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JP3494293B2 - Method and apparatus for cleaning closed container - Google Patents
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JP3494293B2 - Method and apparatus for cleaning closed container - Google Patents

Method and apparatus for cleaning closed container

Info

Publication number
JP3494293B2
JP3494293B2 JP2000325836A JP2000325836A JP3494293B2 JP 3494293 B2 JP3494293 B2 JP 3494293B2 JP 2000325836 A JP2000325836 A JP 2000325836A JP 2000325836 A JP2000325836 A JP 2000325836A JP 3494293 B2 JP3494293 B2 JP 3494293B2
Authority
JP
Japan
Prior art keywords
cleaning
container
drying
hot air
tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2000325836A
Other languages
Japanese (ja)
Other versions
JP2002126678A (en
Inventor
邦夫 河場
光孝 福原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kaijo Corp
Original Assignee
Kaijo Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kaijo Corp filed Critical Kaijo Corp
Priority to JP2000325836A priority Critical patent/JP3494293B2/en
Publication of JP2002126678A publication Critical patent/JP2002126678A/en
Application granted granted Critical
Publication of JP3494293B2 publication Critical patent/JP3494293B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Cleaning In General (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、ウエハ等の半導体
基板を収納するための密閉型容器を洗浄する方法及び装
置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and apparatus for cleaning a hermetically sealed container for housing a semiconductor substrate such as a wafer.

【0002】[0002]

【従来の技術】半導体の製造は多数の工程を極めて高い
クリーン度のもとで行わなければならないが、全ての工
程におよぶ広大な環境を高いクリーン度に保つのはコス
ト面で限界がある。このため、最近では局所環境(ミニ
・エンバイロメント)だけを高いクリーン度に保つ手段
の開発が進められている。例えば、ウエハをFOUP
(Front Opening Unified Pod)と呼ばれる密閉型容器
で搬送し、密閉型容器ごとウエハを半導体製造工程に入
れ、密閉型容器を直接製造装置とドッキングさせて作業
を進めるもので、密閉型容器内部の環境を管理すること
で製造工程内におけるウエハの高いクリーン度を維持す
ることができることになる。
2. Description of the Related Art Semiconductor manufacturing requires a large number of steps to be carried out under a very high degree of cleanliness, but it is costly to keep a vast environment covering all steps to a high degree of cleanliness. For this reason, recently, development of means for keeping only the local environment (mini environment) at a high degree of cleanliness has been advanced. For example, FOUP wafer
(Front Opening Unified Pod) The wafer is transferred in a sealed container, the wafer is put into the semiconductor manufacturing process together with the sealed container, and the sealed container is directly docked with the manufacturing equipment to proceed with the work. It is possible to maintain high cleanliness of the wafer in the manufacturing process by controlling the above.

【0003】ところで、このような密閉型容器は、多数
のウエハを収納して搬送するのであるが、その際にウエ
ハと容器内面とが擦れて内部にパーティクル等の汚れが
生じ、また容器はクリーン度の低いところを移送される
ため外面が汚染され易く、蓋を外したときに内部に収納
したウエハを汚染するおそれがある。そこで、容器を定
期的に洗浄する必要がある。
By the way, in such a hermetically-sealed container, a large number of wafers are stored and transported. At that time, the wafers and the inner surface of the container are rubbed with each other to cause contamination such as particles, and the container is clean. Since it is transferred to a low-temperature place, the outer surface is easily contaminated, and there is a risk of contaminating the wafer stored inside when the lid is removed. Therefore, it is necessary to wash the container regularly.

【0004】従来、密閉型容器の洗浄方法は、容器本体
の方は蓋を外した状態で開口部を下側に向けて洗浄槽中
に配置し、先ず内外面を高圧シャワーで洗浄し、洗浄が
終了した時点で容器内外にクリーン温風を吹き付けて乾
燥させている。
Conventionally, in the method of cleaning a closed container, the container body is placed in a cleaning tank with the opening facing downward with the lid removed, and first the inner and outer surfaces are cleaned by a high pressure shower and then cleaned. When the process is completed, clean hot air is blown inside and outside the container to dry it.

【0005】[0005]

【発明が解決しようとする課題】ところが、ウエハ等の
半導体基板を収納する密閉型容器は、サブミクロン粒子
の汚れを除去する必要があるが、高圧シャワーによる洗
浄のみでは満足する洗浄性を得られない。また、洗浄後
の乾燥においても、ウエハ搬送容器のように形状が複雑
で重なり合うような部分が多い容器では、温風吹きつけ
により完全乾燥させるには約40分を要する。温風の温
度を高めれば乾燥時間を短縮することが可能ではないか
と考えられるが、容器の材質が樹脂(耐熱100℃)で
あるので温度をあまり高くすることができない(通常7
0〜80℃)。
However, a closed container for storing a semiconductor substrate such as a wafer needs to remove dirt of submicron particles, but a satisfactory cleaning property can be obtained only by cleaning with a high pressure shower. Absent. Further, also in the drying after cleaning, it takes about 40 minutes to completely dry by a warm air blow in a container having a complicated shape and many overlapping portions such as a wafer transfer container. It may be possible to shorten the drying time by raising the temperature of the warm air, but the temperature cannot be raised too high because the material of the container is resin (heat resistance 100 ° C) (usually 7
0-80 ° C).

【0006】本発明の課題は、付着したサブミクロン粒
子まで洗浄除去でき、かつ短時間で乾燥させることがで
きる密閉型容器の洗浄方法及び洗浄装置の提供にある。
An object of the present invention is to provide a cleaning method and a cleaning device for a hermetically sealed container capable of cleaning and removing even attached submicron particles and drying in a short time.

【0007】[0007]

【課題を解決するための手段】上述課題を解決するため
に、本発明は、次のような手段を採用した。請求項1の
密閉型容器の洗浄方法は、超音波洗浄槽内に洗浄液を供
給するとともに蓋を外した密閉型容器をその開口部を下
に向けて前記洗浄液中に浸漬すると、前記容器の内部に
残留するエアが前記洗浄液の液圧により、容器内部の底
近傍にその先端部が届くように配置されたエア抜きパイ
プから自動的に排出され、この状態で超音波洗浄を行う
工程と、洗浄液を排出し或いはそのままで容器の内外部
を高圧シャワーにて洗浄する工程とを有する洗浄工程
と、前記洗浄工程を終了した密閉型容器を乾燥槽に搬送
して熱風を送り込み熱風加熱する工程と、乾燥槽内を減
圧して減圧乾燥する工程とを有する乾燥工程とを備えた
ものである。この場合に、前記洗浄工程は、超音波洗浄
を行う工程と高圧シャワーによる洗浄工程とを交互に複
数回繰り返すように構成し、前記乾燥工程も熱風加熱す
る工程と減圧工程とを交互に複数回繰り返すように構成
するのが好ましい。
In order to solve the above problems, the present invention employs the following means. The method for cleaning a hermetically sealed container according to claim 1, wherein a cleaning liquid is supplied into the ultrasonic cleaning tank, and when the hermetically sealed container with the lid removed is immersed in the cleaning liquid with its opening facing downward, the inside of the container is washed. To
Residual air is generated in the bottom of the container due to the pressure of the cleaning liquid.
Air bleed pie placed so that its tip can reach in the vicinity
Is automatically discharged from the container, and ultrasonic cleaning is performed in this state, and a cleaning process including discharging the cleaning liquid or cleaning the inside and outside of the container with a high pressure shower, and the cleaning process are completed. It is provided with a drying step including a step of transporting the sealed container to a drying tank and sending hot air to heat it with hot air, and a step of decompressing and drying the inside of the drying tank under reduced pressure. In this case, the cleaning step is configured to alternately repeat the ultrasonic cleaning step and the high pressure shower cleaning step a plurality of times, and the drying step also includes hot air heating and a depressurizing step alternately a plurality of times. It is preferably configured to repeat.

【0008】 請求項3の密閉型容器の洗浄装置は、蓋
を外した密閉型容器を、その開口部を下にした状態で載
置し昇降する機構を有するとともに、洗浄液を噴射する
高圧シャワーを有し、かつ洗浄液中に前記容器を浸漬す
る際に前記容器の内部に残留するエアを前記洗浄液の液
圧により自動的に排出するため、容器内部の底近傍にそ
の先端部が届くように配置されたエア抜きパイプとを備
え、かつ超音波振動による超音波洗浄が行える超音波洗
浄槽と、前記超音波洗浄槽による洗浄工程を終了した密
閉型容器を収納して熱風を送り込み熱風加熱させる熱風
送風機構を有するとともに、内部を減圧する減圧機構を
有する乾燥槽とを備えたものである。なお、この場合に
前記超音波洗浄槽は、高圧シャワー洗浄と超音波洗浄と
交互に複数回繰り返すように構成し、前記乾燥槽も熱風
加熱と減圧乾燥とを交互に複数回繰り返すように構成す
るのが好ましい。
According to a third aspect of the present invention, there is provided a device for cleaning a hermetically-sealed container, which has a mechanism for mounting and hoisting a hermetically-sealed container with a lid removed, with an opening thereof facing down, and a high-pressure shower for injecting a cleaning liquid. Air that remains inside the container when the container is immersed in the cleaning liquid is a liquid of the cleaning liquid.
Since it is automatically discharged by pressure, it is placed near the bottom inside the container.
Equipped with an air bleeding pipe arranged so that the tip of the
In addition to having an ultrasonic cleaning tank that can perform ultrasonic cleaning by ultrasonic vibration , and a hot air blowing mechanism that stores hot air and heats the hot air by storing the sealed container that has completed the cleaning process by the ultrasonic cleaning tank, And a drying tank having a pressure reducing mechanism for reducing the pressure. In this case, the ultrasonic cleaning tank is configured to alternately repeat high pressure shower cleaning and ultrasonic cleaning a plurality of times, and the drying tank is also configured to alternately repeat hot air heating and reduced pressure drying a plurality of times. Is preferred.

【0009】[0009]

【発明の実施の形態】以下、図面を参照して、本発明に
係る密閉型容器の洗浄装置の実施の形態について説明す
る。図1は、本発明に係る密閉型容器の洗浄装置の実施
の形態を模式的に表した図である。密閉型容器の洗浄装
置10は従来のものと異なり、洗浄部と乾燥部とが分離
されている。すなわち、洗浄部は洗浄槽20により構成
され、乾燥部は乾燥槽30によって構成されている。前
記洗浄槽20は、洗浄液を貯留することができる洗浄槽
本体21を有しており、該洗浄槽本体21の底面には超
音波振動子22が取り付けられていて超音波洗浄が行え
るように構成されている。また、洗浄槽20は、蓋を外
した密閉型容器100を開口部を下にした状態で載置す
る受台23を有する。この受台23は、洗浄槽本体21
の液面より上方で密閉型容器100を受け、洗浄槽本体
21内に貯留する洗浄液24中に出し入れできるように
昇降自在に構成されたものである。なお、密閉型容器1
00を載置させた受台23を洗浄槽本体21内に下降さ
せておき、後から洗浄液24を供給することも当然可能
である。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of a closed container cleaning apparatus according to the present invention will be described below with reference to the drawings. FIG. 1 is a diagram schematically showing an embodiment of a closed container cleaning device according to the present invention. Unlike the conventional cleaning device 10 for a closed container, the cleaning part and the drying part are separated. That is, the cleaning unit is composed of the cleaning tank 20, and the drying unit is composed of the drying tank 30. The cleaning tank 20 has a cleaning tank main body 21 capable of storing a cleaning liquid, and an ultrasonic transducer 22 is attached to the bottom surface of the cleaning tank main body 21 so that ultrasonic cleaning can be performed. Has been done. The cleaning tank 20 also has a pedestal 23 on which the closed container 100 with the lid removed is placed with the opening facing down. The pedestal 23 is the cleaning tank main body 21.
It is configured to be movable up and down so as to receive the hermetically-sealed container 100 above the liquid surface of and to put it in and out of the cleaning liquid 24 stored in the cleaning tank main body 21. The closed container 1
It is naturally possible to lower the pedestal 23 on which 00 is placed in the cleaning tank main body 21 and supply the cleaning liquid 24 later.

【0010】開口部を下側にした密閉型容器100を洗
浄液中に浸漬していくと、密閉型容器100の内部に溜
まっているエアを排出する機構が必要になる。この洗浄
槽20では、図3に示すように、前記受台23と一体に
組み付けられて先端部が受台23に載置された密閉型容
器100の底近傍まで届くエア抜きパイプ25が設けら
れており、受台23が降下して密閉型容器100が洗浄
液中に浸漬されていくと、容器100内に残留するエア
は容器100の重量により圧力が高まりエア抜きパイプ
25を介して自然に排出される。なお、エア抜きパイプ
25は、図4に示すように、洗浄槽本体21の中に支持
具26によって固定させておいてもよい。その場合、エ
ア抜きパイプ25の先端部は受台23が降下して密閉型
容器100が洗浄液中に浸漬され最も下にきたときに、
密閉型容器100の底近傍まで届くように配置する必要
がある。この方法で行う場合、洗浄液は密閉型容器10
0が洗浄槽本体21内の受台23に置かれた状態で供給
する。洗浄液が供給されて洗浄槽本体21内の液面が上
昇するにしたがって、密閉型容器100中の空気は徐々
にエア抜きパイプ25を通って排出される。
When the hermetically sealed container 100 with the opening facing downward is dipped in the cleaning liquid, a mechanism for discharging the air accumulated inside the hermetically sealed container 100 is required. As shown in FIG. 3, the cleaning tank 20 is provided with an air bleed pipe 25 that is integrally assembled with the pedestal 23 and has a tip portion reaching the vicinity of the bottom of the sealed container 100 placed on the pedestal 23. As the pedestal 23 descends and the hermetically sealed container 100 is immersed in the cleaning liquid, the pressure of the air remaining in the container 100 increases due to the weight of the container 100 and the air is naturally discharged through the air vent pipe 25. To be done. The air bleeding pipe 25 may be fixed in the cleaning tank main body 21 by a support 26 as shown in FIG. In that case, when the pedestal 23 descends and the hermetically-sealed container 100 is immersed in the cleaning liquid and comes to the lowermost end of the air bleeding pipe 25,
It is necessary to arrange so as to reach the vicinity of the bottom of the hermetically sealed container 100. When this method is used, the cleaning liquid is a closed container 10.
0 is supplied in a state of being placed on the pedestal 23 in the cleaning tank main body 21. As the cleaning liquid is supplied and the liquid level in the cleaning tank main body 21 rises, the air in the sealed container 100 is gradually discharged through the air vent pipe 25.

【0011】 また、洗浄槽20の受台23には、密閉
型容器100の内面を洗浄するため先端部から洗浄液を
噴射する高圧シャワー用配管27が並設されているとと
もに、洗浄槽本体21の側面にも密閉型容器100の外
面を高圧シャワー洗浄するため多数のノズル28が設け
られており、これらノズル28には高圧シャワー用配管
(図示を省略)が接続されている。なお、エア抜きパイ
プ25が前述したように、洗浄槽本体21側に直接取り
付ける場合には、高圧シャワー用配管27も、同様に洗
浄槽本体21側に設けることになる。また、図におけ
る、符号29は洗浄槽本体21の側面に設けられている
オーバーフロー装置である。また、洗浄液を供給する機
構や排出する機構は従来と同様の構成になっているので
図示を省略した。
Further, a high-pressure shower pipe 27 for injecting a cleaning liquid from the tip portion for cleaning the inner surface of the hermetically sealed container 100 is juxtaposed on the pedestal 23 of the cleaning tank 20 and the cleaning tank main body 21 A large number of nozzles 28 are also provided on the side surface for high-pressure shower cleaning of the outer surface of the closed container 100, and high-pressure shower pipes (not shown) are connected to these nozzles 28. When the air bleeding pipe 25 is directly attached to the cleaning tank body 21 side as described above, the high-pressure shower pipe 27 is also provided on the cleaning tank body 21 side. Further, in the figure, reference numeral 29 is an overflow device provided on the side surface of the cleaning tank main body 21. Further, the mechanism for supplying the cleaning liquid and the mechanism for discharging the cleaning liquid have the same configurations as the conventional ones, so that the illustration thereof is omitted.

【0012】次に、乾燥槽30について説明する。乾燥
槽30は、図1に示すように、上辺にスライド蓋31a
を有する密閉型の乾燥槽本体31を有しており、該乾燥
槽本体31内部には、開口部を下側に向けた密閉型容器
100を載置する受台33が設けられている。また、乾
燥槽本体31には、熱風送風機34が取り付けられてい
る。この熱風送風機34は、ブロア34a、ヒータ34
b、フィルタ(HEPA: high efficiency particulate fi
lter)34cにより構成されており、バルブV1を介し
て配管36により乾燥槽本体31に接続されている。ま
た、配管36の一部36aは分岐され乾燥槽本体31の
側面を貫通して前記受台33の下側から上方に延出され
ていて、受台33に載置された密閉型容器100の内面
に、外面と同様に熱風(70〜80℃、最高90℃)を
送ることができるようになっている。
Next, the drying tank 30 will be described. As shown in FIG. 1, the drying tank 30 has a slide lid 31a on the upper side.
Has a closed type drying tank main body 31, and inside the drying tank main body 31, there is provided a pedestal 33 on which the closed type container 100 with the opening facing downward is placed. A hot air blower 34 is attached to the drying tank body 31. The hot air blower 34 includes a blower 34a, a heater 34
b, Filter (HEPA: high efficiency particulate fi
lter) 34c, and is connected to the drying tank main body 31 by a pipe 36 via a valve V1. Further, a part 36 a of the pipe 36 is branched and penetrates a side surface of the drying tank main body 31 and extends upward from the lower side of the pedestal 33, and the sealed container 100 placed on the pedestal 33 is provided. Hot air (70 to 80 ° C., maximum 90 ° C.) can be sent to the inner surface like the outer surface.

【0013】また、乾燥槽本体31の底面には、排気用
配管37が取り付けられており、該排気用配管37には
バルブV2を介して真空ポンプ35が取り付けられてい
るととともに、排気用配管37にはバルブV3を介して
熱風排気と、バルブV4を介してドレインも排出できる
ように構成されている。
Further, an exhaust pipe 37 is attached to the bottom surface of the drying tank main body 31, and a vacuum pump 35 is attached to the exhaust pipe 37 via a valve V2, and the exhaust pipe is also attached. 37 is configured so that hot air can be exhausted via the valve V3 and drain can also be exhausted via the valve V4.

【0014】 次に、この密閉型容器100の洗浄装置
の使用方法について説明する。先ず、図2に示すような
搬送機50によって洗浄対象物である密閉型容器100
を、図1に示す洗浄槽20まで搬送する。搬送機50
は、左右方向に移動自在でかつ昇降自在な本体51を有
しており、本体51の上部51aから水平に2本の平行
なバー52が延びていて、それぞれのバー52には2本
のアーム53が垂直に固着されている。各アーム53の
下端部は内側に曲げられており、開口部が下側になった
密閉型容器100の開口部端部を支持するフック53a
として形成されている。また、前記バー52は、本体5
1の上部51a内に設けられた装置によって回転するよ
うに構成されており、バー52を回転させると、バー5
2に固着されているアーム53は図の矢印Aのように動
く。
Next, a method of using the cleaning device for the sealed container 100 will be described. First, the sealed container 100, which is an object to be cleaned, is conveyed by the carrier 50 as shown in FIG.
Is conveyed to the cleaning tank 20 shown in FIG. Carrier machine 50
Has a main body 51 that is movable in the left-right direction and can be moved up and down. Two parallel bars 52 extend horizontally from an upper portion 51a of the main body 51, and each bar 52 has two arms. 53 is fixed vertically. The lower end of each arm 53 is bent inward, and the hook 53a that supports the end of the opening of the closed container 100 with the opening on the lower side.
Is formed as. In addition, the bar 52 is the main body 5
1 is configured to rotate by a device provided in the upper portion 51a of the first bar 51. When the bar 52 is rotated, the bar 5 is rotated.
The arm 53 fixed to 2 moves like the arrow A in the figure.

【0015】このアーム53のフック53aによって、
開口部が下側に向いた密閉型容器100の開口部端部を
支持して、容器100を洗浄槽20の上方まで搬送し、
アーム53を開いて容器100を受台23に移す。洗浄
槽本体21内には、純水(洗浄液)を所定量供給する。
純水の供給が終了したらバルブV5を閉め、バルブV6
を開けておく。容器100を載置した受台23はエア抜
きパイプ25と一体となって洗浄槽本体21の洗浄液2
4の中に下降していく。容器100の内部に溜まってい
るエアはエア抜きパイプ25を介して開けてあるバルブ
V6を介し自然に排出される。受台23が所定位置まで
降下したら止まり、洗浄槽本体21の底面に取り付けら
れている超音波振動子22を振動させ容器100を超音
波洗浄する。
By the hook 53a of this arm 53,
The opening 100 supports the end of the opening of the hermetically-sealed container 100 with the opening facing downward and conveys the container 100 to above the cleaning tank 20.
The arm 53 is opened and the container 100 is transferred to the pedestal 23. A predetermined amount of pure water (cleaning liquid) is supplied into the cleaning tank body 21.
When the supply of pure water is complete, close valve V5 and
Keep open. The pedestal 23 on which the container 100 is placed is integrated with the air bleeding pipe 25 to clean the cleaning liquid 2 of the cleaning tank main body 21.
It descends into 4. The air accumulated inside the container 100 is naturally discharged through the valve V6 opened through the air bleeding pipe 25. When the pedestal 23 descends to a predetermined position, it stops, and the ultrasonic transducer 22 attached to the bottom surface of the cleaning tank body 21 is vibrated to ultrasonically clean the container 100.

【0016】超音波洗浄を所定時間行った後、洗浄槽本
体21内の洗浄液24を排水して、バルブV6を閉め
て、バルブV5を開けて純水を高圧シャワー用配管27
及びノズル28に供給して容器100の内外面に高圧シ
ャワー洗浄を行う。この時当然に、洗浄槽本体21の排
水口は開けておき、高圧シャワーで使用した純水を排出
する。所定時間高圧シャワー洗浄を行った後、洗浄槽本
体21の排水口を閉めて中に純水を供給し、先ほどと同
じように所定時間超音波洗浄を行い、排水して続いて高
圧シャワー洗浄を行う。超音波洗浄と高圧シャワー洗浄
とを交互に数回繰り返して洗浄を終了する。勿論、繰り
返しを行わなくても汚れを除去できれば繰り返えさなく
てもよい。なお、上記の例では、高圧シャワー洗浄を行
うときに、洗浄液24を排出して行ったが、排出しない
状態のまま液中噴流洗浄を行ってもよい。また、洗浄対
象の汚れの種類によって超音波洗浄と高圧シャワー洗浄
のいずれか一方のみを行うこともできる。
After ultrasonic cleaning for a predetermined time, the cleaning liquid 24 in the cleaning tank main body 21 is drained, the valve V6 is closed and the valve V5 is opened to deionize pure water into the high pressure shower pipe 27.
And the nozzle 28 to perform high pressure shower cleaning on the inner and outer surfaces of the container 100. At this time, naturally, the drain port of the cleaning tank main body 21 is left open, and the pure water used in the high-pressure shower is discharged. After high-pressure shower cleaning for a predetermined time, the drain port of the cleaning tank main body 21 is closed and pure water is supplied into the cleaning tank main body 21, ultrasonic cleaning is performed for a predetermined time in the same manner as above, drainage is performed, and then high-pressure shower cleaning is performed. To do. Ultrasonic cleaning and high-pressure shower cleaning are alternately repeated several times to complete the cleaning. Of course, if the stain can be removed without repeating, it is not necessary to repeat. In the above example, the cleaning liquid 24 is discharged when performing the high-pressure shower cleaning, but the submerged jet cleaning may be performed without discharging the cleaning liquid 24. Further, only one of ultrasonic cleaning and high-pressure shower cleaning can be performed depending on the type of dirt to be cleaned.

【0017】洗浄が終了すると、受台23が洗浄槽本体
21の上方まで上昇し、搬送機50のアーム53によっ
て容器100が受け取られ乾燥槽30の上方まで搬送さ
れる。乾燥槽本体31の上部の蓋31aが開くと、搬送
機50が下降して容器100を乾燥槽本体31内に設け
られた受台33に移す。容器100を放した搬送機50
は上昇し、乾燥槽本体31の蓋31aが閉じられる。
When the cleaning is completed, the pedestal 23 rises above the cleaning tank main body 21, and the container 100 is received by the arm 53 of the carrier 50 and conveyed to above the drying tank 30. When the lid 31a on the upper portion of the drying tank main body 31 is opened, the carrier 50 descends and transfers the container 100 to the pedestal 33 provided in the drying tank main body 31. Conveyor 50 with container 100 released
Rises and the lid 31a of the drying tank body 31 is closed.

【0018】先ず、バルブV1、V3,V4を開けた状
態で熱風送風機34から乾燥槽本体31内に熱風を送っ
て容器100の加熱を行う。所定時間経過した後、バル
ブV1、V3,V4を閉じ、バルブV2を開けて真空ポ
ンプ35を作動し、乾燥機本体31内部を減圧して容器
100の減圧乾燥を行う。所定時間減圧した後、バルブ
V7を開けて乾燥槽本体31内を大気開放し、常圧に戻
してから、バルブV1、V3,V4を開けた状態でまた
熱風送風機34から乾燥槽本体31内に熱風を送って容
器100の加熱を行い、所定時間経過した後また減圧乾
燥を行う。熱風加熱と減圧乾燥とを数回繰り返して乾燥
を終了する。この場合も、洗浄と同じに、繰り返しを行
わなくても十分な乾燥ができれば繰り返して行わなくと
もよい。乾燥が終了した時点で、乾燥槽本体31の上部
の蓋31aを開け、搬送機50によって容器100を乾
燥槽本体31から取り出して、容器100の洗浄が終了
する。
First, with the valves V1, V3 and V4 opened, hot air is blown from the hot air blower 34 into the drying tank main body 31 to heat the container 100. After a predetermined time has elapsed, the valves V1, V3 and V4 are closed, the valve V2 is opened, the vacuum pump 35 is operated, the interior of the dryer main body 31 is decompressed, and the container 100 is dried under reduced pressure. After decompressing for a predetermined time, the valve V7 is opened to open the inside of the drying tank main body 31 to the atmosphere, and after returning to normal pressure, the valves V1, V3 and V4 are opened and the inside of the drying tank main body 31 is again fed from the hot air blower 34. Hot air is sent to heat the container 100, and after a predetermined time has elapsed, vacuum drying is performed again. Hot air heating and reduced pressure drying are repeated several times to complete the drying. In this case as well, like the washing, it is not necessary to repeat the steps as long as sufficient drying can be performed without repeating the steps. When the drying is completed, the lid 31a on the upper part of the drying tank main body 31 is opened, the container 100 is taken out of the drying tank main body 31 by the carrier 50, and the cleaning of the container 100 is completed.

【0019】容器100の乾燥を密閉型の乾燥槽本体3
1で熱風加熱と減圧乾燥とを交互に繰り返し行うので、
従来の乾燥方法では乾燥に40分程かかったものが10
分程度に短縮することができた。
The container 100 is dried by a closed type drying tank main body 3
Since hot air heating and reduced pressure drying are alternately repeated in 1,
It took 10 minutes to dry in the conventional drying method.
I was able to shorten to about a minute.

【0020】[0020]

【発明の効果】以上説明したように、本発明によれば、
洗浄槽と乾燥槽とを分離して洗浄槽では超音波洗浄と高
圧シャワー洗浄とを交互に行えるようにしたので、サブ
ミクロンの塵芥まで洗浄でき、かつ乾燥槽では熱風加熱
と減圧乾燥とを交互に行えるようにしたので、乾燥時間
を大幅に短縮することができる。
As described above, according to the present invention,
Since the cleaning tank and the drying tank are separated so that ultrasonic cleaning and high-pressure shower cleaning can be alternately performed in the cleaning tank, even sub-micron dust can be cleaned, and hot air heating and vacuum drying alternate in the drying tank. Therefore, the drying time can be greatly shortened.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施の形態を模式的に示した図であ
る。
FIG. 1 is a diagram schematically showing an embodiment of the present invention.

【図2】本発明に利用する搬送機を模式的に示した図で
ある。
FIG. 2 is a diagram schematically showing a carrier used in the present invention.

【図3】本発明を構成する超音波洗浄槽の受台と高圧シ
ャワーとの位置関係の一例を示す図である。
FIG. 3 is a diagram showing an example of a positional relationship between a pedestal of an ultrasonic cleaning tank and a high-pressure shower that constitute the present invention.

【図4】本発明を構成する超音波洗浄槽の高圧シャワー
の設置位置の他の例を示す図である。
FIG. 4 is a diagram showing another example of the installation position of the high-pressure shower in the ultrasonic cleaning tank that constitutes the present invention.

【符号の説明】[Explanation of symbols]

10 密閉型容器の洗浄装置 20 洗浄槽 21 洗浄槽本体 22 超音波振動子 23 受台 24 洗浄液 25 エア抜きパイプ 27 高圧シャワー用配管 28 ノズル 30 乾燥槽 33 受台 34 熱風送風機 35 真空ポンプ 50 搬送機 100 密閉型容器 10 Airtight container cleaning device 20 washing tank 21 Cleaning tank body 22 Ultrasonic transducer 23 cradle 24 cleaning liquid 25 Air bleeding pipe 27 High-pressure shower piping 28 nozzles 30 drying tank 33 pedestal 34 Hot air blower 35 vacuum pump 50 carrier 100 airtight container

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) B08B 9/28 B08B 3/02 B08B 3/12 H01L 21/304 648 H01L 21/68 ─────────────────────────────────────────────────── ─── Continuation of front page (58) Fields surveyed (Int.Cl. 7 , DB name) B08B 9/28 B08B 3/02 B08B 3/12 H01L 21/304 648 H01L 21/68

Claims (4)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 超音波洗浄槽内に洗浄液を供給するとと
もに蓋を外した密閉型容器をその開口部を下に向けて前
記洗浄液中に浸漬すると、前記容器の内部に残留するエ
アが前記洗浄液の液圧により、容器内部の底近傍にその
先端部が届くように配置されたエア抜きパイプから自動
的に排出され、この状態で超音波洗浄を行う工程と、洗
浄液を排出し或いはそのままで容器の内外部を高圧シャ
ワーにて洗浄する工程とを有する洗浄工程と、 前記洗浄工程を終了した密閉型容器を乾燥槽に搬送して
熱風を送り込み熱風加熱する工程と、乾燥槽内を減圧し
て減圧乾燥する工程とを有する乾燥工程とを備えた密閉
型容器の洗浄方法。
1. When an airtight container having a lid and a cleaning liquid is supplied into the ultrasonic cleaning tank and the lid is removed, the closed container is immersed in the cleaning liquid and remains inside the container.
Due to the hydraulic pressure of the cleaning liquid, the
Automatic from the air bleeding pipe arranged so that the tip can reach
Of the cleaning solution, and a cleaning step including a step of performing ultrasonic cleaning in this state, a step of discharging the cleaning liquid or cleaning the inside and outside of the container with a high-pressure shower, and a closed mold after the cleaning step. A method for cleaning a hermetically-sealed container, comprising: a step of transporting the container to a drying tank and sending hot air to heat the same with hot air; and a drying step including a step of decompressing and drying the inside of the drying tank under reduced pressure.
【請求項2】 前記洗浄工程は、超音波洗浄を行う工程
と高圧シャワーによる洗浄工程とを交互に複数回繰り返
すように構成されるとともに、前記乾燥工程も熱風加熱
する工程と減圧工程とを交互に複数回繰り返すように構
成されていることを特徴とする請求項1記載の密閉型容
器の洗浄方法。
2. The cleaning step is configured to alternately repeat the ultrasonic cleaning step and the high pressure shower cleaning step a plurality of times, and the drying step also alternates between hot air heating step and depressurizing step. The method for cleaning a hermetically sealed container according to claim 1, wherein the method is repeated a plurality of times.
【請求項3】 蓋を外した密閉型容器を、その開口部を
下にした状態で載置し昇降する機構を有するとともに、
洗浄液を噴射する高圧シャワーを有し、かつ洗浄液中に
前記容器を浸漬する際に前記容器の内部に残留するエア
前記洗浄液の液圧により自動的に排出するため、容器
内部の底近傍にその先端部が届くように配置されたエア
抜きパイプとを備え、かつ超音波振動による超音波洗浄
が行える超音波洗浄槽と、 前記超音波洗浄槽による洗浄工程を終了した密閉型容器
を収納して熱風を送り込み熱風加熱させる熱風送風機構
を有するとともに、内部を減圧する減圧機構を有する乾
燥槽とを備えた密閉型容器の洗浄装置。
3. A hermetically-sealed container with a lid removed is provided with a mechanism for mounting and elevating the container with the opening thereof facing down,
A container having a high-pressure shower for injecting a cleaning liquid, and when the container is immersed in the cleaning liquid, air remaining inside the container is automatically discharged by the liquid pressure of the cleaning liquid.
Air placed so that its tip reaches near the inside bottom.
An ultrasonic cleaning tank equipped with a drain pipe and capable of ultrasonic cleaning by ultrasonic vibration , and a hot air blowing mechanism for sending hot air and heating hot air by housing a sealed container that has completed the cleaning process by the ultrasonic cleaning tank A cleaning device for a hermetically-sealed container having a drying tank having a depressurizing mechanism for depressurizing the inside.
【請求項4】 前記超音波洗浄槽は、高圧シャワー洗浄
と超音波洗浄と交互に複数回繰り返すように構成されて
いるとともに、前記乾燥槽も熱風加熱と減圧乾燥とを交
互に複数回繰り返すように構成されていることを特徴と
する請求項3記載の密閉型容器の洗浄装置。
4. The ultrasonic cleaning tank is configured to alternately repeat high-pressure shower cleaning and ultrasonic cleaning a plurality of times, and the drying tank also alternately repeats hot air heating and reduced pressure drying a plurality of times. The cleaning device for a hermetically sealed container according to claim 3, wherein the cleaning device is configured as follows.
JP2000325836A 2000-10-25 2000-10-25 Method and apparatus for cleaning closed container Expired - Fee Related JP3494293B2 (en)

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Application Number Priority Date Filing Date Title
JP2000325836A JP3494293B2 (en) 2000-10-25 2000-10-25 Method and apparatus for cleaning closed container

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JP2002126678A JP2002126678A (en) 2002-05-08
JP3494293B2 true JP3494293B2 (en) 2004-02-09

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ID=18803136

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Country Status (1)

Country Link
JP (1) JP3494293B2 (en)

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