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JP3484475B2 - Electrophotographic photoreceptor and electrophotographic apparatus - Google Patents
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JP3484475B2 - Electrophotographic photoreceptor and electrophotographic apparatus - Google Patents

Electrophotographic photoreceptor and electrophotographic apparatus

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Publication number
JP3484475B2
JP3484475B2 JP2000132503A JP2000132503A JP3484475B2 JP 3484475 B2 JP3484475 B2 JP 3484475B2 JP 2000132503 A JP2000132503 A JP 2000132503A JP 2000132503 A JP2000132503 A JP 2000132503A JP 3484475 B2 JP3484475 B2 JP 3484475B2
Authority
JP
Japan
Prior art keywords
protective layer
layer
electrophotographic
photosensitive member
electrophotographic photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2000132503A
Other languages
Japanese (ja)
Other versions
JP2000338705A (en
Inventor
伸二 納所
満 瀬戸
節 六反園
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP02192341A external-priority patent/JP3100389B2/en
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP2000132503A priority Critical patent/JP3484475B2/en
Publication of JP2000338705A publication Critical patent/JP2000338705A/en
Application granted granted Critical
Publication of JP3484475B2 publication Critical patent/JP3484475B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Photoreceptors In Electrophotography (AREA)

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、電子写真用感光体
及び電子写真装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrophotographic photoreceptor and an electrophotographic apparatus.

【0002】[0002]

【従来の技術】従来、電子写真感光体としては、導電性
支持体上にセレンないしセレン合金を主体とする光導電
層を設けたもの、酸化亜鉛、酸化カドミウムなどの無機
光導電材料をバインダー中に分散させたもの、ポリ−N
−ビニルカルバゾールとトリニトロフルオレノンあるい
はアゾ顔料などの有機光導電材料を用いたもの及び非晶
質シリコンを用いたもの等が一般に知られている。これ
らの感光体に対して、長時間高画質を保つ信頼性の要求
が年々高まっている。しかし光導電層が露出している場
合、帯電過程のコロナ放電による損傷と複写プロセスで
受ける他部材との接触による物理的あるいは化学的な損
傷が感光体の寿命を損うものであった。このような欠点
を解消する方法として感光体表面に保護層を設ける技術
が知られている。具体的には感光層の表面に有機フィル
ムを設ける方法(特公昭38−15446)、無機酸化
物を設ける方法(特公昭43−14517)、接着層を
設けた後、絶縁層を積層する方法(特公昭43−275
91)、あるいはプラズマCVD法・光CVD法等によ
ってa−Si層、a−Si:N:H層、a−Si:O:
H層等を積層する方法(特開昭57−179859、特
開昭59−58437)が開示されている。しかしなが
ら、保護層が電子写真的に高抵抗(1014Ω・cm以
上)になると、残留電位の増大、繰返時の蓄積などが問
題となり、実用上好ましくない。上記欠点を補う技術と
して保護層を光導電層とする方法(特公昭48−384
27、特公昭43−16198、特公昭49−1025
8、USP−2901348)、保護層中に色素やルイ
ス酸に代表される移動剤を添加する方法(特公昭44−
834、特開昭53−133444)、或いは金属や金
属酸化物微粒子の添加により保護層の抵抗を制御する方
法(特開昭53−3338)等が提案されている。しか
し、このような場合には保護層による光の吸収が生じ光
導電層へ到達する光量が減少するため、結果として電子
写真用感光体の感度が低下するという問題が生じる。こ
の様な観点から特開昭57−30846に開示されてい
るように平均粒径0.3μm以下の金属酸化物微粒子を
抵抗制御剤として表面保護層中に分散させることによ
り、可視光に対して実質的に透明にする方法がある。こ
の表面保護層を持つた電子写真用感光体は感度低下も少
なく、表面保護層の機械的強度も増し、耐久性が向上す
る。しかしながら、この感光体を実際の複写機に組み込
んだ場合、残留電位が生じ画像上に地肌汚れを発生させ
るという欠点がある。この残留電位は表面保護層上に蓄
積した残留電荷により発生し、複写速度が速くなるに従
って著しく増大する。
2. Description of the Related Art Conventionally, as an electrophotographic photosensitive member, a photoconductive layer mainly composed of selenium or a selenium alloy is provided on a conductive support, or an inorganic photoconductive material such as zinc oxide or cadmium oxide is used as a binder. Dispersed in poly-N
Those using an organic photoconductive material such as vinylcarbazole and trinitrofluorenone or an azo pigment, and those using amorphous silicon are generally known. The demand for reliability of keeping high image quality for a long time is increasing for these photoconductors year by year. However, when the photoconductive layer is exposed, damage due to corona discharge during the charging process and physical or chemical damage due to contact with other members during the copying process impairs the life of the photoconductor. As a method of solving such a defect, a technique of providing a protective layer on the surface of the photoconductor is known. Specifically, a method of providing an organic film on the surface of the photosensitive layer (Japanese Patent Publication No. 38-15446), a method of providing an inorganic oxide (Japanese Patent Publication No. 43-14517), a method of laminating an insulating layer after providing an adhesive layer ( JP-B-43-275
91), or an a-Si layer, an a-Si: N: H layer, an a-Si: O: by a plasma CVD method, a photo CVD method, or the like.
Methods for laminating H layers and the like (JP-A-57-179859 and JP-A-59-58437) are disclosed. However, when the protective layer becomes electrophotographically high in resistance (10 14 Ω · cm or more), the residual potential increases, accumulation during repetition and the like become problems, which is not preferable in practice. As a technique for compensating the above-mentioned drawbacks, a method in which a protective layer is a photoconductive layer (Japanese Patent Publication No. 48-384)
27, Japanese Patent Publication 43-16198, Japanese Patent Publication 49-1025
8, USP-2901348), a method of adding a transfer agent typified by a dye or a Lewis acid into the protective layer (Japanese Patent Publication No. 44-44-
834, JP-A-53-133444), or a method of controlling the resistance of the protective layer by adding metal or metal oxide fine particles (JP-A-53-3338). However, in such a case, the light absorption by the protective layer occurs and the amount of light reaching the photoconductive layer is reduced, resulting in a problem that the sensitivity of the electrophotographic photoreceptor is lowered. From such a viewpoint, as disclosed in JP-A-57-30846, by dispersing metal oxide fine particles having an average particle diameter of 0.3 μm or less as a resistance control agent in the surface protective layer, it is possible to prevent visible light. There is a method of making it substantially transparent. The electrophotographic photosensitive member having the surface protective layer has less deterioration in sensitivity, the mechanical strength of the surface protective layer is increased, and the durability is improved. However, when this photoconductor is incorporated into an actual copying machine, there is a drawback that a residual potential is generated and a background stain is generated on an image. This residual potential is generated by the residual charges accumulated on the surface protective layer, and remarkably increases as the copying speed increases.

【0003】[0003]

【発明が解決しようとする課題】本発明はこうした実情
に鑑みなされたものであって、金属酸化物を結着樹脂中
に分散した保護層を有する電子写真用感光体の残留電荷
を低減し、高速複写機内で使用しても画像上に地肌汚れ
を生じない良好な画像が得られ、信頼性の高い電子写真
感光体を提供することを目的とする。
SUMMARY OF THE INVENTION The present invention has been made in view of these circumstances, and reduces the residual charge of an electrophotographic photoreceptor having a protective layer in which a metal oxide is dispersed in a binder resin, An object of the present invention is to provide a highly reliable electrophotographic photoreceptor which can obtain a good image without causing background stains even when used in a high speed copying machine.

【0004】[0004]

【課題を解決するための手段】本発明者らは種々検討し
た結果、結着樹脂中に金属酸化物を分散した保護層を有
する電子写真用感光体においては、結着樹脂中に金属酸
化物粒子を分散した保護層の表面を、摺擦または研磨加
工処理を行うことにより、保護層表面の表面荒さを中心
線平均粗さ0.07μm以下、最大高さ0.6μm以
下、及び十点平均粗さ0.5μm以下に平滑化すると、
保護層の自由界面の残留電荷に起因する残留電位、地供
肌汚れ等の発生が防げられ、さらに機械的強度の劣化、
異常画像の発生などの全く生じないことを知見した。
As a result of various investigations by the present inventors, in an electrophotographic photoreceptor having a protective layer in which a metal oxide is dispersed in a binder resin, the metal oxide is contained in the binder resin. By rubbing or polishing the surface of the protective layer in which the particles are dispersed, the surface roughness of the protective layer surface is center line average roughness 0.07 μm or less, maximum height 0.6 μm or less, and ten-point average. When smoothing to a roughness of 0.5 μm or less,
Residual potential due to residual charge on the free interface of the protective layer, generation of stains on the ground surface, etc. can be prevented, and further deterioration of mechanical strength,
It was found that no abnormal image was generated at all.

【0005】本発明は、これらの知見に基づいてなされ
たものである。本発明によれば、以下の発明が提供され
る。導電性支持体上に光導電層、結着樹脂中に金属酸化
物粒子を分散した保護層を順次積層した電子写真用感光
体において、保護層表面の表面を、保護層の表面を、摺
擦または研磨加工処理を行うことにより、保護層表面の
表面粗さを中心線平均粗さ0.07μm以下、最大高さ
0.6μm以下、及び十点平均粗さ0.5μm以下に平
滑化したことを特徴とする電子写真感光体。少なくとも
電子写真感光体を具備してなる電子写真装置において、
電子写真感光体として前記記載の電子写真感光体を搭載
することを特徴とすることを特徴とする電子写真装置。
The present invention has been made based on these findings. According to the present invention, the following inventions are provided. In an electrophotographic photoreceptor in which a photoconductive layer and a protective layer in which metal oxide particles are dispersed in a binder resin are sequentially laminated on a conductive support, the surface of the protective layer is rubbed against the surface of the protective layer. Alternatively, the surface roughness of the protective layer surface is smoothed to a center line average roughness of 0.07 μm or less, a maximum height of 0.6 μm or less, and a ten-point average roughness of 0.5 μm or less by performing a polishing process. An electrophotographic photoreceptor characterized by: In an electrophotographic apparatus including at least an electrophotographic photosensitive member,
An electrophotographic apparatus comprising the electrophotographic photosensitive member described above as an electrophotographic photosensitive member.

【0006】[0006]

【発明の実施の形態】本発明の保護層を形成するには金
属酸化物粉末を結着樹脂中にボールミル或いはビーズミ
ル等の方法で分散し、これを光導電層上に塗布、乾燥硬
化後、表面を摺擦、研磨等の加工手段を施すことにより
形成することができる。具体的な表面加工手段として
は、たとえば、ブレード又はブラシ状のものを感光体表
面に当接し、感光体を回転する方法、砥石の振動及び摺
動によって摺擦する方法、バフ布で保護層を摺擦する方
法、バフ布に研磨剤を含ませ摺擦する方法、適度な硬度
の微粒子を用いる方法、プラズマエッチング法を用いる
方法等が挙げられる。適度な硬度の微粒子を用いる方法
を採用した場合、ヌープ硬度600以上、粒子径10μ
m以下の微粒子たとえばAl23、TiO2、MgO、
SiO2(水晶)、Si、CeO2、Fe23、Cr
23、Si3N4、ダイヤモンド等を用いることが望まし
い。また、プラズマエッチング法としては、反応室内を
真空にした後、エッチングガスを導入し、高周波などに
よってガスプラズマを発生させ、活性となったイオンま
たは中性ラジカルを保護層表面にエッチングする方法、
たとえば同軸静電方式、平行平板電極形、反応性イオン
エッチング法などが採用される。
BEST MODE FOR CARRYING OUT THE INVENTION To form a protective layer of the present invention, a metal oxide powder is dispersed in a binder resin by a method such as a ball mill or a bead mill, coated on a photoconductive layer, dried and cured, It can be formed by applying processing means such as rubbing or polishing the surface. Specific surface processing means include, for example, a method in which a blade or a brush-shaped object is brought into contact with the surface of the photoconductor and the photoconductor is rotated, a method of rubbing with the vibration and sliding of a grindstone, and a protective layer with a buff cloth. Examples thereof include a method of rubbing, a method of rubbing a buff cloth with an abrasive, a method of using fine particles having an appropriate hardness, and a method of using a plasma etching method. When the method using fine particles of appropriate hardness is adopted, Knoop hardness is 600 or more and particle diameter is 10μ.
fine particles of m or less such as Al 2 O 3 , TiO 2 , MgO,
SiO 2 (crystal), Si, CeO 2 , Fe 2 O 3 , Cr
It is desirable to use 2 O 3 , Si 3 N 4, diamond or the like. Further, as the plasma etching method, after the reaction chamber is evacuated, an etching gas is introduced, a gas plasma is generated by a high frequency or the like, and an activated ion or neutral radical is etched on the protective layer surface,
For example, a coaxial electrostatic system, a parallel plate electrode type, a reactive ion etching method, etc. are adopted.

【0007】本発明に用いられる金属酸化物粉末として
はZnO、TiO2、SnO2、In 23、Sb32含有
SnO2、In23含有SnO2、V23、MoO3、N
iO、CuO等の粉末が例示できる。これらの金属酸化
物は2種以上混合してもかまわない。
As a metal oxide powder used in the present invention
Is ZnO, TiO2, SnO2, In 2O3, Sb3O2Inclusion
SnO2, In2O3Contained SnO2, V2O3, MoO3, N
The powder of iO, CuO, etc. can be illustrated. Oxidation of these metals
Two or more kinds of materials may be mixed.

【0008】本発明に係わる表面保護層の結着樹脂とし
ては可視光に対して実質上透明で、電気絶縁性、強度、
接着性に優れたものが望ましい。例えば、ポリスチレ
ン、MMA、n−BMA、ポリアミド、ポリエステル、
ポリウレタン、ポリカーボネート、ポリビニルホリマー
ル、ポリシリコーン、ポリビニルアセタール、ポリビニ
ルブチラール、エチルセルロース、メラミン樹脂及びそ
れらの共重合体、混合物などが用いられる。また、表面
保護層中に接着性などを向上させる目的で種々の添加剤
を加えてもかまわない。
The binder resin for the surface protective layer according to the present invention is substantially transparent to visible light and has electrical insulation, strength, and
Those with excellent adhesiveness are desirable. For example, polystyrene, MMA, n-BMA, polyamide, polyester,
Polyurethane, polycarbonate, polyvinylholimal, polysilicone, polyvinyl acetal, polyvinyl butyral, ethyl cellulose, melamine resin and copolymers and mixtures thereof are used. Further, various additives may be added to the surface protective layer for the purpose of improving adhesiveness and the like.

【0009】表面保護層の比抵抗は109〜1013Ω・
cm、好ましくは1010〜1012Ω・cmであり、選択
する樹脂、金属酸化物粉末及びその平均粒径との組み合
わせにより、樹脂と金属酸化物粉末の最適な混合重量比
は異なる。
The specific resistance of the surface protective layer is 10 9 to 10 13 Ω.
cm, preferably 10 10 to 10 12 Ω · cm, and the optimum mixing weight ratio of the resin and the metal oxide powder varies depending on the combination of the selected resin, the metal oxide powder and the average particle size thereof.

【0010】本発明の保護層の膜厚は10μm以下が好
ましく、更には過透率、強度の点から1〜5μmがより
好ましい。本発明に係わる光導電層の構成材料として
は、Se、又はSe〜Te、As2Se3等のSe系合
金;ZnO、CdS、CdSe等のII−VI族化合物の粒
子を樹脂に分散させた系;ポリビニルカルバゾール、ア
ントラセンなどの有機光導電材料;アモルファスSi等
が用いられる。また、光導電層の形成方法としては使用
材料によって蒸着、スパッタリング、塗布などの方法が
適宜選択される。光導電層の構成は特に制約されず単相
であっても或いは前記光導電材料を主成分とする電荷発
生層とドナー又はアクセプターを主成分とする電荷輸送
層との積層であってもよい。厚さは単層型光導電層の場
合は3〜100μm、積層型光導電層の場合は電荷発生
層については0.05〜3μm、電荷輸送層については
3〜100μmの範囲が適当である。さらに表面保護層
と光導電層との間に接着性を高めるための接着層、電荷
注入を阻止するための電気的バリアー層、表面保護層形
成液中の溶剤により有機系光導電層が侵されることを防
ぐ耐溶剤層を設けてもよい。
The thickness of the protective layer of the present invention is preferably 10 μm or less, and more preferably 1 to 5 μm from the viewpoints of superpermeability and strength. As the constituent material of the photoconductive layer according to the present invention, Se or Se-based alloys such as Se to Te and As 2 Se 3 ; particles of II-VI group compounds such as ZnO, CdS, and CdSe are dispersed in a resin. A system; organic photoconductive materials such as polyvinylcarbazole and anthracene; amorphous Si and the like are used. Further, as a method for forming the photoconductive layer, a method such as vapor deposition, sputtering or coating is appropriately selected depending on the material used. The structure of the photoconductive layer is not particularly limited, and it may be a single phase or a stacked layer of a charge generation layer containing the photoconductive material as a main component and a charge transport layer containing a donor or an acceptor as a main component. The thickness of the single-layer photoconductive layer is preferably 3 to 100 μm, the thickness of the multilayer photoconductive layer is 0.05 to 3 μm for the charge generation layer, and the charge transport layer is preferably 3 to 100 μm. Furthermore, the organic photoconductive layer is attacked by an adhesive layer for enhancing the adhesiveness between the surface protective layer and the photoconductive layer, an electrical barrier layer for preventing charge injection, and a solvent in the surface protective layer forming liquid. You may provide the solvent resistant layer which prevents that.

【0011】本発明の導電性支持体としてはAl、N
i、Fe、Cu、Au等の金属又は合金:ポリエステ
ル、ポリカーボネート、ポリイミド等のプラスチック又
はガラス等の絶縁性基板上にAl、Ag、Au等の金属
膜又はIn23、SnO2等の金属酸化物膜を設けたも
の;導電処理紙等が例示できる。形状は特に制約されな
いが、通常は板状、ドラム状又はベルト状である。
As the conductive support of the present invention, Al, N
Metals or alloys such as i, Fe, Cu and Au: Metal films such as Al, Ag and Au or metals such as In 2 O 3 and SnO 2 on an insulating substrate such as plastic or glass such as polyester, polycarbonate and polyimide. The one provided with an oxide film; conductive treated paper and the like can be exemplified. The shape is not particularly limited, but is usually a plate shape, a drum shape or a belt shape.

【0012】[0012]

【実施例】以下に本発明を実施例によって説明する。参考例 1 80mmφ×340mm(長さ)のAlドラム支持体を
真空蒸着装置内にセットし、またこの装置の蒸着源ボー
トにAsSe合金を入れ、真空度3×10−6To
rr、支持体温度200℃、ボート温度450℃の条件
で蒸着を行い、支持体上に60μm厚の光導電層を形成
した。次にこの上に、a)アルコキシ基含有ポリシロキ
サンとb)水酸基含有ポリシロキサンと、c)炭素原子
に結合したアミノ基、イミノ基又はニトリル基を少なく
とも1個及びアルコキシ基が2〜3個結合した珪素原子
を有する有機珪素化合物とを主成分とするシリコーン樹
脂A(トーレシリコーン社製AY42−440)と前記
a)、b)及びc)の成分比が異なるシリコーン樹脂B
(トーレシリコーン社製AY42−441)との等量
(重量)混合物のリグロイン溶液を塗布し、120℃で
1時間乾燥して0.15μm厚の電気的バリアー層を形
成した。次にスチレン〜メタクリル酸〜アクリル酸〜N
−メチロールアクリルアミド共重合体の40wt%トル
エン〜ブタノール(9:1比)溶液30重量部と抵抗制
御剤SnO(三菱金属社製S−1)18重量部と適量
のトルエン〜ブタノール(9:1比)混合溶媒とをボー
ルミルで96時間分散し、これを電気的バリアー層上に
塗布し、130℃で30分間乾燥を行い4μm厚の保護
層を形成した。次にこの保護層が形成された感光体にウ
レタンゴムブレードを当接し、感光体を回転させ保護層
の自由界面にSnOを露出させた電子写真用感光体を
得た。
EXAMPLES The present invention will be described below with reference to examples. Reference Example 1 An 80 mmφ × 340 mm (length) Al drum support was set in a vacuum vapor deposition apparatus, an As 2 Se 3 alloy was placed in a vapor deposition source boat of this apparatus, and a vacuum degree was 3 × 10 −6 To.
Vapor deposition was performed under the conditions of rr, the support temperature of 200 ° C., and the boat temperature of 450 ° C. to form a photoconductive layer having a thickness of 60 μm on the support. Next, a) an alkoxy group-containing polysiloxane, b) a hydroxyl group-containing polysiloxane, and c) at least one amino group, imino group or nitrile group bonded to a carbon atom, and two or three alkoxy groups bonded thereto. Silicone resin A (AY42-440 manufactured by Toray Silicone Co., Ltd.) containing a silicon atom-containing organosilicon compound as a main component and silicone resin B having a different component ratio of a), b) and c)
A ligroin solution of an equal amount (weight) mixture with (Toray Silicone AY42-441) was applied and dried at 120 ° C. for 1 hour to form an electric barrier layer having a thickness of 0.15 μm. Next, styrene-methacrylic acid-acrylic acid-N
30 parts by weight of a 40 wt% toluene-butanol (9: 1 ratio) solution of a methylol acrylamide copolymer, 18 parts by weight of a resistance control agent SnO 2 (S-1 manufactured by Mitsubishi Metals) and an appropriate amount of toluene-butanol (9: 1). (Ratio) The mixed solvent was dispersed in a ball mill for 96 hours, and this was applied onto the electrical barrier layer and dried at 130 ° C. for 30 minutes to form a protective layer having a thickness of 4 μm. Next, a urethane rubber blade was brought into contact with the photoconductor on which the protective layer was formed, and the photoconductor was rotated to obtain an electrophotographic photoconductor in which SnO 2 was exposed at the free interface of the protective layer.

【0013】参考例2 保護層中の金属酸化物をSnOからInに代え
た他は参考例1と全く同様にして電子写真感光体を作製
した。
Reference Example 2 An electrophotographic photosensitive member was produced in exactly the same manner as in Reference Example 1 except that the metal oxide in the protective layer was changed from SnO 2 to In 2 O 3 .

【0014】参考例3 保護層中の金属酸化物をSnOからNiOに代えた他
参考例1と全く同様にして電子写真用感光体を作製し
た。
Reference Example 3 An electrophotographic photoreceptor was prepared in exactly the same manner as in Reference Example 1 , except that the metal oxide in the protective layer was changed from SnO 2 to NiO.

【0015】比較例1 保護層自由界面にSnOを露出させる工程を施さない
他は参考例1と全く同様にして電子写真用感光体を作製
した。
Comparative Example 1 An electrophotographic photoreceptor was prepared in exactly the same manner as in Reference Example 1 except that the step of exposing SnO 2 to the free interface of the protective layer was not performed.

【0016】比較例2 保護層自由界面にInを露出させる工程を施さな
い他は参考例2と全く同様にして電子写真感光体を作製
した。
Comparative Example 2 An electrophotographic photosensitive member was produced in exactly the same manner as Reference Example 2 except that the step of exposing In 2 O 3 to the free interface of the protective layer was not performed.

【0017】比較例3 保護層自由界面にNiOを露出させる工程を施さない他
参考例3と全く同様にして電子写真感光体を製作し
た。以上の様に作製した電子写真用感光体を実際の複写
機(リコー製FT6550)に組み込み実機内残留電位
及び地肌汚れを評価した。その結果を表−1に示す。な
お、残留電位は帯電・イレース露光後の電位を測定した
ものである。また地肌汚れは目視によった。
Comparative Example 3 An electrophotographic photosensitive member was manufactured in exactly the same manner as Reference Example 3 except that the step of exposing NiO to the free interface of the protective layer was not performed. The electrophotographic photosensitive member produced as described above was incorporated into an actual copying machine (FT6550 manufactured by Ricoh Co., Ltd.), and the residual potential in the actual machine and the background stain were evaluated. The results are shown in Table-1. The residual potential is a potential measured after charging / erasing exposure. The background stain was visually observed.

【0018】[0018]

【表1】 [Table 1]

【0019】表1から明らかな様に保護層の自由界面に
金属酸化物を露出させていない比較例の電子写真用感光
体は残留電位が高い為地肌汚れが激しいのに対し、本発
明による電子写真用感光体は金属酸化物が保護層の自由
界面で露出している為、残留電位が低く、地肌汚れの生
じない良好なものであることが分る。参考例1〜3及び
比較例1〜3の保護層を剥離してその断面を透過型電子
顕微鏡で観察したところ、参考例1〜3は保護層の自由
界面で金属酸化物が露出しており、一方比較例1〜3は
保護層の自由界面で金属酸化物が完全に被覆されている
ことが判った。
As is clear from Table 1, the electrophotographic photosensitive member of the comparative example in which the metal oxide is not exposed at the free interface of the protective layer has a high residual potential and therefore has a large background stain. Since the metal oxide is exposed at the free interface of the protective layer, the photoconductor for photographic use has a low residual potential and is a good one without causing background stain. When the protective layers of Reference Examples 1 to 3 and Comparative Examples 1 to 3 were peeled off and their cross sections were observed with a transmission electron microscope, the metal oxides were exposed at the free interfaces of the protective layers in Reference Examples 1 to 3. On the other hand, in Comparative Examples 1 to 3, it was found that the free oxide of the protective layer was completely covered with the metal oxide.

【0020】実施例4 80mmφ×340mm(長さ)のAlドラム支持体を
真空蒸着装置内にセットし、またこの装置の蒸着源ボー
トにAs2Se3合金を入れ、真空度3×10-6Tor
r、支持体温度200℃、ボート温度450℃の条件で
蒸着を行い、支持体上に60μm厚の光導電層を形成し
た。次にこの上に、a)アルコキシ基含有ポリシロキサ
ンとb)水酸基含有ポリシロキサンと、c)炭素原子に
結合したアミノ基、イミノ基又はニトリル基を少なくと
も1個及びアルコキシ基が2〜3個結合した珪素原子を
有する有機珪素化合物とを主成分とするシリコーン樹脂
A(トーレシリコーン社製AY42−440)と前記
a)、b)及びc)の成分比が異なるシリコーン樹脂B
(トーレシリコーン社製AY42−441)との等量
(重量)混合物のリグロイン溶液を塗布し、120℃で
1時間乾燥して0.15μm厚の電気的バリアー層を形
成した。次にスチレン〜メタクリル酸〜アクリル酸〜N
−メチロールアクリルアミド共重合体の40wt%トル
エン〜ブタノール(9:1比)溶液30重量部と抵抗制
御剤SnO2(三菱金属社製S−1)18重量部と適量
のトルエン〜ブタノール(9:1比)混合溶媒とをボー
ルミルで96時間分散し、これを電気的バリアー層上に
塗布し、130℃で30分間乾燥を行い4μm厚の保護
層を形成した。次にこの感光体をポリウタレン製クリー
ニングブレード、ポリエステル製クリーニングブラシが
感光体に対して当接される複写機(リコー製FT655
0)に組み込み、非通紙コピーモードで2時間摺擦を行
ない、保護層の表面粗さが中心線平均粗さ0.04μ
m、最大高さ0.5μm、十点平均粗さ0.45μmの
電子写真用感光体を作製した。
Example 4 An 80 mmφ × 340 mm (length) Al drum support was set in a vacuum vapor deposition apparatus, and a vapor deposition source boat of this apparatus was charged with As 2 Se 3 alloy, and the degree of vacuum was 3 × 10 −6. Tor
r, the substrate temperature was 200 ° C., and the boat temperature was 450 ° C. to perform vapor deposition to form a photoconductive layer having a thickness of 60 μm on the substrate. Next, a) an alkoxy group-containing polysiloxane, b) a hydroxyl group-containing polysiloxane, and c) at least one amino group, imino group or nitrile group bonded to a carbon atom, and two or three alkoxy groups bonded thereto. Silicone resin A (AY42-440 manufactured by Toray Silicone Co., Ltd.) containing a silicon atom-containing organosilicon compound as a main component and silicone resin B having a different component ratio of a), b) and c)
A ligroin solution of an equal amount (weight) mixture with (Toray Silicone AY42-441) was applied and dried at 120 ° C. for 1 hour to form an electric barrier layer having a thickness of 0.15 μm. Next, styrene-methacrylic acid-acrylic acid-N
30 parts by weight of a 40 wt% toluene-butanol (9: 1 ratio) solution of a methylol acrylamide copolymer, 18 parts by weight of a resistance control agent SnO 2 (S-1 manufactured by Mitsubishi Metals) and an appropriate amount of toluene-butanol (9: 1). (Ratio) The mixed solvent was dispersed in a ball mill for 96 hours, and this was applied onto the electrical barrier layer and dried at 130 ° C. for 30 minutes to form a protective layer having a thickness of 4 μm. Next, a copier (a FT655 manufactured by Ricoh Co., Ltd.) in which a cleaning blade made of polyutalen and a cleaning brush made of polyester are brought into contact with the photosensitive body
0) and rubbed for 2 hours in non-paper copy mode, and the surface roughness of the protective layer is center line average roughness 0.04μ.
m, the maximum height was 0.5 μm, and the ten-point average roughness was 0.45 μm to prepare an electrophotographic photoreceptor.

【0021】実施例5 実施例の摺擦時間を10時間にした他は実施例と全
く同様にして、保護層の表面粗さが中心線平均粗さ0.
03μm、最大高さ0.3μm、十点平均粗さ0.36
μmの電子写真感光体を作製した。
Example 5 The surface roughness of the protective layer was the same as in Example 4 except that the rubbing time in Example 4 was 10 hours.
03 μm, maximum height 0.3 μm, ten-point average roughness 0.36
An electrophotographic photosensitive member of μm was manufactured.

【0022】実施例6 保護層研磨工程を2000番のサンドペーパーによる摺
擦に代えた他は実施例4と全く同様にして保護層の表面
粗さが中心線平均粗さ0.04μm、最大高さ0.32
μm、十点平均粗さ0.34μmの電子写真用感光体を
作製した。
Example 6 The surface roughness of the protective layer was 0.04 μm in center line average roughness and maximum height in exactly the same manner as in Example 4 except that the polishing step of the protective layer was changed to rubbing with No. 2000 sandpaper. 0.32
A photoconductor for electrophotography having a thickness of 10 μm and a ten-point average roughness of 0.34 μm was produced.

【0023】比較例4 ポリエステル製クリーニングブラシをステンレス製ルー
プ状クリーニングブラシに代えた他は実施例4と全く同
様にして保護層の表面粗さが中心線平均粗さ0.08μ
m、最大高さ1.2μm、十点平均粗さ0.8μmの電
子写真感光体を作製した。
Comparative Example 4 The surface roughness of the protective layer was the center line average roughness of 0.08 μm in exactly the same manner as in Example 4 except that the polyester cleaning brush was replaced with a stainless loop cleaning brush.
m, the maximum height was 1.2 μm, and the ten-point average roughness was 0.8 μm.

【0024】比較例5 2000番のサンドペーパーを100番のサンドペーパ
ーに代えた他は実施例6と全く同様にして保護層の表面
粗さが中心線平均粗さ0.10μm、最大高さ0.8μ
m、十点平均粗さ0.86μmの電子写真用感光体を作
製した。以上の様に作製した電子写真用感光体を実際の
複写機(リコー製FT−6550)に組み込み、実機内
の残留電位、地肌汚れ、ハーフトーン画像の均一性、ク
リーニング性、更に保護層の鉛筆硬度を評価した。結果
を表2に示す。 残留電位:帯電−イレース露光後の電位を評価 クリーニング性:複写後の感光体上の残存トナー量を評
価 地肌汚れ:複写画像の地肌汚れを目視により評価 ハーフトーン画像の均一性:複写画像のハーフトーンの
均一性を目視により評価 鉛筆硬度:荷重100gで評価
Comparative Example 5 The surface roughness of the protective layer was 0.10 μm in center line average and 0 in maximum height in the same manner as in Example 6 except that the sandpaper No. 2000 was replaced with the sandpaper No. 100. .8μ
m, and a ten-point average roughness of 0.86 μm to prepare an electrophotographic photoreceptor. The electrophotographic photoreceptor prepared as described above is incorporated into an actual copying machine (FT-6550 manufactured by Ricoh), and residual potential in the actual machine, background stain, uniformity of halftone image, cleaning property, and pencil for the protective layer The hardness was evaluated. The results are shown in Table 2. Residual potential: Charge-Evaluation of potential after erase exposure Cleaning property: Evaluation of residual toner amount on photoconductor after copying Background stain: Visual evaluation of background stain of copied image Halftone image uniformity: Half of copied image Visual evaluation of tone uniformity Pencil hardness: Evaluation with a load of 100 g

【0025】[0025]

【表2】 [Table 2]

【0026】表2から明らかな様に、保護層の表面粗さ
が中心線平均粗さ0.07μm以下、最大高さ0.6μ
m以下及び十点平均粗さ0.5μm以下の条件を満足し
ないものは残留電位による地肌汚れは防ぐことが出来て
も、クリーニング不良による地肌汚れが発生し、更に塗
膜の強度も著しく低下する。逆に本発明による実施例4
〜6の電子写真感光体は残留電位に起因する地肌汚れの
抑制はもとより、クリーニング性、塗膜強度など一切副
作用を伴なわない良好なものである。実施例4及び比較
例4の電子写真用感光体に対しそれぞれ5万枚の複写テ
ストを行なった後、その保護層摩耗量を評価したとこ
ろ、平均減少膜厚が比較例4のものでは0.3μmであ
ったのに対し、本発明による実施例1のものは0μmと
複写機内での耐摩耗性にも優れていることが分かった。
As is clear from Table 2, the surface roughness of the protective layer is not more than 0.07 μm in the center line average roughness and the maximum height is 0.6 μm.
Those that do not satisfy the conditions of m or less and ten-point average roughness of 0.5 μm or less can prevent the background stain due to the residual potential, but cause the background stain due to poor cleaning and further significantly reduce the strength of the coating film. . On the contrary, Example 4 according to the present invention
The electrophotographic photoconductors of Nos. 6 to 6 are good ones that not only suppress the background stain caused by the residual potential but also have no side effects such as cleaning property and coating film strength. The electrophotographic photoreceptors of Example 4 and Comparative Example 4 were each subjected to a copying test of 50,000 sheets, and the abrasion loss of the protective layer was evaluated. While it was 3 μm, Example 1 according to the present invention was 0 μm, and it was found that the abrasion resistance in the copying machine was excellent.

【0027】[0027]

【発明の効果】本発明の電子写真用感光体は、保護層の
自由界面での電荷の蓄積を防ぎ、複写機内での残留電
位、画像上の地肌汚れを抑制できることはもとより、保
護層本来のもつ塗膜強度、耐摩耗性を損うことなく、良
好な画像が得られるので信頼性の極めて高いものであ
る。
The electrophotographic photoreceptor of the present invention is capable of preventing the accumulation of electric charge at the free interface of the protective layer, suppressing the residual potential in the copying machine, and the background stain on the image, and of course, the original of the protective layer. Since a good image can be obtained without impairing the coating film strength and abrasion resistance, the reliability is extremely high.

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平4−77748(JP,A) (58)調査した分野(Int.Cl.7,DB名) G03G 5/00 ─────────────────────────────────────────────────── ─── Continuation of the front page (56) Reference JP-A-4-77748 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) G03G 5/00

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 導電性支持体上に光導電層、結着樹脂中
に金属酸化物粒子を分散した保護層を順次積層した電子
写真用感光体において、保護層の表面を、摺擦または研
磨加工処理を行うことにより、保護層表面の表面粗さを
中心線平均粗さ0.07μm以下、最大高さ0.6μm
以下、及び十点平均粗さ0.5μm以下に平滑化したこ
とを特徴とする電子写真感光体。
1. An electrophotographic photosensitive member comprising a conductive support, a photoconductive layer, and a protective layer in which metal oxide particles are dispersed in a binder resin, which are sequentially laminated on the surface of the protective layer. By performing the processing, the surface roughness of the protective layer surface is a center line average roughness of 0.07 μm or less and a maximum height of 0.6 μm.
The following, and an electrophotographic photosensitive member characterized by being smoothed to a ten-point average roughness of 0.5 μm or less.
【請求項2】 少なくとも電子写真感光体を具備してな
る電子写真装置において、電子写真感光体として請求項
1記載の電子写真感光体を搭載することを特徴とする電
子写真装置。
2. An electrophotographic apparatus comprising at least an electrophotographic photosensitive member, wherein the electrophotographic photosensitive member according to claim 1 is mounted as the electrophotographic photosensitive member.
JP2000132503A 1990-07-19 2000-05-01 Electrophotographic photoreceptor and electrophotographic apparatus Expired - Lifetime JP3484475B2 (en)

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JP02192341A JP3100389B2 (en) 1990-07-19 1990-07-19 Electrophotographic photoreceptor
JP2000132503A JP3484475B2 (en) 1990-07-19 2000-05-01 Electrophotographic photoreceptor and electrophotographic apparatus

Related Parent Applications (1)

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JP3484475B2 true JP3484475B2 (en) 2004-01-06

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Country Link
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