択を広くする。In the above embodiments, the single fluid introducing shaft has been described. However, for the convenience of manufacturing the fluid introducing shaft and the like, a plurality of short fluid introducing shafts are used and a space between them is used. You may connect a shaft coupling. Further, the vacuum piping may pass through the inside of the shaft coupling, if necessary. Furthermore, since it is possible to increase the dimension of the fluid introduction shaft portion, it is possible to use a labyrinth seal having a longer seal width and improved sealability than before. Even if the bearing portion of the seal member generates heat due to friction due to the rotation of the spin main shaft portion 23, the distance between the heat generating portion and the substrate pedestal 2 is longer than before, and the rotating shaft coupling 30 is Since it functions as a good heat radiator, the heat does not substantially affect the substrate 1 on the substrate pedestal 2. These allow the use of a contact-type sealing mechanism in some cases, and widen the selection of the sealing method.
【0028】[0028]
【発明の効果】本発明は以上述べたような特徴を有して
いるので、高精度な塗布を行うための高精度なスピン回
転機構と、基板吸着用の真空や基板裏面洗浄用の洗浄液
などの塗布に必要な各種流体の回転部分への導入機構
が、容易に両立できる回転塗布装置が得られる。EFFECTS OF THE INVENTION Since the present invention has the characteristics as described above, a high-accuracy spin rotating mechanism for performing high-accuracy coating, a vacuum for adsorbing a substrate, a cleaning liquid for cleaning the back surface of the substrate, etc. It is possible to obtain a spin coater in which the mechanism for introducing various fluids required for coating of the above into the rotating part can be easily compatible.
【図1】本発明にかかる回転塗布装置の一実施例を示す
構造を示す図である。FIG. 1 is a view showing a structure showing an embodiment of a spin coating apparatus according to the present invention.
【図2】本発明にかかる回転塗布装置の第2の実施例を
示す構造を示す図である。FIG. 2 is a view showing a structure showing a second embodiment of the spin coating apparatus according to the present invention.
【図3】従来の回転塗布装置の一例を示す図である。FIG. 3 is a diagram showing an example of a conventional spin coating apparatus.
【符号の説明】
1…基板 2…基板受台 3
…スピン軸
4…軸受 5…軸受ケース 6
…軸継手
7…スピン駆動モータ
10…シールリング 11…洗浄液供給部材 1
2…配管継手
13…洗浄液配管 15…洗浄液吹出口 1
6…洗浄液通路
17…真空吸着溝 18…真空排気通路 1
9…ラビリンスシール
20、20’…配管継手 21…真空配管 2
2…固定チャンバ
23…スピン主軸部 24…軸受 2
5…軸受ケース
26…スプロケット 27…スプロケット 2
8…タイミングベルト
30…軸継手
30a…上部部材 30b…下部部材 3
0c…中間部材
30d…弾性部材
31…流体導入軸部 32…磁性流体シールユニ
ット
32a…磁性材管 32b…Oリング 3
2c…軸受
32d…ケース 32e…永久磁石 3
2f…N極の内周部
32g…S極の内周部 32h…磁性流体
33…洗浄液圧送容器 34…真空排気通路 3
5…洗浄液通路
36…配管継手 37…エアー配管 3
8…液面下限センサ
39…液面上限センサ 40…洗浄液配管 4
1…配管継手
42、42’…真空配管 43…支持具 4
4…回転カップ
45…カップカバー 46…排気通路 4
7…スピン主軸部
48…流体導入軸部 49…排気通路 5
0…カップ内排気用配管[Explanation of Codes] 1 ... Substrate 2 ... Substrate pedestal 3
… Spin shaft 4… Bearing 5… Bearing case 6
... Shaft joint 7 ... Spin drive motor 10 ... Seal ring 11 ... Cleaning liquid supply member 1
2 ... Piping joint 13 ... Washing liquid piping 15 ... Washing liquid outlet 1
6 ... Cleaning liquid passage 17 ... Vacuum adsorption groove 18 ... Vacuum exhaust passage 1
9 ... Labyrinth seal 20, 20 '... Piping joint 21 ... Vacuum piping 2
2 ... Fixed chamber 23 ... Spin spindle 24 ... Bearing 2
5 ... Bearing case 26 ... Sprocket 27 ... Sprocket 2
8 ... Timing belt 30 ... Shaft coupling 30a ... Upper member 30b ... Lower member 3
0c ... Intermediate member 30d ... Elastic member 31 ... Fluid introduction shaft part 32 ... Magnetic fluid seal unit 32a ... Magnetic material pipe 32b ... O ring 3
2c ... Bearing 32d ... Case 32e ... Permanent magnet 3
2f ... Inner peripheral part of N pole 32g ... Inner peripheral part of S pole 32h ... Magnetic fluid 33 ... Cleaning liquid pressure feed container 34 ... Vacuum exhaust passage 3
5 ... Cleaning liquid passage 36 ... Piping joint 37 ... Air piping 3
8 ... Liquid level lower limit sensor 39 ... Liquid level upper limit sensor 40 ... Cleaning liquid piping 4
1 ... Piping joint 42, 42 '... Vacuum piping 43 ... Supporting tool 4
4 ... Rotating cup 45 ... Cup cover 46 ... Exhaust passage 4
7 ... Spin main shaft portion 48 ... Fluid introduction shaft portion 49 ... Exhaust passage 5
0 ... Exhaust pipe in cup
Claims (3)
載置する基板受台を回転させるスピン主軸部と、被塗布
基板を吸着するための吸引通路及び被塗布基板の裏面を
洗浄するための洗浄液が供給されている洗浄液圧送容器
内に垂直に延び、前記洗浄液を通流する流体通路の少な
くとも一方を備えた流体導入軸部とからなり、前記スピ
ン主軸部は軸継手を通して流体導入軸部に連結されると
共に、スピン駆動装置に結合され、前記流体導入軸には
一つ以上の流体シールユニットを通して前記吸引通路、
流体通路に連通する配管が接続されていることを特徴と
する回転塗布装置。1. A spin main shaft part for rotating a substrate pedestal on which a substrate to be coated is mounted, a suction passage for adsorbing the substrate to be coated, and a back surface of the substrate to be coated are cleaned. Cleaning liquid pressure supply container for supplying cleaning liquid for
And a fluid introduction shaft portion having at least one of fluid passages for vertically flowing the cleaning liquid , wherein the spin main shaft portion is connected to the fluid introduction shaft portion through a shaft coupling, and a spin drive device is provided. The suction passage is connected to the fluid introduction shaft through one or more fluid seal units,
A spin coater characterized in that a pipe communicating with the fluid passage is connected.
応じて複数に分割されており、それらが軸継手で連結さ
れていると共に、導入される流体が上記スピン主軸部へ
送られるように配管が各軸部間に配設されていることを
特徴とする請求項1に記載の回転塗布装置。2. The fluid introducing shaft portion is divided into a plurality according to the number of fluids to be introduced, and these are connected by a shaft joint, and the introduced fluid is sent to the spin main shaft portion. The spin coater according to claim 1, wherein the pipe is arranged between the shaft portions.
軸継手が、各軸部間の偏心又は取付角度誤差を吸収でき
る可撓性の軸継手であると共に、各軸部間に配設される
配管が可撓性をもつ材質でできていることを特徴とする
請求項1又は2に記載の回転塗布装置。3. A shaft joint for connecting shaft parts divided into spin shafts is a flexible shaft joint capable of absorbing an eccentricity between the shaft parts or a mounting angle error, and is arranged between the shaft parts. The spin coater according to claim 1 or 2, wherein the pipe provided is made of a flexible material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP06498895A JP3481006B2 (en) | 1995-02-28 | 1995-02-28 | Rotary coating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP06498895A JP3481006B2 (en) | 1995-02-28 | 1995-02-28 | Rotary coating device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH08229485A JPH08229485A (en) | 1996-09-10 |
| JP3481006B2 true JP3481006B2 (en) | 2003-12-22 |
Family
ID=13273949
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP06498895A Expired - Fee Related JP3481006B2 (en) | 1995-02-28 | 1995-02-28 | Rotary coating device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3481006B2 (en) |
-
1995
- 1995-02-28 JP JP06498895A patent/JP3481006B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH08229485A (en) | 1996-09-10 |
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